WO2014200005A1 - Coated cutting tool - Google Patents
Coated cutting tool Download PDFInfo
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- WO2014200005A1 WO2014200005A1 PCT/JP2014/065415 JP2014065415W WO2014200005A1 WO 2014200005 A1 WO2014200005 A1 WO 2014200005A1 JP 2014065415 W JP2014065415 W JP 2014065415W WO 2014200005 A1 WO2014200005 A1 WO 2014200005A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Physical Vapour Deposition (AREA)
- Drilling Tools (AREA)
Abstract
In order to provide a coated cutting tool that exhibits long tool-life and superior abrasion resistance and damage resistance, a coated cutting tool is provided in which: a base material and coating layers formed on a surface of the base material are included; at least one layer of the coating layers is a hard layer comprising a compound that is configured by at least one type of element selected from a group comprising of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si, and Y, and at least one type of element selected from a group comprising of C, N, B, and O; and, when particle diameters in a cross-sectional structure of a hard-layer plane that is parallel to the surface of the base material is measured, hard-layer particles having a particle diameter of less than 1-300nm account for 10-80% of the surface area of the entire cross-sectional structure of the hard layer, hard-layer particles having a particle diameter of 300-1000nm account for 20-90% of the surface area of the entire cross-sectional structure of the hard layer, and in total these particles account for 100% of the surface area.
Description
本発明は、被覆切削工具に関するものである。
The present invention relates to a coated cutting tool.
鋼、鋳鉄、ステンレス鋼、耐熱合金などの切削加工には、超硬合金、サーメット、ｃＢＮ焼結体などの基材の表面にＴｉＮ層やＴｉＡｌＮ層などを形成させた被覆切削工具が広く用いられている。
For cutting of steel, cast iron, stainless steel, heat-resistant alloys, etc., coated cutting tools in which a TiN layer or TiAlN layer is formed on the surface of a substrate such as cemented carbide, cermet, or cBN sintered body are widely used. ing.
被覆切削工具の従来技術としては、ＷＣ基超硬合金、サーメット、セラミックス、高速度鋼などからなる母材の表面に、IVａ、Vａ、VIａ族金属元素およびＡｌ、Ｓｉから選んだ２種類以上の元素からなる合金の窒化物、酸化物、炭化物、炭窒化物又はホウ化物を、物理的蒸着法により、５０ｎｍ以下の粒子径で構成した被膜を持つことを特徴とする表面被覆硬質部材がある（例えば、特許文献１参照。）。
As the conventional technology of coated cutting tools, there are two or more types selected from IVa, Va, VIa group metal elements and Al, Si on the surface of the base material made of WC base cemented carbide, cermet, ceramics, high speed steel, etc. There is a surface-coated hard member characterized by having a coating composed of a nitride, oxide, carbide, carbonitride or boride of an alloy consisting of elements with a particle diameter of 50 nm or less by physical vapor deposition ( For example, see Patent Document 1.)
また、被覆切削工具の従来技術としては、基体の表面に、平均結晶幅が上層よりも大きい柱状粒子から構成された下層と、平均結晶幅が下層よりも小さい柱状粒子から構成された上層とからなる被覆層を形成することを特徴とする表面被覆切削工具がある（例えば、特許文献２参照）。
Further, as a conventional technique of the coated cutting tool, on the surface of the base, a lower layer composed of columnar particles having an average crystal width larger than that of the upper layer, and an upper layer composed of columnar particles having an average crystal width smaller than that of the lower layer. There is a surface-coated cutting tool characterized by forming a coating layer (see, for example, Patent Document 2).
高速加工および高能率加工で切削を行う場合には、特許文献１で開示された細かい粒子径で構成した被膜を有する被覆切削工具では、切削加工中に被覆切削工具の刃先と被削材とが擦過し、被膜粒子の脱落による摩耗を生じるため、耐摩耗性に劣るという問題があった。また、被膜の表面に発生したクラックが、被膜粒子の粒界に沿って直線的に基材まで進展するため、耐欠損性に劣るという問題があった。
In the case of cutting by high-speed machining and high-efficiency machining, in the coated cutting tool having a coating composed of a fine particle diameter disclosed in Patent Document 1, the cutting edge of the coated cutting tool and the work material are cut during machining. There is a problem that the abrasion resistance is inferior because the abrasion is caused by the abrasion of the coated particles. Moreover, since the crack which generate | occur | produced on the surface of the film progresses to a base material linearly along the grain boundary of a film particle, there existed a problem that it was inferior to fracture resistance.
また、特許文献２で開示された大きい柱状粒子で構成された下層と、小さい柱状粒子で構成された上層とを有する被覆切削工具では、下層が大きい柱状粒子のみで構成されているため、粒子の脱落による摩耗の進行は抑制される。しかし、切削加工中に発生したクラックが粒界に沿って進展することにより、大きく被覆層が剥離するため、その被覆層の剥離が起点となって欠損に至るという問題があった。
Further, in the coated cutting tool having a lower layer composed of large columnar particles and an upper layer composed of small columnar particles disclosed in Patent Document 2, the lower layer is composed only of large columnar particles. The progress of wear due to falling off is suppressed. However, since cracks generated during cutting progress along the grain boundaries, the coating layer is largely peeled off, and there is a problem that the peeling of the coating layer is a starting point and leads to defects.
近年の切削加工では高速化、高能率化が顕著となり、従来よりも被覆切削工具に負荷がかかるため、工具寿命が低下する傾向が見られるようになってきた。本発明は、このような問題を解決するためになされたものであり、優れた耐摩耗性と耐欠損性とを持つ、工具寿命の長い被覆切削工具を提供することを目的とする。
In recent years, high speed and high efficiency have become prominent in cutting, and the load on the coated cutting tool is more than ever, so that the tool life tends to be reduced. The present invention has been made to solve such a problem, and an object of the present invention is to provide a coated cutting tool having excellent wear resistance and fracture resistance and having a long tool life.
本発明者らは研究を重ねたところ、硬質層が細かい粒子と粗い粒子とを含むと、硬質層粒子の脱落による摩耗や、欠損を生じにくくなり、そのような硬質層を形成した被覆切削工具は、耐摩耗性および耐欠損性が向上し、工具寿命が長くなるという知見が得られた。
As a result of repeated researches, the present inventors have found that when the hard layer contains fine particles and coarse particles, the hard layer particles are less likely to be worn out or chipped, and the coated cutting tool formed with such a hard layer is formed. It was found that wear resistance and fracture resistance were improved and tool life was prolonged.
すなわち、本発明の要旨は以下の通りである。
（１）基材と該基材の表面に形成した被覆層とを備え、前記被覆層の少なくとも１層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる硬質層であり、前記硬質層における前記基材の表面に対して平行な面の断面組織から粒径を測定したとき、粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して１０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して２０～９０面積％であり、これらの合計は１００面積％である被覆切削工具。
（２）粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して２０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して２０～８０面積％であり、これらの合計は１００面積％である（１）の被覆切削工具。
（３）粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して３０～７０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して３０～７０面積％であり、これらの合計は１００面積％である（１）または（２）の被覆切削工具。
（４）硬質層粒子の粒径分布は粒径１～３００ｎｍ未満に少なくとも１つのピークを持ち、硬質層粒子の粒径分布は粒径３００～１０００ｎｍに少なくとも１つのピークを持つ（１）～（３）のいずれかの被覆切削工具。
（５）前記硬質層の平均層厚は０．２～１５μｍである（１）～（４）のいずれかの被覆切削工具。
（６）前記硬質層の組成が（ＡｌａＭｂＬｃ）Ｘ［但し、ＭはＴｉおよびＣｒの１種または２種を表し、ＬはＷ、ＹおよびＳｉからなる群より選ばれた少なくとも１種の元素を表し、ＸはＣおよびＮの１種または２種の元素を表し、ａはＡｌ元素とＭ元素とＬ元素との合計に対するＡｌ元素の原子比を表し、ｂはＡｌ元素とＭ元素とＬ元素との合計に対するＭ元素の原子比を表し、ｃはＡｌ元素とＭ元素とＬ元素との合計に対するＬ元素の原子比を表し、ａ、ｂ、ｃは、０．２５≦ａ≦０．７５、０．２５≦ｂ≦０．７５、０≦ｃ≦０．２０、ａ＋ｂ＋ｃ＝１を満足する。］である（１）～（５）のいずれかの被覆切削工具。
（７）前記被覆層の少なくとも１層は、前記基材と前記硬質層との間に形成された下部層であり、前記下部層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる単層または多層の（１）～（６）のいずれかの被覆切削工具。
（８）前記被覆層の少なくとも１層は、前記硬質層の表面に形成された上部層であり、前記上部層はＴｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる単層または多層の（１）～（７）のいずれかの被覆切削工具。 That is, the gist of the present invention is as follows.
(1) A substrate and a coating layer formed on the surface of the substrate, wherein at least one of the coating layers is Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si And a hard layer made of a compound composed of at least one element selected from the group consisting of Y and at least one element selected from the group consisting of C, N, B and O, When the particle size is measured from a cross-sectional structure of a plane parallel to the surface of the substrate, hard layer particles having a particle size of less than 1 to 300 nm are 10 to 80 area% with respect to the entire cross-sectional structure of the hard layer. A coated cutting tool in which hard layer particles having a particle size of 300 to 1000 nm are 20 to 90 area% with respect to the entire cross-sectional structure of the hard layer, and the total of these is 100 area%.
(2) Hard layer particles having a particle size of 1 to less than 300 nm are 20 to 80 area% with respect to the entire cross-sectional structure of the hard layer, and hard layer particles having a particle size of 300 to 1000 nm are The coated cutting tool according to (1), which is 20 to 80 area% with respect to the entire cross-sectional structure, and the total of these is 100 area%.
(3) Hard layer particles having a particle size of 1 to less than 300 nm are 30 to 70 area% with respect to the entire cross-sectional structure of the hard layer, and hard layer particles having a particle size of 300 to 1000 nm are The coated cutting tool according to (1) or (2), which is 30 to 70 area% with respect to the entire cross-sectional structure, and the total of these is 100 area%.
(4) The particle size distribution of the hard layer particles has at least one peak at a particle size of 1 to less than 300 nm, and the particle size distribution of the hard layer particles has at least one peak at a particle size of 300 to 1000 nm (1) to ( The coated cutting tool according to any one of 3).
(5) The coated cutting tool according to any one of (1) to (4), wherein the hard layer has an average layer thickness of 0.2 to 15 μm.
(6) The composition of the hard layer is (Al a M b L c ) X [where M represents one or two of Ti and Cr, and L is at least selected from the group consisting of W, Y and Si 1 represents one element, X represents one or two elements of C and N, a represents the atomic ratio of Al element to the sum of Al element, M element and L element, and b represents Al element and M represents the atomic ratio of M element to the sum of M element and L element, c represents the atomic ratio of L element to the sum of Al element, M element, and L element, and a, b, and c are 0.25 ≦ a ≦ 0.75, 0.25 ≦ b ≦ 0.75, 0 ≦ c ≦ 0.20, and a + b + c = 1 are satisfied. ] The coated cutting tool according to any one of (1) to (5).
(7) At least one of the coating layers is a lower layer formed between the base material and the hard layer, and the lower layer includes Ti, Zr, Hf, V, Nb, Ta, Cr, A single layer composed of a compound composed of at least one element selected from the group consisting of Mo, W, Al, Si and Y and at least one element selected from the group consisting of C, N, B and O Alternatively, a coated cutting tool according to any one of (1) to (6), which is a multilayer.
(8) At least one of the coating layers is an upper layer formed on the surface of the hard layer, and the upper layer is Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, A single layer or multilayer (1) comprising a compound composed of at least one element selected from the group consisting of Si and Y and at least one element selected from the group consisting of C, N, B and O A coated cutting tool according to any one of (7) to (7).
（１）基材と該基材の表面に形成した被覆層とを備え、前記被覆層の少なくとも１層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる硬質層であり、前記硬質層における前記基材の表面に対して平行な面の断面組織から粒径を測定したとき、粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して１０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して２０～９０面積％であり、これらの合計は１００面積％である被覆切削工具。
（２）粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して２０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して２０～８０面積％であり、これらの合計は１００面積％である（１）の被覆切削工具。
（３）粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して３０～７０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して３０～７０面積％であり、これらの合計は１００面積％である（１）または（２）の被覆切削工具。
（４）硬質層粒子の粒径分布は粒径１～３００ｎｍ未満に少なくとも１つのピークを持ち、硬質層粒子の粒径分布は粒径３００～１０００ｎｍに少なくとも１つのピークを持つ（１）～（３）のいずれかの被覆切削工具。
（５）前記硬質層の平均層厚は０．２～１５μｍである（１）～（４）のいずれかの被覆切削工具。
（６）前記硬質層の組成が（ＡｌａＭｂＬｃ）Ｘ［但し、ＭはＴｉおよびＣｒの１種または２種を表し、ＬはＷ、ＹおよびＳｉからなる群より選ばれた少なくとも１種の元素を表し、ＸはＣおよびＮの１種または２種の元素を表し、ａはＡｌ元素とＭ元素とＬ元素との合計に対するＡｌ元素の原子比を表し、ｂはＡｌ元素とＭ元素とＬ元素との合計に対するＭ元素の原子比を表し、ｃはＡｌ元素とＭ元素とＬ元素との合計に対するＬ元素の原子比を表し、ａ、ｂ、ｃは、０．２５≦ａ≦０．７５、０．２５≦ｂ≦０．７５、０≦ｃ≦０．２０、ａ＋ｂ＋ｃ＝１を満足する。］である（１）～（５）のいずれかの被覆切削工具。
（７）前記被覆層の少なくとも１層は、前記基材と前記硬質層との間に形成された下部層であり、前記下部層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる単層または多層の（１）～（６）のいずれかの被覆切削工具。
（８）前記被覆層の少なくとも１層は、前記硬質層の表面に形成された上部層であり、前記上部層はＴｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる単層または多層の（１）～（７）のいずれかの被覆切削工具。 That is, the gist of the present invention is as follows.
(1) A substrate and a coating layer formed on the surface of the substrate, wherein at least one of the coating layers is Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si And a hard layer made of a compound composed of at least one element selected from the group consisting of Y and at least one element selected from the group consisting of C, N, B and O, When the particle size is measured from a cross-sectional structure of a plane parallel to the surface of the substrate, hard layer particles having a particle size of less than 1 to 300 nm are 10 to 80 area% with respect to the entire cross-sectional structure of the hard layer. A coated cutting tool in which hard layer particles having a particle size of 300 to 1000 nm are 20 to 90 area% with respect to the entire cross-sectional structure of the hard layer, and the total of these is 100 area%.
(2) Hard layer particles having a particle size of 1 to less than 300 nm are 20 to 80 area% with respect to the entire cross-sectional structure of the hard layer, and hard layer particles having a particle size of 300 to 1000 nm are The coated cutting tool according to (1), which is 20 to 80 area% with respect to the entire cross-sectional structure, and the total of these is 100 area%.
(3) Hard layer particles having a particle size of 1 to less than 300 nm are 30 to 70 area% with respect to the entire cross-sectional structure of the hard layer, and hard layer particles having a particle size of 300 to 1000 nm are The coated cutting tool according to (1) or (2), which is 30 to 70 area% with respect to the entire cross-sectional structure, and the total of these is 100 area%.
(4) The particle size distribution of the hard layer particles has at least one peak at a particle size of 1 to less than 300 nm, and the particle size distribution of the hard layer particles has at least one peak at a particle size of 300 to 1000 nm (1) to ( The coated cutting tool according to any one of 3).
(5) The coated cutting tool according to any one of (1) to (4), wherein the hard layer has an average layer thickness of 0.2 to 15 μm.
(6) The composition of the hard layer is (Al a M b L c ) X [where M represents one or two of Ti and Cr, and L is at least selected from the group consisting of W, Y and Si 1 represents one element, X represents one or two elements of C and N, a represents the atomic ratio of Al element to the sum of Al element, M element and L element, and b represents Al element and M represents the atomic ratio of M element to the sum of M element and L element, c represents the atomic ratio of L element to the sum of Al element, M element, and L element, and a, b, and c are 0.25 ≦ a ≦ 0.75, 0.25 ≦ b ≦ 0.75, 0 ≦ c ≦ 0.20, and a + b + c = 1 are satisfied. ] The coated cutting tool according to any one of (1) to (5).
(7) At least one of the coating layers is a lower layer formed between the base material and the hard layer, and the lower layer includes Ti, Zr, Hf, V, Nb, Ta, Cr, A single layer composed of a compound composed of at least one element selected from the group consisting of Mo, W, Al, Si and Y and at least one element selected from the group consisting of C, N, B and O Alternatively, a coated cutting tool according to any one of (1) to (6), which is a multilayer.
(8) At least one of the coating layers is an upper layer formed on the surface of the hard layer, and the upper layer is Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, A single layer or multilayer (1) comprising a compound composed of at least one element selected from the group consisting of Si and Y and at least one element selected from the group consisting of C, N, B and O A coated cutting tool according to any one of (7) to (7).
本発明の被覆切削工具は、基材と基材の表面に形成された被覆層とを備えている。本発明の基材は、被覆切削工具の基材として用いられるものであれば特に限定されない。被覆切削工具の基材として、具体的には、超硬合金、サーメット、セラミックス、立方晶窒化硼素焼結体、ダイヤモンド焼結体、高速度鋼などを挙げることができる。その中でも基材が超硬合金であると、耐摩耗性および耐欠損性に優れるので、さらに好ましい。
The coated cutting tool of the present invention includes a base material and a coating layer formed on the surface of the base material. The base material of the present invention is not particularly limited as long as it is used as a base material for a coated cutting tool. Specific examples of the base material for the coated cutting tool include cemented carbide, cermet, ceramics, cubic boron nitride sintered body, diamond sintered body, and high-speed steel. Among them, it is more preferable that the base material is a cemented carbide because it is excellent in wear resistance and fracture resistance.
本発明の被覆層は、被覆切削工具の被覆層として用いられるものであれば特に限定されない。例えば、（ＡｌＴｉ）ＮやＭｏ２Ｓなどの金属化合物層、金属Ｔｉなどの金属層、ＤＬＣ（ダイヤモンドライクカーボン）やダイヤモンドなどの硬質炭素層などを挙げることができる。その中でも、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とから構成される化合物の単層または多層であると、耐摩耗性に優れるので、さらに好ましい。
The coating layer of this invention will not be specifically limited if it is used as a coating layer of a coated cutting tool. For example, a metal compound layer such as (AlTi) N or Mo 2 S, a metal layer such as metal Ti, or a hard carbon layer such as DLC (diamond-like carbon) or diamond can be used. Among these, at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si and Y, and a group consisting of C, N, B and O A single layer or a multilayer of a compound composed of at least one selected element is more preferable because it is excellent in wear resistance.
本発明の被覆層は、本発明の硬質層だけで構成されてもよいが、基材と硬質層との間に下部層を含んでもよい。下部層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とから構成される化合物の単層または多層であると、耐摩耗性に優れるので、さらに好ましい。
The coating layer of the present invention may be composed of only the hard layer of the present invention, but may include a lower layer between the substrate and the hard layer. The lower layer is made of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si and Y, and a group consisting of C, N, B and O A single layer or a multilayer of a compound composed of at least one element selected from the above is more preferable because it is excellent in wear resistance.
本発明の被覆層は、本発明の硬質層だけで構成されてもよいが、硬質層の表面に上部層を形成してもよい。上部層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とから構成される化合物の単層または多層であると、耐摩耗性に優れるので、さらに好ましい。上部層の表面にさらに硬質層を形成させても好ましく、上部層と硬質層とを交互にそれぞれ２層以上積層させた交互積層構造も好ましい。
The coating layer of the present invention may be composed of only the hard layer of the present invention, but an upper layer may be formed on the surface of the hard layer. The upper layer is made of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si and Y, and a group consisting of C, N, B and O A single layer or a multilayer of a compound composed of at least one element selected from the above is more preferable because it is excellent in wear resistance. It is also preferable to further form a hard layer on the surface of the upper layer, and an alternate laminated structure in which two or more upper layers and hard layers are alternately laminated is also preferred.
本発明の被覆層全体の平均層厚は、０．２μｍ未満であると耐摩耗性が低下する傾向が見られ、１５μｍを超えて厚くなると耐欠損性が低下する傾向が見られる。そのため、被覆層全体の平均層厚は０．２～１５μｍであると、さらに好ましい。
When the average layer thickness of the entire coating layer of the present invention is less than 0.2 μm, the wear resistance tends to decrease, and when it exceeds 15 μm, the fracture resistance tends to decrease. For this reason, the average thickness of the entire coating layer is more preferably 0.2 to 15 μm.
本発明において、各層の層厚は、被覆切削工具の断面組織から光学顕微鏡、走査電子顕微鏡（ＳＥＭ）、電界放射型走査電子顕微鏡（ＦＥ－ＳＥＭ）、透過電子顕微鏡（ＴＥＭ）などを用いて測定することができる。なお、被覆切削工具の各層の層厚は、金属蒸発源に対向する面の刃先から当該面の中心部に向かって５０μｍの位置の近傍において、各層の層厚を３箇所以上測定し、その平均値を算出し、各層の平均層厚とした。また、各層の組成は、エネルギー分散型Ｘ線分光器（ＥＤＳ）や波長分散型Ｘ線分光器（ＷＤＳ）などを用いて測定することができる。
In the present invention, the thickness of each layer is measured from the cross-sectional structure of the coated cutting tool using an optical microscope, a scanning electron microscope (SEM), a field emission scanning electron microscope (FE-SEM), a transmission electron microscope (TEM), or the like. can do. The layer thickness of each layer of the coated cutting tool was measured at three or more points in the vicinity of the position of 50 μm from the blade edge of the surface facing the metal evaporation source toward the center of the surface, and the average The value was calculated and taken as the average layer thickness of each layer. The composition of each layer can be measured using an energy dispersive X-ray spectrometer (EDS), a wavelength dispersive X-ray spectrometer (WDS), or the like.
本発明の硬質層は、粒径が１～３００ｎｍ未満である硬質層粒子と、粒径が３００～１０００ｎｍである硬質層粒子とからなる。従来よりも被覆切削工具に負荷がかかる切削加工の条件において、微細な粒子で構成される被覆層では、切削加工中に被覆切削工具の刃先と被削材が擦過し、粒子の脱落による摩耗が生じるため耐摩耗性が劣る。さらに、被覆層の表面に発生したクラックが粒子の粒界に沿って直線的に基材まで進展するため、耐欠損性も十分ではない。一方、粗大な粒子で構成される被覆層では、粒子の脱落による摩耗は少ないが、クラックが粒界に沿って進展することにより、大きく被覆層が剥離する。このため、その被覆層の剥離を起点とした欠損が生じるので、耐欠損性が劣る。一方、本発明の硬質層は、微細な粒子と粗大な粒子との両方を含むため、微細な粒子の脱落が抑制されるので耐摩耗性が優れ、被覆層の剥離を最小限に抑えることで耐欠損性も優れる。
The hard layer of the present invention comprises hard layer particles having a particle size of 1 to less than 300 nm and hard layer particles having a particle size of 300 to 1000 nm. Under cutting conditions where the coated cutting tool is more heavily loaded than before, the coating layer made up of fine particles rubs between the cutting edge of the coated cutting tool and the work material during cutting, and wear due to falling off of the particles occurs. Resulting in poor wear resistance. Furthermore, since cracks generated on the surface of the coating layer linearly propagate to the base material along the grain boundaries of the particles, the fracture resistance is not sufficient. On the other hand, in the coating layer composed of coarse particles, there is little abrasion due to the falling off of the particles, but the coating layer is largely peeled off as the cracks propagate along the grain boundaries. For this reason, since the defect | deletion starting from peeling of the coating layer arises, defect resistance is inferior. On the other hand, since the hard layer of the present invention includes both fine particles and coarse particles, the fine particles are prevented from falling off, so the wear resistance is excellent and the peeling of the coating layer is minimized. Excellent fracture resistance.
本発明の硬質層の断面組織から粒径を測定したとき、粒径が１～３００ｎｍ未満である硬質層粒子が硬質層の断面組織全体に対して１０～８０面積％で、粒径が３００～１０００ｎｍである硬質層粒子が硬質層の断面組織全体に対して２０～９０面積％で、これらの合計は１００面積％である。粒径が１～３００ｎｍ未満である硬質層粒子が１０面積％未満になり、粒径が３００～１０００ｎｍである硬質層粒子が９０面積％を超えると、耐欠損性が低下し、粒径が１～３００ｎｍ未満である硬質層粒子が８０面積％を超えて、粒径が３００～１０００ｎｍである硬質層粒子が２０面積％未満になると、耐摩耗性および耐欠損性が低下することから、この範囲に定めた。その中でも、粒径が１～３００ｎｍ未満である硬質層粒子が硬質層の断面組織全体に対して２０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が硬質層の断面組織全体に対して２０～８０面積％であると、さらに好ましい。その中でも、粒径が１～３００ｎｍ未満である硬質層粒子が硬質層の断面組織全体に対して３０～７０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が硬質層の断面組織全体に対して３０～７０面積％であると、さらに好ましい。本発明の硬質層は、本発明の被覆層に１層または２層以上含まれる。
When the particle size is measured from the cross-sectional structure of the hard layer of the present invention, the hard layer particles having a particle size of less than 1 to 300 nm are 10 to 80% by area with respect to the entire cross-sectional structure of the hard layer, and the particle size is 300 to 300%. The hard layer particles of 1000 nm are 20 to 90 area% with respect to the entire cross-sectional structure of the hard layer, and the total of these is 100 area%. When the hard layer particles having a particle size of less than 1 to 300 nm are less than 10% by area and the hard layer particles having a particle size of from 300 to 1000 nm are more than 90% by area, the chipping resistance is lowered and the particle size is reduced to 1 If the hard layer particles having a particle size of less than ˜300 nm exceed 80 area% and the hard layer particles having a particle size of 300 to 1000 nm are less than 20 area%, the wear resistance and fracture resistance are lowered. Determined. Among them, the hard layer particles having a particle size of less than 1 to 300 nm are 20 to 80% by area with respect to the entire cross-sectional structure of the hard layer, and the hard layer particles having a particle size of 300 to 1000 nm are the cross-sectional structure of the hard layer. More preferably, it is 20 to 80 area% with respect to the whole. Among them, the hard layer particles having a particle size of less than 1 to 300 nm are 30 to 70 area% with respect to the entire cross-sectional structure of the hard layer, and the hard layer particles having a particle size of 300 to 1000 nm are the cross-sectional structure of the hard layer. More preferably, it is 30 to 70 area% with respect to the whole. The hard layer of the present invention is contained in one or more layers in the coating layer of the present invention.
本発明において、硬質層の粒径は硬質層の断面組織を観察して求められる。具体的には、基材の表面に対して平行な面の硬質層の表面、または上部層と硬質層との界面から内部に向かって、硬質層の凹凸が無くなるまで鏡面研磨し、得られた鏡面研磨面を断面組織とする。硬質層の粒径は、硬質層の表面近傍の断面組織を観察してもよく、硬質層の内部の断面組織を観察してもよい。硬質層を鏡面研磨する方法としては、ダイヤモンドペーストまたはコロイダルシリカを用いて研磨する方法や、イオンミリングなどを挙げることができる。直径１００ｎｍ以上のドロップレットを除いた断面組織を、ＦＥ－ＳＥＭ、ＴＥＭ、電子線後方散乱回折装置（ＥＢＳＤ）などを用いて観察して、硬質層粒子の面積と等しい面積の円の直径をその粒子の粒径とする。硬質層の断面組織から粒径を求めるときに、画像解析ソフトを用いてもよい。なお、硬質層の断面組織において、直径１００ｎｍ以上のドロップレットとドロップレット以外の断面組織とは容易に区別できる。断面組織の鏡面研磨面を観察すると、ドロップレットは円形であり、ドロップレットの周りには厚さ数ｎｍ～数十ｎｍの空隙ができている。また、ドロップレットは鏡面研磨中に硬質層から抜け落ちることがあり、その場合には硬質層に円形の孔が生じる。そのため、硬質層において、直径１００ｎｍ以上のドロップレットとドロップレット以外の断面組織とは容易に区別することができる。
In the present invention, the particle size of the hard layer is determined by observing the cross-sectional structure of the hard layer. Specifically, the surface of the hard layer parallel to the surface of the substrate, or from the interface between the upper layer and the hard layer toward the inside was mirror-polished until the irregularities of the hard layer disappeared. The mirror polished surface is a cross-sectional structure. Regarding the particle size of the hard layer, the cross-sectional structure near the surface of the hard layer may be observed, or the cross-sectional structure inside the hard layer may be observed. Examples of the method of mirror polishing the hard layer include a method of polishing using diamond paste or colloidal silica, ion milling, and the like. The cross-sectional structure excluding droplets with a diameter of 100 nm or more is observed using an FE-SEM, TEM, electron beam backscattering diffractometer (EBSD), etc., and the diameter of a circle having an area equal to the area of the hard layer particles is measured. The particle size is taken as the particle size. When obtaining the particle size from the cross-sectional structure of the hard layer, image analysis software may be used. In the cross-sectional structure of the hard layer, a droplet having a diameter of 100 nm or more can be easily distinguished from a cross-sectional structure other than the droplet. When the mirror-polished surface of the cross-sectional structure is observed, the droplet is circular, and a void having a thickness of several nanometers to several tens of nanometers is formed around the droplet. In addition, the droplet may fall off from the hard layer during mirror polishing, and in this case, a circular hole is formed in the hard layer. Therefore, in the hard layer, a droplet having a diameter of 100 nm or more and a cross-sectional structure other than the droplet can be easily distinguished.
本発明における粒径分布は、１ｎｍ以上１００ｎｍ未満、１００ｎｍ以上２００ｎｍ未満、２００ｎｍ以上３００ｎｍ未満のように、粒径を１００ｎｍ間隔に区分けして、その区分けに含まれる粒子の面積率で、粒径の分布を示したものである。粒径分布の測定装置としては、粒子の粒界が明瞭に観察できるＥＢＳＤが好ましい。ＥＢＳＤの設定としては、ステップサイズが０．０１μｍ、測定範囲が２μｍ×２μｍ、方位差が５°以上の境界を粒界とみなすという設定が好ましい。
In the present invention, the particle size distribution is divided into 100 nm intervals such as 1 nm or more and less than 100 nm, 100 nm or more and less than 200 nm, and 200 nm or more and less than 300 nm. The distribution is shown. As an apparatus for measuring the particle size distribution, EBSD that can clearly observe the grain boundaries of the particles is preferable. The EBSD is preferably set so that a boundary having a step size of 0.01 μm, a measurement range of 2 μm × 2 μm, and an orientation difference of 5 ° or more is regarded as a grain boundary.
本発明における硬質層粒子の粒径分布は、粒径が１～３００ｎｍ未満のところに少なくとも１つのピークがあり、粒径が３００～１０００ｎｍのところに少なくとも１つのピークがあると、耐摩耗性および耐欠損性が向上するので、さらに好ましい。なお、ピークを有するとは、例えば、１ｎｍ以上１００ｎｍ未満、１００ｎｍ以上２００ｎｍ未満、２００ｎｍ以上３００ｎｍ未満のように、粒径を１００ｎｍ間隔に区分けして、２００ｎｍ以上３００ｎｍ未満の面積率が、１ｎｍ以上１００ｎｍ未満や２００ｎｍ以上３００ｎｍ未満の面積率よりも高い面積率であることを挙げることができる。
The particle size distribution of the hard layer particles in the present invention has at least one peak when the particle size is less than 1 to 300 nm, and at least one peak when the particle size is 300 to 1000 nm. It is further preferable because the fracture resistance is improved. Note that having a peak means, for example, that the particle size is divided into 100 nm intervals such as 1 nm or more and less than 100 nm, 100 nm or more and less than 200 nm, and the area ratio of 200 nm or more and less than 300 nm is 1 nm or more and less than 100 nm. Or an area ratio higher than an area ratio of 200 nm or more and less than 300 nm.
本発明の硬質層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とからなる化合物で構成される。本発明の硬質層の粒径に及ぼす組成の影響としては、（ＡｌＴｉ）Ｎまたは（ＡｌＣｒ）ＮのＡｌ含有量を高くすると粒径が微細になりやすい。また、（ＡｌＴｉ）Ｎまたは（ＡｌＣｒ）Ｎに、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、Ｓｉ、ＢおよびＹからなる群より選ばれる少なくとも１種の元素を添加すると粒径が微細になりやすい。その中でも、硬質層が（ＡｌａＭｂＬｃ）Ｘ［但し、ＭはＴｉおよびＣｒの１種または２種を表し、ＬはＷ、ＹおよびＳｉからなる群より選ばれた少なくとも１種の元素を表し、ＸはＣおよびＮの１種または２種の元素を表し、ａはＡｌ元素とＭ元素とＬ元素との合計に対するＡｌ元素の原子比を表し、ｂはＡｌ元素とＭ元素とＬ元素との合計に対するＭ元素の原子比を表し、ｃはＡｌ元素とＭ元素とＬ元素との合計に対するＬ元素の原子比を表し、ａ、ｂ、ｃは、０．２５≦ａ≦０．７５、０．２５≦ｂ≦０．７５、０≦ｃ≦０．２０、ａ＋ｂ＋ｃ＝１を満足する。］と表される組成であると耐摩耗性に優れるので、さらに好ましい。
The hard layer of the present invention comprises at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si and Y, and C, N, B and O. It is comprised with the compound which consists of at least 1 sort (s) of elements chosen from the group which consists of. As the influence of the composition on the particle size of the hard layer of the present invention, if the Al content of (AlTi) N or (AlCr) N is increased, the particle size tends to be fine. Further, at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si, B and Y is added to (AlTi) N or (AlCr) N. When added, the particle size tends to be fine. Among them, the hard layer is (Al a M b L c ) X [wherein M represents one or two of Ti and Cr, and L represents at least one selected from the group consisting of W, Y and Si. X represents one or two elements of C and N, a represents the atomic ratio of Al element to the sum of Al element, M element and L element, and b represents Al element and M element. M represents the atomic ratio of the M element to the total of the L element, c represents the atomic ratio of the L element to the total of the Al element, the M element, and the L element, and a, b, and c are 0.25 ≦ a ≦ 0. .75, 0.25 ≦ b ≦ 0.75, 0 ≦ c ≦ 0.20, and a + b + c = 1. ] Is more preferable because it is excellent in wear resistance.
本発明の硬質層の平均層厚は、０．２μｍ未満であると耐摩耗性が低下する傾向を示し、１５μｍを超えて厚くなると耐欠損性が低下する傾向を示すので、０．２～１５μｍであると、さらに好ましい。
When the average layer thickness of the hard layer of the present invention is less than 0.2 μm, the wear resistance tends to decrease, and when it exceeds 15 μm, the fracture resistance tends to decrease. Is more preferable.
本発明の硬質層を、物理蒸着法によって形成することができる。物理蒸着法として、例えば、アークイオンプレーティング法、イオンプレーティング法、スパッタ法、イオンミキシング法などを挙げることができる。その中でも、アークイオンプレーティング法は、基材と被覆層との密着性が優れるので、さらに好ましい。
The hard layer of the present invention can be formed by physical vapor deposition. Examples of the physical vapor deposition method include an arc ion plating method, an ion plating method, a sputtering method, and an ion mixing method. Among these, the arc ion plating method is more preferable because the adhesion between the base material and the coating layer is excellent.
本発明者らが、硬質層の粒径に及ぼす形成条件の影響について研究したところ、基材の温度を高く、基材バイアス電圧を高く、硬質層の成長速度を大にすると、硬質層の粒径は細かくなることが分かった。この知見を利用すると、本発明の硬質層を得ることができる。例えば、硬質層を形成している間に硬質層の成長速度を大きく変化させると、微細な粒子と粗大な粒子の両方を含む硬質層を得ることができる。硬質層の成長速度を大きく変化させる方法としては、金属蒸発源の蒸発と停止を繰り返す方法が挙げられる。なお、金属蒸発源を蒸発させる時間と蒸発を停止する時間とを調節することで、硬質層粒子の粒径分布を調節することができる。
The present inventors have studied the influence of the forming conditions on the particle size of the hard layer. When the substrate temperature is increased, the substrate bias voltage is increased, and the growth rate of the hard layer is increased, the particles of the hard layer are increased. It was found that the diameter became fine. By utilizing this knowledge, the hard layer of the present invention can be obtained. For example, if the growth rate of the hard layer is greatly changed while the hard layer is formed, a hard layer including both fine particles and coarse particles can be obtained. As a method for greatly changing the growth rate of the hard layer, there is a method of repeatedly evaporating and stopping the metal evaporation source. The particle size distribution of the hard layer particles can be adjusted by adjusting the time for evaporating the metal evaporation source and the time for stopping the evaporation.
本発明の硬質層を製造する方法として、以下の方法を挙げることができる。例えば、アークイオンプレーティング装置の反応容器内に基材を入れ、アークイオンプレーティング装置の反応容器内のヒーターで基材の温度が２００～８００℃になるまで加熱した後、反応容器内を圧力０．５Ｐａ～５．０Ｐａの反応ガス雰囲気とし、基材バイアス電圧を－１０Ｖ～－１５０Ｖとし、硬質層の金属成分に応じた金属蒸発源に対するアーク放電について、０．５～３分間のアーク放電と、０．５～３分間のアーク放電の停止とを交互に繰り返すと、微細な粒子と粗大な粒子との両方を含む本発明の硬質層を形成することができる。なお、アーク放電の時間またはアーク放電の停止の時間のいずれかが、０．５分間よりも短いと硬質相の成長速度の変化が小さいため、微細な粒子と粗大な粒子とを含む硬質層が得られない。一方、アーク放電の時間またはアーク放電の停止の時間のいずれかが、３分間よりも長いと形成時間が長いため、有益でない。
The following method can be mentioned as a method for producing the hard layer of the present invention. For example, a substrate is placed in a reaction vessel of an arc ion plating apparatus, heated with a heater in the reaction vessel of the arc ion plating apparatus until the temperature of the substrate reaches 200 to 800 ° C., and then the pressure in the reaction container is increased. The reaction gas atmosphere is 0.5 Pa to 5.0 Pa, the substrate bias voltage is −10 V to −150 V, and the arc discharge to the metal evaporation source corresponding to the metal component of the hard layer is 0.5 to 3 minutes. When the arc discharge for 0.5 to 3 minutes is alternately repeated, the hard layer of the present invention including both fine particles and coarse particles can be formed. Note that if either the arc discharge time or the arc discharge stop time is shorter than 0.5 minutes, the change in the growth rate of the hard phase is small, so that the hard layer containing fine particles and coarse particles is formed. I can't get it. On the other hand, if either the arc discharge time or the arc discharge stop time is longer than 3 minutes, the formation time is longer, which is not useful.
本発明の被覆切削工具として、具体的には、インサート、ドリル、エンドミル、リーマなどを挙げることができる。
Specific examples of the coated cutting tool of the present invention include an insert, a drill, an end mill, and a reamer.
本発明の被覆切削工具は、耐摩耗性および耐欠損性に優れ、従来よりも工具寿命が長くなるという効果を奏する。
The coated cutting tool of the present invention is excellent in wear resistance and fracture resistance, and has an effect that the tool life is longer than that in the past.
基材として、ＩＳＯ規格ＳＥＫＮ１２０３ＡＧＴＮインサート形状のＰ２０相当の超硬合金を用意した。アークイオンプレーティング装置の反応容器内に、表２に示す硬質層組成となる金属成分の金属蒸発源を配置した。用意した基材を、反応容器内の回転テーブルの固定金具に固定した。その後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。真空引き後、反応容器内のヒーターで、基材の温度が５００℃になるまで加熱した。加熱後、反応容器内の圧力が５．０ＰａになるようにＡｒガスを導入した。圧力５．０ＰａのＡｒガス雰囲気にて、基材に－１０００Ｖの基材バイアス電圧を印加して、反応容器内のタングステンフィラメントに１０Ａの電流を流して、基材の表面に対してＡｒガスによるイオンボンバードメント処理を３０分間行った。イオンボンバードメント処理後、試料番号１～１０、１２～１４については、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、窒素ガスを反応容器内に導入し、反応容器内を圧力３．０Ｐａの窒素ガス雰囲気にした。ヒーターで、表１に示す温度まで基材を加熱した。基材に表１に示す基材バイアス電圧を印加して、金属蒸発源に対して、表１に示すアーク放電と放電停止とを交互に繰り返す間欠放電を行って、所定の層厚になるまで硬質層を形成した。間欠放電のアーク電流と、放電時間と、停止時間とを表１に示した。硬質層を形成した後に、ヒーターの電源を切り、試料温度が１００℃以下になった後で、反応容器内から試料を取り出した。
As a base material, an ISO standard SEKN1203AGTN insert-shaped cemented carbide equivalent to P20 was prepared. A metal evaporation source of a metal component having a hard layer composition shown in Table 2 was placed in the reaction vessel of the arc ion plating apparatus. The prepared base material was fixed to the fixture of the turntable in the reaction vessel. Thereafter, vacuuming was performed until the pressure in the reaction vessel became a vacuum of 5.0 × 10 −3 Pa or less. After evacuation, the substrate was heated with a heater in the reaction vessel until the temperature of the substrate reached 500 ° C. After heating, Ar gas was introduced so that the pressure in the reaction vessel was 5.0 Pa. In a Ar gas atmosphere at a pressure of 5.0 Pa, a substrate bias voltage of −1000 V is applied to the substrate, a current of 10 A is passed through the tungsten filament in the reaction vessel, and Ar gas is applied to the surface of the substrate. Ion bombardment treatment was performed for 30 minutes. After the ion bombardment treatment, the sample numbers 1 to 10 and 12 to 14 were evacuated until the pressure in the reaction vessel became a vacuum of 5.0 × 10 −3 Pa or less. Next, nitrogen gas was introduced into the reaction vessel, and the inside of the reaction vessel was brought to a nitrogen gas atmosphere at a pressure of 3.0 Pa. The substrate was heated to the temperature shown in Table 1 with a heater. The substrate bias voltage shown in Table 1 is applied to the substrate, and intermittent discharge that alternately repeats arc discharge and discharge stop shown in Table 1 is performed on the metal evaporation source until a predetermined layer thickness is reached. A hard layer was formed. Table 1 shows the arc current of intermittent discharge, discharge time, and stop time. After the hard layer was formed, the heater was turned off, and the sample was taken out from the reaction vessel after the sample temperature became 100 ° C. or lower.
発明品の試料番号１１については、イオンボンバードメント処理までを試料番号１～１０、１２～１４と同様に行った。イオンボンバードメント処理後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、Ｎ２ガスとＣＨ４ガスの分圧比がＮ２：ＣＨ４＝１：１となるように混合した混合ガスを反応容器内に導入して、反応容器内を圧力３．０Ｐａの混合ガス雰囲気にした。ヒーターで、表１に示す温度まで基材を加熱した後、基材に表１に示す基材バイアス電圧を印加して、金属蒸発源に対して、表１に示すアーク放電と停止とを交互に繰り返す間欠放電を行って、所定の層厚になるまで硬質層を形成した。間欠放電のアーク電流と、放電時間と、停止時間とを表１に示した。硬質層を形成した後に、ヒーターの電源を切り、試料温度が１００℃以下になった後で、反応容器内から試料を取り出した。
With respect to Sample No. 11 of the invention, the processes up to the ion bombardment treatment were performed in the same manner as Sample Nos. 1 to 10 and 12 to 14. After the ion bombardment treatment, evacuation was performed until the pressure in the reaction vessel became a vacuum of 5.0 × 10 −3 Pa or less. Next, a mixed gas mixed so that the partial pressure ratio of N 2 gas and CH 4 gas is N 2 : CH 4 = 1: 1 is introduced into the reaction vessel, and the reaction vessel is mixed at a pressure of 3.0 Pa. Gas atmosphere. After heating the substrate to the temperature shown in Table 1 with a heater, the substrate bias voltage shown in Table 1 is applied to the substrate, and the arc discharge and stop shown in Table 1 are alternately applied to the metal evaporation source. A hard layer was formed until a predetermined layer thickness was obtained by performing intermittent discharge repeatedly. Table 1 shows the arc current of intermittent discharge, discharge time, and stop time. After the hard layer was formed, the heater was turned off, and the sample was taken out from the reaction vessel after the sample temperature became 100 ° C. or lower.
比較品の試料番号１５～１８については、イオンボンバードメント処理までを試料番号１～１０、１２～１４と同様に行った。イオンボンバードメント処理後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、窒素ガスを反応容器内に導入し、反応容器内を圧力３．０Ｐａの窒素ガス雰囲気にした。ヒーターで、表１に示す温度まで基材を加熱した後、基材に表１に示す基材バイアス電圧を印加して、金属蒸発源に対して、表１に示すアーク電流を流すアーク放電を連続的に行って、所定の層厚になるまで硬質層を形成した。硬質層を形成した後に、ヒーターの電源を切り、試料温度が１００℃以下になった後で、反応容器内から試料を取り出した。
For the comparative sample numbers 15 to 18, the ion bombardment process was performed in the same manner as the sample numbers 1 to 10 and 12 to 14. After the ion bombardment treatment, evacuation was performed until the pressure in the reaction vessel became a vacuum of 5.0 × 10 −3 Pa or less. Next, nitrogen gas was introduced into the reaction vessel, and the inside of the reaction vessel was brought to a nitrogen gas atmosphere at a pressure of 3.0 Pa. After heating the base material to the temperature shown in Table 1 with a heater, the base material bias voltage shown in Table 1 is applied to the base material, and arc discharge that causes the arc current shown in Table 1 to flow to the metal evaporation source is performed. Continuously, a hard layer was formed until a predetermined layer thickness was obtained. After the hard layer was formed, the heater was turned off, and the sample was taken out from the reaction vessel after the sample temperature became 100 ° C. or lower.
得られた試料の層厚について、被覆切削工具の金属蒸発源に対向する面の刃先から当該面の中心部に向かって５０μｍの位置の近傍における断面を、ＳＥＭを用いて３箇所測定し、その平均値を算出して求めた。得られた試料の硬質層の組成を、被覆切削工具の金属蒸発源に対向する面の刃先から当該面の中心部に向かって５０μｍの位置の近傍における断面を、ＥＤＳを用いて測定した。それらの結果を、表２に示した。なお、表２の硬質層の金属成分の組成比は、金属元素全体に対する各金属元素の原子比を示している。
About the layer thickness of the obtained sample, the cross section in the vicinity of the position of 50 μm from the cutting edge of the surface facing the metal evaporation source of the coated cutting tool toward the center of the surface is measured at three locations using SEM, The average value was calculated. With respect to the composition of the hard layer of the obtained sample, a cross section in the vicinity of a position of 50 μm from the cutting edge of the surface facing the metal evaporation source of the coated cutting tool toward the center of the surface was measured using EDS. The results are shown in Table 2. In addition, the composition ratio of the metal component of the hard layer in Table 2 indicates the atomic ratio of each metal element with respect to the entire metal element.
得られた試料について、ダイヤモンドペーストとコロイダルシリカとを用いて、硬質層の凹凸がなくなるまで鏡面研磨した。鏡面研磨して得られた硬質層の断面組織から直径１００ｎｍ以上のドロップレットを除いた組織を、ＥＢＳＤを用いて観察して、硬質層粒子の面積と等しい面積の円の直径をその粒子の粒径とした。ＥＢＳＤの設定としては、ステップサイズが０．０１μｍ、測定範囲が２μｍ×２μｍ、方位差が５°以上の境界を粒界とみなすという設定にした。硬質層の断面組織の粒径分布を、表３に示した。なお、表３の粒径分布は、硬質層粒子の粒径を１ｎｍ以上１００ｎｍ未満、１００ｎｍ以上２００ｎｍ未満、２００ｎｍ以上３００ｎｍ未満のように１００ｎｍ間隔で区分けし、その区分だけに含まれる硬質層粒子の面積率を示したものである。また、表３には、粒径が１以上３００ｎｍ未満の面積率と粒径が３００ｎｍ以上の面積率も併記した。
The obtained sample was mirror-polished using diamond paste and colloidal silica until the hard layer had no irregularities. A structure obtained by removing droplets having a diameter of 100 nm or more from the cross-sectional structure of the hard layer obtained by mirror polishing is observed using EBSD, and the diameter of a circle having an area equal to the area of the hard layer particle is determined by the grain size of the particle. The diameter. The EBSD was set such that a boundary having a step size of 0.01 μm, a measurement range of 2 μm × 2 μm, and an orientation difference of 5 ° or more was regarded as a grain boundary. Table 3 shows the particle size distribution of the cross-sectional structure of the hard layer. The particle size distribution shown in Table 3 is divided into 100 nm intervals such as 1 nm or more and less than 100 nm, 100 nm or more and less than 200 nm, and 200 nm or more and less than 300 nm. The area ratio is shown. Table 3 also shows the area ratio of the particle size of 1 to less than 300 nm and the area ratio of the particle size of 300 nm or more.
図４に試料番号３の粒径分布を図示した。図４から、試料番号３の粒径分布は２つのピークを持つことが分かる。発明品の粒径分布について、粒径１～３００ｎｍ未満と粒径３００ｎｍ以上とにそれぞれにピークがあるかどうか調べたところ、発明品の試料番号１の粒径分布では、粒径２００ｎｍ以上３００ｎｍ未満に１つのピークと、粒径４００ｎｍ以上５００ｎｍ未満にもう１つのピークとを持つ。発明品の試料番号２～４、７～９の粒径分布では、粒径１００ｎｍ以上２００ｎｍ未満に１つのピークと、粒径５００ｎｍ以上６００ｎｍ未満にもう１つのピークとを持つ。発明品の試料番号５、６の粒径分布では、粒径２００ｎｍ以上３００ｎｍ未満に１つのピークと、粒径５００ｎｍ以上６００ｎｍ未満にもう１つのピークとを持つ。
FIG. 4 shows the particle size distribution of Sample No. 3. FIG. 4 shows that the particle size distribution of sample number 3 has two peaks. Regarding the particle size distribution of the inventive product, whether or not there is a peak in each of the particle size of 1 to less than 300 nm and the particle size of 300 nm or more was examined. One peak and another peak at a particle size of 400 nm or more and less than 500 nm. In the particle size distribution of Sample Nos. 2 to 4 and 7 to 9 of the invention product, there is one peak at a particle size of 100 nm or more and less than 200 nm, and another peak at a particle size of 500 nm or more and less than 600 nm. In the particle size distribution of Sample Nos. 5 and 6 of the invention product, there is one peak at a particle size of 200 nm or more and less than 300 nm, and another peak at a particle size of 500 nm or more and less than 600 nm.
得られた試料を用いて、以下の試験条件１、２で正面フライス加工を行い、耐摩耗性と耐欠損性とを評価した。
Using the obtained sample, face milling was performed under the following test conditions 1 and 2, and the wear resistance and fracture resistance were evaluated.
［試験条件１］
被削材：Ｓ４５Ｃ、
被削材形状：５０ｍｍ×２００ｍｍ×１５０ｍｍの直方体（但し、１０５ｍｍ×２００ｍｍの面に正面フライス加工を行う。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．１ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：５０ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１００ｍｍ、
評価項目：試料の最大逃げ面摩耗幅が０．２ｍｍに至ったときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 1]
Work material: S45C,
Work material shape: a rectangular parallelepiped of 50 mm × 200 mm × 150 mm (however, face milling is performed on a surface of 105 mm × 200 mm),
Cutting speed: 250 m / min,
Feed: 0.1 mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 50 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ100mm,
Evaluation item: When the maximum flank wear width of the sample reached 0.2 mm, the tool life was determined, and the machining length until the tool life was measured.
被削材：Ｓ４５Ｃ、
被削材形状：５０ｍｍ×２００ｍｍ×１５０ｍｍの直方体（但し、１０５ｍｍ×２００ｍｍの面に正面フライス加工を行う。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．１ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：５０ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１００ｍｍ、
評価項目：試料の最大逃げ面摩耗幅が０．２ｍｍに至ったときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 1]
Work material: S45C,
Work material shape: a rectangular parallelepiped of 50 mm × 200 mm × 150 mm (however, face milling is performed on a surface of 105 mm × 200 mm),
Cutting speed: 250 m / min,
Feed: 0.1 mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 50 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ100mm,
Evaluation item: When the maximum flank wear width of the sample reached 0.2 mm, the tool life was determined, and the machining length until the tool life was measured.
［試験条件２］
被削材：Ｓ４５Ｃ、
被削材形状：１０５ｍｍ×２００ｍｍ×６０ｍｍの直方体（但し、正面フライス加工を行う直方体の１０５ｍｍ×２００ｍｍの面に直径φ３０ｍｍの穴が６箇所明けられている。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．４ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：１０５ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１２５ｍｍ、
評価項目：試料が欠損したときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 2]
Work material: S45C,
Workpiece shape: 105 mm × 200 mm × 60 mm rectangular parallelepiped (however, six holes with a diameter of 30 mm are drilled in the 105 mm × 200 mm surface of the rectangular parallelepiped to be face milled).
Cutting speed: 250 m / min,
Feed: 0.4mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 105 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ125mm,
Evaluation item: The tool life was measured when the sample was broken, and the machining length up to the tool life was measured.
被削材：Ｓ４５Ｃ、
被削材形状：１０５ｍｍ×２００ｍｍ×６０ｍｍの直方体（但し、正面フライス加工を行う直方体の１０５ｍｍ×２００ｍｍの面に直径φ３０ｍｍの穴が６箇所明けられている。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．４ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：１０５ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１２５ｍｍ、
評価項目：試料が欠損したときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 2]
Work material: S45C,
Workpiece shape: 105 mm × 200 mm × 60 mm rectangular parallelepiped (however, six holes with a diameter of 30 mm are drilled in the 105 mm × 200 mm surface of the rectangular parallelepiped to be face milled).
Cutting speed: 250 m / min,
Feed: 0.4mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 105 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ125mm,
Evaluation item: The tool life was measured when the sample was broken, and the machining length up to the tool life was measured.
試験条件１、２における工具寿命までの加工長を表４に示した。なお、試験条件１、２において、加工長が０．０ｍ以上５．０ｍ未満をＣ、５．０ｍ以上１０．０ｍ未満をＢ、１０．０ｍ以上をＡとして評価した。さらに、試験条件１、２の評価において、ＡとＡの場合はＡＡ、ＡとＢの場合はＡＢ、ＢとＢの場合はＢＢ、ＢとＣの場合はＢＣ、ＣとＣの場合はＣＣとする総合評価を行った。この総合評価では、（優）ＡＡ＞ＡＢ＞ＢＢ＞ＢＣ＞ＣＣ（劣）という順位になる。
Table 4 shows the machining lengths up to the tool life under test conditions 1 and 2. In the test conditions 1 and 2, the machining length was evaluated as C when the processing length was 0.0 m or more and less than 5.0 m, B as 5.0 m or more and less than 10.0 m, and A as 10.0 m or more. Further, in the evaluation of test conditions 1 and 2, A and A are AA, A and B are AB, B and B are BB, B and C are BC, and C and C are CC. A comprehensive evaluation was performed. In this comprehensive evaluation, the order is (excellent) AA> AB> BB> BC> CC (inferior).
表４に示されるように、発明品の試料番号１～１４は、主に耐摩耗性を評価する試験条件１でＢ以上であり、主に耐欠損性を評価する試験条件２でＢ以上であった。発明品の試料番号１～１４の総合評価はＢＢ以上であり、比較品の試料番号１５～１８と比較して、耐摩耗性および耐欠損性の両方が優れることが分かる。
As shown in Table 4, samples Nos. 1 to 14 of the invention are B or higher mainly under test condition 1 for evaluating wear resistance, and B or higher mainly under test condition 2 for evaluating fracture resistance. there were. The overall evaluation of samples Nos. 1 to 14 of the invention is BB or higher, and it can be seen that both wear resistance and fracture resistance are superior to those of samples Nos. 15 to 18 of comparative products.
基材として、ＩＳＯ規格ＳＥＫＮ１２０３ＡＧＴＮインサート形状のＰ２０相当の超硬合金を用意した。アークイオンプレーティング装置の反応容器内に、表６に示す各層の組成となる金属成分の金属蒸発源を配置した。用意した基材を、反応容器内の回転テーブルの固定金具に固定した。その後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。真空引き後、反応容器内のヒーターで、基材の温度が５００℃になるまで加熱した。加熱後、反応容器内の圧力が５．０ＰａになるようにＡｒガスを導入した。圧力５．０ＰａのＡｒガス雰囲気にて、基材に－１０００Ｖの基材バイアス電圧を印加し、反応容器内のタングステンフィラメントに１０Ａの電流を流して、基材の表面に対してＡｒガスによるイオンボンバードメント処理を３０分間行った。
As a base material, an ISO standard SEKN1203AGTN insert-shaped cemented carbide equivalent to P20 was prepared. A metal evaporation source of a metal component having the composition of each layer shown in Table 6 was placed in the reaction vessel of the arc ion plating apparatus. The prepared base material was fixed to the fixture of the turntable in the reaction vessel. Thereafter, vacuuming was performed until the pressure in the reaction vessel became a vacuum of 5.0 × 10 −3 Pa or less. After evacuation, the substrate was heated with a heater in the reaction vessel until the temperature of the substrate reached 500 ° C. After heating, Ar gas was introduced so that the pressure in the reaction vessel was 5.0 Pa. In a Ar gas atmosphere at a pressure of 5.0 Pa, a base material bias voltage of −1000 V is applied to the base material, a current of 10 A is applied to the tungsten filament in the reaction vessel, and ions of Ar gas are applied to the surface of the base material. Bombardment treatment was performed for 30 minutes.
イオンボンバードメント処理後、試料番号１９、２１、２３、２５、２６、２７、３０、３２、３４については、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、窒素ガスを反応容器内に導入し、反応容器内を圧力３．０Ｐａの窒素ガス雰囲気にした。ヒーターで７００℃まで基材を加熱した後、基材に－５０Ｖの基材バイアス電圧を印加し、金属蒸発源に対してアーク電流１５０Ａのアーク放電を行って、所定の層厚になるまで下部層を形成した。
After the ion bombardment treatment, the sample numbers 19, 21, 23, 25, 26, 27, 30, 32, and 34 are evacuated until the pressure in the reaction vessel becomes a vacuum of 5.0 × 10 −3 Pa or less. did. Next, nitrogen gas was introduced into the reaction vessel, and the inside of the reaction vessel was brought to a nitrogen gas atmosphere at a pressure of 3.0 Pa. After heating the substrate to 700 ° C with a heater, a substrate bias voltage of -50V is applied to the substrate, and arc discharge with an arc current of 150A is performed on the metal evaporation source, and the lower part until a predetermined layer thickness is reached. A layer was formed.
試料番号１９、２１、２３、２５については、下部層を形成した後、試料番号２０、２２、２４については、基材の表面をイオンボンバードメント処理した後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、窒素ガスを反応容器内に導入し、反応容器内を圧力３．０Ｐａの窒素ガス雰囲気にした。ヒーターで、表１に示す温度まで基材を加熱した。基材に表５に示す基材バイアス電圧を印加して、金属蒸発源に対して、表５に示すアーク放電と停止とを交互に繰り返す間欠放電を行って、所定の層厚になるまで硬質層を形成した。間欠放電のアーク電流と放電時間と停止時間を表５に示した。
For sample numbers 19, 21, 23, and 25, after forming the lower layer, for sample numbers 20, 22, and 24, the surface of the substrate was subjected to ion bombardment treatment, and then the pressure in the reaction vessel was 5.0. Vacuum was drawn until a vacuum of × 10 −3 Pa or less was reached. Next, nitrogen gas was introduced into the reaction vessel, and the inside of the reaction vessel was brought to a nitrogen gas atmosphere with a pressure of 3.0 Pa. The substrate was heated to the temperature shown in Table 1 with a heater. A base material bias voltage shown in Table 5 is applied to the base material, and the metal evaporation source is subjected to intermittent discharge that alternately repeats arc discharge and stop shown in Table 5 until it reaches a predetermined layer thickness. A layer was formed. Table 5 shows the arc current, discharge time, and stop time of intermittent discharge.
比較品の試料番号２６、２７、３０、３２、３４については、下部層を形成した後、比較品の試料番号２８、２９、３１、３３については、基材の表面をイオンボンバードメント処理した後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、窒素ガスを反応容器内に導入し、反応容器内を圧力３．０Ｐａの窒素ガス雰囲気にした。ヒーターで表５に示す温度まで基材を加熱した後、基材に表５に示す基材バイアス電圧を印加し、金属蒸発源に対して、表５に示すアーク電流を流すアーク放電を連続的に行って、所定の層厚になるまで硬質層を形成した。
For comparative sample numbers 26, 27, 30, 32, and 34, after forming the lower layer, for comparative sample numbers 28, 29, 31, and 33, the surface of the substrate was subjected to ion bombardment treatment. Then, evacuation was performed until the pressure in the reaction vessel became a vacuum of 5.0 × 10 −3 Pa or less. Next, nitrogen gas was introduced into the reaction vessel, and the inside of the reaction vessel was brought to a nitrogen gas atmosphere at a pressure of 3.0 Pa. After heating the base material to the temperature shown in Table 5 with a heater, the base material bias voltage shown in Table 5 is applied to the base material, and the arc discharge that causes the arc current shown in Table 5 to flow is continuously applied to the metal evaporation source. Then, a hard layer was formed until a predetermined layer thickness was obtained.
試料番号２０、２２、２４，２５、２８、２９、３１、３３、３４については、硬質層を形成した後、反応容器内の圧力が５．０×１０－３Ｐａ以下の真空になるまで真空引きした。次に、窒素ガスを反応容器内に導入し、反応容器内を圧力３．０Ｐａの窒素ガス雰囲気にした。ヒーターで７００℃まで基材を加熱した後、基材に－５０Ｖの基材バイアス電圧を印加して、金属蒸発源に対して、アーク電流１５０Ａのアーク放電を行って、所定の層厚になるまで上部層を形成した。被覆層の各層を形成した後に、ヒーターの電源を切り、試料温度が１００℃以下になった後で、反応容器内から試料を取り出した。
For sample numbers 20, 22, 24, 25, 28, 29, 31, 33, and 34, after forming a hard layer, vacuum until the pressure in the reaction vessel reaches 5.0 × 10 −3 Pa or less. Pulled. Next, nitrogen gas was introduced into the reaction vessel, and the inside of the reaction vessel was brought to a nitrogen gas atmosphere at a pressure of 3.0 Pa. After heating the substrate to 700 ° C. with a heater, a substrate bias voltage of −50 V is applied to the substrate, and arc discharge with an arc current of 150 A is performed on the metal evaporation source, resulting in a predetermined layer thickness Up to the top layer was formed. After each layer of the coating layer was formed, the heater was turned off and the sample was taken out from the reaction vessel after the sample temperature became 100 ° C. or lower.
得られた試料の各層の層厚について、被覆切削工具の金属蒸発源に対向する面の刃先から当該面の中心部に向かって５０μｍの位置の近傍における断面を、ＳＥＭを用いて３箇所測定し、その平均値を算出して求めた。得られた試料の各層の組成を、被覆切削工具の金属蒸発源に対向する面の刃先から当該面の中心部に向かって５０μｍの位置の近傍における断面を、ＥＤＳを用いて測定した。それらの結果を、表６に示した。なお、表６の各層の金属成分の組成比は、金属元素全体に対する各金属元素の原子比を示している。
About the layer thickness of each layer of the obtained sample, the cross section in the vicinity of the position of 50 μm from the cutting edge of the surface facing the metal evaporation source of the coated cutting tool toward the center of the surface is measured at three locations using SEM. The average value was calculated. The composition of each layer of the obtained sample was measured using an EDS for a cross section in the vicinity of a position of 50 μm from the cutting edge of the surface facing the metal evaporation source of the coated cutting tool toward the center of the surface. The results are shown in Table 6. In addition, the composition ratio of the metal component of each layer in Table 6 indicates the atomic ratio of each metal element to the entire metal element.
得られた試料について、ダイヤモンドペーストとコロイダルシリカとを用いて、硬質層の表面、または上部層と硬質層との界面から内部に向かって、硬質相の凹凸がなくなるまで鏡面研磨した。鏡面研磨して得られた硬質層の断面組織から直径１００ｎｍ以上のドロップレットを除いた組織を、ＥＢＳＤを用いて観察して、硬質層粒子の面積と等しい面積の円の直径をその粒子の粒径とした。ＥＢＳＤの設定としては、ステップサイズが０．０１μｍ、測定範囲が２μｍ×２μｍ、方位差が５°以上の境界を粒界とみなすという設定にした。硬質層の断面組織の粒径分布を、表７に示した。また、表７には、粒径が１以上３００ｎｍ未満の面積率と粒径が３００ｎｍ以上の面積率も併記した。
The obtained sample was mirror-polished using diamond paste and colloidal silica until the hard phase irregularities disappeared from the surface of the hard layer or from the interface between the upper layer and the hard layer to the inside. A structure obtained by removing droplets having a diameter of 100 nm or more from the cross-sectional structure of the hard layer obtained by mirror polishing is observed using EBSD, and the diameter of a circle having an area equal to the area of the hard layer particle is determined by the grain size of the particle. The diameter. The EBSD was set such that a boundary having a step size of 0.01 μm, a measurement range of 2 μm × 2 μm, and an orientation difference of 5 ° or more was regarded as a grain boundary. Table 7 shows the particle size distribution of the cross-sectional structure of the hard layer. Table 7 also shows the area ratio of the particle size of 1 to less than 300 nm and the area ratio of the particle size of 300 nm or more.
発明品の粒径分布について、粒径１～３００ｎｍ未満と粒径３００ｎｍ以上とにそれぞれにピークがあるかどうか調べたところ、発明品の試料番号１９～２２、２４、２５の粒径分布は、粒径１００ｎｍ以上２００ｎｍ未満に１つのピークと、粒径５００ｎｍ以上６００ｎｍ未満にもう１つのピークとを持つ。発明品の試料番号２３の粒径分布は、粒径１００ｎｍ以上２００ｎｍ未満に１つのピークと、粒径４００ｎｍ以上５００ｎｍ未満にもう１つのピークとを持つ。
Regarding the particle size distribution of the inventive product, whether or not there is a peak in each of the particle size of 1 to less than 300 nm and the particle size of 300 nm or more, the particle size distribution of the sample numbers 19 to 22, 24, and 25 of the invention product is There is one peak at a particle size of 100 nm or more and less than 200 nm, and another peak at a particle size of 500 nm or more and less than 600 nm. The particle size distribution of Sample No. 23 of the invention product has one peak at a particle size of 100 nm or more and less than 200 nm, and another peak at a particle size of 400 nm or more and less than 500 nm.
得られた試料を用いて、以下の試験条件３、４で正面フライス加工を行い、耐摩耗性と耐欠損性とを評価した。
Using the obtained sample, face milling was performed under the following test conditions 3 and 4 to evaluate wear resistance and fracture resistance.
［試験条件３］
被削材：ＳＣＭ４４０、
被削材形状：５０ｍｍ×２００ｍｍ×１５０ｍｍの直方体（但し、１０５ｍｍ×２００ｍｍの面に正面フライス加工を行う。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．１ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：５０ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１００ｍｍ、
評価項目：試料の最大逃げ面摩耗幅が０．２ｍｍに至ったときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 3]
Work material: SCM440,
Work material shape: a rectangular parallelepiped of 50 mm × 200 mm × 150 mm (however, face milling is performed on a surface of 105 mm × 200 mm),
Cutting speed: 250 m / min,
Feed: 0.1 mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 50 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ100mm,
Evaluation item: When the maximum flank wear width of the sample reached 0.2 mm, the tool life was determined, and the machining length until the tool life was measured.
被削材：ＳＣＭ４４０、
被削材形状：５０ｍｍ×２００ｍｍ×１５０ｍｍの直方体（但し、１０５ｍｍ×２００ｍｍの面に正面フライス加工を行う。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．１ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：５０ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１００ｍｍ、
評価項目：試料の最大逃げ面摩耗幅が０．２ｍｍに至ったときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 3]
Work material: SCM440,
Work material shape: a rectangular parallelepiped of 50 mm × 200 mm × 150 mm (however, face milling is performed on a surface of 105 mm × 200 mm),
Cutting speed: 250 m / min,
Feed: 0.1 mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 50 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ100mm,
Evaluation item: When the maximum flank wear width of the sample reached 0.2 mm, the tool life was determined, and the machining length until the tool life was measured.
［試験条件４］
被削材：ＳＣＭ４４０、
被削材形状：１０５ｍｍ×２００ｍｍ×６０ｍｍの直方体（但し、正面フライス加工を行う直方体の１０５ｍｍ×２００ｍｍの面に直径φ３０ｍｍの穴が６箇所明けられている。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．４ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：１０５ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１２５ｍｍ、
評価項目：試料が欠損したときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 4]
Work material: SCM440,
Workpiece shape: 105 mm × 200 mm × 60 mm rectangular parallelepiped (however, six holes with a diameter of 30 mm are drilled in the 105 mm × 200 mm surface of the rectangular parallelepiped to be face milled).
Cutting speed: 250 m / min,
Feed: 0.4mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 105 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ125mm,
Evaluation item: The tool life was measured when the sample was broken, and the machining length up to the tool life was measured.
被削材：ＳＣＭ４４０、
被削材形状：１０５ｍｍ×２００ｍｍ×６０ｍｍの直方体（但し、正面フライス加工を行う直方体の１０５ｍｍ×２００ｍｍの面に直径φ３０ｍｍの穴が６箇所明けられている。）、
切削速度：２５０ｍ／ｍｉｎ、
送り：０．４ｍｍ／ｔｏｏｔｈ、
切り込み：２．０ｍｍ、
切削幅：１０５ｍｍ、
クーラント：不使用（ドライ加工）、
カッター有効径:φ１２５ｍｍ、
評価項目：試料が欠損したときを工具寿命とし、工具寿命までの加工長を測定した。 [Test condition 4]
Work material: SCM440,
Workpiece shape: 105 mm × 200 mm × 60 mm rectangular parallelepiped (however, six holes with a diameter of 30 mm are drilled in the 105 mm × 200 mm surface of the rectangular parallelepiped to be face milled).
Cutting speed: 250 m / min,
Feed: 0.4mm / tooth,
Cutting depth: 2.0 mm
Cutting width: 105 mm
Coolant: Not used (dry processing)
Effective cutter diameter: φ125mm,
Evaluation item: The tool life was measured when the sample was broken, and the machining length up to the tool life was measured.
試験条件３、４における工具寿命までの加工長を、表８に示した。なお、試験条件３、４において、加工長が０．０ｍ以上５．０ｍ未満をＣ、５．０ｍ以上１０．０ｍ未満をＢ、１０．０ｍ以上をＡとして評価した。さらに、試験条件３、４の評価において、ＡとＡの場合はＡＡ、ＡとＢの場合はＡＢ、ＢとＢの場合はＢＢ、ＢとＣの場合はＢＣ、ＣとＣの場合はＣＣとする総合評価を行った。この総合評価では、（優）ＡＡ＞ＡＢ＞ＢＢ＞ＢＣ＞ＣＣ（劣）という順位になる。
Table 8 shows the machining lengths up to the tool life under test conditions 3 and 4. In test conditions 3 and 4, the machining length was evaluated as C when the processing length was 0.0 m or more and less than 5.0 m, B as 5.0 m or more and less than 10.0 m, and A as 10.0 m or more. Further, in the evaluation of test conditions 3 and 4, A and A are AA, A and B are AB, B and B are BB, B and C are BC, and C and C are CC. A comprehensive evaluation was performed. In this comprehensive evaluation, the order is (excellent) AA> AB> BB> BC> CC (inferior).
表８に示されるように、発明品の試料番号１９～２５は、主に耐摩耗性を評価する試験条件３でＡ以上であり、主に耐欠損性を評価する試験条件４でＡ以上であった。発明品の試料番号１９～２５の総合評価はＡＡ以上であり、比較品の試料番号２６～３４と比較して、耐摩耗性および耐欠損性の両方が優れることが分かる。
As shown in Table 8, samples Nos. 19 to 25 of the invention products are A or more mainly under test condition 3 for evaluating wear resistance, and A or more under test condition 4 for mainly evaluating fracture resistance. there were. The overall evaluation of the inventive sample numbers 19 to 25 is AA or higher, and it can be seen that both the wear resistance and the fracture resistance are superior to the comparative sample numbers 26 to 34.
Claims (8)
- 基材と該基材の表面に形成した被覆層とを備え、前記被覆層の少なくとも１層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる硬質層であり、前記硬質層における前記基材の表面に対して平行な面の断面組織の粒径を測定したとき、粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して１０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して２０～９０面積％であり、これらの合計は１００面積％である被覆切削工具。 A substrate and a coating layer formed on the surface of the substrate, wherein at least one of the coating layers is made of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si and Y A hard layer comprising a compound composed of at least one element selected from the group consisting of and at least one element selected from the group consisting of C, N, B and O, and the base material in the hard layer When the particle size of the cross-sectional structure of the plane parallel to the surface of the hard layer particles is 10 to 80 area% of the hard layer particles having a particle size of less than 1 to 300 nm with respect to the entire cross-sectional structure of the hard layer, A coated cutting tool in which hard layer particles having a particle size of 300 to 1000 nm are 20 to 90 area% with respect to the entire cross-sectional structure of the hard layer, and the total of these is 100 area%.
- 粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して２０～８０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して２０～８０面積％であり、これらの合計は１００面積％である請求項１に記載の被覆切削工具。 Hard layer particles having a particle size of less than 1 to 300 nm are 20 to 80% by area based on the entire cross-sectional structure of the hard layer, and hard layer particles having a particle size of 300 to 1000 nm are the entire cross-sectional structure of the hard layer. The coated cutting tool according to claim 1, wherein the amount is 20 to 80 area%, and the total of these is 100 area%.
- 粒径が１～３００ｎｍ未満である硬質層粒子が前記硬質層の断面組織全体に対して３０～７０面積％であり、粒径が３００～１０００ｎｍである硬質層粒子が前記硬質層の断面組織全体に対して３０～７０面積％であり、これらの合計は１００面積％である請求項１または２に記載の被覆切削工具。 Hard layer particles having a particle size of less than 1 to 300 nm are 30 to 70% by area based on the entire cross-sectional structure of the hard layer, and hard layer particles having a particle size of 300 to 1000 nm are the entire cross-sectional structure of the hard layer. The coated cutting tool according to claim 1 or 2, wherein 30 to 70 area% of the total is 100 area%.
- 硬質層粒子の粒径分布は粒径１～３００ｎｍ未満に少なくとも１つのピークを持ち、硬質層粒子の粒径分布は粒径３００～１０００ｎｍに少なくとも１つのピークを持つ請求項１～３のいずれか１項に記載の被覆切削工具。 4. The particle size distribution of the hard layer particles has at least one peak at a particle size of less than 1 to 300 nm, and the particle size distribution of the hard layer particles has at least one peak at a particle size of from 300 to 1000 nm. The coated cutting tool according to Item 1.
- 前記硬質層の平均層厚は０．２～１５μｍである請求項１～４のいずれか１項に記載の被覆切削工具。 The coated cutting tool according to any one of claims 1 to 4, wherein an average layer thickness of the hard layer is 0.2 to 15 µm.
- 前記硬質層が（ＡｌａＭｂＬｃ）Ｘ［但し、ＭはＴｉおよびＣｒの１種または２種を表し、ＬはＷ、ＹおよびＳｉからなる群より選ばれた少なくとも１種の元素を表し、ＸはＣおよびＮの１種または２種の元素を表し、ａはＡｌ元素とＭ元素とＬ元素との合計に対するＡｌ元素の原子比を表し、ｂはＡｌ元素とＭ元素とＬ元素との合計に対するＭ元素の原子比を表し、ｃはＡｌ元素とＭ元素とＬ元素との合計に対するＬ元素の原子比を表し、ａ、ｂ、ｃは、０．２５≦ａ≦０．７５、０．２５≦ｂ≦０．７５、０≦ｃ≦０．２０、ａ＋ｂ＋ｃ＝１を満足する。］と表される組成である請求項１～５のいずれか１項に記載の被覆切削工具。 The hard layer is (Al a M b L c ) X [wherein M represents one or two of Ti and Cr, and L represents at least one element selected from the group consisting of W, Y and Si. X represents one or two elements of C and N, a represents the atomic ratio of Al element to the sum of Al element, M element and L element, and b represents Al element, M element and L element Represents the atomic ratio of the M element to the sum of the elements, c represents the atomic ratio of the L element to the sum of the Al element, the M element, and the L element, and a, b, and c are 0.25 ≦ a ≦ 0.75. 0.25 ≦ b ≦ 0.75, 0 ≦ c ≦ 0.20, and a + b + c = 1. The coated cutting tool according to any one of claims 1 to 5, which has a composition represented by the formula:
- 前記被覆層の少なくとも１層は、前記基材と前記硬質層との間に形成された下部層であり、前記下部層は、Ｔｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる単層または多層の請求項１～６のいずれか１項に記載の被覆切削工具。 At least one of the coating layers is a lower layer formed between the base material and the hard layer, and the lower layer includes Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W A single layer or a multilayer composed of a compound composed of at least one element selected from the group consisting of Al, Si and Y and at least one element selected from the group consisting of C, N, B and O The coated cutting tool according to any one of claims 1 to 6.
- 前記被覆層の少なくとも１層は、前記硬質層の表面に形成された上部層であり、前記上部層はＴｉ、Ｚｒ、Ｈｆ、Ｖ、Ｎｂ、Ｔａ、Ｃｒ、Ｍｏ、Ｗ、Ａｌ、ＳｉおよびＹからなる群より選ばれる少なくとも１種の元素と、Ｃ、Ｎ、ＢおよびＯからなる群より選ばれる少なくとも１種の元素とで構成された化合物からなる単層または多層の請求項１～７のいずれか１項に記載の被覆切削工具。 At least one of the coating layers is an upper layer formed on the surface of the hard layer, and the upper layer is Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Si, and Y. The single-layer or multilayer-layer comprising a compound composed of at least one element selected from the group consisting of and at least one element selected from the group consisting of C, N, B and O. The coated cutting tool of any one of Claims.
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| JP2012166295A (en) * | 2011-02-14 | 2012-09-06 | Mitsubishi Materials Corp | Surface coated drill excellent in wear resistance, and chip discharging characteristic |
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| JP2011224767A (en) * | 2010-03-29 | 2011-11-10 | Mitsubishi Materials Corp | Surface-coated cutting tool having hard coating layer showing excellent chipping resistance |
| JP2011224716A (en) * | 2010-04-20 | 2011-11-10 | Mitsubishi Materials Corp | Surface-coated cutting tool with hard coating layer for exhibiting excellent abrasion resistance |
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| JP6004366B1 (en) * | 2015-04-27 | 2016-10-05 | 株式会社タンガロイ | Coated cutting tool |
| WO2016175166A1 (en) * | 2015-04-27 | 2016-11-03 | 株式会社タンガロイ | Coated cutting tool |
| CN107530786A (en) * | 2015-04-27 | 2018-01-02 | 株式会社泰珂洛 | Coated cutting tool |
| CN107530786B (en) * | 2015-04-27 | 2020-05-05 | 株式会社泰珂洛 | Coated cutting tool |
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