WO2014142151A1 - Composite sheet for protective film formation, method for producing composite sheet for protective film formation, and method for producing chip with protective film - Google Patents

Composite sheet for protective film formation, method for producing composite sheet for protective film formation, and method for producing chip with protective film Download PDF

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Publication number
WO2014142151A1
WO2014142151A1 PCT/JP2014/056436 JP2014056436W WO2014142151A1 WO 2014142151 A1 WO2014142151 A1 WO 2014142151A1 JP 2014056436 W JP2014056436 W JP 2014056436W WO 2014142151 A1 WO2014142151 A1 WO 2014142151A1
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Prior art keywords
protective film
adhesive layer
pressure
sensitive adhesive
film
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PCT/JP2014/056436
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French (fr)
Japanese (ja)
Inventor
高野 健
章生 加太
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リンテック株式会社
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Priority to JP2015505503A priority Critical patent/JP6262717B2/en
Publication of WO2014142151A1 publication Critical patent/WO2014142151A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/16Layered products comprising a layer of synthetic resin specially treated, e.g. irradiated
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/30Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38Pressure-sensitive adhesives [PSA]
    • C09J7/381Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385Acrylic polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/14Semiconductor wafers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/20Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself
    • C09J2301/208Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive itself the adhesive layer being constituted by at least two or more adjacent or superposed adhesive layers, e.g. multilayer adhesive

Definitions

  • the present invention relates to a composite sheet for forming a protective film, which can form a protective film on a semiconductor wafer or semiconductor chip and can improve the manufacturing efficiency of the semiconductor chip.
  • the present invention relates to a composite sheet for forming a protective film used for manufacturing a semiconductor chip mounted by a so-called face-down method.
  • chip a semiconductor chip having electrodes such as bumps on a circuit surface
  • the electrodes are bonded to a substrate.
  • the surface (chip back surface) opposite to the circuit surface of the chip may be exposed.
  • the exposed chip back surface may be protected by an organic film.
  • a chip having a protective film made of an organic film is obtained by applying a liquid resin to the back surface of a wafer by spin coating, drying and curing, and cutting the protective film together with the wafer.
  • the thickness accuracy of the protective film formed in this way is not sufficient, the product yield may be lowered.
  • Patent Document 1 a dicing tape-integrated film for semiconductor back surface in which a film for semiconductor back surface is laminated on a dicing tape is disclosed.
  • the dicing tape that supports the film for semiconductor back surface is required to have a good holding force against a jig such as a ring frame and a good releasability at the time of pickup.
  • the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer of the dicing tape is made to have a low pressure-sensitive adhesive property.
  • the pressure-sensitive adhesive has low adhesiveness, there is a concern that good holding power for the ring frame is lost.
  • an additional adhesive layer is provided between the film for semiconductor back surface and the dicing tape to achieve both the holding force for the ring frame and the peelability at the time of pickup. ing.
  • the semiconductor back film is cured after a chip having the semiconductor back film is bonded to a substrate or the like.
  • the dicing tape-integrated film for semiconductor back surface disclosed in Patent Document 1 may not always have sufficient pickup properties (peelability). After applying the dicing tape integrated semiconductor back film to the semiconductor wafer, the semiconductor back film is thermally cured, and then used in the process of dicing and picking up. It may become strong and the pick-up property may deteriorate. With the dicing tape-integrated semiconductor back film of Patent Document 1, there is a concern that the pickup property cannot be maintained in a process where such conditions are more severe.
  • the adhesive layer (second adhesive layer in the present invention) provided between the film for semiconductor back surface and the dicing tape (adhesive sheet in the present invention) is required to have good pick-up property, and the adhesive of the adhesive layer When the property is lowered, the adhesion between the dicing tape and the pressure-sensitive adhesive layer may be lowered. As a result, the adhesive layer may remain on the film for semiconductor back surface at the time of pick-up. Such a decrease in adhesiveness cannot be dealt with simply by improving the adhesiveness of the dicing sheet (adhesive sheet).
  • An object of the present invention is to provide a good holding force for a jig such as a ring frame, excellent releasability at the time of pick-up, and a second adhesive layer and an adhesive layer (first adhesive layer) in the adhesive sheet.
  • An object of the present invention is to provide a composite sheet for forming a protective film that can prevent problems caused by a decrease in adhesiveness.
  • the present invention includes the following gist.
  • a protective film-forming composite sheet in which a protective film-forming film is provided on a first pressure-sensitive adhesive layer of a pressure-sensitive adhesive sheet comprising a base material and a first pressure-sensitive adhesive layer as constituent layers via a second pressure-sensitive adhesive layer Because The shape of the second pressure-sensitive adhesive layer in plan view is a shape included in the shape of the pressure-sensitive adhesive sheet in plan view,
  • the first pressure-sensitive adhesive layer is composed of an energy beam-curable pressure-sensitive adhesive or an energy beam-cured pressure-sensitive adhesive,
  • the second pressure-sensitive adhesive layer is made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive,
  • the manufacturing method of the composite sheet for protective film formation which has the process of hardening a 1st adhesive layer, after laminating
  • Step (1) A step of attaching the protective film-forming film of the protective film-forming composite sheet according to any one of [1] to [5] to a workpiece
  • Step (2) a step of heat-curing the protective film-forming film to obtain a protective film
  • Step (3) A step of separating the protective film and the second pressure-sensitive adhesive layer.
  • the composite sheet for forming a protective film of the present invention has a good holding power with respect to a jig such as a ring frame, is excellent in the pick-up property of a chip with a protective film, and has an adhesive layer (shown in FIG. The malfunction resulting from the adhesive fall of the 2nd adhesive layer 3) and the adhesive layer (1st adhesive layer 2 shown in FIG. 1) in an adhesive sheet can be prevented.
  • a protective film-forming composite sheet 10 is formed on a first adhesive layer 2 of an adhesive sheet 5 including a substrate 1 and a first adhesive layer 2 as constituent layers. Is provided via the second pressure-sensitive adhesive layer 3.
  • the substrate is not particularly limited.
  • these laminated films may be sufficient.
  • the base material composed of a film containing one or more layers of polypropylene film has high heat resistance, and the deformation is small even when the adhesive sheet is bonded when the protective film-forming film is cured. It is preferable because it can be easily restored, can easily maintain pickup properties, and can be expanded.
  • the thickness of the substrate is not particularly limited, and is preferably 30 to 300 ⁇ m, more preferably 50 to 200 ⁇ m.
  • the composite sheet for forming a protective film has sufficient flexibility, and therefore exhibits good adhesiveness to a workpiece (for example, a semiconductor wafer).
  • the surface where the base material is in contact with the first pressure-sensitive adhesive layer may be subjected to corona treatment or other layers such as a primer.
  • a 1st adhesive layer consists of an adhesive which hardened
  • the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are made of a pressure-sensitive adhesive obtained by curing the energy ray-curable pressure-sensitive adhesive. It is considered that the bond between the energy beam polymerizable groups can occur because the energy beam polymerizable group) of the reaction exists. Moreover, in the manufacturing process of the protective film-forming composite sheet described later, even when energy beam irradiation is not performed after laminating the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer, the energy beam polymerizable groups are bonded to each other. This reaction is considered to proceed slowly after the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are laminated, and a bond is formed.
  • the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are stronger than the adhesive force between the protective film obtained by heating and curing the protective film-forming film and the second pressure-sensitive adhesive layer. Due to the stronger adhesive force between the pressure-sensitive adhesive layer, it becomes easy to perform separation between the protective film and the second pressure-sensitive adhesive layer.
  • the energy beam polymerizable group in the present invention is a functional group having a polymerizable carbon-carbon double bond, and specific examples thereof include a vinyl group, an allyl group, a (meth) acryloyl group, and the like. (Meth) acryloyl group is mentioned.
  • the energy beam polymerizable group in the present invention does not mean a double bond having no polymerizability because it generates a radical in the presence of a radical and easily causes a polyaddition reaction.
  • each component constituting the energy ray-curable pressure-sensitive adhesive may contain an aromatic ring, but the unsaturated structure of the aromatic ring does not mean the energy ray polymerizable group in the present invention.
  • the pressure-sensitive adhesive usually contains a polymer (A) and also contains an energy ray curable compound (B).
  • the energy ray-curable compound (B) contains an energy ray-polymerizable group, has a function of being polymerized and cured when irradiated with energy rays such as ultraviolet rays and electron beams, and reducing the adhesiveness of the pressure-sensitive adhesive.
  • it describes as an energy-beam curable polymer (henceforth component (AB)) by which an energy-beam polymeric group is couple
  • Such an energy beam curable polymer (AB) has the property of having both a function as a polymer and energy beam curability.
  • the energy ray-curable pressure-sensitive adhesive is not particularly limited, but will be specifically described with an acrylic pressure-sensitive adhesive as an example.
  • the acrylic pressure-sensitive adhesive contains an acrylic polymer (A1) as the polymer (A).
  • the acrylic polymer (A1) a conventionally known acrylic polymer can be used.
  • the weight average molecular weight (Mw) of the acrylic polymer (A1) is preferably 10,000 to 2,000,000, more preferably 100,000 to 1,500,000.
  • the glass transition temperature (Tg) of the acrylic polymer (A1) is preferably in the range of ⁇ 70 to 30 ° C., more preferably in the range of ⁇ 60 to 20 ° C.
  • the monomer constituting the acrylic polymer (A1) includes at least one (meth) acrylic acid ester monomer or a derivative thereof. Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl ( Alkyl groups such as (meth) acrylate, 2-ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, tetradecyl (meth) acrylate, octadecyl (meth) acrylate and the like have 1 carbon atom Alkyl (meth) acrylate which is -18; cycloalkyl (meth)
  • (meth) acryl may be used in the meaning including both acryl and methacryl.
  • the acrylic polymer (A1) may be cross-linked.
  • the acrylic polymer (A1) before being crosslinked has a crosslinkable functional group such as a hydroxyl group, and a composition for forming the first pressure-sensitive adhesive layer.
  • a cross-linking agent is added to the product.
  • the acrylic polymer (A1) is crosslinked by the reaction between the crosslinkable functional group and the functional group of the crosslinking agent. By crosslinking the acrylic polymer (A1), the cohesive force of the first pressure-sensitive adhesive layer can be adjusted.
  • crosslinking agent examples include organic polyvalent isocyanate compounds and organic polyvalent imine compounds.
  • organic polyvalent isocyanate compounds include aromatic polyvalent isocyanate compounds, aliphatic polyvalent isocyanate compounds, alicyclic polyvalent isocyanate compounds, trimers of these organic polyvalent isocyanate compounds, and these organic polyvalent isocyanate compounds.
  • examples thereof include terminal isocyanate urethane prepolymers obtained by reacting with a polyol compound.
  • organic polyvalent isocyanate compound examples include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylene diisocyanate, diphenylmethane-4,4′-.
  • organic polyvalent imine compounds include N, N′-diphenylmethane-4,4′-bis (1-aziridinecarboxamide), trimethylolpropane-tri- ⁇ -aziridinylpropionate, tetramethylol. Mention may be made of methane-tri- ⁇ -aziridinylpropionate and N, N′-toluene-2,4-bis (1-aziridinecarboxamide) triethylenemelamine.
  • the crosslinking agent is usually used in a ratio of 0.01 to 20 parts by weight, preferably 0.1 to 15 parts by weight, more preferably 0.5 to 12 parts by weight with respect to 100 parts by weight of the acrylic polymer before crosslinking. It is done.
  • the reference content is the content of the acrylic polymer before being crosslinked.
  • the energy ray-curable compound (B) is a compound that is polymerized and cured when irradiated with energy rays such as ultraviolet rays and electron beams.
  • energy ray curable compounds include low molecular weight compounds (monofunctional and polyfunctional monomers and oligomers) having an energy ray polymerizable group, and specifically include trimethylolpropane triacrylate and tetramethylolmethane.
  • Acrylates such as tetraacrylate, pentaerythritol triacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butylene glycol diacrylate, 1,6-hexanediol diacrylate, dicyclopentadiene dimethoxydiacrylate, Cyclic aliphatic skeleton-containing acrylates such as isobornyl acrylate, polyethylene glycol diacrylate, oligoester acrylate, urethane acrylate Goma, epoxy-modified acrylates, polyether acrylates, acrylate compounds such as itaconic acid oligomer is used.
  • Such a compound has an energy ray polymerizable group in the molecule and usually has a molecular weight of about 100 to 30,000, preferably about 300 to 10,000.
  • the amount of the low molecular weight compound having an energy ray polymerizable group is preferably 0 to 200 parts by mass relative to 100 parts by mass of the component (A) (including the energy ray curable polymer (AB) described later).
  • the ratio is preferably 1 to 100 parts by mass, more preferably about 1 to 30 parts by mass.
  • the energy beam curable polymer (AB) having the properties of the components (A) and (B) is formed by bonding an energy beam polymerizable group to the main chain, side chain or terminal of the polymer.
  • the energy ray curable polymer bonded to the main chain, side chain or terminal of the energy ray curable polymer is an alkylene group, alkyleneoxy group or polyalkyleneoxy group via the main chain or side chain of the energy ray curable polymer. Or you may couple
  • the weight average molecular weight (Mw) of the energy beam curable polymer (AB) is preferably 10,000 to 2,000,000, and more preferably 100,000 to 1,500,000.
  • the glass transition temperature (Tg) of the energy beam curable polymer (AB) is preferably in the range of ⁇ 70 to 30 ° C., more preferably ⁇ 60 to 20 ° C.
  • Tg is a polymerizable group. It is Tg of the acrylic polymer before making it react with a containing compound.
  • the energy ray curable polymer (AB) includes, for example, an acrylic polymer containing a functional group such as a hydroxy group, a carboxyl group, an amino group, a substituted amino group, and an epoxy group, and a substituent that reacts with the functional group. It is obtained by reacting a polymerizable group-containing compound having 1 to 5 energy beam polymerizable carbon-carbon double bonds per molecule.
  • the acrylic polymer includes a (meth) acrylic acid ester monomer having a functional group such as a hydroxy group, a carboxyl group, an amino group, a substituted amino group, and an epoxy group or a derivative thereof, and a monomer constituting the component (A) described above.
  • a copolymer consisting of Examples of the polymerizable group-containing compound include (meth) acryloyloxyethyl isocyanate, meta-isopropenyl- ⁇ , ⁇ -dimethylbenzyl isocyanate, (meth) acryloyl isocyanate, allyl isocyanate, glycidyl (meth) acrylate, and (meth) acrylic acid. Etc.
  • the energy ray curable polymer (AB) When the energy ray curable polymer (AB) is obtained by reacting an acrylic polymer containing a functional group such as a hydroxy group with a polymerizable group-containing compound, the energy ray curable polymer (AB) is Like the above-mentioned acrylic polymer (A1), it may be crosslinked.
  • the acrylic pressure-sensitive adhesive containing the acrylic polymer (A1), the energy ray curable compound (B) and / or the energy ray curable polymer (AB) as described above is cured by irradiation with energy rays. Specifically, ultraviolet rays, electron beams, etc. are used as the energy rays.
  • the polymerization curing time can be shortened and the amount of light irradiation can be decreased.
  • photopolymerization initiators examples include benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, benzoin dimethyl ketal, 2,4-diethyl Thioxanthone, ⁇ -hydroxycyclohexyl phenyl ketone, benzyldiphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, benzyl, dibenzyl, diacetyl, 1,2-diphenylmethane, 2-hydroxy-2-methyl-1- [4- (1-Methylvinyl) phenyl] propanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide and ⁇ -chloranth Examples include laquinone.
  • the blending ratio of the photopolymerization initiator is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the energy beam curable compound (B) and the energy beam curable polymer (AB), and is preferably 1 to 5 parts by mass. More preferably, it is included. If the blending ratio of the photopolymerization initiator is less than 0.1 parts by mass, satisfactory curability may not be obtained due to insufficient photopolymerization, and if it exceeds 10 parts by mass, a residue that does not contribute to photopolymerization is generated. May cause malfunctions.
  • the first pressure-sensitive adhesive layer may be a pressure-sensitive adhesive layer made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive.
  • the pressure-sensitive adhesive layer made of the pressure-sensitive adhesive obtained by curing the energy beam-curable pressure-sensitive adhesive is obtained by curing the energy beam-curable pressure-sensitive adhesive by energy beam irradiation described in the method for producing a protective film-forming composite sheet described later. Is. The same applies to the second pressure-sensitive adhesive layer described later.
  • the thickness of the first pressure-sensitive adhesive layer is not particularly limited, but is preferably 3 to 80 ⁇ m, more preferably 4 to 50 ⁇ m, and particularly preferably 5 to 30 ⁇ m.
  • a 2nd adhesive layer consists of an adhesive which hardened the energy-beam curable adhesive.
  • the energy ray-curable pressure-sensitive adhesive the same one as the energy ray-curable pressure-sensitive adhesive in the first pressure-sensitive adhesive layer described above can be used, but a low molecular weight component (for example, energy ray-curable property) to the protective film-forming film. From the viewpoint of suppressing the migration of the compound and the like, it is preferable to use an energy beam curable polymer as the energy beam curable adhesive.
  • the energy ray curable polymer is not particularly limited, and for example, the same energy ray curable pressure sensitive adhesive contained in the first pressure sensitive adhesive layer can be used.
  • the tensile elastic modulus at 25 ° C. of the second pressure-sensitive adhesive layer is 200 to 2000 MPa.
  • the tensile elastic modulus at 25 ° C. of the second pressure-sensitive adhesive layer is preferably 500 to 2000 MPa, more preferably 500 to 1500 MPa. If it is such a range, the pick-up property of the chip
  • the pickup property of the chip with the protective film is excellent.
  • the tensile elastic modulus at 25 ° C. of the second pressure-sensitive adhesive layer can be controlled by selecting a monomer constituting the acrylic polymer.
  • control of the tensile elasticity modulus in 25 degreeC of a 2nd adhesive layer becomes easy by adjusting the compounding quantity of vinyl acetate.
  • the tensile elasticity modulus in 25 degreeC of a 2nd adhesive layer can be controlled with the compounding quantity of the polymeric group containing compound made to react with the acrylic polymer containing a functional group.
  • the thickness of the second pressure-sensitive adhesive layer is not particularly limited, but is preferably 2 to 80 ⁇ m, more preferably 3 to 50 ⁇ m, and particularly preferably 5 to 10 ⁇ m.
  • the shape of the second pressure-sensitive adhesive layer in plan view is not particularly limited as long as it is a shape included in the shape of the above-described pressure-sensitive adhesive sheet in plan view.
  • the shape that can include substantially the same shape as the workpiece or the shape of the workpiece. Is mentioned.
  • the protective film-forming film may be any film having (1) sheet shape maintaining property, (2) initial adhesiveness, and (3) curability.
  • the protective film-forming film can be provided with (1) sheet shape maintainability and (3) curability by adding a binder component, and the binder component includes a first component containing a polymer component and a curable component.
  • a second binder component containing a curable polymer component having the properties of a binder component or a polymer component and a curable component can be used.
  • the initial adhesiveness may be pressure-sensitive adhesiveness, and is a property of being softened and bonded by heat. There may be.
  • the initial adhesiveness is usually controlled by adjusting various properties of the binder component and adjusting the blending amount of the inorganic filler described later.
  • a 1st binder component provides a sheet
  • the 1st binder component does not contain a curable polymer component for convenience to distinguish from the 2nd binder component.
  • the polymer component (a) is added to the protective film-forming film mainly for the purpose of imparting sheet shape maintenance to the protective film-forming film.
  • the weight average molecular weight (Mw) of the polymer component (a) is usually 20,000 or more, preferably 20,000 to 3,000,000.
  • the value of the weight average molecular weight (Mw) is a value when measured by a gel permeation chromatography method (GPC) method (polystyrene standard).
  • GPC gel permeation chromatography method
  • the measurement by such a method is carried out, for example, by using a high-speed GPC apparatus “HLC-8120GPC” manufactured by Tosoh Corporation and a high-speed column “TSK gold column H XL- H”, “TSK Gel GMH XL ”, “TSK Gel G2000 H XL ”. (The above, all manufactured by Tosoh Corporation) are connected in this order, and the detector is used as a differential refractometer at a column temperature of 40 ° C. and a liquid feed rate of 1.0 mL / min.
  • the polymer component (a) does not have a curing functional functional group described later.
  • the polymer component (a) examples include acrylic polymers, polyesters, phenoxy resins (for the purpose of distinguishing from curable polymers described later, those having no epoxy group), polycarbonates, polyethers, polyurethanes, polysiloxanes.
  • a rubber polymer or the like can be used.
  • an acrylic urethane resin obtained by reacting a urethane prepolymer having an isocyanate group at a molecular terminal with an acrylic polyol having an hydroxyl group and an acrylic polyol having a combination of two or more of these also good.
  • two or more of these may be used in combination, including a polymer in which two or more are bonded.
  • the acrylic polymer (a1) is used as the polymer component (a)
  • the same polymer as the acrylic polymer (A1) contained in the above acrylic pressure-sensitive adhesive can be used.
  • polyester for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • phenoxy resin for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polycarbonate for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polyether for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polyurethane for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polycarbonate for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polycarbonate for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polyether for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polyurethane for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group
  • polysiloxane for the purpose of distinguishing
  • the glass transition temperature of the non-acrylic resin (a2) is preferably in the range of ⁇ 30 to 150 ° C., more preferably in the range of ⁇ 20 to 120 ° C.
  • the cured protective film-forming film (protective film) is transferred to the workpiece using a protective film-forming composite sheet described later. In doing so, delamination of the protective film and the second pressure-sensitive adhesive layer can be easily performed. Further, the protective film-forming film tends to follow the unevenness of the transfer surface.
  • the content of the non-acrylic resin (a2) is such that the non-acrylic resin (a2) and the acrylic polymer (a1) Is usually in the range of 1:99 to 60:40, preferably 1:99 to 30:70.
  • the content of the non-acrylic resin (a2) is in this range, the above effect can be obtained to a higher degree.
  • the curable component (b) is added to the protective film-forming film mainly for the purpose of imparting curability to the protective film-forming film.
  • a thermosetting component (b1) can be used as the curable component (b).
  • the protective film-forming film contains a thermosetting component (b1)
  • the protective film-forming film becomes thermosetting.
  • the thermosetting component (b1) contains at least a compound having a functional group that reacts by heating. Curing is realized by the functional groups of the curable component (b) reacting to form a three-dimensional network structure. Since the curable component (b) is used in combination with the polymer component (a), the increase in the viscosity of the coating composition for forming the protective film-forming film is suppressed, and the handleability is improved. Therefore, the weight average molecular weight (Mw) is usually 10,000 or less, preferably 100 to 10,000.
  • thermosetting component (b1) for example, an epoxy thermosetting component is preferable.
  • the epoxy thermosetting component preferably contains a compound (b11) having an epoxy group and a combination of the compound (b11) having an epoxy group and a thermosetting agent (b12).
  • epoxy compound As the compound having an epoxy group (hereinafter sometimes referred to as "epoxy compound”), a conventionally known compound can be used. Specifically, polyfunctional epoxy resin, bisphenol A diglycidyl ether and its hydrogenated product, orthocresol novolac epoxy resin, dicyclopentadiene type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type Examples thereof include epoxy compounds having two or more functional groups in the molecule, such as epoxy resins and phenylene skeleton type epoxy resins. These can be used individually by 1 type or in combination of 2 or more types.
  • the content of the epoxy compound (b11) is preferably 1 to 1500 parts by mass, and more preferably 3 to 1200 parts by mass with respect to 100 parts by mass of the polymer component (a).
  • thermosetting agent (b12) functions as a curing agent for the epoxy compound.
  • a preferable thermosetting agent includes a compound having two or more functional groups capable of reacting with an epoxy group in one molecule.
  • the functional group include a phenolic hydroxyl group, an alcoholic hydroxyl group, an amino group, a carboxyl group, and an acid anhydride. Of these, phenolic hydroxyl groups, amino groups, acid anhydrides and the like are preferable, and phenolic hydroxyl groups and amino groups are more preferable.
  • phenolic curing agents include polyfunctional phenolic resins, biphenols, novolac phenolic resins, dicyclopentadiene phenolic resins, zylocic phenolic resins, and aralkyl phenolic resins. Is mentioned.
  • a specific example of the amine curing agent (thermosetting agent having an amino group) is DICY (dicyandiamide). These can be used individually by 1 type or in mixture of 2 or more types.
  • thermosetting agent (b12) is preferably 0.1 to 500 parts by mass, and more preferably 1 to 200 parts by mass with respect to 100 parts by mass of the epoxy compound.
  • the curing accelerator (b13) may be used to adjust the rate of thermal curing of the protective film-forming film.
  • the curing accelerator (b13) is preferably used particularly when an epoxy thermosetting component is used as the thermosetting component.
  • Preferred curing accelerators (b13) include tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol; 2-methylimidazole, 2-phenylimidazole, 2 -Imidazoles such as phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole; organics such as tributylphosphine, diphenylphosphine, triphenylphosphine Phosphines; and tetraphenylboron salts such as tetraphenylphosphonium tetraphenylborate and triphenylphosphinetetraphenylborate. These can be used individually by 1 type or in mixture of 2 or more types.
  • the curing accelerator (b13) is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 2 parts by mass with respect to 100 parts by mass of the total amount of the epoxy compound (b11) and the thermosetting agent (b12). Included in the amount of.
  • the protective film-forming film has excellent adhesion to the workpiece even under exposure to high temperatures and high humidity, and is subjected to severe reflow conditions. High reliability can be achieved even when exposed.
  • the curing accelerator (b13) having high polarity is a film for forming a protective film under high temperature and high humidity. By moving the inside to the adhesion interface side and segregating, the reliability of the semiconductor device may be lowered.
  • the second binder component By containing the curable polymer component (ab), the second binder component imparts film forming properties (sheet forming properties) and curability to the protective film forming film.
  • the curable polymer component (ab) is a polymer having a functional functional group.
  • the curing functional group is a functional group that can react with each other to form a three-dimensional network structure, and includes a functional group that reacts by heating.
  • the functional functional group may be added to the unit of the continuous structure that becomes the skeleton of the curable polymer, or may be added to the terminal.
  • the functional functional group may be added to the side chain or directly to the main chain. Also good.
  • the weight average molecular weight (Mw) of the curable polymer component (ab) is usually 20,000 or more from the viewpoint of achieving the purpose of imparting sheet shape maintainability to the protective film-forming film.
  • the functional group that reacts by heating includes an epoxy group.
  • examples of the curable polymer component having an epoxy group include phenoxy resins having an epoxy group, and specific product names include jER1256 and jER4250 manufactured by Mitsubishi Chemical Corporation.
  • the curable polymer component which has an epoxy group is a polymer similar to the above-mentioned acrylic polymer (a1), and is polymerized using a monomer having an epoxy group as a monomer ( Epoxy group-containing acrylic polymer).
  • a monomer having an epoxy group as a monomer Epoxy group-containing acrylic polymer.
  • examples of such a monomer include epoxy group-containing (meth) acrylates such as glycidyl (meth) acrylate.
  • the preferred embodiment is the same as that of the acrylic polymer (a1).
  • thermosetting agent (b12) or a curing accelerator (b13) may be used in the same manner as in the case of using an epoxy thermosetting component as the curable component. Good.
  • the second binder component may contain the above-described polymer component (a) and curable component (b) together with the curable polymer component (ab).
  • the protective film-forming film contains one or both of the thermosetting component (b1) and the curable polymer component (ab), the protective film-forming film has thermosetting properties. In order to impart more sufficient thermosetting property to the protective film-forming film, it is preferable that the protective film-forming film contains at least the thermosetting component (b1). However, when the protective film-forming film contains only the thermosetting component (b1), the sheet shape maintaining property of the protective film-forming film may be inferior. Therefore, the protective film-forming film preferably contains a thermosetting component (b1) and one or both of the polymer component (a) and the curable polymer component (ab).
  • the amount of the thermosetting component (b1) contained in the protective film-forming film is determined by the polymer component (a) and the curable polymer component (
  • the total amount of ab) is preferably 50 to 300 parts by mass, more preferably 70 to 250 parts by mass with respect to 100 parts by mass in total.
  • the protective film-forming film may contain the following components in addition to the binder component.
  • the inorganic filler protective film-forming film may contain an inorganic filler (c).
  • an inorganic filler (c) By blending the inorganic filler (c) into the protective film-forming film, the thermal expansion coefficient of the cured protective film-forming film can be adjusted, and the protective film-forming film after curing with respect to the workpiece can be adjusted.
  • the reliability of the semiconductor device can be improved by optimizing the thermal expansion coefficient. It is also possible to reduce the moisture absorption rate of the protective film-forming film after curing.
  • Preferable inorganic fillers (c) include silica, alumina, talc, calcium carbonate, titanium oxide, iron oxide, silicon carbide, boron nitride and other powders, beads formed by spheroidizing them, single crystal fibers, glass fibers, and the like. .
  • silica filler and alumina filler are preferable.
  • the said inorganic filler can be used individually or in mixture of 2 or more types.
  • the range of the content of the inorganic filler (c) for obtaining the above-mentioned effect more reliably is preferably 1 to 80 parts by mass with respect to 100 parts by mass of the total solid content constituting the protective film-forming film, More preferred is 5 to 75 parts by mass, and particularly preferred is 15 to 60 parts by mass.
  • Colorant (d) can be mix
  • the colorant (d) malfunction of the semiconductor device due to infrared rays or the like generated from surrounding devices when the semiconductor device is incorporated into equipment can be prevented.
  • the protective film forming film is engraved by means such as laser marking, there is an effect that marks such as characters and symbols can be easily recognized.
  • the colorant (d) organic or inorganic pigments and dyes are used. Among these, black pigments are preferable from the viewpoint of electromagnetic wave and infrared shielding properties. Examples of the black pigment include carbon black, iron oxide, manganese dioxide, aniline black, activated carbon, and the like, but are not limited thereto.
  • the blending amount of the colorant (d) is preferably 0.1 to 35 parts by mass, more preferably 0.5 to 25 parts by mass, particularly 100 parts by mass of the total solid content constituting the protective film-forming film.
  • the amount is preferably 1 to 15 parts by mass.
  • the coupling agent (e) having a functional group that reacts with an inorganic substance and a functional group that reacts with an organic functional group is bonded to the workpiece of the protective film-forming film and / or You may use in order to improve aggregability.
  • the water resistance can be improved by using a coupling agent (e), without impairing the heat resistance of the protective film obtained by hardening
  • coupling agents (e) include titanate coupling agents, aluminate coupling agents, silane coupling agents, and the like. Of these, silane coupling agents are preferred.
  • silane coupling agent a silane coupling agent in which a functional group that reacts with the organic functional group is a group that reacts with a functional group of a polymer, a curable component, a curable polymer component, or the like is preferably used.
  • silane coupling agents include ⁇ -glycidoxypropyltrimethoxysilane, ⁇ -glycidoxypropylmethyldiethoxysilane, ⁇ - (3,4-epoxycyclohexyl) ethyltrimethoxysilane, ⁇ - (methacryloxy).
  • the silane coupling agent is usually 0.1 to 20 parts by weight, preferably 0.8 parts per 100 parts by weight in total of the polymer component (a), the curable component (b) and the curable polymer component (ab). 2 to 10 parts by mass, more preferably 0.3 to 5 parts by mass. If the content of the silane coupling agent is less than 0.1 parts by mass, the above effect may not be obtained, and if it exceeds 20 parts by mass, it may cause outgassing.
  • additives may be added to the film for forming a general-purpose additive protective film as necessary.
  • additives include leveling agents, plasticizers, antistatic agents, antioxidants, ion scavengers, gettering agents, chain transfer agents, and the like.
  • the protective film-forming film may be a single composition film or a laminated film of two or more films having different compositions.
  • the film to be bonded to the workpiece is blended with a relatively large amount of components capable of improving the adhesiveness of the film, and the other film (the film in contact with the second adhesive layer)
  • the amount of the curable component may be increased.
  • the thickness of the protective film-forming film is not particularly limited, but is preferably 3 to 300 ⁇ m, more preferably 5 to 250 ⁇ m, and particularly preferably 7 to 200 ⁇ m.
  • FIG. 1 shows the structure of the composite sheet for forming a protective film of the present invention comprising the above layers.
  • a protective film-forming composite sheet 10 is formed on a first adhesive layer 2 of an adhesive sheet 5 including a substrate 1 and a first adhesive layer 2 as constituent layers. Is provided via the second pressure-sensitive adhesive layer 3.
  • the protective film-forming film 4 is formed on the second pressure-sensitive adhesive layer 3 so as to be peelable.
  • the protective film-forming film 4 is not particularly limited as long as it is substantially the same shape as the workpiece or can completely include the shape of the workpiece, and may be the same shape as the second pressure-sensitive adhesive layer 3 as shown in FIG. .
  • the shape of the composite sheet for forming a protective film is not limited to a single sheet, but may be a long strip or roll it up.
  • a release sheet is laminated on the protective film-forming film in order to protect the protective film-forming film, the first pressure-sensitive adhesive layer, and the second pressure-sensitive adhesive layer.
  • a release sheet the film illustrated as a base material mentioned above can be used.
  • the surface tension of the surface of the release sheet that contacts the protective film-forming film is preferably 40 mN / m or less, more preferably 37 mN / m or less, and particularly preferably 35 mN / m or less.
  • the lower limit is usually about 25 mN / m.
  • Such a release sheet having a relatively low surface tension can be obtained by appropriately selecting the material, and can also be obtained by applying a release agent to the surface of the release sheet and performing a release treatment. .
  • alkyd, silicone, fluorine, unsaturated polyester, polyolefin, wax, and the like are used as the release agent used for the release treatment.
  • alkyd, silicone, and fluorine release agents are heat resistant. This is preferable.
  • the release agent can be used without any solvent, or can be diluted or emulsified in a solvent to obtain a gravure coater, Mayer bar coater, air knife coater.
  • the release sheet may be applied by a roll coater or the like, and the release sheet on which the release agent is applied is subjected to room temperature or heating, or cured by an electron beam to form a release agent layer.
  • the surface tension of the release sheet may be adjusted by laminating films by wet lamination, dry lamination, hot melt lamination, melt extrusion lamination, coextrusion processing, or the like. That is, a film in which the surface tension of at least one surface is within a preferable range as the surface in contact with the protective film-forming film of the release sheet described above is such that the surface is in contact with the protective film-forming film.
  • a laminate laminated with another film may be manufactured and used as a release sheet.
  • the protective film-forming composite sheet having the configuration shown in FIG. 1, the protective film-forming composite sheet is bonded to the jig by the sufficient adhesiveness of the first pressure-sensitive adhesive layer in the region surrounding the protective film-forming film. be able to. At the same time, the adhesiveness at the interface between the second pressure-sensitive adhesive layer and the first pressure-sensitive adhesive layer can be controlled to facilitate the pickup of the chip with the protective film.
  • the composite sheet for forming a protective film functions as a dicing sheet for supporting a workpiece in the dicing process, it is not necessary to dice by separately attaching a dicing sheet to the wafer with the film for forming the protective film in the dicing process.
  • the manufacturing process of the semiconductor device can be simplified.
  • the adhesive strength measurement test in which the adhesive sheet is peeled from the second adhesive layer, at least one of the first adhesive layer and the second adhesive layer is cohesively broken, or adhesive
  • the force is preferably 0.8 N / 25 mm or more.
  • the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is relatively low, in the pressure-sensitive adhesive strength measurement test, the interface can be broken and the pressure-sensitive adhesive strength can be measured.
  • the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is remarkably high, one or both of the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer cohesively break, and the adhesive force cannot be measured.
  • the adhesive force measurement test is specifically described in the examples described later.
  • the protective film-forming sheet has such characteristics, and since the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is large, the effect of the present invention is further improved. For example, the size is relatively large. Even when the composite sheet for forming a protective film of the present invention is used in a process for obtaining a chip, undesired peeling of the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer can be prevented.
  • the protective sheet-forming composite sheet in the adhesive force measurement test in which the adhesive sheet is peeled from the second adhesive layer, at least one of the first adhesive layer and the second adhesive layer is cohesively broken, or the adhesive force is More preferably, it is 1.2 N / 25 mm or more.
  • Such a protective film-forming film of the protective film-forming composite sheet can be used as a protective film of a chip.
  • the protective film-forming film is affixed to the back surface of the face-down type chip and cured by an appropriate means to have a function of protecting the chip as an alternative to the sealing resin. Further, when the protective film-forming film is attached to the semiconductor wafer, the protective film has a function of reinforcing the wafer, so that damage to the wafer can be prevented.
  • a 1st adhesive layer is formed in the surface of a base material, and an adhesive sheet is obtained.
  • the method for providing the first pressure-sensitive adhesive layer on the surface of the substrate is not particularly limited, and the energy ray curable that constitutes the first pressure-sensitive adhesive layer so as to have a predetermined film thickness on the release sheet (first release sheet).
  • the 1st adhesive layer which consists of an adhesive which hardened the energy-beam curable adhesive by hardening
  • curing a 1st film by energy ray irradiation is obtained.
  • the first coating becomes the first pressure-sensitive adhesive layer made of the energy beam-curable pressure-sensitive adhesive as it is.
  • the first film is cured by irradiating energy rays, and the first film is used as the first pressure-sensitive adhesive layer. Also good. In this case, curing may be limited to preliminary curing so that unreacted energy beam polymerizable groups remain in the first coating.
  • Examples of the energy rays include ultraviolet rays, and near ultraviolet rays including ultraviolet rays having a wavelength of about 200 to 380 nm may be used.
  • the amount ultraviolet (light amount) is generally 50 ⁇ 500mJ / cm 2 or so, preferably 100 ⁇ 450mJ / cm 2, more preferably 200 ⁇ 400mJ / cm 2.
  • the ultraviolet illumination is usually 50 ⁇ 500mW / cm 2 or so, preferably 100 ⁇ 450mW / cm 2, more preferably 200 ⁇ 400mW / cm 2.
  • an ultraviolet-ray source For example, a high pressure mercury lamp, a metal halide lamp, a light emitting diode etc. are used. In the following, when ultraviolet rays are used as the energy rays to be irradiated, an appropriate condition may be similarly selected from such a range.
  • a release sheet the film illustrated as a base material mentioned above can be used.
  • composition (2nd adhesive) containing the energy-beam curable adhesive which comprises a 2nd adhesive layer is apply
  • another release sheet (third release sheet) is laminated on the second coating to obtain a laminate of second release sheet / second coating / third release sheet.
  • the second film is cured, and a second pressure-sensitive adhesive layer sandwiched between the second release sheet and the third release sheet is obtained.
  • the second coating is not irradiated with energy rays, or the curing is limited to preliminary curing so that unreacted energy beam polymerizable groups remain in the second coating, and the first coating or the first pressure-sensitive adhesive layer. After the lamination, the second coating may be cured to form a second pressure-sensitive adhesive layer.
  • a protective film-forming composition is applied on another release sheet (fourth release sheet) to form a protective film-forming film.
  • another release sheet (fifth release sheet) is laminated on the protective film-forming film to obtain a laminate of fourth release sheet / protective film-forming film / fifth release sheet.
  • the third release sheet is laminated from the laminate of the second release sheet / second pressure-sensitive adhesive layer / third release sheet
  • the fourth release sheet is laminated from the laminate of fourth release sheet / protective film forming film / fifth release sheet.
  • the second pressure-sensitive adhesive layer and the protective film-forming film are laminated while removing the film to obtain a laminate of second release sheet / second pressure-sensitive adhesive layer / protective film-forming film / fifth release sheet.
  • the second pressure-sensitive adhesive layer and the protective film-forming film are cut into a shape that can substantially include the shape of the work affixed to the protective film-forming film or the shape of the work, and the remaining portion is removed. .
  • the fifth release sheet When the laminate of the second release sheet / second pressure-sensitive adhesive layer / protective film forming film / fifth release sheet is a long belt-like body, the fifth release sheet can be left without being cut. A laminated body of a plurality of second release sheets / second pressure-sensitive adhesive layers / protective film forming films continuously held by the fifth release sheet can be obtained.
  • the 1st exfoliation sheet is laminated on the 1st coat or the 1st adhesive layer, the 1st exfoliation sheet, the 2nd exfoliation sheet / the 2nd adhesive layer / the film for protective film formation / the 1st While peeling the second release sheet of the laminate composed of 5 release sheets, the first film or the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are laminated, and the base material / the first film or the first pressure-sensitive adhesive layer / A laminate comprising the second pressure-sensitive adhesive layer / the protective film-forming film / the fifth release sheet is obtained.
  • the second coating When the second coating is not irradiated with energy rays or when the second coating is preliminarily cured and laminated with the first coating or the first pressure-sensitive adhesive layer, energy rays are irradiated from the substrate side.
  • the second coating is cured to form a second pressure-sensitive adhesive layer.
  • the first coating When the first coating is not cured or is preliminarily cured, at this time, the first coating is irradiated with energy rays simultaneously with the second coating. It becomes the 1st adhesive layer which consists of an adhesive which hardened the. Further, even when the second coating has already been cured, energy beam irradiation may be performed on the laminated body of the first coating and the second pressure-sensitive adhesive layer at this time for curing the first coating.
  • the composite sheet for protective film formation of this invention is obtained by the above.
  • the first pressure-sensitive adhesive layer in the composite sheet for forming a protective film is made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive, the energy is applied after laminating the first film and the second pressure-sensitive adhesive layer.
  • the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer can be improved, so that the pickup property of the chip with protective film is excellent.
  • Step (1) A step of attaching the protective film-forming film of the protective film-forming composite sheet to the workpiece
  • Step (2) a step of heat-curing the protective film-forming film to obtain a protective film
  • Step (3) A step of separating the protective film and the second pressure-sensitive adhesive layer.
  • the workpiece may be a silicon wafer or a compound semiconductor wafer such as gallium / arsenic.
  • Examples of the work include various articles such as glass substrates, ceramic substrates, organic material substrates such as FPC substrates, and metal materials such as precision parts. Furthermore, the chip
  • Formation of a circuit on the wafer surface can be performed by various methods including conventionally used methods such as an etching method and a lift-off method.
  • the opposite surface (back surface) of the circuit surface of the wafer is ground.
  • the grinding method is not particularly limited, and grinding may be performed by a known means using a grinder or the like.
  • an adhesive sheet called a surface protection sheet is attached to the circuit surface in order to protect the circuit on the surface.
  • the circuit surface side (that is, the surface protection sheet side) of the wafer is fixed by a chuck table or the like, and the back surface side on which no circuit is formed is ground by a grinder.
  • the thickness of the wafer after grinding is not particularly limited, but is usually about 50 to 500 ⁇ m.
  • the crushed layer generated during back grinding is removed.
  • the crushed layer is removed by chemical etching, plasma etching, or the like.
  • a sticking method is not particularly limited.
  • the protective film-forming film is cured by heating to form a protective film on the back surface of the wafer.
  • a protective film made of a cured resin is formed on the back surface of the wafer, and the strength is improved as compared with the case of the wafer alone, so that damage during handling of the thinned wafer can be reduced.
  • the thickness uniformity of the protective film is excellent as compared with a coating method in which a coating solution for a resin film is directly applied to the back surface of the wafer.
  • the composite sheet for forming a protective film of the present invention can serve as a dicing sheet that supports a wafer.
  • the outer peripheral portion of the protective film forming composite sheet is bonded to another jig such as a ring frame, so that the protective film forming composite sheet attached to the semiconductor wafer is fixed to the apparatus, and dicing is performed. Is called.
  • Dicing of the semiconductor wafer on the composite sheet for forming a protective film is performed in the same manner as a conventional method using a known dicing sheet.
  • a dicing process can also be performed before the process of heat-hardening the film for protective film formation and obtaining a protective film.
  • a protective film-forming film is formed by forming a pressure-sensitive adhesive layer using a specific pressure-sensitive adhesive and setting the tensile elastic modulus of the second pressure-sensitive adhesive layer to a specific range. It is easy to peel off the protective film obtained by curing from the second pressure-sensitive adhesive layer. In addition, problems such as peeling between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer at the time of pickup due to a decrease in adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer can be prevented. .
  • Laser printing is performed by a laser marking method, and the surface of the protective film is scraped off by laser light irradiation to mark a product number or the like on the protective film.
  • a semiconductor device can be manufactured by mounting a chip with a protective film on a predetermined base in a face-down manner. Further, a semiconductor device can be manufactured by adhering a semiconductor chip having a protective film on the back surface to another member (on the chip mounting portion) such as a die pad portion or another semiconductor chip.
  • ⁇ Pickup property> Use a tape mounter (Adwill RAD2700, manufactured by Lintec) to attach the protective film-forming film of the protective film-forming composite sheet to the polished surface of a silicon wafer (200 mm diameter, 200 ⁇ m thick) that has been back-ground with a # 2000 grindstone. And fixed to a ring frame for wafer dicing. Next, the protective film-forming composite sheet and the wafer were placed in an environment at 130 ° C. for 2 hours to cure the protective film-forming film. Thereafter, the silicon wafer was diced using a dicing apparatus (DFD651 manufactured by DISCO) to obtain a 5 mm ⁇ 5 mm chip.
  • a dicing apparatus D651 manufactured by DISCO
  • the amount of cutting during dicing was such that the substrate was cut by 15 ⁇ m, and the cutting speed was 40 mm / min. Moreover, as a dicing blade, 27HECC made by DISCO was used, and the rotation speed of the blade was 35,000 rpm. It was confirmed whether or not the obtained chip could be picked up using a pickup device (BESTEM DO2 manufactured by Canon Machinery). Specifically, all the pins were pushed up by 1000 ⁇ m with the push-up pins (five), and then picked up by further pushing up by 400 ⁇ m with the center pin (one). The thrusting speed was 10 mm / second and 20 mm / second.
  • ⁇ Tensile modulus> The tensile elastic modulus of the second pressure-sensitive adhesive layer was measured using a viscoelasticity measuring apparatus (manufactured by TA Instruments, DMA Q800). First, the 2nd adhesive layer before ultraviolet curing was laminated
  • an ultraviolet irradiation device RAD-2000 manufactured by Lintec Corporation
  • Measurement conditions were set so that the measurement part of the sample had a length of 20 mm and a width of 4 mm, measurement was performed at an amplitude of 16 ⁇ m and a measurement temperature range of ⁇ 40 to 150 ° C., and a tensile elastic modulus at a frequency of 11 Hz at 25 ° C. was measured. Value.
  • ⁇ Adhesion test> The protective film-forming film was removed from the protective film-forming sheet and cut into a width of 25 mm to prepare a sample.
  • the exposed surface of the second pressure-sensitive adhesive layer is fixed to a flat plate and the pressure-sensitive adhesive sheet is peeled off at an angle of 180 ° from the second pressure-sensitive adhesive layer at a speed of 300 mm / min in an environment of 23 ° C. and 50% relative humidity
  • the adhesive strength of was measured.
  • each component constituting the protective film-forming film and its blending amount are shown below (component / blending amount).
  • the compounding quantity of each component shows the mass part of solid content conversion, and solid content means all components other than a solvent in this invention.
  • composition for forming protective film (A1) Acrylic polymer: acrylic polymer comprising 55 parts by mass of n-butyl acrylate, 10 parts by mass of methyl acrylate, 20 parts by mass of glycidyl methacrylate, and 15 parts by mass of 2-hydroxyethyl acrylate (weight average molecular weight: 900,000) , Glass transition temperature: -28 ° C.) / 20 parts by mass (b1) thermosetting component: (B11-1) Bisphenol A type epoxy resin (epoxy equivalent 180 to 200 g / eq) / 20 parts by mass (b11-2) Dicyclopentadiene type epoxy resin (Epicron HP-7200HH manufactured by Dainippon Ink & Chemicals, Inc.) / 10 parts by weight (b12) Dicyandiamide (Adekaha Donor 3636AS manufactured by Asahi Denka) /0.5 parts by weight (b13) Curing accelerator: 2-phenyl-4,5-dihydroxymethylimidazole (
  • a protective film-forming composition was applied to a release sheet (SP-PET3811 manufactured by Lintec Co., Ltd., thickness 38 ⁇ m) so that the coating amount after drying was 42 g / m 2 and dried at 110 ° C. for 2 minutes to form a protective film Was formed, and another release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 ⁇ m) was laminated on the protective film-forming film to obtain a laminate of release sheet / protective film-forming film / release sheet. .
  • the first adhesive was applied to a release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 ⁇ m) so that the coating amount after drying was 5 g / m 2 and dried at 100 ° C. for 2 minutes to form the first film. Then, as a base material, it laminated
  • the second adhesive was applied to a release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 ⁇ m) so that the coating amount after drying was 10 g / m 2, and dried at 100 ° C. for 2 minutes to form a second film. After that, a release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 ⁇ m) was laminated to obtain a release sheet / second coating / release sheet laminate.
  • a release sheet SP-PET3811 manufactured by Lintec Corporation, thickness 38 ⁇ m
  • the second coating is cured by irradiating with UV light under irradiation conditions of illuminance of 230 mW / cm 2 and light amount of 190 mJ / cm 2 (main wavelength 365 nm), A second pressure-sensitive adhesive layer was obtained.
  • an isocyanate compound (BHS-8515 manufactured by Toyo Ink Manufacturing Co., Ltd.) was used as a crosslinking agent in the production of the pressure-sensitive adhesive sheet, and 0.5 part by mass was blended with respect to 100 parts by mass of the energy ray curable polymer.
  • Example 3 In the production of the protective film-forming composite sheet, a protective film-forming composite sheet was obtained in the same manner as in Example 2 except that ultraviolet irradiation was not performed. That is, in Example 3, the uncured first film was used as the first pressure-sensitive adhesive layer. Each evaluation result is shown in Table 1.
  • a composite sheet for forming a protective film was obtained in the same manner as Example 2 except for the above. Each evaluation result is shown in Table 1.
  • cohesive failure indicates that at least one of the first adhesive layer and the second adhesive layer has undergone cohesive failure.
  • Base material 2 First pressure-sensitive adhesive layer 3: Second pressure-sensitive adhesive layer 4: Film for forming a protective film 5: Pressure-sensitive adhesive sheet 10: Composite sheet for forming a protective film

Abstract

[Problem] To provide a composite sheet for protective film formation, which has good holding power with respect to a jig such as a ring frame and excellent releasability at the time of pick-up, and which is capable of preventing defects that are caused by decrease in adhesion between a second adhesive layer and an adhesive layer (a first adhesive layer) of an adhesive sheet. [Solution] A composite sheet for protective film formation according to the present invention comprises a film for protective film formation on a first adhesive layer of an adhesive sheet, which comprises a base and the first adhesive layer as constituent layers, with a second adhesive layer being interposed therebetween. The shape of the second adhesive layer is contained in the shape of the adhesive sheet when viewed in plan; the first adhesive layer is formed of an energy ray-curable adhesive or an adhesive that is obtained by curing an energy ray-curable adhesive; the second adhesive layer is formed of an adhesive that is obtained by curing an energy ray-curable adhesive; and the tensile modulus of the second adhesive layer at 25°C is 200-2,000 MPa.

Description

保護膜形成用複合シート、保護膜形成用複合シートの製造方法および保護膜付チップの製造方法Protective film forming composite sheet, method for manufacturing protective film forming composite sheet, and method for manufacturing chip with protective film
 本発明は、半導体ウエハや半導体チップに保護膜を形成でき、かつ、半導体チップの製造効率の向上が可能な保護膜形成用複合シートに関する。特に、いわゆるフェースダウン(face down)方式で実装される半導体チップの製造に用いられる保護膜形成用複合シートに関する。 The present invention relates to a composite sheet for forming a protective film, which can form a protective film on a semiconductor wafer or semiconductor chip and can improve the manufacturing efficiency of the semiconductor chip. In particular, the present invention relates to a composite sheet for forming a protective film used for manufacturing a semiconductor chip mounted by a so-called face-down method.
 近年、いわゆるフェースダウン(face down)方式と呼ばれる実装法を用いた半導体装置の製造が行われている。フェースダウン方式においては、回路面上にバンプなどの電極を有する半導体チップ(以下、単に「チップ」ともいう。)が用いられ、該電極が基板と接合される。このため、チップの回路面とは反対側の面(チップ裏面)は剥き出しとなることがある。 In recent years, semiconductor devices have been manufactured using a so-called “face-down” mounting method. In the face-down method, a semiconductor chip (hereinafter simply referred to as “chip”) having electrodes such as bumps on a circuit surface is used, and the electrodes are bonded to a substrate. For this reason, the surface (chip back surface) opposite to the circuit surface of the chip may be exposed.
 この剥き出しとなったチップ裏面は、有機膜により保護されることがある。従来、この有機膜からなる保護膜を有するチップは、液状の樹脂をスピンコート法によりウエハ裏面に塗布し、乾燥し、硬化してウエハとともに保護膜を切断して得られる。しかしながら、このようにして形成される保護膜の厚み精度は充分でないため、製品の歩留まりが低下することがあった。 The exposed chip back surface may be protected by an organic film. Conventionally, a chip having a protective film made of an organic film is obtained by applying a liquid resin to the back surface of a wafer by spin coating, drying and curing, and cutting the protective film together with the wafer. However, since the thickness accuracy of the protective film formed in this way is not sufficient, the product yield may be lowered.
 上記問題を解決するため、ダイシングテープ上に半導体裏面用フィルムを積層したダイシングテープ一体型半導体裏面用フィルムが開示されている(特許文献1)。 In order to solve the above problem, a dicing tape-integrated film for semiconductor back surface in which a film for semiconductor back surface is laminated on a dicing tape is disclosed (Patent Document 1).
 半導体裏面用フィルムを支持するダイシングテープには、リングフレーム等の治具に対する良好な保持力と、ピックアップ時における良好な剥離性とが求められる。 The dicing tape that supports the film for semiconductor back surface is required to have a good holding force against a jig such as a ring frame and a good releasability at the time of pickup.
 近年の半導体パッケージの薄型化、小型化により、上記の保持力および剥離性を同時に達成する必要があり、同時解決が困難を極めている。チップをピックアップするための優れた剥離性を得るためには、ダイシングテープの粘着剤層を構成する粘着剤を低粘着性とすることが考えられる。しかしながら、粘着剤を低粘着性とすると、リングフレームに対する良好な保持力が失われる懸念があった。 With the recent thinning and miniaturization of semiconductor packages, it is necessary to achieve the above-mentioned holding power and peelability at the same time, making simultaneous resolution extremely difficult. In order to obtain an excellent peelability for picking up a chip, it is conceivable that the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer of the dicing tape is made to have a low pressure-sensitive adhesive property. However, when the pressure-sensitive adhesive has low adhesiveness, there is a concern that good holding power for the ring frame is lost.
 このような問題を解決するため、特許文献1においては、半導体裏面用フィルムとダイシングテープとの間に、別途粘着剤層を設け、リングフレームに対する保持力とピックアップ時における剥離性との両立を図っている。このようなダイシングテープ一体型半導体裏面用フィルムを用いた半導体装置の製造においては、半導体裏面用フィルムを有するチップを基板等に接合した後、半導体裏面用フィルムの硬化を行っている。 In order to solve such a problem, in Patent Document 1, an additional adhesive layer is provided between the film for semiconductor back surface and the dicing tape to achieve both the holding force for the ring frame and the peelability at the time of pickup. ing. In manufacturing a semiconductor device using such a dicing tape integrated semiconductor back film, the semiconductor back film is cured after a chip having the semiconductor back film is bonded to a substrate or the like.
特開2012-33637号公報JP 2012-33637 A
 しかしながら、特許文献1のダイシングテープ一体型半導体裏面用フィルムは、必ずしもピックアップ性(剥離性)が十分でないことがあった。ダイシングテープ一体型半導体裏面用フィルムを半導体ウエハに貼付した後、半導体裏面用フィルムを熱硬化し、次いでダイシング、ピックアップをするプロセスに用いると、熱硬化中に粘着剤層と裏面用フィルムの接着が強くなり、ピックアップ性が低下することがある。特許文献1のダイシングテープ一体型半導体裏面フィルムでは、このような条件がより過酷なプロセスにおいて、ピックアップ性を維持できなくなる懸念があった。 However, the dicing tape-integrated film for semiconductor back surface disclosed in Patent Document 1 may not always have sufficient pickup properties (peelability). After applying the dicing tape integrated semiconductor back film to the semiconductor wafer, the semiconductor back film is thermally cured, and then used in the process of dicing and picking up. It may become strong and the pick-up property may deteriorate. With the dicing tape-integrated semiconductor back film of Patent Document 1, there is a concern that the pickup property cannot be maintained in a process where such conditions are more severe.
 そこで、半導体裏面用フィルムとダイシングテープ(本発明における粘着シート)との間に設けられた粘着剤層(本発明における第2粘着剤層)に良好なピックアップ性を求め、該粘着剤層の粘着性を低下させると、ダイシングテープと該粘着剤層との接着性が低下することがあった。その結果、ピックアップ時に半導体裏面用フィルムに該粘着剤層が残ってしまうという不具合を生じることがあった。このような接着性の低下は、単純にダイシングシート(粘着シート)の粘着性を向上させただけでは対応できないものであった。 Accordingly, the adhesive layer (second adhesive layer in the present invention) provided between the film for semiconductor back surface and the dicing tape (adhesive sheet in the present invention) is required to have good pick-up property, and the adhesive of the adhesive layer When the property is lowered, the adhesion between the dicing tape and the pressure-sensitive adhesive layer may be lowered. As a result, the adhesive layer may remain on the film for semiconductor back surface at the time of pick-up. Such a decrease in adhesiveness cannot be dealt with simply by improving the adhesiveness of the dicing sheet (adhesive sheet).
 本発明の課題は、リングフレーム等の治具に対する良好な保持力と、ピックアップ時における剥離性に優れ、かつ、第2粘着剤層と粘着シートにおける粘着剤層(第1粘着剤層)との接着性の低下に起因した不具合を防止することができる保護膜形成用複合シートを提供することである。 An object of the present invention is to provide a good holding force for a jig such as a ring frame, excellent releasability at the time of pick-up, and a second adhesive layer and an adhesive layer (first adhesive layer) in the adhesive sheet. An object of the present invention is to provide a composite sheet for forming a protective film that can prevent problems caused by a decrease in adhesiveness.
 本発明は以下の要旨を含む。
〔1〕基材及び第1粘着剤層を構成層として含む粘着シートの第1粘着剤層上に、保護膜形成用フィルムが第2粘着剤層を介して設けられた保護膜形成用複合シートであって、
 第2粘着剤層の平面視における形状が、粘着シートの平面視における形状に含まれる形状であり、
 第1粘着剤層が、エネルギー線硬化性粘着剤またはエネルギー線硬化性粘着剤を硬化させた粘着剤からなり、
 第2粘着剤層が、エネルギー線硬化性粘着剤を硬化させた粘着剤からなり、
 第2粘着剤層の25℃における引張弾性率が、200~2000MPaである保護膜形成用複合シート。
The present invention includes the following gist.
[1] A protective film-forming composite sheet in which a protective film-forming film is provided on a first pressure-sensitive adhesive layer of a pressure-sensitive adhesive sheet comprising a base material and a first pressure-sensitive adhesive layer as constituent layers via a second pressure-sensitive adhesive layer Because
The shape of the second pressure-sensitive adhesive layer in plan view is a shape included in the shape of the pressure-sensitive adhesive sheet in plan view,
The first pressure-sensitive adhesive layer is composed of an energy beam-curable pressure-sensitive adhesive or an energy beam-cured pressure-sensitive adhesive,
The second pressure-sensitive adhesive layer is made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive,
A composite sheet for forming a protective film, wherein the second adhesive layer has a tensile elastic modulus at 25 ° C. of 200 to 2000 MPa.
〔2〕第2粘着剤層の25℃における引張弾性率が、500~2000MPaである〔1〕に記載の保護膜形成用複合シート。 [2] The composite sheet for forming a protective film according to [1], wherein the second pressure-sensitive adhesive layer has a tensile elastic modulus at 25 ° C. of 500 to 2000 MPa.
〔3〕保護膜形成用フィルムが熱硬化性である〔1〕または〔2〕に記載の保護膜形成用複合シート。 [3] The composite sheet for forming a protective film according to [1] or [2], wherein the protective film-forming film is thermosetting.
〔4〕基材が、ポリプロピレンフィルムを1層以上含むフィルムからなる〔1〕~〔3〕のいずれかに記載の保護膜形成用複合シート。 [4] The composite sheet for forming a protective film according to any one of [1] to [3], wherein the base material is a film containing one or more layers of polypropylene film.
〔5〕粘着シートを、第2粘着剤層から剥離する粘着力測定試験において、第1粘着剤層および第2粘着剤層の少なくともいずれかが凝集破壊し、又は粘着力が0.8N/25mm以上である〔1〕~〔4〕のいずれかに記載の保護膜形成用複合シート。 [5] In an adhesive strength measurement test in which the adhesive sheet is peeled off from the second adhesive layer, at least one of the first adhesive layer and the second adhesive layer is agglomerated and broken, or the adhesive strength is 0.8 N / 25 mm. The composite sheet for forming a protective film according to any one of [1] to [4].
〔6〕上記〔1〕~〔5〕のいずれかに記載の保護膜形成用複合シートを製造する方法であって、
 粘着シートの第1粘着剤層上に第2粘着剤層を積層する工程、
 第1粘着剤層と第2粘着剤層とを積層した後に、第1粘着剤層を硬化する工程を有する保護膜形成用複合シートの製造方法。
[6] A method for producing the composite sheet for forming a protective film according to any one of [1] to [5],
A step of laminating a second pressure-sensitive adhesive layer on the first pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet,
The manufacturing method of the composite sheet for protective film formation which has the process of hardening a 1st adhesive layer, after laminating | stacking a 1st adhesive layer and a 2nd adhesive layer.
〔7〕以下の工程(1)~(3)を、この順で行う保護膜付チップの製造方法;
 工程(1):上記〔1〕~〔5〕のいずれかに記載の保護膜形成用複合シートの保護膜形成用フィルムをワークに貼付する工程、
 工程(2):保護膜形成用フィルムを加熱硬化して保護膜を得る工程、
 工程(3):保護膜と第2粘着剤層とを分離する工程。
[7] A method for manufacturing a chip with a protective film, wherein the following steps (1) to (3) are performed in this order;
Step (1): A step of attaching the protective film-forming film of the protective film-forming composite sheet according to any one of [1] to [5] to a workpiece,
Step (2): a step of heat-curing the protective film-forming film to obtain a protective film,
Step (3): A step of separating the protective film and the second pressure-sensitive adhesive layer.
 本発明の保護膜形成用複合シートによれば、リングフレーム等の治具に対して良好な保持力を有し、保護膜付チップのピックアップ性に優れ、かつ、粘着剤層(図1に示す第2粘着剤層3)と粘着シートにおける粘着剤層(図1に示す第1粘着剤層2)との接着性の低下に起因した不具合を防止することができる。 According to the composite sheet for forming a protective film of the present invention, it has a good holding power with respect to a jig such as a ring frame, is excellent in the pick-up property of a chip with a protective film, and has an adhesive layer (shown in FIG. The malfunction resulting from the adhesive fall of the 2nd adhesive layer 3) and the adhesive layer (1st adhesive layer 2 shown in FIG. 1) in an adhesive sheet can be prevented.
本発明に係る保護膜形成用複合シートの断面図を示す。Sectional drawing of the composite sheet for protective film formation which concerns on this invention is shown.
 以下、本発明の保護膜形成用複合シートの詳細を説明する。
 図1に示すように、保護膜形成用複合シート10は、基材1及び第1粘着剤層2を構成層として含む粘着シート5の第1粘着剤層2上に、保護膜形成用フィルム4が第2粘着剤層3を介して設けられている。
Hereinafter, the detail of the composite sheet for protective film formation of this invention is demonstrated.
As shown in FIG. 1, a protective film-forming composite sheet 10 is formed on a first adhesive layer 2 of an adhesive sheet 5 including a substrate 1 and a first adhesive layer 2 as constituent layers. Is provided via the second pressure-sensitive adhesive layer 3.
〔基材〕
 基材は特に限定されず、たとえばポリエチレンフィルム、ポリプロピレンフィルム、ポリブテンフィルム、ポリブタジエンフィルム、ポリメチルペンテンフィルム、ポリ塩化ビニルフィルム、塩化ビニル共重合体フィルム、ポリエチレンテレフタレートフィルム、ポリエチレンナフタレートフィルム、ポリブチレンテレフタレートフィルム、ポリウレタンフィルム、エチレン酢酸ビニル共重合体フィルム、アイオノマー樹脂フィルム、エチレン・(メタ)アクリル酸共重合体フィルム、エチレン・(メタ)アクリル酸エステル共重合体フィルム、ポリスチレンフィルム、ポリカーボネートフィルム、ポリイミドフィルム、フッ素樹脂フィルム等が用いられる。またこれらの架橋フィルムも用いられる。さらにこれらの積層フィルムであってもよい。これらのうちでも、ポリプロピレンフィルムを1層以上含むフィルムからなる基材は、耐熱性が高く、保護膜形成用フィルムの硬化時に粘着シートが貼り合わされた状態でも変形が小さく、また、変形しても復元しやすい点、ピックアップ性を維持しやすい点、エキスパンドが可能である点などから好ましい。
〔Base material〕
The substrate is not particularly limited. For example, polyethylene film, polypropylene film, polybutene film, polybutadiene film, polymethylpentene film, polyvinyl chloride film, vinyl chloride copolymer film, polyethylene terephthalate film, polyethylene naphthalate film, polybutylene terephthalate. Film, polyurethane film, ethylene vinyl acetate copolymer film, ionomer resin film, ethylene / (meth) acrylic acid copolymer film, ethylene / (meth) acrylic acid ester copolymer film, polystyrene film, polycarbonate film, polyimide film A fluororesin film or the like is used. These crosslinked films are also used. Furthermore, these laminated films may be sufficient. Among these, the base material composed of a film containing one or more layers of polypropylene film has high heat resistance, and the deformation is small even when the adhesive sheet is bonded when the protective film-forming film is cured. It is preferable because it can be easily restored, can easily maintain pickup properties, and can be expanded.
 基材の厚さは特に限定されず、好ましくは30~300μm、より好ましくは50~200μmである。基材の厚みを上記範囲とすることで、保護膜形成用複合シートが十分な可とう性を有するため、ワーク(例えば半導体ウエハ等)に対して良好な貼付性を示す。 The thickness of the substrate is not particularly limited, and is preferably 30 to 300 μm, more preferably 50 to 200 μm. By setting the thickness of the base material within the above range, the composite sheet for forming a protective film has sufficient flexibility, and therefore exhibits good adhesiveness to a workpiece (for example, a semiconductor wafer).
 また、基材が第1粘着剤層と接する面には、第1粘着剤層との接着性を向上させるために、コロナ処理を施したり、プライマー等の他の層を設けてもよい。 Moreover, in order to improve the adhesiveness with the first pressure-sensitive adhesive layer, the surface where the base material is in contact with the first pressure-sensitive adhesive layer may be subjected to corona treatment or other layers such as a primer.
〔第1粘着剤層〕
 第1粘着剤層は、エネルギー線硬化性粘着剤またはエネルギー線硬化性粘着剤を硬化させた粘着剤からなる。
 第1粘着剤層を上記の粘着剤で構成することで、後述する第2粘着剤層との接着性を向上させることができる。これは、第1粘着剤層と後述する第2粘着剤層とに含まれるエネルギー線硬化性粘着剤におけるエネルギー線重合性基が結合した構造や、エネルギー線重合性基同士の親和性が高いこと、また、場合によってエネルギー線重合性基同士が結合することに起因すると考えられる。なお、第1粘着剤層や第2粘着剤層がエネルギー線硬化性粘着剤を硬化させた粘着剤からなるものであり、硬化済みであっても、残存しているエネルギー線重合性基(未反応のエネルギー線重合性基)が存在するために、エネルギー線重合性基同士の結合は発生しうると考えられる。また、後述する保護膜形成用複合シートの製造工程において、第1粘着剤層と第2粘着剤層を積層した後にエネルギー線照射を行わない場合であっても、エネルギー線重合性基同士が結合する反応は、第1粘着剤層と第2粘着剤層の積層後、緩やかに進行し、結合が生成するものと考えられる。
 その結果、保護膜付チップを製造する際に、保護膜形成用フィルムを加熱硬化して得られる保護膜と第2粘着剤層との間の接着力よりも、第1粘着剤層と第2粘着剤層との間の接着力の方がより強いことに起因して、保護膜と第2粘着剤層との間での剥離を行うことが容易となる。
[First adhesive layer]
A 1st adhesive layer consists of an adhesive which hardened | cured energy-beam curable adhesive or energy-beam curable adhesive.
By constituting the first pressure-sensitive adhesive layer with the above-mentioned pressure-sensitive adhesive, it is possible to improve the adhesion with the second pressure-sensitive adhesive layer described later. This is because the energy ray-polymerizable groups in the energy ray-curable pressure-sensitive adhesive contained in the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer, which will be described later, have a high affinity between the energy ray-polymerizable groups. Moreover, it is thought that it originates in energy beam polymeric groups couple | bonding depending on the case. Note that the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are made of a pressure-sensitive adhesive obtained by curing the energy ray-curable pressure-sensitive adhesive. It is considered that the bond between the energy beam polymerizable groups can occur because the energy beam polymerizable group) of the reaction exists. Moreover, in the manufacturing process of the protective film-forming composite sheet described later, even when energy beam irradiation is not performed after laminating the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer, the energy beam polymerizable groups are bonded to each other. This reaction is considered to proceed slowly after the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are laminated, and a bond is formed.
As a result, when manufacturing a chip with a protective film, the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are stronger than the adhesive force between the protective film obtained by heating and curing the protective film-forming film and the second pressure-sensitive adhesive layer. Due to the stronger adhesive force between the pressure-sensitive adhesive layer, it becomes easy to perform separation between the protective film and the second pressure-sensitive adhesive layer.
  本発明におけるエネルギー線重合性基は、重合性の炭素-炭素二重結合を有する官能基であり、具体的な例としてはビニル基、アリル基、(メタ)アクリロイル基などが挙げられ、好ましくは(メタ)アクリロイル基が挙げられる。本発明におけるエネルギー線重合性基は、ラジカル存在下でラジカルを生成して重付加反応を容易に起こすため、重合性を有しない二重結合を意味しない。たとえば、エネルギー線硬化性粘着剤を構成する各成分には芳香環が含まれていてもよいが、芳香環の不飽和構造は本発明におけるエネルギー線重合性基を意味しない。 The energy beam polymerizable group in the present invention is a functional group having a polymerizable carbon-carbon double bond, and specific examples thereof include a vinyl group, an allyl group, a (meth) acryloyl group, and the like. (Meth) acryloyl group is mentioned. The energy beam polymerizable group in the present invention does not mean a double bond having no polymerizability because it generates a radical in the presence of a radical and easily causes a polyaddition reaction. For example, each component constituting the energy ray-curable pressure-sensitive adhesive may contain an aromatic ring, but the unsaturated structure of the aromatic ring does not mean the energy ray polymerizable group in the present invention.
 粘着剤は、通常重合体(A)を含有し、またエネルギー線硬化性化合物(B)を含有する。エネルギー線硬化性化合物(B)は、エネルギー線重合性基を含み、紫外線、電子線等のエネルギー線の照射を受けると重合硬化し、粘着剤の粘着性を低下させる機能を有する。
 また、上記成分(A)および(B)の性質を兼ね備えるものとして、主鎖または側鎖に、エネルギー線重合性基が結合されてなるエネルギー線硬化型重合体(以下、成分(AB)と記載する場合がある)を用いることもできる。このようなエネルギー線硬化型重合体(AB)は、重合体としての機能とエネルギー線硬化性とを兼ね備える性質を有する。
The pressure-sensitive adhesive usually contains a polymer (A) and also contains an energy ray curable compound (B). The energy ray-curable compound (B) contains an energy ray-polymerizable group, has a function of being polymerized and cured when irradiated with energy rays such as ultraviolet rays and electron beams, and reducing the adhesiveness of the pressure-sensitive adhesive.
Moreover, as what has the property of said component (A) and (B), it describes as an energy-beam curable polymer (henceforth component (AB)) by which an energy-beam polymeric group is couple | bonded with the principal chain or the side chain. May be used). Such an energy beam curable polymer (AB) has the property of having both a function as a polymer and energy beam curability.
 エネルギー線硬化性粘着剤としては特に限定されないが、アクリル系粘着剤を例として具体的に説明する。アクリル系粘着剤は、重合体(A)として、アクリル系重合体(A1)を含有する。 The energy ray-curable pressure-sensitive adhesive is not particularly limited, but will be specifically described with an acrylic pressure-sensitive adhesive as an example. The acrylic pressure-sensitive adhesive contains an acrylic polymer (A1) as the polymer (A).
 アクリル系重合体(A1)としては、従来公知のアクリル系重合体を用いることができる。アクリル系重合体(A1)の重量平均分子量(Mw)は、1万~200万であることが好ましく、10万~150万であることがより好ましい。また、アクリル系重合体(A1)のガラス転移温度(Tg)は、好ましくは-70~30℃、さらに好ましくは-60~20℃の範囲にある。 As the acrylic polymer (A1), a conventionally known acrylic polymer can be used. The weight average molecular weight (Mw) of the acrylic polymer (A1) is preferably 10,000 to 2,000,000, more preferably 100,000 to 1,500,000. The glass transition temperature (Tg) of the acrylic polymer (A1) is preferably in the range of −70 to 30 ° C., more preferably in the range of −60 to 20 ° C.
 アクリル系重合体(A1)を構成するモノマーには、少なくとも一種の(メタ)アクリル酸エステルモノマーまたはその誘導体が含まれる。
 具体的には、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、へプチル(メタ)アクリレート、オクチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ノニル(メタ)アクリレート、デシル(メタ)アクリレート、ラウリル(メタ)アクリレート、テトラデシル(メタ)アクリレート、オクタデシル(メタ)アクリレートなどのアルキル基の炭素数が1~18であるアルキル(メタ)アクリレート;シクロアルキル(メタ)アクリレート、ベンジル(メタ)アクリレート、イソボルニル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、ジシクロペンテニルオキシエチル(メタ)アクリレート、イミド(メタ)アクリレートなどの環状骨格を有する(メタ)アクリレート;ヒドロキシメチル(メタ)アクリレート、2-ヒドロキシエチル(メタ)アクリレート、2-ヒドロキシプロピル(メタ)アクリレート、2-ヒドロキシブチル(メタ)アクリレートなどの水酸基含有(メタ)アクリレート;グリシジル(メタ)アクリレート、3,4-エポキシシクロヘキシルメチル(メタ)アクリレートなどのエポキシ基含有(メタ)アクリレート;モノメチルアミノ(メタ)アクリレート、モノエチルアミノ(メタ)アクリレート、ジエチルアミノ(メタ)アクリレートなどのアミノ基含有(メタ)アクリレート;2-(メタ)アクリロイロキシエチルフタレート、2-(メタ)アクリロイロキシプロピルフタレートなどのカルボキシル基含有(メタ)アクリレート;が挙げられる。
 また、(メタ)アクリル酸、イタコン酸、酢酸ビニル、アクリロニトリル、スチレン等が共重合されていてもよい。
 これらは1種単独で用いてもよく、2種以上を併用してもよい。
The monomer constituting the acrylic polymer (A1) includes at least one (meth) acrylic acid ester monomer or a derivative thereof.
Specifically, methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl ( Alkyl groups such as (meth) acrylate, 2-ethylhexyl (meth) acrylate, nonyl (meth) acrylate, decyl (meth) acrylate, lauryl (meth) acrylate, tetradecyl (meth) acrylate, octadecyl (meth) acrylate and the like have 1 carbon atom Alkyl (meth) acrylate which is -18; cycloalkyl (meth) acrylate, benzyl (meth) acrylate, isobornyl (meth) acrylate, dicyclopentanyl (meth) acrylate, dicyclopentenyl (Meth) acrylates having a cyclic skeleton such as (meth) acrylate, dicyclopentenyloxyethyl (meth) acrylate, imide (meth) acrylate; hydroxymethyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl Hydroxyl group-containing (meth) acrylates such as (meth) acrylate and 2-hydroxybutyl (meth) acrylate; Epoxy group-containing (meth) acrylates such as glycidyl (meth) acrylate and 3,4-epoxycyclohexylmethyl (meth) acrylate; monomethyl Amino group-containing (meth) acrylates such as amino (meth) acrylate, monoethylamino (meth) acrylate, diethylamino (meth) acrylate; 2- (meth) acryloyloxyethyl phthalate And carboxyl group-containing (meth) acrylates such as 2- (meth) acryloyloxypropyl phthalate.
Further, (meth) acrylic acid, itaconic acid, vinyl acetate, acrylonitrile, styrene or the like may be copolymerized.
These may be used alone or in combination of two or more.
 なお、本明細書で(メタ)アクリルは、アクリルおよびメタクリルの両者を包含する意味で用いることがある。 In addition, in this specification, (meth) acryl may be used in the meaning including both acryl and methacryl.
 アクリル系重合体(A1)は架橋されていてもよい。アクリル系重合体(A1)を架橋する場合は、架橋される前のアクリル系重合体(A1)が水酸基等の架橋性官能基を有しており、第1粘着剤層を形成するための組成物中に架橋剤を添加する。架橋性官能基と架橋剤の有する官能基が反応することでアクリル系重合体(A1)が架橋される。アクリル系重合体(A1)を架橋することにより、第1粘着剤層の凝集力を調節することが可能となる。 The acrylic polymer (A1) may be cross-linked. In the case of crosslinking the acrylic polymer (A1), the acrylic polymer (A1) before being crosslinked has a crosslinkable functional group such as a hydroxyl group, and a composition for forming the first pressure-sensitive adhesive layer. A cross-linking agent is added to the product. The acrylic polymer (A1) is crosslinked by the reaction between the crosslinkable functional group and the functional group of the crosslinking agent. By crosslinking the acrylic polymer (A1), the cohesive force of the first pressure-sensitive adhesive layer can be adjusted.
 架橋剤としては有機多価イソシアネート化合物、有機多価イミン化合物などが挙げられる。 Examples of the crosslinking agent include organic polyvalent isocyanate compounds and organic polyvalent imine compounds.
 有機多価イソシアネート化合物としては、芳香族多価イソシアネート化合物、脂肪族多価イソシアネート化合物、脂環族多価イソシアネート化合物およびこれらの有機多価イソシアネート化合物の三量体、ならびにこれら有機多価イソシアネート化合物とポリオール化合物とを反応させて得られる末端イソシアネートウレタンプレポリマー等を挙げることができる。 Examples of organic polyvalent isocyanate compounds include aromatic polyvalent isocyanate compounds, aliphatic polyvalent isocyanate compounds, alicyclic polyvalent isocyanate compounds, trimers of these organic polyvalent isocyanate compounds, and these organic polyvalent isocyanate compounds. Examples thereof include terminal isocyanate urethane prepolymers obtained by reacting with a polyol compound.
 有機多価イソシアネート化合物として、具体的には、2,4-トリレンジイソシアネート、2,6-トリレンジイソシアネート、1,3-キシリレンジイソシアネート、1,4-キシレンジイソシアネート、ジフェニルメタン-4,4’-ジイソシアネート、ジフェニルメタン-2,4’-ジイソシアネート、3-メチルジフェニルメタンジイソシアネート、ヘキサメチレンジイソシアネート、イソホロンジイソシアネート、ジシクロヘキシルメタン-4,4’-ジイソシアネート、ジシクロヘキシルメタン-2,4’-ジイソシアネート、リジンイソシアネート、およびこれらの多価アルコールアダクト体が挙げられる。 Specific examples of the organic polyvalent isocyanate compound include 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, 1,3-xylylene diisocyanate, 1,4-xylene diisocyanate, diphenylmethane-4,4′-. Diisocyanate, diphenylmethane-2,4′-diisocyanate, 3-methyldiphenylmethane diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate, dicyclohexylmethane-4,4′-diisocyanate, dicyclohexylmethane-2,4′-diisocyanate, lysine isocyanate, and these Examples thereof include polyhydric alcohol adducts.
 有機多価イミン化合物として、具体的には、N,N’-ジフェニルメタン-4,4’-ビス(1-アジリジンカルボキシアミド)、トリメチロールプロパン-トリ-β-アジリジニルプロピオネート、テトラメチロールメタン-トリ-β-アジリジニルプロピオネートおよびN,N’-トルエン-2,4-ビス(1-アジリジンカルボキシアミド)トリエチレンメラミン等を挙げることができる。 Specific examples of organic polyvalent imine compounds include N, N′-diphenylmethane-4,4′-bis (1-aziridinecarboxamide), trimethylolpropane-tri-β-aziridinylpropionate, tetramethylol. Mention may be made of methane-tri-β-aziridinylpropionate and N, N′-toluene-2,4-bis (1-aziridinecarboxamide) triethylenemelamine.
 架橋剤は架橋する前のアクリル系重合体100質量部に対して通常0.01~20質量部、好ましくは0.1~15質量部、より好ましくは0.5~12質量部の比率で用いられる。 The crosslinking agent is usually used in a ratio of 0.01 to 20 parts by weight, preferably 0.1 to 15 parts by weight, more preferably 0.5 to 12 parts by weight with respect to 100 parts by weight of the acrylic polymer before crosslinking. It is done.
 本発明において、第1粘着剤層を構成する成分の含有量の態様について、アクリル系重合体の含有量を基準として定める場合、アクリル系重合体が架橋されたアクリル系重合体であるときは、その基準とする含有量は、架橋される前のアクリル系重合体の含有量である。 In the present invention, for the aspect of the content of the component constituting the first pressure-sensitive adhesive layer, when determining the content of the acrylic polymer as a reference, when the acrylic polymer is a crosslinked acrylic polymer, The reference content is the content of the acrylic polymer before being crosslinked.
 エネルギー線硬化性化合物(B)は、紫外線、電子線等のエネルギー線の照射を受けると重合硬化する化合物である。このエネルギー線硬化性化合物の例としては、エネルギー線重合性基を有する低分子量化合物(単官能、多官能のモノマーおよびオリゴマー)が挙げられ、具体的には、トリメチロールプロパントリアクリレート、テトラメチロールメタンテトラアクリレート、ペンタエリスリトールトリアクリレート、ジペンタエリスリトールモノヒドロキシペンタアクリレート、ジペンタエリスリトールヘキサアクリレート、1,4-ブチレングリコールジアクリレート、1,6-ヘキサンジオールジアクリレートなどのアクリレート、ジシクロペンタジエンジメトキシジアクリレート、イソボルニルアクリレートなどの環状脂肪族骨格含有アクリレート、ポリエチレングリコールジアクリレート、オリゴエステルアクリレート、ウレタンアクリレートオリゴマー、エポキシ変性アクリレート、ポリエーテルアクリレート、イタコン酸オリゴマーなどのアクリレート系化合物が用いられる。このような化合物は、分子内にエネルギー線重合性基を有し、通常は、分子量が100~30000、好ましくは300~10000程度である。 The energy ray-curable compound (B) is a compound that is polymerized and cured when irradiated with energy rays such as ultraviolet rays and electron beams. Examples of the energy ray curable compounds include low molecular weight compounds (monofunctional and polyfunctional monomers and oligomers) having an energy ray polymerizable group, and specifically include trimethylolpropane triacrylate and tetramethylolmethane. Acrylates such as tetraacrylate, pentaerythritol triacrylate, dipentaerythritol monohydroxypentaacrylate, dipentaerythritol hexaacrylate, 1,4-butylene glycol diacrylate, 1,6-hexanediol diacrylate, dicyclopentadiene dimethoxydiacrylate, Cyclic aliphatic skeleton-containing acrylates such as isobornyl acrylate, polyethylene glycol diacrylate, oligoester acrylate, urethane acrylate Goma, epoxy-modified acrylates, polyether acrylates, acrylate compounds such as itaconic acid oligomer is used. Such a compound has an energy ray polymerizable group in the molecule and usually has a molecular weight of about 100 to 30,000, preferably about 300 to 10,000.
 一般的には成分(A)(後述するエネルギー線硬化型重合体(AB)を含む)100質量部に対して、エネルギー線重合性基を有する低分子量化合物は好ましくは0~200質量部、より好ましくは1~100質量部、さらに好ましくは、1~30質量部程度の割合で用いられる。 In general, the amount of the low molecular weight compound having an energy ray polymerizable group is preferably 0 to 200 parts by mass relative to 100 parts by mass of the component (A) (including the energy ray curable polymer (AB) described later). The ratio is preferably 1 to 100 parts by mass, more preferably about 1 to 30 parts by mass.
 上記成分(A)および(B)の性質を兼ね備えるエネルギー線硬化型重合体(AB)は、重合体の主鎖、側鎖または末端に、エネルギー線重合性基が結合されてなる。 The energy beam curable polymer (AB) having the properties of the components (A) and (B) is formed by bonding an energy beam polymerizable group to the main chain, side chain or terminal of the polymer.
 エネルギー線硬化型重合体の主鎖、側鎖または末端に結合するエネルギー線重合性基は、アルキレン基、アルキレンオキシ基、ポリアルキレンオキシ基を介してエネルギー線硬化型重合体の主鎖、側鎖または末端に結合していてもよい。 The energy ray curable polymer bonded to the main chain, side chain or terminal of the energy ray curable polymer is an alkylene group, alkyleneoxy group or polyalkyleneoxy group via the main chain or side chain of the energy ray curable polymer. Or you may couple | bond with the terminal.
 エネルギー線硬化型重合体(AB)の重量平均分子量(Mw)は、1万~200万であることが好ましく、10万~150万であることがより好ましい。また、エネルギー線硬化型重合体(AB)のガラス転移温度(Tg)は、好ましくは-70~30℃、より好ましくは-60~20℃の範囲にある。なお、後述するヒドロキシ基等の官能基を含有するアクリル系重合体と、重合性基含有化合物とを反応させて得たエネルギー線硬化型重合体(AB)の場合には、Tgは重合性基含有化合物と反応させる前のアクリル系重合体のTgである。 The weight average molecular weight (Mw) of the energy beam curable polymer (AB) is preferably 10,000 to 2,000,000, and more preferably 100,000 to 1,500,000. The glass transition temperature (Tg) of the energy beam curable polymer (AB) is preferably in the range of −70 to 30 ° C., more preferably −60 to 20 ° C. In the case of an energy ray curable polymer (AB) obtained by reacting an acrylic polymer containing a functional group such as a hydroxy group described later with a polymerizable group-containing compound, Tg is a polymerizable group. It is Tg of the acrylic polymer before making it react with a containing compound.
 エネルギー線硬化型重合体(AB)は、例えば、ヒドロキシ基、カルボキシル基、アミノ基、置換アミノ基、エポキシ基等の官能基を含有するアクリル系重合体と、該官能基と反応する置換基とエネルギー線重合性炭素-炭素二重結合を1分子毎に1~5個を有する重合性基含有化合物とを反応させて得られる。アクリル系重合体は、ヒドロキシ基、カルボキシル基、アミノ基、置換アミノ基、エポキシ基等の官能基を有する(メタ)アクリル酸エステルモノマーまたはその誘導体と、前述した成分(A)を構成するモノマーとからなる共重合体であることが好ましい。該重合性基含有化合物としては、(メタ)アクリロイルオキシエチルイソシアネート、メタ-イソプロペニル-α,α-ジメチルベンジルイソシアネート、(メタ)アクリロイルイソシアネート、アリルイソシアネート、グリシジル(メタ)アクリレート、(メタ)アクリル酸等が挙げられる。 The energy ray curable polymer (AB) includes, for example, an acrylic polymer containing a functional group such as a hydroxy group, a carboxyl group, an amino group, a substituted amino group, and an epoxy group, and a substituent that reacts with the functional group. It is obtained by reacting a polymerizable group-containing compound having 1 to 5 energy beam polymerizable carbon-carbon double bonds per molecule. The acrylic polymer includes a (meth) acrylic acid ester monomer having a functional group such as a hydroxy group, a carboxyl group, an amino group, a substituted amino group, and an epoxy group or a derivative thereof, and a monomer constituting the component (A) described above. A copolymer consisting of Examples of the polymerizable group-containing compound include (meth) acryloyloxyethyl isocyanate, meta-isopropenyl-α, α-dimethylbenzyl isocyanate, (meth) acryloyl isocyanate, allyl isocyanate, glycidyl (meth) acrylate, and (meth) acrylic acid. Etc.
 エネルギー線硬化型重合体(AB)を、ヒドロキシ基等の官能基を含有するアクリル系重合体と、重合性基含有化合物とを反応させて得た場合、エネルギー線硬化型重合体(AB)は、上述のアクリル系重合体(A1)同様、架橋されていてもよい。 When the energy ray curable polymer (AB) is obtained by reacting an acrylic polymer containing a functional group such as a hydroxy group with a polymerizable group-containing compound, the energy ray curable polymer (AB) is Like the above-mentioned acrylic polymer (A1), it may be crosslinked.
 上記のようなアクリル系重合体(A1)、エネルギー線硬化性化合物(B)及び/又は、エネルギー線硬化型重合体(AB)を含むアクリル系粘着剤は、エネルギー線照射により硬化する。エネルギー線としては、具体的には、紫外線、電子線等が用いられる。 The acrylic pressure-sensitive adhesive containing the acrylic polymer (A1), the energy ray curable compound (B) and / or the energy ray curable polymer (AB) as described above is cured by irradiation with energy rays. Specifically, ultraviolet rays, electron beams, etc. are used as the energy rays.
 また、エネルギー線硬化性化合物(B)や、エネルギー線硬化型重合体(AB)に光重合開始剤を組み合わせることで、重合硬化時間を短くし、ならびに光線照射量を少なくすることができる。 Also, by combining a photopolymerization initiator with the energy beam curable compound (B) or the energy beam curable polymer (AB), the polymerization curing time can be shortened and the amount of light irradiation can be decreased.
 このような光重合開始剤としては、ベンゾフェノン、アセトフェノン、ベンゾイン、ベンゾインメチルエーテル、ベンゾインエチルエーテル、ベンゾインイソプロピルエーテル、ベンゾインイソブチルエーテル、ベンゾイン安息香酸、ベンゾイン安息香酸メチル、ベンゾインジメチルケタール、2,4-ジエチルチオキサンソン、α-ヒドロキシシクロヘキシルフェニルケトン、ベンジルジフェニルサルファイド、テトラメチルチウラムモノサルファイド、アゾビスイソブチロニトリル、ベンジル、ジベンジル、ジアセチル、1,2-ジフェニルメタン、2-ヒドロキシ-2-メチル-1-[4-(1-メチルビニル)フェニル]プロパノン、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイドおよびβ-クロールアンスラキノンなどが挙げられる。光重合開始剤は1種類単独で、または2種類以上を組み合わせて用いることができる。 Examples of such photopolymerization initiators include benzophenone, acetophenone, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzoin benzoic acid, benzoin methyl benzoate, benzoin dimethyl ketal, 2,4-diethyl Thioxanthone, α-hydroxycyclohexyl phenyl ketone, benzyldiphenyl sulfide, tetramethylthiuram monosulfide, azobisisobutyronitrile, benzyl, dibenzyl, diacetyl, 1,2-diphenylmethane, 2-hydroxy-2-methyl-1- [4- (1-Methylvinyl) phenyl] propanone, 2,4,6-trimethylbenzoyldiphenylphosphine oxide and β-chloranth Examples include laquinone. A photoinitiator can be used individually by 1 type or in combination of 2 or more types.
 光重合開始剤の配合割合は、エネルギー線硬化性化合物(B)やエネルギー線硬化型重合体(AB)100質量部に対して0.1~10質量部含まれることが好ましく、1~5質量部含まれることがより好ましい。
 光重合開始剤の配合割合が0.1質量部未満であると光重合の不足で満足な硬化性が得られないことがあり、10質量部を超えると光重合に寄与しない残留物が生成し、不具合の原因となることがある。
The blending ratio of the photopolymerization initiator is preferably 0.1 to 10 parts by mass with respect to 100 parts by mass of the energy beam curable compound (B) and the energy beam curable polymer (AB), and is preferably 1 to 5 parts by mass. More preferably, it is included.
If the blending ratio of the photopolymerization initiator is less than 0.1 parts by mass, satisfactory curability may not be obtained due to insufficient photopolymerization, and if it exceeds 10 parts by mass, a residue that does not contribute to photopolymerization is generated. May cause malfunctions.
 第1粘着剤層は、エネルギー線硬化性粘着剤を硬化させた粘着剤からなる粘着剤層であってもよい。エネルギー線硬化性粘着剤を硬化させた粘着剤からなる粘着剤層は、後述する保護膜形成用複合シートの製造方法において説明するエネルギー線照射により、エネルギー線硬化性粘着剤を硬化させて得られるものである。なお、後述の第2粘着剤層についても同様である。 The first pressure-sensitive adhesive layer may be a pressure-sensitive adhesive layer made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive. The pressure-sensitive adhesive layer made of the pressure-sensitive adhesive obtained by curing the energy beam-curable pressure-sensitive adhesive is obtained by curing the energy beam-curable pressure-sensitive adhesive by energy beam irradiation described in the method for producing a protective film-forming composite sheet described later. Is. The same applies to the second pressure-sensitive adhesive layer described later.
 第1粘着剤層の厚さは特に限定されないが、好ましくは3~80μm、さらに好ましくは4~50μm、特に好ましくは5~30μmである。 The thickness of the first pressure-sensitive adhesive layer is not particularly limited, but is preferably 3 to 80 μm, more preferably 4 to 50 μm, and particularly preferably 5 to 30 μm.
〔第2粘着剤層〕
 第2粘着剤層は、エネルギー線硬化性粘着剤を硬化させた粘着剤からなる。エネルギー線硬化性粘着剤としては、上述した第1粘着剤層におけるエネルギー線硬化性粘着剤と同様のものを用いることができるが、保護膜形成用フィルムへの低分子量成分(例えばエネルギー線硬化性化合物等)の移行を抑制するという観点から、エネルギー線硬化性粘着剤としてエネルギー線硬化型重合体を用いることが好ましい。保護膜形成用フィルムに低分子量成分が移行すると、保護膜形成用フィルムの硬化性が低下し、保護膜付チップを用いた半導体装置の信頼性に劣ることがある。なお、エネルギー線硬化型重合体は特に限定されず、例えば第1粘着剤層に含まれるエネルギー線硬化型粘着剤と同様のものを用いることができる。
[Second adhesive layer]
A 2nd adhesive layer consists of an adhesive which hardened the energy-beam curable adhesive. As the energy ray-curable pressure-sensitive adhesive, the same one as the energy ray-curable pressure-sensitive adhesive in the first pressure-sensitive adhesive layer described above can be used, but a low molecular weight component (for example, energy ray-curable property) to the protective film-forming film. From the viewpoint of suppressing the migration of the compound and the like, it is preferable to use an energy beam curable polymer as the energy beam curable adhesive. When the low molecular weight component is transferred to the protective film-forming film, the curability of the protective film-forming film is lowered, and the reliability of the semiconductor device using the chip with the protective film may be deteriorated. The energy ray curable polymer is not particularly limited, and for example, the same energy ray curable pressure sensitive adhesive contained in the first pressure sensitive adhesive layer can be used.
 また、第2粘着剤層の25℃における引張弾性率は200~2000MPaである。
 このような構成の第2粘着剤層によれば、第1粘着剤層との接着性に優れる一方、保護膜との剥離性に優れるため、保護膜付チップのピックアップ性が向上する。第2粘着剤層の25℃における引張弾性率は好ましくは500~2000MPa、より好ましくは500~1500MPaである。このような範囲であれば、保護膜付チップのピックアップ性が一層向上する。特に、保護膜形成用複合シートの粘着シートを除去せずに、保護膜形成用フィルムを粘着シートごと熱硬化工程に投入した場合であっても、保護膜付チップのピックアップ性が優れたものとなる。第2粘着剤層の25℃における引張弾性率は、アクリル系重合体を構成する単量体を選択することにより制御できる。なかでも、酢酸ビニルの配合量を調整することにより第2粘着剤層の25℃における引張弾性率の制御が容易となる。また、エネルギー線硬化型重合体を用いる場合には、官能基を含有するアクリル系重合体に反応させる重合性基含有化合物の配合量により第2粘着剤層の25℃における引張弾性率を制御できる。
Further, the tensile elastic modulus at 25 ° C. of the second pressure-sensitive adhesive layer is 200 to 2000 MPa.
According to the 2nd adhesive layer of such composition, while being excellent in adhesiveness with the 1st adhesive layer, since it is excellent in releasability from a protective film, the pick-up property of a chip with a protective film improves. The tensile elastic modulus at 25 ° C. of the second pressure-sensitive adhesive layer is preferably 500 to 2000 MPa, more preferably 500 to 1500 MPa. If it is such a range, the pick-up property of the chip | tip with a protective film will improve further. In particular, even when the protective film-forming film is put into the thermosetting process together with the adhesive sheet without removing the adhesive sheet of the protective film-forming composite sheet, the pickup property of the chip with the protective film is excellent. Become. The tensile elastic modulus at 25 ° C. of the second pressure-sensitive adhesive layer can be controlled by selecting a monomer constituting the acrylic polymer. Especially, control of the tensile elasticity modulus in 25 degreeC of a 2nd adhesive layer becomes easy by adjusting the compounding quantity of vinyl acetate. Moreover, when using an energy-beam curable polymer, the tensile elasticity modulus in 25 degreeC of a 2nd adhesive layer can be controlled with the compounding quantity of the polymeric group containing compound made to react with the acrylic polymer containing a functional group. .
 第2粘着剤層の厚さは特に限定されないが、好ましくは2~80μm、より好ましくは3~50μm、特に好ましくは5~10μmである。 The thickness of the second pressure-sensitive adhesive layer is not particularly limited, but is preferably 2 to 80 μm, more preferably 3 to 50 μm, and particularly preferably 5 to 10 μm.
 第2粘着剤層の平面視における形状は、上述した粘着シートの平面視における形状に含まれる形状であれば特に限定されず、例えばワークと略同形状またはワークの形状をそっくり含むことのできる形状が挙げられる。 The shape of the second pressure-sensitive adhesive layer in plan view is not particularly limited as long as it is a shape included in the shape of the above-described pressure-sensitive adhesive sheet in plan view. For example, the shape that can include substantially the same shape as the workpiece or the shape of the workpiece. Is mentioned.
〔保護膜形成用フィルム〕
 保護膜形成用フィルムは、(1)シート形状維持性、(2)初期接着性、(3)硬化性を有しているものであればよい。
[Protective film forming film]
The protective film-forming film may be any film having (1) sheet shape maintaining property, (2) initial adhesiveness, and (3) curability.
 保護膜形成用フィルムには、バインダー成分の添加により(1)シート形状維持性および(3)硬化性を付与することができ、バインダー成分としては、重合体成分および硬化性成分を含有する第1のバインダー成分または重合体成分および硬化性成分の性質を兼ね備えた硬化性重合体成分を含有する第2のバインダー成分を用いることができる。 The protective film-forming film can be provided with (1) sheet shape maintainability and (3) curability by adding a binder component, and the binder component includes a first component containing a polymer component and a curable component. A second binder component containing a curable polymer component having the properties of a binder component or a polymer component and a curable component can be used.
 保護膜形成用フィルムを硬化までの間、ワークに仮着させておくための機能である(2)初期接着性は、感圧接着性であってもよく、熱により軟化して接着する性質であってもよい。(2)初期接着性は、通常バインダー成分の諸特性や、後述する無機フィラーの配合量の調整などにより制御される。 (2) The initial adhesiveness may be pressure-sensitive adhesiveness, and is a property of being softened and bonded by heat. There may be. (2) The initial adhesiveness is usually controlled by adjusting various properties of the binder component and adjusting the blending amount of the inorganic filler described later.
 (第1のバインダー成分)
 第1のバインダー成分は、重合体成分と硬化性成分を含有することにより、保護膜形成用フィルムにシート形状維持性と硬化性を付与する。なお、第1のバインダー成分は、第2のバインダー成分と区別する便宜上、硬化性重合体成分を含有しない。
(First binder component)
A 1st binder component provides a sheet | seat shape maintainability and curability to the film for protective film formation by containing a polymer component and a sclerosing | hardenable component. In addition, the 1st binder component does not contain a curable polymer component for convenience to distinguish from the 2nd binder component.
(a)重合体成分
 重合体成分(a)は、保護膜形成用フィルムにシート形状維持性を付与することを主目的として保護膜形成用フィルムに添加される。
(A) Polymer component The polymer component (a) is added to the protective film-forming film mainly for the purpose of imparting sheet shape maintenance to the protective film-forming film.
 上記の目的を達成するため、重合体成分(a)の重量平均分子量(Mw)は、通常20,000以上であり、20,000~3,000,000であることが好ましい。重量平均分子量(Mw)の値は、ゲル・パーミエーション・クロマトグラフィー法(GPC)法(ポリスチレン標準)により測定される場合の値である。このような方法による測定は、たとえば、東ソー社製の高速GPC装置「HLC-8120GPC」に、高速カラム「TSK gurd column HXL-H」、「TSK Gel GMHXL」、「TSK Gel G2000 HXL」(以上、全て東ソー社製)をこの順序で連結したものを用い、カラム温度:40℃、送液速度:1.0mL/分の条件で、検出器を示差屈折率計として行われる。 In order to achieve the above object, the weight average molecular weight (Mw) of the polymer component (a) is usually 20,000 or more, preferably 20,000 to 3,000,000. The value of the weight average molecular weight (Mw) is a value when measured by a gel permeation chromatography method (GPC) method (polystyrene standard). The measurement by such a method is carried out, for example, by using a high-speed GPC apparatus “HLC-8120GPC” manufactured by Tosoh Corporation and a high-speed column “TSK gold column H XL- H”, “TSK Gel GMH XL ”, “TSK Gel G2000 H XL ”. (The above, all manufactured by Tosoh Corporation) are connected in this order, and the detector is used as a differential refractometer at a column temperature of 40 ° C. and a liquid feed rate of 1.0 mL / min.
 なお、後述する硬化性重合体成分(ab)と区別する便宜上、重合体成分(a)は後述する硬化機能官能基を有しない。 In addition, for convenience to distinguish from the curable polymer component (ab) described later, the polymer component (a) does not have a curing functional functional group described later.
 重合体成分(a)としては、アクリル系重合体、ポリエステル、フェノキシ樹脂(後述する硬化性重合体と区別する便宜上、エポキシ基を有しないものに限る。)、ポリカーボネート、ポリエーテル、ポリウレタン、ポリシロキサン、ゴム系重合体等を用いることができる。また、これらの2種以上が結合したもの、たとえば、水酸基を有するアクリル重合体であるアクリルポリオールに、分子末端にイソシアネート基を有するウレタンプレポリマーを反応させることにより得られるアクリルウレタン樹脂等であってもよい。さらに、2種以上が結合した重合体を含め、これらの2種以上を組み合わせて用いてもよい。
 重合体成分(a)としてアクリル系重合体(a1)を用いる場合には、上述のアクリル系粘着剤が含有するアクリル系重合体(A1)と同じものを用いることができる。
Examples of the polymer component (a) include acrylic polymers, polyesters, phenoxy resins (for the purpose of distinguishing from curable polymers described later, those having no epoxy group), polycarbonates, polyethers, polyurethanes, polysiloxanes. A rubber polymer or the like can be used. In addition, an acrylic urethane resin obtained by reacting a urethane prepolymer having an isocyanate group at a molecular terminal with an acrylic polyol having an hydroxyl group and an acrylic polyol having a combination of two or more of these, Also good. Furthermore, two or more of these may be used in combination, including a polymer in which two or more are bonded.
When the acrylic polymer (a1) is used as the polymer component (a), the same polymer as the acrylic polymer (A1) contained in the above acrylic pressure-sensitive adhesive can be used.
 また、重合体成分(a)として、ポリエステル、フェノキシ樹脂(後述する硬化性重合体と区別する便宜上、エポキシ基を有しないものに限る。)、ポリカーボネート、ポリエーテル、ポリウレタン、ポリシロキサン、ゴム系重合体またはこれらの2種以上が結合したものから選ばれる非アクリル系樹脂(a2)の1種単独または2種以上の組み合わせを用いてもよい。このような樹脂としては、重量平均分子量が20,000~100,000のものが好ましく、20,000~80,000のものがさらに好ましい。 Further, as the polymer component (a), polyester, phenoxy resin (for the purpose of distinguishing from the curable polymer described later, limited to those having no epoxy group), polycarbonate, polyether, polyurethane, polysiloxane, rubber-based weight One type of non-acrylic resin (a2) selected from a combination or a combination of two or more types thereof or a combination of two or more types may be used. Such a resin preferably has a weight average molecular weight of 20,000 to 100,000, more preferably 20,000 to 80,000.
 非アクリル系樹脂(a2)のガラス転移温度は、好ましくは-30~150℃、さらに好ましくは-20~120℃の範囲にある。 The glass transition temperature of the non-acrylic resin (a2) is preferably in the range of −30 to 150 ° C., more preferably in the range of −20 to 120 ° C.
 非アクリル系樹脂(a2)を、アクリル系重合体(a1)と併用した場合には、後述する保護膜形成用複合シートを用いてワークへ硬化後の保護膜形成用フィルム(保護膜)を転写する際に、保護膜と第2粘着剤層の層間剥離を容易に行うことができる。また、転写面の凹凸に保護膜形成用フィルムが追従しやすくなる傾向がある。 When the non-acrylic resin (a2) is used in combination with the acrylic polymer (a1), the cured protective film-forming film (protective film) is transferred to the workpiece using a protective film-forming composite sheet described later. In doing so, delamination of the protective film and the second pressure-sensitive adhesive layer can be easily performed. Further, the protective film-forming film tends to follow the unevenness of the transfer surface.
 非アクリル系樹脂(a2)を、アクリル系重合体(a1)と併用する場合には、非アクリル系樹脂(a2)の含有量は、非アクリル系樹脂(a2)とアクリル系重合体(a1)との質量比において、通常1:99~60:40、好ましくは1:99~30:70の範囲にある。非アクリル系樹脂(a2)の含有量がこの範囲にあることにより、上記の効果をより高い程度で得ることができる。 When the non-acrylic resin (a2) is used in combination with the acrylic polymer (a1), the content of the non-acrylic resin (a2) is such that the non-acrylic resin (a2) and the acrylic polymer (a1) Is usually in the range of 1:99 to 60:40, preferably 1:99 to 30:70. When the content of the non-acrylic resin (a2) is in this range, the above effect can be obtained to a higher degree.
(b)硬化性成分
 硬化性成分(b)は、保護膜形成用フィルムに硬化性を付与することを主目的として保護膜形成用フィルムに添加される。硬化性成分(b)としては、熱硬化性成分(b1)を用いることができる。保護膜形成用フィルムが熱硬化性成分(b1)を含有する場合、保護膜形成用フィルムは熱硬化性となる。熱硬化性成分(b1)は、少なくとも加熱により反応する官能基を有する化合物を含有する。硬化性成分(b)が有する官能基同士が反応し、三次元網目構造が形成されることにより硬化が実現される。硬化性成分(b)は、重合体成分(a)と組み合わせて用いるため、保護膜形成用フィルムを形成するための塗工用組成物の粘度上昇を抑制し、取り扱い性を向上させる等の観点から、通常その重量平均分子量(Mw)は、10,000以下であり、100~10,000であることが好ましい。
(B) Curable component The curable component (b) is added to the protective film-forming film mainly for the purpose of imparting curability to the protective film-forming film. As the curable component (b), a thermosetting component (b1) can be used. When the protective film-forming film contains a thermosetting component (b1), the protective film-forming film becomes thermosetting. The thermosetting component (b1) contains at least a compound having a functional group that reacts by heating. Curing is realized by the functional groups of the curable component (b) reacting to form a three-dimensional network structure. Since the curable component (b) is used in combination with the polymer component (a), the increase in the viscosity of the coating composition for forming the protective film-forming film is suppressed, and the handleability is improved. Therefore, the weight average molecular weight (Mw) is usually 10,000 or less, preferably 100 to 10,000.
(b1)熱硬化性成分
 熱硬化性成分(b1)としては、たとえば、エポキシ系熱硬化性成分が好ましい。エポキシ系熱硬化性成分は、エポキシ基を有する化合物(b11)を含有し、エポキシ基を有する化合物(b11)と熱硬化剤(b12)を組み合わせたものを用いることが好ましい。
(B1) Thermosetting component As the thermosetting component (b1), for example, an epoxy thermosetting component is preferable. The epoxy thermosetting component preferably contains a compound (b11) having an epoxy group and a combination of the compound (b11) having an epoxy group and a thermosetting agent (b12).
(b11)エポキシ基を有する化合物
 エポキシ基を有する化合物(以下、「エポキシ化合物」ということがある。)としては、従来公知のものを用いることができる。具体的には、多官能系エポキシ樹脂や、ビスフェノールAジグリシジルエーテルやその水添物、オルソクレゾールノボラックエポキシ樹脂、ジシクロペンタジエン型エポキシ樹脂、ビフェニル型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェニレン骨格型エポキシ樹脂など、分子中に2官能以上有するエポキシ化合物が挙げられる。これらは1種単独で、または2種以上を組み合わせて用いることができる。
(B11) Compound having an epoxy group As the compound having an epoxy group (hereinafter sometimes referred to as "epoxy compound"), a conventionally known compound can be used. Specifically, polyfunctional epoxy resin, bisphenol A diglycidyl ether and its hydrogenated product, orthocresol novolac epoxy resin, dicyclopentadiene type epoxy resin, biphenyl type epoxy resin, bisphenol A type epoxy resin, bisphenol F type Examples thereof include epoxy compounds having two or more functional groups in the molecule, such as epoxy resins and phenylene skeleton type epoxy resins. These can be used individually by 1 type or in combination of 2 or more types.
 エポキシ化合物(b11)の含有量は、重合体成分(a)100質量部に対して、1~1500質量部であることが好ましく、3~1200質量部であることがより好ましい。 The content of the epoxy compound (b11) is preferably 1 to 1500 parts by mass, and more preferably 3 to 1200 parts by mass with respect to 100 parts by mass of the polymer component (a).
(b12)熱硬化剤
 熱硬化剤(b12)は、エポキシ化合物に対する硬化剤として機能する。好ましい熱硬化剤としては、1分子中にエポキシ基と反応しうる官能基を2個以上有する化合物が挙げられる。その官能基としてはフェノール性水酸基、アルコール性水酸基、アミノ基、カルボキシル基および酸無水物などが挙げられる。これらのうち好ましくはフェノール性水酸基、アミノ基、酸無水物などが挙げられ、さらに好ましくはフェノール性水酸基、アミノ基が挙げられる。
(B12) Thermosetting agent The thermosetting agent (b12) functions as a curing agent for the epoxy compound. A preferable thermosetting agent includes a compound having two or more functional groups capable of reacting with an epoxy group in one molecule. Examples of the functional group include a phenolic hydroxyl group, an alcoholic hydroxyl group, an amino group, a carboxyl group, and an acid anhydride. Of these, phenolic hydroxyl groups, amino groups, acid anhydrides and the like are preferable, and phenolic hydroxyl groups and amino groups are more preferable.
 フェノール系硬化剤(フェノール性水酸基を有する熱硬化剤)の具体的な例としては、多官能系フェノール樹脂、ビフェノール、ノボラック型フェノール樹脂、ジシクロペンタジエン系フェノール樹脂、ザイロック型フェノール樹脂、アラルキルフェノール樹脂が挙げられる。アミン系硬化剤(アミノ基を有する熱硬化剤)の具体的な例としては、DICY(ジシアンジアミド)が挙げられる。これらは、1種単独で、または2種以上混合して使用することができる。 Specific examples of phenolic curing agents (thermosetting agents having a phenolic hydroxyl group) include polyfunctional phenolic resins, biphenols, novolac phenolic resins, dicyclopentadiene phenolic resins, zylocic phenolic resins, and aralkyl phenolic resins. Is mentioned. A specific example of the amine curing agent (thermosetting agent having an amino group) is DICY (dicyandiamide). These can be used individually by 1 type or in mixture of 2 or more types.
 熱硬化剤(b12)の含有量は、エポキシ化合物100質量部に対して、0.1~500質量部であることが好ましく、1~200質量部であることがより好ましい。 The content of the thermosetting agent (b12) is preferably 0.1 to 500 parts by mass, and more preferably 1 to 200 parts by mass with respect to 100 parts by mass of the epoxy compound.
(b13)硬化促進剤
 硬化促進剤(b13)を、保護膜形成用フィルムの熱硬化の速度を調整するために用いてもよい。硬化促進剤(b13)は、特に、熱硬化性成分として、エポキシ系熱硬化性成分を用いるときに好ましく用いられる。
(B13) Curing accelerator The curing accelerator (b13) may be used to adjust the rate of thermal curing of the protective film-forming film. The curing accelerator (b13) is preferably used particularly when an epoxy thermosetting component is used as the thermosetting component.
 好ましい硬化促進剤(b13)としては、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン、ジメチルアミノエタノール、トリス(ジメチルアミノメチル)フェノールなどの3級アミン類;2-メチルイミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール、2-フェニル-4,5-ジヒドロキシメチルイミダゾール、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾールなどのイミダゾール類;トリブチルホスフィン、ジフェニルホスフィン、トリフェニルホスフィンなどの有機ホスフィン類;テトラフェニルホスホニウムテトラフェニルボレート、トリフェニルホスフィンテトラフェニルボレートなどのテトラフェニルボロン塩などが挙げられる。これらは1種単独で、または2種以上混合して使用することができる。 Preferred curing accelerators (b13) include tertiary amines such as triethylenediamine, benzyldimethylamine, triethanolamine, dimethylaminoethanol, tris (dimethylaminomethyl) phenol; 2-methylimidazole, 2-phenylimidazole, 2 -Imidazoles such as phenyl-4-methylimidazole, 2-phenyl-4,5-dihydroxymethylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole; organics such as tributylphosphine, diphenylphosphine, triphenylphosphine Phosphines; and tetraphenylboron salts such as tetraphenylphosphonium tetraphenylborate and triphenylphosphinetetraphenylborate. These can be used individually by 1 type or in mixture of 2 or more types.
 硬化促進剤(b13)は、エポキシ化合物(b11)および熱硬化剤(b12)の合計量100質量部に対して、好ましくは0.01~10質量部、さらに好ましくは0.1~2質量部の量で含まれる。硬化促進剤(b13)を上記範囲の量で含有することにより、高温度高湿度下に曝されても、保護膜形成用フィルムはワークに対して優れた接着性を有し、厳しいリフロー条件に曝された場合であっても高い信頼性を達成することができる。硬化促進剤(b13)の含有量が少ないと硬化不足で十分な接着性が得られず、過剰であると高い極性をもつ硬化促進剤(b13)は高温度高湿度下で保護膜形成用フィルム中を接着界面側に移動し、偏析することにより半導体装置の信頼性を低下させることがある。 The curing accelerator (b13) is preferably 0.01 to 10 parts by mass, more preferably 0.1 to 2 parts by mass with respect to 100 parts by mass of the total amount of the epoxy compound (b11) and the thermosetting agent (b12). Included in the amount of. By containing the curing accelerator (b13) in an amount within the above range, the protective film-forming film has excellent adhesion to the workpiece even under exposure to high temperatures and high humidity, and is subjected to severe reflow conditions. High reliability can be achieved even when exposed. If the content of the curing accelerator (b13) is low, sufficient adhesion cannot be obtained due to insufficient curing, and if it is excessive, the curing accelerator (b13) having high polarity is a film for forming a protective film under high temperature and high humidity. By moving the inside to the adhesion interface side and segregating, the reliability of the semiconductor device may be lowered.
 (第2のバインダー成分)
 第2のバインダー成分は、硬化性重合体成分(ab)を含有することにより、保護膜形成用フィルムに造膜性(シート形成性)と硬化性を付与する。
(Second binder component)
By containing the curable polymer component (ab), the second binder component imparts film forming properties (sheet forming properties) and curability to the protective film forming film.
(ab)硬化性重合体成分
 硬化性重合体成分(ab)は、硬化機能官能基を有する重合体である。硬化機能官能基は、互いに反応して三次元網目構造を構成しうる官能基であり、加熱により反応する官能基が挙げられる。
(Ab) Curable polymer component The curable polymer component (ab) is a polymer having a functional functional group. The curing functional group is a functional group that can react with each other to form a three-dimensional network structure, and includes a functional group that reacts by heating.
 硬化機能官能基は、硬化性重合体の骨格となる連続構造の単位中に付加していてもよいし、末端に付加していてもよい。硬化機能官能基が硬化性重合体成分の骨格となる連続構造の単位中に付加している場合、硬化機能官能基は側鎖に付加していてもよいし、主鎖に直接付加していてもよい。硬化性重合体成分(ab)の重量平均分子量(Mw)は、保護膜形成用フィルムにシート形状維持性を付与する目的を達成する観点から、通常20,000以上である。 The functional functional group may be added to the unit of the continuous structure that becomes the skeleton of the curable polymer, or may be added to the terminal. When the functional functional group is added in the unit of the continuous structure that becomes the skeleton of the curable polymer component, the functional functional group may be added to the side chain or directly to the main chain. Also good. The weight average molecular weight (Mw) of the curable polymer component (ab) is usually 20,000 or more from the viewpoint of achieving the purpose of imparting sheet shape maintainability to the protective film-forming film.
 加熱により反応する官能基としてはエポキシ基が挙げられる。エポキシ基を有する硬化性重合体成分としては、エポキシ基を有するフェノキシ樹脂が挙げられ、具体的な製品名としては、三菱化学株式会社製のjER1256、jER4250等が挙げられる。 The functional group that reacts by heating includes an epoxy group. Examples of the curable polymer component having an epoxy group include phenoxy resins having an epoxy group, and specific product names include jER1256 and jER4250 manufactured by Mitsubishi Chemical Corporation.
 また、エポキシ基を有する硬化性重合体成分は、上述のアクリル系重合体(a1)と同様の重合体であって、単量体として、エポキシ基を有する単量体を用いて重合したもの(エポキシ基含有アクリル系重合体)であってもよい。このような単量体としては、たとえばグリシジル(メタ)アクリレート等のエポキシ基含有(メタ)アクリレートが挙げられる。 Moreover, the curable polymer component which has an epoxy group is a polymer similar to the above-mentioned acrylic polymer (a1), and is polymerized using a monomer having an epoxy group as a monomer ( Epoxy group-containing acrylic polymer). Examples of such a monomer include epoxy group-containing (meth) acrylates such as glycidyl (meth) acrylate.
 エポキシ基含有アクリル系重合体を用いる場合、その好ましい態様はアクリル系重合体(a1)と同様である。 When an epoxy group-containing acrylic polymer is used, the preferred embodiment is the same as that of the acrylic polymer (a1).
 エポキシ基を有する硬化性重合体成分を用いる場合には、硬化性成分としてエポキシ系熱硬化性成分を用いる場合と同様、熱硬化剤(b12)や、硬化促進剤(b13)を併用してもよい。 When a curable polymer component having an epoxy group is used, a thermosetting agent (b12) or a curing accelerator (b13) may be used in the same manner as in the case of using an epoxy thermosetting component as the curable component. Good.
 第2のバインダー成分は、硬化性重合体成分(ab)と併せて、上述の重合体成分(a)や硬化性成分(b)を含有していてもよい。 The second binder component may contain the above-described polymer component (a) and curable component (b) together with the curable polymer component (ab).
 保護膜形成用フィルムが熱硬化性成分(b1)および硬化性重合体成分(ab)のいずれか単独または両方を含有する場合には、保護膜形成用フィルムは熱硬化性を有することとなる。より十分な熱硬化性を保護膜形成用フィルムに付与するためには、保護膜形成用フィルムが少なくとも熱硬化性成分(b1)を含有していることが好ましい。しかしながら、保護膜形成用フィルムが熱硬化性成分(b1)のみを含有する場合には、保護膜形成用フィルムのシート形状維持性が劣ることがある。そこで、保護膜形成用フィルムは、熱硬化性成分(b1)と、重合体成分(a)および硬化性重合体成分(ab)のいずれか単独または両方と、を含有することが好ましい。 When the protective film-forming film contains one or both of the thermosetting component (b1) and the curable polymer component (ab), the protective film-forming film has thermosetting properties. In order to impart more sufficient thermosetting property to the protective film-forming film, it is preferable that the protective film-forming film contains at least the thermosetting component (b1). However, when the protective film-forming film contains only the thermosetting component (b1), the sheet shape maintaining property of the protective film-forming film may be inferior. Therefore, the protective film-forming film preferably contains a thermosetting component (b1) and one or both of the polymer component (a) and the curable polymer component (ab).
 保護膜形成用フィルムにさらに十分な熱硬化性を付与する観点から、保護膜形成用フィルムが含有する熱硬化性成分(b1)の量は、重合体成分(a)および硬化性重合体成分(ab)の合計100質量部に対して、50~300質量部であることが好ましく、70~250質量部であることがより好ましい。 From the viewpoint of imparting sufficient thermosetting property to the protective film-forming film, the amount of the thermosetting component (b1) contained in the protective film-forming film is determined by the polymer component (a) and the curable polymer component ( The total amount of ab) is preferably 50 to 300 parts by mass, more preferably 70 to 250 parts by mass with respect to 100 parts by mass in total.
 保護膜形成用フィルムには、バインダー成分のほか、以下の成分を含有させてもよい。 The protective film-forming film may contain the following components in addition to the binder component.
(c)無機フィラー
 保護膜形成用フィルムは、無機フィラー(c)を含有していてもよい。無機フィラー(c)を保護膜形成用フィルムに配合することにより、硬化後の保護膜形成用フィルムにおける熱膨張係数を調整することが可能となり、ワークに対して硬化後の保護膜形成用フィルムの熱膨張係数を最適化することで半導体装置の信頼性を向上させることができる。また、硬化後の保護膜形成用フィルムの吸湿率を低減させることも可能となる。
(C) The inorganic filler protective film-forming film may contain an inorganic filler (c). By blending the inorganic filler (c) into the protective film-forming film, the thermal expansion coefficient of the cured protective film-forming film can be adjusted, and the protective film-forming film after curing with respect to the workpiece can be adjusted. The reliability of the semiconductor device can be improved by optimizing the thermal expansion coefficient. It is also possible to reduce the moisture absorption rate of the protective film-forming film after curing.
 好ましい無機フィラー(c)としては、シリカ、アルミナ、タルク、炭酸カルシウム、酸化チタン、酸化鉄、炭化珪素、窒化ホウ素等の粉末、これらを球形化したビーズ、単結晶繊維およびガラス繊維等が挙げられる。これらのなかでも、シリカフィラーおよびアルミナフィラーが好ましい。上記無機フィラーは単独でまたは2種以上を混合して使用することができる。上述の効果をより確実に得るための、無機フィラー(c)の含有量の範囲としては、保護膜形成用フィルムを構成する全固形分100質量部に対して、好ましくは1~80質量部、より好ましくは5~75質量部、特に好ましくは15~60質量部である。 Preferable inorganic fillers (c) include silica, alumina, talc, calcium carbonate, titanium oxide, iron oxide, silicon carbide, boron nitride and other powders, beads formed by spheroidizing them, single crystal fibers, glass fibers, and the like. . Among these, silica filler and alumina filler are preferable. The said inorganic filler can be used individually or in mixture of 2 or more types. The range of the content of the inorganic filler (c) for obtaining the above-mentioned effect more reliably is preferably 1 to 80 parts by mass with respect to 100 parts by mass of the total solid content constituting the protective film-forming film, More preferred is 5 to 75 parts by mass, and particularly preferred is 15 to 60 parts by mass.
(d)着色剤
 保護膜形成用フィルムには、着色剤(d)を配合することができる。着色剤(d)を配合することで、半導体装置を機器に組み込んだ際に、周囲の装置から発生する赤外線等による半導体装置の誤作動を防止することができる。また、レーザーマーキング等の手段により保護膜形成用フィルムに刻印を行った場合に、文字、記号等のマークが認識しやすくなるという効果がある。
 着色剤(d)としては、有機または無機の顔料および染料が用いられる。これらの中でも電磁波や赤外線遮蔽性の点から黒色顔料が好ましい。黒色顔料としては、カーボンブラック、酸化鉄、二酸化マンガン、アニリンブラック、活性炭等が用いられるが、これらに限定されることはない。半導体装置の信頼性を高める観点からは、カーボンブラックが特に好ましい。着色剤(d)の配合量は、保護膜形成用フィルムを構成する全固形分100質量部に対して、好ましくは0.1~35質量部、さらに好ましくは0.5~25質量部、特に好ましくは1~15質量部である。
(D) Colorant (d) can be mix | blended with the film for colorant protective film formation. By blending the colorant (d), malfunction of the semiconductor device due to infrared rays or the like generated from surrounding devices when the semiconductor device is incorporated into equipment can be prevented. Further, when the protective film forming film is engraved by means such as laser marking, there is an effect that marks such as characters and symbols can be easily recognized.
As the colorant (d), organic or inorganic pigments and dyes are used. Among these, black pigments are preferable from the viewpoint of electromagnetic wave and infrared shielding properties. Examples of the black pigment include carbon black, iron oxide, manganese dioxide, aniline black, activated carbon, and the like, but are not limited thereto. Carbon black is particularly preferable from the viewpoint of increasing the reliability of the semiconductor device. The blending amount of the colorant (d) is preferably 0.1 to 35 parts by mass, more preferably 0.5 to 25 parts by mass, particularly 100 parts by mass of the total solid content constituting the protective film-forming film. The amount is preferably 1 to 15 parts by mass.
(e)カップリング剤
 無機物と反応する官能基および有機官能基と反応する官能基を有するカップリング剤(e)を、保護膜形成用フィルムのワークに対する接着性および/または保護膜形成用フィルムの凝集性を向上させるために用いてもよい。また、カップリング剤(e)を使用することで、保護膜形成用フィルムを硬化して得られる保護膜の耐熱性を損なうことなく、その耐水性を向上することができる。このようなカップリング剤(e)としては、チタネート系カップリング剤、アルミネート系カップリング剤、シランカップリング剤等が挙げられる。これらのうちでも、シランカップリング剤が好ましい。
(E) Coupling agent The coupling agent (e) having a functional group that reacts with an inorganic substance and a functional group that reacts with an organic functional group is bonded to the workpiece of the protective film-forming film and / or You may use in order to improve aggregability. Moreover, the water resistance can be improved by using a coupling agent (e), without impairing the heat resistance of the protective film obtained by hardening | curing the film for protective film formation. Examples of such coupling agents (e) include titanate coupling agents, aluminate coupling agents, silane coupling agents, and the like. Of these, silane coupling agents are preferred.
 シランカップリング剤としては、その有機官能基と反応する官能基が、重合体、硬化性成分や硬化性重合体成分などが有する官能基と反応する基であるシランカップリング剤が好ましく使用される。
 このようなシランカップリング剤としてはγ-グリシドキシプロピルトリメトキシシラン、γ-グリシドキシプロピルメチルジエトキシシラン、β-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、γ-(メタクリロキシプロピル)トリメトキシシラン、γ-アミノプロピルトリメトキシシラン、N-6-(アミノエチル)-γ-アミノプロピルトリメトキシシラン、N-6-(アミノエチル)-γ-アミノプロピルメチルジエトキシシラン、N-フェニル-γ-アミノプロピルトリメトキシシラン、γ-ウレイドプロピルトリエトキシシラン、γ-メルカプトプロピルトリメトキシシラン、γ-メルカプトプロピルメチルジメトキシシラン、ビス(3-トリエトキシシリルプロピル)テトラスルファン、メチルトリメトキシシラン、メチルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリアセトキシシラン、イミダゾールシランなどが挙げられる。これらは1種単独で、または2種以上混合して使用することができる。
As the silane coupling agent, a silane coupling agent in which a functional group that reacts with the organic functional group is a group that reacts with a functional group of a polymer, a curable component, a curable polymer component, or the like is preferably used. .
Such silane coupling agents include γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, γ- (methacryloxy). Propyl) trimethoxysilane, γ-aminopropyltrimethoxysilane, N-6- (aminoethyl) -γ-aminopropyltrimethoxysilane, N-6- (aminoethyl) -γ-aminopropylmethyldiethoxysilane, N -Phenyl-γ-aminopropyltrimethoxysilane, γ-ureidopropyltriethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropylmethyldimethoxysilane, bis (3-triethoxysilylpropyl) tetrasulfane, methyltri Methoxysilane , Methyltriethoxysilane, vinyltrimethoxysilane, vinyltriacetoxysilane, and imidazolesilane. These can be used individually by 1 type or in mixture of 2 or more types.
 シランカップリング剤は、重合体成分(a)、硬化性成分(b)および硬化性重合体成分(ab)の合計100質量部に対して、通常0.1~20質量部、好ましくは0.2~10質量部、より好ましくは0.3~5質量部の割合で含まれる。シランカップリング剤の含有量が0.1質量部未満だと上記の効果が得られない可能性があり、20質量部を超えるとアウトガスの原因となる可能性がある。 The silane coupling agent is usually 0.1 to 20 parts by weight, preferably 0.8 parts per 100 parts by weight in total of the polymer component (a), the curable component (b) and the curable polymer component (ab). 2 to 10 parts by mass, more preferably 0.3 to 5 parts by mass. If the content of the silane coupling agent is less than 0.1 parts by mass, the above effect may not be obtained, and if it exceeds 20 parts by mass, it may cause outgassing.
(f)汎用添加剤
 保護膜形成用フィルムには、上記の他に、必要に応じて各種添加剤が配合されてもよい。各種添加剤としては、レベリング剤、可塑剤、帯電防止剤、酸化防止剤、イオン捕捉剤、ゲッタリング剤、連鎖移動剤などが挙げられる。
(F) In addition to the above, various additives may be added to the film for forming a general-purpose additive protective film as necessary. Examples of various additives include leveling agents, plasticizers, antistatic agents, antioxidants, ion scavengers, gettering agents, chain transfer agents, and the like.
 保護膜形成用フィルムは、単一組成のフィルムであってもよく、また組成の異なる2種以上のフィルムの積層フィルムであってもよい。2種以上のフィルムで構成する場合、たとえば、ワークに接着されるフィルムは、フィルムの接着性を向上させうる成分を比較的多量に配合し、他方のフィルム(第2粘着剤層に接するフィルム)には、硬化性成分の配合量を増加してもよい。 The protective film-forming film may be a single composition film or a laminated film of two or more films having different compositions. When the film is composed of two or more kinds of films, for example, the film to be bonded to the workpiece is blended with a relatively large amount of components capable of improving the adhesiveness of the film, and the other film (the film in contact with the second adhesive layer) The amount of the curable component may be increased.
 保護膜形成用フィルムの厚さは特に限定されないが、好ましくは3~300μm、より好ましくは5~250μm、特に好ましくは7~200μmである。 The thickness of the protective film-forming film is not particularly limited, but is preferably 3 to 300 μm, more preferably 5 to 250 μm, and particularly preferably 7 to 200 μm.
 上記のような各層からなる、本発明の保護膜形成用複合シートの構成を図1に示す。図1に示すように、保護膜形成用複合シート10は、基材1及び第1粘着剤層2を構成層として含む粘着シート5の第1粘着剤層2上に、保護膜形成用フィルム4が第2粘着剤層3を介して設けられている。保護膜形成用フィルム4は、第2粘着剤層3上に剥離可能に形成される。保護膜形成用フィルム4は、ワークと略同形状またはワークの形状をそっくり含むことのできる形状であれば特に限定されず、図1に示すように第2粘着剤層3と同形状としてもよい。 FIG. 1 shows the structure of the composite sheet for forming a protective film of the present invention comprising the above layers. As shown in FIG. 1, a protective film-forming composite sheet 10 is formed on a first adhesive layer 2 of an adhesive sheet 5 including a substrate 1 and a first adhesive layer 2 as constituent layers. Is provided via the second pressure-sensitive adhesive layer 3. The protective film-forming film 4 is formed on the second pressure-sensitive adhesive layer 3 so as to be peelable. The protective film-forming film 4 is not particularly limited as long as it is substantially the same shape as the workpiece or can completely include the shape of the workpiece, and may be the same shape as the second pressure-sensitive adhesive layer 3 as shown in FIG. .
 保護膜形成用複合シートの形状は、枚葉のものに限られず、長尺の帯状のものであってもよく、これを巻収してもよい。 The shape of the composite sheet for forming a protective film is not limited to a single sheet, but may be a long strip or roll it up.
 また、保護膜形成用複合シートの使用前に、保護膜形成用フィルムや第1粘着剤層、第2粘着剤層を保護するために、保護膜形成用フィルム上に剥離シートを積層しておいてもよい。剥離シートとしては、上述した基材として例示したフィルムを用いることができる。剥離シートの保護膜形成用フィルムに接する面の表面張力は、好ましくは40mN/m以下、さらに好ましくは37mN/m以下、特に好ましくは35mN/m以下である。下限値は通常25mN/m程度である。このような表面張力が比較的低い剥離シートは、材質を適宜に選択して得ることが可能であるし、また剥離シートの表面に剥離剤を塗布して剥離処理を施すことで得ることもできる。 Before using the protective film-forming composite sheet, a release sheet is laminated on the protective film-forming film in order to protect the protective film-forming film, the first pressure-sensitive adhesive layer, and the second pressure-sensitive adhesive layer. May be. As a release sheet, the film illustrated as a base material mentioned above can be used. The surface tension of the surface of the release sheet that contacts the protective film-forming film is preferably 40 mN / m or less, more preferably 37 mN / m or less, and particularly preferably 35 mN / m or less. The lower limit is usually about 25 mN / m. Such a release sheet having a relatively low surface tension can be obtained by appropriately selecting the material, and can also be obtained by applying a release agent to the surface of the release sheet and performing a release treatment. .
 剥離処理に用いられる剥離剤としては、アルキッド系、シリコーン系、フッ素系、不飽和ポリエステル系、ポリオレフィン系、ワックス系などが用いられるが、特にアルキッド系、シリコーン系、フッ素系の剥離剤が耐熱性を有するので好ましい。 As the release agent used for the release treatment, alkyd, silicone, fluorine, unsaturated polyester, polyolefin, wax, and the like are used. In particular, alkyd, silicone, and fluorine release agents are heat resistant. This is preferable.
 上記の剥離剤を用いて剥離シートの基体となるフィルム等の表面を剥離処理するためには、剥離剤をそのまま無溶剤で、または溶剤希釈やエマルション化して、グラビアコーター、メイヤーバーコーター、エアナイフコーター、ロールコーターなどにより塗布して、剥離剤が塗布された剥離シートを常温下または加熱下に供するか、または電子線により硬化させて剥離剤層を形成すればよい。 In order to release the surface of a film or the like as a substrate of a release sheet using the above release agent, the release agent can be used without any solvent, or can be diluted or emulsified in a solvent to obtain a gravure coater, Mayer bar coater, air knife coater. The release sheet may be applied by a roll coater or the like, and the release sheet on which the release agent is applied is subjected to room temperature or heating, or cured by an electron beam to form a release agent layer.
 また、ウェットラミネーションやドライラミネーション、熱溶融ラミネーション、溶融押出ラミネーション、共押出加工などによりフィルムの積層を行うことにより剥離シートの表面張力を調整してもよい。すなわち、少なくとも一方の面の表面張力が、上述した剥離シートの保護膜形成用フィルムと接する面のものとして好ましい範囲内にあるフィルムを、当該面が保護膜形成用フィルムと接する面となるように、他のフィルムと積層した積層体を製造し、剥離シートとしてもよい。 Further, the surface tension of the release sheet may be adjusted by laminating films by wet lamination, dry lamination, hot melt lamination, melt extrusion lamination, coextrusion processing, or the like. That is, a film in which the surface tension of at least one surface is within a preferable range as the surface in contact with the protective film-forming film of the release sheet described above is such that the surface is in contact with the protective film-forming film. Alternatively, a laminate laminated with another film may be manufactured and used as a release sheet.
 図1に示す構成の保護膜形成用複合シートによれば、保護膜形成用フィルムを取り囲む領域において、第1粘着剤層の十分な接着性により、保護膜形成用複合シートを治具に接着することができる。それとともに、第2粘着剤層と第1粘着剤層との界面における接着性を制御し、保護膜付チップのピックアップを容易にすることができる。
 また、保護膜形成用複合シートが、ダイシング工程においてワークを支持するためのダイシングシートとして機能する場合、ダイシング工程において保護膜形成用フィルム付ウエハに別途ダイシングシートを貼り合せてダイシングをする必要がなくなり、半導体装置の製造工程を簡略化できる。
According to the protective film-forming composite sheet having the configuration shown in FIG. 1, the protective film-forming composite sheet is bonded to the jig by the sufficient adhesiveness of the first pressure-sensitive adhesive layer in the region surrounding the protective film-forming film. be able to. At the same time, the adhesiveness at the interface between the second pressure-sensitive adhesive layer and the first pressure-sensitive adhesive layer can be controlled to facilitate the pickup of the chip with the protective film.
In addition, when the composite sheet for forming a protective film functions as a dicing sheet for supporting a workpiece in the dicing process, it is not necessary to dice by separately attaching a dicing sheet to the wafer with the film for forming the protective film in the dicing process. The manufacturing process of the semiconductor device can be simplified.
 また、保護膜形成用複合シートは、粘着シートを、第2粘着剤層から剥離する粘着力測定試験において、第1粘着剤層および第2粘着剤層の少なくともいずれかが凝集破壊し、又は粘着力が0.8N/25mm以上であることが好ましい。第1粘着剤層と第2粘着剤層の間の接着性が相対的に低い場合には、粘着力測定試験において、界面が破壊して粘着力を測定可能であるが、第1粘着剤層と第2粘着剤層の間の接着性が著しく高い場合には、第1粘着剤層と第2粘着剤層のいずれか一方、または両方が凝集破壊して粘着力が測定不能となる。粘着力測定試験は、具体的には後述する実施例に記載されているものである。保護膜形成用シートがこのような特徴を有し、第1粘着剤層と第2粘着剤層との接着性が大きいことで、本発明の効果がより向上し、たとえば、比較的サイズの大きいチップを得るプロセスに本発明の保護膜形成用複合シートを用いた場合にも、第1粘着剤層と第2粘着剤層の望ましくない剥離を防止しうる。保護膜形成用複合シートは、粘着シートを、第2粘着剤層から剥離する粘着力測定試験において、第1粘着剤層および第2粘着剤層の少なくともいずれかが凝集破壊し、又は粘着力が1.2N/25mm以上であることがより好ましい。 Further, in the composite sheet for forming a protective film, in the adhesive strength measurement test in which the adhesive sheet is peeled from the second adhesive layer, at least one of the first adhesive layer and the second adhesive layer is cohesively broken, or adhesive The force is preferably 0.8 N / 25 mm or more. When the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is relatively low, in the pressure-sensitive adhesive strength measurement test, the interface can be broken and the pressure-sensitive adhesive strength can be measured. When the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is remarkably high, one or both of the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer cohesively break, and the adhesive force cannot be measured. The adhesive force measurement test is specifically described in the examples described later. The protective film-forming sheet has such characteristics, and since the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer is large, the effect of the present invention is further improved. For example, the size is relatively large. Even when the composite sheet for forming a protective film of the present invention is used in a process for obtaining a chip, undesired peeling of the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer can be prevented. In the protective sheet-forming composite sheet, in the adhesive force measurement test in which the adhesive sheet is peeled from the second adhesive layer, at least one of the first adhesive layer and the second adhesive layer is cohesively broken, or the adhesive force is More preferably, it is 1.2 N / 25 mm or more.
 このような保護膜形成用複合シートの保護膜形成用フィルムは、チップの保護膜とすることができる。保護膜形成用フィルムはフェースダウン方式のチップ裏面に貼付され、適当な手段により硬化されて封止樹脂の代替としてチップを保護する機能を有する。また、保護膜形成用フィルムを半導体ウエハに貼付した場合には、保護膜がウエハを補強する機能を有するためにウエハの破損等を防止しうる。 Such a protective film-forming film of the protective film-forming composite sheet can be used as a protective film of a chip. The protective film-forming film is affixed to the back surface of the face-down type chip and cured by an appropriate means to have a function of protecting the chip as an alternative to the sealing resin. Further, when the protective film-forming film is attached to the semiconductor wafer, the protective film has a function of reinforcing the wafer, so that damage to the wafer can be prevented.
[保護膜形成用複合シートの製造方法]
 次に、図1に示す保護膜形成用複合シートの製造方法の一例について説明するが、本発明の保護膜形成用複合シートは、このような製造方法により得られるものに限定されるものではない。
[Method for producing composite sheet for forming protective film]
Next, although an example of the manufacturing method of the composite sheet for protective film formation shown in FIG. 1 is demonstrated, the composite sheet for protective film formation of this invention is not limited to what is obtained by such a manufacturing method. .
 まず、基材の表面に第1粘着剤層を形成し、粘着シートを得る。基材の表面に第1粘着剤層を設ける方法は特に限定されず、剥離シート(第1剥離シート)上に所定の膜厚になるように、第1粘着剤層を構成するエネルギー線硬化性粘着剤を含む組成物(第1粘着剤)を塗布し形成した第1被膜を基材表面に転写する方法;基材表面に第1粘着剤を直接塗布して第1被膜を形成する方法;が挙げられる。第1被膜をエネルギー線照射により硬化することでエネルギー線硬化性粘着剤を硬化させた粘着剤からなる第1粘着剤層が得られる。また、第1被膜に対してエネルギー線照射を行わない場合は、第1被膜がそのままエネルギー線硬化性粘着剤からなる第1粘着剤層となる。
 粘着シートの第1被膜と後述する第2被膜あるいは第2粘着剤層とを積層する前にエネルギー線を照射して第1被膜を硬化して、第1被膜を第1粘着剤層としておいてもよい。この場合において、第1被膜に未反応のエネルギー線重合性基が残存するように、硬化を予備的な硬化にとどめてもよい。
First, a 1st adhesive layer is formed in the surface of a base material, and an adhesive sheet is obtained. The method for providing the first pressure-sensitive adhesive layer on the surface of the substrate is not particularly limited, and the energy ray curable that constitutes the first pressure-sensitive adhesive layer so as to have a predetermined film thickness on the release sheet (first release sheet). A method of transferring a first coating formed by applying a composition containing a pressure-sensitive adhesive (first pressure-sensitive adhesive) to the surface of the substrate; a method of forming a first coating by directly applying the first pressure-sensitive adhesive to the surface of the substrate; Is mentioned. The 1st adhesive layer which consists of an adhesive which hardened the energy-beam curable adhesive by hardening | curing a 1st film by energy ray irradiation is obtained. Moreover, when energy beam irradiation is not performed on the first coating, the first coating becomes the first pressure-sensitive adhesive layer made of the energy beam-curable pressure-sensitive adhesive as it is.
Before laminating the first film of the pressure-sensitive adhesive sheet and the second film or second pressure-sensitive adhesive layer described below, the first film is cured by irradiating energy rays, and the first film is used as the first pressure-sensitive adhesive layer. Also good. In this case, curing may be limited to preliminary curing so that unreacted energy beam polymerizable groups remain in the first coating.
 エネルギー線としては、紫外線が挙げられ、波長200~380nm程度の紫外線を含む近紫外線を用いればよい。紫外線量(光量)としては、通常50~500mJ/cm程度であり、100~450mJ/cmが好ましく、200~400mJ/cmがより好ましい。また、紫外線照度は、通常50~500mW/cm程度であり、100~450mW/cmが好ましく、200~400mW/cmがより好ましい。紫外線源としては特に制限はなく、例えば高圧水銀ランプ、メタルハライドランプ、発光ダイオードなどが用いられる。以下において、照射するエネルギー線として紫外線を用いる場合は、同様にこのような範囲から適切な条件を選択して行えばよい。
 剥離シートとしては、上述した基材として例示したフィルムを用いることができる。
Examples of the energy rays include ultraviolet rays, and near ultraviolet rays including ultraviolet rays having a wavelength of about 200 to 380 nm may be used. The amount ultraviolet (light amount) is generally 50 ~ 500mJ / cm 2 or so, preferably 100 ~ 450mJ / cm 2, more preferably 200 ~ 400mJ / cm 2. The ultraviolet illumination is usually 50 ~ 500mW / cm 2 or so, preferably 100 ~ 450mW / cm 2, more preferably 200 ~ 400mW / cm 2. There is no restriction | limiting in particular as an ultraviolet-ray source, For example, a high pressure mercury lamp, a metal halide lamp, a light emitting diode etc. are used. In the following, when ultraviolet rays are used as the energy rays to be irradiated, an appropriate condition may be similarly selected from such a range.
As a release sheet, the film illustrated as a base material mentioned above can be used.
 また、別の剥離シート(第2剥離シート)上に、第2粘着剤層を構成するエネルギー線硬化性粘着剤を含む組成物(第2粘着剤)を塗布して被膜(第2被膜)を形成する。次いで、別の剥離シート(第3剥離シート)を第2被膜上に積層し、第2剥離シート/第2被膜/第3剥離シートの積層体を得る。その後、エネルギー線照射することで、第2被膜を硬化し、第2剥離シートと第3剥離シートに挟持された第2粘着剤層を得る。
 なお、第2被膜にエネルギー線照射を行わず、または第2被膜に未反応のエネルギー線重合性基が残存するように、硬化を予備的な硬化にとどめ、第1被膜あるいは第1粘着剤層との積層後、第2被膜を硬化し第2粘着剤層を形成してもよい。
Moreover, the composition (2nd adhesive) containing the energy-beam curable adhesive which comprises a 2nd adhesive layer is apply | coated on another peeling sheet (2nd peeling sheet), and a film (2nd film) is applied. Form. Next, another release sheet (third release sheet) is laminated on the second coating to obtain a laminate of second release sheet / second coating / third release sheet. Then, by irradiating with energy rays, the second film is cured, and a second pressure-sensitive adhesive layer sandwiched between the second release sheet and the third release sheet is obtained.
It should be noted that the second coating is not irradiated with energy rays, or the curing is limited to preliminary curing so that unreacted energy beam polymerizable groups remain in the second coating, and the first coating or the first pressure-sensitive adhesive layer. After the lamination, the second coating may be cured to form a second pressure-sensitive adhesive layer.
 また、別の剥離シート(第4剥離シート)上に保護膜形成用組成物を塗布し保護膜形成用フィルムを形成する。次いで、別の剥離シート(第5剥離シート)を保護膜形成用フィルム上に積層し、第4剥離シート/保護膜形成用フィルム/第5剥離シートの積層体を得る。 Also, a protective film-forming composition is applied on another release sheet (fourth release sheet) to form a protective film-forming film. Next, another release sheet (fifth release sheet) is laminated on the protective film-forming film to obtain a laminate of fourth release sheet / protective film-forming film / fifth release sheet.
 次いで、第2剥離シート/第2粘着剤層/第3剥離シートの積層体から第3剥離シートを、第4剥離シート/保護膜形成用フィルム/第5剥離シートの積層体から第4剥離シートを剥離しながら、第2粘着剤層と保護膜形成用フィルムを積層し、第2剥離シート/第2粘着剤層/保護膜形成用フィルム/第5剥離シートの積層体を得る。次いで、保護膜形成用フィルムに貼付されるワークと略同形状あるいはワークの形状をそっくり含むことのできる形状に、第2粘着剤層と保護膜形成用フィルムとを切込み、残余の部分を除去する。第2剥離シート/第2粘着剤層/保護膜形成用フィルム/第5剥離シートの積層体が長尺の帯状体である場合には、第5剥離シートを切り込まずにおくことで、長尺の第5剥離シートに連続的に保持された複数の第2剥離シート/第2粘着剤層/保護膜形成用フィルムの積層体を得ることができる。 Next, the third release sheet is laminated from the laminate of the second release sheet / second pressure-sensitive adhesive layer / third release sheet, and the fourth release sheet is laminated from the laminate of fourth release sheet / protective film forming film / fifth release sheet. The second pressure-sensitive adhesive layer and the protective film-forming film are laminated while removing the film to obtain a laminate of second release sheet / second pressure-sensitive adhesive layer / protective film-forming film / fifth release sheet. Next, the second pressure-sensitive adhesive layer and the protective film-forming film are cut into a shape that can substantially include the shape of the work affixed to the protective film-forming film or the shape of the work, and the remaining portion is removed. . When the laminate of the second release sheet / second pressure-sensitive adhesive layer / protective film forming film / fifth release sheet is a long belt-like body, the fifth release sheet can be left without being cut. A laminated body of a plurality of second release sheets / second pressure-sensitive adhesive layers / protective film forming films continuously held by the fifth release sheet can be obtained.
 そして、第1被膜あるいは第1粘着剤層の上に第1剥離シートが積層されている場合には第1剥離シートを、第2剥離シート/第2粘着剤層/保護膜形成用フィルム/第5剥離シートからなる積層体の第2剥離シートを剥離しながら、第1被膜あるいは第1粘着剤層と第2粘着剤層とを積層し、基材/第1被膜あるいは第1粘着剤層/第2粘着剤層/保護膜形成用フィルム/第5剥離シートからなる積層体を得る。
 なお、第2被膜にエネルギー線照射を行わず、または第2被膜に予備的な硬化を施し、第1被膜あるいは第1粘着剤層と積層した場合には、基材側からエネルギー線を照射し、第2被膜を硬化して第2粘着剤層とする。第1被膜が硬化されておらず、または予備的に硬化されている場合、この時点で第2被膜と同時に第1被膜にもエネルギー線が照射され、第1被膜は、エネルギー線硬化性粘着剤を硬化させた粘着剤からなる第1粘着剤層となる。
 また、第2被膜がすでに硬化されている場合であっても、第1被膜の硬化のためにこの時点において第1被膜と第2粘着剤層の積層体にエネルギー線照射を行ってもよい。以上により、本発明の保護膜形成用複合シートを得る。
And when the 1st exfoliation sheet is laminated on the 1st coat or the 1st adhesive layer, the 1st exfoliation sheet, the 2nd exfoliation sheet / the 2nd adhesive layer / the film for protective film formation / the 1st While peeling the second release sheet of the laminate composed of 5 release sheets, the first film or the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer are laminated, and the base material / the first film or the first pressure-sensitive adhesive layer / A laminate comprising the second pressure-sensitive adhesive layer / the protective film-forming film / the fifth release sheet is obtained.
When the second coating is not irradiated with energy rays or when the second coating is preliminarily cured and laminated with the first coating or the first pressure-sensitive adhesive layer, energy rays are irradiated from the substrate side. The second coating is cured to form a second pressure-sensitive adhesive layer. When the first coating is not cured or is preliminarily cured, at this time, the first coating is irradiated with energy rays simultaneously with the second coating. It becomes the 1st adhesive layer which consists of an adhesive which hardened the.
Further, even when the second coating has already been cured, energy beam irradiation may be performed on the laminated body of the first coating and the second pressure-sensitive adhesive layer at this time for curing the first coating. The composite sheet for protective film formation of this invention is obtained by the above.
 特に、保護膜形成用複合シートにおける第1粘着剤層が、エネルギー線硬化性粘着剤を硬化させた粘着剤からなる場合には、第1被膜と第2粘着剤層とを積層した後に、エネルギー線照射により第1粘着剤層を硬化することで、第1粘着剤層と第2粘着剤層の接着性を向上させることができるため、保護膜付チップのピックアップ性に優れる。 In particular, when the first pressure-sensitive adhesive layer in the composite sheet for forming a protective film is made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive, the energy is applied after laminating the first film and the second pressure-sensitive adhesive layer. By curing the first pressure-sensitive adhesive layer by irradiation with rays, the adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer can be improved, so that the pickup property of the chip with protective film is excellent.
[保護膜付チップの製造方法]
 次に、本発明の保護膜形成用複合シートを用いた保護膜付チップの製造方法について説明する。
[Method of manufacturing chip with protective film]
Next, the manufacturing method of the chip | tip with a protective film using the composite sheet for protective film formation of this invention is demonstrated.
 本発明の保護膜付チップの製造方法は、以下の工程(1)~(3)をこの順で行う。
 工程(1):保護膜形成用複合シートの保護膜形成用フィルムをワークに貼付する工程、
 工程(2):保護膜形成用フィルムを加熱硬化して保護膜を得る工程、
 工程(3):保護膜と第2粘着剤層とを分離する工程。
In the method for manufacturing a chip with a protective film of the present invention, the following steps (1) to (3) are performed in this order.
Step (1): A step of attaching the protective film-forming film of the protective film-forming composite sheet to the workpiece,
Step (2): a step of heat-curing the protective film-forming film to obtain a protective film,
Step (3): A step of separating the protective film and the second pressure-sensitive adhesive layer.
 ワークは、シリコンウエハであってもよく、またガリウム・砒素などの化合物半導体ウエハであってもよい。また、ワークとして、ガラス基板、セラミック基板、FPC基板等の有機材料基板、精密部品等の金属材料など種々の物品を挙げることができる。さらには、それらを個片化したチップでもよい。 The workpiece may be a silicon wafer or a compound semiconductor wafer such as gallium / arsenic. Examples of the work include various articles such as glass substrates, ceramic substrates, organic material substrates such as FPC substrates, and metal materials such as precision parts. Furthermore, the chip | tip which separated them may be sufficient.
 以下において、一例として、ワークとしてシリコンウエハを用いる保護膜付チップの製造方法を説明する。
 ウエハ表面への回路の形成はエッチング法、リフトオフ法などの従来より汎用されている方法を含む様々な方法により行うことができる。次いで、ウエハの回路面の反対面(裏面)を研削する。研削法は特に限定はされず、グラインダーなどを用いた公知の手段で研削してもよい。裏面研削時には、表面の回路を保護するために回路面に、表面保護シートと呼ばれる粘着シートを貼付する。裏面研削は、ウエハの回路面側(すなわち表面保護シート側)をチャックテーブル等により固定し、回路が形成されていない裏面側をグラインダーにより研削する。ウエハの研削後の厚みは特に限定はされないが、通常は50~500μm程度である。
In the following, as an example, a method for manufacturing a chip with a protective film using a silicon wafer as a workpiece will be described.
Formation of a circuit on the wafer surface can be performed by various methods including conventionally used methods such as an etching method and a lift-off method. Next, the opposite surface (back surface) of the circuit surface of the wafer is ground. The grinding method is not particularly limited, and grinding may be performed by a known means using a grinder or the like. At the time of back surface grinding, an adhesive sheet called a surface protection sheet is attached to the circuit surface in order to protect the circuit on the surface. In the back surface grinding, the circuit surface side (that is, the surface protection sheet side) of the wafer is fixed by a chuck table or the like, and the back surface side on which no circuit is formed is ground by a grinder. The thickness of the wafer after grinding is not particularly limited, but is usually about 50 to 500 μm.
 その後、必要に応じ、裏面研削時に生じた破砕層を除去する。破砕層の除去は、ケミカルエッチングや、プラズマエッチングなどにより行われる。 After that, if necessary, the crushed layer generated during back grinding is removed. The crushed layer is removed by chemical etching, plasma etching, or the like.
 次いで、ウエハの裏面に保護膜形成用複合シートの保護膜形成用フィルムを貼付する。貼付方法は特に限定されない。 Next, a protective film forming film of the protective film forming composite sheet is attached to the back surface of the wafer. A sticking method is not particularly limited.
 そして、保護膜形成用フィルムを加熱硬化して、ウエハの裏面に保護膜を形成する。この結果、ウエハの裏面に硬化樹脂からなる保護膜が形成され、ウエハ単独の場合と比べて強度が向上するので、薄くなったウエハの取扱い時の破損を低減できる。また、ウエハの裏面に直接樹脂膜用の塗布液を塗布・被膜化するコーティング法と比較して、保護膜の厚さの均一性に優れる。 Then, the protective film-forming film is cured by heating to form a protective film on the back surface of the wafer. As a result, a protective film made of a cured resin is formed on the back surface of the wafer, and the strength is improved as compared with the case of the wafer alone, so that damage during handling of the thinned wafer can be reduced. In addition, the thickness uniformity of the protective film is excellent as compared with a coating method in which a coating solution for a resin film is directly applied to the back surface of the wafer.
 次いで、ウエハと保護膜を、ウエハ表面に形成された回路毎にダイシングする(ダイシング工程)。ダイシングは、ウエハと保護膜をともに切断するように行われる。本発明の保護膜形成用複合シートは、ウエハを支持するダイシングシートの役割を果たすことができる。ダイシング工程においては、保護膜形成用複合シートの外周部がリングフレーム等の他の治具と接合することで、半導体ウエハに貼付された保護膜形成用複合シートが装置に固定され、ダイシングが行われる。保護膜形成用複合シート上での半導体ウエハのダイシングは、公知のダイシングシートを用いた常法と同様に行われる。なお、ダイシング工程は、保護膜形成用フィルムを加熱硬化して保護膜を得る工程の前に行うこともできる。 Next, the wafer and the protective film are diced for each circuit formed on the wafer surface (dicing process). Dicing is performed so as to cut both the wafer and the protective film. The composite sheet for forming a protective film of the present invention can serve as a dicing sheet that supports a wafer. In the dicing process, the outer peripheral portion of the protective film forming composite sheet is bonded to another jig such as a ring frame, so that the protective film forming composite sheet attached to the semiconductor wafer is fixed to the apparatus, and dicing is performed. Is called. Dicing of the semiconductor wafer on the composite sheet for forming a protective film is performed in the same manner as a conventional method using a known dicing sheet. In addition, a dicing process can also be performed before the process of heat-hardening the film for protective film formation and obtaining a protective film.
 このようにダイシングされたチップ(保護膜付チップ)をコレット等の汎用手段によりピックアップすることで、保護膜と第2粘着剤層とを分離し、保護膜付チップを得ることができる。本発明の保護膜形成用複合シートによれば、特定の粘着剤を用いて粘着剤層を形成し、第2粘着剤層の引張弾性率を特定範囲とすることで、保護膜形成用フィルムを硬化して得られる保護膜を第2粘着剤層から剥離することが容易である。また、第1粘着剤層と第2粘着剤層との接着性が低下することに起因した、ピックアップ時の第1粘着剤層と第2粘着剤層の間の剥離等の不具合が防止されうる。 By picking up the chip diced in this way (chip with protective film) by a general-purpose means such as a collet, the protective film and the second pressure-sensitive adhesive layer can be separated to obtain a chip with a protective film. According to the composite sheet for forming a protective film of the present invention, a protective film-forming film is formed by forming a pressure-sensitive adhesive layer using a specific pressure-sensitive adhesive and setting the tensile elastic modulus of the second pressure-sensitive adhesive layer to a specific range. It is easy to peel off the protective film obtained by curing from the second pressure-sensitive adhesive layer. In addition, problems such as peeling between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer at the time of pickup due to a decrease in adhesiveness between the first pressure-sensitive adhesive layer and the second pressure-sensitive adhesive layer can be prevented. .
 次いで、保護膜にレーザー印字することもできる。レーザー印字はレーザーマーキング法により行われ、レーザー光の照射により保護膜の表面を削り取ることで保護膜に品番等をマーキングする。 Next, laser printing can be performed on the protective film. Laser printing is performed by a laser marking method, and the surface of the protective film is scraped off by laser light irradiation to mark a product number or the like on the protective film.
 最後に、保護膜付チップをフェースダウン方式で所定の基台上に実装することで半導体装置を製造することができる。また、裏面に保護膜を有する半導体チップを、ダイパッド部または別の半導体チップなどの他の部材上(チップ搭載部上)に接着することで、半導体装置を製造することもできる。 Finally, a semiconductor device can be manufactured by mounting a chip with a protective film on a predetermined base in a face-down manner. Further, a semiconductor device can be manufactured by adhering a semiconductor chip having a protective film on the back surface to another member (on the chip mounting portion) such as a die pad portion or another semiconductor chip.
 以下、本発明を実施例により説明するが、本発明はこれらの実施例に限定されるものではない。なお、以下の実施例または比較例において、<ピックアップ性>、<第2粘着剤層の転着>、<引張弾性率>及び<粘着力測定試験>は以下のように測定・評価した。 Hereinafter, the present invention will be described by way of examples, but the present invention is not limited to these examples. In the following Examples or Comparative Examples, <Pickup Property>, <Second Adhesive Layer Transfer>, <Tensile Elastic Modulus>, and <Adhesive Strength Measurement Test> were measured and evaluated as follows.
<ピックアップ性>
 #2000の砥石で裏面研削したシリコンウエハ(200mm径、厚さ200μm)の研磨面に、保護膜形成用複合シートの保護膜形成用フィルムを、テープマウンター(リンテック社製 Adwill RAD2700)を用い貼付し、ウエハダイシング用リングフレームに固定した。
 次いで、保護膜形成用複合シートとウエハとを130℃の環境下に2時間投入し、保護膜形成用フィルムを硬化した。
 その後、ダイシング装置(DISCO社製 DFD651)を使用してシリコンウエハのダイシングを行い5mm×5mmのチップを得た。なお、ダイシングの際の切込み量は、基材を15μm切り込むようにし、切断速度は40mm/分であった。また、ダイシングブレードとしてはDISCO社製27HECCを用い、ブレードの回転数を35,000rpmとした。
 得られたチップを、ピックアップ装置(キャノンマシナリー製 BESTEM DO2)を用いてピックアップ可能かを確認した。
 具体的には、突き上げピン(5本)により、全てのピンで1000μm突き上げた後、中央のピン(1本)でさらに400μm突き上げてピックアップを行った。突き上げ速度は10mm/秒および20mm/秒で行った。
 突き上げ速度が20mm/秒でピックアップ可能であった場合を「A」、10mm/秒でピックアップ可能であった場合を「B」、いずれの速度でもピックアップできなかった場合を「C」と評価した。
<Pickup property>
Use a tape mounter (Adwill RAD2700, manufactured by Lintec) to attach the protective film-forming film of the protective film-forming composite sheet to the polished surface of a silicon wafer (200 mm diameter, 200 μm thick) that has been back-ground with a # 2000 grindstone. And fixed to a ring frame for wafer dicing.
Next, the protective film-forming composite sheet and the wafer were placed in an environment at 130 ° C. for 2 hours to cure the protective film-forming film.
Thereafter, the silicon wafer was diced using a dicing apparatus (DFD651 manufactured by DISCO) to obtain a 5 mm × 5 mm chip. The amount of cutting during dicing was such that the substrate was cut by 15 μm, and the cutting speed was 40 mm / min. Moreover, as a dicing blade, 27HECC made by DISCO was used, and the rotation speed of the blade was 35,000 rpm.
It was confirmed whether or not the obtained chip could be picked up using a pickup device (BESTEM DO2 manufactured by Canon Machinery).
Specifically, all the pins were pushed up by 1000 μm with the push-up pins (five), and then picked up by further pushing up by 400 μm with the center pin (one). The thrusting speed was 10 mm / second and 20 mm / second.
The case where pick-up was possible at a thrust speed of 20 mm / sec was evaluated as “A”, the case where pick-up was possible at 10 mm / sec was “B”, and the case where pick-up was not possible at any speed was evaluated as “C”.
<第2粘着剤層の転着>
 上記ピックアップ性の評価でピックアップできた保護膜付チップの裏面(保護膜面)を確認し、第2粘着剤層が転着を起こしていないか確認した。確認方法は、保護膜付チップの厚み測定を行い、想定している厚みであることを確認した。また、保護膜面にニチバン製のセロハンテープを貼り付け、剥離した際にセロハンテープに第2粘着剤層が付着していないことを確認した。
 転写不良が起こっていない場合を「A」、転写不良が起こっている場合を「B」と評価した。
<Transfer of second adhesive layer>
The back surface (protective film surface) of the chip with protective film that could be picked up in the evaluation of the pickup property was confirmed, and it was confirmed whether or not the second pressure-sensitive adhesive layer was transferred. As a confirmation method, the thickness of the chip with protective film was measured and confirmed to be the expected thickness. Moreover, when the cellophane tape made from Nichiban was affixed on the protective film surface and it peeled, it confirmed that the 2nd adhesive layer did not adhere to the cellophane tape.
The case where no transfer failure occurred was evaluated as “A”, and the case where transfer failure occurred was evaluated as “B”.
<引張弾性率>
 第2粘着剤層の引張弾性率を粘弾性測定装置(ティー・エイ・インスツルメント社製、DMA Q800)を用いて測定した。
 まず、紫外線硬化前の第2粘着剤層を積層し、厚さ200μmの積層体を得た。その後、紫外線照射装置(リンテック社製 RAD-2000)を用い、照度230mW/cm、光量190mJ/cm(主波長365nm)の照射条件で紫外線照射を行ったものを試料とした。
 測定条件としては、試料の測定部が長さ20mm、幅4mmとなるようにセットし、振幅16μm、測定温度領域-40~150℃で測定を行い、25℃における周波数11Hzの引張弾性率を測定値とした。
<Tensile modulus>
The tensile elastic modulus of the second pressure-sensitive adhesive layer was measured using a viscoelasticity measuring apparatus (manufactured by TA Instruments, DMA Q800).
First, the 2nd adhesive layer before ultraviolet curing was laminated | stacked, and the 200-micrometer-thick laminated body was obtained. Thereafter, a sample irradiated with ultraviolet rays using an ultraviolet irradiation device (RAD-2000 manufactured by Lintec Corporation) under irradiation conditions of an illuminance of 230 mW / cm 2 and a light amount of 190 mJ / cm 2 (main wavelength 365 nm) was used as a sample.
Measurement conditions were set so that the measurement part of the sample had a length of 20 mm and a width of 4 mm, measurement was performed at an amplitude of 16 μm and a measurement temperature range of −40 to 150 ° C., and a tensile elastic modulus at a frequency of 11 Hz at 25 ° C. was measured. Value.
<粘着力測定試験>
 保護膜形成用シートから保護膜形成用フィルムを除去し、幅25mmに裁断して試料とした。第2粘着剤層の露出した面を平板に固定し、23℃、50%相対湿度の環境下において、第2粘着剤層から180°の角度で、300mm/分の速度で粘着シートを剥がす際の粘着力を測定した。
<Adhesion test>
The protective film-forming film was removed from the protective film-forming sheet and cut into a width of 25 mm to prepare a sample. When the exposed surface of the second pressure-sensitive adhesive layer is fixed to a flat plate and the pressure-sensitive adhesive sheet is peeled off at an angle of 180 ° from the second pressure-sensitive adhesive layer at a speed of 300 mm / min in an environment of 23 ° C. and 50% relative humidity The adhesive strength of was measured.
保護膜形成用フィルムの作製
 また、保護膜形成用フィルムを構成する各成分とその配合量を下記に示す(成分/配合量)。各成分の配合量は固形分換算の質量部を示し、本発明において固形分とは溶媒以外の全成分をいう。
Production of protective film-forming film Each component constituting the protective film-forming film and its blending amount are shown below (component / blending amount). The compounding quantity of each component shows the mass part of solid content conversion, and solid content means all components other than a solvent in this invention.
[保護膜形成用組成物]
(a1)アクリル系重合体:n-ブチルアクリレート55質量部、メチルアクリレート10質量部、グリシジルメタクリレート20質量部、及び2-ヒドロキシエチルアクリレート15質量部からなるアクリル系重合体(重量平均分子量:90万、ガラス転移温度:-28℃)/20質量部
(b1)熱硬化性成分:
 (b11-1)ビスフェノールA型エポキシ樹脂(エポキシ当量180~200g/eq)/20質量部
 (b11-2)ジシクロペンタジエン型エポキシ樹脂(大日本インキ化学工業(株)製 エピクロンHP-7200HH)/10質量部
 (b12)ジシアンジアミド(旭電化製 アデカハ-ドナー3636AS)/0.5質量部
 (b13)硬化促進剤:2-フェニル-4,5-ジヒドロキシメチルイミダゾール(四国化成工業(株)製 キュアゾール2PHZ)/0.5質量部
(c)無機フィラー:シリカフィラー(溶融石英フィラー(平均粒径8μm))/60質量部
(d)着色剤:黒色顔料(カーボンブラック(三菱化学社製#MA650、平均粒径28nm))/2質量部
(e)カップリング剤:シランカップリング剤(日本ユニカー社製 A-1110)/0.2質量部
[Composition for forming protective film]
(A1) Acrylic polymer: acrylic polymer comprising 55 parts by mass of n-butyl acrylate, 10 parts by mass of methyl acrylate, 20 parts by mass of glycidyl methacrylate, and 15 parts by mass of 2-hydroxyethyl acrylate (weight average molecular weight: 900,000) , Glass transition temperature: -28 ° C.) / 20 parts by mass (b1) thermosetting component:
(B11-1) Bisphenol A type epoxy resin (epoxy equivalent 180 to 200 g / eq) / 20 parts by mass (b11-2) Dicyclopentadiene type epoxy resin (Epicron HP-7200HH manufactured by Dainippon Ink & Chemicals, Inc.) / 10 parts by weight (b12) Dicyandiamide (Adekaha Donor 3636AS manufactured by Asahi Denka) /0.5 parts by weight (b13) Curing accelerator: 2-phenyl-4,5-dihydroxymethylimidazole (Cureazole 2PHZ manufactured by Shikoku Chemicals Co., Ltd.) ) /0.5 parts by mass (c) Inorganic filler: Silica filler (fused quartz filler (average particle size 8 μm)) / 60 parts by mass (d) Colorant: Black pigment (carbon black (# MA650, manufactured by Mitsubishi Chemical Corporation, average) Particle size 28 nm)) / 2 parts by mass (e) Coupling agent: Silane coupling agent (Nihon Unica Company Ltd. A-1110) /0.2 parts by
 剥離シート(リンテック社製 SP-PET3811、厚さ38μm)に保護膜形成用組成物を乾燥後の塗布量が42g/mとなるように塗布し、110℃で2分間乾燥して保護膜形成用フィルムを形成し、保護膜形成用フィルム上に別の剥離シート(リンテック社製 SP-PET3811、厚さ38μm)を積層し、剥離シート/保護膜形成用フィルム/剥離シートの積層体を得た。 A protective film-forming composition was applied to a release sheet (SP-PET3811 manufactured by Lintec Co., Ltd., thickness 38 μm) so that the coating amount after drying was 42 g / m 2 and dried at 110 ° C. for 2 minutes to form a protective film Was formed, and another release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 μm) was laminated on the protective film-forming film to obtain a laminate of release sheet / protective film-forming film / release sheet. .
(実施例1)
粘着シートの作製
 アクリル系重合体(2-エチルヘキシルアクリレート/ブチルアクリレート/ヒドロキシエチルアクリレート=35/60/5(質量比)、重量平均分子量:60万)に、メタクリロイルオキシエチルイソシアネートを60%当量(アクリル系重合体100質量部に対し4質量部)反応させたエネルギー線硬化型重合体を作製した。
(Example 1)
Preparation of pressure-sensitive adhesive sheet Acrylic polymer (2-ethylhexyl acrylate / butyl acrylate / hydroxyethyl acrylate = 35/60/5 (mass ratio), weight average molecular weight: 600,000) and 60% equivalent of methacryloyloxyethyl isocyanate (acrylic) An energy beam curable polymer was prepared by reacting 4 parts by mass with respect to 100 parts by mass of the polymer.
 このエネルギー線硬化型重合体100質量部に、光重合開始剤(チバ・スペシャリティケミカルズ社製 イルガキュア(登録商標)184)3.0質量部、及び架橋剤としてイソシアネート化合物(三井武田ケミカル社製 D-110N)10質量部を配合(すべて固形分換算による配合比)し、トルエン/酢酸エチル(120/70部)で希釈して粘着剤(第1粘着剤)とした。 To 100 parts by mass of this energy beam curable polymer, 3.0 parts by mass of a photopolymerization initiator (Irgacure (registered trademark) 184, manufactured by Ciba Specialty Chemicals) and an isocyanate compound (D-, manufactured by Mitsui Takeda Chemical Co., Ltd.) as a crosslinking agent. 110N) 10 parts by mass (all blending ratios in terms of solid content) were mixed and diluted with toluene / ethyl acetate (120/70 parts) to obtain an adhesive (first adhesive).
 第1粘着剤を剥離シート(リンテック社製 SP-PET3811、厚さ38μm)に乾燥後の塗布量が5g/mとなるように塗布し、100℃で2分乾燥して第1被膜を形成した後、基材として、片面にコロナ処理を施したポリプロピレンフィルム(厚さ80μm)のコロナ処理面に積層し、剥離シート/第1被膜/基材の積層体を得た。 The first adhesive was applied to a release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 μm) so that the coating amount after drying was 5 g / m 2 and dried at 100 ° C. for 2 minutes to form the first film. Then, as a base material, it laminated | stacked on the corona treatment surface of the polypropylene film (thickness of 80 micrometers) which gave the corona treatment to one side, and obtained the laminated body of the peeling sheet / 1st film | membrane / base material.
第2粘着剤層の作製
 アクリル系重合体(2-エチルヘキシルアクリレート/酢酸ビニル/ヒドロキシエチルアクリレート=40/40/20(質量比)、重量平均分子量:50万)にメタクリロイルオキシエチルイソシアネートを80%当量(アクリル系重合体100質量部に対し21.4質量部)反応させたエネルギー線硬化型重合体を作製した。
Preparation of second adhesive layer Acrylic polymer (2-ethylhexyl acrylate / vinyl acetate / hydroxyethyl acrylate = 40/40/20 (mass ratio), weight average molecular weight: 500,000) 80% equivalent of methacryloyloxyethyl isocyanate (21.4 parts by mass with respect to 100 parts by mass of the acrylic polymer) A reacted energy ray-curable polymer was produced.
 このエネルギー線硬化型重合体100質量部に、光重合開始剤(チバ・スペシャリティケミカルズ社製 イルガキュア(登録商標)184)3.0質量部、及び架橋剤としてイソシアネート化合物(東洋インキ製造社製 BHS-8515)0.5質量部を配合(すべて固形分換算による配合比)し、メチルエチルケトンで希釈して粘着剤(第2粘着剤)とした。 To 100 parts by mass of this energy ray-curable polymer, 3.0 parts by mass of a photopolymerization initiator (Irgacure (registered trademark) 184 manufactured by Ciba Specialty Chemicals) and an isocyanate compound (BHS- manufactured by Toyo Ink Manufacturing Co., Ltd.) as a crosslinking agent 8515) 0.5 parts by mass were blended (all blending ratios in terms of solid content) and diluted with methyl ethyl ketone to obtain a pressure-sensitive adhesive (second pressure-sensitive adhesive).
 第2粘着剤を剥離シート(リンテック社製 SP-PET3811、厚さ38μm)に乾燥後の塗布量が10g/mとなるように塗布し、100℃で2分乾燥して第2被膜を形成した後、剥離シート(リンテック社製 SP-PET3811、厚さ38μm)を積層し、剥離シート/第2被膜/剥離シートの積層体を得た。その後、紫外線照射装置(リンテック社製 RAD-2000)を用いて、照度230mW/cm、光量190mJ/cm(主波長365nm)の照射条件で紫外線を照射して、第2被膜を硬化し、第2粘着剤層を得た。 The second adhesive was applied to a release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 μm) so that the coating amount after drying was 10 g / m 2, and dried at 100 ° C. for 2 minutes to form a second film. After that, a release sheet (SP-PET3811 manufactured by Lintec Corporation, thickness 38 μm) was laminated to obtain a release sheet / second coating / release sheet laminate. Then, using a UV irradiation device (RAD-2000 manufactured by Lintec), the second coating is cured by irradiating with UV light under irradiation conditions of illuminance of 230 mW / cm 2 and light amount of 190 mJ / cm 2 (main wavelength 365 nm), A second pressure-sensitive adhesive layer was obtained.
保護膜形成用複合シートの作製
 上記で得られた、剥離シート/保護膜形成用フィルム/剥離シートの積層体と、剥離シート/第2粘着剤層/剥離シートの積層体とから、一方の剥離シートを剥離しながら、保護膜形成用フィルムと第2粘着剤層とを熱ラミネート(60℃、1m/分)した。
 次いで、第2粘着剤層と保護膜形成用フィルムとを円形に抜き加工(220mm径)しつつ、第2粘着剤層に積層された剥離シートを除去した。これにより、剥離シート上に、同一の円形状の保護膜形成層および第2粘着剤層がこの順に積層された積層体を得た。そして、剥離シート/第1被膜/基材の積層体の剥離シートを剥がしながら、第2粘着剤層と第1被膜とを積層し、剥離シート/保護膜形成用フィルム/第2粘着剤層/第1被膜/基材の積層体を得た。
 その後、紫外線照射装置(リンテック社製 RAD-3600)を用い、照度230mW/cm、光量190mJ/cm(主波長365nm)の照射条件で、基材側から紫外線照射を行い、第1被膜を硬化して第1粘着剤層とし、保護膜形成用フィルム上に剥離シートが積層した保護膜形成用複合シートを得た。各評価結果を表1に示す。
Production of Composite Sheet for Forming Protective Film One release from the laminate of release sheet / film for protective film / release sheet obtained above and the laminate of release sheet / second adhesive layer / release sheet While peeling off the sheet, the protective film-forming film and the second pressure-sensitive adhesive layer were heat-laminated (60 ° C., 1 m / min).
Subsequently, the release sheet laminated on the second pressure-sensitive adhesive layer was removed while the second pressure-sensitive adhesive layer and the protective film-forming film were punched into a circular shape (220 mm diameter). Thereby, the laminated body by which the same circular protective film formation layer and the 2nd adhesive layer were laminated | stacked in this order on the peeling sheet was obtained. Then, while peeling the release sheet of the release sheet / first coating / substrate laminate, the second pressure-sensitive adhesive layer and the first coating are laminated, and the release sheet / protective film forming film / second pressure-sensitive adhesive layer / A laminate of the first film / substrate was obtained.
Then, using a UV irradiation device (RAD-3600 manufactured by Lintec Corporation), UV irradiation was performed from the substrate side under irradiation conditions of an illuminance of 230 mW / cm 2 and a light amount of 190 mJ / cm 2 (main wavelength 365 nm), and the first coating was applied. It hardened | cured and it was set as the 1st adhesive layer and the composite sheet for protective film formation which the peeling sheet laminated | stacked on the film for protective film formation was obtained. Each evaluation result is shown in Table 1.
(実施例2)
 粘着シートの作製におけるエネルギー線硬化型重合体として、アクリル系重合体(ブチルアクリレート/メチルメタアクリレート/ヒドロキシエチルアクリレート=74/20/6(質量比)、重量平均分子量:35万)に、メタクリロイルオキシエチルイソシアネートを50%当量(アクリル系重合体100質量部に対し3質量部)反応させたエネルギー線硬化型重合体を用いた。
 また、粘着シートの作製における架橋剤としてイソシアネート化合物(東洋インキ製造社製 BHS-8515)を用い、エネルギー線硬化型重合体100質量部に対して0.5質量部を配合した。
(Example 2)
As an energy ray curable polymer in the production of an adhesive sheet, an acrylic polymer (butyl acrylate / methyl methacrylate / hydroxyethyl acrylate = 74/20/6 (mass ratio), weight average molecular weight: 350,000), methacryloyloxy An energy ray-curable polymer obtained by reacting 50% equivalent of ethyl isocyanate (3 parts by mass with respect to 100 parts by mass of the acrylic polymer) was used.
In addition, an isocyanate compound (BHS-8515 manufactured by Toyo Ink Manufacturing Co., Ltd.) was used as a crosslinking agent in the production of the pressure-sensitive adhesive sheet, and 0.5 part by mass was blended with respect to 100 parts by mass of the energy ray curable polymer.
 上記以外は実施例1と同様にして、保護膜形成用複合シートを得た。各評価結果を表1に示す。 Except for the above, a protective sheet-forming composite sheet was obtained in the same manner as in Example 1. Each evaluation result is shown in Table 1.
(実施例3)
 保護膜形成用複合シートの作製において、紫外線照射を行わなかったこと以外は実施例2と同様にして、保護膜形成用複合シートを得た。つまり、実施例3においては、未硬化の第1被膜を第1粘着剤層とした。各評価結果を表1に示す。
(Example 3)
In the production of the protective film-forming composite sheet, a protective film-forming composite sheet was obtained in the same manner as in Example 2 except that ultraviolet irradiation was not performed. That is, in Example 3, the uncured first film was used as the first pressure-sensitive adhesive layer. Each evaluation result is shown in Table 1.
(実施例4)
 第2粘着剤層の作製におけるエネルギー線硬化型重合体として、アクリル系重合体(2-エチルヘキシルアクリレート/酢酸ビニル/ヒドロキシエチルアクリレート=60/20/20(質量比)、重量平均分子量:35万)にメタクリロイルオキシエチルイソシアネートを80%当量(アクリル系重合体100質量部に対し21質量部)反応させたエネルギー線硬化型重合体を用いた。
Example 4
As an energy ray-curable polymer in the production of the second pressure-sensitive adhesive layer, an acrylic polymer (2-ethylhexyl acrylate / vinyl acetate / hydroxyethyl acrylate = 60/20/20 (mass ratio), weight average molecular weight: 350,000) An energy ray-curable polymer obtained by reacting 80% equivalent of methacryloyloxyethyl isocyanate (21 parts by mass with respect to 100 parts by mass of the acrylic polymer) was used.
 上記以外は実施例2と同様にして、保護膜形成用複合シートを得た。各評価結果を表1に示す。 A composite sheet for forming a protective film was obtained in the same manner as Example 2 except for the above. Each evaluation result is shown in Table 1.
(比較例1)
 粘着シートの作製におけるエネルギー線硬化型重合体の代わりに、アクリル系重合体(2-エチルヘキシルアクリレート/ブチルアクリレート/ヒドロキシエチルアクリレート=35/60/5(質量比)、重量平均分子量:50万)を用いた。
 また、粘着シートの作製における光重合開始剤を配合しなかった。
 さらにまた、保護膜形成用複合シートの作製において、紫外線照射を行わなかった。
(Comparative Example 1)
Instead of the energy ray curable polymer in the production of the pressure-sensitive adhesive sheet, an acrylic polymer (2-ethylhexyl acrylate / butyl acrylate / hydroxyethyl acrylate = 35/60/5 (mass ratio), weight average molecular weight: 500,000) was used. Using.
Moreover, the photoinitiator in preparation of an adhesive sheet was not mix | blended.
Furthermore, ultraviolet rays were not irradiated in the production of the protective sheet-forming composite sheet.
 上記以外は、実施例1と同様にして、保護膜形成用複合シートを得た。各評価結果を表1に示す。 Except for the above, a protective sheet-forming composite sheet was obtained in the same manner as in Example 1. Each evaluation result is shown in Table 1.
(比較例2)
 第2粘着剤層の作製におけるエネルギー線硬化型重合体として、アクリル系重合体(2-エチルヘキシルアクリレート/ヒドロキシエチルアクリレート=80/20(質量比)、重量平均分子量:35万)にメタクリロイルオキシエチルイソシアネートを80%当量(アクリル系重合体100質量部に対し21質量部)反応させたエネルギー線硬化型重合体を用いた。
(Comparative Example 2)
As an energy ray-curable polymer in the production of the second pressure-sensitive adhesive layer, an acrylic polymer (2-ethylhexyl acrylate / hydroxyethyl acrylate = 80/20 (mass ratio), weight average molecular weight: 350,000) and methacryloyloxyethyl isocyanate Was used as an energy ray curable polymer in which 80% equivalent (21 parts by mass with respect to 100 parts by mass of the acrylic polymer) was reacted.
 上記以外は比較例1と同様にして、保護膜形成用複合シートを得た。各評価結果を表1に示す。 Other than the above, a composite sheet for forming a protective film was obtained in the same manner as in Comparative Example 1. Each evaluation result is shown in Table 1.
(比較例3)
 第2粘着剤層の作製におけるエネルギー線硬化型重合体として、アクリル系重合体(2-エチルヘキシルアクリレート/酢酸ビニル/ヒドロキシエチルアクリレート=60/20/20(質量比)、重量平均分子量:約35万)にメタクリロイルオキシエチルイソシアネートを80%当量(アクリル系重合体100質量部に対し21質量部)反応させたエネルギー線硬化型重合体を用いた。
(Comparative Example 3)
As an energy ray curable polymer in the production of the second pressure-sensitive adhesive layer, an acrylic polymer (2-ethylhexyl acrylate / vinyl acetate / hydroxyethyl acrylate = 60/20/20 (mass ratio), weight average molecular weight: about 350,000 ) Was used for the reaction with 80% equivalent of methacryloyloxyethyl isocyanate (21 parts by mass with respect to 100 parts by mass of the acrylic polymer).
 上記以外は比較例1と同様にして、保護膜形成用複合シートを得た。各評価結果を表1に示す。 Other than the above, a composite sheet for forming a protective film was obtained in the same manner as in Comparative Example 1. Each evaluation result is shown in Table 1.
Figure JPOXMLDOC01-appb-T000001
 粘着力において、「凝集破壊」は第1粘着剤層および第2粘着剤層の少なくともいずれかが凝集破壊したことを示す。
Figure JPOXMLDOC01-appb-T000001
In the adhesive strength, “cohesive failure” indicates that at least one of the first adhesive layer and the second adhesive layer has undergone cohesive failure.
 1:基材
 2:第1粘着剤層
 3:第2粘着剤層
 4:保護膜形成用フィルム
 5:粘着シート
 10:保護膜形成用複合シート
 
1: Base material 2: First pressure-sensitive adhesive layer 3: Second pressure-sensitive adhesive layer 4: Film for forming a protective film 5: Pressure-sensitive adhesive sheet 10: Composite sheet for forming a protective film

Claims (7)

  1.  基材及び第1粘着剤層を構成層として含む粘着シートの第1粘着剤層上に、保護膜形成用フィルムが第2粘着剤層を介して設けられた保護膜形成用複合シートであって、
     第2粘着剤層の平面視における形状が、粘着シートの平面視における形状に含まれる形状であり、
     第1粘着剤層が、エネルギー線硬化性粘着剤またはエネルギー線硬化性粘着剤を硬化させた粘着剤からなり、
     第2粘着剤層が、エネルギー線硬化性粘着剤を硬化させた粘着剤からなり、
     第2粘着剤層の25℃における引張弾性率が、200~2000MPaである保護膜形成用複合シート。
    A protective film-forming composite sheet in which a protective film-forming film is provided on a first pressure-sensitive adhesive layer of a pressure-sensitive adhesive sheet comprising a base material and a first pressure-sensitive adhesive layer as constituent layers, via a second pressure-sensitive adhesive layer, ,
    The shape of the second pressure-sensitive adhesive layer in plan view is a shape included in the shape of the pressure-sensitive adhesive sheet in plan view,
    The first pressure-sensitive adhesive layer is composed of an energy beam-curable pressure-sensitive adhesive or an energy beam-cured pressure-sensitive adhesive,
    The second pressure-sensitive adhesive layer is made of a pressure-sensitive adhesive obtained by curing an energy ray-curable pressure-sensitive adhesive,
    A composite sheet for forming a protective film, wherein the second adhesive layer has a tensile elastic modulus at 25 ° C. of 200 to 2000 MPa.
  2.  第2粘着剤層の25℃における引張弾性率が、500~2000MPaである請求項1に記載の保護膜形成用複合シート。 The composite sheet for forming a protective film according to claim 1, wherein the second pressure-sensitive adhesive layer has a tensile elastic modulus at 25 ° C of 500 to 2000 MPa.
  3.  保護膜形成用フィルムが熱硬化性である請求項1または2に記載の保護膜形成用複合シート。 The composite sheet for forming a protective film according to claim 1 or 2, wherein the film for forming a protective film is thermosetting.
  4.  基材が、ポリプロピレンフィルムを1層以上含むフィルムからなる請求項1~3のいずれかに記載の保護膜形成用複合シート。 The composite sheet for forming a protective film according to any one of claims 1 to 3, wherein the base material comprises a film containing one or more layers of polypropylene film.
  5.  粘着シートを、第2粘着剤層から剥離する粘着力測定試験において、第1粘着剤層および第2粘着剤層の少なくともいずれかが凝集破壊し、又は粘着力が0.8N/25mm以上である請求項1~4のいずれかに記載の保護膜形成用複合シート。 In an adhesive strength measurement test in which the adhesive sheet is peeled from the second adhesive layer, at least one of the first adhesive layer and the second adhesive layer is cohesively broken, or the adhesive strength is 0.8 N / 25 mm or more. The composite sheet for forming a protective film according to any one of claims 1 to 4.
  6.  請求項1~5のいずれかに記載の保護膜形成用複合シートを製造する方法であって、
     粘着シートの第1粘着剤層上に第2粘着剤層を積層する工程、
     第1粘着剤層と第2粘着剤層とを積層した後に、第1粘着剤層を硬化する工程を有する保護膜形成用複合シートの製造方法。
    A method for producing the composite sheet for forming a protective film according to any one of claims 1 to 5,
    A step of laminating a second pressure-sensitive adhesive layer on the first pressure-sensitive adhesive layer of the pressure-sensitive adhesive sheet,
    The manufacturing method of the composite sheet for protective film formation which has the process of hardening a 1st adhesive layer, after laminating | stacking a 1st adhesive layer and a 2nd adhesive layer.
  7.  以下の工程(1)~(3)を、この順で行う保護膜付チップの製造方法;
     工程(1):請求項1~5のいずれかに記載の保護膜形成用複合シートの保護膜形成用フィルムをワークに貼付する工程、
     工程(2):保護膜形成用フィルムを加熱硬化して保護膜を得る工程、
     工程(3):保護膜と第2粘着剤層とを分離する工程。
     
    A method for producing a chip with a protective film, wherein the following steps (1) to (3) are carried out in this order;
    Step (1): A step of attaching the protective film-forming film of the protective film-forming composite sheet according to any one of claims 1 to 5 to a workpiece,
    Step (2): a step of heat-curing the protective film-forming film to obtain a protective film,
    Step (3): A step of separating the protective film and the second pressure-sensitive adhesive layer.
PCT/JP2014/056436 2013-03-13 2014-03-12 Composite sheet for protective film formation, method for producing composite sheet for protective film formation, and method for producing chip with protective film WO2014142151A1 (en)

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WO2016195071A1 (en) * 2015-06-05 2016-12-08 リンテック株式会社 Composite sheet for forming protective film
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JP2012033637A (en) * 2010-07-29 2012-02-16 Nitto Denko Corp Dicing tape integrated semiconductor rear face film, and method of manufacturing semiconductor device

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JP2012033636A (en) * 2010-07-29 2012-02-16 Nitto Denko Corp Thermal peeling sheet integrated film for semiconductor rear face, method of collecting semiconductor element, and method of manufacturing semiconductor device
JP2012033637A (en) * 2010-07-29 2012-02-16 Nitto Denko Corp Dicing tape integrated semiconductor rear face film, and method of manufacturing semiconductor device

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JP2016182767A (en) * 2015-03-26 2016-10-20 東洋紡株式会社 Ultraviolet-transmissive antistatic release film and adhesive sheet comprising the same laminated with adhesive layer
JP2016221469A (en) * 2015-06-01 2016-12-28 関西ペイント株式会社 Multi-layered coating film forming method
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JP2020017758A (en) * 2015-06-05 2020-01-30 リンテック株式会社 Composite sheet for forming protective film
KR20190003458A (en) * 2016-04-28 2019-01-09 린텍 가부시키가이샤 Film for forming protective film and composite sheet for forming protective film
KR102456771B1 (en) 2016-04-28 2022-10-20 린텍 가부시키가이샤 A film for forming a protective film and a composite sheet for forming a protective film

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