WO2014098406A1 - Touch panel comprising anti-reflection layer and method for manufacturing same - Google Patents

Touch panel comprising anti-reflection layer and method for manufacturing same Download PDF

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Publication number
WO2014098406A1
WO2014098406A1 PCT/KR2013/011465 KR2013011465W WO2014098406A1 WO 2014098406 A1 WO2014098406 A1 WO 2014098406A1 KR 2013011465 W KR2013011465 W KR 2013011465W WO 2014098406 A1 WO2014098406 A1 WO 2014098406A1
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WO
WIPO (PCT)
Prior art keywords
layer
sensor electrodes
bridge
touch panel
substrate
Prior art date
Application number
PCT/KR2013/011465
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French (fr)
Korean (ko)
Inventor
김현수
고용남
Original Assignee
(주)인터플렉스
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Priority claimed from KR1020120148646A external-priority patent/KR20140079073A/en
Priority claimed from KR1020120148648A external-priority patent/KR20140079074A/en
Application filed by (주)인터플렉스 filed Critical (주)인터플렉스
Priority to JP2015549246A priority Critical patent/JP2016506574A/en
Publication of WO2014098406A1 publication Critical patent/WO2014098406A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only
    • G02B1/115Multilayers
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to a touch panel and a method for manufacturing the same, and more particularly, to a touch panel including an antireflection layer and a method for manufacturing the same.
  • the touch panel is a device for inputting two-dimensional coordinate data by pressing a surface of a display panel provided in electronic devices such as a smartphone, a tablet computer, a game machine, a learning aid device, and a camera with a hand or a pen.
  • electronic devices such as a smartphone, a tablet computer, a game machine, a learning aid device, and a camera with a hand or a pen.
  • touch panels are widely used in that they can be easily operated and widely applied to various display devices.
  • the touch panel is formed by including a sensor electrode provided in a matrix form on a light transmissive film or a glass material, a bridge electrode connecting the sensor electrode, and an insulating layer provided between the bridge electrodes.
  • the touch panel may be directly attached to the surfaces of various display devices. When the display device with such a touch panel is attached, visibility may be degraded due to reflection due to external light.
  • the surface of the upper surface of the touch panel may have irregularities having roughness of several tens to hundreds of nanometers to prevent diffuse reflection due to external light.
  • AG coating Anti-Glare coating
  • the haze Haze
  • the sharpness is lowered.
  • an anti-reflection coating method has been proposed to form a thin film of two or more layers having different refractive indices to prevent direct reflection caused by external light.
  • the present invention is to provide a touch panel and a manufacturing method thereof including an antireflection layer or a layer capable of antireflection function.
  • a touch panel is a substrate, a plurality of first sensor electrodes arranged side by side in a first direction on the substrate, spaced apart from the first sensor electrode on the substrate, the first direction and A plurality of second sensor electrodes arranged side by side along a second orthogonal direction, a first bridge connecting adjacent first sensor electrodes of the plurality of first sensor electrodes in the first direction, and the plurality of first sensors
  • the second sensor electrodes adjacent to each other of the plurality of second sensor electrodes are connected in the second direction through an insulating layer formed on the substrate on which the electrode, the second sensor electrode and the first bridge are formed, and via holes penetrating through the insulating layer.
  • a second bridge wherein the first bridge and the second bridge cross each other.
  • the insulating layer includes at least one low refractive layer and a high refractive layer.
  • the low refractive layer includes at least one of MgF 2, NaF, and CaF 2.
  • the high refractive layer includes at least one of CeF 3, Al 2 O 3, ZrO 2, TiO 2, and Nb 2 O x.
  • a touch panel includes a substrate, a plurality of first sensor electrodes disposed side by side along a first direction on the substrate, and spaced apart from the first sensor electrode on the substrate, the first direction A plurality of second sensor electrodes arranged side by side in a second direction orthogonal to each other, a first bridge connecting first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction, and the plurality of first electrodes
  • An insulating layer formed on a substrate on which a sensor electrode, a second sensor electrode, and a first bridge are formed, and second sensor electrodes adjacent to each other among the plurality of second sensor electrodes in the second direction through via holes penetrating through the insulating layer.
  • an anti-reflection layer disposed on a substrate on which the second bridge to connect and the plurality of sensor electrodes and the bridge are disposed.
  • the anti-reflection layer includes a film substrate, a low refractive layer disposed on the film substrate, and a high refractive layer disposed on the low refractive layer.
  • the low refractive index layer and the high refractive layer are alternately provided.
  • the low refractive layer and the high refractive layer are alternately provided two to five times.
  • the refractive index of the low refractive index layer is 1.3 or more and less than 1.5.
  • the refractive index of the high refractive index layer is 1.5 or more and 2.5 or less.
  • the low refractive layer includes at least one of MgF 2, NaF, and CaF 2.
  • the high refractive layer includes at least one of CeF 3, Al 2 O 3, ZrO 2, TiO 2, and Nb 2 O x.
  • a method of manufacturing a touch panel may include forming a plurality of first sensor electrodes, a second sensor electrode, and a first bridge on a substrate, wherein the first sensor electrode, the second sensor electrode, and the first bridge are formed. Forming a via hole for exposing a portion of the second sensor electrode through an insulating layer covering the second sensor electrode; forming a via hole for exposing a portion of the second sensor electrode; Forming a second bridge layer on the insulating layer while filling, patterning the second bridge layer to form a second bridge.
  • the forming of the insulating layer may include forming a low refractive layer and forming a high refractive layer.
  • the forming of the low refractive layer and the forming of the high refractive layer are performed twice to five times, respectively.
  • the forming of the low refractive layer and the forming of the high refractive layer may be performed using any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process, and a vacuum deposition process.
  • the touch panel according to the exemplary embodiment of the present invention may improve visibility by preventing reflection due to external light through an insulating layer having an insulating function and an antireflection function.
  • the touch panel including the anti-reflection layer according to another example of the present invention may improve visibility by preventing reflection due to external light.
  • FIG. 1 is a schematic plan view of a touch panel according to an example of the present invention.
  • FIG. 2 is an enlarged view of a portion A of the touch panel illustrated in FIG. 1.
  • FIG. 3 is a cross-sectional view taken along the line II of FIG. 2.
  • FIG. 4 is a schematic plan view of a touch panel according to another exemplary embodiment of the present invention.
  • FIG. 5 is a schematic cross-sectional view of the touch panel shown in FIG. 4.
  • 6A to 6F are diagrams for describing a method of manufacturing a touch panel according to one embodiment of the present invention.
  • a part when a part is connected to another part, this includes not only a case in which the part is directly connected, but also a case in which another part is electrically connected in between.
  • a part when a part includes a certain component, this means that it may further include other components, without excluding other components, unless specifically stated otherwise.
  • first, second, third, etc. may be used herein to describe various components, but such components are not limited by the terms. The terms are used to distinguish one component from other components.
  • first component may be referred to as the second or third component, and similarly, the second or third component may be alternatively named.
  • FIG. 1 is a schematic plan view of a touch panel according to an example of the present invention
  • FIG. 2 is an enlarged view of a portion A of the touch panel illustrated in FIG. 1.
  • 3 is a cross-sectional view taken along the line II of FIG. 2.
  • the direction from the left side to the right side of the figure is determined as the first direction
  • the direction from the top of the figure toward the bottom is determined as the second direction.
  • the first direction and the second direction are exemplary and are not limited to the directions shown in FIG. 1.
  • the touch panel 100 may include a substrate 110, a plurality of first sensor electrodes 210 disposed side by side in a first direction on the substrate, and A plurality of second sensor electrodes 220 arranged side by side in a second direction orthogonal to the first direction, and a first bridge connecting the first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction.
  • 230 among the plurality of second sensor electrodes through an insulating layer 300 formed on a substrate on which the plurality of first sensor electrodes, the second sensor electrode, and the first bridge are formed, and via holes penetrating through the insulating layer. It may include a second bridge 240 for connecting the second sensor electrodes adjacent to each other in the second direction.
  • a wiring circuit (not shown) connected to the first sensor electrode 210 and the second sensor electrode 220 may be disposed on the bezel of the touch panel 100.
  • the substrate 110 may be formed using any one of a polymer film, a plastic, and an organic.
  • the substrate 110 will be described using an example of using a polymer film made of a transparent material. PET may be used as the polymer film of the transparent material.
  • the first sensor electrode 210 and the second sensor electrode 220 serve to determine whether an input device such as a finger or a touch pen is in contact with each other.
  • the first sensor electrode 210 and the second sensor electrode 220 are illustrated as having a rhombus shape, but are not necessarily limited to a rhombus shape, and may have various shapes such as a triangle, a square, a rectangle, and a circle. It can be formed as.
  • the number and size of the first sensor electrode 210 and the second sensor electrode 220 may vary depending on the resolution of the touch panel 100 and the type and size of the display to which the touch panel 100 is attached.
  • the first bridge 230 serves to connect the plurality of first sensor electrodes 210 to each other, and the second bridge 240 serves to connect the plurality of second sensor electrodes 220 to each other. do.
  • the first bridge 230 and the second bridge 240 cross each other with the insulating layer 300 interposed therebetween.
  • the first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240 may be formed of a metal or a transparent material having conductivity.
  • Transparent conductive oxide (TCO) can be used as the transparent material having such conductivity.
  • TCO transparent conductive oxide
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • ZnO zinc oxide
  • the first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240 may be formed of the same material or may be formed of different materials. In consideration of manufacturing convenience, the first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240 may be formed of the same material.
  • An insulating layer 300 may be formed on the substrate 110 on which the first sensor electrode 210, the second sensor electrode 220, and the first bridge 230 are formed.
  • the insulating layer 300 may be formed in a multilayer structure including at least one low refractive layer 310 and a high refractive layer 320.
  • the insulating layer 300 may be formed by alternately repeating the low refractive layer 310 and the high refractive layer 320.
  • the insulating layer 300 is illustrated in a stacked structure in the order of the low refractive layer 311, the high refractive layer 321, the low refractive layer 312, and the high refractive layer 322, but is not limited thereto.
  • the low refractive layer 310 and the high refractive layer 320 may be alternately stacked two to five times.
  • the low refractive layer 310 may be formed to include an organic material or an inorganic material having a refractive index of 1.3 or more and 1.5 or less.
  • the low refractive layer 310 may be formed using MgF 2, NaF and CaF 2.
  • the high refractive index layer 320 may include an organic material or an inorganic material having a refractive index greater than 1.5 and less than 2.5. CeF3, Al2O3, ZrO2, TiO2 and Nb2Ox may be used as the high refractive layer.
  • the insulating layer 300 in which the low refractive index layer 310 and the high refractive index layer 320 are alternately stacked is electrically insulated from the first bridge 230 and the second bridge 240. At the same time anti-reflection can be achieved.
  • the external light incident at the boundary surface of each of the stacked thin films may be transmitted or absorbed without being reflected.
  • the external light reflectance may decrease as the number of thin films stacked increases.
  • FIG. 4 is a schematic plan view of a touch panel according to another exemplary embodiment of the present invention
  • FIG. 5 is a schematic cross-sectional view of the touch panel shown in FIG. 4.
  • descriptions overlapping descriptions of the touch panel according to the exemplary embodiment will be omitted.
  • the touch panel 100 includes a substrate 110, a plurality of first sensor electrodes 210 disposed side by side in a first direction on the substrate, A plurality of second sensor electrodes 220 arranged side by side in a second direction perpendicular to the first direction, and a first connecting the first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction;
  • An anti-reflection layer disposed on a substrate on which the second bridge 240 and the plurality of sensor electrodes 210 and 220 and the bridges 230 and 240 which connect adjacent second sensor electrodes in the second direction are disposed ( 400).
  • the anti-reflection layer 400 may be formed in a multilayer structure including a film substrate 430, a low refractive layer 410 disposed on the film substrate 430, and a high refractive layer 420 disposed on the low refractive layer. Can be.
  • the antireflection film 400 may be formed by alternately repeating the low refractive layer 410 and the high refractive layer 420.
  • the antireflection layer 400 has a structure in which a low refractive index layer 411, a high refractive index layer 421, a low refractive layer 412, and a high refractive layer 422 are stacked on the film base 430.
  • the low refractive layer 410 and the high refractive layer 420 may be alternately stacked two to five times.
  • the external light incident on the boundary surface of each of the stacked thin films may be transmitted or absorbed without being reflected.
  • the amount of light transmitted or absorbed relative to the amount of incident light increases as the difference in refractive index between the thin films stacked on the antireflection layer 400 increases and the number of the high refractive index and the low refractive thin films stacked increases. Therefore, as the number of the high refractive index-low refractive thin films laminated increases, the external light reflectance may be lowered, thereby improving visibility.
  • ITO (n 2.0), which may be used as a material such as the first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240, generally has a high refractive index. Since the material has a low refractive index layer 411 and one high refractive index-low refractive layer of the anti-reflection film 400 can be improved anti-reflection function.
  • the film substrate 430 may be formed using an insulating film of a transparent material.
  • the film base material 430 can be appropriately selected from known transparent plastic films.
  • plastic films include polyester films, polyethylene films, polypropylene films, triacetylcellulose films, polyvinyl chloride films, polyvinyl alcohol films, polyimide films, cycloolefin resin films, and acrylic resin films.
  • the film substrate 430 may be transparent, translucent, or colored.
  • the thickness of the film substrate 430 is not particularly limited, but generally has a thickness range of 30 to 200 ⁇ m.
  • one or both surfaces of the film substrate 430 may be subjected to surface treatment by an oxidation method, an unevenness method, or the like.
  • the oxidation method include a corona discharge treatment, a plasma treatment, a chromic acid treatment, a flame treatment, a hot air treatment, and an ultraviolet irradiation treatment.
  • the uneven treatment include a sand blasting method and a solvent treatment method.
  • An adhesive layer 440 may be provided on the rear surface of the film substrate 430.
  • the pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer 440 may be used a pressure-sensitive adhesive suitable for optical purposes, such a pressure-sensitive adhesive may be a urethane-based adhesive and a silicone-based adhesive.
  • the thickness of the pressure-sensitive adhesive layer may have a range value of 10 to 60 ⁇ m.
  • the low refractive layer 410 may be formed to include an organic material or an inorganic material having a refractive index of 1.3 or more and less than 1.5.
  • the low refractive layer 410 may be formed using MgF 2, NaF, CaF 2, or the like.
  • the high refractive layer 420 may be formed to include an organic material or an inorganic material having a refractive index of 1.5 or more and 2.5 or less.
  • the high refractive layer 420 may use CeF 3, Al 2 O 3, ZrO 2, TiO 2, Nb 2 O x, or the like.
  • the low refractive layer 410 and the high refractive layer 420 is any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process and a vacuum deposition process on the film substrate 430 It can be formed using.
  • the external light incident on the boundary surface of each of the stacked thin films may be transmitted or absorbed without being reflected.
  • the external light reflectance may decrease as the number of stacked thin films increases.
  • 6A to 6F are diagrams for describing a method of manufacturing a touch panel according to one embodiment of the present invention.
  • a method of manufacturing a touch panel includes: (a) patterning a plurality of first sensor electrodes, a second sensor electrode, and a first bridge on a substrate; (b) the first sensor electrode and a second; Forming an insulating layer on the substrate on which the sensor electrode and the first bridge are patterned, (c) forming a via hole through the insulating layer covering the second sensor electrode to expose a portion of the second sensor electrode, (d) forming a second bridge layer on the insulating layer while filling a via hole exposing a portion of the second sensor electrode, (e) patterning the second bridge layer to form a second bridge Include.
  • a first sensor electrode 210, a second sensor electrode (not shown), and a first bridge 230 are formed on the substrate 110.
  • An electrode (not shown), a second sensor electrode 220, and a first bridge 230 may be formed.
  • the first sensor electrode (not shown), the second sensor electrode 220 and the first bridge may be formed using a transparent conductive oxide (TCO).
  • TCO transparent conductive oxide
  • ITO ITO
  • IZO IZO
  • ZnO ZnO
  • the first sensor electrode (not shown), the second sensor electrode 220 and the method for forming the material for forming the first bridge 230 may be a spin coating process, printing process, sputtering process, chemical vapor deposition process, atomic layer Any one of a lamination process and a vacuum deposition process may be used.
  • an insulating layer 300 is formed on the substrate 110 on which the first sensor electrode (not shown), the second sensor electrode 220, and the first bridge 230 are formed.
  • the forming of the insulating layer 300 includes forming a low refractive layer 310 and forming a high refractive layer 320.
  • the forming of the low refractive layer 310 and the forming of the high refractive layer 320 may be repeated two to five times, respectively.
  • the low refractive layer 310 may be formed using at least one of MgFx, SiOx, NaF, and CaFx
  • the high refractive layer 320 may be formed using at least one of CeFx, Al2Ox, ZrOx, TiOx, and Nb2Ox. Can be.
  • the low refractive layer 310 and the high refractive layer 320 may be formed using any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process and a vacuum deposition process.
  • a via hole is formed through the insulating layer 300 to expose a portion of the second sensor electrode 220.
  • the via hole is for electrically connecting the plurality of second sensor electrodes 220 to the second bridge 240.
  • the via hole may be formed through the insulating layer 300 disposed on the second sensor electrode 220.
  • a second bridge layer is formed on the insulating layer 300. After forming a second bridge layer on the insulating layer 300 while filling a via hole exposing a portion of the second sensor electrode, the second bridge layer is patterned to form a second bridge 240.

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  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Human Computer Interaction (AREA)
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  • Inorganic Chemistry (AREA)
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Abstract

Provided is a touch panel comprising: a substrate; a plurality of first sensor electrodes arranged in parallel on the substrate along a first direction; a plurality of second sensor electrodes spaced from the first sensor electrodes and arranged in parallel to each other on the substrate along a second direction which is perpendicular to the first direction; a first bridge for connecting neighboring first sensor electrodes among the plurality of first sensor electrodes in the first direction; an insulating layer formed on the substrate on which the plurality of first sensor electrodes, the second sensor electrodes and the first bridge are formed; and a second bridge for connecting neighboring second sensor electrodes among the plurality of second sensor electrodes in the second direction through a via hole penetrating through the insulating layer, wherein the first bridge and the second bridge cross each other.

Description

반사방지층을 포함하는 터치 패널 및 이의 제조 방법Touch panel comprising an antireflection layer and a method of manufacturing the same
본 발명은 터치 패널 및 이의 제조 방법에 관한 것으로, 특히 반사방지층을 포함하는 터치 패널 및 이의 제조 방법에 관한 것이다.The present invention relates to a touch panel and a method for manufacturing the same, and more particularly, to a touch panel including an antireflection layer and a method for manufacturing the same.
터치 패널은 스마트폰, 태블릿 컴퓨터, 게임기, 학습보조장치 및 카메라 등의 전자 장치에 구비된 표시 패널의 표면을 손이나 펜을 사용하여 누름으로써, 2차원의 좌표 데이터를 입력하는 장치이다. 이러한 터치 패널은 조작이 용이하고 각종 디스플레이 장치에 폭넓게 응용될 수 있다는 점에서 널리 사용되고 있다.The touch panel is a device for inputting two-dimensional coordinate data by pressing a surface of a display panel provided in electronic devices such as a smartphone, a tablet computer, a game machine, a learning aid device, and a camera with a hand or a pen. Such touch panels are widely used in that they can be easily operated and widely applied to various display devices.
일반적으로 터치 패널은 광 투과성 필름 또는 글라스 소재의 기판 상에 매트릭스 형태로 구비된 센서전극, 상기 센서전극을 연결하는 브릿지 전극 및 상기 브릿지 전극 사이에 구비되는 절연층을 포함하여 형성된다.In general, the touch panel is formed by including a sensor electrode provided in a matrix form on a light transmissive film or a glass material, a bridge electrode connecting the sensor electrode, and an insulating layer provided between the bridge electrodes.
상기 터치 패널은 각종 디스플레이 장치의 표면에 직접 부착되어 사용될 수 있다. 이러한 터치 패널이 부착된 디스플레이 장치를 볼 때, 외광으로인한 반사 때문에 시인성이 떨어질 수 있다.The touch panel may be directly attached to the surfaces of various display devices. When the display device with such a touch panel is attached, visibility may be degraded due to reflection due to external light.
상기와 같은 외광으로 인한 반사를 방지하여 시인성을 개선하기 위해서 터치 패널 상부 기재 표면에 수십~수백 나노 미터 크기의 거칠기(roughness)를 갖는 요철을 형성하여 외광으로 인한 확산 반사(diffuse reflection)를 방지하는 AG 코팅(Anti-Glare coating) 방식이 제안되었으나, 헤이즈(Haze)가 높아져 선명도가 떨어지는 단점이있다.In order to prevent the reflection caused by the external light and to improve the visibility, the surface of the upper surface of the touch panel may have irregularities having roughness of several tens to hundreds of nanometers to prevent diffuse reflection due to external light. AG coating (Anti-Glare coating) method has been proposed, but the haze (Haze) has a disadvantage that the sharpness is lowered.
이에 최근에는 굴절률이 서로 다른 두 층 이상의 박막을 형성하여 외광으로인한 직접 반사(specular reflection)를 방지하는AR 코팅(Anti-Reflection coating) 방식이 제안되었다.Recently, an anti-reflection coating method has been proposed to form a thin film of two or more layers having different refractive indices to prevent direct reflection caused by external light.
상기 AR 코팅은 고굴절률층 및 저굴절률층을 교대로 적층하는 코팅 방식으로입사되는 외광은 상기 적층된 각 박막의 경계면에서 소멸 간섭을 일으키게 된다. 상기 적층되는 박막간의 굴절률 차이가 클수록, 적층되는 박막의 개수가 증가할수록 반사율이 낮아질 수 있다. 그러나, 실제로 터치 패널 상에 AR층을 구현함에 있어서는 상기 AR층을 무한정 두껍게 할 수는 없고, 일정 두께 이하로 형성할 수밖에 없는 제약이 있다. In the AR coating, external light incident by a coating method of alternately stacking a high refractive index layer and a low refractive index layer causes extinction interference at an interface of each of the stacked thin films. The greater the difference in refractive index between the stacked thin films, the lower the reflectance as the number of stacked thin films increases. However, in actual implementation of the AR layer on the touch panel, there is a limitation that the AR layer cannot be made infinitely thick, but has to be formed below a predetermined thickness.
이에 본 발명에서는 반사방지층 또는 반사방지기능을 할 수 있는 층을 포함하는 터치 패널 및 이의 제조 방법을 제공하고자 한다.Accordingly, the present invention is to provide a touch panel and a manufacturing method thereof including an antireflection layer or a layer capable of antireflection function.
본 발명의 일례에 따른 터치 패널은 기판, 상기 기판 상에 제 1 방향을 따라 나란하게배치되는 복수개의 제 1 센서전극, 상기 기판 상에, 상기 제 1 센서전극과 이격되어, 상기 제 1 방향과 직교하는 제 2 방향을 따라 나란하게 배치되는 복수개의제 2 센서전극, 상기 복수개의 제 1 센서전극중 서로 인접한 제 1 센서전극들을 상기 제 1 방향으로 연결하는 제 1 브릿지, 상기 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판상에 형성되는 절연층 및 상기 절연층을 관통하는 비아홀을 통하여 상기 복수개의 제 2 센서전극중 서로 인접한 제 2 센서전극들을 상기 제 2 방향으로 연결하는 제 2 브릿지를 포함하며, 상기 제 1 브릿지 및 제 2 브릿지는 서로 교차된다.A touch panel according to an embodiment of the present invention is a substrate, a plurality of first sensor electrodes arranged side by side in a first direction on the substrate, spaced apart from the first sensor electrode on the substrate, the first direction and A plurality of second sensor electrodes arranged side by side along a second orthogonal direction, a first bridge connecting adjacent first sensor electrodes of the plurality of first sensor electrodes in the first direction, and the plurality of first sensors The second sensor electrodes adjacent to each other of the plurality of second sensor electrodes are connected in the second direction through an insulating layer formed on the substrate on which the electrode, the second sensor electrode and the first bridge are formed, and via holes penetrating through the insulating layer. And a second bridge, wherein the first bridge and the second bridge cross each other.
본 발명의 일례에 따른 터치 패널에서 상기 절연층은 적어도 하나 이상의 저굴절층 및 고굴절층을 포함한다.In the touch panel according to the exemplary embodiment of the present invention, the insulating layer includes at least one low refractive layer and a high refractive layer.
본 발명의 일례에 따른 터치 패널에서 상기 저굴절층은 MgF2, NaF 및 CaF2 중 적어도 하나를 포함한다.In the touch panel according to the exemplary embodiment of the present invention, the low refractive layer includes at least one of MgF 2, NaF, and CaF 2.
본 발명의 일례에 따른 터치 패널에서 상기 고굴절층은 CeF3, Al2O3, ZrO2, TiO2 및 Nb2Ox 중 적어도 하나를 포함한다.In the touch panel according to the exemplary embodiment of the present invention, the high refractive layer includes at least one of CeF 3, Al 2 O 3, ZrO 2, TiO 2, and Nb 2 O x.
본 발명의 다른 일례에 따른 터치 패널은 기판, 상기 기판 상에 제 1 방향을 따라 나란하게 배치되는 복수개의 제 1 센서전극, 상기 기판 상에, 상기 제 1 센서전극과 이격되어, 상기 제 1 방향과 직교하는 제 2 방향을 따라 나란하게 배치되는 복수개의제 2 센서전극, 상기 복수개의 제 1 센서전극중 서로 인접한 제 1 센서전극들을 상기 제 1 방향으로 연결하는 제 1 브릿지, 상기 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판상에 형성되는 절연층, 상기 절연층을 관통하는 비아홀을 통하여 상기 복수개의 제 2 센서전극중 서로 인접한 제 2 센서전극들을 상기 제 2 방향으로 연결하는 제 2 브릿지 및 상기 복수개의 센서전극 및 브릿지가 배치된 기판 상에 배치되는 반사방지층을 포함한다.According to another exemplary embodiment of the present disclosure, a touch panel includes a substrate, a plurality of first sensor electrodes disposed side by side along a first direction on the substrate, and spaced apart from the first sensor electrode on the substrate, the first direction A plurality of second sensor electrodes arranged side by side in a second direction orthogonal to each other, a first bridge connecting first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction, and the plurality of first electrodes An insulating layer formed on a substrate on which a sensor electrode, a second sensor electrode, and a first bridge are formed, and second sensor electrodes adjacent to each other among the plurality of second sensor electrodes in the second direction through via holes penetrating through the insulating layer. And an anti-reflection layer disposed on a substrate on which the second bridge to connect and the plurality of sensor electrodes and the bridge are disposed.
본 발명의 다른 일례에 따른 터치 패널에서 상기 반사방지층은 필름 기재, 상기 필름 기재 상에 배치되는 저굴절층 및 상기 저굴절층 상에 배치되는 고굴절층을 포함한다.In the touch panel according to another exemplary embodiment of the present invention, the anti-reflection layer includes a film substrate, a low refractive layer disposed on the film substrate, and a high refractive layer disposed on the low refractive layer.
본 발명의 다른 일례에 따른 터치 패널에서 상기 저굴절층 및 고굴절층은 교대로 반복되어 구비된다.In the touch panel according to another embodiment of the present invention, the low refractive index layer and the high refractive layer are alternately provided.
본 발명의 다른 일례에 따른 터치 패널에서 상기 저굴절층 및 고굴절층은 2회 내지 5회 교대로 반복되어 구비된다.In the touch panel according to another exemplary embodiment of the present invention, the low refractive layer and the high refractive layer are alternately provided two to five times.
본 발명의 다른 일례에 따른 터치 패널에서 상기 저굴절층의 굴절률은 1.3 이상 내지 1.5 미만이다.In the touch panel according to another embodiment of the present invention, the refractive index of the low refractive index layer is 1.3 or more and less than 1.5.
본 발명의 다른 일례에 따른 터치 패널에서 상기 고굴절층의 굴절률은 1.5 이상 내지 2.5 이하이다.In the touch panel according to another embodiment of the present invention, the refractive index of the high refractive index layer is 1.5 or more and 2.5 or less.
본 발명의 다른 일례에 따른 터치 패널에서 상기 저굴절층은 MgF2, NaF 및 CaF2 중 적어도 하나를 포함한다.In the touch panel according to another embodiment of the present invention, the low refractive layer includes at least one of MgF 2, NaF, and CaF 2.
본 발명의 다른 일례에 따른 터치 패널에서 상기 고굴절층은 CeF3, Al2O3, ZrO2, TiO2 및 Nb2Ox 중 적어도 하나를 포함한다.In the touch panel according to another exemplary embodiment of the present invention, the high refractive layer includes at least one of CeF 3, Al 2 O 3, ZrO 2, TiO 2, and Nb 2 O x.
본 발명의 일례에 따른 터치 패널 제조 방법은 기판 상에 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지를 형성하는 단계, 상기 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판 상에 절연층을 형성하는 단계, 상기 제 2 센서전극을 덮는 절연층을 관통하여 상기 제 2 센서전극의 일부를 노출시키는 비아홀을 형성하는 단계, 상기 제 2 센서전극의 일부를 노출시키는 비아홀을 채우면서 상기 절연층 상에 제 2 브릿지층을 형성하는 단계, 상기 제 2 브릿지층을 패터닝하여 제 2 브릿지를 형성하는 단계를 포함한다.According to one or more exemplary embodiments, a method of manufacturing a touch panel may include forming a plurality of first sensor electrodes, a second sensor electrode, and a first bridge on a substrate, wherein the first sensor electrode, the second sensor electrode, and the first bridge are formed. Forming a via hole for exposing a portion of the second sensor electrode through an insulating layer covering the second sensor electrode; forming a via hole for exposing a portion of the second sensor electrode; Forming a second bridge layer on the insulating layer while filling, patterning the second bridge layer to form a second bridge.
상기 절연층을 형성하는 단계는 저굴절층을 형성하는 단계 및 고굴절층을 형성하는 단계를 포함한다.The forming of the insulating layer may include forming a low refractive layer and forming a high refractive layer.
상기 저굴절층을 형성하는 단계 및 고굴절층을 형성하는 단계는 각각 2회 내지 5회 실시된다.The forming of the low refractive layer and the forming of the high refractive layer are performed twice to five times, respectively.
상기 저굴절층을 형성하는 단계 및 고굴절층을 형성하는 단계는 스핀 코팅 공정, 프린팅 공정, 스퍼터링 공정, 화학 기상 증착 공정, 원자층 적층 공정 및 진공 증착 공정 중 어느 하나의 공정을 이용하여 형성된다.The forming of the low refractive layer and the forming of the high refractive layer may be performed using any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process, and a vacuum deposition process.
본 발명의 일례에 따른 터치 패널은 절연 기능 및 반사 방지 기능을 하는 절연층을 통하여 외광으로 인한 반사를 방지하여 시인성을 개선할 수 있다.The touch panel according to the exemplary embodiment of the present invention may improve visibility by preventing reflection due to external light through an insulating layer having an insulating function and an antireflection function.
또한, 본 발명의 다른 일례에 따른 반사방지층을 포함하는 터치 패널은 외광으로 인한 반사를 방지하여 시인성을 개선할 수 있다.In addition, the touch panel including the anti-reflection layer according to another example of the present invention may improve visibility by preventing reflection due to external light.
도 1은 본 발명의 일례에 따른 터치 패널의 개략적인 평면도이다.1 is a schematic plan view of a touch panel according to an example of the present invention.
도 2는 도 1에 도시된 터치 패널의 일부(A)를 확대한 도이다.FIG. 2 is an enlarged view of a portion A of the touch panel illustrated in FIG. 1.
도 3은 도 2에서 Ⅰ-Ⅱ를 따라 절단한 단면도이다.3 is a cross-sectional view taken along the line II of FIG. 2.
도 4는 본 발명의 다른 일례에 따른 터치 패널의 개략적인 평면도이다.4 is a schematic plan view of a touch panel according to another exemplary embodiment of the present invention.
도 5는 도 4에 도시된 터치 패널의 개략적인 단면도이다.FIG. 5 is a schematic cross-sectional view of the touch panel shown in FIG. 4.
도 6a 내지 도 6f는 본 발명의 일례에 따른 터치 패널의 제조 방법을 설명하기 위한 도이다.6A to 6F are diagrams for describing a method of manufacturing a touch panel according to one embodiment of the present invention.
이하, 첨부도면을 참조하여 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
본 발명은 다양한 변경이 가능하고, 여러 가지 형태로 실시될 수 있는 바, 특정의 실시예만을 도면에 예시하고본문에는 이를 중심으로 설명한다. 그렇다고하여 본 발명의 범위가 상기 특정한 실시예로 한정되는 것은 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변경, 균등물 또는 대체물은 본 발명의 범위에 포함되는 것으로 이해되어야 한다.The present invention may be modified in various ways, and may be implemented in various forms. Only specific embodiments are illustrated in the drawings and the text will be mainly described. However, the scope of the present invention is not limited to the above specific embodiments, and it should be understood that all changes, equivalents, or substitutes included in the spirit and technical scope of the present invention are included in the scope of the present invention.
본 명세서에서 어떤 부분이 다른 부분과 연결되어 있다고 할 때, 이는 직접적으로 연결되어있는 경우뿐 아니라, 그 중간에 다른 소자를 사이에 두고 전기적으로 연결되어 있는 경우도 포함한다. 또한, 어떤 부분이 어떤 구성 요소를 포함한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.In the present specification, when a part is connected to another part, this includes not only a case in which the part is directly connected, but also a case in which another part is electrically connected in between. In addition, when a part includes a certain component, this means that it may further include other components, without excluding other components, unless specifically stated otherwise.
본 명세서에서 제1, 제2, 제3 등의 용어는 다양한 구성 요소들을 설명하는데 사용될 수 있지만, 이러한 구성 요소들은 상기 용어들에 의해 한정되는 것은 아니다. 상기 용어들은 하나의 구성 요소를 다른 구성 요소들로부터 구별하는 목적으로 사용된다. 예를 들어, 본 발명의 권리 범위로부터 벗어나지 않고, 제1 구성 요소가 제2 또는 제3 구성 요소 등으로 명명될 수 있으며, 유사하게 제2 또는 제3 구성 요소도 교호적으로 명명될 수 있다.The terms first, second, third, etc. may be used herein to describe various components, but such components are not limited by the terms. The terms are used to distinguish one component from other components. For example, without departing from the scope of the present invention, the first component may be referred to as the second or third component, and similarly, the second or third component may be alternatively named.
본 발명을 명확하게 설명하기위해서 설명과 관계없는 부분은 생략하였으며, 명세서 전체를 통하여 동일 또는 유사한 구성요소에 대해서는 동일한 참조 부호를 붙인다.In order to clearly describe the present invention, parts irrelevant to the description are omitted, and like reference numerals designate like elements throughout the specification.
도 1은 본 발명의 일례에 따른 터치 패널의 개략적인 평면도이고, 도 2는 도 1에 도시된 터치 패널의 일부(A)를 확대한 도이다. 또한, 도 3은 도 2에서 Ⅰ-Ⅱ를 따라 절단한 단면도이다.1 is a schematic plan view of a touch panel according to an example of the present invention, and FIG. 2 is an enlarged view of a portion A of the touch panel illustrated in FIG. 1. 3 is a cross-sectional view taken along the line II of FIG. 2.
도 1에서 설명의 편의상, 도면의 좌측에서 우측으로 향하는 방향을 제 1 방향으로 정하고, 도면의 위에서 아래로 향하는 방향을 제 2 방향으로 정하였다. 상기 제 1 방향 및 상기 제 2 방향은 예시적인 것으로, 도 1에 도시된 방향에 한정되지 않음은 물론이다.For convenience of description in FIG. 1, the direction from the left side to the right side of the figure is determined as the first direction, and the direction from the top of the figure toward the bottom is determined as the second direction. The first direction and the second direction are exemplary and are not limited to the directions shown in FIG. 1.
도 1 내지 도 3을 참조하면, 본 발명의 일례에 따른 터치 패널(100)은 기판(110), 상기 기판 상에 제 1 방향을 따라 나란하게 배치되는 복수개의 제 1 센서전극(210), 상기 제 1 방향과 직교하는 제 2 방향을 따라 나란하게 배치되는 복수개의 제 2 센서전극(220), 상기 복수개의 제 1 센서전극 중 서로 인접한 제 1 센서전극들을 상기 제 1 방향으로 연결하는 제 1 브릿지(230), 상기 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판상에 형성되는 절연층(300) 및 상기 절연층을 관통하는 비아홀을 통하여 상기 복수개의 제 2 센서전극 중 서로 인접한 제 2 센서전극들을 상기 제 2 방향으로 연결하는 제 2 브릿지(240)를 포함할 수 있다.1 to 3, the touch panel 100 according to an exemplary embodiment of the present invention may include a substrate 110, a plurality of first sensor electrodes 210 disposed side by side in a first direction on the substrate, and A plurality of second sensor electrodes 220 arranged side by side in a second direction orthogonal to the first direction, and a first bridge connecting the first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction. 230, among the plurality of second sensor electrodes through an insulating layer 300 formed on a substrate on which the plurality of first sensor electrodes, the second sensor electrode, and the first bridge are formed, and via holes penetrating through the insulating layer. It may include a second bridge 240 for connecting the second sensor electrodes adjacent to each other in the second direction.
또한, 상기 터치 패널(100)의 베젤부에는 상기 제 1 센서전극(210) 및 제 2 센서전극(220)과 연결되는 배선회로(도시되지 않음)등이 위치할 수 있다.In addition, a wiring circuit (not shown) connected to the first sensor electrode 210 and the second sensor electrode 220 may be disposed on the bezel of the touch panel 100.
상기 기판(110)은 고분자 필름, 플라스틱 또는 유기 중 어느 하나를 이용하여 형성될 수 있다. 이하에서 상기 기판(110)은 투명한 소재의 고분자 필름을 이용하는 것을 예로 들어 설명한다. 상기 투명한 소재의 고분자 필름으로는 PET를 이용할 수 있다.The substrate 110 may be formed using any one of a polymer film, a plastic, and an organic. Hereinafter, the substrate 110 will be described using an example of using a polymer film made of a transparent material. PET may be used as the polymer film of the transparent material.
상기 제 1 센서전극(210) 및 제 2 센서전극(220)은 손가락 또는 터치펜 등과 같은 입력 장치가 접촉되었는지 여부를 판단하는 역할을 한다.The first sensor electrode 210 and the second sensor electrode 220 serve to determine whether an input device such as a finger or a touch pen is in contact with each other.
도 1에서, 상기 제 1 센서전극(210) 및 제 2 센서전극(220)은 마름모 형상을 가지는 것으로 도시되어 있으나, 반드시 마름모 형태로 한정되는 것은 아니며, 삼각형, 정사각형, 직사각형 및 원형과 같이 다양한 형태로 형성될 수 있다.In FIG. 1, the first sensor electrode 210 and the second sensor electrode 220 are illustrated as having a rhombus shape, but are not necessarily limited to a rhombus shape, and may have various shapes such as a triangle, a square, a rectangle, and a circle. It can be formed as.
상기 제 1 센서전극(210) 및 제 2 센서전극(220)의 개수 및 크기는 상기 터치 패널(100)의 해상도 및 상기 터치 패널(100)이 부착되는 디스플레이의 종류 및 크기에 따라 달라질 수 있다.The number and size of the first sensor electrode 210 and the second sensor electrode 220 may vary depending on the resolution of the touch panel 100 and the type and size of the display to which the touch panel 100 is attached.
상기 제 1 브릿지(230)는 상기 복수개의 제 1 센서전극(210)을 서로 연결시키는 역할을 하고, 상기 제 2 브릿지(240)는 상기 복수개의 제 2 센서전극(220)을 서로 연결시키는 역할을 한다.The first bridge 230 serves to connect the plurality of first sensor electrodes 210 to each other, and the second bridge 240 serves to connect the plurality of second sensor electrodes 220 to each other. do.
상기 제 1 브릿지(230) 및 제 2 브릿지(240)는 상기 절연층(300)을 사이에 두고 서로 교차된다.The first bridge 230 and the second bridge 240 cross each other with the insulating layer 300 interposed therebetween.
상기 제 1 센서전극(210), 제 2 센서전극(220), 제 1 브릿지(230) 및 제 2 브릿지(240)은 금속 또는 도전성을 갖는 투명재료로 형성될 수 있다. 이러한 도전성을 갖는 투명 재료로서 투명 전도성 산화물(TCO:Transparent Conductive Oxide)을 사용할 수 있다.The first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240 may be formed of a metal or a transparent material having conductivity. Transparent conductive oxide (TCO) can be used as the transparent material having such conductivity.
이러한 투명 전도성 산화물(TCO)로는 인듐 주석 산화물(ITO:Indium Tin Oxide), 인듐 아연 산화물(IZO:Indium Zinc Oxide) 및 아연 산화물(ZnO) 등을 사용할 수 있다. 이들은 단독으로 또는 서로 조합되어 사용될 수 있다.As the transparent conductive oxide (TCO), indium tin oxide (ITO), indium zinc oxide (IZO: indium zinc oxide), and zinc oxide (ZnO) may be used. These may be used alone or in combination with each other.
상기 제 1 센서전극(210), 제 2 센서전극(220), 제 1 브릿지(230) 및 제 2 브릿지(240)은 동일한 재료에 의하여 형성될 수도 있고, 서로 다른 재료에 의하여 형성될 수도 있다. 제조상 편의성을 고려할 때 상기 제 1 센서전극(210), 제 2 센서전극(220), 제 1 브릿지(230) 및 제 2 브릿지(240)은 동일한 재료로 형성되는 것이 바람직하다.The first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240 may be formed of the same material or may be formed of different materials. In consideration of manufacturing convenience, the first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240 may be formed of the same material.
상기 제 1 센서전극(210), 제 2 센서전극(220) 및 제 1 브릿지(230)가 형성된 기판(110) 상에는 절연층(300)이 형성될 수 있다.An insulating layer 300 may be formed on the substrate 110 on which the first sensor electrode 210, the second sensor electrode 220, and the first bridge 230 are formed.
상기 절연층(300)은 적어도 하나 이상의 저굴절층(310) 및 고굴절층(320)으로 이루어진 다층 구조로 형성될 수 있다. 상기 절연층(300)은 상기 저굴절층(310) 및 고굴절층(320)이 교대로 반복되어 형성될 수 있다.The insulating layer 300 may be formed in a multilayer structure including at least one low refractive layer 310 and a high refractive layer 320. The insulating layer 300 may be formed by alternately repeating the low refractive layer 310 and the high refractive layer 320.
도 3에서는 상기 절연층(300)이 저굴절층(311), 고굴절층(321), 저굴절층(312) 및 고굴절층(322)의 순서로 적층된 구조로 도시되었으나, 이에 한정되는 것은아니며, 상기 저굴절층(310) 및 고굴절층(320)은 2회 내지 5회 교대로 적층될 수 있다.In FIG. 3, the insulating layer 300 is illustrated in a stacked structure in the order of the low refractive layer 311, the high refractive layer 321, the low refractive layer 312, and the high refractive layer 322, but is not limited thereto. The low refractive layer 310 and the high refractive layer 320 may be alternately stacked two to five times.
상기 저굴절층(310)은 굴절률 1.3 이상 1.5 이하의 유기물 또는 무기물을 포함하여 형성될 수 있다. 상기 저굴절층(310)은 MgF2, NaF 및 CaF2 등을 사용하여 형성할 수 있다.The low refractive layer 310 may be formed to include an organic material or an inorganic material having a refractive index of 1.3 or more and 1.5 or less. The low refractive layer 310 may be formed using MgF 2, NaF and CaF 2.
상기 고굴절층(320)은 굴절률 1.5 초과 2.5 이하의 유기물 또는 무기물을 포함하여 형성될 수 있다. 상기 고굴절층은 CeF3, Al2O3, ZrO2, TiO2 및 Nb2Ox 등을 사용할 수 있다.The high refractive index layer 320 may include an organic material or an inorganic material having a refractive index greater than 1.5 and less than 2.5. CeF3, Al2O3, ZrO2, TiO2 and Nb2Ox may be used as the high refractive layer.
상기와 같이 저굴절층(310) 및 고굴절층(320)이 교대로 반복되어 적층된 상기 절연층(300)은 상기 제 1 브릿지(230) 및 제 2 브릿지(240)를 전기적으로 절연시키는 기능과 동시에 반사 방지 기능을 할 수 있다.As described above, the insulating layer 300 in which the low refractive index layer 310 and the high refractive index layer 320 are alternately stacked is electrically insulated from the first bridge 230 and the second bridge 240. At the same time anti-reflection can be achieved.
상기 절연층(300)에 외광이 입사되는 경우 상기 적층된 각 박막의 경계면에서 입사된 외광이 반사되지 않고 투과 또는 흡수될 수 있다. 상기 절연층(300)에 적층되는 박막간의 굴절률 차이가 클수록, 적층되는 박막의 개수가 증가할수록 외광 반사율이 낮아질 수 있다.When external light is incident on the insulating layer 300, the external light incident at the boundary surface of each of the stacked thin films may be transmitted or absorbed without being reflected. As the difference in refractive index between the thin films stacked on the insulating layer 300 increases, the external light reflectance may decrease as the number of thin films stacked increases.
도 4는 본 발명의 다른 일례에 따른 터치 패널의 개략적인 평면도이고, 도 5는 도 4에 도시된 터치 패널의 개략적인 단면도이다. 이하에서 본 발명의 일례에 따른 터치 패널에 관한 설명과 중복되는 내용은 생략하도록 한다.4 is a schematic plan view of a touch panel according to another exemplary embodiment of the present invention, and FIG. 5 is a schematic cross-sectional view of the touch panel shown in FIG. 4. Hereinafter, descriptions overlapping descriptions of the touch panel according to the exemplary embodiment will be omitted.
도 4 및 도 5를 참조하면, 본 발명의 다른 일례에 따른 터치 패널(100)은 기판(110), 상기 기판 상에 제 1 방향을 따라 나란하게 배치되는 복수개의 제 1 센서전극(210), 상기 제 1 방향과 직교하는 제 2 방향을 따라 나란하게 배치되는 복수개의 제 2 센서전극(220), 상기 복수개의 제 1 센서전극 중 서로 인접한 제 1 센서전극들을 상기 제 1 방향으로 연결하는 제 1 브릿지(230), 상기 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판상에 형성되는 절연층(300), 상기 절연층을 관통하는 비아홀을 통하여 상기 복수개의 제 2 센서전극 중 서로 인접한 제 2 센서전극들을 상기 제 2 방향으로 연결하는 제 2 브릿지(240) 및 상기 복수개의 센서전극(210, 220) 및 브릿지(230, 240)가 배치된 기판 상에 배치되는 반사방지층(400)을 포함할 수 있다.4 and 5, the touch panel 100 according to another embodiment of the present invention includes a substrate 110, a plurality of first sensor electrodes 210 disposed side by side in a first direction on the substrate, A plurality of second sensor electrodes 220 arranged side by side in a second direction perpendicular to the first direction, and a first connecting the first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction; The bridge 230, the insulating layer 300 formed on the substrate having the plurality of first sensor electrodes, the second sensor electrode, and the first bridge, and the plurality of second sensor electrodes through via holes penetrating through the insulating layer. An anti-reflection layer disposed on a substrate on which the second bridge 240 and the plurality of sensor electrodes 210 and 220 and the bridges 230 and 240 which connect adjacent second sensor electrodes in the second direction are disposed ( 400).
상기 반사방지층(400)은 필름 기재(430), 상기 필름 기재(430) 상에 배치되는 저굴절층(410) 및 상기 저굴절층 상에 배치되는 고굴절층(420)으로 이루어진 다층구조로 형성될 수 있다. 상기 반사방지 필름(400)은 상기 저굴절층(410) 및 고굴절층(420)이 교대로 반복되어 형성될 수 있다.The anti-reflection layer 400 may be formed in a multilayer structure including a film substrate 430, a low refractive layer 410 disposed on the film substrate 430, and a high refractive layer 420 disposed on the low refractive layer. Can be. The antireflection film 400 may be formed by alternately repeating the low refractive layer 410 and the high refractive layer 420.
도 5에서, 상기 반사방지층(400)은 상기 필름기재(430) 상에 저굴절층(411), 고굴절층(421), 저굴절층(412) 및 고굴절층(422)의 순서로 적층된 구조로 도시되었으나, 이에 한정되는 것은 아니며, 상기 저굴절층(410) 및 고굴절층(420)은 2회 내지 5회 교대로 적층될 수 있다.In FIG. 5, the antireflection layer 400 has a structure in which a low refractive index layer 411, a high refractive index layer 421, a low refractive layer 412, and a high refractive layer 422 are stacked on the film base 430. Although not shown, the low refractive layer 410 and the high refractive layer 420 may be alternately stacked two to five times.
상기 반사방지층(400)에 외광이 입사되는 경우 상기 적층된 각 박막의 경계면에서 입사된 외광이 반사되지 않고 투과 또는 흡수될 수 있다. 상기 입사하는 광량 대비 투과 또는 흡수되는 광량은 상기 반사방지층(400)에 적층되는 박막간의 굴절률 차이가 클수록, 적층되는 고굴절-저굴절 박막의 개수가 증가할수록 증가하게 된다. 따라서, 상기 적층되는 고굴절-저굴절 박막의 개수가 증가할수록 외광 반사율이 낮아져 시인성이 개선될 수 있다.When external light is incident on the anti-reflection layer 400, the external light incident on the boundary surface of each of the stacked thin films may be transmitted or absorbed without being reflected. The amount of light transmitted or absorbed relative to the amount of incident light increases as the difference in refractive index between the thin films stacked on the antireflection layer 400 increases and the number of the high refractive index and the low refractive thin films stacked increases. Therefore, as the number of the high refractive index-low refractive thin films laminated increases, the external light reflectance may be lowered, thereby improving visibility.
또한, 상기 제 1 센서전극(210), 제 2 센서전극(220), 제 1 브릿지(230) 및 제 2 브릿지(240) 등의 재료로 사용될 수 있는 ITO(n=2.0)은 일반적으로 고굴절률을 가지는 재료이므로 상기 반사방지 필름(400)의 저굴절층(411)과 하나의 고굴절-저굴절층을 이루게 되어 반사방지 기능이 향상될 수 있다.In addition, ITO (n = 2.0), which may be used as a material such as the first sensor electrode 210, the second sensor electrode 220, the first bridge 230, and the second bridge 240, generally has a high refractive index. Since the material has a low refractive index layer 411 and one high refractive index-low refractive layer of the anti-reflection film 400 can be improved anti-reflection function.
상기 필름기재(430)는 투명한 소재의 절연막을 이용하여 형성될 수 있다. 상기 필름기재(430)는 공지된 투명 플라스틱 필름 중에서 적절히 선택해서 이용할 수 있다. 이와 같은 플라스틱 필름으로는 폴리에스터 필름, 폴리에틸렌 필름, 폴리 프로필렌 필름, 트리아세틸셀룰로오스 필름, 폴리염화비닐 필름, 폴리비닐알코올 필름, 폴리이미드 필름, 시클로올레핀 수지필름 및 아크릴수지 필름 등이 있다.The film substrate 430 may be formed using an insulating film of a transparent material. The film base material 430 can be appropriately selected from known transparent plastic films. Such plastic films include polyester films, polyethylene films, polypropylene films, triacetylcellulose films, polyvinyl chloride films, polyvinyl alcohol films, polyimide films, cycloolefin resin films, and acrylic resin films.
상기 필름기재(430)는 투명 또는 반투명하거나 착색되어 있어도 무방하다. 또한, 상기 필름기재(430)의 두께는 특별한 제한은 없으나, 일반적으로 30 내지 200μm의 두께 범위를 갖는다. 또한, 상기 필름기재(430) 상에 형성되는 층과의 밀착성을 향상시키기 위하여 상기 필름기재(430)의 일면또는 양면에 산화법이나 요철화법 등에 의한 표면처리를 할 수 있다. 상기 산화법으로는 코로나 방전처리, 플라즈마처리, 크롬산처리, 화염처리, 열풍처리 및 자외선조사처리 등을 들 수 있으며, 상기 요철화법으로는 샌드 블라스트법 및 용제처리법 등을 들 수 있다.The film substrate 430 may be transparent, translucent, or colored. In addition, the thickness of the film substrate 430 is not particularly limited, but generally has a thickness range of 30 to 200μm. In addition, in order to improve adhesion to the layer formed on the film substrate 430, one or both surfaces of the film substrate 430 may be subjected to surface treatment by an oxidation method, an unevenness method, or the like. Examples of the oxidation method include a corona discharge treatment, a plasma treatment, a chromic acid treatment, a flame treatment, a hot air treatment, and an ultraviolet irradiation treatment. Examples of the uneven treatment include a sand blasting method and a solvent treatment method.
상기 필름기재(430)의 배면에는 점착제층(440)이 구비될 수 있다. 상기 점착제층(440)을 구성하는 점착제는 광학용도에 적합한 점착제가 사용될 수 있으며, 이러한 점착제로는 우레탄계 점착제 및 실리콘계 점착제가 사용될 수 있다. 상기 점착제층의 두께는 10 내지 60μm의 범위 값을 가질 수 있다.An adhesive layer 440 may be provided on the rear surface of the film substrate 430. The pressure-sensitive adhesive constituting the pressure-sensitive adhesive layer 440 may be used a pressure-sensitive adhesive suitable for optical purposes, such a pressure-sensitive adhesive may be a urethane-based adhesive and a silicone-based adhesive. The thickness of the pressure-sensitive adhesive layer may have a range value of 10 to 60μm.
상기 저굴절층(410)은 굴절률 1.3 이상 내지 1.5 미만의 유기물 또는 무기물을 포함하여 형성될 수 있다. 상기 저굴절층(410)은 MgF2, NaF 및 CaF2 등을 사용하여 형성할 수 있다.The low refractive layer 410 may be formed to include an organic material or an inorganic material having a refractive index of 1.3 or more and less than 1.5. The low refractive layer 410 may be formed using MgF 2, NaF, CaF 2, or the like.
상기 고굴절층(420)은 굴절률 1.5 이상 내지 2.5 이하의 유기물 또는 무기물을 포함하여 형성될 수 있다. 상기 고굴절층(420)은 CeF3, Al2O3, ZrO2, TiO2 및 Nb2Ox 등을 사용할 수 있다.The high refractive layer 420 may be formed to include an organic material or an inorganic material having a refractive index of 1.5 or more and 2.5 or less. The high refractive layer 420 may use CeF 3, Al 2 O 3, ZrO 2, TiO 2, Nb 2 O x, or the like.
상기 저굴절층(410) 및 고굴절층(420)은 상기 필름 기재(430) 상에 스핀 코팅 공정, 프린팅 공정, 스퍼터링 공정, 화학 기상 증착 공정, 원자층 적층 공정 및 진공 증착 공정 중 어느 하나의 공정을 이용하여 형성될 수 있다.The low refractive layer 410 and the high refractive layer 420 is any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process and a vacuum deposition process on the film substrate 430 It can be formed using.
상기 반사방지층(400)에 외광이 입사되는 경우 상기 적층된 각 박막의 경계면에서 입사된 외광이 반사되지 않고 투과 또는 흡수될 수 있다. 상기 반사방지층(400)에 적층되는 박막간의 굴절률 차이가 클수록, 적층되는 박막의 개수가 증가할수록 외광 반사율이 낮아질 수 있다.When external light is incident on the anti-reflection layer 400, the external light incident on the boundary surface of each of the stacked thin films may be transmitted or absorbed without being reflected. As the difference in refractive index between the thin films stacked on the anti-reflection layer 400 increases, the external light reflectance may decrease as the number of stacked thin films increases.
도 6a 내지 도 6f는 본 발명의 일례에 따른 터치 패널의 제조 방법을 설명하기 위한 도이다.6A to 6F are diagrams for describing a method of manufacturing a touch panel according to one embodiment of the present invention.
본 발명의 일례에 따른 터치 패널의 제조 방법은, (a) 기판 상에 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지를 패터닝하는 단계, (b) 상기 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 패터닝된 기판 상에 절연층을 형성하는 단계, (c) 상기 제 2 센서전극을 덮는 절연층을 관통하여 상기 제 2 센서전극의 일부를 노출시키는 비아홀을 형성하는 단계, (d) 상기 제 2 센서전극의 일부를 노출시키는 비아홀을 채우면서 상기 절연층 상에 제 2 브릿지층을 형성하는 단계, (e) 상기 제 2 브릿지층을 패터닝하여 제 2 브릿지를 형성하는 단계를 포함한다.According to one or more exemplary embodiments, a method of manufacturing a touch panel includes: (a) patterning a plurality of first sensor electrodes, a second sensor electrode, and a first bridge on a substrate; (b) the first sensor electrode and a second; Forming an insulating layer on the substrate on which the sensor electrode and the first bridge are patterned, (c) forming a via hole through the insulating layer covering the second sensor electrode to expose a portion of the second sensor electrode, (d) forming a second bridge layer on the insulating layer while filling a via hole exposing a portion of the second sensor electrode, (e) patterning the second bridge layer to form a second bridge Include.
도 6a를 참조하면, 기판(110) 상에 제 1 센서전극(210), 제 2 센서전극(미도시) 및 제 1 브릿지(230)를 형성한다.Referring to FIG. 6A, a first sensor electrode 210, a second sensor electrode (not shown), and a first bridge 230 are formed on the substrate 110.
상기 기판(110) 상에 제 1 센서전극(미도시), 제 2 센서전극(220) 및 제 1 브릿지(230) 형성용 물질을 도포한 후, 패터닝하여 상기 기판(110) 상에 제 1 센서전극(미도시), 제 2 센서전극(220) 및 제 1 브릿지(230)를 형성할 수 있다.The first sensor electrode (not shown), the second sensor electrode 220 and the first bridge 230 to form a material for coating on the substrate 110, and then patterned to the first sensor on the substrate 110 An electrode (not shown), a second sensor electrode 220, and a first bridge 230 may be formed.
상기 제 1 센서전극(미도시), 제 2 센서전극(220) 및 제 1 브릿지는 투명 전도성 산화물(TCO)를 사용하여 형성될 수 있다. 이러한 투명 전도성 산화물(TCO)로는 ITO, IZO, ZnO등이 사용될 수 있다.The first sensor electrode (not shown), the second sensor electrode 220 and the first bridge may be formed using a transparent conductive oxide (TCO). As the transparent conductive oxide (TCO), ITO, IZO, ZnO, or the like may be used.
상기 제 1 센서전극(미도시), 제 2 센서전극(220) 및 제 1 브릿지(230) 형성용 물질을 도포하는 방법으로는 스핀 코팅 공정, 프린팅 공정, 스퍼터링 공정, 화학 기상 증착 공정, 원자층 적층 공정 및 진공 증착 공정 중 어느 하나의 공정을 이용할 수 있다.The first sensor electrode (not shown), the second sensor electrode 220 and the method for forming the material for forming the first bridge 230 may be a spin coating process, printing process, sputtering process, chemical vapor deposition process, atomic layer Any one of a lamination process and a vacuum deposition process may be used.
도 6b를 참조하면, 상기 제 1 센서전극(미도시), 제 2 센서전극(220) 및 제 1 브릿지(230)가 형성된 기판(110) 상에 절연층(300)이 형성된다.Referring to FIG. 6B, an insulating layer 300 is formed on the substrate 110 on which the first sensor electrode (not shown), the second sensor electrode 220, and the first bridge 230 are formed.
상기 절연층(300)을 형성하는 단계는, 저굴절층(310)을 형성하는 단계 및 고굴절층(320)을 형성하는 단계를 포함한다.The forming of the insulating layer 300 includes forming a low refractive layer 310 and forming a high refractive layer 320.
상기 저굴절층(310)을 형성하는 단계 및 고굴절층(320)을 형성하는 단계는 각각 2회 내지 5회 반복 실시될 수 있다.The forming of the low refractive layer 310 and the forming of the high refractive layer 320 may be repeated two to five times, respectively.
상기 저굴절층(310)은 MgFx, SiOx, NaF 및 CaFx 중 적어도 하나를 사용하여 형성될 수 있으며, 상기 고굴절층(320)은CeFx, Al2Ox, ZrOx, TiOx 및 Nb2Ox 중 적어도 하나를 사용하여 형성될 수 있다.The low refractive layer 310 may be formed using at least one of MgFx, SiOx, NaF, and CaFx, and the high refractive layer 320 may be formed using at least one of CeFx, Al2Ox, ZrOx, TiOx, and Nb2Ox. Can be.
상기 저굴절층(310) 및 고굴절층(320)은 스핀 코팅 공정, 프린팅 공정, 스퍼터링 공정, 화학 기상 증착 공정, 원자층 적층 공정 및 진공 증착 공정 중 어느 하나의 공정을 이용하여 형성될 수 있다.The low refractive layer 310 and the high refractive layer 320 may be formed using any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process and a vacuum deposition process.
도 6c를 참조하면, 상기 절연층(300)을 관통하여 상기 제 2 센서전극(220)의 일부를 노출시키는 비아홀을 형성한다.Referring to FIG. 6C, a via hole is formed through the insulating layer 300 to expose a portion of the second sensor electrode 220.
상기 비아홀은 상기 복수개의 제 2 센서전극(220)을 상기 제 2 브릿지(240)로 전기적으로 연결하기 위한 것이다. 상기 비아홀은 상기 제 2 센서전극(220) 상부에 배치되는 절연층(300)을 관통하여 형성될 수 있다.The via hole is for electrically connecting the plurality of second sensor electrodes 220 to the second bridge 240. The via hole may be formed through the insulating layer 300 disposed on the second sensor electrode 220.
도 6d 및 도 6e를 참조하면, 상기 절연층(300) 상에 제 2 브릿지층을 형성한다. 상기 제 2 센서전극의 일부를 노출시키는 비아홀을 채우면서 상기 절연층(300) 상에 제 2 브릿지층을 형성한 후, 상기 제 2 브릿지층을 패터닝하여 제 2 브릿지(240)를 형성한다.6D and 6E, a second bridge layer is formed on the insulating layer 300. After forming a second bridge layer on the insulating layer 300 while filling a via hole exposing a portion of the second sensor electrode, the second bridge layer is patterned to form a second bridge 240.
이상에서 설명된 터치 패널의 실시예는 예시적인 것에 불과하며, 본 발명의 보호범위는 본 발명 기술분야의 통상의 지식을 가진 자라면 이로부터 다양한 변형 및 균등예를 포함할 수 있다. Embodiments of the touch panel described above are merely exemplary, and the protection scope of the present invention may include various modifications and equivalents from those skilled in the art.

Claims (16)

  1. 기판;Board;
    상기 기판 상에 제 1 방향을 따라 나란하게 배치되는 복수개의 제 1 센서전극;A plurality of first sensor electrodes arranged side by side in a first direction on the substrate;
    상기 기판 상에, 상기 제 1 센서전극과 이격되어, 상기 제 1 방향과 직교하는 제 2 방향을 따라 나란하게 배치되는 복수개의제 2 센서전극;A plurality of second sensor electrodes spaced apart from the first sensor electrode on the substrate and disposed side by side in a second direction perpendicular to the first direction;
    상기 복수개의 제 1 센서전극중 서로 인접한 제 1 센서전극들을 상기 제 1 방향으로 연결하는 제 1 브릿지;A first bridge connecting the first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction;
    상기 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판상에 형성되는 절연층; 및An insulating layer formed on the substrate on which the plurality of first sensor electrodes, the second sensor electrodes, and the first bridge are formed; And
    상기 절연층을 관통하는 비아홀을 통하여 상기 복수개의제 2 센서전극 중 서로 인접한 제 2 센서전극들을 상기 제 2 방향으로 연결하는 제 2 브릿지를 포함하며,A second bridge connecting second sensor electrodes adjacent to each other among the plurality of second sensor electrodes in the second direction through a via hole penetrating through the insulating layer,
    상기 제 1 브릿지 및 제 2 브릿지는 서로 교차되는 터치 패널.And the first bridge and the second bridge cross each other.
  2. 제 1 항에 있어서, 상기 절연층은 적어도 하나 이상의 저굴절층 및 고굴절층을 포함하는 터치 패널.The touch panel of claim 1, wherein the insulating layer comprises at least one low refractive index layer and a high refractive index layer.
  3. 제 2 항에 있어서, 상기 저굴절층은 MgF2, NaF 및 CaF2 중 적어도 하나를 포함하는 터치 패널.The touch panel of claim 2, wherein the low refractive index layer comprises at least one of MgF 2, NaF, and CaF 2.
  4. 제 2 항에 있어서, 상기 고굴절층은 CeF3, Al2O3, ZrO2, TiO2 및 Nb2Ox 중 적어도 하나를 포함하는 터치 패널.The touch panel of claim 2, wherein the high refractive index layer comprises at least one of CeF 3, Al 2 O 3, ZrO 2, TiO 2, and Nb 2 Ox.
  5. 기판;Board;
    상기 기판 상에 제 1 방향을 따라 나란하게 배치되는 복수개의 제 1 센서전극;A plurality of first sensor electrodes arranged side by side in a first direction on the substrate;
    상기 기판 상에, 상기 제 1 센서전극과 이격되어, 상기 제 1 방향과 직교하는 제 2 방향을 따라 나란하게 배치되는 복수개의제 2 센서전극;A plurality of second sensor electrodes spaced apart from the first sensor electrode on the substrate and disposed side by side in a second direction perpendicular to the first direction;
    상기 복수개의 제 1 센서전극중 서로 인접한 제 1 센서전극들을 상기 제 1 방향으로 연결하는 제 1 브릿지;A first bridge connecting the first sensor electrodes adjacent to each other among the plurality of first sensor electrodes in the first direction;
    상기 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판상에 형성되는 절연층;An insulating layer formed on the substrate on which the plurality of first sensor electrodes, the second sensor electrodes, and the first bridge are formed;
    상기 절연층을 관통하는 비아홀을 통하여 상기 복수개의제 2 센서전극 중 서로 인접한 제 2 센서전극들을 상기 제 2 방향으로 연결하는 제 2 브릿지; 및A second bridge connecting second sensor electrodes adjacent to each other of the plurality of second sensor electrodes in the second direction through a via hole penetrating through the insulating layer; And
    상기 복수개의 센서전극 및 브릿지가 배치된 기판 상에 배치되는 반사방지층;을 포함하는 터치 패널.And an anti-reflection layer disposed on a substrate on which the plurality of sensor electrodes and the bridge are disposed.
  6. 제 5 항에 있어서, 상기 반사방지층은,The method of claim 5, wherein the antireflection layer,
    필름 기재;Film substrates;
    상기 필름 기재 상에 배치되는 저굴절층; 및A low refractive layer disposed on the film substrate; And
    상기 저굴절층 상에 배치되는 고굴절층;을 포함하는 터치 패널.And a high refractive layer disposed on the low refractive layer.
  7. 제 6 항에 있어서, 상기 저굴절층 및 고굴절층은 교대로 반복되어 구비되는 터치 패널.The touch panel of claim 6, wherein the low refractive layer and the high refractive layer are alternately provided.
  8. 제 6 항에 있어서, 상기 저굴절층 및 고굴절층은 2회 내지 5회 교대로 반복되어 구비되는 터치 패널. The touch panel of claim 6, wherein the low refractive layer and the high refractive layer are alternately provided two to five times.
  9. 제 6 항에 있어서, 상기 저굴절층의 굴절률은 1.3 이상 내지 1.5 미만인 터치 패널.The touch panel of claim 6, wherein the low refractive index layer has a refractive index of about 1.3 to about 1.5.
  10. 제 6 항에 있어서, 상기 고굴절층의 굴절률은 1.5 이상 내지 2.5 이하인 터치 패널.The touch panel of claim 6, wherein the high refractive index layer has a refractive index of about 1.5 to about 2.5.
  11. 제 6 항에 있어서, 상기 저굴절층은 MgF2, NaF 및 CaF2 중 적어도 하나를 포함하는 터치 패널.The touch panel of claim 6, wherein the low refractive index layer comprises at least one of MgF 2, NaF, and CaF 2.
  12. 제 6 항에 있어서, 상기 고굴절층은 CeF3, Al2O3, ZrO2, TiO2 및 Nb2Ox 중 적어도 하나를 포함하는 터치 패널.The touch panel of claim 6, wherein the high refractive index layer comprises at least one of CeF 3, Al 2 O 3, ZrO 2, TiO 2, and Nb 2 Ox.
  13. 기판 상에 복수개의 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지를 형성하는 단계;Forming a plurality of first sensor electrodes, second sensor electrodes, and first bridges on the substrate;
    상기 제 1 센서전극, 제 2 센서전극 및 제 1 브릿지가 형성된 기판 상에 절연층을 형성하는 단계;Forming an insulating layer on a substrate on which the first sensor electrode, the second sensor electrode, and the first bridge are formed;
    상기 제 2 센서전극을 덮는 절연층을 관통하여 상기 제 2 센서전극의 일부를 노출시키는 비아홀을 형성하는 단계;Forming a via hole through the insulating layer covering the second sensor electrode to expose a portion of the second sensor electrode;
    상기 제 2 센서전극의 일부를 노출시키는 비아홀을 채우면서 상기 절연층 상에 제 2 브릿지층을 형성하는 단계; 및Forming a second bridge layer on the insulating layer while filling a via hole exposing a portion of the second sensor electrode; And
    상기 제 2 브릿지층을 패터닝하여 제 2 브릿지를 형성하는 단계;를 포함하는 터치 패널 제조 방법.And patterning the second bridge layer to form a second bridge.
  14. 제 13 항에 있어서, 상기 절연층을 형성하는 단계는,The method of claim 13, wherein the forming of the insulating layer,
    저굴절층을 형성하는 단계; 및Forming a low refractive layer; And
    고굴절층을 형성하는 단계;를 포함하는 터치 패널 제조 방법.Forming a high refractive layer; Touch panel manufacturing method comprising a.
  15. 제 13 항에 있어서, 상기 저굴절층을 형성하는 단계 및 고굴절층을 형성하는 단계는 각각 2회 내지 5회 실시되는 터치 패널 제조 방법.The method of claim 13, wherein the forming of the low refractive layer and the forming of the high refractive layer are performed two to five times, respectively.
  16. 제 13 항에 있어서, 상기 저굴절층을 형성하는 단계 및 고굴절층을 형성하는 단계는 스핀 코팅 공정, 프린팅 공정, 스퍼터링 공정, 화학 기상 증착 공정, 원자층 적층 공정 및 진공 증착 공정 중 어느 하나의 공정을 이용하여 형성되는 터치 패널 제조 방법.The method of claim 13, wherein the forming of the low refractive layer and the forming of the high refractive layer are performed by any one of a spin coating process, a printing process, a sputtering process, a chemical vapor deposition process, an atomic layer deposition process, and a vacuum deposition process. Touch panel manufacturing method formed using.
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