WO2014094327A1 - 定位方法及定位装置 - Google Patents

定位方法及定位装置 Download PDF

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Publication number
WO2014094327A1
WO2014094327A1 PCT/CN2012/087470 CN2012087470W WO2014094327A1 WO 2014094327 A1 WO2014094327 A1 WO 2014094327A1 CN 2012087470 W CN2012087470 W CN 2012087470W WO 2014094327 A1 WO2014094327 A1 WO 2014094327A1
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WO
WIPO (PCT)
Prior art keywords
point
reflected
auxiliary positioning
reflected beam
height information
Prior art date
Application number
PCT/CN2012/087470
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English (en)
French (fr)
Inventor
郑文达
吴础任
Original Assignee
深圳市华星光电技术有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 深圳市华星光电技术有限公司 filed Critical 深圳市华星光电技术有限公司
Priority to US13/811,389 priority Critical patent/US8884574B2/en
Publication of WO2014094327A1 publication Critical patent/WO2014094327A1/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S17/00—Systems using the reflection or reradiation of electromagnetic waves other than radio waves, e.g. lidar systems
    • G01S17/02—Systems using the reflection of electromagnetic waves other than radio waves
    • G01S17/06—Systems determining position data of a target
    • G01S17/46—Indirect determination of position data
    • G01S17/48—Active triangulation systems, i.e. using the transmission and reflection of electromagnetic waves other than radio waves

Definitions

  • the present invention relates to the field of positioning technologies, and in particular, to a positioning method and a positioning device used in a process of a liquid crystal panel.
  • the TFT array substrate In the process of the TFT array substrate, it is necessary to measure the width of the signal line of the TFT array substrate to ensure the quality of the TFT array substrate.
  • the TFT array substrate Before measuring the signal line of the array substrate, the TFT array substrate is generally positioned by the laser positioning device, so that the measuring device can obtain a clearer picture and improve the accuracy of the measurement.
  • the laser emitter of the laser positioning device emits a light beam to a predetermined point to be positioned on the TFT array, and the emitted light beam is reflected by the point to be positioned to form a reflected beam, and the receiver Then, the reflected beam is received to determine the height information of the point to be positioned, and then the height of the TFT array substrate is adjusted according to the height information of the positioning point, so that the TFT array substrate is at a height most suitable for measurement by the measuring device.
  • the surface of the TFT array substrate is uneven, and sometimes various impurities are present on the surface of the TFT array substrate, if the surface to be positioned is uneven or has impurities.
  • the light beam that is irradiated onto the point to be positioned is reflected and scattered, so that the reflected beam is projected outside the range of the receiver, causing the receiver to not receive the reflected beam of the point to be positioned, thereby causing the positioning to fail.
  • the main object of the present invention is to provide a positioning method and a positioning device, aiming at improving the success rate of positioning.
  • the present invention provides a positioning method comprising the steps of:
  • determining the height information of the to-be-positioned point according to the reflected light beam reflected by the to-be-positioned point or the auxiliary positioning point comprises:
  • the height information of the point to be located is determined according to the reflected beam reflected from the auxiliary positioning point.
  • the determining whether the received reflected light beam reflected by the to-be-positioned point is valid includes:
  • determining the height information of the point to be located according to the reflected light beam reflected by the auxiliary positioning point comprises:
  • the determining, according to the reflected light beam reflected from the point to be located, the height information of the point to be located includes:
  • determining the height information of the point to be located according to the reflected light beam reflected from the auxiliary positioning point comprises:
  • the step of transmitting the light beam to the point to be positioned and the auxiliary positioning point further comprises:
  • the auxiliary positioning point is determined, and the auxiliary positioning point is symmetrically disposed around the point to be positioned.
  • the invention also provides a positioning device, comprising:
  • a transmitter for emitting a light beam to the point to be positioned and the auxiliary positioning point
  • a receiver for receiving a reflected beam of the beam emitted by the transmitter and reflected by the point to be positioned and the auxiliary positioning point;
  • a determining module determining whether the receiver receives the reflected light beam reflected by the point to be positioned
  • a calculation module configured to receive a determination result of the determination module, and if the received determination result is yes, determine the height information of the to-be-positioned point according to the reflected beam reflected from the to-be-positioned point or the auxiliary positioning point; When the judgment result is no, the height information of the point to be positioned is determined according to the reflected light beam reflected from the auxiliary positioning point.
  • the receiver further includes a valid position range, and when the reflected beam reflected by the to-be-positioned point or the auxiliary positioning point is projected within the effective position range, the determining module determines the to-be-positioned point or The reflected beam reflected by the auxiliary positioning point is effective; when the reflected beam reflected by the to-be-positioned point or the auxiliary positioning point is projected outside the effective position range, the determining module determines that the to-be-positioned point or the auxiliary positioning point reflects The reflected beam coming back is invalid.
  • the determining module is further configured to determine whether the reflected beam reflected by the to-be-positioned point received by the receiver is valid, and send the determination result to the calculation module;
  • the calculation module When the calculation module receives the determination result as valid, the height information of the to-be-positioned point is determined according to the reflected light beam reflected from the point to be located; and when the calculation module receives the determination result as invalid, the reflection is reflected according to the auxiliary positioning point.
  • the light beam determines height information of the point to be positioned.
  • the determining module is further configured to determine whether the reflected beam reflected by the auxiliary positioning point received by the receiver is valid, and send the determination result to the calculation module;
  • the determining module determines the height information of the point to be located according to the reflected beam reflected by the auxiliary positioning point, and then selects the effective reflected beam reflected by the auxiliary positioning point to determine the height information of the point to be positioned.
  • the receiver is further configured to record a projection position of the reflected beam reflected by the to-be-positioned point and the auxiliary positioning point on the receiver, and the calculation module determines the height of the to-be-positioned point according to the projection position. information.
  • the positioning device further comprises a determining module, configured to determine a point to be located and an auxiliary positioning point, wherein the auxiliary positioning point is symmetrically disposed around the point to be positioned.
  • the positioning method and the positioning device provided by the present invention determine the to-be-located point and the auxiliary positioning point in advance, and when the reflected beam or the reflected beam reflected from the point to be positioned cannot be received, the reflected beam is reflected according to the auxiliary positioning point.
  • the reflected beam determines the height information of the point to be positioned, thereby improving the success rate of the positioning.
  • FIG. 1 is a flow chart of a first embodiment of a positioning method of the present invention
  • FIG. 2 is a schematic view showing the distribution of a point to be positioned and an auxiliary positioning point in the present invention
  • FIG. 3 is a schematic view showing another distribution of a point to be positioned and an auxiliary positioning point in the present invention
  • FIG. 4 is a schematic view of the reflected light reflected from the auxiliary positioning point projected on the positioner in the present invention
  • Figure 5 is a flow chart of a second embodiment of the positioning method of the present invention.
  • Figure 6 is a schematic view showing the structure of an embodiment of the positioning device of the present invention.
  • the positioning method is used for positioning a measurement point when measuring an array substrate, and the positioning method includes:
  • Step S101 transmitting a light beam to the to-be-located point and the auxiliary positioning point.
  • the measurement point to be measured is first determined, and the measurement point needs to be first positioned before measuring the measurement point to be measured.
  • the to-be-measured point is the to-be-positioned point to be located, and a plurality of auxiliary positioning points are determined around the to-be-positioned point.
  • the auxiliary positioning point may be distributed around the point to be positioned centering on the point to be positioned, preferably symmetrically distributed around the point to be positioned around the point to be positioned, and arranged in a symmetrical geometric shape such as a rectangle or a circle.
  • the point to be located is the geometric center. As shown in Fig.
  • the center of the rectangle is located at the point O to be positioned, and the points symmetrically distributed around the point O to be positioned are the auxiliary points A, B, C, D, E, F. , G, H.
  • the auxiliary positioning point and the point to be positioned may also be arranged in a straight line, and the auxiliary positioning points are symmetrically distributed on both sides of the point to be positioned, as shown in FIG. 3, the point at the midpoint of the line is the point O to be positioned, and the symmetry is respectively determined to be positioned.
  • the points on the sides of point O are auxiliary positioning points A, B, C, and D. The more auxiliary positioning points, the higher the positioning success rate and the more accurate the positioning.
  • the beam is emitted to the predetermined point to be positioned and the auxiliary point.
  • Step S102 Receive a reflected beam of the emitted light beam reflected by the to-be-positioned point and the auxiliary positioning point.
  • step S102 after the beam is irradiated onto the to-be-positioned point and the auxiliary positioning point, the reflected point and the auxiliary positioning point are reflected to form a reflected beam, and the reflected beam reflected by the to-be-positioned point and the auxiliary positioning point is received, and the reflected beam is recorded. Projection position projected on the receiver.
  • Step S103 Determine whether a reflected beam reflected from the point to be positioned is received.
  • the surface of the array substrate is uneven, and sometimes various impurities are present on the surface of the array substrate. If the surface to be positioned or the auxiliary positioning point is uneven or has impurities, the light beam is irradiated onto the point to be positioned or the auxiliary positioning point. After being reflected, the scattering state is such that the reflected beam is projected outside the receiving range of the receiver, so that the receiver cannot receive the reflected beam reflected from the point to be positioned or the auxiliary positioning point. If the projection position recorded in step S102 is not to be determined The projected position of the reflected beam reflected from the spot indicates that the reflected beam reflected from the point to be positioned is not received. It is determined whether the reflected light beam reflected by the point to be positioned is received, and if yes, step S104 is performed; if no, step S105 is performed.
  • Step S104 Determine height information of the point to be located according to the reflected light beam reflected from the point to be positioned.
  • the height of the point to be positioned may be directly determined according to the projected position of the reflected beam reflected from the point to be positioned. For example, when the reflected beam reflected from the point to be positioned is projected to the receiver and is offset from the center of the receiver by 1 unit, the height of the point to be positioned is directly determined to be 1, and when the position to be measured is subsequently measured, the array substrate is lowered. Move 1 unit; when the reflected beam is projected to the receiver and deviate from the center of the receiver by 3 units, the height of the point to be positioned is directly determined to be -3. When the positioning point is measured, the array substrate is up. It can be moved by 3 units; when the reflected beam is projected on the receiver just at the center of the receiver, the height of the point to be positioned is directly determined to be 0, and the positioning point can be directly measured.
  • the height of the point to be positioned can be indirectly calculated by the projection position of the reflected beam reflected by the auxiliary positioning point; or the reflection reflected back by the point to be positioned
  • the projection position of the beam directly determines the height of the point to be positioned, and then determines the height of the point to be positioned by indirectly reflecting the position of the reflected beam reflected by the auxiliary positioning point, and compares the difference between the two height values to verify the positioning method. The accuracy is thus used as a reference for the subsequent measurement of the three sigma variation.
  • the method of indirectly determining the height of the point to be positioned for the reflected beam reflected back by the auxiliary positioning point will be described in detail in the following steps.
  • Step S105 Determine height information of the point to be located according to the reflected beam reflected from the auxiliary positioning point.
  • the position to be located is not able to receive the reflected beam of the point to be positioned due to the unevenness of the surface or the impurity, the position to be positioned is determined according to the position of the reflected beam reflected from the auxiliary positioning point on the receiver. Height information.
  • FIG. 4 a schematic diagram of a reflected beam reflected from an auxiliary positioning point projected onto a receiver is shown, where the coordinate origin is the center of the receiver.
  • the receiver receives the reflected beam reflected by the two auxiliary positioning points A and B symmetrically distributed on both sides of the point to be positioned O.
  • the reflected beam of A is projected at the position A' of the receiver, it is offset from the center of the receiver by 4 units.
  • the position B' of the reflected beam of B projected on the receiver is located at the center of the receiver. Since the auxiliary positioning points A and B are symmetrically disposed on both sides of the point O to be positioned, it can be determined that the auxiliary positioning points A and B are to be determined.
  • the surface of one or more auxiliary positioning points may be uneven or have impurities, so that the receiver cannot receive the reflected beam reflected by the auxiliary positioning point, so the more auxiliary positioning points are selected, the positioning is successful. The higher the chance.
  • the reflected beam reflected from the auxiliary positioning points can be used to determine the height of the point to be positioned respectively. When the obtained data is different, the average value can be averaged, and the height thus obtained is more accurate, thereby improving the positioning. Accuracy.
  • the height information of the point to be positioned is determined according to the reflected beam reflected from the auxiliary positioning point, thereby Improve the success rate of positioning.
  • the positioning method of this embodiment includes the following steps:
  • Step S201 transmitting a light beam to the to-be-located point and the auxiliary positioning point.
  • the measurement point to be measured is first determined, and the measurement point needs to be first positioned before measuring the measurement point to be measured.
  • the to-be-measured point is the to-be-positioned point to be located, and a plurality of auxiliary positioning points are determined around the to-be-positioned point.
  • the auxiliary positioning point may be distributed around the point to be positioned centering on the point to be positioned, preferably symmetrically distributed around the point to be positioned around the point to be positioned, and arranged in a symmetrical geometric shape such as a rectangle or a circle.
  • the point to be located is the geometric center. As shown in Fig.
  • the center of the rectangle is located at the point O to be positioned, and the points symmetrically distributed around the point O to be positioned are the auxiliary points A, B, C, D, E, F. , G, H.
  • the auxiliary positioning point and the point to be positioned may also be arranged in a straight line, and the auxiliary positioning points are symmetrically distributed on both sides of the point to be positioned, as shown in FIG. 3, the point at the midpoint of the line is the point O to be positioned, and the symmetry is respectively determined to be positioned.
  • the points on the sides of point O are auxiliary positioning points A, B, C, and D. The more auxiliary positioning points, the higher the positioning success rate and the more accurate the positioning.
  • the positioning device and the auxiliary positioning point are used to emit the light beam.
  • Step S202 Receive a reflected beam of the emitted light beam reflected by the to-be-positioned point and the auxiliary positioning point.
  • step S202 after the beam is irradiated onto the to-be-positioned point and the auxiliary positioning point, the reflected point and the auxiliary positioning point are reflected to form a reflected beam, and the reflected beam reflected by the to-be-positioned point and the auxiliary positioning point is received, and the reflected beam is recorded. Projection position projected on the receiver.
  • Step S203 Determine whether a reflected beam reflected from the point to be positioned is received.
  • the surface of the array substrate is uneven, and sometimes various impurities are present on the surface of the array substrate. If the surface to be positioned or the auxiliary positioning point is uneven or has impurities, the light beam is irradiated onto the point to be positioned or the auxiliary positioning point. After being reflected, the scattering state is such that the reflected beam is projected outside the receiving range of the receiver, so that the receiver cannot receive the reflected beam reflected from the point to be positioned or the auxiliary positioning point, and if there is no position to be located in the position recorded in step S202 The position of the reflected beam reflected back by the point indicates that the reflected beam reflected from the point to be positioned is not received. It is determined whether the reflected beam reflected by the point to be positioned is received, and if yes, step S204 is performed; if no, step S205 is performed.
  • Step S204 Determine whether the reflected beam reflected from the point to be positioned is valid.
  • a valid position range is set. Receiving a position where the reflected beam formed by the to-be-positioned point and the auxiliary positioning point is projected on the receiver, and determining whether the received position is within the effective position range, and the projected position of the reflected beam reflected by the point to be positioned is When the effective position range is within, it is determined that the reflected beam is effective, and the height information of the to-be-positioned point determined according to the projection position of the effective reflected beam is more accurate; when the projected position of the reflected beam reflected from the point to be positioned is in the effective position range When it is outside, it is determined that the reflected beam is invalid, and the height information to be positioned determined according to the invalid reflected beam is less accurate.
  • step S205 After receiving the projection position of the reflected beam reflected from the point to be positioned, it is further determined whether the reflected beam is effective. If it is invalid, step S205 is performed; if it is valid, step S206 is performed.
  • Step S205 Determine height information of the point to be located according to the reflected beam reflected from the auxiliary positioning point.
  • the receiver cannot receive the reflected beam of the point to be positioned, or even if the reflected beam reflected from the point to be positioned is received, it is determined that the reflected beam is invalid, and then according to the auxiliary The projection position of the reflected beam reflected from the positioning point determines the height information of the point to be positioned.
  • FIG. 4 a schematic diagram of a reflected beam reflected from an auxiliary positioning point projected onto a receiver is shown, where the coordinate origin is the center of the receiver.
  • the receiver receives the reflected beam reflected by the two auxiliary positioning points A and B symmetrically distributed on both sides of the point to be positioned O.
  • the reflected beam of A is projected at the position A' of the receiver, it is offset from the center of the receiver by 4 units.
  • the position B' of the reflected beam of B projected on the receiver is located at the center of the receiver. Since the auxiliary positioning points A and B are symmetrically disposed on both sides of the point O to be positioned, it can be determined that the auxiliary positioning points A and B are to be determined.
  • the surface of one or more auxiliary positioning points may be uneven or have impurities, so that the receiver cannot receive the reflected beam reflected by the auxiliary positioning point, so the more auxiliary positioning points are selected, the positioning is successful. The higher the chance.
  • the reflected beam reflected from the auxiliary positioning points can be used to determine the height of the point to be positioned respectively. When the obtained data is different, the average value can be averaged, and the height thus obtained is more accurate, thereby improving the positioning. Accuracy.
  • step S205 in order to ensure the accuracy of the positioning, when selecting the reflected beam reflected from the auxiliary positioning point, the effective reflected beam projected in the effective position range of the receiver is also selected, and the effective reflected beam is projected on the receiver according to the effective reflected beam. The position to determine the height information of the point to be located.
  • Step S206 Determine a height of a point to be located according to the reflected light beam reflected from the point to be positioned.
  • the projection position of the reflected beam reflected from the point to be positioned may be directly Determine the height of the point to be positioned. For example, when the reflected beam reflected from the point to be positioned is projected to the receiver and is offset from the center of the receiver by 1 unit, the height of the point to be positioned is directly determined to be 1, and when the position to be measured is subsequently measured, the array substrate is lowered. Move 1 unit; when the reflected beam is projected to the receiver and deviate from the center of the receiver by 3 units, the height of the point to be positioned is directly determined to be -3. When the positioning point is measured, the array substrate is up. It can be moved by 3 units; when the reflected beam is projected on the receiver just at the center of the receiver, the height of the point to be positioned is directly determined to be 0, and the positioning point can be directly measured.
  • the height of the point to be positioned can be indirectly calculated by the projection position of the reflected beam reflected by the auxiliary positioning point; or the reflection reflected back by the point to be positioned
  • the beam directly determines the height of the point to be positioned, and indirectly determines the height of the point to be positioned by the projection position of the reflected beam reflected by the auxiliary positioning point, and compares the difference between the two height values, thereby verifying the accuracy of the positioning of the positioning device. Therefore, as a reference for the variation of three sigma in subsequent measurement.
  • the reflected beam projected in the effective position range is selected to determine the height information of the point to be positioned, thereby improving the accuracy of the positioning.
  • the positioning device 100 includes a transmitter 110, a receiver 120, a determining module 130, a determining module 140, and a computing module 150.
  • the determining module 130 is configured to determine a point to be located that needs to be located on the array substrate, and then determine a plurality of auxiliary positioning points according to the point to be positioned.
  • the auxiliary positioning points are distributed around the points to be positioned around the points to be positioned.
  • the auxiliary positioning point may be symmetrically distributed around the point to be positioned around the point to be positioned, and arranged in a symmetrical geometric shape such as a rectangle or a circle, and the point to be positioned is a geometric center, as shown in FIG.
  • the geometric center is the point O to be positioned, and the auxiliary points A, B, C, D, E, F, G, and H are symmetrically distributed around the point O to be positioned.
  • the auxiliary positioning point and the point to be positioned may also be arranged in a straight line, and the auxiliary positioning points are symmetrically distributed on both sides of the point to be positioned, as shown in FIG. 3, the point at the midpoint of the line is the point O to be positioned, and the symmetry is respectively determined to be positioned.
  • the points on the sides of point O are auxiliary positioning points A, B, C, and D. The more auxiliary positioning points, the higher the positioning success rate and the more accurate the positioning.
  • the above process of determining the to-be-located point and the auxiliary positioning point can also be manually determined, but the accuracy and speed determined by the positioning device in this embodiment are faster.
  • the transmitter 110 is configured to respectively transmit a light beam to a predetermined point to be positioned and an auxiliary positioning point, and the transmitter 110 transmits the light beam to the point to be positioned, and is also distributed around the point to be positioned around the point to be positioned.
  • the auxiliary positioning point emits a light beam.
  • the receiver 120 is configured to receive the reflected beam reflected by the beam emitted by the transmitter 110 through the point to be located and the auxiliary positioning point, and record the position of the reflected beam on the receiver 120 according to the received reflected beam, and then position the projection. Transfer to the determination module 140.
  • the determining module 140 is configured to receive a projected position of the reflected beam, and then determine whether a projected position of the reflected beam reflected by the point to be positioned is received in the projected position of the received reflected beam, and if so, the reflected beam reflected from the point to be positioned.
  • the projection position of the reflected beam reflected by the projection position and the auxiliary positioning point is transmitted to the calculation module 150, and the calculation module 150 determines the projection position of the reflected beam reflected from the point to be positioned or the projection position of the reflected beam reflected by the auxiliary positioning point.
  • the height of the point to be positioned is 1; when the reflected beam is projected on the receiver 120; When the time is deviated from the center of the receiver 120 by 3 units, the height of the point to be positioned is directly determined to be -3; when the reflected beam is projected at the center of the receiver 120 when the reflected beam is projected on the receiver 120, the height of the point to be positioned is directly determined to be 0. .
  • a schematic diagram of the reflected beam reflected from the auxiliary positioning point is projected on the receiver, wherein the coordinate origin is the center of the receiver.
  • the receiver 120 receives the reflected light beams reflected by the two auxiliary positioning points A and B symmetrically distributed on both sides of the point to be positioned O.
  • the reflected beam of A is projected on the projection point A of the receiver 120, it is offset from the center of the receiver 120.
  • the reflected beam of B is projected at the projection point B' of the receiver 120 just at the center of the receiver 120. Since the thickness of the array substrate changes linearly (ie, the thickness of the array substrate gradually increases gradually), it can be determined that it is located.
  • the positioning device 100 of the embodiment transmits a light beam to the to-be-located point and the auxiliary positioning point through the transmitter 110, and the receiver 120 receives the reflected beam reflected from the to-be-positioned point and the auxiliary positioning point, even if the reflected beam of the point to be positioned
  • the receiver 120 does not receive the reflected beam reflected by the point to be positioned due to the scattering, and can also determine the height information of the point to be positioned by the projection position of the reflected beam reflected by the auxiliary positioning point, thereby improving the success rate of the positioning and effectiveness.
  • the determining module 140 is further provided with a valid position range, and the determining module 140 is further configured to determine whether a projection position of the reflected light beam reflected by the point to be positioned is within a valid position range, and when the projected position of the reflected light beam is in the effective position range Internally, the height information of the point to be positioned determined according to the projected position of the reflected beam is relatively accurate; conversely, when the projected position of the reflected beam is outside the effective position range, the position to be determined is determined according to the projected position of the reflected beam. The height information of the points is less accurate. In order to improve the accuracy of the positioning, the determining module 140 of the embodiment is further configured to determine whether the reflected beam is valid according to whether the projected position of the reflected beam reflected by the received point to be positioned is detected within the effective position range.
  • the determining module 140 determines that the projected beam reflected by the to-be-positioned point is projected in the effective position range of the receiver 120, it is determined that the reflected beam is valid, and the determination result is sent to the calculation module 150, and the calculation module 150 is The effective reflected beam determines the height information of the point to be located.
  • the determining module 140 determines that the projected beam reflected by the to-be-positioned spot is projected outside the effective position range of the reflected position of the receiver 120, it is determined that the reflected beam is invalid, and the determination result is sent to the calculation module 150, and the calculation module 150
  • the height information of the point to be positioned is determined according to the projection position of the reflected beam reflected from the auxiliary positioning point.
  • the determining module 140 is further configured to determine whether the projection position of the reflected beam reflected by the auxiliary positioning point received by the receiver is within the effective position range, and send the determination result to the calculation module 150, and calculate The module 150 determines the height information of the point to be positioned according to the reflected beam reflected from the auxiliary positioning point, and also selects the effective reflected light speed reflected by the auxiliary positioning point to determine the height information of the point to be positioned, that is, selects those projected in the effective position. The projection position of the reflected beam within the range to determine the height information of the point to be positioned.
  • the receiver 120 receives two pairs of auxiliary positioning points symmetrically distributed around the point to be located, C and D, and E and F, respectively, wherein the reflected beam of C is projected upwardly from the center of the receiver by 3 units when projected onto the receiver 120.
  • the reflected beam of D is projected to the receiver 120 and is offset from the center of the receiver by one unit
  • the reflected beam of E is projected downward from the center of the receiver when the reflected beam of E is projected onto the receiver 120
  • the reflected beam of F is projected onto the receiver 120.
  • the surface of one or more auxiliary positioning points may be uneven or have impurities, so that the receiver 120 can not receive the reflected beam reflected by the auxiliary positioning point, so the more auxiliary positioning points are selected, the positioning is performed. The chance of success is higher.
  • the reflected beam reflected by the auxiliary pairs can be used to determine the height of the point to be positioned. When the obtained data is different, the average value can be averaged, and the height obtained is more accurate, which improves the accuracy of the positioning. rate.
  • the determining module 140 determines the validity of the projected position of the reflected beam, so that the calculating module 150 selects the reflected beam projected in the effective position range to determine the height information of the point to be positioned, thereby improving the positioning accuracy. Sex.

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  • Engineering & Computer Science (AREA)
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Abstract

提供一种定位方法及定位装置（10）。定位装置（10）包括发射器（110）、接收器（120）、判断模块（140）和计算模块（150）。发射器（110）向待定位点（0）和辅助定位点（A、B、C、D、E、F、G、H）发射光束，再由接收器（120）接受发射的光束经待定位点（O）和辅助定位点（A、B、C、D、E、F、G、H）反射回来的反射光束，判断模块（140）然后判断接收器（120）是否接收到待定位点（O）反射回来的反射光束，最后由计算模块（150）根据判断结果以及待定位点（O）和辅助定位点（A、B、C、D、E、F、G、H）反射回来的反射光束确定所述待定位点（O）的高度信息。从而当无法接收到待定位点（O）反射回来的反射光束时，则根据辅助定位点（A、B、C、D、E、F、G、H）反射回来的反射光束确定待定位点（O）的高度信息，提高了定位的成功几率。

Description

定位方法及定位装置
技术领域
本发明涉及定位技术领域，尤其是涉及一种用于液晶面板制程中的定位方法及定位装置。
背景技术
在TFT阵列基板的制程中，需要测量TFT阵列基板的信号线的宽度，以保证TFT阵列基板的质量。现有技术中，在测量阵列基板的信号线之前，一般先由激光定位装置对TFT阵列基板进行定位，使测量装置能获取更清楚的图片，提高测量的准确度。
目前的激光定位装置在对TFT阵列基板进行定位时，由激光定位装置的激光发射器向TFT阵列上预先确定的待定位点发射光束，发射的光束经待定位点反射后形成反射光束，接收器则接收该反射光束来确定待定位点的高度信息，然后根据定位点的高度信息调整TFT阵列基板的高度，使TFT阵列基板处于最适合测量装置进行测量的高度。
然而由于在进行定位时，TFT阵列基板上已形成多个元件，使TFT阵列基板的表面凹凸不平，并且有时TFT阵列基板表面也会存在各种杂质，若待定位点的表面凹凸不平或者有杂质，则会导致照射到待定位点上的光束反射后呈散射状态，使得反射光束投射于接收器范围之外，导致接收器不能接收到待定位点的反射光束，从而导致定位失败。
发明内容
本发明的主要目的在于提供一种定位方法及定位装置，旨在提高定位的成功率。
为达以上目的，本发明提出一种定位方法，包括步骤：
向待定位点和辅助定位点发射光束；
接收发射的光束经待定位点和辅助定位点反射回来的反射光束；
判断是否接收到所述待定位点反射回来的反射光束；
若是，则根据所述待定位点或辅助定位点反射回来的反射光束确定所述待定位点的高度信息；
若否，则根据所述辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
优选地，所述根据所述待定位点或辅助定位点反射回来的反射光束确定该待定位点的高度信息包括：
判断接收到的所述待定位点反射回来的反射光束是否有效；
若有效，则根据所述待定位点反射回来的反射光束确定该待定位点的高度信息；
若无效，则根据所述辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
优选地，所述判断接收到的所述待定位点反射回来的反射光束是否有效包括：
设置一有效位置范围；
接收发射的光束经待定位点反射回来的反射光束的投射位置，并判断接收到的投射位置是否在有效位置范围内；
当待定位点反射回来的反射光束的投射位置在所述有效位置范围内时，则判定该反射光束有效；
当待定位点反射回来的反射光束的投射位置在所述有效位置范围以外时，则判定该反射光束无效。
优选地，所述根据所述辅助定位点反射回来的反射光束确定所述待定位点的高度信息包括：
根据所述辅助定位点反射回来的有效反射光束确定所述待定位点的高度信息。
优选地，所述根据待定位点反射回来的反射光束确定所述待定位点的高度信息包括：
记录所述待定位点反射回来的反射光束的投射位置；
根据所述投射位置确定所述待定位点的高度信息。
优选地，所述根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息包括：
记录所述辅助定位点反射回来的反射光束的投射位置；
根据所述投射位置确定所述待定位点的高度信息。
优选地，所述向待定位点和辅助定位点发射光束的步骤之前还包括：
确定所述待定位点；
确定所述辅助定位点，且该辅助定位点以所述待定位点为中心对称设置。
本发明同时提出一种定位装置，包括：
发射器，用于向待定位点和辅助定位点发射光束；
接收器，用于接收发射器发射的光束经待定位点和辅助定位点反射回来的反射光束；
判断模块，判断所述接收器是否接收到所述待定位点反射回来的反射光束；
计算模块，用于接收判断模块的判断结果，若接收到的判断结果为是时，则根据待定位点或辅助定位点反射回来的反射光束确定所述待定位点的高度信息；若接收到的判断结果为否时，则根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
优选地，所述接收器还包括一有效位置范围，当所述待定位点或辅助定位点反射回来的反射光束投射于该有效位置范围内时，所述判断模块则判断所述待定位点或辅助定位点反射回来的反射光束有效；当所述待定位点或辅助定位点反射回来的反射光束投射于该有效位置范围外时，所述判断模块则判断所述待定位点或辅助定位点反射回来的反射光束无效。
优选地，所述判断模块还用于判断所述接收器接收到的所述待定位点反射回来的反射光束是否有效，并将判断结果发送至所述计算模块；
所述计算模块接收到判断结果为有效时，则根据待定位点反射回来的反射光束确定该待定位点的高度信息；计算模块接收到判断结果为无效时，则根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
优选地，所述判断模块还用于判断所述接收器接收到的辅助定位点反射回来的反射光束是否有效，并将判断结果发送至所述计算模块；
所述计算模块根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息时，则选择所述辅助定位点反射回来的有效反射光束确定所述待定位点的高度信息。
优选地，所述接收器还用于记录所述待定位点和辅助定位点反射回来的反射光束在接收器上的投射位置，所述计算模块根据所述投射位置确定所述待定位点的高度信息。
优选地，所述定位装置还包括确定模块，该确定模块用于确定待定位点和辅助定位点，所述辅助定位点以所述待定位点为中心对称设置。
本发明所提供的一种定位方法及定位装置，通过预先确定待定位点和辅助定位点，当无法接收到待定位点反射回来的反射光束或反射光束无效时，则根据辅助定位点反射回来的反射光束确定待定位点的高度信息，从而提高了定位的成功率。
附图说明
图1是本发明的定位方法第一实施例的流程图；
图2是本发明中待定位点和辅助定位点的分布示意图；
图3是本发明中待定位点和辅助定位点的另一分布示意图；
图4是本发明中辅助定位点反射回来的反射光线投射于定位器的示意图；
图5是本发明的定位方法第二实施例的流程图；
图6 是本发明的定位装置一实施例的结构示意图。
本发明目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。
具体实施方式
应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
参见图1，提出本发明的定位方法第一实施例，所述定位方法用于在测量阵列基板时对待测量点进行定位，该定位方法包括：
步骤S101、向待定位点和辅助定位点发射光束。
以阵列基板为例，在对阵列基板进行量测时，先确定待量测点，在对该待量测点量测之前，需首先对该量测点定位。定位时，则该待量测点即为需要定位的待定位点，再于该待定位点周围确定若干辅助定位点。作为优选，辅助定位点可以以待定位点为中心分布于该待定位点周围，最好是以待定位点为中心对称分布于待定位点周围，呈矩形或圆形等对称几何体排布，而待定位点则为几何中心，如图2所示，位于矩形几何中心的是待定位点O，对称分布于该待定位点O周围的为辅助定位点A、B、C、D、E、F、G、H。辅助定位点和待定位点也可以呈直线排布，且辅助定位点对称分布于待定位点两侧，如图3所示，位于直线中点的为待定位点O，对称分别于该待定位点O两侧的为辅助定位点A、B、C、D。辅助定位点越多，则定位成功率越高、定位越准确。
确定了待定位点和辅助定位点之后，则向预先确定的待定位点和辅助定位点发射光束。
步骤S102、接收发射的光束经待定位点和辅助定位点反射回来的反射光束。
本步骤S102中，光束照射到待定位点和辅助定位点上后在待定位点和辅助定位点发生反射，形成反射光束，接收待定位点和辅助定位点反射回来的反射光束，并记录反射光束投射于接收器上的投射位置。
步骤S103、判断是否接收到待定位点反射回来的反射光束。
阵列基板的表面凹凸不平，并且有时阵列基板表面也会存在各种杂质，若待定位点或辅助定位点的表面凹凸不平或者有杂质，则会导致照射到待定位点或辅助定位点上的光束反射后呈散射状态，使得反射光束投射于接收器的接收范围之外，导致接收器不能接收到待定位点或辅助定位点反射回来的反射光束，若在步骤S102中记录的投射位置中没有待定位点反射回来的反射光束的投射位置，则表示未接收到待定位点反射回来的反射光束。判断是否接收到待定位点反射回来的反射光束，若是，则执行步骤S104；若否，则执行步骤S105。
步骤S104、根据待定位点反射回来的反射光束确定待定位点的高度信息。
如果接收到了待定位点反射回来的反射光束的投射位置，则可以根据该待定位点反射回来的反射光束的投射位置来直接确定该待定位点的高度。例如，当待定位点反射回来的反射光束投射于接收器时向上偏离接收器中心1个单位，则直接确定待定位点的高度为1，后续对待定位点进行量测时，将阵列基板向下移动1个单位即可；当反射光束投射于接收器时向下偏离接收器中心3个单位，则直接确定待定位点的高度为-3，后续对待定位点进行量测时，将阵列基板向上移动3个单位即可；当反射光束投射于接收器时刚好位于接收器中心，则直接确定待定位点的高度为0，后续可直接对待定位点进行量测。
当然，即使接收到了待定位点反射回来的反射光束的投射位置，也可以通过辅助定位点反射回来的反射光束的投射位置间接计算出待定位点的高度；或者先通过待定位点反射回来的反射光束的投射位置直接确定待定位点的高度，再通过辅助定位点反射回来的反射光束的投射位置来间接确定待定位点的高度，对比两个高度值的大小差异，以此来验证定位方法定位的准确性，从而作为后续量测时三西格玛变差的参考。对于通过辅助定位点反射回来的反射光束来间接确定待定位点的高度的方法，将在下述步骤中详细说明。
步骤S105、根据辅助定位点反射回来的反射光束确定待定位点的高度信息。
如果待定位点因表面凹凸不平或者有杂质而使得接收器不能接收到该待定位点的反射光束，此时则根据辅助定位点反射回来的反射光束投射于接收器上的位置来确定待定位点的高度信息。
例如，如图4所示，显示了辅助定位点反射回来的反射光束投射于接收器的示意图，其中坐标原点即为接收器的中心。接收器接收到对称分布于待定位点O两侧的两个辅助定位点A和B反射回来的反射光束，当A的反射光束投射于接收器的位置A＇向上偏离接收器中心4个单位，B的反射光束投射于接收器的位置B＇刚好位于接收器中心，由于辅助定位点A和B对称地设置在待定位点O的两侧，因此可以确定位于辅助定位点A和B中间的待定位点O如果正常反射，则其反射回来的反射光束投射于接收器的投影点O＇(图中该点以虚线表示)应该位于A＇和B＇之间，即待定位点O的高度应为(4+0)/2=2；或者，当A的反射光束投射于接收器时向上偏离3个单位，B的反射光束投射于接收器时向下偏离1个单位，则可以确定待定位点的高度为(3-1)/2=1。
当然，也会出现一个或多个辅助定位点的表面凹凸不平或者有杂质的情况，导致接收器也无法接收到该辅助定位点反射回来的反射光束，因此选择的辅助定位点越多，定位成功的几率越高。同时可以通过多对辅助定位点反射回来的反射光束来分别确定待定位点的高度，当得出的数据有差异时，可对其求平均值，如此得到的高度更精确，从而可提高定位的准确率。
据此，本实施例通过预先确定待定位点和辅助定位点，当无法接收到待定位点反射回来的反射光束时，则根据辅助定位点反射回来的反射光束确定待定位点的高度信息，从而提高了定位的成功率。
参见图5所示的本发明的定位方法第二实施例，本实施例的定位方法包括以下步骤：
步骤S201、向待定位点和辅助定位点发射光束。
以阵列基板为例，在对阵列基板进行量测时，先确定待量测点，在对该待量测点量测之前，需首先对该量测点定位。定位时，则该待量测点即为需要定位的待定位点，再于该待定位点周围确定若干辅助定位点。作为优选，辅助定位点可以以待定位点为中心分布于该待定位点周围，最好是以待定位点为中心对称分布于待定位点周围，呈矩形或圆形等对称几何体排布，而待定位点则为几何中心，如图2所示，位于矩形几何中心的是待定位点O，对称分布于该待定位点O周围的为辅助定位点A、B、C、D、E、F、G、H。辅助定位点和待定位点也可以呈直线排布，且辅助定位点对称分布于待定位点两侧，如图3所示，位于直线中点的为待定位点O，对称分别于该待定位点O两侧的为辅助定位点A、B、C、D。辅助定位点越多，则定位成功率越高、定位越准确。
确定了待定位点和辅助定位点之后，则使用定位装置待定位点和辅助定位点发射光束。
步骤S202、接收发射的光束经待定位点和辅助定位点反射回来的反射光束。
本步骤S202中，光束照射到待定位点和辅助定位点上后在待定位点和辅助定位点发生反射，形成反射光束，接收待定位点和辅助定位点反射回来的反射光束，并记录反射光束投射于接收器上的投射位置。
步骤S203、判断是否接收到待定位点反射回来的反射光束。
阵列基板的表面凹凸不平，并且有时阵列基板表面也会存在各种杂质，若待定位点或辅助定位点的表面凹凸不平或者有杂质，则会导致照射到待定位点或辅助定位点上的光束反射后呈散射状态，使得反射光束投射于接收器的接收范围之外，导致接收器不能接收到待定位点或辅助定位点反射回来的反射光束，若在步骤S202中记录的位置中没有待定位点反射回来的反射光束的位置，则表示未接收到待定位点反射回来的反射光束。判断是否接收到待定位点反射回来的反射光束，若是，则执行步骤S204；若否，则执行步骤S205。
步骤S204、判断待定位点反射回来的反射光束是否有效。
在本步骤中，设置一有效位置范围。接收发射光束经过待定位点及辅助定位点形成的反射光束投射在接收器上的位置，并判断接收到的位置是否在有效位置范围内，当待定位点反射回来的反射光束的投射位置在该有效位置范围内时，则判定该反射光束有效，根据该有效的反射光束的投射位置确定的待定位点高度信息会更加精确；当待定位点反射回来的反射光束的投射位置在该有效位置范围以外时，则判定该反射光束无效，根据该无效的反射光束确定的待定位高度信息精确性较差。因此，为了提高定位的精确性，收到待定位点反射回来的反射光束的投射位置后，还进一步判断该反射光束是否有效。若无效，则执行步骤S205；若有效，则执行步骤S206。
步骤S205、根据辅助定位点反射回来的反射光束确定待定位点的高度信息。
如果待定位点因表面凹凸不平或者有杂质而使得接收器不能接收到该待定位点的反射光束，或者即使接收到待定位点反射回来的反射光束但判定该反射光束无效，此时则根据辅助定位点反射回来的反射光束的投射位置来确定待定位点的高度信息。
例如，如图4所示，显示了辅助定位点反射回来的反射光束投射于接收器的示意图，其中坐标原点即为接收器的中心。接收器接收到对称分布于待定位点O两侧的两个辅助定位点A和B反射回来的反射光束，当A的反射光束投射于接收器的位置A＇向上偏离接收器中心4个单位，B的反射光束投射于接收器的位置B＇刚好位于接收器中心，由于辅助定位点A和B对称地设置在待定位点O的两侧，因此可以确定位于辅助定位点A和B中间的待定位点O如果正常反射，则其反射回来的反射光束投射于接收器的投影点O＇(图中该点以虚线表示)应该位于A＇和B＇之间，即待定位点O的高度应为(4+0)/2=2；或者，当A的反射光束投射于接收器时向上偏离3个单位，B的反射光束投射于接收器时向下偏离1个单位，则可以确定待定位点的高度为(3-1)/2=1。
当然，也会出现一个或多个辅助定位点的表面凹凸不平或者有杂质的情况，导致接收器也无法接收到该辅助定位点反射回来的反射光束，因此选择的辅助定位点越多，定位成功的几率越高。同时可以通过多对辅助定位点反射回来的反射光束来分别确定待定位点的高度，当得出的数据有差异时，可对其求平均值，如此得到的高度更精确，从而可提高定位的准确率。
此外，对于步骤S205，为了保证定位的准确性，在选择辅助定位点反射回来的反射光束时，同样选择那些投射于接收器有效位置范围内的有效反射光束，根据该有效反射光束投射于接收器的位置来确定待定位点的高度信息。
步骤S206、根据待定位点反射回来的反射光束确定待定位点的高度。
如果接收到了待定位点反射回来的有效反射光束，即待定位点反射回来的有效反射光束投射于接收器的有效位置范围内，则可以根据该待定位点反射回来的反射光束的投射位置来直接确定该待定位点的高度。例如，当待定位点反射回来的反射光束投射于接收器时向上偏离接收器中心1个单位，则直接确定待定位点的高度为1，后续对待定位点进行量测时，将阵列基板向下移动1个单位即可；当反射光束投射于接收器时向下偏离接收器中心3个单位，则直接确定待定位点的高度为-3，后续对待定位点进行量测时，将阵列基板向上移动3个单位即可；当反射光束投射于接收器时刚好位于接收器中心，则直接确定待定位点的高度为0，后续可直接对待定位点进行量测。
当然，即使接收到了待定位点反射回来的反射光束的投射位置，也可以通过辅助定位点反射回来的反射光束的投射位置间接计算出待定位点的高度；或者先通过待定位点反射回来的反射光束直接确定待定位点的高度，再通过辅助定位点反射回来的反射光束的投射位置来间接确定待定位点的高度，对比两个高度值的大小差异，以此来验证定位装置定位的准确性，从而作为后续量测时三西格玛变差的参考。
据此，本实施例通过对反射光束的投射位置有效性进行判断，选择投射于有效位置范围内的反射光束来确定待定位点的高度信息，从而提高了定位的精确性。
参见图6，提出本发明的定位装置的优选实施例，该定位装置用于在测量阵列基板时对待测量点进行定位。所述定位装置100包括发射器110、接收器120、确定模块130、判断模块140及计算模块150。
确定模块130用于在阵列基板上确定需要定位的待定位点，再根据待定位点确定若干辅助定位点。辅助定位点以待定位点为中心分布于待定位点周围。作为优选，辅助定位点可以以待定位点为中心对称分布于该待定位点周围，呈矩形或圆形等对称几何体排布，而待定位点则为几何中心，如图2所示，位于矩形几何中心的是待定位点O，对称分布于该待定位点O周围的为辅助定位点A、B、C、D、E、F、G、H。辅助定位点和待定位点也可以呈直线排布，且辅助定位点对称分布于待定位点两侧，如图3所示，位于直线中点的为待定位点O，对称分别于该待定位点O两侧的为辅助定位点A、B、C、D。辅助定位点越多，则定位成功率越高、定位越准确。当然，上述确定待定位点和辅助定位点的过程也可以由人工确定，只是本实施例由定位装置确定的准确性和速度更快。
发射器110用于分别向预先确定的待定位点和辅助定位点发射光束，发射器110向待定位点发射光束的同时，也向以所述待定位点为中心分布于该待定位点周围的辅助定位点发射光束。
接收器120用于接收发射器110发射的光束经待定位点和辅助定位点反射回来的反射光束，并根据接收到的反射光束记录该反射光束在接收器120上的投射位置，然后将投射位置传送至判断模块140。
判断模块140用于接收反射光束的投射位置，然后判断所接收到的反射光束的投射位置中是否有待定位点反射回来的反射光束的投射位置，若是，则将待定位点反射回来的反射光束的投射位置和辅助定位点反射回来的反射光束的投射位置传送至计算模块150，计算模块150则根据待定位点反射回来的反射光束的投射位置或辅助定位点反射回来的反射光束的投射位置来确定待定位点的高度信息；若否，则将辅助定位点反射回来的反射光束的投射位置传送至计算模块150，计算模块150则根据辅助定位点反射回来的反射光束的投射位置来确定待定位点的高度信息。
例如，当发射的光束经待定位点反射回来的反射光束投射于接收器120时向上偏离接收器120中心1个单位，则直接确定待定位点的高度为1；当反射光束投射于接收器120时向下偏离接收器120中心3个单位，则直接确定待定位点的高度为-3；当反射光束投射于接收器120时刚好位于接收器120中心，则直接确定待定位点的高度为0。
再如，如图4所示，显示了辅助定位点反射回来的反射光束投射于接收器的示意图，其中坐标原点即为接收器的中心。接收器120接收到对称分布于待定位点O两侧的两个辅助定位点A和B反射回来的反射光束，当A的反射光束投射于接收器120的投影点A向上偏离接收器120中心4个单位，B的反射光束投射于接收器120的投影点B＇刚好位于接收器120中心，鉴于阵列基板的厚度呈线性变化（即阵列基板的厚度逐渐增加会逐渐减小），因此可以确定位于辅助定位点A和B中间的待定位点O如果正常反射，则其反射回来的反射光束投射于接收器的投影点O＇(图中该点以虚线表示)应该位于A＇和B＇之间，即待定位点O的高度应为(4+0)/2=2。当A的反射光束投射于接收器120时向上偏离3个单位，B的反射光束投射于接收器120时向下偏离1个单位，则可以确定待定位点的高度为(3-1)/2=1。
据此，本实施例的定位装置100，通过发射器110向待定位点和辅助定位点发射光束，接收器120接收待定位点和辅助定位点反射回来的反射光束，即使待定位点的反射光束因散射而导致接收器120没有接收到待定位点反射回来的反射光束，也可以通过辅助定位点反射回来的反射光束的投射位置来确定待定位点的高度信息，因此提高了定位的成功率和效率。
进一步地，判断模块140还设有一有效位置范围，该判断模块140还用于判断待定位点反射回来的反射光束的投射位置是否在有效位置范围内，当反射光束的投射位置在该有效位置范围内时，根据该反射光束的投射位置来确定的待定位点高度信息就比较精确；反之，当反射光束的投射位置在该有效位置范围外时，根据该反射光束的投射位置来确定的待定位点的高度信息的精确性就较差。为了提高定位的精确性，本实施例的判断模块140还用于根据检测接收到的待定位点反射回来的反射光束的投射位置是否投射于有效位置范围内，来判断该反射光束是否有效。
若判断模块140判断待定位点反射回来的反射光束投射于接收器120的投射位置在有效位置范围内，则判定该反射光束有效，并将该判断结果发送至计算模块150，计算模块150则根据该有效的反射光束确定待定位点的高度信息。
若判断模块140判断待定位点反射回来的反射光束投射于接收器120的投射位置在有效位置范围外时，则判定该反射光束无效，并将该判断结果发送至计算模块150，计算模块150则根据辅助定位点反射回来的反射光束的投射位置确定待定位点的高度信息。
同时，为了保证定位的准确性，判断模块140还用于判断接收器接收到的辅助定位点反射回来的反射光束的投射位置是否在有效位置范围内，并将判断结果发送至计算模块150，计算模块150在根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息时，同样选择辅助定位点反射回来的有效反射光速来确定待定位点的高度信息，即选择那些投射于有效位置范围内的反射光束的投射位置，来确定待定位点的高度信息。
例如，接收器120接收到对称分布于待定位点周围的两对辅助定位点，分别是C和D以及E和F，其中C的反射光束投射于接收器120时向上偏离接收器中心3个单位、D的反射光束投射于接收器120时向上偏离接收器中心1个单位、E的反射光束投射于接收器120时向下偏离接收器中心1个单位、F的反射光束投射于接收器120时向上偏离接收器中心10个单位。C、D、E的反射光束均投射于接收器120的有效位置范围内，F的反射光束则投射于接收器120的有效位置范围外，因此选择C和D的反射光束来确定待定位点的高度，从而待定位点的高度为(3+1)/2=2。
当然，也会出现一个或多个辅助定位点的表面凹凸不平或者有杂质的情况，导致接收器120也无法接收到该辅助定位点反射回来的反射光束，因此选择的辅助定位点越多，定位成功的几率越高。同时可以通过多对辅助定位点反射回来的反射光束来分别确定待定位点的高度，当得出的数据有差异时，可对其求平均值，如此得到的高度更精确，提高了定位的准确率。
本实施例中，判断模块140通过对反射光束的投射位置的有效性进行判断，从而计算模块150选择投射于有效位置范围内的反射光束来确定待定位点的高度信息，从而提高了定位的精确性。
应当理解的是，以上仅为本发明的优选实施例，不能因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (13)

  1. 一种定位方法，其特征在于，包括步骤：
    向待定位点和辅助定位点发射光束；
    接收发射的光束经待定位点和辅助定位点反射回来的反射光束；
    判断是否接收到所述待定位点反射回来的反射光束；
    若是，则根据所述待定位点或辅助定位点反射回来的反射光束确定所述待定位点的高度信息；
    若否，则根据所述辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
  2. 根据权利要求1所述的定位方法，其特征在于，所述根据所述待定位点或辅助定位点反射回来的反射光束确定该待定位点的高度信息包括：
    判断接收到的所述待定位点反射回来的反射光束是否有效；
    若有效，则根据所述待定位点反射回来的反射光束确定该待定位点的高度信息；
    若无效，则根据所述辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
  3. 根据权利要求2所述的定位方法，其特征在于，所述判断接收到的所述待定位点反射回来的反射光束是否有效包括：
    设置一有效位置范围；
    接收发射的光束经待定位点反射回来的反射光束的投射位置，并判断接收到的投射位置是否在有效位置范围内；
    当待定位点反射回来的反射光束的投射位置在所述有效位置范围内时，则判定该反射光束有效；
    当待定位点反射回来的反射光束的投射位置在所述有效位置范围以外时，则判定该反射光束无效。
  4. 根据权利要求2所述的定位方法，其特征在于，所述根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息包括：
    根据所述辅助定位点反射回来的有效反射光束确定所述待定位点的高度信息。
  5. 根据权利要求1所述的定位方法，其特征在于，所述根据待定位点反射回来的反射光束确定所述待定位点的高度信息包括：
    记录所述待定位点反射回来的反射光束的投射位置；
    根据所述投射位置确定所述待定位点的高度信息。
  6. 根据权利要求1所述的定位方法，其特征在于，所述根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息包括：
    记录所述辅助定位点反射回来的反射光束的投射位置；
    根据所述投射位置确定所述待定位点的高度信息。
  7. 根据权利要求1所述的定位方法，其特征在于，所述向待定位点和辅助定位点发射光束的步骤之前还包括：
    确定所述待定位点；
    确定所述辅助定位点，且该辅助定位点以所述待定位点为中心对称设置。
  8. 一种定位装置，其特征在于，包括：
    发射器，用于向待定位点和辅助定位点发射光束；
    接收器，用于接收发射器发射的光束经待定位点和辅助定位点反射回来的反射光束；
    判断模块，判断所述接收器是否接收到所述待定位点反射回来的反射光束；
    计算模块，用于接收判断模块的判断结果，若接收到的判断结果为是时，则根据待定位点或辅助定位点反射回来的反射光束确定所述待定位点的高度信息；若接收到的判断结果为否时，则根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
  9. 根据权利要求8所述的定位装置，其特征在于，所述接收器还包括一有效位置范围，当所述待定位点或辅助定位点反射回来的反射光束投射于该有效位置范围内时，所述判断模块则判断所述待定位点或辅助定位点反射回来的反射光束有效；当所述待定位点或辅助定位点反射回来的反射光束投射于该有效位置范围外时，所述判断模块则判断所述待定位点或辅助定位点反射回来的反射光束无效。
  10. 根据权利要求8所述的定位装置，其特征在于，所述判断模块还用于判断所述接收器接收到的所述待定位点反射回来的反射光束是否有效，并将判断结果发送至所述计算模块；
    所述计算模块接收到判断结果为有效时，则根据待定位点反射回来的反射光束确定该待定位点的高度信息；计算模块接收到判断结果为无效时，则根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息。
  11. 根据权利要求8所述的定位装置，其特征在于，所述判断模块还用于判断所述接收器接收到的辅助定位点反射回来的反射光束是否有效，并将判断结果发送至所述计算模块；
    所述计算模块根据辅助定位点反射回来的反射光束确定所述待定位点的高度信息时，则选择所述辅助定位点反射回来的有效反射光束确定所述待定位点的高度信息。
  12. 根据权利要求8所述的定位装置，其特征在于，所述接收器还用于记录所述待定位点和辅助定位点反射回来的反射光束在接收器上的投射位置，所述计算模块根据所述投射位置确定所述待定位点的高度信息。
  13. 根据权利要求8所述的定位装置，其特征在于，所述定位装置还包括确定模块，该确定模块用于确定待定位点和辅助定位点，所述辅助定位点以所述待定位点为中心对称设置。
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