WO2014034247A1 - Gate valve and substrate processing system - Google Patents

Gate valve and substrate processing system Download PDF

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Publication number
WO2014034247A1
WO2014034247A1 PCT/JP2013/067827 JP2013067827W WO2014034247A1 WO 2014034247 A1 WO2014034247 A1 WO 2014034247A1 JP 2013067827 W JP2013067827 W JP 2013067827W WO 2014034247 A1 WO2014034247 A1 WO 2014034247A1
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WO
WIPO (PCT)
Prior art keywords
valve body
valve
opening
gate
unit
Prior art date
Application number
PCT/JP2013/067827
Other languages
French (fr)
Japanese (ja)
Inventor
達下　弘一
Original Assignee
東京エレクトロン株式会社
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Filing date
Publication date
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Publication of WO2014034247A1 publication Critical patent/WO2014034247A1/en

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/16—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together
    • F16K3/18—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members
    • F16K3/184—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members by means of cams
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K3/00—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing
    • F16K3/02—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor
    • F16K3/16—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together
    • F16K3/18—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members
    • F16K3/184—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members by means of cams
    • F16K3/186—Gate valves or sliding valves, i.e. cut-off apparatus with closing members having a sliding movement along the seat for opening and closing with flat sealing faces; Packings therefor with special arrangements for separating the sealing faces or for pressing them together by movement of the closure members by means of cams by means of cams of wedge from
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like

Definitions

  • the present invention relates to a gate valve used for opening and closing a vacuum vessel and a substrate processing system using the gate valve.
  • FPD flat panel displays
  • LCD liquid crystal displays
  • solar cells a large glass substrate is provided with a plurality of processing chambers for performing predetermined processing such as etching and film formation.
  • a multi-housing type processing system is known (for example, Patent Document 1).
  • a batch type processing system for processing a plurality of substrates at a time is also known (for example, Patent Document 2).
  • Such a multi-housing type substrate processing system has a common transfer chamber provided with a transfer device for transferring a substrate (object to be processed), and a processing chamber and a common transfer chamber are provided around the common transfer chamber.
  • a load lock chamber or the like for exchanging an unprocessed substrate and a processed substrate with an atmospheric pressure atmosphere is provided.
  • the common transfer chamber, the processing chamber, and the load lock chamber are evacuated using an exhaust mechanism to be evacuated to function as a vacuum container.
  • substrate transport and substrate processing are performed in a state where a plurality of substrates are arranged in multiple stages in the vertical direction.
  • These vacuum chambers such as processing chambers and load lock chambers are provided with openings for taking in and out the objects to be processed, and the openings are opened and closed using gate valves.
  • the openings are opened and closed using gate valves.
  • the inside of the processing chamber or the load lock chamber is hermetically sealed.
  • the gate valve closed, the processing chamber reduces the internal pressure to a predetermined pressure to perform a predetermined processing, and the load lock chamber can convert between the atmospheric state and the reduced pressure state. It is possible.
  • the gate valve has a valve body that closes the opening and closing portion, and the valve body is lifted and lowered by a hydraulic cylinder, and the link mechanism is used while the valve body is positioned at the opening. Then, the opening is closed by pressing the valve body against the opening.
  • an object of the present invention is that an increase in the space in the height direction is almost necessary in the case of a batch type processing system in which a plurality of substrates are arranged in multiple stages in the vertical direction to carry the substrates and process the substrates.
  • an object of the present invention is to provide a gate valve capable of cleaning the valve body and a substrate processing system using such a gate valve.
  • a gate valve used for opening and closing a vacuum container when transporting a plurality of substrates arranged in multiple stages in the vertical direction between the vacuum containers, wherein the gate valve is to be transported.
  • a housing having a vertical wall in which a plurality of openings are formed so as to correspond to substrates arranged in multiple stages, a valve body provided in the housing for opening and closing the openings, and raising and lowering the valve body
  • the valve body elevating mechanism elevates and lowers the valve body between an opening corresponding position corresponding to the opening and a retracted position adjacent to the opening.
  • the valve body is rotated so that the vertically oriented valve body in the opening corresponding position becomes lateral in the retracted position, and the valve body pressing mechanism opens the valve body in the opening corresponding position to the opening.
  • a gate valve is provided in which the valve body is advanced toward the portion to press the valve body, and the sealing surface of the valve body is pressed around the opening.
  • the gate valve according to the first aspect further includes valve body holders that are provided at both ends of the valve body and hold the valve body so as to be able to advance and retreat, and a valve body unit is configured by the valve body and the valve body holder.
  • the valve body elevating mechanism can be configured to elevate and lower the valve body unit.
  • the valve body rotation mechanism includes a rotation shaft and a cam follower provided on an end surface of the valve body holder, a guide that is adjacent to the valve body holder, is fixed to the housing, and has a curved surface that guides the cam follower.
  • the cam follower is guided and moved by the curved surface of the guide block, and the valve body unit including the valve body is moved accordingly. It is possible to rotate around the rotation axis.
  • the retracted position is a position below the opening, and the valve body rotation mechanism is configured to move the seal at the retracted position when the valve body unit is lowered from the opening corresponding position.
  • the valve body unit can be rotated so that the surface faces downward.
  • valve body pressing mechanism can be configured to press only the valve body in the valve body unit and advance toward the opening.
  • the valve body pressing mechanism includes a cam unit having a cam at a position corresponding to the plurality of valve bodies, and an elevating drive unit for elevating and lowering the cam unit, and elevating and lowering the cam unit.
  • the cam can be configured to press the valve body by taking a pressing position for pressing the valve body and a pressing release position for releasing the pressing, and positioning the cam at the pressing position.
  • it can be set as the structure further equipped with the urging
  • a common transfer chamber held in a vacuum a processing chamber connected to the common transfer chamber for performing a predetermined process under vacuum, connected to the common transfer chamber,
  • a load lock chamber that is provided so as to be switchable between an atmospheric state and a vacuum state and that replaces a substrate that has not been processed and has been processed, and is provided in the common transfer chamber, between the processing chamber and the load lock chamber.
  • a substrate transfer apparatus that collectively transfers a plurality of substrates in a state where a plurality of substrates are arranged in multiple stages in the vertical direction; and between the common transfer chamber and the processing chamber; and the common transfer chamber and the load lock chamber;
  • the small openings corresponding to the respective substrates are provided in the same number as the number of the substrates to be transferred at once, and the valve bodies for opening and closing these are provided for each opening. Therefore, when opening the valve bodies, The valve body as in the case of providing a large opening for collectively transporting a plurality of conventional substrates and opening and closing the opening with a single valve body The space in the height direction for escaping is substantially unnecessary. For this reason, the height of the housing can be reduced.
  • the valve body is moved up and down, and the valve body is rotated by the valve body rotation mechanism at that time. Since it does not face the wall portion of the housing, it is possible to clean the valve body seal surface, which has been difficult in the past.
  • valve body when the valve body is retracted, the valve body is rotated so as to be turned sideways, so that the height of the valve body can be reduced, and the pitch of the openings should be made smaller than the vertical width of the valve body. Can do.
  • FIG. 1 is a plan view schematically showing a substrate processing system in which a gate valve according to an embodiment of the present invention is used. It is a side view which shows the substrate conveying apparatus provided in the common conveyance chamber of the substrate processing system of FIG. It is the longitudinal cross-sectional view which looked at the gate valve which concerns on one Embodiment of this invention from the side surface. It is the longitudinal cross-sectional view which looked at the gate valve which concerns on one Embodiment of this invention from the front. It is a horizontal sectional view of the gate valve concerning one embodiment of the present invention. It is a perspective view which shows the valve body unit of the gate valve which concerns on one Embodiment of this invention.
  • FIG. 1 is a plan view schematically showing a substrate processing system using a gate valve according to an embodiment of the present invention.
  • the substrate processing system 1 is configured as a device that performs vacuum processing such as etching or film formation on a rectangular substrate used as an FPD glass substrate such as a liquid crystal display (LCD) or a solar cell glass substrate. ing.
  • the substrate processing system 1 includes a common transfer chamber 10 held in a vacuum, and performs processing such as etching and film formation on the substrate G connected to the common transfer chamber 10 in vacuum 3 Common to the two processing chambers 30a, 30b, 30c, a load-lock chamber 40 for exchanging the substrate G between the substrate container (not shown) arranged on the atmosphere side and the common transfer chamber 10 held in vacuum. And a substrate transfer device 50 that transfers the substrate G provided in the transfer chamber 10.
  • the common transfer chamber 10 is a vacuum container having a rectangular planar shape, and the processing chambers 30 a, 30 b, 30 c and the load lock chamber 40 are connected to each side surface of the common transfer chamber 10.
  • the substrate transfer device 50 is provided inside the common transfer chamber 10. Further, each of the processing chambers 30a, 30b, 30b has a mechanism (not shown) for supporting the substrate G therein, and is maintained in a predetermined reduced pressure atmosphere.
  • the load lock chamber 40 is for exchanging the substrate G between a substrate storage container (not shown) arranged on the atmosphere side and the common transfer chamber 10 held in a vacuum, and has an atmospheric atmosphere. Functions as a vacuum preparatory chamber that can be switched between a vacuum atmosphere and a reduced pressure atmosphere. That is, the common transfer chamber 10, the processing chambers 30a, 30b, and 30c, and the load lock chamber 40 are configured as vacuum containers.
  • an opening 60 is formed at a position corresponding to the processing chambers 30 a, 30 b, 30 c and the load lock chamber 40, and the processing chambers 30 a, 30 b, 30 c and the opening 60 of the load lock chamber 40 are formed. Openings 61a, 61b, 61c, and 62a are provided at corresponding positions. Then, the substrate G is transported through these openings 60, 61a, 61b, 61c, and 62a.
  • a gate valve 70 is provided between the common transfer chamber 10 and the processing chambers 30a, 30b, 30c and the load lock chamber 40 connected thereto.
  • An opening 62b that is opened to the outside of the substrate processing system 1 is formed on the atmosphere side of the load lock chamber 40. This opening 62b is used for loading the substrate G before processing and unloading the processed substrate G. It is opened and closed by a gate 63 that is used for loading and opened to atmospheric conditions.
  • the substrate processing system 1 is configured to process a plurality of substrates G, for example, three or more substrates G at a time in a horizontal direction in the height direction, and the substrate transport apparatus 50 is configured as shown in FIG.
  • the three substrate support arms 51a, 51b, and 51c arranged in the vertical direction are configured to be able to travel linearly on a base member 52 that can turn.
  • the substrate support arms 51a, 51b, and 51c can access the processing chambers 30a, 30b, and 30c and the load lock chamber 40 by the advancement / retraction operation of the substrate support arms 51a, 51b, and 51c and the turning operation of the base member 52.
  • Reference numeral 53 denotes a drive system for realizing the turning operation of the base member 52.
  • a plurality of substrates G are carried into the load lock chamber 40 via the gate 63 from an external substrate container by an atmospheric transfer device (not shown).
  • the plurality of loaded substrates G are loaded into the common transfer chamber 10 from the load lock chamber 40 via the gate valve 70 by the substrate transfer apparatus 50, and the processing chamber 30 a is transferred from the common transfer chamber 10 via the gate valve 70. , 30b, 30c.
  • the substrate G processed in the processing chambers 30a, 30b, and 30c is transferred from the processing chambers 30a, 30b, and 30c to the load lock chamber 40 through the gate valve 70.
  • the load lock chamber 40 to which the processed substrate G has been transferred is carried out through the gate 63 after the pressure therein is returned to atmospheric pressure.
  • the gate valve 70 will be described in detail.
  • the gate valve 70 between the common transfer chamber 10 and the processing chamber 30a will be described as an example.
  • FIG. 3 is a longitudinal sectional view of the gate valve 70 as seen from the side
  • FIG. 4 is a longitudinal sectional view as seen from the front
  • FIG. 5 is a horizontal sectional view
  • FIG. 6 is a perspective view showing the valve body unit.
  • the gate valve 70 has a housing 71 provided between the common transfer chamber 10 and, for example, the processing chamber 30a.
  • a plurality of (three in the present embodiment) openings 71 a through which the substrate G to be transferred passes are formed in the vertical wall 71 c on the processing chamber 30 a side of the housing 71.
  • the pitch of the openings 71a coincides with the pitch of the substrate support arms 51a, 51b, 51c of the substrate transport apparatus 50.
  • one large opening 71b is formed in the vertical wall 71d on the common transfer chamber 10 side.
  • the gate valve 70 also has a valve body unit 72 having a valve body 81 for opening and closing the three openings 71a in the housing 71, a valve body unit lifting mechanism 73 for lifting and lowering the valve body unit 72, a valve Corresponding to the opening 71a, the valve body pressing mechanism 74 for pressing the body 81 against the periphery of the opening 71a and the valve body unit 72 are rotated as the valve body unit 72 is moved up and down. And a valve body rotating mechanism 75 that moves between a position where the valve is retracted and a position retracted from the opening 71a.
  • the valve body unit 72 includes a valve body 81 and a valve body holder 82 provided on both sides thereof for holding the valve body 81 so as to be able to advance and retreat.
  • the valve body holder 82 is L-shaped and has an end surface portion 82 a on the end surface side of the valve body 81 and a back surface portion 82 b on the back surface side of the valve body 81.
  • a pressure roller 83 for pressing the valve body 81 around the opening 71a is provided on both ends of the back surface of the valve body 81.
  • a rotating shaft 84 and a cam follower 85 that are part of the valve body rotating mechanism 75 are attached to the outer surface of the end surface portion 82 a of the valve body holder 82.
  • an advancing / retracting shaft 86 that is inserted into the back surface portion 82b of the valve body holder 82 is provided at the end of the valve body 81, and a portion corresponding to the outside of the back surface portion 82b of the advancing / retreating shaft 86 is provided as a biasing force applying mechanism.
  • the compression spring 87 is provided. Due to the urging force of the compression spring 87, the valve body 81 is returned backward when the valve body 81 is not pressed by the valve body pressing mechanism 74. 3 to 5 show a closed state in which the seal surface of the valve body 81 is pressed around the opening 71a. At this time, the space between the valve body 81 and the peripheral portion of the opening 71a is sealed by a seal ring (not shown).
  • the valve body unit elevating mechanism 73 includes support pillars 91 extending on both sides of the valve body unit 72 and an elevating drive unit 92 that elevates and lowers the support pillars 91.
  • the support column 91 that moves up and down is guided by an LM guide 93 as shown in FIG.
  • the valve body unit 72 and the support column 91 are rotatably connected by a rotation shaft 84, and when the support column 91 moves up and down, the valve body 81 has an opening corresponding position and an opening corresponding to the opening 71a.
  • the valve body unit 72 is moved up and down so as to move up and down between the retracted position below the 71a.
  • the valve body pressing mechanism 74 includes a pair of cam units 101 provided at both end portions on the back side of the valve body unit 72 and a lift drive unit 102 that moves the cam unit 101 up and down.
  • the cam unit 101 that moves up and down is guided by the LM guide 103.
  • the cam unit 101 includes a cam 104 provided at a position corresponding to the pressing roller 83 of each valve body unit 72 and a support bar 105 that supports the cam 104.
  • the cam unit 101 has three cams 104 attached to the support bar 105 in the vertical direction.
  • the cam 104 is formed with a thick upper portion, and an inclined portion is formed which gradually becomes thinner toward the lower portion. In the position shown in FIG.
  • the cam 104 has a thick position at the upper portion corresponding to the pressing roller 83 (valve element 81), and the valve element 81 is advanced by the cam 104 via the pressing roller 83.
  • the sealing surface is pressed around the opening 71a, and the opening 71a is closed.
  • valve body pressing mechanism 74 the pressing force by the valve body pressing mechanism 74 is released, and the valve body 81 reaches a position separated from the vertical wall portion 71c. Conversely, by lowering the cam unit 101 from the state shown in FIG. 7, the valve body 81 is pressed around the opening 71 a via the cam 104 and the pressing roller 83.
  • the valve body rotation mechanism 75 includes the rotation shaft 84 and the cam follower 85 described above, and a guide block 111 that is adjacent to the end surface portion 82 a of the valve body holder 82 and is fixed to the housing 71.
  • the guide block 111 has a curved surface 111a on the upper surface, and guides the cam follower 85 so that the cam follower 85 contacts the curved surface 111a. Then, when the valve body unit 72 is moved up and down, the cam follower 85 moves on the curved surface 111a while keeping the state in contact with the curved surface 111a. Thereby, the valve body unit 72 (valve body 81) rotates around the rotation shaft 84. In this case, as shown in FIG. 9, the position of the center of gravity of the valve body unit 72 is located on the back side with respect to the rotation shaft 84. As a result, the cam follower 85 can always be in contact with the curved surface 111 a of the guide block 111.
  • valve body unit 72 (valve body 81) rotates 90 degrees, and as shown in FIG. Then, the state is retracted below the corresponding opening 71a, and the opening 71a is opened. Conversely, by raising the valve body unit 72 from the open state of FIG. 10, the valve body 81 of FIG. 7 is in a state corresponding to the opening 71a.
  • the gate 63 is opened, and a plurality of (three in this embodiment) unprocessed substrates G are carried into the load lock chamber 40 in the atmospheric atmosphere by an atmosphere side substrate transfer device (not shown), and the gate 63 is closed.
  • the inside of the load lock chamber 40 is set to a reduced pressure atmosphere.
  • the gate valve 70 between the load lock chamber 40 and the common transfer chamber 10 is opened, and the three substrate support arms 51a, 51b, 51c of the substrate transfer device 50 are advanced into the load lock chamber 40, and the load lock chamber 40
  • the unprocessed substrates G carried in are received together.
  • the substrate support arms 51 a, 51 b, 51 c of the substrate transfer apparatus 50 are retracted to the common transfer chamber 10, and the gate valve 70 between the load lock chamber 40 and the common transfer chamber 10 is closed.
  • the substrate support arms 51a, 51b, 51c of the substrate transfer apparatus 50 are made to face the processing chambers 30a, 30b, or 30c, and the gate valve 70 between the common transfer chamber 10 and the processing chambers 30a, 30b, or 30c is set.
  • the substrate support arms 51a, 51b and 51c are advanced to the processing chamber 30a, 30b or 30c, and the substrate G is transferred to the processing chamber 30a, 30b or 30c.
  • the substrate support arms 51a, 51b, 51c are retracted to the common transfer chamber 10, the gate valve 70 is closed, and processing in the processing chambers 30a, 30b, or 30c is started.
  • a plurality of substrates G are taken out of the load lock chamber 40 by the substrate support arms 51a, 51b, 51c, and the processing is performed among the processing chambers 30a, 30b, and 30c. Transport it to something that is not.
  • the corresponding gate valve 70 is opened, the substrate support arms 51a, 51b, 51c are advanced into the processing chamber, and the processed substrate G is received. Next, the substrate support arms 51a, 51b, 51c are retracted into the common transfer chamber 10, and the gate valve 70 is closed. Next, the substrate support arms 51a, 51b, 51c are made to face the load lock chamber 40, the gate valve 70 between the common transfer chamber 10 and the load lock chamber 40 is opened, and the substrate support arms 51a, 51b, 51c are moved. The load lock chamber 40 is advanced to transfer the processed substrate G to the load lock chamber 40.
  • the substrate support arms 51a, 51b, and 51c are retracted to the common transfer chamber 10, the gate valve 70 between the common transfer chamber 10 and the load lock chamber 40 is closed, and the inside of the load lock chamber 40 is set to an atmospheric atmosphere. Thereafter, the gate 63 is opened, and the processed substrate G is carried out of the load lock chamber 40 by an atmosphere side substrate transfer device (not shown).
  • the gate valve 70 is always opened and closed when the substrate G is transferred between the vacuum vessels.
  • the gate valve 70 has three openings 71a for transporting the substrate G in the housing 71.
  • the opening and closing operation of the gate valve 70 is performed by the three openings. This is performed by three valve bodies 81 corresponding to 71a.
  • the valve body 81 in (a) is in the vertical direction and the sealing surface is pressed around the opening 71a.
  • the valve body 81 is retracted to the position, and then the valve body 81 is rotated 90 degrees while being lowered, so that each valve body 81 is retracted to the position below the corresponding opening 71a in the lateral state with the seal surface down.
  • the “open state” of (c) is obtained.
  • the substrate G can be transferred through the openings 71a by the substrate support arms 51a, 51b, 51c of the substrate transfer mechanism 50.
  • valve body 81 of (a) when the gate valve 70 is closed, the valve body 81 of (a) is moved from the “open state” in which the valve body 81 is retracted to the lower position of the opening 71a in the lateral state with the seal surface facing downward.
  • each valve body 81 in (b) is brought into a state facing each opening 71a, and then the valve body 81 is moved forward to The sealing surface is pressed around the periphery of the opening 71a to be in the “closed state” of (c).
  • the opening operation is performed from the “closed state” in (a) in FIG. 11 to the “open state” in (c).
  • the valve body 81 is pressed around the opening 71a.
  • the cam unit 101 is lifted by the lifting drive unit 102, the pressing of the cam 104 is released, and the valve body 81 is retracted by the biasing force of the compression spring 87 of the valve body unit 72, and FIG. (B)) in FIG. From this state, the valve body unit 72 is lowered by the valve body unit elevating mechanism 73.
  • the cam follower 85 is fixed to the housing 71 as the valve body unit 72 is lowered by the cooperation of the rotation shaft 84, the cam follower 85, and the guide block 111 constituting the valve body rotation mechanism 75.
  • the valve element unit 72 (valve element 81) is moved to the corresponding opening when the valve element unit 72 is rotated 90 degrees around the rotation shaft 84 while being guided by the curved surface 111a of the guide block 111. Retracted in a lateral state at a position below the portion 71a, the "open state" of FIG. 10 ((c) in FIG. 11) is obtained.
  • valve body unit 72 is raised by the valve body unit lifting mechanism 73 from the “open state” of FIG. 10 ((a) in FIG. 12).
  • the cam follower 85 is fixed to the housing 71 as the valve body unit 72 is raised by the cooperation of the rotation shaft 84, the cam follower 85, and the guide block 111 constituting the valve body rotation mechanism 75.
  • the valve element unit 72 (valve element 81) is moved to the corresponding opening when the valve element unit 72 is rotated 90 degrees around the rotation shaft 84 while being guided by the curved surface 111a of the guide block 111. It arrange
  • FIG. 13 is a view for explaining the operation of rotating the valve body unit 72 (valve body 81) by the valve body rotating mechanism 75, and shows an example in the case where the gate valve 70 is closed.
  • FIG. 13A shows a state in which the valve body unit 72 (valve body 81) is retracted sideways to a position below the opening 71a.
  • the cam follower 85 attached to the valve body unit 72 is moved to the curved surface 111a of the guide block 111 fixed to the housing 71.
  • valve body unit 72 rotates around the rotation shaft 84, and the valve body unit 72 (valve body 81) becomes vertically oriented. And finally, as shown in (e), the valve body unit 72 turns 90 degrees from the state of (a), and is in a state of facing the opening 71a. Note that when the gate valve 70 is opened, the operation is opposite to that shown in FIG.
  • the gate valve 70 has a small opening 71a corresponding to each substrate G. Since the number of the substrates G to be transferred at a time is provided and the valve bodies 81 for opening and closing these are provided for each opening 71a, when opening the valve body 81, the valve body 81 is below the corresponding opening 71a.
  • a large opening for carrying a plurality of conventional substrates in a lump is provided and the opening A space in the height direction for escaping the valve body as in the case of opening and closing the part with one valve body is substantially unnecessary. For this reason, the height of the housing 71 can be reduced. Further, the stroke of the valve body 81 does not change even if the number of stages of the substrates arranged in the vertical direction is changed.
  • valve body 81 when the valve body 81 is opened and closed, the valve body unit 72 (valve body 81) is moved up and down, and the valve body unit 72 (valve body 81) is rotated by the valve body rotating mechanism 75 at that time.
  • the valve body 81 In the "open state", the valve body 81 is retracted to the position below the opening 71a in a state of being sideways and with the seal surface down, so that it is possible to clean the seal surface of the valve body 81, which has been difficult in the prior art.
  • the valve body 81 is rotated 90 degrees laterally, so that the height of the valve body 81 can be reduced, and the opening 71a. Can be made smaller than the vertical width of the valve body 81.
  • valve body 81 valve body 81
  • the rotation operation of the valve body unit 72 is performed when the valve body unit 72 is moved up and down by the valve body unit lifting mechanism 73, and the rotation shaft 84 and the cam follower 85 constituting the valve body rotation mechanism 75.
  • the cooperation of the guide block 111 can be performed without using individual power, which is extremely simple.
  • the cam unit 101 of the valve body pressing mechanism 74 is moved up and down by the lift drive unit 102, and the cam unit 101
  • the valve body 81 is advanced by the cam 104 via the pressing roller 83 to press the valve body 81 around the opening 71 or return by the urging force of the compression spring 87 when the pressing force of the cam 104 is released. It can be performed with such a simple operation.
  • the present invention can be variously modified without being limited to the above embodiment.
  • a substrate processing system that transports and processes three substrates at once is shown.
  • the number of substrates is not limited as long as it is a plurality, but in the present invention, the number of substrates to be processed at once is determined. The larger the number, the greater the effect, which is suitable when there are three or more.
  • the valve body rotation mechanism the valve body is rotated by the cooperation of the rotation shaft, the cam follower, and the guide block by using the lifting and lowering of the valve body unit. It is not limited.
  • movement of the cam unit which has a cam corresponding to a valve body as a valve body press mechanism was used, it does not restrict to this.
  • Substrate processing system 10; Common transfer chamber, 30a, 30b, 30c; Processing chamber, 40; Load lock chamber, 50; Substrate transfer device, 70; Gate valve, 71; Housing, 71a; Body unit 73; valve body unit lifting mechanism 74; valve body pressing mechanism 75; valve body rotating mechanism 81; valve body 82; valve body holder 83; pressing roller 84; rotating shaft 85; Cam follower, 87; compression spring, 101; cam unit, 102; elevating drive unit, 104; cam, 111; guide block, 111a;

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Abstract

A gate valve (70) is provided with a housing (71) having a vertical wall in which a plurality of openings (71a) are formed so as to correspond to substrates that are to be conveyed and are arranged in multiple stages, valve bodies (81) provided in the housing (71) and used for opening/closing the openings (71a), a valve-lifting/lowering mechanism (73) for lifting or lowering the valve bodies (81), a valve-rotating mechanism (75) for rotating the valve bodies (81) in concert with the lifting or lowering of the valve-lifting mechanism (73), and a valve-pressing mechanism (74) for pressing the seal surface of the valve bodies (81) to the openings. The valve-lifting/lowering mechanism (73) lifts or lowers the valve bodies (81) between a position corresponding to an opening and a retracted position, the valve-rotating mechanism rotates the valve bodies (81) when the valve bodies (81) have been lifted or lowered by the valve-lifting/lowering mechanism (73), and the valve-pressing mechanism (74) presses the valve bodies (81) in position corresponding to the openings.

Description

ゲートバルブおよび基板処理システムGate valve and substrate processing system
　本発明は、真空容器の開閉に用いられるゲートバルブおよびそれを用いた基板処理システムに関する。 The present invention relates to a gate valve used for opening and closing a vacuum vessel and a substrate processing system using the gate valve.
　液晶ディスプレイ（ＬＣＤ）に代表されるフラットパネルディスプレイ（ＦＰＤ）や太陽電池などの製造過程においては、大型のガラス基板に対し、エッチングや成膜等の所定の処理を施す複数の処理室を備えたマルチハウジングタイプの処理システムが知られている（例えば、特許文献１）。 In the manufacturing process of flat panel displays (FPD) typified by liquid crystal displays (LCD) and solar cells, a large glass substrate is provided with a plurality of processing chambers for performing predetermined processing such as etching and film formation. A multi-housing type processing system is known (for example, Patent Document 1).
　また、このようなマルチハウジングタイプの処理システムにおいて、一度に複数枚の基板を処理するバッチ式の処理システムも知られている（例えば特許文献２）。 Also, in such a multi-housing type processing system, a batch type processing system for processing a plurality of substrates at a time is also known (for example, Patent Document 2).
　このようなマルチハウジングタイプの基板処理システムは、基板（被処理体）を搬送する搬送装置が設けられた共通搬送室を有し、この共通搬送室の周囲に、処理室や、共通搬送室と大気圧雰囲気との間で未処理の基板と処理済の基板とを交換するロードロック室等を備えている。これら共通搬送室、処理室、およびロードロック室は、排気機構を用いて排気することで内部が真空状態とされ、真空容器として機能する。特許文献２に記載されたようなバッチ式の処理システムでは、複数の基板を上下方向に多段に配置した状態で基板の搬送および基板の処理が行われる。 Such a multi-housing type substrate processing system has a common transfer chamber provided with a transfer device for transferring a substrate (object to be processed), and a processing chamber and a common transfer chamber are provided around the common transfer chamber. A load lock chamber or the like for exchanging an unprocessed substrate and a processed substrate with an atmospheric pressure atmosphere is provided. The common transfer chamber, the processing chamber, and the load lock chamber are evacuated using an exhaust mechanism to be evacuated to function as a vacuum container. In a batch-type processing system as described in Patent Document 2, substrate transport and substrate processing are performed in a state where a plurality of substrates are arranged in multiple stages in the vertical direction.
　これら処理室やロードロック室等の真空容器には、被処理体を出し入れするための開口部が設けられており、開口部はゲートバルブを用いて開閉される。開口部をゲートバルブにより閉じることにより、処理室やロードロック室の内部は気密にシールされる。ゲートバルブが閉じた状態で、処理室では、その内部の圧力を所定の圧力まで減圧して所定の処理が行われ、ロードロック室では、大気状態と減圧状態との相互間で変換することが可能となっている。 These vacuum chambers such as processing chambers and load lock chambers are provided with openings for taking in and out the objects to be processed, and the openings are opened and closed using gate valves. By closing the opening with the gate valve, the inside of the processing chamber or the load lock chamber is hermetically sealed. With the gate valve closed, the processing chamber reduces the internal pressure to a predetermined pressure to perform a predetermined processing, and the load lock chamber can convert between the atmospheric state and the reduced pressure state. It is possible.
　ゲートバルブは、上記特許文献１に記載されているように、開閉部を閉じる弁体を有し、弁体は油圧シリンダによって昇降され、弁体が開口部に位置した状態で、リンク機構を利用して弁体を開口部に押しつけることにより、開口部が閉じられるようになっている。 As described in Patent Document 1, the gate valve has a valve body that closes the opening and closing portion, and the valve body is lifted and lowered by a hydraulic cylinder, and the link mechanism is used while the valve body is positioned at the opening. Then, the opening is closed by pressing the valve body against the opening.
特開平５－１９６１５０号公報JP-A-5-196150 特開２０１１－３５１０３号公報JP 2011-35103 A
　ところで、特許文献２に示すようなバッチ式の処理システムでは、複数の基板が上下方向に多段に配置した状態で基板を搬送するため、処理室やロードロック室の開口部の高さを大きくする必要がある。このような場合に、上記構造のゲートバルブを用いると、ゲートバルブを開放する際に、弁体を開口部の上方または下方に逃がす必要があり、高さ方向に大きなスペースが必要となる。このため、基板の上下方向の段数を増加させたり、処理室内での基板配置ピッチを増加させたりする要求に対し、実現が困難になる場合も生じる。また、このように弁体を昇降動作する場合には、弁体は常に処理室等の壁部に面した状態となっているため、弁体シール面のクリーニングが困難である。 By the way, in a batch type processing system as shown in Patent Document 2, a plurality of substrates are transported in a state where they are arranged in multiple stages in the vertical direction, so the height of the opening of the processing chamber or the load lock chamber is increased. There is a need. In such a case, when the gate valve having the above structure is used, when opening the gate valve, it is necessary to release the valve body above or below the opening, and a large space is required in the height direction. For this reason, it may be difficult to realize the demand for increasing the number of steps in the vertical direction of the substrate or increasing the substrate arrangement pitch in the processing chamber. Further, when the valve body is moved up and down in this way, the valve body is always in a state of facing the wall portion of the processing chamber or the like, so that it is difficult to clean the valve body seal surface.
　したがって、本発明の目的は、複数の基板が上下方向に多段に配置された状態で基板の搬送や基板の処理を行うバッチ式の処理システムの場合に、高さ方向のスペースの増加がほとんど必要がなく、また、弁体のクリーニングも可能なゲートバルブ、およびそのようなゲートバルブを用いた基板処理システムを提供することにある。 Therefore, the object of the present invention is that an increase in the space in the height direction is almost necessary in the case of a batch type processing system in which a plurality of substrates are arranged in multiple stages in the vertical direction to carry the substrates and process the substrates. In addition, an object of the present invention is to provide a gate valve capable of cleaning the valve body and a substrate processing system using such a gate valve.
　本発明の第１の観点によれば、上下方向に多段に配置された複数の基板を真空容器間で搬送する際に、真空容器の開閉に用いられるゲートバルブであって、搬送されるべき前記多段に配置された基板に対応するように複数の開口部が形成された垂直壁を有するハウジングと、前記ハウジング内に設けられ、前記開口部を開閉するための弁体と、前記弁体を昇降させる弁体昇降機構と、前記弁体昇降機構の昇降にともなって弁体を回動させる弁体回動機構と、前記弁体のシール面を前記開口部に押しつける弁体押圧機構とを具備し、前記弁体昇降機構は、前記弁体を、前記開口部に対応する開口部対応位置と前記開口部に隣接した退避位置との間で昇降させ、前記弁体回動機構は、前記弁体昇降機構により前記弁体を昇降させている際に前記弁体を回動させて、前記開口部対応位置において縦向きの前記弁体を前記退避位置において横向きになるようにし、前記弁体押圧機構は、前記開口部対応位置にある前記弁体を前記開口部に向けて進出させて前記弁体を押圧し、前記弁体のシール面を前記開口部の周囲に押しつける、ゲートバルブを提供する。 According to a first aspect of the present invention, there is provided a gate valve used for opening and closing a vacuum container when transporting a plurality of substrates arranged in multiple stages in the vertical direction between the vacuum containers, wherein the gate valve is to be transported. A housing having a vertical wall in which a plurality of openings are formed so as to correspond to substrates arranged in multiple stages, a valve body provided in the housing for opening and closing the openings, and raising and lowering the valve body A valve body raising / lowering mechanism, a valve body turning mechanism for turning the valve body as the valve body raising / lowering mechanism moves up and down, and a valve body pressing mechanism for pressing the seal surface of the valve body against the opening. The valve body elevating mechanism elevates and lowers the valve body between an opening corresponding position corresponding to the opening and a retracted position adjacent to the opening. When the valve body is moved up and down by the lifting mechanism The valve body is rotated so that the vertically oriented valve body in the opening corresponding position becomes lateral in the retracted position, and the valve body pressing mechanism opens the valve body in the opening corresponding position to the opening. A gate valve is provided in which the valve body is advanced toward the portion to press the valve body, and the sealing surface of the valve body is pressed around the opening.
　上記第１の観点のゲートバルブにおいて、前記弁体の両端に設けられ、弁体を進退可能に保持する弁体ホルダーをさらに具備し、前記弁体と前記弁体ホルダーにより弁体ユニットを構成し、前記弁体昇降機構は前記弁体ユニットを昇降させるように構成することができる。 The gate valve according to the first aspect further includes valve body holders that are provided at both ends of the valve body and hold the valve body so as to be able to advance and retreat, and a valve body unit is configured by the valve body and the valve body holder. The valve body elevating mechanism can be configured to elevate and lower the valve body unit.
　前記弁体回動機構は、前記弁体ホルダーの端面に設けられた回動軸およびカムフォロワと、前記弁体ホルダーに隣接し、前記ハウジングに固定され、前記カムフォロワをガイドする曲面が形成されたガイドブロックとを有し、前記弁体昇降機構により前記弁体ユニットが昇降した際に、前記カムフォロワが前記ガイドブロックの曲面にガイドされて移動し、それにともなって前記弁体を含む前記弁体ユニットが前記回動軸まわりを回動するようにすることができる。この場合に、前記退避位置は、前記開口部の下方位置であり、前記弁体回動機構は、前記弁体ユニットを前記開口部対応位置から下降させた際に、前記退避位置において、前記シール面が下向きになるように前記弁体ユニットを回動させるようにすることができる。 The valve body rotation mechanism includes a rotation shaft and a cam follower provided on an end surface of the valve body holder, a guide that is adjacent to the valve body holder, is fixed to the housing, and has a curved surface that guides the cam follower. When the valve body unit is moved up and down by the valve body lifting mechanism, the cam follower is guided and moved by the curved surface of the guide block, and the valve body unit including the valve body is moved accordingly. It is possible to rotate around the rotation axis. In this case, the retracted position is a position below the opening, and the valve body rotation mechanism is configured to move the seal at the retracted position when the valve body unit is lowered from the opening corresponding position. The valve body unit can be rotated so that the surface faces downward.
　また、前記弁体押圧機構は、前記弁体ユニットのうち、前記弁体のみを押圧して前記開口部に向けて進出させる構成とすることができる。この場合に、前記弁体押圧機構は、前記複数の弁体に対応する位置にカムを有するカムユニットと、前記カムユニットを昇降させる昇降駆動部とを有し、前記カムユニットを昇降させることにより、前記カムが前記弁体を押圧する押圧位置と押圧を解除する押圧解除位置とをとり、前記カムを前記押圧位置に位置させることにより前記弁体を押圧する構成とすることができる。また、前記弁体押圧機構の押圧力が解除された際に、前記弁体を元の位置に戻す付勢力を付与する付勢力付与機構をさらに具備する構成とすることができる。 Further, the valve body pressing mechanism can be configured to press only the valve body in the valve body unit and advance toward the opening. In this case, the valve body pressing mechanism includes a cam unit having a cam at a position corresponding to the plurality of valve bodies, and an elevating drive unit for elevating and lowering the cam unit, and elevating and lowering the cam unit. The cam can be configured to press the valve body by taking a pressing position for pressing the valve body and a pressing release position for releasing the pressing, and positioning the cam at the pressing position. Moreover, it can be set as the structure further equipped with the urging | biasing force provision mechanism which provides the urging | biasing force which returns the said valve body to an original position, when the pressing force of the said valve body pressing mechanism is cancelled | released.
　本発明の第２の観点によれば、真空に保持される共通搬送室と、前記共通搬送室に接続された、真空下で所定の処理を行う処理室と、前記共通搬送室に接続され、大気状態と真空状態との間で切り替え可能に設けられ、処理前および処理済みの基板を交換するロードロック室と、前記共通搬送室に設けられ、前記処理室および前記ロードロック室との間で複数の基板を上下方向に多段に配置した状態で複数の基板を一括して搬送する基板搬送装置と、前記共通搬送室と前記処理室との間、および前記共通搬送室と前記ロードロック室との間に設けられたゲートバルブとを具備し、前記ゲートバルブの少なくとも一つとして、上記第１の観点のゲートバルブを用いた基板処理システムを提供する。 According to a second aspect of the present invention, a common transfer chamber held in a vacuum, a processing chamber connected to the common transfer chamber for performing a predetermined process under vacuum, connected to the common transfer chamber, A load lock chamber that is provided so as to be switchable between an atmospheric state and a vacuum state and that replaces a substrate that has not been processed and has been processed, and is provided in the common transfer chamber, between the processing chamber and the load lock chamber. A substrate transfer apparatus that collectively transfers a plurality of substrates in a state where a plurality of substrates are arranged in multiple stages in the vertical direction; and between the common transfer chamber and the processing chamber; and the common transfer chamber and the load lock chamber; A substrate processing system using the gate valve according to the first aspect as at least one of the gate valves.
　このように、各基板に対応した小さい開口部を一括して搬送する基板の数だけ設け、これらを開閉する弁体を開口部毎に設けたので、弁体を開放する際には、弁体を開口部と開口部との間に退避させればよく、従来の複数の基板を一括して搬送する大きな開口部を設けてその開口部を一つの弁体で開閉する場合のような弁体を逃がす高さ方向のスペースが実質的に不要となる。このため、ハウジングの高さを小さくすることができる。また、弁体を開閉動作させる際に、弁体を昇降させ、その際に弁体回動機構により弁体を回動させて、弁体を退避させる際には弁体は横向きでシール面がハウジングの壁部に面していないので、従来は困難であった弁体シール面の洗浄が可能となる。 As described above, the small openings corresponding to the respective substrates are provided in the same number as the number of the substrates to be transferred at once, and the valve bodies for opening and closing these are provided for each opening. Therefore, when opening the valve bodies, The valve body as in the case of providing a large opening for collectively transporting a plurality of conventional substrates and opening and closing the opening with a single valve body The space in the height direction for escaping is substantially unnecessary. For this reason, the height of the housing can be reduced. When opening and closing the valve body, the valve body is moved up and down, and the valve body is rotated by the valve body rotation mechanism at that time. Since it does not face the wall portion of the housing, it is possible to clean the valve body seal surface, which has been difficult in the past.
　また、弁体を退避させる際に、弁体を横向きになるように回動させるので、弁体の高さを小さくすることができ、開口部のピッチを弁体の縦幅よりも小さくすることができる。 Moreover, when the valve body is retracted, the valve body is rotated so as to be turned sideways, so that the height of the valve body can be reduced, and the pitch of the openings should be made smaller than the vertical width of the valve body. Can do.
本発明の一実施形態に係るゲートバルブが用いられた基板処理システムを概略的に示す平面図である。1 is a plan view schematically showing a substrate processing system in which a gate valve according to an embodiment of the present invention is used. 図１の基板処理システムの共通搬送室に設けられた基板搬送装置を示す側面図である。It is a side view which shows the substrate conveying apparatus provided in the common conveyance chamber of the substrate processing system of FIG. 本発明の一実施形態に係るゲートバルブを側面から見た縦断面図である。It is the longitudinal cross-sectional view which looked at the gate valve which concerns on one Embodiment of this invention from the side surface. 本発明の一実施形態に係るゲートバルブを正面から見た縦断面図である。It is the longitudinal cross-sectional view which looked at the gate valve which concerns on one Embodiment of this invention from the front. 本発明の一実施形態に係るゲートバルブの水平断面図である。It is a horizontal sectional view of the gate valve concerning one embodiment of the present invention. 本発明の一実施形態に係るゲートバルブの弁体ユニットを示す斜視図である。It is a perspective view which shows the valve body unit of the gate valve which concerns on one Embodiment of this invention. 本発明の一実施形態に係るゲートバルブにおける弁体押圧機構による押圧力を解除した状態を示す側面から見た縦断面図である。It is the longitudinal cross-sectional view seen from the side surface which shows the state which cancelled | released the pressing force by the valve body pressing mechanism in the gate valve which concerns on one Embodiment of this invention. 弁体回動機構を示す斜視図である。It is a perspective view which shows a valve body rotation mechanism. 弁体ユニットの重心位置を説明するための図である。It is a figure for demonstrating the gravity center position of a valve body unit. 本発明の一実施形態に係るゲートバルブにおける弁体を退避した状態を示す側面から見た縦断面図である。It is the longitudinal cross-sectional view seen from the side surface which shows the state which retracted the valve body in the gate valve which concerns on one Embodiment of this invention. 本発明の一実施形態に係るゲートバルブを開状態にする動作を概略的に示す図である。It is a figure which shows roughly the operation | movement which opens the gate valve which concerns on one Embodiment of this invention. 本発明の一実施形態に係るゲートバルブを閉状態にする動作を概略的に示す図である。It is a figure which shows roughly the operation | movement which makes the gate valve which concerns on one Embodiment of this invention a closed state. 弁体回動機構の具体的な動作を説明するための図である。It is a figure for demonstrating the specific operation | movement of a valve body rotation mechanism.
　以下、添付図面を参照して本発明の実施形態について説明する。参照する図面全てにわたり、同一の部分については同一の参照符号を付す。
　図１は、本発明の一実施形態に係るゲートバルブが用いられた基板処理システムを概略的に示す平面図である。この基板処理システム１は、例えば、液晶ディスプレイ（ＬＣＤ）のようなＦＰＤ用ガラス基板あるいは太陽電池用ガラス基板として用いられる矩形基板に対し例えばエッチングや成膜のような真空処理を行う装置として構成されている。 Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. Throughout the drawings to be referred to, the same parts are denoted by the same reference numerals.
FIG. 1 is a plan view schematically showing a substrate processing system using a gate valve according to an embodiment of the present invention. The substrate processing system 1 is configured as a device that performs vacuum processing such as etching or film formation on a rectangular substrate used as an FPD glass substrate such as a liquid crystal display (LCD) or a solar cell glass substrate. ing.
　図１に示すように、基板処理システム１は、真空に保持された共通搬送室１０と、この共通搬送室１０に接続された、真空中で基板Ｇにエッチングや成膜等の処理を施す３つの処理室３０ａ，３０ｂ，３０ｃと、大気側に配置された基板収容容器（図示せず）と真空に保持された共通搬送室１０との間で基板Ｇを交換するロードロック室４０と、共通搬送室１０内に設けられた、基板Ｇを搬送する基板搬送装置５０とを備えている。共通搬送室１０は平面形状が矩形状をなす真空容器であり、処理室３０ａ，３０ｂ，３０ｃ、ロードロック室４０は、共通搬送室１０の各側面に接続されている。 As shown in FIG. 1, the substrate processing system 1 includes a common transfer chamber 10 held in a vacuum, and performs processing such as etching and film formation on the substrate G connected to the common transfer chamber 10 in vacuum 3 Common to the two processing chambers 30a, 30b, 30c, a load-lock chamber 40 for exchanging the substrate G between the substrate container (not shown) arranged on the atmosphere side and the common transfer chamber 10 held in vacuum. And a substrate transfer device 50 that transfers the substrate G provided in the transfer chamber 10. The common transfer chamber 10 is a vacuum container having a rectangular planar shape, and the processing chambers 30 a, 30 b, 30 c and the load lock chamber 40 are connected to each side surface of the common transfer chamber 10.
　基板搬送装置５０は、共通搬送室１０の内部に設けられている。また、処理室３０ａ，３０ｂ，３０ｂには、それぞれ内部に基板Ｇを支持する機構（図示せず）を有し、所定の減圧雰囲気に保持されるようになっている。また、ロードロック室４０は、大気側に配置された基板収容容器（図示せず）と、真空に保持された共通搬送室１０との間で基板Ｇを交換するためのものであり、大気雰囲気と減圧雰囲気との間で切り替え可能な真空予備室として機能する。すなわち、共通搬送室１０、処理室３０ａ，３０ｂ，３０ｃ、ロードロック室４０は、真空容器として構成されている。 The substrate transfer device 50 is provided inside the common transfer chamber 10. Further, each of the processing chambers 30a, 30b, 30b has a mechanism (not shown) for supporting the substrate G therein, and is maintained in a predetermined reduced pressure atmosphere. The load lock chamber 40 is for exchanging the substrate G between a substrate storage container (not shown) arranged on the atmosphere side and the common transfer chamber 10 held in a vacuum, and has an atmospheric atmosphere. Functions as a vacuum preparatory chamber that can be switched between a vacuum atmosphere and a reduced pressure atmosphere. That is, the common transfer chamber 10, the processing chambers 30a, 30b, and 30c, and the load lock chamber 40 are configured as vacuum containers.
　共通搬送室１０には、処理室３０ａ，３０ｂ，３０ｃ、ロードロック室４０に対応する位置に開口部６０が形成されており、処理室３０ａ，３０ｂ，３０ｃ、ロードロック室４０の開口部６０に対応する位置には、開口部６１ａ、６１ｂ、６１ｃ，６２ａが設けられている。そして、これら開口部６０，６１ａ、６１ｂ、６１ｃ，６２ａを介して基板Ｇの搬送が行われる。 In the common transfer chamber 10, an opening 60 is formed at a position corresponding to the processing chambers 30 a, 30 b, 30 c and the load lock chamber 40, and the processing chambers 30 a, 30 b, 30 c and the opening 60 of the load lock chamber 40 are formed. Openings 61a, 61b, 61c, and 62a are provided at corresponding positions. Then, the substrate G is transported through these openings 60, 61a, 61b, 61c, and 62a.
　共通搬送室１０と、これらに接続されている処理室３０ａ，３０ｂ，３０ｃ、およびロードロック室４０との間には、それぞれゲートバルブ７０が設けられている。 A gate valve 70 is provided between the common transfer chamber 10 and the processing chambers 30a, 30b, 30c and the load lock chamber 40 connected thereto.
　ロードロック室４０の大気側には、基板処理システム１の外部に開放される開口部６２ｂが形成されており、この開口部６２ｂは、処理前の基板Ｇのロード、処理済の基板Ｇのアンロードに使用され、大気状態下に開放されたゲート６３により開閉される。 An opening 62b that is opened to the outside of the substrate processing system 1 is formed on the atmosphere side of the load lock chamber 40. This opening 62b is used for loading the substrate G before processing and unloading the processed substrate G. It is opened and closed by a gate 63 that is used for loading and opened to atmospheric conditions.
　この基板処理システム１は、一度に複数枚、例えば３枚以上の基板Ｇを高さ方向に水平に配置して処理するように構成されており、基板搬送装置５０は、図２に示すように、垂直方向に配列された３つの基板支持アーム５１ａ，５１ｂ，５１ｃが旋回可能なベース部材５２上を直線走行可能に構成されている。そして、基板支持アーム５１ａ，５１ｂ，５１ｃの進出退避動作およびベース部材５２の旋回動作により、基板支持アーム５１ａ，５１ｂ，５１ｃが処理室３０ａ，３０ｂ，３０ｃ、およびロードロック室４０にアクセス可能となっている。なお、符号５３は、ベース部材５２の旋回動作を実現するための駆動系である。 The substrate processing system 1 is configured to process a plurality of substrates G, for example, three or more substrates G at a time in a horizontal direction in the height direction, and the substrate transport apparatus 50 is configured as shown in FIG. The three substrate support arms 51a, 51b, and 51c arranged in the vertical direction are configured to be able to travel linearly on a base member 52 that can turn. The substrate support arms 51a, 51b, and 51c can access the processing chambers 30a, 30b, and 30c and the load lock chamber 40 by the advancement / retraction operation of the substrate support arms 51a, 51b, and 51c and the turning operation of the base member 52. ing. Reference numeral 53 denotes a drive system for realizing the turning operation of the base member 52.
　処理に際しては、外部の基板収容容器から図示しない大気側搬送装置によりゲート６３を介してロードロック室４０に複数枚の基板Ｇが搬入される。搬入された複数枚の基板Ｇは、基板搬送装置５０により、ロードロック室４０からゲートバルブ７０を介して共通搬送室１０へ搬入され、この共通搬送室１０からゲートバルブ７０を介して処理室３０ａ，３０ｂ，３０ｃのいずれかへ搬送される。そして、処理室３０ａ，３０ｂ，３０ｃにおいて処理が終了した基板Ｇは、処理室３０ａ，３０ｂ，３０ｃからゲートバルブ７０を介してロードロック室４０へ搬送される。処理後の基板Ｇが搬送されたロードロック室４０は、その中の圧力が大気圧に戻された後にゲート６３を介して搬出される。 At the time of processing, a plurality of substrates G are carried into the load lock chamber 40 via the gate 63 from an external substrate container by an atmospheric transfer device (not shown). The plurality of loaded substrates G are loaded into the common transfer chamber 10 from the load lock chamber 40 via the gate valve 70 by the substrate transfer apparatus 50, and the processing chamber 30 a is transferred from the common transfer chamber 10 via the gate valve 70. , 30b, 30c. Then, the substrate G processed in the processing chambers 30a, 30b, and 30c is transferred from the processing chambers 30a, 30b, and 30c to the load lock chamber 40 through the gate valve 70. The load lock chamber 40 to which the processed substrate G has been transferred is carried out through the gate 63 after the pressure therein is returned to atmospheric pressure.
　次にゲートバルブ７０について詳細に説明する。
　ここでは、共通搬送室１０と処理室３０ａとの間ゲートバルブ７０を例にとって説明する。 Next, the gate valve 70 will be described in detail.
Here, the gate valve 70 between the common transfer chamber 10 and the processing chamber 30a will be described as an example.
　図３はゲートバルブ７０を側面から見た縦断面図、図４は正面から見た縦断面図、図５は水平断面図であり、図６は弁体ユニットを示す斜視図である。 3 is a longitudinal sectional view of the gate valve 70 as seen from the side, FIG. 4 is a longitudinal sectional view as seen from the front, FIG. 5 is a horizontal sectional view, and FIG. 6 is a perspective view showing the valve body unit.
　ゲートバルブ７０は、共通搬送室１０と例えば処理室３０ａとの間に設けられたハウジング７１を有している。ハウジング７１の処理室３０ａ側の垂直壁部７１ｃには搬送する基板Ｇが通る複数（本実施形態では３つ）の開口部７１ａが形成されている。開口部７１ａのピッチは、基板搬送装置５０の基板支持アーム５１ａ，５１ｂ，５１ｃのピッチと一致している。一方、共通搬送室１０側の垂直壁部７１ｄには１つの大きな開口部７１ｂが形成されている。 The gate valve 70 has a housing 71 provided between the common transfer chamber 10 and, for example, the processing chamber 30a. A plurality of (three in the present embodiment) openings 71 a through which the substrate G to be transferred passes are formed in the vertical wall 71 c on the processing chamber 30 a side of the housing 71. The pitch of the openings 71a coincides with the pitch of the substrate support arms 51a, 51b, 51c of the substrate transport apparatus 50. On the other hand, one large opening 71b is formed in the vertical wall 71d on the common transfer chamber 10 side.
　ゲートバルブ７０は、また、ハウジング７１内に、３つの開口部７１ａをそれぞれ開閉するための弁体８１を有する弁体ユニット７２と、弁体ユニット７２を昇降させる弁体ユニット昇降機構７３と、弁体８１を開口部７１ａの周囲に対して押圧するための弁体押圧機構７４と、弁体ユニット７２の昇降にともなって弁体ユニット７２を回動させて、弁体８１を開口部７１ａに対応する位置と開口部７１ａから退避した位置との間で移動させる弁体回動機構７５とを有する。 The gate valve 70 also has a valve body unit 72 having a valve body 81 for opening and closing the three openings 71a in the housing 71, a valve body unit lifting mechanism 73 for lifting and lowering the valve body unit 72, a valve Corresponding to the opening 71a, the valve body pressing mechanism 74 for pressing the body 81 against the periphery of the opening 71a and the valve body unit 72 are rotated as the valve body unit 72 is moved up and down. And a valve body rotating mechanism 75 that moves between a position where the valve is retracted and a position retracted from the opening 71a.
　弁体ユニット７２は、弁体８１と、その両側に設けられた、弁体８１を進退可能に保持する弁体ホルダー８２とを有する。弁体ホルダー８２はＬ字状をなし、弁体８１の端面側の端面部８２ａと、弁体８１の背面側の背面部８２ｂとを有している。弁体８１の背面の両端側には弁体８１を開口部７１ａの周囲に押しつけるための押圧ローラ８３が設けられている。また弁体ホルダー８２の端面部８２ａの外側面には、弁体回動機構７５の一部をなす、回動軸８４とカムフォロワ８５とが取り付けられている。また、弁体８１の端部には、弁体ホルダー８２の背面部８２ｂに挿通する進退軸８６が設けられており、進退軸８６の背面部８２ｂ外側に対応する部分には付勢力付与機構としての圧縮バネ８７が設けられている。この圧縮バネ８７の付勢力により、弁体８１が弁体押圧機構７４で押圧されていないときに、弁体８１が後方に戻されるようになっている。なお、図３～５は、弁体８１のシール面が開口部７１ａの周囲に押しつけられた閉状態を示している。この際には、シールリング（図示せず）により弁体８１と開口部７１ａ周囲部分との間がシールされている。 The valve body unit 72 includes a valve body 81 and a valve body holder 82 provided on both sides thereof for holding the valve body 81 so as to be able to advance and retreat. The valve body holder 82 is L-shaped and has an end surface portion 82 a on the end surface side of the valve body 81 and a back surface portion 82 b on the back surface side of the valve body 81. A pressure roller 83 for pressing the valve body 81 around the opening 71a is provided on both ends of the back surface of the valve body 81. Further, a rotating shaft 84 and a cam follower 85 that are part of the valve body rotating mechanism 75 are attached to the outer surface of the end surface portion 82 a of the valve body holder 82. Further, an advancing / retracting shaft 86 that is inserted into the back surface portion 82b of the valve body holder 82 is provided at the end of the valve body 81, and a portion corresponding to the outside of the back surface portion 82b of the advancing / retreating shaft 86 is provided as a biasing force applying mechanism. The compression spring 87 is provided. Due to the urging force of the compression spring 87, the valve body 81 is returned backward when the valve body 81 is not pressed by the valve body pressing mechanism 74. 3 to 5 show a closed state in which the seal surface of the valve body 81 is pressed around the opening 71a. At this time, the space between the valve body 81 and the peripheral portion of the opening 71a is sealed by a seal ring (not shown).
　弁体ユニット昇降機構７３は、図４に示すように、弁体ユニット７２の両側に延びる支持柱９１と、支持柱９１を昇降させる昇降駆動部９２とを有する。昇降する支持柱９１は、図５に示すように、ＬＭガイド９３によりガイドされる。弁体ユニット７２と支持柱９１とは回動軸８４により回転可能に連結されており、支持柱９１が昇降することにより、弁体８１が、開口部７１ａに対応する開口部対応位置と開口部７１ａの下方の退避位置との間で昇降するように、弁体ユニット７２が昇降される。 As shown in FIG. 4, the valve body unit elevating mechanism 73 includes support pillars 91 extending on both sides of the valve body unit 72 and an elevating drive unit 92 that elevates and lowers the support pillars 91. The support column 91 that moves up and down is guided by an LM guide 93 as shown in FIG. The valve body unit 72 and the support column 91 are rotatably connected by a rotation shaft 84, and when the support column 91 moves up and down, the valve body 81 has an opening corresponding position and an opening corresponding to the opening 71a. The valve body unit 72 is moved up and down so as to move up and down between the retracted position below the 71a.
　弁体押圧機構７４は、弁体ユニット７２の背面側の両端部に設けられた一対のカムユニット１０１と、カムユニット１０１を昇降させる昇降駆動部１０２とを有する。昇降するカムユニット１０１はＬＭガイド１０３によりガイドされる。カムユニット１０１は、各弁体ユニット７２の押圧ローラ８３に対応する位置に設けられたカム１０４と、カム１０４を支持する支持棒１０５とを有する。すなわち、カムユニット１０１は、支持棒１０５に上下に３つのカム１０４が取り付けられている。図３に示すように、カム１０４は、上部が厚く形成され、下部に進むにつれて徐々に薄くなる傾斜部が形成されている。図３の位置では、カム１０４は、その上部の厚い部分が押圧ローラ８３（弁体８１）に対応する押圧位置をとっており、カム１０４により押圧ローラ８３を介して弁体８１が前進してそのシール面が開口部７１ａの周囲に押圧され、開口部７１ａは閉じられた状態である。この状態からカムユニット１０１を上昇させることにより、カム１０４は、最も薄い下端部が押圧ローラ８３（弁体８１）に対応する押圧解除位置となり、圧縮バネ８７の付勢力により、押圧ローラ８３はカム１０４の傾斜部を通って最も薄い下端部に達する。これにより、図７に示すように、弁体押圧機構７４による押圧力は解除され、弁体８１が垂直壁部７１ｃから離隔した位置に達する。逆に、図７の状態からカムユニット１０１を下降させることにより、カム１０４および押圧ローラ８３を介して弁体８１が開口部７１ａの周囲に押圧される。 The valve body pressing mechanism 74 includes a pair of cam units 101 provided at both end portions on the back side of the valve body unit 72 and a lift drive unit 102 that moves the cam unit 101 up and down. The cam unit 101 that moves up and down is guided by the LM guide 103. The cam unit 101 includes a cam 104 provided at a position corresponding to the pressing roller 83 of each valve body unit 72 and a support bar 105 that supports the cam 104. In other words, the cam unit 101 has three cams 104 attached to the support bar 105 in the vertical direction. As shown in FIG. 3, the cam 104 is formed with a thick upper portion, and an inclined portion is formed which gradually becomes thinner toward the lower portion. In the position shown in FIG. 3, the cam 104 has a thick position at the upper portion corresponding to the pressing roller 83 (valve element 81), and the valve element 81 is advanced by the cam 104 via the pressing roller 83. The sealing surface is pressed around the opening 71a, and the opening 71a is closed. By raising the cam unit 101 from this state, the thinnest lower end portion of the cam 104 becomes a pressing release position corresponding to the pressing roller 83 (valve element 81), and the pressing roller 83 is camped by the urging force of the compression spring 87. The thinnest lower end is reached through 104 slopes. Thereby, as shown in FIG. 7, the pressing force by the valve body pressing mechanism 74 is released, and the valve body 81 reaches a position separated from the vertical wall portion 71c. Conversely, by lowering the cam unit 101 from the state shown in FIG. 7, the valve body 81 is pressed around the opening 71 a via the cam 104 and the pressing roller 83.
　弁体回動機構７５は、図８に示すように、上述した回動軸８４およびカムフォロワ８５と、弁体ホルダー８２の端面部８２ａに隣接し、ハウジング７１に固定されたガイドブロック１１１とを有する。ガイドブロック１１１は、その上面が曲面１１１ａとなっており、この曲面１１１ａにカムフォロワ８５が接触するようにカムフォロワ８５をガイドする。そして、弁体ユニット７２を昇降させた際に、カムフォロワ８５が曲面１１１ａに接触した状態を保ったまま曲面１１１ａ上を移動する。これにより、弁体ユニット７２（弁体８１）は回動軸８４の回りに回動する。この場合に、図９に示すように、弁体ユニット７２の重心位置を、回動軸８４よりも背面側となるようにしている。これにより、カムフォロワ８５を常にガイドブロック１１１の曲面１１１ａに接する状態とすることができる。 As shown in FIG. 8, the valve body rotation mechanism 75 includes the rotation shaft 84 and the cam follower 85 described above, and a guide block 111 that is adjacent to the end surface portion 82 a of the valve body holder 82 and is fixed to the housing 71. . The guide block 111 has a curved surface 111a on the upper surface, and guides the cam follower 85 so that the cam follower 85 contacts the curved surface 111a. Then, when the valve body unit 72 is moved up and down, the cam follower 85 moves on the curved surface 111a while keeping the state in contact with the curved surface 111a. Thereby, the valve body unit 72 (valve body 81) rotates around the rotation shaft 84. In this case, as shown in FIG. 9, the position of the center of gravity of the valve body unit 72 is located on the back side with respect to the rotation shaft 84. As a result, the cam follower 85 can always be in contact with the curved surface 111 a of the guide block 111.
　したがって、弁体ユニット７２を図７の状態から下降させることにより、弁体ユニット７２（弁体８１）が９０度回動して、図１０に示すように、弁体８１がシール面を下に向けて、対応する開口部７１ａの下方に退避した状態となり、開口部７１ａが開放される。逆に、図１０の開放状態から弁体ユニット７２を上昇させることにより、図７の弁体８１が開口部７１ａに対応した状態となる。 Accordingly, by lowering the valve body unit 72 from the state shown in FIG. 7, the valve body unit 72 (valve body 81) rotates 90 degrees, and as shown in FIG. Then, the state is retracted below the corresponding opening 71a, and the opening 71a is opened. Conversely, by raising the valve body unit 72 from the open state of FIG. 10, the valve body 81 of FIG. 7 is in a state corresponding to the opening 71a.
　次に、このように構成される基板処理システムの処理動作についてゲートバルブ７０の動作を中心に説明する。
　まず、ゲート６３を開けて大気側基板搬送装置（図示せず）により複数枚（本実施例では３枚）の未処理の基板Ｇを大気雰囲気のロードロック室４０に搬入し、ゲート６３を閉じてロードロック室４０内を減圧雰囲気とする。そして、ロードロック室４０と共通搬送室１０との間のゲートバルブ７０を開け、基板搬送装置５０の３つの基板支持アーム５１ａ，５１ｂ，５１ｃをロードロック室４０内に進出させ、ロードロック室４０内に搬入された未処理の基板Ｇを一括して受け取る。次いで、基板搬送装置５０の基板支持アーム５１ａ，５１ｂ，５１ｃを共通搬送室１０に退避させ、ロードロック室４０と共通搬送室１０との間のゲートバルブ７０を閉じる。 Next, the processing operation of the substrate processing system configured as described above will be described focusing on the operation of the gate valve 70.
First, the gate 63 is opened, and a plurality of (three in this embodiment) unprocessed substrates G are carried into the load lock chamber 40 in the atmospheric atmosphere by an atmosphere side substrate transfer device (not shown), and the gate 63 is closed. Thus, the inside of the load lock chamber 40 is set to a reduced pressure atmosphere. Then, the gate valve 70 between the load lock chamber 40 and the common transfer chamber 10 is opened, and the three substrate support arms 51a, 51b, 51c of the substrate transfer device 50 are advanced into the load lock chamber 40, and the load lock chamber 40 The unprocessed substrates G carried in are received together. Next, the substrate support arms 51 a, 51 b, 51 c of the substrate transfer apparatus 50 are retracted to the common transfer chamber 10, and the gate valve 70 between the load lock chamber 40 and the common transfer chamber 10 is closed.
　次いで、基板搬送装置５０の基板支持アーム５１ａ，５１ｂ，５１ｃを処理室３０ａ、３０ｂまたは３０ｃに相対するようにさせ、共通搬送室１０と処理室３０ａ、３０ｂまたは３０ｃとの間のゲートバルブ７０を開け、基板支持アーム５１ａ，５１ｂ，５１ｃを処理室３０ａ、３０ｂまたは３０ｃに進出させ、基板Ｇを処理室３０ａ、３０ｂまたは３０ｃへ搬送する。次いで、基板支持アーム５１ａ，５１ｂ，５１ｃを共通搬送室１０に退避させ、そのゲートバルブ７０を閉じ、処理室３０ａ、３０ｂ、または３０ｃにおける処理を開始する。この間に、次の基板Ｇの搬送が可能であれば、基板支持アーム５１ａ，５１ｂ，５１ｃによりロードロック室４０から複数の基板Ｇを取り出し、処理室３０ａ、３０ｂおよび３０ｃのうち、処理が行われていないものへ搬送する。 Next, the substrate support arms 51a, 51b, 51c of the substrate transfer apparatus 50 are made to face the processing chambers 30a, 30b, or 30c, and the gate valve 70 between the common transfer chamber 10 and the processing chambers 30a, 30b, or 30c is set. The substrate support arms 51a, 51b and 51c are advanced to the processing chamber 30a, 30b or 30c, and the substrate G is transferred to the processing chamber 30a, 30b or 30c. Next, the substrate support arms 51a, 51b, 51c are retracted to the common transfer chamber 10, the gate valve 70 is closed, and processing in the processing chambers 30a, 30b, or 30c is started. During this time, if the next substrate G can be transferred, a plurality of substrates G are taken out of the load lock chamber 40 by the substrate support arms 51a, 51b, 51c, and the processing is performed among the processing chambers 30a, 30b, and 30c. Transport it to something that is not.
　処理室処理が終了したら、対応するゲートバルブ７０を開け、基板支持アーム５１ａ，５１ｂ，５１ｃをその処理室に進出させ、処理済みの基板Ｇを受け取る。次いで、基板支持アーム５１ａ，５１ｂ，５１ｃを共通搬送室１０に退避させ、そのゲートバルブ７０を閉じる。次いで、基板支持アーム５１ａ，５１ｂ，５１ｃをロードロック室４０に相対するようにさせ、共通搬送室１０とロードロック室４０との間のゲートバルブ７０を開け、基板支持アーム５１ａ，５１ｂ，５１ｃをロードロック室４０に進出させ、処理済みの基板Ｇをロードロック室４０へ搬送する。次いで、基板支持アーム５１ａ，５１ｂ，５１ｃを共通搬送室１０に退避させ、共通搬送室１０とロードロック室４０との間のゲートバルブ７０を閉じ、ロードロック室４０内を大気雰囲気にする。この後、ゲート６３を開けて大気側基板搬送装置（図示せず）により処理済みの基板Ｇをロードロック室４０から搬出する。 When the processing chamber processing is completed, the corresponding gate valve 70 is opened, the substrate support arms 51a, 51b, 51c are advanced into the processing chamber, and the processed substrate G is received. Next, the substrate support arms 51a, 51b, 51c are retracted into the common transfer chamber 10, and the gate valve 70 is closed. Next, the substrate support arms 51a, 51b, 51c are made to face the load lock chamber 40, the gate valve 70 between the common transfer chamber 10 and the load lock chamber 40 is opened, and the substrate support arms 51a, 51b, 51c are moved. The load lock chamber 40 is advanced to transfer the processed substrate G to the load lock chamber 40. Next, the substrate support arms 51a, 51b, and 51c are retracted to the common transfer chamber 10, the gate valve 70 between the common transfer chamber 10 and the load lock chamber 40 is closed, and the inside of the load lock chamber 40 is set to an atmospheric atmosphere. Thereafter, the gate 63 is opened, and the processed substrate G is carried out of the load lock chamber 40 by an atmosphere side substrate transfer device (not shown).
　このような一連の動作において、上述したように、各真空容器間の基板Ｇの搬送の際には必ずゲートバルブ７０の開閉をともなう。本実施形態においては、ゲートバルブ７０は、上述したように、ハウジング７１に基板Ｇを搬送するための３つの開口部７１ａが形成されており、ゲートバルブ７０の開閉動作は、これら３つの開口部７１ａに対応する３つの弁体８１により行う。 In such a series of operations, as described above, the gate valve 70 is always opened and closed when the substrate G is transferred between the vacuum vessels. In the present embodiment, as described above, the gate valve 70 has three openings 71a for transporting the substrate G in the housing 71. The opening and closing operation of the gate valve 70 is performed by the three openings. This is performed by three valve bodies 81 corresponding to 71a.
　図１１に示すように、ゲートバルブ７０を開放する際には、（ａ）の弁体８１が縦向きでシール面が開口部７１ａの周囲に押しつけられた「閉状態」から、（ｂ）の位置に弁体８１を後退させ、その後、弁体８１を下降させつつ９０度回動させて、各弁体８１を対応する開口部７１ａの下方位置にシール面を下にした横向き状態で退避させることにより、（ｃ）の「開状態」とする。このようにゲートバルブ７０が「開状態」となった際には、基板搬送機構５０の基板支持アーム５１ａ，５１ｂ，５１ｃにより各開口部７１ａを通って基板Ｇを搬送することが可能となる。 As shown in FIG. 11, when the gate valve 70 is opened, the valve body 81 in (a) is in the vertical direction and the sealing surface is pressed around the opening 71a. The valve body 81 is retracted to the position, and then the valve body 81 is rotated 90 degrees while being lowered, so that each valve body 81 is retracted to the position below the corresponding opening 71a in the lateral state with the seal surface down. Thus, the “open state” of (c) is obtained. As described above, when the gate valve 70 is in the “open state”, the substrate G can be transferred through the openings 71a by the substrate support arms 51a, 51b, 51c of the substrate transfer mechanism 50.
　一方、図１２に示すように、ゲートバルブ７０を閉じる際には、（ａ）の弁体８１が開口部７１ａの下方位置にシール面を下にして横向き状態で退避した「開状態」から、弁体８１を上昇させつつ９０度回動させて縦向き状態とすることにより、（ｂ）の各弁体８１を各開口部７１ａに対面した状態とし、その後、弁体８１を前進させてそのシール面を開口部７１ａの周囲に押しつけ、（ｃ）の「閉状態」とする。 On the other hand, as shown in FIG. 12, when the gate valve 70 is closed, the valve body 81 of (a) is moved from the “open state” in which the valve body 81 is retracted to the lower position of the opening 71a in the lateral state with the seal surface facing downward. By rotating the valve body 81 by 90 degrees and turning it vertically, each valve body 81 in (b) is brought into a state facing each opening 71a, and then the valve body 81 is moved forward to The sealing surface is pressed around the periphery of the opening 71a to be in the “closed state” of (c).
　次に、このようなゲートバルブ７０の開動作および閉動作を具体的に説明する。
　開動作については、図１１における（ａ）の「閉状態」から（ｃ）の「開状態」に動作させるが、「閉状態」では図３に示すように、弁体８１が弁体押圧機構７４におけるカムユニット１０１のカム１０４により押圧され、これにより弁体８１が開口部７１ａの周囲に押しつけられた状態となっている。この状態で昇降駆動部１０２によりカムユニット１０１を上昇させることにより、カム１０４の押圧は解除され、弁体ユニット７２の圧縮バネ８７の付勢力により、弁体８１が後退し、図７（図１１における（ｂ））の状態となる。この状態から、弁体ユニット昇降機構７３により弁体ユニット７２を下降させる。このとき、弁体回動機構７５を構成する回動軸８４、カムフォロワ８５、およびガイドブロック１１１の協働により、具体的には、弁体ユニット７２の下降にともない、カムフォロワ８５がハウジング７１に固定されているガイドブロック１１１の曲面１１１ａにガイドされて移動し、弁体ユニット７２が回動軸８４の回りに９０度回動することにより、各弁体ユニット７２（弁体８１）が対応する開口部７１ａの下方位置に横向き状態で退避され、図１０（図１１における（ｃ））の「開状態」となる。 Next, the opening operation and the closing operation of the gate valve 70 will be specifically described.
The opening operation is performed from the “closed state” in (a) in FIG. 11 to the “open state” in (c). In the “closed state”, as shown in FIG. 74, the valve body 81 is pressed around the opening 71a. In this state, when the cam unit 101 is lifted by the lifting drive unit 102, the pressing of the cam 104 is released, and the valve body 81 is retracted by the biasing force of the compression spring 87 of the valve body unit 72, and FIG. (B)) in FIG. From this state, the valve body unit 72 is lowered by the valve body unit elevating mechanism 73. At this time, specifically, the cam follower 85 is fixed to the housing 71 as the valve body unit 72 is lowered by the cooperation of the rotation shaft 84, the cam follower 85, and the guide block 111 constituting the valve body rotation mechanism 75. The valve element unit 72 (valve element 81) is moved to the corresponding opening when the valve element unit 72 is rotated 90 degrees around the rotation shaft 84 while being guided by the curved surface 111a of the guide block 111. Retracted in a lateral state at a position below the portion 71a, the "open state" of FIG. 10 ((c) in FIG. 11) is obtained.
　閉動作については、最初に図１０（図１２における（ａ））の「開状態」から、弁体ユニット昇降機構７３により弁体ユニット７２を上昇させる。このとき、弁体回動機構７５を構成する回動軸８４、カムフォロワ８５、およびガイドブロック１１１の協働により、具体的には、弁体ユニット７２の上昇にともない、カムフォロワ８５がハウジング７１に固定されているガイドブロック１１１の曲面１１１ａにガイドされて移動し、弁体ユニット７２が回動軸８４の回りに９０度回動することにより、各弁体ユニット７２（弁体８１）が対応する開口部７１ａに対面した位置に縦向き状態で配置され、図７（図１２における（ｂ））の状態となる。この状態で、弁体押圧機構７４のカムユニット１０１を下降させることにより、カム１０４が押圧ローラ８３を介して弁体８１を押圧し、弁体８１を前進してそのシール面が開口部７１ａの周囲部分に押しつけられ、図３（図１２における（ｃ））の「閉状態」となる。 As for the closing operation, first, the valve body unit 72 is raised by the valve body unit lifting mechanism 73 from the “open state” of FIG. 10 ((a) in FIG. 12). At this time, specifically, the cam follower 85 is fixed to the housing 71 as the valve body unit 72 is raised by the cooperation of the rotation shaft 84, the cam follower 85, and the guide block 111 constituting the valve body rotation mechanism 75. The valve element unit 72 (valve element 81) is moved to the corresponding opening when the valve element unit 72 is rotated 90 degrees around the rotation shaft 84 while being guided by the curved surface 111a of the guide block 111. It arrange | positions in the state facing vertically at the position facing the part 71a, and will be in the state of FIG. 7 ((b) in FIG. 12). In this state, by lowering the cam unit 101 of the valve body pressing mechanism 74, the cam 104 presses the valve body 81 via the pressing roller 83, the valve body 81 is advanced, and the sealing surface of the opening 71a Pressed against the surrounding portion, the “closed state” of FIG. 3 ((c) in FIG. 12) is obtained.
　次に、弁体回動機構７５の動作をより具体的に説明する。
　図１３は弁体回動機構７５により弁体ユニット７２（弁体８１）が回動する動作を説明するための図であり、ゲートバルブ７０の閉動作を行う場合の例を示している。図１３の（ａ）では弁体ユニット７２（弁体８１）が開口部７１ａの下方位置に横向きで退避した状態である。この状態から（ｂ）、（ｃ）、（ｄ）と弁体ユニット７２を上昇させていくと、弁体ユニット７２に取り付けられたカムフォロワ８５がハウジング７１に固定されたガイドブロック１１１の曲面１１１ａに沿って移動し、これにともなって弁体ユニット７２は回動軸８４の回りに回動し、弁体ユニット７２（弁体８１）は縦向きとなっていく。そして、最終的には（ｅ）のように、弁体ユニット７２は（ａ）の状態から９０度回動し、開口部７１ａに対面した状態となる。なお、ゲートバルブ７０の開動作を行う場合には、図１３とは逆の動作となる。 Next, the operation of the valve body rotation mechanism 75 will be described more specifically.
FIG. 13 is a view for explaining the operation of rotating the valve body unit 72 (valve body 81) by the valve body rotating mechanism 75, and shows an example in the case where the gate valve 70 is closed. FIG. 13A shows a state in which the valve body unit 72 (valve body 81) is retracted sideways to a position below the opening 71a. When the valve body unit 72 is raised from (b), (c), (d) from this state, the cam follower 85 attached to the valve body unit 72 is moved to the curved surface 111a of the guide block 111 fixed to the housing 71. Along with this, the valve body unit 72 rotates around the rotation shaft 84, and the valve body unit 72 (valve body 81) becomes vertically oriented. And finally, as shown in (e), the valve body unit 72 turns 90 degrees from the state of (a), and is in a state of facing the opening 71a. Note that when the gate valve 70 is opened, the operation is opposite to that shown in FIG.
　以上のように、本実施形態では、複数の基板Ｇを上下方向に多段に配置した状態で一括して搬送する基板処理システムにおいて、ゲートバルブ７０は、各基板Ｇに対応した小さい開口部７１ａを一括して搬送する基板Ｇの数だけ設け、これらを開閉する弁体８１を開口部７１ａ毎に設けたので、弁体８１を開放する際には、弁体８１を対応する開口部７１ａの下方位置、つまり開口部７１ａと開口部７１ａの間（最下部の開口部７１ａについてはその下方位置）に配置すればよく、従来の複数の基板を一括して搬送する大きな開口部を設けてその開口部を一つの弁体で開閉する場合のような弁体を逃がす高さ方向のスペースが実質的に不要となる。このため、ハウジング７１の高さを小さくすることができる。また、上下方向に配置する基板の段数を変化させても弁体８１のストロークは変わらない。 As described above, in the present embodiment, in the substrate processing system in which a plurality of substrates G are collectively transported in a state where they are arranged in multiple stages in the vertical direction, the gate valve 70 has a small opening 71a corresponding to each substrate G. Since the number of the substrates G to be transferred at a time is provided and the valve bodies 81 for opening and closing these are provided for each opening 71a, when opening the valve body 81, the valve body 81 is below the corresponding opening 71a. Position, that is, between the opening 71a and the opening 71a (below the lowermost opening 71a), a large opening for carrying a plurality of conventional substrates in a lump is provided and the opening A space in the height direction for escaping the valve body as in the case of opening and closing the part with one valve body is substantially unnecessary. For this reason, the height of the housing 71 can be reduced. Further, the stroke of the valve body 81 does not change even if the number of stages of the substrates arranged in the vertical direction is changed.
　また、これら弁体８１を開閉動作させる際に、弁体ユニット７２（弁体８１）を昇降させ、その際に弁体回動機構７５により弁体ユニット７２（弁体８１）を回動させて、「開状態」では弁体８１は横向きでかつシール面を下にした状態で開口部７１ａの下方位置に退避されるので、従来は困難であった弁体８１のシール面の洗浄が可能となる。また、このとき、弁体８１を開口部７１ａの下方位置に退避させる際に、弁体８１を横向きに９０度回動させるので、弁体８１の高さを小さくすることができ、開口部７１ａのピッチを弁体８１の縦幅よりも小さくすることができる。 Further, when the valve body 81 is opened and closed, the valve body unit 72 (valve body 81) is moved up and down, and the valve body unit 72 (valve body 81) is rotated by the valve body rotating mechanism 75 at that time. In the "open state", the valve body 81 is retracted to the position below the opening 71a in a state of being sideways and with the seal surface down, so that it is possible to clean the seal surface of the valve body 81, which has been difficult in the prior art. Become. At this time, when the valve body 81 is retracted to a position below the opening 71a, the valve body 81 is rotated 90 degrees laterally, so that the height of the valve body 81 can be reduced, and the opening 71a. Can be made smaller than the vertical width of the valve body 81.
　さらに、弁体ユニット７２（弁体８１）の回動動作は、弁体ユニット昇降機構７３により弁体ユニット７２を昇降する際に、弁体回動機構７５を構成する回動軸８４、カムフォロワ８５、およびガイドブロック１１１の協働により、個別の動力を用いることなく行うことができるので、極めて簡便である。 Further, the rotation operation of the valve body unit 72 (valve body 81) is performed when the valve body unit 72 is moved up and down by the valve body unit lifting mechanism 73, and the rotation shaft 84 and the cam follower 85 constituting the valve body rotation mechanism 75. , And the cooperation of the guide block 111 can be performed without using individual power, which is extremely simple.
　さらにまた、弁体８１による開口部７１ａの周囲に対してシールする際およびシールを解除する際の動作は、弁体押圧機構７４のカムユニット１０１を昇降駆動部１０２により昇降させて、カムユニット１０１のカム１０４により押圧ローラ８３を介して弁体８１を進出させることにより、弁体８１を開口部７１の周囲に押しつけ、またはカム１０４の押圧力を解除した際の圧縮バネ８７の付勢力により戻すといった簡易な動作で行うことができる。 Furthermore, when sealing the periphery of the opening 71a by the valve body 81 and releasing the seal, the cam unit 101 of the valve body pressing mechanism 74 is moved up and down by the lift drive unit 102, and the cam unit 101 The valve body 81 is advanced by the cam 104 via the pressing roller 83 to press the valve body 81 around the opening 71 or return by the urging force of the compression spring 87 when the pressing force of the cam 104 is released. It can be performed with such a simple operation.
　なお、本発明は、上記実施の形態に限定されることなく種々変形可能である。例えば、上記実施の形態においては、３枚の基板を一括して搬送し、処理する基板処理システムを示したが、複数であれば枚数は問わないが、本発明では一括して処理する基板の枚数が多いほど効果が大きく、３枚以上の場合に好適である。さらに、弁体回動機構として、弁体ユニットの昇降を利用して、回動軸、カムフォロワ、ガイドブロックの協働により弁体を回動させるようにしたが、弁体回動機構はこれに限るものではない。また、弁体押圧機構として弁体に対応するカムを有するカムユニットの昇降動作により、弁体にカムを作用させるものを用いたが、これに限るものではない。 Note that the present invention can be variously modified without being limited to the above embodiment. For example, in the above-described embodiment, a substrate processing system that transports and processes three substrates at once is shown. However, the number of substrates is not limited as long as it is a plurality, but in the present invention, the number of substrates to be processed at once is determined. The larger the number, the greater the effect, which is suitable when there are three or more. Furthermore, as the valve body rotation mechanism, the valve body is rotated by the cooperation of the rotation shaft, the cam follower, and the guide block by using the lifting and lowering of the valve body unit. It is not limited. Moreover, although the thing which makes a cam act on a valve body by the raising / lowering operation | movement of the cam unit which has a cam corresponding to a valve body as a valve body press mechanism was used, it does not restrict to this.
　１；基板処理システム、１０；共通搬送室、３０ａ，３０ｂ，３０ｃ；処理室、４０；ロードロック室、５０；基板搬送装置、７０；ゲートバルブ、７１；ハウジング、７１ａ；開口部、７２；弁体ユニット、７３；弁体ユニット昇降機構、７４；弁体押圧機構、７５；弁体回動機構、８１；弁体、８２；弁体ホルダー、８３；押圧ローラ、８４；回動軸、８５；カムフォロワ、８７；圧縮バネ、１０１；カムユニット、１０２；昇降駆動部、１０４；カム、１１１；ガイドブロック、１１１ａ；曲面 DESCRIPTION OF SYMBOLS 1; Substrate processing system, 10; Common transfer chamber, 30a, 30b, 30c; Processing chamber, 40; Load lock chamber, 50; Substrate transfer device, 70; Gate valve, 71; Housing, 71a; Body unit 73; valve body unit lifting mechanism 74; valve body pressing mechanism 75; valve body rotating mechanism 81; valve body 82; valve body holder 83; pressing roller 84; rotating shaft 85; Cam follower, 87; compression spring, 101; cam unit, 102; elevating drive unit, 104; cam, 111; guide block, 111a;

Claims (8)

  1. 　上下方向に多段に配置された複数の基板を真空容器間で搬送する際に、真空容器の開閉に用いられるゲートバルブであって、
    　搬送されるべき前記多段に配置された基板に対応するように複数の開口部が形成された垂直壁を有するハウジングと、
    　前記ハウジング内に設けられ、前記開口部を開閉するための弁体と、
    　前記弁体を昇降させる弁体昇降機構と、
    　前記弁体昇降機構の昇降にともなって弁体を回動させる弁体回動機構と、
    　前記弁体のシール面を前記開口部に押しつける弁体押圧機構と
    を具備し、
    　前記弁体昇降機構は、前記弁体を、前記開口部に対応する開口部対応位置と前記開口部に隣接した退避位置との間で昇降させ、
    　前記弁体回動機構は、前記弁体昇降機構により前記弁体を昇降させている際に前記弁体を回動させて、前記開口部対応位置において縦向きの前記弁体を前記退避位置において横向きになるようにし、
    　前記弁体押圧機構は、前記開口部対応位置にある前記弁体を前記開口部に向けて進出させて前記弁体を押圧し、前記弁体のシール面を前記開口部の周囲に押しつける、ゲートバルブ。     A gate valve used to open and close the vacuum container when transporting a plurality of substrates arranged in multiple stages in the vertical direction between the vacuum containers,
    A housing having a vertical wall formed with a plurality of openings so as to correspond to the multi-stage substrates to be transported;
    A valve body provided in the housing for opening and closing the opening;
    A valve body lifting mechanism for lifting and lowering the valve body;
    A valve body rotating mechanism for rotating the valve body as the valve body elevating mechanism moves up and down;
    A valve body pressing mechanism that presses the sealing surface of the valve body against the opening,
    The valve body lifting mechanism lifts and lowers the valve body between an opening corresponding position corresponding to the opening and a retracted position adjacent to the opening,
    The valve body rotating mechanism rotates the valve body when the valve body is raised and lowered by the valve body elevating mechanism, so that the valve body vertically oriented at the opening corresponding position is moved to the retracted position. Try to be sideways,
    The valve body pressing mechanism advances the valve body at the position corresponding to the opening toward the opening, presses the valve body, and presses the seal surface of the valve body around the opening. valve.
  2. 　前記弁体の両端に設けられ、弁体を進退可能に保持する弁体ホルダーをさらに具備し、前記弁体と前記弁体ホルダーにより弁体ユニットを構成し、前記弁体昇降機構は前記弁体ユニットを昇降させる、請求項１に記載のゲートバルブ。 The valve body is further provided with valve body holders provided at both ends of the valve body so that the valve body can be moved forward and backward, and the valve body and the valve body holder constitute a valve body unit. The gate valve according to claim 1, wherein the unit is raised and lowered.
  3. 　前記弁体回動機構は、前記弁体ホルダーの端面に設けられた回動軸およびカムフォロワと、前記弁体ホルダーに隣接し、前記ハウジングに固定され、前記カムフォロワをガイドする曲面が形成されたガイドブロックとを有し、前記弁体昇降機構により前記弁体ユニットが昇降した際に、前記カムフォロワが前記ガイドブロックの曲面にガイドされて移動し、それにともなって前記弁体を含む前記弁体ユニットが前記回動軸まわりを回動する、請求項２に記載のゲートバルブ。 The valve body rotation mechanism includes a rotation shaft and a cam follower provided on an end surface of the valve body holder, a guide that is adjacent to the valve body holder, is fixed to the housing, and has a curved surface that guides the cam follower. When the valve body unit is moved up and down by the valve body lifting mechanism, the cam follower is guided and moved by the curved surface of the guide block, and the valve body unit including the valve body is moved accordingly. The gate valve according to claim 2, wherein the gate valve rotates about the rotation axis.
  4. 　前記退避位置は、前記開口部の下方位置であり、前記弁体回動機構は、前記弁体ユニットを前記開口部対応位置から下降させた際に、前記退避位置において、前記シール面が下向きになるように前記弁体ユニットを回動させる、請求項３に記載のゲートバルブ。 The retracted position is a position below the opening, and the valve body rotation mechanism is configured such that when the valve body unit is lowered from the opening corresponding position, the seal surface faces downward at the retracted position. The gate valve according to claim 3, wherein the valve body unit is rotated so as to become.
  5. 　前記弁体押圧機構は、前記弁体ユニットのうち、前記弁体のみを押圧して前記開口部に向けて進出させる、請求項２に記載のゲートバルブ。 The gate valve according to claim 2, wherein the valve body pressing mechanism presses only the valve body in the valve body unit to advance toward the opening.
  6. 　前記弁体押圧機構は、前記複数の弁体に対応する位置にカムを有するカムユニットと、前記カムユニットを昇降させる昇降駆動部とを有し、前記カムユニットを昇降させることにより、前記カムが前記弁体を押圧する押圧位置と押圧を解除する押圧解除位置とをとり、前記カムを前記押圧位置に位置させることにより前記弁体を押圧する、請求項５に記載のゲートバルブ。 The valve body pressing mechanism includes a cam unit having a cam at a position corresponding to the plurality of valve bodies, and an elevating drive unit that elevates and lowers the cam unit. The gate valve according to claim 5, wherein a pressure position for pressing the valve body and a pressure release position for releasing the pressure are taken, and the valve body is pressed by positioning the cam at the pressing position.
  7. 　前記弁体押圧機構の押圧力が解除された際に、前記弁体を元の位置に戻す付勢力を付与する付勢力付与機構をさらに具備する、請求項５に記載のゲートバルブ。 The gate valve according to claim 5, further comprising a biasing force applying mechanism that applies a biasing force to return the valve body to its original position when the pressing force of the valve body pressing mechanism is released.
  8. 　真空に保持される共通搬送室と、
    　前記共通搬送室に接続された、真空下で所定の処理を行う処理室と、
    　前記共通搬送室に接続され、大気状態と真空状態との間で切り替え可能に設けられ、処理前および処理済みの基板を交換するロードロック室と、
    　前記共通搬送室に設けられ、前記処理室および前記ロードロック室との間で複数の基板を上下方向に多段に配置した状態で複数の基板を一括して搬送する基板搬送装置と、
    　前記共通搬送室と前記処理室との間、および前記共通搬送室と前記ロードロック室との間に設けられたゲートバルブと
    を具備し、
    　前記ゲートバルブの少なくとも一つとして、請求項１のゲートバルブを用いた、基板処理システム。     A common transfer chamber maintained in a vacuum;
    A processing chamber connected to the common transfer chamber for performing predetermined processing under vacuum;
    A load lock chamber connected to the common transfer chamber, provided to be switchable between an atmospheric state and a vacuum state, and for exchanging a substrate before and after processing;
    A substrate transfer apparatus that is provided in the common transfer chamber and that transfers a plurality of substrates in a lump in a multi-stage arrangement in the vertical direction between the processing chamber and the load lock chamber;
    A gate valve provided between the common transfer chamber and the processing chamber, and between the common transfer chamber and the load lock chamber;
    A substrate processing system using the gate valve according to claim 1 as at least one of the gate valves.
PCT/JP2013/067827 2012-08-30 2013-06-28 Gate valve and substrate processing system WO2014034247A1 (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000337546A (en) * 1999-05-28 2000-12-05 Tokyo Electron Ltd Gate valve
JP2001082613A (en) * 1999-09-08 2001-03-30 Anelva Corp Gate valve
JP2004036760A (en) * 2002-07-03 2004-02-05 Nippon Valqua Ind Ltd Gate valve for vacuum
JP2013011289A (en) * 2011-06-28 2013-01-17 Tokyo Electron Ltd Gate valve and substrate processing system using same

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Publication number Priority date Publication date Assignee Title
JP2000337546A (en) * 1999-05-28 2000-12-05 Tokyo Electron Ltd Gate valve
JP2001082613A (en) * 1999-09-08 2001-03-30 Anelva Corp Gate valve
JP2004036760A (en) * 2002-07-03 2004-02-05 Nippon Valqua Ind Ltd Gate valve for vacuum
JP2013011289A (en) * 2011-06-28 2013-01-17 Tokyo Electron Ltd Gate valve and substrate processing system using same

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