WO2014024678A1 - Resin composition, and adhesive film and coverlay film each of which is formed of same - Google Patents

Resin composition, and adhesive film and coverlay film each of which is formed of same Download PDF

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Publication number
WO2014024678A1
WO2014024678A1 PCT/JP2013/069912 JP2013069912W WO2014024678A1 WO 2014024678 A1 WO2014024678 A1 WO 2014024678A1 JP 2013069912 W JP2013069912 W JP 2013069912W WO 2014024678 A1 WO2014024678 A1 WO 2014024678A1
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Prior art keywords
component
resin composition
mass
film
parts
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PCT/JP2013/069912
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French (fr)
Japanese (ja)
Inventor
聡子 高橋
慎 寺木
吉田 真樹
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ナミックス株式会社
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Priority to CN201380040490.1A priority Critical patent/CN104508040B/en
Publication of WO2014024678A1 publication Critical patent/WO2014024678A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/49Phosphorus-containing compounds
    • C08K5/51Phosphorus bound to oxygen
    • C08K5/53Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5313Phosphinic compounds, e.g. R2=P(:O)OR'
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/408Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2453/00Presence of block copolymer
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2463/00Presence of epoxy resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2471/00Presence of polyether

Definitions

  • the present invention relates to a resin composition. More specifically, the present invention relates to a resin composition suitable for an adhesive film for electric / electronic use or a coverlay film for a printed wiring board. Moreover, this invention relates to the adhesive film produced using this resin composition, and a coverlay film.
  • the adhesive film materials used in the above applications are inherently flammable, so that they can be used as industrial materials in addition to satisfying general chemical and physical properties in a well-balanced manner. That is, there are many cases where flame retardancy is required. In many cases, particularly when used in home appliances, a high level of flame retardancy such as “flame retardancy based on UL94 satisfies V-0 or VTM-0” is required.
  • a method for imparting flame retardancy to a resin material such as an adhesive film
  • a method of adding a halogen-based organic compound as a flame retardant and further adding an antimony compound as a flame retardant aid to the resin can be mentioned.
  • a phosphorous flame retardant formulation for example, a phosphorous flame retardant formulation is employed.
  • phosphate esters such as trimethyl phosphate, triphenyl phosphate, tricresyl phosphate and the like can be used as a flame retardant, The range of the flame retardant content when the flame retardant is contained in the coverlay film described in the document is shown.
  • the cover lay film described in Patent Document 1 is intended for application to a flexible printed wiring board, and has the above-described high flame retardancy, that is, “flame retardancy based on UL94 is V-0 or VTM-0. It is not described that "satisfying" is required. Therefore, the flame retardant content described in paragraph [0040] of Patent Document 1 achieves a high level of flame retardancy such as “flameability based on UL94 satisfies V-0 or VTM-0”. It is not intended. In order to achieve high flame retardancy such as “flame retardancy based on UL94 satisfies V-0 or VTM-0”, it is necessary to increase the content of the flame retardant.
  • the frequency is 1 to 10 GHz. It has been clarified that the dielectric constant ( ⁇ ) and dielectric loss tangent (tan ⁇ ) in the high frequency region are increased, and electric signal loss in the high frequency region becomes a problem.
  • the present invention can achieve low dielectric constant and low dielectric loss in a high frequency region, specifically, a frequency range of 1 to 5 GHz, and UL94 It is an object of the present invention to provide an adhesive film and a coverlay film for electric / electronic applications that can satisfy V-0 or VTM-0, and a resin composition used for producing them.
  • R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group or a phenyl group.
  • — (O—X—O) — is represented by the following structural formula (2).
  • R 8 , R 9 , R 10 , R 14 , and R 15 may be the same or different and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • R 11, R 12, R 13 are the same or different, it is a hydrogen atom, a halogen atom or more than 6 alkyl group or a phenyl group having a carbon.
  • -(YO)- is one type of structure defined by the following structural formula (3) or two or more types of structures defined by the following structural formula (3) arranged at random.
  • R 16 and R 17 may be the same or different and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • R 18 and R 19 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • Z is an organic group having 1 or more carbon atoms, and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom.
  • a and b each represents an integer of 0 to 300, at least one of which is not 0.
  • c and d represent an integer of 0 or 1.
  • thermoplastic elastomer (B) a thermoplastic elastomer, (C) a thermosetting resin other than the vinyl compound represented by the general formula (1), (D) a curing agent, and (E) containing an organic aluminum phosphinate, 10 to 50 parts by mass of the component (E) with respect to 100 parts by mass in total of the component (A), the component (B), the component (C), the component (D), and the component (E)
  • the resin composition characterized by containing is provided.
  • — (O—X—O) — of the component (A) is represented by the following structural formula (4)
  • — (YO) — of the component (A) is Structural formula (5), or a structure represented by the following structural formula (6), or a structure represented by the following structural formula (5) and a structure represented by the following structural formula (6) are randomly arranged. It is preferable.
  • — (YO) — of the component (A) has a structure represented by the structural formula (6).
  • the thermoplastic elastomer of component (B) is a styrene-butadiene block copolymer, a styrene-ethylene / butylene-styrene block copolymer, a styrene-isoprene-styrene block copolymer, or a polybutadiene. And at least one selected from the group consisting of styrene- (ethylene-ethylene / propylene) -styrene block copolymers.
  • thermosetting resin of the component (C) is a biphenyl type epoxy resin, a naphthalene type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a novolac type epoxy resin, a bismaleimide, And at least one selected from the group consisting of carbodiimide and the like.
  • the content of the thermoplastic elastomer of the component (B) includes the component (A), the component (B), the component (C), the component (D), and the component.
  • the amount is preferably 10 to 60 parts by mass with respect to 100 parts by mass in total of (E).
  • the content of the thermosetting resin of the component (C) is such that the component (A), the component (B), the component (C), the component (D), and the The amount is preferably 0.5 to 40 parts by mass with respect to 100 parts by mass in total of the component (E).
  • the resin composition of the present invention may further contain (F) a filler.
  • the component (A), the component (B), the component (C), the component (D), the component (E), and the component (F) with respect to a total of 100 parts by mass. 10 to 60 parts by mass of (F) is contained.
  • the resin composition of the present invention may further contain (G) an organic peroxide.
  • the resin composition of the present invention has a dielectric constant ( ⁇ ) of 3.0 or less and a dielectric loss tangent (tan ⁇ ) of 0.006 or less in the frequency range of 1 to 10 GHz of the cured product of the resin composition. preferable.
  • the resin composition of the present invention preferably has flame retardancy based on UL94 satisfying V-0 or VTM-0.
  • the present invention also provides an adhesive film produced using the resin composition of the present invention.
  • the present invention also provides a coverlay film produced using the resin composition of the present invention.
  • the present invention also provides a varnish containing the resin composition of the present invention.
  • the adhesive film and coverlay film of the present invention have excellent electrical characteristics in a high frequency region after heating and curing, specifically, a low dielectric constant ( ⁇ ) and a low dielectric loss tangent (tan ⁇ ) in a frequency range of 1 to 10 GHz. ), It is possible to achieve low dielectric constant and low dielectric loss in a high frequency region, and flame retardancy based on UL94 satisfies V-0 or VTM-0. Moreover, the adhesive film and coverlay film of this invention show the adhesive strength outstanding with respect to the organic material or inorganic material used for printed wiring boards, such as a polyimide, a liquid crystal polymer, and a ceramic, after heat-hardening.
  • the adhesive film and coverlay film of this invention are excellent in flexibility after heat-curing, they are suitable as an adhesive film and coverlay film for flexible printed wiring boards.
  • the film of this invention is excellent in flexibility before heat-hardening, the workability
  • the adhesive film and coverlay film of the present invention can be prepared using the resin composition of the present invention.
  • a varnish containing the resin composition of the present invention may be applied to the film forming surface and then dried to form a film.
  • the resin composition of the present invention contains the following components (A) to (E) as essential components.
  • Component (A) Vinyl compound represented by the following general formula (1) and having a mass average molecular weight (Mw) of 500 to 4000
  • R 1, R 2, R 3, R 4, R 5, R 6, R 7 are the same or different, a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, or It is a phenyl group.
  • R 1, R 2, R 3, R 4, R 5, is preferably R 6, R 7 is a hydrogen atom.
  • — (O—X—O) — is represented by the following structural formula (2).
  • R 8 , R 9 , R 10 , R 14 , and R 15 may be the same or different, and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • R 8 , R 9 , R 10 , R 14 , and R 15 are preferably alkyl groups having 6 or less carbon atoms.
  • R 11 , R 12 and R 13 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • R 11 , R 12 and R 13 are preferably a hydrogen atom, a halogen atom or an alkyl group having 6 or less carbon atoms.
  • -(YO)- is a random arrangement of one type of structure defined by the following structural formula (3) or two or more types of structures defined by the following structural formula (3) It is a thing.
  • — (YO) — is preferably an arrangement of one type of structure defined by the following structural formula (3).
  • R 16 and R 17 may be the same or different, and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • R 16 and R 17 are preferably alkyl groups having 6 or less carbon atoms.
  • R 18 and R 19 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group.
  • R 18 and R 19 are preferably a hydrogen atom or an alkyl group having 3 or less carbon atoms.
  • Z is an organic group having 1 or more carbon atoms and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom. Among these, it is preferable that Z is a methylene group.
  • a and b each represents an integer of 0 to 300, at least one of which is not 0.
  • c and d represent an integer of 0 or 1. Among these, c and d are preferably 1.
  • R 8, R 9, R 10, R 14, R 15 is alkyl group having 3 or less carbon atoms
  • R 11, R 12, R 13 is a hydrogen atom or alkyl group having 3 or less carbon atoms
  • R 16 and R 17 are alkyl groups having 3 or less carbon atoms
  • R 18 and R 19 are hydrogen atoms.
  • — (O—X—O) — in the general formula (1) is preferably represented by the following structural formula (4).
  • — (Y—O) — represents the structure represented by the following structural formula (5), the following structural formula (6), the structure represented by the following structural formula (5), and It is preferable to have a structure in which the structure represented by the following structural formula (6) is randomly arranged.
  • -(YO)- preferably has a structure in which structures defined by the following structural formula (6) are arranged.
  • the component (A) is the thermosetting property, heat resistance, and excellent electrical properties at high frequencies of the adhesive film and coverlay film prepared using the resin composition, that is, the frequency. This contributes to a low dielectric constant ( ⁇ ) and a low dielectric loss tangent (tan ⁇ ) in the region of 1 to 10 GHz.
  • component (A) acts as a compatibilizer for components (B) to (E) described below.
  • the component (A) among the vinyl compounds represented by the general formula (1), those having a mass average molecular weight (Mw) of 500 to 4000 are used as follows.
  • Mw mass average molecular weight
  • the mass average molecular weight (Mw) is less than 500, the flexibility of the adhesive film and coverlay film prepared using the resin composition is lost, and the film becomes brittle and easily broken.
  • the melt viscosity is too low during thermocompression bonding or heat curing, the film thickness uniformity may be impaired.
  • the mass average molecular weight (Mw) exceeds 4000, the solubility is lowered, which causes a problem when preparing the resin composition.
  • the component (A) among the vinyl compounds represented by the general formula (1), those having a mass average molecular weight (Mw) of 800 to 3500 are preferably used, and those having 1000 to 3000 are more preferably used.
  • the method for producing the vinyl compound represented by the general formula (1) is not particularly limited, and may be produced by any method.
  • chloromethylstyrene is added to a compound represented by the following general formula (7) in the presence of an alkali catalyst such as sodium hydroxide, potassium carbonate, sodium ethoxide, and the like, if necessary, benzyltri n-butylammonium bromide, 18- It can be obtained by reacting with a phase transfer catalyst such as crown-6-ether.
  • an alkali catalyst such as sodium hydroxide, potassium carbonate, sodium ethoxide, and the like
  • benzyltri n-butylammonium bromide 18- It can be obtained by reacting with a phase transfer catalyst such as crown-6-ether.
  • — (O—X—O) and — (Y—O) — are as described above for formula (1).
  • component (B) is an excellent electrical property (frequency 1 to frequency) of an adhesive film and a coverlay film prepared using the resin composition. This contributes to low dielectric constant ( ⁇ ) and low dielectric loss tangent (tan ⁇ ), film properties, and heat resistance in the 10 GHz region.
  • styrene-butadiene block copolymer As the elastomer of component (B), styrene-butadiene block copolymer, styrene-ethylene / butylene-styrene block copolymer, styrene-isoprene-styrene block copolymer, polybutadiene, and , At least one selected from the group consisting of styrene- (ethylene-ethylene / propylene) -styrene block copolymers can be used. Among these, only any 1 type may be used and 2 or more types may be used. Which of these is used can be appropriately selected depending on the properties to be imparted to the adhesive film and the coverlay film produced using the resin composition.
  • a styrene-ethylene / butylene-styrene block copolymer has high heat resistance due to high crystallinity of the portion of -ethylene / butylene-, and is used as an adhesive film and a coverlay film formed using the resin composition. It is preferable for imparting heat resistance.
  • the styrene- (ethylene-ethylene / propylene) -styrene block copolymer has a crystallinity of the-(ethylene-ethylene / propylene)-moiety corresponding to that of the styrene-ethylene / butylene-styrene block copolymer.
  • the adhesive strength to the substrate is higher than that of the styrene-ethylene / butylene-styrene block copolymer.
  • the styrene-butadiene block copolymer has a low elastic modulus of an adhesive film and a coverlay film prepared using the resin composition, and unevenness present on the adherend surface during thermocompression bonding of the film. Therefore, the adhesive strength of the film is increased. Moreover, the flexibility after curing of the film is also excellent.
  • the content of the component (B) is preferably 10 to 60 parts by mass with respect to 100 parts by mass in total of the components (A) to (E).
  • the content of the component (B) is less than 10 parts by mass, the film properties of the adhesive film and coverlay film prepared using the resin composition, specifically, the folding resistance of the film alone is inferior.
  • the amount of seepage during thermocompression increases, and the film thickness tends to be uneven.
  • the content of the component (B) exceeds 60 parts by mass, the content of other components of the resin composition, in particular, the component (A) is reduced, so that the resin composition is used. The heat resistance of the adhesive film and the coverlay film is lowered.
  • the content of the component (B) is more preferably 12 to 55 parts by mass, and 13 to 45 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). More preferably, it is a part.
  • Component (C) Thermosetting resin other than the vinyl compound represented by the general formula (1)
  • the component (C) is an adhesive film and a coverlay prepared using the resin composition. Contributes to the thermosetting and adhesive properties of the film.
  • thermosetting resin used as the component (C) is not particularly limited as long as it is a thermosetting resin other than the vinyl compound represented by the general formula (1) as the component (A).
  • the thermosetting resin used as the component (C) includes biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, bismaleimide, and carbodiimide. At least one selected from the group can be used.
  • any 1 type may be used and 2 or more types may be used together. Which of these is used can be appropriately selected depending on the properties to be imparted to the adhesive film and the coverlay film produced using the resin composition.
  • Epoxy resins such as biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and novolak type epoxy resin are excellent in compatibility with other components of the resin composition, and the resin composition An adhesive film and a cover lay film produced using a product are excellent in moisture resistance reliability.
  • a biphenyl type epoxy resin is more preferable because the dielectric property of the resin itself is relatively good.
  • bismaleimide when bismaleimide is used, the linear expansion coefficient after hardening of the adhesive film and coverlay film which are created using this resin composition becomes low.
  • the content of the thermosetting resin of component (C) is 0.5 to 40 parts by mass with respect to 100 parts by mass in total of components (A) to (E). preferable.
  • content of a component (C) is less than 0.5 mass part, there exists a problem that the adhesiveness of the adhesive film and coverlay film which are created using this resin composition becomes inadequate.
  • the content of the component (C) is more than 40 parts by mass, the amount of oozing during thermocompression bonding of the adhesive film and coverlay film prepared using the resin composition becomes excessively large.
  • the ratio of the component (C) in all the components increases, the properties of the component (C) inferior in heat resistance affect the entire adhesive film and coverlay film formed using the resin composition. .
  • the content of component (C) is more preferably 1.0 to 30 parts by mass with respect to 100 parts by mass in total of components (A) to (E). More preferably, it is 5 to 15 parts by mass.
  • the number average molecular weight ( Mn) is preferably from 150 to 2500 for reasons of thermosetting, adhesiveness, and post-curing mechanical properties of the adhesive film and coverlay film prepared using the resin composition.
  • the thermosetting resin used as the component (C) is bismaleimide
  • the number average molecular weight (Mn) is 150 to 3500. The heat of the adhesive film and coverlay film prepared using the resin composition It is preferable for reasons of curability, adhesiveness, and mechanical properties after curing.
  • Component (D) Curing Agent
  • the resin composition of the present invention contains an effective amount of a curing agent as the component (D).
  • the curing agent used as component (D) is not particularly limited.
  • phenol-based curing agent examples include monomers, oligomers, and polymers in general having a phenolic hydroxyl group. Examples thereof include triphenol methane resin and dicyclopentadiene type phenol resin.
  • amine curing agent examples include triazine compounds such as 2,4-diamino-6- [2′-methylimidazolyl- (1 ′)] ethyl-s-triazine, 1,8-diazabicyclo [5,4, 0] tertiary amine compounds such as undecene-7 (DBU), triethylenediamine, benzyldimethylamine, triethanolamine and the like.
  • triazine compounds such as 2,4-diamino-6- [2′-methylimidazolyl- (1 ′)] ethyl-s-triazine
  • DBU undecene-7
  • 2,4-diamino-6- [2'-methylimidazolyl- (1 ')] ethyl-s-triazine is preferred.
  • imidazole curing agents examples include 2-methylimidazole, 2-undecylimidazole, 1-cyanoethyl-2-undecylimidazole, 2-heptadecylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-ethyl.
  • imidazole compounds such as -4-imidazole, 2-phenylimidazole, and 2-phenyl-4-methylimidazole. Of these, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, and 1-cyanoethyl-2-ethyl-4-imidazole are preferable.
  • acid anhydride-based curing agent examples include phthalic anhydride, maleic anhydride, dodecenyl succinic anhydride, trimellitic anhydride, benzophenone tetracarbanoic dianhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride. .
  • any 1 type may be used among said hardening
  • an imidazole-based curing agent is preferable because it exhibits an effect even if the addition amount is small.
  • 2-phenyl-4,5 dihydroxymethylimidazole is a varnish obtained by diluting a resin composition with a solvent. It is preferable because the pot life and the shelf life of the adhesive film and coverlay film produced using the resin composition are improved.
  • the effective amount of the curing agent varies depending on the type of the curing agent.
  • the effective amount for each type of curing agent is shown below.
  • the effective amount is more preferably 1 to 10 parts by mass, and more preferably 1 to 5 parts by mass with respect to 100 parts by mass in total of components (A) to (E). Further preferred.
  • the effective amount is more preferably 1 to 10 parts by mass, and more preferably 1 to 3 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). Further preferred.
  • the effective amount is more preferably 0.1 to 5 parts by mass, and 0.2 to 3 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). More preferably.
  • the effective amount is more preferably 1 to 10 parts by mass with respect to 100 parts by mass in total of components (A) to (E), preferably 1 to 5 parts by mass. More preferably it is.
  • Component (E) Aluminum organophosphinate
  • component (E) contributes to the flame retardancy of an adhesive film and a coverlay film prepared using the resin composition.
  • the organic aluminum phosphinate used as the component (E) is represented by the following general formula.
  • R 1 and R 2 may be the same or different and each represents an alkyl group having 1 to 6 carbon atoms, a phenyl group or a naphthyl group.
  • the alkyl group may be linear, branched or cyclic. An alkyl group having 1 to 3 carbon atoms is preferable, and an ethyl group is more preferable.
  • the organic aluminum phosphinate used as component (E) is preferably aluminum dialkylphosphinate, more preferably aluminum diethylphosphinate.
  • the resin composition of the present invention uses an organoaluminum phosphinate as the component (E), so that an adhesive film and a coverlay film prepared using the resin composition have a flame retardancy based on UL94 of V-0. Or, VTM-0 is satisfied. It is also described in JP-A-2009-179774 and JP-A-2011-225883 that, when an organic phosphinate aluminum is used as a flame retardant, flame retardancy based on UL94 satisfies V-0 or VTM-0. Has been. However, in the former case, the electric signal loss in the high frequency region is not regarded as a problem, and the electrical characteristics in the high frequency region have not been studied at all.
  • the relative dielectric constant at a frequency of 1 GHz or higher includes a resin having a relative dielectric constant of 2.9 or lower
  • the relative dielectric constant of the resin composition at a frequency of 1 GHz or higher can be 3.0 or lower. Since the mass average molecular weight (Mw) of the resin having a relative dielectric constant of 2.9 or less at a frequency of 1 GHz or higher is as high as 1,000 to 300,000, it was used as a resin composition for adhesive films and coverlay films. In this case, the solubility is lowered, which causes a problem when preparing the resin composition.
  • Mw mass average molecular weight
  • the resin composition of the present invention contains 10 to 50 parts by mass of the component (E) with respect to 100 parts by mass in total of the components (A) to (E).
  • the content of the component (E) is less than 10 parts by mass, the flame retardancy of the adhesive film and coverlay film prepared using the resin composition is lowered, and the flame retardancy based on UL94 is V-0 or Not satisfied with VTM-0.
  • the component (E) exceeds 50 parts by mass, it becomes impossible to form a film when an adhesive film and a coverlay film are produced using the resin composition.
  • the component (E) is preferably contained in an amount of 15 to 48 parts by mass, more preferably 18 to 45 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). More preferred.
  • the resin composition of the present invention may contain the following components (F) and (G) as necessary in addition to the components (A) to (E).
  • Component (F) Filler
  • the resin composition of the present invention may contain a filler as the component (F) in addition to the components (A) to (E).
  • a filler as the component (F)
  • the adhesive film and coverlay film prepared using the resin composition of the present invention can have desired rheological properties, electrical properties, or physical properties, or Both can be granted.
  • the filler used as the component (F) is appropriately selected according to the use of the adhesive film and the coverlay film prepared using the resin composition of the present invention. For example, a thermally conductive substance, an unnecessary radiation absorbing substance And ceramic dielectric materials.
  • thermally conductive substance examples include oxides such as aluminum oxide and silicon dioxide, and nitrides such as aluminum nitride and boron nitride.
  • unnecessary radiation absorbing material examples include iron oxides such as ferrite.
  • ceramic dielectric material examples include barium titanate and titanium oxide.
  • the content of the resin composition of the present invention is an amount necessary for exhibiting desired characteristics and an amount capable of forming a film.
  • it is 10 with respect to a total of 100 mass parts of a component (A), a component (B), a component (C), a component (D), a component (E), and a component (F).
  • It is preferably from 60 parts by mass from the viewpoint of dispersibility in the resin composition and processability of an adhesive film and a coverlay film prepared using the resin composition, and more preferably from 20 to 55 parts by mass. More preferably, it is 25 to 50 parts by mass.
  • the shape is not particularly limited, and may be, for example, granular, powdery, flake shaped, etc.
  • the maximum diameter) is preferably 0.5 ⁇ m or less from the viewpoint of dispersibility with respect to the resin composition and workability of an adhesive film and a coverlay film prepared using the resin composition.
  • a filler when included as the component (F), a filler that has been subjected to a surface treatment as necessary may be used.
  • a filler include those in which an oxide film is formed on the particle surface.
  • Component (G) Organic Peroxide
  • the resin composition of the present invention comprises an organic peroxide as component (G) in addition to the above components (A) to (E) (may contain component (F)). You may contain a thing. Reaction of the vinyl compound used as the component (A) at the time of heat curing of the adhesive film and coverlay film prepared using the resin composition of the present invention by containing an organic peroxide as the component (G) Is promoted.
  • the organic peroxide of component (G) includes benzoyl peroxide, isobutyryl peroxide, isononanoyl peroxide, decanoyl peroxide, lauroyl peroxide, parachlorobenzoyl peroxide, di (3,5,5- Diacyl peroxides such as trimethylhexanoyl) peroxide; peroxyketals such as 2,2-di (4,4-di- (di-tert-butylperoxy) cyclohexyl) propane; isopropyl purge carbonate, di-sec Peroxydicarbonates such as butyl purge carbonate, di-2-ethylhexyl purge carbonate, di-1-methylheptyl purge carbonate, di-3-methoxybutyl purge carbonate, dicyclohexyl purge carbonate; tert-butyl perbenzoate, tert-butyl peracetate, tert-butyl per-2-e
  • tert-butyl peroxybenzoate has an optimum activation temperature, that is, a temperature range of 60 to 120 ° C. in the drying process of film formation, and around 80 ° C. at the time of transfer of an adhesive film or a coverlay film. It is not activated in the above temperature range, but it is activated in the temperature range of 180 to 210 ° C. during the heat curing of the adhesive film or coverlay film, and the shelf life of the adhesive film or coverlay film is good. preferable.
  • component (G) When an organic peroxide is contained as the component (G), the content in the resin composition of the present invention is as follows: Component (A), Component (B), Component (C), Component (D), Component (E) , (If included, component (F)) and 100 parts by mass of component (G), preferably 5 parts by mass or less, more preferably 3 parts by mass or less, More preferably, it is ⁇ 1 part by mass.
  • the resin composition of the present invention may contain components other than the above components (A) to (G) as necessary.
  • Specific examples of such components include silane coupling agents, antifoaming agents, flow control agents, film forming aids, dispersants, and the like.
  • the resin composition of the present invention can be produced by a conventional method. For example, in the presence or absence of a solvent, the above components (A) to (E) (if the resin composition contains the above components (F), (G) and other optional components, these optional Ingredients) are mixed with a heating vacuum mixing kneader.
  • the resin composition contains the above components (F), (G) and other optional components, these optional components) so that the above components (A) to (E) have a desired content ratio , Dissolved in a predetermined solvent concentration, put them in a reaction kettle heated to 10 to 80 ° C., mixed at atmospheric pressure for 3 hours while rotating at a rotational speed of 100 to 1000 rpm, The mixture can be further stirred for 30 to 60 minutes at (maximum 1 Torr).
  • the adhesive film and coverlay film of the present invention can be obtained from the resin composition of the present invention by a known method.
  • the resin composition of the present invention is diluted with a solvent to obtain a varnish, which is applied to at least one side of a support and dried, and then provided as a film with a support or a film peeled from the support. be able to.
  • the solvent that can be used as the varnish examples include ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic solvents such as toluene and xylene; high-boiling solvents such as dioctyl phthalate and dibutyl phthalate.
  • the amount of the solvent used is not particularly limited and may be a conventionally used amount, but is preferably 20 to 90% by mass with respect to the solid content.
  • the support is appropriately selected depending on the desired form in the film production method, and is not particularly limited. Examples thereof include metal foils such as copper and aluminum, and carrier films of resins such as polyester and polyethylene. When providing the adhesive film of this invention as a form of the film peeled from the support body, it is preferable that the support body is mold-release-processed with the silicone compound etc.
  • the method for applying the varnish is not particularly limited, and examples thereof include a slot die method, a gravure method, a doctor coater method, and the like, which are appropriately selected according to a desired film thickness and the like. This is preferable because it can be designed to be thin.
  • coating is performed so that the thickness of the film formed after drying may turn into desired thickness. Such a thickness can be derived from the solvent content by those skilled in the art.
  • the thickness of the adhesive film and cover lay film of the present invention is appropriately designed based on characteristics such as mechanical strength required according to the application, but is generally 1 to 100 ⁇ m, and when thinning is required, It is preferably 1 to 30 ⁇ m.
  • the drying conditions are appropriately designed according to the type and amount of the solvent used in the varnish, the amount of varnish used and the thickness of the coating, and are not particularly limited, but are, for example, 60 to 120 ° C., It can be performed under atmospheric pressure.
  • the adhesive film and coverlay film of the present invention before use are stored in a state of being sandwiched between protective films in order to prevent foreign matter from adhering.
  • a protective film what was described as a base material can be used.
  • the procedure for using the adhesive film of the present invention is as follows.
  • the adhesive film of the present invention is placed on the surface to be bonded of one object, the other surface is exposed to the adhesive film. Place it in contact with the surface.
  • the adhesive film is placed so that the exposed surface of the adhesive film is in contact with the adherend surface of one object, and the adhesive film is transferred onto the adherend surface.
  • the temperature at the time of transfer can be set to 80 ° C., for example.
  • the other object is placed on the surface of the adhesive film exposed by peeling the support during transfer so that the surface to be bonded is in contact with the exposed surface of the adhesive film.
  • thermocompression bonding is performed for a predetermined temperature and for a predetermined time, and then heat-cured.
  • the temperature during thermocompression bonding is preferably 100 to 200 ° C.
  • the time for thermocompression bonding is preferably 0.5 to 10 minutes.
  • the temperature for heat curing is preferably 180 to 210 ° C.
  • the heat curing time is preferably 30 to 120 minutes.
  • the procedure for using the coverlay film of the present invention is basically the same. After the coverlay film of the present invention is placed at a predetermined position on the printed wiring board, that is, at a position covered with the coverlay film, a predetermined temperature is set. Then, it may be heat-pressed for a predetermined time, and then heat-cured.
  • a varnish obtained by diluting the resin composition of the present invention with a solvent is applied to the surface to be bonded (position to be covered with a film in the case of a coverlay film). After applying and drying, the above-described procedure of placing one object (in the case of a coverlay film, thermocompression bonding) may be performed.
  • the adhesive film and coverlay film of the present invention are excellent in high frequency electrical characteristics after heat curing.
  • the heat-cured coverlay film preferably has a dielectric constant ( ⁇ ) of 3.0 or less, more preferably 2.5 or less, in a frequency range of 1 to 10 GHz.
  • the dielectric loss tangent (tan ⁇ ) in the frequency region of 1 to 10 GHz is more preferably 0.01 or less, and more preferably 0.0025 or less.
  • the adhesive film and coverlay film of the present invention have sufficient adhesive strength after heat curing.
  • the adhesive film and the coverlay film after heat curing preferably have a peel strength (180 degree peel) with respect to the roughened surface of the copper foil measured in accordance with JIS C6471 of 5 N / cm or more, more preferably. Is 8 N / cm or more, more preferably 10 N / cm or more.
  • the adhesive film and coverlay film of the present invention have sufficient flame retardancy after heat curing. Specifically, it is preferable that the adhesive film and the coverlay film after heat curing pass with a flame retardancy class V-0 in a flame retardancy test performed in accordance with the flame retardancy standard of UL94V. Moreover, it is preferable that the adhesive film and coverlay film after heat curing pass with the flame retardancy class VTM-0 in the flame retardancy test conducted in accordance with the flame retardancy standard of UL94VTM.
  • Examples 1 to 12, Comparative Examples 1 to 6) Mix each component so that the blending ratio (parts by mass) shown in the table below is met, add toluene, put into a reaction kettle heated to 80 ° C., and mix at normal pressure while rotating at 150 rpm. For 3 hours.
  • the varnish containing the resin composition thus obtained was applied to one side of a base material (PET film subjected to release treatment) and dried at 100 ° C. to obtain an adhesive film with a support.
  • the abbreviations in the table represent the following.
  • Ingredient (A) OPE2200: Oligophenylene ether (vinyl compound represented by the above general formula (1)) (Mn 2200), manufactured by Mitsubishi Gas Chemical Co., Ltd.
  • Ingredient (E) OP935 Aluminum organophosphinate, manufactured by Clariant Japan
  • Ingredient (E ') FP2200 Phosphate flame retardant, ADEKA Corporation
  • PX-200 Phosphate ester flame retardant, manufactured by Daihachi Chemical Industry
  • Ingredient (F) SE2050 Silica filler, Admatechs Co., Ltd.
  • KBM403 Silane coupling agent, Shin-Etsu Chemical Co., Ltd.
  • DISPERBYK2009 Dispersant, manufactured by Big Chemie Japan
  • Dielectric constant ( ⁇ ), dielectric loss tangent (tan ⁇ ) After the adhesive film was cured by heating at 180 ° C. and peeled from the support, a test piece (40 ⁇ 0.5 mm ⁇ 100 ⁇ 2 mm) was cut out from the adhesive film, and the thickness was measured. The test piece was rolled into a cylindrical shape having a length of 100 mm and a diameter of 2 mm or less, and a dielectric constant ( ⁇ ) and a dielectric loss tangent (tan ⁇ ) were measured by a cavity resonator perturbation method (10 GHz).
  • Glass transition point Tg measured by dynamic viscoelasticity measurement (DMA). After the adhesive film was heat-cured at 180 ° C. and peeled from the support, a test piece (10 ⁇ 0.5 mm ⁇ 40 ⁇ 1 mm) was cut out from the adhesive film, and the width and thickness of the test piece were measured. Thereafter, measurement was performed with DMS6100 (3 ° C./min 25-220 ° C.). The peak temperature of tanD was read and used as Tg.
  • DMA dynamic viscoelasticity measurement
  • Linear expansion coefficient Measured with a thermal analyzer (TMA). After the adhesive film was heat-cured at 180 ° C. and peeled off from the support, a test piece (5 ⁇ 0.5 mm ⁇ 20 ⁇ 1 mm) was cut out from the adhesive film and measured with TMA4000S (5 ° C./min 25 ⁇ 230 ° C.). 90-100 ° C. C.I. T.A. The average of E was ⁇ 1, C.C. T.A. The average of E was ⁇ 2.
  • test piece 50 ⁇ 0.5 mm ⁇ 200 ⁇ 0.5 mm
  • the test piece was rolled into a cylindrical shape having a length of 200 mm and a diameter of about 15 mm and fixed to a stand.
  • the flame of the gas burner was adjusted to a height of about 20 mm, and after burning for 3 seconds at the lower end of the film, the burning time was measured.
  • Varnish stability The varnish containing the resin composition obtained by the above procedure was sealed in a glass bottle and allowed to stand at 25 ° C., and the stability of the solution was confirmed. The number of days until the generation of crystals, precipitates, separation of the solution, etc. were compared, and those that were stable for one week or more were marked with ⁇ and those with about 3 days were marked with ⁇ .
  • Solubility The varnish containing the resin composition obtained by the above procedure was allowed to stand at room temperature. The resin composition components were not recrystallized.
  • Example 1 a uniform adhesive film was obtained, and the embedding property at the time of thermocompression bonding was excellent. Further, the adhesive film was excellent in all of the high frequency electric characteristics (dielectric constant ⁇ , dielectric loss tangent Tan ⁇ ), peel strength, and flame retardancy after heat curing. Moreover, the solubility and stability of the varnish were also excellent.
  • Comparative Example 1 in which the content of the component (E) is less than 10 parts by mass, the flame resistance of the obtained adhesive film was inferior.
  • Comparative Example 2 in which the content of the component (E) exceeds 50 parts by mass, a mottled pattern occurred during film formation. Moreover, the embedding property at the time of thermocompression bonding of the obtained adhesive film was inferior.
  • the stability of the varnish was also inferior.
  • Comparative Example 3 using a phosphate-based flame retardant instead of the component (E) the obtained adhesive film had poor flame retardancy.
  • Comparative Example 4 using a phosphate ester-based flame retardant instead of the component (E) the obtained adhesive film had poor flame retardancy.
  • Comparative Example 5 in which a phosphate-based flame retardant was used in place of the component (E) and the blending amount of the flame retardant was increased the flame resistance of the obtained adhesive film was excellent. Occasionally mottled patterns occurred.
  • the embedding property at the time of thermocompression bonding of the obtained adhesive film was inferior.
  • the stability of the varnish was also inferior.

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Abstract

The purpose of the present invention is to provide: an adhesive film for electrical/electronic applications and a coverlay film, each of which enables the achievement of a lower dielectric constant and a lower dielectric loss in the frequency range of 1-10 GHz, while having a flame retardancy meeting V-0 or VTM-0 according to UL-94 standard; and a resin composition which is used for the purpose of producing the adhesive film and the coverlay film. The present invention provides a resin composition which is characterized by containing (A) a vinyl compound represented by general formula (1) and having a mass average molecular weight (Mw) of 500-4,000, (B) a thermoplastic elastomer, (C) a thermosetting resin other than the vinyl compound represented by general formula (1), (D) a curing agent and (E) an organic aluminum phosphinate. This resin composition is also characterized in that the component (E) is contained in an amount of 10-50 parts by mass per 100 parts by mass of the total of the component (A), the component (B), the component (C), the component (D) and the component (E).

Description

樹脂組成物、ならびに、それによる接着フィルムおよびカバーレイフィルムResin composition, and adhesive film and coverlay film thereby
 本発明は、樹脂組成物に関する。より具体的には、電気・電子用途の接着フィルムやプリント配線板のカバーレイフィルムに適した樹脂組成物に関する。
 また、本発明は、該樹脂組成物を用いて作成される接着フィルム、および、カバーレイフィルムに関する。
The present invention relates to a resin composition. More specifically, the present invention relates to a resin composition suitable for an adhesive film for electric / electronic use or a coverlay film for a printed wiring board.
Moreover, this invention relates to the adhesive film produced using this resin composition, and a coverlay film.
 近年、電気・電子機器に使用されるプリント配線板は、機器の小型化、軽量化、および、高性能化が進んでおり、特に多層プリント配線板に対し、さらなる高多層化、高密度化、薄型化、軽量化、高信頼性、および、成形加工性等が要求されている。
 また、最近のプリント配線板における伝送信号の高速化要求に伴い、伝送信号の高周波化が顕著に進んでいる。これにより、プリント配線板に使用する材料に対して、高周波領域、具体的には、周波数1~10GHzの領域での電気信号損失を低減できることが求められる。
 プリント配線板の層間接着剤や表面保護膜(すなわち、カバーレイフィルム)として用いる接着フィルムについても、高周波領域で優れた電気特性(低誘電率(ε)、低誘電正接(tanδ))を示すことが求められる。
In recent years, printed wiring boards used in electrical and electronic equipment have been reduced in size, weight, and performance, especially for multilayer printed wiring boards. Thinning, lightening, high reliability, moldability, etc. are required.
In addition, with the recent demand for higher speed transmission signals in printed wiring boards, the frequency of transmission signals has increased significantly. Accordingly, it is required that the electric signal loss in the high frequency region, specifically, the frequency region of 1 to 10 GHz can be reduced with respect to the material used for the printed wiring board.
For adhesive films used as interlayer adhesives and surface protective films (ie, coverlay films) for printed wiring boards, excellent electrical properties (low dielectric constant (ε), low dielectric loss tangent (tan δ)) in the high frequency region Is required.
 上記の用途で用いられる接着フィルムの材料は、本質的に可燃性である為、工業用材料として使用するには一般の化学的、物理的諸特性をバランスよく満足する以外に、火炎に対する安全性、すなわち難燃性を要求される場合が多い。特に家電用途で使用される場合の多くは、「UL94に基づく難燃性がV-0またはVTM-0を満足すること」等の高度な難燃性を要求される。一般的に、接着フィルムのような樹脂材料に難燃性を付与する方法としては、難燃剤としてハロゲン系有機化合物、さらに難燃助剤としてアンチモン化合物を樹脂に添加する方法が挙げられる。 The adhesive film materials used in the above applications are inherently flammable, so that they can be used as industrial materials in addition to satisfying general chemical and physical properties in a well-balanced manner. That is, there are many cases where flame retardancy is required. In many cases, particularly when used in home appliances, a high level of flame retardancy such as “flame retardancy based on UL94 satisfies V-0 or VTM-0” is required. In general, as a method for imparting flame retardancy to a resin material such as an adhesive film, a method of adding a halogen-based organic compound as a flame retardant and further adding an antimony compound as a flame retardant aid to the resin can be mentioned.
 しかしながら、この方法には燃焼時に腐食性のハロゲンガスや猛毒性のダイオキシンを発生する問題がある。そこで近年、これらハロゲン系難燃剤の環境への悪影響を排除する為、ハロゲンを全く含まない、即ちハロゲンフリーの難燃剤を用いることが強く望まれるようになった。 However, this method has a problem of generating corrosive halogen gas and highly toxic dioxin during combustion. Therefore, in recent years, in order to eliminate the adverse effects of these halogen-based flame retardants on the environment, it has been strongly desired to use a halogen-free flame retardant that does not contain halogen at all.
 ハロゲンフリーの難燃処方については、たとえばリン系難燃剤の配合が採用されている。たとえば、本願出願人らによる、特許文献1の段落[0040]には、難燃剤として、トリメチルホスファーレ、トリフェニルホスファーレ、トリクレジルホスファーレ等のリン酸エステルを使用できるとされており、同文献に記載のカバーレイフィルムに難燃剤を含有させる場合の、難燃剤の含有量の範囲が示されている。 For halogen-free flame retardant formulations, for example, a phosphorous flame retardant formulation is employed. For example, in the paragraph [0040] of Patent Document 1 by the present applicants, it is said that phosphate esters such as trimethyl phosphate, triphenyl phosphate, tricresyl phosphate and the like can be used as a flame retardant, The range of the flame retardant content when the flame retardant is contained in the coverlay film described in the document is shown.
特開2011-068713号公報JP 2011-068713 A
 特許文献1に記載のカバーレイフィルムは、フレキシブルプリント配線板への適用を意図したものであり、上記した高度な難燃性、すなわち、「UL94に基づく難燃性がV-0またはVTM-0を満足すること」が要求されるとは記載されていない。
 したがって、特許文献1の段落[0040]に記載の難燃剤の含有量は、「UL94に基づく難燃性がV-0またはVTM-0を満足すること」等の高度な難燃性を達成することを意図したものではない。
 「UL94に基づく難燃性がV-0またはVTM-0を満足すること」等の高度な難燃性を達成するためには、難燃剤の含有量を増加する必要がある。
The cover lay film described in Patent Document 1 is intended for application to a flexible printed wiring board, and has the above-described high flame retardancy, that is, “flame retardancy based on UL94 is V-0 or VTM-0. It is not described that "satisfying" is required.
Therefore, the flame retardant content described in paragraph [0040] of Patent Document 1 achieves a high level of flame retardancy such as “flameability based on UL94 satisfies V-0 or VTM-0”. It is not intended.
In order to achieve high flame retardancy such as “flame retardancy based on UL94 satisfies V-0 or VTM-0”, it is necessary to increase the content of the flame retardant.
 しかしながら、「UL94に基づく難燃性がV-0またはVTM-0を満足すること」等の高度な難燃性を達成可能な量のリン系難燃剤を含有させた場合、周波数1~10GHzの高周波領域における誘電率(ε)、誘電正接(tanδ)が上昇し、高周波領域での電気信号損失が問題となることが明らかになった。 However, when an amount of a phosphorus-based flame retardant capable of achieving a high level of flame retardancy such as “flame retardancy based on UL94 satisfies V-0 or VTM-0” is included, the frequency is 1 to 10 GHz. It has been clarified that the dielectric constant (ε) and dielectric loss tangent (tan δ) in the high frequency region are increased, and electric signal loss in the high frequency region becomes a problem.
 本発明は上記した従来技術の問題点を解決するため、高周波領域、具体的には、周波数1~5GHzの領域での低誘電率化および低誘電損失化を達成することができ、かつ、UL94に基づく難燃性がV-0またはVTM-0を満足することができる電気・電子用途の接着フィルムおよびカバーレイフィルム、ならびに、それらの作成に用いる樹脂組成物を提供することを目的とする。 In order to solve the above-described problems of the prior art, the present invention can achieve low dielectric constant and low dielectric loss in a high frequency region, specifically, a frequency range of 1 to 5 GHz, and UL94 It is an object of the present invention to provide an adhesive film and a coverlay film for electric / electronic applications that can satisfy V-0 or VTM-0, and a resin composition used for producing them.
 上記の目的を達成するため、本発明は、
(A)下記一般式(1)で示される、質量平均分子量(Mw)が500~4000のビニル化合物、
Figure JPOXMLDOC01-appb-C000006
(式中、R1,R2,R3,R4,R5,R6,R7は、同一または異なってもよく、水素原子、ハロゲン原子、アルキル基、ハロゲン化アルキル基またはフェニル基である。-(O-X-O)-は下記構造式(2)で示される。
Figure JPOXMLDOC01-appb-C000007
8,R9,R10,R14,R15は、同一または異なってもよく、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。R11,R12,R13は、同一または異なってもよく、水素原子、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。-(Y-O)-は下記構造式(3)で定義される1種類の構造、または下記構造式(3)で定義される2種類以上の構造がランダムに配列したものである。
Figure JPOXMLDOC01-appb-C000008
16,R17は、同一または異なってもよく、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。R18,R19は、同一または異なってもよく、水素原子、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。Zは、炭素数1以上の有機基であり、酸素原子、窒素原子、硫黄原子、ハロゲン原子を含むこともある。a,bは、少なくともいずれか一方が0でない、0~300の整数を示す。c,dは、0または1の整数を示す。)
(B)熱可塑性エラストマー、
(C)前記一般式(1)で示されるビニル化合物以外の熱硬化性樹脂、
(D)硬化剤、および、
(E)有機ホスフィン酸アルミニウムを含有し、
 前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、および、前記成分(E)の合計100質量部に対し、前記成分(E)を10~50質量部含有することを特徴とする樹脂組成物を提供する。
In order to achieve the above object, the present invention provides:
(A) A vinyl compound having a mass average molecular weight (Mw) of 500 to 4000 represented by the following general formula (1):
Figure JPOXMLDOC01-appb-C000006
(In the formula, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group or a phenyl group. — (O—X—O) — is represented by the following structural formula (2).
Figure JPOXMLDOC01-appb-C000007
R 8 , R 9 , R 10 , R 14 , and R 15 may be the same or different and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. R 11, R 12, R 13 are the same or different, it is a hydrogen atom, a halogen atom or more than 6 alkyl group or a phenyl group having a carbon. -(YO)-is one type of structure defined by the following structural formula (3) or two or more types of structures defined by the following structural formula (3) arranged at random.
Figure JPOXMLDOC01-appb-C000008
R 16 and R 17 may be the same or different and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. R 18 and R 19 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. Z is an organic group having 1 or more carbon atoms, and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom. a and b each represents an integer of 0 to 300, at least one of which is not 0. c and d represent an integer of 0 or 1. )
(B) a thermoplastic elastomer,
(C) a thermosetting resin other than the vinyl compound represented by the general formula (1),
(D) a curing agent, and
(E) containing an organic aluminum phosphinate,
10 to 50 parts by mass of the component (E) with respect to 100 parts by mass in total of the component (A), the component (B), the component (C), the component (D), and the component (E) The resin composition characterized by containing is provided.
 本発明の樹脂組成物において、前記成分(A)の-(O-X-O)-が、下記構造式(4)で示され、前記成分(A)の-(Y-O)-が下記構造式(5)、若しくは、下記構造式(6)で示される構造、または、下記構造式(5)で示される構造および下記構造式(6)で示される構造がランダムに配列した構造を有することが好ましい。
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
In the resin composition of the present invention, — (O—X—O) — of the component (A) is represented by the following structural formula (4), and — (YO) — of the component (A) is Structural formula (5), or a structure represented by the following structural formula (6), or a structure represented by the following structural formula (5) and a structure represented by the following structural formula (6) are randomly arranged. It is preferable.
Figure JPOXMLDOC01-appb-C000009
Figure JPOXMLDOC01-appb-C000010
 本発明の樹脂組成物において、前記成分(A)の-(Y-O)-が前記構造式(6)で示される構造を有することが好ましい。 In the resin composition of the present invention, it is preferable that — (YO) — of the component (A) has a structure represented by the structural formula (6).
 本発明の樹脂組成物において、前記成分(B)の熱可塑性エラストマーが、スチレン-ブタジエンブロック共重合体、スチレン-エチレン/ブチレン-スチレンブロック共重合体、スチレン-イソプレン-スチレンブロック共重合体、ポリブタジエン、および、スチレン-(エチレン-エチレン/プロピレン)-スチレンブロック共重合体からなる群から選択される少なくとも1つであることが好ましい。 In the resin composition of the present invention, the thermoplastic elastomer of component (B) is a styrene-butadiene block copolymer, a styrene-ethylene / butylene-styrene block copolymer, a styrene-isoprene-styrene block copolymer, or a polybutadiene. And at least one selected from the group consisting of styrene- (ethylene-ethylene / propylene) -styrene block copolymers.
 本発明の樹脂組成物において、前記成分(C)の熱硬化性樹脂が、ビフェニル型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、ビスマレイミド、および、カルボジイミドおよびからなる群から選択される少なくとも1つであることが好ましい。 In the resin composition of the present invention, the thermosetting resin of the component (C) is a biphenyl type epoxy resin, a naphthalene type epoxy resin, a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a novolac type epoxy resin, a bismaleimide, And at least one selected from the group consisting of carbodiimide and the like.
 本発明の樹脂組成物において、前記成分(B)の熱可塑性エラストマーの含有量が、前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、および、前記成分(E)の合計100質量部に対し、10~60質量部であることが好ましい。 In the resin composition of the present invention, the content of the thermoplastic elastomer of the component (B) includes the component (A), the component (B), the component (C), the component (D), and the component. The amount is preferably 10 to 60 parts by mass with respect to 100 parts by mass in total of (E).
 本発明の樹脂組成物において、前記成分(C)の熱硬化性樹脂の含有量が、前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、および、前記成分(E)の合計100質量部に対し、0.5~40質量部であることが好ましい。 In the resin composition of the present invention, the content of the thermosetting resin of the component (C) is such that the component (A), the component (B), the component (C), the component (D), and the The amount is preferably 0.5 to 40 parts by mass with respect to 100 parts by mass in total of the component (E).
 本発明の樹脂組成物は、さらに、(F)フィラーを含有してもよい。この場合、前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、前記成分(E)、および、前記成分(F)の合計100質量部に対し、前記成分(F)を10~60質量部含有する。 The resin composition of the present invention may further contain (F) a filler. In this case, the component (A), the component (B), the component (C), the component (D), the component (E), and the component (F) with respect to a total of 100 parts by mass. 10 to 60 parts by mass of (F) is contained.
 本発明の樹脂組成物は、さらに、(G)有機過酸化物を含有してもよい。 The resin composition of the present invention may further contain (G) an organic peroxide.
 本発明の樹脂組成物は、樹脂組成物の硬化物の周波数1~10GHzの領域における、誘電率(ε)が3.0以下であり、誘電正接(tanδ)が0.006以下であることが好ましい。 The resin composition of the present invention has a dielectric constant (ε) of 3.0 or less and a dielectric loss tangent (tan δ) of 0.006 or less in the frequency range of 1 to 10 GHz of the cured product of the resin composition. preferable.
 本発明の樹脂組成物は、UL94に基づく難燃性がV-0またはVTM-0を満足することが好ましい。 The resin composition of the present invention preferably has flame retardancy based on UL94 satisfying V-0 or VTM-0.
 また、本発明は、本発明の樹脂組成物を用いて作成される接着フィルムを提供する。 The present invention also provides an adhesive film produced using the resin composition of the present invention.
 また、本発明は、本発明の樹脂組成物を用いて作成されるカバーレイフィルムを提供する。 The present invention also provides a coverlay film produced using the resin composition of the present invention.
 また、本発明は、本発明の樹脂組成物を含むワニスを提供する。 The present invention also provides a varnish containing the resin composition of the present invention.
 本発明の接着フィルムおよびカバーレイフィルムは、加熱硬化後において、高周波領域で優れた電気特性、具体的には、周波数1~10GHzの領域で低誘電率(ε)、および、低誘電正接(tanδ)を示すので、高周波領域での低誘電率化および低誘電損失化を達成することができ、かつ、UL94に基づく難燃性がV-0またはVTM-0を満足する。
 また、本発明の接着フィルムおよびカバーレイフィルムは、加熱硬化後において、ポリイミド、液晶ポリマー、セラミックなどのプリント配線板に用いられる有機材料または無機材料に対して優れた接着強度を示す。
 また、本発明の接着フィルムおよびカバーレイフィルムは、加熱硬化後において、可撓性に優れているので、フレキシブルプリント配線板用の接着フィルムおよびカバーレイフィルムとして好適である。なお、本発明のフィルムは、加熱硬化前においても可撓性に優れているため、フィルムの加工工程における作業性が良好である。
 本発明の接着フィルムおよびカバーレイフィルムは、本発明の樹脂組成物を用いて作成することができる。
 本発明では、予めフィルムの形態にしたものを用いる代わりに、本発明の樹脂組成物を含むワニスをフィルム形成面に塗布した後、乾燥させてフィルム化させてもよい。
The adhesive film and coverlay film of the present invention have excellent electrical characteristics in a high frequency region after heating and curing, specifically, a low dielectric constant (ε) and a low dielectric loss tangent (tan δ) in a frequency range of 1 to 10 GHz. ), It is possible to achieve low dielectric constant and low dielectric loss in a high frequency region, and flame retardancy based on UL94 satisfies V-0 or VTM-0.
Moreover, the adhesive film and coverlay film of this invention show the adhesive strength outstanding with respect to the organic material or inorganic material used for printed wiring boards, such as a polyimide, a liquid crystal polymer, and a ceramic, after heat-hardening.
Moreover, since the adhesive film and coverlay film of this invention are excellent in flexibility after heat-curing, they are suitable as an adhesive film and coverlay film for flexible printed wiring boards. In addition, since the film of this invention is excellent in flexibility before heat-hardening, the workability | operativity in the processing process of a film is favorable.
The adhesive film and coverlay film of the present invention can be prepared using the resin composition of the present invention.
In the present invention, instead of using a film in advance, a varnish containing the resin composition of the present invention may be applied to the film forming surface and then dried to form a film.
 以下、本発明について詳細に説明する。
 本発明の樹脂組成物は、以下に示す成分(A)~成分(E)を必須成分として含有する。
Hereinafter, the present invention will be described in detail.
The resin composition of the present invention contains the following components (A) to (E) as essential components.
成分(A):下記一般式(1)で示される、質量平均分子量(Mw)が500~4000のビニル化合物
Figure JPOXMLDOC01-appb-C000011
Component (A): Vinyl compound represented by the following general formula (1) and having a mass average molecular weight (Mw) of 500 to 4000
Figure JPOXMLDOC01-appb-C000011
 一般式(1)中、R1,R2,R3,R4,R5,R6,R7は、同一または異なってもよく、水素原子、ハロゲン原子、アルキル基、ハロゲン化アルキル基またはフェニル基である。これらの中でも、R1,R2,R3,R4,R5,R6,R7が水素原子であることが好ましい。
 式中、-(O-X-O)-は下記構造式(2)で示される。
Figure JPOXMLDOC01-appb-C000012
 構造式(2)中、R8,R9,R10,R14,R15は、同一または異なってもよく、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。これらの中でも、R8,R9,R10,R14,R15が炭素数6以下のアルキル基であることが好ましい。
 R11,R12,R13は、同一または異なってもよく、水素原子、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。これらの中でも、R11,R12,R13は、水素原子、ハロゲン原子または炭素数6以下のアルキル基であることが好ましい。
 一般式(1)中、-(Y-O)-は下記構造式(3)で定義される1種類の構造、または下記構造式(3)で定義される2種類以上の構造がランダムに配列したものである。これらの中でも、-(Y-O)-は下記構造式(3)で定義される1種類の構造が配列したものであることが好ましい。
Figure JPOXMLDOC01-appb-C000013
 構造式(3)中、R16,R17は、同一または異なってもよく、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。これらの中でも、R16,R17が炭素数6以下のアルキル基であることが好ましい。
 R18,R19は、同一または異なってもよく、水素原子、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。これらの中でも、R18,R19が水素原子または炭素数3以下のアルキル基であることが好ましい。
 一般式(1)中、Zは、炭素数1以上の有機基であり、酸素原子、窒素原子、硫黄原子、ハロゲン原子を含むこともある。これらの中でも、Zがメチレン基であることが好ましい。
 a,bは、少なくともいずれか一方が0でない、0~300の整数を示す。
 c,dは、0または1の整数を示す。これらの中でも、c,dが1であることが好ましい。
 これらのなかでも好ましくは、R8,R9,R10,R14,R15は炭素数3以下のアルキル基、R11,R12,R13は水素原子または炭素数3以下のアルキル基、R16,R17は炭素数3以下のアルキル基、R18,R19は水素原子である。
In the general formula (1), R 1, R 2, R 3, R 4, R 5, R 6, R 7 are the same or different, a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group, or It is a phenyl group. Among these, R 1, R 2, R 3, R 4, R 5, is preferably R 6, R 7 is a hydrogen atom.
In the formula, — (O—X—O) — is represented by the following structural formula (2).
Figure JPOXMLDOC01-appb-C000012
In the structural formula (2), R 8 , R 9 , R 10 , R 14 , and R 15 may be the same or different, and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. Among these, R 8 , R 9 , R 10 , R 14 , and R 15 are preferably alkyl groups having 6 or less carbon atoms.
R 11 , R 12 and R 13 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. Among these, R 11 , R 12 and R 13 are preferably a hydrogen atom, a halogen atom or an alkyl group having 6 or less carbon atoms.
In the general formula (1),-(YO)-is a random arrangement of one type of structure defined by the following structural formula (3) or two or more types of structures defined by the following structural formula (3) It is a thing. Among these, — (YO) — is preferably an arrangement of one type of structure defined by the following structural formula (3).
Figure JPOXMLDOC01-appb-C000013
In the structural formula (3), R 16 and R 17 may be the same or different, and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. Among these, R 16 and R 17 are preferably alkyl groups having 6 or less carbon atoms.
R 18 and R 19 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. Among these, R 18 and R 19 are preferably a hydrogen atom or an alkyl group having 3 or less carbon atoms.
In general formula (1), Z is an organic group having 1 or more carbon atoms and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom. Among these, it is preferable that Z is a methylene group.
a and b each represents an integer of 0 to 300, at least one of which is not 0.
c and d represent an integer of 0 or 1. Among these, c and d are preferably 1.
Preferably Among these, R 8, R 9, R 10, R 14, R 15 is alkyl group having 3 or less carbon atoms, R 11, R 12, R 13 is a hydrogen atom or alkyl group having 3 or less carbon atoms, R 16 and R 17 are alkyl groups having 3 or less carbon atoms, and R 18 and R 19 are hydrogen atoms.
 また、上記一般式(1)中の-(O-X-O)-は、下記構造式(4)で示されることが好ましい。
Figure JPOXMLDOC01-appb-C000014
 また、一般式(1)中の-(Y-O)-が下記構造式(5)、若しくは、下記構造式(6)で示される構造、または、下記構造式(5)で示される構造および下記構造式(6)で示される構造がランダムに配列した構造を有することが好ましい。これらの中でも、-(Y-O)-は下記構造式(6)で定義される構造が配列した構造を有することが好ましい。
Figure JPOXMLDOC01-appb-C000015
In addition, — (O—X—O) — in the general formula (1) is preferably represented by the following structural formula (4).
Figure JPOXMLDOC01-appb-C000014
In the general formula (1), — (Y—O) — represents the structure represented by the following structural formula (5), the following structural formula (6), the structure represented by the following structural formula (5), and It is preferable to have a structure in which the structure represented by the following structural formula (6) is randomly arranged. Among these,-(YO)-preferably has a structure in which structures defined by the following structural formula (6) are arranged.
Figure JPOXMLDOC01-appb-C000015
 本発明の樹脂組成物において、成分(A)は該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの熱硬化性、耐熱性、および、高周波での優れた電気特性、すなわち、周波数1~10GHzの領域での低誘電率(ε)、および、低誘電正接(tanδ)に寄与する。
 また、成分(A)は、後述する成分(B)~成分(E)の相溶化剤として作用する。
In the resin composition of the present invention, the component (A) is the thermosetting property, heat resistance, and excellent electrical properties at high frequencies of the adhesive film and coverlay film prepared using the resin composition, that is, the frequency. This contributes to a low dielectric constant (ε) and a low dielectric loss tangent (tan δ) in the region of 1 to 10 GHz.
In addition, component (A) acts as a compatibilizer for components (B) to (E) described below.
 本発明の樹脂組成物において、成分(A)として、一般式(1)で示されるビニル化合物のうち、質量平均分子量(Mw)が500~4000のものを用いる理由は以下の通り。
 質量平均分子量(Mw)が500未満だと、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの柔軟性がなくなり、もろく割れやすいフィルムになる。また、熱圧着時や加熱硬化時に溶融粘度が低下しすぎるため、フィルムの膜厚の均一性が損なわれるおそれがある。
 一方、質量平均分子量(Mw)が4000超だと、溶解性が低下するため、樹脂組成物の調製時に問題となる。具体的には、樹脂組成物を溶剤で希釈したワニスの調製時に熱トルエン中での長時間の混合溶解が必要となる。また、フィルムを作成するためにワニスを室温に戻すと再結晶し始め、ワニスの保存安定性が悪くなる。また、フィルム化後に結晶化するため、フィルムとしての形状の維持が難しくなる。このため、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムが割れやすくなる。また、薄膜のフィルムを作成することができなくなる。さらにまた、フィルム表面の平滑性が悪化する。
 成分(A)として、一般式(1)で示されるビニル化合物のうち、質量平均分子量(Mw)が800~3500のものを用いることが好ましく、1000~3000のものを用いることがより好ましい。
In the resin composition of the present invention, as the component (A), among the vinyl compounds represented by the general formula (1), those having a mass average molecular weight (Mw) of 500 to 4000 are used as follows.
When the mass average molecular weight (Mw) is less than 500, the flexibility of the adhesive film and coverlay film prepared using the resin composition is lost, and the film becomes brittle and easily broken. In addition, since the melt viscosity is too low during thermocompression bonding or heat curing, the film thickness uniformity may be impaired.
On the other hand, when the mass average molecular weight (Mw) exceeds 4000, the solubility is lowered, which causes a problem when preparing the resin composition. Specifically, long-time mixing and dissolution in hot toluene is required when preparing a varnish obtained by diluting a resin composition with a solvent. Further, when the varnish is returned to room temperature to form a film, recrystallization starts and the storage stability of the varnish is deteriorated. Moreover, since it crystallizes after film formation, it becomes difficult to maintain the shape as a film. For this reason, the adhesive film and coverlay film created using this resin composition are easily broken. Moreover, it becomes impossible to produce a thin film. Furthermore, the smoothness of the film surface is deteriorated.
As the component (A), among the vinyl compounds represented by the general formula (1), those having a mass average molecular weight (Mw) of 800 to 3500 are preferably used, and those having 1000 to 3000 are more preferably used.
 上記一般式(1)で表されるビニル化合物の製法は、特に限定されず、いかなる方法で製造してもよい。例えば、下記一般式(7)で示される化合物に対してクロロメチルスチレンを水酸化ナトリウム、炭酸カリウム、ナトリウムエトキサイド等のアルカリ触媒存在下で、必要に応じてベンジルトリn-ブチルアンモニウムブロマイド、18-クラウン-6-エーテル等の相間移動触媒を用いて反応させることにより得ることができる。
Figure JPOXMLDOC01-appb-C000016
 一般式(7)中の-(O-X-O)、および、-(Y-O)-については、一般式(1)について上述した通りである。
The method for producing the vinyl compound represented by the general formula (1) is not particularly limited, and may be produced by any method. For example, chloromethylstyrene is added to a compound represented by the following general formula (7) in the presence of an alkali catalyst such as sodium hydroxide, potassium carbonate, sodium ethoxide, and the like, if necessary, benzyltri n-butylammonium bromide, 18- It can be obtained by reacting with a phase transfer catalyst such as crown-6-ether.
Figure JPOXMLDOC01-appb-C000016
In formula (7), — (O—X—O) and — (Y—O) — are as described above for formula (1).
成分(B):熱可塑性エラストマー
 本発明の樹脂組成物において、成分(B)は特に該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの高周波での優れた電気特性(周波数1~10GHzの領域での低誘電率(ε)、および、低誘電正接(tanδ))、フィルム性状、および、耐熱性に寄与する。
Component (B): Thermoplastic Elastomer In the resin composition of the present invention, component (B) is an excellent electrical property (frequency 1 to frequency) of an adhesive film and a coverlay film prepared using the resin composition. This contributes to low dielectric constant (ε) and low dielectric loss tangent (tan δ), film properties, and heat resistance in the 10 GHz region.
 本発明の樹脂組成物において、成分(B)のエラストマーとしては、スチレン-ブタジエンブロック共重合体、スチレン-エチレン/ブチレン-スチレンブロック共重合体、スチレン-イソプレン-スチレンブロック共重合体、ポリブタジエン、および、スチレン-(エチレン-エチレン/プロピレン)-スチレンブロック共重合体からなる群から選択される少なくとも1つを用いることができる。これらのうち、いずれか1種のみを用いてもよく、2種以上を用いてもよい。
 これらのうち、いずれを用いるかは、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムに付与する特性に応じて適宜選択することができる。
 例えば、スチレン-エチレン/ブチレン-スチレンブロック共重合体は、-エチレン/ブチレン-の部分の結晶性が高いため耐熱性が高く、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムに耐熱性を付与するうえで好ましい。
 一方、スチレン-(エチレン-エチレン/プロピレン)-スチレンブロック共重合体は、-(エチレン-エチレン/プロピレン)-の部分の結晶性が、スチレン-エチレン/ブチレン-スチレンブロック共重合体の対応する部分(-エチレン/ブチレン-の部分)に比べて低いため、スチレン-エチレン/ブチレン-スチレンブロック共重合体に比べて基材に対する接着強度が高い。
 また、スチレンーブタジエンブロック共重合体は、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの弾性率が低くなり、かつ、フィルムの熱圧着時において、被接着面に存在する凹凸の埋め込み性がよいため、該フィルムの接着強度が高くなる。また、フィルムの硬化後の柔軟性も優れる。
In the resin composition of the present invention, as the elastomer of component (B), styrene-butadiene block copolymer, styrene-ethylene / butylene-styrene block copolymer, styrene-isoprene-styrene block copolymer, polybutadiene, and , At least one selected from the group consisting of styrene- (ethylene-ethylene / propylene) -styrene block copolymers can be used. Among these, only any 1 type may be used and 2 or more types may be used.
Which of these is used can be appropriately selected depending on the properties to be imparted to the adhesive film and the coverlay film produced using the resin composition.
For example, a styrene-ethylene / butylene-styrene block copolymer has high heat resistance due to high crystallinity of the portion of -ethylene / butylene-, and is used as an adhesive film and a coverlay film formed using the resin composition. It is preferable for imparting heat resistance.
On the other hand, the styrene- (ethylene-ethylene / propylene) -styrene block copolymer has a crystallinity of the-(ethylene-ethylene / propylene)-moiety corresponding to that of the styrene-ethylene / butylene-styrene block copolymer. Since it is lower than (the ethylene / butylene portion), the adhesive strength to the substrate is higher than that of the styrene-ethylene / butylene-styrene block copolymer.
In addition, the styrene-butadiene block copolymer has a low elastic modulus of an adhesive film and a coverlay film prepared using the resin composition, and unevenness present on the adherend surface during thermocompression bonding of the film. Therefore, the adhesive strength of the film is increased. Moreover, the flexibility after curing of the film is also excellent.
 本発明の樹脂組成物において、成分(B)の含有量は、成分(A)~成分(E)の合計100質量部に対し、10~60質量部であることが好ましい。
 成分(B)の含有量が10質量部未満だと、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムのフィルム性状、具体的には、フィルム単体での耐折性に劣る。また、熱圧着時のしみ出し量が大きくなり、フィルムの厚さが不均一になりやすい。
 一方、成分(B)の含有量の60質量部超だと、樹脂組成物の他の成分、特に、成分(A)の含有量が少なくなることから、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの耐熱性が低下する。また、樹脂組成物の他の成分との相溶性が低下するので、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの組成が不均一になり、接着フィルムおよびカバーレイフィルムの接着性や機械的強度が低下する。
 本発明の樹脂組成物において、成分(B)の含有量は、成分(A)~成分(E)の合計100質量部に対し、12~55質量部であることがより好ましく、13~45質量部であることがさらに好ましい。
In the resin composition of the present invention, the content of the component (B) is preferably 10 to 60 parts by mass with respect to 100 parts by mass in total of the components (A) to (E).
When the content of the component (B) is less than 10 parts by mass, the film properties of the adhesive film and coverlay film prepared using the resin composition, specifically, the folding resistance of the film alone is inferior. In addition, the amount of seepage during thermocompression increases, and the film thickness tends to be uneven.
On the other hand, if the content of the component (B) exceeds 60 parts by mass, the content of other components of the resin composition, in particular, the component (A) is reduced, so that the resin composition is used. The heat resistance of the adhesive film and the coverlay film is lowered. In addition, since the compatibility with the other components of the resin composition is reduced, the composition of the adhesive film and cover lay film prepared using the resin composition becomes non-uniform, and the adhesive film and cover lay film are bonded. Property and mechanical strength are reduced.
In the resin composition of the present invention, the content of the component (B) is more preferably 12 to 55 parts by mass, and 13 to 45 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). More preferably, it is a part.
成分(C):上記一般式(1)で示されるビニル化合物以外の熱硬化性樹脂
 本発明の樹脂組成物において、成分(C)は該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの熱硬化性、および、接着性に寄与する。
Component (C): Thermosetting resin other than the vinyl compound represented by the general formula (1) In the resin composition of the present invention, the component (C) is an adhesive film and a coverlay prepared using the resin composition. Contributes to the thermosetting and adhesive properties of the film.
 成分(C)として使用する熱硬化性樹脂は、成分(A)として上記一般式(1)で示されるビニル化合物以外の熱硬化性樹脂であれば特に限定されない。
 成分(C)として使用する熱硬化性樹脂としては、ビフェニル型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、ビスマレイミド、および、カルボジイミドおよびからなる群から選択される少なくとも1つを用いることができる。
 なお、上記の熱硬化性樹脂のうち、いずれか1種を使用してもよく、2種以上を併用してもよい。
 これらのうち、いずれを用いるかは、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムに付与する特性に応じて適宜選択することができる。
 ビフェニル型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂といったエポキシ樹脂は、樹脂組成物の他の成分との相溶性に優れ、また、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムが耐湿信頼性に優れる。上記のエポキシ樹脂の中では、樹脂自体の誘電特性が比較的良いため、ビフェニル型エポキシ樹脂がより好ましい。
 また、ビスマレイミドを使用した場合、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの硬化後の線膨張係数が低くなる。
The thermosetting resin used as the component (C) is not particularly limited as long as it is a thermosetting resin other than the vinyl compound represented by the general formula (1) as the component (A).
The thermosetting resin used as the component (C) includes biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, bismaleimide, and carbodiimide. At least one selected from the group can be used.
In addition, among said thermosetting resin, any 1 type may be used and 2 or more types may be used together.
Which of these is used can be appropriately selected depending on the properties to be imparted to the adhesive film and the coverlay film produced using the resin composition.
Epoxy resins such as biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, and novolak type epoxy resin are excellent in compatibility with other components of the resin composition, and the resin composition An adhesive film and a cover lay film produced using a product are excellent in moisture resistance reliability. Among the above epoxy resins, a biphenyl type epoxy resin is more preferable because the dielectric property of the resin itself is relatively good.
Moreover, when bismaleimide is used, the linear expansion coefficient after hardening of the adhesive film and coverlay film which are created using this resin composition becomes low.
 本発明の樹脂組成物において、成分(C)の熱硬化性樹脂の含有量が、成分(A)~成分(E)の合計100質量部に対し、0.5~40質量部であることが好ましい。
 成分(C)の含有量が0.5質量部未満だと、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの接着性が不十分となる等の問題がある。
 成分(C)の含有量が40質量部超だと、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの熱圧着時のしみ出し量が過剰に大きくなる。また、全成分中に占める成分(C)の割合が多くなるため、耐熱性に劣る成分(C)の特性が、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルム全体に影響する。そのため、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの耐熱性や硬化性が低下するおそれがある。
 本発明の樹脂組成物において、成分(C)の含有量は、成分(A)~成分(E)の合計100質量部に対し、1.0~30質量部であることがより好ましく、1.5~15質量部であることがさらに好ましい。
In the resin composition of the present invention, the content of the thermosetting resin of component (C) is 0.5 to 40 parts by mass with respect to 100 parts by mass in total of components (A) to (E). preferable.
When content of a component (C) is less than 0.5 mass part, there exists a problem that the adhesiveness of the adhesive film and coverlay film which are created using this resin composition becomes inadequate.
When the content of the component (C) is more than 40 parts by mass, the amount of oozing during thermocompression bonding of the adhesive film and coverlay film prepared using the resin composition becomes excessively large. Moreover, since the ratio of the component (C) in all the components increases, the properties of the component (C) inferior in heat resistance affect the entire adhesive film and coverlay film formed using the resin composition. . Therefore, there exists a possibility that the heat resistance and sclerosis | hardenability of the adhesive film and coverlay film which are created using this resin composition may fall.
In the resin composition of the present invention, the content of component (C) is more preferably 1.0 to 30 parts by mass with respect to 100 parts by mass in total of components (A) to (E). More preferably, it is 5 to 15 parts by mass.
 成分(C)として使用する熱硬化性樹脂が、ビフェニル型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、または、カルボジイミドの場合、数平均分子量(Mn)が150~2500であることが該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの熱硬化性、接着性、硬化後の機械的特性の理由から好ましい。
 成分(C)として使用する熱硬化性樹脂が、ビスマレイミドの場合、数平均分子量(Mn)が150~3500であることが該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの熱硬化性、接着性、硬化後の機械的特性の理由から好ましい。
When the thermosetting resin used as component (C) is biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, or carbodiimide, the number average molecular weight ( Mn) is preferably from 150 to 2500 for reasons of thermosetting, adhesiveness, and post-curing mechanical properties of the adhesive film and coverlay film prepared using the resin composition.
When the thermosetting resin used as the component (C) is bismaleimide, the number average molecular weight (Mn) is 150 to 3500. The heat of the adhesive film and coverlay film prepared using the resin composition It is preferable for reasons of curability, adhesiveness, and mechanical properties after curing.
成分(D):硬化剤
 本発明の樹脂組成物は、成分(D)として硬化剤を有効量含有する。
 成分(D)として使用する硬化剤は特に限定されない。(D)成分としては、フェノール系硬化剤、アミン系硬化剤、イミダゾール系硬化剤、および、酸無水物系硬化剤からなる群から選択される少なくとも1種の硬化剤を用いることが好ましい。
Component (D): Curing Agent The resin composition of the present invention contains an effective amount of a curing agent as the component (D).
The curing agent used as component (D) is not particularly limited. As the component (D), it is preferable to use at least one curing agent selected from the group consisting of a phenolic curing agent, an amine curing agent, an imidazole curing agent, and an acid anhydride curing agent.
 フェノール系硬化剤の具体例としては、フェノール性水酸基を有するモノマー、オリゴマー、ポリマー全般を指し、例えば、フェノールノボラック樹脂、クレゾールノボラック樹脂、フェノールアラルキル(フェニレン、ビフェニレン骨格を含む)樹脂、ナフトールアラルキル樹脂、トリフェノールメタン樹脂、ジシクロペンタジエン型フェノール樹脂等が挙げられる。 Specific examples of the phenol-based curing agent include monomers, oligomers, and polymers in general having a phenolic hydroxyl group. Examples thereof include triphenol methane resin and dicyclopentadiene type phenol resin.
 アミン系硬化剤の具体例としては、2,4-ジアミノ-6-〔2’―メチルイミダゾリル-(1’)〕エチル-s-トリアジン等のトリアジン化合物、1,8-ジアザビシクロ[5,4,0]ウンデセン-7(DBU)、トリエチレンジアミン、ベンジルジメチルアミン、トリエタノールアミン等の第三級アミン化合物が挙げられる。中でも、2,4-ジアミノ-6-〔2’―メチルイミダゾリル-(1’)〕エチル-s-トリアジンが好ましい。 Specific examples of the amine curing agent include triazine compounds such as 2,4-diamino-6- [2′-methylimidazolyl- (1 ′)] ethyl-s-triazine, 1,8-diazabicyclo [5,4, 0] tertiary amine compounds such as undecene-7 (DBU), triethylenediamine, benzyldimethylamine, triethanolamine and the like. Of these, 2,4-diamino-6- [2'-methylimidazolyl- (1 ')] ethyl-s-triazine is preferred.
 イミダゾール系硬化剤としては、2-メチルイミダゾール、2-ウンデシルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-エチル-4-メチルイミダゾール、1-シアノエチル-2-エチル-4-イミダゾール、2-フェニルイミダゾール、2-フェニル-4-メチルイミダゾール等のイミダゾール化合物が挙げられる。中でも、2-エチル-4-メチルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾール、および、1-シアノエチル-2-エチル-4-イミダゾールが好ましい。 Examples of imidazole curing agents include 2-methylimidazole, 2-undecylimidazole, 1-cyanoethyl-2-undecylimidazole, 2-heptadecylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-ethyl. Examples thereof include imidazole compounds such as -4-imidazole, 2-phenylimidazole, and 2-phenyl-4-methylimidazole. Of these, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, and 1-cyanoethyl-2-ethyl-4-imidazole are preferable.
 酸無水物系硬化剤の具体例としては、無水フタル酸、無水マレイン酸、ドデセニル無水コハク酸、無水トリメリット酸、ベンゾフェノンテトラカルバン酸二無水物、テトラヒドロ無水フタル酸、ヘキサヒドロ無水フタル酸が挙げられる。 Specific examples of the acid anhydride-based curing agent include phthalic anhydride, maleic anhydride, dodecenyl succinic anhydride, trimellitic anhydride, benzophenone tetracarbanoic dianhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride. .
 なお、上記の硬化剤のうち、いずれか1種を使用してもよく、2種以上を併用してもよい。
 これらの中でも、イミダゾール系硬化剤が、添加量が少なくても効果を発揮するなどの理由から好ましく、特に、2-フェニル-4,5ジヒドロキシメチルイミダゾールが、樹脂組成物を溶剤で希釈したワニスのポットライフや、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムのシェルフライフが向上することから好ましい。
In addition, any 1 type may be used among said hardening | curing agents, and 2 or more types may be used together.
Among these, an imidazole-based curing agent is preferable because it exhibits an effect even if the addition amount is small. In particular, 2-phenyl-4,5 dihydroxymethylimidazole is a varnish obtained by diluting a resin composition with a solvent. It is preferable because the pot life and the shelf life of the adhesive film and coverlay film produced using the resin composition are improved.
 硬化剤の有効量は硬化剤の種類によって異なる。硬化剤の種類ごとに、その有効量を以下に示す。
 フェノール系硬化剤の場合、その有効量は、成分(A)~成分(E)の合計100質量部に対し、1~10質量部であることがより好ましく、1~5質量部であることがさらに好ましい。
 アミン系硬化剤の場合、その有効量は、成分(A)~成分(E)の合計100質量部に対し、1~10質量部であることがより好ましく、1~3質量部であることがさらに好ましい。
 イミダゾール系硬化剤の場合、その有効量は、成分(A)~成分(E)の合計100質量部に対し、0.1~5質量部であることがより好ましく、0.2~3質量部であることがさらに好ましい。
 酸無水物系エポキシ硬化剤の場合、その有効量は、成分(A)~成分(E)の合計100質量部に対し、1~10質量部であることがより好ましく、1~5質量部であることがさらに好ましい。
 また、フェノール系硬化剤、アミン系硬化剤、イミダゾール系硬化剤、酸無水物系硬化剤のうち、2種以上を併用する場合、個々のエポキシ硬化剤が上記の有効量になるように添加する。
The effective amount of the curing agent varies depending on the type of the curing agent. The effective amount for each type of curing agent is shown below.
In the case of a phenolic curing agent, the effective amount is more preferably 1 to 10 parts by mass, and more preferably 1 to 5 parts by mass with respect to 100 parts by mass in total of components (A) to (E). Further preferred.
In the case of an amine-based curing agent, the effective amount is more preferably 1 to 10 parts by mass, and more preferably 1 to 3 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). Further preferred.
In the case of an imidazole-based curing agent, the effective amount is more preferably 0.1 to 5 parts by mass, and 0.2 to 3 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). More preferably.
In the case of an acid anhydride type epoxy curing agent, the effective amount is more preferably 1 to 10 parts by mass with respect to 100 parts by mass in total of components (A) to (E), preferably 1 to 5 parts by mass. More preferably it is.
Moreover, when using together 2 or more types among phenol type hardening | curing agents, amine type hardening | curing agents, imidazole type hardening | curing agents, and acid anhydride type hardening | curing agents, it adds so that each epoxy hardening | curing agent may become said effective amount. .
成分(E):有機ホスフィン酸アルミニウム
 本発明の樹脂組成物において、成分(E)は該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの難燃性に寄与する。
 成分(E)として用いる有機ホスフィン酸アルミニウムは下記一般式で表される。
Figure JPOXMLDOC01-appb-C000017
 上記一般式中、R1およびR2は同一でも異なってもよく、炭素数1~6のアルキル基、フェニル基またはナフチル基を示す。アルキル基は直鎖状でも分岐状でも環状でもよい。好ましくは炭素数1~3のアルキル基であり、より好ましくはエチル基である。
 成分(E)として用いる有機ホスフィン酸アルミニウムは、ジアルキルホスフィン酸アルミニウムであることが好ましく、ジエチルホスフィン酸アルミニウムであることがより好ましい。
Component (E): Aluminum organophosphinate In the resin composition of the present invention, component (E) contributes to the flame retardancy of an adhesive film and a coverlay film prepared using the resin composition.
The organic aluminum phosphinate used as the component (E) is represented by the following general formula.
Figure JPOXMLDOC01-appb-C000017
In the above general formula, R 1 and R 2 may be the same or different and each represents an alkyl group having 1 to 6 carbon atoms, a phenyl group or a naphthyl group. The alkyl group may be linear, branched or cyclic. An alkyl group having 1 to 3 carbon atoms is preferable, and an ethyl group is more preferable.
The organic aluminum phosphinate used as component (E) is preferably aluminum dialkylphosphinate, more preferably aluminum diethylphosphinate.
 本発明の樹脂組成物は、成分(E)として有機ホスフィン酸アルミニウムを用いることにより、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムが、UL94に基づく難燃性がV-0またはVTM-0を満足する。
 難燃剤として、有機ホスフィン酸アルミニウムを用いた場合に、UL94に基づく難燃性がV-0またはVTM-0を満足することは、特開2009-179774号、特開2011-225883号にも記載されている。
 しかしながら、前者の場合、高周波領域での電気信号損失は問題視されておらず、高周波領域での電気特性は全く検討されていなかった。一方、後者の場合、1GHz以上の周波数における比誘電率が2.9以下の樹脂を含むため、樹脂組成物の1GHz以上の周波数における比誘電率を3.0以下にすることができるが、使用する1GHz以上の周波数における比誘電率が2.9以下の樹脂の質量平均分子量(Mw)が、1,000~300,000と高いため、接着フィルムやカバーレイフィルム用の樹脂組成物として使用した場合、溶解性が低下するため、樹脂組成物の調製時に問題となる。具体的には、樹脂組成物を溶剤で希釈したワニスの調製時に熱トルエン中での長時間の混合溶解が必要となる。また、フィルムを作成するためにワニスを室温に戻すと再結晶し始め、ワニスの保存安定性が悪くなる。また、フィルム化後に結晶化するため、フィルムとしての形状の維持が難しくなる。このため、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムが割れやすくなる。また、薄膜のフィルムを作成することができなくなる。さらにまた、フィルム表面の平滑性が悪化する。
The resin composition of the present invention uses an organoaluminum phosphinate as the component (E), so that an adhesive film and a coverlay film prepared using the resin composition have a flame retardancy based on UL94 of V-0. Or, VTM-0 is satisfied.
It is also described in JP-A-2009-179774 and JP-A-2011-225883 that, when an organic phosphinate aluminum is used as a flame retardant, flame retardancy based on UL94 satisfies V-0 or VTM-0. Has been.
However, in the former case, the electric signal loss in the high frequency region is not regarded as a problem, and the electrical characteristics in the high frequency region have not been studied at all. On the other hand, in the latter case, since the relative dielectric constant at a frequency of 1 GHz or higher includes a resin having a relative dielectric constant of 2.9 or lower, the relative dielectric constant of the resin composition at a frequency of 1 GHz or higher can be 3.0 or lower. Since the mass average molecular weight (Mw) of the resin having a relative dielectric constant of 2.9 or less at a frequency of 1 GHz or higher is as high as 1,000 to 300,000, it was used as a resin composition for adhesive films and coverlay films. In this case, the solubility is lowered, which causes a problem when preparing the resin composition. Specifically, long-time mixing and dissolution in hot toluene is required when preparing a varnish obtained by diluting a resin composition with a solvent. Further, when the varnish is returned to room temperature to form a film, recrystallization starts and the storage stability of the varnish is deteriorated. Moreover, since it crystallizes after film formation, it becomes difficult to maintain the shape as a film. For this reason, the adhesive film and coverlay film created using this resin composition are easily broken. Moreover, it becomes impossible to produce a thin film. Furthermore, the smoothness of the film surface is deteriorated.
 本発明の樹脂組成物において、成分(A)~成分(E)の合計100質量部に対し、成分(E)を10~50質量部含有する。
 成分(E)の含有量が10質量部未満だと、該樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの難燃性が低下し、UL94に基づく難燃性がV-0またはVTM-0を満足しない。
 成分(E)の含有量が50質量部超だと、該樹脂組成物を用いて接着フィルムおよびカバーレイフィルムを作成する際にフィルム化できなくなる。
 本発明の樹脂組成物において、成分(A)~成分(E)の合計100質量部に対し、成分(E)を15~48質量部含有することが好ましく、18~45質量部含有することがより好ましい。
The resin composition of the present invention contains 10 to 50 parts by mass of the component (E) with respect to 100 parts by mass in total of the components (A) to (E).
When the content of the component (E) is less than 10 parts by mass, the flame retardancy of the adhesive film and coverlay film prepared using the resin composition is lowered, and the flame retardancy based on UL94 is V-0 or Not satisfied with VTM-0.
When the content of the component (E) exceeds 50 parts by mass, it becomes impossible to form a film when an adhesive film and a coverlay film are produced using the resin composition.
In the resin composition of the present invention, the component (E) is preferably contained in an amount of 15 to 48 parts by mass, more preferably 18 to 45 parts by mass with respect to 100 parts by mass in total of the components (A) to (E). More preferred.
 本発明の樹脂組成物は、成分(A)~成分(E)に加えて、以下の成分(F)、成分(G)を必要に応じて含有してもよい。 The resin composition of the present invention may contain the following components (F) and (G) as necessary in addition to the components (A) to (E).
成分(F):フィラー
 本発明の樹脂組成物は、上記成分(A)~成分(E)に加えて、成分(F)としてフィラーを含有してもよい。
 成分(F)として、フィラーを含有させることで、本発明の樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムに、所望のレオロジー特性、電気的特性、または、物理的特性、あるいはその両方を付与することができる。成分(F)として用いるフィラーは、本発明の樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの用途に応じて適宜選択されるが、例えば、熱伝導性物質、不要輻射吸収性物質、セラミック誘電体物質などが挙げられる。
Component (F): Filler The resin composition of the present invention may contain a filler as the component (F) in addition to the components (A) to (E).
By including a filler as the component (F), the adhesive film and coverlay film prepared using the resin composition of the present invention can have desired rheological properties, electrical properties, or physical properties, or Both can be granted. The filler used as the component (F) is appropriately selected according to the use of the adhesive film and the coverlay film prepared using the resin composition of the present invention. For example, a thermally conductive substance, an unnecessary radiation absorbing substance And ceramic dielectric materials.
 熱伝導性物質としては、例えば、酸化アルミニウム、二酸化ケイ素などの酸化物、窒化アルミニウム、窒化ホウ素などの窒化物が挙げられる。
 不要輻射吸収物質としては、例えば、フェライトなどの酸化鉄が挙げられる。
 セラミック誘電体物質としては、例えば、チタン酸バリウム、酸化チタンなどが挙げられる。
Examples of the thermally conductive substance include oxides such as aluminum oxide and silicon dioxide, and nitrides such as aluminum nitride and boron nitride.
Examples of the unnecessary radiation absorbing material include iron oxides such as ferrite.
Examples of the ceramic dielectric material include barium titanate and titanium oxide.
 成分(F)としてフィラーを含有させる場合、本発明の樹脂組成物への含有量は、所望の特性を発揮させるのに必要な量であって、かつ、フィルム形成が可能な量であれば、特に制限されるものではないが、成分(A)、成分(B)、成分(C)、成分(D)、成分(E)、および、成分(F)の合計100質量部に対して、10~60質量部であることが、樹脂組成物に対する分散性や樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの加工性の点から好ましく、20~55質量部であることがより好ましく、25~50質量部であることがさらに好ましい。 When the filler is contained as the component (F), the content of the resin composition of the present invention is an amount necessary for exhibiting desired characteristics and an amount capable of forming a film. Although it does not restrict | limit in particular, it is 10 with respect to a total of 100 mass parts of a component (A), a component (B), a component (C), a component (D), a component (E), and a component (F). It is preferably from 60 parts by mass from the viewpoint of dispersibility in the resin composition and processability of an adhesive film and a coverlay film prepared using the resin composition, and more preferably from 20 to 55 parts by mass. More preferably, it is 25 to 50 parts by mass.
 また、成分(F)としてフィラーを含有させる場合、その形状は特に限定されず、例えば、粒状、粉末状、りん片状等であってよいが、その平均粒径(粒状以外の場合、その平均最大径)が0.5μm以下であることが、樹脂組成物に対する分散性や樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの加工性の点から好ましい。 Moreover, when a filler is contained as the component (F), the shape is not particularly limited, and may be, for example, granular, powdery, flake shaped, etc. The maximum diameter) is preferably 0.5 μm or less from the viewpoint of dispersibility with respect to the resin composition and workability of an adhesive film and a coverlay film prepared using the resin composition.
 また、成分(F)としてフィラーを含有させる場合、必要に応じて表面処理を施したフィラーを用いてもよい。このようなフィラーの具体例としては、粒子表面に酸化皮膜を形成させたものが挙げられる。 In addition, when a filler is included as the component (F), a filler that has been subjected to a surface treatment as necessary may be used. Specific examples of such a filler include those in which an oxide film is formed on the particle surface.
成分(G):有機過酸化物
 本発明の樹脂組成物は、上記成分(A)~成分(E)(成分(F)を含むこともある)に加えて、成分(G)として有機過酸化物を含有してもよい。
 成分(G)として、有機過酸化物を含有させることで、本発明の樹脂組成物を用いて作成される接着フィルムおよびカバーレイフィルムの加熱硬化時において、成分(A)として用いるビニル化合物の反応が促進される。
Component (G): Organic Peroxide The resin composition of the present invention comprises an organic peroxide as component (G) in addition to the above components (A) to (E) (may contain component (F)). You may contain a thing.
Reaction of the vinyl compound used as the component (A) at the time of heat curing of the adhesive film and coverlay film prepared using the resin composition of the present invention by containing an organic peroxide as the component (G) Is promoted.
 成分(G)の有機過酸化物としては、ベンゾイルパーオキサイド、イソブチリルパーオキサイド、イソノナノイルパーオキサイド、デカノイルパーオキサイド、ラウロイルパーオキサイド、パラクロロベンゾイルパーオキサイド、ジ(3,5,5-トリメチルヘキサノイル)パーオキシドなどのジアシルパーオキサイド類;2,2-ジ(4,4-ジ-(ジ-tert-ブチルパーオキシ)シクロヘキシル)プロパンなどのパーオキシケタール類;イソプロピルパージカーボネート、ジ-sec-ブチルパージカーボネート、ジ-2-エチルヘキシルパージカーボネート、ジ-1-メチルヘプチルパージカーボネート、ジ-3-メトキシブチルパージカーボネート、ジシクロヘキシルパージカーボネートなどのパーオキシジカーボネート類;tert-ブチルパーベンゾエート、tert-ブチルパーアセテート、tert-ブチルパー-2-エチルへキサノエート、tert-ブチルパーイソブチレート、tert-ブチルパーピバレート、tert-ブチルジパーアジペート、キュミルパーネオデカノエート、tert-ブチルパーオキシベンゾエート、2,5-ジメチル-2,5ジ(ベンゾイルパーオキシ)ヘキサンなどのパーオキシエステル類;メチルエチルケトンパーオキサイド、シクロヘキサノンパーオキサイドなどのケトンパーオキサイド類;ジ-tert-ブチルパーオキサイド、ジキュミルパーオキサイド、tert-ブチルキュミルパーオキサイド、1,1-ジ(t-ヘキシルパーオキシ)-3,3,5-トリメチルシクロヘキサン、ジ-tert-ヘキシルパーオキサイド、ジ(2-tert-ブチルパーオキシイソプロピル)ベンゼンなどのジアルキルパーオキサイド類;キュメンヒドロキシパーオキサイド、tert-ブチルハイドロパーオキサイド、p-メンタハイドロパーオキサイドなどのハイドロパーオキサイド類等を使用することができる。これらの中でも、tert-ブチルパーオキシベンゾエートが、活性温度が最適であること、すなわち、フィルム化の乾燥工程の60~120℃の温度域や、接着フィルムやカバーレイフィルムの転写時の80℃前後の温度域では活性化せず、接着フィルムやカバーレイフィルムの加熱硬化時の180~210℃の温度域で活性化すること、および、接着フィルムやカバーレイフィルムのシェルフライフが良好であることから好ましい。 The organic peroxide of component (G) includes benzoyl peroxide, isobutyryl peroxide, isononanoyl peroxide, decanoyl peroxide, lauroyl peroxide, parachlorobenzoyl peroxide, di (3,5,5- Diacyl peroxides such as trimethylhexanoyl) peroxide; peroxyketals such as 2,2-di (4,4-di- (di-tert-butylperoxy) cyclohexyl) propane; isopropyl purge carbonate, di-sec Peroxydicarbonates such as butyl purge carbonate, di-2-ethylhexyl purge carbonate, di-1-methylheptyl purge carbonate, di-3-methoxybutyl purge carbonate, dicyclohexyl purge carbonate; tert-butyl perbenzoate, tert-butyl peracetate, tert-butyl per-2-ethylhexanoate, tert-butyl perisobutyrate, tert-butyl perpivalate, tert-butyl diperadipate, cumyl perneodecano Peroxyesters such as acrylate, tert-butylperoxybenzoate, 2,5-dimethyl-2,5di (benzoylperoxy) hexane; ketone peroxides such as methyl ethyl ketone peroxide and cyclohexanone peroxide; di-tert- Butyl peroxide, dicumyl peroxide, tert-butyl cumyl peroxide, 1,1-di (t-hexylperoxy) -3,3,5-trimethylcyclohexane, di-tert-hexyl Dialkyl peroxides such as oxyoxide and di (2-tert-butylperoxyisopropyl) benzene; hydroperoxides such as cumene hydroxy peroxide, tert-butyl hydroperoxide, p-menta hydroperoxide, etc. Can do. Among these, tert-butyl peroxybenzoate has an optimum activation temperature, that is, a temperature range of 60 to 120 ° C. in the drying process of film formation, and around 80 ° C. at the time of transfer of an adhesive film or a coverlay film. It is not activated in the above temperature range, but it is activated in the temperature range of 180 to 210 ° C. during the heat curing of the adhesive film or coverlay film, and the shelf life of the adhesive film or coverlay film is good. preferable.
 成分(G)として有機過酸化物を含有させる場合、本発明の樹脂組成物への含有量は、成分(A)、成分(B)、成分(C)、成分(D)、成分(E)、(含有する場合は(F)成分)、および、成分(G)の合計100質量部に対し、5質量部以下であることが好ましく、3質量部以下であることがより好ましく、0.1~1質量部であることがさらに好ましい。 When an organic peroxide is contained as the component (G), the content in the resin composition of the present invention is as follows: Component (A), Component (B), Component (C), Component (D), Component (E) , (If included, component (F)) and 100 parts by mass of component (G), preferably 5 parts by mass or less, more preferably 3 parts by mass or less, More preferably, it is ˜1 part by mass.
 本発明の樹脂組成物は、上記成分(A)~成分(G)以外の成分を必要に応じて含有してもよい。このような成分の具体例としては、シランカップリング剤、消泡剤、流動調整剤、成膜補助剤、分散剤等が挙げられる。 The resin composition of the present invention may contain components other than the above components (A) to (G) as necessary. Specific examples of such components include silane coupling agents, antifoaming agents, flow control agents, film forming aids, dispersants, and the like.
 本発明の樹脂組成物は、慣用の方法により製造することができる。例えば、溶剤の存在下または非存在下で、上記成分(A)~成分(E)(樹脂組成物が上記成分(F),(G)や他の任意成分を含有する場合はさらにこれらの任意成分)を加熱真空混合ニーダーにより混合する。
 上記成分(A)~成分(E)が所望の含有割合となるように、(樹脂組成物が上記成分(F),(G)や他の任意成分を含有する場合はさらにこれらの任意成分)、所定の溶剤濃度に溶解し、それらを10~80℃に加温された反応釜に所定量投入し、回転数100~1000rpmで回転させながら、常圧混合を3時間行った後、真空下(最大1Torr)でさらに30~60分混合攪拌することができる。
The resin composition of the present invention can be produced by a conventional method. For example, in the presence or absence of a solvent, the above components (A) to (E) (if the resin composition contains the above components (F), (G) and other optional components, these optional Ingredients) are mixed with a heating vacuum mixing kneader.
(If the resin composition contains the above components (F), (G) and other optional components, these optional components) so that the above components (A) to (E) have a desired content ratio , Dissolved in a predetermined solvent concentration, put them in a reaction kettle heated to 10 to 80 ° C., mixed at atmospheric pressure for 3 hours while rotating at a rotational speed of 100 to 1000 rpm, The mixture can be further stirred for 30 to 60 minutes at (maximum 1 Torr).
 本発明の接着フィルムおよびカバーレイフィルムは、本発明の樹脂組成物から公知の方法により得ることができる。例えば、本発明の樹脂組成物を溶剤で希釈してワニスとし、これを支持体の少なくとも片面に塗布し、乾燥させた後、支持体付のフィルム、または、支持体から剥離したフィルムとして提供することができる。 The adhesive film and coverlay film of the present invention can be obtained from the resin composition of the present invention by a known method. For example, the resin composition of the present invention is diluted with a solvent to obtain a varnish, which is applied to at least one side of a support and dried, and then provided as a film with a support or a film peeled from the support. be able to.
 ワニスとして使用可能な溶剤としては、メチルエチルケトン、メチルイソブチルケトン等のケトン類;トルエン、キシレン等の芳香族溶剤;ジオクチルフタレート、ジブチルフタレート等の高沸点溶剤等が挙げられる。溶剤の使用量は特に限定されず、従来から使用されている量とすることができるが、好ましくは、固形分に対して20~90質量%である。 Examples of the solvent that can be used as the varnish include ketones such as methyl ethyl ketone and methyl isobutyl ketone; aromatic solvents such as toluene and xylene; high-boiling solvents such as dioctyl phthalate and dibutyl phthalate. The amount of the solvent used is not particularly limited and may be a conventionally used amount, but is preferably 20 to 90% by mass with respect to the solid content.
 支持体は、フィルムの製造方法における所望の形態により適宜選択され、特に限定されないが、例えば、銅、アルミニウム等の金属箔、ポリエステル、ポリエチレン等の樹脂のキャリアフィルム等が挙げられる。本発明の接着フィルムを、支持体から剥離したフィルムの形態として提供する場合、支持体は、シリコーン化合物等で離型処理されていることが好ましい。 The support is appropriately selected depending on the desired form in the film production method, and is not particularly limited. Examples thereof include metal foils such as copper and aluminum, and carrier films of resins such as polyester and polyethylene. When providing the adhesive film of this invention as a form of the film peeled from the support body, it is preferable that the support body is mold-release-processed with the silicone compound etc.
 ワニスを塗布する方法は、特に限定されないが、例えば、スロットダイ方式、グラビア方式、ドクターコーター方式等が挙げられ、所望のフィルムの厚みなどに応じて適宜選択されるが、特に、グラビア方式がフィルムの厚みを薄く設計しうることから好ましい。塗布は、乾燥後に形成されるフィルムの厚みが、所望の厚みになるように行われる。このような厚みは、当業者であれば、溶剤含有量から導くことができる。 The method for applying the varnish is not particularly limited, and examples thereof include a slot die method, a gravure method, a doctor coater method, and the like, which are appropriately selected according to a desired film thickness and the like. This is preferable because it can be designed to be thin. Application | coating is performed so that the thickness of the film formed after drying may turn into desired thickness. Such a thickness can be derived from the solvent content by those skilled in the art.
 本発明の接着フィルムおよびカバーレイフィルムの厚みは、用途に応じて要求される機械的強度などの特性に基づいて適宜設計されるが、一般に1~100μmであり、薄膜化が要求される場合、1~30μmであることが好ましい。 The thickness of the adhesive film and cover lay film of the present invention is appropriately designed based on characteristics such as mechanical strength required according to the application, but is generally 1 to 100 μm, and when thinning is required, It is preferably 1 to 30 μm.
 乾燥の条件は、ワニスに使用される溶剤の種類や量、ワニスの使用量や塗布の厚みなどに応じて適宜設計され、特に限定されるものではないが、例えば、60~120℃であり、大気圧下で行うことができる。 The drying conditions are appropriately designed according to the type and amount of the solvent used in the varnish, the amount of varnish used and the thickness of the coating, and are not particularly limited, but are, for example, 60 to 120 ° C., It can be performed under atmospheric pressure.
 使用前の本発明の接着フィルムおよびカバーレイフィルムは、異物が付着することを防止するため、保護フィルムではさんだ状態で保管される。保護フィルムとしては、基材として記載したものを用いることができる。 The adhesive film and coverlay film of the present invention before use are stored in a state of being sandwiched between protective films in order to prevent foreign matter from adhering. As a protective film, what was described as a base material can be used.
 本発明の接着フィルムの使用手順は以下の通り。
 本発明の接着フィルムを用いて接着する対象物のうち、一方の対象物の被接着面に本発明の接着フィルムを載置した後、もう一方の対象物をその被接着面が接着フィルムの露出面と接するように載置する。ここで、支持体付の接着フィルムを用いる場合、接着フィルムの露出面が一方の対象物の被接着面に接するように接着フィルムを載置して、被着面上に該接着フィルムを転写する。ここで、転写時の温度は例えば80℃とすることができる。
 次に、転写時に支持体を剥離することによって露出した接着フィルムの面上にもう一方の対象物をその被接着面が接着フィルムの露出面と接するように載置する。これらの手順を実施した後、所定温度及び所定時間熱圧着させ、その後、加熱硬化させる。
 熱圧着時の温度は好ましくは100~200℃である。熱圧着の時間は好ましくは0.5~10分である。
 加熱硬化の温度は、好ましくは180~210℃である。加熱硬化時間は、好ましくは30~120分である。
 本発明のカバーレイフィルムの使用手順も基本的に同様であり、本発明のカバーレイフィルムを、プリント配線板の所定の位置、すなわち、カバーレイフィルムで被覆する位置に載置した後、所定温度及び所定時間熱圧着させ、その後、加熱硬化させればよい。
 また、予めフィルム化したものを使用する代わりに、本発明の樹脂組成物を溶剤で希釈したワニスを、一方の接着対象物の被接着面(カバーレイフィルムの場合、フィルムで被覆する位置)に塗布し、乾燥させた後に、上記した一方の対象物を載置する手順(カバーレイフィルムの場合、熱圧着)を実施してもよい。
The procedure for using the adhesive film of the present invention is as follows.
Among objects to be bonded using the adhesive film of the present invention, after the adhesive film of the present invention is placed on the surface to be bonded of one object, the other surface is exposed to the adhesive film. Place it in contact with the surface. Here, when using an adhesive film with a support, the adhesive film is placed so that the exposed surface of the adhesive film is in contact with the adherend surface of one object, and the adhesive film is transferred onto the adherend surface. . Here, the temperature at the time of transfer can be set to 80 ° C., for example.
Next, the other object is placed on the surface of the adhesive film exposed by peeling the support during transfer so that the surface to be bonded is in contact with the exposed surface of the adhesive film. After performing these procedures, thermocompression bonding is performed for a predetermined temperature and for a predetermined time, and then heat-cured.
The temperature during thermocompression bonding is preferably 100 to 200 ° C. The time for thermocompression bonding is preferably 0.5 to 10 minutes.
The temperature for heat curing is preferably 180 to 210 ° C. The heat curing time is preferably 30 to 120 minutes.
The procedure for using the coverlay film of the present invention is basically the same. After the coverlay film of the present invention is placed at a predetermined position on the printed wiring board, that is, at a position covered with the coverlay film, a predetermined temperature is set. Then, it may be heat-pressed for a predetermined time, and then heat-cured.
Moreover, instead of using what was previously filmed, a varnish obtained by diluting the resin composition of the present invention with a solvent is applied to the surface to be bonded (position to be covered with a film in the case of a coverlay film). After applying and drying, the above-described procedure of placing one object (in the case of a coverlay film, thermocompression bonding) may be performed.
 以下、本発明の接着フィルムおよびカバーレイフィルムの特性について述べる。 Hereinafter, the characteristics of the adhesive film and coverlay film of the present invention will be described.
 本発明の接着フィルムおよびカバーレイフィルムは、加熱硬化後において、高周波での電気特性に優れている。具体的には、加熱硬化後のカバーレイフィルムは、周波数1~10GHzの領域での誘電率(ε)が3.0以下であることが好ましく、2.5以下であることがより好ましい。また、周波数1~10GHzの領域での誘電正接(tanδ)が0.01以下であることがより好ましく、0.0025以下であることがより好ましい。
 周波数1~10GHzの領域での誘電率(ε)および誘電正接(tanδ)が上記の範囲であることにより、周波数1~10GHzの領域での電気信号損失を低減することができる。
The adhesive film and coverlay film of the present invention are excellent in high frequency electrical characteristics after heat curing. Specifically, the heat-cured coverlay film preferably has a dielectric constant (ε) of 3.0 or less, more preferably 2.5 or less, in a frequency range of 1 to 10 GHz. Further, the dielectric loss tangent (tan δ) in the frequency region of 1 to 10 GHz is more preferably 0.01 or less, and more preferably 0.0025 or less.
When the dielectric constant (ε) and dielectric loss tangent (tan δ) in the frequency range of 1 to 10 GHz are in the above ranges, the electric signal loss in the frequency range of 1 to 10 GHz can be reduced.
 本発明の接着フィルムおよびカバーレイフィルムは、加熱硬化後において、十分な接着強度を有している。具体的には、加熱硬化後の接着フィルムおよびカバーレイフィルムは、JIS C6471に準拠して測定した銅箔粗化面に対するピール強度(180度ピール)が5N/cm以上あることが好ましく、より好ましくは8N/cm以上あり、さらに好ましくは10N/cm以上である。 The adhesive film and coverlay film of the present invention have sufficient adhesive strength after heat curing. Specifically, the adhesive film and the coverlay film after heat curing preferably have a peel strength (180 degree peel) with respect to the roughened surface of the copper foil measured in accordance with JIS C6471 of 5 N / cm or more, more preferably. Is 8 N / cm or more, more preferably 10 N / cm or more.
 本発明の接着フィルムおよびカバーレイフィルムは、加熱硬化後において、十分な難燃性を有している。具体的には、加熱硬化後の接着フィルムおよびカバーレイフィルムは、UL94Vの難燃性規格に準拠して実施される難燃性試験において、難燃性クラスV-0で合格することが好ましい。また、加熱硬化後の接着フィルムおよびカバーレイフィルムは、UL94VTMの難燃性規格に準拠して実施される難燃性試験において、難燃性クラスVTM-0で合格することが好ましい。 The adhesive film and coverlay film of the present invention have sufficient flame retardancy after heat curing. Specifically, it is preferable that the adhesive film and the coverlay film after heat curing pass with a flame retardancy class V-0 in a flame retardancy test performed in accordance with the flame retardancy standard of UL94V. Moreover, it is preferable that the adhesive film and coverlay film after heat curing pass with the flame retardancy class VTM-0 in the flame retardancy test conducted in accordance with the flame retardancy standard of UL94VTM.
 以下、実施例により、本発明を詳細に説明するが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in detail by way of examples, but the present invention is not limited thereto.
(実施例1~12、比較例1~6)
 各成分を下記表に示す配合割合(質量部)になるように計量配合した後、トルエンを加え、80℃に加温された反応釜に投入し、回転数150rpmで回転させながら、常圧混合を3時間行った。
 このようにして得られた樹脂組成物を含むワニスを、基材(離型処理をほどこしたPETフィルム)の片面に塗布し、100℃で乾燥させることにより、支持体付の接着フィルムを得た。
 表中の略号はそれぞれ以下を表わす。
成分(A)
OPE2200:オリゴフェニレンエーテル(上記一般式(1)で示されるビニル化合物)(Mn=2200)、三菱ガス化学株式会社製
成分(A´)
S202A:変性ポリフェニレンエーテル(Mn=16000)、旭化成ケミカルズ株式会社製
成分(B)
SEPTON8007:スチレン-エチレン/ブチレンブロック共重合体、株式会社クラレ製
SEPTON4044:スチレン-(エチレン-エチレン/プロピレン)-スチレンブロック共重合体、株式会社クラレ製
TR2003:スチレン-ブタジエン-スチレンブロック共重合体、JSR株式会社製
PB810:ポリブタジエン、JSR株式会社製
成分(C)
NC3000H:ビフェニル型エポキシ樹脂、日本化薬株式会社製
828:ビスフェノールA型エポキシ樹脂、三菱化学株式会社製
HP4032D:ナフタレンノボラック型エポキシ樹脂、DIC株式会社製
BMI-70:ビスマレイミド、ケイ・アイ化成株式会社製
V-03:カルボジイミド、日清紡績株式会社製
成分(D)
2E4MZ:2-エチル-4-メチルイミダゾール、四国化成工業株式会社製
2PHZ-PW:2-フェニル-4,5-ジヒドロキシメチルイミダゾール、四国化成工業株式会社製
成分(E)
OP935:有機ホスフィン酸アルミニウム、クラリアントジャパン株式会社製
成分(E´)
FP2200:リン酸塩系難燃剤、株式会社ADEKA製
PX-200:リン酸エステル系難燃剤、大八化学工業製
成分(F)
SE2050:シリカフィラー、株式会社アドマテックス
成分(G)
パーブチルZ:tert-ブチルパーオキシベンゾエート、日油株式会社
その他の成分
KBM403:シランカップリング剤、信越化学工業株式会社製
DISPERBYK2009:分散剤、ビックケミー・ジャパン株式会社製
(Examples 1 to 12, Comparative Examples 1 to 6)
Mix each component so that the blending ratio (parts by mass) shown in the table below is met, add toluene, put into a reaction kettle heated to 80 ° C., and mix at normal pressure while rotating at 150 rpm. For 3 hours.
The varnish containing the resin composition thus obtained was applied to one side of a base material (PET film subjected to release treatment) and dried at 100 ° C. to obtain an adhesive film with a support. .
The abbreviations in the table represent the following.
Ingredient (A)
OPE2200: Oligophenylene ether (vinyl compound represented by the above general formula (1)) (Mn = 2200), manufactured by Mitsubishi Gas Chemical Co., Ltd.
Ingredient (A ')
S202A: Modified polyphenylene ether (Mn = 16000), manufactured by Asahi Kasei Chemicals Corporation
Ingredient (B)
SEPTON 8007: Styrene-ethylene / butylene block copolymer, Kuraray Co., Ltd. SEPTON 4044: Styrene- (ethylene-ethylene / propylene) -styrene block copolymer, Kuraray Co., Ltd. TR2003: Styrene-butadiene-styrene block copolymer, PSR810 manufactured by JSR Corporation: Polybutadiene, manufactured by JSR Corporation
Ingredient (C)
NC3000H: Biphenyl type epoxy resin, Nippon Kayaku Co., Ltd. 828: Bisphenol A type epoxy resin, Mitsubishi Chemical Corporation HP4032D: Naphthalene novolac type epoxy resin, DIC Corporation BMI-70: Bismaleimide, Kay Kasei Co., Ltd. Company V-03: Carbodiimide, Nisshinbo Industries, Ltd.
Ingredient (D)
2E4MZ: 2-ethyl-4-methylimidazole, manufactured by Shikoku Chemicals Co., Ltd. 2PHZ-PW: 2-phenyl-4,5-dihydroxymethylimidazole, manufactured by Shikoku Chemicals Co., Ltd.
Ingredient (E)
OP935: Aluminum organophosphinate, manufactured by Clariant Japan
Ingredient (E ')
FP2200: Phosphate flame retardant, ADEKA Corporation PX-200: Phosphate ester flame retardant, manufactured by Daihachi Chemical Industry
Ingredient (F)
SE2050: Silica filler, Admatechs Co., Ltd.
Ingredient (G)
Perbutyl Z: tert-butyl peroxybenzoate, NOF Corporation
Other components KBM403: Silane coupling agent, Shin-Etsu Chemical Co., Ltd. DISPERBYK2009: Dispersant, manufactured by Big Chemie Japan
 作成した接着フィルムについて以下の評価を実施した。 The following evaluation was performed on the created adhesive film.
誘電率(ε)、誘電正接(tanδ):接着フィルムを180℃で加熱硬化させ、支持体から剥離した後、該接着フィルムから試験片(40±0.5mm×100±2mm)を切り出し、厚みを測定した。試験片を長さ100mm、直径2mm以下の筒状に丸めて、空洞共振器摂動法(10GHz)にて、誘電率(ε)および誘電正接(tanδ)を測定した。 Dielectric constant (ε), dielectric loss tangent (tan δ): After the adhesive film was cured by heating at 180 ° C. and peeled from the support, a test piece (40 ± 0.5 mm × 100 ± 2 mm) was cut out from the adhesive film, and the thickness Was measured. The test piece was rolled into a cylindrical shape having a length of 100 mm and a diameter of 2 mm or less, and a dielectric constant (ε) and a dielectric loss tangent (tan δ) were measured by a cavity resonator perturbation method (10 GHz).
ガラス転移点Tg:動的粘弾性測定(DMA)にて測定した。接着フィルムを180℃で加熱硬化させ、支持体から剥離した後、該接着フィルムから試験片(10±0.5mm×40±1mm)を切り出し、試験片の幅、厚みを測定した。その後、DMS6100にて測定を行った(3℃/min 25-220℃)。tanDのピーク温度を読み取り、Tgとした。 Glass transition point Tg: measured by dynamic viscoelasticity measurement (DMA). After the adhesive film was heat-cured at 180 ° C. and peeled from the support, a test piece (10 ± 0.5 mm × 40 ± 1 mm) was cut out from the adhesive film, and the width and thickness of the test piece were measured. Thereafter, measurement was performed with DMS6100 (3 ° C./min 25-220 ° C.). The peak temperature of tanD was read and used as Tg.
ピール強度:接着フィルムの両面に、粗化面を内側にして銅箔を貼りあわせ、プレス機で熱圧着させた(180℃60min、10kgf)。この試験片を10mm幅にカットし、オートグラフで引きはがし、ピール強度を測定した。測定結果について、各N=5の平均値を計算した。 Peel strength: A copper foil was bonded to both surfaces of the adhesive film with the roughened surface inside, and thermocompression bonded with a press machine (180 ° C. 60 min, 10 kgf). This test piece was cut into a width of 10 mm, peeled off by an autograph, and peel strength was measured. About the measurement result, the average value of each N = 5 was calculated.
線膨張係数:熱分析装置(TMA)にて測定した。接着フィルムを180℃で加熱硬化させ、支持体から剥離した後、該接着フィルムから試験片(5±0.5mm×20±1mm)を切り出しTMA4000Sにて測定を行った(5℃/min 25-230℃)。90-100℃のC.T.Eの平均をα1、170-180℃のC.T.Eの平均をα2とした。 Linear expansion coefficient: Measured with a thermal analyzer (TMA). After the adhesive film was heat-cured at 180 ° C. and peeled off from the support, a test piece (5 ± 0.5 mm × 20 ± 1 mm) was cut out from the adhesive film and measured with TMA4000S (5 ° C./min 25− 230 ° C.). 90-100 ° C. C.I. T.A. The average of E was α1, C.C. T.A. The average of E was α2.
難燃性評価:接着フィルムを180℃で加熱硬化させ、支持体から剥離した後、該接着フィルムから試験片(50±0.5mm×200±0.5mm)を切り出し、厚みを測定した。試験片を長さ200mm、直径約15mmの筒状に丸めてスタンドに固定した。ガスバーナーの炎を高さ約20mmに調整し、フィルムの下端に3sec接炎後、燃焼時間を測定した。1サンプルにつき3回接炎を繰返した。
 各燃焼時間が10sec以下であり、3回の合計燃焼時間が30sec以下のものを合格と判断した。各N=3で試験を行い、すべて合格したものをVTM-0相当とした。
Flame retardancy evaluation: After the adhesive film was heat-cured at 180 ° C. and peeled from the support, a test piece (50 ± 0.5 mm × 200 ± 0.5 mm) was cut out from the adhesive film, and the thickness was measured. The test piece was rolled into a cylindrical shape having a length of 200 mm and a diameter of about 15 mm and fixed to a stand. The flame of the gas burner was adjusted to a height of about 20 mm, and after burning for 3 seconds at the lower end of the film, the burning time was measured. The flame contact was repeated 3 times per sample.
Each combustion time was 10 sec or less, and those having a total combustion time of 3 times of 30 sec or less were judged to be acceptable. Tests were performed at each N = 3, and all passed were regarded as equivalent to VTM-0.
ワニス安定性:上記の手順で得られた樹脂組成物を含むワニスをガラス瓶に密閉して25℃で静置し、溶液の安定性を確認した。結晶、沈殿物の発生、溶液の分離等が起こるまでの日数を比較し、1週間以上安定なものを○、3日程度のものを△とした。 Varnish stability: The varnish containing the resin composition obtained by the above procedure was sealed in a glass bottle and allowed to stand at 25 ° C., and the stability of the solution was confirmed. The number of days until the generation of crystals, precipitates, separation of the solution, etc. were compared, and those that were stable for one week or more were marked with ◯ and those with about 3 days were marked with Δ.
溶解性:上記の手順で得られた樹脂組成物を含むワニスを、常温で放置し、樹脂組成物の成分が再結晶しなかったものを○、再結晶したものを×と評価した。 Solubility: The varnish containing the resin composition obtained by the above procedure was allowed to stand at room temperature. The resin composition components were not recrystallized.
埋め込み性:表面にパターン形成された基板(L/S=30/30μm、配線高さ20μm)にフィルムを加熱ラミネートし、パターン間の凹凸を埋め込むことができるか、確認した。問題なく埋め込みできたものを○、一部不十分だったものは△、埋め込みできなかったものは×とした。 Embedding property: A film was heated and laminated on a substrate (L / S = 30/30 μm, wiring height 20 μm) patterned on the surface, and it was confirmed whether the unevenness between patterns could be embedded. Those that could be embedded without problems were marked with ◯, those that were partially insufficient were marked with △, and those that could not be embedded were marked with ×.
フィルム化:上記の手順で支持体付の接着フィルムを作成した際に、均一なフィルムが得られたものを○、混合物の均一化が図れないため、フィルム化時にまだら模様が発生したり、割れが発生してフィルム化できなかったものを×とした。 Filming: When an adhesive film with a support is created using the above procedure, a uniform film is obtained. ○ The mixture cannot be homogenized, causing mottled patterns or cracks during filming. Was generated and could not be formed into a film.
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000018
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000019
Figure JPOXMLDOC01-appb-T000020
Figure JPOXMLDOC01-appb-T000020
 実施例1~12では、均一な接着フィルムが得られ、熱圧着時の埋め込み性が優れていた。また、接着フィルムが、加熱硬化後において、高周波領域の電気特性(誘電率ε、誘電正接Tanδ)、ピール強度、難燃性のいずれも優れていた。また、ワニスの溶解性および安定性も優れていた。
 (E)成分の含有量が10質量部未満の比較例1では、得られた接着フィルムの難燃性が劣っていた。
 (E)成分の含有量が50質量部超の比較例2では、フィルム化時にまだら模様が発生した。また、得られた接着フィルムの熱圧着時の埋め込み性が劣っていた。また、ワニスの安定性も劣っていた。
 (E)成分の代わりに、リン酸塩系の難燃剤を使用した比較例3では、得られた接着フィルムの難燃性が劣っていた。
 (E)成分の代わりに、リン酸エステル系の難燃剤を使用した比較例4では、得られた接着フィルムの難燃性が劣っていた。
 (E)成分の代わりに、リン酸塩系の難燃剤を使用し、該難燃剤の配合量を増やした比較例5では、得られた接着フィルムの難燃性は優れていたが、フィルム化時にまだら模様が発生した。また、得られた接着フィルムの熱圧着時の埋め込み性が劣っていた。また、ワニスの安定性も劣っていた。
 (A)成分として、質量平均分子量(Mw)が4000超のポリフェニレンエーテルを使用した比較例6では、上記の手順で得られた樹脂組成物を含むワニスを常温で放置した際に、樹脂組成物の成分が再結晶してしまい、フィルム化することができなかった。
In Examples 1 to 12, a uniform adhesive film was obtained, and the embedding property at the time of thermocompression bonding was excellent. Further, the adhesive film was excellent in all of the high frequency electric characteristics (dielectric constant ε, dielectric loss tangent Tan δ), peel strength, and flame retardancy after heat curing. Moreover, the solubility and stability of the varnish were also excellent.
In Comparative Example 1 in which the content of the component (E) is less than 10 parts by mass, the flame resistance of the obtained adhesive film was inferior.
In Comparative Example 2 in which the content of the component (E) exceeds 50 parts by mass, a mottled pattern occurred during film formation. Moreover, the embedding property at the time of thermocompression bonding of the obtained adhesive film was inferior. Moreover, the stability of the varnish was also inferior.
In Comparative Example 3 using a phosphate-based flame retardant instead of the component (E), the obtained adhesive film had poor flame retardancy.
In Comparative Example 4 using a phosphate ester-based flame retardant instead of the component (E), the obtained adhesive film had poor flame retardancy.
In Comparative Example 5 in which a phosphate-based flame retardant was used in place of the component (E) and the blending amount of the flame retardant was increased, the flame resistance of the obtained adhesive film was excellent. Occasionally mottled patterns occurred. Moreover, the embedding property at the time of thermocompression bonding of the obtained adhesive film was inferior. Moreover, the stability of the varnish was also inferior.
In Comparative Example 6 using a polyphenylene ether having a mass average molecular weight (Mw) of more than 4000 as the component (A), when the varnish containing the resin composition obtained by the above procedure was left at room temperature, the resin composition This component was recrystallized and could not be formed into a film.

Claims (14)

  1. (A)下記一般式(1)で示される質量平均分子量(Mw)が500~4000のビニル化合物、
    Figure JPOXMLDOC01-appb-C000001
    (式中、R1,R2,R3,R4,R5,R6,R7は、同一または異なってもよく、水素原子、ハロゲン原子、アルキル基、ハロゲン化アルキル基またはフェニル基である。-(O-X-O)-は下記構造式(2)で示される。
    Figure JPOXMLDOC01-appb-C000002
    8,R9,R10,R14,R15は、同一または異なってもよく、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。R11,R12,R13は、同一または異なってもよく、水素原子、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。-(Y-O)-は下記構造式(3)で定義される1種類の構造、または下記構造式(3)で定義される2種類以上の構造がランダムに配列したものである。
    Figure JPOXMLDOC01-appb-C000003
    16,R17は、同一または異なってもよく、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。R18,R19は、同一または異なってもよく、水素原子、ハロゲン原子または炭素数6以下のアルキル基またはフェニル基である。Zは、炭素数1以上の有機基であり、酸素原子、窒素原子、硫黄原子、ハロゲン原子を含むこともある。a,bは、少なくともいずれか一方が0でない、0~300の整数を示す。c,dは、0または1の整数を示す。)
    (B)熱可塑性エラストマー、
    (C)前記一般式(1)で示されるビニル化合物以外の熱硬化性樹脂、
    (D)硬化剤、および、
    (E)有機ホスフィン酸アルミニウムを含有し、
     前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、および、前記成分(E)の合計100質量部に対し、前記成分(E)を10~50質量部含有することを特徴とする樹脂組成物。
    (A) a vinyl compound having a mass average molecular weight (Mw) of 500 to 4000 represented by the following general formula (1):
    Figure JPOXMLDOC01-appb-C000001
    (In the formula, R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 may be the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, a halogenated alkyl group or a phenyl group. — (O—X—O) — is represented by the following structural formula (2).
    Figure JPOXMLDOC01-appb-C000002
    R 8 , R 9 , R 10 , R 14 , and R 15 may be the same or different and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. R 11 , R 12 and R 13 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. -(YO)-is one type of structure defined by the following structural formula (3) or two or more types of structures defined by the following structural formula (3) arranged at random.
    Figure JPOXMLDOC01-appb-C000003
    R 16 and R 17 may be the same or different and are a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. R 18 and R 19 may be the same or different and are a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms, or a phenyl group. Z is an organic group having 1 or more carbon atoms, and may contain an oxygen atom, a nitrogen atom, a sulfur atom, or a halogen atom. a and b each represents an integer of 0 to 300, at least one of which is not 0. c and d represent an integer of 0 or 1. )
    (B) a thermoplastic elastomer,
    (C) a thermosetting resin other than the vinyl compound represented by the general formula (1),
    (D) a curing agent, and
    (E) containing an organic aluminum phosphinate,
    10 to 50 parts by mass of the component (E) with respect to 100 parts by mass in total of the component (A), the component (B), the component (C), the component (D), and the component (E) A resin composition characterized by containing.
  2.  前記成分(A)の-(O-X-O)-が、下記構造式(4)で示され、前記成分(A)の-(Y-O)-が下記構造式(5)、若しくは、下記構造式(6)で示される構造、または、下記構造式(5)で示される構造および下記構造式(6)で示される構造がランダムに配列した構造を有する請求項1に記載の樹脂組成物。
    Figure JPOXMLDOC01-appb-C000004
    Figure JPOXMLDOC01-appb-C000005
    In the component (A), — (O—X—O) — is represented by the following structural formula (4), and — (YO) — in the component (A) is represented by the following structural formula (5), or The resin composition according to claim 1, which has a structure represented by the following structural formula (6), or a structure in which the structure represented by the following structural formula (5) and the structure represented by the following structural formula (6) are randomly arranged. object.
    Figure JPOXMLDOC01-appb-C000004
    Figure JPOXMLDOC01-appb-C000005
  3.  前記成分(A)の-(Y-O)-が、前記構造式(6)で示される構造を有する請求項2に記載の樹脂組成物。 3. The resin composition according to claim 2, wherein — (YO) — of the component (A) has a structure represented by the structural formula (6).
  4.  前記成分(B)の熱可塑性エラストマーが、スチレン-ブタジエンブロック共重合体、スチレン-エチレン/ブチレン-スチレンブロック共重合体、スチレン-イソプレン-スチレンブロック共重合体、ポリブタジエン、および、スチレン-(エチレン-エチレン/プロピレン)-スチレンブロック共重合体からなる群から選択される少なくとも1つである、請求項1~3のいずれかに記載の樹脂組成物。 The thermoplastic elastomer of component (B) is a styrene-butadiene block copolymer, a styrene-ethylene / butylene-styrene block copolymer, a styrene-isoprene-styrene block copolymer, polybutadiene, and styrene- (ethylene- The resin composition according to any one of claims 1 to 3, which is at least one selected from the group consisting of (ethylene / propylene) -styrene block copolymers.
  5.  前記成分(C)の熱硬化性樹脂が、ビフェニル型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、ビスマレイミド、および、カルボジイミドおよびからなる群から選択される少なくとも1つである、請求項1~4のいずれかに記載の樹脂組成物。 The thermosetting resin of the component (C) is selected from the group consisting of biphenyl type epoxy resin, naphthalene type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolac type epoxy resin, bismaleimide, and carbodiimide. The resin composition according to any one of claims 1 to 4, which is at least one selected.
  6.  前記成分(B)の熱可塑性エラストマーの含有量が、前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、および、前記成分(E)の合計100質量部に対し、10~60質量部である、請求項1~5のいずれかに記載の樹脂組成物。 The content of the thermoplastic elastomer of the component (B) is 100 parts by mass in total of the component (A), the component (B), the component (C), the component (D), and the component (E). The resin composition according to any one of claims 1 to 5, wherein the amount is 10 to 60 parts by mass.
  7.  前記成分(C)の熱硬化性樹脂の含有量が、前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、および、前記成分(E)の合計100質量部に対し、0.5~40質量部である、請求項1~6のいずれかに記載の樹脂組成物。 The content of the thermosetting resin of the component (C) is a total of 100 masses of the component (A), the component (B), the component (C), the component (D), and the component (E). The resin composition according to any one of claims 1 to 6, which is 0.5 to 40 parts by mass with respect to parts.
  8.  さらに、(F)フィラーを、前記成分(A)、前記成分(B)、前記成分(C)、前記成分(D)、前記成分(E)、および、前記成分(F)の合計100質量部に対し、10~60質量部含有する、請求項1~7のいずれかに記載の樹脂組成物。 Furthermore, (F) filler is 100 mass parts in total of the said component (A), the said component (B), the said component (C), the said component (D), the said component (E), and the said component (F). The resin composition according to any one of claims 1 to 7, wherein the resin composition is contained in an amount of 10 to 60 parts by mass.
  9.  さらに、(G)有機過酸化物を含有する、請求項1~8のいずれかに記載の樹脂組成物。 The resin composition according to claim 1, further comprising (G) an organic peroxide.
  10.  樹脂組成物の硬化物の周波数1~10GHzの領域における、誘電率(ε)が3.0以下であり、誘電正接(tanδ)が0.006以下である、請求項1~9のいずれかに記載の樹脂組成物。 The dielectric constant (ε) is 3.0 or less and the dielectric loss tangent (tan δ) is 0.006 or less in a frequency range of 1 to 10 GHz of the cured product of the resin composition. The resin composition as described.
  11.  UL94に基づく難燃性がV-0またはVTM-0を満足する、請求項1~10のいずれかに記載の樹脂組成物。 11. The resin composition according to claim 1, wherein the flame retardancy based on UL94 satisfies V-0 or VTM-0.
  12.  請求項1~11のいずれかに記載の樹脂組成物を用いて作成される接着フィルム。 An adhesive film produced using the resin composition according to any one of claims 1 to 11.
  13.  請求項1~11のいずれかに記載の樹脂組成物を用いて作成されるカバーレイフィルム。 A coverlay film produced using the resin composition according to any one of claims 1 to 11.
  14.  請求項1~11のいずれかに記載の樹脂組成物を含むワニス。 A varnish comprising the resin composition according to any one of claims 1 to 11.
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