WO2014010428A1 - Mist generator - Google Patents

Mist generator Download PDF

Info

Publication number
WO2014010428A1
WO2014010428A1 PCT/JP2013/067629 JP2013067629W WO2014010428A1 WO 2014010428 A1 WO2014010428 A1 WO 2014010428A1 JP 2013067629 W JP2013067629 W JP 2013067629W WO 2014010428 A1 WO2014010428 A1 WO 2014010428A1
Authority
WO
WIPO (PCT)
Prior art keywords
collision wall
mist
rotating substrate
wall
liquid
Prior art date
Application number
PCT/JP2013/067629
Other languages
French (fr)
Japanese (ja)
Inventor
井上 和彦
Original Assignee
日立マクセル株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日立マクセル株式会社 filed Critical 日立マクセル株式会社
Publication of WO2014010428A1 publication Critical patent/WO2014010428A1/en

Links

Images

Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61HPHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H33/00Bathing devices for special therapeutic or hygienic purposes
    • A61H33/06Artificial hot-air or cold-air baths; Steam or gas baths or douches, e.g. sauna or Finnish baths
    • A61H33/12Steam baths for the face
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M15/00Inhalators
    • A61M15/0001Details of inhalators; Constructional features thereof
    • A61M15/0005Details of inhalators; Constructional features thereof with means for agitating the medicament
    • A61M15/0006Details of inhalators; Constructional features thereof with means for agitating the medicament using rotating means
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M16/00Devices for influencing the respiratory system of patients by gas treatment, e.g. mouth-to-mouth respiration; Tracheal tubes
    • A61M16/10Preparation of respiratory gases or vapours
    • A61M16/14Preparation of respiratory gases or vapours by mixing different fluids, one of them being in a liquid phase
    • A61M16/16Devices to humidify the respiration air
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B3/00Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
    • B05B3/02Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
    • B05B3/10Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements discharging over substantially the whole periphery of the rotating member, i.e. the spraying being effected by centrifugal forces
    • B05B3/1007Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements discharging over substantially the whole periphery of the rotating member, i.e. the spraying being effected by centrifugal forces characterised by the rotating member
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B3/00Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
    • B05B3/02Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
    • B05B3/10Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements discharging over substantially the whole periphery of the rotating member, i.e. the spraying being effected by centrifugal forces
    • B05B3/105Fan or ventilator arrangements therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/0012Apparatus for achieving spraying before discharge from the apparatus
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/24Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas with means, e.g. a container, for supplying liquid or other fluent material to a discharge device
    • B05B7/2402Apparatus to be carried on or by a person, e.g. by hand; Apparatus comprising containers fixed to the discharge device
    • B05B7/2464Apparatus to be carried on or by a person, e.g. by hand; Apparatus comprising containers fixed to the discharge device a liquid being fed by mechanical pumping from the container to the nozzle
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61HPHYSICAL THERAPY APPARATUS, e.g. DEVICES FOR LOCATING OR STIMULATING REFLEX POINTS IN THE BODY; ARTIFICIAL RESPIRATION; MASSAGE; BATHING DEVICES FOR SPECIAL THERAPEUTIC OR HYGIENIC PURPOSES OR SPECIFIC PARTS OF THE BODY
    • A61H2201/00Characteristics of apparatus not provided for in the preceding codes
    • A61H2201/01Constructive details
    • A61H2201/0119Support for the device
    • A61H2201/0153Support for the device hand-held
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61MDEVICES FOR INTRODUCING MEDIA INTO, OR ONTO, THE BODY; DEVICES FOR TRANSDUCING BODY MEDIA OR FOR TAKING MEDIA FROM THE BODY; DEVICES FOR PRODUCING OR ENDING SLEEP OR STUPOR
    • A61M2206/00Characteristics of a physical parameter; associated device therefor
    • A61M2206/10Flow characteristics
    • A61M2206/16Rotating swirling helical flow, e.g. by tangential inflows

Definitions

  • the present invention relates to a mist generating device for sending a liquid such as water or lotion as a fine mist.
  • This mist generator can be used, for example, as a humidifier that moisturizes the skin or as an inhaler that moistens the throat and oral cavity. Furthermore, it can be used as a liquid spreader that is disposed inside the washing tub and releases a mist-like detergent or softener.
  • the mist generating apparatus finely divides a liquid by splashing the liquid fed onto the rotating substrate with a centrifugal force and causing it to collide with a collision wall provided on the rotating substrate.
  • a generator is known, for example, from US Pat.
  • eight blades extending radially from the center between a pair of opposing disks and a number of baffle members are provided integrally with the disk, and when liquid is fed between the rotating disks, Is blown off by a centrifugal force to be misted, further refined by colliding with a baffle member, and discharged outward from between the disks.
  • a similar mist generator is also disclosed in Patent Document 2.
  • an annular wall having a large number of guide paths extending in the radial direction and a large number of rollers facing the exit of the guide paths are provided between a pair of upper and lower disks.
  • Both the baffle member of Patent Document 1 and the roller of Patent Document 2 are formed in a cylindrical shape. For this reason, when the liquid collides with a baffle member or the like, it is inevitable that the collision energy applied to the liquid is dispersed on the cylindrical surface, the liquid cannot be efficiently misted, and the mist diameter is reduced. It is difficult to plan.
  • An object of the present invention is to provide a mist generator that can generate fine mist more efficiently.
  • the present invention includes a rotating substrate 70 that is rotationally driven, a tank 7 that stores a liquid 8 for generating mist, and a liquid supply means 9 that supplies the liquid 8 stored in the tank 7 to the rotating substrate 70.
  • the rotating substrate 70 has a plurality of collision walls 81, and an uneven portion 95 is formed on the wall surface 90 of the collision wall 81 so that the wall surface 90 is roughened.
  • the present invention also includes a rotary substrate 70 that is driven to rotate, a tank 7 that contains a liquid 8 for generating mist, and a liquid feeding means 9 that feeds the liquid 8 contained in the tank 7 to the rotary substrate 70.
  • Targeted mist generators An annular collision wall row 82 formed by alternately arranging the collision walls 81 and the liquid passages 83 is provided at least twice in the radial direction so as to surround the rotation center of the rotary substrate 70. 82, the collision wall 81 constituting the outer collision wall row 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82.
  • grooved part 95 is formed in the wall surface 90 of the collision wall 81 of the outer side collision wall row
  • the “annular collision wall row” referred to in the present invention is not only a form in which a plurality of collision wall rows 82 having different diameters are formed as shown in FIG. 5, but also as shown in FIG. This is a concept including a form in which the wall row 82 is formed in a spiral shape.
  • the collision wall 81 constituting the outer collision wall row 82 is disposed in a state of facing the liquid passage 83 of the inner collision wall row 82” is without any exception, and is all It does not mean that the collision wall 81 constituting the outer collision wall row 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82, and the majority of the outer collision wall rows 82 This is a concept that includes that the collision wall 81 constituting 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82.
  • the surface roughness of the rotating substrate 70 is preferably set to be smaller than the roughness of the wall surface 90 of the collision wall 81 on which the uneven portion 95 is formed.
  • the uneven portions 95 can be formed on all the wall surfaces 90, 91, 92, and 93 constituting the collision wall 81 to be roughened.
  • the collision wall 81 is formed in a protruding shape from the surface of the rotating substrate 70, and the uneven portion 95 can be configured by a groove 96 and a rib 97 that are long in the protruding direction from the rotating substrate 70.
  • the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70 and the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70 are set so as to satisfy the relationship W> T. be able to.
  • the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the protruding dimension (H) of the collision wall 81 are: It can be set to satisfy the relationship of W> H> T.
  • the rotating substrate 70 includes a substrate main body 80 and a collision wall 81, and the thickness dimension (E) of the substrate main body 80, the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, and the radial direction of the rotating substrate 70.
  • the thickness dimension (T) of the collision wall 81 and the protrusion dimension (H) of the collision wall 81 can be set so as to satisfy the relationship E> W> H> T.
  • the passage width (A) of the liquid passage 83 in the wall row 82 can be set so as to satisfy the relationship of W> H> T> A.
  • the passage width (B) of the circumferential liquid passage 84 formed between the collision walls 81 constituting the inner and outer collision wall row 82 and the passage width (A) of the liquid passage 83 of the collision wall row 82 are represented by B > A can be set to satisfy the relationship.
  • a top plate 86 is fixed to the upper surface 94 of the collision wall 81, and the roughness of the upper surface 94 of the collision wall 81 is preferably set smaller than the roughness of the wall surface 90 of the collision wall 81 facing the liquid passage 83. .
  • the colliding wall row 82 is provided in a multiple manner in the radial direction of the rotary substrate 70, and the colliding wall row 82 including the collision wall 81 can also take the form of serving as a support structure for the top plate 86.
  • a plurality of rotary substrates 70 each having a collision wall row 82 are stacked, and the upper rotary substrate 70 can also serve as the top plate 86 of the lower rotary substrate 70.
  • the collision wall 81 can be formed by electroforming.
  • the collision wall 81 can be formed by an etching method.
  • the concavo-convex portion 95 is formed on the wall surface 90 of the collision wall 81 provided on the rotating substrate 70 to roughen the wall surface 90. According to this, since the liquid droplets colliding with the wall surface 90 can be more efficiently separated and dispersed (pulverized), the liquid can be reliably miniaturized and fine mist can be obtained. In addition, since the concavo-convex portion 95 is formed on the wall surface 90, it is possible to prevent droplets from aggregating on the surface of the wall surface 90. Therefore, a finer mist can be obtained and the mist diameter can be reduced. Uniformity can be achieved.
  • At least double annular collision wall rows 82 in which the collision walls 81 and the liquid passages 83 are alternately arranged are provided, and the collision wall 81 of the outer collision wall row 82 is provided, Since the liquid passage 83 of the inner collision wall row 82 is opposed to the liquid, the liquid can be reliably collided with the collision wall 81 until the liquid jumps out of the outermost outer collision wall row 82. Therefore, it is possible to obtain a fine mist by refining the liquid.
  • At least the concave and convex portions 95 are formed on the wall surface 90 of the collision wall 81 of the outer collision wall row 82 facing the outlet of the liquid passage 83 of the inner collision wall row 82 to roughen the wall surface 90.
  • the liquid droplets colliding with the wall surface 90 can be more efficiently separated and dispersed (pulverized).
  • the concavo-convex portion 95 is formed on the wall surface 90, droplets can be prevented from aggregating on the surface of the wall surface 90. Therefore, a finer mist can be obtained and the mist diameter can be made uniform.
  • the surface roughness of the rotating substrate 70 is set to be smaller than the roughness of the wall surface 90 of the collision wall 81 on which the concavo-convex portion 95 is formed, a droplet flowing in the liquid passage 83 along the surface of the rotating substrate 70 It can prevent effectively that the flow rate of mist is impaired. In other words, it is possible to prevent the collision energy of the droplets and mist flowing through the liquid passage 83 from colliding with the collision wall 81 from being taken away by contacting the surface of the rotating substrate 70. Thereby, since a droplet or mist can be made to collide with the collision wall 81 efficiently, finer mist can be obtained.
  • the concavo-convex portion 95 is configured by a groove and a rib that are long in the direction perpendicular to the protruding direction from the rotating substrate 70, that is, in the horizontal direction, the groove is formed in the liquid flow direction in the liquid passage 83. Therefore, when the liquid flows along the groove, the liquid aggregates and there is a possibility that the mist diameter increases.
  • the concavo-convex portion 95 is composed of grooves 96 and ribs 97 that are long in the protruding direction from the rotating substrate 70, and the grooves 96 are formed in a direction perpendicular to the liquid flow direction in the liquid flow path. If formed, the flow path resistance in the flow direction of the liquid passage 83 can be increased, so that the liquid can be more efficiently separated and dispersed to reduce the mist diameter.
  • the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70 and the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70 are set so as to satisfy the relationship of W> T. In this case, the diameter of the rotating substrate 70 can be reduced, and the overall size of the mist generator can be reduced.
  • the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the protruding dimension (H) of the collision wall 81 are: If it is set to satisfy the relationship of W> H> T, the collision area of the collision wall 81 can be increased while reducing the diameter of the rotating substrate 70. That is, while the thickness dimension (T) of the collision wall 81 is reduced, the collision wall 81 of the outer collision wall row 82 defined by the width dimension (W) of the collision wall 81 and the protrusion dimension (H) of the collision wall.
  • the wall surface area (W ⁇ H) can be increased.
  • the thickness dimension (T) of the collision wall 81 is reduced to reduce the diameter of the rotating substrate 70, and the droplets sent out from the liquid passage 83 of the inner collision wall row 82 are more reliably transferred to the outer side. It is possible to efficiently reduce the mist diameter by colliding with the collision wall 81 of the collision wall row 82.
  • the protruding dimension (H) of the wall 81 is set so as to satisfy the relationship of E> W> H> T
  • the collision of the collision wall 81 is attempted while reducing the diameter of the rotating substrate 70 as before.
  • the area can be increased.
  • the thickness dimension (E) of the rotating substrate 70 can be increased to make the rotating substrate 70 excellent in strength.
  • the weight of the rotating substrate 70 can be increased and the inertia weight thereof can be increased, the rotational posture of the rotating substrate 70 can be stabilized.
  • the passage width (A) of the liquid passage 83 in the wall row 82 is set so as to satisfy the relationship of W> H> T> A, the diameter of the rotating substrate 70 is reduced as before, The collision area of the collision wall 81 can be increased.
  • the protrusion dimension (H) of the collision wall 81 is larger than the passage width (A) of the liquid passage 83, the protrusion dimension (H) of the collision wall 81 and the passage width (A) of the liquid passage 83 are set.
  • the cross-sectional area (H ⁇ A) of the liquid passage 83 defined by (2) can be made large, so that the liquid flow in the liquid passage 83 can be made smooth.
  • the passage width (B) of the circumferential liquid passage 84 formed between the collision walls 81 constituting the inner and outer collision wall row 82 and the passage width (A) of the liquid passage 83 of the collision wall row 82 are represented by B If it is set so as to satisfy the relationship of> A, the effect of improving the collision energy of the liquid against the collision wall 81, which is derived from the reduction of the passage width (A) of the liquid passage 81 of the collision wall row 82, can be expected. . Therefore, it is possible to make the mist diameter finer by causing the liquid to collide with the collision wall 81 more efficiently.
  • the roughness of the upper surface 94 of the collision wall 81 is set to be smaller than the roughness of the wall surface 90 of the collision wall 81 facing the liquid passage 83, the adhesion between the top plate 86 and the collision wall 81 is improved. Can do. Accordingly, it is possible to prevent the top plate 86 and the collision wall 81 from being inadvertently separated, so that the state in which the top plate 86 and the rotating substrate 70 are firmly integrated can be maintained for a long time.
  • the liquid traveling direction can be diversified, the liquid can be well separated, and the mist can be miniaturized.
  • the liquid can be repeatedly collided with the collision wall 81 facing the liquid passage 83, so that the mist can be further refined.
  • the collision wall row 82 including the collision wall 81 also serves as a support structure for the top plate 86, an increase in the manufacturing cost of the mist generating device can be suppressed as compared with a mode in which a separate support structure for the top plate is provided. it can.
  • the amount of mist generated can be increased without increasing the outer diameter of the rotating substrate 70. Therefore, it is possible to obtain a mist generating device that is small and excellent in mist generation capability.
  • the upper rotating substrate 70 also serves as the top plate 86 of the lower rotating substrate 70, it is possible to suppress an increase in the overall dimension (vertical thickness dimension) of the stacked rotating substrates 70. This can contribute to the miniaturization of the mist generator.
  • the rotary substrate 70 including a large number of collision walls 81 can be formed with high accuracy.
  • the filler 115 is included in the pattern film 110 of the resist body 111 formed prior to the electrodeposition process of the electroforming method, vertical grooves are formed on the side surfaces of the resist body 111 due to light refraction by the filler 115. Since it can be formed, the concavo-convex portion 95 of the collision wall 81 can be formed using the vertical groove. More specifically, the electroforming method forms a photoresist layer 109 on the substrate body 80 and forms a pattern film 110 having a through hole 110 a corresponding to the liquid passage 83 on the photoresist layer 109.
  • a resist body 111 corresponding to the liquid passage 83 is obtained by performing exposure by irradiating ultraviolet light with the ultraviolet light irradiating means 103, performing development and drying, and dissolving and removing unexposed portions.
  • the filler 115 is included in the pattern film 110, the pattern is caused by refraction of ultraviolet light by the filler 115.
  • the vertical groove is formed on the surface of the collision wall 81 by forming the electroformed layer 113 using the groove. Can be formed.
  • the concavo-convex portion 95 can be formed simultaneously with the formation of the collision wall 81. Therefore, the concavo-convex portion is formed in a separate process such as applying sandblast or metal particles. Compared with the embodiment in which 95 is formed, an increase in the manufacturing cost of the mist generating device can be suppressed.
  • the overhang part 135 is provided at the upper end of the collision wall 81, the top plate can be abolished, and an increase in the manufacturing cost of the mist generating device can be suppressed.
  • the concavo-convex portion 95 can be formed simultaneously with the formation of the collision wall 81, and therefore the concavo-convex portion 95 is formed in a separate process such as sand blasting or metal particle coating. Compared with the form to do, the raise of the manufacturing cost of a mist generator can be suppressed.
  • FIG. 1 It is a perspective view of the principal part of the mist generator which concerns on 1st Embodiment of this invention. It is a vertical side view which shows schematic structure of a mist generator. It is a figure which expands and shows the head part of a mist generator. It is an exploded view of the head part of a mist generator. It is a top view which shows a rotation board. It is a vertical side view of the principal part of a mist generator. It is a block diagram which shows the control structure of a mist generator. (A) * (b) is a time chart for demonstrating the control method of a mist generator. It is a figure for demonstrating the usage method of a mist generator.
  • (A)-(c) is a figure for demonstrating the manufacturing method of the rotating substrate which comprises a mist generator.
  • A)-(c) is a figure for demonstrating the manufacturing method of the rotating substrate which comprises a mist generator. It is a top view which shows the rotating substrate which comprises the mist generator which concerns on 2nd Embodiment of this invention.
  • (A) * (b) is a vertical side view which shows the rotation board which comprises the mist generator which concerns on 3rd Embodiment of this invention. It is a vertical side view which shows the rotating substrate which comprises the mist generator which concerns on 4th Embodiment of this invention.
  • FIGS. 1 to 12 show a first embodiment of a mist generating apparatus according to the present invention.
  • a main body case 1 serving as a casing of the mist generating apparatus includes a cylindrical grip portion 2 that is provided in the lower portion and is long in the vertical direction, and a head portion that is integrally formed above the grip portion 2.
  • 3 is a resin molded product.
  • “front / rear”, “left / right”, and “upper / lower” follow the cross arrows shown in FIG. 2 to FIG.
  • the vertical direction in FIG. 2 defines the extending direction of the grip portion 2 as the vertical direction
  • FIGS. 3 to 6 the extending direction of the head portion 3 is defined as the vertical direction. It is supplemented that the “vertical direction” is different between FIGS.
  • a mist generating unit 6 including a fan (fan unit) 46 and the like is disposed.
  • a tank 7 in which water (liquid) 8 for generating mist is accommodated is detachably attached to the lower end of the grip portion 2, and the water 8 accommodated in the tank 7 is mist inside the grip portion 2.
  • a liquid feeding unit 10 including a feeding pump (liquid feeding means) 9 for feeding to the generating unit 6, a battery 11 for supplying electric power to the rotating body driving motor 4, and the like, a charging device 117 (FIG.
  • reference numeral 14 denotes a control board on which the control circuit 13 and the oscillation circuit 124 constituting the charging device 117 are mounted
  • reference numeral 15 denotes a rotating body driving motor 4 and a pump driving motor 17.
  • Reference numeral 16 denotes a main switch for turning on and off the motor 4 during the washing operation. The main switch 15 and the cleaning switch 16 are provided on the front surface of the housing of the grip portion 2.
  • the tank 7 is a resin molded product formed in a cylindrical container shape having an outer diameter that matches the outer diameter of the cylindrical grip portion 2, and the upper wall surface 7 a constitutes the liquid feeding unit 10.
  • a liquid supply port 20 that allows insertion of the strainer 24 attached to the lower end of the suction pipe 25 is projected upward.
  • a pipe opening 21 that allows the suction pipe 25 to protrude is projected downward on the lower wall surface 2 a of the grip portion 2, and a tank detaching mechanism is provided between the pipe opening 21 and the liquid supply port 20. It has been.
  • the tank detaching mechanism includes a male screw portion 21a provided in the pipe opening 21 on the grip portion 2 side, and a female screw portion 20a that is screwed and coupled to the male screw portion 21a provided in the liquid supply port 20 on the tank 7 side.
  • the tank 7 is It can be removed from the grip part 2. Further, by removing the tank 7 from the grip portion 2 and supplying water 8 into the tank 7 from the liquid supply port 20, the water 7 can be filled into the tank 7.
  • Reference numeral 22 denotes a seal ring disposed between the pipe opening 21 and the suction pipe 25.
  • the liquid supply unit 10 extends toward the inner bottom of the tank 7 from the supply pump 9 disposed inside the grip unit 2, the motor 17 that drives the supply pump 9, and the suction port of the supply pump 9. It is comprised by the suction pipe 25 and the discharge flow path 26 arrange
  • the discharge channel 26 is in communication with the feed tube 27 disposed from the discharge port of the feed pump 9 to the protective hood 45 of the head unit 3, the liquid passage 28 formed in the protective hood 45, and the liquid passage 28.
  • the feed pipe 29 extends toward the rotating body 5.
  • the feed pump 9 is a low-pressure gear pump, and delivers about 0.01 ml of water to the discharge passage 26 per second.
  • the head portion 3 is disposed above the base case 30, a base case 30 disposed at the center in the vertical direction, a lower case 31 disposed below the base case 30, and the base case 30.
  • a motor holder 33 for mounting the motor 4 is provided therein.
  • the head portion 3 composed of the base case 30, the lower case 31, the upper case 32, and the like is mounted in a head holder 3a (see FIG. 2) connected to the grip portion 2.
  • the motor holder 33 includes inner cylindrical walls 35 and 38 provided in the base case 30 and the lower case 31. More specifically, the base case 30 includes a bottomed straight cylindrical inner cylinder wall 35 having an opening below, an outer cylinder wall 36 disposed so as to surround the inner cylinder wall 35, and the inner and outer cylinder walls 35 and 36. And a connecting arm 37 (not shown) for bridging, and a communication hole 37 is formed between the inner and outer cylinder walls 35 and 36 to communicate in the vertical direction.
  • the lower case 31 includes a bottomed straight cylindrical inner cylinder wall 38 having an opening on the upper side, an outer cylinder wall 39 disposed so as to surround the inner cylinder wall 38, and a bridge between the inner and outer cylinder walls 38 and 39.
  • a connecting hole 40 is formed between the inner and outer cylinder walls 38 and 39.
  • the communicating hole 40 is formed between the inner and outer cylinder walls 38 and 39.
  • the outer cylindrical wall 39 of the lower case 31 includes a straight portion 39a having a uniform diameter and a tapered portion 39b formed continuously from the straight portion 39a and gradually increasing in diameter as it goes downward. Yes.
  • the diameter dimensions of the inner cylinder walls 35 and 38 of both cases 30 and 31 and the diameter dimensions of the outer cylinder wall 36 of the base case 30 and the straight portion 39a of the lower case 31 are set to the same dimension.
  • the upper case 32 includes a cylindrical wall 44 having a bell mouth-shaped injection port 43, and a protective hood 45 formed above the cylindrical wall 44.
  • a fan unit 46, a support base 47, and a rotating body are provided therein. 5.
  • a mist generating unit 6 composed of a pressing plate 48 is disposed.
  • the cylindrical wall 44 includes a straight portion 44 a that is continuous with the outer cylindrical wall 36 of the base case 30, and an upwardly expanding tapered tapered portion 44 b that is continuously formed at the upper end of the straight portion 44 a. It is configured.
  • the protective hood 45 includes a disc-shaped hood main body 50 formed for the purpose of protecting the rotating body 5, and a hood holder 51 that holds the hood main body 50.
  • the hood holder 51 includes three support legs 52 that support the hood body 50 in a floating position, and a support piece 53 that is formed on the upper end of the support legs 52 and receives the hood body 50.
  • the support legs 52 of the hood holder 51 are radially formed at equal intervals from the hood main body 50, and the lower ends thereof are connected to the cylindrical wall 44. In FIG. 3 and the like, only the two support legs 52 and 52 are shown.
  • a liquid passage 28 is formed inside the hood holder 51 of the protective hood 45.
  • the liquid passage 28 is formed in one support leg 52 and is formed in the first flow path 28a to which the feed tube 27 (see FIG. 2) is connected and in the support piece 53, and
  • the second channel 28b is connected to the downstream end of the first channel 28a.
  • the lower end portion of the support leg 52 having the first flow path 28a protrudes outside the cylindrical wall 44, and the feed tube 27 is connected to the lower end portion of the support leg 52 in an outer fitting shape.
  • a liquid feed port 54 protrudes downward from the central portion of the lower surface of the support piece 53, and the feed connected to the downstream end of the second flow path 28 b in the liquid feed port 54.
  • a tube 29 is arranged.
  • reference numeral 53 a indicates a central opening that is provided in the central portion of the support piece 53 and communicates with the liquid supply port 54.
  • the liquid supply port 29a at the lower end of the feed pipe 29 is close to and opposed to the output shaft 56 of the motor 4 for driving the rotating body through a slight gap (see FIG. 6).
  • an opening 58 that allows the output shaft 56 of the motor 4 to protrude is formed in the upper wall 57 of the base case 30, and the motor 4 ejects the upper case 32 through the opening 58. It is disposed in the motor holder 33 with the output shaft 56 oriented in the mouth 43.
  • the fan unit 46, the support base 47, and the rotating body 5 are mounted in the order of description on the output shaft 56 of the motor 4 protruding from the upper wall 57 of the base case 30.
  • the fan unit 46 surrounds the fan blade 61, a columnar fan base 60 that is externally fitted to the output shaft 56, a group of fan blades 61 that project in a spiral shape along the outer peripheral surface of the fan base 60, and the fan blade 61.
  • the fan unit 46 is attached to the output shaft 56 of the motor 4 for driving the rotating body. That is, the motor 4 also serves as a fan driving motor.
  • the support base 47 is a plastic molded product formed in a substantially inverted truncated cone shape with a small diameter on the lower surface and a large diameter on the upper surface.
  • a connection boss 64 for welding and fixing the presser plate 48 is projected.
  • mounting holes 65 and 66 for opening and mounting the fan unit 46 and the support base 47 are formed on the outer peripheral surface of the output shaft 56.
  • a receiving surface 67 for receiving the lower surface of the support base 47 is formed in a stepped shape on the upper surface of the fan base 60 of the fan unit 46.
  • the rotator 5 is formed by laminating a plurality of metal rotating substrates 70 having the same outer diameter, and in this embodiment, four rotating substrates.
  • the rotating body 5 is configured by laminating 70a to 70d.
  • Each of the rotating substrates 70a to 70d includes a disk-shaped or ring-shaped substrate main body 80 and a plurality of collision walls 81 erected on the upper surface of the substrate main body 80.
  • a mounting hole 71 for opening and mounting the rotary substrate 70a on the outer peripheral surface of the output shaft 56 is formed, and is positioned above.
  • a flow path introduction port 72 that allows the liquid supply port 54 to be inserted is opened. That is, the substrate body 80 of the lowermost rotating substrate 70 a is formed in a circular plate shape having the mounting holes 71, and the substrate bodies 80 of the remaining rotating substrates 70 b to 70 d are larger in diameter than the mounting holes 71. It is formed in a circular ring shape having a flow path inlet 72. As described above, the rotating body 5 formed by laminating these rotating substrates 70 a to 70 d is formed in a cylindrical block shape having an upper opening communicating with the flow path introduction port 72. Connection holes 73 that allow the connection bosses 64 to be inserted are formed at four positions at equal intervals on each of the rotary substrates 70a to 70d.
  • the holding plate 48 disposed for the purpose of preventing the rotary substrates 70a to 70d from being lifted from the support base 47 includes a circular ring-shaped base portion 75 having an inner diameter equivalent to that of the uppermost rotary substrate 70d, and the base portion 75.
  • connection holes 77 are also opened at four positions on the surface of the base portion 75.
  • the rotating body 5 and the holding plate 48 are fixed upward in a retaining manner by connecting bosses 64 inserted through the connecting holes 73 and 77. More specifically, the rotating base plates 70a to 70d and the connecting holes 73 and 77 of the pressing plate 48 constituting the rotating body 5 are aligned with the connecting boss 64 of the support base 47, and the rotating substrates 70a to 70d and the pressing plate 48 are aligned. After the connection boss 64 is inserted into the connection holes 73 and 77, the upper end portion of the connection boss 64 protruding upward from the base portion 75 of the holding plate 48 through the connection holes 73 and 77 is heat caulked. Thereby, the rotary substrates 70a to 70d and the pressing plate 48 can be fixed to the support base 47 in a retaining manner.
  • mist generating unit 6 having the above-described configuration fixes the rotating body 5 and the pressing plate 48 to the support base 47 in advance by the above procedure, and the three parties (the supporting base 47, the rotating body 5, and the pressing plate 48). ) Can be made into unit parts.
  • the mist generating unit 6 can be assembled by mounting the fan unit 46 and the previous unit component on the output shaft 56 of the motor 4.
  • the liquid supply port 29a at the lower end of the feed pipe 29 is in close proximity to the output shaft 56 of the motor 4 through a slight gap (see FIG. 6). Accordingly, when the motors 4 and 17 are driven, the water sucked up from the tank 7 through the suction pipe 25 and discharged from the liquid supply port 29a of the supply pipe 29 through the discharge flow path 26 is supplied to the output shaft. After bouncing at the upper end of 56 and being scattered in the space related to the flow path introduction port 72, it is introduced into the rotator 5. Then, after being misted in the rotating body 5, the air is blown from the fan unit 46 and is discharged from the ejection port 43.
  • the water that has been discharged from the liquid supply port 29a of the feed pipe 29 through the discharge flow channel 26 and moved to the contact portion with the rotating substrate 70 is scattered toward the flow channel introduction port 72 by centrifugal force. Then, it enters the gap (passage entrance) formed between the rotating substrates 70a to 70d and the clearance (passage entrance) formed between the rotating substrate 70d and the base portion 75. Then, while colliding with the collision wall 81, the inside of the passage is moved outward to be misted.
  • the output shaft 56 since the output shaft 56 has a structure in which the diameter gradually decreases toward the tip, the action of sucking the liquid from the liquid supply port 29a works. Further, the output shaft 56 also serves as a protrusion provided to prevent the liquid from the feed pump 9 from being intermittently fed to the rotary substrate 70. Therefore, it is possible to contribute to cost reduction as compared with a case where a separate protrusion is provided.
  • the collision walls 81 are provided on the entire upper surface except for the vicinity of the center of the substrate body 80, and are arranged at predetermined intervals in the circumferential direction of the substrate body 80. It is composed. Between the adjacent collision walls 81 in the collision wall row 82, a liquid passage 83 through which the liquid splashed by the centrifugal force passes is formed.
  • the collision wall rows 82 are provided in a multiple manner in the radial direction of the rotating substrate 70, and a circumferential passage 84 is formed between the adjacent collision wall rows 82 in the inner and outer directions (radial direction) of the rotating substrate 70. Yes.
  • the collision wall row 82 is provided in multiple (triple or more), water miniaturization can be further promoted.
  • the liquid traveling direction can be diversified, the liquid can be separated well, and the mist can be miniaturized.
  • the liquid can be repeatedly collided with the collision wall 81 facing the liquid passage 83, so that the mist can be further refined.
  • the collision wall 81 constituting the outer collision wall row 82 faces the liquid passage 83 of the inner collision wall row 82. That is, each collision wall 81 constituting the outer collision wall 82 is disposed so as to face the outlet of the liquid passage 83 of the inner collision wall row 82. As a result, the water fed to the center of the rotating substrate 70 and splashed off by the centrifugal force passes through the liquid passage 83 constituting the inner collision wall row 82 and the collision wall constituting the outer collision wall row 82. 81 can always be made to collide.
  • the outer collision wall row 82 includes more collision walls 81 and liquid passages 83 than the inner collision wall row 82. In this way, if a large number of liquid passages 83 are provided in the collision wall row 82 on the outer peripheral side, it is possible to diversify the traveling direction of water and to disperse the water so as to spread over the entire surface of the rotating substrate 70. Water refinement can be promoted.
  • the collision wall 81 constituting the outer collision wall row 82 is disposed in a state of being opposed to the liquid passage 83 of the inner collision wall row 82” without any exception, and all It does not mean that the collision wall 81 constituting the outer collision wall row 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82, and the majority of the outer collision wall rows 82 As described above, the collision wall 81 that constitutes 82 is a concept that includes that the collision wall 81 is disposed in a state of facing the liquid passage 83 of the inner collision wall row 82 as in the present embodiment.
  • the collision walls 82 are provided in multiple (three or more), for example, even when the liquid passages 83 overlap with part of the two collision wall rows 82 and the liquid passages 83 communicate with each other in the inner and outer directions, three rows are provided.
  • the collision wall 81 of the fourth or fourth collision wall row 82 And over at least once until the liquid popping outward collision wall column 82 of the outermost periphery can collide with the collision wall 81.
  • the rotating body 5 is configured by laminating a plurality of rotating substrates 70, the surface area of the rotating body 5 is increased without increasing the outer diameter of the rotating substrate 70, thereby increasing the amount of mist generated. Can be achieved. Therefore, it is possible to obtain a mist generating device that is small and excellent in mist generation capability.
  • the upper opening of the liquid passage 83 is covered with the lower surface of the rotating substrate 70 disposed above, in other words, the substrate body 80 of the upper rotating substrate 70 is connected to the liquid passage 83 of the lower rotating substrate 70.
  • the top plate 86 covers the upper opening.
  • the rotation can be performed as compared with a configuration in which a separate top plate 86 is provided.
  • the upper opening of the liquid passage 83 of the rotary substrate 70 positioned at the uppermost position is covered with the lower surface of the pressing plate 48.
  • the upper rotary substrate 70 is supported on the upper surface of the collision wall 81 of the lower rotary substrate 70. That is, the collision wall row 82 including the lower collision wall 81 also serves as a support structure for the upper rotary substrate 70. According to this, an increase in the manufacturing cost of the rotating body 5 can be suppressed as compared with a mode in which a support structure for the upper rotating substrate 70 is provided separately.
  • each collision wall 81 includes a pair of wall surfaces 90 facing the center of the rotating substrate 70, a wall surface 91 facing the radial outside of the rotating substrate 70, and a pair of walls 90 and 91.
  • Water which is formed in a rectangular column shape having wall surfaces 92 and 93 and splashed outward by centrifugal force through the liquid passage 83 constituting the inner collision wall row 82 collides with the wall surface 90 and is crushed. Is done.
  • the entire wall surface of the collision wall 81 including the wall surface 90 is roughened by forming an uneven portion 95 in order to improve the water crushing effect.
  • the concavo-convex portion 95 includes a groove 96 that is long in the protruding direction (vertical direction) of the collision wall 81 from the substrate body 80 and a rib 97 that is formed between adjacent grooves 96.
  • a groove 96 that is long in the protruding direction (vertical direction) of the collision wall 81 from the substrate body 80
  • a rib 97 that is formed between adjacent grooves 96.
  • the concavo-convex portion is formed by a groove and a rib that are long in the left-right direction
  • the groove is formed in the water flow direction, so that water flows along the long groove in the left-right direction, The inconvenience of flocculation is expected.
  • the uneven portion 95 is formed by the groove 96 and the rib 97 that are long in the vertical direction as in the present embodiment, the flow in the flow direction of the liquid passage (the liquid passage 83 and the circumferential passage 84). Since the road resistance can be increased, water can be more efficiently separated and dispersed to reduce the mist diameter.
  • the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70 is set larger than the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70. That is, the relationship of W> T is satisfied.
  • the thickness dimension (T) of the collision wall 81 is set small, the diameter of the rotating substrate 70 can be reduced, and the entire mist generator can be downsized.
  • the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the protrusion dimension (H) of the collision wall 81 are: It is set so as to satisfy the relationship of W> H> T. According to this, the diameter of the rotating substrate 70 can be reduced by reducing the thickness dimension of the collision wall 81. In addition, since the wall surface area (W ⁇ H) of the collision wall 81 can be increased, the water sent out from the liquid passage 83 of the inner collision wall row 82 is more reliably caused to collide with the outer collision wall row 82. By colliding with the wall 81, the mist diameter can be efficiently reduced.
  • the thickness dimension (E) of the substrate body 80, the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the collision The protrusion dimension (H) of the wall 81 is set so as to satisfy the relationship of E> W> H> T. According to this, similarly to the above, the collision area of the collision wall 81 can be increased while reducing the diameter of the rotating substrate 70. Moreover, since the thickness dimension (E) of the board
  • the passage width (A) of the liquid passage 83 in the wall row 82 is set so as to satisfy the relationship of W> H> T> A. According to this, similarly to the above, the collision area of the collision wall 81 can be increased while reducing the diameter of the rotating substrate 70.
  • the protrusion dimension (H) of the collision wall 81 is larger than the passage width (A) of the liquid passage 83, the protrusion dimension (H) of the collision wall 81 and the passage width (A) of the liquid passage 83 are The cross-sectional area (H ⁇ A) of the liquid passage 83 defined by Accordingly, the water flow in the liquid passage 83 can be made smooth.
  • FIG. 11 (a) shows a pattern resist forming step that is performed prior to the primary electroforming step (FIG. 11 (b)).
  • FIG. 11 (a) the surface of the mother die 100 is shown.
  • a pattern film 102 having a through hole 102a corresponding to the through hole (the mounting hole 71, the channel introduction port 72, or the connection hole 73) of the substrate body 80 is formed on the photoresist layer 101.
  • a resist corresponding to the through-hole is formed by exposing the pattern film 102 to ultraviolet light from the upper side of the pattern film 102 and irradiating it with ultraviolet light, performing development and drying, and dissolving and removing unexposed portions.
  • a primary pattern resist 105 having a body 104 is formed.
  • the mother mold 100 together with the primary pattern resist 105 is put in an electroforming tank, and an electrodeposited metal is electroformed on the surface of the mother mold 100 that is not covered with the primary pattern resist 105.
  • a cast layer 106 is formed (FIG. 11B).
  • the primary electroformed layer 106 is polished to form a substrate body 80 with the upper surface of the primary electroformed layer 106 being a smooth surface (FIG. 11C). )).
  • the polishing belt 116 used in the polishing process a No. 1000 belt or a No. 700 belt can be used.
  • a liquid passage (a liquid passage 83 and a circumferential passage 84) corresponds to the photoresist layer 109.
  • a pattern film 110 having a through-hole 110a is formed on the photoresist layer 109, exposed by irradiating ultraviolet light from above the pattern film 110 with an ultraviolet irradiation lamp 103, developed, and dried. By dissolving and removing the exposed portion, a secondary pattern resist 112 having a resist body 111 corresponding to the liquid passage is formed.
  • the substrate main body 80 together with the secondary pattern resist 112 is put in an electroforming tank, and an electrodeposited metal is electroformed on the surface of the substrate main body 80 not covered with the secondary pattern resist 112 to correspond to the collision wall 81.
  • a secondary electroformed layer 113 is formed (FIG. 12B).
  • the upper surface of the secondary electroformed layer 113 is made smooth (FIG. 12C), and the secondary pattern resist 112 is removed.
  • the rotating substrate 70 in which the collision wall 81 is formed on the substrate body 80 can be obtained.
  • the polishing belt 116 used in the polishing process a No. 1000 belt or a No. 700 belt can be used. In FIG.
  • reference numeral 114 denotes a polishing burr formed on the upper end of the collision wall 81 in the polishing process, and the polishing burr 114 is removed by electropolishing and shown in FIG. 1 and FIG. Such a rotating substrate 70 can be obtained.
  • the filler 115 is included in the pattern film 110 having the through holes 110a corresponding to the liquid passages (the liquid passage 83 and the circumferential passage 84). The point is noted.
  • a groove is formed in the boundary portion between the exposed portion and the unexposed portion of the secondary pattern resist 112, that is, on the side surface of the resist body 111 due to refraction of ultraviolet light by the filler 115. Therefore, a vertical groove can be formed on the surface of the collision wall 81 by forming the secondary electroformed layer 113 using such a groove. That is, the uneven portion 95 can be formed simultaneously with the formation of the collision wall 81. Therefore, an increase in the manufacturing cost of the mist generating device can be suppressed as compared with a mode in which the concavo-convex portion 95 is formed in another process such as sand blasting or metal particle coating.
  • FIG. 7 shows a circuit configuration of the mist generating apparatus according to this embodiment.
  • the mist generator comprises a main switch 15 and a cleaning switch 16 provided on the front surface of the casing of the grip portion 2, and a rotating body driving motor 4 and a feed pump 9 according to an on / off operation of these switches 15 and 16.
  • a control circuit 13 that rotationally drives the pump driving motor 17 and a charging device 117 that charges the mist when the main switch 15 is turned on.
  • the charging device 117 includes a high voltage generator 118, and a high-voltage pulse generated by the high voltage generator 118, and the power supply electrode that contacts the output shaft 56 of the motor 4 for driving the rotating body and the outer peripheral surface of the output shaft 56.
  • the charging lead 120 applied to the rotating substrate 70 (rotating body 5) via the 119 and one end connected to the negative electrode of the battery 11 and the other end connected to the contact electrode 121 disposed on the rear surface of the grip portion 2.
  • the ground lead 122 is configured. The ground lead 122 allows the contact electrode 121 to have the same potential as the circuit ground potential.
  • the high voltage generator 118 is boosted by the oscillation circuit 124 that converts the current of the battery 11 into alternating current, the first boost circuit 125 that boosts the pulse current generated by the oscillation circuit 124, and the first boost circuit 125.
  • Rectifying circuit 126 that rectifies the pulse current
  • a pulse generation circuit 127 that converts the direct current output from the rectifying circuit 126 into a pulse current again
  • a second boosting circuit 128 that further boosts the pulse current
  • the pulse current generated by the oscillation circuit 124 is boosted to 100 V by the first booster circuit 125, further boosted to 4 kV by the second booster circuit 128, and then supplied to the discharge electrode.
  • the pulse current boosted by the second booster circuit 128 is discharged between the rotating substrate 70 (rotating body 5), which is a discharge electrode, and a counter electrode (not shown), thereby generating mist generated on the rotating substrate 70. Can be charged to a positive potential or a negative potential.
  • the control circuit 13, the oscillation circuit 124, the first booster circuit 125, the rectifier circuit 126, the pulse generator circuit 127, the second booster circuit 128, the diode D, and the like are mounted on the control board 14. When the diode D is connected in the forward direction toward the power supply electrode 119, the mist is charged positively. When the diode D is connected in the reverse direction toward the power supply electrode 119, the mist is negative. Is charged.
  • the feeding electrode 119 is not brought into contact with the output shaft 56 of the motor 4 for driving the rotating body, but the feeding electrode 119 is directly brought into contact with a part of the rotating substrate 70 (the rotating body 5) to thereby rotate the rotating substrate 70 (the rotating body).
  • a high voltage may be applied to 5).
  • One end of the ground lead 122 is not limited to the circuit configuration connected to the negative electrode line of the battery 11, but is connected to the secondary electrode line (not shown) of the booster circuit 128. May be. That is, one end of the ground lead 122 may be connected to a ground line of a circuit such as the counter electrode or the negative electrode of the battery 11.
  • Fig. 9 shows how to use the mist generating device having the above-described configuration.
  • the mist generating apparatus according to the present embodiment is used in a state where the grip portion 2 is gripped with the palm of the hand and the injection port 43 of the head portion 3 is directed to the human body face.
  • the main switch 15 is turned on from such a use posture, the mist generation mode is set, and the rotating body driving motor 4 and the pump driving motor 17 are driven and the charging device 117 is driven.
  • the ground potential of the human body can be made equal to the ground potential of the circuit.
  • the rotating substrate 70 can be changed depending on the connection direction of the diode D.
  • the mist generated at 70 can be charged to a positive or negative potential.
  • electric lines of force are formed from the rotating board 70 of the mist generating device toward the human body, so that the positive or negatively charged mist generated by the rotating board 70 is moved along the electric lines of force, It can be attracted to the human body.
  • mist can be attracted to a human body more efficiently, mist can be adsorbed to a human body more efficiently.
  • the rotating substrate 70 (rotating body 5) while applying a high voltage, it is possible to generate mist charged positively or negatively on the rotating substrate 70.
  • the mist can be adsorbed to the human body by generating the negatively charged mist on the rotating substrate 70.
  • the contact electrode 121 connected to the circuit ground line such as the counter electrode or the negative electrode of the battery 11 is provided, the ground potential of the human body is positively set to the same potential as the circuit ground potential. Therefore, mist can be stably adsorbed to the human body.
  • FIG. 8A shows a time chart showing the control timing of the motors 4 and 17 in the mist generation mode.
  • the control circuit 13 rotates the motor 4 for driving the rotating body simultaneously with the turning-on operation of the main switch 15.
  • the pump driving motor 17 is driven after a predetermined time (t1) has elapsed since the motor 4 was driven.
  • t1 a predetermined time
  • the rotation speed of the motor 4 in the use state is about 10,000 rpm.
  • the control circuit immediately stops the driving of the pump driving motor 17 and the rotation speed is set for a predetermined time (t2) from the turning off of the main switch 15.
  • the motor 4 for driving the rotating body is rotationally driven while raising the speed (about 15000 rpm).
  • a predetermined time (t2) elapses after the main switch 15 is turned off, the motor 4 is stopped.
  • FIG. 10 shows a cleaning method of the mist generating apparatus according to this embodiment
  • FIG. 8B shows a timing chart during the cleaning operation.
  • the cleaning switch 16 when the cleaning switch 16 is pushed in and turned on, the cleaning mode is set, and the control circuit 13 reversely rotates the motor 4 for driving the rotating body.
  • the reverse rotation speed of the motor 4 at this time is set faster than the rotation speed of the motor 4 in the use state (about 15000 rpm). From this state, when the spray port 43 of the mist generating device is positioned below the tap and the tap of the tap is twisted, tap water (cleaning water) discharged from the tap is discharged from the spray port 43 to the rotating substrate 70 and the fan.
  • the cleaning water introduced from the central opening 53a of the protective hood 45 is passed through the passages (liquid passage 83 and circumferential passage 84) formed between the rotating substrates 70a to 70d and between the rotating substrate 70d and the base portion 75.
  • These passages can be cleaned by flowing into the formed passages (liquid passage 83 and circumferential passage 84). Therefore, even when highly viscous lotion or the like is made into mist instead of water, the lotion can be prevented from being hardened and clogged in the flow path.
  • the injection port 43 and the communication holes 37 and 40 can be simultaneously cleaned.
  • the cleaning water is not limited to tap water. Again, when the cleaning switch 16 is pushed again and turned off, the rotation of the motor 4 is stopped.
  • this device is a mist generating device that supplies liquid to the rotating substrate 70 by the pump device 9 (feed pump) and mists the liquid by the rotation of the rotating substrate 70.
  • the switch 15 When the switch 15 is turned on, the rotary substrate 70 is rotated and the pump device 9 is driven.
  • the switch 15 is turned off, the driving of the pump device 9 is stopped, and then the rotation of the rotary substrate 70 is stopped after a predetermined period (t2).
  • t2 As described above, after the driving of the pump device 9 is stopped, if the rotation of the rotating substrate 70 is stopped after a predetermined period (t2), the residual liquid remaining on the rotating substrate 70 is misted to ensure the rotation. Since the liquid can be discharged, it is possible to reliably prevent the liquid from solidifying, particularly when the viscous liquid remains. Therefore, it is possible to obtain a mist generating device having excellent reliability while suppressing the occurrence of malfunction.
  • this mist generating device when the switch 15 is turned on, the rotary substrate 70 is rotated and the pump device 9 is driven, and when the switch 15 is turned off, the driving of the pump device 9 is stopped, and then for a predetermined period (t2).
  • the rotation of the rotating substrate 70 is stopped later,
  • the rotational speed of the rotating substrate 70 in the predetermined period (t2) is set to be faster than the rotational speed when mist is generated.
  • the rotational speed of the rotary substrate 70 in the predetermined period (t2) after the driving of the pump device 9 is stopped is set to be higher than the rotational speed at the time of mist generation, the residual liquid is more reliably discharged. Therefore, the solidification problem of the residual liquid can be surely solved.
  • the rotary substrate 70 is rotated by turning on the switch 15, and then the pump device 9 is driven after a predetermined period (t1). According to this, since the liquid is supplied to the rotating substrate 70 after the rotating speed of the rotating substrate 70 is increased, large mist generated when the liquid is supplied when the rotating speed of the rotating substrate 70 is low is generated. The inconvenience of being done can be solved. Therefore, it is possible to generate a finer mist more reliably.
  • this mist generating device has a mist generation mode and a cleaning mode
  • a fan 46 fan unit
  • the wind generated by the fan 46 is used to carry mist in the mist generation mode, and is used to discharge washing water in the cleaning mode.
  • the wind used for both actions can be generated.
  • the number of parts can be reduced and the manufacturing cost of the mist generating device can be reduced.
  • the wind used for both actions can be generated with a simple configuration, a highly reliable mist generating device can be obtained.
  • the rotational speed of the rotating substrate 70 in the cleaning mode can be made faster than the rotating speed of the rotating substrate 70 in the mist generation mode. According to this, the improvement of the discharge effect of washing water can be expected.
  • FIG. 13 shows a second embodiment of the mist generating apparatus according to the present invention.
  • the point that the collision wall row 82 is spirally arranged from the center of the circle of the rotating substrate 70 toward the outer periphery is different from the first embodiment. Since the other points are the same as those in the first embodiment, the same members are denoted by the same reference numerals, and the description thereof is omitted.
  • FIG. 13 shows only the rotating substrate 70a positioned at the lowermost position, but the remaining rotating substrates 70b to 70d can adopt the same arrangement configuration of the collision wall rows 82 as the rotating substrate 70a. To supplement.
  • FIG. 14 shows a third embodiment of the present invention.
  • the point that the collision wall 81 is formed by an etching method is different from the first embodiment. That is, as shown in FIG. 14A, after a pattern resist 131 having a resist body 130 corresponding to the formation location of the collision wall 81 is formed on the upper surface of the substrate body 80 constituting the rotating substrate 70, the substrate body By applying an etching solution from the upper surface side of 80 and etching the upper surface of the substrate body 80 without the resist body 130 with the etching solution, the liquid passage 83 and the circumferential passage 84 as shown in FIG.
  • the collision wall 81 is formed by forming a recess corresponding to the above in the substrate body 80.
  • the concavo-convex portion 95 can be formed by etching with an etching solution on the periphery of the recess, that is, the side surface of the collision wall 81. Since the other points are the same as those of the first embodiment, the same members are denoted by the same reference numerals and the description thereof is omitted.
  • FIG. 15 shows a fourth embodiment of the present invention.
  • an overhang portion 135 larger than the peripheral wall surface of the collision wall 81 is formed at the upper end of the collision wall 81.
  • the rotating body 5 is not formed by stacking a plurality of rotating substrates 70, but the rotating body 5 is configured by only one rotating substrate 70.
  • the upper rotating substrate 70 that serves as a top plate that covers the liquid passage 83 and the circumferential passage 84 is eliminated. Since the other points are the same as those in the first embodiment, the same members are denoted by the same reference numerals and the description thereof is omitted.
  • the overhang portion 135 is formed at the upper end of the collision wall 81, the liquid passing through the liquid passage 83 and the circumferential passage 84 can be prevented from moving upward in the overhang portion 135. Therefore, the liquid can be moved from the center of the rotating substrate 70 toward the outer peripheral direction while repeatedly colliding the liquid with the collision wall 81. Therefore, a miniaturized mist can be obtained.
  • the rotating body 5 is configured by four rotating substrates 70 (70a to 70d).
  • the present invention is not limited to this, and the number of rotating substrates 70 may be more than four. It may be less than 4 sheets.
  • the mist generating device includes two switches, the main switch 15 and the cleaning switch 16, and the mist generating mode is set when the main switch 15 is pressed and the cleaning mode is set when the cleaning switch 16 is pressed.
  • the number of switches may be one, and the mode may be changed in a cycle every time the switch is pressed.
  • the shape of the main body case 1 such as the protective hood 45 is not limited to that shown in the first embodiment.
  • the plurality of rotating substrates 70 are fixed by the connecting bosses 64.
  • the present invention is not limited to this, and the plurality of rotating substrates 70 can be fixed by screws.
  • the mist generating unit 5 includes a fan (fan unit 46).
  • a fan fan unit 46
  • the present invention is not limited to this, and there may be no fan.
  • a fan motor may be provided separately from the rotating body driving motor 4.
  • the driving means of the rotating body 5 is not limited to the motor 4 and may be a manual rotating body driving means.
  • manual rotating body drive means comprising a rack gear provided in the pressing lever, a pinion gear meshing with the rack gear, and a one-way clutch provided between the pinion gear and the rotating body, Alternatively, a mainspring type rotating body driving means may be used.
  • the rotating body 5 may be rotated by wind force provided by a separately provided air supply unit by providing a plurality of fins on the back surface of the rotating body.
  • generation part 6 Can be provided separately from the liquid feeding means 9 and the tank 7. That is, the form which the mist production
  • the form may be such that the lotion bottle is directly connected to supply the liquid.
  • the lotion bottle itself is the tank of the present invention.
  • the liquid may be directly supplied to the rotating body 5 by using a dropper or the like. In this case, the dropper itself serves as a tank and a liquid supply unit.
  • Liquid feed means (feed pump) 70 rotating substrate 81 collision wall 82 collision wall row 83 liquid passage 86 top plate 90 wall surface 91 wall surface 92 wall surface 93 wall surface 94 upper surface 95 uneven portion 96 groove 97 rib 135 overhang portion A liquid passage passage width B circumferential liquid passage direction Passage width E Rotational substrate thickness dimension H Collision wall protrusion dimension T Collision wall thickness dimension W Collision wall width dimension

Abstract

Uneven sections (95) are formed on wall surfaces (90) of a plurality of impact walls (81) provided on a rotating substrate (70), causing the wall surfaces to be roughened. Consequently, liquid drops impacting the wall surfaces (90) are more effectively separated/dispersed (broken up), and aggregation of the liquid drops on the surface of the wall surfaces (90) is prevented, thereby allowing a finer mist to be obtained and the mist diameter to be harmonized. In addition, a ring-shaped array of impact walls (82) in which the impact walls (81) and liquid channels (83) are disposed in alternating fashion is provided in at least two rows on the rotating substrate (70), the impact walls (81) of the outer array of impact walls (82) being opposed to the liquid channels (83) of the inner array of impact walls (82). Consequently, before traveling beyond the outermost array of impact walls (82), the liquid is effectively caused to impact the impact walls (81), and accordingly refined, allowing a fine mist to be obtained.

Description

ミスト発生装置Mist generator
 本発明は、水または化粧水などの液体を微細なミストにして送出するミスト発生装置に関する。このミスト発生装置は、例えば、肌を潤いのある状態にする加湿器として、あるいは喉や口腔を湿らせる吸入器として使用できる。さらに、洗濯槽の内部に配置してミスト状の洗剤や柔軟剤を放出する液体散布器として使用することができる。 The present invention relates to a mist generating device for sending a liquid such as water or lotion as a fine mist. This mist generator can be used, for example, as a humidifier that moisturizes the skin or as an inhaler that moistens the throat and oral cavity. Furthermore, it can be used as a liquid spreader that is disposed inside the washing tub and releases a mist-like detergent or softener.
 本発明に係るミスト発生装置は、回転基板上に送給された液体を遠心力で跳ね飛ばして、回転基板上に設けた衝突壁に衝突させることにより液体を微細化するが、この種のミスト発生装置は例えば特許文献1に公知である。そこでは、対向する一対の円盤の間に中心から放射状に伸びる8枚の羽根と、多数の邪魔部材とが、円盤と一体に設けてあり、回転する円盤の間に液体を送給すると、液体が遠心力で跳ね飛ばされてミスト化され、邪魔部材に衝突することによってさらに微細化されて、円盤の間から外方へ放出されるようにしている。 The mist generating apparatus according to the present invention finely divides a liquid by splashing the liquid fed onto the rotating substrate with a centrifugal force and causing it to collide with a collision wall provided on the rotating substrate. A generator is known, for example, from US Pat. There, eight blades extending radially from the center between a pair of opposing disks and a number of baffle members are provided integrally with the disk, and when liquid is fed between the rotating disks, Is blown off by a centrifugal force to be misted, further refined by colliding with a baffle member, and discharged outward from between the disks.
 同様のミスト発生装置は特許文献2にも開示されている。そこでは、上下一対の円板の間に、径方向に伸びる多数の案内路を有する環状壁と、案内路の出口に臨む多数のコロとが設けてある。回転する一対の円板の間に液体を送給すると、液体が遠心力で跳ね飛ばされてミスト化され、案内路を通ってコロに衝突することによりさらに液体が微細化される。 A similar mist generator is also disclosed in Patent Document 2. There, an annular wall having a large number of guide paths extending in the radial direction and a large number of rollers facing the exit of the guide paths are provided between a pair of upper and lower disks. When the liquid is fed between a pair of rotating disks, the liquid is splashed by centrifugal force to be misted, and the liquid is further refined by colliding with the rollers through the guide path.
国際公開第98/05432号(第15頁第5~19行、第8図)International Publication No. 98/05432 (Page 15, Lines 5-19, Figure 8) 実開昭62-179052号のマイクロフィルム(第8頁第6~8行、第2図)Japanese Utility Model Sho 62-179052 microfilm (page 8, lines 6-8, Fig. 2)
 特許文献1の邪魔部材、および特許文献2のコロは、共に円柱形状に形成されている。このため、液体が邪魔部材等に衝突したときに、液体に加わる衝突エネルギーが円柱表面で分散されることが避けられず、効率的に液体をミスト化することができず、ミスト径の微細化を図ることが困難である。 Both the baffle member of Patent Document 1 and the roller of Patent Document 2 are formed in a cylindrical shape. For this reason, when the liquid collides with a baffle member or the like, it is inevitable that the collision energy applied to the liquid is dispersed on the cylindrical surface, the liquid cannot be efficiently misted, and the mist diameter is reduced. It is difficult to plan.
 本発明の目的は、より効率的に微細なミストを生成できるミスト発生装置を提供することにある。 An object of the present invention is to provide a mist generator that can generate fine mist more efficiently.
 本発明は、回転駆動される回転基板70と、ミスト生成用の液体8を収容するタンク7と、タンク7に収容した液体8を回転基板70に送給する液体送給手段9とを備えるミスト発生装置を対象とする。そして、回転基板70が、複数の衝突壁81を有しており、衝突壁81の壁面90に凹凸部95を形成して、該壁面90が粗面化されていることを特徴とする。 The present invention includes a rotating substrate 70 that is rotationally driven, a tank 7 that stores a liquid 8 for generating mist, and a liquid supply means 9 that supplies the liquid 8 stored in the tank 7 to the rotating substrate 70. For generators. The rotating substrate 70 has a plurality of collision walls 81, and an uneven portion 95 is formed on the wall surface 90 of the collision wall 81 so that the wall surface 90 is roughened.
 また、本発明は、回転駆動される回転基板70と、ミスト生成用の液体8を収容するタンク7と、タンク7に収容した液体8を回転基板70に送給する液体送給手段9とを備えているミスト発生装置を対象とする。衝突壁81と液体通路83とを交互に配置してなる環状の衝突壁列82が、回転基板70の回転中心を囲む状態で、径方向へ少なくとも二重に設けられており、各衝突壁列82は、外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されている。そして、少なくとも内側の衝突壁列82の液体通路83の出口に臨む外側の衝突壁列82の衝突壁81の壁面90に凹凸部95を形成して、該壁面90が粗面化されていることを特徴とする。 The present invention also includes a rotary substrate 70 that is driven to rotate, a tank 7 that contains a liquid 8 for generating mist, and a liquid feeding means 9 that feeds the liquid 8 contained in the tank 7 to the rotary substrate 70. Targeted mist generators. An annular collision wall row 82 formed by alternately arranging the collision walls 81 and the liquid passages 83 is provided at least twice in the radial direction so as to surround the rotation center of the rotary substrate 70. 82, the collision wall 81 constituting the outer collision wall row 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82. And the uneven | corrugated | grooved part 95 is formed in the wall surface 90 of the collision wall 81 of the outer side collision wall row | line | column 82 which faces the exit of the liquid channel | path 83 of the inner side collision wall row | line | column 82 at least, and this wall surface 90 is roughened. It is characterized by.
 本発明で言うところの「環状の衝突壁列」とは、図5に示すように、径寸法の異なる衝突壁列82が複数個形成されている形態のほか、図13に示すように、衝突壁列82が螺旋状に形成されている形態をも含む概念である。また、本発明において「外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されている」とは、一つの例外も無く、全ての外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されていることを意味するものではなく、大多数の外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されていることをも含む概念である。 The “annular collision wall row” referred to in the present invention is not only a form in which a plurality of collision wall rows 82 having different diameters are formed as shown in FIG. 5, but also as shown in FIG. This is a concept including a form in which the wall row 82 is formed in a spiral shape. Further, in the present invention, “the collision wall 81 constituting the outer collision wall row 82 is disposed in a state of facing the liquid passage 83 of the inner collision wall row 82” is without any exception, and is all It does not mean that the collision wall 81 constituting the outer collision wall row 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82, and the majority of the outer collision wall rows 82 This is a concept that includes that the collision wall 81 constituting 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82.
 回転基板70の表面粗度は、凹凸部95が形成された衝突壁81の壁面90の粗度よりも小さく設定することが好ましい。 The surface roughness of the rotating substrate 70 is preferably set to be smaller than the roughness of the wall surface 90 of the collision wall 81 on which the uneven portion 95 is formed.
 衝突壁81を構成する全ての壁面90・91・92・93に凹凸部95を形成して、粗面化することができる。 The uneven portions 95 can be formed on all the wall surfaces 90, 91, 92, and 93 constituting the collision wall 81 to be roughened.
 衝突壁81が回転基板70の表面から突出状に形成されており、凹凸部95が、回転基板70からの突出方向に長い溝96とリブ97とで構成されている形態を採ることができる。 The collision wall 81 is formed in a protruding shape from the surface of the rotating substrate 70, and the uneven portion 95 can be configured by a groove 96 and a rib 97 that are long in the protruding direction from the rotating substrate 70.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)とが、W>Tの関係を満たすように設定することができる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70 and the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70 are set so as to satisfy the relationship W> T. be able to.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)とが、W>H>Tの関係を満たすように設定することができる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the protruding dimension (H) of the collision wall 81 are: It can be set to satisfy the relationship of W> H> T.
 回転基板70は基板本体80と衝突壁81を含み、基板本体80の厚み寸法(E)と、回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)とが、E>W>H>Tの関係を満たすように設定することができる。 The rotating substrate 70 includes a substrate main body 80 and a collision wall 81, and the thickness dimension (E) of the substrate main body 80, the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, and the radial direction of the rotating substrate 70. The thickness dimension (T) of the collision wall 81 and the protrusion dimension (H) of the collision wall 81 can be set so as to satisfy the relationship E> W> H> T.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)と、衝突壁列82の液体通路83の通路幅(A)とが、W>H>T>Aの関係を満たすように設定することができる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, the protruding dimension (H) of the collision wall 81, and the collision The passage width (A) of the liquid passage 83 in the wall row 82 can be set so as to satisfy the relationship of W> H> T> A.
 内外の衝突壁列82を構成する衝突壁81の間に形成される周方向の液体通路84の通路幅(B)と、衝突壁列82の液体通路83の通路幅(A)とが、B>Aの関係を満たすように設定することができる。 The passage width (B) of the circumferential liquid passage 84 formed between the collision walls 81 constituting the inner and outer collision wall row 82 and the passage width (A) of the liquid passage 83 of the collision wall row 82 are represented by B > A can be set to satisfy the relationship.
 衝突壁81の上面94には天板86が固定されており、衝突壁81の上面94の粗度は、液体通路83に臨む衝突壁81の壁面90の粗度よりも小さく設定することが好ましい。 A top plate 86 is fixed to the upper surface 94 of the collision wall 81, and the roughness of the upper surface 94 of the collision wall 81 is preferably set smaller than the roughness of the wall surface 90 of the collision wall 81 facing the liquid passage 83. .
 衝突壁列82が回転基板70の径方向へ多重に設けられており、衝突壁81を含む衝突壁列82が、天板86の支持構造を兼ねている形態を採ることができる。 The colliding wall row 82 is provided in a multiple manner in the radial direction of the rotary substrate 70, and the colliding wall row 82 including the collision wall 81 can also take the form of serving as a support structure for the top plate 86.
 衝突壁列82を備える回転基板70が複数枚積層されており、上方の回転基板70が、下方の回転基板70の天板86を兼ねている形態を採ることができる。 A plurality of rotary substrates 70 each having a collision wall row 82 are stacked, and the upper rotary substrate 70 can also serve as the top plate 86 of the lower rotary substrate 70.
 衝突壁81は電鋳法により形成することができる。 The collision wall 81 can be formed by electroforming.
 衝突壁81の上端にオーバーハング部135が設けられている形態を採ることができる。 The form in which the overhang part 135 is provided at the upper end of the collision wall 81 can be taken.
 エッチング法により衝突壁81を形成することができる。 The collision wall 81 can be formed by an etching method.
 本発明に係るミスト発生装置においては、回転基板70に設けられた衝突壁81の壁面90に凹凸部95を形成して、壁面90を粗面化した。これによれば、壁面90に衝突した液滴をより効率的に分離・分散(粉砕)させることができるので、液体を確実に微細化して、細かなミストを得ることが可能となる。加えて、壁面90に凹凸部95を形成したので、該壁面90の表面で液滴が団粒化することを防ぐことができ、したがって、より細かなミストを得ることができるとともに、ミスト径の均一化を図ることができる。 In the mist generating apparatus according to the present invention, the concavo-convex portion 95 is formed on the wall surface 90 of the collision wall 81 provided on the rotating substrate 70 to roughen the wall surface 90. According to this, since the liquid droplets colliding with the wall surface 90 can be more efficiently separated and dispersed (pulverized), the liquid can be reliably miniaturized and fine mist can be obtained. In addition, since the concavo-convex portion 95 is formed on the wall surface 90, it is possible to prevent droplets from aggregating on the surface of the wall surface 90. Therefore, a finer mist can be obtained and the mist diameter can be reduced. Uniformity can be achieved.
 また、本発明に係るミスト発生装置においては、衝突壁81と液体通路83とを交互に配置した環状の衝突壁列82を少なくとも二重に設け、外側の衝突壁列82の衝突壁81を、内側の衝突壁列82の液体通路83に対向させたので、液体が最外周の衝突壁列82の外方へ飛び出るまでの間に、該液体を衝突壁81に確実に衝突させることができる。したがって、液体を微細化して、細かなミストを得ることができる。
 加えて本発明では、少なくとも内側の衝突壁列82の液体通路83の出口に臨む外側の衝突壁列82の衝突壁81の壁面90に凹凸部95を形成して、該壁面90を粗面化したので、壁面90に衝突した液滴をより効率的に分離・分散(粉砕)させることができる。加えて、壁面90に凹凸部95が形成されていると、該壁面90の表面で液滴が団粒化することを防ぐことができる。したがって、より細かなミストを得ることができるとともに、ミスト径の均一化を図ることができる。
Further, in the mist generating apparatus according to the present invention, at least double annular collision wall rows 82 in which the collision walls 81 and the liquid passages 83 are alternately arranged are provided, and the collision wall 81 of the outer collision wall row 82 is provided, Since the liquid passage 83 of the inner collision wall row 82 is opposed to the liquid, the liquid can be reliably collided with the collision wall 81 until the liquid jumps out of the outermost outer collision wall row 82. Therefore, it is possible to obtain a fine mist by refining the liquid.
In addition, in the present invention, at least the concave and convex portions 95 are formed on the wall surface 90 of the collision wall 81 of the outer collision wall row 82 facing the outlet of the liquid passage 83 of the inner collision wall row 82 to roughen the wall surface 90. As a result, the liquid droplets colliding with the wall surface 90 can be more efficiently separated and dispersed (pulverized). In addition, when the concavo-convex portion 95 is formed on the wall surface 90, droplets can be prevented from aggregating on the surface of the wall surface 90. Therefore, a finer mist can be obtained and the mist diameter can be made uniform.
 回転基板70の表面粗度が、凹凸部95が形成された衝突壁81の壁面90の粗度よりも小さく設定されていると、回転基板70の表面に沿って液体通路83を流れる液滴やミストの流速が損なわれることを効果的に防ぐことができる。換言すれば、液体通路83を流れる液滴やミストの衝突壁81への衝突エネルギーが、回転基板70の表面に接触することで奪われることを防ぐことができる。これにて、効率的に液滴やミストを衝突壁81に衝突させることができるので、より細かなミストを得ることができる。 When the surface roughness of the rotating substrate 70 is set to be smaller than the roughness of the wall surface 90 of the collision wall 81 on which the concavo-convex portion 95 is formed, a droplet flowing in the liquid passage 83 along the surface of the rotating substrate 70 It can prevent effectively that the flow rate of mist is impaired. In other words, it is possible to prevent the collision energy of the droplets and mist flowing through the liquid passage 83 from colliding with the collision wall 81 from being taken away by contacting the surface of the rotating substrate 70. Thereby, since a droplet or mist can be made to collide with the collision wall 81 efficiently, finer mist can be obtained.
 衝突壁81を構成する全ての壁面90・91・92・93に凹凸部95が形成され、粗面化されていると、該衝突壁81の壁面で区画される液体通路83の流路抵抗の増大化を図ることができる。したがって、液体の分離効果の向上が期待でき、より細かなミストを得ることができる。 When uneven portions 95 are formed and roughened on all the wall surfaces 90, 91, 92, and 93 constituting the collision wall 81, the flow resistance of the liquid passage 83 defined by the wall surface of the collision wall 81 is reduced. Increase can be achieved. Therefore, improvement of the liquid separation effect can be expected, and finer mist can be obtained.
 例えば、凹凸部95が、回転基板70からの突出方向と直交する方向、すなわち水平方向に長い溝とリブとで構成されている場合には、液体通路83における液体の流れ方向に溝が形成されることとなるため、該溝に沿って液体が流れることで、液体が団粒化し、却ってミスト径が大きくなるおそれがある。これに対して本発明のように、凹凸部95を回転基板70からの突出方向に長い溝96とリブ97とで構成して、液体流路における液体の流れ方向と直交する方向に溝96を形成していると、液体通路83の流れ方向における流路抵抗を大きくすることができるため、液体をより効率的に分離・分散して、ミスト径の微細化を図ることができる。 For example, when the concavo-convex portion 95 is configured by a groove and a rib that are long in the direction perpendicular to the protruding direction from the rotating substrate 70, that is, in the horizontal direction, the groove is formed in the liquid flow direction in the liquid passage 83. Therefore, when the liquid flows along the groove, the liquid aggregates and there is a possibility that the mist diameter increases. On the other hand, as in the present invention, the concavo-convex portion 95 is composed of grooves 96 and ribs 97 that are long in the protruding direction from the rotating substrate 70, and the grooves 96 are formed in a direction perpendicular to the liquid flow direction in the liquid flow path. If formed, the flow path resistance in the flow direction of the liquid passage 83 can be increased, so that the liquid can be more efficiently separated and dispersed to reduce the mist diameter.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)とが、W>Tの関係を満たすように設定されていると、回転基板70の小径化を図り、ミスト発生装置の全体寸法の小型化に貢献できる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70 and the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70 are set so as to satisfy the relationship of W> T. In this case, the diameter of the rotating substrate 70 can be reduced, and the overall size of the mist generator can be reduced.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)とが、W>H>Tの関係を満たすように設定されていると、回転基板70の小径化を図りながら、衝突壁81の衝突面積を大きくすることができる。すなわち、衝突壁81の厚み寸法(T)を小さくしながら、衝突壁81の幅寸法(W)と衝突壁の突出寸法(H)とで規定される、外側の衝突壁列82の衝突壁81の壁面面積(W×H)を大きく取ることができる。これにて、衝突壁81の厚み寸法(T)を小さくして、回転基板70の小径化を図りながら、より確実に内側の衝突壁列82の液体通路83から送出された液滴を、外側の衝突壁列82の衝突壁81に衝突させて、効率的にミスト径の微細化を図ることが可能となる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the protruding dimension (H) of the collision wall 81 are: If it is set to satisfy the relationship of W> H> T, the collision area of the collision wall 81 can be increased while reducing the diameter of the rotating substrate 70. That is, while the thickness dimension (T) of the collision wall 81 is reduced, the collision wall 81 of the outer collision wall row 82 defined by the width dimension (W) of the collision wall 81 and the protrusion dimension (H) of the collision wall. The wall surface area (W × H) can be increased. As a result, the thickness dimension (T) of the collision wall 81 is reduced to reduce the diameter of the rotating substrate 70, and the droplets sent out from the liquid passage 83 of the inner collision wall row 82 are more reliably transferred to the outer side. It is possible to efficiently reduce the mist diameter by colliding with the collision wall 81 of the collision wall row 82.
 基板本体80の厚み寸法(E)と、回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)とが、E>W>H>Tの関係を満たすように設定されていると、先と同様に、回転基板70の小径化を図りながら、衝突壁81の衝突面積を大きくすることができる。また、回転基板70の厚み寸法(E)を大きく取って、該回転基板70を強度に優れたものとすることができる。加えて、回転基板70の重量を大きくして、その慣性重量を大きくすることができるので、回転基板70の回転姿勢を安定化することができる。 The thickness dimension (E) of the substrate body 80, the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the collision When the protruding dimension (H) of the wall 81 is set so as to satisfy the relationship of E> W> H> T, the collision of the collision wall 81 is attempted while reducing the diameter of the rotating substrate 70 as before. The area can be increased. Moreover, the thickness dimension (E) of the rotating substrate 70 can be increased to make the rotating substrate 70 excellent in strength. In addition, since the weight of the rotating substrate 70 can be increased and the inertia weight thereof can be increased, the rotational posture of the rotating substrate 70 can be stabilized.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)と、衝突壁列82の液体通路83の通路幅(A)とが、W>H>T>Aの関係を満たすように設定されていると、先と同様に、回転基板70の小径化を図りながら、衝突壁81の衝突面積を大きくすることができる。加えて、衝突壁81の突出寸法(H)を、液体通路83の通路幅(A)よりも大きくしていると、これら衝突壁81の突出寸法(H)と液体通路83の通路幅(A)とで規定される液体通路83の断面積(H×A)を大きく取ることができるので、該液体通路83内の液体の流れをスムーズなものとすることができる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, the protruding dimension (H) of the collision wall 81, and the collision When the passage width (A) of the liquid passage 83 in the wall row 82 is set so as to satisfy the relationship of W> H> T> A, the diameter of the rotating substrate 70 is reduced as before, The collision area of the collision wall 81 can be increased. In addition, if the protrusion dimension (H) of the collision wall 81 is larger than the passage width (A) of the liquid passage 83, the protrusion dimension (H) of the collision wall 81 and the passage width (A) of the liquid passage 83 are set. The cross-sectional area (H × A) of the liquid passage 83 defined by (2) can be made large, so that the liquid flow in the liquid passage 83 can be made smooth.
 内外の衝突壁列82を構成する衝突壁81の間に形成される周方向の液体通路84の通路幅(B)と、衝突壁列82の液体通路83の通路幅(A)とが、B>Aの関係を満たすように設定されていると、衝突壁列82の液体通路81の通路幅(A)を小さくしたことに由来する、衝突壁81に対する液体の衝突エネルギーの向上効果が期待できる。したがって、より効率的に液体を衝突壁81に衝突させて、ミスト径を微細化できる。 The passage width (B) of the circumferential liquid passage 84 formed between the collision walls 81 constituting the inner and outer collision wall row 82 and the passage width (A) of the liquid passage 83 of the collision wall row 82 are represented by B If it is set so as to satisfy the relationship of> A, the effect of improving the collision energy of the liquid against the collision wall 81, which is derived from the reduction of the passage width (A) of the liquid passage 81 of the collision wall row 82, can be expected. . Therefore, it is possible to make the mist diameter finer by causing the liquid to collide with the collision wall 81 more efficiently.
 衝突壁81の上面94の粗度が、液体通路83に臨む衝突壁81の壁面90の粗度よりも小さく設定されていると、天板86と衝突壁81との密着性の向上を図ることができる。これにより、不用意に天板86と衝突壁81とが分離することを防ぐことができるので、天板86と回転基板70とが強固に一体化された状態を長期にわたって維持できる。 When the roughness of the upper surface 94 of the collision wall 81 is set to be smaller than the roughness of the wall surface 90 of the collision wall 81 facing the liquid passage 83, the adhesion between the top plate 86 and the collision wall 81 is improved. Can do. Accordingly, it is possible to prevent the top plate 86 and the collision wall 81 from being inadvertently separated, so that the state in which the top plate 86 and the rotating substrate 70 are firmly integrated can be maintained for a long time.
 衝突壁列82が回転基板70の径方向へ多重に設けられていると、液体の進行方向を多様化させて、液体をよく分離させることができ、ミストの微細化を促進できる。また、液体通路83と対向する衝突壁81に液体を繰り返して衝突させて、ミストをさらに確実に微細化できる。また、衝突壁81を含む衝突壁列82が天板86の支持構造を兼ねていると、別途に天板の支持構造を設ける形態に比べて、ミスト発生装置の製造コストの上昇を抑えることができる。 If the collision wall rows 82 are provided in the radial direction of the rotating substrate 70, the liquid traveling direction can be diversified, the liquid can be well separated, and the mist can be miniaturized. In addition, the liquid can be repeatedly collided with the collision wall 81 facing the liquid passage 83, so that the mist can be further refined. Further, if the collision wall row 82 including the collision wall 81 also serves as a support structure for the top plate 86, an increase in the manufacturing cost of the mist generating device can be suppressed as compared with a mode in which a separate support structure for the top plate is provided. it can.
 衝突壁列82を備える回転基板70が複数枚積層されていると、回転基板70の外径寸法を大きくすることなく、ミスト発生量の増大化を図ることができる。従って、小型でありながら、ミスト生成能力に優れたミスト発生装置を得ることができる。加えて、上方の回転基板70が、下方の回転基板70の天板86を兼ねていると、複数個積層された回転基板70の全体寸法(上下方向の厚み寸法)の増大化を抑えることができるので、ミスト発生装置の小型化に貢献できる。 When a plurality of rotating substrates 70 including the collision wall row 82 are stacked, the amount of mist generated can be increased without increasing the outer diameter of the rotating substrate 70. Therefore, it is possible to obtain a mist generating device that is small and excellent in mist generation capability. In addition, if the upper rotating substrate 70 also serves as the top plate 86 of the lower rotating substrate 70, it is possible to suppress an increase in the overall dimension (vertical thickness dimension) of the stacked rotating substrates 70. This can contribute to the miniaturization of the mist generator.
 衝突壁81が電鋳法により形成されていると、多数個の衝突壁81を備える回転基板70を精度良く形成することができる。
 加えて、電鋳法の電着工程に先立って形成されるレジスト体111のパターンフィルム110にフィラー115を含有させてあると、該フィラー115による光の屈折によりレジスト体111の側面に縦溝を形成することができるので、該縦溝を利用して衝突壁81の凹凸部95を形成することができる。より具体的には、電鋳法が、基板本体80上にフォトレジスト層109を形成する工程と、液体通路83に対応する透孔110aを有するパターンフィルム110を該フォトレジスト層109上に形成する工程と、紫外線光照射手段103で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、液体通路83に対応するレジスト体111を有するパターンレジスト112を基板本体80上に形成する工程と、該レジスト体111の無い基板本体80の部分に金属を電着させることにより、衝突壁81に対応する電鋳層113を形成する工程とを含むものとしたうえで、前記パターンフィルム110にフィラー115を含ませてあると、該フィラー115による紫外線光の屈折によりパターンレジスト112の露光部分と未露光部分との境界部、すなわちレジスト体111の側面に溝ができるため、かかる溝を利用して電鋳層113を形成することで、衝突壁81の表面に縦溝を形成することができる。以上より、パターンフィルム110にフィラー115を含ませてあると、衝突壁81の形成と同時に凹凸部95を形成することができるので、サンドブラストや金属粒体を塗着するなどの別工程で凹凸部95を形成する形態に比べて、ミスト発生装置の製造コストの上昇を抑えることができる。
When the collision wall 81 is formed by electroforming, the rotary substrate 70 including a large number of collision walls 81 can be formed with high accuracy.
In addition, if the filler 115 is included in the pattern film 110 of the resist body 111 formed prior to the electrodeposition process of the electroforming method, vertical grooves are formed on the side surfaces of the resist body 111 due to light refraction by the filler 115. Since it can be formed, the concavo-convex portion 95 of the collision wall 81 can be formed using the vertical groove. More specifically, the electroforming method forms a photoresist layer 109 on the substrate body 80 and forms a pattern film 110 having a through hole 110 a corresponding to the liquid passage 83 on the photoresist layer 109. A resist body 111 corresponding to the liquid passage 83 is obtained by performing exposure by irradiating ultraviolet light with the ultraviolet light irradiating means 103, performing development and drying, and dissolving and removing unexposed portions. A step of forming a pattern resist 112 on the substrate body 80 and a step of forming an electroformed layer 113 corresponding to the collision wall 81 by electrodepositing a metal on a portion of the substrate body 80 without the resist body 111. In addition, if the filler 115 is included in the pattern film 110, the pattern is caused by refraction of ultraviolet light by the filler 115. Since a groove is formed at the boundary between the exposed portion and the unexposed portion of the resist 112, that is, the side surface of the resist body 111, the vertical groove is formed on the surface of the collision wall 81 by forming the electroformed layer 113 using the groove. Can be formed. As described above, when the filler 115 is included in the pattern film 110, the concavo-convex portion 95 can be formed simultaneously with the formation of the collision wall 81. Therefore, the concavo-convex portion is formed in a separate process such as applying sandblast or metal particles. Compared with the embodiment in which 95 is formed, an increase in the manufacturing cost of the mist generating device can be suppressed.
 衝突壁81の上端にオーバーハング部135が設けられていると、天板を廃することができるので、ミスト発生装置の製造コストの上昇を抑えることができる。 If the overhang part 135 is provided at the upper end of the collision wall 81, the top plate can be abolished, and an increase in the manufacturing cost of the mist generating device can be suppressed.
 エッチング法により衝突壁81が形成されていると、衝突壁81の形成と同時に凹凸部95を形成することができるので、サンドブラストや金属粒体を塗着するなどの別工程で凹凸部95を形成する形態に比べて、ミスト発生装置の製造コストの上昇を抑えることができる。 If the collision wall 81 is formed by the etching method, the concavo-convex portion 95 can be formed simultaneously with the formation of the collision wall 81, and therefore the concavo-convex portion 95 is formed in a separate process such as sand blasting or metal particle coating. Compared with the form to do, the raise of the manufacturing cost of a mist generator can be suppressed.
本発明の第1実施形態に係るミスト発生装置の要部の斜視図である。It is a perspective view of the principal part of the mist generator which concerns on 1st Embodiment of this invention. ミスト発生装置の概略構造を示す縦断側面図である。It is a vertical side view which shows schematic structure of a mist generator. ミスト発生装置のヘッド部を拡大して示す図である。It is a figure which expands and shows the head part of a mist generator. ミスト発生装置のヘッド部の分解図である。It is an exploded view of the head part of a mist generator. 回転基板を示す平面図である。It is a top view which shows a rotation board. ミスト発生装置の要部の縦断側面図である。It is a vertical side view of the principal part of a mist generator. ミスト発生装置の制御構成を示すブロック図である。It is a block diagram which shows the control structure of a mist generator. (a)・(b)はミスト発生装置の制御方法を説明するためのタイムチャートである。(A) * (b) is a time chart for demonstrating the control method of a mist generator. ミスト発生装置の使用方法を説明するための図である。It is a figure for demonstrating the usage method of a mist generator. ミスト発生装置の洗浄方法を説明するための図である。It is a figure for demonstrating the washing | cleaning method of a mist generator. (a)~(c)は、ミスト発生装置を構成する回転基板の製造方法を説明するための図である。(A)-(c) is a figure for demonstrating the manufacturing method of the rotating substrate which comprises a mist generator. (a)~(c)は、ミスト発生装置を構成する回転基板の製造方法を説明するための図である。(A)-(c) is a figure for demonstrating the manufacturing method of the rotating substrate which comprises a mist generator. 本発明の第2実施形態に係るミスト発生装置を構成する回転基板を示す平面図である。It is a top view which shows the rotating substrate which comprises the mist generator which concerns on 2nd Embodiment of this invention. (a)・(b)は、本発明の第3実施形態に係るミスト発生装置を構成する回転基板を示す縦断側面図である。(A) * (b) is a vertical side view which shows the rotation board which comprises the mist generator which concerns on 3rd Embodiment of this invention. 本発明の第4実施形態に係るミスト発生装置を構成する回転基板を示す縦断側面図である。It is a vertical side view which shows the rotating substrate which comprises the mist generator which concerns on 4th Embodiment of this invention.
(第1実施形態) 図1乃至図12は本発明に係るミスト発生装置の第1実施形態を示す。図2に示すように、ミスト発生装置の筐体となる本体ケース1は、下方に設けられた上下方向に長い円筒状のグリップ部2と、該グリップ部2の上方に一体形成されたヘッド部3とで構成される樹脂成形品である。本発明における前後、左右、上下とは、図2乃至図6等に示す交差矢印と、各矢印の近傍に表記した前後、左右、上下の表示に従う。なお、図2における上下方向とは、グリップ部2の伸び方向を上下方向と規定しており、図3乃至図6においては、ヘッド部3の伸び方向を上下方向と規定しており、図2と、図3乃至図6とでは「上下方向」が異なることを補足する。 First Embodiment FIGS. 1 to 12 show a first embodiment of a mist generating apparatus according to the present invention. As shown in FIG. 2, a main body case 1 serving as a casing of the mist generating apparatus includes a cylindrical grip portion 2 that is provided in the lower portion and is long in the vertical direction, and a head portion that is integrally formed above the grip portion 2. 3 is a resin molded product. In the present invention, “front / rear”, “left / right”, and “upper / lower” follow the cross arrows shown in FIG. 2 to FIG. Note that the vertical direction in FIG. 2 defines the extending direction of the grip portion 2 as the vertical direction, and in FIGS. 3 to 6, the extending direction of the head portion 3 is defined as the vertical direction. It is supplemented that the “vertical direction” is different between FIGS.
 図2に示すように、ヘッド部3の内部には、回転体5と、回転体5を回転駆動するモーター(回転体駆動手段)4と、モーター4の出力軸56に取り付けられるミスト供給用のファン(ファンユニット)46などで構成されるミスト生成部6が配置されている。グリップ部2の下端にはミスト生成用の水(液体)8が収容されるタンク7が着脱自在に装着されており、グリップ部2の内部には、タンク7に収容されている水8をミスト生成部6に送給するための送給ポンプ(液体送給手段)9を含む液体送給部10、回転体駆動用のモーター4等に電力を供給するための電池11、帯電装置117(図7参照)のほか、ミスト発生装置の全体を制御するための制御回路13(図7参照)などが配置されている。図2において、符号14は、制御回路13のほか、帯電装置117を構成する発振回路124等が実装される制御基板を、符号15は、回転体駆動用のモーター4やポンプ駆動用のモーター17等をオンオフ操作するためのメインスイッチを、符号16は、洗浄動作時にモーター4をオン操作するための洗浄スイッチを示す。これらメインスイッチ15および洗浄スイッチ16は、グリップ部2の筐体前面に設けられている。 As shown in FIG. 2, inside the head unit 3, there is a rotating body 5, a motor (rotating body driving means) 4 that rotationally drives the rotating body 5, and a mist supply that is attached to an output shaft 56 of the motor 4. A mist generating unit 6 including a fan (fan unit) 46 and the like is disposed. A tank 7 in which water (liquid) 8 for generating mist is accommodated is detachably attached to the lower end of the grip portion 2, and the water 8 accommodated in the tank 7 is mist inside the grip portion 2. A liquid feeding unit 10 including a feeding pump (liquid feeding means) 9 for feeding to the generating unit 6, a battery 11 for supplying electric power to the rotating body driving motor 4, and the like, a charging device 117 (FIG. 7), and a control circuit 13 (see FIG. 7) for controlling the entire mist generator. In FIG. 2, reference numeral 14 denotes a control board on which the control circuit 13 and the oscillation circuit 124 constituting the charging device 117 are mounted, and reference numeral 15 denotes a rotating body driving motor 4 and a pump driving motor 17. Reference numeral 16 denotes a main switch for turning on and off the motor 4 during the washing operation. The main switch 15 and the cleaning switch 16 are provided on the front surface of the housing of the grip portion 2.
 タンク7は、円筒形状のグリップ部2の外径寸法と一致する外径寸法を有する円筒容器状に形成された樹脂成形品であり、その上壁面7aには、液体送給部10を構成する吸込パイプ25の下端に装着されたストレーナー24の挿入を許す液体供給口20が上向きに突設されている。グリップ部2の下壁面2aには、吸込パイプ25の突出を許すパイプ用開口21が下向きに突設されており、該パイプ用開口21と液体供給口20との間に、タンク脱着機構が設けられている。タンク脱着機構は、グリップ部2側のパイプ用開口21に設けられた雄ねじ部21aと、タンク7側の液体供給口20に設けられた雄ねじ部21aと螺合結合する雌ねじ部20aとからなり、ストレーナー24および吸込パイプ25を液体供給口20からタンク7内に挿入したうえで、雄ねじ部21aの外面に雌ねじ部20aを所定方向に捩じ込むことにより、グリップ部2の下端にタンク7を装着固定することができる。また、グリップ部2の下端にタンク7が装着された状態から、先とは逆方向にタンク7を回転させることにより、雄ねじ部20aに対する雌ねじ部21aの螺合状態を解除して、タンク7をグリップ部2から取り外すことができる。また、タンク7をグリップ部2から取り外したうえで、液体供給口20からタンク7内に水8を供給することで、タンク内7に水8を充填することができる。符号22は、パイプ用開口21と吸込パイプ25との間に配されたシールリングを示す。 The tank 7 is a resin molded product formed in a cylindrical container shape having an outer diameter that matches the outer diameter of the cylindrical grip portion 2, and the upper wall surface 7 a constitutes the liquid feeding unit 10. A liquid supply port 20 that allows insertion of the strainer 24 attached to the lower end of the suction pipe 25 is projected upward. A pipe opening 21 that allows the suction pipe 25 to protrude is projected downward on the lower wall surface 2 a of the grip portion 2, and a tank detaching mechanism is provided between the pipe opening 21 and the liquid supply port 20. It has been. The tank detaching mechanism includes a male screw portion 21a provided in the pipe opening 21 on the grip portion 2 side, and a female screw portion 20a that is screwed and coupled to the male screw portion 21a provided in the liquid supply port 20 on the tank 7 side. After the strainer 24 and the suction pipe 25 are inserted into the tank 7 from the liquid supply port 20, the tank 7 is attached to the lower end of the grip portion 2 by screwing the female screw portion 20a into the outer surface of the male screw portion 21a in a predetermined direction. Can be fixed. Further, by rotating the tank 7 in the opposite direction from the state in which the tank 7 is attached to the lower end of the grip portion 2, the threaded state of the female screw portion 21a with respect to the male screw portion 20a is released, and the tank 7 is It can be removed from the grip part 2. Further, by removing the tank 7 from the grip portion 2 and supplying water 8 into the tank 7 from the liquid supply port 20, the water 7 can be filled into the tank 7. Reference numeral 22 denotes a seal ring disposed between the pipe opening 21 and the suction pipe 25.
 液体送給部10は、グリップ部2の内部に配された送給ポンプ9と、送給ポンプ9を駆動するモーター17と、送給ポンプ9の吸込口からタンク7の内底に向かって伸びる吸込パイプ25と、送給ポンプ9の吐出口と回転体5との間に配置される吐出流路26とで構成される。吐出流路26は、送給ポンプ9の吐出口からヘッド部3の保護フード45にわたって配置される送給チューブ27と、保護フード45に形成される液体通路28と、液体通路28に連通されて回転体5に向かって伸びる送給管29とで構成される。送給ポンプ9は低圧仕様のギヤポンプからなり、毎秒0.01ml程度の水を吐出流路26へ送出する。 The liquid supply unit 10 extends toward the inner bottom of the tank 7 from the supply pump 9 disposed inside the grip unit 2, the motor 17 that drives the supply pump 9, and the suction port of the supply pump 9. It is comprised by the suction pipe 25 and the discharge flow path 26 arrange | positioned between the discharge port of the feed pump 9, and the rotary body 5. FIG. The discharge channel 26 is in communication with the feed tube 27 disposed from the discharge port of the feed pump 9 to the protective hood 45 of the head unit 3, the liquid passage 28 formed in the protective hood 45, and the liquid passage 28. The feed pipe 29 extends toward the rotating body 5. The feed pump 9 is a low-pressure gear pump, and delivers about 0.01 ml of water to the discharge passage 26 per second.
 図3および図4に示すように、ヘッド部3は、上下方向中央部に配されたベースケース30と、ベースケース30の下方に配された下ケース31と、ベースケース30の上方に配された上ケース32とで構成され、その内部にモーター4を装着するためのモーターホルダー33が設けられている。これらベースケース30、下ケース31、および上ケース32などで構成されるヘッド部3は、グリップ部2に連設されたヘッドホルダー3a(図2参照)内に装着されている。 As shown in FIGS. 3 and 4, the head portion 3 is disposed above the base case 30, a base case 30 disposed at the center in the vertical direction, a lower case 31 disposed below the base case 30, and the base case 30. In addition, a motor holder 33 for mounting the motor 4 is provided therein. The head portion 3 composed of the base case 30, the lower case 31, the upper case 32, and the like is mounted in a head holder 3a (see FIG. 2) connected to the grip portion 2.
 モーターホルダー33は、ベースケース30および下ケース31に設けられた内筒壁35・38で構成される。より詳しくは、ベースケース30は、下方に開口を有する有底直円筒状の内筒壁35と、内筒壁35を囲むように配された外筒壁36と、これら内外筒壁35・36を橋絡する図外の連結腕とを備える二重筒状に構成されており、これら内外筒壁35・36の間に上下方向に連通する連通孔37が形成されている。下ケース31は、上方に開口を有する有底直円筒状の内筒壁38と、該内筒壁38を囲むように配された外筒壁39と、これら内外筒壁38・39を橋絡する図外の連結腕とを備える二重筒状に構成されており、これら内外筒壁38・39の間に上下方向に連通する連通孔40が形成されている。下ケース31の外筒壁39は、径寸法が均一なストレート部39aと、該ストレート部39aに連続して形成されて、下方に行くに従って漸次径寸法が大きくなるテーパー部39bとで構成されている。両ケース30・31の内筒壁35・38の径寸法、およびベースケース30の外筒壁36と下ケース31のストレート部39aの径寸法は、同寸法に設定されており、ベースケース30の下端に下ケース31を装着したとき、ヘッド部3の内部には、両ケース30・31の内筒壁35・38で区画されるモーターホルダー33が形成される。 The motor holder 33 includes inner cylindrical walls 35 and 38 provided in the base case 30 and the lower case 31. More specifically, the base case 30 includes a bottomed straight cylindrical inner cylinder wall 35 having an opening below, an outer cylinder wall 36 disposed so as to surround the inner cylinder wall 35, and the inner and outer cylinder walls 35 and 36. And a connecting arm 37 (not shown) for bridging, and a communication hole 37 is formed between the inner and outer cylinder walls 35 and 36 to communicate in the vertical direction. The lower case 31 includes a bottomed straight cylindrical inner cylinder wall 38 having an opening on the upper side, an outer cylinder wall 39 disposed so as to surround the inner cylinder wall 38, and a bridge between the inner and outer cylinder walls 38 and 39. A connecting hole 40 is formed between the inner and outer cylinder walls 38 and 39. The communicating hole 40 is formed between the inner and outer cylinder walls 38 and 39. The outer cylindrical wall 39 of the lower case 31 includes a straight portion 39a having a uniform diameter and a tapered portion 39b formed continuously from the straight portion 39a and gradually increasing in diameter as it goes downward. Yes. The diameter dimensions of the inner cylinder walls 35 and 38 of both cases 30 and 31 and the diameter dimensions of the outer cylinder wall 36 of the base case 30 and the straight portion 39a of the lower case 31 are set to the same dimension. When the lower case 31 is attached to the lower end, a motor holder 33 defined by the inner cylindrical walls 35 and 38 of both cases 30 and 31 is formed inside the head portion 3.
 上ケース32は、ベルマウス状の噴射口43を備える筒壁44と、該筒壁44の上方に形成された保護フード45とからなり、その内部に、ファンユニット46、支持ベース47、回転体5、押さえ板48からなるミスト生成部6が配置されている。図4に示すように、筒壁44は、ベースケース30の外筒壁36に連続するストレート部44aと、ストレート部44aの上端に連続して形成された上拡がりテーパー状のテーパー部44bとで構成されている。保護フード45は、回転体5を保護する目的で形成された円板状のフード本体50と、該フード本体50を保持するフードホルダー51とで構成される。フードホルダー51は、フード本体50を浮揚姿勢に支持する3本の支持脚52と、支持脚52の上端に形成されてフード本体50を受け止める支持片53とを備える。フードホルダー51の各支持脚52は、フード本体50から等間隔を置いて放射状に形成されており、その下端部が筒壁44に連結されている。なお、図3等においては、二本の支持脚52・52のみを図示している。 The upper case 32 includes a cylindrical wall 44 having a bell mouth-shaped injection port 43, and a protective hood 45 formed above the cylindrical wall 44. A fan unit 46, a support base 47, and a rotating body are provided therein. 5. A mist generating unit 6 composed of a pressing plate 48 is disposed. As shown in FIG. 4, the cylindrical wall 44 includes a straight portion 44 a that is continuous with the outer cylindrical wall 36 of the base case 30, and an upwardly expanding tapered tapered portion 44 b that is continuously formed at the upper end of the straight portion 44 a. It is configured. The protective hood 45 includes a disc-shaped hood main body 50 formed for the purpose of protecting the rotating body 5, and a hood holder 51 that holds the hood main body 50. The hood holder 51 includes three support legs 52 that support the hood body 50 in a floating position, and a support piece 53 that is formed on the upper end of the support legs 52 and receives the hood body 50. The support legs 52 of the hood holder 51 are radially formed at equal intervals from the hood main body 50, and the lower ends thereof are connected to the cylindrical wall 44. In FIG. 3 and the like, only the two support legs 52 and 52 are shown.
 図3および図4に示すように、保護フード45のフードホルダー51の内部には、液体通路28が形成されている。液体通路28は、一本の支持脚52の内部に形成されて、送給チューブ27(図2参照)が接続される第1流路28aと、支持片53の内部に形成されて、該第1流路28aの下流端に連設された第2流路28bとで構成される。第1流路28aを有する支持脚52の下端部は、筒壁44の外部に突出されており、その下端部に送給チューブ27が外嵌状に接続されている。支持片53の下面の中央部には、液体送給口54が下方に向けて突設されており、この液体送給口54内に、第2流路28bの下流端に接続された送給管29が配置されている。図3および図4において、符号53aは、支持片53の中央部に設けられて、液体送給口54に連通する中央開口を示している。送給管29の下端の給液口29aは、僅かな隙間を介して回転体駆動用のモーター4の出力軸56に近接対向されている(図6参照)。 3 and 4, a liquid passage 28 is formed inside the hood holder 51 of the protective hood 45. The liquid passage 28 is formed in one support leg 52 and is formed in the first flow path 28a to which the feed tube 27 (see FIG. 2) is connected and in the support piece 53, and The second channel 28b is connected to the downstream end of the first channel 28a. The lower end portion of the support leg 52 having the first flow path 28a protrudes outside the cylindrical wall 44, and the feed tube 27 is connected to the lower end portion of the support leg 52 in an outer fitting shape. A liquid feed port 54 protrudes downward from the central portion of the lower surface of the support piece 53, and the feed connected to the downstream end of the second flow path 28 b in the liquid feed port 54. A tube 29 is arranged. 3 and 4, reference numeral 53 a indicates a central opening that is provided in the central portion of the support piece 53 and communicates with the liquid supply port 54. The liquid supply port 29a at the lower end of the feed pipe 29 is close to and opposed to the output shaft 56 of the motor 4 for driving the rotating body through a slight gap (see FIG. 6).
 図4に示すように、ベースケース30の上壁57には、モーター4の出力軸56の突出を許す開口58が形成されており、モーター4は、該開口58を介して上ケース32の噴射口43内に出力軸56が指向する姿勢状態でモーターホルダー33内に配置される。ベースケース30の上壁57から突出するモーター4の出力軸56には、ファンユニット46、支持ベース47、および回転体5が記載順に装着されている。ファンユニット46は、出力軸56に外嵌装着される円柱状のファンベース60と、ファンベース60の外周面に沿って渦巻状に突設した一群のファンブレード61と、ファンブレード61を囲むように形成された円環状の保護リング62とを一体に成形したプラスチック成形品であり、ベースケース30および下ケース31の連通孔37・40を介して、下ケース31の下方開口41から吸い込んだ空気を、上ケース32の噴射口43に向けて送出する。先に述べたように、このファンユニット46は、回転体駆動用のモーター4の出力軸56に装着されている。つまり、モーター4は、ファン駆動用のモーターを兼ねている。 As shown in FIG. 4, an opening 58 that allows the output shaft 56 of the motor 4 to protrude is formed in the upper wall 57 of the base case 30, and the motor 4 ejects the upper case 32 through the opening 58. It is disposed in the motor holder 33 with the output shaft 56 oriented in the mouth 43. The fan unit 46, the support base 47, and the rotating body 5 are mounted in the order of description on the output shaft 56 of the motor 4 protruding from the upper wall 57 of the base case 30. The fan unit 46 surrounds the fan blade 61, a columnar fan base 60 that is externally fitted to the output shaft 56, a group of fan blades 61 that project in a spiral shape along the outer peripheral surface of the fan base 60, and the fan blade 61. Is a plastic molded product integrally formed with an annular protective ring 62 formed on the base case 30 and air sucked from the lower opening 41 of the lower case 31 through the communication holes 37 and 40 of the base case 30 and the lower case 31. Is delivered toward the injection port 43 of the upper case 32. As described above, the fan unit 46 is attached to the output shaft 56 of the motor 4 for driving the rotating body. That is, the motor 4 also serves as a fan driving motor.
 支持ベース47は、下面の径寸法が小さく、上面の径寸法が大きな略逆円錐台形に形成されたプラスチック成形品であり、その上面の四箇所の周方向の等間隔位置には回転体5および押さえ板48を溶着固定するための連結ボス64が突設されている。ファンユニット46のファンベース60および支持ベース47の中央には、出力軸56の外周面に、これらファンユニット46および支持ベース47を外嵌装着するための装着孔65・66が開設されている。ファンユニット46のファンベース60の上面には、支持ベース47の下面を受け止める受面67が段付き状に凹み形成されており、ファンユニット46、次いで支持ベース47を出力軸56に装着したとき、ファンユニット46の受面67に支持ベース47の下面が受け止められるようになっている。 The support base 47 is a plastic molded product formed in a substantially inverted truncated cone shape with a small diameter on the lower surface and a large diameter on the upper surface. A connection boss 64 for welding and fixing the presser plate 48 is projected. At the center of the fan base 60 and the support base 47 of the fan unit 46, mounting holes 65 and 66 for opening and mounting the fan unit 46 and the support base 47 are formed on the outer peripheral surface of the output shaft 56. A receiving surface 67 for receiving the lower surface of the support base 47 is formed in a stepped shape on the upper surface of the fan base 60 of the fan unit 46. When the fan unit 46 and then the support base 47 are mounted on the output shaft 56, The lower surface of the support base 47 is received by the receiving surface 67 of the fan unit 46.
 図5および図6に示すように、回転体5は、同一の外径寸法を有する複数枚の金属製の回転基板70を積層してなるものであり、本実施例では、4枚の回転基板70a~70dを積層して回転体5を構成している。各回転基板70a~70dは、円板状、或いは円リング状の基板本体80と、該基板本体80の上面に立設された多数個の衝突壁81とで構成される。最下方に位置する回転基板70aを構成する基板本体80の盤面中央には、出力軸56の外周面に回転基板70aを外嵌装着するための装着孔71が開設されており、上方に位置する3枚の回転基板70b~70dを構成する基板本体80の盤面中央には、液体送給口54の挿入を許す流路導入口72が開設されている。すなわち、最下方の回転基板70aの基板本体80は装着孔71を有する円プレート形に形成されており、その余の上方の回転基板70b~70dの基板本体80は、装着孔71よりも大径の流路導入口72を有する円リング状に形成されている。以上より、これら回転基板70a~70dを積層してなる回転体5は、流路導入口72に連通する上方開口を有する円柱ブロック状に形成される。各回転基板70a~70dの等間隔位置の四箇所には、連結ボス64の挿通を許す連結孔73が開設されている。 As shown in FIGS. 5 and 6, the rotator 5 is formed by laminating a plurality of metal rotating substrates 70 having the same outer diameter, and in this embodiment, four rotating substrates. The rotating body 5 is configured by laminating 70a to 70d. Each of the rotating substrates 70a to 70d includes a disk-shaped or ring-shaped substrate main body 80 and a plurality of collision walls 81 erected on the upper surface of the substrate main body 80. At the center of the board surface of the substrate main body 80 constituting the lowermost rotary substrate 70a, a mounting hole 71 for opening and mounting the rotary substrate 70a on the outer peripheral surface of the output shaft 56 is formed, and is positioned above. In the center of the board surface of the substrate body 80 constituting the three rotary substrates 70b to 70d, a flow path introduction port 72 that allows the liquid supply port 54 to be inserted is opened. That is, the substrate body 80 of the lowermost rotating substrate 70 a is formed in a circular plate shape having the mounting holes 71, and the substrate bodies 80 of the remaining rotating substrates 70 b to 70 d are larger in diameter than the mounting holes 71. It is formed in a circular ring shape having a flow path inlet 72. As described above, the rotating body 5 formed by laminating these rotating substrates 70 a to 70 d is formed in a cylindrical block shape having an upper opening communicating with the flow path introduction port 72. Connection holes 73 that allow the connection bosses 64 to be inserted are formed at four positions at equal intervals on each of the rotary substrates 70a to 70d.
 回転基板70a~70dの支持ベース47からの浮き上がりを防ぐ目的で配置される押さえ板48は、最上方の回転基板70dと同等の内径寸法を備える円リング状のベース部75と、ベース部75の内周面から上方に突設して、液体送給口54に近接対向して、回転体5を含むミスト生成部6の揺動を規制する規制筒部76とで構成される。回転基板70a~70dの連結孔73に対応して、ベース部75の盤面四箇所にも連結孔77が開設されている。 The holding plate 48 disposed for the purpose of preventing the rotary substrates 70a to 70d from being lifted from the support base 47 includes a circular ring-shaped base portion 75 having an inner diameter equivalent to that of the uppermost rotary substrate 70d, and the base portion 75. A restricting cylinder portion 76 that protrudes upward from the inner peripheral surface, faces the liquid supply port 54 in close proximity, and restricts swinging of the mist generating portion 6 including the rotating body 5. Corresponding to the connection holes 73 of the rotary substrates 70a to 70d, connection holes 77 are also opened at four positions on the surface of the base portion 75.
 回転体5および押さえ板48は、連結孔73・77に挿通された連結ボス64により、上方に抜け止め状に固定される。より詳しくは、支持ベース47の連結ボス64に回転体5を構成する回転基板70a~70dおよび押さえ板48の連結孔73・77を位置合わせして、これら回転基板70a~70dおよび押さえ板48の連結孔73・77内に連結ボス64を挿通させたうえで、連結孔73・77を介して押さえ板48のベース部75から上方に突出する連結ボス64の上端部を熱かしめする。これにより、支持ベース47に対して回転基板70a~70dおよび押さえ板48を抜け止め状に固定することができる。 The rotating body 5 and the holding plate 48 are fixed upward in a retaining manner by connecting bosses 64 inserted through the connecting holes 73 and 77. More specifically, the rotating base plates 70a to 70d and the connecting holes 73 and 77 of the pressing plate 48 constituting the rotating body 5 are aligned with the connecting boss 64 of the support base 47, and the rotating substrates 70a to 70d and the pressing plate 48 are aligned. After the connection boss 64 is inserted into the connection holes 73 and 77, the upper end portion of the connection boss 64 protruding upward from the base portion 75 of the holding plate 48 through the connection holes 73 and 77 is heat caulked. Thereby, the rotary substrates 70a to 70d and the pressing plate 48 can be fixed to the support base 47 in a retaining manner.
 また、以上のような構成からなるミスト発生部6は、予め支持ベース47に回転体5および押さえ板48を先の手順で固定して、三者(支持ベース47、回転体5、押さえ板48)をユニット部品化しておくことができる。また、ミスト発生部6は、モーター4の出力軸56に、ファンユニット46、および先のユニット部品を装着することで組付けることができる。 Further, the mist generating unit 6 having the above-described configuration fixes the rotating body 5 and the pressing plate 48 to the support base 47 in advance by the above procedure, and the three parties (the supporting base 47, the rotating body 5, and the pressing plate 48). ) Can be made into unit parts. The mist generating unit 6 can be assembled by mounting the fan unit 46 and the previous unit component on the output shaft 56 of the motor 4.
 上述のように送給管29の下端の給液口29aは、僅かな隙間を介してモーター4の出力軸56に近接対向されている(図6参照)。従って、両モーター4・17を駆動させると、吸込パイプ25を介してタンク7から吸い上げられて、吐出流路26を介して送給管29の給液口29aから吐出された水は、出力軸56の上端で跳ねて、流路導入口72に係る空間に飛散されたのち、回転体5内に導入される。そして、回転体5内でミスト化された後、ファンユニット46からの送風に乗って噴射口43から放出される。より詳しくは、吐出流路26を介して送給管29の給液口29aから吐出されて回転基板70との接触部分まで移動した水は、遠心力によって流路導入口72に向けて飛散していき、回転基板70a~70d間に形成された隙間(通路入口)及び回転基板70dとベース部75間に形成される隙間(通路入口)に入り込む。そして衝突壁81に衝突しながら通路内を外方に向けて移動しミスト化される。このとき、出力軸56は、先端に向けて徐々に径が小さくなる構造であるので、給液口29aからの液体を吸い込む作用が働く。また、出力軸56は、送給ポンプ9からの液体が断続的に回転基板70に送給されるのを抑制するために設けられる突起を兼ねている。したがって、別途突起を設ける形態に比べて、コスト低減に貢献できる。 As described above, the liquid supply port 29a at the lower end of the feed pipe 29 is in close proximity to the output shaft 56 of the motor 4 through a slight gap (see FIG. 6). Accordingly, when the motors 4 and 17 are driven, the water sucked up from the tank 7 through the suction pipe 25 and discharged from the liquid supply port 29a of the supply pipe 29 through the discharge flow path 26 is supplied to the output shaft. After bouncing at the upper end of 56 and being scattered in the space related to the flow path introduction port 72, it is introduced into the rotator 5. Then, after being misted in the rotating body 5, the air is blown from the fan unit 46 and is discharged from the ejection port 43. More specifically, the water that has been discharged from the liquid supply port 29a of the feed pipe 29 through the discharge flow channel 26 and moved to the contact portion with the rotating substrate 70 is scattered toward the flow channel introduction port 72 by centrifugal force. Then, it enters the gap (passage entrance) formed between the rotating substrates 70a to 70d and the clearance (passage entrance) formed between the rotating substrate 70d and the base portion 75. Then, while colliding with the collision wall 81, the inside of the passage is moved outward to be misted. At this time, since the output shaft 56 has a structure in which the diameter gradually decreases toward the tip, the action of sucking the liquid from the liquid supply port 29a works. Further, the output shaft 56 also serves as a protrusion provided to prevent the liquid from the feed pump 9 from being intermittently fed to the rotary substrate 70. Therefore, it is possible to contribute to cost reduction as compared with a case where a separate protrusion is provided.
 図5に示すように、衝突壁81は、基板本体80の中央近傍を除く上面全体に設けられており、基板本体80の周方向に所定間隔で列設されて、環状の衝突壁列82を構成している。衝突壁列82において隣接する衝突壁81の間には、遠心力で跳ね飛ばされた液体が通過する液体通路83が形成されている。衝突壁列82は、回転基板70の径方向へ多重に設けられており、回転基板70の内外方向(径方向)において隣接する衝突壁列82の間には、周方向通路84が形成されている。このように衝突壁列82を多重(三重以上)に設けると、水の微細化をより促進することができる。すなわち、衝突壁列82が回転基板70の径方向へ多重に設けられていると、液体の進行方向を多様化させて、液体をよく分離させることができ、ミストの微細化を促進できる。また、液体通路83と対向する衝突壁81に液体を繰り返して衝突させて、ミストをさらに確実に微細化できる。 As shown in FIG. 5, the collision walls 81 are provided on the entire upper surface except for the vicinity of the center of the substrate body 80, and are arranged at predetermined intervals in the circumferential direction of the substrate body 80. It is composed. Between the adjacent collision walls 81 in the collision wall row 82, a liquid passage 83 through which the liquid splashed by the centrifugal force passes is formed. The collision wall rows 82 are provided in a multiple manner in the radial direction of the rotating substrate 70, and a circumferential passage 84 is formed between the adjacent collision wall rows 82 in the inner and outer directions (radial direction) of the rotating substrate 70. Yes. Thus, if the collision wall row 82 is provided in multiple (triple or more), water miniaturization can be further promoted. In other words, when the collision wall rows 82 are provided in the radial direction of the rotary substrate 70, the liquid traveling direction can be diversified, the liquid can be separated well, and the mist can be miniaturized. In addition, the liquid can be repeatedly collided with the collision wall 81 facing the liquid passage 83, so that the mist can be further refined.
 外側の衝突壁列82を構成する衝突壁81は、内側の衝突壁列82の液体通路83と対向している。つまり、外側の衝突壁82を構成する各衝突壁81が、内側の衝突壁列82の液体通路83の出口に臨むように配置してある。これにより、回転基板70の中央に送給されて遠心力で跳ね飛ばされた水は、内側の衝突壁列82を構成する液体通路83を通って、外側の衝突壁列82を構成する衝突壁81に必ず衝突させることができる。 The collision wall 81 constituting the outer collision wall row 82 faces the liquid passage 83 of the inner collision wall row 82. That is, each collision wall 81 constituting the outer collision wall 82 is disposed so as to face the outlet of the liquid passage 83 of the inner collision wall row 82. As a result, the water fed to the center of the rotating substrate 70 and splashed off by the centrifugal force passes through the liquid passage 83 constituting the inner collision wall row 82 and the collision wall constituting the outer collision wall row 82. 81 can always be made to collide.
 外側の衝突壁列82は、内側の衝突壁列82よりも多くの衝突壁81および液体通路83を備えている。このように、外周側の衝突壁列82に多くの液体通路83を設けると、水の進行方向を多様化させて、回転基板70の面全体に広がるように水を分散させることができるので、水の微細化を促進することができる。なお、本発明において「外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されている」とは、一つの例外も無く、全ての外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されていることを意味するものではなく、大多数の外側の衝突壁列82を構成する衝突壁81が、内側の衝突壁列82の液体通路83と対向する状態で配置されていることをも含む概念であることは上述したとおりであるが、本実施形態のように、衝突壁82を多重(三重以上)に設けていると、例えば2列の衝突壁列82の一部で液体通路83が重なって内外方向に液体通路83が連通している場合でも、3列目或いは4列目の衝突壁列82の衝突壁81でカバーして、液体が最外周の衝突壁列82の外方へ飛び出るまでの間に少なくとも一度は衝突壁81に衝突させることができる。 The outer collision wall row 82 includes more collision walls 81 and liquid passages 83 than the inner collision wall row 82. In this way, if a large number of liquid passages 83 are provided in the collision wall row 82 on the outer peripheral side, it is possible to diversify the traveling direction of water and to disperse the water so as to spread over the entire surface of the rotating substrate 70. Water refinement can be promoted. In the present invention, “the collision wall 81 constituting the outer collision wall row 82 is disposed in a state of being opposed to the liquid passage 83 of the inner collision wall row 82” without any exception, and all It does not mean that the collision wall 81 constituting the outer collision wall row 82 is arranged in a state of facing the liquid passage 83 of the inner collision wall row 82, and the majority of the outer collision wall rows 82 As described above, the collision wall 81 that constitutes 82 is a concept that includes that the collision wall 81 is disposed in a state of facing the liquid passage 83 of the inner collision wall row 82 as in the present embodiment. When the collision walls 82 are provided in multiple (three or more), for example, even when the liquid passages 83 overlap with part of the two collision wall rows 82 and the liquid passages 83 communicate with each other in the inner and outer directions, three rows are provided. The collision wall 81 of the fourth or fourth collision wall row 82 And over at least once until the liquid popping outward collision wall column 82 of the outermost periphery can collide with the collision wall 81.
 また、複数枚の回転基板70が積層されて回転体5が構成されていると、回転基板70の外径寸法を大きくすることなく、回転体5の表面積を大きくしてミスト発生量の増大化を図ることができる。従って、小型でありながら、ミスト生成能力に優れたミスト発生装置を得ることができる。 Further, when the rotating body 5 is configured by laminating a plurality of rotating substrates 70, the surface area of the rotating body 5 is increased without increasing the outer diameter of the rotating substrate 70, thereby increasing the amount of mist generated. Can be achieved. Therefore, it is possible to obtain a mist generating device that is small and excellent in mist generation capability.
 液体通路83の上方開口は、上方に配された回転基板70の下面で覆われており、換言すれば、上方側の回転基板70の基板本体80が、下方側の回転基板70の液体通路83の上方開口を覆う天板86(図6参照)とされている。このように、上方側の回転基板70の基板本体80が、下方側の回転基板70の液体通路83を覆う天板86を兼ねるものとしてあると、別途天板86を設ける形態に比べて、回転体5の厚み寸法を小さくして、ミスト発生装置の小型化に貢献できる。尤も、最上方に位置する回転基板70の液体通路83の上方開口は、押さえ板48の下面で覆われている。 The upper opening of the liquid passage 83 is covered with the lower surface of the rotating substrate 70 disposed above, in other words, the substrate body 80 of the upper rotating substrate 70 is connected to the liquid passage 83 of the lower rotating substrate 70. The top plate 86 (see FIG. 6) covers the upper opening. As described above, when the substrate body 80 of the upper rotating substrate 70 also serves as the top plate 86 that covers the liquid passage 83 of the lower rotating substrate 70, the rotation can be performed as compared with a configuration in which a separate top plate 86 is provided. By reducing the thickness dimension of the body 5, it is possible to contribute to miniaturization of the mist generating device. However, the upper opening of the liquid passage 83 of the rotary substrate 70 positioned at the uppermost position is covered with the lower surface of the pressing plate 48.
 図6に示すように、上方側の回転基板70は、下方側の回転基板70の衝突壁81の上面で支持されている。つまり、下方側の衝突壁81を含む衝突壁列82が、上方側の回転基板70の支持構造を兼ねている。これによれば、別途、上方側の回転基板70の支持構造を設ける形態に比べて、回転体5の製造コストの上昇を抑えることができる。 As shown in FIG. 6, the upper rotary substrate 70 is supported on the upper surface of the collision wall 81 of the lower rotary substrate 70. That is, the collision wall row 82 including the lower collision wall 81 also serves as a support structure for the upper rotary substrate 70. According to this, an increase in the manufacturing cost of the rotating body 5 can be suppressed as compared with a mode in which a support structure for the upper rotating substrate 70 is provided separately.
 図1および図5に示すように、各衝突壁81は、回転基板70の中心に臨む壁面90と、回転基板70の径方向外側に臨む壁面91と、壁面90と壁面91とを繋ぐ一対の壁面92・93とを備える矩形柱状に形成されており、内側の衝突壁列82を構成する液体通路83を通って、遠心力により外側に跳ね飛ばされた水は、壁面90に衝突して粉砕される。この壁面90を含む衝突壁81の壁面の全体には、水の粉砕効果を向上するために、凹凸部95を形成して、粗面化が図られている。凹凸部95は、基板本体80からの衝突壁81の突出方向(上下方向)に長い溝96と、隣り合う溝96の間に形成されたリブ97とで構成されている。このように、上下方向に長い溝96とリブ97とで構成される凹凸部95を衝突壁81の各壁面90~93に形成して、各壁面90~93を粗面化していると、壁面90~93に衝突した液滴をより効率的に粉砕することができるので、水の微細化を図り、より細かなミストを得ることができる。また、壁面90~93の表面で水が団粒化することを防ぐことができるので、この点でも水の微細化を図り、より細かなミストを得ることができる。また、衝突壁81を構成する全ての壁面90~93に凹凸部95が形成され粗面化されていると、該衝突壁81の壁面90~93で区画される通路(液体通路83・周方向通路84)の流路抵抗の増大化を図ることができるので、水の分離効果の向上が期待でき、より細かなミストを得ることができる。 As shown in FIGS. 1 and 5, each collision wall 81 includes a pair of wall surfaces 90 facing the center of the rotating substrate 70, a wall surface 91 facing the radial outside of the rotating substrate 70, and a pair of walls 90 and 91. Water which is formed in a rectangular column shape having wall surfaces 92 and 93 and splashed outward by centrifugal force through the liquid passage 83 constituting the inner collision wall row 82 collides with the wall surface 90 and is crushed. Is done. The entire wall surface of the collision wall 81 including the wall surface 90 is roughened by forming an uneven portion 95 in order to improve the water crushing effect. The concavo-convex portion 95 includes a groove 96 that is long in the protruding direction (vertical direction) of the collision wall 81 from the substrate body 80 and a rib 97 that is formed between adjacent grooves 96. As described above, when the concave and convex portions 95 formed by the vertically long grooves 96 and the ribs 97 are formed on the respective wall surfaces 90 to 93 of the collision wall 81 and the respective wall surfaces 90 to 93 are roughened, Since the liquid droplets colliding with 90 to 93 can be crushed more efficiently, the water can be miniaturized and finer mist can be obtained. In addition, since water can be prevented from aggregating on the surfaces of the wall surfaces 90 to 93, the water can be refined in this respect, and finer mist can be obtained. In addition, when the concavo-convex portions 95 are formed and roughened on all the wall surfaces 90 to 93 constituting the collision wall 81, a passage (liquid passage 83, circumferential direction) defined by the wall surfaces 90 to 93 of the collision wall 81 is formed. Since the flow path resistance of the passage 84) can be increased, an improvement in water separation effect can be expected, and finer mist can be obtained.
 なお、仮に左右方向に長い溝とリブとで凹凸部を形成した場合には、水の流れ方向に溝が形成されることとなるため、左右方向に長い溝に沿って水が流れて、水が団粒化する不都合が予測される。これに対して本実施形態のように、上下方向に長い溝96とリブ97とで凹凸部95を形成していると、液体の通路(液体通路83・周方向通路84)の流れ方向における流路抵抗を大きくすることができるため、水をより効率的に分離・分散して、ミスト径の微細化を図ることができる。 In addition, if the concavo-convex portion is formed by a groove and a rib that are long in the left-right direction, the groove is formed in the water flow direction, so that water flows along the long groove in the left-right direction, The inconvenience of flocculation is expected. On the other hand, when the uneven portion 95 is formed by the groove 96 and the rib 97 that are long in the vertical direction as in the present embodiment, the flow in the flow direction of the liquid passage (the liquid passage 83 and the circumferential passage 84). Since the road resistance can be increased, water can be more efficiently separated and dispersed to reduce the mist diameter.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)は、回転基板70の径方向に係る衝突壁81の厚み寸法(T)よりも大きく設定されている。すなわち、W>Tの関係を満たすものとなっている。このように、衝突壁81の厚み寸法(T)を小さく設定すると、回転基板70の小径化を実現してミスト発生装置の全体を小型化できる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70 is set larger than the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70. That is, the relationship of W> T is satisfied. Thus, if the thickness dimension (T) of the collision wall 81 is set small, the diameter of the rotating substrate 70 can be reduced, and the entire mist generator can be downsized.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)とは、W>H>Tの関係を満たすように設定されている。これによれば、衝突壁81の厚み寸法を小さくしたことにより、回転基板70の小径化を図ることができる。加えて、衝突壁81の壁面面積(W×H)を大きく取ることができるので、より確実に内側の衝突壁列82の液体通路83から送出された水を、外側の衝突壁列82の衝突壁81に衝突させて、効率的にミスト径の微細化を図ることができる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the protrusion dimension (H) of the collision wall 81 are: It is set so as to satisfy the relationship of W> H> T. According to this, the diameter of the rotating substrate 70 can be reduced by reducing the thickness dimension of the collision wall 81. In addition, since the wall surface area (W × H) of the collision wall 81 can be increased, the water sent out from the liquid passage 83 of the inner collision wall row 82 is more reliably caused to collide with the outer collision wall row 82. By colliding with the wall 81, the mist diameter can be efficiently reduced.
 基板本体80の厚み寸法(E)と、回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)とが、E>W>H>Tの関係を満たすように設定されている。これによれば、先と同様に、回転基板70の小径化を図りながら、衝突壁81の衝突面積を大きくすることができる。また、基板本体80の厚み寸法(E)を大きく取ることができるので、該回転基板70を強度に優れたものとすることができる。加えて、回転基板70の重量を大きくして、その慣性重量を大きくすることができるので、回転基板70の回転姿勢を安定化することができる。 The thickness dimension (E) of the substrate body 80, the width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, and the collision The protrusion dimension (H) of the wall 81 is set so as to satisfy the relationship of E> W> H> T. According to this, similarly to the above, the collision area of the collision wall 81 can be increased while reducing the diameter of the rotating substrate 70. Moreover, since the thickness dimension (E) of the board | substrate body 80 can be taken large, this rotary board | substrate 70 can be made excellent in intensity | strength. In addition, since the weight of the rotating substrate 70 can be increased and the inertia weight thereof can be increased, the rotational posture of the rotating substrate 70 can be stabilized.
 回転基板70の周方向に係る衝突壁81の幅寸法(W)と、回転基板70の径方向に係る衝突壁81の厚み寸法(T)と、衝突壁81の突出寸法(H)と、衝突壁列82の液体通路83の通路幅(A)とが、W>H>T>Aの関係を満たすように設定されている。これによれば、先と同様に、回転基板70の小径化を図りながら、衝突壁81の衝突面積を大きくすることができる。加えて、衝突壁81の突出寸法(H)を、液体通路83の通路幅(A)よりも大きくしたので、これら衝突壁81の突出寸法(H)と液体通路83の通路幅(A)とで規定される液体通路83の断面積(H×A)を大きく取ることができる。したがって、該液体通路83内の水の流れをスムーズなものとすることができる。 The width dimension (W) of the collision wall 81 in the circumferential direction of the rotating substrate 70, the thickness dimension (T) of the collision wall 81 in the radial direction of the rotating substrate 70, the protruding dimension (H) of the collision wall 81, and the collision The passage width (A) of the liquid passage 83 in the wall row 82 is set so as to satisfy the relationship of W> H> T> A. According to this, similarly to the above, the collision area of the collision wall 81 can be increased while reducing the diameter of the rotating substrate 70. In addition, since the protrusion dimension (H) of the collision wall 81 is larger than the passage width (A) of the liquid passage 83, the protrusion dimension (H) of the collision wall 81 and the passage width (A) of the liquid passage 83 are The cross-sectional area (H × A) of the liquid passage 83 defined by Accordingly, the water flow in the liquid passage 83 can be made smooth.
 内外の衝突壁列82を構成する衝突壁81の間に形成される周方向の液体通路(周方向通路84)の通路幅(B)と、衝突壁列82の液体通路83の通路幅(A)とが、B>Aの関係を満たすように設定する。これによれば、衝突壁列82の液体通路83の通路幅(A)を小さくしたことに由来する、衝突壁81に対する水の衝突エネルギーの向上効果が期待できる。したがって、より効率的に水を衝突壁81に衝突させて、ミスト径を微細化できる。 The passage width (B) of the circumferential liquid passage (circumferential passage 84) formed between the collision walls 81 constituting the inner and outer collision wall row 82 and the passage width (A) of the liquid passage 83 of the collision wall row 82 ) And B> A. According to this, the improvement effect of the collision energy of water with respect to the collision wall 81 resulting from reducing the passage width (A) of the liquid passage 83 of the collision wall row 82 can be expected. Therefore, water can be collided with the collision wall 81 more efficiently, and the mist diameter can be refined.
 図11および図12に示すように、回転基板70は、一次電鋳工程と二次電鋳工程とを経て作製される。図11(a)は、一次電鋳工程(図11(b))に先立って行われるパターンレジスト作成工程を示しており、そこでは、図11(a)に示すように、母型100の表面にフォトレジスト層101を形成したうえで、フォトレジスト層101上に基板本体80の通孔(装着孔71、流路導入口72或いは連結孔73)に対応する透孔102aを有するパターンフィルム102を形成し、パターンフィルム102の上方から紫外線照射ランプ103で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、通孔に対応するレジスト体104を有する一次パターンレジスト105を形成する。次いで、一次パターンレジスト105ごと母型100を電鋳槽に入れて、一次パターンレジスト105で覆われていない母型100の表面に電着金属を電鋳して、基板本体80に対応する一次電鋳層106を形成する(図11(b))。次に、一次パターンレジスト105を除去したうえで、一次電鋳層106に対して研磨処理を行って、一次電鋳層106の上面を平滑面として、基板本体80を形成する(図11(c))。研磨処理において使用される研磨ベルト116としては、1000番ベルト、或いは700番ベルトを使用することができる。 As shown in FIGS. 11 and 12, the rotating substrate 70 is manufactured through a primary electroforming process and a secondary electroforming process. FIG. 11 (a) shows a pattern resist forming step that is performed prior to the primary electroforming step (FIG. 11 (b)). As shown in FIG. 11 (a), the surface of the mother die 100 is shown. After the photoresist layer 101 is formed, a pattern film 102 having a through hole 102a corresponding to the through hole (the mounting hole 71, the channel introduction port 72, or the connection hole 73) of the substrate body 80 is formed on the photoresist layer 101. A resist corresponding to the through-hole is formed by exposing the pattern film 102 to ultraviolet light from the upper side of the pattern film 102 and irradiating it with ultraviolet light, performing development and drying, and dissolving and removing unexposed portions. A primary pattern resist 105 having a body 104 is formed. Next, the mother mold 100 together with the primary pattern resist 105 is put in an electroforming tank, and an electrodeposited metal is electroformed on the surface of the mother mold 100 that is not covered with the primary pattern resist 105. A cast layer 106 is formed (FIG. 11B). Next, after removing the primary pattern resist 105, the primary electroformed layer 106 is polished to form a substrate body 80 with the upper surface of the primary electroformed layer 106 being a smooth surface (FIG. 11C). )). As the polishing belt 116 used in the polishing process, a No. 1000 belt or a No. 700 belt can be used.
 次に、図12(a)に示すように、基板本体80上にフォトレジスト層109を形成したうえで、フォトレジスト層109上に液体の通路(液体通路83・周方向通路84)に対応する透孔110aを有するパターンフィルム110をフォトレジスト層109上に形成し、パターンフィルム110の上方から紫外線照射ランプ103で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、液体の通路に対応するレジスト体111を有する二次パターンレジスト112を形成する。次いで、二次パターンレジスト112ごと基板本体80を電鋳槽に入れて、二次パターンレジスト112で覆われていない基板本体80の表面に電着金属を電鋳して、衝突壁81に対応する二次電鋳層113を形成する(図12(b))。次に、二次電鋳層113の上面に対して研磨処理を行うことで、二次電鋳層113の上面を平滑面としたうえで(図12(c))、二次パターンレジスト112を除去することで、基板本体80上に衝突壁81が形成された回転基板70を得ることができる。研磨処理において使用される研磨ベルト116としては、1000番ベルト、或いは700番ベルトを使用することができる。図12(c)において、符号114は、研磨処理において衝突壁81の上端に形成される研磨バリを示しており、かかる研磨バリ114を電解研磨で除去することにより、図1および図5に示すような回転基板70を得ることができる。 Next, as shown in FIG. 12A, after a photoresist layer 109 is formed on the substrate body 80, a liquid passage (a liquid passage 83 and a circumferential passage 84) corresponds to the photoresist layer 109. A pattern film 110 having a through-hole 110a is formed on the photoresist layer 109, exposed by irradiating ultraviolet light from above the pattern film 110 with an ultraviolet irradiation lamp 103, developed, and dried. By dissolving and removing the exposed portion, a secondary pattern resist 112 having a resist body 111 corresponding to the liquid passage is formed. Next, the substrate main body 80 together with the secondary pattern resist 112 is put in an electroforming tank, and an electrodeposited metal is electroformed on the surface of the substrate main body 80 not covered with the secondary pattern resist 112 to correspond to the collision wall 81. A secondary electroformed layer 113 is formed (FIG. 12B). Next, by polishing the upper surface of the secondary electroformed layer 113, the upper surface of the secondary electroformed layer 113 is made smooth (FIG. 12C), and the secondary pattern resist 112 is removed. By removing, the rotating substrate 70 in which the collision wall 81 is formed on the substrate body 80 can be obtained. As the polishing belt 116 used in the polishing process, a No. 1000 belt or a No. 700 belt can be used. In FIG. 12C, reference numeral 114 denotes a polishing burr formed on the upper end of the collision wall 81 in the polishing process, and the polishing burr 114 is removed by electropolishing and shown in FIG. 1 and FIG. Such a rotating substrate 70 can be obtained.
 以上のような本実施形態に係る回転基板70の製造方法においては、液体の通路(液体通路83・周方向通路84)に対応する透孔110aを有するパターンフィルム110にフィラー115を含ませてある点が着目される。このようにパターンフィルム110にフィラー115を含ませてあると、該フィラー115による紫外線光の屈折により二次パターンレジスト112の露光部分と未露光部分との境界部、すなわちレジスト体111の側面に溝ができるため、かかる溝を利用して二次電鋳層113を形成することで、衝突壁81の表面に縦溝を形成することができる。すなわち、衝突壁81の形成と同時に凹凸部95を形成することができる。したがって、サンドブラストや金属粒体を塗着するなどの別工程で凹凸部95を形成する形態に比べて、ミスト発生装置の製造コストの上昇を抑えることができる。 In the manufacturing method of the rotating substrate 70 according to this embodiment as described above, the filler 115 is included in the pattern film 110 having the through holes 110a corresponding to the liquid passages (the liquid passage 83 and the circumferential passage 84). The point is noted. When the filler 115 is included in the pattern film 110 as described above, a groove is formed in the boundary portion between the exposed portion and the unexposed portion of the secondary pattern resist 112, that is, on the side surface of the resist body 111 due to refraction of ultraviolet light by the filler 115. Therefore, a vertical groove can be formed on the surface of the collision wall 81 by forming the secondary electroformed layer 113 using such a groove. That is, the uneven portion 95 can be formed simultaneously with the formation of the collision wall 81. Therefore, an increase in the manufacturing cost of the mist generating device can be suppressed as compared with a mode in which the concavo-convex portion 95 is formed in another process such as sand blasting or metal particle coating.
 図7に、本実施形態に係るミスト発生装置の回路構成を示す。ミスト発生装置は、グリップ部2の筐体前面に設けられたメインスイッチ15と洗浄スイッチ16と、これらスイッチ15・16のオンオフ操作に従って、回転体駆動用のモーター4および送給ポンプ9を構成するポンプ駆動用のモーター17を回転駆動させる制御回路13と、メインスイッチ15がオン操作されたときに、ミストを帯電させるための帯電装置117とで構成される。帯電装置117は、高電圧発生部118と、高電圧発生部118で生成された高圧パルスを、回転体駆動用のモーター4の出力軸56、および該出力軸56の外周面に接触する給電電極119とを介して回転基板70(回転体5)に付与する帯電リード120と、一方端が電池11のマイナス極に接続され、他方端がグリップ部2の後面に配置された接触電極121に接続されるグランドリード122とで構成される。グランドリード122により、接触電極121を回路のグランド電位と同じ電位にすることができる。 FIG. 7 shows a circuit configuration of the mist generating apparatus according to this embodiment. The mist generator comprises a main switch 15 and a cleaning switch 16 provided on the front surface of the casing of the grip portion 2, and a rotating body driving motor 4 and a feed pump 9 according to an on / off operation of these switches 15 and 16. A control circuit 13 that rotationally drives the pump driving motor 17 and a charging device 117 that charges the mist when the main switch 15 is turned on. The charging device 117 includes a high voltage generator 118, and a high-voltage pulse generated by the high voltage generator 118, and the power supply electrode that contacts the output shaft 56 of the motor 4 for driving the rotating body and the outer peripheral surface of the output shaft 56. The charging lead 120 applied to the rotating substrate 70 (rotating body 5) via the 119 and one end connected to the negative electrode of the battery 11 and the other end connected to the contact electrode 121 disposed on the rear surface of the grip portion 2. The ground lead 122 is configured. The ground lead 122 allows the contact electrode 121 to have the same potential as the circuit ground potential.
 高電圧発生部118は、電池11の電流を交流に変換する発振回路124と、発振回路124で生成されたパルス電流を昇圧する第1の昇圧回路125と、第1の昇圧回路125で昇圧されたパルス電流を整流する整流回路126と、整流回路126が出力する直流電流を再度パルス電流に変換するパルス発生回路127と、パルス電流をさらに昇圧させる第2の昇圧回路128と、ミストの帯電極性を設定するダイオードDとで構成される。発振回路124で生成されたパルス電流は、第1の昇圧回路125で100Vまで昇圧され、さらに第2の昇圧回路128で4kVまで昇圧されたのち、放電電極に送給される。第2の昇圧回路128で昇圧されたパルス電流は、放電電極である回転基板70(回転体5)と不図示の対向電極との間で放電されることにより、回転基板70で生成されるミストをプラス電位またはマイナス電位に帯電させることができる。これら制御回路13、発振回路124、第1の昇圧回路125、整流回路126、パルス発生回路127、第2の昇圧回路128、およびダイオードDなどは、制御基板14上に実装されている。ダイオードDが給電電極119に向かって順方向に接続されている場合には、ミストはプラスに帯電され、ダイオードDが給電電極119に向かって逆方向に接続されている場合には、ミストはマイナスに帯電される。なお、給電電極119は、回転体駆動用のモーター4の出力軸56に接触させずに、給電電極119を直接回転基板70(回転体5)の一部に接触させて回転基板70(回転体5)に高電圧を印加してもよい。また、グランドリード122の一方端は、電池11のマイナス極のラインに接続される回路構成に限らず、昇圧回路128の2次側の対向電極のライン(不図示)に接続されるものであってもよい。つまり、グランドリード122の一方端は、対向電極や電池11のマイナス極などの回路のグランドラインに接続すればよい。 The high voltage generator 118 is boosted by the oscillation circuit 124 that converts the current of the battery 11 into alternating current, the first boost circuit 125 that boosts the pulse current generated by the oscillation circuit 124, and the first boost circuit 125. Rectifying circuit 126 that rectifies the pulse current, a pulse generation circuit 127 that converts the direct current output from the rectifying circuit 126 into a pulse current again, a second boosting circuit 128 that further boosts the pulse current, and the charging polarity of the mist And a diode D for setting The pulse current generated by the oscillation circuit 124 is boosted to 100 V by the first booster circuit 125, further boosted to 4 kV by the second booster circuit 128, and then supplied to the discharge electrode. The pulse current boosted by the second booster circuit 128 is discharged between the rotating substrate 70 (rotating body 5), which is a discharge electrode, and a counter electrode (not shown), thereby generating mist generated on the rotating substrate 70. Can be charged to a positive potential or a negative potential. The control circuit 13, the oscillation circuit 124, the first booster circuit 125, the rectifier circuit 126, the pulse generator circuit 127, the second booster circuit 128, the diode D, and the like are mounted on the control board 14. When the diode D is connected in the forward direction toward the power supply electrode 119, the mist is charged positively. When the diode D is connected in the reverse direction toward the power supply electrode 119, the mist is negative. Is charged. The feeding electrode 119 is not brought into contact with the output shaft 56 of the motor 4 for driving the rotating body, but the feeding electrode 119 is directly brought into contact with a part of the rotating substrate 70 (the rotating body 5) to thereby rotate the rotating substrate 70 (the rotating body). A high voltage may be applied to 5). One end of the ground lead 122 is not limited to the circuit configuration connected to the negative electrode line of the battery 11, but is connected to the secondary electrode line (not shown) of the booster circuit 128. May be. That is, one end of the ground lead 122 may be connected to a ground line of a circuit such as the counter electrode or the negative electrode of the battery 11.
 図9に、以上のような構成からなるミスト発生装置の使用方法を示す。図9に示すように、本実施形態に係るミスト発生装置は、グリップ部2を手の平で握り締めて、ヘッド部3の噴射口43が、人体顔面に指向する状態として使用に供される。かかる使用姿勢から、メインスイッチ15がオン操作されると、ミスト発生モードとなり、回転体駆動用のモーター4およびポンプ駆動用のモーター17が駆動されるとともに、帯電装置117が駆動される。このとき、グリップ部2を握り締めることにより、接触電極121に使用者の手の平や指が接触するため、人体のグランド電位を回路のグランド電位と同じ電位にすることができる。また、帯電リード120、給電電極119、および回転体駆動用のモーター4の出力軸56を介して、回転基板70に高圧パルスを印加することができるので、ダイオードDの接続方向により、該回転基板70で生成されるミストをプラス電位またはマイナス電位に帯電させることができる。これにより、ミスト発生装置の回転基板70から人体に向かって電気力線が形成されるため、回転基板70で生成されたプラスまたはマイナスに帯電したミストを、電気力線に沿って移動させて、人体に誘引させることができる。これにより、より効率的にミストを人体に誘引させることができるので、より効率的にミストを人体に吸着させることができる。 Fig. 9 shows how to use the mist generating device having the above-described configuration. As shown in FIG. 9, the mist generating apparatus according to the present embodiment is used in a state where the grip portion 2 is gripped with the palm of the hand and the injection port 43 of the head portion 3 is directed to the human body face. When the main switch 15 is turned on from such a use posture, the mist generation mode is set, and the rotating body driving motor 4 and the pump driving motor 17 are driven and the charging device 117 is driven. At this time, since the user's palm or finger contacts the contact electrode 121 by gripping the grip portion 2, the ground potential of the human body can be made equal to the ground potential of the circuit. In addition, since a high voltage pulse can be applied to the rotating substrate 70 via the charging lead 120, the power supply electrode 119, and the output shaft 56 of the motor 4 for driving the rotating body, the rotating substrate can be changed depending on the connection direction of the diode D. The mist generated at 70 can be charged to a positive or negative potential. As a result, electric lines of force are formed from the rotating board 70 of the mist generating device toward the human body, so that the positive or negatively charged mist generated by the rotating board 70 is moved along the electric lines of force, It can be attracted to the human body. Thereby, since mist can be attracted to a human body more efficiently, mist can be adsorbed to a human body more efficiently.
 このように、回転基板70(回転体5)に高電圧を印加しながら回転させることにより、回転基板70でプラスまたはマイナスに帯電したミストを生成できる。例えば、人体は通常プラスに帯電しているので、回転基板70でマイナスに帯電したミストを生成することにより、ミストを人体に吸着させることができる。さらに上記構造では、対向電極や電池11のマイナス極などの回路のグランドラインに接続した接触電極121を有しているので、人体のグランド電位を積極的に回路のグランド電位と同じ電位にすることができるので、安定的にミストを人体に吸着させることができる。 Thus, by rotating the rotating substrate 70 (rotating body 5) while applying a high voltage, it is possible to generate mist charged positively or negatively on the rotating substrate 70. For example, since the human body is normally positively charged, the mist can be adsorbed to the human body by generating the negatively charged mist on the rotating substrate 70. Further, in the above structure, since the contact electrode 121 connected to the circuit ground line such as the counter electrode or the negative electrode of the battery 11 is provided, the ground potential of the human body is positively set to the same potential as the circuit ground potential. Therefore, mist can be stably adsorbed to the human body.
 図8(a)に、ミスト発生モードにおける両モーター4・17の制御タイミングを示すタイムチャートを示す。まず、メインスイッチ15が押し込まれてオン操作されると、制御回路13は、当該メインスイッチ15のオン動作と同時に回転体駆動用のモーター4を回転駆動させる。次に、モーター4の駆動から所定時間(t1)経過後にポンプ駆動用のモーター17を駆動させる。これにて、タンク7から吸い上げられた水がミスト生成部6によりミスト化され、ファンユニット46により生成される風力に乗って噴射口43から噴射される。使用状態におけるモーター4の回転速度は10000rpm程度である。 FIG. 8A shows a time chart showing the control timing of the motors 4 and 17 in the mist generation mode. First, when the main switch 15 is pushed and turned on, the control circuit 13 rotates the motor 4 for driving the rotating body simultaneously with the turning-on operation of the main switch 15. Next, the pump driving motor 17 is driven after a predetermined time (t1) has elapsed since the motor 4 was driven. As a result, the water sucked up from the tank 7 is made into mist by the mist generator 6 and is injected from the injection port 43 on the wind force generated by the fan unit 46. The rotation speed of the motor 4 in the use state is about 10,000 rpm.
 次に、メインスイッチ15が再度押し込まれてオフ操作されると、制御回路はポンプ駆動用のモーター17の駆動を直ちに停止するとともに、メインスイッチ15のオフ操作から所定時間(t2)だけ、回転速度を上げながら(15000rpm程度)、回転体駆動用のモーター4を回転駆動させる。メインスイッチ15のオフ操作から所定時間(t2)が経過すると、モーター4を停止させる。 Next, when the main switch 15 is pushed in again and turned off, the control circuit immediately stops the driving of the pump driving motor 17 and the rotation speed is set for a predetermined time (t2) from the turning off of the main switch 15. The motor 4 for driving the rotating body is rotationally driven while raising the speed (about 15000 rpm). When a predetermined time (t2) elapses after the main switch 15 is turned off, the motor 4 is stopped.
 図10に、本実施形態に係るミスト生成装置の洗浄方法を、図8(b)に、当該洗浄動作時におけるタイミングチャートを示す。図8(b)に示すように、洗浄スイッチ16が押し込まれオン操作されると、洗浄モードとなり、制御回路13は、回転体駆動用のモーター4を逆回転させる。このときのモーター4の逆回転速度は、使用状態におけるモーター4の回転速度よりも速く設定されている(15000rpm程度)。この状態から、ミスト生成装置の噴射口43を水道の蛇口の下方に位置させて蛇口のコックをひねると、蛇口から吐出された水道水(洗浄水)が、噴射口43から回転基板70、ファンユニット46等を通り、連通孔37・40を介して、下方開口41から流出され、かかる水道水の流れにより、回転基板70等に付着の塵埃が洗い流される。より詳しくは、保護フード45の中央開口53aから導入された洗浄水を、回転基板70a~70d間に形成された通路(液体通路83・周方向通路84)及び回転基板70dとベース部75間に形成される通路(液体通路83・周方向通路84)に流れ込ませて、これら通路を洗浄することができる。したがって、水に替えて粘性の高い化粧水などをミスト化していた場合でも、該化粧水が流路内で硬化して詰まるのを防ぐことができる。もちろんこれと同時に噴射口43、連通孔37、40の洗浄も行うことができる。なお、洗浄水が水道水に限られないことは言うまでもない。再度に、洗浄スイッチ16が再度押し込まれオフ操作されると、モーター4の回転が停止される。 FIG. 10 shows a cleaning method of the mist generating apparatus according to this embodiment, and FIG. 8B shows a timing chart during the cleaning operation. As shown in FIG. 8B, when the cleaning switch 16 is pushed in and turned on, the cleaning mode is set, and the control circuit 13 reversely rotates the motor 4 for driving the rotating body. The reverse rotation speed of the motor 4 at this time is set faster than the rotation speed of the motor 4 in the use state (about 15000 rpm). From this state, when the spray port 43 of the mist generating device is positioned below the tap and the tap of the tap is twisted, tap water (cleaning water) discharged from the tap is discharged from the spray port 43 to the rotating substrate 70 and the fan. It passes through the unit 46 and the like and flows out from the lower opening 41 through the communication holes 37 and 40, and dust adhering to the rotating substrate 70 and the like is washed away by the flow of the tap water. More specifically, the cleaning water introduced from the central opening 53a of the protective hood 45 is passed through the passages (liquid passage 83 and circumferential passage 84) formed between the rotating substrates 70a to 70d and between the rotating substrate 70d and the base portion 75. These passages can be cleaned by flowing into the formed passages (liquid passage 83 and circumferential passage 84). Therefore, even when highly viscous lotion or the like is made into mist instead of water, the lotion can be prevented from being hardened and clogged in the flow path. Of course, the injection port 43 and the communication holes 37 and 40 can be simultaneously cleaned. Needless to say, the cleaning water is not limited to tap water. Again, when the cleaning switch 16 is pushed again and turned off, the rotation of the motor 4 is stopped.
 すなわち、本装置は、ポンプ装置9(送給ポンプ)により回転基板70に液体を供給して該回転基板70の回転によってその液体をミスト化するミスト発生装置であって、
 スイッチ15のオンにより、回転基板70が回転されるとともにポンプ装置9が駆動され、
 スイッチ15のオフにより、ポンプ装置9の駆動が停止され、その後所定期間(t2)後に回転基板70の回転が停止されるものとなっていることを特徴とする。
 このように、ポンプ装置9の駆動が停止されたのち、所定期間(t2)後に回転基板70の回転が停止されるようにしていると、回転基板70に残留する残留液体をミスト化して確実に吐出することができるので、特に粘性のある液体が残留することによって、液体が固化することを確実に防ぐことができる。したがって、動作不良の発生を抑えて、信頼性に優れたミスト発生装置を得ることができる。
That is, this device is a mist generating device that supplies liquid to the rotating substrate 70 by the pump device 9 (feed pump) and mists the liquid by the rotation of the rotating substrate 70.
When the switch 15 is turned on, the rotary substrate 70 is rotated and the pump device 9 is driven.
When the switch 15 is turned off, the driving of the pump device 9 is stopped, and then the rotation of the rotary substrate 70 is stopped after a predetermined period (t2).
As described above, after the driving of the pump device 9 is stopped, if the rotation of the rotating substrate 70 is stopped after a predetermined period (t2), the residual liquid remaining on the rotating substrate 70 is misted to ensure the rotation. Since the liquid can be discharged, it is possible to reliably prevent the liquid from solidifying, particularly when the viscous liquid remains. Therefore, it is possible to obtain a mist generating device having excellent reliability while suppressing the occurrence of malfunction.
 また、このミスト生成装置では、スイッチ15のオンにより、回転基板70が回転されるとともにポンプ装置9が駆動され、スイッチ15のオフにより、ポンプ装置9の駆動が停止され、その後所定期間(t2)後に回転基板70の回転が停止されるようになっており、
 所定期間(t2)における回転基板70の回転速度が、ミスト発生時の回転速度よりも速く設定されている。
 このように、ポンプ装置9の駆動停止後の所定期間(t2)における回転基板70の回転速度が、ミスト生成時の回転速度よりも速く設定されていると、より確実に残留液体を吐出することができるので、残留液体の固化問題を確実に解消できる。
Further, in this mist generating device, when the switch 15 is turned on, the rotary substrate 70 is rotated and the pump device 9 is driven, and when the switch 15 is turned off, the driving of the pump device 9 is stopped, and then for a predetermined period (t2). The rotation of the rotating substrate 70 is stopped later,
The rotational speed of the rotating substrate 70 in the predetermined period (t2) is set to be faster than the rotational speed when mist is generated.
As described above, when the rotational speed of the rotary substrate 70 in the predetermined period (t2) after the driving of the pump device 9 is stopped is set to be higher than the rotational speed at the time of mist generation, the residual liquid is more reliably discharged. Therefore, the solidification problem of the residual liquid can be surely solved.
 また、このミスト発生装置では、スイッチ15のオンにより、回転基板70が回転され、その後所定期間(t1)後にポンプ装置9が駆動されるようにしている。
 これによれば、回転基板70の回転速度が上がってから該回転基板70に液体が供給されるため、回転基板70の回転速度の低いときに液体が供給される場合に生じる大粒のミストが生成されるという不都合を解消できる。したがって、より確実により細かなミストを生成することが可能となる。
Further, in this mist generating device, the rotary substrate 70 is rotated by turning on the switch 15, and then the pump device 9 is driven after a predetermined period (t1).
According to this, since the liquid is supplied to the rotating substrate 70 after the rotating speed of the rotating substrate 70 is increased, large mist generated when the liquid is supplied when the rotating speed of the rotating substrate 70 is low is generated. The inconvenience of being done can be solved. Therefore, it is possible to generate a finer mist more reliably.
 また、このミスト生成装置は、ミスト発生モードと洗浄モードとを備えており、
 回転基板70には、ファン46(ファンユニット)が取り付けられており、
 ファン46により生起された風は、ミスト発生モード時は、ミストを運ぶ作用に利用され、洗浄モード時は、洗浄水を排出する作用に利用されるようになっている。
 これによれば、ミストを運ぶ作用に利用される風と、洗浄水を排出する作用に利用される風とを、一つのファン46により生起することができるので、両作用に利用される風を別々のファン46により生起する形態に比べて、部品点数を減らしてミスト生成装置の製造コストの削減に貢献できる。加えて、簡単な構成で両作用に利用される風を生起できるので、信頼性に優れたミスト生成装置を得ることができる。
In addition, this mist generating device has a mist generation mode and a cleaning mode,
A fan 46 (fan unit) is attached to the rotating substrate 70.
The wind generated by the fan 46 is used to carry mist in the mist generation mode, and is used to discharge washing water in the cleaning mode.
According to this, since the wind used for the action for carrying the mist and the wind used for the action for discharging the washing water can be generated by one fan 46, the wind used for both actions can be generated. Compared to the form generated by the separate fans 46, the number of parts can be reduced and the manufacturing cost of the mist generating device can be reduced. In addition, since the wind used for both actions can be generated with a simple configuration, a highly reliable mist generating device can be obtained.
 洗浄モード時の回転基板70の回転速度を、ミスト発生モード時の回転基板70の回転速度よりも速くすることができる。これによれば、洗浄水の排出効果の向上が期待できる。 The rotational speed of the rotating substrate 70 in the cleaning mode can be made faster than the rotating speed of the rotating substrate 70 in the mist generation mode. According to this, the improvement of the discharge effect of washing water can be expected.
(第2実施形態) 図13に、本発明の係るミスト生成装置の第2実施形態を示す。そこでは、回転基板70の円中心から外周方向に向かって、衝突壁列82を螺旋状に配置した点が先の第1実施形態と相違する。それ以外の点は、先の第1実施形態と同様であるので、同様の部材には同一の符号を付して、その説明を省略する。なお、図13には、最下方に位置する回転基板70aのみを示したが、その余の回転基板70b~70dにおいても、回転基板70aと同様の衝突壁列82の配列構成を採ることができることを補足する。 (Second Embodiment) FIG. 13 shows a second embodiment of the mist generating apparatus according to the present invention. Here, the point that the collision wall row 82 is spirally arranged from the center of the circle of the rotating substrate 70 toward the outer periphery is different from the first embodiment. Since the other points are the same as those in the first embodiment, the same members are denoted by the same reference numerals, and the description thereof is omitted. FIG. 13 shows only the rotating substrate 70a positioned at the lowermost position, but the remaining rotating substrates 70b to 70d can adopt the same arrangement configuration of the collision wall rows 82 as the rotating substrate 70a. To supplement.
(第3実施形態) 図14に、本発明の第3実施形態を示す。そこでは、エッチング法により、衝突壁81を形成した点が、先の第1実施形態と相違する。すなわち、図14(a)に示すように、回転基板70を構成する基板本体80の上面に、衝突壁81の形成箇所に対応するレジスト体130を有するパターンレジスト131を形成したうえで、基板本体80の上面側からエッチング液を塗布することにより、レジスト体130の無い基板本体80の上面をエッチング液で食刻することにより、図14(b)に示すように液体通路83および周方向通路84に対応する凹部を基板本体80に形成して、衝突壁81を形成している。以上のようなエッチング法による回転基板70の形成方法によっても、凹部の周縁、すなわち、衝突壁81の側面にエッチング液による食刻によって凹凸部95を形成することができる。それ以外の点は、先と第1実施形態と同様であるので同様の部材には同一の符号を付してその説明を省略する。 Third Embodiment FIG. 14 shows a third embodiment of the present invention. Here, the point that the collision wall 81 is formed by an etching method is different from the first embodiment. That is, as shown in FIG. 14A, after a pattern resist 131 having a resist body 130 corresponding to the formation location of the collision wall 81 is formed on the upper surface of the substrate body 80 constituting the rotating substrate 70, the substrate body By applying an etching solution from the upper surface side of 80 and etching the upper surface of the substrate body 80 without the resist body 130 with the etching solution, the liquid passage 83 and the circumferential passage 84 as shown in FIG. The collision wall 81 is formed by forming a recess corresponding to the above in the substrate body 80. Also by the method of forming the rotating substrate 70 by the etching method as described above, the concavo-convex portion 95 can be formed by etching with an etching solution on the periphery of the recess, that is, the side surface of the collision wall 81. Since the other points are the same as those of the first embodiment, the same members are denoted by the same reference numerals and the description thereof is omitted.
(第4実施形態) 図15に本発明の第4実施形態を示す。そこでは、衝突壁81の上端に、衝突壁81の周壁面よりも大形のオーバーハング部135を形成している。また、この第4実施形態では、複数枚の回転基板70を積層して回転体5を構成するのでは無く、一枚の回転基板70のみで回転体5を構成している。すなわち、液体通路83や周方向通路84の上方を塞ぐ天板となる、上方側の回転基板70を廃している。それ以外の点は、先の第1実施形態と同様であるので、同様の部材には同一の符号を付してその説明を省略する。このように、衝突壁81の上端にオーバーハング部135を形成してあると、該オーバーハング部135で、液体通路83および周方向通路84を通る液体が、上方に向かうことを防ぐことができるので、衝突壁81に液体を繰り返して衝突させながら、回転基板70の中心から外周方向に向かって液体を移動させることができる。したがって、微細化されたミストを得ることができる。 (Fourth Embodiment) FIG. 15 shows a fourth embodiment of the present invention. There, an overhang portion 135 larger than the peripheral wall surface of the collision wall 81 is formed at the upper end of the collision wall 81. In the fourth embodiment, the rotating body 5 is not formed by stacking a plurality of rotating substrates 70, but the rotating body 5 is configured by only one rotating substrate 70. In other words, the upper rotating substrate 70 that serves as a top plate that covers the liquid passage 83 and the circumferential passage 84 is eliminated. Since the other points are the same as those in the first embodiment, the same members are denoted by the same reference numerals and the description thereof is omitted. As described above, when the overhang portion 135 is formed at the upper end of the collision wall 81, the liquid passing through the liquid passage 83 and the circumferential passage 84 can be prevented from moving upward in the overhang portion 135. Therefore, the liquid can be moved from the center of the rotating substrate 70 toward the outer peripheral direction while repeatedly colliding the liquid with the collision wall 81. Therefore, a miniaturized mist can be obtained.
 上記実施形態においては、4枚の回転基板70(70a~70d)で回転体5を構成したが、本発明はこれに限られず、回転基板70の枚数は4枚を超えるものであっても、4枚未満であってもよい。また、上記実施形態においては、ミスト生成装置は、メインスイッチ15と洗浄スイッチ16の二つのスイッチを備えるものとし、メインスイッチ15を押圧操作するとミスト生成モードとなり、洗浄スイッチ16を押圧操作すると洗浄モードとなるようにしたが、スイッチは一つとし、当該スイッチを押圧操作するたびに、サイクルでモードが変更されるようにしてもよい。保護フード45等の本体ケース1の形状は、先の第1実施形態に示したものに限られない。先の第1実施形態においては、連結ボス64により複数枚の回転基板70を固定したが、本発明はこれに限られず、ビスにより複数枚の回転基板70を固定することができる。 In the above embodiment, the rotating body 5 is configured by four rotating substrates 70 (70a to 70d). However, the present invention is not limited to this, and the number of rotating substrates 70 may be more than four. It may be less than 4 sheets. Further, in the above embodiment, the mist generating device includes two switches, the main switch 15 and the cleaning switch 16, and the mist generating mode is set when the main switch 15 is pressed and the cleaning mode is set when the cleaning switch 16 is pressed. However, the number of switches may be one, and the mode may be changed in a cycle every time the switch is pressed. The shape of the main body case 1 such as the protective hood 45 is not limited to that shown in the first embodiment. In the first embodiment, the plurality of rotating substrates 70 are fixed by the connecting bosses 64. However, the present invention is not limited to this, and the plurality of rotating substrates 70 can be fixed by screws.
 上記実施形態においては、ミスト生成部5がファン(ファンユニット46)を備えるものであったが、本発明はこれに限られず、ファンは無くても良い。また、ファンを設ける場合において、回転体駆動用のモーター4とは別個に、ファン用のモーターを設けた形態であってもよい。 In the above embodiment, the mist generating unit 5 includes a fan (fan unit 46). However, the present invention is not limited to this, and there may be no fan. In the case where a fan is provided, a fan motor may be provided separately from the rotating body driving motor 4.
 回転体5の駆動手段としては、モーター4に限られず、手動式の回転体駆動手段であってもよい。具体的には、押圧式レバーに設けられるラックギヤと、同ラックギヤと噛み合うピニオンギヤと、同ピニオンギヤと回転体との間に設けられるワンウェイクラッチを含んで構成される手動式の回転体駆動手段であってもよく、或いは、ゼンマイ方式の回転体駆動手段であってもよい。さらに、回転体の背面に複数のフィンを設けて別途設けられた送風手段による風力によって回転体5が回転されるものであってもよい。 The driving means of the rotating body 5 is not limited to the motor 4 and may be a manual rotating body driving means. Specifically, manual rotating body drive means comprising a rack gear provided in the pressing lever, a pinion gear meshing with the rack gear, and a one-way clutch provided between the pinion gear and the rotating body, Alternatively, a mainspring type rotating body driving means may be used. Furthermore, the rotating body 5 may be rotated by wind force provided by a separately provided air supply unit by providing a plurality of fins on the back surface of the rotating body.
 また、上記実施形態においては、一つの本体ケース1の内部にミスト生成部6、液体送給手段9などが設けられている形態であったが、本発明はこれに限られず、ミスト生成部6は、液体送給手段9やタンク7とは別体に設けることができる。つまり、ミスト生成部6と液体送給手段9やタンク7とが別体に設けられ、両者間が電力供給用のリードや送給チューブ等を介して連結されている形態であってもよい。化粧水のボトルを直接接続して液体を供給する形態であってもよく、その場合には、化粧水のボトルそのものが、本発明のタンクとなる。また、回転体5にスポイトなどにより直接、液体を送給する形態であってもよく、その場合には、スポイト自身が、タンクおよび液体送給手段となる。 Moreover, in the said embodiment, although it was the form by which the mist production | generation part 6, the liquid supply means 9, etc. were provided in the inside of the one main body case 1, this invention is not limited to this, The mist production | generation part 6 Can be provided separately from the liquid feeding means 9 and the tank 7. That is, the form which the mist production | generation part 6, the liquid supply means 9, and the tank 7 are provided in a different body, and both are connected via the lead for electric power supply, a supply tube, etc. may be sufficient. The form may be such that the lotion bottle is directly connected to supply the liquid. In this case, the lotion bottle itself is the tank of the present invention. Further, the liquid may be directly supplied to the rotating body 5 by using a dropper or the like. In this case, the dropper itself serves as a tank and a liquid supply unit.
1 本体ケース
7 タンク
8 液体(水)
9 液体送給手段(送給ポンプ)
70 回転基板
81 衝突壁
82 衝突壁列
83 液体通路
86 天板
90 壁面
91 壁面
92 壁面
93 壁面
94 上面
95 凹凸部
96 溝
97 リブ
135 オーバーハング部
A 液体通路の通路幅
B 周方向の液体通路の通路幅
E 回転基板の厚み寸法
H 衝突壁の突出寸法
T 衝突壁の厚み寸法
W 衝突壁の幅寸法
1 Body case 7 Tank 8 Liquid (water)
9 Liquid feed means (feed pump)
70 rotating substrate 81 collision wall 82 collision wall row 83 liquid passage 86 top plate 90 wall surface 91 wall surface 92 wall surface 93 wall surface 94 upper surface 95 uneven portion 96 groove 97 rib 135 overhang portion A liquid passage passage width B circumferential liquid passage direction Passage width E Rotational substrate thickness dimension H Collision wall protrusion dimension T Collision wall thickness dimension W Collision wall width dimension

Claims (16)

  1.  回転駆動される回転基板(70)と、ミスト生成用の液体(8)を収容するタンク(7)と、タンク(7)に収容した液体(8)を回転基板(70)に送給する液体送給手段(9)とを備えており、
     回転基板(70)は、複数の衝突壁(81)を有しており、
     衝突壁(81)の壁面(90)に凹凸部(95)を形成して、該壁面(90)が粗面化されていることを特徴とするミスト発生装置。
    A rotating substrate (70) that is driven to rotate, a tank (7) that contains a liquid (8) for generating mist, and a liquid that feeds the liquid (8) contained in the tank (7) to the rotating substrate (70). A feeding means (9),
    The rotating substrate (70) has a plurality of collision walls (81),
    The mist generator characterized by forming an uneven | corrugated | grooved part (95) in the wall surface (90) of a collision wall (81), and this wall surface (90) is roughened.
  2.  回転駆動される回転基板(70)と、ミスト生成用の液体(8)を収容するタンク(7)と、タンク(7)に収容した液体(8)を回転基板(70)に送給する液体送給手段(9)とを備えており、
     衝突壁(81)と液体通路(83)とを交互に配置してなる環状の衝突壁列(82)が、回転基板(70)の回転中心を囲む状態で、径方向へ少なくとも二重に設けてあり、
     各衝突壁列(82)は、外側の衝突壁列(82)を構成する衝突壁(81)が、内側の衝突壁列(82)の液体通路(83)と対向する状態で配置されており、
     少なくとも内側の衝突壁列(82)の液体通路(83)の出口に臨む外側の衝突壁列(82)の衝突壁(81)の壁面(90)に凹凸部(95)を形成して、該壁面(90)が粗面化されていることを特徴とするミスト発生装置。
    A rotating substrate (70) that is driven to rotate, a tank (7) that contains a liquid (8) for generating mist, and a liquid that feeds the liquid (8) contained in the tank (7) to the rotating substrate (70). A feeding means (9),
    An annular collision wall row (82) formed by alternately arranging the collision walls (81) and the liquid passages (83) is provided at least twice in the radial direction so as to surround the rotation center of the rotary substrate (70). And
    Each collision wall row (82) is arranged in a state where the collision wall (81) constituting the outer collision wall row (82) faces the liquid passage (83) of the inner collision wall row (82). ,
    An uneven portion (95) is formed on the wall surface (90) of the collision wall (81) of the outer collision wall row (82) facing at least the outlet of the liquid passage (83) of the inner collision wall row (82), A mist generator characterized in that the wall surface (90) is roughened.
  3.  回転基板(70)の表面粗度が、凹凸部(95)が形成された衝突壁(81)の壁面(90)の粗度よりも小さく設定されている、請求項1又は2記載のミスト発生装置。 The mist generation according to claim 1 or 2, wherein the surface roughness of the rotating substrate (70) is set to be smaller than the roughness of the wall surface (90) of the collision wall (81) on which the uneven portion (95) is formed. apparatus.
  4.  衝突壁(81)を構成する全ての壁面(90・91・92・93)に凹凸部(95)が形成され、粗面化されている、請求項1乃至3のいずれかに記載のミスト発生装置。 The mist generation according to any one of claims 1 to 3, wherein the concave and convex portions (95) are formed and roughened on all the wall surfaces (90, 91, 92, 93) constituting the collision wall (81). apparatus.
  5.  衝突壁(81)が回転基板(70)の表面から突出状に形成されており、
     凹凸部(95)が、回転基板(70)からの突出方向に長い溝(96)とリブ(97)とで構成されている、請求項1乃至4のいずれかに記載のミスト発生装置。
    The collision wall (81) is formed so as to protrude from the surface of the rotating substrate (70),
    The mist generating device according to any one of claims 1 to 4, wherein the concavo-convex portion (95) includes a groove (96) and a rib (97) that are long in a protruding direction from the rotating substrate (70).
  6.  回転基板(70)の周方向に係る衝突壁(81)の幅寸法(W)と、回転基板(70)の径方向に係る衝突壁(81)の厚み寸法(T)とが、(W)>(T)の関係を満たすように設定されている、請求項1乃至5のいずれかに記載のミスト発生装置。 The width dimension (W) of the collision wall (81) in the circumferential direction of the rotating substrate (70) and the thickness dimension (T) of the collision wall (81) in the radial direction of the rotating substrate (70) are (W). The mist generating apparatus according to claim 1, wherein the mist generating apparatus is set so as to satisfy a relationship of> (T).
  7.  回転基板(70)の周方向に係る衝突壁(81)の幅寸法(W)と、回転基板(70)の径方向に係る衝突壁(81)の厚み寸法(T)と、衝突壁(81)の突出寸法(H)とが、(W)>(H)>(T)の関係を満たすように設定されている、請求項1乃至6のいずれかに記載のミスト発生装置。 The width dimension (W) of the collision wall (81) in the circumferential direction of the rotating substrate (70), the thickness dimension (T) of the collision wall (81) in the radial direction of the rotating substrate (70), and the collision wall (81 7) is set so as to satisfy the relationship of (W)> (H)> (T).
  8.  回転基板(70)は基板本体(80)と衝突壁(81)を含み、基板本体(80)の厚み寸法(E)と、回転基板(70)の周方向に係る衝突壁(81)の幅寸法(W)と、回転基板(70)の径方向に係る衝突壁(81)の厚み寸法(T)と、衝突壁(81)の突出寸法(H)とが、(E)>(W)>(H)>(T)の関係を満たすように設定されている、請求項1乃至7のいずれかに記載のミスト発生装置。 The rotating substrate (70) includes a substrate body (80) and a collision wall (81). The thickness dimension (E) of the substrate body (80) and the width of the collision wall (81) in the circumferential direction of the rotating substrate (70). The dimension (W), the thickness dimension (T) of the collision wall (81) in the radial direction of the rotating substrate (70), and the protrusion dimension (H) of the collision wall (81) are (E)> (W). The mist generator according to any one of claims 1 to 7, wherein the mist generator is set to satisfy a relationship of> (H)> (T).
  9.  回転基板(70)の周方向に係る衝突壁(81)の幅寸法(W)と、回転基板(70)の径方向に係る衝突壁(81)の厚み寸法(T)と、衝突壁(81)の突出寸法(H)と、衝突壁列(82)の液体通路(83)の通路幅(A)とが、(W)>(H)>(T)>(A)の関係を満たすように設定されている、請求項1乃至8のいずれかに記載のミスト発生装置。 The width dimension (W) of the collision wall (81) in the circumferential direction of the rotating substrate (70), the thickness dimension (T) of the collision wall (81) in the radial direction of the rotating substrate (70), and the collision wall (81 ) And the passage width (A) of the liquid passage (83) of the collision wall row (82) satisfy the relationship of (W)> (H)> (T)> (A). The mist generating device according to any one of claims 1 to 8, wherein
  10.  内外の衝突壁列(82)を構成する衝突壁(81)の間に形成される周方向の液体通路(84)の通路幅(B)と、衝突壁列(82)の液体通路(83)の通路幅(A)とが、(B)>(A)の関係を満たすように設定されている、請求項1乃至9のいずれかに記載のミスト発生装置。 The passage width (B) of the circumferential liquid passage (84) formed between the collision walls (81) constituting the inner and outer collision wall row (82), and the liquid passage (83) of the collision wall row (82). The mist generator according to any one of claims 1 to 9, wherein the passage width (A) is set so as to satisfy a relationship of (B)> (A).
  11.  衝突壁(81)の上面(94)には天板(86)が固定されており、
     衝突壁(81)の上面(94)の粗度が、液体通路(83)に臨む衝突壁(81)の壁面(90)の粗度よりも小さく設定されている、請求項1乃至10のいずれかに記載のミスト発生装置。
    A top plate (86) is fixed to the upper surface (94) of the collision wall (81),
    The roughness of the upper surface (94) of the collision wall (81) is set smaller than the roughness of the wall surface (90) of the collision wall (81) facing the liquid passage (83). The mist generator according to the above.
  12.  衝突壁列(82)が回転基板(70)の径方向へ多重に設けられており、
     衝突壁(81)を含む衝突壁列(82)が、天板(86)の支持構造を兼ねている、請求項11記載のミスト発生装置。
    Collision wall rows (82) are provided in multiple directions in the radial direction of the rotating substrate (70),
    The mist generator according to claim 11, wherein the collision wall row (82) including the collision wall (81) also serves as a support structure for the top plate (86).
  13.  衝突壁列(82)を備える回転基板(70)が複数枚積層されており、
     上方の回転基板(70)が、下方の回転基板(70)の天板(86)を兼ねている、請求項12記載のミスト発生装置。
    A plurality of rotating substrates (70) having a collision wall row (82) are laminated,
    The mist generator according to claim 12, wherein the upper rotating substrate (70) also serves as a top plate (86) of the lower rotating substrate (70).
  14.  衝突壁(81)が電鋳法により形成されている、請求項1乃至13のいずれかに記載のミスト発生装置。 The mist generating device according to any one of claims 1 to 13, wherein the collision wall (81) is formed by an electroforming method.
  15.  衝突壁(81)の上端にオーバーハング部(135)が設けられている、請求項1乃至10、12のいずれかに記載のミスト発生装置。 The mist generating device according to any one of claims 1 to 10, wherein an overhang portion (135) is provided at an upper end of the collision wall (81).
  16.  エッチング法により衝突壁(81)が形成されている、請求項1乃至13のいずれかに記載のミスト発生装置。 The mist generator according to any one of claims 1 to 13, wherein the collision wall (81) is formed by an etching method.
PCT/JP2013/067629 2012-07-13 2013-06-27 Mist generator WO2014010428A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012-158037 2012-07-13
JP2012158037A JP2014018713A (en) 2012-07-13 2012-07-13 Mist generator

Publications (1)

Publication Number Publication Date
WO2014010428A1 true WO2014010428A1 (en) 2014-01-16

Family

ID=49915892

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2013/067629 WO2014010428A1 (en) 2012-07-13 2013-06-27 Mist generator

Country Status (2)

Country Link
JP (1) JP2014018713A (en)
WO (1) WO2014010428A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014030789A (en) * 2012-08-03 2014-02-20 Hitachi Maxell Ltd Mist generator

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101783741B1 (en) 2016-10-04 2017-10-13 주식회사 클린그린 A face makeup appliance

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS496949B1 (en) * 1970-04-13 1974-02-18
JPS6229078Y2 (en) * 1981-02-19 1987-07-25
JPS62179052U (en) * 1986-04-28 1987-11-13
JPH0254308B2 (en) * 1984-02-18 1990-11-21 Nichidai Kogyo Kk
WO1998005432A1 (en) * 1996-08-03 1998-02-12 Masakatsu Takayasu Spraying apparatus and spraying method
JPH11300238A (en) * 1998-04-20 1999-11-02 Nec Home Electron Ltd Fine water droplet generating apparatus
JP2003130404A (en) * 2001-10-25 2003-05-08 Horizon:Kk Anion generator
JP2006061761A (en) * 2004-08-24 2006-03-09 Tdk Corp Spray-drying apparatus
JP2007313437A (en) * 2006-05-26 2007-12-06 Yamazaki Co Ltd Gas-mixed water-generating apparatus and humidifying apparatus
JP2009078245A (en) * 2007-09-27 2009-04-16 Panasonic Corp Mist generator

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS496949B1 (en) * 1970-04-13 1974-02-18
JPS6229078Y2 (en) * 1981-02-19 1987-07-25
JPH0254308B2 (en) * 1984-02-18 1990-11-21 Nichidai Kogyo Kk
JPS62179052U (en) * 1986-04-28 1987-11-13
WO1998005432A1 (en) * 1996-08-03 1998-02-12 Masakatsu Takayasu Spraying apparatus and spraying method
JPH11300238A (en) * 1998-04-20 1999-11-02 Nec Home Electron Ltd Fine water droplet generating apparatus
JP2003130404A (en) * 2001-10-25 2003-05-08 Horizon:Kk Anion generator
JP2006061761A (en) * 2004-08-24 2006-03-09 Tdk Corp Spray-drying apparatus
JP2007313437A (en) * 2006-05-26 2007-12-06 Yamazaki Co Ltd Gas-mixed water-generating apparatus and humidifying apparatus
JP2009078245A (en) * 2007-09-27 2009-04-16 Panasonic Corp Mist generator

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014030789A (en) * 2012-08-03 2014-02-20 Hitachi Maxell Ltd Mist generator

Also Published As

Publication number Publication date
JP2014018713A (en) 2014-02-03

Similar Documents

Publication Publication Date Title
JP6018455B2 (en) Mist generator
TWI585842B (en) Substrate processing device
WO2014010428A1 (en) Mist generator
KR20150026940A (en) Spin processor
US20120266921A1 (en) Thin plate member washing apparatus
CN100450633C (en) Electrostatic spraying device
US9038625B2 (en) Liquid spray device
JP5964689B2 (en) Mist generator
JP5985294B2 (en) Mist generator
JP5335466B2 (en) Beauty equipment
JP2009078245A (en) Mist generator
JP2014030580A (en) Mist generator
JP5797615B2 (en) Mist generator
JP2010216710A (en) Mist generator
JP2008147149A (en) Air negative ion generation method by water, and its device
GB2506459A (en) Liquid spray device
JP2012130437A (en) Mist generation device
JP5342600B2 (en) Rotary atomization coating equipment
JP5428874B2 (en) Thin plate cleaning equipment
JP2011075139A (en) Mist generator
JP5912576B2 (en) Paint booth
JP2013009705A (en) Mist generator
JPH11114349A (en) Air cleaner
JP2005000785A (en) Electrostatic powder coating apparatus
CN115722476A (en) Cleaning device

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 13817166

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 13817166

Country of ref document: EP

Kind code of ref document: A1