WO2013181899A1

WO2013181899A1 - Array substrate integrated with color film, manufacturing method thereof, and display device

Info

Publication number: WO2013181899A1
Application number: PCT/CN2012/084098
Authority: WO
Inventors: 刘翔; 薛建设
Original assignee: 京东方科技集团股份有限公司
Priority date: 2012-06-08
Filing date: 2012-11-05
Publication date: 2013-12-12
Also published as: CN102749752A; CN102749752B

Abstract

An array substrate integrated with a color film, a manufacturing method, and a display device. The array substrate integrated with a color film comprises a base substrate (10) for forming the array substrate, a black matrix (4) formed on the base substrate (10), and color filters (1, 2, 3). The black matrix (4) is located between adjacent color filters (1, 2, 3). The array substrate integrated with a color film further comprises a light reflecting layer (5) formed between adjacent color filters (1, 2, 3) and on the black matrix (4). The light reflecting layer reflects external light, so as to improve the display brightness of a display device without affecting the aperture ratio thereof.

Description

Array substrate with integrated color film, manufacturing method thereof and display device

Embodiments of the present invention relate to an array substrate in which a color film is integrated, a method of manufacturing the array substrate, and a display device. Background technique

Thin Film Transistor Liquid Crystal Display (TFT-LCD) has the characteristics of small size, low power consumption, no radiation, and is dominant in the current flat panel display market.

A TFT-LCD generally consists of a liquid crystal panel (LCD panel), a driver circuit, and a backlight under the liquid crystal panel. The liquid crystal panel is the most important part of the TFT-LCD, and is formed by two glass plates and a liquid crystal layer sandwiched between the two glass plates. The glass plate on one side includes a color filter (CF) for filtering and a transparent common electrode plated on the color filter. The color filter film CF generally includes color filters of three primary colors of red, green, and blue (R, G, B). The glass plate on the other side is a TFT array substrate, and a thin film transistor arranged in a matrix and some peripheral circuits are disposed on the TFT array substrate.

A black matrix is generally formed on the CF of the TFT-LCD and between the color filter films of the three primary colors of R, G, and B. The material of the black matrix is an opaque material, mainly used to cover portions that are not intended to transmit light, such as metal traces or TFT portions.

Most TFT-LCDs have low display brightness and poor contrast in environments with high ambient light conditions, such as in outdoor environments with high ambient light intensity or in snow and snow environments, making it difficult to see the contents of the display. Summary of the invention

According to an aspect of the invention, an array substrate incorporating an integrated color film is provided. The array substrate of the integrated color film includes a base substrate for forming an array substrate, a black matrix formed on the base substrate, and a color filter film, and the black matrix is located between adjacent color filter films. Array of integrated color film The substrate further includes a light reflecting layer that is also formed between adjacent color filter films and above the black matrix.

According to another aspect of the present invention, there is provided a display device comprising an array substrate of an integrated color film as described above.

According to still another aspect of the present invention, an array substrate manufacturing method of an integrated color film is provided. The method includes: forming a color filter film and a black matrix on a base substrate for forming an array substrate, wherein the black matrix is located between adjacent color filter films; and forming a light reflecting layer, wherein the light reflecting layer is also formed in the phase Between adjacent color filter films and above the black matrix.

According to an embodiment of the present invention, an array substrate and a display device with integrated color film are further provided with a light reflecting layer on the black matrix, and the reflection of the external light by the reflective layer can improve the display brightness of the display device, and the external light is stronger. The higher the display brightness, the better the visibility of the display device in a high light intensity environment without affecting its aperture ratio. The method for manufacturing an array substrate with integrated color film provided by the embodiments of the present invention can basically utilize the conventional manufacturing process to facilitate the production of the array substrate and the display device for integrating the color film. DRAWINGS

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings of the embodiments will be briefly described below. It is obvious that the drawings in the following description relate only to some embodiments of the present invention, and are not intended to limit the present invention. .

1 is a schematic cross-sectional view of an array substrate with an integrated color film according to an embodiment of the present invention;

2 is a schematic cross-sectional view of an array substrate with an integrated color film according to another embodiment of the present invention;

3 is a schematic flow chart of a method for fabricating an array substrate with an integrated color film according to an embodiment of the present invention; FIG. 4 is a schematic cross-sectional view showing a color filter film formed on a base substrate for forming an array substrate according to an embodiment of the present invention;

Fig. 5 is a schematic cross-sectional view showing a black matrix formed on a base substrate for forming an array substrate according to an embodiment of the present invention. detailed description

In order to make the purpose, technical solution and advantages of the embodiments of the present invention clearer, the following will be combined with the present invention. The technical solutions of the embodiments of the present invention are clearly and completely described in the accompanying drawings. It is apparent that the described embodiments are part of the embodiments of the invention, rather than all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the described embodiments of the present invention without departing from the scope of the invention are within the scope of the invention.

In the embodiment of the present invention, the light reflecting layer is added without affecting the aperture ratio, and the light reflecting layer is used to reflect the external light. Thereby, the external light can be fully utilized to increase the display brightness of the display device, increase the contrast, and increase the visibility of the display device in a relatively strong light environment.

1 is a schematic cross-sectional view of an array substrate with an integrated color film according to an embodiment of the present invention. As shown in FIG. 1, the array substrate includes: a base substrate 10 for forming an array substrate, a black matrix 4 formed on the base substrate 10, and color filter films 1, 2, 3, wherein the black matrix 4 is formed adjacent to Between the color filters. In addition, the array substrate of the integrated color film further includes a light reflecting layer 5, which is also formed between adjacent color filter films and above the black matrix 4.

The light reflecting layer 5 is a film having a function of reflecting light, which substantially corresponds to the position of the black matrix. The reflective layer 5 can be made of a metal material having a relatively high light reflectance (generally, a metal having a higher conductivity, a lower penetration coefficient and a higher reflectance), and a reflective film 5 is formed using such a metal film. Can get better reflection effect. Preferably, the reflective layer 5 is made of aluminum, silver or an alloy or compound thereof.

The thickness of the light reflecting layer 5 is preferably between 500 A and 6000 A, which is smaller than the thickness of the color filter film. As can be seen from Fig. 1, the sum of the thicknesses of the black matrix 4 and the light reflecting layer 5 is about the thickness of the color filter film. The preferred thickness of the black matrix 4 is between 10,000 A and 30,000 A.

2 is a schematic cross-sectional view of an array substrate with an integrated color film according to another embodiment of the present invention. As shown in Fig. 2, this embodiment differs from the embodiment shown in Fig. 1 in that the upper surface of the light reflecting layer 5 is non-planar. For example, the non-planar surface can be a serrated surface. Of course, the non-planar surface may also be a rough surface comprising a plurality of concave, convex or concave-convex shapes.

With the embodiment shown in Fig. 2, the light directed at the screen can form a multi-angle reflection or diffuse reflection at the reflective layer, thereby making the brightness of the display device more uniform and meeting the needs of multi-angle viewing.

Embodiments of the present invention also provide a display device. The display device comprises the array substrate of the integrated color film described in the above embodiments. The display device is, for example, a liquid crystal display, an organic light emitting diode display, electronic paper, or the like. The display device according to the embodiment of the invention can still be in a high light intensity environment Have better visibility.

The embodiment of the invention further provides a method for manufacturing an array substrate with integrated color film. As shown in FIG. 3, the method includes the following steps:

Step 1. On the base substrate 10 for forming the array substrate, a conventional color film manufacturing process is employed to form color filter films 1, 2, and 3 (referred to as color film), as shown in FIG.

The base substrate 10 for forming the array substrate may be transparent glass or quartz. The conventional color film manufacturing process may be a pigment dispersion method or an inkjet method (Ink Jet). For example, in the case of the inkjet method, the inkjet apparatus sprays red (R), green (G), and blue (B) inks on the sub-pixel regions of R, G, and B, respectively. The color films 1, 2, and 3 corresponding to the respective sub-pixels are formed by dropping. The sub-pixels of R, G, and B can transmit light of other primary wavelengths through the light of the three primary colors of R, G, and B, respectively, thereby achieving filtering. R, G, B Three sub-pixels form one pixel.

Step 2. On the base substrate 10 on which the step 1 is completed, a layer of organic black resin is applied by one spin coating, and a black matrix 4 is formed by a photolithography process, as shown in FIG.

The organic black resin is, for example, an aniline black, a cyanine black or a perylene black. The preferred thickness of the black matrix 4 is between 10,000 A and 30,000 A. Such a thickness makes it possible to save raw materials on the basis of good light-shielding properties.

Step 3. Form a metal material layer on the base substrate 10 of the step 2 by sputtering or thermal evaporation, and form a light reflecting layer 5 by a photolithography process, as shown in FIG.

The reflective layer 5 is located above the black matrix 4. The material of the light reflecting layer 5 is preferably a metal having a high reflectance such as aluminum, silver or an alloy or a compound thereof. The thickness of the light reflecting layer 5 is preferably 500 A to 6000 A.

Further, in an alternative embodiment of the present invention, the order between the above steps 1 and 2 can be interchanged, that is, a black matrix is first formed on the base substrate 10, and a color filter film is formed. In this case, the area of the light reflecting layer formed in the above step 3 is smaller than the area of the black matrix.

Further, in a preferred embodiment of the present invention, when the light reflecting layer 5 is formed by a photolithography process, the upper surface of the light reflecting layer 5 is made non-planar. The above non-planar surface may be a serrated surface or a rough surface including a plurality of concave, convex or concave-convex shapes. For example, in the exposure and development process of the photolithography process, the exposure of the photosensitive resin layer to the different portions of the light-reflecting layer corresponding to the photosensitive resin layer can be adjusted to obtain the non-planar upper surface of the light-reflecting layer 5. Thereby, the light that is directed to the screen can form a multi-angle reflection or a diffuse reflection at the reflective layer, thereby making the brightness of the display device more uniform and satisfying The need to view the angle.

In this embodiment, in the manufacturing process of the array substrate with integrated color film, a reflective layer is added on the black matrix, so that external visible light can be reflected when the reflective layer is irradiated, and the external light intensity is used to improve the brightness of the display device. Affects the aperture ratio of the display device. Thereby, the visibility of the display device in a high-brightness environment is increased.

It should be noted that, for the sake of clarity, other components on the array substrate such as TFTs, scan lines, data lines, pixel electrodes, and the like are omitted in the above description and the drawings. The omitted components can have structures known in the art and can be fabricated using methods known in the art.

It should be noted that the above description is made for a single pixel unit, but other pixel units may be formed identically.

The above is only an exemplary embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is defined by the appended claims.

Claims

Claim

An array substrate with an integrated color film, comprising: a base substrate for forming an array substrate, a black matrix formed on the base substrate, and a color filter film, wherein the black matrix is located between adjacent color filter films,

The array substrate of the integrated color film further includes a light reflecting layer, and the light reflecting layer is also formed between the adjacent color filter films and located above the black matrix.

2. The integrated color film array substrate according to claim 1, wherein an upper surface of the light reflecting layer is non-planar.

3. The integrated color film array substrate according to claim 2, wherein the upper surface of the light reflecting layer is a sawtooth surface or a rough surface including a plurality of concave, convex or concave-convex shapes.

4. The integrated color film array substrate according to claim 1, wherein the reflective layer has a thickness of 500 A to 6000 A.

5. The integrated color film array substrate according to claim 1, wherein the light reflecting layer is made of a metal material having a high light reflectance.

6. The integrated color film array substrate according to claim 1, wherein a sum of thicknesses of said black matrix and said light reflecting layer is about a thickness of said color filter film

A display device comprising the array substrate of the integrated color film according to claim 1.

8. A method of fabricating an array substrate with integrated color film, wherein the method comprises:

Forming a color filter film and a black matrix on the base substrate for forming the array substrate, wherein the black matrix is located between adjacent color filter films;

A light reflecting layer is formed, wherein the light reflecting layer is also formed between adjacent color filter films and above the black matrix.

The method of manufacturing an array substrate of an integrated color film according to claim 8, wherein the black matrix is formed before or after the color filter film is formed.

10. The method of fabricating an array substrate with integrated color film according to claim 9, wherein the forming the black matrix comprises:

An organic black resin having a thickness of 10000 A to 30000 A is coated on the base substrate; a black matrix is formed by a photolithography process.

11. The method of fabricating an array substrate with integrated color film according to claim 8, wherein the forming the reflective layer comprises:

Forming a metal material layer on the base substrate on which the color filter film and the black matrix are formed; forming a light-reflecting layer by a photolithography process.

12. The method of fabricating an array substrate with integrated color film according to claim 11, wherein the forming a light reflecting layer by a photolithography process comprises:

A reflective layer having a non-planar upper surface is formed by a photolithography process.

The method of manufacturing an array substrate with integrated color film according to claim 12, wherein the non-planar surface is a sawtooth surface or a rough surface including a plurality of concave, convex or concave-convex shapes.