WO2013181899A1 - Substrat de réseau intégré avec film couleur, procédé de fabrication et dispositif d'affichage - Google Patents

Substrat de réseau intégré avec film couleur, procédé de fabrication et dispositif d'affichage Download PDF

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Publication number
WO2013181899A1
WO2013181899A1 PCT/CN2012/084098 CN2012084098W WO2013181899A1 WO 2013181899 A1 WO2013181899 A1 WO 2013181899A1 CN 2012084098 W CN2012084098 W CN 2012084098W WO 2013181899 A1 WO2013181899 A1 WO 2013181899A1
Authority
WO
WIPO (PCT)
Prior art keywords
array substrate
black matrix
color film
reflecting layer
light reflecting
Prior art date
Application number
PCT/CN2012/084098
Other languages
English (en)
Chinese (zh)
Inventor
刘翔
薛建设
Original Assignee
京东方科技集团股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Publication of WO2013181899A1 publication Critical patent/WO2013181899A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Definitions

  • Embodiments of the present invention relate to an array substrate in which a color film is integrated, a method of manufacturing the array substrate, and a display device. Background technique
  • TFT-LCD Thin Film Transistor Liquid Crystal Display
  • a TFT-LCD generally consists of a liquid crystal panel (LCD panel), a driver circuit, and a backlight under the liquid crystal panel.
  • the liquid crystal panel is the most important part of the TFT-LCD, and is formed by two glass plates and a liquid crystal layer sandwiched between the two glass plates.
  • the glass plate on one side includes a color filter (CF) for filtering and a transparent common electrode plated on the color filter.
  • the color filter film CF generally includes color filters of three primary colors of red, green, and blue (R, G, B).
  • the glass plate on the other side is a TFT array substrate, and a thin film transistor arranged in a matrix and some peripheral circuits are disposed on the TFT array substrate.
  • a black matrix is generally formed on the CF of the TFT-LCD and between the color filter films of the three primary colors of R, G, and B.
  • the material of the black matrix is an opaque material, mainly used to cover portions that are not intended to transmit light, such as metal traces or TFT portions.
  • TFT-LCDs have low display brightness and poor contrast in environments with high ambient light conditions, such as in outdoor environments with high ambient light intensity or in snow and snow environments, making it difficult to see the contents of the display. Summary of the invention
  • an array substrate incorporating an integrated color film includes a base substrate for forming an array substrate, a black matrix formed on the base substrate, and a color filter film, and the black matrix is located between adjacent color filter films.
  • the substrate further includes a light reflecting layer that is also formed between adjacent color filter films and above the black matrix.
  • a display device comprising an array substrate of an integrated color film as described above.
  • an array substrate manufacturing method of an integrated color film includes: forming a color filter film and a black matrix on a base substrate for forming an array substrate, wherein the black matrix is located between adjacent color filter films; and forming a light reflecting layer, wherein the light reflecting layer is also formed in the phase Between adjacent color filter films and above the black matrix.
  • an array substrate and a display device with integrated color film are further provided with a light reflecting layer on the black matrix, and the reflection of the external light by the reflective layer can improve the display brightness of the display device, and the external light is stronger.
  • the higher the display brightness the better the visibility of the display device in a high light intensity environment without affecting its aperture ratio.
  • the method for manufacturing an array substrate with integrated color film provided by the embodiments of the present invention can basically utilize the conventional manufacturing process to facilitate the production of the array substrate and the display device for integrating the color film.
  • FIG. 1 is a schematic cross-sectional view of an array substrate with an integrated color film according to an embodiment of the present invention
  • FIG. 2 is a schematic cross-sectional view of an array substrate with an integrated color film according to another embodiment of the present invention.
  • FIG. 3 is a schematic flow chart of a method for fabricating an array substrate with an integrated color film according to an embodiment of the present invention
  • FIG. 4 is a schematic cross-sectional view showing a color filter film formed on a base substrate for forming an array substrate according to an embodiment of the present invention
  • Fig. 5 is a schematic cross-sectional view showing a black matrix formed on a base substrate for forming an array substrate according to an embodiment of the present invention. detailed description
  • the light reflecting layer is added without affecting the aperture ratio, and the light reflecting layer is used to reflect the external light.
  • the external light can be fully utilized to increase the display brightness of the display device, increase the contrast, and increase the visibility of the display device in a relatively strong light environment.
  • the array substrate includes: a base substrate 10 for forming an array substrate, a black matrix 4 formed on the base substrate 10, and color filter films 1, 2, 3, wherein the black matrix 4 is formed adjacent to Between the color filters.
  • the array substrate of the integrated color film further includes a light reflecting layer 5, which is also formed between adjacent color filter films and above the black matrix 4.
  • the light reflecting layer 5 is a film having a function of reflecting light, which substantially corresponds to the position of the black matrix.
  • the reflective layer 5 can be made of a metal material having a relatively high light reflectance (generally, a metal having a higher conductivity, a lower penetration coefficient and a higher reflectance), and a reflective film 5 is formed using such a metal film. Can get better reflection effect.
  • the reflective layer 5 is made of aluminum, silver or an alloy or compound thereof.
  • the thickness of the light reflecting layer 5 is preferably between 500 A and 6000 A, which is smaller than the thickness of the color filter film. As can be seen from Fig. 1, the sum of the thicknesses of the black matrix 4 and the light reflecting layer 5 is about the thickness of the color filter film.
  • the preferred thickness of the black matrix 4 is between 10,000 A and 30,000 A.
  • FIG. 2 is a schematic cross-sectional view of an array substrate with an integrated color film according to another embodiment of the present invention. As shown in Fig. 2, this embodiment differs from the embodiment shown in Fig. 1 in that the upper surface of the light reflecting layer 5 is non-planar.
  • the non-planar surface can be a serrated surface.
  • the non-planar surface may also be a rough surface comprising a plurality of concave, convex or concave-convex shapes.
  • the light directed at the screen can form a multi-angle reflection or diffuse reflection at the reflective layer, thereby making the brightness of the display device more uniform and meeting the needs of multi-angle viewing.
  • Embodiments of the present invention also provide a display device.
  • the display device comprises the array substrate of the integrated color film described in the above embodiments.
  • the display device is, for example, a liquid crystal display, an organic light emitting diode display, electronic paper, or the like.
  • the display device according to the embodiment of the invention can still be in a high light intensity environment Have better visibility.
  • the embodiment of the invention further provides a method for manufacturing an array substrate with integrated color film. As shown in FIG. 3, the method includes the following steps:
  • Step 1 On the base substrate 10 for forming the array substrate, a conventional color film manufacturing process is employed to form color filter films 1, 2, and 3 (referred to as color film), as shown in FIG.
  • the base substrate 10 for forming the array substrate may be transparent glass or quartz.
  • the conventional color film manufacturing process may be a pigment dispersion method or an inkjet method (Ink Jet).
  • the inkjet apparatus sprays red (R), green (G), and blue (B) inks on the sub-pixel regions of R, G, and B, respectively.
  • the color films 1, 2, and 3 corresponding to the respective sub-pixels are formed by dropping.
  • the sub-pixels of R, G, and B can transmit light of other primary wavelengths through the light of the three primary colors of R, G, and B, respectively, thereby achieving filtering.
  • R, G, B Three sub-pixels form one pixel.
  • Step 2 On the base substrate 10 on which the step 1 is completed, a layer of organic black resin is applied by one spin coating, and a black matrix 4 is formed by a photolithography process, as shown in FIG.
  • the organic black resin is, for example, an aniline black, a cyanine black or a perylene black.
  • the preferred thickness of the black matrix 4 is between 10,000 A and 30,000 A. Such a thickness makes it possible to save raw materials on the basis of good light-shielding properties.
  • Step 3 Form a metal material layer on the base substrate 10 of the step 2 by sputtering or thermal evaporation, and form a light reflecting layer 5 by a photolithography process, as shown in FIG.
  • the reflective layer 5 is located above the black matrix 4.
  • the material of the light reflecting layer 5 is preferably a metal having a high reflectance such as aluminum, silver or an alloy or a compound thereof.
  • the thickness of the light reflecting layer 5 is preferably 500 A to 6000 A.
  • the order between the above steps 1 and 2 can be interchanged, that is, a black matrix is first formed on the base substrate 10, and a color filter film is formed.
  • the area of the light reflecting layer formed in the above step 3 is smaller than the area of the black matrix.
  • the upper surface of the light reflecting layer 5 is made non-planar.
  • the above non-planar surface may be a serrated surface or a rough surface including a plurality of concave, convex or concave-convex shapes.
  • the exposure of the photosensitive resin layer to the different portions of the light-reflecting layer corresponding to the photosensitive resin layer can be adjusted to obtain the non-planar upper surface of the light-reflecting layer 5.
  • the light that is directed to the screen can form a multi-angle reflection or a diffuse reflection at the reflective layer, thereby making the brightness of the display device more uniform and satisfying The need to view the angle.
  • a reflective layer is added on the black matrix, so that external visible light can be reflected when the reflective layer is irradiated, and the external light intensity is used to improve the brightness of the display device. Affects the aperture ratio of the display device. Thereby, the visibility of the display device in a high-brightness environment is increased.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

L'invention concerne un substrat de réseau intégré avec un film couleur, comprenant un substrat de base (10) pour former le substrat de réseau, une matrice noire (4) formée sur le substrat de base (10), et des filtres couleurs (1, 2, 3). La matrice noire (4) est disposée entre des films couleurs adjacentes (1, 2, 3). Le substrat de réseau intégré avec un film couleur comprend en outre une couche réfléchissant la lumière (5) formée entre les filtres couleurs adjacents (1, 2, 3) et sur la matrice noire (4). La couche réfléchissant la lumière réfléchit la lumière externe de manière à améliorer la luminosité d'affichage d'un dispositif d'affichage sans affecter son rapport d'ouverture.
PCT/CN2012/084098 2012-06-08 2012-11-05 Substrat de réseau intégré avec film couleur, procédé de fabrication et dispositif d'affichage WO2013181899A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210189873.2 2012-06-08
CN201210189873.2A CN102749752B (zh) 2012-06-08 2012-06-08 集成彩膜的阵列基板及其制造方法和液晶显示器

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104360527A (zh) * 2014-11-03 2015-02-18 合肥鑫晟光电科技有限公司 阵列基板及其制作方法、显示装置
TWI622908B (zh) * 2016-03-18 2018-05-01 財團法人工業技術研究院 觸控顯示面板
US9978821B2 (en) 2016-03-18 2018-05-22 Industrial Technology Research Institute Display device

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CN102749752B (zh) * 2012-06-08 2015-06-17 京东方科技集团股份有限公司 集成彩膜的阵列基板及其制造方法和液晶显示器
CN104091545B (zh) * 2014-06-30 2017-01-04 广东九联科技股份有限公司 一种消除反射光的显示装置及方法
CN106154627A (zh) * 2016-08-29 2016-11-23 深圳市华星光电技术有限公司 一种液晶显示面板及液晶显示器
CN106449657B (zh) * 2016-10-27 2020-02-04 上海天马微电子有限公司 Oled显示面板、显示装置、阵列基板及其制作方法
CN107632453B (zh) 2017-10-31 2021-03-02 京东方科技集团股份有限公司 显示面板及制造方法和显示装置
CN108508648B (zh) * 2018-04-04 2020-01-17 深圳市华星光电技术有限公司 液晶面板及其制作方法
CN108400155B (zh) 2018-04-23 2020-06-05 京东方科技集团股份有限公司 Oled双面显示面板及其制备方法
US11808957B2 (en) 2019-02-25 2023-11-07 Visteon Global Technologies, Inc. System and method for adjusting light intensity in a display system
US11953778B2 (en) * 2019-02-25 2024-04-09 Visteon Global Technologies, Inc. System and method for adjusting light intensity in a display system
CN111221060B (zh) * 2020-03-11 2020-12-25 深圳市华星光电半导体显示技术有限公司 一种显示面板及装置
CN111487806B (zh) * 2020-04-24 2023-05-23 京东方科技集团股份有限公司 一种彩膜基板、镜面显示面板及镜面显示装置
CN111554731B (zh) * 2020-06-15 2022-06-03 京东方科技集团股份有限公司 Oled显示面板制备方法及显示面板、显示装置

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104360527A (zh) * 2014-11-03 2015-02-18 合肥鑫晟光电科技有限公司 阵列基板及其制作方法、显示装置
TWI622908B (zh) * 2016-03-18 2018-05-01 財團法人工業技術研究院 觸控顯示面板
US9978821B2 (en) 2016-03-18 2018-05-22 Industrial Technology Research Institute Display device

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CN102749752B (zh) 2015-06-17

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