WO2013143304A1

WO2013143304A1 - Manufacturing method for touch screen and touch screen

Info

Publication number: WO2013143304A1
Application number: PCT/CN2012/084907
Authority: WO
Inventors: 黄炜赟; 玄明花; 高永益
Original assignee: 京东方科技集团股份有限公司; 成都京东方光电科技有限公司
Priority date: 2012-03-28
Filing date: 2012-11-20
Publication date: 2013-10-03
Also published as: CN102722277B; CN102722277A

Abstract

Provided are a manufacturing method for a touch screen and a touch screen. The manufacturing method for a touch screen comprises: depositing a metal on a substrate, forming a metal layer pattern through a first configuration process, the metal layer pattern comprising a bridging line of a display area; using a first protective material to perform inkjet printing on the substrate formed with the metal layer pattern, to deposit the first protective material on the bridging line, and forming a first protective layer pattern; depositing a transparent conducting material on the substrate formed with the first protective layer pattern, and forming a transparent conducting layer pattern through a second configuration process; and depositing an insulating material on the substrate formed with the transparent conducting layer pattern, and forming a second protective layer pattern through a third configuration process.

Description

Touch screen manufacturing method and touch screen

Embodiments of the present invention relate to a method of fabricating a touch screen and a touch screen. Background technique

The touch screen can be divided into two types: resistive and capacitive. Because capacitive touch screens are highly sensitive, long-lived, and support multi-touch, they are now the mainstream touch technology. Capacitive touch screens are further divided into self-touch touch screens and mutual touch screens. The following describes how to make several mutual-sensing touch screens.

1, double-layer indium tin oxide ITO (can also be another transparent conductive layer pattern) touch screen: 5 Mask (mask) mode

The lateral ITO layer and the vertical ITO were patterned twice with two depositions and two masks. The lateral ITO is separated from the vertical ITO by an insulating layer such as SiNx (silicon nitride) or OC (organic insulating layer), and finally a protective layer is required. In addition to the metal conductive layer and the Via Hole, the double ITO touch screen requires the following processes: MetaK deposition metal) ITO 1 SiNx (or OC) 1 Via Hole^ITO 2 SiNx (or OC) 2, total required 5 Masks, the process is more complicated.

2, single layer ΙΤΟ touch screen 4 Mask - Via Hole mode

The lateral ITO and the vertical ITO are deposited in the same layer, and a layer of metal (Metal) is bridged through the vias to connect the ITOs in the off direction (either horizontally or vertically). The specific step is ITO SiNx (or OC) 1 Via Hole^Metal^ SiNx (or OC) 2, for a total of 4 masks.

Another option is to interchange the Metal Mask and ITO Mask locations, Metal SiNx (or OC) 1 Via Hole^ITO^ SiNx (or OC) 2.

3, single layer ITO touch screen 4 Mask - Island Island mode

The difference between the island mode and the via mode process is that the SiNx (or OC) insulating layer of the lateral ITO and the vertical ITO crossing portion is retained while the SiNx (or OC) 1 is etched or developed, and the rest is left. The insulation of the location is removed, ITO SiNx (or OC) 1 Island^Metal^ SiNx (or OC), a total of 4 Masks. Like the via mode, this process also interchanges the Metal Mask and ITO Mask positions, ie: Metal SiNx (or OC) 1 Island^ITO^ SiNx (or OC) 2

It can be seen from the above that the manufacturing process of the existing touch screen is relatively complicated. Summary of the invention

Embodiments of the present invention provide a touch screen manufacturing method and a touch screen, which can simplify a process

An aspect of the present invention provides a method of fabricating a touch screen, including: depositing a metal on a substrate, and forming a metal layer pattern through a first patterning process, wherein the metal layer pattern includes a bridge line of the display area; a protective material is inkjet printed on the substrate on which the metal layer pattern is formed to deposit the first protective material on the bridge wire to form a first protective layer pattern; the first protective layer is formed Depositing a transparent conductive material on the patterned substrate, and forming a transparent conductive layer pattern through a second patterning process; depositing an insulating material on the substrate on which the transparent conductive layer pattern is formed, and forming a second through a third patterning process Protective layer pattern.

For the manufacturing method, for example, the first protective layer pattern is island-shaped; and the thickness of the first protective layer pattern is greater than the thickness of the metal layer pattern; the width of the first protective layer pattern is smaller than the metal a width of the layer pattern such that opposite first and second sides of the metal layer pattern are exposed; a length of the first protective layer pattern is greater than a length of the metal layer pattern such that the metal layer pattern is opposite The third side and the fourth side are covered.

For the manufacturing method, for example, the range of the transparent conductive layer pattern is larger than the range of the first protective layer pattern such that the transparent conductive layer pattern and the metal layer pattern are on a first side opposite to the metal layer pattern Electrically connected to the location on the second side.

For the manufacturing method, for example, the metal layer pattern may further include a circuit line of the pad region; the transparent conductive layer pattern includes: a transparent conductive layer pattern of the pad region and a transparent conductive layer pattern of the display region; The second protective layer pattern covers the transparent conductive layer pattern of the display region, and exposes the transparent conductive layer pattern of the pad region.

For the manufacturing method, for example, the transparent conductive layer pattern is an indium tin oxide layer.

For the manufacturing method, for example, the first protective layer pattern and the second protective layer pattern are made of a propylene-based resin and an epoxy resin, or the first protective layer pattern and the second protective layer The pattern is made of silicon nitride. For the manufacturing method, for example, the shape of the transparent conductive layer pattern is a diamond shape.

Another aspect of the present invention provides a touch screen, including: a substrate; a metal layer pattern formed by depositing a metal on the substrate and passing through a first patterning process, the metal layer pattern including a bridge line of a display area; a first protective layer pattern formed by a process of performing inkjet printing on a substrate on which the metal layer pattern is formed using a first protective material to deposit the first protective material on the bridge line; a transparent conductive layer a pattern formed by depositing a transparent conductive material on a substrate on which the first protective layer pattern is formed and subjected to a second patterning process; and a second protective layer pattern passing through the substrate on which the transparent conductive layer pattern is formed An insulating material is deposited thereon and formed through a third patterning process.

For the touch screen, for example, the first protective layer pattern is island-shaped; and the thickness of the first protective layer pattern is greater than the thickness of the metal layer pattern; the width of the first protective layer pattern is smaller than the metal layer The width of the pattern is such that the opposite first and second sides of the metal layer pattern are exposed.

For the touch screen, for example, the range of the transparent conductive layer pattern is larger than the range of the first protective layer pattern, such that the transparent conductive layer pattern and the metal layer pattern are on a first side opposite to the metal layer pattern and The second side is electrically connected.

Another aspect of the present invention provides a method of fabricating a touch screen, including: depositing a transparent conductive material on a substrate, and forming a transparent conductive layer pattern through a first patterning process, wherein the transparent conductive layer pattern includes a display area a lateral scan line and a vertical scan line; performing inkjet printing on the substrate on which the transparent conductive layer pattern is formed using a first protective material to deposit the first protective material on the lateral scan line and vertical scan Forming a first protective layer pattern on the node of the line; depositing a metal on the substrate on which the first protective layer pattern is formed, and forming a metal layer pattern through a second patterning process; forming the pattern of the metal layer An insulating material is deposited on the substrate, and a third patterning process is performed to form a second protective layer pattern.

Another aspect of the present invention provides a touch screen, including: a substrate; a transparent conductive layer pattern formed by depositing a transparent conductive material on the substrate and performing a first patterning process, the transparent conductive layer pattern a horizontal scan line and a vertical scan line including a display area; the first protective layer pattern is inkjet printed on the substrate on which the transparent conductive layer pattern is formed by using the first protective material to apply the first protection a material is deposited on the nodes of the lateral scan lines and the vertical scan lines; the metal layer pattern is formed by depositing metal on the substrate on which the first protective layer pattern is formed and undergoing a second patterning process And the second protective layer pattern is An insulating material is deposited on the substrate on which the metal layer pattern is formed, and is formed through a third patterning process.

For the touch screen, for example, the transparent conductive layer pattern includes at least one notch; the first protective layer pattern is island-shaped, and the thickness of the first protective layer pattern is greater than the thickness of the transparent conductive layer pattern; The first protective layer pattern covers the notch and the periphery of the notch, and exposes the transparent conductive layer pattern except the notch and the position around the periphery of the notch.

For the touch screen, for example, the range of the metal layer pattern is larger than the range of the first protective layer pattern such that the metal layer pattern is at a position outside the range of the first protective layer pattern and the transparent conductive layer The pattern is electrically connected.

For the touch screen, for example, the transparent conductive layer pattern further includes: a transparent conductive layer pattern of the pad region; the metal layer pattern includes: a bridge line of the display region and a circuit line of the pad region; the second protective layer The pattern covers the bridge lines of the display area and exposes the circuit lines of the pad area.

For the touch screen, for example, the transparent conductive layer pattern is an indium tin oxide layer.

For the touch screen, for example, the first protective layer pattern and the second protective layer pattern are made of a propylene-based resin and an epoxy resin, or the first protective layer pattern and the second protective layer pattern are Made of silicon nitride.

For the touch screen, for example, the shape of the transparent conductive layer pattern is a diamond shape.

In the above solution, the first protective layer pattern is deposited at the intersection of the lateral scanning line and the vertical scanning line by means of inkjet printing (Ink Inject), and the number of masks used can be reduced compared with the prior art. Therefore, the patterning processes such as exposure, development, etching, and peeling can be reduced correspondingly, thereby achieving the purpose of simplifying the process. DRAWINGS

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings of the embodiments will be briefly described below. It is obvious that the drawings in the following description relate only to some embodiments of the present invention, and are not intended to limit the present invention. .

1 is a schematic flow chart of an embodiment of a method for fabricating a touch screen according to the present invention; FIG. 2A is a plan view showing a display area of a touch screen corresponding to step 111 in the method for fabricating the touch screen shown in FIG.

2B is a cross-sectional view showing a display area of the touch screen corresponding to step 111 in the method of fabricating the touch screen shown in FIG. 1;

3A is a plan view showing a display area of the touch screen corresponding to step 112 in the method for fabricating the touch screen shown in FIG. 1;

3B is a cross-sectional view showing a display area of the touch screen corresponding to step 112 in the method of fabricating the touch screen shown in FIG. 1;

4A is a plan view showing a display area of the touch screen corresponding to step 113 in the method of fabricating the touch screen shown in FIG. 1;

4B is a cross-sectional view showing a display area of the touch screen corresponding to step 113 in the method of fabricating the touch screen shown in FIG. 1;

5A is a plan view showing a display area of the touch screen corresponding to step 114 in the method for fabricating the touch screen shown in FIG. 1;

5B is a cross-sectional view showing a display area of the touch screen corresponding to step 114 in the method of fabricating the touch screen shown in FIG. 1;

FIG. 6 is a schematic flow chart of another embodiment of a method for fabricating a touch screen according to the present invention. 7A is a plan view showing a display area of the touch screen corresponding to step 211 in the method of fabricating the touch screen shown in FIG. 6;

7B is a cross-sectional view showing a display area of the touch screen corresponding to step 211 in the method of fabricating the touch screen shown in FIG. 6;

8A is a plan view of a display area of the touch screen corresponding to step 212 in the method of fabricating the touch screen shown in FIG. 6;

8B is a cross-sectional view of a display area of the touch screen corresponding to step 212 in the method of fabricating the touch screen illustrated in FIG. 6; 9A is a plan view showing a display area of the touch screen corresponding to step 213 in the method for fabricating the touch screen shown in FIG. 6;

9B is a cross-sectional view showing a display area of the touch screen corresponding to step 213 in the method of fabricating the touch screen shown in FIG. 6;

FIG. 10A is a plan view showing a display area of the touch screen corresponding to step 214 in the method of fabricating the touch screen shown in FIG. 6; FIG.

Fig. 10B is a cross-sectional view showing a display area of the touch panel corresponding to step 214 in the method of fabricating the touch panel shown in Fig. 6. detailed description

The technical solutions of the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings of the embodiments of the present invention. It is apparent that the described embodiments are part of the embodiments of the invention, rather than all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the described embodiments of the present invention without departing from the scope of the invention are within the scope of the invention.

Unless otherwise defined, technical terms or scientific terms used herein shall be of the ordinary meaning understood by those of ordinary skill in the art to which the invention pertains. The words "first", "second" and similar terms used in the specification and claims of the present invention do not denote any order, quantity, or importance, but are merely used to distinguish different components. Similarly, the words "a" or "an" do not denote a quantity limitation, but rather mean that there is at least one. The words "including" or "comprising", etc., are intended to mean that the elements or objects preceding "including" or "comprising" are intended to encompass the elements or Component or object. Words such as "connected" or "connected" are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "Down", "Left", "Right", etc. are only used to indicate relative positional relationships, and when the absolute position of the object being described is changed, the relative positional relationship may also change accordingly.

FIG. 5A is a top view of a display area of the touch screen finally generated by the present solution, and FIG. 5B is a cross-sectional view of the touch screen finally generated by the solution. The method may only require three masks ( Mask ).

1 is a schematic flow chart of an embodiment of a method for fabricating a touch screen according to the present invention, The method includes the following steps.

Step 111, depositing a metal on the substrate 11, and through a first patterning process, forming a metal layer pattern 12, the metal layer pattern 12 including a bridge line of the display area.

The metal layer pattern may further include: a circuit line of the pad region.

An example of this step may be: depositing a layer of metal on a glass substrate and patterning through a process including exposure, etching, lift, etc. to form a bridge between the peripheral circuit lines and the display area. The patterning process comprises: coating a photoresist on the metal layer; exposing the photoresist using a photomask; developing the exposed photoresist to obtain a photoresist pattern; etching using the photoresist pattern to The exposed metal layer is removed, thereby obtaining a metal layer pattern; thereafter, the remaining photoresist is removed from the metal layer pattern. The composition process of the following steps is similar and will not be repeated here.

2A is a plan view of a display area of the touch screen corresponding to step 111; and FIG. 2B is a cross-sectional view of a display area of the touch screen corresponding to step 111.

Step 112, performing inkjet printing on the substrate on which the metal layer pattern 12 is formed using a first protective material to deposit the first protective material on the bridge line to form a first protective layer pattern 13.

An example of this step may be: forming a first overcoat layer on the node of the laterally transparent conductive layer pattern to be formed and the vertical transparent conductive layer pattern by an ink jet printing (Ink Inject) method.

3A is a plan view of a display area of the touch screen corresponding to step 112; and FIG. 3B is a cross-sectional view of a display area of the touch screen corresponding to step 112.

The first protective layer pattern 13 may be island-shaped; and the thickness of the first protective layer pattern is greater than the thickness of the metal layer pattern; the width of the first protective layer pattern is smaller than the width of the metal layer pattern, The first side and the second side of the metal layer pattern are exposed; the length of the first protective layer pattern is greater than the length of the metal layer pattern, such that the metal layer pattern is opposite to the third side and the third The four sides are covered; in the subsequent process, the covered area may be deposited with a transparent conductive material of a transparent conductive layer pattern.

Step 113, depositing a transparent conductive material on the substrate on which the first protective layer pattern is formed, and forming a transparent conductive layer pattern 14 through a second patterning process.

The transparent conductive layer pattern may be an indium tin oxide layer.

An example of this step can be: depositing a layer of ITO (indium tin oxide layer) or other transparent The conductive layer pattern is patterned to form a diamond or other shaped ITO layer pattern through a patterning process including exposure, etching, and lift-off.

4A is a plan view of a display area of the touch screen corresponding to step 113; and FIG. 4B is a cross-sectional view of a display area of the touch screen corresponding to step 113.

The transparent conductive layer pattern 14 may have a range greater than a range of the first protective layer pattern such that the transparent conductive layer pattern and the metal layer pattern are opposite to the first side and the second side of the metal layer pattern The location is electrically connected.

In the above embodiment, the metal layer pattern includes opposing first end regions and second end regions and opposite third end regions and fourth end regions, all of which are in communication. The width of the first protective layer pattern is smaller than the width of the metal layer pattern, such that the first side region and the second side region of the metal layer pattern are exposed; the length of the first protective layer pattern is greater than The length of the metal layer pattern is such that the opposite third side region and fourth side region of the metal layer pattern are covered. In the subsequent process, the covered regions of the third side region and the fourth side region may be deposited with a transparent conductive material of a transparent conductive layer pattern. The transparent conductive layer pattern may include a first region, a second region, and a third region that are isolated from each other, with a gap between the first region and the third region, and a gap between the second region and the third region. The first region and the second region of the transparent conductive layer pattern are electrically connected by the first side region and the second side region opposite to the metal layer pattern, and a partial region of the third region of the transparent conductive layer pattern may be deposited on the third side region and The four regions are covered by the first protective layer pattern so as to be able to traverse the first protective layer pattern.

Step 114, depositing an insulating material on the substrate on which the transparent conductive layer pattern is formed, and forming a second protective layer pattern 15 through the third patterning process.

The transparent conductive layer pattern includes: a transparent conductive layer pattern of the pad region and a transparent conductive layer pattern of the display region; the second protective layer pattern covers the transparent conductive layer pattern of the display region, and exposes the pad The transparent conductive layer pattern of the area (the effect of the dew is not shown in the figure).

An example of this step may be: depositing an insulating layer coated with an organic insulating layer or other material, and forming a protective layer to protect the transparent conductive layer of the display region by a patterning process including exposure, etching, lift-off, and the like. At the same time, the protective layer exposes the transparent conductive layer of the pad pad region to facilitate bonding of the IC (drive chip).

5A is a plan view of a display area of the touch screen corresponding to step 114; and FIG. 5B is a cross-sectional view of a display area of the touch screen corresponding to step 114. The first protective layer pattern and the second protective layer pattern may be an organic insulating layer or an inorganic insulating layer, and the first protective layer pattern and the second protective layer pattern may be made of a propylene-based resin and an epoxy resin. Or, the first protective layer pattern and the second protective layer pattern are made of silicon nitride. The shape of the transparent conductive layer pattern may be a diamond shape.

As shown in FIGS. 5A and 5B, the touch screen corresponding to the above method includes: a substrate 11; a metal layer pattern 12 formed by depositing metal on the substrate and undergoing a first patterning process, the metal layer pattern including a display area a bridge wiring; a first protective layer pattern 13 through a process of performing inkjet printing on a substrate on which the metal layer pattern is formed using a first protective material to deposit the first protective material on the bridge line Forming; a transparent conductive layer pattern 14 formed by depositing a transparent conductive material on a substrate on which the first protective layer pattern is formed and subjected to a second patterning process; and a second protective layer pattern 15 through which the transparent layer is formed An insulating material is deposited on the substrate of the conductive layer pattern and formed through a third patterning process.

For example, the first protective layer pattern 13 is island-shaped; and the thickness of the first protective layer pattern is greater than the thickness of the metal layer pattern; the width of the first protective layer pattern is smaller than the width of the metal layer pattern The first side and the second side of the metal layer pattern are exposed to each other.

For example, the range of the transparent conductive layer pattern 14 is larger than the range of the first protective layer pattern such that the transparent conductive layer pattern and the metal layer pattern are on the first side and the second side opposite to the metal layer pattern. The location is electrically connected.

For example, the metal layer pattern 12 further includes: a circuit line of the pad region.

For example, the transparent conductive layer pattern 14 includes: a transparent conductive layer pattern of a pad region and a transparent conductive layer pattern of the display region; the transparent conductive layer pattern may be an indium tin oxide layer; the transparent conductive layer pattern 14 The shape may be a diamond shape, including a first region, a second region, and a third region separated from each other, a gap between the first region and the third region, a gap between the second region and the third region, and a second region in the middle .

For example, the second protective layer pattern 15 covers the transparent conductive layer pattern of the display region and exposes the transparent conductive layer pattern of the pad region.

For example, the first protective layer pattern and the second protective layer pattern may be made of a propylene-based resin and an epoxy resin, or the first protective layer pattern and the second protective layer pattern may be made of nitrogen. Made of silicon.

Another method for manufacturing a touch screen is described below, and FIG. 10A is a touch screen finally generated by the solution. FIG. 10B is a cross-sectional view of the touch screen finally generated by the present scheme. Compared with the above embodiment, this embodiment replaces step 111 and step 113, and the method can only require three masks.

FIG. 6 is a schematic flow chart of another embodiment of a method for fabricating a touch screen according to the present invention, the method comprising the following steps.

Step 211, depositing a transparent conductive material on the substrate 21, and forming a transparent conductive layer pattern 24 through a first patterning process, the transparent conductive layer pattern including a horizontal scan line and a vertical scan line having a display area.

The transparent conductive layer pattern may further include: a transparent conductive layer pattern of the pad region.

An example of this step may be: depositing a pattern of ITO or other transparent conductive layer on a glass substrate and forming a diamond or other shaped ITO through a patterning process including exposure, etching, lift-off, and the like.

7A is a plan view of a display area of the touch screen corresponding to step 211; and FIG. 7A is a cross-sectional view of the display area of the touch screen corresponding to step 211.

As shown, the transparent conductive layer pattern 24 can include at least one notch.

Step 212, performing inkjet printing on the substrate on which the transparent conductive layer pattern is formed by using a first protective material to deposit the first protective material on the nodes of the horizontal scan line and the vertical scan line to form The first protective layer pattern 23.

An example of this step may be: depositing a first protective layer on the nodes of the lateral ITO and the vertical ITO by an inkjet printing (Ink Inject) method.

8A is a plan view of a display area of the touch screen corresponding to step 212; and FIG. 8B is a cross-sectional view of a display area of the touch screen corresponding to step 212.

As shown, the first protective layer pattern 23 is island-shaped, and the thickness of the first protective layer pattern is greater than the thickness of the transparent conductive layer pattern; the first protective layer pattern covers the gap and the The periphery of the notch is exposed, and the transparent conductive layer pattern is exposed except for the notch and the periphery of the notch.

Step 213, depositing a metal on the substrate on which the first protective layer pattern is formed, and forming a metal layer pattern 22 through a second patterning process.

An example of this step may be: depositing a layer of metal and patterning through the exposure, etching, and stripping to form a bridge between the peripheral circuit lines and the display area.

9A is a plan view of a display area of the touch screen corresponding to step 213; and FIG. 9B is step 213. A cross-sectional view of the display area of the corresponding touch screen.

As shown, the range of the metal layer pattern 22 is larger than the range of the first protective layer pattern such that the metal layer pattern is at a position outside the range of the first protective layer pattern and the transparent conductive layer The pattern is electrically connected.

Step 214, depositing an insulating material on the substrate on which the metal layer pattern is formed, and performing a third patterning process to form a second protective layer pattern 25.

The metal layer pattern may include: a bridge line of the display area and a circuit line of the pad area; the second protection layer pattern covers the bridge line of the display area, and the circuit line of the pad area is exposed The effect of the dew is not indicated in the middle).

An example of the step may be: depositing an insulating layer coated with an organic insulating layer or other material, and forming a protective layer to protect the transparent conductive layer of the display region by a patterning process including exposure, etching, peeling, and the like, and The metal layer of the Pad pad area is exposed to facilitate the bonding of the IC (drive chip).

10A is a plan view of a display area of the touch screen corresponding to step 214; and FIG. 10B is a cross-sectional view of a display area of the touch screen corresponding to step 214.

In the above embodiment, the transparent conductive layer pattern 24 may include a first region, a second region, and a third region separated from each other; a gap between the third region and the second region, between the third region and the first region Has a gap. The first protective layer pattern covers the periphery of the notch and the notch, and exposes a position of the transparent conductive layer pattern except for a notch and a periphery of the notch. That is, the first protective layer pattern exposes a partial position of the first region and a partial position of the third region. The metal layer pattern 22 includes opposing first end regions and second end regions and opposing third end regions and fourth end regions, all of which are in communication. The range of the metal layer pattern 22 is larger than the range of the first protective layer pattern such that the metal layer pattern is electrically connected to the transparent conductive layer pattern at a position outside the range of the first protective layer pattern. That is, the metal layer pattern covers the first region partial position and the partial portion of the third region such that the first region and the third region are electrically connected by the metal layer pattern.

For example, the transparent conductive layer pattern may be an indium tin oxide layer; the first protective layer pattern and the second protective layer pattern are made of a propylene-based resin and an epoxy resin, or the first protection The layer pattern and the second protective layer pattern are made of silicon nitride. The shape of the transparent conductive layer pattern may be a diamond shape. As shown in FIGS. 10A and 10B, the touch screen corresponding to the second embodiment includes: a substrate 21; a transparent conductive layer pattern 24 formed by depositing a transparent conductive material on the substrate and undergoing a first patterning process. The transparent conductive layer pattern includes a lateral scan line and a vertical scan line having a display area; the first protective layer pattern 23 is subjected to inkjet printing on the substrate on which the transparent conductive layer pattern is formed by using the first protective material The first protective material is deposited on the nodes of the lateral scan lines and the vertical scan lines; the metal layer pattern 22, after depositing metal on the substrate on which the first protective layer pattern is formed and after a second time Forming a patterning process; and, the second protective layer pattern 25 is formed by depositing an insulating material on the substrate on which the metal layer pattern is formed, and performing a third patterning process.

For example, the transparent conductive layer pattern 24 may include at least one notch; the first protective layer pattern 23 may be island-shaped, and the thickness of the first protective layer pattern is greater than the thickness of the transparent conductive layer pattern; The first protective layer pattern covers the notch and the periphery of the notch, and exposes the transparent conductive layer pattern except the notch and the position around the periphery of the notch.

For example, the range of 22 of the metal layer pattern may be larger than the range of the first protective layer pattern 23 such that the metal layer pattern is at a position outside the range of the first protective layer pattern and the transparent conductive layer pattern Electrical connection.

For example, the transparent conductive layer pattern 24 may further include: a transparent conductive layer pattern of the pad region; the metal layer pattern includes: a bridge line of the display region and a circuit line of the pad region; the second protective layer pattern covers The bridge of the display area and the circuit line of the pad area are exposed.

For example, the transparent conductive layer pattern 24 may be an indium tin oxide layer; the first protective layer pattern 23 and the second protective layer pattern 25 may be made of a propylene-based resin and an epoxy resin, or The first protective layer pattern and the second protective layer pattern may be made of silicon nitride.

For example, the transparent conductive layer pattern 24 has a diamond shape, and includes a first region, a second region, and a third region that are isolated from each other. There is a gap between the first region and the third region, and the second region and the third region are There is a gap between them, and the second area is in the middle.

Embodiments of the present invention deposit an insulating layer at the intersection (node) of the lateral scanning line and the vertical scanning line by means of inkjet printing, instead of the prior art mask (Mask) The method of depositing the insulating layer can reduce the number of the reticle used, so that the total number of reticle used in the preparation method is as low as three, thereby correspondingly reducing the patterning processes such as exposure, development, etching, and peeling. Reduce production costs and simplify the production process. In the embodiment of the present invention, each layer (protective layer, transparent conductive layer pattern) is not limited to the material described in the present application, and the transparent conductive layer pattern is not limited to the diamond (Diamond) mentioned in the present application.

The above is only an exemplary embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is defined by the appended claims.

Claims

Claim

A method of manufacturing a touch screen, comprising:

Depositing a metal on the substrate, and forming a metal layer pattern through a first patterning process, the metal layer pattern including a bridge line of the display area;

Performing inkjet printing on the substrate on which the metal layer pattern is formed using a first protective material to deposit the first protective material on the bridge wire to form a first protective layer pattern;

Depositing a transparent conductive material on the substrate on which the first protective layer pattern is formed, and forming a transparent conductive layer pattern through a second patterning process;

An insulating material is deposited on the substrate on which the transparent conductive layer pattern is formed, and a third patterning process is formed to form a second protective layer pattern.

2. The method of manufacturing a touch screen according to claim 1, wherein

The first protective layer pattern is island-shaped, and the thickness of the first protective layer pattern is greater than the thickness of the metal layer pattern; the width of the first protective layer pattern is smaller than the width of the metal layer pattern, so that The first side and the second side of the opposite metal layer pattern are exposed;

The range of the transparent conductive layer pattern is larger than the range of the first protective layer pattern such that the transparent conductive layer pattern and the metal layer pattern are at positions opposite to the first side and the second side of the metal layer pattern Electrical connection.

3. The method of manufacturing a touch screen according to claim 1, wherein

The metal layer pattern further includes: a circuit line of the pad region;

The transparent conductive layer pattern includes: a transparent conductive layer pattern of the pad region and a transparent conductive layer pattern of the display region;

The second protective layer pattern covers the transparent conductive layer pattern of the display region and exposes the transparent conductive layer pattern of the pad region.

4. The method of manufacturing a touch screen according to claim 1, wherein

The transparent conductive layer pattern is an indium tin oxide layer;

The first protective layer pattern and the second protective layer pattern are made of a propylene-based resin and an epoxy resin, or the first protective layer pattern and the second protective layer pattern are made of silicon nitride .

The method of manufacturing a touch panel according to claim 1, wherein the transparent conductive layer pattern has a diamond shape.

6. A touch screen comprising:

Substrate

a metal layer pattern formed by depositing a metal on the substrate and passing through a first patterning process, the metal layer pattern including a bridge line of the display area;

a first protective layer pattern formed by a process of performing inkjet printing on a substrate on which the metal layer pattern is formed using a first protective material to deposit the first protective material on the bridge line;

a transparent conductive layer pattern formed by depositing a transparent conductive material on a substrate on which the first protective layer pattern is formed and subjected to a second patterning process;

The second protective layer pattern is formed by depositing an insulating material on the substrate on which the transparent conductive layer pattern is formed and passing through a third patterning process.

7. The touch screen according to claim 6, wherein

8. A method of making a touch screen, comprising:

Depositing a transparent conductive material on the substrate, and forming a transparent conductive layer pattern through a first patterning process, the transparent conductive layer pattern including a horizontal scan line and a vertical scan line having a display area; Performing inkjet printing on the substrate of the transparent conductive layer pattern to deposit the first protective material on the nodes of the horizontal scanning line and the vertical scanning line to form a first protective layer pattern;

Depositing a metal on the substrate on which the first protective layer pattern is formed, and performing a second patterning process to form a metal layer pattern;

An insulating material is deposited on the substrate on which the metal layer pattern is formed, and a third patterning process is performed to form a second protective layer pattern.

9. The method of manufacturing a touch screen according to claim 8, wherein

The transparent conductive layer pattern includes at least one notch; The first protective layer pattern is island-shaped, and the thickness of the first protective layer pattern is greater than the thickness of the transparent conductive layer pattern; the first protective layer pattern covers the gap and the periphery of the gap, and Depicting a position of the transparent conductive layer pattern except a notch and a periphery of the notch; the range of the metal layer pattern is larger than a range of the first protective layer pattern, such that the metal layer pattern is in the first protection The position outside the range of the layer pattern is electrically connected to the transparent conductive layer pattern.

10. The method of manufacturing a touch screen according to claim 8, wherein

The transparent conductive layer pattern further includes: a transparent conductive layer pattern of the pad region;

The metal layer pattern includes: a bridge line of the display area and a circuit line of the pad area; the second protection layer pattern covers the bridge line of the display area, and exposes the circuit line of the pad area.

11. The method of manufacturing a touch screen according to claim 8, wherein

The transparent conductive layer pattern is an indium tin oxide layer;

The method of manufacturing a touch panel according to claim 8, wherein the transparent conductive layer pattern has a diamond shape.

13. A touch screen comprising:

Substrate

a transparent conductive layer pattern formed by depositing a transparent conductive material on the substrate and subjected to a first patterning process, the transparent conductive layer pattern including a horizontal scan line and a vertical scan line having a display area;

a first protective layer pattern, which is subjected to inkjet printing on a substrate on which the transparent conductive layer pattern is formed by using a first protective material to deposit the first protective material on the nodes of the horizontal scan line and the vertical scan line Formed on the top;

a metal layer pattern formed by depositing a metal on a substrate on which the first protective layer pattern is formed and subjected to a second patterning process;

The second protective layer pattern is formed by depositing an insulating material on the substrate on which the metal layer pattern is formed, and undergoing a third patterning process.

14. The touch screen according to claim 13, wherein The transparent conductive layer pattern includes at least one notch;

The first protective layer pattern is island-shaped, and the thickness of the first protective layer pattern is greater than the thickness of the transparent conductive layer pattern; the first protective layer pattern covers the gap and the periphery of the gap, and Depicting a position of the transparent conductive layer pattern except a notch and a periphery of the notch; the range of the metal layer pattern is larger than a range of the first protective layer pattern, such that the metal layer pattern is in the first protection The position outside the range of the layer pattern is electrically connected to the transparent conductive layer pattern.