WO2013140631A1 - Organic el apparatus and method for manufacturing same - Google Patents

Organic el apparatus and method for manufacturing same Download PDF

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Publication number
WO2013140631A1
WO2013140631A1 PCT/JP2012/057643 JP2012057643W WO2013140631A1 WO 2013140631 A1 WO2013140631 A1 WO 2013140631A1 JP 2012057643 W JP2012057643 W JP 2012057643W WO 2013140631 A1 WO2013140631 A1 WO 2013140631A1
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WIPO (PCT)
Prior art keywords
electrode
organic
touch
electrodes
layer
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PCT/JP2012/057643
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French (fr)
Japanese (ja)
Inventor
陽介 佐藤
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パイオニア株式会社
東北パイオニア株式会社
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Priority to PCT/JP2012/057643 priority Critical patent/WO2013140631A1/en
Publication of WO2013140631A1 publication Critical patent/WO2013140631A1/en

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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/26Light sources with substantially two-dimensional radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40OLEDs integrated with touch screens

Definitions

  • the present invention relates to an organic EL device and a manufacturing method thereof.
  • a self-luminous device (organic EL device) including an organic EL element includes, for example, a display screen of a mobile phone, a monitor screen of an in-vehicle or household electronic device, an information display screen of a personal computer or a television receiver, a lighting panel for advertisement
  • a display screen of a mobile phone a monitor screen of an in-vehicle or household electronic device
  • an information display screen of a personal computer or a television receiver a lighting panel for advertisement
  • various display devices used in various applications as various light sources used in scanners, printers, etc., as illumination devices used in general illumination and backlights of liquid crystal display devices, etc., and as an optical communication device utilizing a photoelectric conversion function It can be used for various applications and models.
  • An organic EL device having a touch sensor function is known.
  • Some touch sensors are based on various operation principles such as a capacitance method, a resistance film method, an infrared method, and an ultrasonic method.
  • a capacitance method such as a capacitance method, a resistance film method, an infrared method, and an ultrasonic method.
  • an organic EL display device having a capacitive touch sensor function a substrate, an organic EL element provided on the substrate, and a sealing film provided on the opposite side of the organic EL element
  • a touch detection electrode provided on the surface of the sealing film a plurality of touch detection wirings that are electrically connected to the outer peripheral edge of the touch detection electrode at a distance from each other, and from each touch detection wiring
  • a device including a touch position detection circuit that detects a touch position on a touch detection electrode using an electrical signal is known (for example, see Patent Document 1).
  • an organic EL display device having a capacitive touch sensor function as in the prior art is manufactured.
  • the process can be simplified, and the touch detection electrodes are directly formed on the constituent members of the organic EL display device, so that the thickness and weight of the entire device can be reduced.
  • the touch detection electrode is provided on the surface of the sealing film provided on the side opposite to the organic EL element, the film formation process for forming the touch detection electrode in the normal manufacturing process of the organic EL display device It is necessary to add. If the touch sensor function is added to the organic EL display device, it can be said that a manufacturing process is added, but the addition of the film forming process requires the addition of a substrate transport path and a film forming chamber. This will require a large-scale expansion of manufacturing equipment.
  • the tact time of the film forming process occupies most of the time of the entire manufacturing process. Therefore, according to the prior art, the touch detection electrode is formed in the tact time of the normal organic EL display device. The tact time of the film forming process is added, and the entire manufacturing time is greatly extended. This causes a problem that productivity is lowered.
  • the present invention is an example of a problem to deal with such a problem. That is, in the organic EL device, the touch sensor function can be added in a tact time equivalent to the manufacturing process in the organic EL device having no touch sensor function, and in particular, the organic EL with the touch sensor function added without adding manufacturing equipment. It is an object of the present invention to be able to obtain a device, and to obtain an organic EL device to which a touch sensor function is added without greatly affecting the thickness and weight of the entire device.
  • the present invention has at least the following features.
  • the organic EL device is characterized in that the touch electrode is patterned outside a light emitting region for each organic EL element and disposed in a sealing region sealed by the sealing member.
  • a method of manufacturing an organic EL device comprising: a wiring electrode connected to one of the lower electrode and the upper electrode; and a touch electrode for constituting a capacitive touch sensor, wherein the lower electrode
  • the touch electrode is formed at the same time as any one of the upper electrode and the wiring electrode, outside the light emitting region for each organic EL element, and in the sealing region sealed by the sealing member
  • a method for manufacturing an organic EL device comprising: a wiring electrode connected to one of the lower electrode and the upper electrode; and a touch electrode for constituting a capacitive touch sensor, wherein the lower electrode
  • the touch electrode is formed at the same time as any one of the upper electrode and the wiring electrode, outside the light emitting region for each organic EL element, and in the sealing region sealed by the sealing member
  • FIG. 1A is an overall explanatory view in plan view
  • FIG. 1B is an enlarged view of a portion A in FIG. 1A
  • FIG. 1C is a cross-sectional view along XX in FIG.
  • Fig.2 (a) shows the arrangement structure of an electrode
  • FIG.2 (b) is the simplified circuit diagram of a touch electrode. Is shown.
  • It is explanatory drawing (plan view) which showed the other form example of the electrode structure in the organic electroluminescent apparatus which concerns on embodiment of this invention.
  • FIG. 1 is an explanatory diagram showing a configuration of an organic EL device according to an embodiment of the present invention.
  • FIG. 1A is an overall explanatory view in plan view
  • FIG. 1B is an enlarged view of a portion A in FIG. 1A
  • FIG. 1C is a cross-sectional view along XX in FIG.
  • the organic EL device 1 includes a substrate 10 and an organic EL element 1U formed on the substrate 10.
  • the organic EL element 1U is formed in a sealing region 10A in the substrate 10.
  • a plurality of organic EL elements 1U are arranged in a matrix in the sealing region 10A.
  • the organic EL elements 1U are not limited to this, and one organic EL element 1U may be formed on the substrate 10. Good.
  • the organic EL element 1U is hermetically sealed between the substrate 10 and the sealing member 50 that covers the sealing region 10A and faces the substrate 10.
  • the organic EL element 1U is laminated on the substrate 10 as shown in FIG.
  • the organic EL element 1U includes at least a lower electrode 11, an organic layer 12, and an upper electrode 13.
  • the lower electrode 11 is formed on the substrate 10, the organic layer 12 is formed thereon, and the upper electrode 13 is further formed thereon.
  • Several film-forming layers may exist between them, and other layers may be laminated between the lower electrode 11, the organic layer 12, and the upper electrode 13.
  • the organic layer 12 is composed of one light emitting layer or several functional layers for emitting light (hole injection / transport layer, light emitting layer, electron injection / transport layer, etc.).
  • a plurality of lower electrodes 11 are formed in a stripe shape on the substrate 10, and a plurality of upper electrodes 13 are formed in a stripe shape in a direction intersecting the lower electrode 11.
  • the plurality of lower electrodes 11 are insulatively partitioned by an insulating film 14, and the plurality of upper electrodes 13 are insulatively partitioned by partition walls 16 formed in a stripe shape therebetween.
  • the organic EL element 1U has a light emitting region 1L for each element.
  • the light emitting region 1L is a region surrounded by the insulating film 14, in other words, a region of the opening of the insulating film 14.
  • One or a plurality of light emitting regions 1L are formed in the sealing region 10A on the substrate 10 as in the organic EL element 1U.
  • the organic EL device 1 includes a wiring electrode 15 connected to either the lower electrode 11 or the upper electrode 13 on the substrate 10.
  • the wiring electrode 15 is made of a conductive layer stacked on a substrate, and is formed by patterning one or a plurality of stacked conductive layers.
  • the wiring electrode 15 is an auxiliary wiring electrode wired along the lower electrode 11 in order to substantially lower the electric resistance of the lower electrode 11, a lead connected to the end of the lower electrode 11 or the upper electrode 13.
  • One or both of the wiring electrodes are examples of the wiring electrode 15 connected to either the lower electrode 11 or the upper electrode 13 on the substrate 10.
  • the organic EL device 1 includes, for example, a touch electrode 20 for constituting a capacitive touch sensor.
  • the touch electrode 20 is patterned outside the light emitting region 1L for each organic EL element 1U, and is disposed in the sealing region 10A sealed by the sealing member 50.
  • the touch electrode 20 is a layer or the same layer made of the same material as any one of the lower electrode 11, the upper electrode 13, and the wiring electrode 15.
  • the same layer refers to a layer formed in the same film formation process. When a certain layer and a certain layer are the same layer, both are necessarily formed of the same material. Become a layer.
  • the touch electrode 20 is patterned simultaneously with any one of the lower electrode 11, the upper electrode 13, and the wiring electrode 15. Note that two layers that are the same layer are not necessarily on the same plane. When there is a step in the underlayer, the same layer is formed on a different plane.
  • a plurality of touch electrodes 20 are arranged in parallel with the plurality of lower electrodes 11, and are formed in a region between the plurality of lower electrodes 11.
  • the touch electrode 20 is formed in a plurality of lines.
  • the touch electrode 20 is in the same layer as the lower electrode 11 or the wiring electrode 15 and is disposed on the substrate 10 in the same plane as the lower electrode 11 or the wiring electrode 15.
  • the touch electrode 20 is made of a metal material such as Al having a low electric resistance with respect to the lower electrode 11 formed of a transparent conductive film such as ITO or IZO. Can be formed.
  • the drive circuit element (COG) 30 is mounted on the substrate 10, and the wiring electrode 15 (leading wiring electrode) connected to the end portions of the lower electrode 11 and the upper electrode 13 is the driving circuit. It is connected to the element 30. Further, a circuit board (for example, a flexible circuit board) 31 is connected to the substrate 10, the touch electrode 20 is connected to the detection circuit 32 mounted on the circuit board 31, and the drive circuit element is connected to the drive circuit 33. 30 is connected.
  • the detection circuit 32 is a circuit for detecting a change in capacitance on the touch electrode 20.
  • the touch electrode 20 constituting the touch sensor is patterned outside the light emitting region 1L for each organic EL element 1U and in the sealing region 10A. According to this, the touch electrode 20 can be formed in the same process as any one of the lower electrode 11, the upper electrode 13, and the wiring electrode 15. Thereby, a touch sensor function can be added to a normal organic EL device having no touch sensor function without adding a film forming process or a pattern forming process.
  • the organic EL device 1 Since the organic EL device 1 has the above-described characteristics, the organic EL device 1 including the touch electrode 20 can be obtained without extending the cycle time of the manufacturing process. Therefore, the organic EL device without a touch sensor function can be obtained. Can be obtained. Since the touch electrode 20 itself is directly formed on the components of the organic EL element 1U such as the substrate 10, an organic EL device to which a touch sensor function is added without greatly affecting the thickness and weight of the entire device. Obtainable.
  • FIG. 2 is an explanatory view showing a configuration example of a touch electrode in the organic EL device 1 according to the embodiment of the present invention
  • FIG. 2A shows an electrode arrangement structure
  • FIG. 2B is a touch electrode.
  • the simplified circuit diagram is shown.
  • a plurality of touch electrodes 20 are arranged in parallel with the lower electrode 11, and some or all of the plurality of touch electrodes 20 are connected by a connecting electrode 21.
  • the connection electrode 21 extends in a direction intersecting with a plurality of touch electrodes 20 arranged in parallel with the lower electrode 11, and ends of the touch electrodes 20 are connected to the connection electrodes 21, respectively. .
  • the power source 22 is connected to the connecting electrode 21 at the point a
  • the touch electrode 20 (20-1) is connected to the connecting electrode 21 at the point b
  • the touch electrode 20 (20-2) is connected to the point c.
  • the touch electrodes 20 (20-3) are connected at the point d.
  • the connection points a, b, c, and d can be detected by a resistance R1 between a and b, a resistance R2 between b and c, and a resistance R3 between c and d.
  • a finger or the like touches any one of the touch electrodes 20 (20-1, 20-2, 20-3), and the touch electrode 20 (20-1, 20-2, 20-3)
  • the detected current i that flows through the connection electrode 21 varies depending on the position of the touch electrode 20 (20-1, 20-2, 20-3) where the capacitance C has changed.
  • the contact position of a finger or the like can be detected based on the difference in the detected current i.
  • the connection electrode 21 is preferably formed of a material having a higher electrical resistance than the touch electrode 20.
  • the touch electrode 20 is formed of a metal material such as Al, and the connection electrode 21 is formed of ITO or the like having an electric resistance higher than that of the metal material. In this case, such an electrical resistance relationship can be obtained by making the touch electrode 20 the same layer as the wiring electrode 15 and the connecting electrode 21 the same layer as the lower electrode 11.
  • an electrode layer (upper electrode 13) three-dimensionally overlapping on the touch electrode 20 is provided.
  • a parasitic capacitance C 0 is generated between the touch electrode 20 and the electrode layer (upper electrode 13).
  • an insulating film 14 is formed between the touch electrode 20 and the electrode layer (upper electrode 13) to reduce the parasitic capacitance C 0 between these electrodes.
  • FIG. 3 and 4 are explanatory views (plan views) showing other embodiments of the electrode structure in the organic EL device according to the embodiment of the present invention.
  • Each of the examples shown here has an electrode structure for reducing the parasitic capacitance C 0 described above.
  • the example shown in FIG. 3 includes an electrode layer (upper electrode 13) that sterically overlaps the touch electrode 20, and the electrode layer (upper electrode 13) opens a part of the portion that overlaps the touch electrode 20. 13A. According to this, since a part of the electrode layer on the touch electrode 20 is eliminated, the above-described parasitic capacitance C 0 can be reduced.
  • the touch electrode 20 is arranged in parallel with the lower electrode 11 as described above, and the lower electrode 22 is a notch that narrows the electrode width of the lower electrode 11 outside the light emitting region described above. Part 11A.
  • the touch electrode 20 has a widened portion 20A that widens the electrode width of the touch electrode 20 in the cutout portion 11A.
  • a rectangular cutout portion 11A is provided below the partition wall 16, and a rectangular widened portion 20A is provided in the cutout portion 11A. According to this, since the partition wall 16 is provided on the widened portion 20A of the touch electrode 20 and there is no electrode layer, contact detection with reduced parasitic capacitance C 0 is possible by bringing a finger or the like into contact with this part. Become.
  • FIG. 5 is an explanatory view showing another example of the electrode structure in the organic EL device according to the embodiment of the present invention.
  • the touch electrode 20 is in the same layer as the upper electrode 13.
  • the partition 16 is provided on the insulating film 14 in a direction intersecting the lower electrode 11, and the upper electrode 13 formed along the direction intersecting the lower electrode 11 by the partition 16. Is insulated.
  • a touch electrode 20 is provided on the partition wall 16.
  • the upper electrode 13 and the touch electrode 20 are formed on different planes, but both are the same layer and formed in the same film forming process.
  • the touch electrodes 20 are formed in a region between the upper electrodes 13, and are arranged in a plurality of lines along the partition wall 16 in parallel with the upper electrodes 13.
  • another touch electrode 20S is provided on the surface of the partition wall 16 facing the touch electrode 20, and the touch is detected by the physical contact between the touch electrode 20A and the touch electrode 20S.
  • a resistive film method may be adopted.
  • FIGS. 5B and 5C show a pair of partition walls in which the touch electrode 20 insulates the upper electrode 13 from each other. 16 (16A, 16B).
  • two partition walls 16A and 16B are provided on the insulating film 14 in a direction intersecting the lower electrode 11, and the upper electrode 13 formed along the direction intersecting the lower electrode 11 by the partition walls 16A and 16B is formed. Insulated compartment.
  • a touch electrode 20 of the same layer as the upper electrode 13 is formed between the partition walls 16A and 16B.
  • the upper electrode 13 and the touch electrode 20 are formed on different planes, but both are the same layer and formed in the same film forming process, and the touch electrode 20 is in parallel with the upper electrode 13. Then, they are arranged in a plurality of lines along the partition wall 16.
  • FIG. 6 is an explanatory view showing another example of the electrode structure in the organic EL device according to the embodiment of the present invention.
  • the touch electrodes 20 are arranged so as to intersect in two directions.
  • a plurality of touch electrodes 20 (20X) arranged in parallel along one direction are in the same layer as the upper electrode 13 and are formed in a region between the upper electrodes 13.
  • a plurality of touch electrodes 20 (20Y) arranged in parallel along the other direction are in the same layer as the lower electrode 11 and are formed in a region between the lower electrodes 11.
  • the touch electrode 20X can be formed on a partition wall (not shown) or between two partition walls as shown in FIG. 5, and the touch electrode 20Y can be formed on a substrate as shown in FIG. it can.
  • FIG. 7 is an explanatory view showing another example of the electrode structure in the organic EL device according to the embodiment of the present invention.
  • the organic EL elements are formed in a segment shape (FIG. 7A) or an icon shape (FIG. 7B).
  • the touch electrode 20 is formed so as to surround the organic EL element 1U formed in a segment shape.
  • the touch electrode 20 is formed in an icon shape.
  • a touch electrode 20 is formed so as to surround the organic EL element 1U.
  • the touch electrode 20 shown in FIGS. 7A and 7B is the same layer as any one of the lower electrode, the upper electrode, and the wiring electrode.
  • FIGS. 8 to 12 are explanatory diagrams showing examples of connection forms of the touch electrode and the detection circuit in the organic EL device according to the embodiment of the present invention.
  • the touch electrodes 20 in the examples shown in FIGS. 8 to 12 are the same layer as any one of the lower electrode, the upper electrode, and the wiring electrode as described above.
  • the detection circuit 32 is connected to each of the plurality of touch electrodes 20.
  • the example shown in FIG. 9 includes a plurality of touch electrodes 20, and some or all of the plurality of touch electrodes 20 are connected in parallel by connecting electrodes 21, and the touch electrodes 20 are detected via the connecting electrodes 21.
  • the circuit 32 is connected.
  • the plurality of touch electrodes 20 are divided into a plurality of areas (Ar1, Ar2, Ar3), and the connection electrodes 21 (21A, 21B, 21C) are provided separately for each area. Is connected to a detection circuit 32 (32A, 32B, 32C) provided for each area via a coupling electrode 21 (21A, 21B, 21C).
  • the plurality of touch electrodes 20 are divided into a plurality of areas (Ar1, Ar2, Ar3), and the connection electrodes 21 (21A, 21B, 21C) are provided separately for each area.
  • the detection circuit 32 is electrically connected to the detection circuit 32 via the coupling electrodes 21 (21A, 21B, 21C) in a time-sharing manner.
  • the detection circuit 32 and the connecting electrode 21 (21A, 21B, 21C) are sequentially connected by a time division switching circuit 34.
  • the touch electrode 20 formed along the lower electrode 11 or the upper electrode 13 is divided into a plurality along the lower electrode 11 or the upper electrode 13.
  • the touch electrodes 20 divided into a plurality for each line along the lower electrode 11 or the upper electrode 13 are connected by the connecting electrode 21 and connected to the detection circuit 32.
  • the touch electrodes 20 divided into a plurality for each line along the lower electrode 11 or the upper electrode 13 are individually connected to the detection circuit 32 via the connection electrodes 21. .
  • FIG. 13 to 15 are explanatory views showing an example of a method for manufacturing an organic EL device according to an embodiment of the present invention.
  • FIG. 13 shows an example of a manufacturing process when the touch electrode is the same layer as the lower electrode.
  • the substrate preparation step S1 surface treatment of the substrate 10 and formation of a base layer (a layer such as a protective film or a planarizing film) on the surface are performed.
  • a lower electrode layer deposition step S2 a lower electrode layer made of a transparent conductive film material such as ITO or IZO is deposited on the substrate 10 that has undergone the substrate preparation step S1.
  • a wiring electrode layer made of a metal material such as Al is formed in a partial region on the lower electrode layer.
  • the lower electrode 11, the wiring electrode 15, and the touch electrode 20 are simultaneously patterned by a pattern forming step such as photolithography.
  • the touch electrode 20 is formed by patterning the lower electrode layer formed on the substrate 10.
  • the insulating film 14 and the partition 16 are sequentially formed in the insulating film / partition forming step S5, the organic layer 12 is formed into a mask in the organic layer forming step S6, and is formed on the organic layer 12 in the upper electrode forming step S7.
  • An upper electrode 13 made of a metal material such as Al is formed.
  • a sealing step S8 for hermetically sealing the organic EL element 1U and a circuit mounting step S9 for connecting a drive circuit and a detection circuit to the wiring electrode 15 and the touch electrode 20 are performed.
  • FIG. 14 shows an example of the manufacturing process when the touch electrode is the same layer as the wiring electrode.
  • the lower electrode 11 is formed by a pattern formation process such as photolithography in the lower electrode formation process S2a.
  • a wiring electrode layer made of a metal material such as Al is formed on the substrate 10 on which the lower electrode 11 is formed.
  • the wiring electrode 15 and the touch electrode 20 are simultaneously patterned by a pattern forming step such as photolithography.
  • the touch electrode 20 is formed by patterning a wiring electrode layer made of a metal material such as Al formed on the substrate 10. Thereafter, as described above, the insulating film / partition wall forming step S5, the organic layer forming step S6, the upper electrode forming step S7, the sealing step S8, and the circuit mounting step S9 are performed.
  • FIG. 15 shows an example of the manufacturing process when the touch electrode is the same layer as the upper electrode.
  • the substrate preparation process S1, the lower electrode layer film forming process S2, and the wiring electrode layer partial film forming process S3 described above are performed, and then the lower electrode / wiring electrode forming process S4b is performed to form a pattern such as photolithography.
  • the lower electrode 11 and the wiring electrode 15 are formed by the process.
  • the insulating film / partition wall forming step S5 and the organic layer film forming step S6 are performed, and then the upper electrode film forming / touch electrode simultaneous forming step S7a is performed.
  • the touch electrode 20 is made of the same metal material such as Al as the upper electrode 13 and is patterned on the partition wall 16 or between the two partition walls 16A and 16B. Thereafter, as described above, the sealing step S8 and the circuit mounting step S9 are performed.
  • the touch electrode 20 can be formed without adding a film forming process or a pattern forming process, so that the tact equivalent to that of the organic EL device having no touch sensor function is achieved.
  • the organic EL device 1 having a touch sensor function can be manufactured in time.
  • the substrate 10 is light transmissive and is formed of a base material that can support the organic EL element 1U, such as glass or plastic.
  • the transparent conductive film layer forming the lower electrode 11 is a transparent metal such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), zinc oxide-based transparent conductive film, SnO 2 -based transparent conductive film, titanium dioxide-based transparent conductive film, etc. An oxide can be used.
  • an insulating film 14 is provided to ensure insulation between the electrodes.
  • the insulating film 14 is made of a material such as polyimide resin, acrylic resin, silicon oxide, or silicon nitride.
  • the insulating film 14 is formed by depositing the material of the insulating film 14 on the substrate 10 on which the lower electrode 11 is patterned, and then forming an opening for forming the light emitting region 1L for each organic EL element 1U on the lower electrode 11. Patterning is performed. Specifically, a film is formed on the substrate 10 on which the lower electrode 11 is formed to have a predetermined coating thickness by spin coating, and exposure processing and development processing are performed using an exposure mask, whereby an organic EL element is obtained.
  • a layer of insulating film 14 having an opening pattern shape of 1U is formed.
  • the insulating film 14 is formed so as to fill the space between the patterns of the lower electrode 11 and partially cover the side end portion thereof, and is formed in a lattice shape when the organic EL elements 1U are arranged in a dot matrix.
  • the barrier ribs 16 are formed in stripes in a direction intersecting the lower electrode 11 in order to form a pattern of the upper electrode 13 without using a mask or the like, or to completely electrically insulate the adjacent upper electrode 13 from each other.
  • an insulating material such as a photosensitive resin is formed on the above-described insulating film 14 so that the film thickness is larger than the total thickness of the organic layer 12 and the upper electrode 13 that form the organic EL element 1U.
  • the photosensitive resin film is irradiated with ultraviolet rays or the like through a photomask having a stripe pattern intersecting with the lower electrode 11, and the development speed resulting from the difference in the exposure amount in the thickness direction of the layer is applied.
  • the partition wall 16 having a tapered surface with a downward side is formed.
  • the organic layer 12 has a laminated structure of light emitting functional layers including a light emitting layer.
  • a hole injection layer and a hole transport are sequentially formed from the anode side.
  • a layer, a light emitting layer, an electron transport layer, an electron injection layer, and the like are selectively formed.
  • a vacuum deposition method or the like is used as a dry film formation, and coating or various printing methods are used as a wet film formation.
  • NPB N, N-di (naphtalence) -N, N-dipheneyl-benzidene
  • This hole transport layer has a function of transporting holes injected from the anode to the light emitting layer.
  • the hole transport layer may be a single layer or a stack of two or more layers.
  • the hole transport layer is not formed by a single material, but a single layer may be formed by a plurality of materials, and a guest material having a high charge donating (accepting) property may be formed on a host material having a high charge transport capability. Doping may be performed.
  • red (R), green (G), and blue (B) light-emitting layers are formed in respective film formation regions by using a resistance heating vapor deposition method using a coating mask.
  • red (R) an organic material that emits red light such as a styryl dye such as DCM1 (4- (dicyanomethylene) -2-methyl-6- (4'-dimethylaminostyryl) -4H-pyran) is used.
  • An organic material that emits green light such as aluminum quinolinol complex (Alq3), is used as green (G).
  • blue (B) an organic material emitting blue light such as a distyryl derivative or a triazole derivative is used.
  • the emission form may be a fluorescent material or a phosphorescent material.
  • the electron transport layer formed on the light emitting layer is formed by using various materials such as an aluminum quinolinol complex (Alq3) by various film forming methods such as resistance heating vapor deposition.
  • the electron transport layer has a function of transporting electrons injected from the cathode to the light emitting layer.
  • This electron transport layer may have a multilayer structure in which only one layer is stacked or two or more layers are stacked.
  • the electron transport layer may be formed of a plurality of materials instead of a single material, and a guest material having a high charge donating (accepting) property may be formed on a host material having a high charge transport capability. It may be formed by doping.
  • a material (metal, metal oxide, metal fluoride, alloy, etc.) having a work function smaller than that of the anode (for example, 4 eV or less) is used.
  • metal films such as aluminum (Al), indium (In), magnesium (Mg), amorphous semiconductors such as doped polyaniline and doped polyphenylene vinylene, Cr 2 O 3 , NiO , Oxides such as Mn 2 O 5 can be used.
  • a single layer structure made of a metal material, a laminated structure such as LiO 2 / Al, or the like can be adopted.
  • a single layer or a multilayer of metal, silicon oxide, nitride, or oxynitride formed by an atomic layer growth method can be used.
  • an aluminum oxide film for example, Al 2 O
  • an alkyl metal such as TMA (trimethylaluminum), TEA (triethylaluminum), DMAH (dimethylaluminum hydride) and water, oxygen, or alcohols.
  • a silicon oxide film for example, SiO 2 film obtained by a reaction between a vaporized gas of a silicon-based material and a vaporized gas of water can be used.

Abstract

An organic EL apparatus (1) is provided with: a substrate (10); organic EL elements, each of which is provided with at least a lower electrode (11), an organic layer (12), and an upper electrode (13), which are laminated on the substrate (10); a sealing member (50), which seals the organic EL elements (1U) between the substrate (10) and the sealing member; and touch electrodes (20). The touch electrodes (20) are patterned outside of light emitting regions of respective organic EL elements (1U), and are disposed in the sealing regions sealed by means of the sealing member (50).

Description

有機EL装置及びその製造方法Organic EL device and manufacturing method thereof
 本発明は、有機EL装置及びその製造方法に関するものである。 The present invention relates to an organic EL device and a manufacturing method thereof.
 有機EL素子を備えた自発光装置(有機EL装置)は、例えば携帯電話の表示画面,車載用或いは家庭用電子機器のモニタ画面,パーソナルコンピュータやテレビジョン受像装置の情報表示画面,宣伝用点灯パネルなどに用いられる各種表示装置として、スキャナやプリンタなどに用いられる各種光源として、一般照明や液晶表示装置のバックライトなどに用いられる照明装置として、また、光電変換機能を利用した光通信用デバイスとして、各種用途及び機種に利用可能なものである。 A self-luminous device (organic EL device) including an organic EL element includes, for example, a display screen of a mobile phone, a monitor screen of an in-vehicle or household electronic device, an information display screen of a personal computer or a television receiver, a lighting panel for advertisement As various display devices used in various applications, as various light sources used in scanners, printers, etc., as illumination devices used in general illumination and backlights of liquid crystal display devices, etc., and as an optical communication device utilizing a photoelectric conversion function It can be used for various applications and models.
 有機EL装置には、タッチセンサ機能を備えたものが知られている。タッチセンサは、静電容量方式、抵抗膜方式、赤外線方式、超音波方式など、各種の動作原理に基づくものがある。これらのなかで、静電容量方式のタッチセンサ機能を備えた有機EL表示装置として、基板と、基板上に設けられた有機EL素子と、有機EL素子の反基板側に設けられた封止膜とを備え、封止膜の表面に設けられたタッチ検出電極と、タッチ検出電極の外周縁部に互いに離間して電気的に接続された複数本のタッチ検出配線と、各タッチ検出配線からの電気信号によりタッチ検出電極におけるタッチ位置を検出するタッチ位置検出回路を備えたものが知られている(例えば、特許文献1参照)。 An organic EL device having a touch sensor function is known. Some touch sensors are based on various operation principles such as a capacitance method, a resistance film method, an infrared method, and an ultrasonic method. Among these, as an organic EL display device having a capacitive touch sensor function, a substrate, an organic EL element provided on the substrate, and a sealing film provided on the opposite side of the organic EL element A touch detection electrode provided on the surface of the sealing film, a plurality of touch detection wirings that are electrically connected to the outer peripheral edge of the touch detection electrode at a distance from each other, and from each touch detection wiring A device including a touch position detection circuit that detects a touch position on a touch detection electrode using an electrical signal is known (for example, see Patent Document 1).
特開2011-23558号公報JP 2011-23558 A
 従来技術のような静電容量方式のタッチセンサ機能を備えた有機EL表示装置は、抵抗膜方式などのタッチパネルを別個に形成して、これを表示基板上に搭載させる場合と比較して、製造工程を簡略化でき、有機EL表示装置の構成部材上に直接タッチ検出電極を形成するので、装置全体の厚さや重量を低減することができるとされている。 Compared to the case where a touch panel such as a resistive film type is separately formed and mounted on a display substrate, an organic EL display device having a capacitive touch sensor function as in the prior art is manufactured. The process can be simplified, and the touch detection electrodes are directly formed on the constituent members of the organic EL display device, so that the thickness and weight of the entire device can be reduced.
 しかしながら、従来技術によると、有機EL素子の反基板側に設けられる封止膜の表面にタッチ検出電極を設けることから、有機EL表示装置の通常の製造工程にタッチ検出電極を形成する成膜工程などを追加することが必要になる。有機EL表示装置にタッチセンサ機能を付加することからすると、製造工程が追加されるのは当然とも言えるが、成膜工程の追加は基板の搬送経路や成膜室を追加することが必要になり、製造設備の大規模な増設を要することになる。 However, according to the conventional technique, since the touch detection electrode is provided on the surface of the sealing film provided on the side opposite to the organic EL element, the film formation process for forming the touch detection electrode in the normal manufacturing process of the organic EL display device It is necessary to add. If the touch sensor function is added to the organic EL display device, it can be said that a manufacturing process is added, but the addition of the film forming process requires the addition of a substrate transport path and a film forming chamber. This will require a large-scale expansion of manufacturing equipment.
 また、有機EL装置の製造工程では成膜工程のタクト時間が製造工程全体の時間の大半を占めるので、従来技術によると、通常の有機EL表示装置のタクト時間にタッチ検出電極を形成するための成膜工程のタクト時間が追加されて、全体の製造時間が大きく延長されることになり、これによって生産性が低下する問題が生じる。 Further, in the manufacturing process of the organic EL device, the tact time of the film forming process occupies most of the time of the entire manufacturing process. Therefore, according to the prior art, the touch detection electrode is formed in the tact time of the normal organic EL display device. The tact time of the film forming process is added, and the entire manufacturing time is greatly extended. This causes a problem that productivity is lowered.
 本発明は、このような問題に対処することを課題の一例とするものである。すなわち、有機EL装置において、タッチセンサ機能の無い有機EL装置における製造工程と同等のタクト時間でタッチセンサ機能を付加することができること、特に製造設備を増設すること無くタッチセンサ機能を付加した有機EL装置を得ることができること、装置全体の厚さや重量に大きな影響を与えること無くタッチセンサ機能を付加した有機EL装置を得ることができること、などが本発明の目的である。 The present invention is an example of a problem to deal with such a problem. That is, in the organic EL device, the touch sensor function can be added in a tact time equivalent to the manufacturing process in the organic EL device having no touch sensor function, and in particular, the organic EL with the touch sensor function added without adding manufacturing equipment. It is an object of the present invention to be able to obtain a device, and to obtain an organic EL device to which a touch sensor function is added without greatly affecting the thickness and weight of the entire device.
 このような目的を達成するために、本発明は、以下の特徴を少なくとも具備するものである。 In order to achieve such an object, the present invention has at least the following features.
 基板と、前記基板上に積層された、下部電極と有機層と上部電極を少なくとも備える有機EL素子と、前記有機EL素子を、前記基板との間に封止する封止部材と、タッチ電極とを備え、前記タッチ電極は、前記有機EL素子毎の発光領域の外にパターニングされ、前記封止部材によって封止された封止領域内に配置されていることを特徴とする有機EL装置。 A substrate, an organic EL element having at least a lower electrode, an organic layer, and an upper electrode stacked on the substrate; a sealing member that seals the organic EL element between the substrate; and a touch electrode; The organic EL device is characterized in that the touch electrode is patterned outside a light emitting region for each organic EL element and disposed in a sealing region sealed by the sealing member.
 基板と、前記基板上に積層され、下部電極と有機層と上部電極を少なくとも備える有機EL素子と、前記有機EL素子を前記基板との間に封止する封止部材と、前記基板上に形成され、前記下部電極と前記上部電極のいずれかに接続する配線電極と、静電容量方式のタッチセンサを構成するためのタッチ電極とを備えた有機EL装置の製造方法であって、前記下部電極と前記上部電極と前記配線電極のうちのいずれか電極と同時に、前記有機EL素子毎の発光領域の外側で、かつ、前記封止部材によって封止される封止領域内に前記タッチ電極を形成することを特徴とする有機EL装置の製造方法。 A substrate, an organic EL element that is laminated on the substrate and includes at least a lower electrode, an organic layer, and an upper electrode, a sealing member that seals the organic EL element between the substrate, and a substrate formed on the substrate A method of manufacturing an organic EL device, comprising: a wiring electrode connected to one of the lower electrode and the upper electrode; and a touch electrode for constituting a capacitive touch sensor, wherein the lower electrode The touch electrode is formed at the same time as any one of the upper electrode and the wiring electrode, outside the light emitting region for each organic EL element, and in the sealing region sealed by the sealing member A method for manufacturing an organic EL device.
本発明の一実施形態に係る有機EL装置の構成を示した説明図である。図1(a)が平面視した全体説明図、図1(b)が図1(a)におけるA部拡大図、図1(c)が図1(b)におけるX-X断面図である。It is explanatory drawing which showed the structure of the organic electroluminescent apparatus which concerns on one Embodiment of this invention. FIG. 1A is an overall explanatory view in plan view, FIG. 1B is an enlarged view of a portion A in FIG. 1A, and FIG. 1C is a cross-sectional view along XX in FIG. 本発明の実施形態に係る有機EL装置1におけるタッチ電極の構成例を示した説明図であり、図2(a)が電極の配置構造を示し、図2(b)がタッチ電極の簡易回路図を示している。It is explanatory drawing which showed the structural example of the touch electrode in the organic electroluminescent apparatus 1 which concerns on embodiment of this invention, Fig.2 (a) shows the arrangement structure of an electrode, FIG.2 (b) is the simplified circuit diagram of a touch electrode. Is shown. 本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図(平面図)である。It is explanatory drawing (plan view) which showed the other form example of the electrode structure in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図(平面図)である。It is explanatory drawing (plan view) which showed the other form example of the electrode structure in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図である。It is explanatory drawing which showed the other example of the electrode structure in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図である。It is explanatory drawing which showed the other example of the electrode structure in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図である。It is explanatory drawing which showed the other example of the electrode structure in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置におけるタッチ電極と検出回路の接続形態例を示した説明図である。It is explanatory drawing which showed the example of a connection form of the touch electrode and detection circuit in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置におけるタッチ電極と検出回路の接続形態例を示した説明図である。It is explanatory drawing which showed the example of a connection form of the touch electrode and detection circuit in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置におけるタッチ電極と検出回路の接続形態例を示した説明図である。It is explanatory drawing which showed the example of a connection form of the touch electrode and detection circuit in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置におけるタッチ電極と検出回路の接続形態例を示した説明図である。It is explanatory drawing which showed the example of a connection form of the touch electrode and detection circuit in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置におけるタッチ電極と検出回路の接続形態例を示した説明図である。It is explanatory drawing which showed the example of a connection form of the touch electrode and detection circuit in the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置の製造方法の一例を示した説明図である。It is explanatory drawing which showed an example of the manufacturing method of the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置の製造方法の一例を示した説明図である。It is explanatory drawing which showed an example of the manufacturing method of the organic electroluminescent apparatus which concerns on embodiment of this invention. 本発明の実施形態に係る有機EL装置の製造方法の一例を示した説明図である。It is explanatory drawing which showed an example of the manufacturing method of the organic electroluminescent apparatus which concerns on embodiment of this invention.
 以下、図面を参照しながら本発明の実施形態を説明する。本発明の実施形態は図示の内容を含むがこれのみに限定されるものではない。図1は本発明の一実施形態に係る有機EL装置の構成を示した説明図である。図1(a)が平面視した全体説明図、図1(b)が図1(a)におけるA部拡大図、図1(c)が図1(b)におけるX-X断面図である。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. The embodiment of the present invention includes the contents shown in the drawings, but is not limited thereto. FIG. 1 is an explanatory diagram showing a configuration of an organic EL device according to an embodiment of the present invention. FIG. 1A is an overall explanatory view in plan view, FIG. 1B is an enlarged view of a portion A in FIG. 1A, and FIG. 1C is a cross-sectional view along XX in FIG.
 有機EL装置1は、基板10と、基板10に形成された有機EL素子1Uとを備えている。有機EL素子1Uは、基板10内の封止領域10A内に形成されている。図示の例では、有機EL素子1Uは封止領域10A内に複数マトリクス状に配備されているが、これに限らず、基板10に一つの有機EL素子1Uが形成されているものであってもよい。有機EL素子1Uは、封止領域10Aを覆って基板10と対面する封止部材50と基板10との間で気密に封止されている。 The organic EL device 1 includes a substrate 10 and an organic EL element 1U formed on the substrate 10. The organic EL element 1U is formed in a sealing region 10A in the substrate 10. In the illustrated example, a plurality of organic EL elements 1U are arranged in a matrix in the sealing region 10A. However, the organic EL elements 1U are not limited to this, and one organic EL element 1U may be formed on the substrate 10. Good. The organic EL element 1U is hermetically sealed between the substrate 10 and the sealing member 50 that covers the sealing region 10A and faces the substrate 10.
 有機EL素子1Uは、図1(c)に示すように、基板10上に積層されている。この有機EL素子1Uは、下部電極11と有機層12と上部電極13を少なくとも備えている。図示の例では、基板10上に下部電極11が成膜され、その上に有機層12が成膜され、さらにその上に上部電極13が成膜されているが、基板10と下部電極11の間にはいくつかの成膜層が存在していてもよく、下部電極11、有機層12、上部電極13の間に他の層が積層されていてもよい。有機層12は、一つの発光層によって構成されるか、発光するためのいくつかの機能層(正孔注入・輸送層,発光層,電子注入・輸送層など)によって構成される。 The organic EL element 1U is laminated on the substrate 10 as shown in FIG. The organic EL element 1U includes at least a lower electrode 11, an organic layer 12, and an upper electrode 13. In the illustrated example, the lower electrode 11 is formed on the substrate 10, the organic layer 12 is formed thereon, and the upper electrode 13 is further formed thereon. Several film-forming layers may exist between them, and other layers may be laminated between the lower electrode 11, the organic layer 12, and the upper electrode 13. The organic layer 12 is composed of one light emitting layer or several functional layers for emitting light (hole injection / transport layer, light emitting layer, electron injection / transport layer, etc.).
 図示の例では、下部電極11は、基板10上にストライプ状に複数本形成されており、上部電極13は、下部電極11と交差する方向にストライプ状に複数本形成されている。複数の下部電極11は絶縁膜14によって絶縁区画されており、複数の上部電極13は、その間にストライプ状に形成された隔壁16によって絶縁区画されている。 In the illustrated example, a plurality of lower electrodes 11 are formed in a stripe shape on the substrate 10, and a plurality of upper electrodes 13 are formed in a stripe shape in a direction intersecting the lower electrode 11. The plurality of lower electrodes 11 are insulatively partitioned by an insulating film 14, and the plurality of upper electrodes 13 are insulatively partitioned by partition walls 16 formed in a stripe shape therebetween.
 有機EL素子1Uは、1つの素子毎に発光領域1Lを有している。この発光領域1Lは、図示の例では、絶縁膜14によって囲まれた領域であり、言い換えれば絶縁膜14の開口部の領域である。発光領域1Lは、有機EL素子1Uと同様に、基板10上の封止領域10A内に一つ又は複数個形成されている。 The organic EL element 1U has a light emitting region 1L for each element. In the illustrated example, the light emitting region 1L is a region surrounded by the insulating film 14, in other words, a region of the opening of the insulating film 14. One or a plurality of light emitting regions 1L are formed in the sealing region 10A on the substrate 10 as in the organic EL element 1U.
 有機EL装置1は、基板10上に下部電極11と上部電極13のいずれかに接続する配線電極15を備えている。配線電極15は、基板上に積層された導電層からなり、一つ又は複数積層された導電層をパターニングして形成したものである。ここでいう配線電極15は、下部電極11の電気抵抗を実質的に低くするために下部電極11に沿って配線される補助配線電極、下部電極11又は上部電極13の端部に接続される引き出し配線電極の一方又は両方である。 The organic EL device 1 includes a wiring electrode 15 connected to either the lower electrode 11 or the upper electrode 13 on the substrate 10. The wiring electrode 15 is made of a conductive layer stacked on a substrate, and is formed by patterning one or a plurality of stacked conductive layers. In this case, the wiring electrode 15 is an auxiliary wiring electrode wired along the lower electrode 11 in order to substantially lower the electric resistance of the lower electrode 11, a lead connected to the end of the lower electrode 11 or the upper electrode 13. One or both of the wiring electrodes.
 また有機EL装置1は、例えば、静電容量方式のタッチセンサを構成するためのタッチ電極20を備えている。タッチ電極20は、有機EL素子1U毎の発光領域1Lの外にパターニングされ、封止部材50によって封止される封止領域10A内に配置されている。そして、このタッチ電極20は、下部電極11と上部電極13と配線電極15のうちのいずれかの層と同一材料からなる層又は同一層である。ここでいう同一層とは、同一の成膜工程で形成される層であることを指しており、ある層とある層が同一層である場合には必然的に両者は同一材料で形成された層になる。このタッチ電極20は、下部電極11,上部電極13,配線電極15のうちのいずれかの層と同時にパターン形成されるものである。なお、同一層である2つの層は必ずしも同一平面上の層になるとは限らない。下地層に段差がある場合は、同一層であっても異なる平面上に形成されることになる。 Further, the organic EL device 1 includes, for example, a touch electrode 20 for constituting a capacitive touch sensor. The touch electrode 20 is patterned outside the light emitting region 1L for each organic EL element 1U, and is disposed in the sealing region 10A sealed by the sealing member 50. The touch electrode 20 is a layer or the same layer made of the same material as any one of the lower electrode 11, the upper electrode 13, and the wiring electrode 15. Here, the same layer refers to a layer formed in the same film formation process. When a certain layer and a certain layer are the same layer, both are necessarily formed of the same material. Become a layer. The touch electrode 20 is patterned simultaneously with any one of the lower electrode 11, the upper electrode 13, and the wiring electrode 15. Note that two layers that are the same layer are not necessarily on the same plane. When there is a step in the underlayer, the same layer is formed on a different plane.
 図1に示した例では、タッチ電極20は、複数の下部電極11と並列して複数配置されており、複数の下部電極11の間の領域に形成されている。また、タッチ電極20は、複数列のライン状に形成されている。 In the example shown in FIG. 1, a plurality of touch electrodes 20 are arranged in parallel with the plurality of lower electrodes 11, and are formed in a region between the plurality of lower electrodes 11. The touch electrode 20 is formed in a plurality of lines.
 図1に示した例では、タッチ電極20は、下部電極11又は配線電極15と同一層であり、下部電極11又は配線電極15と同一平面の基板10上に配置されている。タッチ電極20が配線電極15と同一層である場合には、タッチ電極20は、ITOやIZOなどの透明導電膜で形成される下部電極11に対して、電気抵抗が低いAlなどの金属材料で形成することができる。 In the example shown in FIG. 1, the touch electrode 20 is in the same layer as the lower electrode 11 or the wiring electrode 15 and is disposed on the substrate 10 in the same plane as the lower electrode 11 or the wiring electrode 15. When the touch electrode 20 is the same layer as the wiring electrode 15, the touch electrode 20 is made of a metal material such as Al having a low electric resistance with respect to the lower electrode 11 formed of a transparent conductive film such as ITO or IZO. Can be formed.
 図1に示した例は、基板10上に駆動回路素子(COG)30が実装されており、下部電極11や上部電極13の端部に接続された配線電極15(引き出し配線電極)が駆動回路素子30に接続されている。また、基板10には回路基板(例えば、フレキシブル回路基板)31が接続されており、この回路基板31に実装された検出回路32にタッチ電極20が接続されており、駆動回路33に駆動回路素子30が接続されている。この検出回路32は、タッチ電極20上の静電容量変化を検出するための回路である。 In the example shown in FIG. 1, the drive circuit element (COG) 30 is mounted on the substrate 10, and the wiring electrode 15 (leading wiring electrode) connected to the end portions of the lower electrode 11 and the upper electrode 13 is the driving circuit. It is connected to the element 30. Further, a circuit board (for example, a flexible circuit board) 31 is connected to the substrate 10, the touch electrode 20 is connected to the detection circuit 32 mounted on the circuit board 31, and the drive circuit element is connected to the drive circuit 33. 30 is connected. The detection circuit 32 is a circuit for detecting a change in capacitance on the touch electrode 20.
 このような有機EL装置1は、タッチセンサを構成するタッチ電極20が、有機EL素子1U毎の発光領域1Lの外であって封止領域10A内にパターニングされている。これによると、タッチ電極20を下部電極11と上部電極13と配線電極15のうちのいずれかの層と同工程で形成することができる。これによって、タッチセンサ機能を有さない通常の有機EL装置に対して、成膜工程やパターン形成工程を追加すること無く、タッチセンサ機能を付加することができる。 In such an organic EL device 1, the touch electrode 20 constituting the touch sensor is patterned outside the light emitting region 1L for each organic EL element 1U and in the sealing region 10A. According to this, the touch electrode 20 can be formed in the same process as any one of the lower electrode 11, the upper electrode 13, and the wiring electrode 15. Thereby, a touch sensor function can be added to a normal organic EL device having no touch sensor function without adding a film forming process or a pattern forming process.
 有機EL装置1は、前述した特徴を有することで、製造工程のタクト時間を延長させること無く、タッチ電極20を備えた有機EL装置1を得ることができるので、タッチセンサ機能の無い有機EL装置と同等の生産性を得ることとができる。また、タッチ電極20自体は、基板10などの有機EL素子1Uの構成要素上に直接形成されるので、装置全体の厚さや重量に大きな影響を与えること無くタッチセンサ機能を付加した有機EL装置を得ることができる。 Since the organic EL device 1 has the above-described characteristics, the organic EL device 1 including the touch electrode 20 can be obtained without extending the cycle time of the manufacturing process. Therefore, the organic EL device without a touch sensor function can be obtained. Can be obtained. Since the touch electrode 20 itself is directly formed on the components of the organic EL element 1U such as the substrate 10, an organic EL device to which a touch sensor function is added without greatly affecting the thickness and weight of the entire device. Obtainable.
 図2は、本発明の実施形態に係る有機EL装置1におけるタッチ電極の構成例を示した説明図であり、図2(a)が電極の配置構造を示し、図2(b)がタッチ電極の簡易回路図を示している。 FIG. 2 is an explanatory view showing a configuration example of a touch electrode in the organic EL device 1 according to the embodiment of the present invention, FIG. 2A shows an electrode arrangement structure, and FIG. 2B is a touch electrode. The simplified circuit diagram is shown.
 図示の例では、タッチ電極20は、下部電極11と並列して複数配置されており、複数のタッチ電極20の一部又は全部が連結電極21によって連結されている。この例では、連結電極21は、下部電極11と並列して複数配置されたタッチ電極20と交差する方向に延在しており、タッチ電極20の端部がそれぞれ連結電極21に連結している。 In the illustrated example, a plurality of touch electrodes 20 are arranged in parallel with the lower electrode 11, and some or all of the plurality of touch electrodes 20 are connected by a connecting electrode 21. In this example, the connection electrode 21 extends in a direction intersecting with a plurality of touch electrodes 20 arranged in parallel with the lower electrode 11, and ends of the touch electrodes 20 are connected to the connection electrodes 21, respectively. .
 図2(b)によって、タッチ電極20によるタッチセンサの動作原理を説明する。この例では、電源22が点aで連結電極21に接続され、連結電極21には点bでタッチ電極20(20-1)が接続されて、点cでタッチ電極20(20-2)が接続されて、点dでタッチ電極20(20-3)が接続されている。接続点a,b,c,dは、a~b間の抵抗R1、b~c間の抵抗R2、c~d間の抵抗R3によって検出することができる。この回路において、タッチ電極20(20-1,20-2,20-3)のいずれかに指などが接触して、タッチ電極20(20-1,20-2,20-3)の静電容量Cが変化すると、連結電極21を流れる検出電流iは、静電容量Cが変化したタッチ電極20(20-1,20-2,20-3)の位置によって異なる値になる。この検出電流iの違いに基づいて指などの接触位置を検出することができる。 2 (b), the operation principle of the touch sensor using the touch electrode 20 will be described. In this example, the power source 22 is connected to the connecting electrode 21 at the point a, the touch electrode 20 (20-1) is connected to the connecting electrode 21 at the point b, and the touch electrode 20 (20-2) is connected to the point c. The touch electrodes 20 (20-3) are connected at the point d. The connection points a, b, c, and d can be detected by a resistance R1 between a and b, a resistance R2 between b and c, and a resistance R3 between c and d. In this circuit, a finger or the like touches any one of the touch electrodes 20 (20-1, 20-2, 20-3), and the touch electrode 20 (20-1, 20-2, 20-3) When the capacitance C changes, the detected current i that flows through the connection electrode 21 varies depending on the position of the touch electrode 20 (20-1, 20-2, 20-3) where the capacitance C has changed. The contact position of a finger or the like can be detected based on the difference in the detected current i.
 この際、抵抗R1,R2,R3を大きくすることで検出電流iの違いを大きくすることができる。したがって、連結電極21は、タッチ電極20よりも電気抵抗が高い材料で形成することが好ましい。一例としては、タッチ電極20をAlなどの金属材料で形成し、連結電極21を金属材料より電気抵抗が高いITOなどで形成する。この場合は、タッチ電極20を配線電極15と同一層にし、連結電極21を下部電極11と同一層にすることで、このような電気抵抗の関係を得ることができる。 At this time, the difference in the detection current i can be increased by increasing the resistances R1, R2, and R3. Therefore, the connection electrode 21 is preferably formed of a material having a higher electrical resistance than the touch electrode 20. As an example, the touch electrode 20 is formed of a metal material such as Al, and the connection electrode 21 is formed of ITO or the like having an electric resistance higher than that of the metal material. In this case, such an electrical resistance relationship can be obtained by making the touch electrode 20 the same layer as the wiring electrode 15 and the connecting electrode 21 the same layer as the lower electrode 11.
 図1に示した例では、タッチ電極20上に立体的に重なる電極層(上部電極13)を備えている。この際、タッチ電極20と電極層(上部電極13)との間には寄生容量C0が生じる。この寄生容量C0の値が大きくなると、タッチ電極20に指などが接触した際の静電容量変化が検出され難くなる。これを解消してタッチ電極20の感度を上げるには寄生容量C0の値を小さくすることが必要になる。図1に示した例では、タッチ電極20と電極層(上部電極13)との間に、これら電極間の寄生容量C0を低減させる絶縁膜14が形成されている。絶縁膜14の膜厚を大きくすることで、寄生容量C0の値を低減させることができる。 In the example shown in FIG. 1, an electrode layer (upper electrode 13) three-dimensionally overlapping on the touch electrode 20 is provided. At this time, a parasitic capacitance C 0 is generated between the touch electrode 20 and the electrode layer (upper electrode 13). When the value of the parasitic capacitance C 0 increases, it becomes difficult to detect a change in capacitance when a finger or the like touches the touch electrode 20. To increase the sensitivity of the touch electrode 20 to eliminate this it is necessary to reduce the value of the parasitic capacitance C 0. In the example shown in FIG. 1, an insulating film 14 is formed between the touch electrode 20 and the electrode layer (upper electrode 13) to reduce the parasitic capacitance C 0 between these electrodes. By increasing the thickness of the insulating film 14, it is possible to reduce the value of the parasitic capacitance C 0.
 図3及び図4は、本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図(平面図)である。ここに示した例は、いずれも前述した寄生容量C0を低減させるための電極構造を備えている。 3 and 4 are explanatory views (plan views) showing other embodiments of the electrode structure in the organic EL device according to the embodiment of the present invention. Each of the examples shown here has an electrode structure for reducing the parasitic capacitance C 0 described above.
 図3に示した例は、タッチ電極20上に立体的に重なる電極層(上部電極13)を備えており、この電極層(上部電極13)が、タッチ電極20と重なる部分の一部を開口した開口部13Aを有している。これによると、タッチ電極20上の電極層が一部排除されるので、前述した寄生容量C0を低減させることができる。 The example shown in FIG. 3 includes an electrode layer (upper electrode 13) that sterically overlaps the touch electrode 20, and the electrode layer (upper electrode 13) opens a part of the portion that overlaps the touch electrode 20. 13A. According to this, since a part of the electrode layer on the touch electrode 20 is eliminated, the above-described parasitic capacitance C 0 can be reduced.
 図4に示した例は、タッチ電極20は前述したように下部電極11と並列して配置されており、下部電極22は、前述した発光領域の外で下部電極11の電極幅を狭める切り欠き部11Aを有している。そして、タッチ電極20は、切り欠き部11A内でタッチ電極20の電極幅を拡幅させる拡幅部20Aを有している。図示の例では、隔壁16の下に矩形状の切り欠き部11Aが設けられ、その切り欠き部11A内に矩形状の拡幅部20Aが設けられている。これによると、タッチ電極20の拡幅部20Aの上は隔壁16が設けられて電極層が無いので、この部位に指などを接触させることで、寄生容量C0を低減させた接触検知が可能になる。 In the example shown in FIG. 4, the touch electrode 20 is arranged in parallel with the lower electrode 11 as described above, and the lower electrode 22 is a notch that narrows the electrode width of the lower electrode 11 outside the light emitting region described above. Part 11A. The touch electrode 20 has a widened portion 20A that widens the electrode width of the touch electrode 20 in the cutout portion 11A. In the illustrated example, a rectangular cutout portion 11A is provided below the partition wall 16, and a rectangular widened portion 20A is provided in the cutout portion 11A. According to this, since the partition wall 16 is provided on the widened portion 20A of the touch electrode 20 and there is no electrode layer, contact detection with reduced parasitic capacitance C 0 is possible by bringing a finger or the like into contact with this part. Become.
 図5は、本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図である。この例は、タッチ電極20が上部電極13と同一層になっている。図5(a)に示した例は、絶縁膜14上に隔壁16が下部電極11と交差する方向に設けられ、この隔壁16によって下部電極11と交差する方向に沿って形成される上部電極13が絶縁区画されている。そして、この隔壁16上にタッチ電極20が配備されている。図示の例では、上部電極13とタッチ電極20は異なる平面上に形成されているが、両者は同一層であって同じ成膜工程で形成されている。この例では、タッチ電極20は、上部電極13の間の領域に形成されており、上部電極13と並列して隔壁16に沿って複数列のライン状に配置されている。図5(a)に示す例は、隔壁16上のタッチ電極20に対向する面にもう一つのタッチ電極20Sを備え、タッチ電極20Aとタッチ電極20Sが物理的に接触することでタッチを検出する抵抗膜方式を採用しても良い。 FIG. 5 is an explanatory view showing another example of the electrode structure in the organic EL device according to the embodiment of the present invention. In this example, the touch electrode 20 is in the same layer as the upper electrode 13. In the example shown in FIG. 5A, the partition 16 is provided on the insulating film 14 in a direction intersecting the lower electrode 11, and the upper electrode 13 formed along the direction intersecting the lower electrode 11 by the partition 16. Is insulated. A touch electrode 20 is provided on the partition wall 16. In the illustrated example, the upper electrode 13 and the touch electrode 20 are formed on different planes, but both are the same layer and formed in the same film forming process. In this example, the touch electrodes 20 are formed in a region between the upper electrodes 13, and are arranged in a plurality of lines along the partition wall 16 in parallel with the upper electrodes 13. In the example shown in FIG. 5A, another touch electrode 20S is provided on the surface of the partition wall 16 facing the touch electrode 20, and the touch is detected by the physical contact between the touch electrode 20A and the touch electrode 20S. A resistive film method may be adopted.
 図5(b),(c)に示した例(図5(b)が断面図であり、図5(c)が平面図)は、タッチ電極20が上部電極13を絶縁区画する一対の隔壁16(16A,16B)の間に形成されている。この例では、絶縁膜14上に2つの隔壁16A,16Bが下部電極11と交差する方向に設けられ、この隔壁16A,16Bによって下部電極11と交差する方向に沿って形成される上部電極13が絶縁区画されている。そして、この隔壁16A,16Bの間に、上部電極13と同一層のタッチ電極20が形成されている。この例においても、上部電極13とタッチ電極20は異なる平面上に形成されているが、両者は同一層であって同じ成膜工程で形成されており、タッチ電極20は、上部電極13と並列して隔壁16に沿って複数列のライン状に配置されている。 The example shown in FIGS. 5B and 5C (FIG. 5B is a cross-sectional view and FIG. 5C is a plan view) shows a pair of partition walls in which the touch electrode 20 insulates the upper electrode 13 from each other. 16 (16A, 16B). In this example, two partition walls 16A and 16B are provided on the insulating film 14 in a direction intersecting the lower electrode 11, and the upper electrode 13 formed along the direction intersecting the lower electrode 11 by the partition walls 16A and 16B is formed. Insulated compartment. A touch electrode 20 of the same layer as the upper electrode 13 is formed between the partition walls 16A and 16B. Also in this example, the upper electrode 13 and the touch electrode 20 are formed on different planes, but both are the same layer and formed in the same film forming process, and the touch electrode 20 is in parallel with the upper electrode 13. Then, they are arranged in a plurality of lines along the partition wall 16.
 図6は、本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図である。この例は、タッチ電極20が2つの方向に交差して配置されている。一つの方向に沿って並列して複数配置されたタッチ電極20(20X)は上部電極13と同一層であって、上部電極13の間の領域に形成されている。また他の方向に沿って並列して複数配置されたタッチ電極20(20Y)は下部電極11と同一層であって、下部電極11の間の領域に形成されている。タッチ電極20Xは、図5に示すように図示省略した隔壁上又は2つの隔壁の間に形成することができ、タッチ電極20Yは、図1(c)に示すように基板上に形成することができる。 FIG. 6 is an explanatory view showing another example of the electrode structure in the organic EL device according to the embodiment of the present invention. In this example, the touch electrodes 20 are arranged so as to intersect in two directions. A plurality of touch electrodes 20 (20X) arranged in parallel along one direction are in the same layer as the upper electrode 13 and are formed in a region between the upper electrodes 13. A plurality of touch electrodes 20 (20Y) arranged in parallel along the other direction are in the same layer as the lower electrode 11 and are formed in a region between the lower electrodes 11. The touch electrode 20X can be formed on a partition wall (not shown) or between two partition walls as shown in FIG. 5, and the touch electrode 20Y can be formed on a substrate as shown in FIG. it can.
 図7は、本発明の実施形態に係る有機EL装置における電極構造の他の形態例を示した説明図である。この例は、有機EL素子がセグメント状(図7(a))又はアイコン状(図7(b))に形成されている例である。図7(a)に示した例では、セグメント状に形成された有機EL素子1Uを囲むようにタッチ電極20が形成されており、図7(b)に示した例では、アイコン状に形成された有機EL素子1Uを囲むようにタッチ電極20が形成されている。図7(a),(b)に示したタッチ電極20は、前述したように下部電極と上部電極と配線電極のうちのいずれかの層と同一層である。 FIG. 7 is an explanatory view showing another example of the electrode structure in the organic EL device according to the embodiment of the present invention. In this example, the organic EL elements are formed in a segment shape (FIG. 7A) or an icon shape (FIG. 7B). In the example shown in FIG. 7A, the touch electrode 20 is formed so as to surround the organic EL element 1U formed in a segment shape. In the example shown in FIG. 7B, the touch electrode 20 is formed in an icon shape. A touch electrode 20 is formed so as to surround the organic EL element 1U. As described above, the touch electrode 20 shown in FIGS. 7A and 7B is the same layer as any one of the lower electrode, the upper electrode, and the wiring electrode.
 図8~図12は、本発明の実施形態に係る有機EL装置におけるタッチ電極と検出回路の接続形態例を示した説明図である。図8~図12に示した例のタッチ電極20は、いずれも前述したように下部電極と上部電極と配線電極のうちのいずれかの層と同一層である。 8 to 12 are explanatory diagrams showing examples of connection forms of the touch electrode and the detection circuit in the organic EL device according to the embodiment of the present invention. The touch electrodes 20 in the examples shown in FIGS. 8 to 12 are the same layer as any one of the lower electrode, the upper electrode, and the wiring electrode as described above.
 図8に示した例は、複数のタッチ電極20毎にそれぞれ検出回路32を接続している。図9に示した例は、タッチ電極20を複数備え、複数のタッチ電極20の一部又は全部が連結電極21によって連結されて並列接続されており、タッチ電極20は連結電極21を介して検出回路32に接続されている。 In the example shown in FIG. 8, the detection circuit 32 is connected to each of the plurality of touch electrodes 20. The example shown in FIG. 9 includes a plurality of touch electrodes 20, and some or all of the plurality of touch electrodes 20 are connected in parallel by connecting electrodes 21, and the touch electrodes 20 are detected via the connecting electrodes 21. The circuit 32 is connected.
 図10に示した例は、複数のタッチ電極20を複数のエリア(Ar1,Ar2,Ar3)毎に分割し、連結電極21(21A,21B,21C)をエリア毎に分けて設け、タッチ電極20はエリア毎に設けた検出回路32(32A,32B,32C)に連結電極21(21A,21B,21C)を介して接続されている。 In the example illustrated in FIG. 10, the plurality of touch electrodes 20 are divided into a plurality of areas (Ar1, Ar2, Ar3), and the connection electrodes 21 (21A, 21B, 21C) are provided separately for each area. Is connected to a detection circuit 32 (32A, 32B, 32C) provided for each area via a coupling electrode 21 (21A, 21B, 21C).
 図11に示した例は、複数のタッチ電極20を複数のエリア(Ar1,Ar2,Ar3)毎に分割し、連結電極21(21A,21B,21C)をエリア毎に分けて設け、タッチ電極20は検出回路32に連結電極21(21A,21B,21C)を介して時分割で電気的に接続されている。検出回路32と連結電極21(21A,21B,21C)は時分割切り替え回路34によって順次接続される。 In the example shown in FIG. 11, the plurality of touch electrodes 20 are divided into a plurality of areas (Ar1, Ar2, Ar3), and the connection electrodes 21 (21A, 21B, 21C) are provided separately for each area. Are electrically connected to the detection circuit 32 via the coupling electrodes 21 (21A, 21B, 21C) in a time-sharing manner. The detection circuit 32 and the connecting electrode 21 (21A, 21B, 21C) are sequentially connected by a time division switching circuit 34.
 図12に示した例は、下部電極11又は上部電極13に沿って形成されたタッチ電極20を、下部電極11又は上部電極13に沿って複数に分割している。図12(a)に示した例では、下部電極11又は上部電極13に沿ったライン毎に複数に分割したタッチ電極20を連結電極21で連結してそれぞれ検出回路32に接続している。図12(b)に示した例では、下部電極11又は上部電極13に沿ったライン毎に複数に分割したタッチ電極20を、連結電極21を介してそれぞれ個別に検出回路32に接続している。 In the example shown in FIG. 12, the touch electrode 20 formed along the lower electrode 11 or the upper electrode 13 is divided into a plurality along the lower electrode 11 or the upper electrode 13. In the example shown in FIG. 12A, the touch electrodes 20 divided into a plurality for each line along the lower electrode 11 or the upper electrode 13 are connected by the connecting electrode 21 and connected to the detection circuit 32. In the example shown in FIG. 12B, the touch electrodes 20 divided into a plurality for each line along the lower electrode 11 or the upper electrode 13 are individually connected to the detection circuit 32 via the connection electrodes 21. .
 図13~図15は、本発明の実施形態に係る有機EL装置の製造方法の一例を示した説明図である。図13は、タッチ電極が下部電極と同一層である場合の製造工程の一例を示している。基板準備工程S1では、基板10の表面処理や表面への下地層(保護膜や平坦化膜などの層)形成などが行われる。その後の下部電極層成膜工程S2では、基板準備工程S1を経た基板10上にITO,IZOなどの透明導電膜材料からなる下部電極層を成膜する。その後の配線電極層部分成膜工程S3では、下部電極層の上の部分的な領域にAlなどの金属材料からなる配線電極層を成膜する。 13 to 15 are explanatory views showing an example of a method for manufacturing an organic EL device according to an embodiment of the present invention. FIG. 13 shows an example of a manufacturing process when the touch electrode is the same layer as the lower electrode. In the substrate preparation step S1, surface treatment of the substrate 10 and formation of a base layer (a layer such as a protective film or a planarizing film) on the surface are performed. In the subsequent lower electrode layer deposition step S2, a lower electrode layer made of a transparent conductive film material such as ITO or IZO is deposited on the substrate 10 that has undergone the substrate preparation step S1. In the subsequent wiring electrode layer partial film forming step S3, a wiring electrode layer made of a metal material such as Al is formed in a partial region on the lower electrode layer.
 その後の下部電極/配線電極/タッチ電極同時形成工程S4では、フォトリソグラフィなどのパターン形成工程によって、下部電極11と配線電極15とタッチ電極20を同時にパターニングする。この際、タッチ電極20は、基板10上に成膜された下部電極層をパターニングすることによって形成される。 In the subsequent lower electrode / wiring electrode / touch electrode simultaneous forming step S4, the lower electrode 11, the wiring electrode 15, and the touch electrode 20 are simultaneously patterned by a pattern forming step such as photolithography. At this time, the touch electrode 20 is formed by patterning the lower electrode layer formed on the substrate 10.
 その後は、絶縁膜/隔壁形成工程S5で絶縁膜14と隔壁16が順次形成され、有機層成膜工程S6で有機層12がマスク成膜され、上部電極成膜工程S7で有機層12上にAlなどの金属材料からなる上部電極13が成膜される。その後は、有機EL素子1Uを気密に封止する封止工程S8や、配線電極15やタッチ電極20に駆動回路や検出回路を接続する回路実装工程S9が行われる。 Thereafter, the insulating film 14 and the partition 16 are sequentially formed in the insulating film / partition forming step S5, the organic layer 12 is formed into a mask in the organic layer forming step S6, and is formed on the organic layer 12 in the upper electrode forming step S7. An upper electrode 13 made of a metal material such as Al is formed. Thereafter, a sealing step S8 for hermetically sealing the organic EL element 1U and a circuit mounting step S9 for connecting a drive circuit and a detection circuit to the wiring electrode 15 and the touch electrode 20 are performed.
 図14は、タッチ電極が配線電極と同一層である場合の製造工程の一例を示している。この例は、前述した基板準備工程S1、下部電極層成膜工程S2を行った後、下部電極形成工程S2aでは、フォトリソグラフィなどのパターン形成工程によって下部電極11が形成される。その後、配線電極層成膜工程S3aでは、下部電極11が形成された基板10上にAlなどの金属材料からなる配線電極層が成膜される。その後、配線電極/タッチ電極同時形成工程S4aでは、フォトリソグラフィなどのパターン形成工程によって、配線電極15とタッチ電極20を同時にパターニングする。この際、タッチ電極20は、基板10上に成膜されたAlなどの金属材料からなる配線電極層をパターニングすることによって形成される。その後は、前述したように、絶縁膜/隔壁形成工程S5、有機層成膜工程S6、上部電極成膜工程S7、封止工程S8、回路実装工程S9が行われる。 FIG. 14 shows an example of the manufacturing process when the touch electrode is the same layer as the wiring electrode. In this example, after the substrate preparation process S1 and the lower electrode layer film formation process S2 described above are performed, the lower electrode 11 is formed by a pattern formation process such as photolithography in the lower electrode formation process S2a. Thereafter, in the wiring electrode layer forming step S3a, a wiring electrode layer made of a metal material such as Al is formed on the substrate 10 on which the lower electrode 11 is formed. Thereafter, in the wiring electrode / touch electrode simultaneous forming step S4a, the wiring electrode 15 and the touch electrode 20 are simultaneously patterned by a pattern forming step such as photolithography. At this time, the touch electrode 20 is formed by patterning a wiring electrode layer made of a metal material such as Al formed on the substrate 10. Thereafter, as described above, the insulating film / partition wall forming step S5, the organic layer forming step S6, the upper electrode forming step S7, the sealing step S8, and the circuit mounting step S9 are performed.
 図15は、タッチ電極が上部電極と同一層である場合の製造工程の一例を示している。この例は、前述した基板準備工程S1、下部電極層成膜工程S2、配線電極層部分成膜工程S3を行った後、下部電極/配線電極形成工程S4bが行われ、フォトリソグラフィなどのパターン形成工程によって下部電極11と配線電極15が形成される。その後、前述したように、絶縁膜/隔壁形成工程S5、有機層成膜工程S6が行われ、その後に上部電極成膜/タッチ電極同時形成工程S7aが行われる。この際には、タッチ電極20は、上部電極13と同じAlなどの金属材料で、隔壁16上又は2つの隔壁16A,16Bの間にパターン形成される。その後は、前述したように、封止工程S8、回路実装工程S9が行われる。 FIG. 15 shows an example of the manufacturing process when the touch electrode is the same layer as the upper electrode. In this example, the substrate preparation process S1, the lower electrode layer film forming process S2, and the wiring electrode layer partial film forming process S3 described above are performed, and then the lower electrode / wiring electrode forming process S4b is performed to form a pattern such as photolithography. The lower electrode 11 and the wiring electrode 15 are formed by the process. Thereafter, as described above, the insulating film / partition wall forming step S5 and the organic layer film forming step S6 are performed, and then the upper electrode film forming / touch electrode simultaneous forming step S7a is performed. At this time, the touch electrode 20 is made of the same metal material such as Al as the upper electrode 13 and is patterned on the partition wall 16 or between the two partition walls 16A and 16B. Thereafter, as described above, the sealing step S8 and the circuit mounting step S9 are performed.
 このような有機EL装置1の製造方法によると、成膜工程やパターン形成工程を追加すること無くタッチ電極20を形成することができるので、タッチセンサ機能を有さない有機EL装置と同等のタクト時間でタッチセンサ機能を有する有機EL装置1を製造することができる。 According to such a manufacturing method of the organic EL device 1, the touch electrode 20 can be formed without adding a film forming process or a pattern forming process, so that the tact equivalent to that of the organic EL device having no touch sensor function is achieved. The organic EL device 1 having a touch sensor function can be manufactured in time.
 以下に、前述した有機EL素子1Uの具体的な構成例について説明する。 Hereinafter, a specific configuration example of the organic EL element 1U described above will be described.
 基板10は、光透過性であり、ガラスやプラスチックなど、有機EL素子1Uを支持することができる基材によって形成される。下部電極11を形成する透明導電膜層は、ITO(Indium Tin Oxide),IZO(Indium Zinc Oxide),酸化亜鉛系透明導電膜,SnO2系透明導電膜,二酸化チタン系透明導電膜などの透明金属酸化物を用いることができる。 The substrate 10 is light transmissive and is formed of a base material that can support the organic EL element 1U, such as glass or plastic. The transparent conductive film layer forming the lower electrode 11 is a transparent metal such as ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), zinc oxide-based transparent conductive film, SnO 2 -based transparent conductive film, titanium dioxide-based transparent conductive film, etc. An oxide can be used.
 下部電極11が複数の電極にパターン形成されている場合は、各電極間の絶縁性を確保するために絶縁膜14が設けられる。この絶縁膜14は、ポリイミド樹脂,アクリル系樹脂,酸化シリコン,窒化シリコンなどの材料が用いられる。絶縁膜14の形成は、絶縁膜14の材料を下部電極11がパターン形成された基板10上に成膜した後、下部電極11上に有機EL素子1U毎の発光領域1Lを形成する開口を形成するパターニングがなされる。具体的には、下部電極11が形成された基板10にスピンコート法により所定の塗布厚となるように膜を形成し、露光マスクを用いて露光処理,現像処理を施すことにより、有機EL素子1Uの開口パターン形状を有する絶縁膜14の層が形成される。この絶縁膜14は、下部電極11のパターン間を埋めると共にその側端部分を一部覆うように形成され、有機EL素子1Uをドットマトリクス状に配置する場合は格子状に形成される。 In the case where the lower electrode 11 is patterned on a plurality of electrodes, an insulating film 14 is provided to ensure insulation between the electrodes. The insulating film 14 is made of a material such as polyimide resin, acrylic resin, silicon oxide, or silicon nitride. The insulating film 14 is formed by depositing the material of the insulating film 14 on the substrate 10 on which the lower electrode 11 is patterned, and then forming an opening for forming the light emitting region 1L for each organic EL element 1U on the lower electrode 11. Patterning is performed. Specifically, a film is formed on the substrate 10 on which the lower electrode 11 is formed to have a predetermined coating thickness by spin coating, and exposure processing and development processing are performed using an exposure mask, whereby an organic EL element is obtained. A layer of insulating film 14 having an opening pattern shape of 1U is formed. The insulating film 14 is formed so as to fill the space between the patterns of the lower electrode 11 and partially cover the side end portion thereof, and is formed in a lattice shape when the organic EL elements 1U are arranged in a dot matrix.
 隔壁16が、マスク等を用いることなく上部電極13のパターンを形成するため、或いは隣り合う上部電極13を完全に電気的に絶縁するために、下部電極11と交差する方向にストライプ状に形成される。具体的には、前述した絶縁膜14の上に感光性樹脂等の絶縁材料を、有機EL素子1Uを形成する有機層12と上部電極13の膜厚の総和より厚い膜厚にスピンコート法等で塗布形成した後、この感光性樹脂膜上に下部電極11に交差するストライプ状パターンを有するフォトマスクを介して紫外線等を照射し、層の厚さ方向の露光量の違いから生じる現像速度の差を利用して、側部が下向きのテーパ面を有する隔壁16を形成する。 The barrier ribs 16 are formed in stripes in a direction intersecting the lower electrode 11 in order to form a pattern of the upper electrode 13 without using a mask or the like, or to completely electrically insulate the adjacent upper electrode 13 from each other. The Specifically, an insulating material such as a photosensitive resin is formed on the above-described insulating film 14 so that the film thickness is larger than the total thickness of the organic layer 12 and the upper electrode 13 that form the organic EL element 1U. Then, the photosensitive resin film is irradiated with ultraviolet rays or the like through a photomask having a stripe pattern intersecting with the lower electrode 11, and the development speed resulting from the difference in the exposure amount in the thickness direction of the layer is applied. By utilizing the difference, the partition wall 16 having a tapered surface with a downward side is formed.
 有機層12は、発光層を含む発光機能層の積層構造を有し、下部電極11と上部電極13の一方を陽極とし他方を陰極とすると、陽極側から順次、正孔注入層、正孔輸送層、発光層、電子輸送層、電子注入層などが選択的に形成される。有機層12の成膜は乾式の成膜として真空蒸着法などが用いられ、湿式の成膜としては塗布や各種の印刷法が用いられる。 The organic layer 12 has a laminated structure of light emitting functional layers including a light emitting layer. When one of the lower electrode 11 and the upper electrode 13 is an anode and the other is a cathode, a hole injection layer and a hole transport are sequentially formed from the anode side. A layer, a light emitting layer, an electron transport layer, an electron injection layer, and the like are selectively formed. As the film formation of the organic layer 12, a vacuum deposition method or the like is used as a dry film formation, and coating or various printing methods are used as a wet film formation.
 有機層12の形成例を以下に説明する。例えば先ず、NPB(N,N-di(naphtalence)-N,N-dipheneyl-benzidene)を正孔輸送層として成膜する。この正孔輸送層は、陽極から注入される正孔を発光層に輸送する機能を有する。この正孔輸送層は、1層だけ積層したものでも2層以上積層したものであってもよい。また正孔輸送層は、単一の材料による成膜ではなく、複数の材料により一つの層を形成しても良く、電荷輸送能力の高いホスト材料に電荷供与(受容)性の高いゲスト材料をドーピングしてもよい。 An example of forming the organic layer 12 will be described below. For example, first, NPB (N, N-di (naphtalence) -N, N-dipheneyl-benzidene) is formed as a hole transport layer. This hole transport layer has a function of transporting holes injected from the anode to the light emitting layer. The hole transport layer may be a single layer or a stack of two or more layers. In addition, the hole transport layer is not formed by a single material, but a single layer may be formed by a plurality of materials, and a guest material having a high charge donating (accepting) property may be formed on a host material having a high charge transport capability. Doping may be performed.
 次に、正孔輸送層の上に発光層を成膜する。一例としては、抵抗加熱蒸着法により、赤(R)、緑(G)、青(B)の発光層を、塗分け用マスクを利用してそれぞれの成膜領域に成膜する。赤(R)としてDCM1(4-(ジシアノメチレン)-2-メチル-6-(4’-ジメチルアミノスチリル)-4H-ピラン)等のスチリル色素等の赤色を発光する有機材料を用いる。緑(G)としてアルミキノリノール錯体(Alq3) 等の緑色を発光する有機材料を用いる。青(B)としてジスチリル誘導体、トリアゾール誘導体等の青色を発光する有機材料を用いる。勿論、他の材料でも、ホスト-ゲスト系の層構成でも良く、発光形態も蛍光発光材料を用いてもりん光発光材料を用いたものであってもよい。 Next, a light emitting layer is formed on the hole transport layer. As an example, red (R), green (G), and blue (B) light-emitting layers are formed in respective film formation regions by using a resistance heating vapor deposition method using a coating mask. As red (R), an organic material that emits red light such as a styryl dye such as DCM1 (4- (dicyanomethylene) -2-methyl-6- (4'-dimethylaminostyryl) -4H-pyran) is used. An organic material that emits green light, such as aluminum quinolinol complex (Alq3), is used as green (G). As the blue (B), an organic material emitting blue light such as a distyryl derivative or a triazole derivative is used. Of course, other materials or a host-guest layer structure may be used, and the emission form may be a fluorescent material or a phosphorescent material.
 発光層の上に成膜される電子輸送層は、抵抗加熱蒸着法等の各種成膜方法により、例えばアルミキノリノール錯体(Alq3 )等の各種材料を用いて成膜する。電子輸送層は、陰極から注入される電子を発光層に輸送する機能を有する。この電子輸送層は、1層だけ積層したものでも2層以上積層した多層構造を有してもよい。また、電子輸送層は、単一の材料による成膜ではなく、複数の材料により一つの層を形成しても良く、電荷輸送能力の高いホスト材料に電荷供与(受容)性の高いゲスト材料をドーピングして形成してもよい。 The electron transport layer formed on the light emitting layer is formed by using various materials such as an aluminum quinolinol complex (Alq3) by various film forming methods such as resistance heating vapor deposition. The electron transport layer has a function of transporting electrons injected from the cathode to the light emitting layer. This electron transport layer may have a multilayer structure in which only one layer is stacked or two or more layers are stacked. In addition, the electron transport layer may be formed of a plurality of materials instead of a single material, and a guest material having a high charge donating (accepting) property may be formed on a host material having a high charge transport capability. It may be formed by doping.
 有機層12上に形成される上部電極13は、こちらが陰極の場合には、陽極より仕事関数の小さい(例えば4eV以下)材料(金属,金属酸化物,金属フッ化物,合金等)を用いることができ、具体的には、アルミニウム(Al),インジウム(In),マグネシウム(Mg)等の金属膜、ドープされたポリアニリンやドープされたポリフェニレンビニレン等の非晶質半導体、Cr23,NiO,Mn25等の酸化物を使用できる。構造としては、金属材料による単層構造、LiO2/Al等の積層構造等が採用できる。 When the upper electrode 13 formed on the organic layer 12 is a cathode, a material (metal, metal oxide, metal fluoride, alloy, etc.) having a work function smaller than that of the anode (for example, 4 eV or less) is used. Specifically, metal films such as aluminum (Al), indium (In), magnesium (Mg), amorphous semiconductors such as doped polyaniline and doped polyphenylene vinylene, Cr 2 O 3 , NiO , Oxides such as Mn 2 O 5 can be used. As the structure, a single layer structure made of a metal material, a laminated structure such as LiO 2 / Al, or the like can be adopted.
 有機EL素子1Uを封止する封止部材は、一例としては、原子層成長法によって成膜される金属やケイ素の酸化物,窒化物,酸窒化物の単層又は多層膜を用いることができる。例えば、TMA(トリメチルアルミニウム)やTEA(トリエチルアルミニウム)、DMAH(ジメチルアルミニウム水素化物)等のアルキル系金属と、水や酸素、アルコール類との反応で得られるアルミニウム酸化物膜(例えば、Al23膜)、ケイ素系材料の気化ガスと水の気化ガスとの反応で得られるケイ素酸化物膜(例えば、SiO2膜)などを用いることができる。 As an example of the sealing member for sealing the organic EL element 1U, a single layer or a multilayer of metal, silicon oxide, nitride, or oxynitride formed by an atomic layer growth method can be used. . For example, an aluminum oxide film (for example, Al 2 O) obtained by a reaction between an alkyl metal such as TMA (trimethylaluminum), TEA (triethylaluminum), DMAH (dimethylaluminum hydride) and water, oxygen, or alcohols. 3 film), a silicon oxide film (for example, SiO 2 film) obtained by a reaction between a vaporized gas of a silicon-based material and a vaporized gas of water can be used.
 以上、本発明の実施の形態について図面を参照して詳述してきたが、具体的な構成はこれらの実施の形態に限られるものではなく、本発明の要旨を逸脱しない範囲の設計の変更などがあっても本発明に含まれる。上述の各図で示した実施の形態は、その目的及び構成などに特に矛盾や問題がない限り、互いの記載内容を組み合わせることが可能である。また、各図の記載内容はそれぞれ独立した実施形態になり得るものであり、本発明の実施形態は各図を組み合わせた一つの実施形態に限定されるものではない。 The embodiments of the present invention have been described in detail with reference to the drawings. However, the specific configuration is not limited to these embodiments, and the design can be changed without departing from the scope of the present invention. Is included in the present invention. The embodiments described in the above drawings can be combined with each other as long as there is no particular contradiction or problem in the purpose and configuration. Moreover, the description content of each figure can become independent embodiment, respectively, and embodiment of this invention is not limited to one embodiment which combined each figure.

Claims (26)

  1.  基板と、
     前記基板上に積層された、下部電極と有機層と上部電極を少なくとも備える有機EL素子と、
     前記有機EL素子を、前記基板との間に封止する封止部材と、
     タッチ電極とを備え、
     前記タッチ電極は、前記有機EL素子毎の発光領域の外にパターニングされ、前記封止部材によって封止された封止領域内に配置されていることを特徴とする有機EL装置。
    A substrate,
    An organic EL element comprising at least a lower electrode, an organic layer, and an upper electrode laminated on the substrate;
    A sealing member for sealing the organic EL element with the substrate;
    With touch electrodes,
    The organic EL device according to claim 1, wherein the touch electrode is patterned outside a light emitting region for each organic EL element and disposed in a sealing region sealed by the sealing member.
  2.  前記基板上に形成され、前記下部電極と前記上部電極のいずれかに接続する配線電極をさらに備え、
     前記タッチ電極は、前記下部電極と前記上部電極と前記配線電極のうちのいずれかの層と同一材料からなる層であることを特徴とする請求項1記載の有機EL装置。
    A wiring electrode formed on the substrate and connected to either the lower electrode or the upper electrode;
    The organic EL device according to claim 1, wherein the touch electrode is a layer made of the same material as any one of the lower electrode, the upper electrode, and the wiring electrode.
  3.  前記基板上に形成され、前記下部電極と前記上部電極のいずれかに接続する配線電極をさらに備え、
     前記タッチ電極は、前記下部電極と前記上部電極と前記配線電極のうちのいずれかの層と同一層であることを特徴とする請求項1記載の有機EL装置。
    A wiring electrode formed on the substrate and connected to either the lower electrode or the upper electrode;
    The organic EL device according to claim 1, wherein the touch electrode is the same layer as any one of the lower electrode, the upper electrode, and the wiring electrode.
  4.  前記タッチ電極は、静電容量方式のタッチセンサを構成することを特徴とする請求項2記載の有機EL装置。 3. The organic EL device according to claim 2, wherein the touch electrode constitutes a capacitive touch sensor.
  5.  前記上部電極と前記下部電極をそれぞれ複数備え、
     前記タッチ電極は、前記上部電極間又は前記下部電極間の領域に形成されていることを特徴とする請求項1記載の有機EL装置。
    A plurality of the upper electrode and the lower electrode, respectively,
    The organic EL device according to claim 1, wherein the touch electrode is formed in a region between the upper electrodes or between the lower electrodes.
  6.  前記タッチ電極は、複数列のライン状に形成されていることを特徴とする請求項1記載の有機EL装置。 The organic EL device according to claim 1, wherein the touch electrodes are formed in a plurality of lines.
  7.  前記タッチ電極は、前記下部電極又は前記上部電極と並列して配置されていることを特徴とする請求項1記載の有機EL装置。 The organic EL device according to claim 1, wherein the touch electrode is arranged in parallel with the lower electrode or the upper electrode.
  8.  前記タッチ電極は、前記下部電極と並列して複数配置されており、前記下部電極より電気抵抗が低い材料で形成されていることを特徴とする請求項1記載の有機EL装置。 2. The organic EL device according to claim 1, wherein a plurality of the touch electrodes are arranged in parallel with the lower electrode, and are made of a material having a lower electric resistance than the lower electrode.
  9.  前記タッチ電極を複数備え、複数の前記タッチ電極の一部又は全部が連結電極によって連結されていることを特徴とする請求項1記載の有機EL装置。 2. The organic EL device according to claim 1, comprising a plurality of the touch electrodes, wherein some or all of the plurality of touch electrodes are connected by a connection electrode.
  10.  前記連結電極は前記タッチ電極よりも電気抵抗が高い材料で形成されていることを特徴とする請求項9記載の有機EL装置。 10. The organic EL device according to claim 9, wherein the connecting electrode is made of a material having a higher electric resistance than the touch electrode.
  11.  複数の前記タッチ電極をエリア毎に分割し、前記連結電極を前記エリア毎に分けて設けたこと特徴とする請求項9記載の有機EL装置。 10. The organic EL device according to claim 9, wherein the plurality of touch electrodes are divided for each area, and the connection electrodes are provided for each area.
  12.  前記タッチ電極上に重なる電極層を備え、
     前記タッチ電極と前記電極層との間には、当該電極間の寄生容量を低減させる絶縁膜が形成されていることを特徴とする請求項1記載の有機EL装置。
    Comprising an electrode layer overlying the touch electrode;
    The organic EL device according to claim 1, wherein an insulating film that reduces parasitic capacitance between the electrodes is formed between the touch electrode and the electrode layer.
  13.  前記タッチ電極上に重なる電極層を備え、
     前記電極層は、前記タッチ電極と重なる部分の一部を開口した開口部を有することを特徴とする請求項1記載の有機EL装置。
    Comprising an electrode layer overlying the touch electrode;
    The organic EL device according to claim 1, wherein the electrode layer has an opening in which a part of the portion overlapping the touch electrode is opened.
  14.  前記タッチ電極は前記下部電極と並列して配置され、
     前記下部電極は、前記発光領域の外で当該下部電極の電極幅を狭める切り欠き部を有し、
     前記タッチ電極は、前記切り欠き部内で当該タッチ電極の電極幅を拡幅させる拡幅部を有することを特徴とする請求項1記載の有機EL装置。
    The touch electrode is arranged in parallel with the lower electrode,
    The lower electrode has a notch that narrows the electrode width of the lower electrode outside the light emitting region,
    The organic EL device according to claim 1, wherein the touch electrode has a widened portion that widens an electrode width of the touch electrode in the cutout portion.
  15.  前記タッチ電極は、前記下部電極と同一層であり、当該タッチ電極と前記下部電極は同一平面上に形成されていることを特徴とする請求項1記載の有機EL装置。 2. The organic EL device according to claim 1, wherein the touch electrode is in the same layer as the lower electrode, and the touch electrode and the lower electrode are formed on the same plane.
  16.  前記タッチ電極は、前記配線電極と同一層であり、当該タッチ電極と前記配線電極は同一平面上に形成されていることを特徴とする請求項1記載の有機EL装置。 2. The organic EL device according to claim 1, wherein the touch electrode is in the same layer as the wiring electrode, and the touch electrode and the wiring electrode are formed on the same plane.
  17.  前記タッチ電極は、前記上部電極と同一層であり、当該タッチ電極と前記上部電極は異なる平面上に形成されていることを特徴とする請求項1記載の有機EL装置。 The organic EL device according to claim 1, wherein the touch electrode is formed in the same layer as the upper electrode, and the touch electrode and the upper electrode are formed on different planes.
  18.  前記タッチ電極は、前記上部電極を絶縁区画するための隔壁上に形成されていることを特徴とする請求項17記載の有機EL装置。 The organic EL device according to claim 17, wherein the touch electrode is formed on a partition wall for insulatingly partitioning the upper electrode.
  19.  前記タッチ電極は、前記上部電極を絶縁区画する一対の隔壁の間に形成されていることを特徴とする請求項17記載の有機EL装置。 The organic EL device according to claim 17, wherein the touch electrode is formed between a pair of partition walls that insulate and partition the upper electrode.
  20.  前記タッチ電極上の静電容量変化を検出する検出回路を備え、
     前記タッチ電極は前記検出回路に接続されていることを特徴とする請求項1記載の有機EL装置
    A detection circuit for detecting a capacitance change on the touch electrode;
    The organic EL device according to claim 1, wherein the touch electrode is connected to the detection circuit.
  21.  前記タッチ電極を複数備え、
     複数の前記タッチ電極毎にそれぞれ前記検出回路を接続していることを特徴とする請求項20記載の有機EL装置。
    A plurality of touch electrodes;
    21. The organic EL device according to claim 20, wherein the detection circuit is connected to each of the plurality of touch electrodes.
  22.  前記タッチ電極を複数備え、
     複数の前記タッチ電極の一部又は全部が連結電極によって連結されて並列接続されており、
     前記タッチ電極は前記連結電極を介して前記検出回路に接続されていることを特徴とする請求項20記載の有機EL装置。
    A plurality of touch electrodes;
    A part or all of the plurality of touch electrodes are connected by a connecting electrode and connected in parallel,
    21. The organic EL device according to claim 20, wherein the touch electrode is connected to the detection circuit through the connection electrode.
  23.  複数の前記タッチ電極をエリア毎に分割し、前記連結電極を前記エリア毎に分けて設け、
     前記タッチ電極は前記エリア毎に設けた前記検出回路に前記連結電極を介して接続されていることを特徴とする請求項22記載の有機EL装置。
    A plurality of the touch electrodes are divided for each area, and the connection electrode is divided for each area,
    23. The organic EL device according to claim 22, wherein the touch electrode is connected to the detection circuit provided for each area via the connection electrode.
  24.  複数の前記タッチ電極をエリア毎に分割し、前記連結電極を前記エリア毎に分けて設け、
     前記タッチ電極は前記検出回路に前記連結電極を介して時分割で電気的に接続されていることを特徴とする請求項22記載の有機EL装置。
    A plurality of the touch electrodes are divided for each area, and the connection electrode is divided for each area,
    23. The organic EL device according to claim 22, wherein the touch electrode is electrically connected to the detection circuit through the connection electrode in a time division manner.
  25.  前記配線電極は、前記下部電極に沿って配線される補助配線電極、前記下部電極又は前記上部電極の端部に接続される引き出し配線電極の一方又は両方であることを特徴とする請求項1記載の有機EL装置。 2. The wiring electrode according to claim 1, wherein the wiring electrode is one or both of an auxiliary wiring electrode wired along the lower electrode, an extraction wiring electrode connected to an end of the lower electrode, or the upper electrode. Organic EL device.
  26.  基板と、前記基板上に積層され、下部電極と有機層と上部電極を少なくとも備える有機EL素子と、前記有機EL素子を前記基板との間に封止する封止部材と、前記基板上に形成され、前記下部電極と前記上部電極のいずれかに接続する配線電極と、静電容量方式のタッチセンサを構成するためのタッチ電極とを備えた有機EL装置の製造方法であって、
     前記下部電極と前記上部電極と前記配線電極のうちのいずれか電極と同時に、前記有機EL素子毎の発光領域の外側で、かつ、前記封止部材によって封止される封止領域内に前記タッチ電極を形成することを特徴とする有機EL装置の製造方法。
    A substrate, an organic EL element that is laminated on the substrate and includes at least a lower electrode, an organic layer, and an upper electrode, a sealing member that seals the organic EL element between the substrate, and a substrate formed on the substrate A method of manufacturing an organic EL device comprising: a wiring electrode connected to any one of the lower electrode and the upper electrode; and a touch electrode for constituting a capacitive touch sensor,
    Simultaneously with any one of the lower electrode, the upper electrode, and the wiring electrode, the touch is performed outside the light emitting region for each organic EL element and within a sealing region sealed by the sealing member. An organic EL device manufacturing method comprising forming an electrode.
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