WO2013137016A1 - Detergent composition, manufacturing method therefor, and methods for storing and transporting said detergent composition - Google Patents

Detergent composition, manufacturing method therefor, and methods for storing and transporting said detergent composition Download PDF

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Publication number
WO2013137016A1
WO2013137016A1 PCT/JP2013/055639 JP2013055639W WO2013137016A1 WO 2013137016 A1 WO2013137016 A1 WO 2013137016A1 JP 2013055639 W JP2013055639 W JP 2013055639W WO 2013137016 A1 WO2013137016 A1 WO 2013137016A1
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WIPO (PCT)
Prior art keywords
aqueous solution
silicate
cleaning composition
acid
containing aqueous
Prior art date
Application number
PCT/JP2013/055639
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French (fr)
Japanese (ja)
Inventor
雅幸 神谷
山本 秀之
Original Assignee
ユケン工業株式会社
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Publication of WO2013137016A1 publication Critical patent/WO2013137016A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/044Hydroxides or bases
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/02Inorganic compounds ; Elemental compounds
    • C11D3/04Water-soluble compounds
    • C11D3/08Silicates
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/06Hydroxides
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02Inorganic compounds
    • C11D7/04Water-soluble compounds
    • C11D7/10Salts
    • C11D7/14Silicates

Definitions

  • the present invention relates to a cleaning composition, a method for producing the same, and a method for storing and transporting the cleaning composition.
  • Liquid detergent composition in the present specification, “liquid detergent composition” means not only a liquid detergent composition, but also a lower limit fluidity (specifically, a liquid detergent composition that can be normally used as a detergent composition). Includes a cleaning composition in which solids are dispersed within a range that maintains a viscosity of 4500 mPa ⁇ s or less.) Is a cleaning function, that is, components to be removed such as oil adhering to the member to be cleaned. In addition to being excellent in the function of removing water, it may be required to be excellent in stability during storage.
  • liquid detergent compositions are usually used even when the detergent composition is in a low-temperature environment because the detergent composition is frozen or precipitates are generated in the detergent composition. It may be required as low temperature stability that the possibility of occurrence of less than the lower limit flowability (hereinafter referred to as “flow failure”) is sufficiently reduced. If the cleaning composition is excellent in low-temperature stability, the supply of cleaning composition into the cleaning tank by replenishing the pump, etc. may cause problems such as reduced controllability of the supply amount or inability to supply. Hateful.
  • the lower limit temperature at which low temperature stability can be ensured is set according to the assumed use environment of the liquid detergent composition. Usually, for example, as described in Patent Document 1, the lower limit temperature is ⁇ 5 ° C. It is often said.
  • the liquid detergent composition when the manufactured liquid detergent composition is transported to a destination, or when the storage environment is not particularly controlled, the liquid detergent composition is placed in almost the same environment as the outside air. In some cases, ⁇ 20 ° C. is required as a lower limit temperature (hereinafter also referred to as “storage lower limit temperature”) that can secure the properties.
  • storage lower limit temperature a lower limit temperature
  • the minimum storage temperature of the liquid detergent composition is ⁇ 20 ° C., it is almost the same as the outside air even if it is a part of Siberia, the northern part of North America, etc. Even if the liquid detergent composition is placed in the environment, the possibility of freezing and poor flow is sufficiently low.
  • liquid detergent composition having a storage minimum temperature of ⁇ 20 ° C.
  • a component for improving low-temperature stability is used as a liquid detergent composition. It is common to make it contain in a thing.
  • Patent Document 2 discloses a transparent liquid detergent composition containing a surfactant in the range of 20 to 50% by weight, comprising (a) alpha-olefin sulfonic acid or an alkali metal salt thereof, (B) containing polyoxyethylene alkylsulfuric acid or an alkali metal salt thereof and (c) a magnesium salt, wherein the component (a) / component (b) is in the range of 90/10 to 10/90 by weight, A transparent liquid detergent composition is disclosed wherein the ⁇ (a) component + (b) component ⁇ / (c) component is in the range of 99/1 to 75/25 in molar ratio.
  • alpha olefin sulfonic acid or its alkali metal salt and polyoxyethylene alkylsulfuric acid or its alkali metal salt and magnesium salt are positioned as freeze inhibitors.
  • Patent Document 3 discloses a high concentration characterized by containing 0.1 to 10% by weight of phosphonobutanetricarboxylic acid or a salt thereof in an alkaline liquid detergent composition containing 20 to 60% by weight of an alkaline agent.
  • An alkaline liquid detergent composition is disclosed.
  • at least one of phosphonobutanetricarboxylic acid and a salt thereof is positioned as a freezing inhibitor.
  • the cleaning composition has an ability to reduce the amount.
  • the number of components contained in the cleaning composition tends to decrease from the viewpoint of reducing the waste liquid treatment load and reducing the manufacturing cost.
  • an object of the present invention is to provide a fluid detergent composition having excellent low-temperature stability.
  • “having fluidity” means that the above-mentioned flow failure does not occur, and specifically means that the viscosity is 4500 mPa ⁇ s or less.
  • An alkaline silicate-containing aqueous solution comprising potassium ions, sodium ions, a water-soluble anhydrous silicic acid compound and water, and having a fluidity, wherein the silicate-containing aqueous solution
  • the potassium content is 10.0% by mass or more in terms of KOH
  • the molar ratio of the potassium content to the sodium content in the silicate-containing aqueous solution is 0.5 or more
  • the water-soluble silicic acid anhydride in the silicate-containing aqueous solution is as follows.
  • the content of the compound is 1.0% by mass or more and 24% by mass or less in terms of SiO 2 , and the content of water contained in the silicate-containing aqueous solution is 75% by mass or less, and the silicate content A cleaning composition, wherein the aqueous solution has fluidity even when left in a -20 ° C environment for 500 hours.
  • the silicate-containing aqueous solution includes potassium hydroxide, sodium hydroxide, potassium hydroxide aqueous solution, potassium hydroxide aqueous solution, a mixture of potassium oxide and anhydrous silicic acid, oxidation
  • silicate-containing aqueous solution is formed from an aqueous solution of sodium hydroxide, an aqueous solution of a mixture of potassium oxide and anhydrous silicic acid, and water.
  • An aqueous composition for preparing the cleaning composition described in any one of (1) to (9) above, which is any one of (1) to (4) above An aqueous composition comprising the silicate-containing aqueous solution described.
  • An aqueous composition for preparing the cleaning composition described in any one of (1) to (9) above, which is any one of (1) to (4) above An aqueous composition comprising the described silicate-containing aqueous solution and a chelating agent.
  • (20) A method for storing an aqueous composition, wherein the aqueous composition described in (10) or (14) is stored in an environment of ⁇ 20 ° C. or higher and lower than ⁇ 5 ° C.
  • a method for transporting a cleaning composition comprising transporting the aqueous composition described in (10) or (14) above in an environment of ⁇ 20 ° C. or higher and lower than ⁇ 5 ° C.
  • a cleaning liquid composition having excellent low-temperature stability, which can have a storage minimum temperature of ⁇ 20 ° C. or lower.
  • the cleaning composition according to this embodiment has fluidity.
  • having fluidity means that the viscosity is 4500 mPa ⁇ s or less as described above.
  • the cleaning composition according to the present embodiment is preferably a colloid or a liquid and is substantially free of visible-size solids. In the case of containing such a solid, there is a possibility that crystallization will proceed with this as a nucleus at a low temperature, or the temperature at which such crystallization starts may increase.
  • the cleaning composition according to this embodiment contains an alkaline silicate-containing aqueous solution composed of potassium ions, sodium ions, a water-soluble anhydrous silicic acid compound, and water.
  • water is a general term for a group of substances consisting of water molecules, hydrogen ions and hydroxide ions, and the silicate-containing aqueous solution according to the present embodiment is alkaline.
  • the hydrogen ion concentration contained in water is lower than the hydroxide ions contained in water.
  • “containing a silicate-containing aqueous solution” includes the following cases.
  • a hypothetical silicate obtained by theoretically excluding the second component from the composition of the cleaning agent composition according to the present embodiment in the case of containing the component referred to as “second component” in the present embodiment
  • the aqueous solution contains the following compositional requirements
  • potassium ions and sodium ions are hydrated or chemically interact via silicic anhydride and water.
  • the “water-soluble silicic acid anhydride compound” refers to other substances (such as water) in which the silicic acid (SiO 2 ) molecule and the silicic acid anhydride are contained in the silicate-containing aqueous solution according to the present embodiment, such as water.
  • the silicic acid (SiO 2 ) molecule and the silicic acid anhydride are contained in the silicate-containing aqueous solution according to the present embodiment, such as water.
  • water molecules and other silicic acid molecules are exemplified.
  • the silicate-containing aqueous solution according to the present embodiment is substantially free of components other than potassium ions, sodium ions, water-soluble silicate compounds and water.
  • substantially free means that the silicate-containing aqueous solution may contain impurities (lithium component, magnesium component, aluminum component, etc.) that are inevitably mixed in the production process. .
  • the silicate-containing aqueous solution according to the present embodiment can have fluidity even when left in an environment of ⁇ 20 ° C. for 500 hours.
  • Potassium content of the silicate-containing aqueous solution refers to the content of the component containing potassium contained in the silicate-containing aqueous solution. Means 10.0% by mass or more in terms of KOH. Since the solubility in water is higher in potassium than in sodium, when the potassium content of the silicate-containing aqueous solution is less than 10.0% by mass in terms of KOH, it has fluidity if it is up to about ⁇ 5 ° C. Even in some cases, when it is cooled to ⁇ 20 ° C., the fluidity is lost due to precipitation.
  • the potassium content of the silicate-containing aqueous solution according to this embodiment is 11 mass in terms of KOH. % Or more, more preferably 18% by mass or more, and further preferably 25% by mass or more.
  • the upper limit of the potassium content of the silicate-containing aqueous solution according to the embodiment should be appropriately set in relation to other components such as a water-soluble silicic acid anhydride compound and water.
  • the molar ratio of potassium to sodium content in the silicate-containing aqueous solution according to this embodiment (also referred to as “K / Na ratio” in this embodiment) is 0. .5 or more.
  • the K / Na ratio is less than 0.5, it becomes difficult to satisfy the above-mentioned conditions regarding potassium content, and problems such as poor flow may occur in the detergent composition when stored at ⁇ 20 ° C. Will increase.
  • the K / Na ratio of the silicate-containing aqueous solution according to this embodiment may be 0.6 or more. Preferably, it is 1.5 or more, more preferably 5 or more.
  • the upper limit of the K / Na ratio of the silicate-containing aqueous solution according to the present embodiment should be appropriately set in relation to other components such as a water-soluble silicic acid anhydride compound and water.
  • the content of the water-soluble silicic acid compound in the silicate-containing aqueous solution according to this embodiment is 1.0% by mass or more and 24% by mass or less in terms of SiO 2. It is. By being in this range, the possibility that the aqueous solution containing silicate loses its fluidity when stored at ⁇ 20 ° C. can be reduced.
  • the SiO 2 equivalent content of the water-soluble silicic acid compound is less than 1.0% by mass, it is ⁇ 20 ° C. even if it has fluidity up to about ⁇ 5 ° C. When it is cooled down, the possibility of losing fluidity increases due to precipitation.
  • the content of the water-soluble silicic acid compound in terms of SiO 2 is preferably 1.0% by mass or more and 20.0% by mass or less, and 5.0% by mass or more. More preferably, it is 15.0% by mass or less.
  • the water content in the silicate-containing aqueous solution according to this embodiment is 75% by mass or less. By being in this range, the possibility that the aqueous solution containing silicate loses its fluidity when stored at ⁇ 20 ° C. can be reduced. If the water content is excessively high, it becomes difficult to obtain the effect of freezing prevention due to the freezing point depression, and the silicate-containing aqueous solution tends to lose its fluidity. From the viewpoint of more stably reducing the possibility of such a tendency, the water content is preferably 70% by mass or less. Moreover, by reducing the water content, a relatively large amount of the water-soluble silicic anhydride compound can be contained.
  • the detergency may increase, so it may be more preferable to increase the content of the water-soluble silicic acid anhydride by setting the water content to 65% by mass or less depending on the application.
  • the lower limit of the moisture content is not singly defined. For example, when there are fewer active water content, consequently if the content of SiO 2 in terms the content of the water-soluble silicic anhydride compound Takamare, silicate-containing aqueous solution is more likely to lose fluidity.
  • the potassium content is low or the K / Na ratio is low, the content (sodium content) of sodium-containing components with relatively low solubility increases, so that the silicate-containing aqueous solution is fluid.
  • the lower limit of the moisture content is preferably 40% or more, and more preferably 45% or more. Reduce the possibility of the above problems more stably, reduce the possibility of poor handling, avoid the possibility of safety management problems due to excessively concentrated liquids, etc. From this viewpoint, the water content in the silicate-containing aqueous solution is preferably 49.0% by mass or more, and more preferably 50.0% by mass or more.
  • the water content in the silicate-containing aqueous solution is preferably 51% by mass or more, 52 It is more preferable to set it as mass% or more.
  • the material component which comprises the silicate containing aqueous solution which concerns on this embodiment is not specifically limited. For example, you may make it form from 2 or more types chosen from the group which consists of the following component. Potassium hydroxide, Sodium hydroxide, Aqueous solution of potassium hydroxide, Aqueous solution of potassium hydroxide, A mixture of potassium oxide and silicic anhydride, A mixture of sodium oxide and silicic anhydride, An aqueous solution of a mixture of potassium oxide and silicic anhydride, An aqueous solution of a mixture of sodium oxide and silicic acid, and water.
  • the silicate-containing aqueous solution may be formed from an aqueous solution of sodium hydroxide, an aqueous solution of a mixture of potassium oxide and anhydrous silicic acid, and water.
  • Alkali metal hydroxides and a mixture of potassium oxide and silicic anhydride are easier to handle if they are previously stored in an aqueous solution.
  • handling them as solids such as powder increases the possibility of problems in health and safety.
  • the cleaning composition according to the present embodiment may further contain a component (including a solvent) other than the components constituting the silicate-containing aqueous solution as the second component.
  • a component including a solvent
  • the cleaning composition according to the present embodiment includes only the above-mentioned silicate-containing aqueous solution or a solvent. A diluted one may be used.
  • the cleaning composition according to the present embodiment includes at least one of a freeze inhibitor (A) containing a polyether polyol (phosphonobutanetricarboxylic acid and a salt thereof) as disclosed in Patent Documents 2 and 3.
  • Freezing inhibitor (B); and none of freezing inhibitor (C) containing alpha olefin sulfonic acid or its alkali metal salt and polyoxyethylene alkylsulfuric acid or its alkali metal salt and magnesium salt are contained as the second component It is preferable.
  • the second component may contain a chelating agent.
  • the specific kind of chelating agent is not particularly limited.
  • the composition of the member to be cleaned, the composition of the component to be removed adhering to the surface of the member to be cleaned, the quality required in the state after cleaning of the member to be cleaned (such as the allowable level of surface residual substances), and the composition of the cleaning composition It may be set as appropriate in consideration of the above.
  • chelating agents include aminopolycarboxylic acid chelating agents, aromatic or aliphatic carboxylic acid chelating agents, amino acid chelating agents, ether carboxylic acid chelating agents, phosphonic acid chelating agents, and hydroxycarboxylic acid chelating agents. , Polymer electrolyte (including oligomer electrolyte) chelating agents, nitrogen-containing chelating agents such as polyalcohol and dimethylglyoxime, and sulfur-containing chelating agents such as thioglycolic acid.
  • these chelating agents is arbitrary.
  • an acid-based chelating agent it may be in the free acid form or in the form of a salt such as sodium salt, potassium salt or ammonium salt.
  • a salt such as sodium salt, potassium salt or ammonium salt.
  • they may be in the form of their ester derivatives which are hydrolysable.
  • aminopolycarboxylic acid chelating agents include ethylenediaminetetraacetic acid (EDTA), ethylenediaminediacetic acid, hydroxyethylethylenediaminetriacetic acid (HEDTA), dihydroxyethylethylenediaminetetraacetic acid (DHEDDA), nitrilotriacetic acid (NTA), and hydroxyethyl.
  • EDTA ethylenediaminetetraacetic acid
  • HEDTA ethylenediaminediacetic acid
  • HEDTA hydroxyethylethylenediaminetriacetic acid
  • DHEDDA dihydroxyethylethylenediaminetetraacetic acid
  • NTA nitrilotriacetic acid
  • Iminodiacetic acid HIDA
  • ⁇ -alanine diacetic acid cyclohexanediamine tetraacetic acid
  • iminodiacetic acid N- (2-hydroxyethyl) iminodiacetic acid, diethylenetriaminepentaacetic acid, N- (2-hydroxyethyl) ethylenediaminetriacetic acid, glycol ether diamine Tetraacetic acid
  • glutamic acid diacetic acid aspartic acid diacetic acid, methylglycine diacetic acid, iminodisuccinic acid, serine diacetic acid, hydroxyiminodisuccinic acid, dihydroxy Chirugurishin, aspartic acid, and glutamic acid, as well as derivatives such as their salts and esters.
  • aromatic or aliphatic carboxylic acid-based chelating agents include glyoxylic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, sebacic acid, azelaic acid, itaconic acid, aconitic acid, and pyruvic acid.
  • Gluconic acid Gluconic acid
  • pyromellitic acid benzopolycarboxylic acid
  • cyclopentanetetracarboxylic acid salicylic acid
  • acetylsalicylic acid hydroxybenzoic acid
  • aminobenzoic acid including anthranilic acid
  • phthalic acid fumaric acid
  • trimellitic acid gallic acid And hexahydrophthalic acid, and salts and derivatives thereof.
  • amino acid chelating agents include glycine, serine, alanine, lysine, cystine, cysteine, ethionine, tyrosine, and methionine, and salts and derivatives thereof.
  • ether carboxylates examples include carboxymethyl tarturonate, carboxymethyloxysuccinate, oxydisuccinate, tartaric acid monosuccinate, and tartaric acid disuccinate, and salts and derivatives thereof.
  • Examples of the phosphonic acid chelating agent include iminodimethylphosphonic acid, alkyldiphosphonic acid, 1-hydroxyethane-1,1-diphosphonic acid and phytic acid, and salts and derivatives thereof.
  • hydroxycarboxylic acid chelating agent examples include malic acid, citric acid, glycolic acid, gluconic acid, heptonic acid, tartaric acid, and lactic acid, and salts and derivatives thereof.
  • polymer electrolyte (including oligomer electrolyte) chelating agent examples include acrylic acid polymer, maleic anhydride polymer, ⁇ -hydroxyacrylic acid polymer, itaconic acid polymer, and two constituent monomers of these polymers.
  • the copolymer which consists of the above and an epoxy succinic acid polymer are mentioned.
  • polyalcohol examples include ethylene glycol, pyrocatechol, pyrogallol, bisphenol, tannic acid, and derivatives thereof.
  • polyol polyalcohol such as polyethylene glycol which has been used for enhancing the low-temperature stability of the cleaning composition.
  • the chelating agent to be contained as the second component may be composed of one kind of substance or may be composed of two or more kinds of substances.
  • the cleaning performance is often improved.
  • at least an aminopolycarboxylic acid chelating agent, an amino acid chelating agent and a nitrogen-containing chelating agent are contained in the nitrogen-containing material, and at least a phosphonic acid chelating agent is contained in the phosphorus-containing material.
  • the processing oil may contain a component containing an alkaline earth metal such as calcium.
  • the chelating agent to be contained as the second component has a chelating function with respect to the alkaline earth metal, so that the removal target component composed of the component containing the alkaline earth metal can be efficiently cleaned. It can be removed from the member.
  • the content of the chelating agent to be contained as the second component should be set in consideration of the same factors as in the case of the type of chelating agent. This point will be described later.
  • the cleaning composition according to this embodiment may contain a surfactant as the second component.
  • the kind is not particularly limited. Further, the surfactant may be composed of one type of substance or may be composed of a plurality of types of substances.
  • the surfactant include an anionic surfactant, a nonionic surfactant, an amphoteric surfactant, a semipolar surfactant, and an anionic surfactant.
  • anionic surfactant examples include polyoxyethylene alkyl sulfate, alkyl or alkenyl sulfate, polyoxyethylene alkyl or alkenyl sulfate, alkyl benzene sulfonate, alkane sulfonate, alkyl or alkenyl ether.
  • Carboxylate, ⁇ -sulfo fatty acid derivative, ⁇ -olefin sulfonate, ⁇ -sulfo fatty acid alkyl ester salt, sulfosuccinate, alkyl phosphate ester salt, natural fatty acid soap, alkyl ethoxy sulfate, amide ether carboxylic acid, amino acid anion activator Etc. are exemplified.
  • nonionic surfactant examples include polyoxyalkylene alkyl ether, fatty acid alkanolamide, polyoxyethylene sorbitan ester, sorbitan ester, sorbitol ester, sucrose fatty acid ester, methyl glucoside ester, methyl mannoside ester, ethyl Glucoside ester, N-methyl glucamide, cyclic N-methyl glucamide, alkyl glucoside, alkyl polyglucoside, alkyl glyceryl ether, polyoxyethylene alkyl ether, sorbitan fatty acid ester, polyoxyethylene acyl ester, fatty acid glycoside ester, fatty acid methyl glycoside
  • esters and alkylmethylglucamides examples include esters and alkylmethylglucamides.
  • amphoteric surfactant examples include carboxybetaine, aminocarboxylate, alkylsulfobetaine, hydroxyalkylsulfobetaine, alkylimidazolinium betaine, alkylbetaine, and alkylamidopropylbetaine.
  • semipolar surfactant examples include alkylamine oxide, alkylamidoamine oxide, alkylhydroxyamine oxide and the like.
  • cationic surfactant examples include dilong chain alkyldimethyl quaternary ammonium ions, long chain alkyldimethyl quaternary ammonium ions, alkylammonium ions, and quaternary ammonium ions. These are usually blended in the form of hydrochloride.
  • anionic surfactants and nonionic surfactants are preferred.
  • specific examples of preferable surfactants include alkyl ether sulfate, sodium alkylbenzene sulfonate, polyoxyethylene alkyl ether, coconut fatty acid alkanolamide, and fatty acid amidopropyl betaine.
  • the cleaning composition according to the present embodiment contains a chelating agent and a surfactant as the second component
  • the content of the chelating agent with respect to the content of the surfactant in the cleaning composition according to the present embodiment the ratio R c of the amount it is preferably set according to the removal target components to be attached to the cleaning member.
  • the ratio Rc may be lowered when manufacturing the cleaning composition.
  • a calcium-based additive is added to the processing oil for the purpose of improving processability when the member to be cleaned is manufactured by machining, and therefore a lot of such substances are included in the components to be removed. It is preferable to use a large amount of a chelating agent having an excellent ability to wash such substances. Therefore, in such a case, the ratio Rc may be increased when manufacturing the cleaning composition.
  • the cleaning composition according to the present embodiment may contain components other than the chelating agent and the surfactant as the second component, as long as the low temperature stability is not significantly inhibited.
  • examples of such components include sequestering agents, neutral inorganic salts, antioxidants and antifoaming agents. What is necessary is just to set these content suitably.
  • a solvent may be included as a second component for concentration adjustment.
  • a polar solvent such as an alcohol may be used in addition to water, but the type and amount used should not significantly inhibit the low-temperature stability of the cleaning composition according to this embodiment. It is.
  • the manufacturing method of the cleaning composition which concerns on this embodiment is not specifically limited.
  • Raw material that provides ingredients to be included as a detergent composition that is, a potassium source that provides potassium ions, a sodium source that provides sodium ions, a silicic acid source and water that provides a water-soluble silicic acid compound, and, if necessary, a chelate
  • a second component such as an agent and a surfactant may be appropriately mixed to form a solution.
  • a mixture of some or all of these components may be heated. The heating temperature for heating is arbitrary. In order to mitigate the influence of the component that generates heat of dissolution, the above mixture may be cooled.
  • first aqueous composition used for preparing the cleaning composition according to the present embodiment is one comprising the above-mentioned silicate-containing aqueous solution. Since the cleaning composition which concerns on this embodiment can be manufactured only by mixing this 1st aqueous composition and 2nd component, it is preferable. Further, since the first aqueous composition itself has excellent low-temperature stability, it can be stably stored even in a low-temperature environment as high as ⁇ 20 ° C.
  • the cleaning composition which concerns on this embodiment manufactured using this 1st aqueous composition is shown, a manufacturing method provided with the process of mixing a 1st aqueous composition and a chelating agent will be implemented. By this, the cleaning composition which concerns on this embodiment containing a silicate containing aqueous solution and a chelating agent is obtained. By performing the manufacturing method including the step of mixing the first aqueous composition and the surfactant, the cleaning composition according to this embodiment containing the silicate-containing aqueous solution and the surfactant is obtained.
  • a cleaning agent according to this embodiment containing a silicate-containing aqueous solution, a chelating agent, and a surfactant by carrying out a production method comprising a step of mixing the first aqueous composition, the chelating agent, and the surfactant.
  • a composition is obtained.
  • the silicate-containing aqueous solution described above As another one of the aqueous compositions used for preparing the cleaning composition according to this embodiment (hereinafter, also referred to as “second aqueous composition”), the silicate-containing aqueous solution described above and When a composition comprising a chelating agent that is one of the second components is used, the second aqueous composition and the second component (which may be a chelating agent) are simply mixed and the present embodiment is applied. Since a cleaning composition can be manufactured, it is preferable. Further, unless the content of the chelating agent contained in the second aqueous composition is excessively high, the second aqueous composition itself has excellent low-temperature stability, so that it reaches ⁇ 20 ° C. Even in a low temperature environment, it can be stably stored.
  • the upper and lower limits of the content of the chelating agent that can be contained in the second aqueous composition are determined by the type of chelating agent, the composition of the silicate-containing aqueous solution, etc., it cannot be defined definitely. However, it is preferably 0.5% by mass or more and 30% by mass or less, and more preferably 2.5% by mass or more and 25% by mass with respect to the silicate-containing aqueous solution.
  • Cleaning Method Storage Method, Transport Method (1) Cleaning Method
  • the cleaning composition according to this embodiment described above can be obtained as it is or by appropriately diluting with a solvent such as water.
  • the dilution ratio is arbitrary, and is set as appropriate according to the type and amount of the component to be removed (oil etc.) adhering to the member to be cleaned.
  • the member to be cleaned can be cleaned by bringing the obtained cleaning liquid into contact with the member to be cleaned.
  • the material of the member to be cleaned is not particularly limited, but unless the cleaning composition according to the present embodiment contains a special second component, since the cleaning liquid is alkaline, its surface is constituted by a material that is not easily affected by alkali. It is preferable.
  • a member to be cleaned having a surface made of a metal-based material such as an iron-based material is exemplified.
  • the shape of the member to be cleaned is also arbitrary, and may be a primary processed product such as a plate, bar, wire, or the like, or a secondary processed product such as a bolt, nut, pressed product, bent product, forged product, or cast product. It may be a processed product or a product being processed.
  • the contact method between the member to be cleaned and the cleaning liquid is arbitrary, and the member to be cleaned may be immersed in the cleaning liquid, or the cleaning liquid may be sprayed onto the member to be cleaned.
  • the member to be cleaned may be rubbed with a brush, waste cloth, sponge, or the like.
  • the member to be cleaned may be cleaned while applying an ultrasonic impact, or the cleaning liquid may be heated. Thereafter, by washing with water and drying, the member to be cleaned from which the object to be removed attached thereto has been removed can be obtained.
  • the cleaning composition and the aqueous composition (first aqueous composition, second aqueous composition) according to this embodiment have excellent low-temperature stability. Therefore, even if these cleaning compositions or aqueous compositions are stored in an environment of ⁇ 20 ° C. or higher and lower than ⁇ 5 ° C., the possibility of causing problems such as poor flow during storage is sufficiently reduced. Yes. Further, even when these detergent compositions or aqueous compositions are transported in an environment of ⁇ 20 ° C. or higher and lower than ⁇ 5 ° C., the possibility that they cause problems such as poor flow is sufficiently reduced.
  • Example 1 Potassium source and 48% aqueous solution of KOH as part of the water supply source, sodium source and a 50% aqueous solution of Na 2 O ⁇ SiO 2 as a part of the water supply source, and a source of water needed As a part, pure water is mixed in an amount as shown in Tables 1 to 3 (units are parts by mass), and the test solutions of Test Nos. 1 to 27 are composed of a silicate-containing aqueous solution. Created as a thing. Specifically, a 48% aqueous solution of KOH and / or a 50% aqueous solution of Na 2 O ⁇ SiO 2 were mixed, or these were added to pure water. Since heat was generated when these components were mixed, a colorless and transparent test solution could be obtained without particular heating by adjusting the mixing amount and addition amount of these components.
  • test solution 125 ml of the test solution was placed in two 250 ml plastic (polypropylene) containers, the upper part of the container was covered with a transparent sheet, and the inside of the container was sealed.
  • One container with the test solution was left in an environment at ⁇ 5 ° C., and the other container with the test solution was left in an environment at ⁇ 20 ° C.
  • the test liquid in each container was visually observed in an environment of ⁇ 20 ° C., and the liquid property was confirmed by rocking the container as necessary.
  • the low temperature stability of each test solution was evaluated by determining which of the following states “A” to “F” belonged to.
  • the state of the test solution in the container placed in an environment of ⁇ 20 ° C. is any one of “A”, “B”, and “C”
  • the silicate-containing aqueous solution and the washing related to the test solution The agent composition was determined to be excellent in low temperature stability.
  • it is compared with the fluidity at 30 ° C.
  • test liquid to be evaluated has fluidity.
  • A The transparent appearance is maintained and has fluidity equivalent to that at the beginning of manufacture.
  • B The transparent appearance is maintained and has fluidity, but the viscosity is slightly higher than that at the beginning of manufacture.
  • C The transparent appearance is maintained and manufactured.
  • D Transparent appearance is maintained, but fluidity is poor
  • E Precipitation is observed and the transparent appearance is not maintained, fluidity is increased.
  • Evaluation results are shown in Tables 1 to 3.
  • the solution of test number 1 was also determined to be B even when evaluated when the standing time in an environment of ⁇ 20 ° C. exceeded 1300 hours. Further, the solutions of Test Nos. 3, 9 and 10 were also judged as A even when evaluated when the standing time in an environment of ⁇ 20 ° C. passed 1300 hours. Even if the solutions of test numbers 11 to 14, 17 to 21, 23 and 24 were evaluated when the standing time in an environment of ⁇ 20 ° C. passed 800 hours, the results were evaluated when 500 hours passed. The result was the same.
  • the solution of test number 25 was evaluated as E when it was evaluated when the standing time in an environment of ⁇ 20 ° C. passed 800 hours.

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Abstract

Provided is a fluid detergent composition that exhibits excellent low-temperature stability and contains an alkaline silicate-containing aqueous solution comprising potassium ions, sodium ions, a water-soluble silicic-anhydride compound, and water. Potassium, in terms of KOH, constitutes at least 10.0% of the mass of said silicate-containing aqueous solution; the quotient of the number of moles of potassium and the number of moles of sodium in the silicate-containing aqueous solution is greater than or equal to 0.5; the water-soluble silicic-anhydride compound, in terms of SiO2, constitutes 1.0-24% of the mass of the silicate-containing aqueous solution; water constitutes at most 75% of the mass of the silicate-containing aqueous solution; and the silicate-containing aqueous solution exhibits fluidity even if let sit for 500 hours at a temperature of −20°C.

Description

洗浄剤組成物、およびその製造方法、ならびにその洗浄剤組成物の保管および運搬方法Cleaning composition, method for producing the same, and method for storing and transporting the cleaning composition
 本発明は、洗浄剤組成物、およびその製造方法、ならびにその洗浄剤組成物の保管および運搬方法に関する。 The present invention relates to a cleaning composition, a method for producing the same, and a method for storing and transporting the cleaning composition.
 液状洗浄剤組成物(本明細書において、「液状洗浄剤組成物」とは、液体のみからなる洗浄剤組成物のみならず、洗浄剤組成物として通常使用されうる下限の流動性(具体的には粘度として4500mPa・s程度以下である。)を維持する範囲で固体が分散する洗浄剤組成物も含む。)は、洗浄機能、すなわち、被洗浄部材に付着している油分などの除去対象成分を除去する機能に優れることばかりでなく、その保管時の安定性について優れることが求められる場合がある。 Liquid detergent composition (in the present specification, “liquid detergent composition” means not only a liquid detergent composition, but also a lower limit fluidity (specifically, a liquid detergent composition that can be normally used as a detergent composition). Includes a cleaning composition in which solids are dispersed within a range that maintains a viscosity of 4500 mPa · s or less.) Is a cleaning function, that is, components to be removed such as oil adhering to the member to be cleaned. In addition to being excellent in the function of removing water, it may be required to be excellent in stability during storage.
 液状洗浄剤組成物の保管時の安定性を失う要因の一つに、保管環境が低温であることが挙げられる。それゆえ、液状洗浄剤組成物には、洗浄剤組成物が低温環境下にあっても、洗浄剤組成物の凍結や、洗浄剤組成物内に析出物が発生してその流動性が通常使用されうる下限の流動性未満となってしまうこと(以下、「流動不良」という。)が発生する可能性が十分に低減されていることが、低温安定性として求められる場合がある。洗浄剤組成物が低温安定性に優れる場合には、ポンプ補給などによって洗浄剤組成物を洗浄槽内に補給するにあたり、供給量の制御性が低下したり、供給できなくなったりする不具合が発生しにくい。 One reason for the loss of stability during storage of the liquid detergent composition is that the storage environment is low temperature. Therefore, liquid detergent compositions are usually used even when the detergent composition is in a low-temperature environment because the detergent composition is frozen or precipitates are generated in the detergent composition. It may be required as low temperature stability that the possibility of occurrence of less than the lower limit flowability (hereinafter referred to as “flow failure”) is sufficiently reduced. If the cleaning composition is excellent in low-temperature stability, the supply of cleaning composition into the cleaning tank by replenishing the pump, etc. may cause problems such as reduced controllability of the supply amount or inability to supply. Hateful.
 低温安定性を確保しうる下限温度は、その液状洗浄剤組成物の想定される使用環境に応じて設定されるが、通常、例えば特許文献1に記載されるように、下限温度は-5℃とされる場合が多い。 The lower limit temperature at which low temperature stability can be ensured is set according to the assumed use environment of the liquid detergent composition. Usually, for example, as described in Patent Document 1, the lower limit temperature is −5 ° C. It is often said.
 しかしながら、製造された液状洗浄剤組成物を目的地に運搬する場合や、保管環境が特に制御されていない場合など、外気とほぼ同じ環境に液状洗浄剤組成物が置かれる場合には、低温安定性を確保しうる下限温度(以下、「保存下限温度」ともいう。)として-20℃が求められる場合がある。液状洗浄剤組成物の保存下限温度が-20℃である場合には、世界的に見ても、シベリアの一部、北アメリカの北部など限られた一部以外であれば、外気とほぼ同じ環境に液状洗浄剤組成物が置かれても、凍結や流動不良が発生する可能性は十分に低いといえる。 However, when the manufactured liquid detergent composition is transported to a destination, or when the storage environment is not particularly controlled, the liquid detergent composition is placed in almost the same environment as the outside air. In some cases, −20 ° C. is required as a lower limit temperature (hereinafter also referred to as “storage lower limit temperature”) that can secure the properties. When the minimum storage temperature of the liquid detergent composition is −20 ° C., it is almost the same as the outside air even if it is a part of Siberia, the northern part of North America, etc. Even if the liquid detergent composition is placed in the environment, the possibility of freezing and poor flow is sufficiently low.
 このような保存下限温度が-20℃である液状洗浄剤組成物を実現するには、例えば特許文献2や3に開示されるように、低温安定性を向上させるための成分を液状洗浄剤組成物に含有させることが一般的である。 In order to realize such a liquid detergent composition having a storage minimum temperature of −20 ° C., for example, as disclosed in Patent Documents 2 and 3, a component for improving low-temperature stability is used as a liquid detergent composition. It is common to make it contain in a thing.
 具体的には、特許文献2には、界面活性剤を20~50重量%の範囲で含有する透明な液体洗浄剤組成物であって、(a)アルファオレフィンスルホン酸またはそのアルカリ金属塩と、(b)ポリオキシエチレンアルキル硫酸またはそのアルカリ金属塩と、(c)マグネシウム塩とを含有し、上記(a)成分/(b)成分が重量比で90/10~10/90の範囲で、かつ{(a)成分+(b)成分}/(c)成分がモル比で99/1~75/25の範囲であることを特徴とする透明液体洗浄剤組成物が開示されている。特許文献2に開示される組成物において、アルファオレフィンスルホン酸またはそのアルカリ金属塩とポリオキシエチレンアルキル硫酸またはそのアルカリ金属塩とマグネシウム塩とが凍結抑制剤として位置付けられている。 Specifically, Patent Document 2 discloses a transparent liquid detergent composition containing a surfactant in the range of 20 to 50% by weight, comprising (a) alpha-olefin sulfonic acid or an alkali metal salt thereof, (B) containing polyoxyethylene alkylsulfuric acid or an alkali metal salt thereof and (c) a magnesium salt, wherein the component (a) / component (b) is in the range of 90/10 to 10/90 by weight, A transparent liquid detergent composition is disclosed wherein the {(a) component + (b) component} / (c) component is in the range of 99/1 to 75/25 in molar ratio. In the composition disclosed in Patent Document 2, alpha olefin sulfonic acid or its alkali metal salt and polyoxyethylene alkylsulfuric acid or its alkali metal salt and magnesium salt are positioned as freeze inhibitors.
 特許文献3には、アルカリ剤20~60重量%を含むアルカリ液体洗浄剤組成物中に、ホスホノブタントリカルボン酸或はその塩を0.1~10重量%配合したことを特徴とする高濃度アルカリ液体洗浄剤組成物が開示されている。特許文献2に開示される組成物において、ホスホノブタントリカルボン酸およびその塩の少なくとも一方が凍結抑制剤として位置付けられている。 Patent Document 3 discloses a high concentration characterized by containing 0.1 to 10% by weight of phosphonobutanetricarboxylic acid or a salt thereof in an alkaline liquid detergent composition containing 20 to 60% by weight of an alkaline agent. An alkaline liquid detergent composition is disclosed. In the composition disclosed in Patent Document 2, at least one of phosphonobutanetricarboxylic acid and a salt thereof is positioned as a freezing inhibitor.
特開2009-242643号公報JP 2009-242643 A 特開平6-346099号公報JP-A-6-346099 特開2000-303099号公報JP 2000-303099 A
 しかしながら、近年、洗浄剤組成物に含有される成分が被洗浄部材に残留することに起因して被洗浄部材を備える製品の品質が低下する問題が生じる場合があり、こうした問題が発生する可能性を低減させる能力を洗浄剤組成物が有していることが求められる場合がある。このような観点に加え、廃液処理負荷の緩和、製造コストの低減などの観点から、洗浄剤組成物に含有される成分数は低下する傾向がある。 However, in recent years, there may be a problem that the quality of a product including a member to be cleaned is deteriorated due to the components contained in the cleaning composition remaining in the member to be cleaned, and such a problem may occur. In some cases, it is required that the cleaning composition has an ability to reduce the amount. In addition to such a viewpoint, the number of components contained in the cleaning composition tends to decrease from the viewpoint of reducing the waste liquid treatment load and reducing the manufacturing cost.
 そのように単純化された組成の場合には、上記の特許文献2や3に示されるような手法はもはや適用できず、保存下限温度を-20℃としうる、優れた低温安定性を有する洗浄剤組成物を得ることは困難となっている。 In the case of such a simplified composition, the technique as shown in the above-mentioned Patent Documents 2 and 3 can no longer be applied, and the cleaning minimum temperature can be set to −20 ° C. and has excellent low-temperature stability. It is difficult to obtain an agent composition.
 本発明はかかる現状を鑑み、優れた低温安定性を有する流動性の洗浄剤組成物を提供することを課題とする。なお、本明細書において、「流動性を有する」とは、前述の流動不良が発生していないことを意味し、具体的には、粘度が4500mPa・s以下であることを意味する。 In view of the present situation, an object of the present invention is to provide a fluid detergent composition having excellent low-temperature stability. In the present specification, “having fluidity” means that the above-mentioned flow failure does not occur, and specifically means that the viscosity is 4500 mPa · s or less.
 上記課題を解決するために提供される本発明は次のとおりである。
(1)カリウムイオンとナトリウムイオンと水溶性無水ケイ酸化合物と水とからなるアルカリ性のケイ酸塩含有水溶液を含有し、流動性を有する洗浄剤組成物であって、前記ケイ酸塩含有水溶液のカリウム分はKOH換算で10.0質量%以上であり、前記ケイ酸塩含有水溶液におけるカリウム分のナトリウム分に対するモル比は0.5以上であり、前記ケイ酸塩含有水溶液における水溶性無水ケイ酸化合物の含有量がSiO換算で1.0質量%以上24質量%以下であって、前記ケイ酸塩含有水溶液に含有される水分の含有量が75質量%以下であり、前記ケイ酸塩含有水溶液は-20℃の環境下に500時間静置されても流動性を有するものであることを特徴とする洗浄剤組成物。
The present invention provided to solve the above problems is as follows.
(1) An alkaline silicate-containing aqueous solution comprising potassium ions, sodium ions, a water-soluble anhydrous silicic acid compound and water, and having a fluidity, wherein the silicate-containing aqueous solution The potassium content is 10.0% by mass or more in terms of KOH, the molar ratio of the potassium content to the sodium content in the silicate-containing aqueous solution is 0.5 or more, and the water-soluble silicic acid anhydride in the silicate-containing aqueous solution. The content of the compound is 1.0% by mass or more and 24% by mass or less in terms of SiO 2 , and the content of water contained in the silicate-containing aqueous solution is 75% by mass or less, and the silicate content A cleaning composition, wherein the aqueous solution has fluidity even when left in a -20 ° C environment for 500 hours.
(2)ポリエーテルポリオールを含む凍結抑制剤(A);ホスホノブタントリカルボン酸およびその塩の少なくとも一種を含む凍結抑制剤(B);ならびにアルファオレフィンスルホン酸またはそのアルカリ金属塩とポリオキシエチレンアルキル硫酸またはそのアルカリ金属塩とマグネシウム塩とを含む凍結抑制剤(C)のいずれも実質的に含有しない上記(1)に記載の洗浄剤組成物。 (2) Freezing inhibitor containing polyether polyol (A); Freezing inhibitor (B) containing at least one of phosphonobutanetricarboxylic acid and its salt; and alpha olefin sulfonic acid or its alkali metal salt and polyoxyethylene alkyl The cleaning composition according to the above (1), which does not substantially contain any of the freezing inhibitor (C) containing sulfuric acid or its alkali metal salt and magnesium salt.
(3)前記ケイ酸塩含有水溶液は、カリウムの水酸化物、ナトリウムの水酸化物、カリウムの水酸化物の水溶液、カリウムの水酸化物の水溶液、酸化カリウムと無水ケイ酸との混合物、酸化ナトリウムと無水ケイ酸との混合物、酸化カリウムと無水ケイ酸との混合物の水溶液、酸化ナトリウムと無水ケイ酸との混合物の水溶液、および水からなる群から選ばれる二種以上から形成される上記(1)または(2)に記載の洗浄剤組成物。 (3) The silicate-containing aqueous solution includes potassium hydroxide, sodium hydroxide, potassium hydroxide aqueous solution, potassium hydroxide aqueous solution, a mixture of potassium oxide and anhydrous silicic acid, oxidation The above formed from two or more kinds selected from the group consisting of a mixture of sodium and silicic acid, an aqueous solution of a mixture of potassium oxide and silicic acid, an aqueous solution of a mixture of sodium oxide and silicic acid, and water ( The cleaning composition according to 1) or (2).
(4)前記ケイ酸塩含有水溶液は、ナトリウムの水酸化物の水溶液、酸化カリウムと無水ケイ酸との混合物の水溶液、および水から形成される上記(3)に記載の洗浄剤組成物。 (4) The cleaning composition according to (3), wherein the silicate-containing aqueous solution is formed from an aqueous solution of sodium hydroxide, an aqueous solution of a mixture of potassium oxide and anhydrous silicic acid, and water.
(5)キレート剤をさらに含有する上記(1)から(4)のいずれか一項に記載の洗浄剤組成物。 (5) The cleaning composition according to any one of (1) to (4), further including a chelating agent.
(6)前記キレート剤が窒素含有物質およびリン含有物質の少なくとも一種を含有する上記(5)に記載の洗浄剤組成物。 (6) The cleaning composition according to (5), wherein the chelating agent contains at least one of a nitrogen-containing substance and a phosphorus-containing substance.
(7)前記キレート剤がアルカリ土類金属に対するキレート機能を有する上記(5)または(6)に記載の洗浄剤組成物。 (7) The cleaning composition according to (5) or (6), wherein the chelating agent has a chelating function with respect to an alkaline earth metal.
(8)界面活性剤に含有する上記(2)から(4)のいずれか一項に記載の洗浄剤組成物。 (8) The cleaning composition according to any one of (2) to (4), which is contained in a surfactant.
(9)界面活性剤をさらに含有する上記(5)から(7)のいずれか一項に記載の洗浄剤組成物。 (9) The cleaning composition according to any one of (5) to (7), further including a surfactant.
(10)上記(1)から(9)のいずれか一項に記載される洗浄剤組成物を調製するための水性組成物であって、上記(1)から(4)のいずれか一項に記載されるケイ酸塩含有水溶液からなることを特徴とする水性組成物。 (10) An aqueous composition for preparing the cleaning composition described in any one of (1) to (9) above, which is any one of (1) to (4) above An aqueous composition comprising the silicate-containing aqueous solution described.
(11)上記(10)に記載される水性組成物とキレート剤とを混合する工程を備える製造方法により得られたものである、上記(1)から(4)のいずれか一項に記載されるケイ酸塩含有水溶液と前記キレート剤とを含有する洗浄剤組成物。 (11) It is obtained by the manufacturing method provided with the process of mixing the aqueous composition and chelating agent described in said (10), It is described in any one of said (1) to (4) A detergent composition comprising a silicate-containing aqueous solution and the chelating agent.
(12)上記(10)に記載される水性組成物と界面活性剤とを混合する工程を備える製造方法により得られたものである、上記(1)から(4)のいずれか一項に記載されるケイ酸塩含有水溶液と前記界面活性剤とを含有する洗浄剤組成物。 (12) The method according to any one of (1) to (4), which is obtained by a production method including a step of mixing the aqueous composition described in (10) and a surfactant. A detergent composition comprising a silicate-containing aqueous solution and the surfactant.
(13)上記(10)に記載される水性組成物、キレート剤および界面活性剤を混合する工程を備える製造方法により得られたものである、上記(1)から(4)のいずれか一項に記載されるケイ酸塩含有水溶液、前記キレート剤および前記界面活性剤とを含有する洗浄剤組成物。 (13) Any one of (1) to (4) above, which is obtained by a production method comprising the step of mixing the aqueous composition, chelating agent and surfactant described in (10) above. A cleaning composition containing the silicate-containing aqueous solution described in 1., the chelating agent and the surfactant.
(14)上記(1)から(9)のいずれか一項に記載される洗浄剤組成物を調製するための水性組成物であって、上記(1)から(4)のいずれか一項に記載される前記ケイ酸塩含有水溶液とキレート剤とからなることを特徴とする水性組成物。 (14) An aqueous composition for preparing the cleaning composition described in any one of (1) to (9) above, which is any one of (1) to (4) above An aqueous composition comprising the described silicate-containing aqueous solution and a chelating agent.
(15)上記(14)に記載されるケイ酸塩含有水溶液とおよび界面活性剤とを混合する工程を備える製造方法により得られたものである、上記(1)から(4)のいずれか一項に記載されるケイ酸塩含有水溶液、前記キレート剤および前記界面活性剤とを含有する洗浄剤組成物。 (15) Any one of (1) to (4) above, which is obtained by a production method comprising a step of mixing the silicate-containing aqueous solution described in (14) above and a surfactant. A cleaning composition containing the silicate-containing aqueous solution described in the paragraph, the chelating agent, and the surfactant.
(16)上記(9)、(13)および(15)のいずれか一項に記載される洗浄剤組成物の製造方法であって、前記洗浄剤組成物における、前記界面活性剤の含有量に対する前記キレート剤の含有量の比率Rを、被洗浄部材に付着する除去対象成分に応じて設定することを特徴とする洗浄剤組成物の製造方法。 (16) The method for producing a cleaning composition according to any one of (9), (13) and (15) above, with respect to the content of the surfactant in the cleaning composition. method for producing a detergent composition the ratio R c of the content of the chelating agent, and setting in response to the removal target components to be attached to the cleaning member.
(17)前記除去対象成分がアルカリ土類金属を含有する成分を有する場合に、前記比率Rを高める上記(16)に記載の製造方法。 (17) The manufacturing method according to (16), wherein the ratio R c is increased when the component to be removed has a component containing an alkaline earth metal.
(18)上記(1)から(9)、(11)から(13)および(15)から(17)のいずれか一項に記載される洗浄剤組成物を用いて被洗浄部材を洗浄する洗浄方法。 (18) Cleaning for cleaning the member to be cleaned using the cleaning composition described in any one of (1) to (9), (11) to (13) and (15) to (17) Method.
(19)上記(1)から(9)、(11)から(13)および(15)のいずれか一項に記載される洗浄剤組成物を-20℃以上-5℃未満の環境に保管する洗浄剤組成物の保管方法。 (19) Store the cleaning composition described in any one of (1) to (9), (11) to (13) and (15) in an environment of -20 ° C or higher and lower than -5 ° C. Storage method of cleaning composition.
(20)上記(10)または(14)に記載される水性組成物を-20℃以上-5℃未満の環境に保管する水性組成物の保管方法。 (20) A method for storing an aqueous composition, wherein the aqueous composition described in (10) or (14) is stored in an environment of −20 ° C. or higher and lower than −5 ° C.
(21)上記(1)から(9)、(11)から(13)および(15)のいずれか一項に記載される洗浄剤組成物を-20℃以上-5℃未満の環境にて運搬する洗浄剤組成物の運搬方法。 (21) Transporting the cleaning composition according to any one of (1) to (9), (11) to (13) and (15) in an environment of -20 ° C or higher and lower than -5 ° C A method for transporting a cleaning composition.
(22)上記(10)または(14)に記載される水性組成物を-20℃以上-5℃未満の環境にて運搬する洗浄剤組成物の運搬方法。 (22) A method for transporting a cleaning composition, comprising transporting the aqueous composition described in (10) or (14) above in an environment of −20 ° C. or higher and lower than −5 ° C.
 本発明によれば、保存下限温度を-20℃以下としうる、優れた低温安定性を有する洗浄液組成物が提供される。 According to the present invention, there is provided a cleaning liquid composition having excellent low-temperature stability, which can have a storage minimum temperature of −20 ° C. or lower.
 本発明の実施形態について説明する。
 本実施形態に係る洗浄剤組成物は、流動性を有する。本実施形態において流動性を有するとは、前述のように粘度として4500mPa・s以下であることを意味する。本実施形態に係る洗浄剤組成物は好ましくは、コロイドまたは液体であって、可視サイズの固体を実質的に含まないことが好ましい。そのような固体を含有する場合には、低温時にこれを核として結晶化が進行する可能性が高まる、またはそのような結晶化が始まる温度が高くなる可能性がある。
An embodiment of the present invention will be described.
The cleaning composition according to this embodiment has fluidity. In this embodiment, having fluidity means that the viscosity is 4500 mPa · s or less as described above. The cleaning composition according to the present embodiment is preferably a colloid or a liquid and is substantially free of visible-size solids. In the case of containing such a solid, there is a possibility that crystallization will proceed with this as a nucleus at a low temperature, or the temperature at which such crystallization starts may increase.
1.ケイ酸塩含有水溶液
 本実施形態に係る洗浄剤組成物は、カリウムイオンとナトリウムイオンと水溶性無水ケイ酸化合物と水とからなるアルカリ性のケイ酸塩含有水溶液を含有する。
1. Silicate-containing aqueous solution The cleaning composition according to this embodiment contains an alkaline silicate-containing aqueous solution composed of potassium ions, sodium ions, a water-soluble anhydrous silicic acid compound, and water.
 ここで、本実施形態において、「水」とは、水分子、水素イオンおよび水酸化物イオンからなる一群の物質の総称であり、本実施形態に係るケイ酸塩含有水溶液はアルカリ性であるから、水に含まれる水素イオン濃度は水に含まれる水酸化物イオンよりも低い。 Here, in the present embodiment, “water” is a general term for a group of substances consisting of water molecules, hydrogen ions and hydroxide ions, and the silicate-containing aqueous solution according to the present embodiment is alkaline. The hydrogen ion concentration contained in water is lower than the hydroxide ions contained in water.
 また、本実施形態において「ケイ酸塩含有水溶液を含有する」とは次の場合を含む。
 (A)本実施形態に係る洗浄剤組成物を製造する際にケイ酸塩含有水溶液を原料の少なくとも一部とする場合
 (B)本実施形態に係る洗浄剤組成物がケイ酸塩含有水溶液以外の成分(本実施形態において「第二成分」という。)を含有する場合において、本実施形態に係る洗浄剤組成物の組成から第二成分を理論上除外して得られる仮想的なケイ酸塩含有水溶液が、後述する組成上の条件を満たす場合
In the present embodiment, “containing a silicate-containing aqueous solution” includes the following cases.
(A) When manufacturing the cleaning composition which concerns on this embodiment at the time of making silicate containing aqueous solution at least one part of a raw material (B) The cleaning composition which concerns on this embodiment other than silicate containing aqueous solution A hypothetical silicate obtained by theoretically excluding the second component from the composition of the cleaning agent composition according to the present embodiment in the case of containing the component (referred to as “second component” in the present embodiment) When the aqueous solution contains the following compositional requirements
 実施形態に係るケイ酸塩含有水溶液中において、カリウムイオンおよびナトリウムイオンは、水和していたり、無水ケイ酸と水などを介して化学的に相互作用していたりする。 In the silicate-containing aqueous solution according to the embodiment, potassium ions and sodium ions are hydrated or chemically interact via silicic anhydride and water.
 本実施形態において、「水溶性無水ケイ酸化合物」とは、無水ケイ酸(SiO)分子および無水ケイ酸が、水など本実施形態に係るケイ酸塩含有水溶液に含有される他の物質(具体的には、水分子および他の無水ケイ酸分子が例示される。)と化学的に相互作用した状態にあるものの総称である。 In the present embodiment, the “water-soluble silicic acid anhydride compound” refers to other substances (such as water) in which the silicic acid (SiO 2 ) molecule and the silicic acid anhydride are contained in the silicate-containing aqueous solution according to the present embodiment, such as water. Specifically, water molecules and other silicic acid molecules are exemplified.) A general term for those in a state of chemically interacting with each other.
 本実施形態に係るケイ酸塩含有水溶液は、カリウムイオン、ナトリウムイオン、水溶性無水ケイ酸化合物および水以外の成分を実質的に含まない。ここで、「実質的に含まない」とは、ケイ酸塩含有水溶液が、その製造過程において不可避的に混入する不純物(リチウム成分、マグネシウム成分、アルミニウム成分など)を含む場合もあることを意味する。 The silicate-containing aqueous solution according to the present embodiment is substantially free of components other than potassium ions, sodium ions, water-soluble silicate compounds and water. Here, “substantially free” means that the silicate-containing aqueous solution may contain impurities (lithium component, magnesium component, aluminum component, etc.) that are inevitably mixed in the production process. .
(1)組成
 本実施形態に係るケイ酸塩含有水溶液は、次の組成上の条件を満たすことによって、-20℃の環境下に500時間静置されても流動性を有することができる。
(1) Composition By satisfying the following compositional conditions, the silicate-containing aqueous solution according to the present embodiment can have fluidity even when left in an environment of −20 ° C. for 500 hours.
(1-1)カリウム分
 本実施形態に係るケイ酸塩含有水溶液のカリウム分(本実施形態において、「カリウム分」とは、ケイ酸塩含有水溶液に含まれるカリウムを含有する成分の含有量を意味する。)はKOH換算で10.0質量%以上である。水に対する溶解度はナトリウムに比べてカリウムの方が高いため、ケイ酸塩含有水溶液のカリウム分がKOH換算で10.0質量%未満となると、-5℃程度までであれば流動性を有する状態にある場合であっても、-20℃まで冷却されると沈殿が生じるなどして流動性を失ってしまう。したがって、そのようなケイ酸塩含有水溶液を含有する洗浄剤組成物には流動不良などの問題が発生してしまう。-20℃に保管されたときに洗浄剤組成物に流動不良などの問題が発生する可能性をさらに低減させる観点から、本実施形態に係るケイ酸塩含有水溶液のカリウム分はKOH換算で11質量%以上とすることが好ましく、18質量%以上とすることがより好ましく、25質量%以上とすることがさらに好ましい。
 実施形態に係るケイ酸塩含有水溶液のカリウム分の上限は、水溶性無水ケイ酸化合物や水など他の成分との関係で適宜設定されるべきものである。
(1-1) Potassium content Potassium content of the silicate-containing aqueous solution according to the present embodiment (in this embodiment, "potassium content" refers to the content of the component containing potassium contained in the silicate-containing aqueous solution. Means 10.0% by mass or more in terms of KOH. Since the solubility in water is higher in potassium than in sodium, when the potassium content of the silicate-containing aqueous solution is less than 10.0% by mass in terms of KOH, it has fluidity if it is up to about −5 ° C. Even in some cases, when it is cooled to −20 ° C., the fluidity is lost due to precipitation. Therefore, problems such as poor flow occur in the cleaning composition containing such a silicate-containing aqueous solution. From the viewpoint of further reducing the possibility of problems such as poor flow in the cleaning composition when stored at −20 ° C., the potassium content of the silicate-containing aqueous solution according to this embodiment is 11 mass in terms of KOH. % Or more, more preferably 18% by mass or more, and further preferably 25% by mass or more.
The upper limit of the potassium content of the silicate-containing aqueous solution according to the embodiment should be appropriately set in relation to other components such as a water-soluble silicic acid anhydride compound and water.
(1-2)カリウム分のナトリウム分に対するモル比
 本実施形態に係るケイ酸塩含有水溶液におけるカリウム分のナトリウム分に対するモル比(本実施形態において「K/Na比」ともいう。)は、0.5以上である。K/Na比を0.5以上とし、上記のカリウム分などの条件をも満たすことにより、-20℃の環境下に500時間置かれても流動不良などの問題が発生しにくい洗浄剤組成物を得ることが実現される。K/Na比が0.5未満となると、上記のカリウム分に関する条件を満たすことが困難になり、-20℃に保管されたときに洗浄剤組成物に流動不良などの問題が発生する可能性が高まる。流動不良の発生の可能性を、さらに長期、例えば800時間以上にわたってより安定的に低減させる観点から、本実施形態に係るケイ酸塩含有水溶液のK/Na比を0.6以上とすることが好ましく、1.5以上とすることがより好ましく、5以上とすることがさらに好ましい。
 本実施形態に係るケイ酸塩含有水溶液のK/Na比の上限は、水溶性無水ケイ酸化合物や水など他の成分との関係で適宜設定されるべきものである。
(1-2) Molar ratio of potassium to sodium content The molar ratio of potassium to sodium content in the silicate-containing aqueous solution according to this embodiment (also referred to as “K / Na ratio” in this embodiment) is 0. .5 or more. A detergent composition in which the K / Na ratio is 0.5 or more and the above-mentioned conditions such as the potassium content are satisfied, so that problems such as poor flow are less likely to occur even when placed in an environment of −20 ° C. for 500 hours. Is realized. When the K / Na ratio is less than 0.5, it becomes difficult to satisfy the above-mentioned conditions regarding potassium content, and problems such as poor flow may occur in the detergent composition when stored at −20 ° C. Will increase. From the viewpoint of more stably reducing the possibility of occurrence of poor flow over a longer period, for example, 800 hours or more, the K / Na ratio of the silicate-containing aqueous solution according to this embodiment may be 0.6 or more. Preferably, it is 1.5 or more, more preferably 5 or more.
The upper limit of the K / Na ratio of the silicate-containing aqueous solution according to the present embodiment should be appropriately set in relation to other components such as a water-soluble silicic acid anhydride compound and water.
(1-3)水溶性無水ケイ酸化合物の含有量
 本実施形態に係るケイ酸塩含有水溶液における水溶性無水ケイ酸化合物の含有量は、SiO換算で1.0質量%以上24質量%以下である。この範囲にあることで、-20℃に保管されたときにケイ酸塩含有水溶液が流動性を失う可能性を低減させることができる。特に、水溶性無水ケイ酸化合物のSiO換算含有量が1.0質量%未満の場合には、-5℃程度までであれば流動性を有する状態にある場合であっても、-20℃まで冷却されると沈殿が生じるなどして流動性を失う可能性が高まる。この可能性をより安定的に低減させる観点から、水溶性無水ケイ酸化合物のSiO換算含有量は1.0質量%以上20.0質量%以下とすることが好ましく、5.0質量%以上15.0質量%以下とすることがより好ましい。
(1-3) Content of Water-Soluble Silicic Acid Compound The content of the water-soluble silicic acid compound in the silicate-containing aqueous solution according to this embodiment is 1.0% by mass or more and 24% by mass or less in terms of SiO 2. It is. By being in this range, the possibility that the aqueous solution containing silicate loses its fluidity when stored at −20 ° C. can be reduced. In particular, when the SiO 2 equivalent content of the water-soluble silicic acid compound is less than 1.0% by mass, it is −20 ° C. even if it has fluidity up to about −5 ° C. When it is cooled down, the possibility of losing fluidity increases due to precipitation. From the viewpoint of more stably reducing this possibility, the content of the water-soluble silicic acid compound in terms of SiO 2 is preferably 1.0% by mass or more and 20.0% by mass or less, and 5.0% by mass or more. More preferably, it is 15.0% by mass or less.
(1-4)水分含有量
 本実施形態に係るケイ酸塩含有水溶液における水分の含有量は75質量%以下である。この範囲にあることで、-20℃に保管されたときにケイ酸塩含有水溶液が流動性を失う可能性を低減させることができる。水分の含有量が過度に高くなると、凝固点降下による凍結防止の効果が得られにくくなり、ケイ酸塩含有水溶液が流動性を失う傾向が見られやすくなる。かかる傾向が現れる可能性をより安定的に低減させる観点から、水分の含有量は70質量%以下とすることが好ましい。また、水分の含有量を低下させることにより、水溶性無水ケイ酸化合物を相対的に多く含有させることができる。そのような場合には洗浄力が高まる場合もあるため、用途に応じて水分を65質量%以下として水溶性無水ケイ酸化合物の含有量を高めることがさらに好ましいときもある。
 一方、水分の含有量の下限は、単独では規定されない。例えば、水分の含有量が少なくなって、結果的に水溶性無水ケイ酸化合物のSiO換算含有量の含有量が高まれば、ケイ酸塩含有水溶液が流動性を失う可能性が高まる。また、カリウム分が少ない場合や、K/Na比が小さい場合には、相対的に溶解度の低いナトリウムを含有する成分の含有量(ナトリウム分)が増加するため、ケイ酸塩含有水溶液が流動性を失う傾向が顕在化しやすくなる。こうした問題が発生する可能性をより安定的に低減する観点から、水分の含有量の下限は、40%以上とすることが好ましく、45%以上とすることがより好ましい。上記の問題が発生する可能性をさらに安定的に低減するとともに、取り扱い性が低下する可能性を低減したり、過度に濃厚液となって安全管理上の問題が発生する可能性を回避したりする観点から、ケイ酸塩含有水溶液中の水分の含有量は49.0質量%以上とすることが好ましく、50.0質量%以上とすることがより好ましい。流動性が低下することに起因する問題が発生する可能性を特に長期にわたって安定的に低減する観点から、ケイ酸塩含有水溶液中の水分の含有量は51質量%以上とすることが好ましく、52質量%以上とすることがより好ましい。
(1-4) Water Content The water content in the silicate-containing aqueous solution according to this embodiment is 75% by mass or less. By being in this range, the possibility that the aqueous solution containing silicate loses its fluidity when stored at −20 ° C. can be reduced. If the water content is excessively high, it becomes difficult to obtain the effect of freezing prevention due to the freezing point depression, and the silicate-containing aqueous solution tends to lose its fluidity. From the viewpoint of more stably reducing the possibility of such a tendency, the water content is preferably 70% by mass or less. Moreover, by reducing the water content, a relatively large amount of the water-soluble silicic anhydride compound can be contained. In such a case, the detergency may increase, so it may be more preferable to increase the content of the water-soluble silicic acid anhydride by setting the water content to 65% by mass or less depending on the application.
On the other hand, the lower limit of the moisture content is not singly defined. For example, when there are fewer active water content, consequently if the content of SiO 2 in terms the content of the water-soluble silicic anhydride compound Takamare, silicate-containing aqueous solution is more likely to lose fluidity. In addition, when the potassium content is low or the K / Na ratio is low, the content (sodium content) of sodium-containing components with relatively low solubility increases, so that the silicate-containing aqueous solution is fluid. The tendency to lose is easily manifested. From the viewpoint of more stably reducing the possibility of such a problem, the lower limit of the moisture content is preferably 40% or more, and more preferably 45% or more. Reduce the possibility of the above problems more stably, reduce the possibility of poor handling, avoid the possibility of safety management problems due to excessively concentrated liquids, etc. From this viewpoint, the water content in the silicate-containing aqueous solution is preferably 49.0% by mass or more, and more preferably 50.0% by mass or more. From the viewpoint of stably reducing the possibility of problems due to lowering of fluidity particularly over a long period of time, the water content in the silicate-containing aqueous solution is preferably 51% by mass or more, 52 It is more preferable to set it as mass% or more.
(2)材料成分
 本実施形態に係るケイ酸塩含有水溶液を構成する材料成分は特に限定されない。例えば、次の成分からなる群から選ばれる二種以上から形成されるようにしてもよい。
  カリウムの水酸化物、
  ナトリウムの水酸化物、
  カリウムの水酸化物の水溶液、
  カリウムの水酸化物の水溶液、
  酸化カリウムと無水ケイ酸との混合物、
  酸化ナトリウムと無水ケイ酸との混合物、
  酸化カリウムと無水ケイ酸との混合物の水溶液、
  酸化ナトリウムと無水ケイ酸との混合物の水溶液、および
  水。
(2) Material component The material component which comprises the silicate containing aqueous solution which concerns on this embodiment is not specifically limited. For example, you may make it form from 2 or more types chosen from the group which consists of the following component.
Potassium hydroxide,
Sodium hydroxide,
Aqueous solution of potassium hydroxide,
Aqueous solution of potassium hydroxide,
A mixture of potassium oxide and silicic anhydride,
A mixture of sodium oxide and silicic anhydride,
An aqueous solution of a mixture of potassium oxide and silicic anhydride,
An aqueous solution of a mixture of sodium oxide and silicic acid, and water.
 さらに具体的な一例を挙げれば、ケイ酸塩含有水溶液は、ナトリウムの水酸化物の水溶液、酸化カリウムと無水ケイ酸との混合物の水溶液、および水から形成されるものとしてもよい。アルカリ金属の水酸化物および酸化カリウムと無水ケイ酸との混合物は、あらかじめ水溶液としておいた方が、取扱いが容易である。また、いずれも強アルカリ性物質であるから、粉体などの固体として取り扱うと、安全衛生上の問題が生じる可能性が高まる。 As a more specific example, the silicate-containing aqueous solution may be formed from an aqueous solution of sodium hydroxide, an aqueous solution of a mixture of potassium oxide and anhydrous silicic acid, and water. Alkali metal hydroxides and a mixture of potassium oxide and silicic anhydride are easier to handle if they are previously stored in an aqueous solution. In addition, since both are strong alkaline substances, handling them as solids such as powder increases the possibility of problems in health and safety.
2.第二成分
 本実施形態に係る洗浄剤組成物は、第二成分として、ケイ酸塩含有水溶液を構成する成分以外の成分(溶媒も含む。)をさらに含有してもよい。なお、前述のように、洗浄剤組成物の組成を単純化する近時の要請に応える観点から、本実施形態に係る洗浄剤組成物は、前述のケイ酸塩含有水溶液のみまたはこれを溶媒で希釈したものを用いてもよい。
2. Second Component The cleaning composition according to the present embodiment may further contain a component (including a solvent) other than the components constituting the silicate-containing aqueous solution as the second component. As described above, from the viewpoint of meeting the recent demand for simplifying the composition of the cleaning composition, the cleaning composition according to the present embodiment includes only the above-mentioned silicate-containing aqueous solution or a solvent. A diluted one may be used.
 また、本実施形態に係る洗浄剤組成物は、特許文献2や3に開示されるような、ポリエーテルポリオールを含む凍結抑制剤(A);ホスホノブタントリカルボン酸およびその塩の少なくとも一方を含む凍結抑制剤(B);ならびにアルファオレフィンスルホン酸またはそのアルカリ金属塩とポリオキシエチレンアルキル硫酸またはそのアルカリ金属塩とマグネシウム塩とを含む凍結抑制剤(C)のいずれも、第二成分として含有しないことが好ましい。また、不凍液に多用されるポリエチレングリコールも、第二成分として含有しないことが好ましい。 In addition, the cleaning composition according to the present embodiment includes at least one of a freeze inhibitor (A) containing a polyether polyol (phosphonobutanetricarboxylic acid and a salt thereof) as disclosed in Patent Documents 2 and 3. Freezing inhibitor (B); and none of freezing inhibitor (C) containing alpha olefin sulfonic acid or its alkali metal salt and polyoxyethylene alkylsulfuric acid or its alkali metal salt and magnesium salt are contained as the second component It is preferable. Moreover, it is preferable not to contain the polyethylene glycol often used for antifreeze as a second component.
(1)キレート剤
 第二成分はキレート剤を含有してもよい。キレート剤の具体的な種類は特に限定されない。被洗浄部材の組成、被洗浄部材の表面に付着した除去対象成分の組成、被洗浄部材の洗浄後の状態において求められる品質(表面残留物質の許容程度など)、さらには洗浄剤組成物の組成などを考慮して適宜設定すればよい。
(1) Chelating agent The second component may contain a chelating agent. The specific kind of chelating agent is not particularly limited. The composition of the member to be cleaned, the composition of the component to be removed adhering to the surface of the member to be cleaned, the quality required in the state after cleaning of the member to be cleaned (such as the allowable level of surface residual substances), and the composition of the cleaning composition It may be set as appropriate in consideration of the above.
 キレート剤としては、例えば、アミノポリカルボン酸系キレート剤、芳香族または脂肪族カルボン酸系キレート剤、アミノ酸系キレート剤、エーテルカルボン酸系キレート剤、ホスホン酸系キレート剤、ヒドロキシカルボン酸系キレート剤、高分子電解質(オリゴマー電解質を含む)系キレート剤、ポリアルコール、ジメチルグリオキシム等の窒素含有キレート剤、チオグリコール酸等の硫黄含有キレート剤などが挙げられる。 Examples of chelating agents include aminopolycarboxylic acid chelating agents, aromatic or aliphatic carboxylic acid chelating agents, amino acid chelating agents, ether carboxylic acid chelating agents, phosphonic acid chelating agents, and hydroxycarboxylic acid chelating agents. , Polymer electrolyte (including oligomer electrolyte) chelating agents, nitrogen-containing chelating agents such as polyalcohol and dimethylglyoxime, and sulfur-containing chelating agents such as thioglycolic acid.
 これらのキレート剤の形態は任意であり、例えば酸系キレート剤の場合には、フリーの酸型であっても、ナトリウム塩、カリウム塩、アンモニウム塩等の塩の形であってもよい。さらに、それらは、加水分解可能なそれらのエステル誘導体の形であってもよい。 The form of these chelating agents is arbitrary. For example, in the case of an acid-based chelating agent, it may be in the free acid form or in the form of a salt such as sodium salt, potassium salt or ammonium salt. Furthermore, they may be in the form of their ester derivatives which are hydrolysable.
 アミノポリカルボン酸系キレート剤としては、例えば、エチレンジアミンテトラ酢酸(EDTA)、エチレンジアミンジ酢酸、ヒドロキシエチルエチレンジアミン三酢酸(HEDTA)、ジヒドロキシエチルエチレンジアミン四酢酸(DHEDDA)、ニトリロ三酢酸(NTA)、ヒドロキシエチルイミノ二酢酸(HIDA)、β-アラニンジ酢酸、シクロヘキサンジアミンテトラ酢酸、イミノジ酢酸、N-(2-ヒドロキシエチル)イミノジ酢酸、ジエチレントリアミンペンタ酢酸、N-(2-ヒドロキシエチル)エチレンジアミントリ酢酸、グリコールエーテルジアミンテトラ酢酸、グルタミン酸ジ酢酸、アスパラギン酸ジ酢酸、メチルグリシンジ酢酸、イミノジコハク酸、セリンジ酢酸、ヒドロキシイミノジコハク酸、ジヒドロキシエチルグリシン、アスパラギン酸、およびグルタミン酸、ならびにこれらの塩類およびエステル類など誘導体が挙げられる。 Examples of aminopolycarboxylic acid chelating agents include ethylenediaminetetraacetic acid (EDTA), ethylenediaminediacetic acid, hydroxyethylethylenediaminetriacetic acid (HEDTA), dihydroxyethylethylenediaminetetraacetic acid (DHEDDA), nitrilotriacetic acid (NTA), and hydroxyethyl. Iminodiacetic acid (HIDA), β-alanine diacetic acid, cyclohexanediamine tetraacetic acid, iminodiacetic acid, N- (2-hydroxyethyl) iminodiacetic acid, diethylenetriaminepentaacetic acid, N- (2-hydroxyethyl) ethylenediaminetriacetic acid, glycol ether diamine Tetraacetic acid, glutamic acid diacetic acid, aspartic acid diacetic acid, methylglycine diacetic acid, iminodisuccinic acid, serine diacetic acid, hydroxyiminodisuccinic acid, dihydroxy Chirugurishin, aspartic acid, and glutamic acid, as well as derivatives such as their salts and esters.
 芳香族または脂肪族カルボン酸系キレート剤としては、例えば、グリオキシル酸、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、セバシン酸、アゼライン酸、イタコン酸、アコニット酸、ピルビン酸、グルコン酸、ピロメリット酸、ベンゾポリカルボン酸、シクロペンタンテトラカルボン酸、サリチル酸、アセチルサリチル酸、ヒドロキシ安息香酸、アミノ安息香酸(アントラニル酸を含む)、フタル酸、フマル酸、トリメリット酸、没食子酸、およびヘキサヒドロフタル酸、ならびにこれらの塩類および誘導体が挙げられる。 Examples of aromatic or aliphatic carboxylic acid-based chelating agents include glyoxylic acid, oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, sebacic acid, azelaic acid, itaconic acid, aconitic acid, and pyruvic acid. , Gluconic acid, pyromellitic acid, benzopolycarboxylic acid, cyclopentanetetracarboxylic acid, salicylic acid, acetylsalicylic acid, hydroxybenzoic acid, aminobenzoic acid (including anthranilic acid), phthalic acid, fumaric acid, trimellitic acid, gallic acid And hexahydrophthalic acid, and salts and derivatives thereof.
 アミノ酸系キレート剤としては、例えば、グリシン、セリン、アラニン、リジン、シスチン、システイン、エチオニン、チロシン、およびメチオニン、ならびにこれらの塩類および誘導体が挙げられる。 Examples of amino acid chelating agents include glycine, serine, alanine, lysine, cystine, cysteine, ethionine, tyrosine, and methionine, and salts and derivatives thereof.
 エーテルカルボン酸塩としては、カルボキシメチルタルトロネート、カルボキシメチルオキシサクシネート、オキシジサクシネート、酒石酸モノサクシネート、および酒石酸ジサクシネート、ならびにこれらの塩類および誘導体が挙げられる。 Examples of the ether carboxylates include carboxymethyl tarturonate, carboxymethyloxysuccinate, oxydisuccinate, tartaric acid monosuccinate, and tartaric acid disuccinate, and salts and derivatives thereof.
 ホスホン酸系キレート剤としては、例えば、イミノジメチルホスホン酸、アルキルジホスホン酸、1-ヒドロキシエタン-1,1-ジホスホン酸およびフィチン酸、ならびにこれらの塩類および誘導体が挙げられる。 Examples of the phosphonic acid chelating agent include iminodimethylphosphonic acid, alkyldiphosphonic acid, 1-hydroxyethane-1,1-diphosphonic acid and phytic acid, and salts and derivatives thereof.
 ヒドロキシカルボン酸系キレート剤としては、例えば、リンゴ酸、クエン酸、グリコール酸、グルコン酸、ヘプトン酸、酒石酸、および乳酸、ならびにこれらの塩類および誘導体が挙げられる。 Examples of the hydroxycarboxylic acid chelating agent include malic acid, citric acid, glycolic acid, gluconic acid, heptonic acid, tartaric acid, and lactic acid, and salts and derivatives thereof.
 高分子電解質(オリゴマー電解質を含む)系キレート剤としては、例えば、アクリル酸重合体、無水マレイン酸重合体、α-ヒドロキシアクリル酸重合体、イタコン酸重合体、これらの重合体の構成モノマー2種以上からなる共重合体およびエポキシコハク酸重合体が挙げられる。 Examples of the polymer electrolyte (including oligomer electrolyte) chelating agent include acrylic acid polymer, maleic anhydride polymer, α-hydroxyacrylic acid polymer, itaconic acid polymer, and two constituent monomers of these polymers. The copolymer which consists of the above and an epoxy succinic acid polymer are mentioned.
 ポリアルコールとしては、エチレングリコール、ピロカテコール、ピロガロール、ビスフェノール、およびタンニン酸、ならびにこれらの誘導体が挙げられる。なお、洗浄組成物の低温安定性を高めるために使用されてきたポリエチレングリコールのようなポリオールポリアルコールは使用しないことが好ましい。 Examples of the polyalcohol include ethylene glycol, pyrocatechol, pyrogallol, bisphenol, tannic acid, and derivatives thereof. In addition, it is preferable not to use a polyol polyalcohol such as polyethylene glycol which has been used for enhancing the low-temperature stability of the cleaning composition.
 第二成分として含有させるキレート剤は一種類の物質から構成されていてもよいし、二種類以上の物質から構成されていてもよい。 The chelating agent to be contained as the second component may be composed of one kind of substance or may be composed of two or more kinds of substances.
 第二成分として含有させるキレート剤が窒素含有物質およびリン含有物質の少なくとも一種を含有する場合に、洗浄性能が高まる場合が多い。上記の例示した中では、少なくともアミノポリカルボン酸系キレート剤、アミノ酸系キレート剤および窒素含有キレート剤が窒素含有物質に含まれ、少なくともホスホン酸系キレート剤がリン含有物質に含まれる。 When the chelating agent contained as the second component contains at least one of a nitrogen-containing substance and a phosphorus-containing substance, the cleaning performance is often improved. In the above examples, at least an aminopolycarboxylic acid chelating agent, an amino acid chelating agent and a nitrogen-containing chelating agent are contained in the nitrogen-containing material, and at least a phosphonic acid chelating agent is contained in the phosphorus-containing material.
 被洗浄部材の材料によっては、被洗浄部材が機械加工される際に、加工油にカルシウムなどのアルカリ土類金属を含有する成分が含まれている場合がある。そのような場合には、第二成分として含有させるキレート剤がアルカリ土類金属に対するキレート機能を有することにより、そのようなアルカリ土類金属を含有する成分からなる除去対象成分を効率的に被洗浄部材から除去することができる。 Depending on the material of the member to be cleaned, when the member to be cleaned is machined, the processing oil may contain a component containing an alkaline earth metal such as calcium. In such a case, the chelating agent to be contained as the second component has a chelating function with respect to the alkaline earth metal, so that the removal target component composed of the component containing the alkaline earth metal can be efficiently cleaned. It can be removed from the member.
 第二成分として含有させるキレート剤の含有量はキレート剤の種類の場合と同様の因子を適宜考慮して設定されるべきものである。なお、この点については、後述する。 The content of the chelating agent to be contained as the second component should be set in consideration of the same factors as in the case of the type of chelating agent. This point will be described later.
(2)界面活性剤
 本実施形態に係る洗浄剤組成物は、第二成分として界面活性剤を含有してもよい。その種類は特に限定されない。また、界面活性剤は一種類の物質から構成されていてもよいし、複数種類の物質から構成されていてもよい。
(2) Surfactant The cleaning composition according to this embodiment may contain a surfactant as the second component. The kind is not particularly limited. Further, the surfactant may be composed of one type of substance or may be composed of a plurality of types of substances.
 界面活性剤の具体例として、アニオン系界面活性剤、ノニオン系界面活性剤、両性界面活性剤、半極性界面活性剤、アニオン系界面活性剤等が挙げられる。 Specific examples of the surfactant include an anionic surfactant, a nonionic surfactant, an amphoteric surfactant, a semipolar surfactant, and an anionic surfactant.
 アニオン系界面活性剤としては、具体的には、ポリオキシエチレンアルキル硫酸塩、アルキルまたはアルケニル硫酸塩、ポリオキシエチレンアルキルまたはアルケニル硫酸エステル塩、アルキルベンゼンスルホン酸塩、アルカンスルホン酸塩、アルキルまたはアルケニルエーテルカルボン酸塩、αスルホ脂肪酸誘導体、αオレフィンスルホン酸塩、αスルホ脂肪酸アルキルエステル塩、スルホコハク酸塩、アルキルリン酸エステル塩、天然脂肪酸石鹸、アルキルエトキシサルフェート、アミドエーテルカルボン酸、アミノ酸系アニオン活性剤等が例示される。 Specific examples of the anionic surfactant include polyoxyethylene alkyl sulfate, alkyl or alkenyl sulfate, polyoxyethylene alkyl or alkenyl sulfate, alkyl benzene sulfonate, alkane sulfonate, alkyl or alkenyl ether. Carboxylate, α-sulfo fatty acid derivative, α-olefin sulfonate, α-sulfo fatty acid alkyl ester salt, sulfosuccinate, alkyl phosphate ester salt, natural fatty acid soap, alkyl ethoxy sulfate, amide ether carboxylic acid, amino acid anion activator Etc. are exemplified.
 ノニオン系界面活性剤としては、具体的には、ポリオキシアルキレンアルキルエーテル、脂肪酸アルカノールアミド、ポリオキシエチレンソルビタンエステル、ソルビタンエステル、ソルビトールエステル、蔗糖脂肪酸エステル、メチルグルコシドエステル、メチルマンノシドエステル、エチルグルコシドエステル、N-メチルグルカミド、環状N-メチルグルカミド、アルキルグルコシド、アルキルポリグルコシド、アルキルグリセリルエーテル、ポリオキシエチレンアルキルエーテル、ソルビタン脂肪酸エステル、ポリオキシエチレンアシルエステル、脂肪酸グリコシドエステル、脂肪酸メチルグリコシドエステル、アルキルメチルグルカミド等が例示される。 Specific examples of the nonionic surfactant include polyoxyalkylene alkyl ether, fatty acid alkanolamide, polyoxyethylene sorbitan ester, sorbitan ester, sorbitol ester, sucrose fatty acid ester, methyl glucoside ester, methyl mannoside ester, ethyl Glucoside ester, N-methyl glucamide, cyclic N-methyl glucamide, alkyl glucoside, alkyl polyglucoside, alkyl glyceryl ether, polyoxyethylene alkyl ether, sorbitan fatty acid ester, polyoxyethylene acyl ester, fatty acid glycoside ester, fatty acid methyl glycoside Examples include esters and alkylmethylglucamides.
 両性界面活性剤としては、具体的には、カルボキシベタイン、アミノカルボン酸塩、アルキルスルホベタイン、ヒドロキシアルキルスルホベタイン、アルキルイミダゾリニウムベタイン、アルキルベタイン、アルキルアミドプロピルベタイン等が例示される。 Specific examples of the amphoteric surfactant include carboxybetaine, aminocarboxylate, alkylsulfobetaine, hydroxyalkylsulfobetaine, alkylimidazolinium betaine, alkylbetaine, and alkylamidopropylbetaine.
 半極性界面活性剤としては、具体的には、アルキルアミンオキシド、アルキルアミドアミンオキシド、アルキルヒドロキシアミンオキシド等が例示される。 Specific examples of the semipolar surfactant include alkylamine oxide, alkylamidoamine oxide, alkylhydroxyamine oxide and the like.
 カチオン系界面活性剤の具体例として、ジ長鎖アルキルジメチル4級アンモニウムイオン、長鎖アルキルジメチル4級アンモニウムイオン、アルキルアンモニウムイオン、第4級アンモニウムイオンが挙げられる。これらは、通常、塩酸塩などの形態で配合される。 Specific examples of the cationic surfactant include dilong chain alkyldimethyl quaternary ammonium ions, long chain alkyldimethyl quaternary ammonium ions, alkylammonium ions, and quaternary ammonium ions. These are usually blended in the form of hydrochloride.
 これらの界面活性剤の中で、アニオン系界面活性剤およびノニオン系界面活性剤が好ましい。更に、好ましい界面活性剤の具体例として、アルキルエーテル硫酸エステル、アルキルベンゼンスルホン酸ナトリウム、ポリオキシエチレンアルキルエーテル、ヤシ脂肪酸アルカノールアミド、および脂肪酸アミドプロピルベタインが挙げられる。 Of these surfactants, anionic surfactants and nonionic surfactants are preferred. Furthermore, specific examples of preferable surfactants include alkyl ether sulfate, sodium alkylbenzene sulfonate, polyoxyethylene alkyl ether, coconut fatty acid alkanolamide, and fatty acid amidopropyl betaine.
 本実施形態に係る洗浄剤組成物が、キレート剤および界面活性剤を第二成分として含有する場合には、本実施形態に係る洗浄剤組成物における、界面活性剤の含有量に対するキレート剤の含有量の比率Rを、被洗浄部材に付着する除去対象成分に応じて設定することが好ましい。例えば、除去対象成分の主成分が鉱物油であって、添加成分をほとんど含有しないような場合には、油性物質を洗浄する能力に優れる界面活性剤を多めに用いることが好ましい。したがって、このような場合には、洗浄剤組成物を製造する際に上記の比率Rが低くなるようにすればよい。一方、被洗浄部材を機械加工により製造する際に加工性を改善するなどの目的で例えばカルシウム系の添加剤が加工油に添加され、それゆえ除去対象成分にそのような物質が多く含まれる場合には、そのような物質を洗浄する能力に優れるキレート剤を多めに用いることが好ましい。したがって、このような場合には、洗浄剤組成物を製造する際に上記の比率Rが高くなるようにすればよい。 In the case where the cleaning composition according to the present embodiment contains a chelating agent and a surfactant as the second component, the content of the chelating agent with respect to the content of the surfactant in the cleaning composition according to the present embodiment the ratio R c of the amount, it is preferably set according to the removal target components to be attached to the cleaning member. For example, when the main component of the component to be removed is mineral oil and hardly contains any added component, it is preferable to use a large amount of a surfactant having an excellent ability to clean the oily substance. Therefore, in such a case, the ratio Rc may be lowered when manufacturing the cleaning composition. On the other hand, for example, a calcium-based additive is added to the processing oil for the purpose of improving processability when the member to be cleaned is manufactured by machining, and therefore a lot of such substances are included in the components to be removed. It is preferable to use a large amount of a chelating agent having an excellent ability to wash such substances. Therefore, in such a case, the ratio Rc may be increased when manufacturing the cleaning composition.
(3)その他の成分
 本実施形態に係る洗浄剤組成物は、その低温安定性を著しく阻害しない限り、第二成分として、キレート剤や界面活性剤以外の成分を含有してもよい。そのような成分として、金属イオン封鎖剤、中性無機塩、酸化防止剤および消泡剤が例示される。これらの含有量は、適宜設定すればよい。濃度調整用に溶媒を第二成分として含有させてもよい。この際の溶媒としては、水以外にアルコールなどの極性溶媒を用いてもよいが、その種類および使用量は、本実施形態に係る洗浄剤組成物の低温安定性を著しく阻害しないようにするべきである。
(3) Other components The cleaning composition according to the present embodiment may contain components other than the chelating agent and the surfactant as the second component, as long as the low temperature stability is not significantly inhibited. Examples of such components include sequestering agents, neutral inorganic salts, antioxidants and antifoaming agents. What is necessary is just to set these content suitably. A solvent may be included as a second component for concentration adjustment. As a solvent in this case, a polar solvent such as an alcohol may be used in addition to water, but the type and amount used should not significantly inhibit the low-temperature stability of the cleaning composition according to this embodiment. It is.
3.製造方法
 本実施形態に係る洗浄剤組成物の製造方法は特に限定されない。洗浄剤組成物として含有すべき成分を与える原料物質、すなわちカリウムイオンを与えるカリウム源、ナトリウムイオンを与えるナトリウム源、水溶性無水ケイ酸化合物を与える無水ケイ酸源および水、さらに必要に応じてキレート剤や界面活性剤などの第二成分を、適宜混合し、溶液とすればよい。溶液とするにあたり、これらの成分の一部または全部からなる混合物を加熱してもよい。加熱する場合の加熱温度は任意である。溶解熱を発する成分の影響を緩和するために、上記の混合物を冷却してもよい。
3. Manufacturing method The manufacturing method of the cleaning composition which concerns on this embodiment is not specifically limited. Raw material that provides ingredients to be included as a detergent composition, that is, a potassium source that provides potassium ions, a sodium source that provides sodium ions, a silicic acid source and water that provides a water-soluble silicic acid compound, and, if necessary, a chelate A second component such as an agent and a surfactant may be appropriately mixed to form a solution. In preparing a solution, a mixture of some or all of these components may be heated. The heating temperature for heating is arbitrary. In order to mitigate the influence of the component that generates heat of dissolution, the above mixture may be cooled.
 本実施形態に係る洗浄剤組成物の調製するために使用される水性組成物(以下、「第一の水性組成物」ともいう。)として、前述のケイ酸塩含有水溶液からなるものを用いると、この第一の水性組成物と第二成分とを混合するだけで本実施形態に係る洗浄剤組成物を製造することができるため、好ましい。また、その第一の水性組成物自体が優れた低温安定性を有しているため、-20℃に至るほどの低温環境下であっても、安定的に保管しておくことができる。 When an aqueous composition (hereinafter, also referred to as “first aqueous composition”) used for preparing the cleaning composition according to the present embodiment is one comprising the above-mentioned silicate-containing aqueous solution. Since the cleaning composition which concerns on this embodiment can be manufactured only by mixing this 1st aqueous composition and 2nd component, it is preferable. Further, since the first aqueous composition itself has excellent low-temperature stability, it can be stably stored even in a low-temperature environment as high as −20 ° C.
 この第一の水性組成物を用いて製造される本実施形態に係る洗浄剤組成物の具体例を示せば、第一の水性組成物とキレート剤とを混合する工程を備える製造方法を実施することにより、ケイ酸塩含有水溶液とキレート剤とを含有する本実施形態に係る洗浄剤組成物が得られる。第一の水性組成物と界面活性剤を混合する工程を備える製造方法を実施することにより、ケイ酸塩含有水溶液と界面活性剤とを含有する本実施形態に係る洗浄剤組成物が得られる。第一の水性組成物とキレート剤と界面活性剤とを混合する工程を備える製造方法を実施することにより、ケイ酸塩含有水溶液、キレート剤および界面活性剤を含有する本実施形態に係る洗浄剤組成物が得られる。 If the specific example of the cleaning composition which concerns on this embodiment manufactured using this 1st aqueous composition is shown, a manufacturing method provided with the process of mixing a 1st aqueous composition and a chelating agent will be implemented. By this, the cleaning composition which concerns on this embodiment containing a silicate containing aqueous solution and a chelating agent is obtained. By performing the manufacturing method including the step of mixing the first aqueous composition and the surfactant, the cleaning composition according to this embodiment containing the silicate-containing aqueous solution and the surfactant is obtained. A cleaning agent according to this embodiment containing a silicate-containing aqueous solution, a chelating agent, and a surfactant by carrying out a production method comprising a step of mixing the first aqueous composition, the chelating agent, and the surfactant. A composition is obtained.
 本実施形態に係る洗浄剤組成物の調製するために使用される水性組成物の別の一つ(以下、「第二の水性組成物」ともいう。)として、前述のケイ酸塩含有水溶液と第二成分の一つであるキレート剤とからなるものを用いると、この第二の水性組成物と第二成分(キレート剤であってもよい。)とを混合するだけで本実施形態に係る洗浄剤組成物を製造することができるため、好ましい。また、第二の水性組成物に含有されるキレート剤の含有量が過度に高くない限り、第二の水性組成物自体が優れた低温安定性を有しているため、-20℃に至るほどの低温環境下であっても、安定的に保管しておくことができる。なお、第二の水性組成物に含有しうるキレート剤の含有量の上下限は、キレート剤の種類や、ケイ酸塩含有水溶液の組成などによって決定されるため、確定的に規定することはできないが、通常、ケイ酸塩含有水溶液に対して、0.5質量%以上30質量%以下とすることが好ましく、2.5質量%以上25質量%とすることがより好ましい。 As another one of the aqueous compositions used for preparing the cleaning composition according to this embodiment (hereinafter, also referred to as “second aqueous composition”), the silicate-containing aqueous solution described above and When a composition comprising a chelating agent that is one of the second components is used, the second aqueous composition and the second component (which may be a chelating agent) are simply mixed and the present embodiment is applied. Since a cleaning composition can be manufactured, it is preferable. Further, unless the content of the chelating agent contained in the second aqueous composition is excessively high, the second aqueous composition itself has excellent low-temperature stability, so that it reaches −20 ° C. Even in a low temperature environment, it can be stably stored. In addition, since the upper and lower limits of the content of the chelating agent that can be contained in the second aqueous composition are determined by the type of chelating agent, the composition of the silicate-containing aqueous solution, etc., it cannot be defined definitely. However, it is preferably 0.5% by mass or more and 30% by mass or less, and more preferably 2.5% by mass or more and 25% by mass with respect to the silicate-containing aqueous solution.
 この第二の水性組成物を用いて製造される本実施形態に係る洗浄剤組成物の具体例を示せば、第二の水性組成物と界面活性剤とを混合する工程を備える製造方法を実施することにより、ケイ酸塩含有水溶液、キレート剤および界面活性剤とを含有する本実施形態に係る洗浄剤組成物が得られる。 If the specific example of the cleaning composition concerning this embodiment manufactured using this 2nd aqueous composition is shown, a manufacturing method provided with the process of mixing the 2nd aqueous composition and surfactant will be carried out. By doing, the cleaning composition which concerns on this embodiment containing a silicate containing aqueous solution, a chelating agent, and surfactant is obtained.
4.洗浄方法、保管方法、運搬方法
(1)洗浄方法
 以上説明した本実施形態に係る洗浄剤組成物はそのままで、または水などの溶媒により適宜希釈することによって洗浄液を得ることができる。その希釈倍率は任意であり、被洗浄部材に付着する除去対象成分(油分など)の種類や量に応じて適宜設定される。
4). Cleaning Method, Storage Method, Transport Method (1) Cleaning Method The cleaning composition according to this embodiment described above can be obtained as it is or by appropriately diluting with a solvent such as water. The dilution ratio is arbitrary, and is set as appropriate according to the type and amount of the component to be removed (oil etc.) adhering to the member to be cleaned.
 得られた洗浄液を被洗浄部材に接触させることによって、被洗浄部材を洗浄することができる。被洗浄部材の材質は特に限定されないが、本実施形態に係る洗浄剤組成物が特段の第二成分を含有しない限り、洗浄液はアルカリ性であるから、アルカリによって冒されにくい材料によってその表面が構成されていることが好ましい。そのような被洗浄部材の一例として、鉄系材料などの金属系材料からなる表面を有する被洗浄部材が例示される。被洗浄部材の形状も任意であり、板材、棒材、線材といった一次加工品またはその加工途中のものでもよいし、ボルト、ナット、プレス品、曲げ加工品、鍛造品、鋳造品、といった二次加工品またはその加工途中のものでもよい。 The member to be cleaned can be cleaned by bringing the obtained cleaning liquid into contact with the member to be cleaned. The material of the member to be cleaned is not particularly limited, but unless the cleaning composition according to the present embodiment contains a special second component, since the cleaning liquid is alkaline, its surface is constituted by a material that is not easily affected by alkali. It is preferable. As an example of such a member to be cleaned, a member to be cleaned having a surface made of a metal-based material such as an iron-based material is exemplified. The shape of the member to be cleaned is also arbitrary, and may be a primary processed product such as a plate, bar, wire, or the like, or a secondary processed product such as a bolt, nut, pressed product, bent product, forged product, or cast product. It may be a processed product or a product being processed.
 被洗浄部材と洗浄液との接触方法は任意であり、洗浄液内に被洗浄部材を浸漬させてもよいし、洗浄液を被洗浄部材にスプレーしてもよい。洗浄に際して被洗浄部材をブラシ、ウエス、スポンジなどでこすってもよい。また、被洗浄部材に超音波衝撃を加えながら洗浄してもよいし、洗浄液を加熱してもよい。その後、水洗・乾燥することにより、その上に付着していた除去対象物が除去された被洗浄部材を得ることができる。 The contact method between the member to be cleaned and the cleaning liquid is arbitrary, and the member to be cleaned may be immersed in the cleaning liquid, or the cleaning liquid may be sprayed onto the member to be cleaned. During cleaning, the member to be cleaned may be rubbed with a brush, waste cloth, sponge, or the like. Further, the member to be cleaned may be cleaned while applying an ultrasonic impact, or the cleaning liquid may be heated. Thereafter, by washing with water and drying, the member to be cleaned from which the object to be removed attached thereto has been removed can be obtained.
(2)保管方法、運搬方法
 以上説明したように、本実施形態に係る洗浄剤組成物および水性組成物(第一の水性組成物、第二の水性組成物)は、優れた低温安定性を有するため、これらの洗浄剤組成物または水性組成物を-20℃以上-5℃未満の環境に保管しても、それらが保管中に流動不良などの問題を生じる可能性は十分に低減されている。また、これらの洗浄剤組成物または水性組成物を-20℃以上-5℃未満の環境にて運搬しても、それらが流動不良などの問題を生じる可能性も十分に低減されている。
(2) Storage method, transportation method As described above, the cleaning composition and the aqueous composition (first aqueous composition, second aqueous composition) according to this embodiment have excellent low-temperature stability. Therefore, even if these cleaning compositions or aqueous compositions are stored in an environment of −20 ° C. or higher and lower than −5 ° C., the possibility of causing problems such as poor flow during storage is sufficiently reduced. Yes. Further, even when these detergent compositions or aqueous compositions are transported in an environment of −20 ° C. or higher and lower than −5 ° C., the possibility that they cause problems such as poor flow is sufficiently reduced.
 以下、実施例等により本発明をさらに具体的に説明するが、本発明の範囲はこれらの実施例等に限定されるものではない。 Hereinafter, the present invention will be described more specifically with reference to examples and the like, but the scope of the present invention is not limited to these examples and the like.
(実施例1)
 カリウム源および水の供給源の一部としてのKOHの48%水溶液、ナトリウム源および水の供給源の一部としてのNaO・SiOの50%水溶液、ならびに必要に応じ水の供給源の一部として純水を、表1から3に示されるような量(単位はいずれも質量部)で混合して、試験番号1から27の試験液を、ケイ酸塩含有水溶液からなる洗浄剤組成物として作成した。具体的には、KOHの48%水溶液および/またはNaO・SiOの50%水溶液を混合したり、これらを純水に添加したりした。これらの成分の混合にあたり熱が発生したため、これらの混合量や添加量を調整することによって、特に加熱することなく、無色透明の試験液を得ることができた。
(Example 1)
Potassium source and 48% aqueous solution of KOH as part of the water supply source, sodium source and a 50% aqueous solution of Na 2 O · SiO 2 as a part of the water supply source, and a source of water needed As a part, pure water is mixed in an amount as shown in Tables 1 to 3 (units are parts by mass), and the test solutions of Test Nos. 1 to 27 are composed of a silicate-containing aqueous solution. Created as a thing. Specifically, a 48% aqueous solution of KOH and / or a 50% aqueous solution of Na 2 O · SiO 2 were mixed, or these were added to pure water. Since heat was generated when these components were mixed, a colorless and transparent test solution could be obtained without particular heating by adjusting the mixing amount and addition amount of these components.
 得られた試験液のそれぞれについて、250mlのプラスチック(ポリプロピレン)製容器2つの中に、試験液125mlを入れ、容器の上部を透明シートで覆い、容器内を密封した。一方の試験液入り容器は-5℃の環境下に静置し、他方の試験液入り容器は-20℃の環境下に静置した。 For each of the obtained test solutions, 125 ml of the test solution was placed in two 250 ml plastic (polypropylene) containers, the upper part of the container was covered with a transparent sheet, and the inside of the container was sealed. One container with the test solution was left in an environment at −5 ° C., and the other container with the test solution was left in an environment at −20 ° C.
 静置してから3週間後に各容器内の試験液を、-20℃の環境において目視で観察し、必要に応じて容器を揺動させて液性状を確認した。その結果、次の「A」から「F」に示される状態のいずれに属するかを判定することによって、各試験液の低温安定性を評価した。-20℃の環境に静置された容器内の試験液の状態が、「A」、「B」および「C」のいずれかである場合に、その試験液に係るケイ酸塩含有水溶液および洗浄剤組成物は低温安定性に優れると判定した。なお、流動性の評価を行うに際しては、JIS Z8809に準拠した粘度計校正用標準液(種別:JIS14000)の30℃における流動性(粘度として概ね4800mPa・sに相当する。)との対比で、評価対象の試験液が流動性を有するか否かを判定した。 Three weeks after standing, the test liquid in each container was visually observed in an environment of −20 ° C., and the liquid property was confirmed by rocking the container as necessary. As a result, the low temperature stability of each test solution was evaluated by determining which of the following states “A” to “F” belonged to. When the state of the test solution in the container placed in an environment of −20 ° C. is any one of “A”, “B”, and “C”, the silicate-containing aqueous solution and the washing related to the test solution The agent composition was determined to be excellent in low temperature stability. When evaluating the fluidity, it is compared with the fluidity at 30 ° C. of the standard solution for viscosity meter calibration (type: JIS14000) based on JIS Z8809 (corresponding to a viscosity of approximately 4800 mPa · s). It was determined whether the test liquid to be evaluated has fluidity.
  A:透明外観は維持され、製造当初と同等の流動性を有する
  B:透明外観は維持され、流動性を有するが製造当初に比べるとやや粘度が高まっている
  C:透明外観は維持され、製造当初に比べると粘度が高まっているが流動不良には至っていない
  D:透明外観は維持されているものの、流動不良となっている
  E:沈殿物が認められ透明外観は維持されておらず、流動不良となっている
  F:凍結しており、透明外観は維持されていない
A: The transparent appearance is maintained and has fluidity equivalent to that at the beginning of manufacture. B: The transparent appearance is maintained and has fluidity, but the viscosity is slightly higher than that at the beginning of manufacture. C: The transparent appearance is maintained and manufactured. D: Transparent appearance is maintained, but fluidity is poor E: Precipitation is observed and the transparent appearance is not maintained, fluidity is increased. F: Frozen, transparent appearance is not maintained
 評価結果を表1から3に示す。なお、試験番号1の液は、-20℃の環境下での静置時間が1300時間を経過したときに評価しても、やはりBと判定された。また、試験番号3,9および10の液は、-20℃の環境下での静置時間が1300時間を経過したときに評価しても、やはりAと判定された。試験番号11から14,17から21,23および24の液は、-20℃の環境下での静置時間が800時間を経過したときに評価しても、その結果は500時間経過時の評価結果と同じであった。試験番号25の液は、-20℃の環境下での静置時間が800時間を経過したときに評価したところ、Eと判定された。 Evaluation results are shown in Tables 1 to 3. The solution of test number 1 was also determined to be B even when evaluated when the standing time in an environment of −20 ° C. exceeded 1300 hours. Further, the solutions of Test Nos. 3, 9 and 10 were also judged as A even when evaluated when the standing time in an environment of −20 ° C. passed 1300 hours. Even if the solutions of test numbers 11 to 14, 17 to 21, 23 and 24 were evaluated when the standing time in an environment of −20 ° C. passed 800 hours, the results were evaluated when 500 hours passed. The result was the same. The solution of test number 25 was evaluated as E when it was evaluated when the standing time in an environment of −20 ° C. passed 800 hours.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003

Claims (22)

  1.  カリウムイオンとナトリウムイオンと水溶性無水ケイ酸化合物と水とからなるアルカリ性のケイ酸塩含有水溶液を含有し、流動性を有する洗浄剤組成物であって、
     前記ケイ酸塩含有水溶液のカリウム分はKOH換算で10.0質量%以上であり、
     前記ケイ酸塩含有水溶液におけるカリウム分のナトリウム分に対するモル比は0.5以上であり、
     前記ケイ酸塩含有水溶液における水溶性無水ケイ酸化合物の含有量がSiO換算で1.0質量%以上24質量%以下であって、
     前記ケイ酸塩含有水溶液に含有される水分の含有量が75質量%以下であり、
     前記ケイ酸塩含有水溶液は-20℃の環境下に500時間静置されても流動性を有するものであることを特徴とする洗浄剤組成物。
    An alkaline silicate-containing aqueous solution comprising potassium ions, sodium ions, a water-soluble silicic acid anhydride compound and water, and a fluidity cleaning composition comprising:
    The potassium content of the silicate-containing aqueous solution is 10.0% by mass or more in terms of KOH,
    The molar ratio of potassium to sodium in the silicate-containing aqueous solution is 0.5 or more,
    The content of water-soluble silicic anhydride compound in the silicate-containing aqueous solution is not more than 24 mass% 1.0 mass% or more in terms of SiO 2,
    The water content contained in the silicate-containing aqueous solution is 75% by mass or less,
    The cleaning composition, wherein the silicate-containing aqueous solution has fluidity even when left in an environment of -20 ° C for 500 hours.
  2.  ポリエーテルポリオールを含む凍結抑制剤(A);ホスホノブタントリカルボン酸およびその塩の少なくとも一種を含む凍結抑制剤(B);ならびにアルファオレフィンスルホン酸またはそのアルカリ金属塩とポリオキシエチレンアルキル硫酸またはそのアルカリ金属塩とマグネシウム塩とを含む凍結抑制剤(C)のいずれも実質的に含有しない請求項1に記載の洗浄剤組成物。 Freezing inhibitor (A) containing polyether polyol; Freezing inhibitor (B) containing at least one of phosphonobutanetricarboxylic acid and its salt; and alpha olefin sulfonic acid or its alkali metal salt and polyoxyethylene alkyl sulfuric acid or its The cleaning composition of Claim 1 which does not contain substantially any of the freezing inhibitor (C) containing an alkali metal salt and a magnesium salt.
  3.  前記ケイ酸塩含有水溶液は、カリウムの水酸化物、ナトリウムの水酸化物、カリウムの水酸化物の水溶液、カリウムの水酸化物の水溶液、酸化カリウムと無水ケイ酸との混合物、酸化ナトリウムと無水ケイ酸との混合物、酸化カリウムと無水ケイ酸との混合物の水溶液、酸化ナトリウムと無水ケイ酸との混合物の水溶液、および水からなる群から選ばれる二種以上から形成される請求項1または2に記載の洗浄剤組成物。 The silicate-containing aqueous solution includes potassium hydroxide, sodium hydroxide, potassium hydroxide aqueous solution, potassium hydroxide aqueous solution, a mixture of potassium oxide and anhydrous silicic acid, sodium oxide and anhydrous 3. A mixture of silicic acid, an aqueous solution of a mixture of potassium oxide and anhydrous silicic acid, an aqueous solution of a mixture of sodium oxide and anhydrous silicic acid, and two or more selected from the group consisting of water. The cleaning composition described in 1.
  4.  前記ケイ酸塩含有水溶液は、ナトリウムの水酸化物の水溶液、酸化カリウムと無水ケイ酸との混合物の水溶液、および水から形成される請求項3に記載の洗浄剤組成物。 The cleaning composition according to claim 3, wherein the silicate-containing aqueous solution is formed from an aqueous solution of sodium hydroxide, an aqueous solution of a mixture of potassium oxide and anhydrous silicic acid, and water.
  5.  キレート剤をさらに含有する請求項1から4のいずれか一項に記載の洗浄剤組成物。 The cleaning composition according to any one of claims 1 to 4, further comprising a chelating agent.
  6.  前記キレート剤が窒素含有物質およびリン含有物質の少なくとも一種を含有する請求項5に記載の洗浄剤組成物。 The cleaning composition according to claim 5, wherein the chelating agent contains at least one of a nitrogen-containing substance and a phosphorus-containing substance.
  7.  前記キレート剤がアルカリ土類金属に対するキレート機能を有する請求項5または6に記載の洗浄剤組成物。 The cleaning composition according to claim 5 or 6, wherein the chelating agent has a chelating function for an alkaline earth metal.
  8.  界面活性剤を含有する請求項2から4のいずれか一項に記載の洗浄剤組成物。 The cleaning composition according to any one of claims 2 to 4, comprising a surfactant.
  9.  界面活性剤をさらに含有する請求項5から7のいずれか一項に記載の洗浄剤組成物。 The detergent composition according to any one of claims 5 to 7, further comprising a surfactant.
  10.  請求項1から9のいずれか一項に記載される洗浄剤組成物を調製するための水性組成物であって、請求項1から4のいずれか一項に記載されるケイ酸塩含有水溶液からなることを特徴とする水性組成物。 It is an aqueous composition for preparing the cleaning composition as described in any one of Claims 1-9, Comprising: From the silicate containing aqueous solution as described in any one of Claims 1-4. An aqueous composition characterized by comprising:
  11.  請求項10に記載される水性組成物とキレート剤とを混合する工程を備える製造方法により得られたものである、請求項1から4のいずれか一項に記載されるケイ酸塩含有水溶液と前記キレート剤とを含有する洗浄剤組成物。 The silicate-containing aqueous solution according to any one of claims 1 to 4, which is obtained by a production method comprising a step of mixing the aqueous composition described in claim 10 and a chelating agent. A cleaning composition containing the chelating agent.
  12.  請求項10に記載される水性組成物と界面活性剤とを混合する工程を備える製造方法により得られたものである、請求項1から4のいずれか一項に記載されるケイ酸塩含有水溶液と前記界面活性剤とを含有する洗浄剤組成物。 The silicate-containing aqueous solution according to any one of claims 1 to 4, which is obtained by a production method including a step of mixing the aqueous composition according to claim 10 and a surfactant. And a detergent composition containing the surfactant.
  13.  請求項10に記載される水性組成物、キレート剤および界面活性剤を混合する工程を備える製造方法により得られたものである、請求項1から4のいずれか一項に記載されるケイ酸塩含有水溶液、前記キレート剤および前記界面活性剤とを含有する洗浄剤組成物。 The silicate as described in any one of Claim 1 to 4 obtained by the manufacturing method provided with the process of mixing the aqueous composition described in Claim 10, a chelating agent, and surfactant. A cleaning composition comprising a containing aqueous solution, the chelating agent, and the surfactant.
  14.  請求項1から9のいずれか一項に記載される洗浄剤組成物を調製するための水性組成物であって、請求項1から4のいずれか一項に記載される前記ケイ酸塩含有水溶液とキレート剤とからなることを特徴とする水性組成物。 An aqueous composition for preparing the cleaning composition according to any one of claims 1 to 9, wherein the silicate-containing aqueous solution according to any one of claims 1 to 4. And an aqueous composition comprising a chelating agent.
  15.  請求項14に記載されるケイ酸塩含有水溶液とおよび界面活性剤とを混合する工程を備える製造方法により得られたものである、請求項1から4のいずれか一項に記載されるケイ酸塩含有水溶液、前記キレート剤および前記界面活性剤とを含有する洗浄剤組成物。 The silicic acid as described in any one of Claim 1 to 4 obtained by the manufacturing method provided with the process of mixing the silicate containing aqueous solution described in Claim 14, and surfactant. A detergent composition comprising a salt-containing aqueous solution, the chelating agent, and the surfactant.
  16.  請求項9、13および15のいずれか一項に記載される洗浄剤組成物の製造方法であって、前記洗浄剤組成物における、前記界面活性剤の含有量に対する前記キレート剤の含有量の比率Rを、被洗浄部材に付着する除去対象成分に応じて設定することを特徴とする洗浄剤組成物の製造方法。 It is a manufacturing method of the cleaning composition described in any one of Claim 9, 13, and 15, Comprising: Ratio of content of the said chelating agent with respect to content of the said surfactant in the said cleaning composition. Rc is set according to the removal object component adhering to a to-be-cleaned member, The manufacturing method of the cleaning composition characterized by the above-mentioned.
  17.  前記除去対象成分がアルカリ土類金属を含有する成分を有する場合に、前記比率Rを高める請求項16に記載の製造方法。 The manufacturing method according to claim 16, wherein the ratio R c is increased when the removal target component includes a component containing an alkaline earth metal.
  18.  請求項1から9、11から13および15から17のいずれか一項に記載される洗浄剤組成物を用いて被洗浄部材を洗浄する洗浄方法。 A cleaning method for cleaning a member to be cleaned using the cleaning composition according to any one of claims 1 to 9, 11 to 13, and 15 to 17.
  19.  請求項1から9、11から13および15のいずれか一項に記載される洗浄剤組成物を-20℃以上-5℃未満の環境に保管する洗浄剤組成物の保管方法。 A method for storing a cleaning composition, wherein the cleaning composition according to any one of claims 1 to 9, 11 to 13 and 15 is stored in an environment of -20 ° C or higher and lower than -5 ° C.
  20.  請求項10または14に記載される水性組成物を-20℃以上-5℃未満の環境に保管する水性組成物の保管方法。 A method for storing an aqueous composition, wherein the aqueous composition according to claim 10 or 14 is stored in an environment of -20 ° C or higher and lower than -5 ° C.
  21.  請求項1から9、11から13および15のいずれか一項に記載される洗浄剤組成物を-20℃以上-5℃未満の環境にて運搬する洗浄剤組成物の運搬方法。 A method for transporting a cleaning composition comprising transporting the cleaning composition according to any one of claims 1 to 9, 11 to 13 and 15 in an environment of -20 ° C or higher and lower than -5 ° C.
  22.  請求項10または14に記載される水性組成物を-20℃以上-5℃未満の環境にて運搬する洗浄剤組成物の運搬方法。 A method for transporting a cleaning composition, comprising transporting the aqueous composition according to claim 10 or 14 in an environment of -20 ° C or higher and lower than -5 ° C.
PCT/JP2013/055639 2012-03-15 2013-03-01 Detergent composition, manufacturing method therefor, and methods for storing and transporting said detergent composition WO2013137016A1 (en)

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JP2011137192A (en) * 2009-12-28 2011-07-14 Lion Corp Cleaning agent for metal

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JPH06346099A (en) * 1993-06-11 1994-12-20 T Paul Kk Highly concentrated alkali liquid cleanser composition and its production
WO2010140561A1 (en) * 2009-06-01 2010-12-09 ユケン工業株式会社 Degreasing composition and method for producing same
JP2011137192A (en) * 2009-12-28 2011-07-14 Lion Corp Cleaning agent for metal

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