WO2013123781A1

WO2013123781A1 - Liquid crystal display panel, manufacturing method therefor and display device

Info

Publication number: WO2013123781A1
Application number: PCT/CN2012/084600
Authority: WO
Inventors: 李坤; 玄明花; 高永益
Original assignee: 京东方科技集团股份有限公司; 成都京东方光电科技有限公司
Priority date: 2012-02-23
Filing date: 2012-11-14
Publication date: 2013-08-29
Also published as: CN102654681B; CN102654681A

Abstract

Provided are a liquid crystal display panel, a manufacturing method therefor and a display device. The liquid crystal display panel comprises a colour film substrate (1) and an array substrate (2). Liquid crystals are filled between the colour film substrate (1) and the array substrate (2). The colour film substrate (1) or the array substrate (2) comprises a first insulating layer (13, 27); a first conducting signal line (16, 28) formed on the first insulating layer (13, 27); a second insulating layer (14, 210) covering the first conducting signal line (16, 28) and the first insulating layer (13, 27); a second conducting signal line (17, 211) formed at the intersection of the second insulating layer (14, 210) and the first conducting signal line (16, 28); and a spacer (18, 29) made of a force-sensitive resistance material, which is located at the intersection of the second conducting signal line (17, 211) and the first conducting signal line (16, 28), wherein a via hole (111a, 111b, 213a, 213b) located at the intersection of the second conducting signal line (17, 211) and the first conducting signal line (16, 28) is formed in the second insulating layer (14, 210), and the two ends of the spacer (18, 29) made of a force-sensitive resistance material are respectively in contact with the first conducting signal line (16, 28) and the second conducting signal line (17, 211) through the via hole (111a,111b,213a,213b), thereby being able to reduce the thickness of a touch control display panel, and increase the touch control accuracy and the light transmittance.

Description

Liquid crystal display panel, manufacturing method thereof and display device

Embodiments of the present invention provide a liquid crystal display panel, a method of fabricating the same, and a display device. Background technique

As a thin-film transistor as a control element, liquid crystal is a medium-sized integrated semiconductor integrated circuit and flat-panel light source technology. The thin-film transistor liquid crystal display has low power consumption, convenient carrying, wide range of use, high quality and the like. Become a new generation of mainstream displays.

In the display device, a touch panel is used in order to allow the user to perform related operations while viewing the screen. The touch display screen is one of the important carriers for integrating the input and output terminals; by measuring the coordinate position of the touch point on the display screen, the toucher's intention can be known according to the display content or graphic of the corresponding coordinate point on the display screen. Thereby performing related operations. At present, the use of resistive, capacitive, infrared, surface acoustic wave and other technologies to achieve the confirmation of the touch point position; then the touch screen using these technologies is independently prepared, and then attached to the display to achieve the display The touch effect.

In the above display structure, the inventors have found that since the touch screen is separately prepared from the display screen, the touch display screen formed is generally costly, and has a large thickness and weight, which is disadvantageous for the thin and light display requirements; The amount of overlap deviation during the bonding process is large, and the touch position cannot be accurately positioned; the touch screen on the surface of the display screen reduces the light transmittance of the display, and requires a higher power backlight under the same display brightness condition. Further increasing the load on the battery in the mobile device using the touch screen is not conducive to the low power consumption requirement in the mobile phone design. Summary of the invention

The embodiment of the present invention provides a liquid crystal display panel, comprising a color filter substrate and an array substrate, wherein the color filter substrate and the array substrate are filled with liquid crystal, wherein the color film substrate or the array substrate comprises: An insulating layer; a first conductive signal line formed on the first insulating layer; a second insulating layer covering the first conductive signal line and the first insulating layer; formed on the second insulating layer and a second conductive signal line crossing the first conductive signal line; and the second conductive signal line a spacer of the force-sensitive resistive material at an intersection of the first conductive signal lines, wherein the second insulating layer is formed at an intersection of the second conductive signal line and the first conductive signal line And a via hole, wherein the two ends of the spacer of the force-sensitive resistive material are respectively in contact with the first conductive signal line and the second conductive signal line.

Another embodiment of the present invention provides a display device including the above liquid crystal display panel. A further embodiment of the present invention provides a method of fabricating a liquid crystal display panel, including the steps of forming an array substrate, the step of forming a color filter substrate, and the step of injecting the color filter substrate and the array substrate into the liquid crystal, wherein the array is formed. The step of forming a substrate or forming a color filter substrate includes: forming a first insulating layer; forming a first conductive signal line covering the first insulating layer; forming a first layer covering the first conductive signal line and the first insulating layer a second insulating signal line; and a second conductive signal line covering the second insulating layer and crossing the first conductive signal line; wherein, after forming the first conductive signal line and forming the second conductive Before the signal line, the manufacturing method further includes: forming a spacer of the force sensitive resistor material on the first conductive signal line; and crossing the first conductive signal line and the second conductive signal line a via hole is formed in the second insulating layer, and the two ends of the spacer of the force-sensitive resistive material are respectively connected to the first conductive signal by the via hole And second conductive signal line contact. DRAWINGS

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below. Obviously, the drawings in the following description are only It is a certain embodiment of the invention and is not intended to limit the invention.

1A is a schematic top plan view of a color filter substrate of a liquid crystal display panel according to a first embodiment of the present invention;

1B is a schematic structural view of a liquid crystal display panel according to a first embodiment of the present invention at a cross section of a color filter substrate A-A';

1C is a schematic structural view of a liquid crystal display panel at a cross section of a color filter substrate A-A' according to a second embodiment of the present invention;

2A is a schematic top plan view of an array substrate of a liquid crystal display panel according to a third embodiment of the present invention;

2B is a cross-sectional view of an array substrate B-B' of a liquid crystal display panel according to a third embodiment of the present invention. Schematic diagram

2C is a schematic view showing a cross-sectional structure of an array substrate B-B of a liquid crystal display panel according to a fourth embodiment of the present invention;

3A-3E are schematic structural views showing a manufacturing process of a liquid crystal display panel according to a fifth embodiment of the present invention;

4A-4E are schematic structural views showing a manufacturing process of a liquid crystal display panel according to a seventh embodiment of the present invention. detailed description

The technical solutions in the embodiments of the present invention are clearly and completely described in the following with reference to the accompanying drawings in the embodiments of the present invention. It is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative efforts are within the scope of the present invention.

First embodiment:

1A and 1B (FIG. 1A is a schematic perspective view of a color filter substrate of a liquid crystal display panel according to a first embodiment of the present invention, and FIG. 1B is a liquid crystal display panel according to a first embodiment of the present invention. The liquid crystal display panel provided by the embodiment of the present invention includes a color filter substrate 1 and an array substrate 2, and a liquid crystal substrate 1 and an array substrate 2 are filled with liquid crystal ( The color film substrate 1 includes: a substrate 10; a color film layer 11 formed on the substrate 10; and a first insulating layer 13 covering the color film layer 11, wherein the color film layer 11 includes a color film pixel region 12a. And a black matrix region 12b surrounding the color film pixel region 12a; a first conductive signal line 16 formed on the first insulating layer 13, and a spacer 18 of the force sensitive resistor material uniformly disposed on the first conductive signal line 16, One end thereof is in contact with the first conductive signal line 16; the second insulating layer 14 covering the first signal line 16, the first insulating layer 13 and the spacer 18 of the force-sensitive resistor material; formed on the second insulating layer 14 a conductive signal line 1 The 6th crossed second conductive signal line 17, the second conductive signal line 17 is in contact with the other end of the spacer 18 of the force sensitive resistor material through the via 111a in the second insulating layer 14.

The liquid crystal display panel provided by the embodiment of the invention can reduce the thickness of the touch display panel, improve the touch precision and the light transmittance, and the spacer of the force sensitive resistor material simultaneously has the thickness and the thickness of the liquid crystal cell supporting the display panel. The effect of the pressure resistance effect is to realize the touch panel and the display panel. Integration can effectively reduce production costs.

Here, FIGS. 1A and 1B provide a display panel of a TN (Twisted Nematic) structure, and thus a third insulating layer covering the second conductive signal line 17 and the second insulating layer 14 is also shown. 15; a common electrode layer 19 covering the third insulating layer 15; an alignment layer 110 covering the common electrode layer 19; of course, an In-Plane Switching (IPS) or a Fringe Field Switching (FFS) structure The display panel may not include: the third insulating layer 15 and the common electrode layer 19.

It should be noted that the first conductive signal line 16 and the second conductive signal line 17 are, for example, perpendicularly intersecting each other in a grid shape. The intersection of the first conductive signal line 16 and the second conductive signal line 17 corresponds to the black matrix region 12b of the color filter layer 11. In this way, it is possible to avoid the occurrence of light leakage or the like due to the abnormality of the peripheral liquid crystal molecules being deflected due to the protrusion of the spacer of the force-sensitive resistor material.

Further preferably, the first conductive signal line 16 corresponds to the position of the gate line on the array substrate, and the second conductive signal line 17 corresponds to the position of the data line on the array substrate; or the first conductive signal line 16 corresponds to the position of the data line on the array substrate. The second conductive signal line 17 corresponds to the position of the gate line on the array substrate.

Further, the spacer 18 of the force-sensitive resistive material is, for example, a semiconductor crystal spacer or an alloy force-sensitive resist material spacer; although the spacer 18 of the force-sensitive resistor material given in the figure herein is a truncated cone structure Of course, the spacer 18 can also be a cylindrical or prismatic structure. Here, the shape of the spacer 18 of the force-sensitive resistive material is not limited. Here, the shape of the spacer of the force-sensitive resistive material can be precisely determined by a photolithography process. Control, therefore, is more conducive to maintaining the thickness of the liquid crystal cell relative to the conventional spherical spacer to improve display performance.

Second embodiment:

Referring to FIG. 1C, a schematic view of a color filter substrate of a liquid crystal display panel according to a second embodiment of the present invention is the same as that of the first embodiment. Referring to FIG. 1A, FIG. 1C is a liquid crystal display panel according to a second embodiment of the present invention. The liquid crystal display panel provided by the embodiment of the present invention includes a color filter substrate 1 and an array substrate 2, and the liquid crystal substrate 1 and the array substrate 2 are filled with liquid crystal, and the color filter substrate 1 is filled. The method includes: a substrate 10; a color film layer 11 formed on the substrate 10 and a first insulating layer 13 above the color film layer 11, wherein the color film layer 11 includes a color film pixel region 12a and a black matrix region surrounding the color film pixel region 12a. 12b; a first conductive signal line 16 formed on the first insulating layer 13, a second insulating layer 14 covering the first conductive signal line 16 and the first insulating layer 13, and a via 111b on the second insulating layer 14 The first conductive signal line 16 is electrically connected to the force sensitive battery a spacer 18 of a resistive material, a spacer 18 of the force-sensitive resistive material is uniformly disposed on the first conductive signal line 16; and a second conductive layer formed on the second insulating layer 14 covering the spacer 18 of the force-sensitive resistive material The signal line 17, the second conductive signal line 17 intersects the first conductive signal line 16.

The liquid crystal display panel provided by the embodiment of the invention can reduce the thickness of the touch display panel, improve the touch precision and the light transmittance, and the spacer of the force sensitive resistor material simultaneously has the thickness and the thickness of the liquid crystal cell supporting the display panel. The effect of the pressure resistance effect is achieved by integrating the touch panel and the display panel, which can effectively reduce the production cost.

1C is a display panel with a twisted nematic (TN) structure as an example, so the third insulating layer 15 covering the second conductive signal line 17 and the second insulating layer 14 is also shown; a common electrode layer 19 covering the third insulating layer 15; and an alignment layer 110 covering the common electrode layer 19; of course, an In-Plane Switching (IPS) or FFS FFS (Fringe Field Switching) structure The display panel does not include: the third insulating layer 15 and the common electrode layer 19.

Third embodiment:

2A and 2B (FIG. 2A is a schematic perspective view of an array substrate of a liquid crystal display panel according to a third embodiment of the present invention, and FIG. 2B is a liquid crystal display panel according to a third embodiment of the present invention. Schematic diagram of the structure at the cross section), provided by the embodiment of the present invention The liquid crystal display panel includes a color filter substrate 1 and an array substrate 2, and the color filter substrate 1 and the array substrate 2 are filled with liquid crystal. The array substrate 2 includes: a substrate 20; the substrate 20 is formed with horizontal and vertical intersecting data lines 24 and gates. a line 21; a data line 24 and a gate line 21 enclosing a pixel unit and a TFT switch, wherein the TFT switch includes a gate electrode, a gate insulating layer 22, a source electrode, a drain electrode, and an active layer 23; a passivation layer 25 is formed on the passivation layer 25; a pixel electrode layer 26 is formed on the corresponding pixel unit region on the passivation layer 25; the array substrate 2 further includes: a first insulating layer 27 covering the passivation layer 25 and the pixel electrode layer 26; a first conductive signal line 28 on the first insulating layer 27; a spacer 29 of the force-sensitive resistive material formed on the first conductive signal line 28, and a spacer 29 of the force-sensitive resistive material uniformly disposed on the first conductive a signal line 28; a second insulating layer 210 covering the first conductive signal line 28, the first insulating layer 27 and the spacer 29 of the force-sensitive resistive material; and a second conductive signal line 211 formed on the second insulating layer 210 The second wire signal line 211 passes through the second insulating layer 210 Vias 213a 29 in contact with the spacer force-sensitive resistive material.

2A and 2B also show an alignment layer 212 covering the second insulating layer 210 and the second conductive signal line 211.

It should be noted that the first conductive signal line 28 and the second conductive signal line 211 are, for example, perpendicularly intersecting each other in a grid shape. The intersection of the first conductive signal line 28 and the second conductive signal line 211 corresponds to the black matrix region of the color filter layer. This avoids the occurrence of undesirable phenomena such as light leakage caused by the uneven deflection of the surrounding liquid crystal molecules due to the protrusion of the spacer.

Further preferably, the first conductive signal line 28 corresponds to the position of the gate line on the array substrate, and the second conductive signal line 211 corresponds to the position of the data line on the array substrate; or the first conductive signal line 28 corresponds to the position of the data line on the array substrate The second conductive signal line 211 corresponds to the position of the gate line on the array substrate.

Further, the spacer 29 of the force-sensitive resistive material is, for example, a semiconductor crystal spacer or an alloy force-sensitive resist material spacer; although the spacer 29 of the force-sensitive resist material given in the figure herein is a truncated cone structure Of course, the spacer 29 can also be a cylindrical or prismatic structure. Here, the shape of the spacer 29 of the force-sensitive resistive material is not limited. Here, the shape of the spacer of the force-sensitive resistive material can be precisely determined by a photolithography process. Control, so it is more conducive to maintaining the thickness of the liquid crystal cell compared to the conventional spherical spacer Performance.

Fourth embodiment:

As shown in FIG. 2C, a schematic view of a perspective view of an array substrate of a liquid crystal display panel according to a fourth embodiment of the present invention is the same as that of the third embodiment. FIG. 2A is a second embodiment of a liquid crystal display panel according to a fourth embodiment of the present invention. Schematic diagram of the structure at the AA section of the substrate).

In one aspect, the embodiment of the present invention provides a liquid crystal display panel comprising a color filter substrate 1 and an array substrate 2, wherein the color filter substrate 1 and the array substrate 2 are filled with liquid crystal, and the array substrate 2 comprises: a substrate 20; Forming a horizontally and vertically intersecting data line 24 and a gate line 21; the data line 24 and the gate line 21 enclosing a pixel unit and a TFT switch, wherein the TFT switch includes a gate electrode, a gate insulating layer 22, a source electrode, a drain electrode, and a source layer 23; a passivation layer 25 is formed on the substrate 20 having the above structure; a pixel electrode layer 26 is formed on the corresponding pixel unit region on the passivation layer 25; the array substrate 2 further includes: a passivation layer 25 and a pixel a first insulating layer 27 of the electrode layer 26; a first conductive signal line 28 formed on the first insulating layer 27; a second insulating layer 210 covering the first conductive signal line 28 and the first insulating layer 27; a spacer 29 of the force sensitive resistor material electrically connected to the first conductive signal line 28 on the layer 210, and a spacer 29 of the force sensitive resistor material are uniformly disposed on the first conductive signal line 28; In the second Covering the force sensitive resistive material layer 210 on the edge of the spacer 29 of the second conductive signal line 211, a second conductive signal line 211 and the first conductive signal line 28 intersect.

Here, the alignment layer 212 covering the second insulating layer 210 and the second conductive signal line 211 is also shown in Fig. 2C.

It should be noted that the first conductive signal line 28 and the second conductive signal line 211 are, for example, perpendicularly intersecting each other in a grid shape. The intersection of the first conductive signal line 28 and the second conductive signal line 211 corresponds to the black matrix region of the color filter layer. In this way, it is possible to avoid the occurrence of light leakage or the like due to the abnormality of the peripheral liquid crystal molecules being deflected due to the protrusion of the spacer of the force-sensitive resistor material.

Further preferably, the first conductive signal line 28 corresponds to the position of the gate line on the array substrate, and the second conductive signal line 211 corresponds to the position of the data line on the array substrate; or the first conductive signal line 28 corresponds to The position of the data line on the array substrate, and the second conductive signal line 211 corresponds to the position of the gate line on the array substrate. Further, the spacer 29 of the force-sensitive resistive material is, for example, a semiconductor crystal spacer or an alloy force-sensitive resist material spacer; although the spacer 29 of the force-sensitive resist material given in the figure herein is a truncated cone structure Of course, the spacer 29 can also be a cylindrical or prismatic structure. Here, the shape of the spacer 29 of the force-sensitive resistive material is not limited. Here, the shape of the spacer of the force-sensitive resistive material can be precisely determined by a photolithography process. Control, therefore, is more conducive to maintaining the thickness of the liquid crystal cell relative to the conventional spherical spacer to improve display performance.

The embodiment of the invention provides a display device comprising any one of the first to fourth embodiments described above.

The display device provided by the embodiment of the invention can reduce the thickness of the touch display panel, improve the touch precision and the light transmittance, and the spacer of the force sensitive resistor material simultaneously has the thickness and pressure of the liquid crystal cell supporting the display panel. The effect of the resistance effect is achieved by integrating the touch panel and the display panel, which can effectively reduce the production cost.

Fifth embodiment:

A method for fabricating a liquid crystal display panel according to a fifth embodiment of the present invention is specifically described in conjunction with the structural diagrams in the manufacturing process shown in FIGS. 3A-3G. The method includes the following steps, for example:

5101. A color film layer 11 on the substrate is produced.

5102. An insulating layer 13 covering the color film layer 11 is formed.

5103. Referring to FIG. 3A, a first conductive layer covering the insulating layer 13 is formed, and the first conductive signal line 16 is formed by a first patterning process.

5104. Referring to FIG. 3B, a layer of a force-sensitive resist material covering the first conductive signal line 16 and the first insulating layer 13 is formed, and a uniformly disposed force-sensitive resist material is formed on the first conductive signal line 16 by a second patterning process. The spacer 18 is such that one end of the spacer 18 of the force-sensitive resistive material is in contact with the first conductive signal line 16.

S105, referring to FIG. 3C, fabricating a second insulating layer 14 covering the first signal line 16, the first insulating layer 13, and the spacer 18 of the force-sensitive resistor material; forming a via 111a on the second insulating layer 14 by photolithography To expose the other end of the spacer 18 of the force-sensitive resistive material.

S106. Referring to FIG. 3D, a second conductive layer covering the second insulating layer 14 is formed, and a second conductive signal line 17 intersecting the first conductive signal line is formed through a third patterning process, and the second conductive signal 17 line passes through the via hole. 111a is in contact with the other end of the spacer 18 of the force-sensitive resistive material. S107. Referring to FIG. 3E, the color film substrate produced by the above process is paired with the formed array substrate and injected into the liquid crystal.

The liquid crystal display panel manufacturing method provided by the embodiment of the invention can reduce the thickness of the touch display panel, improve the touch precision and the light transmittance, and the spacer of the force sensitive resistor material simultaneously has the thickness of the liquid crystal cell supporting the display panel. And the effect of generating the pressure resistance effect, thereby realizing the integration of the touch panel and the display panel can effectively reduce the production cost.

It should be noted that, in conjunction with FIG. 3E, a display panel of a twisted nematic (TN) mode is provided. Therefore, the second conductive signal line 17 and the second insulating layer 14 which are formed after the step S106 are provided. The third insulating layer 15, the common electrode layer 19 covering the third insulating layer 15, and the alignment layer 110 covering the common electrode layer 19, of course, only need to be directly in the second conductive when manufacturing the display panel of the IPS or FFS display mode The alignment layer may be formed on the signal line 17 and the second insulating layer 14.

Sixth embodiment:

A method for fabricating a liquid crystal display panel according to a sixth embodiment of the present invention includes the following steps: S201: forming a color film layer on a substrate.

5202. Making an insulating layer covering the color film layer.

5203. The first conductive layer covering the insulating layer is formed, and the first conductive signal line is formed by the first patterning process.

5204, forming a second insulating layer covering the first conductive signal line and the first insulating layer, forming a uniformly distributed via hole on the second insulating layer by a photolithography process, so as to expose a part of the first conductive signal line through the via hole .

5205, forming a layer of the force-sensitive resistive material covering the second insulating layer, forming a spacer of the uniformly arranged force-sensitive resist material on the first conductive signal line by the second patterning process, and the spacer of the force-sensitive resistive material One end is in contact with the first conductive signal line through the via.

S206. The second conductive layer covering the second insulating layer and the spacer of the force-sensitive resist material is formed, and the second conductive signal line intersecting the first conductive signal line is formed by the third patterning process, and the second conductive signal line is The spacer of the force-sensitive resistive material is in contact with the other end.

S207. The color film substrate produced by the above process is paired with the formed array substrate and injected into the liquid crystal.

This embodiment does not provide a structural diagram in a specific manufacturing process. For details, refer to the fifth embodiment. The structural diagram of the production process.

It should be noted that, in conjunction with FIG. 3E, a display panel of a Twisted Nematic (TN) mode is provided. Therefore, the covered second conductive signal line 17 and the second which need to be fabricated after step S106 are also shown in the figure. The third insulating layer 15 of the insulating layer 14, the common electrode layer 19 covering the third insulating layer 15, and the alignment layer 110 covering the common electrode layer 19, of course, only need to be directly in the display panel of the IPS or FFS display mode The alignment layer may be formed on the second conductive signal line 17 and the second insulating layer 14.

Seventh embodiment:

A method for fabricating a liquid crystal display panel according to a seventh embodiment of the present invention is specifically described in conjunction with the structural diagrams in the manufacturing process shown in FIGS. 4A-4F. The manufacturing method includes the following steps, for example:

S301, forming a first conductive film on the substrate 20, and processing the gate line 21 and the gate electrode by a patterning process.

5302, a gate insulating layer is formed on the gate line 21 and the gate electrode, and an active layer 23 corresponding to the gate electrode is formed on the gate insulating layer 22.

5303. Form a second conductive film on the gate insulating layer 22, and process the pattern line to obtain the data line 24 and the source electrode and the drain electrode.

5304, a passivation layer 25 is formed on the substrate 20 on which the above structure is formed, and a pixel electrode via hole is formed at the drain electrode position.

5305. Depositing a pixel electrode layer 26 on the passivation layer 25.

The procedure of the above steps can be carried out according to the prior art.

S306, a first insulating layer 27 covering the passivation layer 25 and the pixel electrode layer 26 is formed.

5307. Referring to FIG. 4A, a first conductive layer covering the first insulating layer 27 is formed, and a first conductive signal line 28 is formed by a patterning process.

5308. Referring to FIG. 4B, a layer of a force-sensitive resist material covering the first conductive signal line 28 and the first insulating layer 27 is formed, and a spacer 29 of a uniformly disposed force-sensitive resist material is formed on the first conductive signal line by a patterning process. So that one end of the spacer 29 of the force-sensitive resistive material is in contact with the first conductive signal line Contact.

S309, referring to FIG. 4C, a second insulating layer 210 covering the first signal line 28, the first insulating layer 27 and the spacer 29 is formed, and the via hole 213a on the second insulating layer 210 is formed by a photolithography process to expose the force. The other end of the spacer 29 of the varistor material.

S310, referring to FIG. 4D, forming a second conductive layer covering the second insulating layer 210, forming a second conductive signal line 211 crossing the first conductive signal line 28 by a patterning process, and the second conductive signal line 211 passes through the via 213a and The other end of the spacer 29 of the force-sensitive resistive material is in contact.

S311, referring to Fig. 4E, the array substrate produced by the above process is placed in a box with the formed color film substrate and injected into the liquid crystal.

Of course, the orientation layer 212 provided for the array substrate after S310 is also shown.

The liquid crystal display panel manufacturing method provided by the embodiment of the invention can reduce the thickness of the touch display panel, improve the touch precision and the light transmittance, and the spacer of the force sensitive resistor material simultaneously has the thickness of the liquid crystal cell supporting the display panel. And the effect of generating the pressure resistance effect, thereby realizing the integration of the touch panel and the display panel can effectively reduce the production cost. Eighth embodiment

A method for fabricating a liquid crystal display panel according to an eighth embodiment of the present invention includes the following steps: S401, forming a first conductive film on a glass substrate, and performing a patterning process to obtain a gate line and a gate electrode.

S402, forming a gate insulating layer on the gate line and the gate electrode, and forming an active layer corresponding to the gate electrode on the gate insulating layer.

5403. Form a second conductive film on the gate insulating layer, and obtain a data line, a source electrode, and a drain electrode by a patterning process.

5404. Forming a passivation layer on the substrate on which the above structure is formed, and forming a pixel electrode via at a position of the drain electrode.

5405. Deposit a pixel electrode layer on the passivation layer.

The procedure of the above steps can be carried out according to the prior art.

S406. A first insulating layer covering the passivation layer and the pixel electrode layer is formed.

S407, forming a first conductive layer covering the first insulating layer, and forming a first conductive signal line by a patterning process. 5408, forming a second insulating layer covering the first conductive signal line and the first insulating layer, forming a uniformly distributed via hole on the second insulating layer by a photolithography process, so as to expose a part of the first conductive signal line through the via hole .

5409, forming a layer of the force-sensitive resistive material covering the second insulating layer, forming a spacer of the uniformly arranged force-sensitive resist material on the first conductive signal line by a patterning process, and passing one end of the spacer of the force-sensitive resistive material The hole is in contact with the first conductive signal line.

5410. The second conductive layer covering the second insulating layer and the spacer of the force-sensitive resist material is formed, and the second conductive signal line crossing the first conductive signal line is formed by a patterning process, and the second conductive signal line and the force-sensitive resistor are formed. The other side of the spacer of the material is in contact.

Of course, an alignment layer can also be provided for the array substrate after S310.

In S411, the array substrate produced by the above process and the formed color filter substrate are paired into a liquid crystal.

This embodiment does not show a structural diagram in a specific manufacturing process. For details, reference may be made to the structural diagram in the manufacturing process provided in the seventh embodiment.

The method for manufacturing a liquid crystal display panel provided by the embodiment of the invention can reduce the thickness of the touch display panel, improve the touch precision and the light transmittance, and the spacer has the thickness of the liquid crystal cell supporting the display panel and the pressure resistance effect. The function of the touch panel and the display panel can effectively reduce the production cost.

The drawings provided in the embodiments of the present invention are all taken as a display panel in the TN mode. Of course, the technical solution provided by the embodiment of the present invention is not limited by the display mode, that is, regardless of the display mode, and thus is in other display modes (such as IPS and The solution provided by the embodiment of the present invention in the display panel of the FFS mode can also be implemented.

A person skilled in the art can understand that all or part of the steps of implementing the above method embodiments may be completed by using hardware related to program instructions, and the foregoing program may be stored in a computer readable storage medium, and the program is executed when executed. The foregoing steps include the steps of the foregoing method embodiments; and the foregoing storage medium includes: a medium that can store program codes, such as a ROM, a RAM, a magnetic disk, or an optical disk.

(1) a liquid crystal display panel comprising a color filter substrate and an array substrate, wherein the color filter substrate and the array substrate are filled with liquid crystal, wherein The color film substrate or the array substrate includes:

First insulating layer;

a first conductive signal line formed on the first insulating layer;

Covering the first conductive signal line and the second insulating layer of the first insulating layer;

Forming a second conductive signal line crossing the first conductive signal line on the second insulating layer;

a spacer of the force-sensitive resistive material at an intersection of the second conductive signal line and the first conductive signal line, wherein the second conductive layer is formed with the second conductive signal line The via hole at the intersection of the first conductive signal lines, by which the two ends of the spacer of the force-sensitive resistive material are respectively in contact with the first conductive signal line and the second conductive signal line.

(2) The liquid crystal display panel according to (1), wherein the color filter substrate comprises: a substrate;

a color film layer formed on the substrate and a first insulating layer covering the color film layer, wherein the color film layer comprises a color film pixel region and a black matrix region;

a first conductive signal line formed on the first insulating layer;

a spacer of the force sensitive resistor material uniformly disposed on the first conductive signal line; a second insulating layer covering the first conductive signal line, the first insulating layer and the spacer of the force sensitive resistor material ;

Forming a second conductive signal line on the second insulating layer that intersects the first conductive signal line, the second conductive signal line passing through a via hole on the second insulating layer and the force sensitive resistor material The other side of the septum is in contact.

(3) The liquid crystal display panel according to (1), wherein the color filter substrate comprises: a substrate;

a first insulating layer formed on the color filter layer and the color film layer on the substrate, wherein the color film layer includes a color film pixel region and a black matrix region;

a first conductive signal line formed on the first insulating layer;

a spacer of the force-sensitive resistive material electrically connected to the first signal line through a via hole on the second insulating layer, the spacer material being uniformly disposed on the first conductive signal line;

Forming a second conductive letter covering the spacer of the force sensitive resistor material on the second insulating layer Line.

(4) The liquid crystal display panel according to (1), wherein the array substrate comprises: a substrate; the substrate is formed with horizontally and vertically intersecting data lines and gate lines; and the pixel unit and the TFT switch are formed on the data line and a region surrounded by the gate line, wherein the TFT switch includes a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and an active layer; a passivation layer is formed on the substrate on which the above structure is formed; A pixel electrode layer is formed on the corresponding pixel unit region; wherein the array substrate further includes:

Covering the passivation layer and the first insulating layer of the pixel electrode layer;

a first conductive signal line formed on the first insulating layer;

a spacer of the force-sensitive resistor material formed on the first conductive signal line, the spacer is uniformly disposed on the first conductive signal line;

a second insulating layer covering the first conductive signal line, the first insulating layer and the spacer of the force-sensitive resistor material;

And forming a second conductive signal line on the second insulating layer, the second wire signal line contacting the spacer of the force-sensitive resist material through a via hole on the second insulating layer.

(5) The liquid crystal display panel according to (1), wherein the array substrate comprises: a substrate; the substrate is formed with horizontally and vertically intersecting data lines and gate lines; and the pixel unit and the TFT switch are formed on the data line and a region surrounded by the gate line, wherein the TFT switch includes a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and an active layer; a passivation layer is formed on the substrate formed of the above structure; A pixel electrode layer is formed on the corresponding pixel unit region; wherein the array substrate further includes:

a first conductive signal line formed on the first insulating layer;

a spacer of the force-sensitive resistive material electrically connected to the first conductive signal line through a via hole on the second insulating layer, the spacer of the force-sensitive resistive material being uniformly disposed on the first conductive signal Online

A second conductive signal line covering the spacer of the force-sensitive resist material on the second insulating layer is formed.

(6) The liquid crystal display panel of any one of (1) to (5), wherein the first conductive signal The number line and the second conductive signal line are in a grid shape perpendicularly crossing each other.

(7) The liquid crystal display panel according to (6), wherein an intersection position of the first conductive signal line and the second conductive signal line corresponds to a black matrix region of the color film layer.

(8) The liquid crystal display panel according to (6), wherein the first conductive signal line corresponds to a position of a gate line on the array substrate, and the second conductive signal line corresponds to a position of a data line on the array substrate;

Or,

The first conductive signal line corresponds to a position of a data line on the array substrate, and the second conductive signal line corresponds to a position of a gate line on the array substrate.

The liquid crystal display panel according to any one of (1) to (8), wherein the spacer of the force-sensitive resistor material is a semiconductor crystal spacer or an alloy force-sensitive resistor spacer.

(10) A display device comprising the liquid crystal display panel of any one of (1) to (9).

(11) A method of fabricating a liquid crystal display panel, comprising the steps of forming an array substrate, the step of forming a color filter substrate, and the step of inserting the color filter substrate and the array substrate into the liquid crystal, wherein the step of forming the array substrate or forming the color film The steps of the substrate include:

Forming a first insulating layer;

Forming a first conductive signal line covering the first insulating layer;

Forming a second insulating layer covering the first conductive signal line and the first insulating layer; and forming a second conductive signal line covering the second insulating layer and crossing the first conductive signal line;

The manufacturing method further includes: after the forming the first conductive signal line and before forming the second conductive signal line, the manufacturing method further includes:

Forming a spacer of the force sensitive resistor material on the first conductive signal line;

Forming a via hole in the second insulating layer at a position where the first conductive signal line and the second conductive signal line intersect, by means of the via hole, the spacer of the force-sensitive resistive material Both ends are in contact with the first conductive signal line and the second conductive signal line, respectively.

(12) The method according to (11), wherein the forming the color filter substrate comprises: forming a color film layer on the substrate;

Forming the first insulating layer covering the color film layer;

Forming a first conductive layer covering the first insulating layer, and forming a first through a first patterning process a conductive signal line;

Forming a second insulating layer covering the first conductive signal line and the first insulating layer; forming a uniformly distributed via hole on the second insulating layer by a photolithography process, so as to expose through the via hole Said first conductive signal line;

Forming a layer of the force-sensitive resistive material covering the second insulating layer, forming a spacer of the uniformly arranged force-sensitive resist material on the first conductive signal line by a second patterning process, the force-sensitive resistive material One end of the spacer is in contact with the first conductive signal line through the via hole;

Forming a second conductive layer covering the second insulating layer and the spacer of the force-sensitive resist material, and forming a second conductive signal line crossing the first conductive signal line by a third patterning process, The second conductive signal line is in contact with the other end of the spacer of the force-sensitive resistor material.

(13) The manufacturing method according to (11), wherein the forming the color filter substrate comprises: fabricating a color film layer on the substrate;

Making a first insulating layer covering the color film layer;

Forming a first conductive layer covering the first insulating layer, and forming a first conductive signal line by a first patterning process;

Forming a layer of the force-sensitive resistive material covering the first conductive signal line and the first insulating layer, and forming a spacer of the uniformly disposed force-sensitive resist material on the first conductive signal line by a second patterning process So that one end of the spacer is in contact with the first conductive signal line;

Forming a second insulating layer covering the first signal line, the first insulating layer and the spacer of the force-sensitive resistor material;

Making a via on the second insulating layer to expose the other end of the spacer;

Forming a second conductive layer covering the second insulating layer, forming a second conductive signal line crossing the first conductive signal line by a third patterning process, wherein the second conductive signal line passes through the via The other end of the spacer of the force-sensitive resistive material is in contact.

(14) The manufacturing method according to (11), wherein the forming the array substrate comprises: forming a horizontally and vertically intersecting data line and a gate line on the substrate, the data line and the gate line enclosing the pixel unit and the TFT a switch; wherein the TFT switch includes a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and an active layer, and a passivation layer is formed on the substrate on which the above structure is formed; wherein the passivation layer is formed Depositing a pixel electrode layer on the substrate; wherein the step of forming the array substrate further comprises: fabricating a first insulating layer covering the passivation layer and the pixel electrode layer; Forming a first conductive layer covering the insulating layer, and forming a first conductive signal line by a patterning process;

Forming a layer of the force-sensitive resistive material covering the first conductive signal line and the first insulating layer, and forming a spacer of the uniformly disposed force-sensitive resist material on the first conductive signal line by a patterning process, so that One end of the spacer of the force-sensitive resistive material is in contact with the first conductive signal line; and a second insulating layer covering the first signal line, the first insulating layer and the spacer is formed; a via hole on the second insulating layer to expose the other end of the spacer;

Forming a second conductive layer covering the second insulating layer, forming a second conductive signal line crossing the first conductive signal line by a patterning process, the second conductive signal line passing through the via and the force The other end of the spacer of the varistor material is in contact.

(15) The manufacturing method according to (11), wherein the forming the array substrate comprises: forming a horizontally and vertically intersecting data line and a gate line on the substrate, the data line and the gate line enclosing the pixel unit and the TFT a switch; wherein the TFT switch includes a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and an active layer, and a passivation layer is formed on the substrate on which the above structure is formed; wherein the passivation layer is formed Depositing a pixel electrode layer on the substrate; wherein the step of forming the array substrate further includes:

Making a first insulating layer covering the passivation layer and the pixel electrode layer;

Forming a first conductive layer covering the first insulating layer, and forming a first conductive signal line by a patterning process;

Forming a layer of the force-sensitive resistive material covering the second insulating layer, forming a spacer of the uniformly disposed force-sensitive resist material on the first conductive signal line by a patterning process, wherein one end of the spacer passes the The via is in contact with the first conductive signal line;

Forming a second conductive layer covering the second insulating layer and the spacer, forming a second conductive signal line crossing the first conductive signal line by a patterning process, the second conductive signal line and the The spacer of the force-sensitive resistive material is in contact with the other end.

Although the present invention has been described in detail above with reference to the preferred embodiments and specific embodiments, the invention may be modified or modified by those skilled in the art. It is obvious. Therefore, such modifications or improvements made without departing from the spirit of the invention are intended to be within the scope of the invention.

Claims

Claim

The liquid crystal display panel includes a color filter substrate and an array substrate, wherein the color filter substrate and the array substrate are filled with liquid crystal, wherein

The color film substrate or the array substrate includes:

First insulating layer;

a first conductive signal line formed on the first insulating layer;

2. The liquid crystal display panel according to claim 1, wherein the color filter substrate comprises: a substrate;

a first conductive signal line formed on the first insulating layer;

The liquid crystal display panel according to claim 1, wherein the color filter substrate comprises: a substrate;

a first conductive signal line formed on the first insulating layer; Covering the first conductive signal line and the second insulating layer of the first insulating layer;

The liquid crystal display panel according to claim 1, wherein the array substrate comprises: a substrate; the substrate is formed with horizontally and vertically intersecting data lines and gate lines; and the pixel unit and the TFT switch are formed on the data line And a region surrounded by the gate line, wherein the TFT switch includes a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and an active layer; and a passivation layer is formed on the substrate on which the above structure is formed; A pixel electrode layer is formed on the corresponding pixel unit region on the passivation layer; wherein the array substrate further includes:

a first conductive signal line formed on the first insulating layer;

a spacer of the force-sensitive resistive material electrically connected to the first conductive signal line through a via hole on the second insulating layer, the spacer of the force-sensitive resistive material being uniformly disposed on the first conductive signal Line Upper

The liquid crystal display panel according to any one of claims 1 to 5, wherein the first conductive signal line and the second conductive signal line are in a grid shape perpendicularly intersecting each other.

The liquid crystal display panel according to claim 6, wherein an intersection of the first conductive signal line and the second conductive signal line corresponds to a black matrix region of the color film layer.

The liquid crystal display panel according to claim 6, wherein the first conductive signal line corresponds to a position of a gate line on the array substrate, and the second conductive signal line corresponds to a position of a data line on the array substrate ;

Or,

The liquid crystal display panel according to any one of claims 1 to 8, wherein the spacer of the force-sensitive resist material is a semiconductor crystal spacer or an alloy force-sensitive resistor spacer.

A display device, comprising the liquid crystal display panel according to any one of claims 1 to 9.

11. The method for fabricating a liquid crystal display panel, comprising the steps of: forming an array substrate, the step of forming a color filter substrate, and the step of inserting the color filter substrate and the array substrate into the liquid crystal, wherein the step of forming the array substrate or forming the color filter substrate The steps include:

Forming a first insulating layer;

Forming a first conductive signal line covering the first insulating layer;

Forming a via hole in the second insulating layer at a position where the first conductive signal line and the second conductive signal line intersect, by means of the via hole, the spacer of the force-sensitive resistive material Both ends Contact with the first conductive signal line and the second conductive signal line.

The manufacturing method according to claim 11, wherein the forming the color filter substrate comprises:

Making a color film layer on the substrate;

Forming the first insulating layer covering the color film layer;

Making a color film layer on the substrate;

Making a first insulating layer covering the color film layer;

Forming a second conductive layer covering the second insulating layer, forming a second conductive signal line crossing the first conductive signal line by a third patterning process, wherein the second conductive signal line passes through the The aperture is in contact with the other end of the spacer of the force sensitive resistor material.

The manufacturing method according to claim 11, wherein the forming the array substrate comprises: forming a horizontally and vertically intersecting data line and a gate line on the substrate, wherein the data line and the gate line enclose a pixel unit and a TFT switch, wherein the TFT switch includes a gate electrode, a gate insulating layer, a source electrode, a drain electrode, and an active layer, and a passivation layer is formed on the substrate on which the above structure is formed; Depositing a pixel electrode layer on the substrate; wherein the step of forming the array substrate further includes:

Forming a first conductive layer covering the insulating layer, and forming a first conductive signal line by a patterning process;

Forming a second insulating layer covering the first conductive signal line and the first insulating layer; forming a uniformly distributed via hole on the second insulating layer by a photolithography process, so as to expose through the via hole Said first conductive signal line; Forming a layer of the force-sensitive resistive material covering the second insulating layer, forming a spacer of the uniformly disposed force-sensitive resist material on the first conductive signal line by a patterning process, wherein one end of the spacer passes the The via is in contact with the first conductive signal line;