WO2013050304A1 - Ensemble de mesure de la force normale - Google Patents

Ensemble de mesure de la force normale Download PDF

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Publication number
WO2013050304A1
WO2013050304A1 PCT/EP2012/069211 EP2012069211W WO2013050304A1 WO 2013050304 A1 WO2013050304 A1 WO 2013050304A1 EP 2012069211 W EP2012069211 W EP 2012069211W WO 2013050304 A1 WO2013050304 A1 WO 2013050304A1
Authority
WO
WIPO (PCT)
Prior art keywords
measurement
normal force
arm
connector
piezo
Prior art date
Application number
PCT/EP2012/069211
Other languages
English (en)
Inventor
Martin Bleicher
Andreas Abele
Ruediger Meier
Juergen BECKLER
Original Assignee
Tyco Electronics Amp Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tyco Electronics Amp Gmbh filed Critical Tyco Electronics Amp Gmbh
Publication of WO2013050304A1 publication Critical patent/WO2013050304A1/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/18—Measuring force or stress, in general using properties of piezo-resistive materials, i.e. materials of which the ohmic resistance varies according to changes in magnitude or direction of force applied to the material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0057—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes measuring forces due to spring-shaped elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0061—Force sensors associated with industrial machines or actuators
    • G01L5/0076—Force sensors associated with manufacturing machines
    • G01L5/008—Force sensors integrated in an article or a dummy workpiece
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/16—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes for measuring several components of force
    • G01L5/161—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes for measuring several components of force using variations in ohmic resistance
    • G01L5/162—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes for measuring several components of force using variations in ohmic resistance of piezoresistors

Definitions

  • the invention relates to a device for measuring a normal force.
  • the invention further relates to a method for measuring a normal force.
  • the measurement of a normal force is particularly significant with plug type connections of connectors with their mating connectors.
  • the normal force refers to the force which a connector applies at one or more contact locations to a mating connector in the direction perpendicular relative to the longitudinal direction of the mating connector, that is to say, in the insertion direction.
  • An increase of the normal force leads to a higher friction force, higher insertion force and consequently to a shorter service-life of the connector.
  • a normal force which is too low results in a loose contact, whereby corrosion, adsorption and/or contamination layers present on the contact location of the connector or the mating connector may not be able to be penetrated, which may lead to a poor connection.
  • the measurement arm is introduced into the connector and moved in the direction of the normal force.
  • the resultant bending of the measurement arm is established by means of expansion measurement strips which are located at the rear side opposite the contact location in order to prevent damage.
  • the normal force is therefore measured indirectly via the bending of the measurement arm in this case.
  • a measurement arm is introduced into the connector.
  • the measurement arm is secured to a transverse carrier which moves the measurement arm in the direction of the normal force.
  • a bending of the measurement arm outside the connector is carried out using expansion measurement strips. Owing to the relatively large spacing of the expansion measurement strips from the contact location, a lever effect is produced. In this instance, the normal force is also established indirectly via the expansion of the measurement arm.
  • a rigid measurement arm is introduced into the connector and moved in the direction of the normal force.
  • the measurement arm is fitted to a force sensor which measures the forces which occur.
  • a plurality of contact locations in a connector can be measured one after the other. In this instance, the measurement of the normal force is carried out via the deflection of the measurement arm.
  • measurement arm that is to say, they measure a reaction of the measurement arm. Furthermore, all these methods are dynamic, that is to say, they are based on a movement of the measurement arm in the direction of the normal force.
  • An object of the invention is to provide a device which enables direct measurement of the normal force or a measurement force which is representative of the normal force in a static manner, that is to say, without movement of the measurement arm.
  • a measurement element has a measurement cell which is fitted to an outer face of the
  • a measurement arm so as to be able to be contacted by the contact location and by means of which a measurement force which is representative of the normal force can be detected and output in the form of a signal.
  • the measurement is carried out directly at the contact location, which is in contact with a contact location of the mating connector when the mating connector is inserted.
  • This type of measurement requires no movement of the measurement arm in the direction of the normal force; it is thus static.
  • the solution according to the invention further affords the advantage that a measurement can take place inside a connector, since no components are required outside the connector.
  • the measurement cell is a piezo- resistive measurement cell.
  • an acting force or an acting pressure leads to a change of the resistance.
  • this change of resistance may be attributed not only to geometric effects, but also to effects on an atomic, molecular or structural level.
  • energy levels and consequently, for example, the valence and conduction bands may be displaced.
  • This piezo-resistive effect is particularly prevalent in many semi-conductors.
  • the measurement cell contains such a semiconductor with piezo-resistive effect.
  • a particularly widely used semi— conductor which has such an effect is silicon. Silicon is therefore used in the measurement cell in a preferred
  • other components of the measurement element or the measurement device may also comprise silicon or contain silicon.
  • Semi-conductors such as, for example, silicon, may additionally be doped. This leads to a change of the energy level and consequently to changed electrical properties, such as, for example, the conductivity or the resistance.
  • the embodiment described leads to the measurement arm resulting in the same deflection at the location of the
  • the width of the measurement arm in the direction transverse relative to the normal force and transverse relative to the longitudinal direction of the measurement arm may enable simple introduction of the measurement arm into the connector, without having to adjust the measurement arm in the direction of the width.
  • Simultaneous measurement of a plurality of contact locations is possible in an advantageous embodiment in which measurement cells and/or measurement elements are provided at a plurality of locations of the measurement arm. Such a simultaneous measurement of a plurality of contact locations saves time.
  • a plurality of measurement cells may also be fitted only to a single measurement element.
  • the arrangement and number of the measurement elements on the measurement arm corresponds to the arrangement and/or number of the contact locations of the connector.
  • a connector may have a plurality of contact locations at which it is in contact with the mating connector when the mating connector is inserted. These various contact locations may each have different normal forces.
  • the embodiment described is particularly advantageous.
  • the contact locations of the connector may be arranged at the corners of a rectangle or square.
  • an arrangement of the measurement cells on the measurement arm is also suitable at the corners of a rectangle or square.
  • a plurality of measurement cells or several sets of measurement cells may be provided on the measurement arm so that not only one type of connector can be measured with a measurement arm, but instead such a measurement arm enables the
  • the measurement element in addition to the measurement cell, may also have an additional carrier layer or a carrier element which is used for mechanical stabilisation.
  • a carrier element could be produced, for example, from glass, ceramic material or steel.
  • the measurement element may contain a protective layer, for example, of polymer material, for corrosion protection, protection from mechanical damage or the like.
  • the piezo-resistive measurement cell contains a piezo-resistive layer which is retained so as to be freely deformable between support locations.
  • the support locations may, for example, be integral with the layer or the piezo-resistive layer may rest on support elements.
  • a force which acts perpendicularly relative to the plane of the layer may bring about an expansion in the plane of the layer.
  • this expansion in the plane of the layer may be greater than a compression of the layer which would result if the layer were retained so as not to be freely deformable.
  • the configuration of this feature is achieved, for example, by means of a membrane, similarly to a drum.
  • a more bridge-like structure, in which there is a thin region between two thicker regions, is also possible.
  • the measurement arm may comprise silicon and the measurement cell may also be produced by means of doping, diffusion, nano-technological or micro-technological methods or the like at a location of the measurement arm.
  • the measurement arm may comprise silicon and the measurement cell may also be produced by means of doping, diffusion, nano-technological or micro-technological methods or the like at a location of the measurement arm.
  • an integrated circuit may also be produced. This can be carried out in particular together with the structuring of the measurement cell. This may lead to the measurement cell and an integrated circuit at least partially being integrated one in the other.
  • the measurement cell may be integrated in an integrated circuit and/or the integrated circuit may be an additional component of the measurement element.
  • an integrated circuit may also be integrated at least partially in the measurement cell. A combination of the two variants is also possible.
  • the measurement arm comprises two identical members, which are arranged on each other in a mirror- symmetrical and complementary manner. For example, it is thus possible to process a first component and a second component on the surface thereof in each case, for example, a measurement cell can be produced.
  • the first or second component is rotated through 180 Q and, with the side which faces the structured surface, fitted to the corresponding side of the second or first component.
  • Such a configuration simplifies the handling of the two components considerably since the two components can be retained from three sides during the production whilst an integral measurement arm with measurement cells at two sides can be retained only at the two remaining sides.
  • the measurement arm In order to measure the normal force or a measurement force which is representative of the normal force, the measurement arm can be introduced into a connector and, by means of one or more measurement cells which are in direct mechanical contact with the contact locations of the connector, a signal can be produced which is representative of the measurement force occurring. This signal can be evaluated in a subsequent step.
  • a dynamic measurement is also possible.
  • a profile of the measurement force in a movement direction, for example, in the direction of the normal force.
  • a measurement is carried out using a Wheatstone bridge, since this allows very precise difference measurements.
  • Figure 1 is a schematic cross-section of an embodiment of the device according to the invention during measurement in a connector
  • Figure 2 is a schematic plan view of a device according to the invention
  • Figure 3 shows a schematic structure of a measurement cell according to the invention
  • Figure 4 is a schematic perspective view of a second embodiment of the device according to the invention.
  • Figure 5 shows a schematic structure of a measurement cell according to the invention.
  • Figure 1 is a schematic sectioned side view of a device 1 according to the invention for measuring a normal force 2.
  • the direction 3 of the normal force 2 is perpendicular relative to the longitudinal direction 4 of the measurement arm 5 of the device 1 .
  • the device 1 is already introduced into a connector 6, which is fitted to a retention member 7.
  • the connector 6 has two contact arms 8 which may have contact with the mating connector when a mating connector is introduced at the contact locations 9. These contact locations 9 of the contact arms 8 are in direct contact with the measurement cells 10 of the device 1 .
  • These measurement cells 10 are part of measurement elements 1 1 , in this case they are located in the same place as the measurement elements 1 1 and form a unit therewith. Nonetheless, the measurement cells 10 may be spaced apart from the other components of the measurement elements 1 1 , for example, a measurement cell 10 may be at one end of the measurement arm 5, whilst other components of the measurement element 1 1 are located at another end of the measurement arm.
  • the measurement cells 1 0 are located on an outer face of the measurement arm 5 and are fitted in such a manner that they can be contacted by the contact locations 9 of the contact arm 8.
  • the contact arms 8 press with a measurement force 1 2 which is representative of the normal force 2 at the contact locations 9 on the measurement cells 1 0.
  • the measurement force 1 2 which is representative of the normal force 2 may in this instance be smaller or larger than the normal force 2.
  • the size relationship between the measurement force 2 may be dependent on the deflection of the contact arms 8.
  • the height 1 3 of the measurement arm 5 together with the measurement element 1 1 in the direction 3 of the normal force 2 at the location of a measurement cell 1 0 corresponds to the height of a mating connector. In this instance, this leads to the measurement force 1 2 which is representative of the normal force 2 corresponding to the normal force 2.
  • Figure 1 already shows a preferred embodiment since a plurality of measurement cells 1 0 and a plurality of measurement elements 1 1 are provided. This allows the measurement of normal forces 2 or measurement forces 1 2 which are representative of the normal force at a plurality of contact locations 9 of the connector 6.
  • the measurement cells 1 0 and measurement elements 1 1 are fitted to two opposing longitudinal sides 14 of the measurement arm 5.
  • FIG. 2 is a schematic plan view of a device 1 for measuring a normal force
  • the direction 3 of the normal force 2 or a measurement force 1 2 which is representative of the normal force is perpendicular relative to the plane of projection.
  • the device 1 for measuring a normal force 2 again has a retention member 1 5 and a measurement arm 5. On the measurement arm 5 there are located on the illustrated surface four measurement cells 1 0 which each form a unit with measurement elements 1 1 . Should there not be sufficient space, components of the measurement elements 1 1 which contain measurement cells 1 0 may be provided at one location and other components of the measurement elements 1 1 at another location.
  • the device 1 illustrated in Figure 2 has different dimensions to those of the device 1 illustrated in Figure 1 .
  • the arrangement and number of the measurement cells 1 0 or measurement elements 1 1 is adapted to the arrangement and number of the contact locations 9 of the contact arms 8 of the connector 6, that is to say, it corresponds to the arrangement and number of the contact locations 9.
  • the measurement cells 1 0 or measurement elements 1 1 illustrated here are square when viewed from above.
  • the width 1 7 of the measurement arms substantially corresponds to the width of a mating connector which can be introduced into the connector 6.
  • the width 1 7 may correspond precisely to the width of the mating connector. This may facilitate the positioning of the device 1 in the connector 6 since the measurement arm 5 can no longer move in a direction 1 8 transverse relative to the longitudinal direction 4 of the measurement arm 5 and transverse relative to the direction 3 of the normal force 2.
  • FIG 3 is a schematic, perspective sectioned view of the structure of a measurement element 1 1 according to the invention.
  • the measurement element 1 1 contains three layers.
  • the first layer is a carrier layer 19 which is used for mechanical stabilisation. This may, for example, be of steel, ceramic material or glass.
  • the second layer is the measurement-relevant layer 20.
  • Above the measurement-relevant layer 20 is another protective layer 21 which may comprise, for example, polymer material. In addition, this protective layer 21 may distribute the normal force in a uniform manner over the measurement-relevant layer 20.
  • the measurement-relevant layer 20 contains a piezo-resistive layer 22 which is retained so as to be able to be freely deformed between support locations 23.
  • the free deformability results in a force which is acting on the piezo-resistive layer 22 with the direction 3 of the normal force 2 leading to a deformation of the piezo- resistive layer 22 in directions 24 transverse relative to the direction 3 of the normal force 2.
  • the resultant expansion of the piezo-resistive layer 22 in the directions 24 transverse relative to the normal force may be greater than the compression or expansion of the piezo-resistive layer 22 in the direction 3 of the normal force 2. This produces a stronger signal in the directions 24 transverse relative to the normal force. A measurement of the signal is thus facilitated.
  • the piezo-resistive layer 22 is fitted in the manner of a membrane between the support locations 23.
  • the support locations 23 are in this example integral with the piezo-resistive layer 22. They comprise the same material as the piezo-resistive layer 22.
  • the material of the piezo-resistive layer 22 may in particular contain a piezo- resistive semi-conductor. In semi-conductors, the piezo-resistive effect is generally very evident. A widely used semi-conductor is, for example, silicon.
  • the piezo- resistive layer 22 illustrated in Figure 3 can be processed by means of methods for structuring, in particular these methods may involve structuring in micrometer or nanometer ranges. For example, these may be epitactic methods, etching or lithographic methods or the like.
  • FIG. 3 is a schematic, perspective view of a second embodiment of a measurement arm 5 of a device 1 according to the invention.
  • the measurement arm 5 comprises two identical members 26.
  • the lower member 26b was fitted to the upper member 26a by means of rotation through 180 Q .
  • the connection face 27 was bonded.
  • measurement cells 10 are measurement cells 10 in the form of measurement faces 31 which are located in the region of the thin layer 30.
  • a slot 32 is located between two measurement cells 10 in the direction of the width 17.
  • the width 17 of the measurement arm 5 and the height 13 are adapted to the dimensions of a mating connector which can be inserted into the connector 6.
  • the measurement cells 10 or measurement faces 31 have been produced by means of doping or diffusion. They are thus integral with the measurement arm 5.
  • Figure 5 is a schematic, sectioned illustration of the structure of such a measurement cell 10 or a measurement face 31 .
  • a silicon-n-substrate 33 is used as a base onto which an n-silicon layer has been applied by means of epitaxy.
  • n-epitaxy layer 34 is a p-conductive region 35 which can be connected to an electrical circuit by means of an aluminium/silicon contact 36.
  • two p- conductive regions 35 are two smaller p+ doped regions 37 which act as measurement resistors 38.
  • the resistance thereof changes so that between the p-conductive regions 35 and the aluminium/silicon contacts 36 a changed resistance can also be measured, for example, by changing the voltage or the current which flows from one aluminium/silicon contact 36a to the other aluminium/silicon contact 36b.
  • a closing Si0 2 layer 39 which thus constitutes a passivation layer.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)

Abstract

L'invention concerne un dispositif (1) conçu pour mesurer une force normale (2), en particulier une force normale (2) dans un connecteur (6). Dans des dispositifs antérieurs (1), la force normale (2) n'est mesurée qu'indirectement et dynamiquement par le biais de la flexion d'un bras de mesure (5) lors d'un mouvement du bras de mesure (5). L'invention a pour objet de fournir un dispositif amélioré (1) pour la mesure directe et statique de la force normale (2). À cette fin, le dispositif selon l'invention comprend un bras de mesure (5) présentant une face externe (5) dotée d'une cellule de mesure (10) pouvant être mise en contact avec un emplacement de contact (9) du connecteur (6).
PCT/EP2012/069211 2011-10-07 2012-09-28 Ensemble de mesure de la force normale WO2013050304A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011054319.8 2011-10-07
DE201110054319 DE102011054319A1 (de) 2011-10-07 2011-10-07 Vorrichtung zur Messung einer Normalkraft

Publications (1)

Publication Number Publication Date
WO2013050304A1 true WO2013050304A1 (fr) 2013-04-11

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ID=46934604

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Application Number Title Priority Date Filing Date
PCT/EP2012/069211 WO2013050304A1 (fr) 2011-10-07 2012-09-28 Ensemble de mesure de la force normale

Country Status (2)

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DE (1) DE102011054319A1 (fr)
WO (1) WO2013050304A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11346733B2 (en) 2016-12-29 2022-05-31 Te Connectivity Germany Gmbh Measuring element, measuring system, and method of providing a measuring element for measurement forces

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4380171A (en) * 1980-12-29 1983-04-19 Amp Incorporated Method and apparatus for measuring normal contact forces in electrical connector
JPH02110333A (ja) * 1988-10-20 1990-04-23 Fuji Electric Co Ltd クリップ形接触子の健全性検査方式
US5024106A (en) * 1990-03-13 1991-06-18 Amp Incorporated Contact system normal force gage
US5076106A (en) * 1990-03-21 1991-12-31 Amp Incorporated Normal force transducer

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100581051B1 (ko) * 2004-09-02 2006-05-17 한국표준과학연구원 3축 힘센서들로 구성된 촉각센서의 입출력 배선

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4380171A (en) * 1980-12-29 1983-04-19 Amp Incorporated Method and apparatus for measuring normal contact forces in electrical connector
JPH02110333A (ja) * 1988-10-20 1990-04-23 Fuji Electric Co Ltd クリップ形接触子の健全性検査方式
US5024106A (en) * 1990-03-13 1991-06-18 Amp Incorporated Contact system normal force gage
US5076106A (en) * 1990-03-21 1991-12-31 Amp Incorporated Normal force transducer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11346733B2 (en) 2016-12-29 2022-05-31 Te Connectivity Germany Gmbh Measuring element, measuring system, and method of providing a measuring element for measurement forces

Also Published As

Publication number Publication date
DE102011054319A1 (de) 2013-04-11

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