WO2013009066A3 - Vacuum heat treatment apparatus - Google Patents

Vacuum heat treatment apparatus Download PDF

Info

Publication number
WO2013009066A3
WO2013009066A3 PCT/KR2012/005443 KR2012005443W WO2013009066A3 WO 2013009066 A3 WO2013009066 A3 WO 2013009066A3 KR 2012005443 W KR2012005443 W KR 2012005443W WO 2013009066 A3 WO2013009066 A3 WO 2013009066A3
Authority
WO
WIPO (PCT)
Prior art keywords
heat treatment
treatment apparatus
vacuum heat
powder
reaction container
Prior art date
Application number
PCT/KR2012/005443
Other languages
French (fr)
Other versions
WO2013009066A2 (en
Inventor
Woo Young Lee
Byung Sook Kim
Jung Eun Han
Original Assignee
Lg Innotek Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Innotek Co., Ltd. filed Critical Lg Innotek Co., Ltd.
Publication of WO2013009066A2 publication Critical patent/WO2013009066A2/en
Publication of WO2013009066A3 publication Critical patent/WO2013009066A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/24—Stationary reactors without moving elements inside
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

Provided is a vacuum heat treatment apparatus having a structure which is able to improve the recovery rate of synthesized powder by optimizing a shape of a reaction container, and prevent a scattering phenomenon of the synthesized power within the reaction container, and at the same time to enhance a recovery amount of the powder in such a manner that reaction gas has vortex flow thanks to a groove of a lower part of a cover unit and is discharged to the outside through an exhaust port formed on an upper part of a crucible.
PCT/KR2012/005443 2011-07-12 2012-07-10 Vacuum heat treatment apparatus WO2013009066A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0069142 2011-07-12
KR1020110069142A KR101854781B1 (en) 2011-07-12 2011-07-12 Vacuum heat treatment apparatus

Publications (2)

Publication Number Publication Date
WO2013009066A2 WO2013009066A2 (en) 2013-01-17
WO2013009066A3 true WO2013009066A3 (en) 2013-04-04

Family

ID=47506689

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/005443 WO2013009066A2 (en) 2011-07-12 2012-07-10 Vacuum heat treatment apparatus

Country Status (3)

Country Link
KR (1) KR101854781B1 (en)
TW (1) TWI479112B (en)
WO (1) WO2013009066A2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100023483A (en) * 2008-08-22 2010-03-04 삼성모바일디스플레이주식회사 Inner plate and crucible assembly for deposition having the same
KR20100101535A (en) * 2009-03-09 2010-09-17 쟈판 스파 쿼츠 가부시키가이샤 Closure for silica glass crucible, silica glass crucible and method of handling the same
KR20110017110A (en) * 2009-08-13 2011-02-21 네오세미테크 주식회사 A large-size silicon carbide growth by multiple crucibles
KR20110073872A (en) * 2009-12-24 2011-06-30 엘지이노텍 주식회사 Furnace for manufacturing silicon carbide and silicon carbide manufacturing method using same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201610445U (en) * 2009-12-30 2010-10-20 东莞宏威数码机械有限公司 Vacuum heat treatment cavity

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100023483A (en) * 2008-08-22 2010-03-04 삼성모바일디스플레이주식회사 Inner plate and crucible assembly for deposition having the same
KR20100101535A (en) * 2009-03-09 2010-09-17 쟈판 스파 쿼츠 가부시키가이샤 Closure for silica glass crucible, silica glass crucible and method of handling the same
KR20110017110A (en) * 2009-08-13 2011-02-21 네오세미테크 주식회사 A large-size silicon carbide growth by multiple crucibles
KR20110073872A (en) * 2009-12-24 2011-06-30 엘지이노텍 주식회사 Furnace for manufacturing silicon carbide and silicon carbide manufacturing method using same

Also Published As

Publication number Publication date
WO2013009066A2 (en) 2013-01-17
TWI479112B (en) 2015-04-01
TW201314155A (en) 2013-04-01
KR101854781B1 (en) 2018-05-04
KR20130008412A (en) 2013-01-22

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