WO2013005945A3 - Method for manufacturing substrate for surface-enhanced raman scattering spectroscopy and substrate manufactured using the method - Google Patents

Method for manufacturing substrate for surface-enhanced raman scattering spectroscopy and substrate manufactured using the method Download PDF

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Publication number
WO2013005945A3
WO2013005945A3 PCT/KR2012/005124 KR2012005124W WO2013005945A3 WO 2013005945 A3 WO2013005945 A3 WO 2013005945A3 KR 2012005124 W KR2012005124 W KR 2012005124W WO 2013005945 A3 WO2013005945 A3 WO 2013005945A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
raman scattering
enhanced raman
scattering spectroscopy
manufacturing
Prior art date
Application number
PCT/KR2012/005124
Other languages
French (fr)
Korean (ko)
Other versions
WO2013005945A2 (en
Inventor
이종람
손준호
이일환
Original Assignee
포항공과대학교 산학협력단
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 포항공과대학교 산학협력단 filed Critical 포항공과대학교 산학협력단
Publication of WO2013005945A2 publication Critical patent/WO2013005945A2/en
Publication of WO2013005945A3 publication Critical patent/WO2013005945A3/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N21/658—Raman scattering enhancement Raman, e.g. surface plasmons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/02—Details
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Abstract

The present invention relates to a substrate for surface-enhanced Raman scattering spectroscopy and a manufacturing method thereof. The manufacturing method for a substrate for surface-enhanced Raman scattering spectroscopy, according to the present invention, comprises: a nano-pattern formation step for plasma-treating the surface of a polymer substrate and then forming a nano-pattern on the surface thereof; and a metal film formation step for forming a metal film on the nano-pattern of the polymer substrate. Thus, the present invention can provide a substrate for surface-enhanced Raman scattering spectroscopy and a manufacturing method thereof, which exhibit high reproducibility as well as low manufacturing costs, and effectively induce hot spots, thereby improving the detection sensitivity of the substance.
PCT/KR2012/005124 2011-07-01 2012-06-28 Method for manufacturing substrate for surface-enhanced raman scattering spectroscopy and substrate manufactured using the method WO2013005945A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110065451A KR101229065B1 (en) 2011-07-01 2011-07-01 A method of manufacturing substrate for surface-enhanced raman scattering spectroscope and the substrate manufactured by the method
KR10-2011-0065451 2011-07-01

Publications (2)

Publication Number Publication Date
WO2013005945A2 WO2013005945A2 (en) 2013-01-10
WO2013005945A3 true WO2013005945A3 (en) 2013-03-14

Family

ID=47437532

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/005124 WO2013005945A2 (en) 2011-07-01 2012-06-28 Method for manufacturing substrate for surface-enhanced raman scattering spectroscopy and substrate manufactured using the method

Country Status (2)

Country Link
KR (1) KR101229065B1 (en)
WO (1) WO2013005945A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101448111B1 (en) * 2013-09-17 2014-10-13 한국기계연구원 A substrate for surface-enhanced Raman scattering spectroscopy and a preparing method thereof
KR101639684B1 (en) * 2014-09-29 2016-07-15 한국기계연구원 adjusted nano-gap substrate and fabricating method for the same
KR101601150B1 (en) * 2014-09-26 2016-03-09 한국기계연구원 substrate having inorganic substance grown thereon and fabricating method for the same
CN107075661B (en) 2014-09-26 2020-03-17 韩国机械研究院 Substrate formed with a plurality of nanogaps and method for preparing the same
KR20160070568A (en) * 2014-12-10 2016-06-20 한국과학기술원 Plasmonic Paper and its Manufacturing Method
KR101696839B1 (en) 2015-03-12 2017-01-17 (주)광림정공 Substrate of Surface Enhanced Raman Scattering and method thereof
US11085881B2 (en) 2016-05-17 2021-08-10 The Industry & Academic Cooperation In Chungnam National University (Iac) Surface-enhanced Raman scattering substrate, element for detecting molecule including the same, and method for manufacturing the same
KR102105981B1 (en) 2018-04-18 2020-04-29 경희대학교 산학협력단 A substrate for surface enhanced raman scattering and fabricating method of the same
KR102169831B1 (en) 2019-01-18 2020-10-27 경희대학교 산학협력단 A substrate for surface enhanced raman scattering and fabricating method of the same
WO2023092635A1 (en) * 2021-11-23 2023-06-01 香港城市大学深圳福田研究院 Biological sample detection method based on surface-enhanced raman spectroscopy
KR102472451B1 (en) * 2021-11-29 2022-12-01 한국표준과학연구원 Digital surface-enhanced Raman spectroscopy sensing platform

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050013571A (en) * 2002-06-12 2005-02-04 인텔 코포레이션 Metal coated nanocrystalline silicon as an active surface enhanced raman spectroscopy(sers) substrate
KR20050039023A (en) * 2003-10-23 2005-04-29 엘지.필립스 엘시디 주식회사 Method for crystallizing of si, and methode for fabricating of poly-tft
JP2005305598A (en) * 2004-04-22 2005-11-04 National Institute Of Advanced Industrial & Technology Method for manufacturing fine structure
KR20090034919A (en) * 2006-07-20 2009-04-08 후지필름 가부시키가이샤 Microstructure and its fabrication method, sensor device, and raman spectroscopy device
WO2010056258A1 (en) * 2008-11-17 2010-05-20 Hewlett-Packard Development Company, L.P. A substrate for surface enhanced raman scattering (sers)

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050013571A (en) * 2002-06-12 2005-02-04 인텔 코포레이션 Metal coated nanocrystalline silicon as an active surface enhanced raman spectroscopy(sers) substrate
KR20050039023A (en) * 2003-10-23 2005-04-29 엘지.필립스 엘시디 주식회사 Method for crystallizing of si, and methode for fabricating of poly-tft
JP2005305598A (en) * 2004-04-22 2005-11-04 National Institute Of Advanced Industrial & Technology Method for manufacturing fine structure
KR20090034919A (en) * 2006-07-20 2009-04-08 후지필름 가부시키가이샤 Microstructure and its fabrication method, sensor device, and raman spectroscopy device
WO2010056258A1 (en) * 2008-11-17 2010-05-20 Hewlett-Packard Development Company, L.P. A substrate for surface enhanced raman scattering (sers)

Also Published As

Publication number Publication date
KR101229065B1 (en) 2013-02-04
KR20130003843A (en) 2013-01-09
WO2013005945A2 (en) 2013-01-10

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