WO2013002567A3 - 캐리어 기체에 의한 화합물 기화용 버블러 - Google Patents

캐리어 기체에 의한 화합물 기화용 버블러 Download PDF

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Publication number
WO2013002567A3
WO2013002567A3 PCT/KR2012/005110 KR2012005110W WO2013002567A3 WO 2013002567 A3 WO2013002567 A3 WO 2013002567A3 KR 2012005110 W KR2012005110 W KR 2012005110W WO 2013002567 A3 WO2013002567 A3 WO 2013002567A3
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WO
WIPO (PCT)
Prior art keywords
carrier gas
air
diffusing member
bubbler
compound
Prior art date
Application number
PCT/KR2012/005110
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English (en)
French (fr)
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WO2013002567A2 (ko
Inventor
박영균
이병현
정태희
전병주
Original Assignee
(주)그랜드텍
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)그랜드텍 filed Critical (주)그랜드텍
Publication of WO2013002567A2 publication Critical patent/WO2013002567A2/ko
Publication of WO2013002567A3 publication Critical patent/WO2013002567A3/ko

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • H01L21/205—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

본 발명은 반도체 웨이퍼 표면의 박막 형성을 위하여 캐리어 기체의 버블을 이용하여 화합물을 기화시키는 반도체 제조 고정용 버블러에 관한 것이다. 본 발명은 실시예로, 반응물질이 수용된 용기를 포함하는 버블러에 장착되는 것으로, 상기 용기 내부의 하부에 구비되는 플레이트, 상기 플레이트에 장착되며 외부에서 공급된 캐리어 가스를 방사상으로 분사시키는 제1산기부재, 상기 제1산기부재의 상부에 설치되며, 상승하는 캐리어 가스가 분산되어 통과하는 복수의 통과홀이 상하 관통되어 있는 제2산기부재 그리고 상기 제2산기부재의 상부에 설치되며, 상승하는 캐리어 가스가 통과하는 다공성물질로 이루어진 제3산기부재를 포함하는 것을 특징으로 하는 캐리어 기체에 의한 화합물 기화용 버블러를 제시한다.
PCT/KR2012/005110 2011-06-30 2012-06-28 캐리어 기체에 의한 화합물 기화용 버블러 WO2013002567A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2011-0064788 2011-06-30
KR1020110064788A KR101084997B1 (ko) 2011-06-30 2011-06-30 캐리어 기체에 의한 화합물 기화용 버블러

Publications (2)

Publication Number Publication Date
WO2013002567A2 WO2013002567A2 (ko) 2013-01-03
WO2013002567A3 true WO2013002567A3 (ko) 2013-04-11

Family

ID=45397941

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/005110 WO2013002567A2 (ko) 2011-06-30 2012-06-28 캐리어 기체에 의한 화합물 기화용 버블러

Country Status (2)

Country Link
KR (1) KR101084997B1 (ko)
WO (1) WO2013002567A2 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102207310B1 (ko) * 2019-09-24 2021-01-26 세메스 주식회사 가스 공급 유닛 및 이를 가지는 기판 처리 장치

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335243A (ja) * 1992-06-03 1993-12-17 Mitsubishi Electric Corp 液体バブリング装置
KR20000000946A (ko) * 1998-06-05 2000-01-15 주재현 기화기 및 이를 사용한 화학 기상 증착장치
KR20080108350A (ko) * 2006-04-11 2008-12-12 어플라이드 머티어리얼스, 인코포레이티드 화학 기상 증착을 위한 장치 및 방법
KR20100057760A (ko) * 2007-09-28 2010-06-01 도쿄엘렉트론가부시키가이샤 기화기 및 성막 장치

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335243A (ja) * 1992-06-03 1993-12-17 Mitsubishi Electric Corp 液体バブリング装置
KR20000000946A (ko) * 1998-06-05 2000-01-15 주재현 기화기 및 이를 사용한 화학 기상 증착장치
KR20080108350A (ko) * 2006-04-11 2008-12-12 어플라이드 머티어리얼스, 인코포레이티드 화학 기상 증착을 위한 장치 및 방법
KR20100057760A (ko) * 2007-09-28 2010-06-01 도쿄엘렉트론가부시키가이샤 기화기 및 성막 장치

Also Published As

Publication number Publication date
KR101084997B1 (ko) 2011-11-18
WO2013002567A2 (ko) 2013-01-03

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