WO2012162704A3 - Method and apparatus for reconditioning a carrier wafer for reuse - Google Patents

Method and apparatus for reconditioning a carrier wafer for reuse Download PDF

Info

Publication number
WO2012162704A3
WO2012162704A3 PCT/US2012/039891 US2012039891W WO2012162704A3 WO 2012162704 A3 WO2012162704 A3 WO 2012162704A3 US 2012039891 W US2012039891 W US 2012039891W WO 2012162704 A3 WO2012162704 A3 WO 2012162704A3
Authority
WO
WIPO (PCT)
Prior art keywords
reconditioning
reuse
deposition
film
solar cells
Prior art date
Application number
PCT/US2012/039891
Other languages
French (fr)
Other versions
WO2012162704A2 (en
Inventor
Karl-Josef Kramer
Mehrdad M. Moslehi
Jay Ashjaee
Virendra V. Rana
Seiichi YOKOI
Rafael Ricolcol
Original Assignee
Solexel, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US13/209,390 external-priority patent/US20120125256A1/en
Priority claimed from US13/341,976 external-priority patent/US20120167819A1/en
Application filed by Solexel, Inc. filed Critical Solexel, Inc.
Priority to KR1020137034593A priority Critical patent/KR101389030B1/en
Publication of WO2012162704A2 publication Critical patent/WO2012162704A2/en
Publication of WO2012162704A3 publication Critical patent/WO2012162704A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1892—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof methods involving the use of temporary, removable substrates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Recrystallisation Techniques (AREA)
  • Photovoltaic Devices (AREA)

Abstract

The disclosed subject matter pertains to deposition of thin film or thin foil materials in general, but more specifically to deposition of epitaxial monocrystalline or quasi-monocrystalline silicon film (epi film) for use in manufacturing of high efficiency solar cells. In operation, methods are disclosed which extend the reusable life and to reduce the amortized cost of a reusable substrate or template used in the manufacturing process of silicon and other semiconductor solar cells.
PCT/US2012/039891 2011-05-26 2012-05-29 Method and apparatus for reconditioning a carrier wafer for reuse WO2012162704A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020137034593A KR101389030B1 (en) 2011-05-26 2012-05-29 Method and apparatus for reconditioning a carrier wafer for reuse

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US201161490562P 2011-05-26 2011-05-26
US61/490,562 2011-05-26
US13/209,390 US20120125256A1 (en) 2007-10-06 2011-08-13 Apparatus and method for repeatedly fabricating thin film semiconductor substrates using a template
US13/209,390 2011-08-13
US13/341,976 US20120167819A1 (en) 2007-10-06 2011-12-31 Method for reconstructing a semiconductor template
US13/341,976 2011-12-31

Publications (2)

Publication Number Publication Date
WO2012162704A2 WO2012162704A2 (en) 2012-11-29
WO2012162704A3 true WO2012162704A3 (en) 2013-03-28

Family

ID=47218135

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2012/039891 WO2012162704A2 (en) 2011-05-26 2012-05-29 Method and apparatus for reconditioning a carrier wafer for reuse

Country Status (3)

Country Link
KR (1) KR101389030B1 (en)
MY (1) MY167902A (en)
WO (1) WO2012162704A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3027733B1 (en) * 2014-10-27 2017-05-05 Commissariat Energie Atomique PROCESS FOR PRODUCING A PHOTOVOLTAIC CELL

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050082526A1 (en) * 2003-10-15 2005-04-21 International Business Machines Corporation Techniques for layer transfer processing
US20050170611A1 (en) * 2003-01-07 2005-08-04 Bruno Ghyselen Recycling of a wafer comprising a multi-layer structure after taking-off a thin layer
US20110021006A1 (en) * 2006-10-09 2011-01-27 Solexel, Inc. Method for releasing a thin semiconductor substrate from a reusable template
US20110030610A1 (en) * 2009-05-05 2011-02-10 Solexel, Inc. High-productivity porous semiconductor manufacturing equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050170611A1 (en) * 2003-01-07 2005-08-04 Bruno Ghyselen Recycling of a wafer comprising a multi-layer structure after taking-off a thin layer
US20050082526A1 (en) * 2003-10-15 2005-04-21 International Business Machines Corporation Techniques for layer transfer processing
US20110021006A1 (en) * 2006-10-09 2011-01-27 Solexel, Inc. Method for releasing a thin semiconductor substrate from a reusable template
US20110030610A1 (en) * 2009-05-05 2011-02-10 Solexel, Inc. High-productivity porous semiconductor manufacturing equipment

Also Published As

Publication number Publication date
MY167902A (en) 2018-09-26
KR101389030B1 (en) 2014-04-29
WO2012162704A2 (en) 2012-11-29
KR20140008534A (en) 2014-01-21

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