WO2012161092A1 - 光源制御方法 - Google Patents
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- WO2012161092A1 WO2012161092A1 PCT/JP2012/062684 JP2012062684W WO2012161092A1 WO 2012161092 A1 WO2012161092 A1 WO 2012161092A1 JP 2012062684 W JP2012062684 W JP 2012062684W WO 2012161092 A1 WO2012161092 A1 WO 2012161092A1
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06754—Fibre amplifiers
- H01S3/06758—Tandem amplifiers
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
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- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10015—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by monitoring or controlling, e.g. attenuating, the input signal
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0064—Anti-reflection devices, e.g. optical isolaters
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0078—Frequency filtering
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094003—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094061—Shared pump, i.e. pump light of a single pump source is used to pump plural gain media in parallel
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1691—Solid materials characterised by additives / sensitisers / promoters as further dopants
- H01S3/1693—Solid materials characterised by additives / sensitisers / promoters as further dopants aluminium
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/17—Solid materials amorphous, e.g. glass
- H01S3/176—Solid materials amorphous, e.g. glass silica or silicate glass
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/06209—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
- H01S5/06216—Pulse modulation or generation
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- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/068—Stabilisation of laser output parameters
- H01S5/06804—Stabilisation of laser output parameters by monitoring an external parameter, e.g. temperature
Definitions
- the present invention relates to a method for controlling a pulse light source that amplifies pulse light output from a directly modulated semiconductor laser by an optical fiber amplifier and repeatedly outputs the amplified pulse light.
- Pulse light sources are used for industrial applications such as laser processing.
- the throughput required depending on the object to be processed varies, and the repetition frequency of the pulsed light output needs to be optimized according to the application.
- the control of the pulse width is important not only in microfabrication but also in the fields of optical measurement, communication, and medical applications.
- Patent Document 1 discloses an invention for compressing the pulse width of output pulsed light.
- the pulse light source described in Patent Document 1 is effective in compressing the pulse width of the output pulse light.
- the pulse width increases when the repetition frequency of the pulsed light output is low due to the transient response of the optical fiber amplifier. That is, according to Patent Document 1 described above, when the repetition frequency is 100 kHz, the full width at half maximum of the pulse (hereinafter referred to as pulse full width at half maximum, which may be simply expressed as pulse width or FWHM) is 0.56 ns. When the repetition frequency is 2.5 MHz, FWHM is 0.41 ns.
- the present invention has been made to solve the above-described problems, and an object thereof is to provide a light source control method capable of reducing the repetition frequency dependence of the pulse width (FWHM) of output pulsed light. .
- the light source control method prepares a pulse light source including a directly modulated semiconductor laser as a seed light source, and reduces the repetition frequency dependence of the pulse width of the output pulse light.
- the pulse light source includes a semiconductor laser, an optical filter, and an optical fiber amplifier, and has a MOPA (Master Oscillator Power Amplifier) structure.
- the semiconductor laser is directly modulated and outputs pulsed light.
- the optical filter receives pulsed light output from a semiconductor laser, and forms pulsed light in which one of the shorter wavelength side and the longer wavelength side of the wavelength band of the input pulsed light is attenuated from the other. Is output.
- the optical fiber amplifier amplifies the shaped pulsed light output from the optical filter and outputs the amplified pulsed light.
- the light source control method as a first aspect, by adjusting the temperature of the semiconductor laser, a predetermined full width at half maximum is realized at a predetermined repetition rate for the amplified pulsed light output from the optical fiber amplifier. Further, in the light source control method, as a second aspect applicable to the first aspect, by further controlling the pumping light power of the optical fiber amplifier, the amplified pulsed light output from the optical fiber amplifier is predetermined. It is preferable to realize the full width at half maximum of a predetermined pulse at a repetition frequency of Further, as third to fifth aspects applicable to at least one of the first and second aspects, the predetermined full width at half maximum is at least less than 1 ns, preferably less than 500 ps, more preferably less than 300 ps. In addition, as a sixth aspect applicable to at least one of the first and second aspects, it is preferable that the predetermined repetition frequency is 600 kHz or less.
- the light source control method of the present invention obtains in advance a relationship among the temperature, repetition frequency, and pulse full width at half maximum of the semiconductor laser. deep. This relationship can be realized by tabulating previously obtained measurement values of temperature, repetition frequency, and full width at half maximum of the pulse, and storing this measurement value table in a memory.
- the amplified pulse light from the optical fiber amplifier is It is preferable that a predetermined full width at half maximum is realized at a predetermined repetition rate.
- the light source control method monitors the full width at half maximum of the amplified pulsed light output from the optical fiber amplifier, It is preferable to realize a predetermined full width at half maximum at a predetermined repetition rate for the amplified pulsed light output from the optical fiber amplifier by feedback controlling the temperature adjustment of the semiconductor laser based on the full width at half maximum monitor result.
- the temperature of the semiconductor laser is raised when the full width at half maximum monitor result is wider than the full width at half maximum pulse, and the full width at half maximum monitor result is at a predetermined pulse. It is preferable that the temperature of the semiconductor laser is lowered when the full width at half maximum is smaller.
- the repetition frequency dependence of the pulse width (FWHM) of the output pulsed light can be suitably reduced.
- FIG. 1 is a diagram showing a configuration of an embodiment of a pulse light source according to the present invention.
- the pulse light source 1 has a MOPA structure and includes a seed light source 10 and an optical fiber amplifier 20.
- the seed light source 10 is a 1060 nm-band Fabry-Perot semiconductor laser that is directly pulse-modulated in a driving current range of 0 to 220 mA so as to realize a high repetition frequency ranging from 100 kHz to 1 MHz and a constant pulse width independent of the repetition frequency. including.
- the optical fiber amplifier 20 includes a preamplifier 21 and a booster amplifier 22.
- the preamplifier 21 includes a YbDF 110, a band pass filter 120, a YbDF 130, a band pass filter 140, a YbDF 150, and the like.
- the booster amplifier 22 includes a YbDF 160 and the like.
- Each of the preamplifier 21 and the booster amplifier 22 is an optical fiber amplifier, amplifies the pulse light repeatedly output from the seed light source 10, and outputs the amplified pulse light from the end cap 30.
- This pulsed light source 1 outputs pulsed light having a wavelength near 1060 nm, which is suitable for laser processing.
- YbDFs 110, 130, 150, and 160 are optical amplifying media that amplify pulse light having a wavelength of about 1060 nm outputted from the seed light source 10, and Yb element is added as an active substance to the core of an optical fiber made of quartz glass. .
- YbDFs 110, 130, 150, and 160 are advantageous in that the pumping light wavelength and the amplified light wavelength are close to each other and are advantageous in terms of power conversion efficiency, and are advantageous in that they have a high gain in the vicinity of a wavelength of 1060 nm.
- These YbDFs 110, 130, 150, and 160 constitute a four-stage optical fiber amplifier.
- the pump light from the pump light source 112 via the optical coupler 113 and the optical coupler 111 is supplied to the first stage YbDF 110 in the forward direction.
- the YbDF 110 amplifies the pulsed light from the seed light source 10 via the optical isolator 114 and the optical coupler 111, and the amplified pulsed light is output via the optical isolator 115.
- the band pass filter 120 receives the amplified pulse light from the first stage YbDF 110 via the optical isolator 115 and attenuates one of the short wavelength side and the long wavelength side of the wavelength band of the input pulse light from the other.
- the shaped pulse light is output.
- the pump light from the pump light source 112 via the optical coupler 113 and the optical coupler 131 is supplied to the second stage YbDF 130 in the forward direction. Then, the YbDF 130 amplifies the pulsed light from the band pass filter 120 via the optical coupler 131 and outputs the amplified pulsed light.
- the band pass filter 140 receives the amplified pulse light from the second stage YbDF 130 and outputs shaped pulse light in which one of the short wavelength side and the long wavelength side of the wavelength band of the input pulse light is attenuated from the other. To do.
- the pump light from the pump light source 152 via the optical coupler 151 is supplied to the third stage YbDF 150 in the forward direction.
- the YbDF 150 amplifies the pulsed light from the bandpass filter 140 that has passed through the optical isolator 153 and the optical coupler 151, and outputs the amplified pulsed light.
- the pump light from each of the pump light sources 162 to 167 via the optical combiner 161 is supplied to the fourth stage YbDF 160 in the forward direction.
- the YbDF 160 further amplifies the pulse light from the third stage YbDF 150 via the optical isolator 168 and the optical combiner 161, and the amplified pulse light is output to the outside of the pulse light source 1 through the end cap 30.
- a more preferable configuration example is as follows.
- Each of YbDFs 110, 120, and 130 is a single clad structure Al co-doped silica type YbDF, Al concentration is 5 wt%, core diameter is 7 ⁇ m, clad diameter is 125 ⁇ m, and 915 nm band excitation light is not saturated.
- Absorption is 70 dB / m, 975 nm band excitation light unsaturated absorption peak is 240 dB / m, and length is 7 m.
- the fourth stage YbDF160 is an Al co-doped silica type YbDF having a double clad structure, the Al concentration is 1 wt%, the core diameter is 10 ⁇ m, the clad diameter is 125 ⁇ m, and the 915 nm band excitation light is not saturated. Absorption is 1.5 dB / m and length is 3.5 m.
- the wavelengths of excitation light supplied to YbDF110, 130, 150, 160 are all in the 0.98 ⁇ m band.
- the excitation light supplied to the first stage YbDF 110 has a power of 200 mW and is in a single mode.
- the pump light supplied to the second stage YbDF 130 has a power of 200 mW and is in a single mode.
- the pumping light supplied to the third stage YbDF 150 has a power of 400 mW and is in a single mode.
- the excitation light supplied to the fourth stage YbDF 160 has a power of 12 to 24 W and is multimode. In the following, when the power of pumping light supplied to the fourth stage YbDF 160 is 24 W, the pumping light power is expressed as a relative ratio to 100%.
- each of the bandpass filters 120 and 140 is intentionally shifted from the maximum intensity wavelength of the output light spectrum of the seed light source 10 to the short wavelength side or the long wavelength side, so that the char light of the seed light output from the seed light source 10 can be reduced. Only the ping component can be cut out. Then, by amplifying the light thereafter, pulse light with a short pulse width can be generated. Each of the bandpass filters 120 and 140 can remove ASE light. The FWHM of the transmission spectrum of each of the bandpass filters 120 and 140 is maintained at, for example, 1 ns or less.
- FIG. 2 to FIG. 13 are diagrams each showing a pulse waveform of the output pulse light from the pulse light source 1.
- a total of 12 graphs G210, G310, G410, G510, G610, G710, G810, G910, G1010, G1110, G1210, and G1310 indicate that the excitation light power of the fourth stage YbDF160 is 30%.
- the pulse waveform of the output pulse light in the case of the above is shown.
- a total of ten graphs G220, G320, G420, G620, G720, G820, G920, G1020, G1120, and G1220 indicate the pulse waveform of the output pulse light when the excitation light power of the fourth stage YbDF160 is 50%.
- a total of 11 graphs G230, G330, G430, G530, G630, G730, G830, G1030, G1130, G1230, and G1330 show the output pulse light when the pump light power of the fourth stage YbDF160 is 70%.
- a pulse waveform is shown.
- a total of 12 graphs G240, G340, G440, G540, G640, G740, G840, G940, G1040, G1140, G1240, and G1340 are output pulses when the pump light power of the fourth stage YbDF160 is 100%.
- the pulse waveform of light is shown.
- FIGS. 2 to 5 show the pulse waveforms of the output pulse light when the temperature of the seed light source 10 is set to 17 ° C.
- 2 shows pulse waveforms (graphs G210 to G240) when the repetition frequency is 100 kHz
- FIG. 3 shows pulse waveforms (graphs G310 to G340) when the repetition frequency is 300 kHz
- FIG. Pulse waveforms (graphs G410 to G440) when the frequency is 600 kHz are shown
- FIG. 5 shows pulse waveforms (graphs G510 and G530 to G540) when the repetition frequency is 1000 kHz.
- 6 to 9 show the pulse waveforms of the output pulse light when the temperature of the seed light source 10 is set to 27 ° C.
- 6 shows pulse waveforms (graphs G610 to G640) when the repetition frequency is 100 kHz
- FIG. 7 shows pulse waveforms (graphs G710 to G740) when the repetition frequency is 300 kHz
- FIG. 9 shows pulse waveforms (graphs G910 to G920, G940) when the repetition frequency is 1000 kHz.
- FIG. 9 shows pulse waveforms when the frequency is 600 kHz.
- 10 to 13 show the pulse waveforms of the output pulsed light when the temperature of the seed light source 10 is set to 37 ° C.
- 10 shows pulse waveforms (graphs G1010 to G1040) when the repetition frequency is 100 kHz
- FIG. 11 shows pulse waveforms (graphs G1110 to G1140) when the repetition frequency is 300 kHz
- FIG. 13 shows pulse waveforms (graphs G1310 to G1320, G1340) when the frequency is set to 600 kHz
- FIG. 13 shows pulse waveforms (graphs G1310 to G1320, G1340) when the repetition frequency is set to 1000 kHz.
- FIG. 14 is a graph showing the relationship between the FWHM of the output pulsed light from the pulse light source 1 and the repetition frequency.
- a graph G1410 is a relationship when the pumping light power is 100% at a temperature of 17 ° C. of the seed light source 10
- a graph G1420 is a graph when the pumping light power is 70% at a temperature of 17 ° C. of the seed light source 10.
- the relationship, graph G1430 shows the relationship when the pumping light power is 50% at a temperature of 17 ° C. of the seed light source 10, respectively.
- Graph G1440 is a relationship when the pumping light power is 100% at a temperature of 27 ° C.
- graph G1450 is a relationship when the pumping light power is 70% at a temperature of 27 ° C. of the seed light source 10, and graph G1460. These show the relationship when the pumping light power is 50% when the temperature of the seed light source 10 is 27 ° C.
- a graph G1470 is a relationship when the pumping light power is 100% at a temperature of 37 ° C. of the seed light source 10
- a graph G1480 is a relationship when the pumping light power is 70% at a temperature of 37 ° C. of the seed light source 10, a graph G1490. These show the relationship when the pumping light power is 50% when the temperature of the seed light source 10 is 37 ° C.
- FIG. 15 and 16 are graphs showing the relationship between the FWHM of the pulse light output from the pulse light source 1 and the temperature of the seed light source 10.
- FIG. 15 shows a graph when the pump light power of the fourth stage YbDF 160 is 100%.
- the graph G1510 is a relationship when the repetition frequency is 100 kHz
- the graph G1520 is the case when the repetition frequency is 300 kHz. Relationship, graph G1530 shows the relationship when the repetition frequency is 600 kHz, and graph G1540 shows the relationship when the repetition frequency is 1 MHz.
- FIG. 16 shows a graph when the pump light power of the fourth stage YbDF 160 is 70%.
- the graph G1610 is a relationship when the repetition frequency is 100 kHz
- the graph G1620 is a repetition frequency of 300 kHz
- the graph G1630 shows the relationship when the repetition frequency is 600 kHz
- the graph G1640 shows the relationship when the repetition frequency is 1 MHz.
- the FWHM of the output pulse light is at least less than 1 ns, preferably less than 500 ps, and more preferably less than 300 ps. If the temperature is 35.5 ° C. and the excitation power of the fourth stage YbDF160 is 100%, and if the repetition frequency is 300 kHz, the seed light source temperature is 34.0 ° C. and the excitation power of the fourth stage YbDF160 is 100%. If the repetition frequency is 600 kHz, the seed light source temperature may be 27.0 ° C. and the excitation power of the fourth stage YbDF 160 may be 100%. By controlling the temperature of the seed light source 10 in this way, the FWHM of the output pulse light can be maintained at 300 ps in the range of the repetition frequency of 100 kHz to 600 kHz.
- the temperature of the seed light source 10 is set to 37.0 ° C. and the excitation power of the fourth stage YbDF 160 is set to 70%. .
- the repetition frequency is 300 kHz
- the temperature of the seed light source 10 may be 34.0 ° C.
- the excitation power of the fourth stage YbDF 160 may be 70%.
- the repetition frequency is 600 kHz
- the temperature of the seed light source 10 may be 27.0 ° C.
- the excitation power of the fourth stage YbDF 160 may be 70%.
- the repetition frequency is 1 MHz
- the temperature of the seed light source may be 27.0 ° C.
- the FWHM of the output pulse light can be maintained at 200 ps in the range of the repetition frequency of 100 kHz to 1 MHz.
- the control of the excitation power of the fourth stage YbDF 160 if it is attenuated to the peak value of the output pulse light, the processing quality is affected. For this reason, it is desirable to control the peak value of the output pulsed light within a region saturated due to either or both of the small signal gain of the optical fiber amplifier and the nonlinear optical effect in the optical fiber. In the graphs shown in FIGS. 2 to 13, the range in which the excitation power of the fourth stage YbDF 160 is 70 to 100% corresponds to this.
- the FWHM of the output pulsed light of the pulsed light source 1 is varied under various conditions (including the repetition frequency, the temperature of the seed light source 10 and the fourth stage YbDF excitation power). Based on this result, the temperature of the seed light source 10 and the fourth stage YbDF excitation power are adjusted based on this result, so that the output pulse light has a predetermined pulse width (at a predetermined repetition frequency). FWHM) is preferable.
- Such control by the feedforward method is suitable for reducing the apparatus cost.
- FIGS. 17 and 18 are diagrams showing the configuration of another embodiment of the pulse light source according to the present invention.
- the pulse light sources 1A and 1B shown in these drawings are light sources that perform feedback control. Such feedback control is superior in terms of guaranteeing stabilization of processing quality.
- a configuration for monitoring output pulse light (beam splitter, PD 44, digital oscilloscope 45 disposed on the downstream side of the end cap 30). Is unnecessary.
- the pulse light source 1A shown in FIG. 17 adjusts the temperature of the seed light source 10 by the Peltier element 41, stores the temperature setting value Tref of the seed light source 10 in the memory 50 by the temperature setting unit 43, and The Peltier element 41 is controlled by the operational amplifier 42 so that the temperature measurement value becomes the temperature setting value Tref.
- the pulse light source 1 ⁇ / b> A branches a part of the pulsed light output from the end cap 30 with a beam splitter, and monitors the FWHM of the branched light received by the PD 44 with the digital oscilloscope 45.
- the memory 50 stores the FWHM of the output pulsed light of the pulsed light source 1 measured in advance under conditions (including the repetition frequency, the temperature of the seed light source 10 and the fourth stage YbDF excitation power).
- the measured values are stored as a table associated with each condition.
- the control unit 46A performs feedback control based on the FWHM monitoring result.
- the pulse light source 1A adjusts the temperature of the seed light source 10 by adjusting the temperature setting value Tref of the seed light source 10 in the temperature setting unit 43 by this feedback control, and the output pulse light has a predetermined pulse at a predetermined repetition frequency. Realize width (FWHM). At this time, if the FWHM monitor result is wider than the predetermined pulse width (FWHM), the temperature of the seed light source 10 is increased. If the FWHM monitor result is narrower than the predetermined pulse width (FWHM), the seed light source 10 Reduce the temperature.
- the pulse light source 1B shown in FIG. 18 includes a control unit 46B instead of the control unit 46A.
- the control unit 46B performs feedback control based on the monitoring result of FWHM.
- the pulse light source 1B adjusts the temperature of the seed light source 10 by adjusting the temperature setting value Tref of the seed light source 10 in the temperature setting unit 43 by this feedback control, and also adjusts the excitation power of the fourth-stage YbDF 160.
- a predetermined pulse width (FWHM) is realized at a predetermined repetition rate.
- the FWHM control algorithm for the output pulsed light is preferably as follows. That is, as shown in FIG. 19, first, in step S1, the temperature of the seed light source 10 is adjusted within the variable range, and if this still fails to realize the desired FWHM of the output pulse light, in step S2, The excitation power of the fourth stage YbDF 160 is adjusted. If the FWHM of the desired output pulse light is wider than the adjustable value in steps S1 and S2, any of the pulse width, bias level and amplitude of the modulation signal of the seed light source 10 is adjusted in step S3.
- the temperature adjustment in step S1 is desirably performed under conditions with a repetition frequency of 600 kHz or less. As shown in FIGS. 15 and 16, when the repetition frequency exceeds 600 kHz, the dependence of the FWHM of the output pulse light on the temperature of the seed light source 10 is not monotonous.
- any alarm (lighting of the LED on the operation panel or on the control software) will be issued by the control unit in either feedforward control or feedback control. Error message) is desirable.
- SYMBOLS 1,1A, 1B Pulse light source, 10 ... Seed light source, 20 ... Optical fiber amplifier, 21 ... Preamplifier, 22 ... Booster amplifier, 30 ... End cap, 50 ... Memory, 110 ... YbDF, 111 ... Optical coupler, 112 ... Excitation Light source, 113 ... optical coupler, 114, 115 ... optical isolator, 120 ... band pass filter, 130 ... YbDF, 131 ... optical coupler, 140 ... band pass filter, 150 ... YbDF, 151 ... optical coupler, 152 ... pumping light source, 153 ... optical isolator, 160 ... YbDF, 161 ... optical combiner, 162 to 167 ... excitation light source, 168 ... optical isolator.
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- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Lasers (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims (9)
- 直接変調され、パルス光を出力する半導体レーザと、前記半導体レーザから出力されるパルス光を入力し、その入力パルス光の波長帯域のうちの前記入力パルス光のピーク波長より短波長側および長波長側の一方を他方より減衰させた成形パルス光を出力する光フィルタと、そして、前記光フィルタから出力された成形パルス光を増幅し、その増幅パルス光を出力する光ファイバ増幅器と、を備えたパルス光源を用意し、
前記半導体レーザの温度を調整することにより、前記光ファイバ増幅器から出力される増幅パルス光について、所定の繰返し周波数において所定のパルス半値全幅を実現する光源制御方法。 - 更に前記光ファイバ増幅器の励起光パワーを制御することにより、前記光ファイバ増幅器から出力される増幅パルス光について、所定の繰返し周波数において所定のパルス半値全幅を実現することを特徴とする請求項1に記載の光源制御方法。
- 前記所定のパルス半値全幅が1ns未満であることを特徴とする請求項1または2に記載の光源制御方法。
- 前記所定のパルス半値全幅が500ps未満であることを特徴とする請求項3に記載の光源制御方法。
- 前記所定のパルス半値全幅が300ps未満であることを特徴とする請求項4に記載の光源制御方法。
- 前記所定の繰返し周波数が600kHz以下であることを特徴とする請求項1または2に記載の光源制御方法。
- 前記半導体レーザの温度と繰返し周波数とパルス半値全幅との間の関係を予め求めておき、この関係に基づいて前記半導体レーザの温度調整をフィードフォワード制御することにより、前記光ファイバ増幅器からの増幅パルス光について、所定の繰返し周波数において所定のパルス半値全幅を実現することを特徴とする請求項1または2に記載の光源制御方法。
- 前記光ファイバ増幅器から出力される増幅パルス光の半値全幅をモニタし、この半値全幅モニタ結果に基づいて前記半導体レーザの温度調整をフィードバック制御することにより、前記光ファイバ増幅器から出力される増幅パルス光について、所定の繰返し周波数において所定のパルス半値全幅を実現することを特徴とする請求項1または2に記載の光源制御方法。
- 前記半値全幅モニタ結果が前記所定のパルス半値全幅と比較して広いときに前記半導体レーザの温度を上げ、前記半値全幅モニタ結果が前記所定のパルス半値全幅と比較して狭いときに前記半導体レーザの温度を下げることを特徴とする請求項8に記載の光源制御方法。
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JP2013516329A JP5654673B2 (ja) | 2011-05-24 | 2012-05-17 | 光源制御方法 |
EP12789472.3A EP2717394A4 (en) | 2011-05-24 | 2012-05-17 | LIGHT SOURCE CONTROL METHOD |
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JP6901261B2 (ja) * | 2016-12-27 | 2021-07-14 | 株式会社ディスコ | レーザー装置 |
CN108683068B (zh) * | 2018-03-14 | 2020-06-09 | 深圳市创鑫激光股份有限公司 | 激光器的控制方法、电子控制装置、激光器、激光打孔设备以及存储介质 |
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JPWO2012161092A1 (ja) | 2014-07-31 |
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