WO2012157922A2 - Procédé permettant de détecter le flux et le fonctionnement anormal d'un système de distribution de fluide - Google Patents

Procédé permettant de détecter le flux et le fonctionnement anormal d'un système de distribution de fluide Download PDF

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Publication number
WO2012157922A2
WO2012157922A2 PCT/KR2012/003758 KR2012003758W WO2012157922A2 WO 2012157922 A2 WO2012157922 A2 WO 2012157922A2 KR 2012003758 W KR2012003758 W KR 2012003758W WO 2012157922 A2 WO2012157922 A2 WO 2012157922A2
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Prior art keywords
waveform
teaching
section
flow rate
wave
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PCT/KR2012/003758
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English (en)
Korean (ko)
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WO2012157922A3 (fr
Inventor
김재달
김병섭
김용환
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주식회사 에이앤디코퍼레이션
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Publication of WO2012157922A2 publication Critical patent/WO2012157922A2/fr
Publication of WO2012157922A3 publication Critical patent/WO2012157922A3/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/66—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by measuring frequency, phase shift or propagation time of electromagnetic or other waves, e.g. using ultrasonic flowmeters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
    • G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/66—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by measuring frequency, phase shift or propagation time of electromagnetic or other waves, e.g. using ultrasonic flowmeters
    • G01F1/666—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by measuring frequency, phase shift or propagation time of electromagnetic or other waves, e.g. using ultrasonic flowmeters by detecting noise and sounds generated by the flowing fluid
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
    • G01F25/0092—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume for metering by volume
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means

Definitions

  • the present invention relates to a technology for detecting the flow rate and abnormal operation state in the fluid dispensing system used in the semiconductor manufacturing process or the display device industry, in particular a non-contact flow rate installed outside the pipe to detect the fluid flow without cutting the pipe
  • a method of detecting the flow rate and abnormal operation of a fluid dispense system that sets a normalized reference waveform range based on the output signal of the change detector and analyzes and detects the flow rate of the dispensed fluid and various abnormal operation conditions based on the normalized waveform range. It is about.
  • Dispenser is a device (or system) that injects (or discharges) the flow of fluid based on precise control technology. It dispenses the desired amount of liquid in a discontinuous form rather than in a continuous flow form. .
  • a flow rate sensing technique is applied and a flow rate sensing technique for detecting an abnormality in a discharged flow rate and a fluid flow state and informing a main control device or a user is applied.
  • the flow rate is detected using a contact flow rate change sensor installed directly on a flow path in a fluid flowing pipe, as in Korean Patent Application Publication No. 10-2009-0047052.
  • the flow change detector is concerned about the corrosion of the flow change detector due to the fluid. Problems such as contamination of the fluid by the fluid may occur.
  • the conventional flow rate change detector merely detects the flow rate, but it is an abnormal operation such as the flow of discontinuous micro flow rate, incorrect operation of components (pump, filter, valve, piping) on the flow path, bubble generation or mixing, etc. There is a problem that can not detect the operation.
  • an object of the present invention is to install a flow rate change sensor in a non-contact structure outside the pipe without cutting the pipe in the fluid dispensing system used in the semiconductor manufacturing process or display device industry to output the output signal thereof.
  • the normalized reference waveform range is set, and the reference waveform range is used to detect the flow rate discontinuously supplied through the pipe in the operation mode, or the abnormal state of the fluid flow can be comprehensively modeled. It is to analyze by (three-dimensional) and to inform the main control system of the result (error state such as alarm) or to apply it to the outside.
  • the first embodiment of the present invention for achieving the above object, (a) in the teaching mode, by monitoring the output signal of the flow rate change sensor installed in a non-contact structure to the fluid discontinuously supplied in the pipe to teach the teaching wave data A validity judging step of, upon recording, invalidating the input data as invalid teaching wave data until the recording interval of the teaching wave data reaches a preset synchronization signal section; (b) When the recording section of the teaching wave data enters a preset synchronization signal section, the teaching wave data is recorded until a cumulative sampling value reaches a preset value, and the recording operation of the sampling learning data is preset.
  • a reference waveform range setting step of statistically analyzing a sampling value collected through the teaching wave data recording operation and modeling a reliable range to set a reference waveform range (upper and lower limit allowable range);
  • In the operation mode detects the output signal of the non-contact flow rate change detector and compares the detected result with the reference waveform range set in the reference waveform range setting step, and discontinuously through the pipe based on the comparison analysis result. And generating an alarm or a control output signal by detecting a flow rate supplied thereto or determining an abnormality in a fluid flow path.
  • the second embodiment of the present invention for achieving the above object is applied to a PAL (photoresist) dispense device of Trek equipment, which is a semiconductor manufacturing process equipment, (a) in the teaching mode, the fluid is discontinuously supplied Detects the output signal of the flow rate changer installed in a non-contact structure, and displays the teaching wave of the entire section including the signal invalid (pre-wet) determination section and the signal valid (photoresist) section for the first teaching wave.
  • PAL photoresist
  • Trek equipment which is a semiconductor manufacturing process equipment
  • Alarm generation step of determining and generating an alarm or a control output signal.
  • the third embodiment of the present invention for achieving the above object, (a) in the teaching mode, when collecting the output signal of the non-cutting flow rate change detector, the data input until entering the preset synchronization signal section A validity determining step of invalidating and starting to record the teaching wave data input as valid data thereafter; (b) recording the teaching wave data which is determined as valid data in the validity determining step until the cumulative index count value reaches a preset limit value, and records the learning operation of the teaching wave data at a predetermined number of repetitions; Learning to repeat until it is reached; (c) a reference waveform range setting step of statistically analyzing the sampling values collected through the learning step and modeling a reliable range to set a reference waveform range (upper and lower limit allowable range); (d) In the operation mode, detect the output signal of the flow rate change detector and compare and analyze the teaching wave data according to the reference waveform range data, and detect the flow rate or determine an alarm occurrence condition based on the result and generate an alarm. Alarm generation step occurs.
  • the present invention is a fluid dispensing system used in semiconductor manufacturing process or display device (e.g. LED) industry that requires high precision control, and is an output of a non-contact flow change detector installed at the outside of the pipe without cutting the pipe to sense the flow rate.
  • FIG. 1 is a schematic diagram of a dispensing apparatus to which a flow rate and fluid abnormality motion detection method according to the present invention is applied.
  • FIG. 2 is a schematic diagram of the flow rate change detector of FIG. 1.
  • FIG. 3 is an overall block diagram of a flow rate and fluid anomaly detection system of the present invention.
  • FIG. 4 is a signal flowchart of a first embodiment of a method for detecting a flow rate and fluid abnormal operation according to the present invention.
  • FIG. 5 is a waveform diagram illustrating synchronization of an output waveform and a trigger on period of a flow change detector.
  • FIG. 6 is a signal flowchart of a second embodiment of a method for detecting a flow rate and fluid abnormal operation according to the present invention.
  • FIG. 7 is a waveform diagram illustrating receiving a teaching wave start index point from a user in the second embodiment of the present invention.
  • FIG 8 is an explanatory diagram of an abnormal motion detection waveform of the fluid abnormal motion detection system according to the third embodiment of the present invention.
  • FIG. 9 is a signal flowchart of a third embodiment of a method for detecting a flow rate and fluid abnormal operation according to the present invention.
  • FIG. 10 is a waveform diagram showing the total time required to stop at the start point of the flow flow in the present invention.
  • non-contact in the present invention refers to the manner of installing the flow rate change detector without cutting the pipe.
  • non-contact in the present invention means that the fluid moving in the pipe and the flow rate changer installed outside the pipe does not directly contact each other.
  • the fluid includes a liquid and a gas.
  • the semiconductor process include photoresist (PR), thinner, flowable oxide (FOX), and nitrogen gas (N2).
  • FIG. 1 is a schematic diagram of a dispensing apparatus to which an abnormal motion detection method according to the present invention is applied, and as shown therein, a chemical container 110, a pump 120, a filter 130, a valve 140, and a flow fluid change It consists of a detector 100 and a pipe 150.
  • the chemical stored in the chemical (solution) container 110 is pumped by the pumping operation of the pump 120 to filter 130, the valve 140, the flow rate change sensor 100, and the pipe 150. It is dispensed into the wafer through the wafer, not in a continuous manner, but in a non-flammable form, such as an intermittent pulse.
  • the filter 130 removes the foreign matter contained in the chemical discharged to the pipe 150, the valve 140 to control the discharged chemical supply on, off and prevent the fluid ?? force phenomenon at the end of the nozzle Suckback operation for
  • the flow rate change detector 100 having the structure detects the small change.
  • FIG. 2 is a schematic view showing the structure of the flow rate change sensor 100, and as shown therein, the fluid sensor 160, the first elastic member 171 and the lower cover 181 on one side of the pipe 150 is provided.
  • the other side of the pipe 150 is provided with a second elastic member 172 and an upper cover 182, and the upper cover 182 and the lower cover 181 are fastened by screws 183.
  • the first elastic member 171 surrounds the fluid sensor 160 and the pipe 150.
  • the second elastic member 172 is positioned to face the first elastic member 171 and has a form surrounding the sensing fluid sensor 110 and the pipe 150.
  • the first elastic member 171 and the second elastic member 172 may be any material that is elastic to wrap the fluid sensor 110, alleviate the impact and properly transmit the vibration of the pipe 150.
  • first elastic member 171 and the second elastic member 172 are separated while facing each other, but they may be joined together to cover at least a portion of the pipe 150.
  • the load adjusting unit 184 is attached to the opposite side of the portion of the second elastic member 172 which is in contact with the pipe 150 to control the intensity of vibration transmitted to the fluid sensor 110.
  • the load adjusting unit 184 may adjust the pressure applied to the pipe 150 and the fluid sensor 110 by, for example, a screw or a spring.
  • the fluid sensor 110 is located on the outside of the pipe 150 without cutting the pipe 150 and detects a vibration caused by the flow of the fluid inside the pipe 150 and converts it into an electrical signal.
  • the fluid sensor 110 detects the vibration of the pipe 150 and the micro pressure transmitted through the pipe 150 and converts the electric signal into an electric signal.
  • the piezoelectric device may be a piezo sensor or a vibration sensor. Can be implemented.
  • FIG. 3 is a block diagram of a dispensing system to which a method for detecting and analyzing a flow rate and various abnormal operation states is applied based on the output signal of the flow rate change detector. 200, the interface board 300, and the abnormal operation analysis unit 400.
  • the flow rate change detector 100 is installed outside the pipe as described in FIG. 2 to detect vibration of the pipe and output a signal accordingly.
  • the amplifying unit 200 amplifies and outputs a weak electric signal output from the flow rate change sensor 100 to a level suitable for processing.
  • the interface board 300 converts the output signal of the amplifier 200 into a digital signal suitable for processing by the abnormal operation analyzer 400 and outputs the digital signal.
  • the abnormal motion analysis unit 400 teaches a plurality of measurement results under various conditions based on the output signal of the interface board 300 and models it to set a reference waveform range (upper and lower limit allowable range), and then an operation mode. By comparing and analyzing the waveform range of the input signal in real time with each other, the position of the pipe having flow rate, the pressure of the fluid, the presence or absence of bubbles, or the blockage or abnormality of the pipe is derived.
  • FIG. 4 is a process flowchart showing the first embodiment of the flow and fluid abnormality operation method of the present invention.
  • the current mode is a teaching mode for setting a reference waveform range, and it is determined that the teaching mode is selected, the microscopic vibration transmitted by the flow rate change sensor 100 installed in the pipe is detected, and the detection accordingly.
  • the signal is output (S401, S402).
  • the waveform output from the flow rate change sensor 100 belongs to a preset synchronization signal section (Trigger on), if it is determined to belong to the synchronization signal section, it is determined to be a valid waveform, but if it does not belong to the synchronization signal section It is determined as an invalid waveform (eg, a noise signal) (S403 and S404).
  • Trigger on if it is determined that the waveform output from the flow rate change sensor 100 belongs to a preset synchronization signal section, it is determined to be a valid waveform, but if it does not belong to the synchronization signal section It is determined as an invalid waveform (eg, a noise signal) (S403 and S404).
  • the invalidation process is performed in a section other than the trigger-on section Ton.
  • the data is recorded as '0'.
  • the pre-wet refers to a process of dissolving and removing waste gas such as ignitable gas and toxic gas generated in the manufacturing process of a semiconductor or a display device (eg, LED, LCD, etc.) by dissolving ammonia that is well dissolved in water.
  • the first waveform section W1 before the synchronization signal section Ton is a waveform section at pre-wet injection on
  • the second waveform section W2 is a waveform section at pre-wet injection off
  • the first waveform section W3 in the trigger on section Ton is a waveform section when the photoresist injection is on
  • the second waveform section W4 is a waveform section when the photoresist injection is off.
  • the input waveform is recorded as learning (hereinafter, 'teaching') wave data. do.
  • learning hereinafter, 'teaching'
  • the teaching wave data is a value corresponding to the amplitude value (Y-axis value) of the waveform at the corresponding point in time, and the teaching is performed until the cumulative index count value (ICV) (the X-axis time axis value) reaches a preset limit value.
  • the wave data recording operation is continued (S406).
  • sampling values of the teaching wave collected through the above process are statistically analyzed, the confidence interval is modeled, and the reference waveform range is set based on the modeling result, and this is used as a modeling measurement waveform (S408, S409).
  • the current mode is determined as the operation (operation) mode.
  • the waveform is compared with the reference waveform range, and an alarm for notifying occurrence of abnormal operation is output or a control signal is output based on the comparison result (S410 and S411).
  • Examples of the abnormal operation occurrence include flow rate, abnormal flow of fluid, abnormal operation of pumps, filters, valves, and the like, and bubble generation.
  • mismatch rate MMC mismatch rate
  • MMR Miss Match Rate
  • Miss Match Count means that the actual wave data does not belong to the reference waveform range of the corresponding modeling measurement.
  • T1 Total time spent trained (modeled) (measured at the beginning of the flow flow (M1) in FIG.
  • T2 From the actual flow signal waveform to be modeled and measured, at the beginning of the flow (M1).
  • the first waveform section W3 in the synchronization signal section Ton is divided into the actual dispense waveform by utilizing various variables detected through the writing process of the teaching wave data. A process of checking for a match may be added.
  • the number of mounts of the currently detected waveform is counted and compared with the number of mounts of the reference waveform stored in the teaching mode. As a result of the comparison, if the currently detected waveform is determined to be part of the dispense waveform (waveform related to the intermittent flow rate), the corresponding waveform is matched with the mount of the reference waveform to compare the waveform.
  • the start of the first waveform section W3 and the second waveform section W4 in the synchronization signal section Ton are distinguished based on the comparison result.
  • the second waveform section shows an example of the last waveform section of the reference waveform.
  • the second waveform section is not limited to the second waveform section and can be extended to more waveform sections.
  • comparing the currently detected waveform with the reference waveform if it is determined that the next waveform of the first waveform section (W3) is shifted, and shifted by the corresponding distance in the opposite direction shifted It converts into injection volume cc as much as it shifted.
  • FIG. 6 is a signal flowchart illustrating a second embodiment of a method for detecting a flow rate and fluid abnormal operation according to the present invention.
  • teaching output modeling of the output signal of the flow rate change detector 100 is performed in real time (S601 and S602).
  • the user is to designate the synchronization section directly.
  • the teaching wave data of the entire section including the invalid (pre-wet) section and the valid (photoresist) section is recorded for the first teaching wave, and the teaching wave of the entire section is displayed as shown in FIG.
  • the user may designate a teaching wave start index point on the teaching wave of the entire interval.
  • the second teaching wave data to be input is subjected to waveform validity checking and passes to the next step (S607) if it passes, and proceeds to the second step (S602) if it does not pass (S604-S606).
  • a period of the first teaching wave is examined to select a teaching wave of one period (eg, a positive period) from among the teaching waves inputted as a positive period and a negative period.
  • the number of mounts of the waveform section (section A in FIG. 8) first appearing from the teaching wave start index point is detected and compared with the number of mounts of the corresponding section of the first teaching wave. The validity of the waveform is determined based on the comparison result.
  • the interval between the first waveform section (section A in FIG. 8) and the second waveform section (section C in FIG. 8) appearing from the teaching wave start index point (section B in FIG. 8) ) Is compared with the distance of the corresponding section of the first teaching wave to determine the validity.
  • the number of mounts of the second waveform section (C section in FIG. 8) that appears from the teaching wave start index point is detected and compared with the number of mounts of the corresponding section of the first teaching wave, The validity of the waveform is determined based on the comparison result.
  • each waveform section (A, B, C section in Fig. 8) appearing after the teaching wave start index point, the average value of the index of each mount, the first appearing after the teaching wave start index point Average number of mounts of the first waveform section A and the second waveform section B, the start point and the end point of each waveform section (A, C section in FIG. 8).
  • Index mean value As an example of the various comparison variables, the average value of each waveform section (A, B, C section in Fig. 8) appearing after the teaching wave start index point, the average value of the index of each mount, the first appearing after the teaching wave start index point Average number of mounts of the first waveform section A and the second waveform section B, the start point and the end point of each waveform section (A, C section in FIG. 8).
  • Index mean value As an example of the various comparison variables, the average value of each waveform section (A, B, C section in Fig. 8) appearing after the teaching wave start index point, the average value of the index of each mount, the first appearing after the teaching
  • the current mode is the teaching mode for setting the reference waveform range, and the operating mode is determined if the current mode is not the teaching mode.
  • the comparison result is an alarm generation condition, an alarm is generated so that the user can take appropriate measures (S613, S614).
  • abnormal operation occurrence conditions include occurrence of abnormal flow rate, fluid flow, abnormal operation of a pump, a filter, a valve, and the like.
  • the first waveform in the trigger-on period (Ton) by using various variables detected through the writing process of the teaching wave data as in the first embodiment
  • the process of checking whether the section W3 matches the actual dispensing (pulse flow rate) waveform may be included.
  • FIG. 9 is a signal flowchart illustrating a third embodiment of a method for detecting a flow rate and fluid abnormal operation according to the present invention.
  • the third embodiment of the present invention is to allow the user to easily set and operate the reference waveform range when the environment of the operation mode is different from that of the teaching mode after the product is sold and the accuracy of alarm occurrence is low. .
  • step S603 of FIG. 6 the teaching wave of the entire section is displayed and the user designates the teaching wave start index point on the teaching wave of the entire section.
  • step 3 (S903) of 9 as shown in step 3 (S403) of FIG. 4, if it is determined that the current real-time monitoring section belongs to a preset trigger on section, and is determined not to belong to the sync signal section, it is currently input. The difference is that the teaching wave data is 'invalidated' and enters the synchronization signal section, and then proceeds to the next step to determine the teaching wave data input as valid.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Measuring Volume Flow (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)

Abstract

Selon la présente invention, un état de fonctionnement anormal et un flux fourni par un tuyau sont détectés sur la base d'une fréquence de tuyau naturelle inhérente qui se produit lorsqu'un système de distribution de fluide fonctionne normalement, la détection étant utilisée pour des procédés de fabrication de semi-conducteurs ou dans l'industrie des dispositifs d'affichage. Dans cette optique, en mode apprentissage, une plage de formes d'onde de référence est définie et est normalisée sur la base d'un signal de sortie d'un détecteur de changement de flux sans contact installé sur l'extérieur d'un tuyau de façon à détecter le flux sans avoir à couper le tuyau. En mode fonctionnement, sur la base de la plage de formes d'onde de référence, le flux et divers fonctionnements anormaux d'un fluide distribué sont complètement analysés en vue d'une détection.
PCT/KR2012/003758 2011-05-16 2012-05-14 Procédé permettant de détecter le flux et le fonctionnement anormal d'un système de distribution de fluide WO2012157922A2 (fr)

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KR1020110045829A KR20120128176A (ko) 2011-05-16 2011-05-16 유체 디스펜스 시스템의 유량 및 이상동작 검출 방법
KR10-2011-0045829 2011-05-16

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114659594A (zh) * 2022-03-21 2022-06-24 江苏红光仪表厂有限公司 流量计用主动校准系统

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Publication number Priority date Publication date Assignee Title
JP2002365031A (ja) * 2001-06-12 2002-12-18 Kansai Electric Power Co Inc:The 管内面のスケール厚さ測定方法
JP2004271266A (ja) * 2003-03-06 2004-09-30 Hitachi High-Technologies Corp 分注装置およびそれを用いた自動分析装置
KR100906922B1 (ko) * 2008-12-30 2009-07-10 주식회사대한송유관공사 유량계 측정오차를 보정하여 누유를 감지하는 방법 및 장치
KR100961639B1 (ko) * 2010-02-09 2010-06-09 자인테크놀로지(주) 외벽 부착식 초음파 유량계를 위한 최적 주파수 자동 설정 방법
KR20110048000A (ko) * 2009-10-30 2011-05-09 주식회사 에이앤디코퍼레이션 비절단식 유량 변화 감지기 및 이를 포함하는 디스펜싱 시스템

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002365031A (ja) * 2001-06-12 2002-12-18 Kansai Electric Power Co Inc:The 管内面のスケール厚さ測定方法
JP2004271266A (ja) * 2003-03-06 2004-09-30 Hitachi High-Technologies Corp 分注装置およびそれを用いた自動分析装置
KR100906922B1 (ko) * 2008-12-30 2009-07-10 주식회사대한송유관공사 유량계 측정오차를 보정하여 누유를 감지하는 방법 및 장치
KR20110048000A (ko) * 2009-10-30 2011-05-09 주식회사 에이앤디코퍼레이션 비절단식 유량 변화 감지기 및 이를 포함하는 디스펜싱 시스템
KR100961639B1 (ko) * 2010-02-09 2010-06-09 자인테크놀로지(주) 외벽 부착식 초음파 유량계를 위한 최적 주파수 자동 설정 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114659594A (zh) * 2022-03-21 2022-06-24 江苏红光仪表厂有限公司 流量计用主动校准系统

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