WO2012101080A3 - Optical arrangement for an euv projection exposure apparatus and method for cooling an optical component - Google Patents
Optical arrangement for an euv projection exposure apparatus and method for cooling an optical component Download PDFInfo
- Publication number
- WO2012101080A3 WO2012101080A3 PCT/EP2012/050946 EP2012050946W WO2012101080A3 WO 2012101080 A3 WO2012101080 A3 WO 2012101080A3 EP 2012050946 W EP2012050946 W EP 2012050946W WO 2012101080 A3 WO2012101080 A3 WO 2012101080A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- cooling
- exposure apparatus
- optical
- projection exposure
- optical component
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
- G03F7/70891—Temperature
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/10—Mirrors with curved faces
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/008—Mountings, adjusting means, or light-tight connections, for optical elements with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/065—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements provided with cooling means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- General Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Theoretical Computer Science (AREA)
- Mathematical Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
An optical arrangement (80) for an EUV projection exposure apparatus comprises an optical component (82), which has a substrate (84) and a surface (86) on a side of the substrate (84) which surface is optically operative in the EUV spectral range, and a cooling device (90) for the optical component (82), said cooling device having a cooling medium (94). The substrate (84) comprises a material having at a temperature Ts << 0°C a thermal conductivity of > 50 W-1K-1 and a coefficient of thermal expansion of < 3 * 10-6 K-1, and the cooling medium (94) has a temperature of << 0°C in order to cool the substrate (84) to the temperature Ts.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161437044P | 2011-01-28 | 2011-01-28 | |
US61/437,044 | 2011-01-28 | ||
DE102011010462.3 | 2011-01-28 | ||
DE201110010462 DE102011010462A1 (en) | 2011-01-28 | 2011-01-28 | Optical arrangement for an EUV projection exposure apparatus and method for cooling an optical component |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012101080A2 WO2012101080A2 (en) | 2012-08-02 |
WO2012101080A3 true WO2012101080A3 (en) | 2012-11-01 |
Family
ID=46511461
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2012/050946 WO2012101080A2 (en) | 2011-01-28 | 2012-01-23 | Optical arrangement for an euv projection exposure apparatus and method for cooling an optical component |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102011010462A1 (en) |
WO (1) | WO2012101080A2 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012213671A1 (en) * | 2012-08-02 | 2014-02-06 | Carl Zeiss Smt Gmbh | Mirror arrangement for an EUV lithography system and method for producing the same |
DE102012219543A1 (en) * | 2012-10-25 | 2013-11-07 | Carl Zeiss Smt Gmbh | Arrangement structure for extreme UV (EUV) projection exposure system, has gas flow supply unit that is provided to supply flow of gas through optic element, such that heat exchange takes place between optic element and flow of gas |
DE102013205214B4 (en) * | 2013-03-25 | 2016-02-11 | Carl Zeiss Smt Gmbh | Micromechanical or microelectromechanical device for a projection exposure apparatus and method for operating such a device |
DE102014203144A1 (en) * | 2014-02-21 | 2015-08-27 | Carl Zeiss Smt Gmbh | Assembly of an optical system, in particular in a microlithographic projection exposure apparatus |
DE102014203461A1 (en) * | 2014-02-26 | 2015-03-05 | Carl Zeiss Smt Gmbh | COOLABLE MIRROR ARRANGEMENT |
DE102014206587A1 (en) * | 2014-04-04 | 2015-04-30 | Carl Zeiss Smt Gmbh | OPTICAL ELEMENT, PROJECTION ARRANGEMENT, AND METHOD FOR PRODUCING AN OPTICAL ELEMENT |
DE102015212859A1 (en) * | 2015-07-09 | 2016-07-07 | Carl Zeiss Smt Gmbh | Lithography plant and method |
DE102016206202A1 (en) * | 2016-04-13 | 2017-05-18 | Carl Zeiss Smt Gmbh | Optical assembly with a rinsing device and optical arrangement with it |
CN111940911A (en) * | 2020-08-31 | 2020-11-17 | 苏州麦尔科唯激光机器人有限公司 | Optical head device for universal deburring |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0469744A1 (en) * | 1990-07-30 | 1992-02-05 | Canon Kabushiki Kaisha | Wafer cooling device |
US5220171A (en) * | 1990-11-01 | 1993-06-15 | Canon Kabushiki Kaisha | Wafer holding device in an exposure apparatus |
JPH0854499A (en) * | 1994-08-10 | 1996-02-27 | Nkk Corp | Device for cooling x-ray optical element |
US6359678B1 (en) * | 1997-11-14 | 2002-03-19 | Nikon Corporation | Exposure apparatus, method for producing the same, and exposure method |
US6377655B1 (en) * | 1998-05-08 | 2002-04-23 | Nikon Corporation | Reflective mirror for soft x-ray exposure apparatus |
US20040051984A1 (en) * | 2002-06-25 | 2004-03-18 | Nikon Corporation | Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments |
JP2005064391A (en) * | 2003-08-19 | 2005-03-10 | Canon Inc | Method of cooling optical component, cooling device, exposure apparatus, and method of manufacturing device |
WO2010015511A1 (en) * | 2008-08-08 | 2010-02-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2010037476A2 (en) * | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
US20110075118A1 (en) * | 2009-09-28 | 2011-03-31 | Asml Netherlands B.V. | Heat pipe, lithographic apparatus and device manufacturing method |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2802311B1 (en) * | 1999-12-08 | 2002-01-18 | Commissariat Energie Atomique | LITHOGRAPHY DEVICE USING A RADIATION SOURCE IN THE EXTREME ULTRAVIOLET AREA AND MULTI-LAYER SPECTRAL BAND MIRRORS IN THIS AREA |
US20050099611A1 (en) | 2002-06-20 | 2005-05-12 | Nikon Corporation | Minimizing thermal distortion effects on EUV mirror |
US6822251B1 (en) | 2003-11-10 | 2004-11-23 | University Of Central Florida Research Foundation | Monolithic silicon EUV collector |
JP2005175187A (en) | 2003-12-11 | 2005-06-30 | Canon Inc | Optical member, method and apparatus of cooling, exposure device, and method of manufacturing device0 |
US7483223B2 (en) | 2004-05-06 | 2009-01-27 | Carl Zeiss Smt Ag | Optical component having an improved transient thermal behavior and method for improving the transient thermal behavior of an optical component |
DE102005017262B3 (en) | 2005-04-12 | 2006-10-12 | Xtreme Technologies Gmbh | Collector mirror for plasma-based short-wave radiation sources |
US7470916B2 (en) | 2005-10-19 | 2008-12-30 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and radiation collector |
DE102005053415A1 (en) | 2005-11-04 | 2007-05-10 | Carl Zeiss Laser Optics Gmbh | Optical component with improved thermal behavior |
DE102008017888A1 (en) * | 2007-06-27 | 2009-01-02 | Carl Zeiss Smt Ag | Optical arrangement for extreme UV lithography device, has reflective optical elements including particular operating temperature, where optical characteristics of arrangement are optimized for operation |
-
2011
- 2011-01-28 DE DE201110010462 patent/DE102011010462A1/en not_active Ceased
-
2012
- 2012-01-23 WO PCT/EP2012/050946 patent/WO2012101080A2/en active Application Filing
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0469744A1 (en) * | 1990-07-30 | 1992-02-05 | Canon Kabushiki Kaisha | Wafer cooling device |
US5220171A (en) * | 1990-11-01 | 1993-06-15 | Canon Kabushiki Kaisha | Wafer holding device in an exposure apparatus |
JPH0854499A (en) * | 1994-08-10 | 1996-02-27 | Nkk Corp | Device for cooling x-ray optical element |
US6359678B1 (en) * | 1997-11-14 | 2002-03-19 | Nikon Corporation | Exposure apparatus, method for producing the same, and exposure method |
US6377655B1 (en) * | 1998-05-08 | 2002-04-23 | Nikon Corporation | Reflective mirror for soft x-ray exposure apparatus |
US20040051984A1 (en) * | 2002-06-25 | 2004-03-18 | Nikon Corporation | Devices and methods for cooling optical elements in optical systems, including optical systems used in vacuum environments |
JP2005064391A (en) * | 2003-08-19 | 2005-03-10 | Canon Inc | Method of cooling optical component, cooling device, exposure apparatus, and method of manufacturing device |
WO2010015511A1 (en) * | 2008-08-08 | 2010-02-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2010037476A2 (en) * | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus |
US20110075118A1 (en) * | 2009-09-28 | 2011-03-31 | Asml Netherlands B.V. | Heat pipe, lithographic apparatus and device manufacturing method |
Also Published As
Publication number | Publication date |
---|---|
WO2012101080A2 (en) | 2012-08-02 |
DE102011010462A1 (en) | 2012-08-02 |
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