WO2012075992A3 - Process and apparatus for applying layers to a component - Google Patents
Process and apparatus for applying layers to a component Download PDFInfo
- Publication number
- WO2012075992A3 WO2012075992A3 PCT/DE2011/002046 DE2011002046W WO2012075992A3 WO 2012075992 A3 WO2012075992 A3 WO 2012075992A3 DE 2011002046 W DE2011002046 W DE 2011002046W WO 2012075992 A3 WO2012075992 A3 WO 2012075992A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- component
- coating substance
- layer
- applying layers
- plasma
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/029—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C23C16/402—Silicon dioxide
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/065—After-treatment
- B05D3/067—Curing or cross-linking the coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
- B05D7/54—No clear coat specified
- B05D7/546—No clear coat specified each layer being cured, at least partially, separately
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
What are proposed are a process and an apparatus for applying layers to a component. In this case, first of all a first layer (12, 25) of a first coating substance is applied to the component (1, 24). Then, a second layer (13, 26) is applied to the first layer (12, 25) by means of a plasma generator by introducing a second coating substance or a mixture of a second coating substance and a process gas into the plasma generated by means of the plasma generator. A UV radiation with which the first layer (12, 25) is treated and/or processed is generated in the plasma by the coating substance or by the mixture of coating substance and process gas.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010052637 | 2010-11-29 | ||
DE102010052637.1 | 2010-11-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012075992A2 WO2012075992A2 (en) | 2012-06-14 |
WO2012075992A3 true WO2012075992A3 (en) | 2012-08-09 |
Family
ID=45952808
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE2011/002046 WO2012075992A2 (en) | 2010-11-29 | 2011-11-29 | Process and apparatus for applying layers to a component |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE102011119597A1 (en) |
WO (1) | WO2012075992A2 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5211995A (en) * | 1991-09-30 | 1993-05-18 | Manfred R. Kuehnle | Method of protecting an organic surface by deposition of an inorganic refractory coating thereon |
EP1354640A1 (en) * | 2002-04-19 | 2003-10-22 | Dürr Systems GmbH | Process and apparatus for hardening a coating |
WO2005106917A1 (en) * | 2004-04-30 | 2005-11-10 | Unaxis Balzers Aktiengesellschaft | Method for the production of a disk-shaped workpiece based on a dielectric substrate, and vacuum processing system therefor |
WO2008110151A2 (en) * | 2007-03-09 | 2008-09-18 | Dr. Laure Plasmatechnologie Gmbh | Method and device for the plasma-assisted surface treatment of large-volume components |
-
2011
- 2011-11-29 DE DE102011119597A patent/DE102011119597A1/en not_active Withdrawn
- 2011-11-29 WO PCT/DE2011/002046 patent/WO2012075992A2/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5211995A (en) * | 1991-09-30 | 1993-05-18 | Manfred R. Kuehnle | Method of protecting an organic surface by deposition of an inorganic refractory coating thereon |
EP1354640A1 (en) * | 2002-04-19 | 2003-10-22 | Dürr Systems GmbH | Process and apparatus for hardening a coating |
WO2005106917A1 (en) * | 2004-04-30 | 2005-11-10 | Unaxis Balzers Aktiengesellschaft | Method for the production of a disk-shaped workpiece based on a dielectric substrate, and vacuum processing system therefor |
WO2008110151A2 (en) * | 2007-03-09 | 2008-09-18 | Dr. Laure Plasmatechnologie Gmbh | Method and device for the plasma-assisted surface treatment of large-volume components |
Non-Patent Citations (1)
Title |
---|
SOUHENG WU ED - SOUHENG WU: "Polymer interface and adhesion", 1 January 1982, POLYMER INTERFACE AND ADHESION, NEW YORK, MARCEL DEKKER, US, PAGE(S) 300, XP002166082 * |
Also Published As
Publication number | Publication date |
---|---|
WO2012075992A2 (en) | 2012-06-14 |
DE102011119597A1 (en) | 2012-05-31 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2014158253A3 (en) | Thermal treated sandwich structure layer to improve adhesive strength | |
TW200943398A (en) | Novel treatment and system for mask surface chemical reduction | |
WO2011054405A3 (en) | Method and apparatus for treating substrates | |
WO2011028349A3 (en) | Remote hydrogen plasma source of silicon containing film deposition | |
WO2013052509A3 (en) | Remote plasma burn-in | |
SG196762A1 (en) | High pressure, high power plasma activated conformal film deposition | |
EP2195827A4 (en) | Showerhead, substrate processing apparatus including the showerhead, and plasma supplying method using the showerhead | |
WO2012122559A3 (en) | Method and apparatus for treating containers | |
WO2011018423A3 (en) | Device and method for treating living cells by means of a plasma | |
WO2008125607A3 (en) | Method for the application of a high-strength coating to workpieces and/or materials | |
EP2455512A4 (en) | Masking jig, substrate heating apparatus, and film formation method | |
WO2012125317A3 (en) | Methods and apparatus for conformal doping | |
WO2012125377A3 (en) | Treatment of a self-assembled monolayer on a dielectric layer for improved epoxy adhesion | |
WO2007117634A3 (en) | System, method and apparatus for treating liquids with wave energy from an electrical arc | |
WO2013015559A3 (en) | Method for etching atomic layer of graphine | |
EP2618366A3 (en) | Etching method and etching apparatus | |
TW201130042A (en) | Substrate processing method and substrate processing apparatus | |
WO2009148859A3 (en) | Method and apparatus for uv curing with water vapor | |
SG11201810798PA (en) | Resin composition, and sheet, laminate, power semiconductor device, and plasma processing apparatus including the same, and method of producing semiconductor using the same | |
EP2479226A4 (en) | Porous structure for forming an anti-fingerprint coating, method for forming an anti-fingerprint coating using the porous structure, substrate comprising the anti-fingerprint coating formed by the method, and products comprising the substrate | |
EP2532013A4 (en) | Method of forming ceramic wire, system of forming the same, and superconductor wire using the same | |
WO2013058980A3 (en) | Integrated multi-headed atomizer and vaporization system and method | |
MX362398B (en) | Heat treatment of a laser coating. | |
WO2012144792A3 (en) | Apparatus for decomposing organic materials and method for decomposing organic materials using same | |
WO2012051979A3 (en) | Device for producing, repairing and/or replacing a component by means of a powder that can be solidified by energy radiation, method and component produced according to said method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11832090 Country of ref document: EP Kind code of ref document: A2 |
|
WD | Withdrawal of designations after international publication |
Designated state(s): DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11832090 Country of ref document: EP Kind code of ref document: A2 |