WO2012062369A1 - Appareil et procédé pour le traitement de surface - Google Patents

Appareil et procédé pour le traitement de surface Download PDF

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Publication number
WO2012062369A1
WO2012062369A1 PCT/EP2010/067301 EP2010067301W WO2012062369A1 WO 2012062369 A1 WO2012062369 A1 WO 2012062369A1 EP 2010067301 W EP2010067301 W EP 2010067301W WO 2012062369 A1 WO2012062369 A1 WO 2012062369A1
Authority
WO
WIPO (PCT)
Prior art keywords
source
deposition chamber
coating
metal
metal ion
Prior art date
Application number
PCT/EP2010/067301
Other languages
English (en)
Inventor
Sergueï MIKHAÏLOV
Original Assignee
Nci Swissnanocoat Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nci Swissnanocoat Sa filed Critical Nci Swissnanocoat Sa
Priority to PCT/EP2010/067301 priority Critical patent/WO2012062369A1/fr
Priority to EP10778640.2A priority patent/EP2638182A1/fr
Priority to RU2013126583/02A priority patent/RU2013126583A/ru
Priority to CN2010800710833A priority patent/CN103459652A/zh
Priority to TW100140813A priority patent/TW201233830A/zh
Publication of WO2012062369A1 publication Critical patent/WO2012062369A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32807—Construction (includes replacing parts of the apparatus)
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32889—Connection or combination with other apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32899—Multiple chambers, e.g. cluster tools
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/332—Coating

Definitions

  • the present invention concerns an apparatus and a method for coating parts, especially an apparatus which generates a plasma of various coating materials for deposition on surfaces of parts to be coated.
  • This coating apparatus can be used, without limitation, in the coating and hardening of tools, instruments, electronic components, goods including watches and glasses, etc.
  • PVD physical vapour deposition
  • this apparatus uses two plasma sources that generate two plasma flows directed toward the same deposition chamber. Since the two sources are directed toward each other, a conductive shield is required to serve as a baffle for preventing the plasma flow generated by one plasma source to reach the other plasma source. This baffle increases the cost and volume of the equipment, and needs to be cleaned or even replaced periodically. Moreover, the quality of the filtration could be improved; ion particles of different sizes reach the target, producing uneven coatings.
  • Laser ablation equipments have also been used for coating parts; they generally utilize a pulsed laser source directed toward the material to be ablated, such as a bloc of carbon material. The laser pulses produce ablation of material which is projected and possibly deflected toward the parts within the deposition chamber.
  • WO200801 5016 describes an apparatus for the coating of substrates with diamond-like layers, in which different coating equipment of different types are arranged toward a common deposition chamber, or in line each in a separate chamber. This allows coating of large number of parts within a single batch process, and without any need to open the deposition chamber between depositions of two different layers with source equipments of different types.
  • An aim of the present invention is to increase the flexibility of the apparatus and methods described in WO2008015016.
  • Another aim is to allow coating and manufacturing of different parts, with different layers, without replacing the whole apparatus.
  • an apparatus for coating parts comprising a deposition chamber and a plurality of coating equipments for simultaneously or successively providing coating materials to said deposition chamber,
  • At least one of said coating equipment is a metal filtered (or not filtered) arc ion source
  • At least one other of said coating equipment is a laser ablation source
  • one part may requires one metal filtered arc ion source equipment for metal deposition, and one laser ablation source for carbon deposition, while another part will use two metal filtered arc ion source equipments for faster deposition of one layer, or for deposition of two different metals in two successive layers.
  • the apparatus for coating parts comprises a deposition chamber and at least one metal filtered arc ion source with at least one pair of metal ion sources, each metal ion source having at least one cathode, at least one anode and associated coils, wherein the angle between the emission directions of the two sources within each said pair is larger than 90° but lower than 175°.
  • the angle lower than 175° avoids the risk that each source emits material in the direction of the other source, and removes the need for a shield between the two sources.
  • the angle between the emission directions of the two sources within each said pair may be larger than 90° but lower than 135°. Having an angle between the two sources larger than 90°, and preferably lower than 135°, allows for an important deflection angle toward the parts to be coated, and ensure efficient filtering of the flows.
  • the directions of emissions of the two sources within each pair are not in a same plane. This allows a better spreading of the two flows within the deposition chamber, and a more homogeneous coating.
  • the metal ion source preferably each comprise two focusing coils for focusing the metal ion beam.
  • a common deflection system comprises one first coil traversed by the metal ion beam produced by each of the metal ion sources, and one second coil behind said metal ion source, both coils cooperating for deflecting said metal ion beam toward said deposition chamber. This allows efficient deflection with a limited number of coils.
  • the apparatus for coating parts comprises a laser ablation equipment with a laser, a mirror for deflecting the laser beam produced by said laser toward a target, a first motor for rotating said target, and a second motor for displacing said mirror so as to ablate different portions of said target.
  • a third motor can be used for displacing the target relatively to said laser beam along an axis parallel to the rotation axis of the target. The second and third motor allows use of very large targets from which different parts are successively ablated, and increase the duration of the period between successive replacements of a target.
  • the apparatus for coating parts comprises a laser ablation equipment in which a laser beam is directed so as to make an angle with the target which is lower than an angle between the laser beam and a tangent of the target. This reduces the risk that ablated material bounces toward the entry window, and cancels the requirement for cleaning this window.
  • Faster coating can be achieved with the use in one source equipment of two lasers for ablating the same target, or for ablating two different targets.
  • Fig. 1 shows an apparatus according to the invention which has a single deposition chamber 1.
  • Parts to be coated (not shown), such as substrates, drills, mechanical parts and so on, are placed on one or several part holders in the deposition chamber 1.
  • vacuum can be applied to the deposition chamber 1 using a vacuum generation system (not shown).
  • the deposition chamber 1 comprises a plurality of connecting flanges 10 for connecting various coating equipments.
  • coating equipment generally designates equipment that can be used as a source for generating a flow of material directed toward the deposition chamber 1 , in order to coat the parts within this chamber.
  • at least two connecting flanges 10 are identical or at least compatible, so that one equipment can equivalently be connected to one flange or to the other.
  • the deposition chamber 1 has two identical connecting flanges 10, although more than two flanges could be used.
  • the flanges are preferably vacuum flanges.
  • a first coating equipment, in the form of a metal filtered arc ion source 2 is connected to one of the connecting flanges 10, while a second coating equipment, in the form of a laser ablation source 3, is connected to the other connecting flange 10 of the illustrated example. Since the apparatus has two compatible connecting flanges 10, it would also be possible in other arrangements to mount different types of equipments to the same deposition chamber 1 , for example:
  • Two or more laser ablation sources of the same type for faster or more homogeneous deposition of material (such as Carbon) with this process.
  • One or more low energy ion gun 5 for example based on a Hall accelerator, for example in order to polish parts with an ion beam, or in order to harden a surface by ion implantation
  • One or more magnetron which can be balanced or
  • One or more CVD device such as a plasma enhanced CVD device.
  • One or more heating or cooling devices ⁇ Or any combinations thereof.
  • one of the equipment is used for deposition of a sublayer, such as metal layer, while another equipment is used for deposition of an external layer, such as a hard carbon or DLC layer. It is thus possible with a single equipment to deposit various successive layers on a surface of the same part.
  • a single chamber can thus be proposed or sold with sets comprising various coating equipments that a user can select and mount to the various equivalent positions around the deposition chamber 1 , in order to adapt to his needs and to various coating requirements for different parts.
  • the different coating equipments will be used one after the other in order to successively coat superposed layers of coating material on a single part, it is also possible for some processes to use two equipments at the same time, for example two identical equipments in order to fasten the deposition process, or two different equipments in order to mix beams and deposite layers with mixed materials from different sources. Moreover, the different coating
  • equipments could be used in different processes for coating different parts if the parts in the chamber are replaced between use of each equipment.
  • At least one metal filtered arc ion source 2 comprises two different metal ion sources 28.
  • the use of two sources increases the deposition rate and improves the homogeneity of plasma formed within the deposition chamber 1 when coating parts, resulting in a faster and more regular coating.
  • Each source has one cathode 20 of metal or material that will be used for the coating, and one or several anodes 21 to create an electric arc discharge when at least one current source is activated, so as to extract material from the cathode.
  • the cathodes have preferably a conical shape in order to homogenise deposition during service time.
  • the surface cathode is eroded so that its distance to the target increases, its surface is increased due to the conical shape, so that the deposition rate remains approximately constant.
  • a deflecting system comprises two coils 23, 24 surrounding a portion of a duct just after the cathode 20. Those coils 23, 24 are used to focus the flow of particles extracted from the cathode 20 along an axis 200 of the cathode 20, and to reduce dispersion against side walls of the duct.
  • the axis 200 of each cathode 20 makes an angle a with the axis 100 of introduction into the deposition chamber 1, which is also the central axis of the flange 10.
  • the emitted beam of particles therefore needs to be deflected from the initial emission direction 100 to the direction of introduction into the deposition chamber 1.
  • This deflection is produced by at least one first deflecting coil 27, which is mounted around the
  • Those coils 25 and 27 preferably each have a cylindrical or torical shape with an axis corresponding to the axis of the connecting flange 10 and to the axis of introduction 100. This deflection acts as a filtering means for filtering neutral particles from particles with weight different from the average of desired weight, which are not deflected respectively in a different direction.
  • a metal trap 29 crossed by the beam is maintained at a varying potential for trapping ions with a different weight.
  • a second coil 26 is preferably arranged close and parallel to the first coil 27, so as to be crossed by the deflected beam. This second coil cooperates with another coil 38 on the other side of the deposition chamber, so as to control and homogenise the cloud of particles produced by the arc ion source 2 or by the laser ablation source 3 within the deposition chamber
  • the angle a is preferably lower than 135°, even preferably lower than 120°, to provide enough deflection and enough filtering. However, according to an aspect of the invention independent from all other aspects, this angle is also greater than 90°, preferably greater than 95°, to avoid a situation where the axis 200 of both metal filtered arc ion source 2 are aligned and in which the beam produced by one source would be directed toward the other source. This specific arrangement avoids the need for any shield or baffle element at the intersection between the two beams, thus resulting in a simpler and more compact design, which is also easier to clean. Moreover, since the beams are not aligned, this setting improves the mixing and the spatial diffusion of the two beams, thus resulting in a more homogen distribution of the particles within the chamber 1 .
  • the axis 200 of the two metal ion sources 28 are not in a same plane, but in two parallel or non-parallel planes, so that the two beams from the sources 28 are introduced in the deposition camber 1 along a common duct but along two distinct directions. This is useful for improving the distribution of the particles in a direction perpendicular to the plane of the figure, and improving homogeneity of plasma formed within the deposition chamber 1 when coating, thus resulting in an improved coating quality.
  • the coating equipment comprises two pairs of metal ion sources 28 superposed over each other, thus providing even faster coating, and/or successive replacement of the different cathodes without complete interruption of the coating process.
  • the current generator that drives the two metal ion sources 28 preferably generates a pulsed current with a frequency comprised between 1 and 100 Hz, substantially lower than the frequency of 1 '000 Hz and more used in conventional metal ions sources.
  • the current delivered to the second ion source 28 is dephased with respect to the current delivered to the first ion source 28, thus resulting in less perturbations to the electric network system, and more continuous flow of particles into the deposition chamber 1 .
  • Each pulse has preferably an energy of 1 50mJ, or more.
  • Each current pulse is preferably higher than 4 ⁇ 00 A, thus is substantially more than the conventional currents of about 1 ⁇ 00 A used in conventional systems. Test and experiments have shown that this high current, although requiring more complicated electronics, provide for an improved and more regular coating of the parts.
  • the apparatus illustrated in the figure further comprises a pulsed laser ablation source 3 mounted to the deposition chamber 1 over a second connecting flange 10 which is identical or compatible with the first connecting flange 10 to which the ion source 2 is connected.
  • the pulsed laser ablation source 3 is suitable for ablating a target 32, such as a graphite or carbon target.
  • This pulsed laser ablation source 3 is useful due to its ability to produce high purity films, such as diamond-like coatings (DLC) for example.
  • a laser source 30 generates a pulsed laser beam 300 that is directed via a window 37 to a carbon target 32.
  • a focusing lens (not shown) may be used to focus the laser beam.
  • the laser beam reaches the cylindrical target 32 at a substantial tangential angle, so that carbon ions that instantly evaporate from the target 32 are projected in directions different from the originating direction of the laser. This is useful for preventing deposition of carbon on the window 37.
  • the laser beam 300 thus makes an angle lower than 45°, preferably lower than 20°, with a tangent of the target 32.
  • a moving mirror 31 controlled by a step motor 34, is preferably controlled in order to deflect the laser beam at the desired location of the target 32.
  • a first motor 33 is used for rotating the cylindrical target 32 continuously, or in successive steps.
  • the second motor 34 is used for moving the mirror 32 relative to the target along the axis of the cylindrical target 32, so as to chnge the longitudinal portion of the cylinder which is ablated. Both motors 33, 34 are controlled to produce a regular ablation of the whole surface of the target 32.
  • An additional motor can optionally be used for moving the target 32 relatively to the laser in a direction perpendicular to the incoming laser beam, thus insuring the laser beam always reaches the surface of the target 32. In an option, this displacement for
  • two lasers 30 are provided within the same pulsed laser ablation source 3, and are used for simultaneously attacking the same carbon target 32, or two different targets 32, thus resulting in faster ablation and faster coating.
  • the flow of particles ablated from the target 32 is directed to a bended duct that links it to the deposition chamber 1 , and deflected within this duct using a deflecting coil 38 crossed by the beam of particles.
  • This coil 38 is preferably mounted on a rail, so that it can be manually rotated and displaced along the duct in order to control the deflection.
  • a second coil 39 is crossed by the beam and cooperates with the coil 26 on the other side of the deposition chamber in order to control the homogeneity of the cloud within the deposition chamber.
  • the bending angle within the duct is preferably comprised between 30° and 60°, and is preferably 45°, in order to provide for moderated filtering and keeping some of the larger carbon particles within the bended beam, thus resulting in faster and better coating than if a more bended or even a double bended duct is used.
  • a trap 35 traps particles with a different weight within the duct.
  • the method also relates to a method of fabricating a coated part starting from a non coated part, said method using a plurality of coating equipments around a common deposition chamber, wherein said
  • deposition chamber comprises a plurality of equivalents flanges and wherein the method comprising mounting a metal filtered arc ion source to any one of said flange, mounting a laser ablation source to any other said flange, and successively depositing different layers of different coating materials to parts within said deposition chamber.
  • target (such as carbon target)

Abstract

L'invention concerne un appareil pour le revêtement de pièces, comprenant une chambre de dépôt (1) et une pluralité d'équipements de revêtement (2, 3) pour alimenter simultanément ou successivement des matériaux de revêtement dans ladite chambre de dépôt, au moins un dudit équipement de revêtement (2) étant une source d'ions à arc à filtre métallique, au moins un autre dudit équipement de revêtement (3) étant une source à ablation laser. Au moins deux desdits équipements de revêtement sont raccordés de manière amovible à ladite chambre de dépôt via les brides de raccordement (10). Au moins deux desdites brides sont identiques, de manière à ce qu'un desdits équipements de revêtement (2, 3) peut être raccordé via différentes brides à ladite chambre de dépôt.
PCT/EP2010/067301 2010-11-11 2010-11-11 Appareil et procédé pour le traitement de surface WO2012062369A1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
PCT/EP2010/067301 WO2012062369A1 (fr) 2010-11-11 2010-11-11 Appareil et procédé pour le traitement de surface
EP10778640.2A EP2638182A1 (fr) 2010-11-11 2010-11-11 Appareil et procédé pour le traitement de surface
RU2013126583/02A RU2013126583A (ru) 2010-11-11 2010-11-11 Устройство и способ обработки поверхности
CN2010800710833A CN103459652A (zh) 2010-11-11 2010-11-11 用于表面处理的设备和方法
TW100140813A TW201233830A (en) 2010-11-11 2011-11-09 Apparatus and method for surface processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2010/067301 WO2012062369A1 (fr) 2010-11-11 2010-11-11 Appareil et procédé pour le traitement de surface

Publications (1)

Publication Number Publication Date
WO2012062369A1 true WO2012062369A1 (fr) 2012-05-18

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PCT/EP2010/067301 WO2012062369A1 (fr) 2010-11-11 2010-11-11 Appareil et procédé pour le traitement de surface

Country Status (5)

Country Link
EP (1) EP2638182A1 (fr)
CN (1) CN103459652A (fr)
RU (1) RU2013126583A (fr)
TW (1) TW201233830A (fr)
WO (1) WO2012062369A1 (fr)

Cited By (5)

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EP3091560A1 (fr) * 2015-05-07 2016-11-09 Vapor Technologies, Inc. Système assisté par plasma de décharge d'arc à distance
CN106399949A (zh) * 2016-10-18 2017-02-15 重庆科技学院 脉冲激光沉积系统及采用该系统来沉积薄膜的方法
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
EP3355338A1 (fr) * 2017-01-25 2018-08-01 Sergueï Mikhailov Appareil et procédé de traitement de surface
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment

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CN110318023A (zh) * 2019-07-30 2019-10-11 中国人民解放军陆军工程大学 一种可控磁场筛选激光等离子的薄膜沉淀装置及方法

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JP4883602B2 (ja) * 2005-08-12 2012-02-22 国立大学法人豊橋技術科学大学 プラズマ表面処理方法及びプラズマ処理装置
CN2931493Y (zh) * 2005-11-22 2007-08-08 王福贞 一种积木式多用途真空镀膜机

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US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
EP3091560A1 (fr) * 2015-05-07 2016-11-09 Vapor Technologies, Inc. Système assisté par plasma de décharge d'arc à distance
CN106399949A (zh) * 2016-10-18 2017-02-15 重庆科技学院 脉冲激光沉积系统及采用该系统来沉积薄膜的方法
EP3355338A1 (fr) * 2017-01-25 2018-08-01 Sergueï Mikhailov Appareil et procédé de traitement de surface

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EP2638182A1 (fr) 2013-09-18
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TW201233830A (en) 2012-08-16

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