WO2012043983A3 - 감광성 수지 조성물 - Google Patents

감광성 수지 조성물 Download PDF

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Publication number
WO2012043983A3
WO2012043983A3 PCT/KR2011/006329 KR2011006329W WO2012043983A3 WO 2012043983 A3 WO2012043983 A3 WO 2012043983A3 KR 2011006329 W KR2011006329 W KR 2011006329W WO 2012043983 A3 WO2012043983 A3 WO 2012043983A3
Authority
WO
WIPO (PCT)
Prior art keywords
light
resin composition
sensitive resin
cured product
outstanding
Prior art date
Application number
PCT/KR2011/006329
Other languages
English (en)
French (fr)
Other versions
WO2012043983A2 (ko
Inventor
봉동훈
Original Assignee
코오롱인더스트리 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 코오롱인더스트리 주식회사 filed Critical 코오롱인더스트리 주식회사
Priority claimed from KR1020110085718A external-priority patent/KR20120033968A/ko
Publication of WO2012043983A2 publication Critical patent/WO2012043983A2/ko
Publication of WO2012043983A3 publication Critical patent/WO2012043983A3/ko

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

본 발명은 감광성 수지 조성물에 관한 것으로, 구체적으로는 보관안정성이 우수하고, 그 경화물이 내열성 및 전기절연 신뢰성과 같은 솔더 레지스트로서의 필수적인 특성을 유지하면서도 유연성이 우수한 장점을 가진다.
PCT/KR2011/006329 2010-09-30 2011-08-26 감광성 수지 조성물 WO2012043983A2 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR10-2010-0095635 2010-09-30
KR20100095635 2010-09-30
KR10-2011-0085718 2011-08-26
KR1020110085718A KR20120033968A (ko) 2010-09-30 2011-08-26 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
WO2012043983A2 WO2012043983A2 (ko) 2012-04-05
WO2012043983A3 true WO2012043983A3 (ko) 2012-05-31

Family

ID=45893598

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/006329 WO2012043983A2 (ko) 2010-09-30 2011-08-26 감광성 수지 조성물

Country Status (1)

Country Link
WO (1) WO2012043983A2 (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006162897A (ja) * 2004-12-06 2006-06-22 Toagosei Co Ltd 感光性組成物及びソルダーレジスト
JP2007057797A (ja) * 2005-08-24 2007-03-08 Fujifilm Corp 感光性フィルム及びその製造方法、並びに、永久パターン及びその形成方法
JP2007256943A (ja) * 2006-02-24 2007-10-04 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
JP2009198966A (ja) * 2008-02-25 2009-09-03 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性フィルム、永久マスクレジスト及び永久マスクレジストの製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006162897A (ja) * 2004-12-06 2006-06-22 Toagosei Co Ltd 感光性組成物及びソルダーレジスト
JP2007057797A (ja) * 2005-08-24 2007-03-08 Fujifilm Corp 感光性フィルム及びその製造方法、並びに、永久パターン及びその形成方法
JP2007256943A (ja) * 2006-02-24 2007-10-04 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
JP2009198966A (ja) * 2008-02-25 2009-09-03 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性フィルム、永久マスクレジスト及び永久マスクレジストの製造方法

Also Published As

Publication number Publication date
WO2012043983A2 (ko) 2012-04-05

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