WO2012043983A3 - 감광성 수지 조성물 - Google Patents
감광성 수지 조성물 Download PDFInfo
- Publication number
- WO2012043983A3 WO2012043983A3 PCT/KR2011/006329 KR2011006329W WO2012043983A3 WO 2012043983 A3 WO2012043983 A3 WO 2012043983A3 KR 2011006329 W KR2011006329 W KR 2011006329W WO 2012043983 A3 WO2012043983 A3 WO 2012043983A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- light
- resin composition
- sensitive resin
- cured product
- outstanding
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
본 발명은 감광성 수지 조성물에 관한 것으로, 구체적으로는 보관안정성이 우수하고, 그 경화물이 내열성 및 전기절연 신뢰성과 같은 솔더 레지스트로서의 필수적인 특성을 유지하면서도 유연성이 우수한 장점을 가진다.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2010-0095635 | 2010-09-30 | ||
KR20100095635 | 2010-09-30 | ||
KR10-2011-0085718 | 2011-08-26 | ||
KR1020110085718A KR20120033968A (ko) | 2010-09-30 | 2011-08-26 | 감광성 수지 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012043983A2 WO2012043983A2 (ko) | 2012-04-05 |
WO2012043983A3 true WO2012043983A3 (ko) | 2012-05-31 |
Family
ID=45893598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2011/006329 WO2012043983A2 (ko) | 2010-09-30 | 2011-08-26 | 감광성 수지 조성물 |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2012043983A2 (ko) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006162897A (ja) * | 2004-12-06 | 2006-06-22 | Toagosei Co Ltd | 感光性組成物及びソルダーレジスト |
JP2007057797A (ja) * | 2005-08-24 | 2007-03-08 | Fujifilm Corp | 感光性フィルム及びその製造方法、並びに、永久パターン及びその形成方法 |
JP2007256943A (ja) * | 2006-02-24 | 2007-10-04 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
JP2009198966A (ja) * | 2008-02-25 | 2009-09-03 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性フィルム、永久マスクレジスト及び永久マスクレジストの製造方法 |
-
2011
- 2011-08-26 WO PCT/KR2011/006329 patent/WO2012043983A2/ko active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006162897A (ja) * | 2004-12-06 | 2006-06-22 | Toagosei Co Ltd | 感光性組成物及びソルダーレジスト |
JP2007057797A (ja) * | 2005-08-24 | 2007-03-08 | Fujifilm Corp | 感光性フィルム及びその製造方法、並びに、永久パターン及びその形成方法 |
JP2007256943A (ja) * | 2006-02-24 | 2007-10-04 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法 |
JP2009198966A (ja) * | 2008-02-25 | 2009-09-03 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性フィルム、永久マスクレジスト及び永久マスクレジストの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2012043983A2 (ko) | 2012-04-05 |
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