WO2011160749A1 - Method and device for coating a surface - Google Patents
Method and device for coating a surface Download PDFInfo
- Publication number
- WO2011160749A1 WO2011160749A1 PCT/EP2011/002468 EP2011002468W WO2011160749A1 WO 2011160749 A1 WO2011160749 A1 WO 2011160749A1 EP 2011002468 W EP2011002468 W EP 2011002468W WO 2011160749 A1 WO2011160749 A1 WO 2011160749A1
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- WO
- WIPO (PCT)
- Prior art keywords
- molecules
- electrically charged
- coating
- charged molecules
- movement
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/05—Arrangements for energy or mass analysis
- H01J2237/057—Energy or mass filtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0815—Methods of ionisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0815—Methods of ionisation
- H01J2237/082—Electron beam
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
- H01J2237/0822—Multiple sources
- H01J2237/0827—Multiple sources for producing different ions sequentially
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
Definitions
- the invention relates to a method for coating a surface of a carrier material with molecules, wherein the molecules are converted from a molecule supply into a gaseous state and ionized, wherein the electrically charged molecules in an electric field perform a directed movement in the direction of the surface and wherein the molecules hit the surface and be deposited there.
- the coating of a surface of a carrier material with a coating material represents an important process step in the production of microtechnical products.
- Various coating methods are known in practice which, depending on the respective requirements, in particular of the coating material and the final product, the desired coating of the carrier material enable.
- the coating of a carrier material with an organic material in practice often represents a production step which is decisive for the quality of the end product and with regard to the production costs
- Molecules of the coating material which have molecular weights in the range of 200-1000 g / mol and also significantly moreover, numerous otherwise customary and suitable coating methods can not be used.
- a microstructured application of the coating on the surface of the carrier material is necessary in order to be able to produce individual pixels of the display at a distance from one another and to be able to control them independently of one another later on. This also applies to other organic electronic devices, for example for the production of printed conductors.
- the coating of the surface of the carrier material in the production of OLEDs is currently usually carried out by a thermally induced Evaporation of the organic coating material in vacuo and its subsequent deposition on the surface to be coated. To coat individual pixels, this is covered by a grid-shaped shadow mask, which leaves only the pixels to be coated and shields the non-coated areas of the surface.
- this coating method is associated with considerable disadvantages in practice.
- the organic coating material has to be converted into the gaseous state at the highest possible evaporation temperature.
- the high evaporation temperatures lead to a strong thermal load of the carrier material and the coating device.
- the regularly used shadow masks are considerably mechanically stressed by high evaporation temperatures, so that unwanted deformations and aberrations can hardly be reliably avoided, especially in the case of large-format shadow masks. For this reason, the use of shadow masks for microstructuring the coating of a surface currently sees an upper limit for the largest possible format, which can still be produced without major aberrations and with a sufficiently low scrap.
- the coating materials which can be used for a coating are also subject to restrictions.
- coating materials having a molecular weight of up to about 1000 g / mol can be used. If the molecular mass significantly exceeds this value, then the stability of the large molecules is often no longer sufficient, so that the molecules are thermally broken up and destroyed.
- the proportion of decomposition products increases with increasing evaporation temperature and reduces the purity of the coating material and thus the quality of the coating.
- an important problem of the currently used coating methods is the often inefficient use of the evaporated coating material for coating the surface, typically only 1-10% of the vaporized material is deposited on the surface of the substrate to be coated.
- the far greater proportion of the evaporated coating material is deposited within the coating device and in particular on the particular shadow mask used and leads to a rapid contamination of the coating device and the shadow masks.
- the coating apparatus and in particular the vacuum chamber in which the coating process is carried out, must be cleaned regularly, so that longer machine life is unavoidable. Also, the shadow masks used must be regularly replaced and cleaned to minimize aberrations as possible.
- an electric field may be generated between the molecular reservoir from which the molecules are converted by vaporization into a gaseous state and the surface to be coated, which ionized during or immediately after evaporation and thereby accelerate electrically charged molecules towards the surface.
- a preferential direction is created for the vaporized and moving, electrically charged molecules, which results in a greater proportion of the molecules being deposited on the surface.
- excessively high field strengths and excessive acceleration of the electrically charged molecules thereby caused can be detrimental and can cause the molecules to impinge too rapidly on the surface to be coated, and in the process
- the invention is to improve a coating method of the type mentioned above, that the molecules can be applied structured on the surface to be coated.
- the electrically charged molecules are exposed to at least one electric and / or magnetic field on the way to the surface that at least one field component perpendicular to the directed movement of the electrically charged molecules to one perpendicular to the directed movement the electrically charged molecules directed force acting on the electrically charged molecules. Due to the perpendicular to the movement of the electrically charged molecules component of an electric or magnetic field, a likewise directed perpendicular to the direction of movement of the molecules force is exerted.
- the molecules can be deflected and influenced in their direction on their way to the surface. In this way it can be prevented that a significant or predominant proportion of the evaporated molecules outside the surface to be coated impinges in the coating apparatus and is lost for the desired coating of the surface.
- an electric current flows between the molecule reservoir and the surface or magnetic focusing means acts on the directed movement of the electrically charged molecules.
- a focusing device for example, a Wehnelt cylinder or a system of magnetic lenses are used.
- Suitable electrical or magnetic or electromagnetic focusing devices are well known in practice and can be adapted in a simple manner to the respective requirements of the coating process.
- the molecules converted into an ionized and gaseous state can be bundled into a molecular ion beam and directed onto the surface to be coated almost loss-free.
- a particularly advantageous embodiment of the inventive concept as a consequence provides that an aperture device is arranged between the molecule reservoir and the surface in such a way that only molecules with a predeterminable mass-charge ratio pass through the diaphragm device to the surface.
- a suitable diaphragm device which is expediently arranged according to a focusing device, it can be ensured that only the molecules intended for a coating reach the surface to be coated, while, for example, molecules broken down in an evaporation process or their decomposition products or impurities due to a deviating mass Charging ratio of the diaphragm device and prevented from reaching the surface to be coated.
- Focusing device are known from practice, for example in connection with mass spectrometers.
- At least one quadrupole field acts on the directed movement of the electrically charged molecules between the molecule reservoir and the surface.
- An electric quadrupole field can be inexpensively generated and controlled. Which depends on the movement of the electrically charged molecules. acting forces allow a reliable influence on the direction of flight of the molecules.
- an electric quadrupole field which is acted upon by a suitable alternating voltage, a very precise mass separation of the electrically charged molecules can be carried out in a simple manner in order to ensure a high purity of the molecules of the coating material used for the coating can.
- the high purity not only leads to a correspondingly good coating quality, but also to a prolonged durability and functionality of the coated surface, for example in the case of OLEDs, since it is known that even small amounts of impurities can significantly disturb the properties of an OLED.
- a magnetic quadrupole field is provided for focusing and deflecting the electrically charged molecules.
- a plurality of magnetic quadrupole fields are arranged one behind the other in order to enable all-round focusing and advantageous influencing of the direction of flight of the electrically charged molecules.
- the electrically charged molecules are influenced on their way from the molecule supply to the surface to be coated, known from the prior art for directing the direction of electrically charged particles. It could also be a fast ion trap or any suitable for this application electrostatic or magnetic deflection system are used.
- the suitably used method of influencing the direction of the molecular ion beam from electrically charged molecules for example, depending on the intensity of the electrically charged
- the predetermined deflection angles and the molecular masses relevant for a coating of the surface for each individual application can be selected.
- the electrically charged molecules during a Movement be diverted from the molecule supply to the surface by means of time-varying electric and / or magnetic fields.
- the electrically charged molecules can be deflected, for example, by means of two pairs of deflection capacitor during their movement onto the surface, so that a molecular ion beam previously generated by a focusing device is precisely directed at those
- Areas of the surface can be directed to be coated with the molecules.
- the structured coating of the surface and thus the coating of individual pixels (pixels) is possible.
- the size and shape of the individual pixels and the arrangement of the pixels depend on the desired resolution, the intended use and the desired activation (active matrix or passive matrix). Those skilled in the art of organic electroluminescent devices will know how to design the pixels for their application.
- the electric fields generated by the two deflection capacitor pairs are oriented essentially perpendicular to one another and to the directed movement of the electrically charged molecules.
- the beam deflection devices and control methods known from the tube screens can be adopted and used.
- Applying additional deflection electric fields or by using rotating mechanical diaphragms may be a molecular ion beam of the electrically charged molecules are interrupted at predetermined intervals, so that individual areas of the surface coated and other areas are not coated.
- a microstructured coating of the surface of the substrate to be coated can be made almost loss-free. Since shadow masks do not have to be used and unwanted deposition of gaseous molecules in the coating apparatus or outside of the surface to be coated can be prevented, precise microstructured surface coatings can be produced quickly and inexpensively. Longer set-up, changing or cleaning times are not required, so that in conjunction with a largely error-free, or appropriately corrected imaging geometry reliable and precise, even structured coating of large surfaces is possible. In contrast to the use of shadow masks, even large-format surfaces can be manufactured or coated substantially free from aberrations and without the risk of increasing contamination or cross-contamination.
- to be coated surface areas opposite to the electrically charged molecules are electrically charged and surface areas to be kept with the electrically charged molecules qualitatively coinciding and thus usually also positively charged before with a coating by the electrically charged molecules is started. Due to the spatially varying charge ratios, the electrically charged molecules approaching the surface are attracted to those regions and preferably deposited there, in which an opposite surface charge was generated. In contrast, the electrically charged molecules repelled and kept away from those surface areas by a surface charge of the same name, which should be kept free of the coating material and therefore charged the same name.
- the molecules can therefore be arbitrarily accelerated in the desired direction after their ionization by generating a suitable acceleration field, without their destruction would have to be feared when hitting the surface.
- the method of ionization can therefore be selected with regard to a high ion yield and as non-destructive ionization as possible.
- a particularly gentle and non-destructive ionization method is the photoionization, in which light of a predetermined wavelength is irradiated and used to excite an electron of the molecule. Due to the predetermined wavelength of the irradiated photons, the preferably excited electrons can be selected precisely and their excitation be specified so that the
- Excitation energy is approximately equal to or slightly larger than the ionization energy of a given type of molecule.
- a gentle and particularly efficient ionization of the selected type of molecule in the molecule supply can be effected while at the same time preventing other molecules from being ionized with a different excitation energy of the external electrons.
- a selection can already be made during the ionization of the molecules from the molecule supply and a marked reduction of impurities can be made possible.
- the photoionization or the laser-induced 2-photon absorption and the resulting ionization of the coating material can be carried out intermittently or in a pulsed manner. In this way, the molecular ion beam used for the coating can be largely generated or interrupted at will. In conjunction with the likewise easily predeterminable lateral deflection of the
- Molecular ion beam can be a highly accurate spatially resolved coating with the electrically charged molecules without significant amounts of molecules already dissolved out of the molecule supply on the way to the surface to be coated must be deflected and discarded. The loss of molecules from the molecule supply is therefore extremely low. For that reason, no noticeable Contamination of the coating apparatus to be feared, which in short time intervals, a complex cleaning of the apparatus
- Suitable ionization methods are electron impact ionization (El), chemical ionization (Cl), gentle ionization (Sl), field ionization (Fl), field desorption (FD), liquid injection field desorption ionization (LIFDI), fast atom bombardment (FAB), electrospray Ionization (ESI), Atmospheric Pressure Chemical Ionization (APCI), Atmospheric Pressure Photo Ionization (APPI), Atmospheric Pressure Laser Ionization (APLI), Matrix Assisted Laser Desorption / Ionization (MALDI), Single Photon Ionization (SPI), Resonance Enhanced Multi Photon Ionization (REMPI), Thermal Ionization (Tl), Inductively Coupled Plasma (ICP), and Glow Discharge Ionization (GI).
- El electron impact ionization
- Cl chemical ionization
- Sl gentle ionization
- Fl field ionization
- Fl field desorption
- LIFDI liquid injection field desorption ion
- molecules from at least two different molecular stocks will successively or alternately be converted to a gaseous state and used to coat the surface.
- OLEDs can be produced very rapidly, the pixels of each of which are composed of individual regions of coating materials which can shine in different colors.
- molecules from at least two different molecular stocks are simultaneously converted to a gaseous state and used to coat the surface.
- OLEDs can be produced which
- An advantage of this doping method over the conventional coating methods is that the degree of doping can be set more precisely. This is particularly important when only a small degree of doping is used and small deviations from the degree of doping can already have great effects on the properties of the electronic devices.
- the coating process according to the invention makes it possible to apply organic, organometallic and inorganic materials to a surface.
- the process can be used not only for low molecular weight compounds, but also for relatively high molecular weight compounds, such as oligomers, dendrimers, fullerene derivatives, graphene derivatives, etc., as by gentle ionization methods, these compounds can be ionized undecomposed. This is a further advantage over conventional gas-phase coating processes in which higher molecular weight compounds often undergo thermal decomposition.
- Typical classes of molecules used in organic electroluminescent devices are, for example, arylamines as hole transport materials or singlet emitters, aromatic hydrocarbons, in particular those containing anthracene, pyrene, chrysene, benzanthracene, phenanthrene, benzphenanthrene, fluorene or spirobifluorene, as host materials, electron-poor heteroaromatics, in particular containing benzimidazole, triazine or pyrimidine, or aluminum complexes as electron transport materials, carbazole derivatives, aromatic ketones, aromatic phosphine oxides, triazine or pyrimidine derivatives or
- Triphenylene derivatives as triplet matrix materials and iridium or platinum complexes as triplet emitters also relates to a device for coating surfaces of a carrier material with molecules having a storage means for a supply of molecules, comprising means for vaporizing and ionizing molecules from the supply of molecules, comprising means for generating an electrostatic acceleration field for producing a surface directed movement of the electrically charged molecules and with a holder for a carrier material with a surface to be coated.
- Such coating devices are already known in practice.
- the coating apparatus for a device for generating an electric and / or magnetic field with a field component acting on the movement perpendicular to the movement of the electrically charged molecules. In this way, it can be prevented with a suitably generated electric and / or magnetic field that a predominant proportion of the vaporized and ionized molecules from the molecule supply is deposited on a non-coated surface of the coating apparatus.
- the coating device has at least one device for generating a quadrupole field.
- Such devices may be readily and inexpensively manufactured or commercially purchased and adapted or configured to affect, for example, a magnetic quadrupole field the direction and focus of the beam of the electrically charged molecules or with a quadrupole alternating electric field a selection of the electrically charged molecules and thus to carry out a cleaning of the coating material.
- the coating device has a focusing device and / or a diaphragm device.
- a molecular ion beam can be generated from electrically charged molecules.
- a diaphragm device can be ensured that only molecules with a predeterminable mass-charge ratio by the Aperture device pass through to the surface to be coated, so that a very homogeneous, extremely pure coating can be constructed.
- the coating device also has a device for generating time-variable electrical and / or magnetic deflection fields for the purposeful deflection of the molecular ion beam.
- a time-controllable diaphragm device likewise provided in the coating device, it can be achieved that predetermined areas of the surface are coated with the coating material, while other areas are kept free of the coating material and not coated.
- the charge transport layers can be applied over a large area and unstructured, and the emission layer is patterned, thus enabling the activation of the individual pixels.
- the coating device preferably has a photoionization device.
- the photoionization device expediently comprises at least one laser, which is aligned with the supply of molecules and is capable of releasing electrically charged molecules from the molecule supply.
- the device may also have another suitable ionization device.
- Fig. 1 is a schematic illustration of a coating apparatus with a Wehnelt cylinder and an approximately homogeneous, vertical aligned to the direction of flight of the electrically charged molecules
- FIG. 2 shows a schematic illustration of a deviating coating device, in which the electrically charged molecules are selected with an electric quadrupole field and are subsequently deflected laterally by means of two pairs of deflection condensers, and FIG
- Fig. 3 is a schematic illustration of a differently designed coating device in which the molecules are ionized by means of a laser-induced 2-photon absorption and then deflected laterally with a magnetic quadrupole field.
- a coating device for a surface 1 to be coated 1 of a carrier material 2, in the illustrated example an OLED, has a first molecular reservoir 3 and a second molecular reservoir 4, in each of which solutions or condensed amounts of organic molecules 5, 6 are stored with which the surface 1 is to be coated.
- the organic molecules 5, 6 are vaporized with a suitable evaporation device 7 and ionized.
- the ionization of the molecules 5, 6 can be carried out either with the use of correspondingly suitable evaporation apparatuses 7 simultaneously with the evaporation or in a subsequent method step with the aid of a suitable ionization apparatus. Subsequently, the vaporized and electrically charged molecules 5, 6 by means of a
- Focusing device 8 for example by means of a Wehneltzylinders, bundled into a molecular ion beam 9 (solid line) and 10 (dashed line) and accelerated in the direction of an apparatus 11 for generating an electric and / or magnetic field, the at least one acting on the movement field component perpendicular for moving the electrically charged molecules 5, 6.
- the device 11 generates, for example, a magnetic field which is directed perpendicular to the direction of movement of the electrically charged molecules 5, 6 and, due to the Lorentz force exerted on the moving molecules 5, 6, a circular movement of the electrically charged Molecules 5, 6 forces.
- the radius of the forced circular motion depends not only on the magnetic field, but also on the mass charge ratio and the velocity of the electrically charged molecules 5, 6.
- the field lines of the magnetic field are directed to the viewer to perpendicular to the plane and divert the positively charged molecules 5, 6 in the plane on a circular arc segment approximately 90 ° to the right.
- a diaphragm device 12 is arranged so that only molecules 5, 6 coincide with one another
- the aperture device 12 can traverse. In this way, a single-species molecular ion beam 9, 10 is generated and all contaminants or contaminating molecules from the molecular ion beam 9, 10 are discarded.
- the molecule ion beam 9, 10 is subjected by means of a deflection device 13 to a time-variable deflection and directed in a targeted manner to the respective areas of the surface 1 to be coated.
- the deflection device 13 can consist, for example, of two mutually perpendicular pairs of plate capacitors, as is known, for example, in oscilloscopes or cathode ray tubes.
- the molecular ion beam 9, 10 can be guided in a predeterminable movement pattern over the surface 1 in order to coat it.
- a further diaphragm device 14 is arranged between the deflection device 13 and the surface 1 to be coated, with which the molecular ion beam 9, 10 can be interrupted at intervals which can be predetermined in time or transmitted to the surface 1.
- the molecule ion beam 9, 10 impinging intermittently on the surface 1 individual points 15 can be formed with the coating layer desired in each case. material, or the respective molecules 5, 6 are generated, wherein the points 15 spaced from each other and arranged adjacent points 15 can be successively made of different molecules 5, 6 to form individually controllable pixels (pixels) of an OLED.
- the molecules 5 in the molecule reservoir 3 are vaporized into a gaseous state.
- a laser beam of a laser 16 is directed into the molecule supply 3.
- the ionized by the laser 16 and ionized molecules 5 are then combined with the focusing device 8 to a molecular ion beam 9 and fed into an AC voltage applied quadrupole electric field device 17.
- the suitably operated quadrupole field device 17 allows very precise selection and passage of molecules 5 having a predeterminable charge-to-mass ratio, while other molecules having a different charge-to-mass ratio are laterally rejected and do not reach the surface 1 to be coated , Subsequently, the molecule ion beam 9 is subjected to a deflection that is variable over time by means of the deflection device 13 and directed in a targeted manner to the areas of the surface 1 to be coated in each case.
- FIG. 3 a again different coating device is shown by way of example in FIG. 3. From the molecule reservoir 3, individual molecules 5 are dissolved out and ionized by the laser 16 by a 2-photon absorption. By appropriate selection and specification of the wavelength of the laser beam, the molecules 5 intended for the coating can be selectively excited and ionized, whereas impurities or other molecules are not excited or ionized.
- the ionized molecules 5 are withdrawn from the molecule supply 3 and are bundled to form a molecular ion beam 9.
- the molecular ion beam 9 is directed into a device 19 with which generates a quadrupole magnetic field becomes.
- the focusing of the molecular ion beam 9 and its direction at an exit from the device 19 can be predetermined.
- the present application is primarily concerned with the coating of surfaces for the production of organic electroluminescent devices.
- the described method can be used equally without any inventive step for the coating of surfaces for the production of other electronic devices, for example organic thin-film transistors, organic field-effect transistors or organic solar cells.
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Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013515744A JP5801390B2 (en) | 2010-06-22 | 2011-05-18 | Method and apparatus for coating a surface |
KR1020137001611A KR101780521B1 (en) | 2010-06-22 | 2011-05-18 | Method and device for coating a surface |
DE112011102108T DE112011102108A5 (en) | 2010-06-22 | 2011-05-18 | Method and device for coating a surface |
CN201180029156.7A CN102947479B (en) | 2010-06-22 | 2011-05-18 | The method and apparatus of coated surface |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102010024543.7 | 2010-06-22 | ||
DE102010024543A DE102010024543A1 (en) | 2010-06-22 | 2010-06-22 | Method and device for coating a surface |
Publications (1)
Publication Number | Publication Date |
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WO2011160749A1 true WO2011160749A1 (en) | 2011-12-29 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/EP2011/002468 WO2011160749A1 (en) | 2010-06-22 | 2011-05-18 | Method and device for coating a surface |
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JP (1) | JP5801390B2 (en) |
KR (1) | KR101780521B1 (en) |
CN (1) | CN102947479B (en) |
DE (2) | DE102010024543A1 (en) |
WO (1) | WO2011160749A1 (en) |
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CN103695869A (en) * | 2013-12-20 | 2014-04-02 | 上海中电振华晶体技术有限公司 | Preparation method of graphene film |
DE102014205533A1 (en) * | 2014-03-25 | 2015-10-01 | Waldemar Link Gmbh & Co. Kg | Method of applying charged particles to an implant |
CN105441894A (en) * | 2015-12-31 | 2016-03-30 | 蚌埠雷诺真空技术有限公司 | Physical vapor deposition device with function of focusing ion beams |
CN108837962B (en) * | 2018-07-13 | 2024-02-13 | 金华职业技术学院 | Vacuum deposition device for organic molecules |
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EP1868255A1 (en) * | 2006-06-14 | 2007-12-19 | Novaled AG | Method for surface processing in a vacuum environment |
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JP4003448B2 (en) * | 2001-11-30 | 2007-11-07 | 日新電機株式会社 | Vacuum arc deposition method and apparatus |
US6942929B2 (en) * | 2002-01-08 | 2005-09-13 | Nianci Han | Process chamber having component with yttrium-aluminum coating |
JP3803756B2 (en) * | 2002-11-20 | 2006-08-02 | 独立行政法人日本学術振興会 | Soft landing method for cluster ion species |
JP2004232044A (en) * | 2003-01-31 | 2004-08-19 | National Institute Of Information & Communication Technology | Device and method for depositing molecules |
CN101158030A (en) * | 2007-11-13 | 2008-04-09 | 吴江市天地人真空炉业有限公司 | Ion implantation equipment |
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EP1868255A1 (en) * | 2006-06-14 | 2007-12-19 | Novaled AG | Method for surface processing in a vacuum environment |
Non-Patent Citations (2)
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RAUSCHENBACH ET AL.: "Electrospray ion beam deposition of clusters and biomolecules", SMALL, vol. 2, no. 4, April 2006 (2006-04-01), pages 540 - 547, XP002655853 * |
SAF R ET AL: "Thin organic films by atmospheric-pressure ion deposition", NATURE MATERIALS, NATURE PUBLISHING GROUP, LONDON, GB, vol. 3, 18 April 2004 (2004-04-18), pages 323 - 329, XP002393264, ISSN: 1476-4660, DOI: DOI:10.1038/NMAT1117 * |
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DE112011102108A5 (en) | 2013-04-04 |
JP2013536315A (en) | 2013-09-19 |
JP5801390B2 (en) | 2015-10-28 |
CN102947479A (en) | 2013-02-27 |
KR20130121080A (en) | 2013-11-05 |
KR101780521B1 (en) | 2017-09-21 |
CN102947479B (en) | 2015-11-25 |
DE102010024543A1 (en) | 2011-12-22 |
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