CN101158030A - Ion implantation equipment - Google Patents
Ion implantation equipment Download PDFInfo
- Publication number
- CN101158030A CN101158030A CNA2007101355576A CN200710135557A CN101158030A CN 101158030 A CN101158030 A CN 101158030A CN A2007101355576 A CNA2007101355576 A CN A2007101355576A CN 200710135557 A CN200710135557 A CN 200710135557A CN 101158030 A CN101158030 A CN 101158030A
- Authority
- CN
- China
- Prior art keywords
- ion
- accelerator
- ion implantation
- target chamber
- mold parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Abstract
The invention relates to the field of surface treatment. Ion implantation equipment comprises an ion source system, an ion extraction and acceleration system, a quality analysis system, an ion beam focusing and scanning system, a target chamber system, a vacuum system and so on. At present, the ion implantation gets significant research results in the surface alloying, ion implantation and the substrate-surface interaction, etc., particularly gets outstanding progress in the metal surface alloying area. By using a miniature low energy ion accelerator, the invention ionizes the atom that is need to be implanted into the ion in the ion source of the accelerator, then through the high-voltage electric field of the ion accelerator, the ion is accelerated to form a high-speed plasma flow and then the flow is purified by a magnetic analyzer. The ion beam is forcibly placed into the surface of the mold parts in a target chamber, thus causing the changes of microstructure and macroscopic properties of the surface implanting layers of mold parts.
Description
Technical field:
The present invention is a field of surface treatment.
Technical background:
At present, ion implantation at surface alloying, inject aspects such as ion and matrix surface interaction and obtained significant achievement in research, particularly progress is given prominence to aspect metal surface alloyization.
Technology contents:
High energy ion beam penetrates mould working part basic surface and bumps in excitation electron and the ion process with atom in the surface, the losses of ions of injecting original energy, be still at last in the matrix surface of mold work part, in this process, will cause the Chemical bond of mold work part base solid lattice surface defective or matrix surface dot matrix atom, and make matrix surface generation physics, chemistry and changes of mechanical properties, improved the multiple performances such as hardness, wear resistance, erosion resistance and antifatigue on mold work part base solid surface effectively.
Specific implementation method:
Ion implantation device is drawn with accelerating system, mass analyzing system, focusing of ion beam and scanning system, target chamber system, vacuum system etc. by ion source system, ionic and is formed.
Utilize small-sized low energy ion accelerator, to need to inject atoms of elements, ionization becomes ion in adding the ion source of device, high-voltage electric field by ion accelerator becomes high speed ion stream with its acceleration then, again after magnetic analyzer is purified, ionic fluid is squeezed into the mold work piece surface that places target chamber by force, to cause the variation of microtexture and macro property in the mold work piece surface input horizon.Whole injected system is in 1.33 * 10
-10In the vacuum of Pa, when advancing, the route of regulation do not bump with other atoms of elements to guarantee ionic fluid.
Claims (1)
1. whole injected system is in 1.33 * 10
-10In the vacuum of Pa, when advancing, the route of regulation do not bump with other atoms of elements to guarantee ionic fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101355576A CN101158030A (en) | 2007-11-13 | 2007-11-13 | Ion implantation equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNA2007101355576A CN101158030A (en) | 2007-11-13 | 2007-11-13 | Ion implantation equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101158030A true CN101158030A (en) | 2008-04-09 |
Family
ID=39306262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007101355576A Pending CN101158030A (en) | 2007-11-13 | 2007-11-13 | Ion implantation equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101158030A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102947479A (en) * | 2010-06-22 | 2013-02-27 | 默克专利有限公司 | Method and device for coating a surface |
-
2007
- 2007-11-13 CN CNA2007101355576A patent/CN101158030A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102947479A (en) * | 2010-06-22 | 2013-02-27 | 默克专利有限公司 | Method and device for coating a surface |
| CN102947479B (en) * | 2010-06-22 | 2015-11-25 | 默克专利有限公司 | The method and apparatus of coated surface |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20080409 |