WO2011154131A1 - Electronic device comprising an organic semiconducting material - Google Patents
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- WO2011154131A1 WO2011154131A1 PCT/EP2011/002807 EP2011002807W WO2011154131A1 WO 2011154131 A1 WO2011154131 A1 WO 2011154131A1 EP 2011002807 W EP2011002807 W EP 2011002807W WO 2011154131 A1 WO2011154131 A1 WO 2011154131A1
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
- H10K85/622—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing four rings, e.g. pyrene
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- H—ELECTRICITY
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- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
- H10K50/12—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising dopants
- H10K50/121—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers comprising dopants for assisting energy transfer, e.g. sensitization
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/30—Doping active layers, e.g. electron transporting layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/656—Aromatic compounds comprising a hetero atom comprising two or more different heteroatoms per ring
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/657—Polycyclic condensed heteroaromatic hydrocarbons
- H10K85/6572—Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/15—Hole transporting layers
- H10K50/155—Hole transporting layers comprising dopants
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
- H10K50/16—Electron transporting layers
- H10K50/165—Electron transporting layers comprising dopants
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/917—Electroluminescent
Definitions
- the present invention relates to an organic semiconducting layer, preferably an electronic device, comprising at least one organic semiconducting material.
- Organic semiconductors can be used to fabricate simple electronic components e.g. resistors, diodes, field effect transistors, and also optoelectronic components like organic light emitting devices (e.g. OLED), and many others.
- OLED organic light emitting devices
- Conjugated organic compounds can be small molecules, for instance monomers, or oligomers, polymers, copolymers, copolymers of conjugated and non-conjugated blocks, completely or partially cross-linked layers, aggregate structures, or brush like structures.
- Organic electronic semiconductors can also be used in organic electronic devices, and in organic-inorganic hybrid devices.
- Typical organic semiconducting compounds may have a gap that is still high enough so that the compounds are optically active.
- Organic field effect transistors are explained, for example, in US7026643, US2005146262 and US2008230776.
- the resistance of a semiconductive layer that is contacted by two electrodes (source and drain) can be controlled by the voltage that is applied to the gate.
- the gate is displaced on an insulator that is displaced parallel in contact to the semiconductive layer.
- Various geometries can be used, such as bottom gate (on the substrate), top gate (on the opposite side of the semiconductive layer relative to the substrate) or on both sides.
- Many different arrangements of layers can be used such as bipolar layers, injection layer, insulating layer between electrode and semiconductive layer to lower the off current, etc.
- OTFTs organic thin-film transistors
- Transparent circuits such as transparent OTFTs require that the high mobility organic material also comprises a wide electronic band gap; the electric injection of holes and / or electrons must be still provided.
- OLEDs require transparent transport layers, with high conductivity. The transparency is necessary in those opto-electric devices to avoid non desired absorption of the light. These so called “window” materials can be used as transport layers, exciton or charge blocking layers. The thickness of the layers made with the window materials is used to adjust the micro cavity of the OLEDs in such a way that the outcoupled emission of the OLED is a maximum.
- the non-optically active layers of all kinds of semiconductor devices can be exchanged for window materials in order to fabricate fully transparent components and circuits (e.g US200600331 15). The functionality and nomenclature of the layers are typical as used in the field. Further explanation can be found in US2006244370.
- Electronic devices also need high stability towards temperature, meaning that the intrinsic properties of the amorphous organic semiconducting materials, such as triphenyl amine derivatives, or phenantronine derivatives, must include a high glass transition temperature (Tg) and high temperature stability in the device.
- Tg glass transition temperature
- the performance characteristics of (opto)electronic multilayered components are determined by the ability of the layers to transport the charge carriers, amongst others.
- the ohmic losses in the charge transport layers during operation are associated with their conductivity.
- the conductivity directly influences the operating voltage required and also determines the thermal load of the component.
- a bending of the band in the vicinity of a metal contact results which simplifies the injection of charge carriers and can therefore reduce the contact resistance.
- doped charge-carrier transport layers p- doping of the hole transport layer by admixture of acceptor-like molecules, n-doping of the electron transport layer by admixture of donor-like molecules
- US2008203406 and US 5,093,698 The use of doped charge-carrier transport layers (p- doping of the hole transport layer by admixture of acceptor-like molecules, n-doping of the electron transport layer by admixture of donor-like molecules) in organic light-emitting diodes is described in US2008203406 and US 5,093,698.
- US2008227979 discloses in detail the doping of organic transport materials, also called matrix, with inorganic and with organic dopants. Basically, an effective electronic transfer occurs from the dopant to the matrix increasing the Fermi level of the matrix.
- the LUMO energy level of the dopant must be more negative than the HOMO energy level of the matrix or at least slightly more positive, not more than 0.5 eV, to the HOMO energy level of the matrix.
- the HOMO energy level of the dopant must be more positive than the LUMO energy level of the matrix or at least slightly more negative, not lower than 0.5 eV, to the LUMO energy level of the matrix. It is furthermore desired that the energy level difference for energy transfer from dopant to matrix is smaller than + 0.3 eV.
- CuPc copperphthalocyanine
- F4TCNQ tetrafluoro-tetracyanoquinonedimethane
- ZnPc zincphthalocyanine
- HOMO -5.2 eV
- a-NPD N,N'-Bis(naphthalen-l-yl)-N,N'-bis(phenyl
- Typical examples of doped electron transport materials are: fullerene C60 doped with acridine orange base (AOB); perylene-3,4,9,10-tetracarboxylic-3,4,9,10-dianhydride (PTCDA) doped with leuco crystal violet; 2,9 - di (phenanthren-9-yl) - 4,7 - diphenyl - 1,10 - phenanthroline doped with tetrakis ( 1,3,4,6,7,8 - hexahydro - 2H - pyrimido [ 1 ,2 - a] pyrimidinato) ditung- sten (II) (W(hpp) 4 ); naphthalene tetracarboxylic acid di-anhydride (NTCDA) doped with 3,6- bis-(dimethyl amino)-acridine; NTCDA doped with bis(ethylene-dithio) tetrathiafulvalene (BEDT-TTF
- ETM electron transport materials
- EMH emitter host
- an object of the present invention to provide a semiconducting layer, preferably an electronic device, comprising a specific class of functional materials which can be utilized as or- ganic semiconducting materials to overcome the drawbacks of the prior art.
- an electronic device shall be provided comprising transparent organic semiconducting materials which are additionally thermally stable and/or dopable. Further, the electronic device shall comprise semiconducting materials which can be synthesized without any difficulties.
- R 1-4 are independently selected from H, halogen, CN, substituted or unsubstituted Q- C 20 -alkyl or heteroalkyl, C 6 -C 20 -aryl or C 5 -C 2 o-heteroaryl, Ci-C 2 o-alkoxy or C 6 -C 20 -aryloxy,
- Ar is selected from substituted or unsubstituted C6-C 2 o-aryl or C5-C 2 o-heteroaryl, and
- R5 is selected from substituted or unsubstituted C 6 -C 2 o-aryl or C 5 -C 20 -heteroaryl, H, F or
- Ar and Ri -4 are independently selected from C 6 -C 2 o-aryl and C 5 -C 20 -heteroaryl.
- heteroaryl is a C5-C20 condensed ring structure in which one or two C are substituted by N or S.
- R 5 is H or F and combines with Ar to a moiety selected from
- compounds according to formula (I) are prepared with R 5 ⁇ H or F, but with Ar being C6-C20-aryl or C5-C20-heteroaryl; preferably Ar having the structures as illustrated above, and wherein preferably R1-R4 is H, C6-C20-aryl or C5-C20- heteroaryl.
- Ar is selected from
- Ar is selected from Table 2 and combines with R5 which is selected from Table 1.
- the device is an electronic, optoelectronic or electroluminescent device having an electronically functionally effective region, wherein the electronically effective region comprises at least one compound according to formula (I) as defined above.
- the device has a layered structure and at least one layer comprises at least one compound according to formula (I) as defined above.
- the organic semiconducting material is doped by an n-dopant.
- the device with a layered structure has at least two layers of the organic semiconducting material comprising a compound of formula (I), one n-doped and the other undoped. Preferably both layers are in direct contact.
- the organic semiconducting material may be doped by an organic n-dopant which dopant has HOMO energy level which is more positive than -3.3 eV.
- the device may be preferably an organic light-emitting diode, a field-effect transistor, a sensor, a photodetector, an organic thin-film transistor, an organic integrated circuit, an organic light-emitting transistor, a light-emitting electrochemical cell or an organic laser diode. It was found out that the organic semiconducting materials comprising a compound of formula (I) are especially suitable to be used in electron transport layers in OLEDs.
- Ar can be selected from a number of differently substi ⁇ tuted or unsubstituted C 6 -C 20 -aryl or C 5 -C 20 -heteroaryl. Suitable substituents may be for example halogen, such as Br, Aryl, pyrene, or CF 3 .
- An organic n-dopant can be, for example, selected from the dopants as disclosed in EP 2002492 Al, US 2007252140 or US 2009212280.
- an electronic device comprising an organic semiconducting material comprising at least one organic matrix material which is optionally doped with at least one dopant, wherein the matrix material comprises at least one compound according to formula (I).
- the compounds according to formula (I) can be used in electron transport layers, which might be optionally doped.
- the compounds can be also used in light- emitting diodes in interlayers such as hole blocking layers.
- the compounds are preferably used in the electron transport layer and not as main compound of the emitter layer, preferably they are not used in the emitter layer at all.
- a window semiconducting organic material is provided for the device that can be electrically doped achieving a high conductivity while it remains highly transparent in the visible spectra and has a high thermal stability.
- an organic field-effect transistor comprising at least one compound according to formula (I) for use in a transport layer, in other words, in the semiconducting channel layer.
- An organic field effect transistor may also comprise at least one compound as disclosed as electronically inert buffer layer, when no charge is injected due to high potential barrier.
- An organic field effect transistor may also comprise at least one compound as disclosed as doped injection layer.
- the compounds used in this invention according to formula (I) can be used in OLEDs in electron transport layers as a neat layer, or as a doped layer in combination with a redox dopant.
- the compounds can also be used in mixture with other electron transport materials, with other hole transport materials or with other functional materials such as emitter dopants.
- the com- pounds can be used as hole blocking layers. Advantageous effects are seen over the prior art since the materials have a higher glass transition temperature compared to materials described in the prior art, such as in DE 10 2007 012 794 or EP 2072517.
- the use of the compounds according to formula (I) provides high thermal stability, especially due to high glass transition temperature, a good LUMO position for organic light-emitting devices, good dopability, conductivity and charge carrier mobility, high transparency, and easy synthesis. Further, preparation of these compounds can be conducted in a very cost- effective manner. Finally, it can be pointed out that the synthesis of such compounds offers a high flexibility to change independently the R and X, Ari or Ar 2 groups which opens access to more complex compounds and therefore to different physical/chemical properties resulting in a fine tuning thereof.
- HOMO highest occupied molecular orbital energy level
- LUMO lowest unoccupied molecular orbital energy level
- IP ionization potentials
- UPS ultraviolet photo spectroscopy
- IPES inverted photo electron spectroscopy
- EA electron affinity
- IPES inverted photo electron spectroscopy
- EA electron affinity
- Electrochemical measurements in solution are an alternative to the determination of solid state oxidation (Eox) and reduction (Ered) potential.
- An adequate method is for example the cyclo-voltammetry.
- Hole transport layers including the respective blockers, mostly have HOMO in the range from -4.5 to -5.5 eV (below the vacuum level) and LUMO in the range of -1.5 eV to -3 eV.
- the HOMO levels of the emitter materials are in the range of -5 eV to -6.5 eV, and the LUMO in the range from -2 to -3 eV.
- Electron transport materials, including their respective blockers have their HOMO in a range of -5.5 eV to -6.8 eV and LUMO in the range of -2.3 eV to -3.3 eV.
- the work function of the contact materials is around -4 to -5 eV for the anode and -3 to -4.5 eV for the cathode.
- the dopant donor is a molecule or a neutral radical or combination thereof with a HOMO energy level (ionization potential in solid state) more positive than -3.3 eV, preferably more positive than -2.8 eV, more preferably more positive than -2.6 eV.
- the HOMO of the donor can be estimated by cyclo-voltammetric measurements.
- An alternative way to measure the reduction potential is to measure the cation of the donor salt.
- the donor has to exhibit an oxidation potential that is smaller than or equal to -1.5 V vs Fc / Fc+ (Ferrum/Ferrocenium redox -pair), preferably smaller than -1.5 V, more preferably smaller than or equal to approximately -2.0 V, even more preferably smaller than or equal to -2.2 V.
- the molar mass of the donor is in a range between 100 and 2000 g/mol, preferably in a range from 200 and 1000 g / mol.
- the molar doping concentration is in the range of 1 : 10000 (dopant molecule : matrix molecule) and 1 :2, preferably between 1 : 100 and 1 :5, more preferably between 1 : 100 and 1 : 10.
- the donor can be created by a precursor during the layer forming (deposition) process or during a subsequent process of layer formation (see DE 10307125.3).
- the above given value of the HOMO level of the donor refers to the resulting molecule or molecule radical.
- a dopant acceptor is a molecule or a neutral radical or combination thereof with a LUMO level more negative than -4.5 eV, preferably more negative than -4.8 eV, more preferably more negative than -5.04 eV.
- the LUMO of the acceptor can be estimated by cyclo- voltammetric measurements.
- the acceptor has to exhibit a reduction potential that is larger than or equal to approximately -0.3 V vs Fc / Fc+ (Ferrum/Ferrocenium redox-pair), preferably larger than or equal to 0.0 V, preferably larger than or equal to 0.24 V.
- the molar mass of the aceptor is preferably in the range of 100 to 2000 g / mol, more preferably between 200 and 1000 g / mol, and even more preferably between 300 g/mol and 2000 g/mol.
- the molar doping concentration is in the range of 1 : 10000 (dopant molecule : matrix molecule) and 1 :2, preferably between 1 : 100 and 1 :5, more preferably between 1 :100 and 1 : 10. In individual cases doping concentrations larger than 1 :2 are applied, e.g. if large conductivities are required.
- the acceptor can be created by a precursor during the layer forming (deposition) process or during a subsequent process of layer formation. The above given value of the LUMO level of the acceptor refers to the resulting molecule or molecule radical.
- doping electrical doping as explained above.
- This doping can also be called redox-doping or charge transfer doping. It is known that the doping increases the density of charge carriers of a semiconducting matrix towards the charge carrier density of the undoped matrix.
- An electrically doped semiconductor layer also has an increased effective mobility in comparison with the undoped semiconductor matrix.
- the conductivity can be, for example, measured by the so-called 2-point or 4-point-method.
- contacts of a conductive material such as gold or indium-tin-oxide
- the thin film to be examined is applied onto the substrate, so that the contacts are covered by the thin film. After applying a voltage to the contacts the current is measured. From the geometry of the contacts and the thickness of the sample the resistance and therefore the conductivity of the thin film material can be determined.
- the four point or two point method give the same conductivity values for doped layers since the doped layers grant a good ohmic contact.
- the temperature stability can also be measured with that method in which the (undoped or doped) layer is heated stepwise, and after a waiting period, the conductivity is measured.
- the maximum temperature which can be applied to the layer without loosing the desired semiconducting properties, is then the temperature just before the conductivity breaks down.
- a doped layer can be heated on the substrate with two electrodes, as disclosed above, in steps of 1 °C, wherein after each step there is a waiting period of 10 seconds. Then the conductivity is measured.
- the conductivity changes with temperature and breaks down abruptly at a particular temperature.
- the temperature stability is therefore the temperature up to which the conductivity does not break down abruptly.
- the measurement is performed in vacuum.
- the compounds according to formula (I) are used in an organic light emitting diode as electron transport materials in an ETL which is undoped (not electrically doped).
- the ETL is mixed with an organometallic-complex, preferentially a Li compound, such as LiQ.
- the transporting host of the emitting layer is preferentially electron transporting, either because it has higher electron mobility or because electrons are more easily injected than holes, due to the HOMO and LUMO energy levels of the emitting layer host and its adjacent layer's hosts.
- the ETL consists of the compound according to formula (I).
- Fig. 1 shows a cross section of a typical exemplary small molecule OLED.
- the organic electronic device of the present invention may be an organic light emitting diode.
- Fig. 1 shows a typical layer structure of an organic light emitting diode.
- the layers are disposed on a substrate (10) in the following order: anode (1 1), p-doped hole transport layer (12), electron blocking layer (13), emission layer (14), hole blocking layer (15), n-electron transport layer (16), and cathode (17).
- Two or more layers can collapse into a smaller number of layers if properties can be combined.
- Inverted structure and multiple stacked OLEDs are also well known in the field.
- the emission layer is usually composed by an emitter matrix material and an emitter dopant; this layer can be also composed by several other layers to generate light with a broad spectrum combining several emitters, for example, to generate white light.
- Rl-4 are independently introduced in steps 1 and/or 2 of the general synthesis scheme by choosing the proper tetralone derivative (such as 6-fluoro-3,4-dihydro-7-methoxy-l(2H)- naphthalenone or 3,4-dihydro-5,8-dimethyl- l(2H)-naphthalenone, or 6,7-dichloro-3,4- dihydro l(2H)-naphthalenone, or, 3,4-dihydro-6-nitro- l(2H)-naphthalenone, or 3,4-dihydro- 7-phenyl- 1 (2H)-naphthalenone which are all commercial materials.
- the proper tetralone derivative such as 6-fluoro-3,4-dihydro-7-methoxy-l(2H)- naphthalenone or 3,4-dihydro-5,8-dimethyl- l(2H)-naphthalenone, or 6,7-dichlor
- Second step Synthesis of 7-phenyl-5,6,8,9-tetrahydrodibenzo[c,h]acridine (2). All manipulations were carried out under argon.
- Second step Synthesis of 7-(4-bromophenyl)-5,6,8,9-tetrahydrodibenzo[c,h]acridine (5). All manipulations were carried out under argon.
- Second step Synthesis of 7-(3-bromophenyl)-5,6,8,9-tetrahydrodibenzo[c,h]acridine (9). All manipulations were carried out under argon.
- Second step Synthesis of 7-(4-methoxyphenyl)-5,6,8,9-tetrahydrodibenzo[c, z]xanthen-14- ium tetra-fluoroborate (16). All manipulations were carried out under argon.
- reaction mixture was carefully added to 500 mL of an aqueous saturated sodium carbonate solution and the reaction vessel was flushed with saturated Na 2 C0 3 solution (250 mL) and water (200 mL). After stirring of the mixture at 65°C for 75 minutes the precipitate was allowed to settle down and the product was isolated by filtration and purified by multiple slurry of the solid in water (overall ca. 1000 mL). After drying of the crude product in vacuo at 40°C overnight the solid was suspended in methylene chloride (20 mL), stirred for 45 minutes, isolated by filtration and washed with DCM (2x 20 mL) and dried overnight. 3.53 g of an ochre solid (72% yield) could be obtained in a 99.5% HPLC purity.
- the conductivity of a doped layer consisting of material of structure 18 in table 1 doped with 5% of W(hpp)4 was measured at room temperature and was 3xl0 "7 S/cm.
- the conductivity of a doped layer consisting of material of structure 3 in table 1 doped with 5% of W(hpp)4 was measured at room temperature and was 1.2xl0 "5 S/cm.
- An OLED was fabricated with the following procedure: A glass substrate coated with ITO (90 nm thick, pre-patterned) was cleaned in organic solvents in conventional ultra-sound. Afterwards the substrate was treated with ozone plasma for 5 minutes. After the cleaning, the substrate was transferred to vacuum. The organic layers were deposited in high vacuum (base pressure lower than 10 " Pa) by conventional VTE (Vacuum thermal evaporation). The deposited area was defined by a shadow mask, keeping some area of the ITO surface free so that an electrical contact for the measurements could (later on) be established.
- the organic layer sequence over the ITO layer is: 50 nm thick NPD layer doped with F4TCNQ; 10 nm thick non- doped NPD layer, 20 nm blue emitter host layer doped with a fluorescent emitter; 10 nm ETL (structure 4), 60 nm ETL (structure 4) doped with W(hpp) 4 (5% in weight).
- a 100 nm alumi- num layer was deposited as cathode.
- the OLED reached 1000 cd/m at 3.59 V.
- An OLED was fabricated with the following procedure: A glass substrate coated with ITO (90 nm thick, pre-patterned) was cleaned in organic solvents in conventional ultra-sound. Afterwards the substrate was treated with ozone plasma for 5 minutes. After the cleaning, the substrate was transferred to vacuum. The organic layers were deposited in high vacuum (base pressure lower than 10 "3 Pa) by conventional VTE (Vacuum thermal evaporation). The deposited area was defined by a shadow mask, keeping some area of the ITO surface free so that an electrical contact for the measurements could (later on) be established.
- the organic layer sequence over the ITO layer is: 50 nm thick NPD layer doped with F4TCNQ; 10 nm thick non- doped NPD layer, 20 nm blue emitter host layer doped with a fluorescent emitter; 10 nm ETL (structure lb), 60 nm ETL (structure lb) doped with W(hpp) 4 (5% in weight).
- a 100 nm alu- minum layer was deposited as cathode.
- the OLED reached 1000 cd/m at 4.25 V.
Abstract
Description
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KR1020137000597A KR101866330B1 (en) | 2010-06-10 | 2011-06-08 | Electronic device comprising an organic semiconducting material |
US15/605,237 USRE48156E1 (en) | 2010-06-10 | 2011-06-08 | Electronic device comprising an organic semiconducting material |
US13/699,532 US9040175B2 (en) | 2010-06-10 | 2011-06-08 | Electronic device comprising an organic semiconducting material |
CN201180028541.XA CN102986050B (en) | 2010-06-10 | 2011-06-08 | Comprise the electronic device of organic semiconducting materials |
JP2013513579A JP6014027B2 (en) | 2010-06-10 | 2011-06-08 | Electronic devices containing organic semiconductor materials |
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EP10165537.1 | 2010-06-10 | ||
EP10165537.1A EP2395571B1 (en) | 2010-06-10 | 2010-06-10 | Organic electronic device comprising an organic semiconducting material |
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EP (1) | EP2395571B1 (en) |
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CN103420910A (en) * | 2012-07-26 | 2013-12-04 | 烟台万润精细化工股份有限公司 | Electron-transport blue luminescent material and use thereof |
EP2887416A1 (en) | 2013-12-23 | 2015-06-24 | Novaled GmbH | N-doped semiconducting material comprising phosphine oxide matrix and metal dopant |
EP3002801A1 (en) | 2014-09-30 | 2016-04-06 | Novaled GmbH | Organic electronic device |
EP3109919A1 (en) | 2015-06-23 | 2016-12-28 | Novaled GmbH | N-doped semiconducting material comprising polar matrix and metal dopant |
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Also Published As
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JP2013534047A (en) | 2013-08-29 |
CN102986050A (en) | 2013-03-20 |
JP6014027B2 (en) | 2016-10-25 |
JP6343311B2 (en) | 2018-06-13 |
US9040175B2 (en) | 2015-05-26 |
JP2017025072A (en) | 2017-02-02 |
US20130200341A1 (en) | 2013-08-08 |
USRE48156E1 (en) | 2020-08-11 |
CN102986050B (en) | 2015-10-07 |
EP2395571B1 (en) | 2013-12-04 |
EP2395571A1 (en) | 2011-12-14 |
KR101866330B1 (en) | 2018-06-11 |
KR20130119413A (en) | 2013-10-31 |
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