WO2011142377A1 - Sheet for mask - Google Patents
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- WO2011142377A1 WO2011142377A1 PCT/JP2011/060826 JP2011060826W WO2011142377A1 WO 2011142377 A1 WO2011142377 A1 WO 2011142377A1 JP 2011060826 W JP2011060826 W JP 2011060826W WO 2011142377 A1 WO2011142377 A1 WO 2011142377A1
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- mask
- pollen
- mask sheet
- sheet
- sheet according
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Classifications
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- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62B—DEVICES, APPARATUS OR METHODS FOR LIFE-SAVING
- A62B18/00—Breathing masks or helmets, e.g. affording protection against chemical agents or for use at high altitudes or incorporating a pump or compressor for reducing the inhalation effort
- A62B18/02—Masks
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/77—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof
- D06M11/79—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof with silicon dioxide, silicic acids or their salts
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M13/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with non-macromolecular organic compounds; Such treatment combined with mechanical treatment
- D06M13/322—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with non-macromolecular organic compounds; Such treatment combined with mechanical treatment with compounds containing nitrogen
- D06M13/325—Amines
- D06M13/328—Amines the amino group being bound to an acyclic or cycloaliphatic carbon atom
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M13/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with non-macromolecular organic compounds; Such treatment combined with mechanical treatment
- D06M13/322—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with non-macromolecular organic compounds; Such treatment combined with mechanical treatment with compounds containing nitrogen
- D06M13/46—Compounds containing quaternary nitrogen atoms
- D06M13/463—Compounds containing quaternary nitrogen atoms derived from monoamines
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M15/00—Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment
- D06M15/19—Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment with synthetic macromolecular compounds
- D06M15/37—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- D06M15/643—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds containing silicon in the main chain
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M17/00—Producing multi-layer textile fabrics
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- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D13/00—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
- A41D13/05—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
- A41D13/11—Protective face masks, e.g. for surgical use, or for use in foul atmospheres
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- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62B—DEVICES, APPARATUS OR METHODS FOR LIFE-SAVING
- A62B23/00—Filters for breathing-protection purposes
- A62B23/02—Filters for breathing-protection purposes for respirators
- A62B23/025—Filters for breathing-protection purposes for respirators the filter having substantially the shape of a mask
Definitions
- the present invention relates to a mask sheet for preventing the pollen floating in the air from adhering to the mask, and a mask using the mask sheet.
- Hay fever is an allergic disease that causes various symptoms such as sneezing, runny nose, headache, lacrimation, blurred vision and general malaise when pollen enters the body.
- Patent Documents 1 to 3 Various drugs and treatments for treating hay fever have been studied, but there is no better way to prevent pollen from entering the body. Therefore, in order to prevent pollen from entering the body, many masks that do not allow pollen to pass through and masks that capture and adsorb pollen have been developed (Patent Documents 1 to 3).
- a mask sheet made of a base material coated with a coating agent containing a silicon compound and a cationic antistatic agent reduces the space where pollen adheres.
- the inventors have found that they are less likely to be charged with static electricity and do not attract pollen, thereby completing the present invention.
- the present invention is as follows. 1. A mask sheet comprising a substrate coated with a coating agent comprising a silicon compound and a cationic antistatic agent. 2. 2. The mask sheet according to item 1, wherein the substrate is a nonwoven fabric. 3. 3. The mask sheet according to item 1 or 2, wherein the silicon compound is at least one of polymethylchlorosiloxane and silicon dioxide. 4). 4. The mask sheet according to any one of items 1 to 3, wherein the cationic antistatic agent is octadecylamine acetate. 5. 5. The mask sheet according to any one of items 2 to 4, wherein the nonwoven fabric has a basis weight of 40 g / m 2 or less. 6).
- a pollen adhesion prevention mask comprising: a main body portion covering a target portion of a face including a nose and a mouth; and ear hook portions for engaging with ears provided on left and right side portions of the main body portion, A pollen adhesion preventive mask, wherein the outermost layer is formed of the mask sheet according to any one of the preceding items 1 to 5. 7).
- the mask sheet of the present invention can effectively reduce the space to which pollen containing allergen adheres because the base material is coated with a coating agent containing a silicon compound.
- the base material is coated with a coating agent containing a cationic antistatic agent, it is possible to obtain an effect that it is difficult to be charged with static electricity and does not attract negatively charged pollen.
- FIG. 1A and 1B are sectional views showing an example of the mask of the present invention.
- FIG. 2 is a schematic view showing an example of the mask of the present invention.
- FIG. 3 is a schematic view showing an example of the mask of the present invention.
- the mask sheet of the present invention includes a base material coated with a coating agent containing a silicon compound and a cationic antistatic agent.
- a base material coated with a coating agent containing a silicon compound and a cationic antistatic agent As the base material for the mask sheet of the present invention, generally known materials can be used as mask materials. Specific examples include, for example, polyester fibers, polypropylene fibers, rayon fibers, nylon fibers, acetate fibers, wool fibers, cotton fibers, urethane fibers, and polyethylene fibers, gauze, paper, and the like. Moreover, a moisture-permeable resin sheet etc. are mentioned.
- examples of materials suitable for coating with a coating agent containing a silicon compound and a cationic antistatic agent include polyester, nylon, rayon, and cotton fibers.
- coating agent a coating agent containing a silicon compound and a cationic antistatic agent
- the basis weight of the nonwoven fabric is preferably 40 g / m 2 or less, and more preferably 35 g / m 2 or less. It is also preferably 10 g / m 2 or more, more preferably 20 g / m 2 or more.
- nonwoven fabric examples include 6035A (manufactured by Mie Tech Co., Ltd., material: polyester, basis weight: 35 g / m 2 ), 6040A (manufactured by Mie Tech Co., Ltd., material: polyester, basis weight: 40 g / m 2 ), AC5020.
- Examples of the silicon compound contained in the coating agent used in the present invention include straight silicon such as polymethylchlorosiloxane, silicon dioxide and dimethylsilicon, and modified silicone oil such as alkyl modification.
- straight silicon such as polymethylchlorosiloxane, silicon dioxide and dimethylsilicon
- modified silicone oil such as alkyl modification.
- polymethylchlorosiloxane and silicon dioxide are preferable from the viewpoint of pollen adhesion prevention effect.
- a cationic surfactant As the cationic antistatic agent contained in the coating agent used in the present invention, a cationic surfactant is preferable.
- the cationic surfactant include octadecylamine acetate, octadecyldimethylbenzylammonium chloride, alkyldimethylbenzylammonium chloride, tetradecyldimethylbenzylammonium chloride, dioleyldimethylammonium chloride, octadecyltrimethylammonium chloride, alkyltrimethylammonium chloride, Examples include dodecyltrimethylammonium chloride, hexadecyltrimethylammonium chloride, tetradecylamine acetate, perfluoroalkyltrimethylammonium salt, and perfluoroalkyl quaternary ammonium salt.
- octadecylamine acetate tetradecylamine acetate and octadecyltrimethylammonium chloride are preferable, and octadecylamine acetate is more preferable.
- the mass ratio of the silicon compound and the cationic antistatic agent in the coating agent used in the present invention is preferably 10: 1 to 1:10, more preferably 5: 2 to 2: 5. By being within these ranges, a sufficient pollen adhesion preventing effect can be obtained.
- the coating agent used in the present invention may contain a fluorine-based processing agent containing a fluorine-based resin, a paraffin-based processing agent, and a wax-based processing agent.
- a fluorine processing agent include a fluorine resin emulsion and a fluorine resin aqueous solution.
- the paraffin processing agent include a high melting point paraffin emulsion and a low melting point paraffin emulsion.
- wax processing agents include oxidized wax emulsions and microwax emulsions.
- a conventionally known method can be applied.
- it can be applied and applied by an appropriate method such as application and impregnation by means of spray, roll, brush, or the like.
- the impregnation method is preferable from the viewpoint of production efficiency.
- a coating solution is prepared by dissolving or suspending the above-mentioned silicon compound and cationic antistatic agent in water, ethyl alcohol, isopropyl alcohol or the like by a usual means. To do.
- the substrate is impregnated in the coating solution at room temperature for several seconds to several tens of seconds, and then dried at a temperature of preferably 120 ° C. to 170 ° C., more preferably 140 ° C. to 150 ° C. for several seconds to several minutes.
- a person skilled in the art can appropriately set the impregnation time and the drying temperature and time depending on the concentration of the coating liquid used or the size of the substrate.
- the coating amount of the coating agent on the base material is preferably 0.2 to 2.5 g / m 2 with respect to the base material from the viewpoints of cost and pollen adhesion preventing effect. More preferably, it is 3 to 1.0 g / m 2 .
- the thickness of the substrate formed of the coating agent is preferably 60 to 200 ⁇ m, and more preferably 90 to 150 ⁇ m, from the viewpoint of cost and pollen adhesion preventing effect.
- the mask sheet of the present invention can be used for pollen adhesion prevention masks.
- the mask of this invention is a mask provided with the main-body part which covers the object part of the face containing a nose and a mouth, and the ear hook part for latching to the ear provided in the right-and-left side part of this main-body part.
- the main body 10 is made of a substrate such as a gauze or a nonwoven fabric in addition to the mask sheet of the present invention. It is preferable to laminate at least one of them to form a multilayer structure.
- the durability of the main body 10 can be improved.
- the outermost layer is 11A
- the intermediate layer 11B (two layers) and the innermost layer 11C are illustrated as being formed from a total of four layers of sheet material 11.
- the mask is not limited to this, and may have a multilayer structure other than four layers, or may be a single layer.
- the mask sheet of the present invention for the outermost layer 11A at the time of mounting from the viewpoint of preventing pollen adhesion.
- the base material used for the innermost layer 11C is preferably a non-woven fabric with less fluff and good touch.
- the intermediate layer 11B may be laminated between the mask sheet of the present invention of the outermost layer 11A and the base material of the innermost layer 11C.
- the intermediate layer 11B may be a single layer or two or more layers, but it is preferable to use an ultrafine fiber filter for at least one layer of the intermediate layer 11B.
- ultrafine fiber filter means a non-woven fabric (melt blown non-woven fabric) manufactured by a melt blown method using polyester fiber, polypropylene fiber, polyethylene fiber or the like as a raw material.
- the mask sheet of the present invention can be used not only for a planar mask but also for a mask whose body can be deformed into a three-dimensional shape when used so as to fit the shape of the face.
- a mask for example, a pleated mask (see FIG. 2) in which a main body portion made of nonwoven fabric or the like is subjected to pleating in the lateral direction, and two sheet members are formed in a palm shape at the center of the main body portion.
- There is a three-dimensional mold mask (see FIG. 3) joined together.
- the pleat 14 has a pleat 14 formed of a plurality (four in FIG. 2) of lateral folds 13. In the state shown in FIG. 2, the pleat 14 is folded into two substantially ⁇ -shapes, and is configured to have a three-dimensional shape that expands outward when the pleat 14 is unfolded.
- the material for the ear hook 15 include polyester fiber, rayon fiber, nylon fiber, gauze, paper, and a moisture-permeable resin sheet.
- a nose fitter 16 may be provided on the upper side portion of the main body 10.
- the nose fitter 16 for example, an elongated plate made of metal or polyethylene can be used.
- the joint portion 33 is formed in a curved line that protrudes outward, and is configured to have a three-dimensional shape that expands outward by opening the sheet materials 34A and 34B to the left and right.
- a mask obtained by coating the outside of an existing mask with the present coating agent without using the mask sheet of the present invention is also included in the scope of the present invention.
- Base material 1 (6035A, manufactured by Mie Tech Co., Ltd.), base material 2 (6040A, manufactured by Mie Tech Co., Ltd.), base material 3 (AC5020, manufactured by Asahi Kasei Fibers Co., Ltd.) and base material 4 (N05020, manufactured by Asahi Kasei Fibers Co., Ltd.) was coated with a coating agent containing a silicon compound and a cationic antistatic agent to prepare a mask sheet.
- each substrate is coated in a coating solution prepared by mixing 1% by mass of polymethylchlorosiloxane, 0.1% by mass of silicon dioxide and 0.5% by mass of octadecylamine acetate with water. After impregnation at room temperature for 2 to 3 seconds, drying was performed at 150 ° C. for 30 seconds.
- masks 1 to 4 prepared using a sheet coated with a coating agent containing a silicon-based compound and a cationic antistatic agent had a remarkable number of pollen adhered compared to a commercially available mask. It was found to have an excellent ability to prevent pollen adhesion.
- covered the base materials 1, 3, and 4 with a fabric weight of 35 g / m ⁇ 2 > or less with the coating agent are base materials with a fabric weight of 40 g / m ⁇ 2 >
- the pollen adhesion prevention rate was high. From this result, it was found that a higher pollen adhesion prevention rate can be obtained by setting the basis weight of the base material used for the mask sheet to 35 g / m 2 or less.
Abstract
Description
1.シリコン系化合物およびカチオン系帯電防止剤を含むコーティング剤で被覆した基材を含むマスク用シート。
2.基材が不織布である前項1に記載のマスク用シート。
3.シリコン系化合物がポリメチルクロロシロキサンおよび二酸化ケイ素の少なくともいずれか1種である前項1または2に記載のマスク用シート。
4.カチオン系帯電防止剤がオクタデシルアミン酢酸塩である前項1~3のいずれか1項に記載のマスク用シート。
5.不織布の目付が40g/m2以下である前項2~4のいずれか1項に記載のマスク用シート。
6.鼻および口を含む顔面の対象部を覆う本体部と、該本体部の左右側部に設けられた耳に係止するための耳掛け部とを備える花粉付着防止マスクであって、該本体部の最外層が前項1~5のいずれか1項に記載のマスク用シートにより形成されていることを特徴とする花粉付着防止マスク。
7.本体部が、三層以上の層構造を有し、最外層および最内層の間に積層される中間層の一つが超微細繊維フィルターにより形成されていることを特徴とする前項6に記載の花粉付着防止マスク。 That is, the present invention is as follows.
1. A mask sheet comprising a substrate coated with a coating agent comprising a silicon compound and a cationic antistatic agent.
2. 2. The mask sheet according to item 1, wherein the substrate is a nonwoven fabric.
3. 3. The mask sheet according to item 1 or 2, wherein the silicon compound is at least one of polymethylchlorosiloxane and silicon dioxide.
4). 4. The mask sheet according to any one of items 1 to 3, wherein the cationic antistatic agent is octadecylamine acetate.
5. 5. The mask sheet according to any one of items 2 to 4, wherein the nonwoven fabric has a basis weight of 40 g / m 2 or less.
6). A pollen adhesion prevention mask comprising: a main body portion covering a target portion of a face including a nose and a mouth; and ear hook portions for engaging with ears provided on left and right side portions of the main body portion, A pollen adhesion preventive mask, wherein the outermost layer is formed of the mask sheet according to any one of the preceding items 1 to 5.
7). The pollen according to item 6 above, wherein the main body has a layer structure of three or more layers, and one of the intermediate layers laminated between the outermost layer and the innermost layer is formed by an ultrafine fiber filter. Anti-adhesion mask.
基材1(6035A、三重テック株式会社製)、基材2(6040A、三重テック株式会社製)、基材3(AC5020、旭化成せんい株式会社製)および基材4(N05020、旭化成せんい株式会社製)を、シリコン系化合物およびカチオン系帯電防止剤を含むコーティング剤で被覆し、マスク用シートを調製した。 (1) Preparation of mask sheet Base material 1 (6035A, manufactured by Mie Tech Co., Ltd.), base material 2 (6040A, manufactured by Mie Tech Co., Ltd.), base material 3 (AC5020, manufactured by Asahi Kasei Fibers Co., Ltd.) and base material 4 (N05020, manufactured by Asahi Kasei Fibers Co., Ltd.) was coated with a coating agent containing a silicon compound and a cationic antistatic agent to prepare a mask sheet.
上記(1)で調製したマスク用シートを最外層とし、最内層としてポリプロピレン不織布を、中間層として超微細繊維フィルター(ポリプロピレンのメルトブロー不織布)を積層し、通常の方法でプリーツ加工型のマスク1~4を作製した。 (2) Fabrication of mask The mask sheet prepared in (1) above is used as the outermost layer, a polypropylene nonwoven fabric is laminated as the innermost layer, and an ultrafine fiber filter (polypropylene meltblown nonwoven fabric) is laminated as an intermediate layer, and pleats are formed in the usual manner. Processed masks 1 to 4 were prepared.
擬似花粉(石松子:ヒカゲノカズラの胞子)1.0gを含む4.5Lポリ袋中に、上記(2)で作製したマスク1~4および市販マスク(商品名:クリーンラインコーワ三次元マスク、興和株式会社製)を、最外層側を山折りにして投入し100回(1回/秒)振った。その後、各マスクをポリ袋から取り出し、軽く数回振った後、マスクの最外層に付着した擬似花粉の数を、実体顕微鏡(「M3Z」、ライカ(株)製)を用い、肉眼にて計測した。計測する面積は、5mm×5mmとし、各マスクについて5箇所で計測した花粉付着数の合計値を比較した。また、花粉付着防止率を次式により求めた。結果を表1に示す。 (3) Pollen adhesion prevention performance confirmation test Masks 1 to 4 prepared in (2) above and a commercially available mask (trade name: Trade name :) in a 4.5-L plastic bag containing 1.0 g of pseudo-pollen (Ishimatsuko: spore of lycaensis) A clean line Kowa 3D mask (manufactured by Kowa Co., Ltd.) was placed with the outermost layer side folded, and shaken 100 times (once / second). Then, each mask is taken out from the plastic bag, lightly shaken several times, and then the number of pseudo pollen adhering to the outermost layer of the mask is measured with the naked eye using a stereomicroscope (“M3Z”, manufactured by Leica Corporation). did. The area to be measured was 5 mm × 5 mm, and the total number of pollen adhesions measured at five locations for each mask was compared. Moreover, pollen adhesion prevention rate was calculated | required by following Formula. The results are shown in Table 1.
10,31 本体部
15,32 耳掛け部 12, 30
Claims (7)
- シリコン系化合物およびカチオン系帯電防止剤を含むコーティング剤で被覆した基材を含むマスク用シート。 A mask sheet comprising a substrate coated with a coating agent containing a silicon compound and a cationic antistatic agent.
- 基材が不織布である請求項1に記載のマスク用シート。 2. The mask sheet according to claim 1, wherein the substrate is a nonwoven fabric.
- シリコン系化合物がポリメチルクロロシロキサンおよび二酸化ケイ素の少なくともいずれか1種である請求項1または2に記載のマスク用シート。 3. The mask sheet according to claim 1, wherein the silicon compound is at least one of polymethylchlorosiloxane and silicon dioxide.
- カチオン系帯電防止剤がオクタデシルアミン酢酸塩である請求項1~3のいずれか1項に記載のマスク用シート。 The mask sheet according to any one of claims 1 to 3, wherein the cationic antistatic agent is octadecylamine acetate.
- 不織布の目付が40g/m2以下である請求項2~4のいずれか1項に記載のマスク用シート。 The mask sheet according to any one of claims 2 to 4, wherein the basis weight of the nonwoven fabric is 40 g / m 2 or less.
- 鼻および口を含む顔面の対象部を覆う本体部と、該本体部の左右側部に設けられた耳に係止するための耳掛け部とを備える花粉付着防止マスクであって、該本体部の最外層が請求項1~5のいずれか1項に記載のマスク用シートにより形成されていることを特徴とする花粉付着防止マスク。 A pollen adhesion prevention mask comprising: a main body portion covering a target portion of a face including a nose and a mouth; and ear hook portions for engaging with ears provided on left and right side portions of the main body portion, A pollen adhesion-preventing mask, wherein the outermost layer is formed of the mask sheet according to any one of claims 1 to 5.
- 本体部が、三層以上の層構造を有し、最外層および最内層の間に積層される中間層の一つが超微細繊維フィルターにより形成されていることを特徴とする請求項6に記載の花粉付着防止マスク。 The main body has a layer structure of three or more layers, and one of the intermediate layers laminated between the outermost layer and the innermost layer is formed by an ultrafine fiber filter. Pollen adhesion prevention mask.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020127029414A KR20130096153A (en) | 2010-05-11 | 2011-05-11 | Sheet for mask |
CN201180023630.5A CN102939132B (en) | 2010-05-11 | 2011-05-11 | Sheet for mask |
SG2012080735A SG185388A1 (en) | 2010-05-11 | 2011-05-11 | Sheet for mask |
EA201291218A EA201291218A1 (en) | 2010-05-11 | 2011-05-11 | BLUE FOR MASK |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2010108992A JP2011234910A (en) | 2010-05-11 | 2010-05-11 | Sheet for mask |
JP2010-108992 | 2010-05-11 |
Publications (1)
Publication Number | Publication Date |
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WO2011142377A1 true WO2011142377A1 (en) | 2011-11-17 |
Family
ID=44914429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2011/060826 WO2011142377A1 (en) | 2010-05-11 | 2011-05-11 | Sheet for mask |
Country Status (7)
Country | Link |
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JP (1) | JP2011234910A (en) |
KR (1) | KR20130096153A (en) |
CN (1) | CN102939132B (en) |
EA (1) | EA201291218A1 (en) |
SG (1) | SG185388A1 (en) |
TW (1) | TW201143850A (en) |
WO (1) | WO2011142377A1 (en) |
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CN103522611A (en) * | 2013-09-29 | 2014-01-22 | 吴江市凌通纺织整理有限公司 | Multifunctional dustproof fabric |
EP3804550A1 (en) * | 2016-08-26 | 2021-04-14 | Livinguard AG | Wash-durable face mask with antimicrobial properties and/or improved washability |
JP6608472B2 (en) * | 2018-02-19 | 2019-11-20 | アイリスオーヤマ株式会社 | mask |
KR102253686B1 (en) * | 2020-06-10 | 2021-05-18 | (주)그레이스벨 | Mask asembly held by hand and method for comprising the same |
KR20220073089A (en) * | 2020-11-26 | 2022-06-03 | 대영엔지니어링 주식회사 | Mask having improved shut-off function for harmful component |
Citations (6)
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2010
- 2010-05-11 JP JP2010108992A patent/JP2011234910A/en active Pending
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2011
- 2011-05-11 WO PCT/JP2011/060826 patent/WO2011142377A1/en active Application Filing
- 2011-05-11 TW TW100116573A patent/TW201143850A/en unknown
- 2011-05-11 KR KR1020127029414A patent/KR20130096153A/en active IP Right Grant
- 2011-05-11 CN CN201180023630.5A patent/CN102939132B/en active Active
- 2011-05-11 EA EA201291218A patent/EA201291218A1/en unknown
- 2011-05-11 SG SG2012080735A patent/SG185388A1/en unknown
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JPH0385181A (en) * | 1989-08-29 | 1991-04-10 | Ain:Kk | Health promoting mask body having deodorizing property, antibacterial and sterilizing property, far-infrared radioactivity, acid proofing and anticorrosive property and antistatic property |
JPH03129053A (en) * | 1989-10-14 | 1991-06-03 | Matsushita Electric Works Ltd | Accommodation type chain trough |
JPH10225526A (en) * | 1997-02-14 | 1998-08-25 | Nohmi Bosai Ltd | Dust protective mask |
WO2006038493A1 (en) * | 2004-10-06 | 2006-04-13 | Daikin Industries, Ltd. | Fluorine-containing water- and oil-repellent composition |
JP2007197850A (en) * | 2006-01-25 | 2007-08-09 | Kao Corp | Pollen adhesion-preventing agent |
KR20090049546A (en) * | 2007-11-13 | 2009-05-18 | 코와 가부시키가이샤 | Women's mask |
CN101433382A (en) * | 2007-11-13 | 2009-05-20 | 興和株式会社 | Gauze mask for lady |
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CN112921708A (en) * | 2019-12-05 | 2021-06-08 | 广州华创化工材料科技开发有限公司 | High-efficiency low-resistance surface filtering material and preparation method thereof |
Also Published As
Publication number | Publication date |
---|---|
EA201291218A1 (en) | 2013-04-30 |
CN102939132A (en) | 2013-02-20 |
JP2011234910A (en) | 2011-11-24 |
SG185388A1 (en) | 2012-12-28 |
CN102939132B (en) | 2016-01-20 |
KR20130096153A (en) | 2013-08-29 |
TW201143850A (en) | 2011-12-16 |
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