WO2011125982A1 - Liquid-crystal panel manufacturing method, liquid-crystal panel, and repair device - Google Patents

Liquid-crystal panel manufacturing method, liquid-crystal panel, and repair device Download PDF

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Publication number
WO2011125982A1
WO2011125982A1 PCT/JP2011/058545 JP2011058545W WO2011125982A1 WO 2011125982 A1 WO2011125982 A1 WO 2011125982A1 JP 2011058545 W JP2011058545 W JP 2011058545W WO 2011125982 A1 WO2011125982 A1 WO 2011125982A1
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WIPO (PCT)
Prior art keywords
solvent
repair
alignment film
ink
solid content
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PCT/JP2011/058545
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French (fr)
Japanese (ja)
Inventor
佐藤 仁
公孝 大畑
隆章 岡本
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シャープ株式会社
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Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP2012509654A priority Critical patent/JP5718902B2/en
Priority to CN201180012524.7A priority patent/CN102792215B/en
Publication of WO2011125982A1 publication Critical patent/WO2011125982A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306Details
    • G02F1/1309Repairing; Testing

Definitions

  • the present invention relates to a method for manufacturing a liquid crystal panel, a liquid crystal panel, and a repair device. In particular, it relates to a technique for repairing alignment films of liquid crystal panels. Note that this application claims priority based on Japanese Patent Application No. 2010-88340 filed on Apr. 7, 2010, the entire contents of which are incorporated herein by reference. .
  • a liquid crystal panel which is a component of a liquid crystal display device, has a structure in which a pair of substrates are opposed to each other with a predetermined gap secured. A liquid crystal layer containing liquid crystal molecules is sealed in the gap between the substrates. In addition, an alignment film for regulating the alignment state of the liquid crystal molecules is formed on the surfaces of both substrates in contact with the liquid crystal layer (for example, Patent Document 1).
  • a stamp method is proposed in which the alignment film repair agent is transferred to the pinhole.
  • the pinhole is repaired by pressing the transfer head with the alignment film repairing agent against the pinhole, so that the repair can be easily performed and the thickness of the repaired part can be controlled. Can be easily performed.
  • the alignment film there is an inkjet method in addition to the spin coating method and the spray method.
  • the coating liquid may not be ejected from the nozzles of the inkjet head, and in that case, a relatively wide pinhole (defect due to defective nozzle ejection) may occur. . And such pinholes need repair, and further improvement of pinhole repair technology is required.
  • the present invention has been made in view of such a point, and a main object thereof is to provide a method of manufacturing a liquid crystal panel that can repair defects in an alignment film more easily.
  • the method for producing a liquid crystal panel according to the present invention includes a step of forming an alignment film on the surface of the substrate by discharging a coating liquid by an ink jet method, and a step of repairing a defective portion of the alignment film by applying a repair ink.
  • the coating solution in the step of forming the alignment film includes a solid content made of a material constituting the alignment film, a strong solvent that dissolves the solid content, and a dissolution in the solid content rather than the strong solvent.
  • the repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and the repair ink is adjusted in the coating liquid.
  • the solvent ratio strong solvent / adjusting solvent
  • the solvent ratio strong solvent / adjusting solvent is lower than the solvent ratio of the strong solvent to the working solvent (strong solvent / adjusting solvent).
  • the solid concentration of the repair ink is 1/10 or less of the solid concentration of the coating liquid.
  • the solvent ratio of the strong solvent to the adjusting solvent in the coating solution (strong solvent / adjusting solvent) is 50/50.
  • a liquid crystal panel according to the present invention includes a pair of substrates facing each other and a liquid crystal layer disposed between the pair of substrates, and an alignment film is formed on a surface of the substrate in contact with the liquid crystal layer.
  • a repair layer is formed in the defect portion of the alignment film, and the alignment film is formed by ejecting a coating liquid by an ink jet method, and the repair layer applies a repair ink.
  • the coating solution is a solid content made of a material constituting the alignment film, a strong solvent that dissolves the solid content, and an adjustment solvent that is less soluble in the solid content than the strong solvent.
  • the repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and the repair ink is a strong solvent for the adjustment solvent in the coating liquid. Solvent ratio Than strong solvent / adjustment solvent) having a low solvent percentage (strong solvent / adjustment solvent).
  • a repair device is a device for repairing a defective portion of an alignment film, and includes a repair stamp, a moving device that moves the repair stamp, and a control device that controls the moving device, and the control device includes: Moving the repair stamp to an ink supply unit that supplies repair ink, and disposing the repair stamp in a region including the defect portion of the alignment film.
  • the alignment film is formed by discharging a coating liquid by an ink jet method, and the coating liquid includes a solid content made of a material constituting the alignment film, and a strength that dissolves the solid content.
  • a solvent and a solvent for adjustment that is less soluble in the solid content than the strong solvent, and the repair ink is more than the concentration of the solid content contained in the coating liquid.
  • the restoration ink has a lower solvent ratio (strong solvent / adjusting solvent) than the solvent ratio of the strong solvent to the adjusting solvent (strong solvent / adjusting solvent) in the coating liquid.
  • a lower solvent ratio strong solvent / adjusting solvent
  • an inspection apparatus for inspecting a defective portion of the alignment film is further provided.
  • the defective portion of the alignment film can be repaired by applying the repair ink.
  • the coating liquid contains a solid content made of the material constituting the alignment film, a strong solvent that dissolves the solid content, and an adjustment solvent.
  • the repair ink has a concentration higher than the solid content concentration of the coating liquid. It has a low solid content concentration, and the solvent ratio (strong solvent / adjusting solvent) of the repair ink is lower than the solvent ratio (strong solvent / adjusting solvent) of the coating liquid. Accordingly, it is possible to reduce the amount of the repair ink that dissolves the alignment film.
  • FIG. 3 is an enlarged plan view of a part of the upper surface of the array substrate 12.
  • FIG. 2 is an enlarged cross-sectional view of a part of the liquid crystal panel 10.
  • FIG. 4 is a plan view of a part of the upper surface of the array substrate 12.
  • FIG. (A) to (c) are process cross-sectional views for explaining the process of forming the repair layer 35.
  • A) is a figure which shows the mode of the board
  • (b) is an enlarged view of the periphery of the repair area
  • FIG. 1 is a plan view showing a configuration of an inkjet type coating apparatus 200.
  • FIG. 1 is a plan view showing a configuration of an inkjet type coating apparatus 200.
  • FIG. It is a figure which shows the structure of the coating device 200 of an inkjet system. It is a figure which shows typically the structure of the repair apparatus 300 which concerns on embodiment of this invention. It is a block diagram which shows the structure of the repair apparatus 300 which concerns on embodiment of this invention. It is a top view of a part of upper surface of the array substrate 12 including a plurality of repair regions.
  • a liquid crystal display device 100 including a liquid crystal panel 10 obtained by a manufacturing method according to an embodiment of the present invention will be described with reference to FIGS. 1 to 3.
  • FIG. 1 schematically shows a cross-sectional configuration of a liquid crystal display device 100 including a liquid crystal panel 10 of the present embodiment.
  • a liquid crystal display device 100 shown in FIG. 1 includes a liquid crystal panel 10 and a backlight 20 that is an external light source disposed on the back side (lower side in FIG. 1) of the liquid crystal panel.
  • the liquid crystal panel 10 and the backlight 20 are assembled and held by a bezel 29 covered from the front side of the liquid crystal panel 10.
  • the backlight 20 includes a plurality of linear light sources (for example, cold cathode tubes) 22 and a case 24 that houses the light sources 22.
  • the case 24 has a box shape opened toward the front side (the liquid crystal panel 10 side), and the linear light sources 22 are arranged in parallel in the case 24.
  • the backlight 20 is not limited to a linear light source, but may have another configuration (for example, an LED light source).
  • the optical sheet 26 includes, for example, a diffusion plate, a diffusion sheet, a lens sheet, and a brightness enhancement sheet in order from the back side. Further, in order to hold the optical sheet 26 between the case 24 and the case 24, a substantially frame-like frame 28 is provided on the case 24.
  • the liquid crystal panel 10 generally has a rectangular shape as a whole, and is composed of a pair of translucent substrates (glass substrates) 11 and 12. Both substrates 11 and 12 are cut from a large base material called mother glass in the manufacturing process.
  • Both the substrates 11 and 12 are arranged to face each other, and a liquid crystal layer 13 is provided between them.
  • the liquid crystal layer 13 is made of a liquid crystal material whose optical characteristics change with application of an electric field between the substrates 11 and 12.
  • a sealing material 15 is provided on the outer edge portions of the substrates 11 and 12 to seal the liquid crystal layer 13.
  • a gap between the substrate 11 and the substrate 12 is secured by a spacer (not shown) and the sealing material 15.
  • the spacers are made of, for example, an elastically deformable resin and have a granular shape (spherical shape). A large number of spacers are dispersed at predetermined positions in the liquid crystal layer 13.
  • polarizing plates 17 and 18 are attached to the outer surfaces of both substrates, respectively.
  • the spacer is not limited to a granular structure, and may be a columnar spacer.
  • the front side of both the substrates 11 and 12 is the color filter substrate (CF substrate) 11, while the back side is the array substrate 12.
  • FIG. 2 shows an enlarged part of the upper surface of the array substrate 12.
  • FIG. 3 shows an enlarged part of the cross section of both the substrates 11 and 12.
  • a switching element (for example, TFT) 44 and a pixel electrode 46 are provided on the upper surface of the array substrate 12 (the liquid crystal layer 13 side and the opposite surface side of the CF substrate 11).
  • a grid-like source wiring 41 and gate wiring 42 are provided so as to surround them.
  • the source wiring 41 and the gate wiring 42 are connected to the source electrode and the gate electrode of the switching element 44, respectively.
  • the pixel electrode 46 is made of, for example, ITO (indium tin oxide).
  • the pixel electrode 46 is formed in a rectangular shape, and in the example illustrated in FIG. 2, the pixel electrode 46 is formed in an elongated rectangular shape along the direction in which the source wiring 41 extends.
  • the gate wiring 42 is formed on the array substrate (specifically, the glass substrate) 12.
  • An insulating layer 31 is formed on the array substrate 12 so as to cover the gate wiring 42.
  • An insulating layer 32 is formed on the insulating layer 31, and a pixel electrode 46 is formed on the insulating layer 32.
  • the substrate 12 to the insulating layer 32 and the pixel electrode 46 may be referred to as the array substrate 12.
  • an alignment film 30 (30A) for aligning liquid crystal molecules in the liquid crystal layer 13 is formed on the surface in contact with the liquid crystal layer 13 in the pixel electrode 46 and the insulating layer 32 located outside thereof.
  • the alignment film 30 of the present embodiment is made of a material (so-called vertical alignment type material) that aligns liquid crystal molecules perpendicularly to the surface of the alignment film 30 in a state where no voltage is applied to the liquid crystal layer 13.
  • the alignment film 30 of this embodiment is made of polyimide.
  • the thickness of the alignment film 30 is, for example, about 100 nm to 200 nm.
  • the pixel electrode 46 and the insulating layer 32 are the base of the alignment film 30. However, in a liquid crystal panel employing another laminated structure, a layer different from the above may be the base.
  • the pixel electrode 46 (surface of the array substrate 12) of this embodiment is provided with slits 33 (grooves, openings, steps). Therefore, a step is generated on the surface of the alignment film 30 formed along the pixel electrode 46.
  • the slit 33 is formed in a groove shape having a predetermined width.
  • the pixel electrode 46 is formed at the center position in the longitudinal direction, in the vicinity of both end positions in the longitudinal direction, and at an intermediate position thereof.
  • the slit 33 at the intermediate position is V-shaped in plan view.
  • the slit 33 at the center position is disposed on the side edge of the pixel electrode 46 and has a triangular shape in plan view.
  • the slits 33 on both ends have a linear shape substantially parallel to the slit 33 on the center side.
  • the slits 33 are arranged at substantially equal intervals.
  • the alignment state can be regulated so that the liquid crystal molecules are inclined with respect to the vertical direction shown in FIG. 3 (the direction orthogonal to the surface direction of both the substrates 11 and 12) by the step of the alignment film 30 at each slit 33. Due to the step formed by the slits 33, the rubbing process for the alignment film 30 can be made unnecessary.
  • the depth of the slit 33 can be set to reach the insulating layer 32 as shown in FIG. 3, for example.
  • color filters 36 are provided side by side at positions corresponding to the respective pixel electrodes 46, as shown in FIG. ing.
  • the color filter 36 has a function of allowing transmission of light of a predetermined wavelength and absorbing light of other wavelengths.
  • three color filters of R (red), G (green), and B (blue) are set.
  • Each color filter 36 is arranged in the order of R, G, and B, for example.
  • a light blocking layer 37 (black matrix) for blocking light from the adjacent color filter 36 side is provided, thereby preventing color mixing.
  • the light shielding layer 37 is formed in a lattice shape so as to surround each color filter 36.
  • a counter electrode 48 made of, for example, ITO is formed on the inner surface of the color filter 36.
  • ribs 34 projections, protrusions, stepped portions
  • the rib 34 protrudes from the inner surface of the counter electrode 48 toward the facing array substrate 12 and is formed in an elongated shape having a predetermined width.
  • the ribs 34 are formed in a V shape in plan view, and are arranged side by side at substantially the middle positions of the adjacent slits 33 on the array substrate 12 side.
  • Each rib 34 is formed such that its axial direction is substantially parallel to the extending direction of each slit 33.
  • an alignment film 30 (30B) for aligning liquid crystal molecules in the liquid crystal layer 13 is formed on the inner surface side of the counter electrode 48 and the rib 34.
  • the alignment film 30 (30B) is formed on the surface of the counter electrode 48 and the rib 34 that is in contact with the liquid crystal layer 13. Therefore, a step is formed on the surface of the alignment film 30 (30B) by the ribs 34 protruding from the counter electrode 48.
  • the alignment state can be regulated by this step so that the liquid crystal molecules are inclined with respect to the vertical direction shown in FIG. 3 (the direction perpendicular to the surface direction of both the substrates 11 and 12). By this step, the rubbing process for the alignment film 30 can be made unnecessary.
  • a defect site 50 may occur in the alignment film 30 (30A, 30B) during the manufacturing process.
  • a repair layer 35 made of a repair ink is formed on the defect portion 50 of this embodiment, and the repair portion 35 repairs the defect portion 50 of the alignment film 30.
  • FIG. 4 is a plan view showing the array substrate 12 when a relatively large defect 50 is generated in the manufacturing process.
  • the repair layer 35 is formed in the defect portion 50, thereby completing the repair of the alignment film 30.
  • FIGS. 5A to 5C are process cross-sectional views for explaining the process of forming the repair layer 35.
  • a defect site 50 is found in the alignment film 30 by inspection.
  • a region (repair region) 55 including the defect site 50 discovered by the inspection is defined, and then the repair stamp in which the repair ink 61 is applied to the repair region 55.
  • (Repair stamp) 60 is brought closer. Specifically, the repair stamp 60 with the repair ink 61 attached to the lower surface is held by the jig 62, and the repair stamp 60 is moved to the repair area 55. Next, the repair ink 61 of the repair stamp 60 is brought into contact with the defect site 50 (arrow 65), and then the repair stamp 60 is moved (arrow 52) to apply the repair ink 61 to the defect site 50. When the application of the repair ink 61 is completed, the repair stamp 60 is moved from the repair area 55 (arrow 66).
  • the repair ink 61 applied to the repair region 55 is dried (see arrow 64) to form the repair layer 35.
  • the repair ink 61 is an ultraviolet curable resin
  • the repair layer 35 is cured by irradiating with ultraviolet rays.
  • the repair of the defect site 50 in the alignment film 30 is completed.
  • the defect site 50 of the alignment film 30 (30A) on the insulating layer 32 in the array substrate 12 is illustrated, but the same is performed for the alignment film 30 (30B) in the CF substrate 11.
  • FIG. 6 (a) is a diagram showing a state of the substrate (CF substrate) after repair by the repair ink examined by the inventors of the present application.
  • FIG. 6B is an enlarged view around the repair region 57.
  • the repair layer 35 is formed on the defect site 50 using the repair ink 61, whereby the defect site 50 is repaired.
  • a peripheral edge (projection) 35b that was raised from the central portion 35a was formed around the central portion 35a of the repair layer 35.
  • This peripheral portion (projection portion) 35b is a solid component (for example, polyimide component) of the material constituting the alignment film 30, and the peripheral portion 35b causes a ring-shaped spot (white spot) in the repair region 57.
  • This stain causes a decrease in the contrast ratio of the liquid crystal panel.
  • the stain due to the peripheral edge 35b may appear as a black stain depending on the state of light transmission.
  • such a peripheral edge 35b annular stain
  • certain polyimide materials for example, photo-alignment polyimide materials
  • a strong solvent for example, a highly soluble solvent such as N-merylpyrrolidone (NMP)
  • NMP N-merylpyrrolidone
  • the repair ink 61 is applied with the repair stamp 60 to the repair region 55 including the defect site 50 as shown in FIG. 7A.
  • the strong solvent contained in the repair ink 61 dissolves the alignment film 30
  • a portion 30s of the alignment film 30 in contact with the repair ink 61 is dissolved as shown in FIG. 7B.
  • the melted portion 30 s also becomes the repair layer 35 together with the material in the repair ink 61, so that the repair of the defective portion 50 is completed. Therefore, even if the strong solvent of the repair ink 61 dissolves the alignment film 30, there should be no problem in forming the repair layer 35.
  • a peripheral portion (protrusion portion) 35b as shown in FIGS. 6A and 6B may occur in the repaired portion of the alignment film 30 made of a specific polyimide material. . Then, when this inventor examined about the mechanism which the peripheral part 35b produces, it was inferred that it might become like FIG. 8 (a) to (c).
  • the repair ink 61 is applied to the repair region 55 including the defective portion 50 as shown in FIG.
  • the strong solvent of the repair ink 61 dissolves the alignment film 30
  • the alignment film 30 is dissolved due to the interfacial tension of the repair ink 61 or convection in the repair ink 61 as shown in FIG. 8B.
  • the portions gather around the periphery of the repair ink 61 to form the protrusion 35b.
  • a repair layer 35 is formed which includes a protrusion (peripheral part) 35b located at the periphery and a flat support part (center part) 35a located at the center.
  • the protrusion (peripheral edge) 35b can cause a decrease in contrast ratio.
  • the alignment film 30 when the alignment film 30 is formed, the alignment film 30 is formed on the surface of the substrate by discharging a coating liquid by an inkjet method.
  • the coating liquid has a solid content (for example, a solid content composed of polyimide) made of the material constituting the alignment film 30, a strong solvent (for example, NMP) that dissolves the solid content, and a solid content that is stronger than the strong solvent.
  • a solvent for adjustment or weak solvent having poor solubility.
  • the adjusting solvent is a solvent that adjusts ink characteristics (for example, viscosity), and examples thereof include carbitol acetate and propylene carbonate.
  • the repair ink 61 has a solid content concentration lower than the concentration of the solid content contained in the coating liquid, and the solvent component ratio (strong solvent / weak solvent) of the repair ink 61 is The solvent component ratio of the coating solution (strong solvent / weak solvent) is lower.
  • the weak solvent ratio can be, for example, 40 to 90% (volume%).
  • the solid content concentration (for example, 0.1 to 0.2%) of the repair ink 61 is preferably set to 1/10 or less of the solid content concentration (for example, 3 to 4%) of the coating liquid.
  • a suitable one may be adopted in a timely manner according to the manufacturing process conditions (materials, apparatus conditions, etc.) to be used.
  • the wrinkle repair ink 61 it is typically preferable in terms of management of the manufacturing process to use the same component as the coating liquid (for inkjet) or a diluted one thereof.
  • the solid content concentration of the repair ink 61 is not required to be the same as that of the coating liquid (for example, 3 to 4%), and is lower than that. Things are enough.
  • the restoration ink 61 is obtained by diluting the coating liquid, the solid content concentration of the restoration ink 61 is lowered, so that the strong solvent for dissolving the solid content can also be lowered.
  • the inventor of the present application makes the solvent component ratio (strong solvent / weak solvent) of the repair ink 61 lower than the solvent component ratio (strong solvent / weak solvent) of the coating solution, that is, the ratio of the strong solvent.
  • the solvent component ratio (strong solvent / weak solvent) of the coating solution that is, the ratio of the strong solvent.
  • the repairing ink 61 is applied to repair the defective portion 50 of the alignment film 30.
  • the coating liquid for inkjet
  • the repair ink 61 has a solid content concentration lower than the solid content concentration of the coating liquid, and the solvent ratio (strong solvent / weak solvent) of the repair ink 61 is the solvent ratio (strong solvent / weak solvent) of the coating liquid. Lower than.
  • FIGS. 9 to 11 are diagrams showing the configuration of an ink jet type coating apparatus 200 used in the manufacturing method of the present embodiment.
  • FIG. 12 is a diagram illustrating a configuration of the alignment film repairing apparatus 300 according to the present embodiment.
  • the coating apparatus 200 shown in FIG. 9 is an apparatus (inkjet film forming apparatus) that applies a coating liquid to the substrate 70 by an inkjet method.
  • the coating apparatus 200 of this embodiment includes a head unit 72 including a nozzle (not shown) that discharges a coating solution (solution) to the substrate 70 and a stage 74 that holds the substrate 70.
  • a plurality of inkjet heads are housed and arranged in the head cover 72 in the head cover.
  • a plurality of nozzles are formed in one inkjet head.
  • a surface (discharge surface) from which the solution is discharged from the nozzle is disposed to face the surface of the substrate 70.
  • the alignment film (30) is formed on the surface of the substrate 70 by discharging the coating liquid from the head portion 72.
  • the coating apparatus 200 of the present embodiment is provided with a moving device 76 that relatively moves the head portion 72 and the stage 74 (see arrows 71a and 71b).
  • the head unit 72 is fixed and the stage 74 is movable.
  • the stage 74 can be fixed and the head unit 72 can be movable.
  • a pipe (not shown) for supplying an inkjet coating solution is connected to the head portion 72, there is a technical advantage in that the head portion 72 has a fixed configuration.
  • the substrate 70 before coating is placed on the stage 74 from a transport device (not shown) that transports the substrate 70 from the previous process, and the substrate 70 after coating is moved to the subsequent process.
  • a transport device not shown
  • a control device 78 that controls the movement of the moving device 76 is connected to the moving device 76 of the present embodiment.
  • the control device 78 is, for example, a personal computer (PC), for example, a storage device (for example, a hard disk, a semiconductor memory, an optical disk, etc.) in which a program (stage control program) that can control the movement of the moving device 76 is stored, a center An arithmetic circuit (CPU) and input / output devices (display, keyboard, mouse, etc.) are included.
  • the stage 74 holding the substrate 70 can be moved in the XY direction under the control of the control device 78.
  • the control device 78 of this embodiment can also control the discharge of the solution from the head unit 72.
  • the height of the head unit 72 (control in the Z direction) can also be performed.
  • the substrate 70 of the present embodiment is, for example, a glass substrate, and the substrate 70 of the present embodiment is a glass substrate for a liquid crystal panel.
  • the substrate 70 is a mother glass before being cut out to the dimensions of the liquid crystal panel.
  • the size of the mother glass as the substrate 70 is 1 meter or more on one side. Specifically, when the substrate 70 is a 10th generation mother glass, the size is 2880 mm (W) ⁇ 3130 mm (L).
  • the substrate 70 is not limited to the mother glass before being cut out to the dimensions of the liquid crystal panel, but may be glass having the size of the liquid crystal panel after being cut out.
  • the substrate 70 may be an array substrate on which a thin film transistor (TFT) is manufactured (or a product in the middle of manufacturing), or a CF substrate on which a color filter (CF) is formed (or a device in the middle of manufacturing thereof). It may be.
  • the substrate 70 may be a resin substrate in addition to a glass substrate.
  • the head portion 72 of the present embodiment has a length that crosses the substrate 70 placed on the stage 74.
  • the longitudinal direction of the head portion 72 extends in the Y direction.
  • the longitudinal length of the head portion 72 is about 3 meters or more.
  • the coating apparatus 200 of the present embodiment forms an alignment film (30) by moving over the substrate 70 while discharging a coating liquid from a nozzle (not shown) of the head portion 72.
  • the coating solution here is, for example, a polyimide solution or a solution containing polyamic acid or a derivative thereof.
  • the coating liquid contains a solid content made of a material constituting the alignment film, a strong solvent (for example, NMP) that dissolves the solid content, and an adjustment solvent.
  • the substrate 70 is moved along the direction in which the long side (L) or the short side (W) of the rectangular substrate 70 extends.
  • the substrate 70 is also possible to move the substrate 70 with the substrate 70 inclined (arrows 71a and 71b).
  • the solution (coating liquid) from the head portion 72 exhibits a predetermined wet spread, so that a specific part of the substrate 70 is obtained. This is because there is a case where it is possible to alleviate the phenomenon that it is difficult to get wet.
  • FIG. 11 shows an example of the configuration of the coating apparatus 200 of the present embodiment.
  • an ink jet head 73 and a nozzle 73a located on the bottom surface of the head portion 72 are shown.
  • the inkjet heads 73 are not arranged in a line but are arranged so as to be diagonally arranged, but not limited thereto, other arrangements may be adopted. .
  • each ink jet head 73 is formed with a plurality of nozzles 73a from which the coating liquid is discharged. For example, several hundreds of nozzles 73 a are formed in one inkjet head 73.
  • sequence of the nozzle 73a shown in FIG. 11 is staggered, you may arrange the nozzle 73a in a line.
  • the arrangement of the nozzles 73a is not limited to a two-stage zigzag shape, but may be another arrangement (for example, a three-stage diagonal arrangement).
  • the inkjet head 73 of the head unit 72 is connected to a coating liquid supply unit (for example, a polyimide supply tank) 80 and a waste liquid unit (for example, a waste liquid tank) 82.
  • a coating liquid supply unit for example, a polyimide supply tank
  • a waste liquid unit for example, a waste liquid tank
  • each inkjet head 73 is connected to a supply pipe 85 via a branch pipe 87 and to a waste liquid pipe 86 via a branch pipe 89.
  • the supply pipe 85 is connected to the coating liquid supply part 80, while the waste liquid pipe 86 is connected to the waste liquid part 82.
  • the coating liquid in the coating liquid supply unit 80 advances through the supply pipe 85 as indicated by an arrow 81 and is supplied to the inkjet head 73 through the branch pipe 87.
  • the waste liquid in the ink jet head 73 passes through the branch pipe 89, travels through the waste liquid pipe 86 as indicated by an arrow 83, and moves to the waste liquid section 82.
  • the valve 88 88a, 88b
  • a defect site (50) may be generated in the alignment film 30 in some cases. For example, if one of the large number of nozzles 73a does not discharge the coating liquid, that part may become a defective part (50).
  • An example of an apparatus for repairing the defect site (50) is shown in FIG.
  • FIG. 12 schematically shows the configuration of the repair device 300 of the present embodiment.
  • the repair device 300 of the present embodiment is a device that repairs the defect site 50 of the alignment film 30.
  • the repair device 300 can execute a repair process using the repair ink 61 described above.
  • FIG. 13 is a block diagram illustrating a configuration of the repair device 300.
  • the illustrated repair device 300 includes a repair stamp 60 to which the repair ink 61 of the present embodiment is applied, a moving device 120 that moves the repair stamp 60, and a control device 110 that controls the moving device 120.
  • the moving device 120 and the control device 110 are omitted.
  • a stage 90 for holding a substrate (for example, an array substrate or a CF substrate) 70 having a repair region 55 is provided together with a supply box 98 for supplying the repair ink 61 of the present embodiment.
  • a glass substrate on which the alignment film 30 is formed is disposed on the stage 90 as the substrate 70.
  • the alignment film 30 of this embodiment is formed by the ink jet method.
  • the substrate 70 may be mother glass before being cut out to the dimensions of the liquid crystal panel, or may be glass having the size of the liquid crystal panel after being cut out.
  • the supply box 98 includes a cleaning unit 98 a that cleans the repair stamp 60 and an ink supply unit 98 b that supplies the repair ink 61.
  • the repair ink 61 has a solid content concentration lower than the solid content concentration of the coating liquid, and the solvent ratio (strong solvent / weak solvent) of the repair ink 61 is set to the solvent ratio (strong solvent) of the coating liquid. (Solvent / weak solvent).
  • a waste liquid receiving part 98c is provided below the cleaning part 98a and the ink supply part 98b. The waste liquid receiver 98c is connected to the waste liquid recovery tank 99.
  • the repair stamp 60 is connected to a stamp jig 62.
  • the stamp jig 62 is connected to the moving device 120, and the stamp 60 moves through the moving device 120 under the control of the control device 110 to execute a predetermined coating operation.
  • the stage 90 that holds the substrate 12 can also be controlled by the control device 110, and in addition, both the stage 90 and the stamp 60 can be moved together by the control device 110. Specifically, when the stamp 60 is moved, it is possible to fix the stamp 60 and perform an interlocking operation to move the stage 90 instead.
  • a storage device 112, an input device 114, and an output device 116 are connected to the control device 110 of the present embodiment.
  • the control device 110 is composed of, for example, a CPU (Central Processing Unit).
  • the storage device 112 is a hard disk, a semiconductor memory, an optical disk (CD, DVD, etc.), a magneto-optical disk (MO), or the like.
  • the input device 114 is, for example, a keyboard, a mouse, a touch panel, and the output device 116 is a display device (liquid crystal display, CRT, organic EL display, etc.) or a printing device (laser printer, etc.).
  • the control device 110, the storage device 112, the input device 114, and the output device 116 can be constructed by a personal computer (PC).
  • PC personal computer
  • An alignment film repair program 113 is stored in the storage device 112 connected to the control device 110.
  • the alignment film repair program 113 is a program that controls the operation of the repair device 300, and includes a program that controls the movement of the repair stamp 60.
  • the alignment film repair program 113 according to this embodiment includes a process including a step of moving the repair stamp 60 to the ink supply unit 98 b that supplies the repair ink 61 and a step of placing the repair stamp 60 in the repair region 55. This is a program to be executed. More specifically, the alignment film repair program 113 of the present embodiment is a program for executing operations indicated by arrows 91 to 97 (described later) and an arrow 52 in FIG.
  • the repair device 300 of the present embodiment includes an inspection device 130 that inspects the defect site 50 of the alignment film 30.
  • the inspection device 130 is connected to the control device 110, and data on the defect site 50 detected by the inspection device 130 is output to the control device 110 and the storage device 112.
  • the inspection device 130 includes an image sensor (for example, a CCD or a CMOS image sensor).
  • the inspection device 130 also includes software for detecting the defect site 50 from the image data obtained by the image sensor, but this software can also be stored in the storage device 112. Further, the process of defining the repair region 55 from the data of the defect site 50 can be performed by the control device 110 or can be performed by the inspection device 130.
  • the specific configuration of the inspection device 130 is not particularly limited as long as it has a function of detecting the defect site 50 of the alignment film 30, and a suitable one may be adopted as appropriate. it can.
  • each element which comprises the repair apparatus 300 of this embodiment is not restricted to an electrical connection, For example, a wireless connection, an optical connection, etc. are employable.
  • the control device 110 and the storage device 112 can be integrated, and the input device 114 and the output device 116 can be integrated (for example, a touch panel display).
  • a part of the connection can be made via the Internet.
  • the connection between the control device 110 and the storage device 112 is made via the Internet. It is also possible to use a hard disk or the like in a server at a location remote from 110.
  • the following operation may be performed.
  • the movement of the repair stamp 60 is executed by the moving device 120 controlled by the control device 110.
  • the moving device 120 of the present embodiment can move the repair stamp 60 in any of the X direction, the Y direction, and the Z direction.
  • the repair stamp 60 is first cleaned by bringing the bottom surface of the repair stamp 60 into contact with the cleaning section 98a (see arrow 91).
  • the cleaning unit 98a contains a cleaning solvent (for example, N-methylpyrrolidone). Thereafter, the cleaned repair stamp 60 is moved (see arrow 92), and then the bottom surface of the repair stamp 60 is brought into contact with the ink supply unit 98b (see arrow 93). Then, the repair ink 61 adheres to the repair stamp 60.
  • a cleaning solvent for example, N-methylpyrrolidone
  • the repair stamp 60 with the repair ink 61 attached is moved and placed above the stage 90 (see arrow 94).
  • the repair stamp 60 then moves to the repair region 55 of the substrate 12 (arrow 95) where a repair process is performed (arrow 52) to form the repair layer 35.
  • An example of a more detailed repair process is as described with reference to FIGS.
  • the repair stamp 60 that has run out of the repair ink 61 moves (see arrow 96) and returns to the ink supply unit 98b (see arrow 97) for the next repair process.
  • the repairing ink 61 is replenished by the ink supply unit 98b (see arrow 93), and thereafter the same processing may be performed again.
  • FIGS. 2 and 3 the structure in which the slit 33 and the rib 34 are formed is shown.
  • a slit 33 and the rib 34 are formed. It is also applicable to structures that are not.
  • the alignment film 30 of the present embodiment it is possible to use a photo-alignment film whose alignment direction is defined by light irradiation.
  • a method of defining the pretilt direction of the liquid crystal molecules using a photo-alignment method can also be used.
  • the photo-alignment method sets the pretilt angle by irradiating the photo-alignment film with polarized light.
  • the photo-alignment method is a non-contact process because a light irradiation step that defines the alignment direction by light irradiation is performed. Therefore, there is an advantage that static electricity is not generated.
  • the non-defective array substrate 12 and the non-defective CF substrate 11 are opposed to each other, and the liquid crystal layer 13 is formed between the CF substrate 11 and the array substrate 12.
  • the liquid crystal layer 13 can be formed using, for example, a dropping injection method.
  • the technology according to the embodiment of the present invention is not limited to the liquid crystal panel in which the liquid crystal molecules constituting the liquid crystal layer 13 are vertically aligned, but can also be applied to the repair of the alignment film 30 of liquid crystal panels other than the vertical alignment type.
  • the configuration of the backlight 20 of the liquid crystal display device 100 is not limited to the direct type shown in FIG. 1, but may be another configuration (for example, an edge light method).

Abstract

Disclosed is a liquid-crystal panel manufacturing method in which defective regions of an alignment film can be repaired more easily. Said method includes: a step in which an alignment film is formed on the surface of a substrate via inkjet-style discharge of a liquid coating; and a step in which a repair ink is applied in order to repair defective regions of the alignment film. The liquid coating contains: solids comprising a material that forms the alignment film; a strong solvent; and an adjustment solvent. The repair ink has a lower concentration of solids than the liquid coating, and the ratio of the strong solvent to the adjustment solvent is lower in the repair ink than in the liquid coating.

Description

液晶パネルの製造方法、液晶パネルおよび修復装置Liquid crystal panel manufacturing method, liquid crystal panel and repair device
 本発明は、液晶パネルの製造方法、液晶パネルおよび修復装置に関する。特に、液晶パネルの配向膜の修復技術に関する。
 なお、本出願は2010年4月7日に出願された日本国特許出願2010-88340号に基づく優先権を主張しており、その出願の全内容は本明細書中に参照として組み入れられている。
The present invention relates to a method for manufacturing a liquid crystal panel, a liquid crystal panel, and a repair device. In particular, it relates to a technique for repairing alignment films of liquid crystal panels.
Note that this application claims priority based on Japanese Patent Application No. 2010-88340 filed on Apr. 7, 2010, the entire contents of which are incorporated herein by reference. .
 液晶表示装置の構成部品である液晶パネルは、一対の基板を所定のギャップを確保した状態で対向させた構造を有している。この基板間のギャップには、液晶分子を含む液晶層が封入されている。また、両基板の液晶層に接する面には、液晶分子の配向状態を規制するための配向膜が形成されている(例えば、特許文献1など)。 A liquid crystal panel, which is a component of a liquid crystal display device, has a structure in which a pair of substrates are opposed to each other with a predetermined gap secured. A liquid crystal layer containing liquid crystal molecules is sealed in the gap between the substrates. In addition, an alignment film for regulating the alignment state of the liquid crystal molecules is formed on the surfaces of both substrates in contact with the liquid crystal layer (for example, Patent Document 1).
 この配向膜には、以下のような事情によって局所的なピンホールが生じる可能性がある。
 (1)配向膜の成膜工程で混入した異物が付着し、その異物を除去することに伴って配向膜が局所的に切り欠かれてピンホールが生じる。
 (2)配向膜の下地(画素電極または対向電極など)に対する貼着性が局所的に悪く、その部分で成膜時に配向膜材料がはじかれて、ピンホールが生じる。
 (3)配向膜材料として、液晶分子を垂直配向させるものを用いた場合、配向膜の下地に対する貼着性が悪くなる傾向にあり、上記(2)と相まってピンホールが生じやすくなる。
 (4)配向膜の下地に凹部または凸部を形成し、配向膜の表面に段差をつけることで、液晶分子の配向状態を規制するようにした場合、下地に対する配向膜の敷設面積が大きくなり、上記(2)と相まってピンホールが生じやすくなる。
In this alignment film, local pinholes may occur due to the following circumstances.
(1) A foreign substance mixed in the alignment film forming process adheres, and the alignment film is locally cut off as the foreign substance is removed, thereby generating a pinhole.
(2) The adhesion of the alignment film to the underlying layer (pixel electrode or counter electrode) is locally poor, and the alignment film material is repelled at the time of film formation, resulting in a pinhole.
(3) When a material that vertically aligns liquid crystal molecules is used as the alignment film material, the sticking property of the alignment film to the underlying layer tends to deteriorate, and pinholes are likely to occur in combination with (2) above.
(4) If the alignment state of the liquid crystal molecules is regulated by forming recesses or protrusions on the base of the alignment film and providing a step on the surface of the alignment film, the laying area of the alignment film on the base increases. In combination with (2), pinholes are likely to occur.
 上述した事情によって配向膜にピンホールが生じた場合、その箇所については正常に画像が表示されないことになる。したがって、ピンホールの大きさ又は形成位置によっては、配向膜を全て剥離して成膜し直さなければならない等の問題が発生し、製造コストが高くなってしまうという結果が生じていた。 When a pinhole is generated in the alignment film due to the above-described circumstances, an image is not normally displayed at that location. Therefore, depending on the size or formation position of the pinhole, there arises a problem that the alignment film must be completely peeled off and the film is formed again, resulting in an increase in manufacturing cost.
 特許文献1に開示された技術によれば、配向膜にピンホールを検出した後に、配向膜補修剤をピンホールに転写させるスタンプ手法が提案されている。このスタンプ手法によれば、配向膜補修剤を付着させた転写ヘッドをピンホールに押し当てることによってピンホールの補修を行うので、補修を容易に行うことができるとともに、補修箇所の膜厚の制御を容易に行うことができる。 According to the technique disclosed in Patent Document 1, after detecting a pinhole in the alignment film, a stamp method is proposed in which the alignment film repair agent is transferred to the pinhole. According to this stamp method, the pinhole is repaired by pressing the transfer head with the alignment film repairing agent against the pinhole, so that the repair can be easily performed and the thickness of the repaired part can be controlled. Can be easily performed.
国際公開WO2007-132586号公報International Publication WO2007-132586
 特許文献1に開示されたスタンプ手法を用いた場合、局所的に発生したピンホールを容易に補修することができる。しかしながら、本願発明者の検討によると、配向膜と配向膜補修剤との組み合わせ(相性)によっては、良好に補修をできないことが見出された。具体的には、ある配向膜に対して良好に補修できたとしても、その配向膜の種類(材料、品番など)を変更した場合において、良好に補修できない場合が観測された。良好に補修できない理由は、専門家であっても、すぐにはわからないことが多く、それゆえに、試行錯誤して、変更した配向膜に対して容易に修復できる配向膜補修剤を見つけることに苦心することになる。 When using the stamp method disclosed in Patent Document 1, locally generated pinholes can be easily repaired. However, according to the study of the present inventors, it has been found that the repair cannot be performed satisfactorily depending on the combination (compatibility) of the alignment film and the alignment film repair agent. Specifically, even when repairing a certain alignment film satisfactorily, it was observed that the alignment film could not be repaired satisfactorily when the type of the alignment film (material, product number, etc.) was changed. The reason why it cannot be repaired well, even by experts, is often not immediately obvious, and therefore it is difficult to find an alignment film repair agent that can be easily repaired to a modified alignment film by trial and error. Will do.
 加えて、配向膜の形成方法としては、スピンコート法およびスプレー法の他に、インクジェット法がある。インクジェット法によって配向膜を形成する場合、インクジェットヘッドのノズルから塗布液が吐出されない場合があり、その場合には、比較的広いピンホール(ノズル吐出不良による欠陥)が発生してしまう可能性がある。そして、そのようなピンホールこそ補修が必要であり、ピンホールの修復技術の更なる改善が求められている。 In addition, as a method for forming the alignment film, there is an inkjet method in addition to the spin coating method and the spray method. When the alignment film is formed by the inkjet method, the coating liquid may not be ejected from the nozzles of the inkjet head, and in that case, a relatively wide pinhole (defect due to defective nozzle ejection) may occur. . And such pinholes need repair, and further improvement of pinhole repair technology is required.
 本発明はかかる点に鑑みてなされたものであり、その主な目的は、より容易に配向膜の欠陥を修復することができる液晶パネルの製造方法を提供することにある。 The present invention has been made in view of such a point, and a main object thereof is to provide a method of manufacturing a liquid crystal panel that can repair defects in an alignment film more easily.
 本発明に係る液晶パネルの製造方法は、インクジェット方式で塗布液を吐出することによって基板の表面に配向膜を形成する工程と、修復インクを付与することによって前記配向膜の欠損部位を修復する工程とを含み、前記配向膜を形成する工程における前記塗布液は、前記配向膜を構成する材料からなる固形分と、前記固形分を溶解する強溶媒と、前記強溶媒よりも前記固形分に対する溶解性の劣る調整用溶媒とを含み、前記修復インクは、前記塗布液に含まれている前記固形分の濃度よりも低い固形分濃度を有し、かつ、前記修復インクは、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)よりも低い溶媒割合(強溶媒/調整用溶媒)を有する。
 ある好適な実施形態において、前記修復インクの固形分濃度は、前記塗布液の固形分濃度の1/10以下である。
 ある好適な実施形態では、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)は、50/50である。
 本発明に係る液晶パネルは、互いに対向する一対の基板と、前記一対の基板の間に配置された液晶層とを備え、前記基板のうち前記液晶層に接する面には配向膜が形成されており、前記配向膜の欠損部位には、修復層が形成されており、前記配向膜は、インクジェット方式で塗布液を吐出することによって形成されており、前記修復層は、修復インクを付与することによって形成されており、前記塗布液は、前記配向膜を構成する材料からなる固形分と、前記固形分を溶解する強溶媒と、前記強溶媒よりも前記固形分に対する溶解性の劣る調整用溶媒とを含み、前記修復インクは、前記塗布液に含まれている前記固形分の濃度よりも低い固形分濃度を有し、かつ、前記修復インクは、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)よりも低い溶媒割合(強溶媒/調整用溶媒)を有する。
 本発明に係る修復装置は、配向膜の欠損部位を修復する装置であり、修復スタンプと、前記修復スタンプを移動させる移動装置と、前記移動装置を制御する制御装置とを備え、前記制御装置は、修復インクを供給するインク供給部に、前記修復スタンプを移動するステップと、前記配向膜の前記欠損部位を含む領域に、前記修復スタンプを配置するステップとを実行するように、前記修復スタンプの移動を制御し、前記配向膜は、インクジェット方式で塗布液を吐出することによって形成されており、前記塗布液は、前記配向膜を構成する材料からなる固形分と、前記固形分を溶解する強溶媒と、前記強溶媒よりも前記固形分に対する溶解性の劣る調整用溶媒とを含み、前記修復インクは、前記塗布液に含まれている前記固形分の濃度よりも低い固形分濃度を有し、かつ、前記修復インクは、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)よりも低い溶媒割合(強溶媒/調整用溶媒)を有する。
 ある好適な実施形態では、さらに、前記配向膜の欠損部位を検査する検査装置を備えている。
The method for producing a liquid crystal panel according to the present invention includes a step of forming an alignment film on the surface of the substrate by discharging a coating liquid by an ink jet method, and a step of repairing a defective portion of the alignment film by applying a repair ink. The coating solution in the step of forming the alignment film includes a solid content made of a material constituting the alignment film, a strong solvent that dissolves the solid content, and a dissolution in the solid content rather than the strong solvent. And the repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and the repair ink is adjusted in the coating liquid. The solvent ratio (strong solvent / adjusting solvent) is lower than the solvent ratio of the strong solvent to the working solvent (strong solvent / adjusting solvent).
In a preferred embodiment, the solid concentration of the repair ink is 1/10 or less of the solid concentration of the coating liquid.
In a preferred embodiment, the solvent ratio of the strong solvent to the adjusting solvent in the coating solution (strong solvent / adjusting solvent) is 50/50.
A liquid crystal panel according to the present invention includes a pair of substrates facing each other and a liquid crystal layer disposed between the pair of substrates, and an alignment film is formed on a surface of the substrate in contact with the liquid crystal layer. In addition, a repair layer is formed in the defect portion of the alignment film, and the alignment film is formed by ejecting a coating liquid by an ink jet method, and the repair layer applies a repair ink. The coating solution is a solid content made of a material constituting the alignment film, a strong solvent that dissolves the solid content, and an adjustment solvent that is less soluble in the solid content than the strong solvent. The repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and the repair ink is a strong solvent for the adjustment solvent in the coating liquid. Solvent ratio Than strong solvent / adjustment solvent) having a low solvent percentage (strong solvent / adjustment solvent).
A repair device according to the present invention is a device for repairing a defective portion of an alignment film, and includes a repair stamp, a moving device that moves the repair stamp, and a control device that controls the moving device, and the control device includes: Moving the repair stamp to an ink supply unit that supplies repair ink, and disposing the repair stamp in a region including the defect portion of the alignment film. The alignment film is formed by discharging a coating liquid by an ink jet method, and the coating liquid includes a solid content made of a material constituting the alignment film, and a strength that dissolves the solid content. A solvent and a solvent for adjustment that is less soluble in the solid content than the strong solvent, and the repair ink is more than the concentration of the solid content contained in the coating liquid. The restoration ink has a lower solvent ratio (strong solvent / adjusting solvent) than the solvent ratio of the strong solvent to the adjusting solvent (strong solvent / adjusting solvent) in the coating liquid. Have.
In a preferred embodiment, an inspection apparatus for inspecting a defective portion of the alignment film is further provided.
 本発明によれば、インクジェット方式で塗布液を吐出することによって基板の表面に配向膜を形成した後に、修復インクを付与することによって配向膜の欠損部位を修復することができる。そして、塗布液は、配向膜を構成する材料からなる固形分と、固形分を溶解する強溶媒と、調整用溶媒とを含んでおり、一方、修復インクは、塗布液の固形分濃度よりも低い固形分濃度を有し、かつ、修復インクの溶媒割合(強溶媒/調整用溶媒)は、塗布液の溶媒割合(強溶媒/調整用溶媒)よりも低い。したがって、修復インクが配向膜を溶解させる量を減らすことができ、それゆえに、修復インクの周縁に位置する箇所に、突起部(周縁部)が発生することを抑制することが可能となる。その結果、特定の材料(例えば、光配向性の材料)からなる配向膜を用いた場合でも、より容易に配向膜の欠陥を修復することが可能となる。 According to the present invention, after forming the alignment film on the surface of the substrate by ejecting the coating liquid by the ink jet method, the defective portion of the alignment film can be repaired by applying the repair ink. The coating liquid contains a solid content made of the material constituting the alignment film, a strong solvent that dissolves the solid content, and an adjustment solvent. On the other hand, the repair ink has a concentration higher than the solid content concentration of the coating liquid. It has a low solid content concentration, and the solvent ratio (strong solvent / adjusting solvent) of the repair ink is lower than the solvent ratio (strong solvent / adjusting solvent) of the coating liquid. Accordingly, it is possible to reduce the amount of the repair ink that dissolves the alignment film. Therefore, it is possible to suppress the occurrence of a protrusion (peripheral portion) at a position located at the periphery of the repair ink. As a result, even when an alignment film made of a specific material (for example, photo-alignment material) is used, defects in the alignment film can be repaired more easily.
本発明の実施形態に係る液晶パネル10を備えた液晶表示装置100の断面図である。It is sectional drawing of the liquid crystal display device 100 provided with the liquid crystal panel 10 which concerns on embodiment of this invention. アレイ基板12の上面の一部を拡大した平面図である。3 is an enlarged plan view of a part of the upper surface of the array substrate 12. FIG. 液晶パネル10の一部を拡大した断面図である。2 is an enlarged cross-sectional view of a part of the liquid crystal panel 10. FIG. アレイ基板12の上面の一部の平面図である。4 is a plan view of a part of the upper surface of the array substrate 12. FIG. (a)から(c)は、修復層35の形成工程を説明するための工程断面図である。(A) to (c) are process cross-sectional views for explaining the process of forming the repair layer 35. (a)は、修復インクによる修復後の基板の様子を示す図であり、(b)は、修復領域57の周辺の拡大図である。(A) is a figure which shows the mode of the board | substrate after a repair with a repair ink, (b) is an enlarged view of the periphery of the repair area | region 57. FIG. (a)から(c)は、修復層35の形成工程を予想した工程断面図である。(A) to (c) are process cross-sectional views in which a process of forming the repair layer 35 is predicted. (a)から(c)は、修復層35の周縁部(突起部)35bが形成する様子を説明するための工程断面図である。(A) to (c) are process cross-sectional views for explaining how the peripheral edge (projection) 35b of the repair layer 35 is formed. インクジェット方式の塗布装置200の構成を示す平面図である。1 is a plan view showing a configuration of an inkjet type coating apparatus 200. FIG. インクジェット方式の塗布装置200の構成を示す平面図である。1 is a plan view showing a configuration of an inkjet type coating apparatus 200. FIG. インクジェット方式の塗布装置200の構成を示す図である。It is a figure which shows the structure of the coating device 200 of an inkjet system. 本発明の実施形態に係る修復装置300の構成を模式的に示す図である。It is a figure which shows typically the structure of the repair apparatus 300 which concerns on embodiment of this invention. 本発明の実施形態に係る修復装置300の構成を示すブロック図である。It is a block diagram which shows the structure of the repair apparatus 300 which concerns on embodiment of this invention. 複数の修復領域を含むアレイ基板12の上面の一部の平面図である。It is a top view of a part of upper surface of the array substrate 12 including a plurality of repair regions.
 以下、図面を参照しながら、本発明の実施の形態を説明する。以下の図面においては、説明の簡潔化のため、実質的に同一の機能を有する構成要素を同一の参照符号で示す。なお、本発明は以下の実施形態に限定されない。 Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, components having substantially the same function are denoted by the same reference numerals for the sake of brevity. In addition, this invention is not limited to the following embodiment.
 まず、図1から図3を参照しながら、本発明の実施形態に係る製造方法によって得られる液晶パネル10を備えた液晶表示装置100について説明する。 First, a liquid crystal display device 100 including a liquid crystal panel 10 obtained by a manufacturing method according to an embodiment of the present invention will be described with reference to FIGS. 1 to 3.
 図1は、本実施形態の液晶パネル10を備えた液晶表示装置100の断面構成を模式的に示している。図1に示した液晶表示装置100は、液晶パネル10と、液晶パネルの裏側(図1中の下側)に配置された外部光源であるバックライト20とから構成されている。液晶パネル10とバックライト20とは、液晶パネル10の表側から被せられたベゼル29によって組み付けられて保持されている。 FIG. 1 schematically shows a cross-sectional configuration of a liquid crystal display device 100 including a liquid crystal panel 10 of the present embodiment. A liquid crystal display device 100 shown in FIG. 1 includes a liquid crystal panel 10 and a backlight 20 that is an external light source disposed on the back side (lower side in FIG. 1) of the liquid crystal panel. The liquid crystal panel 10 and the backlight 20 are assembled and held by a bezel 29 covered from the front side of the liquid crystal panel 10.
 バックライト20は、複数本の線状光源(例えば、冷陰極管)22と、光源22を収納するケース24とから構成されている。ケース24は、表側(液晶パネル10側)に向けて開口した箱形形状を有しており、ケース24内には、線状光源22が平行に配列されている。なお、バックライト20は、線状光源のものに限らず、他の構成のもの(例えば、LED光源)を使用することも可能である。 The backlight 20 includes a plurality of linear light sources (for example, cold cathode tubes) 22 and a case 24 that houses the light sources 22. The case 24 has a box shape opened toward the front side (the liquid crystal panel 10 side), and the linear light sources 22 are arranged in parallel in the case 24. Note that the backlight 20 is not limited to a linear light source, but may have another configuration (for example, an LED light source).
 また、ケース24の開口には、複数枚の光学シート26が積層されて配置されている。光学シート26は、例えば、裏側から順に、拡散板、拡散シート、レンズシート、および輝度上昇シートから構成されている。さらに、光学シート26をケース24に挟んで保持するために、ケース24には、略枠状のフレーム28が設けられている。 Also, a plurality of optical sheets 26 are stacked and arranged in the opening of the case 24. The optical sheet 26 includes, for example, a diffusion plate, a diffusion sheet, a lens sheet, and a brightness enhancement sheet in order from the back side. Further, in order to hold the optical sheet 26 between the case 24 and the case 24, a substantially frame-like frame 28 is provided on the case 24.
 液晶パネル10は、概して、全体として矩形の形状を有しており、一対の透光性基板(ガラス基板)11および12から構成されている。両基板11および12は、製造工程でそれぞれマザーガラスと称される大型の母材から切り出されたものを使用している。 The liquid crystal panel 10 generally has a rectangular shape as a whole, and is composed of a pair of translucent substrates (glass substrates) 11 and 12. Both substrates 11 and 12 are cut from a large base material called mother glass in the manufacturing process.
 両基板11および12は、互いに対向して配置され、その間には液晶層13が設けられている。液晶層13は、基板11および12の間の電界印加に伴って光学特定が変化する液晶材料からなる。基板11および12の外縁部には、シール材15が設けられて、液晶層13を封止している。基板11と基板12との間のギャップは、スペーサ(不図示)と、シール材15とによって確保される。スペーサは、例えば、弾性変形可能な樹脂製で、粒状(球状)を有しており、液晶層13中の所定位置に多数分散して配置されている。また、両基板の外面には、それぞれ偏光板17および18が貼り付けられている。なお、スペーサは、粒状の構造のものに限らず、柱状スペーサであってもよい。 Both the substrates 11 and 12 are arranged to face each other, and a liquid crystal layer 13 is provided between them. The liquid crystal layer 13 is made of a liquid crystal material whose optical characteristics change with application of an electric field between the substrates 11 and 12. A sealing material 15 is provided on the outer edge portions of the substrates 11 and 12 to seal the liquid crystal layer 13. A gap between the substrate 11 and the substrate 12 is secured by a spacer (not shown) and the sealing material 15. The spacers are made of, for example, an elastically deformable resin and have a granular shape (spherical shape). A large number of spacers are dispersed at predetermined positions in the liquid crystal layer 13. Further, polarizing plates 17 and 18 are attached to the outer surfaces of both substrates, respectively. The spacer is not limited to a granular structure, and may be a columnar spacer.
 本実施形態では、両基板11および12のうち、表側がカラーフィルタ基板(CF基板)11であり、一方、裏側がアレイ基板12である。図2は、アレイ基板12の上面の一部を拡大して示している。また、図3は、両基板11および12の断面の一部を拡大して示している。 In the present embodiment, the front side of both the substrates 11 and 12 is the color filter substrate (CF substrate) 11, while the back side is the array substrate 12. FIG. 2 shows an enlarged part of the upper surface of the array substrate 12. FIG. 3 shows an enlarged part of the cross section of both the substrates 11 and 12.
 図2に示すように、アレイ基板12の上面(液晶層13側、CF基板11の対向面側)には、スイッチング素子(例えば、TFT)44および画素電極46が設けられている。スイッチング素子44および画素電極46の周りには、格子状をなすソース配線41およびゲート配線42が取り囲むようにして設けられている。ソース配線41およびゲート配線42がそれぞれ、スイッチング素子44のソース電極およびゲート電極に接続されている。画素電極46は、例えば、ITO(インジウム・スズ・オキサイド)から構成されている。画素電極46は、例えば、矩形状に形成され、図2に示した例では、ソース配線41が延びる方向に沿って細長い長方形の形状に形成されている。 As shown in FIG. 2, a switching element (for example, TFT) 44 and a pixel electrode 46 are provided on the upper surface of the array substrate 12 (the liquid crystal layer 13 side and the opposite surface side of the CF substrate 11). Around the switching element 44 and the pixel electrode 46, a grid-like source wiring 41 and gate wiring 42 are provided so as to surround them. The source wiring 41 and the gate wiring 42 are connected to the source electrode and the gate electrode of the switching element 44, respectively. The pixel electrode 46 is made of, for example, ITO (indium tin oxide). For example, the pixel electrode 46 is formed in a rectangular shape, and in the example illustrated in FIG. 2, the pixel electrode 46 is formed in an elongated rectangular shape along the direction in which the source wiring 41 extends.
 本実施形態では、図3に示すように、アレイ基板(具体的には、ガラス基板)12の上に、ゲート配線42が形成されている。また、ゲート配線42を覆うようにアレイ基板12の上に、絶縁層31が形成されている。絶縁層31の上には絶縁層32が形成されており、そして、絶縁層32の上に画素電極46が形成されている。なお、基板12から絶縁層32及び画素電極46を含めてアレイ基板12と称する場合もある。 In this embodiment, as shown in FIG. 3, the gate wiring 42 is formed on the array substrate (specifically, the glass substrate) 12. An insulating layer 31 is formed on the array substrate 12 so as to cover the gate wiring 42. An insulating layer 32 is formed on the insulating layer 31, and a pixel electrode 46 is formed on the insulating layer 32. The substrate 12 to the insulating layer 32 and the pixel electrode 46 may be referred to as the array substrate 12.
 画素電極46および絶縁層32の上には、液晶層13における液晶分子を配向させるための配向膜30(30A)が形成されている。言い換えると、画素電極46およびその外側に位置する絶縁層32のうち液晶層13と接する面には、配向膜30(30A)が形成されている。本実施形態の配向膜30は、液晶層13に対して電圧を印加していない状態で配向膜30の表面に対して液晶分子を垂直に配向させる材料(いわゆる垂直配向タイプの材料)から構成される。本実施形態の配向膜30は、ポリイミドから構成されている。配向膜30の厚さは、例えば、100nm~200nm程度である。なお、本実施形態では、画素電極46および絶縁層32が配向膜30の下地となっているが、他の積層構造を採用した液晶パネルでは、上記とは異なる層が下地になる場合もある。 On the pixel electrode 46 and the insulating layer 32, an alignment film 30 (30A) for aligning liquid crystal molecules in the liquid crystal layer 13 is formed. In other words, the alignment film 30 (30A) is formed on the surface in contact with the liquid crystal layer 13 in the pixel electrode 46 and the insulating layer 32 located outside thereof. The alignment film 30 of the present embodiment is made of a material (so-called vertical alignment type material) that aligns liquid crystal molecules perpendicularly to the surface of the alignment film 30 in a state where no voltage is applied to the liquid crystal layer 13. The The alignment film 30 of this embodiment is made of polyimide. The thickness of the alignment film 30 is, for example, about 100 nm to 200 nm. In the present embodiment, the pixel electrode 46 and the insulating layer 32 are the base of the alignment film 30. However, in a liquid crystal panel employing another laminated structure, a layer different from the above may be the base.
 本実施形態の画素電極46(アレイ基板12の表面)には、スリット33(溝部、開口部、段差部)が設けられている。したがって、この画素電極46に沿って形成される配向膜30の表面には段差が生じている。この例では、図2に示すように、スリット33は、所定幅の溝状に形成されている。具体的には、画素電極46における長手方向中央位置と、長手方向の両端位置付近と、これらの中間位置とにそれぞれ形成されている。中間位置のスリット33は平面視V字型をなす。また、中央位置のスリット33は、画素電極46の側縁に配置され、平面視三角形状をなす。さらに、両端側のスリット33は、中央側のスリット33とほぼ平行な直線状の形状をなす。各スリット33は、ほぼ等間隔に配置されている。 The pixel electrode 46 (surface of the array substrate 12) of this embodiment is provided with slits 33 (grooves, openings, steps). Therefore, a step is generated on the surface of the alignment film 30 formed along the pixel electrode 46. In this example, as shown in FIG. 2, the slit 33 is formed in a groove shape having a predetermined width. Specifically, the pixel electrode 46 is formed at the center position in the longitudinal direction, in the vicinity of both end positions in the longitudinal direction, and at an intermediate position thereof. The slit 33 at the intermediate position is V-shaped in plan view. The slit 33 at the center position is disposed on the side edge of the pixel electrode 46 and has a triangular shape in plan view. Further, the slits 33 on both ends have a linear shape substantially parallel to the slit 33 on the center side. The slits 33 are arranged at substantially equal intervals.
 各スリット33で配向膜30の段差によって、図3に示した上下方向(両基板11、12の面方向と直交する方向)に対して液晶分子が傾くように配向状態を規制することができる。このスリット33による段差により、配向膜30に対するラビング処理を不要にすることができる。なお、スリット33の深さは、例えば、図3に示すように、絶縁層32に達する深さにすることができる。 The alignment state can be regulated so that the liquid crystal molecules are inclined with respect to the vertical direction shown in FIG. 3 (the direction orthogonal to the surface direction of both the substrates 11 and 12) by the step of the alignment film 30 at each slit 33. Due to the step formed by the slits 33, the rubbing process for the alignment film 30 can be made unnecessary. The depth of the slit 33 can be set to reach the insulating layer 32 as shown in FIG. 3, for example.
 また、CF基板11の内面側(液晶層13側、アレイ基板12との対向面側)には、図3に示すように、各画素電極46に対応した位置にカラーフィルタ36が並んで設けられている。カラーフィルタ36は、所定の波長の光については透過を許容し、それ以外の波長の光については吸収する機能を有している。本実施形態のカラーフィルタ36では、R(赤色)、G(緑色)、B(青色)の三色のものが設定されている。各カラーフィルタ36は、例えば、R,G,Bの順番で配列されている。 Further, on the inner surface side of the CF substrate 11 (the liquid crystal layer 13 side and the surface facing the array substrate 12), color filters 36 are provided side by side at positions corresponding to the respective pixel electrodes 46, as shown in FIG. ing. The color filter 36 has a function of allowing transmission of light of a predetermined wavelength and absorbing light of other wavelengths. In the color filter 36 of the present embodiment, three color filters of R (red), G (green), and B (blue) are set. Each color filter 36 is arranged in the order of R, G, and B, for example.
 隣接する各色のカラーフィルタ36の間には、隣のカラーフィルタ36側からの光を遮光する遮光層37(ブラックマトリックス)が設けられ、それによって、混色が防止されるようになっている。遮光層37は、各カラーフィルタ36を取り囲むように格子状に形成されている。 Between the adjacent color filters 36 of each color, a light blocking layer 37 (black matrix) for blocking light from the adjacent color filter 36 side is provided, thereby preventing color mixing. The light shielding layer 37 is formed in a lattice shape so as to surround each color filter 36.
 また、カラーフィルタ36の内面には、画素電極46と同様に、例えばITOから構成された対向電極48が形成されている。本実施形態の対向電極48の内面側には、リブ34(凸部、突起部、段差部)が設けられている。本実施形態の構成では、リブ34は、対向電極48の内面から対向するアレイ基板12側へ突出しており、所定幅の細長い形状によって構成されている。リブ34は、図2に示すように、平面視V字型に形成されており、アレイ基板12側における互いに隣り合う各スリット33のほぼ中間位置に並んで配置されている。各リブ34は、その軸線方向が各スリット33の延出方向とほぼ平行になるように形成されている。 Further, on the inner surface of the color filter 36, similarly to the pixel electrode 46, a counter electrode 48 made of, for example, ITO is formed. On the inner surface side of the counter electrode 48 of the present embodiment, ribs 34 (projections, protrusions, stepped portions) are provided. In the configuration of the present embodiment, the rib 34 protrudes from the inner surface of the counter electrode 48 toward the facing array substrate 12 and is formed in an elongated shape having a predetermined width. As shown in FIG. 2, the ribs 34 are formed in a V shape in plan view, and are arranged side by side at substantially the middle positions of the adjacent slits 33 on the array substrate 12 side. Each rib 34 is formed such that its axial direction is substantially parallel to the extending direction of each slit 33.
 対向電極48およびリブ34の内面側には、液晶層13における液晶分子を配向させるための配向膜30(30B)が形成されている。言い換えると、対向電極48およびリブ34のうち液晶層13と接する面には、配向膜30(30B)が形成されている。したがって、対向電極48から突出する各リブ34によって、配向膜30(30B)の表面には、段差が形成されている。そして、この段差によって、図3に示した上下方向(両基板11、12の面方向と直交する方向)に対して液晶分子が傾くように配向状態を規制することができる。この段差により、配向膜30に対するラビング処理を不要にすることができる。 On the inner surface side of the counter electrode 48 and the rib 34, an alignment film 30 (30B) for aligning liquid crystal molecules in the liquid crystal layer 13 is formed. In other words, the alignment film 30 (30B) is formed on the surface of the counter electrode 48 and the rib 34 that is in contact with the liquid crystal layer 13. Therefore, a step is formed on the surface of the alignment film 30 (30B) by the ribs 34 protruding from the counter electrode 48. The alignment state can be regulated by this step so that the liquid crystal molecules are inclined with respect to the vertical direction shown in FIG. 3 (the direction perpendicular to the surface direction of both the substrates 11 and 12). By this step, the rubbing process for the alignment film 30 can be made unnecessary.
 液晶パネル10においては、製造される過程で配向膜30(30A、30B)に欠損部位50が生じる場合がある。本実施形態の欠損部位50には、修復インクからなる修復層35が形成されており、その修復層35によって、配向膜30の欠損部位50の修復が行われている。 In the liquid crystal panel 10, a defect site 50 may occur in the alignment film 30 (30A, 30B) during the manufacturing process. A repair layer 35 made of a repair ink is formed on the defect portion 50 of this embodiment, and the repair portion 35 repairs the defect portion 50 of the alignment film 30.
 図4は、製造される過程において比較的大きな欠損部位50が生じた場合のアレイ基板12を示す平面図である。本実施形態の構成では、この欠損部位50には、修復層35が形成され、それによって配向膜30の修復が完了している。 FIG. 4 is a plan view showing the array substrate 12 when a relatively large defect 50 is generated in the manufacturing process. In the configuration of the present embodiment, the repair layer 35 is formed in the defect portion 50, thereby completing the repair of the alignment film 30.
 修復層35の形成は、図5(a)から(c)に示すようにして実行される。図5(a)から(c)は、修復層35の形成工程を説明するための工程断面図である。 The repair layer 35 is formed as shown in FIGS. FIGS. 5A to 5C are process cross-sectional views for explaining the process of forming the repair layer 35.
 まず、配向膜30の成膜工程が終わった後、図5(a)に示すように、検査によって配向膜30に欠損部位50を発見する。 First, after the step of forming the alignment film 30 is finished, as shown in FIG. 5A, a defect site 50 is found in the alignment film 30 by inspection.
 次に、図5(b)に示すように、検査で発見された欠損部位50を含む領域(修復領域)55を規定し、次いで、その修復領域55に、修復インク61が付与される修復スタンプ(リペアスタンプ)60を近づける。具体的には、修復インク61が下面に付着した修復スタンプ60を治具62で保持し、その修復スタンプ60を修復領域55のところまで移動させる。次に、修復スタンプ60の修復インク61を欠損部位50に接触させ(矢印65)、その後、修復スタンプ60を移動させて(矢印52)、欠損部位50に修復インク61を塗布する。修復インク61の塗布が完了したら、修復スタンプ60を修復領域55から移動させる(矢印66)。 Next, as shown in FIG. 5B, a region (repair region) 55 including the defect site 50 discovered by the inspection is defined, and then the repair stamp in which the repair ink 61 is applied to the repair region 55. (Repair stamp) 60 is brought closer. Specifically, the repair stamp 60 with the repair ink 61 attached to the lower surface is held by the jig 62, and the repair stamp 60 is moved to the repair area 55. Next, the repair ink 61 of the repair stamp 60 is brought into contact with the defect site 50 (arrow 65), and then the repair stamp 60 is moved (arrow 52) to apply the repair ink 61 to the defect site 50. When the application of the repair ink 61 is completed, the repair stamp 60 is moved from the repair area 55 (arrow 66).
 その後、図5(c)に示すように、修復領域55に塗布された修復インク61を乾燥させて(矢印64参照)、修復層35を形成する。例えば修復インク61が紫外線硬化樹脂の場合、紫外線を照射することによって修復層35を硬化させる。このようにして、配向膜30における欠損部位50の修復が完了する。なお、ここでは、アレイ基板12における絶縁層32上の配向膜30(30A)の欠損部位50について例示しているが、CF基板11における配向膜30(30B)についても同様のことが行われる。 Thereafter, as shown in FIG. 5C, the repair ink 61 applied to the repair region 55 is dried (see arrow 64) to form the repair layer 35. For example, when the repair ink 61 is an ultraviolet curable resin, the repair layer 35 is cured by irradiating with ultraviolet rays. In this way, the repair of the defect site 50 in the alignment film 30 is completed. Here, the defect site 50 of the alignment film 30 (30A) on the insulating layer 32 in the array substrate 12 is illustrated, but the same is performed for the alignment film 30 (30B) in the CF substrate 11.
 図6(a)は、本願発明者が検討した修復インクによる修復後の基板(CF基板)の様子を示す図である。図6(b)は、修復領域57の周辺の拡大図である。 FIG. 6 (a) is a diagram showing a state of the substrate (CF substrate) after repair by the repair ink examined by the inventors of the present application. FIG. 6B is an enlarged view around the repair region 57.
 図6(a)及び(b)に示すように、修復インク61を用いて欠損部位50に修復層35を形成し、それによって、欠損部位50の修復が行われている。しかしながら、修復層35のうち中央部35aの周囲には、中央部35aよりも盛り上がった周縁部(突起部)35bが形成されていることがわかった。 As shown in FIGS. 6A and 6B, the repair layer 35 is formed on the defect site 50 using the repair ink 61, whereby the defect site 50 is repaired. However, it was found that a peripheral edge (projection) 35b that was raised from the central portion 35a was formed around the central portion 35a of the repair layer 35.
 この周縁部(突起部)35bは、配向膜30を構成する材料の固形分成分(例えば、ポリイミド成分)であり、この周縁部35bにより、修復領域57には輪状のシミ(白シミ)が生じ、このシミは液晶パネルのコントラスト比の低下などの原因となる。なお、この周縁部35bによるシミは、光の透過の様子によっては黒いシミに見える場合もある。一方で、同様の修復インク61を用いても、このような周縁部35b(輪状のシミ)が生じない場合もあるため、シミ発生の原因を特定することは非常に困難であった。 This peripheral portion (projection portion) 35b is a solid component (for example, polyimide component) of the material constituting the alignment film 30, and the peripheral portion 35b causes a ring-shaped spot (white spot) in the repair region 57. This stain causes a decrease in the contrast ratio of the liquid crystal panel. The stain due to the peripheral edge 35b may appear as a black stain depending on the state of light transmission. On the other hand, even if the same repair ink 61 is used, such a peripheral edge 35b (annular stain) may not occur, and it is very difficult to specify the cause of the occurrence of the stain.
 本願発明者は、特定のポリイミド材料(例えば、光配向性のポリイミド材料)はイミド化率が低く、溶媒に溶けやすいものがあることに気がついた。そのような特定のポリイミド材料からなる配向膜30の上に、強溶媒(例えば、N-メリルピロリドン(NMP)のような溶解性の強い溶媒)の含有率が大きい修復インク61を付与すると、その部分の配向膜を溶解させてしまう。なお、強溶媒は、ポリイミド材料を溶解させるために必要であるので、修復インク61から強溶媒を取り除くことは難しい。 The inventor of the present application has noticed that certain polyimide materials (for example, photo-alignment polyimide materials) have a low imidization ratio and are easily soluble in solvents. When the restoration ink 61 having a high content of a strong solvent (for example, a highly soluble solvent such as N-merylpyrrolidone (NMP)) is applied on the alignment film 30 made of the specific polyimide material, A portion of the alignment film is dissolved. In addition, since a strong solvent is required in order to dissolve a polyimide material, it is difficult to remove the strong solvent from the repair ink 61.
 また、本願発明者は、修復インク61に強溶媒が含まれている場合において、仮に、修復インク61の強溶媒が配向膜30を溶解したとしても、修復層35の形成には問題ないと予測していた。これについて、図7(a)から(c)を参照しながら説明する。 In addition, when the repair ink 61 contains a strong solvent, the inventor of the present application predicts that there is no problem in forming the repair layer 35 even if the strong solvent of the repair ink 61 dissolves the alignment film 30. Was. This will be described with reference to FIGS. 7A to 7C.
 まず、図5(b)に示したものと同様に、図7(a)に示すように、欠損部位50を含む修復領域)55に、修復スタンプ60で修復インク61を付与する。ここで、修復インク61に含まれている強溶媒が配向膜30を溶解したとすると、図7(b)に示すように、修復インク61に接している配向膜30の一部30sが溶解して、修復インク61中に溶け出す。ただし、図7(c)に示すように、その溶け出した部分30sも修復インク61中の材料とともに修復層35となるので、欠損部位50の修復は完了することになる。したがって、仮に、修復インク61の強溶媒が配向膜30を溶解したとしても、修復層35の形成には問題ないはずである。 First, like the one shown in FIG. 5B, the repair ink 61 is applied with the repair stamp 60 to the repair region 55 including the defect site 50 as shown in FIG. 7A. Here, if the strong solvent contained in the repair ink 61 dissolves the alignment film 30, a portion 30s of the alignment film 30 in contact with the repair ink 61 is dissolved as shown in FIG. 7B. And melts into the repair ink 61. However, as shown in FIG. 7C, the melted portion 30 s also becomes the repair layer 35 together with the material in the repair ink 61, so that the repair of the defective portion 50 is completed. Therefore, even if the strong solvent of the repair ink 61 dissolves the alignment film 30, there should be no problem in forming the repair layer 35.
 しかしながら、本願発明者が観察したところ、特定のポリイミド材料からなる配向膜30の修復箇所には、図6(a)及び(b)に示すような周縁部(突起部)35bが生じる場合がある。そこで、周縁部35bが生じるメカニズムについて、本願発明者が検討したところ、図8(a)から(c)のようになるのではないかと推論した。 However, as observed by the inventors of the present application, a peripheral portion (protrusion portion) 35b as shown in FIGS. 6A and 6B may occur in the repaired portion of the alignment film 30 made of a specific polyimide material. . Then, when this inventor examined about the mechanism which the peripheral part 35b produces, it was inferred that it might become like FIG. 8 (a) to (c).
 まず、図7(a)に示したものと同様に、図8(a)に示すように、欠損部位50を含む修復領域)55に、修復スタンプ60で修復インク61を付与する。次に、修復インク61の強溶媒が配向膜30を溶解したとき、図8(b)に示すように、修復インク61の界面張力や修復インク61内の対流などによって、配向膜30の溶解した部位は、修復インク61の周縁に集まって突起部35bとなる。その後、修復インク61の溶媒が蒸発していくと、周縁に位置する突起部(周縁部)35bと、中央に位置する平担部(中央部)35aとからなる修復層35が形成される。そして、突起部(周縁部)35bは、コントラスト比の低下などの原因となり得る。 First, like the one shown in FIG. 7A, the repair ink 61 is applied to the repair region 55 including the defective portion 50 as shown in FIG. Next, when the strong solvent of the repair ink 61 dissolves the alignment film 30, the alignment film 30 is dissolved due to the interfacial tension of the repair ink 61 or convection in the repair ink 61 as shown in FIG. 8B. The portions gather around the periphery of the repair ink 61 to form the protrusion 35b. Thereafter, as the solvent of the repair ink 61 evaporates, a repair layer 35 is formed which includes a protrusion (peripheral part) 35b located at the periphery and a flat support part (center part) 35a located at the center. The protrusion (peripheral edge) 35b can cause a decrease in contrast ratio.
 このような検討の中、本願発明者は、修復層35に突起部(周縁部)35bが生じるのを抑制する手法を鋭意検討した結果、次のような手法に至った。以下、その手法について詳述する。 During such studies, the inventor of the present application diligently studied a method for suppressing the generation of the protruding portion (peripheral portion) 35b in the repair layer 35, and as a result, the following method was reached. Hereinafter, the method will be described in detail.
 本実施形態の構成において、配向膜30を形成する際には、インクジェット方式で塗布液を吐出することによって基板の表面に配向膜30を形成する。ここで、塗布液は、配向膜30を構成する材料からなる固形分(例えば、ポリイミドからなる固形分)と、固形分を溶解する強溶媒(例えば、NMP)と、強溶媒よりも固形分に対する溶解性の劣る調整用溶媒(または、弱溶媒)とを含んでいる。調整用溶媒は、インク特性(例えば、粘度など)を調整する溶媒であり、例えば、カルビトールアセテート、プロピレンカーボネートなどである。また、塗布液(インクジェット用)は、例えば、固形分濃度3~4%(質量%)であり、溶媒成分比は、強溶媒/弱溶媒=50/50(体積割合)である。 In the configuration of the present embodiment, when the alignment film 30 is formed, the alignment film 30 is formed on the surface of the substrate by discharging a coating liquid by an inkjet method. Here, the coating liquid has a solid content (for example, a solid content composed of polyimide) made of the material constituting the alignment film 30, a strong solvent (for example, NMP) that dissolves the solid content, and a solid content that is stronger than the strong solvent. And a solvent for adjustment (or weak solvent) having poor solubility. The adjusting solvent is a solvent that adjusts ink characteristics (for example, viscosity), and examples thereof include carbitol acetate and propylene carbonate. The coating liquid (for inkjet) has a solid content concentration of 3 to 4% (mass%), for example, and the solvent component ratio is strong solvent / weak solvent = 50/50 (volume ratio).
 本実施形態の構成では、修復インク61は、塗布液に含まれている固形分の濃度よりも低い固形分濃度を有し、さらに、修復インク61の溶媒成分比(強溶媒/弱溶媒)は、塗布液の溶媒成分比(強溶媒/弱溶媒)よりも低い。弱溶媒比率は、例えば、40~90%(体積%)にすることができる。具体的には、修復インク61は、例えば、固形分濃度0.1~0.2%(質量%)であり、溶媒成分比は、例えば、強溶媒/弱溶媒=30/70(体積割合)である。ここで、修復インク61の固形分濃度(例えば、0.1~0.2%)は、塗布液の固形分濃度(例えば、3~4%)の1/10以下にすることが好ましい。なお、より具体的な濃度・割合については、使用する製造プロセス条件(材料、装置条件など)にあわせて適時好適なものを採用すればよい。 In the configuration of the present embodiment, the repair ink 61 has a solid content concentration lower than the concentration of the solid content contained in the coating liquid, and the solvent component ratio (strong solvent / weak solvent) of the repair ink 61 is The solvent component ratio of the coating solution (strong solvent / weak solvent) is lower. The weak solvent ratio can be, for example, 40 to 90% (volume%). Specifically, the restoration ink 61 has a solid content concentration of 0.1 to 0.2% (mass%), for example, and the solvent component ratio is, for example, strong solvent / weak solvent = 30/70 (volume ratio). It is. Here, the solid content concentration (for example, 0.1 to 0.2%) of the repair ink 61 is preferably set to 1/10 or less of the solid content concentration (for example, 3 to 4%) of the coating liquid. In addition, as for a more specific concentration / ratio, a suitable one may be adopted in a timely manner according to the manufacturing process conditions (materials, apparatus conditions, etc.) to be used.
  修復インク61は、典型的には、塗布液(インクジェット用)と同じ成分、または、それを希釈したものを使用することが製造プロセスの管理の上で好ましい。特に、配向膜30の欠損部位50を修復するのであれば、修復インク61の固形分濃度は、塗布液と同じだけの固形分濃度(例えば、3~4%)は必要なく、それよりも低いもので十分である。さらには、修復インク61として、塗布液を希釈したものを使用するのであれば、修復インク61の固形分濃度は低くなるので、その固形分を溶解させる強溶媒も低くできる。そして、本願発明者は、修復インク61の溶媒成分比(強溶媒/弱溶媒)を、塗布液の溶媒成分比(強溶媒/弱溶媒)よりも低くすることによって、すなわち、強溶媒の割合を減らすことにより、配向膜30の溶解する部位30sを少なくすることができる。その結果、周縁に位置する突起部(周縁部)35bが発生することを抑制することができることに想到した。 For the wrinkle repair ink 61, it is typically preferable in terms of management of the manufacturing process to use the same component as the coating liquid (for inkjet) or a diluted one thereof. In particular, if the defective portion 50 of the alignment film 30 is to be repaired, the solid content concentration of the repair ink 61 is not required to be the same as that of the coating liquid (for example, 3 to 4%), and is lower than that. Things are enough. Furthermore, if the restoration ink 61 is obtained by diluting the coating liquid, the solid content concentration of the restoration ink 61 is lowered, so that the strong solvent for dissolving the solid content can also be lowered. Then, the inventor of the present application makes the solvent component ratio (strong solvent / weak solvent) of the repair ink 61 lower than the solvent component ratio (strong solvent / weak solvent) of the coating solution, that is, the ratio of the strong solvent. By reducing the number, the portion 30s where the alignment film 30 is dissolved can be reduced. As a result, it has been conceived that the generation of the protrusion (peripheral part) 35b located at the peripheral edge can be suppressed.
 本実施形態の構成によれば、インクジェット方式で塗布液を吐出することによって基板の表面に配向膜30を形成した後に、修復インク61を付与することによって配向膜30の欠損部位50を修復する。そして、塗布液(インクジェット用)は、配向膜30を構成する材料からなる固形分と、固形分を溶解する強溶媒と、調整用溶媒(弱溶媒)とを含んでいる。修復インク61は、塗布液の固形分濃度よりも低い固形分濃度を有し、かつ、修復インク61の溶媒割合(強溶媒/弱溶媒)は、塗布液の溶媒割合(強溶媒/弱溶媒)よりも低い。したがって、修復インク61が配向膜30を溶解させる量を減らすことができ、その結果、修復インク61の周縁に位置する箇所に、突起部(周縁部)35bが発生することを抑制することが可能となる。すなわち、特定の材料(例えば、光配向性の材料)からなる配向膜30を用いた場合でも、図5(a)から(c)に示したような修復工程を実行することが可能となる。 According to the configuration of the present embodiment, after forming the alignment film 30 on the surface of the substrate by discharging the coating liquid by an ink jet method, the repairing ink 61 is applied to repair the defective portion 50 of the alignment film 30. And the coating liquid (for inkjet) contains the solid content which consists of the material which comprises the alignment film 30, the strong solvent which melt | dissolves solid content, and the solvent for adjustment (weak solvent). The repair ink 61 has a solid content concentration lower than the solid content concentration of the coating liquid, and the solvent ratio (strong solvent / weak solvent) of the repair ink 61 is the solvent ratio (strong solvent / weak solvent) of the coating liquid. Lower than. Accordingly, it is possible to reduce the amount of the repair ink 61 that dissolves the alignment film 30, and as a result, it is possible to prevent the protrusion (peripheral portion) 35 b from being generated at a position located at the periphery of the repair ink 61. It becomes. That is, even when the alignment film 30 made of a specific material (for example, photo-alignment material) is used, it is possible to execute the repairing process as shown in FIGS.
 次に、図9から図13を参照しながら、本実施形態の液晶パネルの製造方法、特に、配向膜の修復方法について説明する。図9から図11は、本実施形態の製造方法に用いるインクジェット方式の塗布装置200の構成を示す図である。また、図12は、本実施形態の配向膜の修復装置300の構成を示す図である。 Next, a manufacturing method of the liquid crystal panel according to the present embodiment, in particular, a method for repairing the alignment film will be described with reference to FIGS. 9 to 11 are diagrams showing the configuration of an ink jet type coating apparatus 200 used in the manufacturing method of the present embodiment. FIG. 12 is a diagram illustrating a configuration of the alignment film repairing apparatus 300 according to the present embodiment.
 図9に示した塗布装置200は、基板70に塗布液をインクジェット方式によって塗布する装置(インクジェット成膜装置)である。本実施形態の塗布装置200は、基板70に塗布液(溶液)を吐出するノズル(不図示)を含むヘッド部72と、基板70を保持するステージ74とを備えている。本実施形態の構成では、ヘッド部72には、複数のインクジェットヘッドがヘッドカバーに収納されて配列されている。また、一つのインクジェットヘッドには、複数のノズルが形成されている。また、ノズルから溶液が吐出される面(吐出面)は、基板70の表面に対向して配置されている。また、本実施形態では、ヘッド部72からの塗布液の吐出によって基板70の表面に配向膜(30)を形成する。 The coating apparatus 200 shown in FIG. 9 is an apparatus (inkjet film forming apparatus) that applies a coating liquid to the substrate 70 by an inkjet method. The coating apparatus 200 of this embodiment includes a head unit 72 including a nozzle (not shown) that discharges a coating solution (solution) to the substrate 70 and a stage 74 that holds the substrate 70. In the configuration of the present embodiment, a plurality of inkjet heads are housed and arranged in the head cover 72 in the head cover. In addition, a plurality of nozzles are formed in one inkjet head. In addition, a surface (discharge surface) from which the solution is discharged from the nozzle is disposed to face the surface of the substrate 70. In the present embodiment, the alignment film (30) is formed on the surface of the substrate 70 by discharging the coating liquid from the head portion 72.
 本実施形態の塗布装置200には、ヘッド部72とステージ74とを相対的に移動させる移動装置76が設けられている(矢印71a、71b参照)。本実施形態の構成では、ヘッド部72が固定式で、ステージ74が可動式の構成を採用しているが、ステージ74を固定式にして、ヘッド部72を可動式にすることも可能である。ただし、ヘッド部72にはインクジェット塗布用の溶液を供給する配管(不図示)が連結されているので、ヘッド部72を固定式の構成にしておくことについて技術的な利点がある。加えて、塗布前の基板70は、前工程からの基板70を搬送する搬送装置(不図示)からステージ74の上に載置されるとともに、塗布後の基板70は後工程に移動させるものであるから、ステージ74を可動式の構成にしておくことについて技術的な利点もある。 The coating apparatus 200 of the present embodiment is provided with a moving device 76 that relatively moves the head portion 72 and the stage 74 (see arrows 71a and 71b). In the configuration of the present embodiment, the head unit 72 is fixed and the stage 74 is movable. However, the stage 74 can be fixed and the head unit 72 can be movable. . However, since a pipe (not shown) for supplying an inkjet coating solution is connected to the head portion 72, there is a technical advantage in that the head portion 72 has a fixed configuration. In addition, the substrate 70 before coating is placed on the stage 74 from a transport device (not shown) that transports the substrate 70 from the previous process, and the substrate 70 after coating is moved to the subsequent process. Thus, there is also a technical advantage in keeping the stage 74 in a movable configuration.
 また、本実施形態の移動装置76には、その移動装置76の移動を制御する制御装置78が接続されている。制御装置78は、例えば、パーソナルコンピュータ(PC)であり、例えば、移動装置76の移動を制御できるプログラム(ステージ制御プログラム)が格納された記憶装置(例えば、ハードディスク、半導体メモリ、光ディスクなど)、中央演算回路(CPU)、入出力装置(ディスプレイ、キーボード、マウスなど)から構成されている。本実施形態の構成では、制御装置78の制御によって、基板70を保持したステージ74をX-Y方向に移動させることができる。また、本実施形態の制御装置78は、ヘッド部72からの溶液の吐出を制御することも可能である。加えて、ヘッド部72の高さ制御(Z方向の制御)も行うことができる。 Further, a control device 78 that controls the movement of the moving device 76 is connected to the moving device 76 of the present embodiment. The control device 78 is, for example, a personal computer (PC), for example, a storage device (for example, a hard disk, a semiconductor memory, an optical disk, etc.) in which a program (stage control program) that can control the movement of the moving device 76 is stored, a center An arithmetic circuit (CPU) and input / output devices (display, keyboard, mouse, etc.) are included. In the configuration of the present embodiment, the stage 74 holding the substrate 70 can be moved in the XY direction under the control of the control device 78. Further, the control device 78 of this embodiment can also control the discharge of the solution from the head unit 72. In addition, the height of the head unit 72 (control in the Z direction) can also be performed.
 本実施形態の基板70は、例えば、ガラス基板であり、本実施形態における基板70は、液晶パネル用のガラス基板である。図示した例では、基板70は、液晶パネルの寸法に切り出す前のマザーガラスである。基板70としてのマザーガラスの寸法は1辺が1メートル以上あり、具体的には、基板70が第10世代のマザーガラスの場合、その寸法は2880mm(W)×3130mm(L)である。なお、基板70は、液晶パネルの寸法に切り出す前のマザーガラスに限らず、切り出した後の液晶パネルのサイズのガラスであってもよい。さらに、基板70は、薄膜トランジスタ(TFT)が作製されるアレイ基板(またはその作製途中のもの)であってもよいし、カラーフィルタ(CF)が形成されるCF基板(またはその作製途中のもの)であってもよい。なお、基板70は、ガラス基板の他、樹脂基板であっても構わない。 The substrate 70 of the present embodiment is, for example, a glass substrate, and the substrate 70 of the present embodiment is a glass substrate for a liquid crystal panel. In the illustrated example, the substrate 70 is a mother glass before being cut out to the dimensions of the liquid crystal panel. The size of the mother glass as the substrate 70 is 1 meter or more on one side. Specifically, when the substrate 70 is a 10th generation mother glass, the size is 2880 mm (W) × 3130 mm (L). The substrate 70 is not limited to the mother glass before being cut out to the dimensions of the liquid crystal panel, but may be glass having the size of the liquid crystal panel after being cut out. Further, the substrate 70 may be an array substrate on which a thin film transistor (TFT) is manufactured (or a product in the middle of manufacturing), or a CF substrate on which a color filter (CF) is formed (or a device in the middle of manufacturing thereof). It may be. The substrate 70 may be a resin substrate in addition to a glass substrate.
 本実施形態のヘッド部72は、ステージ74の上に載置される基板70を横切るような長さを有している。この例では、ヘッド部72の長手方向はY方向に延びている。なお、本実施形態の基板70が第10世代のマザーガラスである場合には、ヘッド部72の長手方向長さ(Y方向に延びる長さ)は、約3メートルまたはそれ以上になる。 The head portion 72 of the present embodiment has a length that crosses the substrate 70 placed on the stage 74. In this example, the longitudinal direction of the head portion 72 extends in the Y direction. When the substrate 70 of the present embodiment is a 10th generation mother glass, the longitudinal length of the head portion 72 (length extending in the Y direction) is about 3 meters or more.
 本実施形態の塗布装置200は、ヘッド部72のノズル(不図示)から塗布液を吐出させながら、基板70の上方を移動して配向膜(30)を形成する。ここでの塗布液は、例えば、ポリイミド液、または、ポリアミック酸もしくはその誘導体を含む溶液である。上述したように、塗布液は、配向膜を構成する材料からなる固形分と、固形分を溶解する強溶媒(例えば、NMP)と、調整用溶媒とを含んでいる。 The coating apparatus 200 of the present embodiment forms an alignment film (30) by moving over the substrate 70 while discharging a coating liquid from a nozzle (not shown) of the head portion 72. The coating solution here is, for example, a polyimide solution or a solution containing polyamic acid or a derivative thereof. As described above, the coating liquid contains a solid content made of a material constituting the alignment film, a strong solvent (for example, NMP) that dissolves the solid content, and an adjustment solvent.
 なお、図9に示した構成では、長方形の基板70の長辺(L)または短辺(W)が延びる方向に沿って、基板70を移動させたが、図10に示すように、長方形の基板70を斜めにして、基板70を移動させることも可能である(矢印71a、71b)。基板70を斜めにして移動させることによって、基板70(例えば、アレイ基板)のパターンに依存して、ヘッド部72からの溶液(塗布液)が所定の濡れ広がりを示す結果、基板70の特定部位が濡れ難いという現象を緩和できる場合があるからである。 In the configuration shown in FIG. 9, the substrate 70 is moved along the direction in which the long side (L) or the short side (W) of the rectangular substrate 70 extends. However, as shown in FIG. It is also possible to move the substrate 70 with the substrate 70 inclined ( arrows 71a and 71b). By moving the substrate 70 obliquely, depending on the pattern of the substrate 70 (for example, the array substrate), the solution (coating liquid) from the head portion 72 exhibits a predetermined wet spread, so that a specific part of the substrate 70 is obtained. This is because there is a case where it is possible to alleviate the phenomenon that it is difficult to get wet.
 図11は、本実施形態の塗布装置200の構成の一例を示している。図11では、ヘッド部72の底面に位置するインクジェットヘッド73およびノズル73aが表されるようにしている。なお、図11に示した例では、インクジェットヘッド73は、一列に配列されずに、一つおきに斜めに位置するように配列されているが、それに限らず他の配列を採用してもよい。 FIG. 11 shows an example of the configuration of the coating apparatus 200 of the present embodiment. In FIG. 11, an ink jet head 73 and a nozzle 73a located on the bottom surface of the head portion 72 are shown. In the example shown in FIG. 11, the inkjet heads 73 are not arranged in a line but are arranged so as to be diagonally arranged, but not limited thereto, other arrangements may be adopted. .
 インクジェットヘッド73は、ヘッド部72に例えば数十個収納されている。また、各インクジェットヘッド73には、塗布液が吐出される複数のノズル73aが形成されている。一つのインクジェットヘッド73に、ノズル73aは例えば数百個形成されている。なお、図11に示したノズル73aの配列は、千鳥形状になっているが、ノズル73aを一列に配列させてもよい。あるいは、ノズル73aの配列を二段の千鳥形状でなく、他の配列(例えば、三段の斜め配列)にすることも可能である。 For example, several tens of inkjet heads 73 are stored in the head unit 72. Each ink jet head 73 is formed with a plurality of nozzles 73a from which the coating liquid is discharged. For example, several hundreds of nozzles 73 a are formed in one inkjet head 73. In addition, although the arrangement | sequence of the nozzle 73a shown in FIG. 11 is staggered, you may arrange the nozzle 73a in a line. Alternatively, the arrangement of the nozzles 73a is not limited to a two-stage zigzag shape, but may be another arrangement (for example, a three-stage diagonal arrangement).
 ヘッド部72のインクジェットヘッド73は、塗布液供給部(例えば、ポリイミド供給タンク)80、及び、廃液部(例えば、廃液タンク)82に接続されている。具体的には、各インクジェットヘッド73は、分岐配管87を介して供給配管85、および、分岐配管89を介して廃液配管86に接続されている。供給配管85は塗布液供給部80に接続されており、一方、廃液配管86は、廃液部82に接続されている。 The inkjet head 73 of the head unit 72 is connected to a coating liquid supply unit (for example, a polyimide supply tank) 80 and a waste liquid unit (for example, a waste liquid tank) 82. Specifically, each inkjet head 73 is connected to a supply pipe 85 via a branch pipe 87 and to a waste liquid pipe 86 via a branch pipe 89. The supply pipe 85 is connected to the coating liquid supply part 80, while the waste liquid pipe 86 is connected to the waste liquid part 82.
 そして、塗布液供給部80中の塗布液は、矢印81に示すように供給配管85を進み、分岐配管87を通ってインクジェットヘッド73に供給される。そして、インクジェットヘッド73内の廃液は、分岐配管89を通って、矢印83に示すように廃液配管86を進んで廃液部82に移動する。ここで、バルブ88(88a、88b)を調整することによって、配管85およびインクジェットヘッド73の溶液の圧力を一定にする処理を行うことも可能である。そのような処理は、図9に示した制御装置78の制御に基づいて実行するようにしてもよい。 Then, the coating liquid in the coating liquid supply unit 80 advances through the supply pipe 85 as indicated by an arrow 81 and is supplied to the inkjet head 73 through the branch pipe 87. Then, the waste liquid in the ink jet head 73 passes through the branch pipe 89, travels through the waste liquid pipe 86 as indicated by an arrow 83, and moves to the waste liquid section 82. Here, by adjusting the valve 88 (88a, 88b), it is possible to perform a process of making the pressure of the solution in the pipe 85 and the inkjet head 73 constant. Such processing may be executed based on the control of the control device 78 shown in FIG.
 上述した塗布装置200によって、基板70の表面に配向膜30を形成することができるが、その配向膜30に欠損部位(50)が生じる場合がある。例えば、多数のノズル73aのうちの一つが塗布液を吐出しなければ、その箇所が欠損部位(50)となる可能性がある。そして、その欠損部位(50)を修復するための装置の一例を図12に示す。 Although the alignment film 30 can be formed on the surface of the substrate 70 by the coating apparatus 200 described above, a defect site (50) may be generated in the alignment film 30 in some cases. For example, if one of the large number of nozzles 73a does not discharge the coating liquid, that part may become a defective part (50). An example of an apparatus for repairing the defect site (50) is shown in FIG.
 図12は、本実施形態の修復装置300の構成を模式的に示している。本実施形態の修復装置300は、配向膜30の欠損部位50を修復する装置である。修復装置300は、上述した修復インク61を用いて修復工程を実行することができる。また、図13は、修復装置300の構成を示すブロック図である。 FIG. 12 schematically shows the configuration of the repair device 300 of the present embodiment. The repair device 300 of the present embodiment is a device that repairs the defect site 50 of the alignment film 30. The repair device 300 can execute a repair process using the repair ink 61 described above. FIG. 13 is a block diagram illustrating a configuration of the repair device 300.
 図示した修復装置300は、本実施形態の修復インク61が付与される修復スタンプ60と、修復スタンプ60を移動させる移動装置120と、移動装置120を制御する制御装置110とから構成されている。なお、図12では、移動装置120および制御装置110は省略している。 The illustrated repair device 300 includes a repair stamp 60 to which the repair ink 61 of the present embodiment is applied, a moving device 120 that moves the repair stamp 60, and a control device 110 that controls the moving device 120. In FIG. 12, the moving device 120 and the control device 110 are omitted.
 図12に示した構成例では、本実施形態の修復インク61を供給するための供給ボックス98とともに、修復領域55を有する基板(例えば、アレイ基板またはCF基板)70を保持するステージ90が設けられている。ステージ90の上には、基板70として、配向膜30が形成されたガラス基板が配置されている。本実施形態の配向膜30は、上述したようにインクジェット方式によって形成されている。なお、基板70は、液晶パネルの寸法に切り出す前のマザーガラスであってもよいし、切り出した後の液晶パネルのサイズのガラスであってもよい。 In the configuration example shown in FIG. 12, a stage 90 for holding a substrate (for example, an array substrate or a CF substrate) 70 having a repair region 55 is provided together with a supply box 98 for supplying the repair ink 61 of the present embodiment. ing. A glass substrate on which the alignment film 30 is formed is disposed on the stage 90 as the substrate 70. As described above, the alignment film 30 of this embodiment is formed by the ink jet method. The substrate 70 may be mother glass before being cut out to the dimensions of the liquid crystal panel, or may be glass having the size of the liquid crystal panel after being cut out.
 供給ボックス98は、修復スタンプ60を洗浄する洗浄部98aと、修復インク61を供給するインク供給部98bとを備えている。修復インク61は、上述したように、塗布液の固形分濃度よりも低い固形分濃度を有し、かつ、修復インク61の溶媒割合(強溶媒/弱溶媒)を、塗布液の溶媒割合(強溶媒/弱溶媒)よりも低くした溶液である。また、洗浄部98aおよびインク供給部98bの下方には廃液受け部98cが設けられている。なお、廃液受け部98cは、廃液回収タンク99に連結されている。 The supply box 98 includes a cleaning unit 98 a that cleans the repair stamp 60 and an ink supply unit 98 b that supplies the repair ink 61. As described above, the repair ink 61 has a solid content concentration lower than the solid content concentration of the coating liquid, and the solvent ratio (strong solvent / weak solvent) of the repair ink 61 is set to the solvent ratio (strong solvent) of the coating liquid. (Solvent / weak solvent). A waste liquid receiving part 98c is provided below the cleaning part 98a and the ink supply part 98b. The waste liquid receiver 98c is connected to the waste liquid recovery tank 99.
 修復スタンプ60は、スタンプ用治具62に接続されている。また、スタンプ用治具62は、移動装置120に接続されており、制御装置110による制御によって移動装置120を介して、スタンプ60は移動して、所定の塗布動作を実行する。さらに、基板12を保持するステージ90も、制御装置110によって制御可能であり、加えて、ステージ90およびスタンプ60を共に、制御装置110によって連動して移動させることも可能である。具体的には、スタンプ60を移動させる場合において、スタンプ60を固定しておいて、代わりに、ステージ90を移動させるような連動をさせることも可能である。 The repair stamp 60 is connected to a stamp jig 62. The stamp jig 62 is connected to the moving device 120, and the stamp 60 moves through the moving device 120 under the control of the control device 110 to execute a predetermined coating operation. Furthermore, the stage 90 that holds the substrate 12 can also be controlled by the control device 110, and in addition, both the stage 90 and the stamp 60 can be moved together by the control device 110. Specifically, when the stamp 60 is moved, it is possible to fix the stamp 60 and perform an interlocking operation to move the stage 90 instead.
 本実施形態の制御装置110には、図13に示すように、記憶装置112、入力装置114、出力装置116が接続されている。制御装置110は、例えば、CPU(中央演算ユニット)から構成されている。記憶装置112は、ハードディスク、半導体メモリ、光ディスク(CD、DVDなど)、光磁気ディスク(MO)などである。入力装置114は、例えば、キーボード、マウス、タッチパネルなどであり、出力装置116は、表示デバイス(液晶ディスプレイ、CRT、有機ELディスプレイなど)または印字デバイス(レーザプリンターなど)である。制御装置110、記憶装置112、入力装置114および出力装置116は、パーソナル・コンピュータ(PC)によって構築することが可能である。 As shown in FIG. 13, a storage device 112, an input device 114, and an output device 116 are connected to the control device 110 of the present embodiment. The control device 110 is composed of, for example, a CPU (Central Processing Unit). The storage device 112 is a hard disk, a semiconductor memory, an optical disk (CD, DVD, etc.), a magneto-optical disk (MO), or the like. The input device 114 is, for example, a keyboard, a mouse, a touch panel, and the output device 116 is a display device (liquid crystal display, CRT, organic EL display, etc.) or a printing device (laser printer, etc.). The control device 110, the storage device 112, the input device 114, and the output device 116 can be constructed by a personal computer (PC).
 制御装置110に接続された記憶装置112には、配向膜修復プログラム113が格納されている。配向膜修復プログラム113は、修復装置300の動作を制御するプログラムであり、ここには、修復スタンプ60の移動を制御するプログラムが含まれている。本実施形態の配向膜修復プログラム113は、修復インク61を供給するインク供給部98bに修復スタンプ60を移動するステップと、修復領域55に修復スタンプ60を配置するステップとを含む工程を修復装置300に実行させるプログラムである。より具体的には、本実施形態の配向膜修復プログラム113は、図12中の矢印91から矢印97(後述)および矢印52に示した動作を実行させるプログラムである。 An alignment film repair program 113 is stored in the storage device 112 connected to the control device 110. The alignment film repair program 113 is a program that controls the operation of the repair device 300, and includes a program that controls the movement of the repair stamp 60. The alignment film repair program 113 according to this embodiment includes a process including a step of moving the repair stamp 60 to the ink supply unit 98 b that supplies the repair ink 61 and a step of placing the repair stamp 60 in the repair region 55. This is a program to be executed. More specifically, the alignment film repair program 113 of the present embodiment is a program for executing operations indicated by arrows 91 to 97 (described later) and an arrow 52 in FIG.
 本実施形態の修復装置300には、配向膜30の欠損部位50を検査する検査装置130が含まれている。検査装置130は、制御装置110に接続されており、検査装置130によって検出された欠損部位50のデータは、制御装置110および記憶装置112に出力される。検査装置130は、撮像素子(例えば、CCD、CMOSイメージセンサ)から構成されている。また、検査装置130には、撮像素子によって得られたイメージデータから欠損部位50を検出するソフトウエアも含まれているが、このソフトウエアは、記憶装置112に格納することも可能である。また、欠損部位50のデータから修復領域55を規定する処理は、制御装置110で行うことも可能であるし、検査装置130で行うことも可能である。なお、検査装置130は、配向膜30の欠損部位50を検出することができる機能を有していれば、具体的な構成は特に限定されるものではなく、適宜好適なものを採用することができる。 The repair device 300 of the present embodiment includes an inspection device 130 that inspects the defect site 50 of the alignment film 30. The inspection device 130 is connected to the control device 110, and data on the defect site 50 detected by the inspection device 130 is output to the control device 110 and the storage device 112. The inspection device 130 includes an image sensor (for example, a CCD or a CMOS image sensor). The inspection device 130 also includes software for detecting the defect site 50 from the image data obtained by the image sensor, but this software can also be stored in the storage device 112. Further, the process of defining the repair region 55 from the data of the defect site 50 can be performed by the control device 110 or can be performed by the inspection device 130. Note that the specific configuration of the inspection device 130 is not particularly limited as long as it has a function of detecting the defect site 50 of the alignment film 30, and a suitable one may be adopted as appropriate. it can.
 なお、本実施形態の修復装置300を構成する各要素(制御装置110など)の接続は、電気的接続に限らず、例えば、無線接続、光接続などを採用することが可能である。また、制御装置110と記憶装置112とを一体の構成にすることも可能であるし、入力装置114及び出力装置116とを一体の構成(例えば、タッチパネル式ディスプレイ)にすることも可能である。また、接続の一部をインターネットを経由したものにすることも可能であり、例えば、制御装置110と記憶装置112との間の接続をインターネットを経由するものにして、記憶装置112は、制御装置110とは離れた場所にあるサーバ内のハードディスクなどを使用することも可能である。 In addition, the connection of each element (control apparatus 110 etc.) which comprises the repair apparatus 300 of this embodiment is not restricted to an electrical connection, For example, a wireless connection, an optical connection, etc. are employable. In addition, the control device 110 and the storage device 112 can be integrated, and the input device 114 and the output device 116 can be integrated (for example, a touch panel display). Further, a part of the connection can be made via the Internet. For example, the connection between the control device 110 and the storage device 112 is made via the Internet. It is also possible to use a hard disk or the like in a server at a location remote from 110.
 本実施形態の修復装置300を用いて修復動作を実行する場合、以下のようにすればよい。なお、上述したように、修復スタンプ60の移動は、制御装置110によって制御された移動装置120によって実行される。また、本実施形態の移動装置120は、修復スタンプ60をX方向、Y方向、Z方向の何れにも移動させることが可能である。 When executing the repair operation using the repair device 300 of the present embodiment, the following operation may be performed. As described above, the movement of the repair stamp 60 is executed by the moving device 120 controlled by the control device 110. In addition, the moving device 120 of the present embodiment can move the repair stamp 60 in any of the X direction, the Y direction, and the Z direction.
 図12に示すように、まず、修復スタンプ60の底面を洗浄部98aに接触させて(矢印91参照)、修復スタンプ60を洗浄する。洗浄部98aには、洗浄溶剤(例えば、N-メチルピロリドン)が含まれている。その後、洗浄された修復スタンプ60を移動して(矢印92参照)、次いで、修復スタンプ60の底面をインク供給部98bに接触させる(矢印93参照)。すると、修復スタンプ60に修復インク61が付着する。 As shown in FIG. 12, the repair stamp 60 is first cleaned by bringing the bottom surface of the repair stamp 60 into contact with the cleaning section 98a (see arrow 91). The cleaning unit 98a contains a cleaning solvent (for example, N-methylpyrrolidone). Thereafter, the cleaned repair stamp 60 is moved (see arrow 92), and then the bottom surface of the repair stamp 60 is brought into contact with the ink supply unit 98b (see arrow 93). Then, the repair ink 61 adheres to the repair stamp 60.
 次に、修復インク61が付着した修復スタンプ60を移動させて、ステージ90の上方に配置する(矢印94参照)。次いで、修復スタンプ60は、基板12の修復領域55に移動し(矢印95)、そこで、修復工程が実行されて(矢印52)、修復層35が形成される。より詳細な修復工程の一例は、図5(a)から(c)で説明した通りである。 Next, the repair stamp 60 with the repair ink 61 attached is moved and placed above the stage 90 (see arrow 94). The repair stamp 60 then moves to the repair region 55 of the substrate 12 (arrow 95) where a repair process is performed (arrow 52) to form the repair layer 35. An example of a more detailed repair process is as described with reference to FIGS.
 その後、修復インク61が無くなった修復スタンプ60は移動し(矢印96参照)、次の修復工程のために、インク供給部98bまで戻っていく(矢印97参照)。次の修復工程を開始する場合には、インク供給部98bで修復インク61を補給して(矢印93参照)、以降は再び同様の処理を行えばよい。 Thereafter, the repair stamp 60 that has run out of the repair ink 61 moves (see arrow 96) and returns to the ink supply unit 98b (see arrow 97) for the next repair process. When starting the next repairing process, the repairing ink 61 is replenished by the ink supply unit 98b (see arrow 93), and thereafter the same processing may be performed again.
 例えば、図14に示した例では、基板12上に修復領域55は2つ(55a、55b)存在する。したがって、修復領域55aで1回修復工程を行い、次いで、修復領域55bでもう1回修復工程を実行すればよい。 For example, in the example shown in FIG. 14, there are two repair regions 55 (55a, 55b) on the substrate 12. Therefore, the repair process is performed once in the repair area 55a, and then the repair process is performed once more in the repair area 55b.
 上述の実施形態では、例えば図2及び図3において、スリット33およびリブ34が形成された構造を示したが、本発明の実施形態に係る技術は、そのようなスリット33およびリブ34が形成されていない構造にも適用可能である。特に、光配向法を用いた配向膜(光配向膜)を有する液晶パネルの場合、スロットまたはリブを設けずに、優れた視野特性を達成することができる。さらに説明すると、本実施形態の配向膜30として、光照射によって配向方向が規定されている光配向膜を使用することも可能である。すなわち、光配向法を用いて液晶分子のプレチルト方向を規定する手法を用いることもできる。光配向法は、光配向膜に偏光を照射することによってプレチルト角を設定するものである。光配向法では、光照射によって配向方向を規定する光照射ステップを行うので、ラビング法と異なり、非接触プロセスである。それゆえ、静電気の発生等が生じない利点を有している。 In the above-described embodiment, for example, in FIGS. 2 and 3, the structure in which the slit 33 and the rib 34 are formed is shown. However, in the technique according to the embodiment of the present invention, such a slit 33 and the rib 34 are formed. It is also applicable to structures that are not. In particular, in the case of a liquid crystal panel having an alignment film (photo-alignment film) using a photo-alignment method, excellent visual field characteristics can be achieved without providing slots or ribs. More specifically, as the alignment film 30 of the present embodiment, it is possible to use a photo-alignment film whose alignment direction is defined by light irradiation. That is, a method of defining the pretilt direction of the liquid crystal molecules using a photo-alignment method can also be used. The photo-alignment method sets the pretilt angle by irradiating the photo-alignment film with polarized light. Unlike the rubbing method, the photo-alignment method is a non-contact process because a light irradiation step that defines the alignment direction by light irradiation is performed. Therefore, there is an advantage that static electricity is not generated.
 なお、配向膜30の修復工程の後は、良品のアレイ基板12と、良品のCF基板11とを対向させるとともに、CF基板11とアレイ基板12との間に液晶層13を形成する。液晶層13は、例えば、滴下注入法を用いて形成することができる。液晶層13を挟むCF基板11とアレイ基板12を含む構造体を形成した後は、CF基板11とアレイ基板12の外側に偏光板17、18を貼り付ける。ノーマリーホワイト型の場合には、偏光板17、18は、互いの偏光軸が直交するように配置される。このようにして、本実施形態の液晶パネル10が得られる。 In addition, after the repair process of the alignment film 30, the non-defective array substrate 12 and the non-defective CF substrate 11 are opposed to each other, and the liquid crystal layer 13 is formed between the CF substrate 11 and the array substrate 12. The liquid crystal layer 13 can be formed using, for example, a dropping injection method. After the structure including the CF substrate 11 and the array substrate 12 sandwiching the liquid crystal layer 13 is formed, polarizing plates 17 and 18 are attached to the outside of the CF substrate 11 and the array substrate 12. In the case of a normally white type, the polarizing plates 17 and 18 are arranged so that their polarization axes are orthogonal to each other. Thus, the liquid crystal panel 10 of this embodiment is obtained.
 また、本発明の実施形態に係る技術は、液晶層13を構成する液晶分子を垂直に配向させる液晶パネルに限らず、垂直配向タイプ以外の液晶パネルの配向膜30の修復にも適用可能である。加えて、液晶表示装置100のバックライト20の構成は図1に示した直下型方式に限らず、他の構成(例えば、エッジライト方式)であっても構わない。 The technology according to the embodiment of the present invention is not limited to the liquid crystal panel in which the liquid crystal molecules constituting the liquid crystal layer 13 are vertically aligned, but can also be applied to the repair of the alignment film 30 of liquid crystal panels other than the vertical alignment type. . In addition, the configuration of the backlight 20 of the liquid crystal display device 100 is not limited to the direct type shown in FIG. 1, but may be another configuration (for example, an edge light method).
 以上、本発明を好適な実施形態により説明してきたが、こうした記述は限定事項ではなく、勿論、種々の改変が可能である。 As mentioned above, although this invention has been demonstrated by suitable embodiment, such description is not a limitation matter and, of course, various modifications are possible.
 本発明によれば、より容易に配向膜の欠損部位を修復することができる液晶パネルの製造方法を提供することができる。 According to the present invention, it is possible to provide a method for manufacturing a liquid crystal panel that can more easily repair a defective portion of an alignment film.
 10 液晶パネル
 11 CF基板
 12 アレイ基板
 15 シール材
 17、18 偏光板
 20 バックライト
 22 光源
 24 ケース
 26 光学シート
 28 フレーム
 29 ベゼル
 30 配向膜
 31 絶縁層
 32 絶縁層
 33 スリット
 34 リブ
 35 修復層
 35a 中央部(平担部)
 35b 周縁部(突起部)
 36 カラーフィルタ
 37 遮光層
 41 ソース配線
 42 ゲート配線
 44 スイッチング素子
 46 画素電極
 48 対向電極
 50 欠損部位
 55 修復領域
 57 修復領域
 60 修復スタンプ
 61 修復インク
 62 スタンプ用治具
 70 基板
 72 ヘッド部
 73 インクジェットヘッド
 73a ノズル
 74 ステージ
 76 移動装置
 78 制御装置
 80 塗布液供給部
 82 廃液部
 85 供給配管
 86 廃液配管
 87 分岐配管
 88 バルブ
 89 分岐配管
 90 ステージ
 98 供給ボックス
 98a 洗浄部
 98b インク供給部
 98c 廃液受け部
 99 廃液回収タンク
100 液晶表示装置
110 制御装置
112 記憶装置
113 配向膜修復プログラム
114 入力装置
116 出力装置
120 移動装置
130 検査装置
200 塗布装置
300 修復装置
DESCRIPTION OF SYMBOLS 10 Liquid crystal panel 11 CF board | substrate 12 Array board | substrate 15 Sealing material 17,18 Polarizing plate 20 Backlight 22 Light source 24 Case 26 Optical sheet 28 Frame 29 Bezel 30 Alignment film 31 Insulating layer 32 Insulating layer 33 Slit 34 Rib 35 Repair layer 35a Center part (Platform)
35b Perimeter (projection)
36 color filter 37 light shielding layer 41 source wiring 42 gate wiring 44 switching element 46 pixel electrode 48 counter electrode 50 defective portion 55 repair region 57 repair region 57 repair stamp 61 repair ink 62 stamp jig 70 substrate 72 head unit 73 inkjet head 73a Nozzle 74 Stage 76 Moving device 78 Control device 80 Coating liquid supply part 82 Waste liquid part 85 Supply pipe 86 Waste liquid pipe 87 Branch pipe 88 Valve 89 Branch pipe 90 Stage 98 Supply box 98a Cleaning part 98b Ink supply part 98c Waste liquid receiving part 99 Waste liquid recovery Tank 100 Liquid crystal display device 110 Control device 112 Storage device 113 Alignment film repair program 114 Input device 116 Output device 120 Moving device 130 Inspection device 200 Coating device 300 Repair device

Claims (6)

  1.  液晶パネルの製造方法であって、
     インクジェット方式で塗布液を吐出することによって基板の表面に配向膜を形成する工程と、
     修復インクを付与することによって前記配向膜の欠損部位を修復する工程と
     を含み、
     前記配向膜を形成する工程における前記塗布液は、
           前記配向膜を構成する材料からなる固形分と、
           前記固形分を溶解する強溶媒と、
           前記強溶媒よりも前記固形分に対する溶解性の劣る調整用溶媒と
     を含み、
     前記修復インクは、前記塗布液に含まれている前記固形分の濃度よりも低い固形分濃度を有し、かつ、
     前記修復インクは、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)よりも低い溶媒割合(強溶媒/調整用溶媒)を有することを特徴とする、液晶パネルの製造方法。
    A method of manufacturing a liquid crystal panel,
    Forming an alignment film on the surface of the substrate by discharging a coating solution by an inkjet method; and
    Repairing the defective portion of the alignment film by applying a repair ink, and
    The coating solution in the step of forming the alignment film is:
    A solid content made of a material constituting the alignment film;
    A strong solvent that dissolves the solids;
    A solvent for adjustment that is less soluble in the solid content than the strong solvent, and
    The repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and
    The repair ink has a solvent ratio (strong solvent / adjusting solvent) lower than a solvent ratio (strong solvent / adjusting solvent) of the strong solvent to the adjusting solvent in the coating liquid. Production method.
  2.  前記修復インクの固形分濃度は、前記塗布液の固形分濃度の1/10以下である、請求項1に記載の液晶パネルの製造方法。 The method for producing a liquid crystal panel according to claim 1, wherein the solid content concentration of the repair ink is 1/10 or less of the solid content concentration of the coating liquid.
  3.  前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)は、50/50である、請求項1または2に記載の液晶パネルの製造方法。 The method for producing a liquid crystal panel according to claim 1 or 2, wherein the solvent ratio of the strong solvent to the solvent for adjustment in the coating solution (strong solvent / solvent for adjustment) is 50/50.
  4.  互いに対向する一対の基板と、
     前記一対の基板の間に配置された液晶層とを備え、
     前記基板のうち前記液晶層に接する面には配向膜が形成されており、
     前記配向膜の欠損部位には、修復層が形成されており、
     前記配向膜は、インクジェット方式で塗布液を吐出することによって形成されており、
     前記修復層は、修復インクを付与することによって形成されており、
     前記塗布液は、
           前記配向膜を構成する材料からなる固形分と、
           前記固形分を溶解する強溶媒と、
           前記強溶媒よりも前記固形分に対する溶解性の劣る調整用溶媒と
     を含み、
     前記修復インクは、前記塗布液に含まれている前記固形分の濃度よりも低い固形分濃度を有し、かつ、
     前記修復インクは、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)よりも低い溶媒割合(強溶媒/調整用溶媒)を有することを特徴とする、液晶パネル。
    A pair of substrates facing each other;
    A liquid crystal layer disposed between the pair of substrates,
    An alignment film is formed on the surface of the substrate in contact with the liquid crystal layer,
    A repair layer is formed in the defect portion of the alignment film,
    The alignment film is formed by discharging a coating liquid by an inkjet method,
    The repair layer is formed by applying a repair ink,
    The coating liquid is
    A solid content made of a material constituting the alignment film;
    A strong solvent that dissolves the solids;
    A solvent for adjustment that is less soluble in the solid content than the strong solvent, and
    The repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and
    The liquid crystal panel, wherein the repair ink has a solvent ratio (strong solvent / adjusting solvent) lower than a solvent ratio (strong solvent / adjusting solvent) of the strong solvent to the adjusting solvent in the coating liquid.
  5.  配向膜の欠損部位を修復する装置であって、
     修復スタンプと、
     前記修復スタンプを移動させる移動装置と、
     前記移動装置を制御する制御装置と
     を備え、
     前記制御装置は、
           修復インクを供給するインク供給部に、前記修復スタンプを移動するステップと、
           前記配向膜の前記欠損部位を含む領域に、前記修復スタンプを配置するステップと
     を実行するように、前記修復スタンプの移動を制御し、
     前記配向膜は、インクジェット方式で塗布液を吐出することによって形成されており、
     前記塗布液は、
           前記配向膜を構成する材料からなる固形分と、
           前記固形分を溶解する強溶媒と、
           前記強溶媒よりも前記固形分に対する溶解性の劣る調整用溶媒と
     を含み、
     前記修復インクは、前記塗布液に含まれている前記固形分の濃度よりも低い固形分濃度を有し、かつ、
     前記修復インクは、前記塗布液における調整用溶媒に対する強溶媒の溶媒割合(強溶媒/調整用溶媒)よりも低い溶媒割合(強溶媒/調整用溶媒)を有することを特徴とする、修復装置。
    An apparatus for repairing a defective portion of an alignment film,
    Repair stamp and
    A moving device for moving the repair stamp;
    A control device for controlling the moving device,
    The control device includes:
    Moving the repair stamp to an ink supply that supplies repair ink;
    Controlling the movement of the repair stamp so as to perform the step of placing the repair stamp in a region including the defect portion of the alignment film,
    The alignment film is formed by discharging a coating liquid by an inkjet method,
    The coating liquid is
    A solid content made of a material constituting the alignment film;
    A strong solvent that dissolves the solids;
    A solvent for adjustment that is less soluble in the solid content than the strong solvent, and
    The repair ink has a solid content concentration lower than the solid content concentration contained in the coating liquid, and
    The repairing apparatus, wherein the repairing ink has a solvent ratio (strong solvent / adjusting solvent) lower than a solvent ratio (strong solvent / adjusting solvent) of the strong solvent to the adjusting solvent in the coating liquid.
  6.  さらに、前記配向膜の欠損部位を検査する検査装置を備えている、請求項5に記載の修復装置。 The repair device according to claim 5, further comprising an inspection device for inspecting a defective portion of the alignment film.
PCT/JP2011/058545 2010-04-07 2011-04-04 Liquid-crystal panel manufacturing method, liquid-crystal panel, and repair device WO2011125982A1 (en)

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US11249348B2 (en) 2017-09-08 2022-02-15 Boe Technology Group Co., Ltd. Needle for repairing alignment layer, alignment layer repairing apparatus, and method for repairing alignment layer
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