WO2011118664A1 - Liquid adhesive for electronic parts and adhesive tape - Google Patents
Liquid adhesive for electronic parts and adhesive tape Download PDFInfo
- Publication number
- WO2011118664A1 WO2011118664A1 PCT/JP2011/057056 JP2011057056W WO2011118664A1 WO 2011118664 A1 WO2011118664 A1 WO 2011118664A1 JP 2011057056 W JP2011057056 W JP 2011057056W WO 2011118664 A1 WO2011118664 A1 WO 2011118664A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- component
- adhesive
- liquid adhesive
- mass
- electronic parts
- Prior art date
Links
- 0 CC[C@](CCC1C)*1*(C(C=I1)=C)C1=C Chemical compound CC[C@](CCC1C)*1*(C(C=I1)=C)C1=C 0.000 description 2
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J109/00—Adhesives based on homopolymers or copolymers of conjugated diene hydrocarbons
- C09J109/02—Copolymers with acrylonitrile
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/04—Non-macromolecular additives inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J113/00—Adhesives based on rubbers containing carboxyl groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/27—Manufacturing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
- C08K5/3415—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/02—Organic macromolecular compounds, natural resins, waxes or and bituminous materials
- C08L2666/14—Macromolecular compounds according to C08L59/00 - C08L87/00; Derivatives thereof
- C08L2666/16—Addition or condensation polymers of aldehydes or ketones according to C08L59/00 - C08L61/00; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/414—Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of a copolymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2409/00—Presence of diene rubber
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2461/00—Presence of condensation polymers of aldehydes or ketones
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2479/00—Presence of polyamine or polyimide
- C09J2479/08—Presence of polyamine or polyimide polyimide
- C09J2479/086—Presence of polyamine or polyimide polyimide in the substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
- H01L2224/29338—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/29339—Silver [Ag] as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32245—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45138—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
- H01L2224/45144—Gold (Au) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/48247—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48245—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
- H01L2224/4826—Connecting between the body and an opposite side of the item with respect to the body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73215—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L24/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
- H01L24/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L24/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00012—Relevant to the scope of the group, the symbol of which is combined with the symbol of this group
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01006—Carbon [C]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01009—Fluorine [F]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01012—Magnesium [Mg]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01014—Silicon [Si]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0102—Calcium [Ca]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01029—Copper [Cu]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0104—Zirconium [Zr]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01045—Rhodium [Rh]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01047—Silver [Ag]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01082—Lead [Pb]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/0665—Epoxy resin
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19107—Disposition of discrete passive components off-chip wires
Definitions
- the present invention relates to a liquid adhesive for an electronic component and an adhesive tape for use in bonding between members around a lead frame constituting a semiconductor device, for example, a lead pin, a semiconductor chip mounting substrate, a heat sink, and a semiconductor chip itself.
- a semiconductor device for example, a lead pin, a semiconductor chip mounting substrate, a heat sink, and a semiconductor chip itself.
- an adhesive tape used in a resin-sealed semiconductor device there are a lead frame fixing tape, a TAB tape, and the like.
- an adhesive tape for fixing a lead frame is used as one that contributes to an improvement in production yield and productivity of the lead frame itself and the entire semiconductor assembly process by fixing lead pins of the lead frame.
- This fixing adhesive tape is usually taped onto a lead frame by a lead frame maker and then shipped to a semiconductor maker. After the IC is mounted by the semiconductor maker, the resin is sealed.
- the adhesive tape for fixing the lead frame has not only general reliability at the semiconductor level and workability during taping, but also sufficient room temperature adhesive force immediately after taping and sufficient resistance to heating in the semiconductor device assembly process. Heat resistance is required.
- an adhesive tape used for such applications for example, a synthetic rubber-based resin such as polyacrylonitrile, polyacrylic acid ester or acrylonitrile-butadiene copolymer alone on a support film such as a polyimide film, Or what modified
- resin-encapsulated semiconductor devices semiconductor packages having a structure as shown in FIGS. 1 to 3 have been developed or manufactured. In the resin-encapsulated semiconductor device of FIG.
- the lead pin 3 and the plane 2 are connected by the adhesive layer 6, the semiconductor chip 1 is mounted on the plane 2, and the bonding wire 4 between the semiconductor chip 1 and the lead pin 3. And a structure sealed with a resin 5.
- 2 has a structure in which the lead pin 3 and the semiconductor chip 1 are fixed by an adhesive layer 6 and sealed together with a bonding wire 4 by a resin 5.
- the semiconductor chip 1 is mounted on the die pad 7, the electrode 8 is fixed by the adhesive layer 6, and between the semiconductor chip 1 and the electrode 8 and between the electrode 8 and the lead pin 3. Are connected by a bonding wire 4 and sealed with a resin 5.
- an adhesive that can be bonded and cured at a relatively low temperature and has sufficient heat resistance and reliability is known (for example, , See Patent Document 1).
- reliability means that current leakage and short-circuit do not occur even under the conditions of a migration test (PCBT: Pressure Cooker Biased Test) described later.
- PCBT Pressure Cooker Biased Test
- Migration resistance means that there is no dendrite growth in the migration test without causing a short circuit.
- the present invention has been made in view of the problems as described above, and its intended treatment is that it can be bonded and cured at a low temperature, has sufficient heat resistance and reliability, and migration resistance. It is an object to provide a liquid adhesive and an adhesive tape for electronic parts that are excellent in performance.
- a liquid adhesive in which a component (a) an acrylonitrile-butadiene copolymer, a component (b) a phenol resin, and a component (c) a compound containing two or more maleimide groups are dissolved in an organic solvent.
- the component (c) contains a compound represented by the formula (1) and a compound represented by (2), which will be described later, and a liquid adhesive for electronic parts.
- the component (c) is used for electronic parts as described in (1) above, wherein the mass ratio of the compounds represented by the formulas (1) and (2) is from 3: 3 to 3:45 Liquid adhesive.
- the sum of component (b) and component (c) is 10 to 900 parts by weight with respect to 100 parts by weight of component (a), and occupies the total of component (b) and component (c)
- the electronic component according to (8), wherein the component (d) is a compound represented by the formula (4) described later, and has a weight average molecular weight of 200 to 7,000 Liquid adhesive.
- the liquid adhesive for electronic components and adhesive tape which can be adhere
- Adhesive tape for example, as lead frame fixing tape, TAB tape, etc., suitable for bonding between members around the lead frame constituting the semiconductor device, for example, lead pins, semiconductor chip mounting substrate, heat sink, semiconductor chip itself, etc. Can be used for
- the liquid adhesive for electronic parts of the present invention comprises a compound containing at least two components (a) acrylonitrile-butadiene copolymer, component (b) phenol resin, and component (c) maleimide group in an organic solvent. It is a dissolved liquid adhesive, and the component (c) is characterized by using a compound represented by the following formulas (1) and (2) in combination.
- Component (a) As the acrylonitrile-butadiene copolymer as component (a), any known acrylonitrile-butadiene copolymer can be used, but an acrylonitrile-butadiene copolymer having a carboxyl group is preferred. The reason is that the melt viscosity at the time of heating is increased, the thermal stability is improved, the compatibility with other resins is increased, the insulating properties are stabilized, and the tensile strength of the resin is increased.
- the carboxyl group equivalent in the acrylonitrile-butadiene copolymer having a carboxyl group is preferably 1000 to 20000.
- the carboxyl group equivalent is a value calculated from the number average molecular weight.
- a Mooney viscosity of 50 to 90 M 1 + 4 (100 ° C.) is preferred. The reason is that when the Mooney viscosity is within the above range, the thermal stability is improved and the heat resistance is improved. Moreover, when it uses as an adhesive agent by the improvement of solvent solubility and a fall of melt viscosity, since workability
- the melt viscosity at the B stage of the adhesive is lowered, and the flow of the adhesive is increased at the time of processing to the lead frame, which is not preferable.
- the Mooney viscosity exceeds the upper limit of the above range, the adhesive is difficult to melt, the fluidity is lowered, and the taping property to the lead frame is lowered.
- the solubility to a solvent falls and the workability
- the acrylonitrile content of the copolymer is preferably 5 to 50% by mass, and more preferably 10 to 40% by mass.
- the acrylonitrile content it is preferable for the acrylonitrile content to be in the above range since the heat resistance and solvent solubility will be in a suitable range, and the insulation will be stable and the reliability will be improved. Below the lower limit of the above range, the heat resistance of the resin is lowered, and the heat resistance necessary for the semiconductor assembly process cannot be obtained. On the other hand, when the upper limit of the above range is exceeded, solubility in a solvent is lowered (workability for preparing an adhesive is lowered), which is not preferable. Also, the migration resistance is reduced.
- Component (b) As the phenol resin which is component (b), known resins can be used. However, since the adhesive temperature and the curing temperature of the adhesive can be lowered and sufficient adhesive strength can be obtained, a resol type alkylphenol is used. A phenolic resin containing is preferable. It is more preferable to use a resol type phenol and a novolac type phenol in combination. Furthermore, the mass ratio of the resol type phenolic resin to the novolac type phenolic resin is preferably 100: 5 to 100: 100, and more preferably 100: 10 to 100: 50.
- Component (c) As the compound containing two or more maleimide groups as component (c), it is necessary to use the compounds represented by the above formulas (1) and (2) in combination. The reason is that the bonding temperature and the curing temperature of the adhesive can be lowered, and a high adhesive strength can be obtained. Moreover, heat stability improves by using together, and adhesiveness at the time of heating improves. Furthermore, the compatibility with other resins is increased and the migration resistance is excellent.
- the mass ratio of the compounds represented by the above formulas (1) and (2) is preferably 3: 3 to 3:45, more preferably 3: 3.9 to 3: 19.5, More preferably, it is 1: 3 to 1: 7.
- the liquid adhesive for electronic parts of the present invention preferably further contains component (d): a diamine compound, and component (d) may contain a compound represented by the following formula (3) or (4). More preferred.
- R 1 represents a divalent aromatic group
- R 2 represents a propylene group or a phenoxymethylene group, and n represents an integer of 0 to 7)
- the curing temperature can be adjusted by using it as a maleimide group curing agent.
- the divalent aromatic group is not particularly limited.
- the divalent aromatic group means a divalent group including an aromatic group, and any group can be selected as necessary.
- the number of phenyl groups is not limited, and may have a substituent as necessary.
- the compound represented by the above formula (4) preferably has a weight average molecular weight of 200 to 7,000. The reason is that it is easy to handle because it is easily dissolved in a solvent.
- Examples of the compound represented by the above formula (4) include bis (3-aminopropyl) tetramethyldisiloxane, aminopropyl-terminated dimethylsiloxane tetramer or octamer, bis (3-aminophenoxymethyl) tetra Examples thereof include methyldisiloxane and the like, and these can be mixed and used.
- the blending ratio of the liquid adhesive is preferably 10 to 900 parts by mass of the sum of the components (b) and (c) with respect to 100 parts by mass of the component (a). More preferably, the sum of component (b) and component (c) is in the range of 20 to 800 parts by mass, more preferably 50 to 400 parts by mass, and particularly preferably 100 to 400 parts by mass.
- the coating layer is cured after application, and the heat resistance, particularly Tg and Young's modulus of the adhesive layer are improved, which is suitable for the intended use.
- the mass ratio of the component (b) in the total of the components (b) and (c) is preferably 10 to 90% by mass, more preferably 20 to 53% by mass.
- the mixing ratio of component (c) and component (d) is such that the amino group of component (d) is 0.01 to 2.0 molar equivalents relative to 1 molar equivalent of maleimide groups of component (c). More preferably, it is set in the range of 0.1 to 1.0 molar equivalent.
- the adhesive layer when the amino group equivalent of the component (d) is within the above range, when the adhesive layer is cured up to the B stage, the adhesive layer itself is not brittle and the workability is improved. The adhesion of the may improve. Moreover, since it does not gel at the time of mixing, an adhesive agent can be adjusted.
- the component (a), the component (b), the component (c), and the component (d) are mixed in a solvent that dissolves them.
- the solvent can be selected according to need.
- Examples include ethyl acetate, acetonitryl,
- reaction accelerator may be added as necessary to promote the addition reaction between the components (a) and the components (b).
- reaction accelerators include diazabicyclooctane, or methyl ethyl ketone peroxide, cyclohexane peroxide, 3,3,5-trimethylcyclohexanone peroxide, methylcyclohexanone peroxide, methyl acetoacetate peroxide, acetylacetone peroxide, 1, 1-bis (t-butylperoxy) -3,3,5 trimethylhexane, 1,1-bis (t-butylperoxy) -cyclohexane, 2,2-bis (t-butylperoxy) octane, n- Butyl-4,4-bis (t-butylperoxy) valate, 2,2-bis (t-butylperoxy) butane, t-butyl hydroperoxide, cumene hydroperoxide, di-isopropylbenzen
- the liquid adhesive may contain a filler having a particle size of 1 ⁇ m or less in order to stabilize taping characteristics when applied to an adhesive tape.
- Stabilization of taping characteristics means that when thermobonding the adhesive tape onto the leads, it prevents adhesive from sticking out of the end surface of the tape and maintains an appropriate thickness in the adhesive layer. Means to maintain.
- the filler content is preferably set in the range of 4 to 40% by mass, preferably 9 to 24% by mass, based on the total solid content. When the content is within the above range, the effect of stabilizing the taping characteristics is increased, the adhesive strength of the adhesive tape is improved, and the processability of laminate and the like is further improved.
- fillers that can be used include silica, quartz powder, alumina, calcium carbonate, magnesium oxide, diamond powder, mica, fluororesin, and zircon powder.
- the liquid adhesive is taken out after completion of the reaction, that is, after drying, if necessary, after being washed with an organic solvent, water, or a mixture of an organic solvent and water, and then again selected as needed. It may be dissolved in a solvent and used as an adhesive.
- Organic solvents that can be used for washing include acetone, methyl ethyl ketone, hexane, benzene, toluene, xylene, methanol, ethanol, propanol, diethyl ether, tetrahydrofuran, methyl acetate, ethyl acetate, acetonitrile, methylene chloride, chloroform, carbon tetrachloride. , Chlorobenzene, dichlorobenzene, dichloroethane, trichloroethane and the like.
- the adhesive tape of the present invention is characterized in that an adhesive layer formed by applying and drying the liquid adhesive for electronic parts is formed on at least one surface of a heat-resistant film or a peelable film.
- the coating thickness is preferably in the range of 5 to 100 ⁇ m, particularly 10 to 50 ⁇ m.
- the heat resistant film examples include heat resistant resin films such as polyimide, polyphenylene sulfide, polyether, polyparabanic acid, and polyethylene terephthalate, and composite heat resistant films such as epoxy resin-glass cloth and epoxy resin-polyimide-glass cloth. Among them, a polyimide film is particularly preferable.
- the thickness of the heat resistant film is preferably set in the range of 7.5 to 130 ⁇ m, preferably 12.5 to 75 ⁇ m. The shape and size of the heat resistant film can be selected as necessary. Within the above range, the waist of the adhesive tape becomes sufficient, and the punching operation becomes easy.
- the peelable film preferably has a thickness of 1 to 200 ⁇ m, preferably 10 to 100 ⁇ m, and acts as a temporary support.
- the shape and size of the peelable film can be selected as necessary.
- the peelable film that can be used include a polypropylene film, a fluororesin film, a polyethylene film, a polyethylene terephthalate film, paper, and, in some cases, a film that has been made peelable with a silicone resin. These peelable films desirably have a 90 ° peel strength in the range of 0.01 to 7.0 g / cm.
- the peelable film is not easily peeled from the adhesive layer during conveyance of the adhesive tape, and the peelable film is peeled cleanly from the adhesive layer during use, and the workability is improved.
- a protective film may be further provided on the adhesive layer.
- the protective film the same film as the peelable film can be used.
- Example 1 Component (a): Acrylonitrile-butadiene copolymer (without carboxyl group, Mooney viscosity 70M 1 + 4 100 ° C., acrylonitrile content 27%) 100 parts by mass Component (b): 50 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400: Showa) Polymer Co., Ltd.) 20 parts by mass component (c): 30 parts by mass of the compound represented by the formula (1) commercially available 50 parts by mass of the compound represented by the formula (2) commercially available Component (d): 0.25 parts by mass of 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane The above ingredients were added to tetrahydrofuran and
- Example 2 Ingredient (a) was changed as follows.
- Example 3 Ingredient (b) was changed as follows.
- the liquid adhesive for electronic parts of Example 3 was obtained in the same manner as in Example 1 except that.
- Example 4 Ingredient (b) was changed as follows.
- Component (b) 50 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400: Showa) (Manufactured by Kobunshi Co., Ltd.) 40 parts by mass
- a liquid adhesive for electronic parts of Example 4 was obtained in the same manner as in Example 1 except that.
- Example 5 Ingredient (c) was changed as follows.
- Example 6 the liquid adhesive for electronic parts of Example 6 was obtained.
- Component (b) and component (c) were changed as follows.
- Component (b) 16.6 parts by mass of pt-butylphenol type resol phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 6.7 parts by mass
- Example 8 Component (b) and component (c) were changed as follows.
- Component (b) 33.3 parts by mass of pt-butylphenol type resol phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 13.4 parts by mass
- Component (c) 20 parts by mass of the commercially available compound represented by the formula (1) 33.3 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic components of Example 8 An agent was obtained.
- Component (b) and component (c) were changed as follows.
- Component (b) and component (c) were changed as follows.
- Component (b) 26-part by mass of pt-butylphenol type resol phenol resin (trade name: “CKM-1282”, Showa Kogyo Co., Ltd.) Copolymer type novolak phenol resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 106.7 parts by mass
- the liquid adhesive for electronic parts of Example 10 An agent was obtained.
- Component (b) and component (c) were changed as follows.
- Component (b) 85.7 parts by mass of pt-butylphenol type resol phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 34.3 parts by mass
- Component (b) and component (c) were changed as follows.
- Component (b) 32.1 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 12.9 parts by mass
- Component (b) and component (c) were changed as follows.
- Component (b) and component (c) were changed as follows.
- Component (b) 10.7 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Kogyo Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 4.3 parts by mass
- the electronic component of Example 14 A liquid adhesive was obtained.
- Example 15 Ingredient (c) was changed as follows. Component (c): 5 parts by mass of a commercially available compound represented by the formula (1) 75 parts by mass of a commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic parts of Example 15 was used. Obtained.
- Example 16 Ingredient (c) was changed as follows.
- Example 17 Ingredient (c) was changed as follows.
- Example 18 Ingredient (c) was changed as follows. Component (c): 40 parts by mass of the commercially available compound represented by the formula (1) 40 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1, except that the liquid adhesive for electronic parts of Example 18 was used. Obtained.
- Table 1 shows the main conditions of the examples and comparative examples.
- liquid adhesives for electronic parts of Examples 1 to 18 and Comparative Examples 1 and 2 were applied to both sides of the polyimide film so that the thickness of the adhesive layer after drying was 20 ⁇ m, and the hot air circulation dryer was used. And then dried at 160 ° C. for 5 minutes to produce adhesive tapes using the adhesives of Examples 1 to 18 and Comparative Examples 1 and 2.
- Lead frame assembly The plane on which the adhesive tape is temporarily bonded in the above process and the lead frame (Cu material) main body are aligned, heated and pressed on a heated hot plate, and the lead frame (Cu material) and the plane are bonded with the adhesive tape. Pasted together.
- the bonding conditions were 140 ° C./2 seconds / 4 Kgf / cm 2 .
- Adhesive tape cure Placed in a hot-air circulating oven substituted with nitrogen and heat-cured. The conditions for thermosetting were 200 ° C./1 hour.
- a lead frame (Cu material) bonded to the produced plane was used to assemble a semiconductor package according to the following procedure.
- Die bonding A semiconductor chip was bonded to a plane portion of a lead frame bonded to a plane using a silver bonding paste, and cured at 150 ° C. for 2 hours.
- Wire bonding A wire bonder was used to wire the wire pad on the semiconductor chip and the silver plating portion at the end of the inner lead wire of the lead pin with a gold wire.
- Molding Transfer molded with an epoxy molding agent. Finishing process: Processes such as homing, die cutting, and plating of the outer lead part were performed to finish the package.
- the adhesive strength was 4.2 N / cm or more, and ⁇ low temperature adhesion, curing> was evaluated according to the following criteria.
- Table 5 shows the evaluation results of low-temperature adhesion and curing.
- Shear adhesive strength [Test specimen preparation] The adhesive tape cut to a width of 5 mm and a length of 75 mm was affixed to an end (a central part of one piece) of a 20 mm ⁇ 20 mm copper plate at 140 ° C. (taping). The sticking area was 25 mm 2 (5 mm ⁇ 5 mm size), and the length of the tape not attached to the copper material was 70 mm. [Measurement of shear bond strength] After fixing the test body on a 160 ° C. heater block, the unattached portion of the tape on the copper plate was connected to a universal tensile testing machine, and the shear bond strength was measured.
- the distance between the chuck of the copper plate-tension tester at the time of measurement was 50 mm, and the tensile speed was 50 mm / min.
- the test body was fixed on the heater block, and measurement was started after 5 seconds. The results are shown in Table 3.
- ⁇ heat resistance> was evaluated according to the following criteria.
- ⁇ No void and shear adhesive strength of 20 N / cm 2 or more and less than 40 N / cm 2 (no problem in practical use)
- ⁇ No void and shear bond strength of less than 20 N / cm 2 (no problem in practical use)
- X Void and shear bond strength less than 20 N / cm 2 (practical problem) Table 5 shows the evaluation results of heat resistance.
- the lead frame used has a pin pitch of 168 ⁇ m. [Measurement of lead pin misalignment] Immediately after the tape was applied and after treatment at 200 ° C./1 hour in a hot air circulation oven, the pin pitch of the lead frame was measured with a microscope. The pressure bonding temperature and the measurement results are shown in Table 4.
- ⁇ dimensional stability of lead pin> was evaluated according to the following criteria.
- ⁇ The pin pitch immediately after tape application and the pin pitch after treatment at 200 ° C./1 hour in a hot air circulating oven are both within 168 ⁇ m ⁇ 10%.
- delta) The pin pitch immediately after tape sticking, and the pin pitch after a 200 degreeC / 1 hour process in a hot-air circulation type oven both exceeded 168 micrometers +/- 10% and within 168 micrometers +/- 15%.
- X The values of the pin pitch immediately after tape application and the pin pitch after treatment at 200 ° C./1 hour in a hot air circulation oven exceeded 168 ⁇ m ⁇ 15%. Table 5 shows the evaluation results of the dimensional stability of the lead pins.
- ⁇ Reliability> The package obtained as described above was subjected to a PCBT test (Pressure Cooker Biased Test). Conditions were 100 volts applied, 130 ° C., 2 atm, 85% RH, and an electrical reliability test was performed. And ⁇ reliability> was evaluated according to the following criteria. ⁇ : No short circuit at 240 hours ⁇ : Short circuit at 240 hours Table 5 shows the reliability evaluation results.
- ⁇ Migration resistance> After the reliability test, the package was polished to expose the adhesive surface and observed with a microscope. And ⁇ migration resistance> was evaluated according to the following criteria. A: Dendrite cannot be confirmed, and there is no discoloration of the lead pin. ⁇ : Dendrite cannot be confirmed, but lead pin is discolored. X: With dendrite Table 5 shows the evaluation results of migration resistance.
- the adhesive tapes of Examples 1 to 18 are all ⁇ or more and have no practical problem.
- Example 5, Example 9, Example 16, and Example 17 were excellent in low-temperature adhesion, curing, heat resistance, and migration resistance.
- Example 2 was excellent in low-temperature adhesion, curing, heat resistance, and migration resistance.
- the adhesive tape of Comparative Example 1 was short-circuited in the reliability test, and there was a practical problem with dendrite in terms of migration resistance.
- the adhesive tape of Comparative Example 2 had practical problems with respect to heat resistance and lead pin dimensional stability.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Die Bonding (AREA)
Abstract
Description
本願は、2010年3月25日に、日本に出願された特願2010-069063号に基づき優先権を主張し、その内容をここに援用する。 The present invention relates to a liquid adhesive for an electronic component and an adhesive tape for use in bonding between members around a lead frame constituting a semiconductor device, for example, a lead pin, a semiconductor chip mounting substrate, a heat sink, and a semiconductor chip itself. .
This application claims priority on March 25, 2010 based on Japanese Patent Application No. 2010-069063 filed in Japan, the contents of which are incorporated herein by reference.
例えば、リードフレーム固定用接着テープは、リードフレームのリードピンを固定することにより、リードフレーム自体および半導体アセンブリ工程全体の、生産歩留まりおよび生産性向上に資するものとして使用されている。
この固定用接着テープは、通常リードフレームメーカーでリードフレーム上にテーピングされた後、半導体メーカーに出荷され、半導体メーカーでIC搭載後、樹脂封止される。
そのためリードフレーム固定用接着テープには、半導体レベルでの一般的な信頼性およびテーピング時の作業性は勿論のこと、テーピング直後の充分な室温接着力、半導体装置組立工程での加熱に耐える充分な耐熱性等が要求される。 Conventionally, as an adhesive tape used in a resin-sealed semiconductor device, there are a lead frame fixing tape, a TAB tape, and the like.
For example, an adhesive tape for fixing a lead frame is used as one that contributes to an improvement in production yield and productivity of the lead frame itself and the entire semiconductor assembly process by fixing lead pins of the lead frame.
This fixing adhesive tape is usually taped onto a lead frame by a lead frame maker and then shipped to a semiconductor maker. After the IC is mounted by the semiconductor maker, the resin is sealed.
For this reason, the adhesive tape for fixing the lead frame has not only general reliability at the semiconductor level and workability during taping, but also sufficient room temperature adhesive force immediately after taping and sufficient resistance to heating in the semiconductor device assembly process. Heat resistance is required.
近年、図1ないし図3に示されるような構造の樹脂封止型半導体装置(半導体パッケージ)が開発または製造されている。
図1の樹脂封止型半導体装置は、リードピン3とプレーン2が接着層6によって接続され、半導体チップ1がプレーン2上に搭載されており、半導体チップ1とリードピン3との間のボンディングワイヤー4と共に樹脂5によって封止された構造を有している。
また、図2の装置は、リードピン3と半導体チップ1が、接着層6によって固定されており、ボンディングワイヤー4と共に樹脂5によって封止された構造を有している。
図3の装置は、ダイパッド7の上に半導体チップ1が搭載され、電極8は接着層6によって固定されており、さらに半導体チップ1と電極8との間、および電極8とリードピン3との間がそれぞれボンディングワイヤー4によって連結され、それらが樹脂5によって封止された構造を有している。 Conventionally, as an adhesive tape used for such applications, for example, a synthetic rubber-based resin such as polyacrylonitrile, polyacrylic acid ester or acrylonitrile-butadiene copolymer alone on a support film such as a polyimide film, Or what modified | denatured with other resin, or the thing which apply | coated the adhesive mixed with other resin and was made into the B-stage state is used.
In recent years, resin-encapsulated semiconductor devices (semiconductor packages) having a structure as shown in FIGS. 1 to 3 have been developed or manufactured.
In the resin-encapsulated semiconductor device of FIG. 1, the
2 has a structure in which the
In the apparatus of FIG. 3, the
なお、信頼性とは、後述するマイグレーション試験(PCBT:Pressure Cooker Biased Test)の条件下においても、電流のリーク、ショートを起こさないということを意味する。
しかしながら、このような接着剤に対して、耐マイグレーション性をさらに向上させることが求められていた。
耐マイグレーション性とは、マイグレーション試験において、ショートを起こさずに、デンドライトの成長が無いことを意味する。 As an adhesive layer in the resin-encapsulated semiconductor device having the structure shown in FIGS. 1 to 3, an adhesive that can be bonded and cured at a relatively low temperature and has sufficient heat resistance and reliability is known (for example, , See Patent Document 1).
Note that reliability means that current leakage and short-circuit do not occur even under the conditions of a migration test (PCBT: Pressure Cooker Biased Test) described later.
However, it has been required to further improve the migration resistance for such an adhesive.
Migration resistance means that there is no dendrite growth in the migration test without causing a short circuit.
(1)有機溶剤中に、成分(a)アクリロニトリル-ブタジエン共重合体、成分(b)フェノ-ル樹脂、成分(c)マレイミド基を2個以上含有する化合物を溶解した液状接着剤であり、前記成分(c)は、これより後に記載する、式(1)で示される化合物、および(2)で示される化合物を含むことを特徴とする電子部品用液状接着剤。
(2)前記成分(a)はムーニー粘度が50~90M1+4100℃であり、アクリロニトリルの含有率が5~50質量%であることを特徴とする前記(1)記載の電子部品用液状接着剤。
(3)前記成分(a)は、カルボキシル基を有するアクリロニトリル-ブタジエン共重合体であることを特徴とする前記(1)記載の電子部品用液状接着剤。
(4)前記成分(b)は、レゾール型のアルキルフェノールを含むフェノ-ル樹脂であることを特徴とする前記(1)記載の電子部品用液状接着剤。
(5)前記成分(b)は、レゾール型のフェノールとノボラック型のフェノールとを併用することを特徴とする前記(1)記載の電子部品用液状接着剤。
(6)前記成分(c)は、式(1)および(2)で示される化合物の質量比が、3:3~3:45であることを特徴とする前記(1)記載の電子部品用液状接着剤。
(7)成分(a)100質量部に対して、成分(b)、成分(c)の総和が10~900質量部であり、かつ、成分(b)、成分(c)の総和中に占める成分(b)の質量割合が10~90質量%であることを特徴とする前記(1)記載の電子部品用液状接着剤。
(8)さらに、成分(d)ジアミン化合物を含有することを特徴とする前記(1)記載の電子部品用液状接着剤。
(9)前記成分(d)は、これより後に記載する、式(3)で示される化合物であることを特徴とする前記(8)記載の電子部品用液状接着剤。
(10)前記成分(d)は、これより後に記載する、式(4)で示される化合物であり、重量平均分子量200~7,000であることを特徴とする前記(8)記載の電子部品用液状接着剤。
(11)粒径1μm以下のフィラーが、全固形分の4~40質量%含まれていることを特徴とする前記(1)記載の電子部品用液状接着剤。
(12)耐熱性フィルムの少なくとも一面に、前記(1)記載の電子部品用液状接着剤を塗布、乾燥した接着層が形成されていることを特徴とする接着テープ。
(13)耐熱性フィルムが、ポリイミドフィルムであることを特徴とする前記(12)記載の接着テープ。
(14)剥離性フィルムの少なくとも一面に、前記(1)記載の電子部品用液状接着剤を塗布、乾燥した接着層が形成されていることを特徴とする接着テープ。 The present invention has solved the above problems by the following technical configuration.
(1) A liquid adhesive in which a component (a) an acrylonitrile-butadiene copolymer, a component (b) a phenol resin, and a component (c) a compound containing two or more maleimide groups are dissolved in an organic solvent. The component (c) contains a compound represented by the formula (1) and a compound represented by (2), which will be described later, and a liquid adhesive for electronic parts.
(2) The liquid adhesive for electronic parts as described in (1) above, wherein the component (a) has a Mooney viscosity of 50 to 90M 1 + 4 at 100 ° C. and an acrylonitrile content of 5 to 50% by mass. .
(3) The liquid adhesive for electronic parts as described in (1) above, wherein the component (a) is an acrylonitrile-butadiene copolymer having a carboxyl group.
(4) The liquid adhesive for electronic parts as described in (1) above, wherein the component (b) is a phenol resin containing a resol type alkylphenol.
(5) The liquid adhesive for electronic parts as set forth in (1), wherein the component (b) uses a resol type phenol and a novolac type phenol in combination.
(6) The component (c) is used for electronic parts as described in (1) above, wherein the mass ratio of the compounds represented by the formulas (1) and (2) is from 3: 3 to 3:45 Liquid adhesive.
(7) The sum of component (b) and component (c) is 10 to 900 parts by weight with respect to 100 parts by weight of component (a), and occupies the total of component (b) and component (c) The liquid adhesive for electronic parts as described in (1) above, wherein the mass proportion of the component (b) is 10 to 90 mass%.
(8) The liquid adhesive for electronic parts as described in (1) above, further comprising a component (d) a diamine compound.
(9) The liquid adhesive for electronic parts as set forth in (8), wherein the component (d) is a compound represented by the formula (3) described later.
(10) The electronic component according to (8), wherein the component (d) is a compound represented by the formula (4) described later, and has a weight average molecular weight of 200 to 7,000 Liquid adhesive.
(11) The liquid adhesive for electronic parts as described in (1) above, wherein a filler having a particle size of 1 μm or less is contained in an amount of 4 to 40% by mass of the total solid content.
(12) An adhesive tape comprising an adhesive layer formed by applying and drying the liquid adhesive for electronic components according to (1) above on at least one surface of a heat resistant film.
(13) The adhesive tape according to (12), wherein the heat resistant film is a polyimide film.
(14) An adhesive tape comprising an adhesive layer formed by applying and drying the liquid adhesive for electronic parts according to (1) above on at least one surface of a peelable film.
すなわち、本発明の電子部品用液状接着剤は、低温で接着または硬化ができ、十分な耐熱性、信頼性を有しており、かつ、耐マイグレーション性に優れるので、それを用いた本発明の接着テープは、例えば、リードフレーム固定用テープ、TABテープ等として、半導体装置を構成するリードフレーム周辺の部材間、例えば、リードピン、半導体チップ搭載用基板、放熱板、半導体チップ自身等の接着に好適に使用することができる。 ADVANTAGE OF THE INVENTION According to this invention, the liquid adhesive for electronic components and adhesive tape which can be adhere | attached and hardened at low temperature, have sufficient heat resistance and reliability, and are excellent in migration resistance can be provided.
That is, the liquid adhesive for electronic parts of the present invention can be bonded or cured at a low temperature, has sufficient heat resistance and reliability, and is excellent in migration resistance. Adhesive tape, for example, as lead frame fixing tape, TAB tape, etc., suitable for bonding between members around the lead frame constituting the semiconductor device, for example, lead pins, semiconductor chip mounting substrate, heat sink, semiconductor chip itself, etc. Can be used for
まず、電子部品用液状接着剤の好ましい例について説明する。ただし本発明はこれら例のみに限定されるものではない。
本発明の電子部品用液状接着剤は、有機溶剤中に、成分(a)アクリロニトリル-ブタジエン共重合体、成分(b)フェノ-ル樹脂、成分(c)マレイミド基を2個以上含有する化合物を溶解した液状接着剤であり、前記成分(c)は、下記式(1)および(2)で示される化合物を併用することを特徴とする。 Hereinafter, the present invention will be described in detail.
First, the preferable example of the liquid adhesive for electronic components is demonstrated. However, the present invention is not limited to these examples.
The liquid adhesive for electronic parts of the present invention comprises a compound containing at least two components (a) acrylonitrile-butadiene copolymer, component (b) phenol resin, and component (c) maleimide group in an organic solvent. It is a dissolved liquid adhesive, and the component (c) is characterized by using a compound represented by the following formulas (1) and (2) in combination.
成分(a):
成分(a)であるアクリロニトリル-ブタジエン共重合体としては、公知のものが全て使用できるが、カルボキシル基を有するアクリロニトリル-ブタジエン共重合体が好ましい。
その理由は、加熱時の溶融粘度が高くなり熱安定性が向上し、他の樹脂との相溶性が上がり絶縁性が安定し、樹脂の引張り強度が上がるからである。
カルボキシル基を有するアクリロニトリル-ブタジエン共重合体中のカルボキシル基当量は、1000~20000が好ましい。
なお、カルボキシル基当量は、数平均分子量より計算した値である。
また、ムーニー粘度が50~90M1+4(100℃)のものが好ましい。
その理由は、ムーニー粘度が上記範囲内であると、熱安定性が良好になり、耐熱性が向上するからである。
また、溶剤溶解性の向上、溶融粘度の低下により、接着剤として使用した場合、作業性、接着性が良好となるので好ましい。
ムーニー粘度が上記範囲の下限を下回ると、樹脂の耐熱性が低下し、半導体組立工程に必要な耐熱性を得られなくなる。また、接着剤のBステージにおける溶融粘度が低下し、リードフレームへの加工時に接着剤の流れ出しが大きくなり、加工性を低下させるので、好ましくない。一方、ムーニー粘度が上記範囲の上限を超えると、接着剤が溶融し難く、流動性が低下し、リードフレームへのテーピング性が低下する。また、溶剤への溶解性が低下し、接着剤作成の作業性が低下するので、好ましくない。
次に、前記共重合体のアクリロニトリル含有率は5~50質量%が好ましく、10~40質量%のものがより好ましい。
アクリロニトリル含有率が上記範囲内であると、耐熱性、溶剤溶解性が好適な範囲となり、絶縁性が安定して信頼性が向上するので好ましい。
上記範囲の下限を下回ると、樹脂の耐熱性が低下し、半導体組立工程に必要な耐熱性を得られなくなり、好ましくない。一方、上記範囲の上限を超えると、溶剤への溶解性が低下し、(接着剤作成の作業性が低下し)、好ましくない。また、耐マイグレーション性も低下する。 Each component will be described below.
Component (a):
As the acrylonitrile-butadiene copolymer as component (a), any known acrylonitrile-butadiene copolymer can be used, but an acrylonitrile-butadiene copolymer having a carboxyl group is preferred.
The reason is that the melt viscosity at the time of heating is increased, the thermal stability is improved, the compatibility with other resins is increased, the insulating properties are stabilized, and the tensile strength of the resin is increased.
The carboxyl group equivalent in the acrylonitrile-butadiene copolymer having a carboxyl group is preferably 1000 to 20000.
The carboxyl group equivalent is a value calculated from the number average molecular weight.
A Mooney viscosity of 50 to 90 M 1 + 4 (100 ° C.) is preferred.
The reason is that when the Mooney viscosity is within the above range, the thermal stability is improved and the heat resistance is improved.
Moreover, when it uses as an adhesive agent by the improvement of solvent solubility and a fall of melt viscosity, since workability | operativity and adhesiveness become favorable, it is preferable.
When the Mooney viscosity is below the lower limit of the above range, the heat resistance of the resin is lowered and the heat resistance necessary for the semiconductor assembly process cannot be obtained. Further, the melt viscosity at the B stage of the adhesive is lowered, and the flow of the adhesive is increased at the time of processing to the lead frame, which is not preferable. On the other hand, when the Mooney viscosity exceeds the upper limit of the above range, the adhesive is difficult to melt, the fluidity is lowered, and the taping property to the lead frame is lowered. Moreover, since the solubility to a solvent falls and the workability | operativity of adhesive preparation falls, it is not preferable.
Next, the acrylonitrile content of the copolymer is preferably 5 to 50% by mass, and more preferably 10 to 40% by mass.
It is preferable for the acrylonitrile content to be in the above range since the heat resistance and solvent solubility will be in a suitable range, and the insulation will be stable and the reliability will be improved.
Below the lower limit of the above range, the heat resistance of the resin is lowered, and the heat resistance necessary for the semiconductor assembly process cannot be obtained. On the other hand, when the upper limit of the above range is exceeded, solubility in a solvent is lowered (workability for preparing an adhesive is lowered), which is not preferable. Also, the migration resistance is reduced.
成分(b)であるフェノ-ル樹脂としては、公知のものが使用できるが、接着温度、接着剤の硬化温度を低温化でき、また、充分な接着力を得られることから、レゾール型のアルキルフェノールを含むフェノ-ル樹脂であることが好ましい。
また、レゾール型のフェノールとノボラック型のフェノールとを併用することがより好ましい。
さらに、レゾール型フェノール樹脂とノボラック型フェノール樹脂の質量比が100:5~100:100である事が好ましく、100:10~100:50である事がさらに好ましい。
その理由は、レゾール型のフェノールとノボラック型フェノールを併用することで表面のタック性を抑えることができ、リードフレーム加工時の搬送不良を抑制することができるからである。
また、ノボラック型フェノール樹脂は単独での硬化性が劣る為、レゾール型フェノールに対してノボラック型フェノール樹脂の質量比が過剰となると、接着剤の硬化性が低下し、耐マイグレーション性が低下するので好ましくない。
具体的には、レゾール型のp-t-ブチルフェノールとノボラック型のp-t-ブチルフェノールなどが例示できる。 Component (b):
As the phenol resin which is component (b), known resins can be used. However, since the adhesive temperature and the curing temperature of the adhesive can be lowered and sufficient adhesive strength can be obtained, a resol type alkylphenol is used. A phenolic resin containing is preferable.
It is more preferable to use a resol type phenol and a novolac type phenol in combination.
Furthermore, the mass ratio of the resol type phenolic resin to the novolac type phenolic resin is preferably 100: 5 to 100: 100, and more preferably 100: 10 to 100: 50.
The reason is that by using a resol type phenol and a novolac type phenol together, the tackiness of the surface can be suppressed, and the conveyance failure at the time of lead frame processing can be suppressed.
In addition, since novolak type phenol resin is inferior in curability by itself, if the mass ratio of novolac type phenol resin to resol type phenol is excessive, curability of the adhesive is lowered and migration resistance is lowered. It is not preferable.
Specific examples include resol-type pt-butylphenol and novolac-type pt-butylphenol.
成分(c)であるマレイミド基を2個以上含有する化合物としては、上記式(1)および(2)で示される化合物を併用することが必要である。
その理由は、接着温度、接着剤の硬化温度を低温化でき、また、高い接着力を得られること。また、併用することで熱安定性が向上し、熱時接着性が向上する。さらに、他の樹脂との相溶性が上がり、耐マイグレーション性に優れるからである。
なお、上記式(1)および(2)で示される化合物の質量比は、3:3~3:45であることが好ましく、より好ましくは3:3.9~3:19.5であり、更に好ましくは1:3~1:7ある。 Component (c):
As the compound containing two or more maleimide groups as component (c), it is necessary to use the compounds represented by the above formulas (1) and (2) in combination.
The reason is that the bonding temperature and the curing temperature of the adhesive can be lowered, and a high adhesive strength can be obtained. Moreover, heat stability improves by using together, and adhesiveness at the time of heating improves. Furthermore, the compatibility with other resins is increased and the migration resistance is excellent.
The mass ratio of the compounds represented by the above formulas (1) and (2) is preferably 3: 3 to 3:45, more preferably 3: 3.9 to 3: 19.5, More preferably, it is 1: 3 to 1: 7.
その理由は、溶剤に溶解しやすいので取り扱いが容易になるからである。 The compound represented by the above formula (4) preferably has a weight average molecular weight of 200 to 7,000.
The reason is that it is easy to handle because it is easily dissolved in a solvent.
成分(b)、成分(c)の総和が上記範囲内であると、塗布して硬化した後、接着層の耐熱性、特にTg、ヤング率が向上し、目的の用途に適する。
また、接着層をBステージまで硬化した際に、接着層自体が脆くならず作業性が良好になり、支持体である耐熱性フィルムとの密着性も良い傾向がある。
このとき、作業性、硬化樹脂の特性から、成分(b)、成分(c)の総和中に占める成分(b)の質量割合は10~90質量%であることが好ましく、より好ましくは20~53質量%である。
また、成分(c)と成分(d)の配合割合は、成分(c)のマレイミド基1モル当量に対する成分(d)のアミノ基が0.01~2.0モル当量になるようにすることが好ましく、より好ましくは0.1~1.0モル当量の範囲に設定する。
成分(d)のアミノ基当量が上記範囲内であると、接着層をBステージまで硬化した際に、接着層自体が脆くならず作業性が良好になったり、支持体である耐熱性フィルムとの密着性が良くなったりする。
また、混合に際してゲル化しないので、接着剤を調整することができる。 The blending ratio of the liquid adhesive is preferably 10 to 900 parts by mass of the sum of the components (b) and (c) with respect to 100 parts by mass of the component (a). More preferably, the sum of component (b) and component (c) is in the range of 20 to 800 parts by mass, more preferably 50 to 400 parts by mass, and particularly preferably 100 to 400 parts by mass.
When the total sum of component (b) and component (c) is within the above range, the coating layer is cured after application, and the heat resistance, particularly Tg and Young's modulus of the adhesive layer are improved, which is suitable for the intended use.
Further, when the adhesive layer is cured up to the B stage, the adhesive layer itself is not brittle, the workability is improved, and the adhesiveness to the heat resistant film as the support tends to be good.
At this time, the mass ratio of the component (b) in the total of the components (b) and (c) is preferably 10 to 90% by mass, more preferably 20 to 53% by mass.
The mixing ratio of component (c) and component (d) is such that the amino group of component (d) is 0.01 to 2.0 molar equivalents relative to 1 molar equivalent of maleimide groups of component (c). More preferably, it is set in the range of 0.1 to 1.0 molar equivalent.
When the amino group equivalent of the component (d) is within the above range, when the adhesive layer is cured up to the B stage, the adhesive layer itself is not brittle and the workability is improved. The adhesion of the may improve.
Moreover, since it does not gel at the time of mixing, an adhesive agent can be adjusted.
溶媒は必要に応じて選択でき、例えば、N-メチル-2-ピロリドン、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、ジメチルスルホキシド、スルホラン、ヘキサメチルリン酸トリアミド、1,3-ジメチル-2-イミダゾリドン、ヘキサン、ベンゼン、トルエン、キシレン、メチルエチルケトン、アセトン、ジエチルエーテル、テトラヒドロフラン、ジオキサン、1,2-ジメトキシエタン、ジエチレングリコールジメチルエーテル、メチルセロソルブ、セロソルブアセテート、メタノール、エタノール、プロパノール、イソプロパノール、酢酸メチル、酢酸エチル、アセト二トリル、塩化メチレン、クロロホルム、四塩化炭素、クロロベンゼン、ジクロロベンゼン、ジクロロエタン、トリクロロエタン等が挙げられる。これらの中から、各成分が溶解するように種類と量を適宜選択して使用できる。 The component (a), the component (b), the component (c), and the component (d) are mixed in a solvent that dissolves them.
The solvent can be selected according to need. For example, N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, N-dimethylformamide, dimethyl sulfoxide, sulfolane, hexamethylphosphoric triamide, 1,3-dimethyl- 2-imidazolidone, hexane, benzene, toluene, xylene, methyl ethyl ketone, acetone, diethyl ether, tetrahydrofuran, dioxane, 1,2-dimethoxyethane, diethylene glycol dimethyl ether, methyl cellosolve, cellosolve acetate, methanol, ethanol, propanol, isopropanol, methyl acetate, Examples include ethyl acetate, acetonitryl, methylene chloride, chloroform, carbon tetrachloride, chlorobenzene, dichlorobenzene, dichloroethane, and trichloroethane. From these, the type and amount can be appropriately selected and used so that each component is dissolved.
反応促進剤の例としては、ジアザビシクロオクタン、またはメチルエチルケトンパーオキサイド、シクロヘキサンパーオキサイド、3,3,5-トリメチルシクロヘキサノンパーオキサイド、メチルシクロヘキサノンパーオキサイド、メチルアセトアセテートパーオキサイド、アセチルアセトンパーオキサイド、1,1-ビス(t-ブチルパーオキシ)-3,3,5トリメチルヘキサン、1,1-ビス(t-ブチルパーオキシ)-シクロヘキサン、2,2-ビス(t-ブチルパーオキシ)オクタン、n-ブチル-4,4-ビス(t-ブチルパーオキシ)バレート、2,2-ビス(t-ブチルパーオキシ)ブタン、t-ブチルハイドロパーオキサイド、クメンハイドロパーオキサイド、ジ-イソプロピルベンゼンハイドロパーオキサイド、p-メンタンハイドロパーオキサイド、2,5-ジメチルヘキサン-2,5-ジハイドロパーオキサイド、1,1,3,3-テトラメチルブチルハイドロパーオキサイド、ジ-t-ブチルパーオキサイド、t-ブチルクミルパーオキサイド、ジ-クミルパーオキサイド、α,α’-ビス(t-ブチルパーオキシ-m-イソプロピル)ベンゼン、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキサン、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)ヘキシン、アセチルパーオキサイド、イソブチルパーオキサイド、オクタノイルパーオキサイド、デカノイルパーオキサイド、ベンゾイルパーオキサイド、ラウロイルパーオキサイド、3,5,5-トリメチルヘキサノイルパーオキサイド、スクシニックアシッドパーオキサイド、2,4-ジクロロベンゾイルパーオキサイド、m-トルオイルパーオキサイド、ジ-イソプロピルパーオキシジカーボネート、ジ-2-エチルヘキシルパーオキシジカーボネート、ジ-n-プロピルパーオキシジカーボネート、ビス-(4-t-ブチルシクロヘキシル)パーオキシジカーボネート、ジ-ミリスティルパーオキシジカーボネート、ジ-2-エトキシエチルパーオキシジカーボネート、ジ-メトキシイソプロピルパーオキシジカーボネート、ジ(3-メチル-3-メトキシブチル)パーオキシジカーボネート、ジ-アリルパーオキシジカーボネート、t-ブチルパーオキシアセテート、t-ブチルパーオキシイソブチレート、t-ブチルパーオキシピバレート、t-ブチルパーオキシネオデカネート、クミルパーオキシネオデカネート、t-ブチルパーオキシ-2-エチルヘキサネート、t-ブチルパーオキシ-3,5,5-トリメチルヘキサネート、t-ブチルパーオキシラウレート、t-ブチルパーオキシベンゾエート、ジ-t-ブチルパーオキシイソフタレート、2,5-ジメチル-2,5-ジ(ベンゾイルパーオキシ)ヘキサン、t-ブチルパーオキシマレイン酸、t-ブチルパーオキシイソプロピルカーボネート、クミルパーオキシオクテート、t-ヘキシルパーオキシネオデカネート、t-ヘキシルパーオキシピバレート、t-ブチルパーオキシネオヘキサネート、アセチルシクロヘキシルスルフォニルパーオキサイド、t-ブチルパーオキシアリルカーボネート等の有機過酸化物、1,2-ジメチルイミダゾール、1-メチル-2-エチルイミダゾール、2-メチルイミダゾール、2-エチル-4-メチルイミダゾール、2-ウンデシルイミダゾール、2-ヘプタデシルイミダゾール、2-フェニルイミダゾール、1-ベンジル-2-メチルイミダゾール、1-ベンジル-2-フェニルイミダゾール、1-ベンジル-2-フェニルイミダゾール・トリメリット酸塩、1-ベンジル-2-エチルイミダゾール、1-ベンジル-2-エチル-5-メチルイミダゾール、2-エチルイミダゾール、2-イソプロピルイミダゾール、2-フェニル-4-ベンジルイミダゾール、1-シアノエチル-2-メチルイミダゾール、1-シアノエチル-2-エチル-4-メチルイミダゾール、1-シアノエチル-2-ウンデシルイミダゾール、1-シアノエチル-2-イソプロピルイミダゾール、1-シアノエチル-2-フェニルイミダゾール、1-シアノエチル-2-メチルイミダゾリウムトリメリテート、1-シアノエチル-2-フェニルイミダゾリウムトリメリテート、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジン、2,4-ジアミノ-6-[2’-エチル-4-メチルイミダゾリル-(1’)]-エチル-s-トリアジン、2,4-ジアミノ-6-[2’-ウンデシルイミダゾリル-(1’)]-エチル-s-トリアジン、2-メチルイミダゾリウムイソシアヌール酸付加物、2-フェニルイミダゾリウムイソシアヌール酸付加物、2,4-ジアミノ-6-[2’-メチルイミダゾリル-(1’)]-エチル-s-トリアジン-イソシアヌール酸付加物、2-フェニル-4,5-ジヒドロキシメチルイミダゾール、2-フェニル-4-ベンジル-5-ヒドロキシメチルイミダゾール、4,4’-メチレン-ビス-(2-エチル-5-メチルイミダゾール)、1-アミノエチル-2-メチルイミダゾール、1-シアノエチル-2-フェニル-4,5-ジ(シアノエトキシメチル)イミダゾール、1-ドデシル-2-メチル-3-ベンジルイミダゾリウムクロライド、2-メチルイミダゾール・ベンゾトリアゾール付加物、1-アミノエチル-2-エチルイミダゾール、1-(シアノエチルアミノエチル)-2-メチルイミダゾール、N,N’-[2-メチルイミダゾリル-(1)-エチル]-アジポイルジアミド、N,N’-ビス-(2-メチルイミダゾリル-1-エチル)尿素、N-(2-メチルイミダゾリル-1-エチル)尿素、N,N’-[2-メチルイミダゾリル-(1)-エチル]ドデカンジオイルジアミド、N,N’-[2-メチルイミダゾリル-(1)-エチル]エイコサンジオイルジアミド、1-ベンジル-2-フェニルイミダゾール・塩化水素酸塩等のイミダゾール類、トリフェニルフォスフィン等の反応促進剤が挙げられる。単独で用いても、2種以上を組み合わせて使用しても良い。 In the liquid adhesive, a reaction accelerator may be added as necessary to promote the addition reaction between the components (a) and the components (b).
Examples of reaction accelerators include diazabicyclooctane, or methyl ethyl ketone peroxide, cyclohexane peroxide, 3,3,5-trimethylcyclohexanone peroxide, methylcyclohexanone peroxide, methyl acetoacetate peroxide, acetylacetone peroxide, 1, 1-bis (t-butylperoxy) -3,3,5 trimethylhexane, 1,1-bis (t-butylperoxy) -cyclohexane, 2,2-bis (t-butylperoxy) octane, n- Butyl-4,4-bis (t-butylperoxy) valate, 2,2-bis (t-butylperoxy) butane, t-butyl hydroperoxide, cumene hydroperoxide, di-isopropylbenzene hydroperoxide, p- Nthane hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 1,1,3,3-tetramethylbutyl hydroperoxide, di-t-butyl peroxide, t-butylcumyl peroxide , Di-cumyl peroxide, α, α′-bis (t-butylperoxy-m-isopropyl) benzene, 2,5-dimethyl-2,5-di (t-butylperoxy) hexane, 2,5- Dimethyl-2,5-di (t-butylperoxy) hexyne, acetyl peroxide, isobutyl peroxide, octanoyl peroxide, decanoyl peroxide, benzoyl peroxide, lauroyl peroxide, 3,5,5-trimethylhexa Noyl peroxide, succinic acid peroxide, 2,4-dichlorobenzoyl peroxide, m-toluoyl peroxide, di-isopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-n-propyl peroxydicarbonate, bis- (4-t -Butylcyclohexyl) peroxydicarbonate, di-myristyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate, di-methoxyisopropyl peroxydicarbonate, di (3-methyl-3-methoxybutyl) per Oxydicarbonate, di-allyl peroxydicarbonate, t-butylperoxyacetate, t-butylperoxyisobutyrate, t-butylperoxypivalate, t-butylperoxyneodecanate, cumylperoxyneodecane , T-butylperoxy-2-ethylhexanate, t-butylperoxy-3,5,5-trimethylhexanate, t-butylperoxylaurate, t-butylperoxybenzoate, di-t- Butyl peroxyisophthalate, 2,5-dimethyl-2,5-di (benzoylperoxy) hexane, t-butylperoxymaleic acid, t-butylperoxyisopropyl carbonate, cumylperoxyoctate, t-hexylper Organic peroxides such as oxyneodecanate, t-hexylperoxypivalate, t-butylperoxyneohexanate, acetylcyclohexylsulfonyl peroxide, t-butylperoxyallyl carbonate, 1,2-dimethylimidazole, 1 -Methyl-2-ethylimidazole 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-benzyl-2-phenylimidazole, 1 -Benzyl-2-phenylimidazole trimellitic acid salt, 1-benzyl-2-ethylimidazole, 1-benzyl-2-ethyl-5-methylimidazole, 2-ethylimidazole, 2-isopropylimidazole, 2-phenyl-4 -Benzylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazole, 1-cyanoethyl-2-isopropylimidazole, 1-cyanoethyl 2-phenylimidazole, 1-cyanoethyl-2-methylimidazolium trimellitate, 1-cyanoethyl-2-phenylimidazolium trimellitate, 2,4-diamino-6- [2′-methylimidazolyl- (1 ')]-Ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl-4-methylimidazolyl- (1')]-ethyl-s-triazine, 2,4-diamino-6- [ 2′-undecylimidazolyl- (1 ′)]-ethyl-s-triazine, 2-methylimidazolium isocyanuric acid adduct, 2-phenylimidazolium isocyanuric acid adduct, 2,4-diamino-6- [ 2′-Methylimidazolyl- (1 ′)]-ethyl-s-triazine-isocyanuric acid adduct, 2-phenyl-4,5-dihydroxymethylimidazole 2-phenyl-4-benzyl-5-hydroxymethylimidazole, 4,4′-methylene-bis- (2-ethyl-5-methylimidazole), 1-aminoethyl-2-methylimidazole, 1-cyanoethyl -2-Phenyl-4,5-di (cyanoethoxymethyl) imidazole, 1-dodecyl-2-methyl-3-benzylimidazolium chloride, 2-methylimidazole / benzotriazole adduct, 1-aminoethyl-2-ethyl Imidazole, 1- (cyanoethylaminoethyl) -2-methylimidazole, N, N ′-[2-methylimidazolyl- (1) -ethyl] -adipoyldiamide, N, N′-bis- (2-methylimidazolyl) -1-ethyl) urea, N- (2-methylimidazolyl-1-ethyl) urea, N, N ′-[2-me Louis imidazolyl- (1) -ethyl] dodecandioyl diamide, N, N ′-[2-methylimidazolyl- (1) -ethyl] eicosane oil amide, 1-benzyl-2-phenylimidazole / hydrochloride, etc. Reaction accelerators such as imidazoles and triphenylphosphine. It may be used alone or in combination of two or more.
テーピング特性の安定とは、接着テープをリードの上に熱圧着する際に、テープの端面からの接着剤の溶融によるはみ出しを防止し、かつ接着剤層に適当な厚さを保持して接着性を維持することを意味する。
フィラーの含有率は、全固形分の4~40質量%、好ましくは9~24質量%の範囲に設定することが好ましい。
含有率が上記範囲内であるとテーピング特性の安定化効果が大きくなり、また接着テープの接着強度が向上し、さらにラミネート等の加工性が良くなるので好ましい。
フィラーとしては、例えば、シリカ、石英粉、アルミナ、炭酸カルシウム、酸化マグネシウム、ダイヤモンド粉、マイカ、フッ素樹脂、ジルコン粉等が使用されえる。 In addition, the liquid adhesive may contain a filler having a particle size of 1 μm or less in order to stabilize taping characteristics when applied to an adhesive tape.
Stabilization of taping characteristics means that when thermobonding the adhesive tape onto the leads, it prevents adhesive from sticking out of the end surface of the tape and maintains an appropriate thickness in the adhesive layer. Means to maintain.
The filler content is preferably set in the range of 4 to 40% by mass, preferably 9 to 24% by mass, based on the total solid content.
When the content is within the above range, the effect of stabilizing the taping characteristics is increased, the adhesive strength of the adhesive tape is improved, and the processability of laminate and the like is further improved.
Examples of fillers that can be used include silica, quartz powder, alumina, calcium carbonate, magnesium oxide, diamond powder, mica, fluororesin, and zircon powder.
洗浄に用いることができる有機溶剤としては、アセトン、メチルエチルケトン、ヘキサン、ベンゼン、トルエン、キシレン、メタノール、エタノール、プロパノール、ジエチルエーテル、テトラヒドロフラン、酢酸メチル、酢酸エチル、アセトニトリル、塩化メチレン、クロロホルム、四塩化炭素、クロロベンゼン、ジクロロベンゼン、ジクロロエタン、トリクロロエタン等が挙げられる。 In addition, the liquid adhesive is taken out after completion of the reaction, that is, after drying, if necessary, after being washed with an organic solvent, water, or a mixture of an organic solvent and water, and then again selected as needed. It may be dissolved in a solvent and used as an adhesive.
Organic solvents that can be used for washing include acetone, methyl ethyl ketone, hexane, benzene, toluene, xylene, methanol, ethanol, propanol, diethyl ether, tetrahydrofuran, methyl acetate, ethyl acetate, acetonitrile, methylene chloride, chloroform, carbon tetrachloride. , Chlorobenzene, dichlorobenzene, dichloroethane, trichloroethane and the like.
本発明の接着テープは、耐熱性フィルムまたは剥離性フィルムの少なくとも一面に、上記電子部品用液状接着剤を塗布、乾燥した接着層が形成されていることを特徴とする。
その際、塗布厚さは、5~100μm、とりわけ10~50μmの範囲にあることが好ましい。 Next, the adhesive tape of the present invention will be described.
The adhesive tape of the present invention is characterized in that an adhesive layer formed by applying and drying the liquid adhesive for electronic parts is formed on at least one surface of a heat-resistant film or a peelable film.
In this case, the coating thickness is preferably in the range of 5 to 100 μm, particularly 10 to 50 μm.
耐熱性フィルムの厚さは、7.5~130μm、好ましくは、12.5~75μmの範囲に設定することが好ましい。耐熱性フィルムの形状やサイズは必要に応じて選択できる。
上記範囲内であると、接着テープの腰が充分になり、打ち抜き作業が容易になる。 Examples of the heat resistant film include heat resistant resin films such as polyimide, polyphenylene sulfide, polyether, polyparabanic acid, and polyethylene terephthalate, and composite heat resistant films such as epoxy resin-glass cloth and epoxy resin-polyimide-glass cloth. Among them, a polyimide film is particularly preferable.
The thickness of the heat resistant film is preferably set in the range of 7.5 to 130 μm, preferably 12.5 to 75 μm. The shape and size of the heat resistant film can be selected as necessary.
Within the above range, the waist of the adhesive tape becomes sufficient, and the punching operation becomes easy.
これらの剥離性フィルムは、90゜ピール強度が0.01~7.0g/cmの範囲にあることが望ましい。
剥離強度が上記の範囲内であると、接着テープ搬送時に剥離性フィルムが接着剤層から簡単に剥離せず、また使用時には剥離性フィルムが接着剤層からきれいに剥がれ、作業性が良くなる。
なお、耐熱性フィルムに接着層を形成した場合には、接着層の上にさらに保護フィルムを設けてもよい。
保護フィルムとしては、上記剥離性フィルムと同様のものが使用できる。 The peelable film preferably has a thickness of 1 to 200 μm, preferably 10 to 100 μm, and acts as a temporary support. The shape and size of the peelable film can be selected as necessary. Examples of the peelable film that can be used include a polypropylene film, a fluororesin film, a polyethylene film, a polyethylene terephthalate film, paper, and, in some cases, a film that has been made peelable with a silicone resin.
These peelable films desirably have a 90 ° peel strength in the range of 0.01 to 7.0 g / cm.
When the peel strength is within the above range, the peelable film is not easily peeled from the adhesive layer during conveyance of the adhesive tape, and the peelable film is peeled cleanly from the adhesive layer during use, and the workability is improved.
In addition, when an adhesive layer is formed on the heat resistant film, a protective film may be further provided on the adhesive layer.
As the protective film, the same film as the peelable film can be used.
<実施例1>
成分(a):
アクリロニトリル-ブタジエン共重合体(カルボキシル基を含有せず、ムーニー粘度70M1+4100℃、アクリロニトリル含有率27%)100質量部
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)50質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)20質量部
成分(c):
市販の前記式(1)で示される化合物30質量部
市販の前記式(2)で示される化合物50質量部
成分(d):
1,3-ビス(3-アミノプロピル)-1,1,3,3-テトラメチルジシロキサン0.25質量部
以上の成分を、テトラヒドロフラン中に添加して充分に混合、溶解し、固形分率30質量%に調整して、実施例1の電子部品用液状接着剤を得た。
なお、マレイミド基1モル当量に対するアミノ基のモル当量は0.51である。 Hereinafter, the present invention will be described in more detail based on examples.
<Example 1>
Component (a):
Acrylonitrile-butadiene copolymer (without carboxyl group, Mooney viscosity 70M 1 + 4 100 ° C., acrylonitrile content 27%) 100 parts by mass Component (b):
50 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400: Showa) Polymer Co., Ltd.) 20 parts by mass component (c):
30 parts by mass of the compound represented by the formula (1) commercially available 50 parts by mass of the compound represented by the formula (2) commercially available Component (d):
0.25 parts by mass of 1,3-bis (3-aminopropyl) -1,1,3,3-tetramethyldisiloxane The above ingredients were added to tetrahydrofuran and mixed well and dissolved to obtain a solid content. The liquid adhesive for electronic parts of Example 1 was obtained by adjusting to 30% by mass.
In addition, the molar equivalent of the amino group with respect to 1 molar equivalent of the maleimide group is 0.51.
成分(a)を、下記のように変更した。
成分(a):
カルボキシル基変性ブタジエン-アクリロニトリル共重合体(カルボキシル基当量100、ムーニー粘度60M1+4100℃、アクリロニトリル含有率27%)100質量部
それ以外は実施例1と同様にして、実施例2の電子部品用液状接着剤を得た。 <Example 2>
Ingredient (a) was changed as follows.
Component (a):
Carboxyl group-modified butadiene-acrylonitrile copolymer (carboxyl group equivalent 100, Mooney viscosity 60M 1 + 4 100 ° C., acrylonitrile content 27%) 100 parts by mass Otherwise, in the same manner as in Example 1, the liquid for electronic parts of Example 2 An adhesive was obtained.
成分(b)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(CKM-1282:昭和高分子社製)70質量部
それ以外は実施例1と同様にして、実施例3の電子部品用液状接着剤を得た。 <Example 3>
Ingredient (b) was changed as follows.
Component (b):
70 parts by mass of pt-butylphenol type resol phenol resin (CKM-1282, manufactured by Showa Polymer Co., Ltd.) The liquid adhesive for electronic parts of Example 3 was obtained in the same manner as in Example 1 except that.
成分(b)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)50質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)40質量部
それ以外は実施例1と同様にして、実施例4の電子部品用液状接着剤を得た。 <Example 4>
Ingredient (b) was changed as follows.
Component (b):
50 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400: Showa) (Manufactured by Kobunshi Co., Ltd.) 40 parts by mass A liquid adhesive for electronic parts of Example 4 was obtained in the same manner as in Example 1 except that.
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(1)で示される化合物15質量部
市販の前記式(2)で示される化合物65質量部
それ以外は実施例1と同様にして、実施例5の電子部品用液状接着剤を得た。 <Example 5>
Ingredient (c) was changed as follows.
Component (c):
Commercially available 15 parts by mass of the compound represented by the formula (1) 65 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1 except that the liquid adhesive for electronic parts of Example 5 was used. Obtained.
成分(d)を、下記のように変更した。
成分(d): <Example 6>
Ingredient (d) was changed as follows.
Component (d):
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)16.6質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)6.7質量部
成分(c):
市販の前記式(1)で示される化合物10質量部
市販の前記式(2)で示される化合物16.7質量部
それ以外は実施例1と同様にして、実施例7の電子部品用液状接着剤を得た。 <Example 7>
Component (b) and component (c) were changed as follows.
Component (b):
16.6 parts by mass of pt-butylphenol type resol phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 6.7 parts by mass Component (c):
10 parts by mass of the commercially available compound represented by the formula (1) 16.7 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic parts of Example 7 An agent was obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)33.3質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)13.4質量部
成分(c):
市販の前記式(1)で示される化合物20質量部
市販の前記式(2)で示される化合物33.3質量部
それ以外は実施例1と同様にして、実施例8の電子部品用液状接着剤を得た。 <Example 8>
Component (b) and component (c) were changed as follows.
Component (b):
33.3 parts by mass of pt-butylphenol type resol phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 13.4 parts by mass Component (c):
20 parts by mass of the commercially available compound represented by the formula (1) 33.3 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic components of Example 8 An agent was obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)133.3質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)53.4質量部
成分(c):
市販の前記式(1)で示される化合物80質量部
市販の前記式(2)で示される化合物133.3質量部
それ以外は実施例1と同様にして、実施例9の電子部品用液状接着剤を得た。 <Example 9>
Component (b) and component (c) were changed as follows.
Component (b):
pt-Butylphenol type resole phenolic resin (trade name: “CKM-1282”, Showa Kogyo Co., Ltd.) 133.3 parts by mass Copolymerization type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 53.4 parts by mass Component (c):
80 parts by mass of the commercially available compound represented by the formula (1) 133.3 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic parts of Example 9 An agent was obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)266.6質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)106.7質量部
成分(c):
市販の前記式(1)で示される化合物160質量部
市販の前記式(2)で示される化合物266.7質量部
それ以外は実施例1と同様にして、実施例10の電子部品用液状接着剤を得た。 <Example 10>
Component (b) and component (c) were changed as follows.
Component (b):
26-part by mass of pt-butylphenol type resol phenol resin (trade name: “CKM-1282”, Showa Kogyo Co., Ltd.) Copolymer type novolak phenol resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 106.7 parts by mass Component (c):
160 parts by mass of a commercially available compound represented by the formula (1) 266.7 parts by mass of a commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic parts of Example 10 An agent was obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)85.7質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)34.3質量部
成分(c):
市販の前記式(1)で示される化合物11.2質量部
市販の前記式(2)で示される化合物18.8質量部
それ以外は実施例1と同様にして、実施例11の電子部品用液状接着剤を得た。 <Example 11>
Component (b) and component (c) were changed as follows.
Component (b):
85.7 parts by mass of pt-butylphenol type resol phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 34.3 parts by mass Component (c):
11.2 parts by mass of a commercially available compound represented by the formula (1) 18.8 parts by mass of a commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, for the electronic component of Example 11. A liquid adhesive was obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)32.1質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)12.9質量部
成分(c):
市販の前記式(1)で示される化合物39.4質量部
市販の前記式(2)で示される化合物65.6質量部
それ以外は実施例1と同様にして、実施例12の電子部品用液状接着剤を得た。 <Example 12>
Component (b) and component (c) were changed as follows.
Component (b):
32.1 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 12.9 parts by mass Component (c):
Commercially available compound represented by the formula (1) 39.4 parts by mass Commercially available compound represented by the formula (2) 65.6 parts by mass Other than that, in the same manner as in Example 1, the electronic component of Example 12 A liquid adhesive was obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)21.4質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)8.6質量部
成分(c):
市販の前記式(1)で示される化合物45質量部
市販の前記式(2)で示される化合物75質量部
それ以外は実施例1と同様にして、実施例13の電子部品用液状接着剤を得た。 <Example 13>
Component (b) and component (c) were changed as follows.
Component (b):
21.4 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Polymer Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 8.6 parts by mass Component (c):
45 parts by mass of the commercially available compound represented by the formula (1) 75 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic components of Example 13 was used. Obtained.
成分(b)及び成分(c)を、下記のように変更した。
成分(b):
p-t-ブチルフェノール型レゾールフェノール樹脂(商品名:「CKM-1282」、昭和高分子社製)10.7質量部
p-t-ブチルフェノールとBis-Aの共重合型ノボラックフェノール樹脂(CKM-2400:昭和高分子社製)4.3質量部
成分(c):
市販の前記式(1)で示される化合物50.6質量部
市販の前記式(2)で示される化合物84.4質量部
それ以外は実施例1と同様にして、実施例14の電子部品用液状接着剤を得た。 <Example 14>
Component (b) and component (c) were changed as follows.
Component (b):
10.7 parts by mass of pt-butylphenol type resole phenolic resin (trade name: “CKM-1282”, manufactured by Showa Kogyo Co., Ltd.) Copolymer type novolak phenolic resin (CKM-2400) of pt-butylphenol and Bis-A : Showa Polymer Co., Ltd.) 4.3 parts by mass Component (c):
50.6 parts by mass of a commercially available compound represented by the formula (1) 84.4 parts by mass of a commercially available compound represented by the formula (2) Other than that, in the same manner as in Example 1, the electronic component of Example 14 A liquid adhesive was obtained.
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(1)で示される化合物5質量部
市販の前記式(2)で示される化合物75質量部
それ以外は実施例1と同様にして、実施例15の電子部品用液状接着剤を得た。 <Example 15>
Ingredient (c) was changed as follows.
Component (c):
5 parts by mass of a commercially available compound represented by the formula (1) 75 parts by mass of a commercially available compound represented by the formula (2) In the same manner as in Example 1 except that, the liquid adhesive for electronic parts of Example 15 was used. Obtained.
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(1)で示される化合物10質量部
市販の前記式(2)で示される化合物70質量部
それ以外は実施例1と同様にして、実施例16の電子部品用液状接着剤を得た。 <Example 16>
Ingredient (c) was changed as follows.
Component (c):
Commercially available 10 parts by weight of the compound represented by the formula (1) 70 parts by weight of the commercially available compound represented by the formula (2) In the same manner as in Example 1, except that the liquid adhesive for electronic components of Example 16 was used. Obtained.
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(1)で示される化合物20質量部
市販の前記式(2)で示される化合物60質量部
それ以外は実施例1と同様にして、実施例17の電子部品用液状接着剤を得た。 <Example 17>
Ingredient (c) was changed as follows.
Component (c):
Commercially available 20 parts by weight of the compound represented by the formula (1) 60 parts by weight of the commercially available compound represented by the formula (2) In the same manner as in Example 1, except that the liquid adhesive for electronic components of Example 17 was used. Obtained.
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(1)で示される化合物40質量部
市販の前記式(2)で示される化合物40質量部
それ以外は実施例1と同様にして、実施例18の電子部品用液状接着剤を得た。 <Example 18>
Ingredient (c) was changed as follows.
Component (c):
40 parts by mass of the commercially available compound represented by the formula (1) 40 parts by mass of the commercially available compound represented by the formula (2) In the same manner as in Example 1, except that the liquid adhesive for electronic parts of Example 18 was used. Obtained.
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(1)で示される化合物80質量部
それ以外は実施例1と同様にして、式(2)で示される化合物を含まない、比較例1の電子部品用液状接着剤を得た。 <Comparative Example 1>
Ingredient (c) was changed as follows.
Component (c):
80 parts by mass of a commercially available compound represented by the formula (1) In the same manner as in Example 1 except for the above, a liquid adhesive for electronic parts of Comparative Example 1 which does not contain the compound represented by the formula (2) was obtained. .
成分(c)を、下記のように変更した。
成分(c):
市販の前記式(2)で示される化合物80質量部
それ以外は実施例1と同様にして、式(1)で示される化合物を含まない、比較例2の電子部品用液状接着剤を得た。 <Comparative Example 2>
Ingredient (c) was changed as follows.
Component (c):
80 parts by mass of a commercially available compound represented by the formula (2) In the same manner as in Example 1 except for the above, a liquid adhesive for electronic parts of Comparative Example 2 containing no compound represented by the formula (1) was obtained. .
接着テープの打ち抜き:金型により接着テープをリング状に打ち抜いた。
接着テープの仮接着:ホットプレート上にプレーンを置き、リング状に打ち抜いたテープをプレーンに金属ロッドで押し付け仮接着した。
なお、仮接着の条件は140℃/2秒/4Kgf/cm2とした。
リードフレーム組み立て:上記工程で接着テープを仮接着したプレーンと、リードフレーム(Cu材)本体を位置合わせし、加熱したホットプレート上で加熱加圧し、リードフレーム(Cu材)とプレーンを接着テープを介して貼り合わせた。
なお、貼り合わせの条件は140℃/2秒/4Kgf/cm2とした。
接着テープキュアー:窒素置換した熱風循環型オーブン内に入れ、熱硬化させた。
なお、熱硬化の条件は200℃/1時間とした。 Next, using the adhesive tapes using the adhesives of Examples 1 to 18 and Comparative Examples 1 and 2, the lead frame used for the semiconductor package shown in FIG. Assembled.
Punching of adhesive tape: The adhesive tape was punched into a ring shape with a mold.
Temporary adhesion of adhesive tape: A plain was placed on a hot plate, and the tape punched into a ring shape was pressed against the plane with a metal rod and temporarily adhered.
The temporary bonding conditions were 140 ° C./2 seconds / 4 Kgf / cm 2 .
Lead frame assembly: The plane on which the adhesive tape is temporarily bonded in the above process and the lead frame (Cu material) main body are aligned, heated and pressed on a heated hot plate, and the lead frame (Cu material) and the plane are bonded with the adhesive tape. Pasted together.
The bonding conditions were 140 ° C./2 seconds / 4 Kgf / cm 2 .
Adhesive tape cure: Placed in a hot-air circulating oven substituted with nitrogen and heat-cured.
The conditions for thermosetting were 200 ° C./1 hour.
ダイボンディング:半導体チップをダイボンディング用銀ペーストを用いて、プレーンと貼り合せたリードフレームのプレーン部に接着し、150℃で2時間硬化させた。
ワイヤーボンディング:ワイヤーボンダーにより、金線で、半導体チップ上のワイヤーパッドとリードピンのインナーリード線端部の銀メッキ部分とを配線した。
モールディング:エポキシ系モールド剤でトランスファーモールドした。
仕上げ工程:ホーミング、ダイカット、アウターリード部のメッキ等の工程を実施し、パッケージに仕上げた。 Next, a lead frame (Cu material) bonded to the produced plane was used to assemble a semiconductor package according to the following procedure.
Die bonding: A semiconductor chip was bonded to a plane portion of a lead frame bonded to a plane using a silver bonding paste, and cured at 150 ° C. for 2 hours.
Wire bonding: A wire bonder was used to wire the wire pad on the semiconductor chip and the silver plating portion at the end of the inner lead wire of the lead pin with a gold wire.
Molding: Transfer molded with an epoxy molding agent.
Finishing process: Processes such as homing, die cutting, and plating of the outer lead part were performed to finish the package.
<低温接着、硬化>
実施例1~18および比較例1、2の接着テープについて、容易且つ迅速に被着体、すなわちプレーンもしくはリードピンに接着できるか否かの評価を行った。
具体的には、銅板に100℃、140℃、または180℃で接着テープを貼り付け(テーピング)した後の、10mm幅のテープの室温での90°ピール強度(接着力)を測定した。
結果を表2に示す。 (Evaluation)
<Low temperature bonding and curing>
The adhesive tapes of Examples 1 to 18 and Comparative Examples 1 and 2 were evaluated whether or not they could be easily and quickly adhered to an adherend, that is, a plane or a lead pin.
Specifically, the 90 ° peel strength (adhesive force) at room temperature of a 10 mm wide tape after the adhesive tape was attached (taped) to a copper plate at 100 ° C., 140 ° C., or 180 ° C. was measured.
The results are shown in Table 2.
◎:100℃で接着可能。実用上優れる。
○:140℃で接着可能。実用上問題なし。
△:180℃で接着可能。実用可能。
×:180℃で接着できず。実用上問題あり。
低温接着、硬化の評価結果を表5に示す。 The adhesive strength was 4.2 N / cm or more, and <low temperature adhesion, curing> was evaluated according to the following criteria.
A: Bondable at 100 ° C. Excellent in practical use.
○: Can be bonded at 140 ° C. There is no practical problem.
Δ: Can be bonded at 180 ° C. Practical possible.
×: Cannot be bonded at 180 ° C. There are practical problems.
Table 5 shows the evaluation results of low-temperature adhesion and curing.
下記のようにボイド、せん断接着力に基づいて評価した。
(ボイド)
接着剤を硬化させる際に、接着剤内に発生するボイドが実用上問題になるレベルにあるか否かを顕微鏡により視覚判定した。
具体的には、銅板に140℃で接着テープを貼り付け(テーピング)した後、30℃/70%RHにて72時間調湿保管し、試験用サンプルとした。
そして、試験用サンプルを160℃のヒーターブロックへ1分間載せ、テープと銅板の間のボイドの状態を顕微鏡により視覚判定した。
(せん断接着力)
[試験体作製]
幅5mm×長さ75mmに裁断した接着テープを、20mm×20mmの銅板の端部(一片の中央部)に、140℃で貼り付けた(テーピング)。
貼付面積は25mm2(5mm×5mmサイズ)、銅材に未着のテープ長さは70mmとした。
[せん断接着強度測定]
160℃のヒーターブロック上に上記試験体を固定した後、テープの銅板未着部分を万能引張試験機に接続し、せん断接着強度を測定した。
測定時の銅板-引張試験機のチャック間距離は50mm、引張速度は50mm/分とした。
尚、測定温度を安定化させるため、試験体をヒーターブロック上に固定し、5秒経過後に測定を開始した。
結果を表3に示す。 <Heat resistance>
Evaluation was based on voids and shear adhesive strength as described below.
(void)
When the adhesive was cured, it was visually determined by a microscope whether or not the voids generated in the adhesive were at a level that would cause a practical problem.
Specifically, after affixing (taping) an adhesive tape to a copper plate at 140 ° C., the humidity was stored at 30 ° C./70% RH for 72 hours to obtain a test sample.
Then, the test sample was placed on a heater block at 160 ° C. for 1 minute, and the state of voids between the tape and the copper plate was visually determined with a microscope.
(Shear adhesive strength)
[Test specimen preparation]
The adhesive tape cut to a width of 5 mm and a length of 75 mm was affixed to an end (a central part of one piece) of a 20 mm × 20 mm copper plate at 140 ° C. (taping).
The sticking area was 25 mm 2 (5 mm × 5 mm size), and the length of the tape not attached to the copper material was 70 mm.
[Measurement of shear bond strength]
After fixing the test body on a 160 ° C. heater block, the unattached portion of the tape on the copper plate was connected to a universal tensile testing machine, and the shear bond strength was measured.
The distance between the chuck of the copper plate-tension tester at the time of measurement was 50 mm, and the tensile speed was 50 mm / min.
In addition, in order to stabilize measurement temperature, the test body was fixed on the heater block, and measurement was started after 5 seconds.
The results are shown in Table 3.
◎:ボイドなし、かつ、せん断接着強度40N/cm2以上(実用上全く問題なし)
○:ボイドなし、かつ、せん断接着強度20N/cm2以上40N/cm2未満(実用上問題なし)
△:ボイドなし、かつ、せん断接着強度20N/cm2未満(実用上問題なし)
×:ボイドあり、かつ、せん断接着強度20N/cm2未満(実用上問題あり)
耐熱性の評価結果を表5に示す。 And <heat resistance> was evaluated according to the following criteria.
A: No void and shear adhesive strength of 40 N / cm 2 or more (no problem in practical use)
○: No void and shear adhesive strength of 20 N / cm 2 or more and less than 40 N / cm 2 (no problem in practical use)
Δ: No void and shear bond strength of less than 20 N / cm 2 (no problem in practical use)
X: Void and shear bond strength less than 20 N / cm 2 (practical problem)
Table 5 shows the evaluation results of heat resistance.
接着剤を硬化させる際に、リードピンの位置ズレが実用上問題にあるレベルにあるか否かに基づいて評価した。
具体的には、接着テープを、金型を用いて外寸22mm×内寸20mmの正方形(リング)に打ち抜いた後、評価用リードフレーム(QFP208ピン)の所定の位置に熱プレスにて貼り付けた。
熱プレス条件は、圧力5kgf/cm2、圧着時間0.3秒とした。圧着温度は120℃~140℃とした(リードピン上の接着剤厚さが15~18μmになる温度を貼付可能温度と見做した)。
尚、使用したリードフレームのピンピッチは168μmである。
[リードピンの位置ズレの測定]
テープ貼付直後および熱風循環型オーブンにて200℃/1時間処理後、リードフレームのピンピッチをマイクロスコープで測定した。
圧着温度および測定結果を表4に示した。 <Dimensional stability of lead pin>
When the adhesive was cured, the evaluation was made based on whether or not the positional deviation of the lead pins was at a level that was problematic in practice.
Specifically, an adhesive tape is punched into a square (ring) with an outer dimension of 22 mm x an inner dimension of 20 mm using a mold, and then attached to a predetermined position of an evaluation lead frame (QFP 208 pin) with a hot press. It was.
The hot press conditions were a pressure of 5 kgf / cm 2 and a pressure bonding time of 0.3 seconds. The pressure bonding temperature was 120 ° C. to 140 ° C. (the temperature at which the adhesive thickness on the lead pin was 15 to 18 μm was regarded as the temperature at which application was possible).
The lead frame used has a pin pitch of 168 μm.
[Measurement of lead pin misalignment]
Immediately after the tape was applied and after treatment at 200 ° C./1 hour in a hot air circulation oven, the pin pitch of the lead frame was measured with a microscope.
The pressure bonding temperature and the measurement results are shown in Table 4.
○:テープ貼付直後のピンピッチ、および、熱風循環型オーブンにて200℃/1時間処理後のピンピッチが、いずれも168μm±10%以内。
△:テープ貼付直後のピンピッチ、および、熱風循環型オーブンにて200℃/1時間処理後のピンピッチが、いずれも168μm±10%を越えて168μm±15%以内。
×:テープ貼付直後のピンピッチ、および、熱風循環型オーブンにて200℃/1時間処理後のピンピッチが、いずれも168μm±15%を越えた値。
リードピンの寸法安定性の評価結果を表5に示す。 Then, <dimensional stability of lead pin> was evaluated according to the following criteria.
○: The pin pitch immediately after tape application and the pin pitch after treatment at 200 ° C./1 hour in a hot air circulating oven are both within 168 μm ± 10%.
(Triangle | delta): The pin pitch immediately after tape sticking, and the pin pitch after a 200 degreeC / 1 hour process in a hot-air circulation type oven both exceeded 168 micrometers +/- 10% and within 168 micrometers +/- 15%.
X: The values of the pin pitch immediately after tape application and the pin pitch after treatment at 200 ° C./1 hour in a hot air circulation oven exceeded 168 μm ± 15%.
Table 5 shows the evaluation results of the dimensional stability of the lead pins.
前述のようにして得られたパッケージに対して、PCBT試験(Pressure Cooker Biased Test)を行った。
条件は100ボルト印加、130℃、2atm、85%RHで実施し、電気的信頼性テストを行った。
そして、下記の基準で<信頼性>の評価を行った。
○:240時間でショートなし
×:240時間でショートあり
信頼性の評価結果を表5に示す。 <Reliability>
The package obtained as described above was subjected to a PCBT test (Pressure Cooker Biased Test).
Conditions were 100 volts applied, 130 ° C., 2 atm, 85% RH, and an electrical reliability test was performed.
And <reliability> was evaluated according to the following criteria.
○: No short circuit at 240 hours ×: Short circuit at 240 hours Table 5 shows the reliability evaluation results.
前記信頼性テストの後で、パッケージを研磨して接着剤面を露出させ、顕微鏡で観察した。
そして、下記の基準で<耐マイグレーション性>の評価を行った。
◎:デンドライト確認できず、リードピンの変色もない。
○:デンドライト確認できないが、リードピンの変色がある。
×:デンドライトあり
耐マイグレーション性の評価結果を表5に示す。 <Migration resistance>
After the reliability test, the package was polished to expose the adhesive surface and observed with a microscope.
And <migration resistance> was evaluated according to the following criteria.
A: Dendrite cannot be confirmed, and there is no discoloration of the lead pin.
○: Dendrite cannot be confirmed, but lead pin is discolored.
X: With dendrite Table 5 shows the evaluation results of migration resistance.
リードフレームの組み立ての際の接着テープのテーピング等、使用時のハンドリング性(カール、走行性)および接着テープの接着剤表面のタックについて、下記の基準で<作業性>の評価を行った。
○:タックがなく非常に作業しやすい
△:タックが少なく作業しやすい
×:タックがあり作業しにくい <Workability>
The handling properties (curling and running properties) during use, such as taping of the adhesive tape at the time of assembling the lead frame, and the tackiness of the adhesive surface of the adhesive tape were evaluated for <workability> according to the following criteria.
○: Very easy to work without tack △: Easy to work with little tack ×: Hard to work with tack
表5から明らかなように、実施例1~実施例18の接着テープは、全て△以上で実用上問題ない。
特に、実施例5、実施例9、実施例16及び実施例17は、低温接着、硬化、耐熱性、耐マイグレーション性に優れていた。更に実施例2は、低温接着、硬化、耐熱性、耐マイグレーション性に優れていた。
これに対して、比較例1の接着テープは、信頼性試験でショートし、耐マイグレーション性についてデンドライトありで実用上問題があった。
また、比較例2の接着テープは、耐熱性及びリードピンの寸法安定性について実用上問題があった。 (Evaluation results)
As can be seen from Table 5, the adhesive tapes of Examples 1 to 18 are all Δ or more and have no practical problem.
In particular, Example 5, Example 9, Example 16, and Example 17 were excellent in low-temperature adhesion, curing, heat resistance, and migration resistance. Furthermore, Example 2 was excellent in low-temperature adhesion, curing, heat resistance, and migration resistance.
On the other hand, the adhesive tape of Comparative Example 1 was short-circuited in the reliability test, and there was a practical problem with dendrite in terms of migration resistance.
Moreover, the adhesive tape of Comparative Example 2 had practical problems with respect to heat resistance and lead pin dimensional stability.
2 プレーン
3 リードピン
4 ボンディングワイヤー
5 樹脂
6 接着層
7 ダイパッド
8 電極
Claims (14)
- 有機溶剤中に、
成分(a)アクリロニトリル-ブタジエン共重合体、
成分(b)フェノ-ル樹脂、
成分(c)マレイミド基を2個以上含有する化合物
を溶解した液状接着剤であり、前記成分(c)は、下記式(1)で示される化合物、および下記(2)で示される化合物を含むことを特徴とする電子部品用液状接着剤。
Component (a) acrylonitrile-butadiene copolymer,
Component (b) phenol resin,
Component (c) is a liquid adhesive in which a compound containing two or more maleimide groups is dissolved, and the component (c) includes a compound represented by the following formula (1) and a compound represented by the following (2) The liquid adhesive for electronic components characterized by the above-mentioned.
- 前記成分(a)はムーニー粘度が50~90M1+4100℃であり、アクリロニトリルの含有率が5~50質量%であることを特徴とする請求項1記載の電子部品用液状接着剤。 The liquid adhesive for electronic parts according to claim 1, wherein the component (a) has a Mooney viscosity of 50 to 90M 1 + 4 at 100 ° C and an acrylonitrile content of 5 to 50% by mass.
- 前記成分(a)は、カルボキシル基を有するアクリロニトリル-ブタジエン共重合体であることを特徴とする請求項1記載の電子部品用液状接着剤。 2. The liquid adhesive for electronic components according to claim 1, wherein the component (a) is an acrylonitrile-butadiene copolymer having a carboxyl group.
- 前記成分(b)は、レゾール型のアルキルフェノールを含むフェノ-ル樹脂であることを特徴とする請求項1記載の電子部品用液状接着剤。 2. The liquid adhesive for electronic parts according to claim 1, wherein the component (b) is a phenol resin containing a resol type alkylphenol.
- 前記成分(b)は、レゾール型のフェノールとノボラック型のフェノールとを併用することを特徴とする請求項1記載の電子部品用液状接着剤。 The liquid adhesive for electronic parts according to claim 1, wherein the component (b) uses a resol type phenol and a novolac type phenol in combination.
- 前記成分(c)は、上記式(1)および(2)で示される化合物の質量比が、3:3~3:45であることを特徴とする請求項1記載の電子部品用液状接着剤。 The liquid adhesive for electronic parts according to claim 1, wherein the component (c) has a mass ratio of the compounds represented by the formulas (1) and (2) of 3: 3 to 3:45. .
- 成分(a)100質量部に対して、成分(b)、成分(c)の総和が10~900質量部であり、かつ、成分(b)、成分(c)の総和中に占める成分(b)の質量割合が10~90質量%であることを特徴とする請求項1記載の電子部品用液状接着剤。 The sum of component (b) and component (c) is 10 to 900 parts by weight with respect to 100 parts by weight of component (a), and component (b) in the sum of component (b) and component (c) 2. The liquid adhesive for electronic parts as claimed in claim 1, wherein the mass ratio of (1) is 10 to 90% by mass.
- さらに、成分(d)ジアミン化合物を含有することを特徴とする請求項1記載の電子部品用液状接着剤。 Furthermore, component (d) diamine compound is contained, The liquid adhesive for electronic components of Claim 1 characterized by the above-mentioned.
- 前記成分(d)は、下記式(4)で示される化合物であり、重量平均分子量200~7,000であることを特徴とする請求項8記載の電子部品用液状接着剤。
- 粒径1μm以下のフィラーが、全固形分の4~40質量%含まれていることを特徴とする請求項1記載の電子部品用液状接着剤。 2. The liquid adhesive for electronic parts according to claim 1, wherein a filler having a particle size of 1 μm or less is contained in an amount of 4 to 40% by mass of the total solid content.
- 耐熱性フィルムの少なくとも一面に、請求項1記載の電子部品用液状接着剤を塗布、乾燥した接着層が形成されていることを特徴とする接着テープ。 An adhesive tape comprising an adhesive layer formed by applying and drying the liquid adhesive for electronic parts according to claim 1 on at least one surface of a heat resistant film.
- 耐熱性フィルムが、ポリイミドフィルムであることを特徴とする請求項12記載の接着テープ。 The adhesive tape according to claim 12, wherein the heat resistant film is a polyimide film.
- 剥離性フィルムの少なくとも一面に、請求項1記載の電子部品用液状接着剤を塗布、乾燥した接着層が形成されていることを特徴とする接着テープ。 An adhesive tape comprising an adhesive layer formed by applying and drying the liquid adhesive for electronic parts according to claim 1 on at least one surface of the peelable film.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020127023214A KR101401162B1 (en) | 2010-03-25 | 2011-03-23 | Liquid adhesive for electronic parts and adhesive tape |
CN201180015590.XA CN102812099B (en) | 2010-03-25 | 2011-03-23 | Liquid adhesive for electronic parts and adhesive tape |
JP2012507048A JP5486081B2 (en) | 2010-03-25 | 2011-03-23 | Liquid adhesive and adhesive tape for electronic parts |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010-069063 | 2010-03-25 | ||
JP2010069063 | 2010-03-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2011118664A1 true WO2011118664A1 (en) | 2011-09-29 |
Family
ID=44673213
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2011/057056 WO2011118664A1 (en) | 2010-03-25 | 2011-03-23 | Liquid adhesive for electronic parts and adhesive tape |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5486081B2 (en) |
KR (1) | KR101401162B1 (en) |
CN (1) | CN102812099B (en) |
TW (1) | TWI429723B (en) |
WO (1) | WO2011118664A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013062318A (en) * | 2011-09-12 | 2013-04-04 | Tomoegawa Paper Co Ltd | Composite magnetic material |
WO2024203092A1 (en) * | 2023-03-27 | 2024-10-03 | 株式会社巴川コーポレーション | Adhesive agent composition, adhesive laminate, and composite member |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6909171B2 (en) * | 2018-02-12 | 2021-07-28 | 株式会社巴川製紙所 | Adhesive sheet for manufacturing semiconductor devices and manufacturing method of semiconductor devices using it |
CN112626569A (en) * | 2020-12-01 | 2021-04-09 | 云南漫风鸟科技有限公司 | Corrosion prevention process of electrolytic zinc cathode aluminum plate for zinc smelting |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09176593A (en) * | 1995-12-25 | 1997-07-08 | Tomoegawa Paper Co Ltd | Liquid adhesive for electronic part and adhesive tape using the same |
JP2001019920A (en) * | 1999-07-08 | 2001-01-23 | Tomoegawa Paper Co Ltd | Adhesive and adhesive tape for electronic part |
JP2002129116A (en) * | 2000-10-26 | 2002-05-09 | Tomoegawa Paper Co Ltd | Adhesive tape for semiconductor device |
JP2004352963A (en) * | 2003-05-30 | 2004-12-16 | Tomoegawa Paper Co Ltd | Adhesive tape for electronic parts |
JP2009158817A (en) * | 2007-12-27 | 2009-07-16 | Tomoegawa Paper Co Ltd | Thermosetting type resin composition for qfn, and adhesive sheet for qfn using it |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3083814B1 (en) * | 1999-03-16 | 2000-09-04 | サエハン インダストリーズ インコーポレーション | Electronic component adhesive tape |
US20070179232A1 (en) * | 2006-01-30 | 2007-08-02 | National Starch And Chemical Investment Holding Corporation | Thermal Interface Material |
-
2011
- 2011-03-23 JP JP2012507048A patent/JP5486081B2/en active Active
- 2011-03-23 KR KR1020127023214A patent/KR101401162B1/en active IP Right Grant
- 2011-03-23 CN CN201180015590.XA patent/CN102812099B/en active Active
- 2011-03-23 WO PCT/JP2011/057056 patent/WO2011118664A1/en active Application Filing
- 2011-03-24 TW TW100110045A patent/TWI429723B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09176593A (en) * | 1995-12-25 | 1997-07-08 | Tomoegawa Paper Co Ltd | Liquid adhesive for electronic part and adhesive tape using the same |
JP2001019920A (en) * | 1999-07-08 | 2001-01-23 | Tomoegawa Paper Co Ltd | Adhesive and adhesive tape for electronic part |
JP2002129116A (en) * | 2000-10-26 | 2002-05-09 | Tomoegawa Paper Co Ltd | Adhesive tape for semiconductor device |
JP2004352963A (en) * | 2003-05-30 | 2004-12-16 | Tomoegawa Paper Co Ltd | Adhesive tape for electronic parts |
JP2009158817A (en) * | 2007-12-27 | 2009-07-16 | Tomoegawa Paper Co Ltd | Thermosetting type resin composition for qfn, and adhesive sheet for qfn using it |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013062318A (en) * | 2011-09-12 | 2013-04-04 | Tomoegawa Paper Co Ltd | Composite magnetic material |
WO2024203092A1 (en) * | 2023-03-27 | 2024-10-03 | 株式会社巴川コーポレーション | Adhesive agent composition, adhesive laminate, and composite member |
Also Published As
Publication number | Publication date |
---|---|
JPWO2011118664A1 (en) | 2013-07-04 |
KR101401162B1 (en) | 2014-05-29 |
JP5486081B2 (en) | 2014-05-07 |
TW201202370A (en) | 2012-01-16 |
TWI429723B (en) | 2014-03-11 |
KR20120124479A (en) | 2012-11-13 |
CN102812099A (en) | 2012-12-05 |
CN102812099B (en) | 2014-12-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2732020B2 (en) | Adhesive tape and liquid adhesive for electronic parts | |
JP2732021B2 (en) | Adhesive tape and liquid adhesive for electronic parts | |
JP2896754B2 (en) | Adhesive tape for electronic components | |
JP2896751B2 (en) | Adhesive tape for electronic components | |
US5863988A (en) | Liquid adhesive for electronic parts and adhesive tape | |
JP5486081B2 (en) | Liquid adhesive and adhesive tape for electronic parts | |
JP5648617B2 (en) | Thermally conductive adhesive composition, adhesive sheet and thermal conductive dicing die attach film using the same | |
JP5183076B2 (en) | Manufacturing method of semiconductor device | |
JP2896755B2 (en) | Adhesive tape for electronic components | |
JPH0913001A (en) | Liquid adhesive for electronic component and adhesive tape for electronic component | |
JP3893085B2 (en) | Adhesive for electronic parts and adhesive tape for electronic parts | |
JP3118420B2 (en) | Liquid adhesives and adhesive tapes for electronic components | |
JP3118404B2 (en) | Liquid adhesives and adhesive tapes for electronic components | |
JP2004352963A (en) | Adhesive tape for electronic parts | |
JP4530126B2 (en) | Adhesive composition and adhesive film | |
JP4586966B2 (en) | Adhesive composition and adhesive film | |
JP2896752B2 (en) | Adhesive tape for electronic components | |
JP3599659B2 (en) | Adhesive tape for semiconductor devices | |
JP4404576B2 (en) | Adhesive tape for electronic parts | |
JP2004352961A (en) | Adhesive tape for electronic part | |
JP2006028242A (en) | Adhesive tape for electronic part, and electronic part | |
JP3532792B2 (en) | Adhesive and adhesive tape for electronic parts | |
JP2001019920A (en) | Adhesive and adhesive tape for electronic part | |
JP4347941B2 (en) | Adhesive tape | |
JPH11246840A (en) | Adhesive for electronic part and adhesive tape |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
WWE | Wipo information: entry into national phase |
Ref document number: 201180015590.X Country of ref document: CN |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11759469 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2012507048 Country of ref document: JP |
|
ENP | Entry into the national phase |
Ref document number: 20127023214 Country of ref document: KR Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11759469 Country of ref document: EP Kind code of ref document: A1 |