WO2011093356A1

WO2011093356A1 - Rotary mold for imprinting and production method thereof

Info

Publication number: WO2011093356A1
Application number: PCT/JP2011/051548
Authority: WO
Inventors: 栄中塚; 勲雨宮; 生木村
Original assignee: Hoya株式会社
Priority date: 2010-01-29
Filing date: 2011-01-27
Publication date: 2011-08-04
Also published as: JPWO2011093356A1; JP5707342B2

Abstract

In a production method of a rotary mold used for imprinting, the rotary mold comprises first and second mold end surfaces, and a mold peripheral surface having a pattern for imprinting, wherein fluid gathering prevention units are respectively provided on the end surfaces in the external direction, and opening holes for storing a flattening agent are respectively formed between the fluid gathering prevention units and the mold end surfaces. The fluid gathering prevention unit has an outer diameter smaller than the outer diameter of the rotary mold.

Description

Imprint rotary mold and manufacturing method thereof

The present invention relates to an imprint rotary mold and a manufacturing method thereof, and more particularly, to an imprint rotary mold for forming a fine pattern on the outer peripheral surface of a mold and a manufacturing method thereof.

Conventionally, processing in the micron order has been performed in the field of machining and electronic circuit, but conventionally, it has been common to use visible light when controlling the processing. However, there was a limit that visible light can only be controlled in the micron order.

On the other hand, in an apparatus called a stepper, by using light and an electron beam having a wavelength shorter than that of visible light from an ultraviolet laser or an extreme ultraviolet light source, processing from the micron order to several tens of nanometers becomes possible.

On the other hand, even micron-order processing takes a considerable amount of time to form a pattern. For this reason, the time required for nano-order microfabrication further increases. In addition, when an ultraviolet laser or an extreme ultraviolet light source is used, the apparatus becomes large and the cost increases. Further, the technique of performing microfabrication by exposure / development with an electron beam is sequential processing, and the work efficiency is lowered.

On the other hand, as a conventional fine pattern transfer, there is a conventional technique that transfers a mask pattern formed on a glass plate by exposure using normal light, that is, a photolithography method. However, even if photolithography is used, it depends on the resolution of light, and there is a limit in forming a nano-order fine pattern.

In response to this problem, in recent years, attention has been focused on nanoimprint technology, which is a method for transferring a fine pattern onto a material to be transferred like a stamp using a mold on which a fine pattern is formed. By this nanoimprint technology, a fine structure of several tens of nm level can be manufactured at a low cost with good reproducibility and in large quantities.

There are two main types of imprint technology, thermal imprint and optical imprint. Thermal imprinting is a method in which a mold on which a fine pattern is formed is pressed against a thermoplastic resin as a molding material while being heated, and then the molding material is cooled and released to transfer the fine pattern. Optical imprinting is a method in which a mold on which a fine pattern is formed is pressed against a photocurable resin that is a molding material, irradiated with ultraviolet light, and then the molding material is released to transfer the fine pattern. is there.

Whichever imprinting method is used, it is necessary to transfer a finer pattern onto a larger molding material. As a method used to do this, a batch transfer method in which the mold and the material to be molded are pressed at once, or the above imprint method is repeatedly performed using a flat plate mold to finally form a large-area substrate. For example, a step & repeat method for transferring a fine pattern may be used.

On the other hand, a roller with a fine pattern provided in advance on the roller surface is used as a mold, a load is applied to the roller while heating the transfer material with this roller, and the roller surface is rotated to change the pattern on the roller surface. There is a roller mold method for transferring images sequentially (see, for example, Patent Documents 1 and 2).

With this method, the pattern can be transferred onto the transfer material continuously without interruption by repeated rotation of the roller. Therefore, this method is effective for pattern transfer onto a transfer material having a length of several meters or more.

Furthermore, in this roller molding method, the contact between the mold and the material to be transferred is a line contact, unlike the surface contact in the case of batch transfer or the step & repeat method. Therefore, there is an advantage that the parallel adjustment of the mold and the substrate and the temperature control of the heater can be easily performed. In addition, since the load is applied to the molded substrate by line contact, the transfer material can be pressed with a small load.

Japanese Patent Laying-Open No. 2005-5284 JP 2008-73902 A

As described above, due to the property of transferring a fine pattern by rolling a roller mold on a transfer material, the mold used in this roller molding method is parallel to the surface of the transfer material and the mold itself is flat. There is a need.

¡To flatten the mold itself, it is necessary to apply a leveling agent to the roller mold first. This conventional coating method is shown in FIG. (A-1) is a mold section perpendicular to the direction of the rotating shaft 13, (a-2) is a mold section in the direction of the rotating shaft 13, and the same applies to (b) and (c).

In this application, from the viewpoint of application uniformity, the mold outer peripheral surface 120 is brought into line contact with the flattening agent 160 as shown in FIG. 7 depicting the state of the conventional flattening agent applying process of the rotary mold 11 ( 7 (a-1) and (a-2)), a process of sequentially applying the planarizing agent 160 to the outer peripheral surface 120 of the mold by rotating the rotary mold 11 is used (FIG. 7 (b-1)). ) (B-2), (c-1) (c-2)).

However, when this flattening agent 161 is applied to the entire mold outer peripheral surface 120, the container containing the flattening agent 160 must have a length larger than the length of the rotary mold 11 in the rotation axis direction (see FIG. 7 (a)). If it does so, the planarizing agent 161 will also adhere to the mold end surface 121 (FIG.7 (b)). The extra flattening agent adhering in this way is caused by centrifugal force generated by mold rotation, mold surface energy, dead weight of the flattening agent, surface tension, and the like. The liquid reservoir 162 may be formed by the flattening agent 160 at the outer peripheral surface outer portion) (FIG. 7C).

As a result, in the subsequent drying process, the liquid reservoir 162 on the outer peripheral surface of the mold is solidified as it is, and this portion is swelled. Then, even if the fine pattern transfer to the transfer material is performed after forming the fine pattern on the mold outer peripheral surface 120, the parallelism of the rotary mold 11 is reduced due to the rise of the outer portion of the mold outer peripheral surface, and the mold center portion The fine pattern may not be transferred satisfactorily. Due to this hollow-out phenomenon, the final transfer accuracy may be lowered, and as a result, the quality and yield of the final product may be lowered.

An object of the present invention is to provide a rotary mold for imprinting having a good degree of parallelism and a method for producing the same, as a result of which swell in the outer peripheral surface of the mold is eliminated.

According to a first aspect of the present invention, in the method for manufacturing a rotary mold used for imprinting, the rotary mold has a mold first and second end faces, and a mold outer peripheral face having an imprint pattern. Then, in the direction of the rotation axis for rotating the rotary mold, when the direction from the mold center to the mold end surface is the outside direction, and the direction from the mold end surface to the mold center is the inside direction, the outer direction of the first mold end surface Provided with a first liquid reservoir elimination section, a second liquid reservoir elimination section provided in the outer direction of the mold second end face, between the first liquid reservoir elimination section and the mold first end face, and the second Including a step of forming an opening for accommodating a leveling agent between the liquid pool eliminating portion and the mold second end surface, wherein the first and second liquid reservoir eliminating portions are smaller than the outer diameter of the rotary mold. And having an outer diameter.
However, the opening hole for storing the leveling agent is a hole which is an open system at least until the liquid reservoir of the leveling agent is eliminated after the leveling agent and the entrance of the opening hole for storing the leveling agent come into contact. That's it.
According to a second aspect of the present invention, in the invention according to the first aspect, after forming the opening for accommodating the flattening agent, a part of the outer peripheral surface of the mold and the first and second liquid pool eliminating portions A flattening agent application step of applying the flattening agent to the outer peripheral surface of the mold by rotating the mold in a state in which a part of the flattening agent and the liquid flattening agent are in contact with each other in parallel with the rotation axis direction. And after the start of the coating step, a flattening agent storage step of storing the liquid reservoir on the outer peripheral surface of the mold in the opening for accommodating the flattening agent; and after the coating step and the flattening agent storage step, Forming on the outer peripheral surface of the mold.
According to a third aspect of the present invention, in the invention according to the first or second aspect, at least one of the first and second liquid reservoir eliminating portions is integrally formed with the rotary mold. And
According to a fourth aspect of the present invention, in the invention according to any one of the first to third aspects, the difference between the outer diameter of the first and second liquid pool eliminating portions and the outer diameter of the mold is greater than zero. It is 0.6 mm or less.
According to a fifth aspect of the present invention, in the invention according to the first, second or fourth aspect, the rotary mold is a cylindrical shape or a columnar shape, and the first and second liquid reservoir eliminating portions are rings. In the flattening agent application step, a part of the mold outer peripheral surface and the first and second liquid reservoirs are eliminated at an immersion depth of 0.2 mm or more and 0.5 mm or less from the leveling liquid surface A part of the portion is brought into contact with a flattening agent.
According to a sixth aspect of the present invention, in the invention according to any one of the first to fifth aspects, the opening for accommodating the flattening agent is a groove, and the first liquid reservoir eliminating portion in the groove The distance between the first end surface of the mold and the distance between the second liquid pool eliminating portion and the second end surface of the mold is greater than 0 and 0.5 mm or less, and the depth of the groove is 1 in the radial direction. It is characterized by being not less than 7 mm and not more than the distance from the outer peripheral surface of the mold to the rotation axis.
7th aspect of this invention is a rotary mold used for imprint, Comprising: The said rotary mold has a mold 1st and 2nd end surface, and the mold outer peripheral surface which has a pattern for imprint. In the direction of the rotation axis for rotating the rotary mold, when the direction from the mold center to the mold end surface is the outer direction, and the direction from the mold end surface to the mold center is the inner direction, the direction toward the outer side of the mold first end surface A first liquid reservoir eliminating portion is provided, a second liquid reservoir eliminating portion is provided in an outer direction of the mold second end surface, and the first and second liquid reservoir eliminating portions are smaller than the outer diameter of the rotary mold. An opening for accommodating a coating agent is formed between the first liquid reservoir eliminating portion and the mold first end surface, and between the second liquid reservoir eliminating portion and the mold second end surface. The Preparative a imprinting rotating mold, characterized in.
According to an eighth aspect of the present invention, in the invention according to the seventh aspect, the rotary mold has a cylindrical shape or a columnar shape, and at least one of the first and second liquid pool eliminating portions is the The difference between the outer diameter of the first and second liquid pool eliminating portions and the outer diameter of the mold is integrally formed with the rotary mold, and is 0.6 mm or less, and the opening for accommodating the coating agent is a groove. Yes, in the groove, the distance between the first liquid reservoir eliminating portion and the mold first end surface, and the distance between the second liquid reservoir eliminating portion and the mold second end surface is larger than 0 and 0.5 mm. The depth of the groove is not less than 1.7 mm in the radial direction and not more than the distance from the outer peripheral surface of the mold to the rotating shaft.

According to the present invention, the swell in the outer peripheral surface of the mold is eliminated, and as a result, a rotary mold for imprinting having a good parallelism and a method for manufacturing the same can be provided.

It is a figure which shows roughly the manufacturing process of the rotary mold for imprint in this embodiment. It is the schematic of the rotary mold for imprint in this embodiment, (a) is a perspective view, (b) is a front view, (c) is sectional drawing of the A-A 'part of (b). It is a figure which shows the mode of the planarization agent application | coating process and planarization agent accommodation process of the rotary mold for imprint in this embodiment. It is a figure which shows the modification of the liquid reservoir elimination part and flattening agent accommodation open hole in this embodiment. It is a figure which shows the liquid reservoir cancellation part modification in this embodiment. It is a figure which shows the parallel degree of the rotary mold for imprint in a present Example and a comparative example. It is a figure which shows the mode of the planarizing agent application | coating process of the rotary mold in a comparative example.

In imprinting using a rotary mold, flatness and parallelism in the rotary mold are particularly important. On the other hand, after applying a flattening agent to the mold base material to improve the flatness, a liquid reservoir due to the flattening agent is generated at the outer peripheral surface of the mold. As a result, even if the flatness is improved, the parallelism is lost.

Under such circumstances, the present inventor has found the following. That is, a minute gap (open hole) is provided in the immediate vicinity of the outer peripheral surface of the mold. By doing so, even if a liquid reservoir of the flattening agent is generated in the outer portion of the outer peripheral surface of the mold, this gap serves as a capillary tube, and the excess liquid reservoir can be drawn into the gap. As a result, it has been found that the occurrence of swelling due to an excessive liquid reservoir can be prevented, and the planarizing agent can be uniformly applied to the mold substrate.

In the present embodiment, “flatness (roundness or flatness)” is an index indicating the surface roughness of the mold substrate, and the deviation of the surface of the portion that should not have scratches from the geometrical plane. This is an index defined in JIS B 0182. “Parallelity” indicates the magnitude of the displacement of the outer peripheral surface of the mold with respect to the rotation axis direction, and is an index defined in JIS B 0182. In the present embodiment, in particular, if the bulge in the outer peripheral surface of the mold is small, it is said that the parallelism is good.

<Embodiment 1>
Hereinafter, the form for implementing this invention is demonstrated based on FIG.
FIG. 1 is a diagram schematically showing a manufacturing process of a rotary mold 1 for imprinting in the present embodiment. FIG. 1A shows a rotary mold base 2, FIG. 1B shows a state in which a liquid pool eliminating portion 4 is provided on the mold base 2, and FIG. A state where the leveling agent 61 is applied is shown in FIG. Further, FIG. 1 (d) shows that when the droplet elimination unit 4 is detachable, the droplet elimination unit 4 is removed and the adhesion layer 7 and the fine pattern forming layer 8 are formed on the flattening agent 61. FIG. 1E shows a state in which a fine pattern is drawn and developed on the resist layer 9. FIG. 1 (f) shows a state in which the fine pattern forming layer 8 has been etched, and FIG. 1 (g) shows a state in which the rotary mold 1 is completed by cleaning after the etching. .

FIG. 2 shows a schematic diagram of the rotary mold 1 completed in this way. 2A is a perspective view, FIG. 2B is a front view, and FIG. 2C is a cross-sectional view taken along line A-A ′.

The rotary mold 1 for imprinting in this embodiment is preferably cylindrical, and includes mold first and second end surfaces 21 and 22 through which the rotary shaft 3 passes, and a mold outer peripheral surface 20 having an imprint pattern. Have.

The rotary mold 1 may be of a non-cylindrical shape or a polygonal shape such as a column, a triangular column, or a quadrangular column. However, the column or cylinder is finer continuously and uniformly on the material to be transferred. It is more preferable because the pattern can be transferred.

Further, as shown in FIG. 2 (b), first and second liquid reservoir eliminating portions 41 and 42 (detailed later) are provided in the immediate vicinity of the mold first and second end faces 21 and 22, respectively. ing. Thus, an open system gap is provided between the liquid

reservoir eliminating portions

41 and 42 and the mold first and second end faces 21 and 22.

Alternatively, the rotating shaft 3 may be inserted into the hollow portion of the mold base 2 to form a material rotating shaft. The rotating shaft 3 may be provided integrally with the mold base 2. Moreover, you may prepare the cylindrical mold base material 2 which is not hollow.

Further, the rotating shaft 3 may be installed so as to hold the outer end face of the ring-shaped member 4 without providing the rotating shaft 3 penetrating the center of the hollow mold base 2. If the mold base 2 and the ring-shaped member 4 are hollow, they may be fixed to the rotating device on the donut-shaped outer peripheral surface of the ring-shaped member 4 (FIG. 5D described later). By doing so, it is not necessary to prepare a rotating shaft having a desired length penetrating the mold base 2 and the ring-shaped member 4, and the time required for the manufacturing process can be shortened. In this embodiment, when the rotating shaft 3 which penetrates the center of the hollow cylindrical mold base material 2 is provided (FIGS. 3 and 5), and when the mold base material 2 rotates, the rotating shaft 3 Both cases where the material does not exist physically (FIG. 2) will be described as needed.

(Preparation of mold substrate)
In order to form the imprint rotary mold 1 having the above configuration, in the mold manufacturing method according to the present embodiment, first, as shown in FIG. A cylindrical mold substrate 2 having a mold outer peripheral surface 20 and a rotating shaft 3 which is not formed physically is prepared as a representative of a group of two mold end surfaces.

Examples of the material of the base material for manufacturing the cylindrical rotary mold 1 include an aluminum base material, an alloy base material such as stainless steel, and a quartz base material. In this embodiment, a stainless steel base material is used. Will be described.

When using a cylindrical stainless steel substrate, the surface of the substrate is often rough, unlike using a stainless steel mold substrate 2. Therefore, before the fine pattern is formed on the substrate surface, an operation for flattening the substrate surface is required.

When the flattening agent is liquid, when the flattening agent 160 is applied in a normal manner as shown in FIG. 7, a liquid reservoir 162 of the flattening agent 161 is generated on the outer peripheral surface of the mold as described above. End up. And even if the flatness of the mold outer peripheral surface 120 is ensured, the parallelism of the entire rotary mold 11 will be lost.

(Formation of flattening agent accommodation hole)
Therefore, in the present embodiment, as shown in FIG. 3, the step of providing the flattening agent accommodating opening 5 in the mold base 2 is performed before applying the flattening agent 61 to the surface of the base. In FIG. 3, (a) is a view when the mold base 2 and the liquid reservoir eliminating part 41 and the flattening agent 61 are brought into contact at the point x, and (b) is a mold base further from (a). It is a figure at the time of rotating the material 2, (c) is a figure at the time of rotating the mold base material 2 further from (b). (A-1), (b-1), and (c-1) are schematic cross-sectional views of a portion of the mold base 2 that is in contact with the planarizing agent in the cross-sectional view perpendicular to the rotation axis direction. (A-2), (b-2), and (c-2) are cross-sectional views of the mold base 2 in the direction of the rotation axis.

The opening 5 for accommodating the leveling agent is specifically provided as shown in FIG. That is, in the direction of the rotary shaft 3, the direction from the mold center to the mold first and second end faces 21, 22 is the outer direction, and the direction from the mold first and second end faces 21, 22 to the mold center is the inner side. Direction, the first liquid reservoir eliminating portion 41 is provided on the outer side of the mold first end surface 21, and the second liquid reservoir eliminating portion 42 is provided on the outer side of the mold second end surface 22, thereby eliminating the first liquid reservoir. The flattening agent accommodating open hole 5 is formed between the portion 41 and the mold first end surface 21 and between the second liquid reservoir eliminating portion 42 and the mold second end surface 22 (hereinafter, The flattening agent accommodating open hole 5 is also simply referred to as an open hole 5. The first and second liquid reservoir eliminating parts are also collectively referred to as a liquid reservoir eliminating part 4).

In FIG. 3, by providing this open hole 5 in the outer part of the outer peripheral surface of the mold (FIGS. 3 (a-1) and (a-2)), a liquid reservoir 62 of the flattening agent 61 is generated in the outer part of the outer peripheral surface of the mold. (FIGS. 3 (b-1) and (b-2)), the open hole 5 formed near the liquid reservoir 62 on the outer peripheral surface of the mold serves as a capillary, and the excess liquid reservoir 62 is placed in the gap. It can be pulled in (FIGS. 3 (c-1) and (c-2)).

At this time, the liquid reservoir eliminating unit 4 may be a conventional material as long as it can withstand subsequent processes, but is preferably the same material as the mold base 2 in order to facilitate process management.
Further, the liquid reservoir eliminating unit 4 may be a member prepared separately from the mold base 2 or may be provided integrally with the mold base 2 and / or the rotary shaft 3 (see FIG. 5 (a)). The member prepared separately is preferable in that it can be used for other rotary molds, the size of the open hole 5 can be adjusted, and the flattening agent accommodated in the open hole 5 can be easily removed by washing. . On the other hand, it is preferable that the liquid reservoir eliminating unit 4 is integrally provided in that the member need not be prepared. Note that the first liquid reservoir elimination section may be provided separately from the mold base 2 and the second liquid reservoir elimination section may be provided integrally with the mold base 2. In the present embodiment, a case will be described in which both the first and second liquid

pool eliminating portions

41 and 42 are members prepared separately from the mold base 2.

Further, the liquid pool elimination unit 4 has an outer diameter smaller than the outer diameter of the rotary mold 1 (that is, the outer diameter of the cylindrical mold base 2). By doing so, even if the flattening agent 61 adheres to the outer peripheral portion of the mold end surface 21 due to the difference in outer diameter between the cylindrical mold base 2 and the liquid reservoir eliminating portion 4, the attached flattening agent 61 In the immediate vicinity, there is an open hole 5 that becomes a capillary tube. As a result, the leveling agent 61 that should form the liquid reservoir 62 can be efficiently accommodated in the open hole 5. In addition, if it is a closed hole, capillary action cannot be caused. For this reason, in this embodiment, at least the flattening agent 61 and the hole come into contact with each other and the liquid reservoir 62 is eliminated so that the hole becomes an open system.

In addition, it is preferable that the difference between the outer diameter of the cylindrical mold base material 2 and the outer diameter of the liquid pool elimination part 4 is larger than 0 and 0.6 mm or less. When the radius is based, the difference between the radius of the cylindrical mold base 2 and the maximum radius of the liquid pool elimination portion 4 is preferably greater than 0 and 0.3 mm or less. This is because, if the radius difference is within this range, the amount of the leveling agent 62 adhering to the mold end surface 21 is not excessive, and the leveling agent 61 can be accommodated in the open hole 5 without difficulty. *

Furthermore, the separate liquid reservoir eliminating portion 4 may be a detachable ring-shaped member (hereinafter, reference numeral 4 is also given to the ring-shaped member). By doing so, it is possible to form the desired flattening agent accommodating opening hole 5 simply by fitting the ring-shaped member 4 into the rotating shaft 3 and adjusting the width of the opening hole 5 in the direction of the rotating shaft 3 ( Hereinafter, as a specific example of the flattening agent-accommodating open hole 5, a reference numeral 5 is also given to this groove for the purpose of explaining the case where the groove is used).

In addition to this, when the separate liquid reservoir eliminating portion 4 is the ring-shaped member 4, a plurality of thin ring-shaped members 4 having the same diameter may be provided, and a clearance may be provided between them, thereby forming the liquid reservoir eliminating portion (see FIG. 5 (b)). Thereby, even if the flattening agent 61 adhering to the mold end surface 21 cannot be accommodated in the gap between the mold end surface 21 and the ring-shaped member 4, the flattening agent 61 is accommodated in another gap provided in the liquid reservoir eliminating portion 4. It is because it can do. This “other gap” is preferably formed as close as possible to the outer portion of the outer peripheral surface of the mold. That is, it is preferable that a large number of ring-shaped members 4 having a small thickness are stacked in the inner direction and a small number of ring-shaped members 4 having a large thickness are stacked in the outer direction. That is, it is preferable to form a large number of gaps that become capillaries at a location close to the mold end surface 21. At this time, the thickness of each ring-shaped member 4 may be gradually increased from the inner side to the outer side.

On the other hand, when the separate liquid reservoir eliminating portion 4 is a ring-shaped member, a plurality of thin ring-shaped members 4 having different diameters may be provided as the liquid reservoir eliminating portion (FIG. 5C). Specifically, the small-diameter ring-shaped member 4a is fitted into the rotary shaft 3 so as to be closely fixed to the mold end surface 21, and then the large-diameter ring-shaped member 4b is closely fixed to the small-diameter ring-shaped member 4a. Fit into the rotating shaft 3. By doing so, the grooves 5 are formed due to the difference in diameter. As a result, the groove 5 having a desired width and a desired depth can be formed, and the accommodation amount of the leveling agent 61 can be adjusted. Furthermore, the width of the groove 5 may be changed in a multistage manner by using three or more ring-shaped members 4.
In the above description, the grooves 5 are formed by the plurality of ring-shaped members 4, but a single ring-shaped member 4 having portions having different diameters may be tightly fixed to the mold end surface 21.

In the description so far, the case where the rotary shaft 3 is installed so as to penetrate the hollow cylindrical mold and the case where the rotary shaft 3 is integrated with the cylindrical mold have been described. On the other hand, as described above in the item of the rotation axis, as shown in FIG. 5D, the rotation device 3a may be installed so as to hold the outer peripheral surface of the ring-shaped member 4 in the outer direction. If the mold base 2 and the ring-shaped member 4 are hollow, the doughnut-shaped outer peripheral surface of the ring-shaped member 4 may be fixed to the rotating device 3a.

As other ring-shaped members 4, the outer diameter may be reduced toward the outer side of the mold (FIG. 5 (e)). By doing so, the portion of the ring-shaped member 4 with which the flattening agent 61 contacts is only in the vicinity of the mold end surface 21. If it becomes so, the total amount of the planarizing agent 61 adhering to the ring-shaped member 4 can be reduced. As a result, it is possible to efficiently accommodate only the liquid reservoir 62 on the outer peripheral surface of the mold in the open hole 5 without causing the capacity of the open hole 5 to be exceeded by the leveling agent 61 attached to the ring-shaped member 4. Can do.

Next, the opening hole 5 will be described. As described above, when the ring-shaped member 4 is used as the liquid reservoir eliminating portion 4, the open hole 5 has a groove shape. In the present embodiment, it is preferable to use the ring-shaped member 4 as the liquid reservoir eliminating portion 4, and it is also preferable that the open hole 5 has a groove shape. This is because the accommodation amount of the flattening agent 61 is increased if the groove shape is formed in comparison with the simple hole shape.

In this groove 5, the distance between the first liquid reservoir eliminating portion 41 and the mold first end surface 21 and the distance between the second liquid reservoir eliminating portion 42 and the mold second end surface 22 are 0.5 mm. Or less, more preferably 0.2 mm or less.
Further, the depth of the groove 5 when viewed from the outer periphery of the droplet elimination portion 4 is 1.7 mm or more and less than the distance from the outer peripheral surface of the resist layer 9 to the rotating shaft 3. It is 7 mm or more and 1.9 mm or less.

Further, when the open hole 5 has a groove shape, various groove shapes can be considered. Specifically, it is preferable not to provide the groove 5 in a portion corresponding to the entire surface of the mold end surface 21 other than the rotary shaft 3 portion, but to provide the open-type groove 5 only in a part thereof (FIG. 4A). . Furthermore, the width of the groove 5 may be changed continuously or stepwise from the outer peripheral surface side of the mold gradually toward the rotating shaft side (FIGS. 5F and 5G). Furthermore, the end of the liquid reservoir eliminating part 4 facing the mold end surface 21 may be rounded (FIG. 5 (h)), or conversely, the vicinity of the opening of the open hole 5 may be made acute (FIG. 5 (e)). .

The shape of the open hole 5 other than the groove 5 may be a linear through hole when the rotary shaft 3 and the mold base 2 are integrated (FIG. 4B). However, in order to accommodate the flattening agent 61 evenly while rotating the mold base 2, it is preferable to provide the plurality of open holes 5 evenly when the holes are hole-shaped. On the other hand, when the rotating shaft 3 and the mold base 2 are separate, that is, in the case of the hollow mold base 2, the open holes 5 are provided circumferentially along the hollow portion, and the circumferential shape thereof is further provided. It is also preferable to provide through holes radially from the open hole 5 toward the outer periphery.

(Application of leveling agent)
In this embodiment, after forming the flattening agent accommodating opening 5, as shown in FIG. 1B, FIG. 2, and FIG. 3, a part of the mold outer peripheral surface 20 and the first and first The flattening agent 60 is applied to a part of the two liquid

reservoir eliminating portions

41 and 42. Hereinafter, this process will be described in detail.

First, the leveling agent 60 is selected. Examples of the flattening agent 60 include conventionally used liquid flattening film forming agents, and specific examples thereof include polysilazane, methylsiloxane, and metal alkoxide.

Furthermore, if the viscosity of the leveling agent 60 is within a preferable range, the viscosity is too low and the leveling agent 60 is less likely to foam, and the viscosity is too high to be not accommodated in the open holes 5. The inventor is intensively studying the range of this viscosity.

Next, in this embodiment, the mold base 2 is held in a state where the rotary shaft 3 is horizontal, and a container containing the flattening agent 60 is prepared below the mold base 2. Thereafter, the mold base material 2 is lowered, and the mold base material 2 and part of the outer peripheral surface of the liquid reservoir eliminating portion 4 are brought into contact with the planarizing agent 60. At this time, not only the mold base 2 is brought into contact with the flattening agent 60 but also the liquid reservoir eliminating portion 4 is brought into contact with the flattening agent 60. Then, a part of the mold base 2 and the liquid reservoir eliminating part 4 is immersed in the flattening agent 60. By immersing the mold base material 2 in the flattening agent 60 to such an extent that the flattening agent 61 adheres to the outer periphery of the liquid pool elimination unit 4, the mold base material 2 is separated from the flattening agent 60 by the rotation of the mold base material 2. Even after this, the flattening agent 60 is in contact with the open hole 5. Therefore, the flattening agent 60 can be efficiently accommodated in the open hole 5 as compared with the case where the flattening agent 60 is not in contact with the open hole 5. Further, the immersion depth in the leveling agent 60 in the mold base 2 is particularly preferably 0.2 mm to 0.3 mm. If immersed in a depth within this range, the flattening agent 60 does not come into contact with the opening 5 because the immersion is too shallow, and the flattening agent 61 is accommodated before the immersion is so deep that the liquid reservoir 62 is eliminated. The amount does not exceed.

Here, the mold base 2 and the liquid reservoir eliminating portion 4 are brought into contact with the planarizing agent 60 in parallel to the rotation axis direction. By making it contact in parallel, it can prevent that the immersion part in the mold base material 2 and the liquid reservoir elimination part 4 differs in the mold 1st end surface 21 side and the mold 2nd end surface 22 side. As a result, unevenness is not generated in the application of the leveling agent 61.

As described above, the mold base 2 is rotated in a state in which the leveling agent 60, the mold base 2, and further the liquid pool elimination portion 4 are in contact with each other in the direction of the rotation axis 3, The planarizing agent 61 is applied to the outer peripheral surface 20 of the mold.
The rotation speed and rotation speed at this time are flat while being filled with the flattening agent 61 to such an extent that the flattening agent 61 can be sufficiently applied to the mold substrate 2 and the open holes 5 can exhibit capillary action. It sets so that accommodation of the agent 61 can be performed.

In addition, it is preferable that the liquid level of the leveling agent 60 and the mold base 2 are parallel. For this reason, it is preferable that the liquid reservoir eliminating unit 4 is provided before the flattening agent 60 and the mold base 2 are brought into contact with each other so as not to cause unnecessary fluctuation of the liquid surface.

(Accommodating flattening agent in open hole)
After the application step is started, as described above, the liquid reservoir 62 on the outer peripheral surface of the mold is accommodated in the flattening agent accommodating opening 5 (FIGS. 3 (c-1) and 3 (c-2)). Again, by providing the open holes 5 in this manner, the flattening agent 61 adheres to the outer peripheral portion of the mold end surface 21, and centrifugal force, gravity, the surface energy of the base material, and the surface tension of the flattening agent 61 are obtained. Thus, even if the liquid reservoir 62 is formed on the outer peripheral surface of the mold, the open hole 5 serves as a capillary tube, and the excess liquid reservoir 62 can be accommodated in the open hole 5.

In addition, when the application of the flattening agent 61 as described above is finished, the mold base 2 is separated from the flattening agent 61. Then, the planarizing agent 61 is dried while rotating the mold base 2. The flattening agent 61 continues to be accommodated in the open holes until the flattening agent 61 is dried (FIG. 1C).

(Formation of fine pattern)
In the present embodiment, the adhesion layer 7, the fine pattern forming layer 8, and the resist layer 9 are laminated in this order on the planarizing agent 61 applied as described above (FIG. 1D). Thereafter, the resist layer 9 is subjected to electron beam exposure and etching is performed (FIGS. 1E and 1F). Thus, a fine pattern is formed on the fine pattern forming layer 8 on the mold base 2 (FIG. 1G).

First, regarding the adhesion layer 7 provided on the flattening agent 61, this is for bonding the fine pattern forming layer 8 and the layer made of the flattening agent, and thus the mold substrate 2. . Any material can be used as long as it is used as the adhesion layer 7, but an amorphous silicon layer is preferable. Note that the adhesion layer 7 may not be provided as long as the fine pattern forming layer 8 can be satisfactorily adhered on the planarizing agent 61. In the present embodiment, a case where the adhesion layer 7 is provided on the planarizing agent 61 will be described.

Next, regarding the fine pattern forming layer 8 provided on the adhesion layer 7, any substance may be used as long as it can be used as the fine pattern forming layer 8. Among them, a chromium oxide layer (CrOx) is preferable from the viewpoint of etching processability and ease of autofocus control.
Furthermore, an amorphous carbon layer may be provided in place of the CrO layer in order to improve the autofocus controllability. Since the amorphous carbon layer is not as transparent as the chromium oxide layer, it is possible to prevent the mold base 2 from being in focus when drawing a fine pattern on the resist layer 9. it can.

Thereafter, as shown in FIG. 1D, a resist layer 9 for electron beam exposure is applied to the fine pattern forming layer 8. The resist layer 9 for electron beam exposure may be a heat-sensitive material whose state changes due to a heat change, and may be suitable for the subsequent etching process. Further, a photosensitive material may be used. At this time, an inorganic resist layer made of tungsten oxide (WOx) having a composition gradient is still preferable from the viewpoint of improving the resolution.

Thereafter, the mold base 2 having the drawn resist layer 9 is exposed and developed to form a desired fine pattern (that is, a finally obtained product) as shown in FIG. A resist layer 9 having a pattern reversed with respect to the fine pattern is obtained.

After applying a fine pattern to the resist layer 9 as described above, the fine pattern forming layer 8 is etched using the resist layer 9 as an etching mask. Thereby, the fine pattern forming layer 8 on which the fine pattern is formed can be formed on the cylindrical mold base 2. This etching process may use a conventional method. For example, dry etching with chlorine gas and oxygen gas can be mentioned.
By this etching process, as shown in FIG.1 (f), the mold base material 2 with the resist layer 9 which has a desired fine pattern is obtained.

The resist substrate 9 with the resist layer 9 is subjected to pure water washing and vapor drying with isopropanol to remove the resist layer 9. As a result, as shown in FIG. 1G, the rotary mold 1 in which a desired fine pattern is transferred to the outer peripheral surface 20 of the mold can be produced.

Note that the fine pattern at this time may be a pattern in a range from nano-order to micro-order, but more preferably a nano-order periodic structure of several nm to several hundred nm. Specific examples are a line-and-space pattern and a fine protrusion structure composed of a plurality of fine irregularities. Examples of the cross-sectional shape include a triangle, a trapezoid, and a square in the case of a one-dimensional periodic structure. In the case of a two-dimensional periodic structure, the shape of the fine protrusions is not limited to an accurate cone (bus line is straight) or pyramid (ridge line is straight), as long as it is tapered in consideration of extraction after imprinting. The ridgeline shape may be a curved surface with a side surface bulging outward. Specific examples include a bell, a cone, a truncated cone, and a cylinder. Hereinafter, the period in this periodic structure is also referred to as a pitch, and indicates the distance between the fine protrusion vertices.
Furthermore, the tip portion may be flattened or rounded in consideration of moldability and breakage resistance. Furthermore, this fine protrusion may produce a continuous fine protrusion with respect to one direction.

As described above, since the imprint rotary mold according to the present embodiment is configured, the following effects can be obtained according to the above embodiment.
A minute open hole is provided in the immediate vicinity of the mold end face. By doing so, even if a liquid reservoir of the flattening agent is generated in the outer peripheral surface of the mold, this gap located in the immediate vicinity of the liquid reservoir serves as a capillary tube, and the excess liquid reservoir can be drawn into the gap. . As a result, the occurrence of swell due to an excessive liquid reservoir can be prevented, and the swell at the outer peripheral surface of the mold is eliminated. As a result, an imprint rotary mold having good parallelism can be manufactured.

In addition, as long as it does not deviate from the technical idea of the invention, the above-described technique can be applied to the case where a liquid reservoir is generated on the outer peripheral surface of the mold. Specifically, in addition to the flattening agent, a general coating agent for forming a resist layer can be applied.

<Embodiment 2>
In the present embodiment, a method for producing the rotary mold 1 by direct drawing on the amorphous carbon layer will be described separately from the method for producing the rotary mold 1 by using the resist layer 9 of the first embodiment. In this method, in order to finally provide a fine pattern (for example, a convex portion) on the material to be transferred and to provide a concave portion for the rotary mold 1, a predetermined fine pattern is obtained by a laser drawing apparatus or an electron beam drawing apparatus. Draw a pattern.

In this embodiment, as a specific procedure for producing the rotary mold 1, the condenser lens or the mold base 2 itself having an amorphous carbon layer on the outermost surface is moved, and the laser is focused on the surface of the amorphous carbon layer. In this state, a laser is irradiated to process a recess that is a non-through hole for a fine protrusion provided on the surface of the transfer object. As a result, a recess that finally becomes a fine protrusion on the surface of the transfer object can be produced. In addition, when producing a needle having a high aspect ratio, the position of the condenser lens and the surface of the amorphous carbon layer are relatively moved so that the focal position of the laser coincides with the bottom of the recess, or Processing may be performed by irradiating the laser again using a condensing lens having a different focal length while being fixed to the bottom of the recess. In this way, by changing the focal position and performing two-stage processing, it is possible to produce a forward tapered recess having a higher aspect ratio between the hole depth and the diameter.
Furthermore, it is preferable to perform washing in order to remove quartz chips adhering to the surface of the amorphous carbon layer when the laser is irradiated.

<Example>
Next, an Example is shown and this invention is demonstrated concretely.
A cylindrical hollow mold base material 2 made of stainless steel (SUS304, diameter 100 mm, that is, radius 50 mm, of which the diameter of the hollow portion is 84 mm and the distance between mold end faces is 300 mm) was prepared.
Next, a ring-shaped member 4 made of stainless steel (SUS304) was prepared as the liquid reservoir eliminating portion 4. At this time, the shape of the ring-shaped member 4 is a radius of a small-diameter portion for the groove 5 in contact with the mold end surface 21 (a portion having a distance of 0.2 mm from the end surface on the mold inner side to the mold outer side in the ring-shaped member). Was 48 mm, and the radius of the other large diameter portion was 49.8 mm. The entire length of the mold base 2 and the ring-shaped member 4 in the rotation axis direction was 360 mm.
And this ring-shaped member 4 was provided in the outer side direction of the mold 1st and 2nd end surfaces 21 and 22, respectively. As a result, the groove 5 as a hole for accommodating the leveling agent was formed with a width of 0.2 mm and a depth of 1.8 mm (a depth viewed from the outer periphery of the large diameter portion of the ring-shaped member).

Next, a leveling agent was prepared. For the leveling agent, polysilazane was dissolved in a dibutyl ether (20%) solvent. The leveling agent container containing the polysilazane solution was disposed below the mold base 2.

Thereafter, the mold base 2 was brought into contact with the polysilazane solution together with the ring-shaped member 4. At this time, a part of the mold outer peripheral surface 20 and a part of the ring-shaped member 4 were immersed in the planarizing agent 60 at a depth of 0.3 mm or less from the liquid surface of the planarizing agent 60.

In this state, the mold was rotated three times at a rotational speed of 32 r / min by a separately provided rotating shaft 3, and the polysilazane solution was applied to the entire outer peripheral surface 20 of the mold. At this time, the polysilazane solution was also applied to the outer peripheral surface of the ring-shaped member 4 in contact with the flattening agent 60 at the same time. At this time, the polysilazane solution was applied in a thickness of 4 μm.
Thereafter, the mold base 2 and the flattening agent 60 were pulled apart, and the mold base 2 was dried while being rotated.
During the above process, the liquid reservoir 62 on the outer peripheral surface of the mold is kept in the groove 5 until the leveling agent 61 on the mold base 2 is dried.

Next, the adhesion layer 7, the fine pattern forming layer 8, and the inorganic resist layer 9 were laminated in this order on the applied leveling agent 61. As the adhesion layer 7, an amorphous silicon layer, an amorphous carbon layer as the fine pattern forming layer 8, and a tungsten oxide (WOx) layer as the inorganic resist layer 9 were formed by sputtering.

A resist composed of tungsten oxide (WOx) having a composition gradient (with a gradient composition of mold base side x = 0.95 and resist outermost surface side x = 1.60 for composition change in the depth direction) with a thickness of 20 nm. A film was formed so as to be. The inorganic resist layer 9 was formed by ion beam sputtering, and the oxygen concentration in the inorganic resist layer 9 was inclined by continuously changing the oxygen concentration during film formation. Further, Rutherford Back Scattering Spectroscopy (RBS) was used for the composition analysis in the inorganic resist layer 9.

A fine pattern was drawn on the inorganic resist layer 9 using a blue laser drawing apparatus (wavelength 405 nm, output 12 mW). After drawing, an etching process and a cleaning process were performed to produce a rotary mold 1 provided with a desired transfer pattern.

<Comparative example>
As a comparative example, as shown in FIG. 7, a rotary mold 11 in the case where the ring-shaped member 4 was not provided was produced. Except that the ring-shaped member 4 was not provided, the rotary mold 11 was produced under the same conditions as in the example.

<Examination of parallelism>
It measured about the swelling of the mold outer peripheral surface outer part in the rotary mold manufactured by the present Example and the comparative example. The result is shown in FIG. FIG. 6 (a) shows the rising distance from the outer peripheral surface of the rotary mold in the rotary mold 11 of this embodiment, and FIG. 6 (b) shows the distance from the outer peripheral surface of the rotary mold. The angle of the measurement position indicates the horizontal / vertical direction portion in the mold cross section in the direction perpendicular to the rotation axis.
As shown in FIG. 6, in the comparative example, a bulge (fringe height) of 10 μm or more was generated, whereas in this example, there was almost no bulge in the outer part of the outer peripheral surface of the mold, and the parallelism was good. The degree was obtained. This is because the liquid reservoir 62 of the flattening agent 6 is accommodated in the open hole 5 by the liquid reservoir elimination unit 4. As a result, it seems that the swell did not occur on the outer peripheral surface of the mold.

DESCRIPTION OF SYMBOLS 1 Rotating mold 2 Mold base material 20 Mold outer peripheral surface 21 Mold 1st end surface 22 Mold 2nd end surface 3 Rotating shaft 3a Rotating device 4 Liquid reservoir elimination part (ring-shaped member)
4a Small-diameter ring-shaped member 4b Large-diameter ring-shaped member 41 First liquid reservoir eliminating portion 42 Second liquid reservoir eliminating portion 5 Flattening agent accommodating open hole (groove)
60 flattening agent 61 flattening agent applied to mold substrate 62 flattening agent reservoir 7 adhesion layer 8 fine pattern forming layer 9 resist layer 11 rotary mold 12 mold substrate 120 mold outer peripheral surface 121 mold first End surface 13 Rotating shaft 160 Flattening agent 161 Flattening agent 162 applied to the mold substrate Flattening agent reservoir 107 Roller

Claims

In the manufacturing method of the rotary mold used for imprinting,
The rotary mold has mold first and second end surfaces, and a mold outer peripheral surface having an imprint pattern,
In the direction of the rotation axis for rotating the rotary mold, when the direction from the mold center to the mold end surface is the outside direction, and the direction from the mold end surface to the mold center is the inside direction, the direction toward the outside of the first end surface of the mold is 1 liquid reservoir elimination part is provided, a 2nd liquid reservoir elimination part is provided in the outer side direction of the said mold 2nd end surface, between the said 1st liquid reservoir elimination part and the said mold 1st end surface, and the said 2nd liquid reservoir Including a step of forming an opening for accommodating a flattening agent between the elimination part and the second end surface of the mold,
The method for manufacturing a rotary mold for imprinting, wherein the first and second liquid pool eliminating portions have an outer diameter smaller than an outer diameter of the rotary mold.
However, the opening hole for storing the leveling agent is a hole which is an open system at least until the liquid reservoir of the leveling agent is eliminated after the leveling agent and the entrance of the opening hole for storing the leveling agent come into contact. That is.
After forming the opening for accommodating the flattening agent, a part of the outer peripheral surface of the mold, a part of the first and second liquid reservoir eliminating portions, and the liquid flattening agent are moved with respect to the rotation axis direction. A planarizing agent applying step of rotating the mold in a state of contact in parallel and applying the planarizing agent to the outer peripheral surface of the mold;
After the application step starts, a leveling agent accommodation step of accommodating a liquid reservoir in the outer peripheral surface of the mold in the opening for accommodating the leveling agent;
A step of forming a fine pattern on the outer peripheral surface of the mold after the coating step and the flattening agent accommodation step;
The manufacturing method of the rotary mold for imprints of Claim 1 characterized by the above-mentioned.
3. The method for producing a rotary mold for imprinting according to claim 1 or 2, wherein at least one of the first and second liquid reservoir eliminating portions is integrally formed with the rotary mold.
4. The imprint according to claim 1, wherein a difference between an outer diameter of the first and second liquid pool elimination portions and an outer diameter of the mold is greater than 0 and equal to or less than 0.6 mm. A manufacturing method of a rotary mold.
The rotary mold is cylindrical or columnar,
The first and second liquid pool eliminating portions are ring-shaped members,
In the flattening agent application step, a part of the outer peripheral surface of the mold and a part of the first and second liquid pool eliminating portions at an immersion depth of 0.2 mm or more and 0.5 mm or less from the leveling liquid surface The method for producing a rotary mold for imprinting according to claim 1, 2 or 4, wherein the step is brought into contact with a flattening agent.
The opening for accommodating the leveling agent is a groove, and in the groove, between the first liquid pool eliminating portion and the mold first end surface, and between the second liquid reservoir eliminating portion and the mold second end surface. And the depth of the groove is not less than 1.7 mm in the radial direction and not more than a distance from the outer peripheral surface of the mold to the rotation axis. The manufacturing method of the rotary mold for imprints in any one of 1 thru | or 5.
A rotary mold used for imprinting, wherein the rotary mold is
Mold first and second end faces;
A mold outer peripheral surface having an imprint pattern;
Have
In the direction of the rotation axis for rotating the rotary mold, when the direction from the mold center to the mold end surface is the outside direction, and the direction from the mold end surface to the mold center is the inside direction, the direction toward the outside of the first end surface of the mold is 1 liquid reservoir elimination part is provided, and a second liquid reservoir elimination part is provided in the outer side direction of the mold second end surface,
The first and second liquid pool elimination portions have an outer diameter smaller than the rotary mold outer diameter,
An opening for accommodating a coating agent is formed between the first liquid reservoir eliminating portion and the mold first end surface, and between the second liquid reservoir eliminating portion and the mold second end surface. Imprint rotary mold.
However, the opening hole for storing the leveling agent is a hole which is an open system at least until the liquid reservoir of the leveling agent is eliminated after the leveling agent and the entrance of the opening hole for storing the leveling agent come into contact. That is.
The rotary mold is cylindrical or columnar,
At least one of the first and second liquid pool eliminating portions is integrally formed with the rotary mold,
The difference between the outer diameter of the first and second liquid pool elimination portions and the outer diameter of the mold is greater than 0 and 0.6 mm or less,
The opening for accommodating the coating agent is a groove,
In the groove, the distance between the first liquid pool eliminating portion and the mold first end surface, and the distance between the second liquid reservoir eliminating portion and the mold second end surface are greater than 0 and 0.5 mm or less. Yes,
8. The imprint rotary mold according to claim 7, wherein a depth of the groove is 1.7 mm or more in a radial direction and not more than a distance from the outer peripheral surface of the mold to the rotation shaft. 9.