JP2013035243A - Roller mold, base material for roller mold, and pattern transfer method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a roller mold for precisely and easily transferring a predetermined pattern to a body to be transferred in the imprinting using light regardless of the translucency or the shape of the body to be transferred, to provide a base material for the roller mold, and to provide a pattern transfer method.SOLUTION: The roller mold for imprint has the predetermined pattern formed on the main surface of an outer peripheral part along the rotary shaft direction. Light emitted from the inside or the outside of the roller mold is made to transmit through the outer peripheral part to freely irradiate the main surface of the predetermined pattern from the inside of the roller mold with the light.

Description

  The present invention relates to a roller mold, a roller mold substrate, and a pattern transfer method, and more particularly to a roller mold used for imprinting, a roller mold substrate used for manufacturing the same, and a pattern transfer method using them.

  In the past, machines and electronic circuits have been processed in the micron order. When these machines and electronic circuits handle light, the light can only be controlled in the micron order due to processing accuracy. For this reason, there is a limit in the sensitivity of sensors and the like.

  On the other hand, in an apparatus called a stepper, by using light or an electron beam having a wavelength shorter than visible light of an ultraviolet laser or an extreme ultraviolet light source, processing on the nano order from micron order to several tens of nanometers has become possible.

  On the other hand, even with micron order processing, it takes a considerable amount of time to form a pattern. Therefore, the time required for nano-order microfabrication further increases. In addition, when an ultraviolet laser or an extreme ultraviolet light source is used, the apparatus becomes large and the cost increases. Further, the technique of performing microfabrication by exposure / development with an electron beam is sequential processing, and the work efficiency is lowered.

  On the other hand, as a conventional fine pattern transfer, there is a conventional technique of transferring a mask pattern formed on a glass plate by exposure using normal light, that is, a photolithography method. However, even if photolithography is used, the processing accuracy depends on the resolution of light, and there is a limit in forming a nano-order uneven pattern.

  In recent years, attention has been focused on nanoimprint technology, which is a method for transferring a concavo-convex pattern onto a transfer material like a stamp using a mold having a concavo-convex pattern. By this nanoimprint technology, a fine structure of several tens of nm level can be manufactured at a low cost with good reproducibility and in large quantities.

  There are roughly two types of imprint techniques, thermal imprint and optical imprint. Thermal imprinting is a method in which a mold on which a concavo-convex pattern is formed is pressed against a thermoplastic resin as a molding material while being heated, and then the molding material is cooled and released to transfer the concavo-convex pattern. Optical imprinting is a method in which a mold with a concavo-convex pattern is pressed against a photocurable resin that is a molding material, irradiated with ultraviolet light, and then the molding material is released to transfer the concavo-convex pattern. is there.

  Whichever imprinting method is used, it is necessary to transfer a finer pattern onto a larger molding material. As a method used to do this, a batch transfer method in which the mold and the material to be molded are pressed at once, or the above imprint method is repeatedly performed using a flat plate mold to finally form a large-area substrate. For example, a step & repeat method for transferring a concavo-convex pattern may be used.

  On the other hand, a roller with a concavo-convex pattern on the roller surface is used as a mold, a load is applied to the roller while heating the transfer material with this roller, and the roller surface is rotated to change the pattern on the roller surface. There is a roller mold method for transferring images sequentially (see, for example, Patent Documents 1 and 2).

  According to this method, the pattern can be transferred onto the transfer material continuously without interruption by repeated rotation of the roller. Therefore, this method is effective for pattern transfer onto a transfer material having a length of several meters or more.

  Further, in this roller molding method, the contact between the mold and the material to be transferred is a line contact, unlike the surface contact in the case of batch transfer or the step & repeat method. Therefore, there is an advantage that the parallel adjustment of the mold and the substrate and the temperature control of the heater can be easily performed. Further, since the load is applied to the molded substrate by line contact, the transfer material can be pressed with a small load.

  Moreover, the technique of patent document 3 is known as an optical imprint among the techniques using this roller mold method. More specifically, as shown in FIG. 7, a photosensitive resin laminate is sandwiched between a roller mold 101 having a predetermined uneven pattern and a transfer support roll 109, and the photosensitive resin laminate is pressed against the roller mold 101. Then, while being transported by the transfer support roll 109, it is released from the mold. In Patent Document 3, not from the time when the photosensitive resin laminate is pressed against the roller mold 101, but from the outside of the roller mold 101 with respect to the surface on which the predetermined uneven pattern is transferred in the photosensitive resin laminate after release. The photosensitive resin is cured by direct exposure to ultraviolet rays using an actinic ray irradiation apparatus. In Patent Document 3, silicon and nickel (Ni) are cited as materials for the roller mold 101 in the examples.

  Moreover, the technique of Example 4 of patent document 3 is known as thermal imprint among the techniques using this roller molding method. Specifically, the roller mold 101 having a predetermined uneven pattern is pressed against the resin on the sheet. At this time, a sheet holding member is disposed under the roller mold 101, and heat is applied during transfer to soften the sheet-like resin (thermoplastic resin). Then, the mold pattern is continuously transferred to the sheet by releasing and cooling the roller mold 101.

  Note that Patent Document 4 describes optical imprinting (in the case of using a plate-shaped mold instead of a roller mold) as well as thermal imprinting. Specifically, in Example 1 of Patent Document 4, a technique is described in which a flat mold is pressed against a substrate coated with an ultraviolet curable resin, and ultraviolet light is exposed from an illumination system. In addition, quartz is mentioned as a material of the mold at this time.

Japanese Patent Laid-Open No. 2005-5284 JP 2008-73902 A JP 2010-287829 A JP 2010-67796 A

  When optical imprinting is used in the conventional roller molding method, first, 1) a predetermined uneven pattern formed on the roller mold 101 is pressed against the transferred material 200 (the transferred resist 202), and 2) then conveyed. The two-stage process of exposing the transferred resist 202 of the transferred body 200 to be transferred has been performed.

  However, with this method, if the translucency of the transfer target 200 with respect to the wavelength of light used for exposure is not good (for example, the transfer target substrate 201 is an opaque film or the like), the arrangement of the exposure apparatus on the transfer target 200 is limited. (Hereafter, the fact that the translucency is not good is also referred to as “opaque”). That is, when the transferred substrate 201 is opaque, exposure must be performed on a portion of the transferred body 200 where the concavo-convex pattern is directly pressed (that is, the transferred resist 202). Exposure cannot be performed from the back side of the pressed part (that is, the transferred substrate 201 side in FIG. 7). In this case, in the case of FIG. 7, the light source 105 must be arranged on the roller mold 101 side (upper side in FIG. 7), not on the transfer support roll 109 side (lower side in FIG. 7) when viewed from the transfer target 200.

On the other hand, if the translucent substrate 201 has good translucency, the light source 105 can be disposed on the transfer support roll 109 side, and space can be saved.
However, this time, the shape of the transfer target 200 is limited.

  That is, in the case of FIG. 7, after pressing the transfer target 200 against the roller mold 101, the film-shaped transfer target 200 is temporarily deformed from the curved shape along the roller mold 101 to a horizontal plane. become. Then, even if the concave / convex pattern of the folding roller mold 101 is faithfully pressed against the transfer target 200, the concave / convex pattern may be bent or bent due to the deformation in the horizontal plane. If exposure is performed with this fear, the uneven pattern of the roller mold 101 may not be faithfully transferred to the transfer target 200.

  On the other hand, as shown in FIG. 8, it is also conceivable to use a plate-shaped transfer target 200 instead of a film and rotate the roller mold 101 to advance the uneven pattern transfer. However, even in this case, the translucency of the transferred object 200 (that is, the transferred substrate 201) becomes a problem.

  That is, when the transferred object 200 is opaque (for example, when the transferred object 200 is a reflection plate, an antireflection plate, or the like), the light source 105 is placed behind the roller mold 101 (that is, the transferred object as viewed from the roller mold 101). 200 on the downstream side in the conveyance direction). Therefore, exposure cannot be performed soon after pressing the concavo-convex pattern, and there remains a possibility that the concavo-convex pattern of the transfer target 200 is deformed.

  Therefore, the light source 105 is disposed outside the roller mold 101 and the light source 105 is disposed on the roller mold 101 side (upper side), and then exposure is performed aiming at a contact portion between the roller mold 101 and the transfer target 200. There is a need. If so, the pattern transfer apparatus including the light source 105 requires a complicated configuration, and the exposure efficiency may be significantly deteriorated.

  As described above, with the conventional roller mold method, the mechanism for moving the light source 105 must be complicated due to the translucency and shape of the transfer target 200, or the uneven pattern of the roller mold 101 is transferred in the first place. It may not be possible. The roller mold 101 that actually solves the above problems has not yet been disclosed.

  An object of the present invention is to provide a roller mold capable of faithfully and easily transferring a predetermined pattern to a transferred body when performing imprinting using light regardless of the translucency and shape of the transferred body, and for the roller mold The present invention provides a substrate and a pattern transfer method.

  The inventor examined where the light source 105 in the optical imprint is arranged. At that time, it was examined how to perform exposure in a state in which the concave-convex pattern pressed against the transfer target 200 maintains the shape. That is, the arrangement of the light source 105 was examined in consideration of how to perform exposure immediately after pressing the concave / convex pattern of the roller mold 101 against the transfer target 200.

  After this study, the present inventor has a configuration in which the light from the light source 105 can be transmitted through the outer peripheral portion 103 in which the concave / convex pattern is formed in the roller mold 101 as shown in FIGS. 2B and 2C described later. I thought of that. If it is this structure, it will become a structure which can irradiate light from the inner side of the roller mold 101 immediately after pressing the uneven | corrugated pattern of the roller mold 101 to the to-be-transferred body 200. FIG. That is, in the roller mold 101, the “part having the pattern to be transferred” and the “part to be irradiated with light” are the same, and “timing for pressing the pattern to be transferred” and “timing to emit light” "Almost at the same time.

As a result, the “transfer” and the “exposure” can be performed almost simultaneously on the same portion while the roller mold 101 is used. In addition, when this roller mold 101 is used, even if the transfer target 200 is opaque or plate-shaped, the location of the light source 105 is not limited and exposure is efficiently performed immediately after pressing. be able to.
Based on the above knowledge, the present inventor has come up with means that can solve the above-mentioned problems.

The embodiment of the present invention based on this finding is as follows.
The first aspect of the present invention is:
A roller mold for imprint in which a predetermined pattern is formed on the main surface of the outer peripheral portion along the rotation axis direction,
By allowing light emitted from inside or outside of the roller mold to be transmitted to the outer peripheral portion, the light can be emitted from the inside of the roller mold to the main surface of the predetermined pattern. It is a roller mold.
A second aspect of the present invention is the aspect described in the first aspect,
The roller mold has a hollow cylindrical structure, and the light source of the light can be accommodated inside the roller mold.
A third aspect of the present invention is the aspect described in the second aspect,
The roller mold is made of quartz, and the predetermined pattern is formed by cutting the roller mold itself.
4th aspect of this invention is a base material for manufacturing the roller mold in any one of 1st thru | or 3, Comprising: It is a base material which has an outer peripheral part along a rotating shaft direction, Comprising: Of the said roller mold, A roller mold base material, characterized in that a planarizing layer having a light-transmitting property capable of irradiating the light from the inside to the main surface of the outer peripheral portion is formed on the main surface of the outer peripheral portion. .
According to a fifth aspect of the present invention,
A pattern transfer method using an imprint roller mold in which a predetermined pattern is formed on the main surface of the outer peripheral portion along the rotation axis direction,
A pressing step of pressing the transferred body against the main surface of the outer peripheral portion when the predetermined pattern is transferred to the transferred body by imprinting;
After the pressing step, the light irradiated from the inside or the outside of the roller mold is transmitted to the outer peripheral portion, thereby irradiating the light from the inside of the roller mold to the transfer target, and A curing step for curing the transfer body;
It is a pattern transfer method characterized by having.

  According to the present invention, a predetermined pattern can be faithfully and easily transferred to a transfer object when performing imprinting using light regardless of the translucency of the transfer object or the shape of the transfer object.

It is a section schematic diagram showing a pattern transfer device in this embodiment. It is the schematic of the roller mold in this embodiment, (a) is a perspective view, (b) is sectional drawing which looked at the AA 'part of (a) from the front, (c) is B- of (a). It is sectional drawing which looked at B 'part from the side surface. It is a cross-sectional schematic diagram which shows the pattern transfer method in this embodiment. It is a section schematic diagram showing roughly the manufacturing process of the roller mold in this embodiment. It is a section schematic diagram showing roughly the manufacturing process of the roller mold in another embodiment. It is a cross-sectional schematic diagram which shows the pattern transfer apparatus in another embodiment. It is the cross-sectional schematic which shows the conventional pattern transfer apparatus. It is the cross-sectional schematic which shows the pattern transfer method in the past.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
[Embodiment 1] describes a case where an uneven pattern is formed on a quartz roller mold itself having a cylindrical structure.
In [Embodiment 2], at least an outer peripheral portion of the roller mold is provided with good translucency while separately forming a layer having a concavo-convex pattern on a quartz substrate having a cylindrical structure. Is described.
[Embodiment 3] describes various modifications.

[Embodiment 1]
In the present embodiment, description will be given in the following order.
1. Composition of roller mold
2. How to use roller mold (pattern transfer method)
A) Outline of pattern transfer apparatus B) Preparation of transfer object C) Pressing process D) Curing process 3. Production method of roller mold A) Preparation of base material for roller mold B) Resist coating process C) Exposure process D) Development process E) Etching process to base material F) Cleaning / drying process Effects of the embodiment

<1. Configuration of roller mold>
The roller mold 101 in this embodiment is a rotary mold used for imprinting as shown in FIG. 2A is a perspective view of the roller mold 101, FIG. 2B is a cross-sectional view of the AA ′ portion of FIG. 2A viewed from the front, and FIG. 2C is a cross-sectional view of BB ′ of FIG. It is sectional drawing which looked at the part from the side.

  The roller mold 101 includes two end portions (102a and 102b, collectively referred to as reference numeral 102 hereinafter) through which the rotation axis O passes, and a portion sandwiched between the two end portions 102 and along the rotation axis direction. And an outer peripheral portion 103. A predetermined pattern is formed on the main surface of the outer peripheral portion 103. The predetermined pattern referred to here is a pattern configured by a periodic uneven shape formed on the main surface of the outer peripheral portion 103. Specific sizes and uneven shapes in the pattern will be described in [Embodiment 3].

  Further, a rotation auxiliary portion 104 is provided along the rotation axis O at the two end portions 102 of the roller mold 101. This is the portion that contacts the roller mold rotating roll 111 for rotating the roller mold 101. The rotation of the roller mold rotating roll 111 is transmitted to the rotation assisting unit 104, and as a result, the roller mold 101 integrated with the rotation assisting unit 104 can be rotated.

  Although it is about the material of the roller mold 101 in this embodiment, the roller mold 101 in this embodiment consists of quartz. Quartz can have sufficient translucency with respect to the wavelength of light used for exposure. As a result, after the light from the light source 105 existing inside or outside the roller mold 101 is transmitted to the outer peripheral portion 103, it is possible to irradiate the predetermined pattern from the inside of the roller mold 101.

  When the roller mold 101 is formed from quartz, it is preferable that the predetermined pattern forms irregularities by cutting the roller mold 101 itself. Specifically, using the fact that the roller mold 101 is made of quartz, etching is performed on quartz that is the main surface of the outer peripheral portion 103 of the roller mold 101, and the uneven pattern is cut into the roller mold 101 itself. Is preferred.

  This is because when a pattern layer having a pattern is separately provided on the main surface of the outer peripheral portion 103 of the base material 1 made of quartz, it is necessary to maintain the adhesion between the base material 1 and the pattern layer. On the other hand, by cutting the concave / convex pattern into the roller mold 101 itself, it is not necessary to form a pattern layer in the first place. Therefore, it is possible to prevent a defect caused by the pattern layer from separating from the substrate 1 in the first place.

  Moreover, the roller mold 101 in the present embodiment has a hollow cylindrical structure. This hollow allows the light source 105 to be accommodated inside the roller mold 101. Then, as shown in FIGS. 2B and 2C, the light source support 106 is provided in the portion located on the rotation axis O, and the light source 105 is actually arranged inside the roller mold 101, and the roller mold 101 rotates. By performing exposure in the middle, light can be irradiated from the inside of the roller mold 101 immediately after pressing the uneven pattern of the roller mold 101 against the transfer target 200. Furthermore, since the light source 105 can be accommodated in the roller mold 101, it is not necessary to prepare a space for the light source 105, and it is possible to save space when transferring the pattern.

The configuration of the light source support 106 in the roller mold 101 may be any configuration that can be exposed immediately after the concave / convex pattern is pressed against the transfer target 200. As an example, the light source support 106 is configured to penetrate the roller mold 101, and the light source support 106 is fixed while the roller mold 101 is rotating. As a result, the light source 105 fixed to the light source support unit 106 can aim at the point immediately after the concave / convex pattern is pressed against the transfer target 200 and stably perform exposure.
In some cases, the pattern transfer may be performed by rotating the light source support 106 and thus the light source 105 and then rotating the roller mold 101 so that the portions α and β in FIG. 1 are exposed. Further, while the roller mold 101 is being rotated, there may be a mechanism for rotating the light source support part 106 halfway from the α portion to the β portion and from the β portion to the α portion.

<2. How to use roller mold (pattern transfer method)>
Next, a method for performing pattern transfer using the roller mold 101 in this embodiment will be described.

A) Outline of Pattern Transfer Apparatus First, a pattern transfer apparatus having the structure shown in FIG. 1 is used for pattern transfer in the present embodiment.
In the pattern transfer apparatus according to the present embodiment, irregularities are formed on the main surfaces of the transfer body supply roll 107, the transfer body support roll 108, and the outer peripheral portion 103 from the upstream side in the transport direction of the transfer body 200 as viewed from the roller mold 101. A roller mold 101 having a concavo-convex pattern), a transfer support roll 109, and a transfer body take-up roll 110.
The light source 105 is housed inside a cylindrical roller mold 101.

  Here, the roller mold 101 and the transfer support roll 109 are installed so that the outer peripheral surfaces thereof face each other, and the transfer target 200 is sandwiched between the outer peripheral surface of the roller mold 101 and the outer peripheral surface of the transfer support roll 109. It is configured so that it can be pressurized. In addition, the light source 105 is installed inside the roller mold 101 so that light can be irradiated from the inner side of the roller mold 101 to the transferred object 200 simultaneously with or immediately after the clamping pressure. ing. Furthermore, the present apparatus can be enclosed by a chamber to maintain airtightness, and can be filled with an inert gas from the outside.

B) Preparation of Transferred Body As the transfer body 200, a known material may be used as long as the transfer resist 202 is provided on the transfer substrate 201. The transfer substrate 201 may be a known wafer, substrate, or film substrate, and is not limited by the material or shape. Further, the transparency is not limited.

Further, as the transferred resist 202, a known photosensitive resist may be used, and a resist pattern 5 ′ (FIG. 4C described later) can be formed due to exposure from the light source 105. If so, other types of resists may be used.
In the present embodiment, a dry film in which an ultraviolet curable photoresist is applied as a transfer resist 202 on a transfer substrate 201 made of a plastic film is used.

C) Pressing step This step is performed using the pattern transfer apparatus having the above-described configuration. That is, the transfer object supply roll 107 and the transfer object take-up roll so that the surface of the transfer object 200 on which the photosensitive transfer resist 202 exists is opposed to the concavo-convex pattern portion in the outer peripheral part 103 of the roller mold 101. The transferred object 200 is set at 110. At that time, the transfer target 200 is installed so as to pass between the transfer support roll 109 and the roller mold 101 and between the transfer target support roll 108 and the roller mold 101. After such installation, an inert gas is introduced from the outside with the chamber closed.

After a while, the transferred body 200 is sent to the transferred body support roll 108 by the upstream transferred body supply roll 107 in a state where the oxygen concentration has reached a predetermined oxygen concentration or lower. Thereafter, the transferred resist 202 of the transferred object 200 passes through the transferred object support roll 108 and is pressed against the roller mold 101 by the transfer support roll 109 with an appropriate load. In this way, the transferred object 200 is pressed against the concave / convex pattern on the main surface of the outer peripheral portion 103 of the roller mold 101.
In the present embodiment, at least the rolls essential for pressing against the roller mold 101 and the transfer target 200 are collectively referred to as “pressing means”.

D) Curing Step After the above pressing step, the resist to be transferred 202 on the transferred body 200 is transferred from the inside of the roller mold 101 by transmitting light irradiated from the inside or outside of the roller mold 101 to the outer peripheral portion 103. The transferred resist 202 having a predetermined uneven pattern is cured by irradiating light.

As shown in FIG. 3, the roller mold 101 is used, and the curing process is performed, so that the concave / convex pattern of the roller mold 101 is pressed against the transfer target 200 immediately after the roller mold 101 is pressed. Light can be irradiated. That is, in the roller mold 101, the “part having the pattern to be transferred” and the “part irradiated with light” are made the same, and the “transfer” and the “exposure” are almost the same in the roller mold 101. Can be done simultaneously. Moreover, this feature is not lost even if the transfer target 200 is opaque or plate-shaped. Furthermore, the location of the light source 105 is not limited and exposure can be performed efficiently immediately after pressing.
In the present embodiment, the roller mold 101 having at least the outer peripheral portion 103 and the light source 105 are referred to as “curing means”.

  Note that “translucency” in this specification refers to “a degree of transmitting light when light used for exposure is transmitted to the outer peripheral portion 103 of the roller mold 101”. The degree of this embodiment is such that the transferred object 200 (the transferred resist 202) in contact with the outer peripheral portion 103 of the roller mold 101 can be cured by light from the inside of the roller mold 101. There is an effect. Furthermore, the outer peripheral portion 103 of the roller mold 101 may be made transparent so as to have the above-described translucency.

  Further, although it is the timing of exposure on the transferred object 200, even if the exposure is performed on the portion α in FIG. 1 so that the exposure is performed at the moment when the concavo-convex pattern of the outer peripheral portion 103 contacts the transferred resist 202. good. Conversely, exposure may be performed on the portion denoted by symbol β in FIG. 1 so that the exposure is performed at the moment when the uneven pattern on the outer peripheral portion 103 is released from the transferred resist 202.

The transferred object 200 after the completion of this step is taken up by the transferred object take-up roll 110 at the most downstream side.
Through the above steps, the concavo-convex pattern on the main surface of the outer peripheral portion 103 of the roller mold 101 can be transferred to the transfer target 200.

<3. Roller mold manufacturing method>
Hereinafter, the manufacturing method of the roller mold 101 in this embodiment is described using FIG.

A) Preparation of Roller Mold Substrate In order to form the roller mold 101 in the present embodiment, first, the rotation axis O that is not formed physically, the two end portions 102 through which the rotation axis O passes, the rotation axis A roller mold base material 1 having a cylindrical structure (hereinafter, also simply referred to as “base material 1”) having an outer peripheral portion 103 along the direction is prepared (FIG. 4A).
In addition, as above-mentioned as a material of the base material 1 for manufacturing this roller mold 101, it is set as quartz in this embodiment.

B) Resist application process The resist layer 5 is formed with respect to the main surface of the outer peripheral part 103 of said base material 1 (FIG.4 (b)). A known method may be used for forming this resist layer.

  The resist layer 5 in the present embodiment is an inorganic resist layer made of tungsten oxide (WOx) with a composition gradient. This resist layer 5 is a positive-type heat-sensitive material that changes its state by thermal change when exposed to blue laser light, and is preferable from the viewpoint of improving resolution. Furthermore, since the WOx resist layer (hereinafter also simply referred to as “resist layer 5”) is suitable for the subsequent etching process, it is preferably used in this embodiment.

C) Exposure process A concavo-convex pattern is drawn on the resist layer 5 using a blue laser drawing apparatus and exposed. In this exposure, a known method may be used.

D) Development Step Thereafter, development is performed on the base material 1 having the exposed resist layer 5 to obtain a resist pattern 5 ′ having a desired concavo-convex pattern (FIG. 4C).

E) Etching process to base material 1 After giving the uneven | corrugated pattern to the resist layer 5 as mentioned above, it etches with respect to the base material 1 which consists of this resist layer 5 as an etching mask. For this etching process, a conventional etching method for quartz may be used. For example, dry etching using a fluorine-based gas or wet etching using hydrofluoric acid can be used.
By this etching process, a base material 1 (with a resist pattern 5 ′) having a desired uneven pattern is obtained (FIG. 4D).

F) Cleaning / drying step The substrate 1 is subjected to pure water cleaning and vapor drying with isopropanol to remove the resist layer 5. Thereby, the roller mold 101 by which a desired uneven | corrugated pattern was transcribe | transferred to the outer peripheral part 103 can be produced (FIG.4 (e)).

<4. Advantages of the embodiment>
According to this embodiment, the following effects can be obtained. That is, making use of the roller molding method, the pattern can be transferred onto the transfer material continuously without interruption by repeated rotation of the roller. At that time, there is an advantage that the parallel adjustment of the mold and the substrate and the temperature control of the heater can be easily performed. In addition, since the load is applied to the molded substrate by line contact, it is possible to press the material to be transferred with a small load.

  Furthermore, even if the transfer target 200 is opaque, the portion of the transfer target 200 where the uneven pattern is directly pressed can be exposed almost simultaneously with the pressing. That is, it is possible to expose the portion from the inside of the roller mold 101 without performing exposure from the back side of the portion. In addition, this is of course possible if the light source 105 is arranged inside the roller mold 101, and even if the light source 105 is arranged outside, the light is transmitted to the outer peripheral portion 103 of the roller mold 101, and as a result It is also possible to expose the part from the inside of the roller mold 101.

  As a result, the exposure is performed at the same time as or immediately after the uneven pattern of the roller mold 101 is faithfully pressed against the transfer target 200. For this reason, even if the transfer object is deformed after exposure, it is possible to suppress the risk of bending or bending of the uneven pattern without complicating the pattern transfer device. The pattern can be transferred to the transfer target 200 faithfully and easily.

  Moreover, the above effect can be obtained regardless of whether the shape of the transfer target 200 is a film or a plate, as well as the transfer target 200 being opaque.

  As a result, with the conventional roller mold method, the mechanism for moving the light source 105 must be complicated due to the translucency and shape of the transfer target 200, or the uneven pattern of the roller mold 101 can be transferred in the first place. However, according to the present embodiment, when imprinting using light is performed regardless of the translucency or shape of the transferred object 200, a predetermined pattern is faithful to the transferred object 200. And can be easily transferred.

[Embodiment 2]
In the first embodiment, the case where the uneven pattern is formed on the roller mold 101 itself made of quartz having a cylindrical structure has been described. On the other hand, in the present embodiment, a case will be described in which the entire roller mold 101 has good translucency while separately forming a layer having an uneven pattern on the quartz substrate 1 having a cylindrical structure.

Although it is different from the first embodiment, specifically, <3. The “flattening agent applying step” and “pattern layer forming step” are added to the manufacturing method of the roller mold>. As a result, <3. The method for producing the roller mold is as follows.
A) Preparation of base material for roller mold B) Flattening agent application process C) Pattern layer formation process D) Resist application process E) Exposure process F) Development process G) Etching process to pattern layer H) Washing / drying process Below B) A flattening agent coating step, C) a pattern layer forming step, and G) an etching step for the pattern layer will be described with reference to FIG. Note that portions that are the same as those in Embodiment 1 are omitted, and the same reference numerals are used.

B) Flattening agent application process The reason why this process is performed in the present embodiment is as follows.
First, in order to perform concavo-convex pattern transfer by imprinting, it is necessary that the roller mold 101 be provided with a concavo-convex pattern. As a means for forming the concave / convex pattern on the roller mold 101, direct drawing on the pattern layer by a blue laser or an electron beam (EB) or etching processing on the pattern layer after drawing / developing of the concave / convex pattern on the resist is performed. Means to do so are used.

  When drawing this concavo-convex pattern, laser irradiation is usually performed after focusing on the surface of the substrate 1. However, when a scratch exists on the main surface of the base material 1, that is, when the flatness of the main surface of the base material 1 is low, the surface of the base material 1 that is not flat is focused. In that case, when the concavo-convex pattern is drawn, the shape reproducibility of the concavo-convex pattern may be lowered.

  Certainly, the drawing apparatus usually has an autofocus function, and if it is a nano-order flaw, it is difficult to cause a focus error. However, when a micron-order scratch occurs, a focus error may occur even if the autofocus function is used. Due to this focus error, the uneven pattern stored in the drawing apparatus may not be accurately reproduced on the roller mold 101.

  As a result, in the base material 1 used for the roller mold 101, micron-order scratches may greatly affect the reproducibility of the uneven pattern.

  Therefore, in the present embodiment, a layer having a concavo-convex pattern is not directly formed on the surface of the base material 1 as in the prior art, but is made of a planarizing agent in which the surface of the base material 1 is planarized by a planarizing agent. A layer is formed on the main surface of the outer peripheral portion 103 of the substrate 1 (FIG. 5B). Hereinafter, this layer is also referred to as a planarization layer 2.

  Examples of the flattening agent include conventionally used liquid flattening film forming agents, and specific examples include polysilazane, methylsiloxane, and metal alkoxide. In addition, as long as good flatness can be maintained, only the above-described materials may be used as the material constituting the planarizing layer 2, or a material obtained by mixing the materials exemplified above may be used. In order to provide at least the outer peripheral portion 103 of the roller mold 101 with translucency, it is necessary to select a material having translucency to such an extent that light can be irradiated from the inside of the roller mold 101 to the main surface of the outer peripheral portion 103. preferable.

  Moreover, although it is the application | coating method of this planarizing agent, the following method is mentioned as an example. That is, the base material 1 is held in a state where the rotation axis O is horizontal, and a container containing a leveling agent is prepared below the base material 1. Then, the base material 1 is lowered and a part of the outer peripheral surface of the base material 1 is brought into contact with the planarizing agent. And a part of base material 1 is immersed in a planarizing agent.

  Here, it is preferable that the base material 1 is brought into contact with the planarizing agent in parallel to the rotation axis direction. By making contact in parallel, it is possible to prevent a difference in the degree of coating between the left and right mold end faces in the immersed portion of the substrate 1. As a result, unevenness is not caused in the application of the flattening agent.

  In this manner, the base material 1 is rotated by a plurality of roller mold rotating rolls 111 in a state where the planarizing agent and the base material 1 are in contact with each other in parallel with the rotation axis direction, and the outer peripheral portion 103 is rotated. The above leveling agent is applied to The rotation speed and rotation speed at this time are set so that the planarizing agent can be sufficiently applied to the substrate 1.

C) Pattern layer forming step to F) Development step In this embodiment, the adhesion layer 3, the pattern layer 4, and the resist layer 5 are formed on the planarizing layer 2 made of the planarizing agent applied as described above. The layers are stacked in order (FIG. 5C).

  First, regarding the adhesion layer 3 provided on the planarizing layer 2, this is for bonding the pattern layer 4 and the planarizing layer 2, and thus the substrate 1. Any material can be used as long as it is used as the adhesion layer 3, but an amorphous silicon layer is preferable. Note that the adhesion layer 3 may not be provided if the pattern layer 4 is formed on the planarizing layer 2 and can be satisfactorily adhered. In the present embodiment, a case where the adhesion layer 3 is provided on the planarizing layer 2 will be described.

  And about the pattern layer 4 provided on the contact | adherence layer 3, in this embodiment, it is preferable that the pattern layer 4 is a layer which has translucency, and it is a transparent thru | or translucent layer. preferable.

  Specific examples of the patterned layer 4 include a chromium oxide layer (CrOx), a chromium nitride layer (CrNx), an amorphous carbon layer, and a combination thereof. However, the thickness of these layers needs to be set to such a thickness that the outer peripheral portion 103 of the roller mold 101 has translucency after the patterns are formed on these layers. Considering the point of translucency, it is preferable to use CrOx because the outer peripheral part 103 of the roller mold 101 can have translucency even if it has a certain layer thickness.

  Thereafter, similarly to the first embodiment, an inorganic resist layer 5 made of WOx having a composition gradient is formed. Thereafter, the resist layer 5 is exposed with a blue laser to draw in a predetermined pattern shape.

  Thereafter, the base material 1 having the drawn resist layer 5 is developed to obtain a desired resist pattern 5 ′ having unevenness, as shown in FIG.

G) Pattern Layer Etching Step After the resist pattern 5 ′ is formed as described above, the pattern layer 4 is etched using the resist pattern 5 ′ as an etching mask. Thereby, pattern 4 'can be separately formed in the main surface of the outer peripheral part 103 of the base material 1. FIG. In addition, the etching process with respect to the pattern layer 4 should just use a well-known method. For example, when the pattern layer 4 is CrOx or CrNx, dry etching using chlorine gas and oxygen gas can be used.

  By this etching process, as shown in FIG. 5 (e), a substrate 1 having a pattern 4 ′ having a desired uneven pattern on the main surface of the outer peripheral portion 103 is obtained. At this time, the resist pattern 5 'may remain on the pattern 4'.

  The substrate 1 with the resist pattern 5 ′ is subjected to alkali cleaning and vapor drying with isopropanol to remove the resist pattern 5 ′. As a result, as shown in FIG. 5 (f), it is possible to produce a roller mold 101 having a pattern 4 ′ having a desired concavo-convex pattern on the outer peripheral portion 103 separately.

[Embodiment 3]
The technical scope of the present invention is not limited to the above-described embodiments, but includes forms to which various modifications and improvements are added within the scope of deriving specific effects obtained by the constituent features of the invention and combinations thereof. .
Hereinafter, modifications other than the above will be listed.

(Transparency of roller mold)
In Embodiments 1 and 2, since quartz is used for the base material 1, not only the outer peripheral portion 103 of the roller mold 101 but also the end portion 102 has translucency. On the other hand, even if the translucency of the end portion 102 is not good, it is sufficient that at least the translucency of the outer peripheral portion 103 is good. Regardless of whether the light source 105 is disposed inside the roller mold 101 or is disposed outside and transmits the light to the outer peripheral portion 103 and then exposes the transfer target 200, the portion having the concavo-convex pattern (ie, the outer periphery) It is only necessary that the main surface of the portion 103) can be exposed. In other words, if the above-described exposure can be performed, and a normal uneven pattern can be obtained through C) pressing step to D) curing step, the translucency of the end portion 102 is opaque. In addition, the outer peripheral portion 103 may be translucent. The same applies to the planarization layer 2 of Embodiment 2, and the planarization layer 2 may be translucent.

(Substrate material)
In relation to this, as for the material of the substrate 1, a material other than quartz may be used which has a transparency that can expose the transfer target 200 from the inside of the roller mold 101. For example, a cylindrical transparent resin may be prepared and an uneven pattern may be provided on the outer peripheral portion 103 thereof. Moreover, you may use inorganic substances other than quartz.

(Roller mold shape)
Further, the shape of the roller mold 101 is not limited to the cylindrical shape as in the first and second embodiments, but may be a column. In addition, a polygonal shape such as a triangular prism or a quadrangular prism may be used, but a cylindrical or cylindrical shape is more preferable because a fine pattern can be transferred onto a transfer material continuously and uniformly.

(When a light source is placed outside the roller mold)
By the way, in the case of the roller mold 101 having a cylindrical shape (that is, having no hollow), the light source 105 cannot be disposed inside the roller mold 101. Even in that case, as shown in FIG. 6, the position opposite to the transferred resist 202 of the transferred object 200 and the concavo-convex pattern of the outer peripheral portion 103 with the roller mold 101 interposed therebetween (in FIG. 6, the roller mold 101 The light source 105 may be installed above (above).

  As described above, at least the outer peripheral portion 103 of the roller mold 101 has translucency. For this reason, even if the light source 105 is disposed outside the roller mold 101, “transfer” and “exposure” can be performed on the same portion almost simultaneously. it can. In addition, as in the first and second embodiments, this feature is not lost even if the transfer target 200 is opaque or plate-shaped.

(Resist layer and transferred resist)
The resist layer in the present embodiment may be any resist layer that has reactivity when exposed by irradiation with an energy beam, and may be a resist having direct reactivity such as curing with respect to light. In addition, a resist that is thermally reacted by exposing a laser beam as in the first embodiment may be used. Specifically, it may be a resist that needs to be developed with a developer, and may be a resist having sensitivity to ultraviolet rays, X-rays, electron beams, ion beams, proton beams, and the like. Of course, a positive resist or a negative resist may be used.
On the other hand, the transferred resist 202 in this embodiment may be any one that has reactivity when exposed by exposure to an energy beam.

(Other layers)
Note that a layer other than that described in Embodiment Mode 2 may be provided between the substrate and the resist layer, although there is a condition that constant translucency can be maintained in the outer peripheral portion 103 of the roller mold 101. Examples of this other layer include a hard mask including a conductive layer and an antioxidant layer, and an adhesion layer 3. Note that the “hard mask” here refers to a layered layer composed of a single layer or a plurality of layers and used for etching a groove on a substrate. Note that the antioxidant layer in the hard mask may also serve as a conductive layer. In that case, the conductive layer can be omitted.

(Working replica)
Moreover, in Embodiment 1 and 2, the example which produces the roller mold 101 used as an original disk was mentioned. Other than this, the concave / convex pattern of the roller mold 101 serving as a master may be transferred to a film-like transferred object 200, and the transferred object 200 may be wound around another substrate 1 to produce a working replica. Furthermore, the working replica may be formed by bringing the transferred object 200 into contact with the substrate 1 on which the resist layer is formed and transferring the uneven pattern. Even if the working replica is deformed / damaged, the working replica can be accurately manufactured if the roller mold 101 serving as the master is safe.

(Etching method)
In addition, although dry etching is used in the etching process to the substrate E) in the first embodiment, wet etching may be performed, or when a plurality of etching processes are provided, only some of them may be wet etching. . Further, when the pattern size is in the micron order, wet etching may be introduced according to the pattern size, such as wet etching at the micron order stage and dry etching at the nano order stage.

(Pattern shape)
In addition, any shape can be used as the shape of the concavo-convex pattern of the present embodiment. For example, when manufacturing a master for producing a magnetic medium (Bit Patterned Media) for recording a signal as a bit pattern (dot pattern), the shape of the dots may be rectangular or other shapes. Absent. Further, a linear pattern may be used in a plan view, such as a discrete track recording media (Discrete Track Recording Media) formed by magnetically separating data tracks of a magnetic disk. May be mixed.

  Furthermore, although it is a concrete order of this concavo-convex pattern, it may be a pattern in the range from nano-order to micro-order, but from the viewpoint of the performance of electronic devices in recent years and the performance of final products, it is several nm. It is even better if it is a nano-order periodic structure of ˜100 nm.

  In addition, as the cross-sectional shape of the concavo-convex pattern, in the case of a one-dimensional periodic structure, a triangle, a trapezoid, a square, and the like are given. In the case of a two-dimensional periodic structure, the shape of the fine protrusions is not limited to an accurate cone (bus line is straight) or pyramid (ridge line is straight), as long as it is tapered in consideration of extraction after imprinting. The ridgeline shape may be a curved surface with a side surface bulging outward. Specific examples include a bell, a cone, a truncated cone, and a cylinder. Hereinafter, the period in this periodic structure is also referred to as a pitch, and indicates the distance between the fine protrusion vertices.

  Further, in consideration of moldability and breakage resistance, the tip portion may be flattened or rounded. Furthermore, this fine protrusion may produce a continuous fine protrusion with respect to one direction.

Hereinafter, preferred embodiments in this embodiment will be additionally described.
[Appendix 1]
A base material for producing the roller mold, which is a base material made of quartz having an outer peripheral portion along a rotation axis direction, and a planarizing layer, a chromium oxide layer, and a main surface of the outer peripheral portion of the base material, A base material for a roller mold, wherein tungsten oxide layers are formed in this order, and an outer peripheral portion after the predetermined pattern is formed on the chromium oxide layer has translucency.
[Appendix 2]
The pattern transfer method according to claim 1, wherein the roller mold has a hollow cylindrical structure, and the light source of the light can be accommodated inside the roller mold.
[Appendix 3]
The pattern transfer method, wherein the roller mold is made of quartz, and the predetermined pattern is formed by cutting the roller mold itself.
[Appendix 4]
A pattern transfer device using a roller mold for imprint in which a predetermined pattern is formed on the main surface of the outer peripheral portion along the rotational axis direction,
A pressing means for pressing the transferred body against the main surface of the outer peripheral portion when transferring the predetermined pattern to the transferred body by imprinting;
By transmitting the light irradiated from the inside or outside of the roller mold to the outer peripheral portion, the outer peripheral portion is irradiated by the pressing means from the inside of the roller mold to the predetermined pattern. Curing means for curing the transferred object after being pressed against the main surface of
A pattern transfer apparatus comprising:
[Appendix 5]
2. The pattern transfer apparatus according to claim 1, wherein the roller mold has a hollow cylindrical structure, and the light source of light can be accommodated inside the roller mold.
[Appendix 6]
The pattern transfer apparatus according to claim 1, wherein the roller mold is made of quartz, and the predetermined pattern is formed by cutting the roller mold itself.

DESCRIPTION OF SYMBOLS 101 Roller mold 102 End part 103 Outer peripheral part 104 Rotation auxiliary part 105 Light source 106 Light source support part 107 Transfer object supply roll 108 Transfer object support roll 109 Transfer support roll 110 Transfer object take-up roll 111 Roll mold rotation roll 200 Transfer body 201 Transferred substrate 202 Transferred resist 1 Roll mold base 2 Flattening layer 3 Adhesive layer 4 Pattern layer 4 ′ Pattern 5 Resist layer 5 ′ Resist pattern O Rotating shaft

Claims (5)

A roller mold for imprint in which a predetermined pattern is formed on the main surface of the outer peripheral portion along the rotation axis direction,
By allowing light emitted from inside or outside of the roller mold to be transmitted to the outer peripheral portion, the light can be emitted from the inside of the roller mold to the main surface of the predetermined pattern. Roller mold to do.   The roller mold according to claim 1, wherein the roller mold has a hollow cylindrical structure, and the light source of the light can be accommodated inside the roller mold.   The roller mold according to claim 2, wherein the roller mold is made of quartz, and the predetermined pattern is formed by cutting the roller mold itself.   It is a base material for manufacturing the roller mold in any one of Claim 1 thru | or 3, Comprising: It is a base material which has the outer peripheral part along a rotating shaft direction, Comprising: The main surface of the said outer peripheral part from the inside of the said roller mold A roller mold base material, wherein a flattening layer having a light-transmitting property capable of being irradiated with light is formed on a main surface of the outer peripheral portion. A pattern transfer method using an imprint roller mold in which a predetermined pattern is formed on the main surface of the outer peripheral portion along the rotation axis direction,
A pressing step of pressing the transferred body against the main surface of the outer peripheral portion when the predetermined pattern is transferred to the transferred body by imprinting;
After the pressing step, the light irradiated from the inside or the outside of the roller mold is transmitted to the outer peripheral portion, thereby irradiating the light from the inside of the roller mold to the transfer target, and A curing step for curing the transfer body;
A pattern transfer method comprising:

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