WO2011071451A1 - Procédé de dopage in-situ d'un film de dioxyde de titane - Google Patents

Procédé de dopage in-situ d'un film de dioxyde de titane Download PDF

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Publication number
WO2011071451A1
WO2011071451A1 PCT/SG2009/000471 SG2009000471W WO2011071451A1 WO 2011071451 A1 WO2011071451 A1 WO 2011071451A1 SG 2009000471 W SG2009000471 W SG 2009000471W WO 2011071451 A1 WO2011071451 A1 WO 2011071451A1
Authority
WO
WIPO (PCT)
Prior art keywords
dopant
titanium dioxide
titanium
layer
dioxide gel
Prior art date
Application number
PCT/SG2009/000471
Other languages
English (en)
Inventor
Zuruzi Bin Abu Samah
Original Assignee
Nanyang Polytechnic
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nanyang Polytechnic filed Critical Nanyang Polytechnic
Priority to US13/512,186 priority Critical patent/US20120237424A1/en
Priority to PCT/SG2009/000471 priority patent/WO2011071451A1/fr
Publication of WO2011071451A1 publication Critical patent/WO2011071451A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation

Definitions

  • This invention relates to titanium dioxide. More particularly, this invention relates to a titanium dioxide film dispersed with a dopant and a method of preparing the film. Still more particularly, the method of preparing a doped titanium dioxide film in accordance with this invention involves deposition of a desired dopant, concurrently or sequentially, with titanium before oxidation of the titanium; and formation of a titanium dioxide gel layer with dopant incorporated within the layer.
  • Titanium dioxide also known as titania
  • titania has a wide range of uses including a pigment for paint, a food colouring, a sunscreen, a photocatalyst, etc.
  • One method of forming a titanium dioxide film is depositing a layer of titanium on a substrate followed by oxidation in a liquid oxidizing agent, such as aqueous hydrogen peroxide. During oxidation process, the titanium layer is oxidised to form an amorphous gel, called a titanium dioxide gel layer.
  • Figure 1 illustrates a diagram of a prior art method to deposit a layer of titanium 101 on a substrate 103 in a sputtering chamber 100.
  • the layer of titanium can be obtained by various deposition techniques, such as physical vapour deposition, chemical vapour deposition, etc.
  • a doping agent or dopant / additive
  • a doping agent is added into a titanium dioxide film to modify the film properties, such as electrical conductivity, optical properties, chemical stability, thermal stability, etc.
  • carbon is added into titanium dioxide as a dopant to enhance the photocatalytic property of titanium dioxide.
  • the type of dopant used and the distribution profile of the dopant in the titanium dioxide film are important as both affect the properties of the film. It is a known problem to obtain a titanium dioxide film with dopants uniformly dispersed throughout the entirety of the film.
  • prior art methods only allow a dopant to disperse into a small area proximate a contact surface of the film during a doping process. This is because prior art methods immerse the titanium dioxide gel layer in a medium containing the dopant.
  • This conventional doping method is illustrated in Figure 2.
  • the titanium dioxide gel layer 201 is immersed in a dopant solution containing tin ions 203, such as aqueous tin chorine.
  • tin ions 203 such as aqueous tin chorine.
  • the dopant ions diffuse into the titanium dioxide gel layer with a higher concentration of dopant proximate the contact surface 205.
  • the gel layer is annealed at an elevated temperature to transform the titanium dioxide gel layer doped with a desired dopant 301 into a crystalline state.
  • this type of doping method creates a gradient concentration of dopant within the titanium dioxide film 301 , i.e. the contact surface having a higher concentration of dopant than other areas of the film.
  • the aforementioned doping method has other disadvantages.
  • One disadvantage is that all ionic species present in the doping solution are incorporated fully into the titanium dioxide gel layer. The incorporation of some undesirable species may degrade the properties of the titanium dioxide film.
  • a first advantage of a method in accordance with this invention is that incorporation of dopants into a titanium dioxide film ("doping step") occurs during oxidation of the film (“oxidation step”). Therefore, unlike conventional methods, the doping and oxidation of the titanium in accordance with this invention occur concurrently (in-situ) in a single step. No separate doping step (e.g. immersing the film in a dopant solution) is required in this invention. Hence, the doping method of this invention is simpler than conventional methods.
  • a second advantage of a method in accordance with this invention is that incorporation of a desired dopant into a titanium dioxide film by way of deposition avoids incorporation of undesired anions from the dopant solution.
  • a third advantage of a method in accordance with this invention is that the amount of dopant incorporated into a titanium dioxide film is controllable by varying the thickness and/or number of dopant layers deposited. For example, a thicker layer of dopant or more layers of dopant may be employed if a higher concentration of dopant is desired.
  • a fourth advantage of a method in accordance with this invention is that dispersion of dopant throughout the titanium dioxide film is more uniform as multiple layers of dopant may be employed in this invention.
  • the present invention provides a method for producing a titanium dioxide film which contains an additive of at least one doping agent (or dopant) uniformly dispersed throughout the entirety of the film.
  • the dopant is selected from a group including platinum, palladium, silver, tin, aluminium, copper and other dopants that are amenable to thin film deposition.
  • the dopant can be deposited by different techniques, either concurrently or sequentially with the titanium.
  • a common deposition technique is sputtering, such as physical vapour deposition or chemical vapour deposition, etc.
  • a layer of dopant is deposited and embedded between two layers of titanium by a sequential deposition process.
  • the number of layers of titanium and dopant to be deposited depends on the desired property of the titanium dioxide film to be achieved.
  • This deposition method creates a structure with layers of titanium interleaved with layers of dopant.
  • This multiple- layered structure of titanium and dopant then undergoes an oxidation process whereby the structure is immersed in an oxidising agent.
  • titanium is oxidised to form a gel layer, called titanium dioxide gel, with dopant incorporated within the layer.
  • the titanium dioxide gel layer is then annealed at an elevated temperature to transform the titanium dioxide gel layer into a crystalline state with dopant uniformly dispersed throughout the entirety of the film.
  • dopant is deposited together with titanium on a substrate in a single deposition process, such as co-sputtering. This concurrent deposition method produces a layer of titanium intermixed with dopant.
  • the layer is then undergoes an oxidation process, similar to the first embodiment as discussed above, to form a titanium dioxide gel layer with dopant incorporated within the layer. This is followed by an annealing process at an elevated temperature to transform the titanium dioxide gel layer into a titanium dioxide film with dopant uniformly dispersed throughout the entirety of the film.
  • deposition of dopant in accordance with this invention occurs before oxidation of titanium.
  • the dopant is more uniformly incorporated into the titanium dioxide gel layer during oxidation process, and thus the additional doping step is eliminated in this invention.
  • the titanium dioxide film produced in accordance with this invention having a more uniform dispersion of dopant throughout the entirety of the film, and thus significantly overcomes the disadvantages as discussed in the previous section.
  • Figure 1 illustrating a diagram of a prior art method to deposit a layer of titanium on a substrate
  • FIG. 2 illustrating a diagram of a prior art method to dope a titanium dioxide gel layer
  • FIG. 3 illustrating a diagram of a gradient concentration of dopants in a titanium dioxide film of a prior art method
  • FIG. 5 illustrating a titanium film incorporated with dopant in accordance with one embodiment of this invention being oxidised
  • Figure 6 illustrating a titanium dioxide film with dopant uniformly dispersed throughout the entirety of the film in accordance with one embodiment of this invention
  • Figure 7 illustrating a flow diagram of a method for producing a titanium dioxide film with dopant uniformly dispersed throughout the entirety of the film in accordance with one embodiment of this invention
  • Figure 8 illustrating a flow diagram of a method for producing a titanium dioxide film with dopant uniformly dispersed throughout the entirety of the film in accordance with another embodiment of this invention.
  • This invention relates to titanium dioxide. More particularly, this invention relates to a titanium dioxide film incorporated with a dopant and a method of preparing the film. Still more particularly, the method of preparing a doped titanium dioxide film in
  • Figures 4-5 illustrate a method of producing a titanium dioxide film with dopant uniformly dispersed throughout the entirety of the film in accordance with one
  • a substrate 401 for example made of silicon, is placed in a cavity 400 as illustrated in Figure 1.
  • the cavity 400 can be any deposition system such as a physical vapour deposition sputtering chamber. The exact deposition technique is not important to this invention and is left as a design choice to those skilled in the art.
  • a first layer of titanium 403 is deposited on the substrate 401.
  • a layer of dopant 405 is then deposited on the first layer of titanium 403.
  • a second layer of titanium 407 is deposited on the dopant layer 405. This sequential deposition process creates a structure 409 with a layer of dopant 405 embedded between two layers of titanium 403, 407.
  • FIG. 5 illustrates an oxidation process of the multiple-layered structure 409.
  • the multiple-layered structure 409 is immersed in a liquid oxidation agent 501 (oxidant).
  • a typical oxidant is hydrogen peroxide although any other suitable oxidant may be used.
  • titanium interacts with the oxidizing agent and forms a titanium dioxide gel layer 503.
  • the dopant 405 which has been intimately embedded between the titanium layers 403, 407 is uniformly incorporated into the titanium dioxide gel layer 503 during the oxidation process. This step is important as oxidation of titanium to form titanium dioxide gel layer and incorporation of dopant into the titanium dioxide gel layer take place simultaneously or in-situ during a single step of oxidation.
  • the titanium dioxide gel layer with dopant uniformly incorporated within the layer then undergoes an annealing process.
  • the annealing process is performed at an elevated temperature from about 300 °C to 700 °C and may be carried out in air or an inert environment.
  • the annealing process enhances the dispersion of dopant within the titanium dioxide film 601 as illustrated in Figure 6. Therefore, the titanium dioxide film obtained in accordance with one embodiment of this invention has dopant more uniformly dispersed throughout the entirety of the film, in comparison to conventional methods.
  • One way of improving the uniformity of the dopant within the film is to have more layers of dopant interleaved with layers of titanium during deposition step.
  • FIG. 7 illustrates a flow diagram of process 700 for producing a titanium dioxide film with dopant uniformly dispersed throughout the film.
  • the process begins in step 701 by depositing a first layer of titanium on a substrate.
  • a layer of dopant is deposited on the first layer of titanium in step 703.
  • a second layer of titanium is deposited on the layer of dopant in step 705.
  • An oxidation process occurs in step 707 whereby the multiple-layered structure of titanium and dopant is immersed in a liquid oxidizing agent.
  • the titanium dioxide gel layer is formed in step 707 during the oxidation process.
  • FIG. 8 illustrates a flow diagram of process 800 in accordance with another embodiment of this invention. As illustrated in Figure 7, a structure with multiple layers of titanium and dopant is obtained by a sequential deposition process in steps of 701 , 703 and 705. Alternatively, a layer of titanium intermixed with dopant can be obtained by a single deposition step in process 800.
  • the second embodiment of this invention is similar to the first embodiment as illustrated in Figures 4-6, except the deposition step.
  • the process 800 begins by concurrently depositing a layer of titanium and dopant on a substrate.
  • the layer of titanium intermixed with dopant is oxidized in step 803 to form a titanium dioxide gel layer. Since the dopant has been intermixed with the titanium during deposition step 801 , the dopant is uniformly incorporated into the titanium dioxide gel layer during the oxidation step 803.
  • the titanium dioxide gel layer is then cleaned with de-ionized water in step 805 to remove unwanted residues.
  • the titanium dioxide gel layer is annealed at an elevated temperature in the range between 300 °C to 700 °C in step 807 and a doped titanium dioxide film is obtained.

Abstract

L'invention concerne un procédé de production d'un film de dioxyde de titane comportant un dopant dispersé uniformément sur tout le film. Le procédé implique le dépôt d'un dopant, simultanément ou séquentiellement, avec du titane avant l'oxydation du titane. Aucune étape de dopage séparée n'est nécessaire dans la présente invention car l'étape de dopage se produit in-situ pendant le procédé d'oxydation. La quantité de dopant incorporé dans un film de dioxyde de titane peut être contrôlée en faisant varier l'épaisseur et/ou le nombre de couches de dopant déposées. Par ailleurs, la dispersion de dopant sur le film de dioxyde de titane est plus uniforme dans la présente invention car de multiples couches de dopant peuvent être utilisées.
PCT/SG2009/000471 2009-12-07 2009-12-07 Procédé de dopage in-situ d'un film de dioxyde de titane WO2011071451A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/512,186 US20120237424A1 (en) 2009-12-07 2009-12-07 Method for in-situ doping of titanium dioxide film
PCT/SG2009/000471 WO2011071451A1 (fr) 2009-12-07 2009-12-07 Procédé de dopage in-situ d'un film de dioxyde de titane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/SG2009/000471 WO2011071451A1 (fr) 2009-12-07 2009-12-07 Procédé de dopage in-situ d'un film de dioxyde de titane

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Publication Number Publication Date
WO2011071451A1 true WO2011071451A1 (fr) 2011-06-16

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US (1) US20120237424A1 (fr)
WO (1) WO2011071451A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106268765A (zh) * 2016-07-15 2017-01-04 辽宁大学 一种金属离子掺杂二氧化钛薄膜制备方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11197516A (ja) * 1998-01-09 1999-07-27 Takenaka Komuten Co Ltd 光触媒材料及びその製造方法
JP2001295026A (ja) * 2000-04-14 2001-10-26 Nippon Sheet Glass Co Ltd 撥水性の物品および撥水性の薄膜の被覆方法
US20060005745A1 (en) * 2004-07-06 2006-01-12 Van Osten Karl-Uwe Method of producing a titanium-suboxide-based coating material, correspondingly produced coating material and sputter target provided there-with
JP2008050208A (ja) * 2006-08-24 2008-03-06 Tohoku Univ 光照射コバルトドープ二酸化チタン膜
US20080187732A1 (en) * 2004-03-12 2008-08-07 Dai Nippon Printing Co., Ltd. Coating Composition, Its Coating Film, Antireflection Film, and Image Display Device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW448318B (en) * 2000-09-18 2001-08-01 Nat Science Council Erbium, Yttrium co-doped Titanium oxide thin film material for planar optical waveguide amplifier

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11197516A (ja) * 1998-01-09 1999-07-27 Takenaka Komuten Co Ltd 光触媒材料及びその製造方法
JP2001295026A (ja) * 2000-04-14 2001-10-26 Nippon Sheet Glass Co Ltd 撥水性の物品および撥水性の薄膜の被覆方法
US20080187732A1 (en) * 2004-03-12 2008-08-07 Dai Nippon Printing Co., Ltd. Coating Composition, Its Coating Film, Antireflection Film, and Image Display Device
US20060005745A1 (en) * 2004-07-06 2006-01-12 Van Osten Karl-Uwe Method of producing a titanium-suboxide-based coating material, correspondingly produced coating material and sputter target provided there-with
JP2008050208A (ja) * 2006-08-24 2008-03-06 Tohoku Univ 光照射コバルトドープ二酸化チタン膜

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106268765A (zh) * 2016-07-15 2017-01-04 辽宁大学 一种金属离子掺杂二氧化钛薄膜制备方法
CN106268765B (zh) * 2016-07-15 2019-01-08 辽宁大学 一种金属离子掺杂二氧化钛薄膜制备方法

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