Classifications

• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/20—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof characterised by a particular use or purpose
  • B42D25/29—Securities; Bank notes
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/40—Manufacture
  • B42D25/405—Marking
  • B42D25/425—Marking by deformation, e.g. embossing
• • B42D2033/04—
• • B42D2033/18—
• • B42D2035/36—
• • B—PERFORMING OPERATIONS; TRANSPORTING
  • B42—BOOKBINDING; ALBUMS; FILES; SPECIAL PRINTED MATTER
  • B42D—BOOKS; BOOK COVERS; LOOSE LEAVES; PRINTED MATTER CHARACTERISED BY IDENTIFICATION OR SECURITY FEATURES; PRINTED MATTER OF SPECIAL FORMAT OR STYLE NOT OTHERWISE PROVIDED FOR; DEVICES FOR USE THEREWITH AND NOT OTHERWISE PROVIDED FOR; MOVABLE-STRIP WRITING OR READING APPARATUS
  • B42D25/00—Information-bearing cards or sheet-like structures characterised by identification or security features; Manufacture thereof
  • B42D25/30—Identification or security features, e.g. for preventing forgery
  • B42D25/328—Diffraction gratings; Holograms

Definitions

• the invention relates to a security element and a manufacturing method thereof.
• Items to be protected are often provided with a security element that allows verification of the authenticity of the item and at the same time serves as protection against unauthorized reproduction.
• Items to be protected include, for example, security papers, identity and value documents (such as banknotes, chip cards, passports, identification cards, identity cards, stocks, bonds, certificates, vouchers, checks, tickets, credit cards, health cards, etc.) as well as product security elements such as security items. Labels, seals, packaging.
• the security against forgery of a security element is particularly great when the security element on the front and back shows perceptible mo- tives that lie in a certain position relative to one another and / or are difficult to imitate or copy.
• WO 2008/017362 A3 describes various production methods for optically variable films in which an optically variable motif (ie one dependent on the viewing condition, eg the viewing direction, dependent image) on the front and another on the back and a third motif Viewing in transmitted light or in transmission observation is visible.
• the production methods involve topographically different structures and subsequent demetallization of metal layers as well as mask exposure methods, in which the front side information is a Form mask for the exposure of a reverse side.
• WO 2006/133863 A2 different variants of optically variable patterns for a security element are known, which look different when viewing the front or back of the security element, so form different motifs.
• WO 03/053713 A1 describes a security element which is constructed on a plastic film and carries relief structures on both sides of the plastic films which act as diffraction structures and represent a motif, for example as a hologram.
• the relief structures are further provided with metal layers which are structured by interruptions, so that additionally a suitable pattern, for example a letter or another alphanumeric character, can be recognized.
• the structured metallization on the relief structures is designed as a reflective layer, so that the corresponding motif is visible in plan view.
• the invention has for its object to provide a security element that shows different motifs on the front and back and yet is easy to manufacture, especially without consuming Passerieux. Furthermore, the security element should preferably also allow a subject to be perceived in a simple way when viewed through transmitted light.
• a security element for security papers, documents of value or the like having a top and a bottom having a carrier, mounted on the top, upper embossing lacquer layer in which an upper embossed structure is formed, one mounted on the bottom, lower embossing lacquer layer in which a lower embossing structure is formed, wherein between the upper side of the carrier and the upper embossing lacquer layer, an upper reflection layer is arranged.
• the object is further achieved by a value document with such a security element.
• a production method for a security element for security papers, documents of value or the like in which a carrier having a top side and a bottom side is provided at the top with an upper reflective layer and therewith an upper embossing lacquer layer and at the bottom side with a lower embossing lacquer layer is formed, wherein in the upper embossing lacquer layer an upper embossing structure and in the lower embossing lacquer layer a lower embossed structure are formed.
• the invention provides a surprisingly simple constructed security element, which has both a recognizable from the front side front motif, which is not visible from the back, and has a visible from the back back motif, which is imperceptible from the front.
• the front and back motifs are not visible from the other side, a registration of the two motifs to each other is not necessary.
• the separation of these two motifs is achieved in that the upper reflection layer is located between the upper embossing lacquer layer and the lower embossing lacquer layer. It causes a reflection of incoming light.
• the upper reflection layer does not lie directly on the embossed structure, as is also the case with conventional hologram films, the front-side motif can only be seen from the front and the back-side motif only from the rear side.
• the embossed structures preferably cooperate with the reflective layer, e.g. B. taking advantage of a diffractive or holographic effect. But there are also different acting embossed structures possible, for. As micro lenses, micro hollow mirror, sawtooth structures, matte structures, etc.
• the upper reflective layer is to be executed over its entire surface.
• This may be a full-surface metallization ⁇ comprising aluminum, copper, iron, chromium, gold, or silver, etc., for example.
• a printed glossy lacquer layer is also suitable as a reflection layer.
• various reflective layers can also be combined to impart a desired visual appearance, such as a desired color effect, to the front motif and back motif, respectively.
• embossing of the upper embossed structure or of the lower embossed structure is preferably carried out using commercially available embossing lacquers, as described, for example, as heat-sealing lacquers in DE 102004035979 A1, the disclosure of which is fully incorporated by reference.
• embossing lacquers as described, for example, as heat-sealing lacquers in DE 102004035979 A1, the disclosure of which is fully incorporated by reference.
• thermoplastic, electron beam-curing or UV-curing embossing systems are suitable.
• embossing lacquer layer Since at least one embossing lacquer layer has to be anchored directly on the support, which can be embodied, for example, as a film, a good adhesion of the embossing lacquer layer usually between 1 ⁇ m and 10 ⁇ m, preferably between 1.5 ⁇ m and 4 ⁇ m, is desirable. This can be achieved by the use of carrier materials, eg. As film material can be achieved with suitable pretreatment. Examples include an acrylate coating in combination with a corona treatment prior to application of the embossing lacquer or the printing of adhesion-promoting primers.
• embossing lacquer Due to the then good adhesion of the embossing lacquer to the carrier, a pure casting process can be used for embossing, in which the embossing lacquer is pressed into an embossing cylinder without further pretreatment. In this way one obtains an optimal reproduction of an embossed structure, resulting from a very good reproduction of the embossing tool. Brilliant embossed motifs are the result.
• the top and / or the bottom is provided with a Regelackhaftung improving treatment / are. It is also preferred if the upper and / or the lower embossing lacquer layer has a UV-curing embossing lacquer.
• Such UV embossing lacquers have the further advantage that they are particularly well suited as an acceptance layer for offset and steel embossing inks. They can thus serve as the base for banknote printing coverage with offset or steel stitch colors. A naturally otherwise possible at any time pressure receiving layer on one side of the security element can then be omitted.
• the inventive structure of the security element with internal reflection layer has several advantages. On the one hand, the reflection layer is flat, which improves its reflection properties. On the other hand, it is well protected by the carrier and the overlying embossing lacquer layer. This achieves good chemical resistance and resistance to scratching.
• the motif which can be perceived by the upper embossing structure from the upper side can be formed in the form of a hologram, the same applies to the motif which can be perceived from the underside and which defines the lower embossed structure. riding up.
• the interaction of embossing structure and reflection layer can advantageously be provided with a color effect if a color layer is provided between the embossing structure and the reflection layer. Then, the corresponding motif provided by the upper and lower embossing patterns, respectively, is affected by the color layer because the reflective radiation is colored.
• a hologram can z. B. be provided with a color effect.
• the protection by the security element can be further increased if the upper reflection layer is structured with an upper motif, which is then visible in transmitted light observation in combination with an at least partially transparent or translucent support.
• the upper reflection layer is not carried out over the entire surface, but provided with motif-dependent interruptions or openings.
• a metallic reflection layer this can be done, for example, by demetallization using technologies known to the person skilled in the art (etching technology and washing process).
• the required printing ink is printed in the form of a fine motif.
• the separation of the embossed motifs through the openings in the reflection layer can be impaired in principle.
• the structure of the openings / interruptions is formed with a sufficient fineness. Additionally or optionally, this separation can be improved by making the support translucent but not transparent.
• another reflective layer may be applied and patterned between the underside of the carrier and the lower embossing lacquer layer which offers further possibilities in the case of transmitted light reflection, since the motifs of this lower reflection layer and the upper reflection layer then form a combination motif in transmitted light viewing.
• the above-mentioned color effect can also be produced when structuring the upper and / or the lower reflection layer. This is particularly easy if the respective reflection layer is produced by means of an etching process.
• a protective lacquer is printed, which covers the reflection layer (for example, a metallization) at those locations where no opening or interruption is to be incorporated, and protects against the etchant, for example an etchant.
• This protective coating usually remains on the structured reflection layer, ie those portions of the reflection layer which have not been removed in the etching process. If this protective varnish is colored, then it is achieved that the motif produced by the respective embossing lacquer layer in connection with the reflective layer also has a color effect, eg, a color effect. B. is colored. At the same time, this color effect does not occur in transmitted light or when viewed from the other side. In the variant with an upper and a lower reflection layer, it is particularly advantageous to provide different colors between the respective reflection layer and the associated embossing structure. The corresponding motifs then have different color effects, whereas the transmitted light motif, which is produced by the interaction of the two reflection layers (or a reflection layer), does not essentially show these color effects.
• the lower motif is in each case a grid structure, z.
• a modulated line enrasters wherein a line width between 20 microns and 200 microns, preferably between 50 microns and 150 microns can be used varying. It has been shown that disturbing moire effects or locally different transmission properties can then be easily avoided if the two line grids are at an angle between 80 ° and 100 ° to each other. It is therefore preferred that the lower motif and the upper motif each by a grid structure, for. B.
• a modulated line grid are generated, wherein the line direction of the upper motif preferably crossing, in particular at an angle of 60 ° to 120 °, preferably 70 ° to 110 °, more preferably from 80 ° to 100 ° to the line direction of the lower motif lies.
• Such crossed line grids interfere with each other especially little or not at all and allow in the fürsichtstruck particularly good and clearly recognizable motives.
• the raster elements of the upper and lower reflective layers can advantageously also be designed so that the resulting transmitted light motif is dependent on the viewing angle. In a first variant, this can be achieved in that the screening of the upper and the lower reflection layer have different screen widths. Then moire-magnified images appear in the background, the appearance of which depends on the viewing angle.
• a known shading grid can be used, for example by a raster structure containing no motif. At certain viewing angles, this raster structure then shades the raster structure of the other reflection layer in which the motif is modulated.
• the desired see-through effect can, in principle, be achieved by any kind of screening which, on the one hand, is so small in terms of fineness that the grid elements are not noticeable to the eye and, on the other hand, in their through-view. local coverage are locally modulated so that the / the visuals is / is visible. In this case, either the density of the raster elements and / or the size of the raster elements can be modulated. At the same time, the fineness of the rastering ensures that the upper or lower reflection layer continues to fulfill its function in connection with the embossing structure lying above it in the viewing direction.
• the security element may in particular be designed as a security thread, tear-open thread, security strip, security strip, patch or label for applying to a security paper, value document or the like.
• the security element can span transparent areas or recesses.
• security paper is understood here in particular as the precursor that can not be processed to a value document which, in addition to the security element according to the invention, may also have further authenticity features (such as, for example, luminescent substances provided in the volume).
• Value documents are here understood, on the one hand, documents produced from security papers.
• value documents can also be other documents and objects which can be provided with the security feature according to the invention, so that the value documents have non-copyable authenticity features, whereby an authenticity check is possible and unwanted copies are prevented at the same time.
• the reciprocal The characteristic of the translucency is the opacity.
• the production method according to the invention can be developed so that the described preferred embodiments and embodiments of the security element are produced.
• FIG. 1 shows a top view of a banknote with a security element
• Fig. 2 is an enlarged view of the section taken along the line A-A of
• FIG. 3 is a sectional view similar to FIG. 2 of a further embodiment of the security element of FIG. 1,
• FIG. 4 shows a sectional view similar to FIG. 2 of a further embodiment of the security element of FIG. 1
• FIG. 5 shows a schematic view of a line-scanned motif in an upper reflection layer of the security element
• FIG. 6 shows a line raster for a lower reflection layer of the security element
• Fig. 7-10 different superimpositions of the line grid of Fig. 5 and 6.
• the figures are not shown to scale for better representation. Furthermore, some hatching is not shown in order to represent the structure of the corresponding security element 1 more clearly.
• sectional views is referred to as the front of the security element in the representations above page. The back is accordingly the bottom side. This convention is merely for ease of description and is not intended to be limiting as to the construction and / or application of the security element.
• a security element 1 is integrated into a banknote 2 such that the security element 1 is visible both from the front side of the banknote 2 shown in FIG. 1 and from the backside of the banknote 2.
• the security element 1 provided on the banknote 2 can also be part of a security thread 19 of the banknote which, as in FIG illustrated by way of example, is usually woven into the paper of the banknote 2 such that it is partially visible on the front side (the side visible in FIG. 1) and partly on the back side of the banknote. It is also possible for the security element 1 to be arranged at least partially via a window 20 provided in the banknote 2. Of course, these possibilities are only examples of the use of the security element 1 described below, which of course can also be used in other ways for copying or imitation protection of a protected object.
• Fig. 2 shows a sectional view through the security element 1 along the line A-A of Fig. 1.
• the basis for the security element 1 is a carrier 3, which can be realized for example by a plastic film. This plastic film may be transparent or even translucent, as will be explained later.
• suitable adhesion promoters 6 and 7 are attached to the carrier 3, which ensure that the following layers have a strong adhesion to the carrier 3.
• the adhesion promoter 6 or 7 can on the one hand by a suitable pretreatment of the carrier or use of films suitable coating tion, such. As acrylate coating in combination with corona treatment, or by printing of adhesion-promoting primers can be achieved. Subsequently, a reflection layer 8 is applied to the top surface 4 of the carrier 3 provided with adhesion promoter 6.
• This is preferably a reflective layer, for example, by a metallization (eligible, for example, aluminum, copper, iron, chromium, GoId, silver, etc. with optical densities between 1.38 and 4.5 oD, preferably between 1.8 and 3.0 oD) is realized.
• a metallization eligible, for example, aluminum, copper, iron, chromium, GoId, silver, etc. with optical densities between 1.38 and 4.5 oD, preferably between 1.8 and 3.0 oD
• a printed glossy lacquer layer is possible.
• various reflective layers may be combined to produce desired optical phenomena of the motifs presented by the security element 1 to the observer, as will be explained below.
• embossing lacquer layer 9 or an embossing lacquer layer 10 is then applied to the reflection layer 8 and to the underside 5 of the carrier 3 provided with adhesion promoter 7.
• the embossing lacquer layers 9, 10 thus obtained are now provided with an upper embossing structure 11 or a lower embossing structure 12. Due to the good adhesion of the embossing lacquer layers 9, 10 on the upper side 4 or underside 5 of the carrier 3, the embossing lacquer structures 11 and 12 can be pressed with a stamping cylinder without further pretreatment.
• the embossed structures realize, in connection with the reflective reflection layer 8, a top-side embossing motif or a bottom-side embossing motif, which is visible when viewed from the front side VS or when viewed from the rear side RS.
• different motifs of the front side VS and the rear side RS can be used. If one of the two sides of the security element 1 is to be printed, this can be done directly on the embossing lacquer 9 or 10 if a UV embossing lacquer is used for this purpose. This is suitable as an acceptance layer for offset and streak stitch colors. Print acceptance layers, which would require several operations for the application, are therefore no longer necessary.
• FIG. 3 shows a further development of the security element of FIG. 1, the layer structure essentially corresponding to that explained with reference to FIG. 2.
• the reflection layer 8 is now additionally provided with a reflection provided ons Mrstechnik, which causes a motif.
• the reflection layer is not over the entire surface on the upper side 4 of the carrier 3, but has a motif-forming varying opacity, ie a pattern. This can be z. B. be generated by a screening.
• the grid density of the grid structure or structuring of the reflection layer 8 is chosen so that the structure and the motive caused by it when viewing from the front side VS and the back RS is not or very little noticeable.
• this structure can be achieved for example by demetalization with known technologies (etching technology and washing process). If a printed reflection layer 8 is used, the motif is already produced during printing by application of the printing ink.
• the security element 1 of FIG. 3 thus has an upper embossing structure 11, which provides an embossed motif, which is visible from the direction of the front side VS forth. From the back RS fro another embossed motif can be seen, which causes the lower embossing structure 12.
• Fig. 4 shows a development of the security element 1 of Fig. 3, wherein now also on the underside 5 of the support 3, a lower reflection layer 14 is provided, which is provided with a lower reflective layer structure. In transmitted light, the two reflection layer structures of the upper reflection layer 8 and the upper reflection layer 14 act together. men.
• security element 1 provides a total of five different motifs.
• the motifs which can be recognized in plan view, in particular in an oblique top view, as security features are the upper reflection layer 8 and the lower reflection layer 14.
• the structures of the upper reflection layer 8 and the lower reflection layer 14 cooperate when the security element 1 is viewed in transmitted light.
• a line width rastering can be used, preferably with a line width between 20 ⁇ m and 200 ⁇ m, particularly preferably between 50 ⁇ m and 150 ⁇ m.
• Fig. 5 schematically shows the upper reflection layer structure 15 in the upper reflection layer 8 of Fig. 4
• Fig. 6 shows the lower reflection layer structure 18 in the lower reflection layer 14 of Fig. 4.
• the carrier 3 can be made transparent. Then the picture appearing in a transparent view is particularly clear. If one uses only a translucent carrier 3, the separation of the image formed by the front side VS by the embossing structure 11 from the image produced at the rear side RS by the lower embossing structure 12 increases at the expense of the quality of the transmitted light image.

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• Engineering & Computer Science (AREA)
• Manufacturing & Machinery (AREA)
• Business, Economics & Management (AREA)
• Accounting & Taxation (AREA)
• Finance (AREA)
• Credit Cards Or The Like (AREA)

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Publications (1)

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Citations (7)

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• 2009
  • 2009-07-01 DE DE102009031386A patent/DE102009031386A1/de not_active Withdrawn
• 2010
  • 2010-06-30 WO PCT/EP2010/059301 patent/WO2011000877A1/de active Application Filing
  • 2010-06-30 MX MX2012000032A patent/MX2012000032A/es active IP Right Grant
  • 2010-06-30 EP EP10726984.7A patent/EP2448766B1/de active Active
  • 2010-06-30 AU AU2010268080A patent/AU2010268080B2/en not_active Ceased

Patent Citations (7)

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