WO2010142684A3 - Solarzelle mit kontaktstruktur mit geringen rekombinationsverlusten sowie herstellungsverfahren für solche solarzellen - Google Patents
Solarzelle mit kontaktstruktur mit geringen rekombinationsverlusten sowie herstellungsverfahren für solche solarzellen Download PDFInfo
- Publication number
- WO2010142684A3 WO2010142684A3 PCT/EP2010/058016 EP2010058016W WO2010142684A3 WO 2010142684 A3 WO2010142684 A3 WO 2010142684A3 EP 2010058016 W EP2010058016 W EP 2010058016W WO 2010142684 A3 WO2010142684 A3 WO 2010142684A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- solar cell
- contact structure
- substrate
- semiconductor material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/206—Electrodes for devices having potential barriers
- H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
- H10F77/219—Arrangements for electrodes of back-contact photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/12—Photovoltaic cells having only metal-insulator-semiconductor [MIS] potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/14—Photovoltaic cells having only PN homojunction potential barriers
- H10F10/146—Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/164—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
- H10F10/165—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
- H10F10/166—Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
- H10F77/311—Coatings for devices having potential barriers for photovoltaic cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Photovoltaic Devices (AREA)
Abstract
Es wird ein Konzept für eine hocheffiziente Solarzelle, insbesondere auf Basis qualitativ hochwertigen kristallinen Siliziums, sowie ein Herstellungsverfahren für eine solche Solarzelle vorgeschlagen. Bei der Solarzelle (1) wird eine Kontaktstruktur (3) mit Hilfe einer Schichtenstapelanordnung ausgebildet, die eine erste Schicht (19) aus einem elektrisch isolierenden Material, eine zweite Schicht (21) aus einem Halbleitermaterial und eine dritte Schicht (22) aus einem elektrisch leitfähigen Material aufweist. Die erste, dielektrische Schicht ist hierbei zwischen dem Substrat (17) und der zweiten, halbleitenden Schicht (21) angeordnet und derart ausgebildet, dass ein signifikantes Tunneln von Ladungsträgern zwischen dem Substrat (17) und der zweiten Schicht (21) durch die erste Schicht (19) hindurch ermöglicht ist. Das Halbleitermaterial des Solarzellensubstrates und das Halbleitermaterial der zweiten Schicht weisen aufgrund unterschiedlicher Bandstrukturen verschiedene elektrische Eigenschaften auf. Auf diese Weise kann eine Elektronen-/Loch- Selektivität des Tunnelprozesses innerhalb der Kontaktstruktur beeinflusst werden, wodurch sich durch die Kontaktstruktur bewirkte Rekombinationverluste signifikant reduzieren lassen.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009024598A DE102009024598A1 (de) | 2009-06-10 | 2009-06-10 | Solarzelle mit Kontaktstruktur mit geringen Rekombinationsverlusten sowie Herstellungsverfahren für solche Solarzellen |
| DE102009024598.7 | 2009-06-10 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| WO2010142684A2 WO2010142684A2 (de) | 2010-12-16 |
| WO2010142684A3 true WO2010142684A3 (de) | 2011-04-28 |
| WO2010142684A4 WO2010142684A4 (de) | 2011-07-21 |
Family
ID=43298791
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2010/058016 Ceased WO2010142684A2 (de) | 2009-06-10 | 2010-06-08 | Solarzelle mit kontaktstruktur mit geringen rekombinationsverlusten sowie herstellungsverfahren für solche solarzellen |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE102009024598A1 (de) |
| WO (1) | WO2010142684A2 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6208682B2 (ja) * | 2011-12-21 | 2017-10-04 | サンパワー コーポレイション | ハイブリッドポリシリコンヘテロ接合裏面コンタクト電池 |
| KR20140135881A (ko) * | 2013-05-16 | 2014-11-27 | 엘지전자 주식회사 | 태양 전지 및 이의 제조 방법 |
| AU2017371707B2 (en) * | 2016-12-06 | 2022-07-07 | The Australian National University | Solar cell fabrication |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2034973A (en) * | 1978-10-23 | 1980-06-11 | Hezel R | Solar cell with multi-layer insulation |
| US4315097A (en) * | 1980-10-27 | 1982-02-09 | Mcdonnell Douglas Corporation | Back contacted MIS photovoltaic cell |
| EP0164090A2 (de) * | 1984-06-05 | 1985-12-11 | Telefunken Systemtechnik Gmbh | Solarzelle |
| EP1835548A1 (de) * | 2004-12-27 | 2007-09-19 | Naoetsu Electronics Co., Ltd. | Back-junction-solarzelle und prozess zu ihrer herstellung |
| US20070256728A1 (en) * | 2006-05-04 | 2007-11-08 | Sunpower Corporation | Solar cell having doped semiconductor heterojunction contacts |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10142481A1 (de) * | 2001-08-31 | 2003-03-27 | Rudolf Hezel | Solarzelle sowie Verfahren zur Herstellung einer solchen |
| US7199395B2 (en) * | 2003-09-24 | 2007-04-03 | Sanyo Electric Co., Ltd. | Photovoltaic cell and method of fabricating the same |
| US7375378B2 (en) * | 2005-05-12 | 2008-05-20 | General Electric Company | Surface passivated photovoltaic devices |
| DE102008045522A1 (de) * | 2008-09-03 | 2010-03-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Heterosolarzelle und Verfahren zur Herstellung von Heterosolarzellen |
-
2009
- 2009-06-10 DE DE102009024598A patent/DE102009024598A1/de not_active Withdrawn
-
2010
- 2010-06-08 WO PCT/EP2010/058016 patent/WO2010142684A2/de not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2034973A (en) * | 1978-10-23 | 1980-06-11 | Hezel R | Solar cell with multi-layer insulation |
| US4315097A (en) * | 1980-10-27 | 1982-02-09 | Mcdonnell Douglas Corporation | Back contacted MIS photovoltaic cell |
| EP0164090A2 (de) * | 1984-06-05 | 1985-12-11 | Telefunken Systemtechnik Gmbh | Solarzelle |
| EP1835548A1 (de) * | 2004-12-27 | 2007-09-19 | Naoetsu Electronics Co., Ltd. | Back-junction-solarzelle und prozess zu ihrer herstellung |
| US20070256728A1 (en) * | 2006-05-04 | 2007-11-08 | Sunpower Corporation | Solar cell having doped semiconductor heterojunction contacts |
Non-Patent Citations (2)
| Title |
|---|
| DESRUES T ET AL: "NEW PROCESS INTEGRATION FOR INTERDIGITATED BACK CONTACT (IBC) a-Si:H/c-Si HETEROJUNCTION SOLAR CELLS", 23RD EUROPEAN PHOTOVOLTAIC SOLAR ENERGY CONFERENCE, PROCEEDINGS OF THE 23RD INTERNATIONAL CONFERENCE, 1-5 SEPTEMBER 2008, VALENCIA, SPAIN,, 5 September 2008 (2008-09-05), pages 1673 - 1676, XP002625075 * |
| HOEX B ET AL: "CRYSTALLINE SILICON SURFACE PASSIVATION BY THE NEGATIVE-CHARGE-DIELECTRIC AL2O3", 33RD IEEE SPECIALISTS CONFERENCE, SAN DIEGO, USA, 2008, 16 May 2008 (2008-05-16), XP002625074, ISBN: 978-1-4244-1640-0, DOI: 10.1109/PVSC.2008.4922635 * |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102009024598A1 (de) | 2011-01-05 |
| WO2010142684A4 (de) | 2011-07-21 |
| WO2010142684A2 (de) | 2010-12-16 |
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