WO2010131878A3 - Substrate processing system - Google Patents

Substrate processing system Download PDF

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Publication number
WO2010131878A3
WO2010131878A3 PCT/KR2010/002952 KR2010002952W WO2010131878A3 WO 2010131878 A3 WO2010131878 A3 WO 2010131878A3 KR 2010002952 W KR2010002952 W KR 2010002952W WO 2010131878 A3 WO2010131878 A3 WO 2010131878A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
organic compounds
pump
processing system
substrate processing
Prior art date
Application number
PCT/KR2010/002952
Other languages
French (fr)
Korean (ko)
Other versions
WO2010131878A2 (en
Inventor
배경빈
윤형석
강창호
한경록
남궁성태
이태성
Original Assignee
에스엔유 프리시젼 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에스엔유 프리시젼 주식회사 filed Critical 에스엔유 프리시젼 주식회사
Priority to JP2012510744A priority Critical patent/JP5430749B2/en
Priority to CN201080021214.7A priority patent/CN102422455B/en
Publication of WO2010131878A2 publication Critical patent/WO2010131878A2/en
Publication of WO2010131878A3 publication Critical patent/WO2010131878A3/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/20—Masking elements, i.e. elements defining uncoated areas on an object to be coated
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating

Abstract

The present invention relates to a substrate processing system, and more particularly, to a substrate processing system comprising antifouling means for preventing the interior of a chamber from being fouled by the diffusion of organic compounds during a process of coating a substrate with said organic compounds. The substrate processing system according to the present invention comprises a coating module and a hardening module. The coating module includes a spray unit and a pump. The spray unit sprays organic compounds on the substrate in the chamber, and has a cooling plate which is spaced apart from the substrate and which has a cooling path formed therein for circulating a coolant in order to prevent the diffusion of the dripping organic compounds which are not coated on the substrate. The pump has a cooling trap arranged in a lower portion outside the chamber, said pump being connected to the spray unit through a pump connection pipe having a branched or curved portion formed in the direction intersecting the direction in which the pump connection pipe extends lengthwise. The hardening module irradiates ultraviolet rays by means of an ultraviolet lamp onto the substrate coated with the organic compounds, and has a heating coil for heating a transmissive window interposed between the substrate and the ultraviolet lamp.
PCT/KR2010/002952 2009-05-11 2010-05-10 Substrate processing system WO2010131878A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012510744A JP5430749B2 (en) 2009-05-11 2010-05-10 Substrate processing system
CN201080021214.7A CN102422455B (en) 2009-05-11 2010-05-10 Substrate processing system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020090040940A KR101069842B1 (en) 2009-05-11 2009-05-11 Substrate processing system
KR10-2009-0040940 2009-05-11

Publications (2)

Publication Number Publication Date
WO2010131878A2 WO2010131878A2 (en) 2010-11-18
WO2010131878A3 true WO2010131878A3 (en) 2011-02-24

Family

ID=43085436

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/002952 WO2010131878A2 (en) 2009-05-11 2010-05-10 Substrate processing system

Country Status (5)

Country Link
JP (1) JP5430749B2 (en)
KR (1) KR101069842B1 (en)
CN (1) CN102422455B (en)
TW (1) TWI427838B (en)
WO (1) WO2010131878A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI481080B (en) * 2011-07-13 2015-04-11 Lustrous Green Technology Of Lighting Led package method for maintaining a predetermined luminous quality
KR101325489B1 (en) * 2012-02-15 2013-11-07 에스엔유 프리시젼 주식회사 Thin film encapsulation apparatus
KR102446556B1 (en) 2015-09-21 2022-09-23 삼성디스플레이 주식회사 Apparatus for treating substrate

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010023887A (en) * 1997-09-11 2001-03-26 조셉 제이. 스위니 Vaporization and deposition apparatus and process
JP2001332488A (en) * 2000-05-25 2001-11-30 Tokyo Electron Ltd Substrate-treating device
JP2002001251A (en) * 2000-06-20 2002-01-08 Tokyo Electron Ltd Substrate treating apparatus
KR20030037401A (en) * 2001-11-05 2003-05-14 주식회사 네오뷰 evaporation apparatus for inorganic material layer of organic material display
JP2009019243A (en) * 2007-07-12 2009-01-29 Hitachi Displays Ltd Vapor deposition method and apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004103512A (en) * 2002-09-12 2004-04-02 Fujitsu Ltd Manufacturing method and device for organic el element
JP4974832B2 (en) 2007-09-10 2012-07-11 株式会社アルバック Vapor deposition source, vapor deposition equipment

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010023887A (en) * 1997-09-11 2001-03-26 조셉 제이. 스위니 Vaporization and deposition apparatus and process
JP2001332488A (en) * 2000-05-25 2001-11-30 Tokyo Electron Ltd Substrate-treating device
JP2002001251A (en) * 2000-06-20 2002-01-08 Tokyo Electron Ltd Substrate treating apparatus
KR20030037401A (en) * 2001-11-05 2003-05-14 주식회사 네오뷰 evaporation apparatus for inorganic material layer of organic material display
JP2009019243A (en) * 2007-07-12 2009-01-29 Hitachi Displays Ltd Vapor deposition method and apparatus

Also Published As

Publication number Publication date
TW201115806A (en) 2011-05-01
WO2010131878A2 (en) 2010-11-18
JP2012526653A (en) 2012-11-01
JP5430749B2 (en) 2014-03-05
TWI427838B (en) 2014-02-21
KR101069842B1 (en) 2011-10-04
CN102422455B (en) 2015-03-18
KR20100121975A (en) 2010-11-19
CN102422455A (en) 2012-04-18

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