WO2010116714A1 - Face plate for display device, process for producing same, and display device and article both made using these - Google Patents

Face plate for display device, process for producing same, and display device and article both made using these Download PDF

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Publication number
WO2010116714A1
WO2010116714A1 PCT/JP2010/002497 JP2010002497W WO2010116714A1 WO 2010116714 A1 WO2010116714 A1 WO 2010116714A1 JP 2010002497 W JP2010002497 W JP 2010002497W WO 2010116714 A1 WO2010116714 A1 WO 2010116714A1
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group
face plate
display device
fluorine
film
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PCT/JP2010/002497
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French (fr)
Japanese (ja)
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小川一文
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国立大学法人香川大学
日本電気株式会社
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Publication of WO2010116714A1 publication Critical patent/WO2010116714A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/126Halogenation

Definitions

  • the present invention relates to a face plate for a display device, a manufacturing method thereof, and a display device and an article using the same, and more specifically, has high durability, can be manufactured at low cost, and is highly safe for human bodies and the environment.
  • the present invention relates to a face plate for a display device including an optical lens and a housing with less adhesion of fingerprints, a manufacturing method thereof, a display device and an article using the same.
  • Patent Document 1 discloses a glass plate on which a highly durable water / oil repellent / antifouling coating is formed, the water / oil repellent / antifouling coating comprising at least a fluorocarbon group and a hydrocarbon group.
  • a water / oil repellent / antifouling glass characterized in that it comprises at least one composite film containing a substance mainly containing a silyl group (for example, perfluoroalkylalkoxysilane) and a substance mainly containing a siloxane group.
  • a plate and its manufacturing method are disclosed.
  • Patent Document 2 discloses a technique for antifouling the surface of a member using fluorine gas.
  • Patent Document 1 has a drawback that the production cost is high because an expensive fluorocarbon silane compound is used.
  • the method described in Patent Document 2 does not require a solvent during the antifouling treatment, but has a problem that transparency is deteriorated due to the treatment, and a long time (several hours) is required for the reaction, so that the efficiency is poor. have.
  • the present invention has been made in view of such circumstances, and a face plate for a display device including an optical lens and a housing that has a low environmental impact at the time of processing or disposal, and that can be manufactured inexpensively and has a low adhesion of fingerprints and the like, and its manufacture. It is an object of the present invention to provide a method and a display device and an article using them.
  • the present invention solves the above-mentioned problems by providing a face plate for a display device, wherein a non-existent substance is present so as to cover at least a part of a transparent substrate exposed on the surface on the outer side.
  • the “display device” includes a device operation touch panel and a portable information terminal having both a display function and an operation function.
  • the “article” includes a mobile phone, an electronic computer, a PDA (personal digital assistant), a GPS terminal, a television receiver, a cash dispenser (CD) device, an automatic teller machine (ATM), and the like.
  • the “face plate” is a transparent member that covers the outermost surface of the display surface of the display device.
  • the touch panel has a display surface protection and input function, a camera lens of a mobile phone that is an information input member, and an input.
  • a touch panel portion of a portable information terminal that also serves as a housing and a housing is also included in the “face plate” in the present invention.
  • the “outside surface” refers to a surface that becomes the outside when the display device is assembled as a face plate, and may be abbreviated as “outside surface” hereinafter.
  • At least a part of the outer surface of the face plate for a display device including a camera lens and a housing incorporated in a cellular phone has a part or all of the hydrogen atoms in the hydrocarbon group are fluorine atoms and fluorocarbon groups.
  • the display device faceplate according to the first aspect of the present invention wherein the fluorine-containing functional group has a hydrocarbon group present so as to cover at least a part of the outer surface of the substrate.
  • water / oil / oil repellency / antifouling property water / oil / oil / oil repellency / antifouling property can be obtained at a lower cost than when an expensive fluorocarbon film compound is used.
  • a face plate for a display device having the above can be manufactured.
  • the substance having a fluorine-containing functional group includes a linear film substance having the fluorine-containing functional group, which is the outside of the substrate.
  • An organic thin film chemically bonded to the surface on the side may be formed. Since the substance having a fluorine-containing functional group present so as to cover at least a part of the surface on the outer side of the base material forms an organic thin film having a nanometer level film thickness, Water and oil repellency can be imparted without impairing optical properties and the like.
  • the fluorine-containing functional group is any one of a hydrocarbon group, a hydrocarbon group having an ester group, and a hydrocarbon group having an ether group. Or the functional group by which the several hydrogen atom was substituted by either a fluorine atom or a fluorocarbon group may be sufficient.
  • the fluorine-containing functional group is any one or more hydrogen atoms in the functional groups represented by the following formulas (I) to (V): It may be a functional group substituted with either a fluorine atom or a fluorocarbon group.
  • n and n each independently represent an integer of 0 or more and 24 or less, and m ⁇ n.
  • the fluorine-containing organic thin film may be a monomolecular film of the film substance chemically bonded to the outer surface of the substrate.
  • the fluorine-containing organic thin film is a monomolecular film, the appearance (color tone, gloss, etc.) and optical properties of the base material are not impaired, and it can be suitably applied to optical materials and housings of various devices.
  • the fluorine-containing organic thin film is chemically bonded to the surface on the outer side of the base material, it is excellent in durability and can exhibit water / oil / oil repellency / antifouling properties over a long period of time.
  • the fluorine-containing organic thin film may contain polysiloxane molecules formed of alkoxysilane and / or alkoxypolysiloxane.
  • the film substance having the fluorine-containing hydrocarbon group is bonded to the outside of the base material through a film of the polysiloxane molecule bonded and fixed to the surface on the outside side of the base material. It may be bonded and fixed to the surface on the other side.
  • the polysiloxane molecule coating is formed on the base material via a bond formed by a reaction between an alkoxysilyl group and a surface functional group present on the outer surface of the base material.
  • a part of the film substance having the fluorine-containing hydrocarbon group fixed to the outer surface is directly bonded to the outer surface of the substrate, and the rest is coated with the polysiloxane molecule. It may be bonded and fixed to the outer surface of the substrate.
  • the polysiloxane molecule coating film has a nanometer-level film thickness, so that the thermal conductivity is not impaired. Therefore, it can be suitably applied to a heat radiating member.
  • the polysiloxane molecule is an alkoxysilane and / or a formula (VII) represented by the following formula (VI): It may be formed by a condensation reaction of an alkoxypolysiloxane represented by: SiH x (OA) 4-x (VI) (AO) 3 Si (OSi (OA) 2 ) n OSi (OA) 3 (VII) In the formulas (VI) and (VII), x is 0, 1, or 2; A represents an alkyl group, n is 0, 1, or 2.
  • the substance having a fluorine-containing functional group may be a fluorine-containing organic polymer having the fluorine-containing functional group. Since the fluorine-containing organic polymer is present so as to cover at least a part of the surface on the outer side of the substrate, it has both water and oil repellency and can prevent the adhesion of dirt to the outer surface.
  • a surface roughness of the outer side surface is 10 nm or more and 400 nm or less. If the surface roughness of the outer surface of the face plate for a display device is 400 nm or less, which is the shortest wavelength of visible light, the transparency and optical characteristics of the face plate for a display device are obtained even when a transparent substrate is used. High water and oil repellency and antifouling properties can be imparted without impairing water.
  • a surface on the outer side of a transparent base material present so that the transparent substance having a hydrocarbon group covers at least a part of the surface on the outer side of the face plate.
  • step A in a gas atmosphere of a compound containing a fluorocarbon group, the surface of the substance having a hydrocarbon group on the surface of the substrate is subjected to low-pressure plasma treatment so that a part or all of the hydrogen atoms in the hydrocarbon group are fluorine.
  • a fluorocarbon group By substituting with one or both of an atom and a fluorocarbon group, water and oil repellency is imparted. Therefore, it is possible to manufacture a face plate for a display device having water repellency, oil repellency and antifouling properties at a lower cost than when an expensive fluorocarbon film compound is used.
  • the side that is outside the substrate in the mixed atmosphere of the compound gas containing the fluorocarbon group and the oxygen gas in the step A, the side that is outside the substrate in the mixed atmosphere of the compound gas containing the fluorocarbon group and the oxygen gas.
  • the surface of the substance having the hydrocarbon group on the surface may be subjected to low-pressure plasma treatment. If the substrate is subjected to low-pressure plasma treatment in a mixed atmosphere of a compound gas containing a fluorocarbon group and oxygen gas, a water- and oil-repellent and antifouling member having higher efficiency and higher durability can be provided.
  • the unevenness having a surface roughness of 10 nm or more and 400 ⁇ m or less is formed on the outer surface of the substrate before the step A. You may further have the process B to form.
  • the apparent surface energy of the surface of the water / oil repellent transparent member can be significantly reduced as compared with the case of a flat surface, and high water / oil repellent / antifouling properties can be imparted.
  • the surface roughness of the water / oil repellent transparent member is 400 nm or less which is the shortest wavelength of visible light, even when used for a transparent lens or face plate, the transparency of the lens or face plate is impaired. High water and oil repellency and antifouling properties can be imparted.
  • the coating of the substance containing a hydrocarbon group covering at least a part of the outer surface of the substrate is formed on the substrate.
  • a treatment liquid containing a film compound having a hydrocarbon group is brought into contact with the surface on the outer side of the substrate.
  • An organic thin film containing a hydrocarbon group may be formed by a reaction between the film compound and a surface functional group on the surface on the outer side of the substrate.
  • the coating of the substance having a hydrocarbon group formed on the surface on the outer side of the substrate is an organic thin film having a film thickness of nanometer level, so that the optical characteristics and the like of the substrate are impaired. Water and oil repellency can be imparted without any problem.
  • the film compound includes any one of a hydrocarbon group, a hydrocarbon group having an ester group, and a hydrocarbon group having an ether group. May be.
  • the film compound may be a film compound represented by the following formula (X).
  • Z-SiX p Y 3-p (X) Z represents a substituent containing any one of an alkyl group having 25 or less carbon atoms, an aryl group, a vinyl group, and a silicone group
  • X represents a hydrogen atom or a substituent containing any one of an alkyl group having less carbon atoms than Z, an aryl group, a vinyl group, and a silicone group
  • Y represents a halogen atom or an alkoxyl group
  • p represents 0, 1 or 2.
  • the film compound containing a hydrocarbon group is a film compound represented by any of the following formulas (XI) to (XV): May be. CH 3 (CH 2) n Si (OA) 3 (XI) [CH 3 (CH 2 ) n ] 2 Si (OA) 2 (XII) [CH 3 (CH 2 ) n ] 3 Si (OA) (XIII) CH 3 (CH 2 ) m —COO— (CH 2 ) n Si (OA) 3 (XIV) CH 3 (CH 2 ) m —O— (CH 2 ) n Si (OA) 3 (XV)
  • m and n each independently represent an integer of 0 or more and 24 or less
  • A represents an alkyl group.
  • the treatment liquid is an alkoxysilane represented by the following formula (VI) and / or an alkoxypolysiloxane represented by the formula (VII): May be included.
  • x is 0, 1, or 2
  • A represents an alkyl group
  • n is 0, 1, or 2.
  • a solution containing the alkoxysilane and / or the alkoxypolysiloxane is used on the outer side of the substrate.
  • a surface is treated to form a polysiloxane molecule film on the surface, and then the substrate on which the polysiloxane molecule film is formed is treated with the treatment liquid, and the organic layer is formed on the polysiloxane molecule film.
  • a thin film may be formed.
  • a film containing an organic polymer may be formed as the substrate in the step C.
  • a third aspect of the present invention solves the above problem by providing a display device using the face plate for a display device according to the first aspect of the present invention.
  • a fourth aspect of the present invention solves the above problem by providing an article using the display device according to the third aspect of the present invention.
  • the article according to the fourth aspect of the present invention is any of a mobile phone, an electronic computer or a display device for an electronic computer, a portable information terminal, a GPS terminal, a television receiver, a cash dispenser device, and an automatic teller machine. May be. Furthermore, the lens used for them and the housing itself may be combined. All of these articles are used for articles that often come into contact with the human body, and antifouling properties are strongly required from the viewpoint of hygiene, and the present invention can be suitably applied.
  • a face plate for a display device having a face plate that can be manufactured at a low cost at the time of processing and disposal, and a manufacturing method thereof, and a display device and an article using them. Further, according to the method of the present invention, it is possible to impart a water / oil repellent / antifouling function only on the outermost surface of the face plate having a hydrocarbon group on the outer surface at low cost, resource saving, energy saving.
  • the display device according to the present invention and an article using the display device have high antifouling properties, durability, safety for human bodies and the environment, and can exhibit antifouling properties semipermanently.
  • FIG. 3 is an explanatory diagram schematically showing an enlarged cross-sectional structure of the face plate for a display device according to the first embodiment of the present invention up to a molecular level.
  • the manufacturing method of the face plate for display apparatuses it is explanatory drawing which expanded and expanded the cross-sectional structure of the base material in which the organic thin film was formed to the molecular level typically.
  • the display device faceplate 1 As shown in FIG. 1, the display device faceplate 1 according to each embodiment of the present invention (hereinafter, the display device faceplates 10, 20, and 30 according to first to fourth embodiments which will be described individually). , 40 generic name), a transparent substance 2 having a fluorine-containing functional group in which some or all of the hydrogen atoms in the hydrocarbon group are substituted with either or both of a fluorine atom and a fluorocarbon group (hereinafter, Surfaces on the outer side of the fluorine-containing organic thin films 11, 21, 31 according to the first to third embodiments and the fluorine-containing organic polymer 41 according to the fourth embodiment, which will be described individually, At least a part of the outer surface of the transparent base material 3 exposed to the surface (hereinafter collectively referred to as base materials 12, 22, 32, and 42 according to first to fourth embodiments which will be described individually) As an example, it exists so as to cover the entire surface of the substrate 3 It is present to cover the are shown.) For engagement.
  • a face plate for a display device (hereinafter sometimes abbreviated as “face plate”) 1 is a base material 3 (covering at least a part of a surface on the outer side of a substance having a hydrocarbon group.
  • face plate Is manufactured by a method including a step A in which a low-pressure plasma treatment is performed in a gas atmosphere containing a fluorocarbon group (see FIGS. 2, 4, 7, and 8 (b)).
  • the fluorine-containing functional group is a gas atmosphere of a compound containing a fluorocarbon group on the surface on the outer side of the substrate 3 (substance having a hydrocarbon group present so as to cover at least a part thereof). It is obtained by low-pressure plasma treatment.
  • step A When plasma is generated by high frequency discharge in a gas atmosphere of a compound containing a fluorocarbon group, a fluorocarbon radical such as a fluorine radical ( ⁇ F) or a trifluoromethyl radical ( ⁇ CF 3 ) is generated. These radicals replace the hydrogen atom of the hydrocarbon group on the surface on the outside of the substrate 3 with trifluoromethyl groups 19 and 43 (an example of a fluorine atom or a fluorocarbon group) (FIGS. 2, 4, 7, 8 (b)).
  • a gas containing a compound having an unsaturated bond such as tetrafluoroethylene
  • a perfluoroalkyl group having a large carbon number can also be generated by plasma polymerization.
  • any plasma treatment apparatus that can be used for plasma surface treatment or low-temperature ashing can be used.
  • the form of the chamber include a flow tube type, a bell jar type, etc., and as a form of the electrode for discharge, a parallel plate type, a coaxial cylindrical type, a curved counter plate type such as a cylinder, a sphere, etc.
  • Examples include a hyperboloid opposed flat plate type and a plurality of fine wire opposed flat plate types.
  • the high frequency current can be applied by either a capacitive coupling method or an induction method using an external electrode.
  • the output of the high-frequency power source is appropriately adjusted depending on the material and size of the base material, the type of compound containing a fluorocarbon group used, the type and volume fraction of the added gas, the volume and pressure of the chamber, etc. For example, 10 to 250 W.
  • Examples of the compound containing a fluorocarbon group that has been confirmed to be usable include CF 4 , C 2 F 6 , C 2 F 4 , and CHF 3 .
  • CF 4 fluorocarbon group
  • C 2 F 6 C 2 F 4
  • CHF 3 CHF 3
  • even a compound that contains a CF 3 group and is liquid at normal temperature and pressure can be used as long as it can be gasified under low-pressure plasma processing conditions.
  • a trace amount (0.1 to 5% by volume) of Ar, He or the like is mixed, there is an effect of stabilizing the discharge.
  • low pressure plasma treatment may be performed in a gas atmosphere of a compound containing a fluorocarbon group after performing low pressure plasma treatment in an oxygen gas atmosphere in advance and performing oxidative etching of the outer surface.
  • Plasma treatment in an oxygen gas atmosphere has an action of cleaning the outer surface of the substrate 12 and an action of roughening the outer surface.
  • the thickness can be controlled in the range of several nanometers to several hundred microns.
  • the base material 3 used for manufacturing the face plate 1 for a display device is transparent and needs to be present so as to cover at least a part of the surface on the outer side, the substance having a hydrocarbon group, There is no restriction
  • a coating of a substance containing a hydrocarbon group covering at least a part of the outer surface is formed. It can be formed on the outer surface of the substrate 3.
  • Specific examples of the material of the substrate 3 include organic materials such as resins and inorganic materials such as glass.
  • transparent resins are polyurethane, polyester, polyethylene, polyphenylene sulfide, polyethylene terephthalate, polyethylene naphthalate, polyvinylidene chloride, polyvinyl chloride, polyolefin, polycarbonate, polyvinyl acetate, polystyrene, polysulfone, polytrimethylene terephthalate.
  • Polylactic acid Polyvinyl alcohol, polyvinyl pyrrolidone, polybutylene terephthalate, polybutylene naphthalate, polyvinylidene fluoride, polypropylene, polymer alloy, polymethylpentene, ionomer resin, acrylic resin, acetylcellulose, alkyd resin, AS resin, liquid crystal polymer, Examples include ABS resin, epoxy resin, urea resin, and other engineering plastics.
  • transparent inorganic materials include soda-lime glass, quartz glass, borosilicate glass, crystal glass, glass ceramics, and other metal oxides such as indium oxide, magnesium oxide, and ITO, sodium chloride, and fluoride. Examples thereof include inorganic salts such as single crystals, diamond, and DLC.
  • the base material 3 does not need to be a bulk material, and may be a thin film material such as a vapor deposition film or a coating, or may be a laminated material or the like.
  • the transparent thin film material include a hard coat film containing silica covering the surface of the transparent resin plate, an ITO film, or a sol-gel film of a transparent metal oxide (silica, alumina, zirconia, etc.).
  • these thin film materials may have functions of a surface protective film, a polarizing filter, a transparent conductor layer, and the like.
  • any known method such as vapor phase epitaxy (PVD and CVD), coating of a coating agent, formation of a fine particle film using nanoparticles, etc., a sol-gel method can be used.
  • the thickness of the substrate 3 may be reduced so as to have flexibility, and a transparent conductor layer such as ITO may be provided on the back side. Or what adhered these resin on the outer surface of transparent base materials, such as glass, may be used as the base material 3.
  • the surface roughness of the outer surface of the face plate 1 for display device or the substrate 3 is 10 nm or more and 400 nm or less, preferably 360 nm or less, more preferably 300 nm or less.
  • the shape of the irregularities on the outer surface of the face plate 1 for a display device is not particularly limited as long as the optical characteristics of the base material 3 are not impaired by diffraction or irregular reflection of incident light. It may be a simple shape. In general, when the surface roughness is within the above range, the surface hydrophobicity of the base material 3 can be further improved without deteriorating the surface characteristics of the base material 3, and the optical properties of visible light such as the transparency of the base material 3 can be improved. There is no loss of properties.
  • the surface roughness can be measured using any known method such as a surface roughness meter or a three-dimensional measuring instrument. Further, the size of the unevenness can be measured by image analysis using a stereoscopic microscope or an electron micrograph.
  • an decyl group (C 10 H 21 : an alkyl group that is a hydrocarbon group) is formed on the outer surface of the substrate 12.
  • a hydrogen atom of a terminal methyl group is substituted with a trifluoromethyl group 19 (a part or all of the hydrogen atoms are substituted with one or both of a fluorine atom and a fluorocarbon group)
  • a fluorine-containing organic thin film 11 including an example of a film substance having a fluorine-containing hydrocarbon group is formed.
  • the fluorine-containing organic thin film 11 is a monomolecular film made of a film substance that is covalently bonded (an example of a chemical bond) to the outer surface of the substrate 12.
  • the face plate 10 for a display device is produced by bringing a treatment liquid containing a film compound having a hydrocarbon group into contact with the outer surface of the substrate 12 and reacting the film compound with the surface functional group of the substrate 12.
  • Step C for forming an organic thin film (an example of a substance having a hydrocarbon group present so as to cover at least a part of the outer surface of the base material 12) 18 containing the obtained film material, and a fluorocarbon group
  • a part or all of the hydrogen atoms in the hydrocarbon groups contained in the organic thin film 18 are fluorine atoms by subjecting the outer surface of the base material 12 on which the organic thin film 18 has been formed in a gas atmosphere of a compound containing And a step A of forming the fluorine-containing organic thin film 11 substituted with one or both of fluorocarbon groups.
  • step B you may roughen the outer surface of the base material 12 so that it may have the surface roughness and the magnitude
  • the order in which step B is performed may be before or after step C. That is, the steps A to C include (1) Step B ⁇ Step C ⁇ Step A (the organic thin film 18 is formed after roughening the outer surface of the substrate 12), and (2) Step C ⁇ Step B. ⁇ You may carry out in any order of step A (roughening the outer surface of the substrate 12 on which the organic thin film 18 is formed).
  • the order of each step is the same for the manufacturing methods of the display device face plates 20 and 30 according to the second and third embodiments described later.
  • step B As a method for roughening the surface on the outer side of the substrate 12, the surface is roughened in advance using any known method such as sandblasting, mechanical polishing, and chemical treatment with chromic acid mixture, phosphoric acid, alkali, or the like.
  • the low pressure plasma treatment can be performed in an atmosphere containing oxygen gas and chlorine gas. Plasma treatment conditions may be adjusted as appropriate so that a surface having a desired surface roughness and unevenness can be obtained.
  • the apparatus and processing conditions used for the low-pressure plasma processing are the same as in the case of step A, and thus detailed description thereof is omitted.
  • the treatment liquid used for forming the organic thin film 18 in the step C is prepared by dispersing the film compound in a solvent.
  • “dispersion” means a state in which any one of a uniform solution, a suspension, and an emulsion is formed.
  • the membrane compound that can be used include any compound that contains a chain-like lipophilic functional group and can form a film made of the membrane substance 2 on the outer surface of the substrate 12.
  • Preferred surface functional groups include alkoxysilyl groups that react relatively rapidly with hydroxyl groups present on the surface of many materials at room temperature.
  • the lipophilic functional group is preferably a linear long-chain alkyl group having self-organization.
  • a silane compound represented by the following general formula (X) can be used as the film compound.
  • Z represents a substituent containing any one of an alkyl group having 25 or less carbon atoms, an aryl group, a vinyl group, and a silicone group
  • X represents a hydrogen atom or a substituent containing any one of an alkyl group having less carbon atoms than Z, an aryl group, a vinyl group, and a silicone group
  • Y represents a halogen atom or an alkoxyl group
  • p represents 0, 1 or 2.
  • a preferred film compound is, for example, an alkoxysilane compound represented by any of the following formulas (XI) to (XV).
  • m and n each independently represent an integer of 0 or more and 24 or less (where m ⁇ n), and A is an alkyl group, more preferably a methyl group or an ethyl group. Represents.
  • the membrane compound include compounds shown in the following (1) to (19).
  • the concentration of the membrane compound contained in the treatment liquid is preferably 0.1 mmol / L to 10 mmol / L.
  • concentration of the membrane compound is less than 0.1 mmol / L, it is difficult to form a uniform organic thin film 18, and when the concentration exceeds 10 mmol / L, gelation is likely to occur and storage stability is reduced. To do.
  • any liquid that can dissolve or stably disperse the membrane compound can be used. Since the membrane compound has high hydrophobicity, an organic solvent is used to dissolve it. However, it is preferable to use water from the viewpoint of reducing the environmental load during the manufacturing of the face plate 10 for a display device. However, it is difficult to dissolve or stably disperse the membrane compound only by using water as it is. Therefore, when water is used as a solvent, the treatment liquid contains a surfactant and / or alcohol in order to solubilize or stably disperse the membrane compound in a solvent mainly composed of water.
  • tetraalkylammonium salt which is a cationic surfactant, more specifically, a tetraalkylammonium represented by the following formula (VIII): Salt.
  • R 1 represents an alkyl group having 1 to 20 carbon atoms, more preferably 12 to 16 carbon atoms
  • R 2 , R 3 , and R 4 represent a methyl group or an ethyl group, more preferably a methyl group
  • X represents a halogen.
  • a particularly preferred tetraalkylammonium salt is hexadecyltrimethylammonium bromide CH 3 (CH 2 ) 15 N (CH 3 ) 3 Br.
  • the concentration of the tetraalkylammonium salt is preferably 0.1 mmol / L to 10 mmol / L, more preferably 0.5 mmol / L to 5 mmol / L.
  • concentration is less than 0.1 mmol / L, the membrane compound cannot be sufficiently solubilized, and when it exceeds 10 mmol / L, the pH of the treatment liquid falls outside the optimum range described later or bubbles are generated. There is a fear.
  • any alcohol that can uniformly disperse the membrane compound in water can be used.
  • ethanol, propanol (1-propanol and 2) that are compatible with water and have high volatility are used.
  • -Propanol butanol (1-butanol, 2-butanol, 2-methyl-2-propanol) and ethylene glycol are preferred.
  • These alcohols may be used alone, or any two or more kinds may be mixed and used at an arbitrary ratio.
  • the mixing ratio of water and alcohol is not particularly limited, but the volume ratio of water and alcohol is preferably 80:20 to 95: 5.
  • An acid or a base may be added to the treatment liquid in order to adjust the pH.
  • a preferred pH range is 5-12. When the pH is less than 5, the organic thin film 18 having a high density is not formed, and the storage stability of the treatment liquid is lowered. Moreover, when pH exceeds 12, there exists a possibility that the formed organic thin film 18 may be destroyed by the alkali hydrolysis of a siloxane bond.
  • the treatment liquid is prepared by a method having a step of mixing and dispersing a membrane compound and a solvent (preferably water containing a surfactant and / or alcohol). First, those components weighed so as to have a desired composition ratio are mixed. The order of adding each component is not particularly limited. Next, when the mixture is treated using an ultrasonic disperser or a homogenizer, a part of the alkoxysilyl group is converted into a silanol group by hydrolysis, and a uniform and transparent treatment liquid is obtained.
  • the treatment temperature and time are not limited, but when an ultrasonic disperser is used, for example, the treatment is performed at room temperature for 10 minutes.
  • Formation of the organic thin film 18 using the treatment liquid obtained as described above can be performed using, for example, the following method.
  • a treatment liquid is applied to the outer surface of the substrate 12 and left to stand until most of the solvent is volatilized (for example, in the atmosphere at room temperature for 1 hour).
  • the film compound is bonded to the outer surface of the base material 12 through a covalent bond (siloxane bond) formed by a condensation reaction between a hydroxyl group (not shown) on the outer surface of the base material 12 and an alkoxysilyl group.
  • a (monomolecular film) 18 is formed (see FIG. 3).
  • an extra film compound may remain on the outer surface of the substrate 12, but in such a case, it may be removed by washing with a solvent. If there is a small amount of excess membrane compound, there is a problem that even if it is left unwashed, a condensation reaction occurs due to silanol groups generated by hydrolysis of alkoxyl groups by moisture in the air, resulting in the formation of membrane materials. There is no.
  • a condensation catalyst may be added.
  • metal salts such as carboxylic acid metal salts, carboxylic acid ester metal salts, carboxylic acid metal salt polymers, carboxylic acid metal salt chelates, titanate esters and titanate ester chelates can be used.
  • the addition amount of the condensation catalyst is preferably 0.2 to 5% by mass of the alkoxysilane compound, more preferably 0.5 to 1% by mass.
  • carboxylic acid metal salts include stannous acetate, dibutyltin dilaurate, dibutyltin dioctate, dibutyltin diacetate, dioctyltin dilaurate, dioctyltin dioctate, dioctyltin diacetate, stannous dioctanoate, naphthenic acid Lead, cobalt naphthenate, iron 2-ethylhexenoate.
  • carboxylic acid ester metal salt examples include dioctyltin bisoctylthioglycolate ester salt and dioctyltin maleate ester salt.
  • carboxylic acid metal salt polymer examples include dibutyltin maleate polymer and dimethyltin mercaptopropionate polymer.
  • carboxylic acid metal salt chelate examples include dibutyltin bisacetylacetate and dioctyltin bisacetyllaurate.
  • titanate ester examples include tetrabutyl titanate and tetranonyl titanate.
  • a specific example of a titanate chelate is bis (acetylacetonyl) di-propyl titanate.
  • reaction time is further shortened. it can.
  • H3 of Japan Epoxy Resin Co. which is a ketimine compound, can be used instead of dibutyltin diacetate.
  • condensation catalyst a mixture of H3 and dibutyltin diacetate manufactured by Japan Epoxy Resin Co., Ltd. (mixing ratio is 1: 1) may be used.
  • the ketimine compound that can be used here is not particularly limited.
  • organic acid which can be used, For example, a formic acid, an acetic acid, propionic acid, a butyric acid, malonic acid etc. are mentioned.
  • a halosilane compound having a halosilyl group instead of the alkoxysilyl group may be used as the film compound.
  • a silanol condensation catalyst and a co-catalyst are not required, but halosilyl groups react quickly with water (including moisture in the air) and alcohol, so that a solvent containing water or alcohol cannot be used as a solvent.
  • the application of the treatment liquid to the outer surface of the substrate 12 and the reaction must be performed under dry conditions (relative humidity of 45% or less).
  • the fluorine-containing organic thin film 21 includes polysiloxane molecules 24 formed from alkoxysilane and / or alkoxypolysiloxane. More specifically, as shown in FIG. 4, the polysiloxane molecule 24 is fixed to the outer surface of the substrate 22 through bonding with hydroxyl groups (an example of surface functional groups) on the outer surface of the substrate 22.
  • the membrane material is formed by a reaction between an alkoxysilyl group at the end of the membrane compound (an example of a reactive group) and a hydroxyl group (an example of a surface functional group) on the outer surface of the substrate 22 or a silanol group on the polysiloxane molecule 24. It is fixed to the polysiloxane molecules 24 that coat the outer surface of the base material 22 and the outer surface of the base material 22 in a mesh form through the formed bond (Si—O— bond).
  • the face plate 20 for a display device is brought into contact with a film compound having a hydrocarbon group on the outer surface of a base material 22 and a treatment liquid in which alkoxysilane and / or alkoxypolysiloxane are mixed and dispersed in a solvent.
  • Step C see FIG.
  • a method for manufacturing the display device face plate 20 will be described.
  • the material that can be used as the base material 22 is the same as that of the base material 12 that can be used for manufacturing the face plate 10 for a display device according to the first embodiment, detailed description thereof is omitted. To do.
  • the treatment liquid used in Step C is prepared by mixing and dispersing the film compound and alkoxysilane and / or alkoxypolysiloxane in a solvent.
  • Specific examples of the compound that can be used as the film compound, the solvent and the surfactant that can be used are the same as those in the method of manufacturing the face plate 10 for a display device, and thus detailed description thereof is omitted.
  • the treatment liquid used for manufacturing the display device face plate 20 contains alkoxysilane and / or alkoxypolysiloxane in order to improve the durability of the obtained display device face plate 20.
  • the alkoxysilane is a compound represented by the formula SiH x (OA) 4-x (formula (VI)), and the alkoxypolysiloxane is represented by the formula (AO) 3 Si (OSi (OA) 2 ) n OSi (OA). 3 It is a compound represented by (Formula (VII)).
  • x is 0, 1, or 2
  • A represents an alkyl group, preferably a methyl group or an ethyl group
  • n is 0, 1, or 2.
  • alkoxysilane represented by the above formula (VI) and the alkoxypolysiloxane represented by the above formula (VII) include the following compounds (21) to (28).
  • SiH 2 (OC 2 H 5 ) 2 (28) (H 5 C 2 O) 3 SiOSi (OC 2 H 5) 3
  • the composition ratio ratio of the number of silicon atoms of the film compound and alkoxysilane and / or alkoxypolysiloxane. Is preferably from 1:10 to 1: 0, more preferably from 1: 3 to 3: 1.
  • the total concentration of the membrane compound and alkoxysilane and / or alkoxypolysiloxane is preferably 0.1 mmol / L to 50 mmol / L, more preferably 0.1 mmol / L to 10 mmol / L.
  • the total concentration is less than 0.1 mmol / L, it is difficult to form a uniform lipophilic film 17, and when the total concentration exceeds 50 mmol / L, gelation or the like is likely to occur, and storage stability is improved. descend.
  • the total concentration is 10 mmol / L to 0.1 mmol / L, gelation of the treatment liquid can be prevented, and the lifetime can be secured up to about 1 month.
  • the treatment liquid used for the production of the display device face plate 20 is a mixture comprising a film compound and alkoxysilane and / or alkoxypolysiloxane and a solvent (preferably water containing a surfactant and / or alcohol).
  • a solvent preferably water containing a surfactant and / or alcohol.
  • the film is an organic thin film 26 including a film 27a of polysiloxane molecules (24a) having unreacted silanol groups (25).
  • heat treatment may be performed in order to improve the water / oil repellency / antifouling property and the durability of the finally obtained fluorine-containing organic thin film 21.
  • the heat treatment is preferably performed at 120 ° C.
  • the hydrogen in the hydrocarbon groups contained in the organic thin film 28 is obtained by subjecting the outer surface of the base material 22 on which the organic thin film 28 is formed in the gas atmosphere of the compound containing a fluorocarbon group in the process A to low pressure plasma treatment.
  • a fluorine-containing organic thin film 21 in which some or all of the atoms are substituted with one or both of fluorine atoms and fluorocarbon groups is formed to obtain a face plate 20 for a display device. Since this is the same as the manufacturing method of the face plate 10 for a display device according to the first embodiment, detailed description is omitted. Similarly, detailed description of the process B is also omitted.
  • the display device face plate 20 thus obtained can be used in the same manner as the display device face plate 10 according to the first embodiment.
  • the fluorine-containing organic thin film 31 is a polysiloxane molecule (34) fixed on the outer surface of the substrate 32 through bonding with a hydroxyl group (an example of a surface functional group) of the substrate 32.
  • a film having a two-layer structure comprising a film of an example of a film substance having a fluorine-containing hydrocarbon group in which part or all of hydrogen atoms are substituted with either or both of a fluorine atom and a fluorocarbon group.
  • the membrane material is composed of a bond (Si—O— bond) formed by a reaction between an alkoxysilyl group (an example of a reactive group) at the end of the membrane compound and a silanol group (Si—OH) (not shown) on the polysiloxane molecule 34. ) To the coating 37 of polysiloxane molecules (34) covering the outer surface of the substrate 32 (see FIG. 7).
  • the display device face plate 30 first contacts a treatment liquid containing alkoxysilane and / or alkoxypolysiloxane with the outer surface of the substrate 32, and coats the outer surface of the substrate 32 with polysiloxane molecules. 37, and then a treatment liquid containing a film compound is brought into contact with the surface of the substrate 32 on which the polysiloxane molecule film 26 is formed on the outer surface to form a film of the film material on the polysiloxane molecule film 37.
  • the step A for obtaining the base material 32 on which the organic thin film 38 is formed and the outer surface of the base material 32 on which the organic thin film 38 is formed in a gas atmosphere of a compound containing a fluorocarbon group are subjected to low-pressure plasma treatment.
  • a face plate 40 for a display device will be described with reference to FIGS. 8 (a) and 8 (b).
  • a fluorine-containing organic polymer (of a substance having a fluorine-containing functional group) is formed so as to cover at least a part of the outer surface of the substrate 42.
  • An example 41 exists.
  • the base material 42 used for manufacturing the water / oil repellent / antifouling member 40 is covered with a hydrocarbon group 43 on the outer surface.
  • the hydrocarbon group covering the outer surface of the base material 42 before the low pressure plasma treatment is substituted with a trifluoromethyl group 44 which is an example of a fluorocarbon group.
  • the water / oil repellent / antifouling member 40 comprises a step A for subjecting the base material 42 to low-pressure plasma treatment in a gas atmosphere of a compound containing a fluorocarbon group, and an outer side of the base material 42 before the step A if necessary. And a step B of roughening the surface so as to have the surface roughness and the size of the irregularities within the above ranges.
  • a fluorocarbon radical such as a fluorine radical ( ⁇ F) or a trifluoromethyl radical ( ⁇ CF 3 ) is generated. These radicals substitute the hydrogen atom of the hydrocarbon group on the outer surface of the acrylic base material 42 with the trifluoromethyl group 43 (FIG. 8B).
  • the surface of the compound containing a fluorocarbon group is directly roughened so as to have a predetermined surface roughness and unevenness by the step B.
  • the display device face plate 40 is obtained by performing low-pressure plasma treatment in a gas atmosphere (step A).
  • the method for manufacturing a display device face plate according to the present embodiment is applied to an article made of an inorganic material or a member thereof. When doing so, the process C is implemented and the film which contains an organic polymer as the base material 42 is formed in the outer surface.
  • the organic polymer used to form the coating has a hydrocarbon group in the main chain and side chain, and in step A, part or all of the hydrogen atoms are fluorine atoms and Any organic polymer can be used as long as it can be substituted with a fluorocarbon group.
  • the film may be formed by spray coating using a solution containing an organic polymer, spin coating, dip coating, cast method, or the like, and a polymerization reaction is caused on the surface of the inorganic material by plasma polymerization or the like. To produce an organic polymer.
  • the face plate 10 for a display device For the roughening method of the outer surface of the base material 42 used in the step B and the order of performing the steps A to C, the face plate 10 for a display device according to the first to third embodiments described above, Since it is the same as the manufacturing method of 20 and 30, detailed description is abbreviate
  • Examples of the display device using the display device faceplate 1 obtained as described above include CRT (cathode ray tube, cathode ray tube), liquid crystal display device, plasma display, organic and inorganic EL display devices, and the like.
  • Articles using the display device incorporating the face plate 1 include a mobile phone, an electronic desk calculator, an electronic computer or a display for an electronic computer, a PDA (personal digital assistant), a portable game machine, a portable GPS terminal, a car navigation system, Examples include a television receiver, a portable DVD player, a digital camera, a video recording device, a cash dispenser (CD) device, an automatic teller machine (ATM), and an automatic ticket machine.
  • the molecular composition ratio means a molar ratio unless otherwise specified.
  • % means weight%.
  • Example 1 Octadecyltrimethoxysilane CH 3 (CH 2 ) 17 Si (OCH 3 ) 3 (film compound) and tetramethoxysilane Si (OCH 3 ) 4 are weighed to a molar ratio of 3: 1, and 0.1% in ethanol.
  • a well-dried glass faceplate substrate is prepared as an inorganic substrate, and the treatment liquid prepared above is applied to the outer surface in the air (relative humidity 57% to 70%), and further in the air. It was left for about 1 hour. During this time, most of the ethanol in the treatment solution evaporates into the air, and the entire surface is chemically bonded to the surface by dehydration reaction with silanol groups (Si-OH) generated by hydrolysis of alkoxysilyl groups.
  • Si-OH silanol groups
  • the unreacted excess octadecyltrimethoxysilane and tetramethoxysilane are washed away with a water-ethanol mixed solvent (this step is not always necessary if the coating amount and the liquid concentration are properly adjusted).
  • the polysiloxane molecule having a thickness of about 5 nm and the octadecylsilyl group immobilized on the outer surface of the face plate or on the polysiloxane molecule were obtained.
  • a film consisting of the above can be formed in a state of being chemically bonded to the outer surface of the faceplate substrate (FIG. 6).
  • Example 2 A face plate was produced under the same conditions as in Example 1 except that the treatment liquid did not contain tetramethoxysilane.
  • the fluorine-containing organic thin film formed on the outer surface was a monomolecular film containing no polysiloxane molecules.
  • the water droplet contact angle the same results as in Example 1 were obtained.
  • the wear resistance of the fluorine-containing organic thin film was inferior to that obtained in Example 1.
  • Example 3 First, under the conditions shown in Table 3, the surface of the glass faceplate substrate was subjected to low-pressure plasma treatment, and the surface was roughened.
  • Table 4 shows the measurement results of the water droplet contact angle of the face plate thus obtained.
  • the water droplet contact angle on the obtained face plate is greatly increased by performing the plasma surface roughening treatment. Further, in the face plate obtained in this example, a decrease in light transmittance, generation of interference fringes, haze, and the like were not observed.
  • Example 4 Production of a water / oil repellent / antifouling member based on a transparent acrylic resin substrate First, after the transparent acrylic resin substrate as a substrate was washed with ethanol, under the conditions shown in Table 5 below, Low-pressure plasma treatment (O 2 plasma treatment) in an oxygen gas atmosphere was performed. Next, plasma treatment was performed in a tetrafluoromethane (CF 4 ) atmosphere containing oxygen under the conditions shown in Table 6.
  • O 2 plasma treatment oxygen gas atmosphere
  • the water droplet contact angle of the water / oil repellent / antifouling member thus obtained was measured. Measurements were made at five different points (IV) on the same sample. The measurement results are as shown in Table 7 below.
  • the water droplet contact angle of the acrylic resin substrate before treatment was 75.0 degrees.
  • the O 2 plasma treatment has an action of cleaning the surface of the acrylic resin substrate and an action of roughening the surface of the member, and the surface roughness can be controlled by arbitrarily controlling the power of the high frequency power source and the treatment time. Can be controlled within a range of several nanometers to several hundred microns, and the final water droplet contact angle can be controlled to about 165 to 100 degrees. In particular, if the water droplet contact angle was controlled to be 150 degrees or more, a high-performance oil-repellent and antifouling member with extremely low surface energy could be produced. Further, when the surface roughness was set to be equal to or less than the wavelength of visible light (for example, 400 nm), the transparency of the acrylic resin substrate used as the base material was not impaired.
  • the wavelength of visible light for example, 400 nm
  • the materials that can be used are of any material that contains hydrocarbon groups, and in addition to artificial materials such as synthetic resin, synthetic leather, and synthetic fibers, it also applies to natural materials such as woody materials, paper, and wool. I was able to handle it.
  • the article to which the present invention can be applied may be in any form as long as it is a display device. Specifically, it can be used for a mobile phone, an electronic computer, a PDA, a GPS, a television receiver, a cash dispenser (CD) device, a display device installed in an ATM device, or a member used for them. . Furthermore, the present invention can be applied to optical lenses and casings used in these devices.

Abstract

A face plate for display devices which has high durability, can be produced at a low cost, is highly safe for the human body and the environment, and is less apt to suffer adhesion of fingerprints or the like thereto; a process for producing the face plate; and a display device and an article each made using the face plate and the process. The face plate has a thin fluorinated organic film (11) obtained by applying a hydrocarbon-group-containing transparent substance so as to cover at least some of the surface of a face plate (10) which is to be located on the outer side and subjecting the coating to a low-pressure plasma treatment in an atmosphere of a fluorocarbon-group-containing gas to thereby replace some or all of the hydrocarbon groups with fluorocarbon groups and/or fluorine atoms (19).

Description

表示装置用フェースプレートとその製造方法並びにそれらを用いた表示装置及び物品Display device face plate, manufacturing method thereof, display device using the same, and article
本発明は、表示装置用フェースプレートとその製造方法並びにそれらを用いた表示装置及び物品に関し、更に詳しくは、耐久性が高く、安価に製造することができ、人体及び環境に対する安全性が高く、指紋等の付着が少ない光学レンズや筐体を含めた表示装置用フェースプレートとその製造方法、並びにそれらを用いた表示装置及び物品に関する。 The present invention relates to a face plate for a display device, a manufacturing method thereof, and a display device and an article using the same, and more specifically, has high durability, can be manufactured at low cost, and is highly safe for human bodies and the environment. The present invention relates to a face plate for a display device including an optical lens and a housing with less adhesion of fingerprints, a manufacturing method thereof, a display device and an article using the same.
近年、生活レベルの向上及び衛生意識の高揚に伴い、身の回りの物品の汚れ対策が要望されている。各種情報機器や操作端末に用いられている光学レンズや筐体を含めた表示装置についても、指紋等の付着を少なくすること、並びに視認性の向上、メンテナンスコストの低減、特にタッチパネルにおける公衆衛生上の要請等の理由から防汚性の向上が求められている。 In recent years, with the improvement of living standards and the enhancement of hygiene awareness, countermeasures against contamination of articles around us have been demanded. For display devices including optical lenses and housings used in various information devices and operation terminals, the adhesion of fingerprints is reduced, visibility is improved, maintenance costs are reduced, especially for public health in touch panels. Improvement of antifouling property is required for reasons such as
部材の表面の汚れを防止する手段として、部材の表面に表面エネルギーが小さな被膜を形成する方法や部材の表面そのものの表面エネルギーを小さくする表面処理方法があるが、それらの中でも、加工時の環境負荷が少ない技術、また、製品を廃棄する際の、環境破壊が少ない製造技術が求められている。 There are two methods for preventing contamination of the surface of the member: a method of forming a film having a small surface energy on the surface of the member and a surface treatment method of reducing the surface energy of the surface of the member itself. There is a demand for technology with low load and manufacturing technology with less environmental damage when products are discarded.
例えば、特許文献1には、高耐久性の撥水撥油防汚被膜が形成されたガラス板であって、前記撥水撥油防汚性被膜が、少なくともフッ化炭素基と炭化水素基とシリル基を主成分とする物質(例えば、パーフルオロアルキルアルコキシシラン)とシロキサン基を主成分とする物質を含む複合膜を少なくとも1層含んでいることを特徴とする撥水撥油防汚性ガラス板及びその製造方法が開示されている。 For example, Patent Document 1 discloses a glass plate on which a highly durable water / oil repellent / antifouling coating is formed, the water / oil repellent / antifouling coating comprising at least a fluorocarbon group and a hydrocarbon group. A water / oil repellent / antifouling glass characterized in that it comprises at least one composite film containing a substance mainly containing a silyl group (for example, perfluoroalkylalkoxysilane) and a substance mainly containing a siloxane group. A plate and its manufacturing method are disclosed.
また、特許文献2には、フッ素ガスを用いて部材の表面そのものを防汚処理する技術が開示されている。 Patent Document 2 discloses a technique for antifouling the surface of a member using fluorine gas.
特開2005-206447号公報JP 2005-206447 A 特開2005-290118号公報JP 2005-290118 A
しかしながら、特許文献1に記載の撥水撥油防汚性ガラス板の製造方法では、高価なフッ化炭素系のシラン化合物を用いるため、製造コストが高いという欠点がある。
一方、特許文献2に記載の方法では、防汚処理時に溶媒を必要としないが、処理により透明度が劣化するという問題や、反応に長時間(数時間)を必要とするので効率が悪いという問題を有している。
However, the method for producing a water- and oil-repellent and antifouling glass plate described in Patent Document 1 has a drawback that the production cost is high because an expensive fluorocarbon silane compound is used.
On the other hand, the method described in Patent Document 2 does not require a solvent during the antifouling treatment, but has a problem that transparency is deteriorated due to the treatment, and a long time (several hours) is required for the reaction, so that the efficiency is poor. have.
本発明はかかる事情に鑑みてなされたもので、加工時や廃棄時に環境負荷が少なく、かつ安価に製造できる指紋等の付着が少ない光学レンズや筐体を含めた表示装置用フェースプレートとその製造方法並びにそれらを用いた表示装置及び物品を提供することを目的とする。 SUMMARY OF THE INVENTION The present invention has been made in view of such circumstances, and a face plate for a display device including an optical lens and a housing that has a low environmental impact at the time of processing or disposal, and that can be manufactured inexpensively and has a low adhesion of fingerprints and the like, and its manufacture. It is an object of the present invention to provide a method and a display device and an article using them.
前記目的に沿う本発明の第1の態様は、炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素官能基を有する透明な物質が、外側となる側の表面に露出した透明な基材の少なくとも一部を覆うように存在することを特徴とする表示装置用フェースプレートを提供することにより上記課題を解決するものである。
なお、本発明において「表示装置」には、表示機能と操作機能を併せ持つ機器操作用のタッチパネル及び携帯情報端末も含まれる。さらにまた、「物品」には、携帯電話、電子計算機、PDA(携帯情報端末)、GPS端末、テレビジョン受像器、キャッシュディスペンサー(CD)装置、現金自動預け払い機(ATM)等が含まれる。
According to the first aspect of the present invention that meets the above-mentioned object, a transparent functional group having a fluorine-containing functional group in which part or all of the hydrogen atoms in the hydrocarbon group are substituted with either or both of a fluorine atom and a fluorocarbon group. The present invention solves the above-mentioned problems by providing a face plate for a display device, wherein a non-existent substance is present so as to cover at least a part of a transparent substrate exposed on the surface on the outer side. .
In the present invention, the “display device” includes a device operation touch panel and a portable information terminal having both a display function and an operation function. Furthermore, the “article” includes a mobile phone, an electronic computer, a PDA (personal digital assistant), a GPS terminal, a television receiver, a cash dispenser (CD) device, an automatic teller machine (ATM), and the like.
なお、「フェースプレート」とは、表示装置の表示面上の最も外側を覆う透明な部材をいい、表示面の保護及び入力機能を兼ね備えたタッチパネル、情報入力部材である携帯電話のカメラレンズ、入力部と筐体を兼ねた携帯情報端末のタッチパネル部等も本発明における「フェースプレート」に含まれる。また、「外側となる側の表面」とは、表示装置にフェースプレートとして組み込んだ際に外側となる表面をいい、以下「外側表面」と略称する場合がある。 The “face plate” is a transparent member that covers the outermost surface of the display surface of the display device. The touch panel has a display surface protection and input function, a camera lens of a mobile phone that is an information input member, and an input. A touch panel portion of a portable information terminal that also serves as a housing and a housing is also included in the “face plate” in the present invention. The “outside surface” refers to a surface that becomes the outside when the display device is assembled as a face plate, and may be abbreviated as “outside surface” hereinafter.
携帯電話に組み込まれているカメラレンズや筐体を含めた表示装置用フェースプレートの外側表面の少なくとも一部を、炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素官能基を有する物質で覆うことにより、基材の表面エネルギーを低下させ、高い撥水撥油性を付与できる。 At least a part of the outer surface of the face plate for a display device including a camera lens and a housing incorporated in a cellular phone has a part or all of the hydrogen atoms in the hydrocarbon group are fluorine atoms and fluorocarbon groups. By covering with a substance having a fluorine-containing functional group substituted with either or both, the surface energy of the substrate can be reduced, and high water and oil repellency can be imparted.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素官能基が、前記基材の前記外側となる側の表面の少なくとも一部を覆うように存在する炭化水素基を有する物質を、フッ化炭素基を含む化合物のガス雰囲気中で低圧プラズマ処理することにより得られることが好ましい。
このようにして撥水撥油防汚性を有する含フッ素官能基を含む物質を得ることにより、高価なフッ化炭素系の膜化合物を使用した場合よりも低コストで撥水撥油防汚性を有する表示装置用フェースプレート等を製造できる。
The display device faceplate according to the first aspect of the present invention, wherein the fluorine-containing functional group has a hydrocarbon group present so as to cover at least a part of the outer surface of the substrate. Is preferably obtained by low-pressure plasma treatment in a gas atmosphere of a compound containing a fluorocarbon group.
In this way, by obtaining a substance containing a fluorine-containing functional group having water / oil / oil repellency / antifouling property, water / oil / oil / oil repellency / antifouling property can be obtained at a lower cost than when an expensive fluorocarbon film compound is used. A face plate for a display device having the above can be manufactured.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素官能基を有する物質が、直鎖状の前記含フッ素官能基を有する膜物質を含み、前記基材の前記外側となる側の表面に化学結合した有機薄膜を形成していてもよい。
基材の外側となる側の表面の少なくとも一部を覆うように存在している含フッ素官能基を有する物質が、ナノメートルレベルの膜厚を有する有機薄膜を形成しているため、基材の光学的特性等を損なうことなく撥水撥油性を付与できる。
In the face plate for a display device according to the first aspect of the present invention, the substance having a fluorine-containing functional group includes a linear film substance having the fluorine-containing functional group, which is the outside of the substrate. An organic thin film chemically bonded to the surface on the side may be formed.
Since the substance having a fluorine-containing functional group present so as to cover at least a part of the surface on the outer side of the base material forms an organic thin film having a nanometer level film thickness, Water and oil repellency can be imparted without impairing optical properties and the like.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素官能基が、炭化水素基、エステル基を有する炭化水素基、及びエーテル基を有する炭化水素基のいずれかにおいて任意の1又は複数の水素原子がフッ素原子又はフッ化炭素基のいずれかで置換された官能基であってもよい。 In the face plate for a display device according to the first aspect of the present invention, the fluorine-containing functional group is any one of a hydrocarbon group, a hydrocarbon group having an ester group, and a hydrocarbon group having an ether group. Or the functional group by which the several hydrogen atom was substituted by either a fluorine atom or a fluorocarbon group may be sufficient.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素官能基が、下記の式(I)~(V)で表される官能基中の任意の1又は複数の水素原子がフッ素原子又はフッ化炭素基のいずれかで置換された官能基であってもよい。 In the display device faceplate according to the first aspect of the present invention, the fluorine-containing functional group is any one or more hydrogen atoms in the functional groups represented by the following formulas (I) to (V): It may be a functional group substituted with either a fluorine atom or a fluorocarbon group.
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
なお、式(I)~(V)において、m及びnは、それぞれ独立して0以上24以下の整数を表し、m≧nである。 In the formulas (I) to (V), m and n each independently represent an integer of 0 or more and 24 or less, and m ≧ n.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素有機薄膜が、前記基材の前記外側となる側の表面に化学結合した前記膜物質の単分子膜であってもよい。
含フッ素有機薄膜が単分子膜であると、基材の外観(色調、光沢等)及び光学的特性を損なうことがなく、光学材料や各種装置の筐体等にも好適に適用できる。また、含フッ素有機薄膜が基材の外側となる側の表面に化学結合しているため、耐久性にも優れ、長期間にわたって撥水撥油防汚性を発揮できる。
In the face plate for a display device according to the first aspect of the present invention, the fluorine-containing organic thin film may be a monomolecular film of the film substance chemically bonded to the outer surface of the substrate. .
When the fluorine-containing organic thin film is a monomolecular film, the appearance (color tone, gloss, etc.) and optical properties of the base material are not impaired, and it can be suitably applied to optical materials and housings of various devices. Moreover, since the fluorine-containing organic thin film is chemically bonded to the surface on the outer side of the base material, it is excellent in durability and can exhibit water / oil / oil repellency / antifouling properties over a long period of time.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素有機薄膜が、アルコキシシラン及び/又はアルコキシポリシロキサンから形成されたポリシロキサン分子を含んでいてもよい。
また、この場合において、前記含フッ素炭化水素基を有する膜物質が、前記基材の前記外側となる側の表面に結合固定された前記ポリシロキサン分子の被膜を介して前記基材の該外側となる側の表面に結合固定されていてもよい。
In the display device faceplate according to the first aspect of the present invention, the fluorine-containing organic thin film may contain polysiloxane molecules formed of alkoxysilane and / or alkoxypolysiloxane.
Further, in this case, the film substance having the fluorine-containing hydrocarbon group is bonded to the outside of the base material through a film of the polysiloxane molecule bonded and fixed to the surface on the outside side of the base material. It may be bonded and fixed to the surface on the other side.
或いは、この場合において、前記ポリシロキサン分子の被膜がアルコキシシリル基と前記基材の前記外側となる側の表面に存在する表面官能基との反応により形成された結合を介して前記基材の該外側となる側の表面に固定され、前記含フッ素炭化水素基を有する膜物質のうち一部は前記基材の前記外側となる側の表面に直接結合し、残りは前記ポリシロキサン分子の被膜を介して前記基材の該外側となる側の表面に結合固定されていてもよい。
ポリシロキサン分子の被膜を形成することにより、最表面の膜物質の密度を向上でき、耐久性及び撥水撥油防汚性を向上できる。なお、前記ポリシロキサン分子の被膜は、ナノメートルレベルの膜厚なので熱伝導性を損なうことがない。そのため、放熱部材等にも好適に適用できる。
Alternatively, in this case, the polysiloxane molecule coating is formed on the base material via a bond formed by a reaction between an alkoxysilyl group and a surface functional group present on the outer surface of the base material. A part of the film substance having the fluorine-containing hydrocarbon group fixed to the outer surface is directly bonded to the outer surface of the substrate, and the rest is coated with the polysiloxane molecule. It may be bonded and fixed to the outer surface of the substrate.
By forming a film of polysiloxane molecules, the density of the film material on the outermost surface can be improved, and durability and water / oil repellent / antifouling properties can be improved. Note that the polysiloxane molecule coating film has a nanometer-level film thickness, so that the thermal conductivity is not impaired. Therefore, it can be suitably applied to a heat radiating member.
含フッ素有機薄膜がポリシロキサン分子を含む本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記ポリシロキサン分子が、下記の式(VI)で表されるアルコキシシラン及び/又は式(VII)で表されるアルコキシポリシロキサンの縮合反応により形成されるものであってもよい。
 SiH(OA)4-x                (VI)
 (AO)Si(OSi(OA)OSi(OA) (VII)
なお、式(VI)及び(VII)において、
xは0、1、又は2であり、
Aはアルキル基を表し、
nは0、1、又は2である。
In the face plate for a display device according to the first aspect of the present invention, in which the fluorine-containing organic thin film contains a polysiloxane molecule, the polysiloxane molecule is an alkoxysilane and / or a formula (VII) represented by the following formula (VI): It may be formed by a condensation reaction of an alkoxypolysiloxane represented by:
SiH x (OA) 4-x (VI)
(AO) 3 Si (OSi (OA) 2 ) n OSi (OA) 3 (VII)
In the formulas (VI) and (VII),
x is 0, 1, or 2;
A represents an alkyl group,
n is 0, 1, or 2.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記含フッ素官能基を有する物質が前記含フッ素官能基を有する含フッ素有機高分子であってもよい。
基材の外側となる側の表面の少なくとも一部を覆うように含フッ素有機高分子が存在しているため、撥水撥油性を併せて具備し、外側表面への汚れの付着を防止できる。
In the display device faceplate according to the first aspect of the present invention, the substance having a fluorine-containing functional group may be a fluorine-containing organic polymer having the fluorine-containing functional group.
Since the fluorine-containing organic polymer is present so as to cover at least a part of the surface on the outer side of the substrate, it has both water and oil repellency and can prevent the adhesion of dirt to the outer surface.
本発明の第1の態様に係る表示装置用フェースプレートにおいて、前記外側となる側の表面の表面粗さが10nm以上400nm以下であることが好ましい。
表示装置用フェースプレートの外側表面の表面粗さが可視光の最短波長である400nm以下であれば、透明な基材を用いた場合であっても、表示装置用フェースプレートの透明度及び光学的特性を損なうことなく高い撥水撥油防汚性を付与できる。
In the face plate for a display device according to the first aspect of the present invention, it is preferable that a surface roughness of the outer side surface is 10 nm or more and 400 nm or less.
If the surface roughness of the outer surface of the face plate for a display device is 400 nm or less, which is the shortest wavelength of visible light, the transparency and optical characteristics of the face plate for a display device are obtained even when a transparent substrate is used. High water and oil repellency and antifouling properties can be imparted without impairing water.
本発明の第2の態様は、炭化水素基を有する透明な物質がフェースプレートの外側となる側の表面の少なくとも一部を覆うように存在する透明な基材の該外側となる側の表面を、フッ化炭素基を含むガス雰囲気中で低圧プラズマ処理する工程Aを含むことを特徴とする表示装置用フェースプレートの製造方法を提供することにより上記課題を解決するものである。 According to a second aspect of the present invention, there is provided a surface on the outer side of a transparent base material present so that the transparent substance having a hydrocarbon group covers at least a part of the surface on the outer side of the face plate. The present invention solves the above problems by providing a method for manufacturing a face plate for a display device, comprising a step A of performing low-pressure plasma treatment in a gas atmosphere containing a fluorocarbon group.
工程Aにおいて、フッ化炭素基を含む化合物のガス雰囲気中で、基材表面の炭化水素基を有する物質の表面を低圧プラズマ処理して、炭化水素基中の水素原子の一部又は全部をフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換することにより、撥水撥油性を付与する。そのため、高価なフッ化炭素系の膜化合物を使用した場合よりも低コストで撥水撥油防汚性を有する表示装置用フェースプレートを製造できる。 In step A, in a gas atmosphere of a compound containing a fluorocarbon group, the surface of the substance having a hydrocarbon group on the surface of the substrate is subjected to low-pressure plasma treatment so that a part or all of the hydrogen atoms in the hydrocarbon group are fluorine. By substituting with one or both of an atom and a fluorocarbon group, water and oil repellency is imparted. Therefore, it is possible to manufacture a face plate for a display device having water repellency, oil repellency and antifouling properties at a lower cost than when an expensive fluorocarbon film compound is used.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記工程Aにおいて、前記フッ化炭素基を含む化合物のガスと酸素ガスの混合雰囲気中で前記基材の外側となる側の表面の前記炭化水素基を有する物質の表面を低圧プラズマ処理してもよい。
フッ化炭素基を含む化合物のガスと酸素ガスの混合雰囲気中で基材を低圧プラズマ処理すると、より効率よく、かつ耐久性の高い撥水撥油防汚性部材を提供できる。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, in the step A, the side that is outside the substrate in the mixed atmosphere of the compound gas containing the fluorocarbon group and the oxygen gas. The surface of the substance having the hydrocarbon group on the surface may be subjected to low-pressure plasma treatment.
If the substrate is subjected to low-pressure plasma treatment in a mixed atmosphere of a compound gas containing a fluorocarbon group and oxygen gas, a water- and oil-repellent and antifouling member having higher efficiency and higher durability can be provided.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記工程Aの前に、前記基材の前記外側となる側の表面に表面粗さが10nm以上400μm以下である凸凹を形成する工程Bを更に有していてもよい。
この場合、平坦な表面の場合よりも撥水撥油性透明部材表面の見かけ上の表面エネルギーを大幅に低減でき、高い撥水撥油防汚性を付与できる。また、撥水撥油性透明部材の表面粗さが可視光の最短波長である400nm以下であるため、透明なレンズやフェースプレートに用いた場合であっても、レンズやフェースプレートの透明度を損なうことなく高い撥水撥油防汚性を付与できる。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, the unevenness having a surface roughness of 10 nm or more and 400 μm or less is formed on the outer surface of the substrate before the step A. You may further have the process B to form.
In this case, the apparent surface energy of the surface of the water / oil repellent transparent member can be significantly reduced as compared with the case of a flat surface, and high water / oil repellent / antifouling properties can be imparted. Further, since the surface roughness of the water / oil repellent transparent member is 400 nm or less which is the shortest wavelength of visible light, even when used for a transparent lens or face plate, the transparency of the lens or face plate is impaired. High water and oil repellency and antifouling properties can be imparted.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記基材の前記外側となる側の表面の少なくとも一部を覆う前記炭化水素基を含む物質の被膜を前記基材の前記外側となる側の表面に形成する工程Cを更に有していてもよい。
炭化水素基を含む物質の被膜を基材の外側となる側の表面に形成する工程Cを有することにより、外側となる側の表面に炭化水素基を有しない無機基材を用いて表示装置用フェースプレートを製造できる。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, the coating of the substance containing a hydrocarbon group covering at least a part of the outer surface of the substrate is formed on the substrate. You may further have the process C formed in the surface of the side used as the said outer side.
By using the inorganic base material which does not have a hydrocarbon group on the surface on the outer side by including the step C of forming a coating of a substance containing a hydrocarbon group on the surface on the outer side of the base material, for a display device A face plate can be manufactured.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記工程Cにおいて、炭化水素基を有する膜化合物を含む処理液を前記基材の前記外側となる側の表面に接触させ、前記膜化合物と前記基材の前記外側となる側の表面の表面官能基との反応により炭化水素基を含む有機薄膜を形成してもよい。
工程Cにおいて、基材の外側となる側の表面に形成される炭化水素基を有する物質の被膜が、ナノメートルレベルの膜厚を有する有機薄膜であるため、基材の光学的特性等を損なうことなく撥水撥油性を付与できる。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, in the step C, a treatment liquid containing a film compound having a hydrocarbon group is brought into contact with the surface on the outer side of the substrate. An organic thin film containing a hydrocarbon group may be formed by a reaction between the film compound and a surface functional group on the surface on the outer side of the substrate.
In Step C, the coating of the substance having a hydrocarbon group formed on the surface on the outer side of the substrate is an organic thin film having a film thickness of nanometer level, so that the optical characteristics and the like of the substrate are impaired. Water and oil repellency can be imparted without any problem.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記膜化合物が、炭化水素基、エステル基を有する炭化水素基、及びエーテル基を有する炭化水素基のいずれかを含んでいてもよい。 In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, the film compound includes any one of a hydrocarbon group, a hydrocarbon group having an ester group, and a hydrocarbon group having an ether group. May be.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記膜化合物が、下記の式(X)で表される膜化合物であってもよい。
  Z-SiXp3-p  (X)
なお、式(X)において、Zは炭素数25以下のアルキル基、アリール基、ビニル基及びシリコーン基のいずれかを含む置換基を表し、
Xは水素原子、又は前記Zより炭素数の少ないアルキル基、アリール基、ビニル基及びシリコーン基のいずれかを含む置換基を表し、
Yは、ハロゲン原子又はアルコキシル基を表し、
pは0、1又は2を表す。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, the film compound may be a film compound represented by the following formula (X).
Z-SiX p Y 3-p (X)
In the formula (X), Z represents a substituent containing any one of an alkyl group having 25 or less carbon atoms, an aryl group, a vinyl group, and a silicone group,
X represents a hydrogen atom or a substituent containing any one of an alkyl group having less carbon atoms than Z, an aryl group, a vinyl group, and a silicone group;
Y represents a halogen atom or an alkoxyl group,
p represents 0, 1 or 2.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記炭化水素基を含む膜化合物が、下記の式(XI)~(XV)のいずれかで表される膜化合物であってもよい。
 CH(CHSi(OA)           (XI)
 [CH(CHSi(OA)        (XII)
 [CH(CHSi(OA)         (XIII)
 CH(CH-COO-(CHSi(OA) (XIV)
 CH(CH-O-(CHSi(OA)   (XV)
なお、式(XI)~(XV)において、m及びnは、それぞれ独立して0以上24以下の整数を表し、Aはアルキル基を表す。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, the film compound containing a hydrocarbon group is a film compound represented by any of the following formulas (XI) to (XV): May be.
CH 3 (CH 2) n Si (OA) 3 (XI)
[CH 3 (CH 2 ) n ] 2 Si (OA) 2 (XII)
[CH 3 (CH 2 ) n ] 3 Si (OA) (XIII)
CH 3 (CH 2 ) m —COO— (CH 2 ) n Si (OA) 3 (XIV)
CH 3 (CH 2 ) m —O— (CH 2 ) n Si (OA) 3 (XV)
In the formulas (XI) to (XV), m and n each independently represent an integer of 0 or more and 24 or less, and A represents an alkyl group.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記処理液が、下記の式(VI)で表されるアルコキシシラン及び/又は式(VII)で表されるアルコキシポリシロキサンを含んでいてもよい。
 SiH(OA)4-x                (VI)
 (AO)Si(OSi(OA)OSi(OA) (VII)
なお、式(VI)及び(VII)において、
xは0、1、又は2であり、
Aはアルキル基を表し、
nは0、1、又は2である。
In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, the treatment liquid is an alkoxysilane represented by the following formula (VI) and / or an alkoxypolysiloxane represented by the formula (VII): May be included.
SiH x (OA) 4-x (VI)
(AO) 3 Si (OSi (OA) 2 ) n OSi (OA) 3 (VII)
In the formulas (VI) and (VII),
x is 0, 1, or 2;
A represents an alkyl group,
n is 0, 1, or 2.
或いは、本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記工程Cにおいて、前記アルコキシシラン及び/又は前記アルコキシポリシロキサンを含む溶液で前記基材の前記外側となる側の表面を処理して、該表面にポリシロキサン分子の被膜を形成し、次いで前記処理液でポリシロキサン分子の被膜が形成された前記基材を処理して、前記ポリシロキサン分子の被膜上に前記有機薄膜を形成してもよい。
ポリシロキサン分子の被膜を形成することにより、最表面の膜物質の密度を向上でき、耐久性及び撥水撥油防汚性を向上できる。
Alternatively, in the method for manufacturing a face plate for a display device according to the second aspect of the present invention, in the step C, a solution containing the alkoxysilane and / or the alkoxypolysiloxane is used on the outer side of the substrate. A surface is treated to form a polysiloxane molecule film on the surface, and then the substrate on which the polysiloxane molecule film is formed is treated with the treatment liquid, and the organic layer is formed on the polysiloxane molecule film. A thin film may be formed.
By forming a film of polysiloxane molecules, the density of the film material on the outermost surface can be improved, and durability and water / oil repellent / antifouling properties can be improved.
本発明の第2の態様に係る表示装置用フェースプレートの製造方法において、前記工程Cにおいて、有機高分子を含む被膜を前記基材として形成してもよい。 In the method for manufacturing a face plate for a display device according to the second aspect of the present invention, a film containing an organic polymer may be formed as the substrate in the step C.
本発明の第3の態様は、本発明の第1の態様に係る表示装置用フェースプレートを用いた表示装置を提供することにより上記課題を解決するものである。 A third aspect of the present invention solves the above problem by providing a display device using the face plate for a display device according to the first aspect of the present invention.
本発明の第4の態様は、本発明の第3の態様に係る表示装置を用いた物品を提供することにより上記課題を解決するものである。 A fourth aspect of the present invention solves the above problem by providing an article using the display device according to the third aspect of the present invention.
本発明の第4の態様に係る物品が、携帯電話、電子計算機又は電子計算機用表示装置、携帯情報端末、GPS端末、テレビジョン受像器、キャッシュディスペンサー装置及び現金自動預け払い機のいずれかであってもよい。さらに、それらに用いられるレンズや筐体そのもので合っても良い。
これらの物品は、いずれも人体に接触することの多い物品に用いられるものであり、衛生上の観点から防汚性が強く求められており、本発明を好適に適用することができる。
The article according to the fourth aspect of the present invention is any of a mobile phone, an electronic computer or a display device for an electronic computer, a portable information terminal, a GPS terminal, a television receiver, a cash dispenser device, and an automatic teller machine. May be. Furthermore, the lens used for them and the housing itself may be combined.
All of these articles are used for articles that often come into contact with the human body, and antifouling properties are strongly required from the viewpoint of hygiene, and the present invention can be suitably applied.
本発明によると、加工時や廃棄時に環境負荷が少なく、かつ安価に製造できるフェースプレートを有する表示装置用フェースプレートとその製造方法及びそれらを用いた表示装置及び物品が提供される。また、本発明の方法によると、外側表面に炭化水素基を有するフェースプレートの最表面にのみ、省資源、省エネルギー、かつ低コストで撥水撥油防汚機能を付与することが可能である。 According to the present invention, there are provided a face plate for a display device having a face plate that can be manufactured at a low cost at the time of processing and disposal, and a manufacturing method thereof, and a display device and an article using them. Further, according to the method of the present invention, it is possible to impart a water / oil repellent / antifouling function only on the outermost surface of the face plate having a hydrocarbon group on the outer surface at low cost, resource saving, energy saving.
本発明に係る表示装置及びそれを用いた物品は、高い防汚性、耐久性、人体及び環境に対する安全性を併せ持ち、半永久的に防汚性を発揮できる。 The display device according to the present invention and an article using the display device have high antifouling properties, durability, safety for human bodies and the environment, and can exhibit antifouling properties semipermanently.
本発明の各実施の形態に係る表示装置用フェースプレートの断面構造の説明図である。It is explanatory drawing of the cross-section of the face plate for display apparatuses which concerns on each embodiment of this invention. 本発明の第1の実施の形態に係る表示装置用フェースプレートの断面構造を分子レベルまで拡大して模式的に表した説明図である。FIG. 3 is an explanatory diagram schematically showing an enlarged cross-sectional structure of the face plate for a display device according to the first embodiment of the present invention up to a molecular level. 同表示装置用フェースプレートの製造方法において、有機薄膜が形成された基材の断面構造を分子レベルまで拡大して模式的に表した説明図である。In the manufacturing method of the face plate for display apparatuses, it is explanatory drawing which expanded and expanded the cross-sectional structure of the base material in which the organic thin film was formed to the molecular level typically. 本発明の第2の実施の形態に係る表示装置用フェースプレートの断面構造を分子レベルまで拡大して模式的に表した説明図である。It is explanatory drawing which expanded the cross-sectional structure of the faceplate for display apparatuses which concerns on the 2nd Embodiment of this invention to the molecular level, and represented typically. 同表示装置用フェースプレートの製造方法において、ポリシロキサン分子を含む有機薄膜が形成された基材の断面構造を分子レベルまで拡大して模式的に表した説明図である。In the manufacturing method of the face plate for display apparatuses, it is explanatory drawing which expanded the cross-sectional structure of the base material in which the organic thin film containing a polysiloxane molecule was expanded to the molecular level, and was represented typically. 同表示装置用フェースプレートの製造方法において、シラノール基を多数含む有機薄膜が形成された状態を示す説明図である。In the manufacturing method of the face plate for display devices, it is an explanatory view showing the state where the organic thin film containing many silanol groups was formed. 本発明の第3の実施の形態に係る表示装置用フェースプレートの断面構造を分子レベルまで拡大して模式的に表した説明図である。It is explanatory drawing which expanded the cross-sectional structure of the faceplate for display apparatuses which concerns on the 3rd Embodiment of this invention to the molecular level, and was represented typically. 本発明の第4の実施の形態に係る撥水撥油防汚性部材の製造方法の説明図で、(a)及び(b)は、それぞれ、フッ化炭素基を有する化合物のガス雰囲気中での低圧プラズマ処理前及び処理後の基材の外側表面近傍を分子レベルまで拡大して模式的に表した説明図である。It is explanatory drawing of the manufacturing method of the water / oil repellent antifouling member which concerns on the 4th Embodiment of this invention, (a) and (b) are each in the gas atmosphere of the compound which has a fluorocarbon group. It is explanatory drawing which expanded to the molecular level and represented typically the outer surface vicinity of the base material before and after low-pressure plasma processing of this.
続いて、添付した図面を参照しつつ、本発明を具体化した実施の形態につき説明し、本発明の理解に供する。 Next, embodiments of the present invention will be described with reference to the accompanying drawings for understanding of the present invention.
図1に示すように、本発明の各実施の形態に係る表示装置用フェースプレート1(以下、個別に説明する第1~第4の実施の形態に係る表示装置用フェースプレート10、20、30、40の総称)において、炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素官能基を有する透明な物質2(以下、個別に説明する第1~第3の実施の形態に係る含フッ素有機薄膜11、21、31及び第4の実施の形態に係る含フッ素有機高分子41の総称)が、外側となる側の表面に露出した透明な基材3(以下、個別に説明する第1~第4の実施の形態に係る基材12、22、32、42の総称)の外側表面の少なくとも一部(図1には、一例として基材3の全面を覆うように存在する場合について図示している。)を覆うように存在している。 As shown in FIG. 1, the display device faceplate 1 according to each embodiment of the present invention (hereinafter, the display device faceplates 10, 20, and 30 according to first to fourth embodiments which will be described individually). , 40 generic name), a transparent substance 2 having a fluorine-containing functional group in which some or all of the hydrogen atoms in the hydrocarbon group are substituted with either or both of a fluorine atom and a fluorocarbon group (hereinafter, Surfaces on the outer side of the fluorine-containing organic thin films 11, 21, 31 according to the first to third embodiments and the fluorine-containing organic polymer 41 according to the fourth embodiment, which will be described individually, At least a part of the outer surface of the transparent base material 3 exposed to the surface (hereinafter collectively referred to as base materials 12, 22, 32, and 42 according to first to fourth embodiments which will be described individually) As an example, it exists so as to cover the entire surface of the substrate 3 It is present to cover the are shown.) For engagement.
表示装置用フェースプレート(以下、「フェースプレート」と略称する場合がある。)1は、炭化水素基を有する物質が外側となる側の表面の少なくとも一部を覆うように存在する基材3(の外側となる側の表面)を、フッ化炭素基を含むガス雰囲気中で低圧プラズマ処理する工程Aを含む方法により製造される(図2、4、7、8(b)参照)。この場合において、含フッ素官能基は、基材3の外側となる側の表面(の少なくとも一部を覆うように存在する炭化水素基を有する物質)を、フッ化炭素基を含む化合物のガス雰囲気中で低圧プラズマ処理することにより得られる。 A face plate for a display device (hereinafter sometimes abbreviated as “face plate”) 1 is a base material 3 (covering at least a part of a surface on the outer side of a substance having a hydrocarbon group. Is manufactured by a method including a step A in which a low-pressure plasma treatment is performed in a gas atmosphere containing a fluorocarbon group (see FIGS. 2, 4, 7, and 8 (b)). In this case, the fluorine-containing functional group is a gas atmosphere of a compound containing a fluorocarbon group on the surface on the outer side of the substrate 3 (substance having a hydrocarbon group present so as to cover at least a part thereof). It is obtained by low-pressure plasma treatment.
まず、工程Aについて説明する。
フッ化炭素基を含む化合物のガス雰囲気中で高周波放電によりプラズマを発生させると、フッ素ラジカル(・F)や、トリフルオロメチルラジカル(・CF)等のフッ化炭素ラジカルが生成する。これらのラジカルが、基材3の外側となる側の表面の炭化水素基の水素原子をトリフルオロメチル基19、43(フッ素原子又はフッ化炭素基の一例)で置換する(図2、4、7、8(b))。或いは、テトラフルオロエチレン等の不飽和結合を有する化合物を含むガスを用いる場合には、プラズマ重合により炭素数の大きいパーフルオロアルキル基も生成しうる。
First, step A will be described.
When plasma is generated by high frequency discharge in a gas atmosphere of a compound containing a fluorocarbon group, a fluorocarbon radical such as a fluorine radical (· F) or a trifluoromethyl radical (· CF 3 ) is generated. These radicals replace the hydrogen atom of the hydrocarbon group on the surface on the outside of the substrate 3 with trifluoromethyl groups 19 and 43 (an example of a fluorine atom or a fluorocarbon group) (FIGS. 2, 4, 7, 8 (b)). Alternatively, when a gas containing a compound having an unsaturated bond such as tetrafluoroethylene is used, a perfluoroalkyl group having a large carbon number can also be generated by plasma polymerization.
低圧プラズマ処理には、プラズマ表面処理や低温灰化等に使用可能な任意のプラズマ処理装置を用いることができる。チャンバーの形態の具体例としては、流通管型、ベルジャー型等が挙げられ、講習は放電のための電極の形態としては、平行平板型、同軸円筒型、円筒、球等の曲面対向平板型、双曲面対向平板型、複数の細線対向平板型等の電極が挙げられる。高周波電流は、容量結合形式、外部電極を用いた誘導形式のいずれによっても印加可能である。高周波電源の出力は、基材の材質及び大きさ、用いられるフッ化炭素基を含む化合物の種類、添加されるガスの種類及び体積分率、チャンバーの容量及び圧力等によって適宜調節されるが、例えば10~250Wである。 For the low-pressure plasma treatment, any plasma treatment apparatus that can be used for plasma surface treatment or low-temperature ashing can be used. Specific examples of the form of the chamber include a flow tube type, a bell jar type, etc., and as a form of the electrode for discharge, a parallel plate type, a coaxial cylindrical type, a curved counter plate type such as a cylinder, a sphere, etc. Examples include a hyperboloid opposed flat plate type and a plurality of fine wire opposed flat plate types. The high frequency current can be applied by either a capacitive coupling method or an induction method using an external electrode. The output of the high-frequency power source is appropriately adjusted depending on the material and size of the base material, the type of compound containing a fluorocarbon group used, the type and volume fraction of the added gas, the volume and pressure of the chamber, etc. For example, 10 to 250 W.
なお、使用可能なことを確認できたフッ化炭素基を含む化合物としては、CF、C、C、CHF等がある。原理的には、CF基を含み常温常圧で液体である化合物であっても、低圧プラズマ処理条件下でガス化できれば使用可能である。なお、このとき、微量(0.1~5体積%)のArやHe等を混合しておくと、放電を安定化させる効果がある。 Examples of the compound containing a fluorocarbon group that has been confirmed to be usable include CF 4 , C 2 F 6 , C 2 F 4 , and CHF 3 . In principle, even a compound that contains a CF 3 group and is liquid at normal temperature and pressure can be used as long as it can be gasified under low-pressure plasma processing conditions. At this time, if a trace amount (0.1 to 5% by volume) of Ar, He or the like is mixed, there is an effect of stabilizing the discharge.
また、酸素を微量(0.1~15体積%)含ませておくと、基材12の外側となる側の表面を酸化しながら炭化水素基の水素原子をフッ素原子やフッ化炭素基で置換することになり、処理効率を上げる効果がある。或いは、予め酸素ガス雰囲気中で低圧プラズマ処理を行い、外側表面の酸化エッチングを行った後にフッ化炭素基を含む化合物のガス雰囲気中で低圧プラズマ処理を行ってもよい。 In addition, when a small amount of oxygen (0.1 to 15% by volume) is contained, the hydrogen atom of the hydrocarbon group is replaced with a fluorine atom or a fluorocarbon group while oxidizing the surface on the outer side of the substrate 12. Therefore, there is an effect of increasing the processing efficiency. Alternatively, low pressure plasma treatment may be performed in a gas atmosphere of a compound containing a fluorocarbon group after performing low pressure plasma treatment in an oxygen gas atmosphere in advance and performing oxidative etching of the outer surface.
酸素ガス雰囲気中でのプラズマ処理は、基材12の外側表面をクリーニングする作用と、外側表面を粗面化する作用があり、高周波電源のパワーや処理時間を任意に制御することで、表面粗さを数ナノメートルから数百ミクロンの範囲で制御できる。 Plasma treatment in an oxygen gas atmosphere has an action of cleaning the outer surface of the substrate 12 and an action of roughening the outer surface. By arbitrarily controlling the power of the high-frequency power source and the treatment time, The thickness can be controlled in the range of several nanometers to several hundred microns.
表示装置用フェースプレート1の製造に用いられる基材3は、透明であり、かつ炭化水素基を有する物質が外側となる側の表面の少なくとも一部を覆うように存在する必要があるものの、その材質、形状及び大きさについて特に制限はなく、任意の材質、形状及び大きさのものを用いることができる。外側となる側の表面に炭化水素基を有しない無機材料からなる基材3を用いる場合には、後述する工程Cにおいて、その外側表面の少なくとも一部を覆う炭化水素基を含む物質の被膜を基材3の外側表面に形成することができる。
基材3の材質の具体例としては、樹脂等の有機材料、ガラス等の無機材料が挙げられる。
Although the base material 3 used for manufacturing the face plate 1 for a display device is transparent and needs to be present so as to cover at least a part of the surface on the outer side, the substance having a hydrocarbon group, There is no restriction | limiting in particular about a material, a shape, and a magnitude | size, The thing of arbitrary materials, shapes, and magnitude | sizes can be used. In the case of using the base material 3 made of an inorganic material having no hydrocarbon group on the surface on the outer side, in Step C described later, a coating of a substance containing a hydrocarbon group covering at least a part of the outer surface is formed. It can be formed on the outer surface of the substrate 3.
Specific examples of the material of the substrate 3 include organic materials such as resins and inorganic materials such as glass.
透明な樹脂の具体例としては、ポリウレタン、ポリエステル、ポリエチレン、ポリフェニレンスルファイド、ポリエチレンテレフタレート、ポリエチレンナフタレート、ポリ塩化ビニリデン、ポリ塩化ビニル、ポリオレフィン、ポリカーボネート、ポリ酢酸ビニル、ポリスチレン、ポリスルホン、ポリトリメチレンテレフタレート、ポリ乳酸、ポリビニルアルコール、ポリビニルピロリドン、ポリブチレンテレフタレート、ポリブチレンナフタレート、ポリフッ化ビニリデン、ポリプロピレン、ポリマーアロイ、ポリメチルペンテン、アイオノマー樹脂、アクリル樹脂、アセチルセルロース、アルキド樹脂、AS樹脂、液晶ポリマー、ABS樹脂、エポキシ樹脂、尿素樹脂、その他エンジニアリングプラスチック等が挙げられる。 Specific examples of transparent resins are polyurethane, polyester, polyethylene, polyphenylene sulfide, polyethylene terephthalate, polyethylene naphthalate, polyvinylidene chloride, polyvinyl chloride, polyolefin, polycarbonate, polyvinyl acetate, polystyrene, polysulfone, polytrimethylene terephthalate. , Polylactic acid, polyvinyl alcohol, polyvinyl pyrrolidone, polybutylene terephthalate, polybutylene naphthalate, polyvinylidene fluoride, polypropylene, polymer alloy, polymethylpentene, ionomer resin, acrylic resin, acetylcellulose, alkyd resin, AS resin, liquid crystal polymer, Examples include ABS resin, epoxy resin, urea resin, and other engineering plastics.
また、透明な無機材料の具体例としては、ソーダ石灰ガラス、石英ガラス、ホウケイ酸ガラス、クリスタルガラス、ガラスセラミックス等のガラス、酸化インジウム、酸化マグネシウム、ITO等の金属酸化物、塩化ナトリウム、フッ化物単結晶等の無機塩、ダイヤモンド、DLC等が挙げられる。基材3はバルク材料である必要はなく、蒸着膜、コーティング等の薄膜材料であってもよく、積層材等であってもよい。透明薄膜材料の具体例としては、透明樹脂板の表面を被覆するシリカを含むハードコート膜、ITO膜又は透明な金属酸化物(シリカ、アルミナ、ジルコニア等)のゾル-ゲル膜等が挙げられる。また、これらの薄膜材料は、表面保護膜、偏光フィルター、透明導電体層等の機能を有するものであってもよい。薄膜材料の形成には、気相成長法(PVD及びCVD)、コーティング剤の塗布、ナノ粒子等を用いた微粒子膜の形成、ゾル-ゲル法等の任意の公知の方法を用いることができる。 Specific examples of transparent inorganic materials include soda-lime glass, quartz glass, borosilicate glass, crystal glass, glass ceramics, and other metal oxides such as indium oxide, magnesium oxide, and ITO, sodium chloride, and fluoride. Examples thereof include inorganic salts such as single crystals, diamond, and DLC. The base material 3 does not need to be a bulk material, and may be a thin film material such as a vapor deposition film or a coating, or may be a laminated material or the like. Specific examples of the transparent thin film material include a hard coat film containing silica covering the surface of the transparent resin plate, an ITO film, or a sol-gel film of a transparent metal oxide (silica, alumina, zirconia, etc.). Moreover, these thin film materials may have functions of a surface protective film, a polarizing filter, a transparent conductor layer, and the like. For the formation of the thin film material, any known method such as vapor phase epitaxy (PVD and CVD), coating of a coating agent, formation of a fine particle film using nanoparticles, etc., a sol-gel method can be used.
フェースプレート1をタッチパネルとして用いる場合には、可撓性を有するように基材3の厚みを小さくし、裏面側にITO等の透明導電体層を有していてもよい。或いは、これらの樹脂が、ガラス等の透明基材の外側表面上に貼着されたものを基材3として用いてもよい。 When the face plate 1 is used as a touch panel, the thickness of the substrate 3 may be reduced so as to have flexibility, and a transparent conductor layer such as ITO may be provided on the back side. Or what adhered these resin on the outer surface of transparent base materials, such as glass, may be used as the base material 3. FIG.
表示装置用フェースプレート1又は基材3の外側表面の表面粗さは、10nm以上400nm以下、好ましくは360nm以下、より好ましくは300nm以下である。表示装置用フェースプレート1の外側表面の凹凸の形状は、入射光の回折や乱反射等により基材3の光学的特性を損なわない限り特に制限されず、規則的な形状であっても、不規則な形状であってもよい。一般に表面粗さが前記範囲内であれば、基材3の表面特性を悪化させることなく、低圧プラズマ処理後の表面の疎水性を更に向上できると共に、基材3の透明度等の可視光に対する光学特性を損なうことがない。表面粗さは、表面粗さ計、3次元計測器等の任意の公知の方法を用いて測定することができる。また、凹凸の大きさについては、実体顕微鏡又は電子顕微鏡写真を用いた画像解析により測定することもできる。 The surface roughness of the outer surface of the face plate 1 for display device or the substrate 3 is 10 nm or more and 400 nm or less, preferably 360 nm or less, more preferably 300 nm or less. The shape of the irregularities on the outer surface of the face plate 1 for a display device is not particularly limited as long as the optical characteristics of the base material 3 are not impaired by diffraction or irregular reflection of incident light. It may be a simple shape. In general, when the surface roughness is within the above range, the surface hydrophobicity of the base material 3 can be further improved without deteriorating the surface characteristics of the base material 3, and the optical properties of visible light such as the transparency of the base material 3 can be improved. There is no loss of properties. The surface roughness can be measured using any known method such as a surface roughness meter or a three-dimensional measuring instrument. Further, the size of the unevenness can be measured by image analysis using a stereoscopic microscope or an electron micrograph.
次いで、本発明の第1の実施の形態に係る表示装置用フェースプレート10及びその製造方法について説明する。
図2に示すように、本発明の第1の実施の形態に係る表示装置用フェースプレート10において、基材12の外側表面には、デシル基(C1021:炭化水素基であるアルキル基の一例)中の末端のメチル基の水素原子がトリフルオロメチル基19で置換された膜物質(水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素炭化水素基を有する膜物質の一例)を含む含フッ素有機薄膜11が形成されている。本実施の形態において、含フッ素有機薄膜11は、基材12の外側表面に共有結合(化学結合の一例)した膜物質からなる単分子膜である。
Next, the display device face plate 10 and the manufacturing method thereof according to the first embodiment of the present invention will be described.
As shown in FIG. 2, in the face plate 10 for a display device according to the first embodiment of the present invention, an decyl group (C 10 H 21 : an alkyl group that is a hydrocarbon group) is formed on the outer surface of the substrate 12. Example) in which a hydrogen atom of a terminal methyl group is substituted with a trifluoromethyl group 19 (a part or all of the hydrogen atoms are substituted with one or both of a fluorine atom and a fluorocarbon group) A fluorine-containing organic thin film 11 including an example of a film substance having a fluorine-containing hydrocarbon group is formed. In the present embodiment, the fluorine-containing organic thin film 11 is a monomolecular film made of a film substance that is covalently bonded (an example of a chemical bond) to the outer surface of the substrate 12.
表示装置用フェースプレート10は、その基材12の外側となる側の表面に炭化水素基を有する膜化合物を含む処理液を接触させ、膜化合物と基材12の表面官能基との反応により生成した膜物質を含む有機薄膜(基材12の外側表面の少なくとも一部を覆うように存在する炭化水素基を有する物質の一例)18を形成する工程C(図3参照)と、フッ化炭素基を含む化合物のガス雰囲気中で有機薄膜18が形成された基材12の外側表面を低圧プラズマ処理することにより、有機薄膜18に含まれる炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素有機薄膜11を形成する工程Aとを有する方法により製造される。 The face plate 10 for a display device is produced by bringing a treatment liquid containing a film compound having a hydrocarbon group into contact with the outer surface of the substrate 12 and reacting the film compound with the surface functional group of the substrate 12. Step C (see FIG. 3) for forming an organic thin film (an example of a substance having a hydrocarbon group present so as to cover at least a part of the outer surface of the base material 12) 18 containing the obtained film material, and a fluorocarbon group A part or all of the hydrogen atoms in the hydrocarbon groups contained in the organic thin film 18 are fluorine atoms by subjecting the outer surface of the base material 12 on which the organic thin film 18 has been formed in a gas atmosphere of a compound containing And a step A of forming the fluorine-containing organic thin film 11 substituted with one or both of fluorocarbon groups.
なお、工程Aの前に、基材12の外側表面を、上記範囲内の表面粗さ及び凹凸の大きさを有するように粗面化してもよい(工程B)。工程Bを実施する順序は、工程Cの前及び後のいずれであってもよい。すなわち、工程A~Cは、(1)工程B→工程C→工程A(基材12の外側表面を粗面化した後有機薄膜18を形成する。)、及び(2)工程C→工程B→工程A(有機薄膜18が形成された基材12の外側表面を粗面化する。)のいずれの順序で実施してもよい。各工程の順序については、後述する第2及び第3の実施の形態に係る表示装置用フェースプレート20及び30の製造方法についても同様である。 In addition, before the process A, you may roughen the outer surface of the base material 12 so that it may have the surface roughness and the magnitude | size of an unevenness | corrugation in the said range (process B). The order in which step B is performed may be before or after step C. That is, the steps A to C include (1) Step B → Step C → Step A (the organic thin film 18 is formed after roughening the outer surface of the substrate 12), and (2) Step C → Step B. → You may carry out in any order of step A (roughening the outer surface of the substrate 12 on which the organic thin film 18 is formed). The order of each step is the same for the manufacturing methods of the display device face plates 20 and 30 according to the second and third embodiments described later.
次に工程Bについて説明する。
基材12の外側となる側の表面を粗面化する方法としては、サンドブラスト、機械研磨、及びクロム酸混液、リン酸、アルカリ等による化学処理等の任意の公知の方法を用いて予め粗面化しておいてもよいが、酸素ガス及び塩素ガスを含む雰囲気中で低圧プラズマ処理を行うことにより行うこともできる。所望の表面粗さ及び凹凸の大きさを有する表面が得られるようにプラズマ処理の条件を適宜調節してもよい。なお、低圧プラズマ処理に使用される装置及び処理条件等については工程Aの場合と同様であるので詳しい説明を省略する。
Next, step B will be described.
As a method for roughening the surface on the outer side of the substrate 12, the surface is roughened in advance using any known method such as sandblasting, mechanical polishing, and chemical treatment with chromic acid mixture, phosphoric acid, alkali, or the like. However, the low pressure plasma treatment can be performed in an atmosphere containing oxygen gas and chlorine gas. Plasma treatment conditions may be adjusted as appropriate so that a surface having a desired surface roughness and unevenness can be obtained. The apparatus and processing conditions used for the low-pressure plasma processing are the same as in the case of step A, and thus detailed description thereof is omitted.
次に工程Cについて説明する。
工程Cにおいて有機薄膜18の形成に使用する処理液は、膜化合物を溶媒中に分散させることにより調製される。ここで、「分散」とは、均一な溶液、懸濁液、及び乳濁液のいずれかを形成している状態を意味する。使用することができる膜化合物としては、鎖状の親油性の官能基を含み、基材12の外側表面に膜物質2からなる被膜を形成することができる任意の化合物が挙げられるが、基材12の外側表面の表面官能基との結合を介して基材12の外側表面に固定させるためには、表面結合基を末端に有していることが好ましい。好ましい表面官能基としては、多くの材料の表面に存在するヒドロキシル基と室温で比較的迅速に反応するアルコキシシリル基が挙げられる。また、単分子膜を形成するためには、親油性の官能基は、自己組織性を有する直鎖状の長鎖アルキル基等が好ましい。
Next, step C will be described.
The treatment liquid used for forming the organic thin film 18 in the step C is prepared by dispersing the film compound in a solvent. Here, “dispersion” means a state in which any one of a uniform solution, a suspension, and an emulsion is formed. Examples of the membrane compound that can be used include any compound that contains a chain-like lipophilic functional group and can form a film made of the membrane substance 2 on the outer surface of the substrate 12. In order to fix to the outer surface of the base material 12 through bonding with the surface functional group of the outer surface of 12, it is preferable to have a surface binding group at the terminal. Preferred surface functional groups include alkoxysilyl groups that react relatively rapidly with hydroxyl groups present on the surface of many materials at room temperature. In order to form a monomolecular film, the lipophilic functional group is preferably a linear long-chain alkyl group having self-organization.
膜化合物としては、例えば、下記の一般式(X)で表されるシラン化合物を使用できる。
  Z-SiXp3-p  (X)
なお、式(X)において、Zは炭素数25以下のアルキル基、アリール基、ビニル基及びシリコーン基のいずれかを含む置換基を表し、
Xは水素原子、又は前記Zより炭素数の少ないアルキル基、アリール基、ビニル基及びシリコーン基のいずれかを含む置換基を表し、
Yは、ハロゲン原子又はアルコキシル基を表し、
pは0、1又は2を表す。
As the film compound, for example, a silane compound represented by the following general formula (X) can be used.
Z-SiX p Y 3-p (X)
In the formula (X), Z represents a substituent containing any one of an alkyl group having 25 or less carbon atoms, an aryl group, a vinyl group, and a silicone group,
X represents a hydrogen atom or a substituent containing any one of an alkyl group having less carbon atoms than Z, an aryl group, a vinyl group, and a silicone group;
Y represents a halogen atom or an alkoxyl group,
p represents 0, 1 or 2.
好ましい膜化合物は、例えば、下記の式(XI)~(XV)のいずれかで表されるアルコキシシラン化合物である。
 CH(CHSi(OA)           (XI)
 [CH(CHSi(OA)        (XII)
 [CH(CHSi(OA)         (XIII)
 CH(CH-COO-(CHSi(OA) (XIV)
 CH(CH-O-(CHSi(OA)   (XV)
なお、式(XI)~(XV)において、m及びnは、それぞれ独立して0以上24以下の整数(但し、m≧n)を表し、Aはアルキル基、より好ましくはメチル基又はエチル基を表す。
A preferred film compound is, for example, an alkoxysilane compound represented by any of the following formulas (XI) to (XV).
CH 3 (CH 2) n Si (OA) 3 (XI)
[CH 3 (CH 2 ) n ] 2 Si (OA) 2 (XII)
[CH 3 (CH 2 ) n ] 3 Si (OA) (XIII)
CH 3 (CH 2 ) m —COO— (CH 2 ) n Si (OA) 3 (XIV)
CH 3 (CH 2 ) m —O— (CH 2 ) n Si (OA) 3 (XV)
In the formulas (XI) to (XV), m and n each independently represent an integer of 0 or more and 24 or less (where m ≧ n), and A is an alkyl group, more preferably a methyl group or an ethyl group. Represents.
膜化合物の具体例としては、下記の(1)~(19)に示す化合物が挙げられる。
(1)  CHCHO(CH15Si(OCH
(2)  CH(CHSi(CH(CH15Si(OCH
(3)  CH(CHSi(CH(CHSi(OCH
(4)  CHCOO(CH15Si(OCH
(5)  CH(CHSi(OCH
(6)  CH(CHSi(OCH
(7)  CH(CHSiCH
(8)  CHCHO(CH15Si(OC
(9)  CH(CHSi(CH )15Si(OC
(10) CH(CHSi(CH ) Si(OC
(11) CHCOO(CH15Si(OC
(12) CH(CHSi(OC
(13) CH(CHSi(OCH
(14) CH(CHSi(OC
(15) [CH(CHSi(OCH
(16) [CH(CH5]SiOCH
(17) [CH(CHSi(OC
(18) [CH(CHSiOC
(19) CH(CHSiCH(OCH
Specific examples of the membrane compound include compounds shown in the following (1) to (19).
(1) CH 3 CH 2 O (CH 2 ) 15 Si (OCH 3 ) 3
(2) CH 3 (CH 2 ) 2 Si (CH 3) 2 (CH 2) 15 Si (OCH 3) 3
(3) CH 3 (CH 2 ) 6 Si (CH 3) 2 (CH 2) 9 Si (OCH 3) 3
(4) CH 3 COO (CH 2 ) 15 Si (OCH 3 ) 3
(5) CH 3 (CH 2 ) 9 Si (OCH 3 ) 3
(6) CH 3 (CH 2 ) 5 Si (OCH 3 ) 3
(7) CH 3 (CH 2 ) 7 C 6 H 4 SiCH 3
(8) CH 3 CH 2 O (CH 2) 15 Si (OC 2 H 5) 3
(9) CH 3 (CH 2 ) 2 Si (CH 2) 15 Si (OC 2 H 5) 3
(10) CH 3 (CH 2 ) 6 Si (CH 2) 9 Si (OC 2 H 5) 3
(11) CH 3 COO (CH 2 ) 15 Si (OC 2 H 5 ) 3
(12) CH 3 (CH 2 ) 9 Si (OC 2 H 5 ) 3
(13) CH 3 (CH 2 ) 7 Si (OCH 3 ) 3
(14) CH 3 (CH 2 ) 7 C 6 H 4 Si (OC 2 H 5) 3
(15) [CH 3 (CH 2 ) 5 ] 2 Si (OCH 3 ) 2
(16) [CH 3 (CH 2 ) 3 5] 3 SiOCH 3
(17) [CH 3 (CH 2 ) 5 ] 2 Si (OC 2 H 5 ) 2
(18) [CH 3 (CH 2 ) 5 ] 3 SiOC 2 H 5
(19) CH 3 (CH 2 ) 5 SiCH 3 (OCH 3 ) 2
処理液に含まれる膜化合物の濃度は、好ましくは0.1mmol/L~10mmol/Lである。膜化合物の濃度が0.1mmol/Lを下回ると、均一な有機薄膜18を形成することが困難であり、濃度が10mmol/Lを上回ると、ゲル化等が起こりやすくなり、保存安定性が低下する。 The concentration of the membrane compound contained in the treatment liquid is preferably 0.1 mmol / L to 10 mmol / L. When the concentration of the membrane compound is less than 0.1 mmol / L, it is difficult to form a uniform organic thin film 18, and when the concentration exceeds 10 mmol / L, gelation is likely to occur and storage stability is reduced. To do.
溶媒としては、膜化合物を溶解又は安定に分散させることができる任意の液体を使用することができる。膜化合物は高い疎水性を有するため、溶解させるためには有機溶媒が使用される。しかし、表示装置用フェースプレート10の製造時における環境負荷の低減の観点からは、水の使用が好ましい。しかし、水をそのまま使用するだけでは、膜化合物を溶解させることも安定に分散させることも困難である。したがって、水を溶媒として使用する場合には、処理液は、水を主体とする溶媒に膜化合物を可溶化又は安定に分散可能にするために、界面活性剤及び/又はアルコールを含んでいる。 As the solvent, any liquid that can dissolve or stably disperse the membrane compound can be used. Since the membrane compound has high hydrophobicity, an organic solvent is used to dissolve it. However, it is preferable to use water from the viewpoint of reducing the environmental load during the manufacturing of the face plate 10 for a display device. However, it is difficult to dissolve or stably disperse the membrane compound only by using water as it is. Therefore, when water is used as a solvent, the treatment liquid contains a surfactant and / or alcohol in order to solubilize or stably disperse the membrane compound in a solvent mainly composed of water.
界面活性剤としては、任意のものを用いることができるが、好ましくは、陽イオン性界面活性剤であるテトラアルキルアンモニウム塩、より具体的には下記の式(VIII)で表されるテトラアルキルアンモニウム塩である。 Any surfactant can be used, but a tetraalkylammonium salt which is a cationic surfactant, more specifically, a tetraalkylammonium represented by the following formula (VIII): Salt.
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
なお、式(VIII)において、
は炭素数1~20、より好ましくは炭素数12~16のアルキル基を表し、
、R、及びRはメチル基又はエチル基、より好ましくはメチル基を表し、
Xはハロゲンを表す。
In the formula (VIII),
R 1 represents an alkyl group having 1 to 20 carbon atoms, more preferably 12 to 16 carbon atoms,
R 2 , R 3 , and R 4 represent a methyl group or an ethyl group, more preferably a methyl group,
X represents a halogen.
特に好ましいテトラアルキルアンモニウム塩は、臭化ヘキサデシルトリメチルアンモニウムCH(CH15N(CHBrである。 A particularly preferred tetraalkylammonium salt is hexadecyltrimethylammonium bromide CH 3 (CH 2 ) 15 N (CH 3 ) 3 Br.
テトラアルキルアンモニウム塩の濃度は、好ましくは0.1mmol/L~10mmmol/L、より好ましくは0.5mmol/L~5mmol/Lである。濃度が0.1mmol/Lを下回ると、膜化合物を十分に可溶化することができず、10mmol/Lを上回ると、処理液のpHが後述する最適範囲外となったり、泡を生じたりするおそれがある。 The concentration of the tetraalkylammonium salt is preferably 0.1 mmol / L to 10 mmol / L, more preferably 0.5 mmol / L to 5 mmol / L. When the concentration is less than 0.1 mmol / L, the membrane compound cannot be sufficiently solubilized, and when it exceeds 10 mmol / L, the pH of the treatment liquid falls outside the optimum range described later or bubbles are generated. There is a fear.
また、アルコールとしては、膜化合物を水中に均一に分散することができる任意のアルコールを用いることができるが、水と相溶性を有し、揮発性の高い、エタノール、プロパノール(1-プロパノール及び2-プロパノール)、ブタノール(1-ブタノール、2-ブタノール、2-メチル-2-プロパノール)、エチレングリコールが好ましい。これらのアルコールは単独で用いてもよく、任意の2種類以上を任意の割合で混合して用いてもよい。 As the alcohol, any alcohol that can uniformly disperse the membrane compound in water can be used. However, ethanol, propanol (1-propanol and 2) that are compatible with water and have high volatility are used. -Propanol), butanol (1-butanol, 2-butanol, 2-methyl-2-propanol) and ethylene glycol are preferred. These alcohols may be used alone, or any two or more kinds may be mixed and used at an arbitrary ratio.
水とアルコールの混合比は特に制限されないが、水とアルコールの体積比が、80:20~95:5であることが好ましい。 The mixing ratio of water and alcohol is not particularly limited, but the volume ratio of water and alcohol is preferably 80:20 to 95: 5.
処理液には、pHを調整するために、酸又は塩基を加えてもよい。好ましいpHの範囲は、5~12である。pHが5を下回ると、密度の高い有機薄膜18が形成されなくなると共に、処理液の保存安定性が低下する。また、pHが12を上回ると、シロキサン結合のアルカリ加水分解により、形成された有機薄膜18が破壊されるおそれがある。 An acid or a base may be added to the treatment liquid in order to adjust the pH. A preferred pH range is 5-12. When the pH is less than 5, the organic thin film 18 having a high density is not formed, and the storage stability of the treatment liquid is lowered. Moreover, when pH exceeds 12, there exists a possibility that the formed organic thin film 18 may be destroyed by the alkali hydrolysis of a siloxane bond.
処理液は、膜化合物と溶媒(好ましくは、界面活性剤及び/又はアルコールとを含む水)を、混合して分散させる工程を有する方法により調製される。まず、これらの成分を、所望の組成比となるよう秤量したものを混合する。各成分を添加する順番については特に制限されない。次いで、超音波分散機又はホモジナイザーを用いて混合物を処理すると、アルコキシシリル基の一部が加水分解によりシラノール基に変換され、均一かつ透明な処理液が得られる。処理温度及び時間に制限はないが、超音波分散機を用いる場合には、例えば、室温で10分間処理を行う。 The treatment liquid is prepared by a method having a step of mixing and dispersing a membrane compound and a solvent (preferably water containing a surfactant and / or alcohol). First, those components weighed so as to have a desired composition ratio are mixed. The order of adding each component is not particularly limited. Next, when the mixture is treated using an ultrasonic disperser or a homogenizer, a part of the alkoxysilyl group is converted into a silanol group by hydrolysis, and a uniform and transparent treatment liquid is obtained. The treatment temperature and time are not limited, but when an ultrasonic disperser is used, for example, the treatment is performed at room temperature for 10 minutes.
上述のようにして得られる処理液を用いた有機薄膜18の形成は、例えば、下記の方法を用いて行うことができる。まず、基材12の外側表面に処理液を塗布し、溶媒の大部分が揮発するまで(例えば、大気中、室温で1時間)放置する。基材12の外側表面のヒドロキシル基(図示しない)とアルコキシシリル基との縮合反応により形成された共有結合(シロキサン結合)を介して、膜化合物が基材12の外側表面に結合し、有機薄膜(単分子膜)18が形成される(図3参照)。 Formation of the organic thin film 18 using the treatment liquid obtained as described above can be performed using, for example, the following method. First, a treatment liquid is applied to the outer surface of the substrate 12 and left to stand until most of the solvent is volatilized (for example, in the atmosphere at room temperature for 1 hour). The film compound is bonded to the outer surface of the base material 12 through a covalent bond (siloxane bond) formed by a condensation reaction between a hydroxyl group (not shown) on the outer surface of the base material 12 and an alkoxysilyl group. A (monomolecular film) 18 is formed (see FIG. 3).
なお、この場合において、処理液の濃度によっては余分な膜化合物が基材12の外側表面に残ってしまう場合があるが、そのような場合には、溶剤で洗浄除去すればよい。余分な膜化合物が少量であれば、未洗浄のまま放置しておいても、空気中の水分によるアルコキシル基の加水分解により生成したシラノール基により縮合反応が起こり、膜物質が形成されるので問題はない。 In this case, depending on the concentration of the treatment liquid, an extra film compound may remain on the outer surface of the substrate 12, but in such a case, it may be removed by washing with a solvent. If there is a small amount of excess membrane compound, there is a problem that even if it is left unwashed, a condensation reaction occurs due to silanol groups generated by hydrolysis of alkoxyl groups by moisture in the air, resulting in the formation of membrane materials. There is no.
アルコキシシリル基と基材12の外側表面のヒドロキシル基との縮合反応を促進するために、縮合触媒を添加してもよい。縮合触媒としては、カルボン酸金属塩、カルボン酸エステル金属塩、カルボン酸金属塩ポリマー、カルボン酸金属塩キレート、チタン酸エステル及びチタン酸エステルキレート等の金属塩が利用可能である。
縮合触媒の添加量は、好ましくはアルコキシシラン化合物の0.2~5質量%であり、より好ましくは0.5~1質量%である。
In order to accelerate the condensation reaction between the alkoxysilyl group and the hydroxyl group on the outer surface of the substrate 12, a condensation catalyst may be added. As the condensation catalyst, metal salts such as carboxylic acid metal salts, carboxylic acid ester metal salts, carboxylic acid metal salt polymers, carboxylic acid metal salt chelates, titanate esters and titanate ester chelates can be used.
The addition amount of the condensation catalyst is preferably 0.2 to 5% by mass of the alkoxysilane compound, more preferably 0.5 to 1% by mass.
カルボン酸金属塩の具体例としては、酢酸第1スズ、ジブチルスズジラウレート、ジブチルスズジオクテート、ジブチルスズジアセテート、ジオクチルスズジラウレート、ジオクチルスズジオクテート、ジオクチルスズジアセテート、ジオクタン酸第1スズ、ナフテン酸鉛、ナフテン酸コバルト、2-エチルヘキセン酸鉄が挙げられる。 Specific examples of carboxylic acid metal salts include stannous acetate, dibutyltin dilaurate, dibutyltin dioctate, dibutyltin diacetate, dioctyltin dilaurate, dioctyltin dioctate, dioctyltin diacetate, stannous dioctanoate, naphthenic acid Lead, cobalt naphthenate, iron 2-ethylhexenoate.
カルボン酸エステル金属塩の具体例としては、ジオクチルスズビスオクチリチオグリコール酸エステル塩、ジオクチルスズマレイン酸エステル塩が挙げられる。
カルボン酸金属塩ポリマーの具体例としては、ジブチルスズマレイン酸塩ポリマー、ジメチルスズメルカプトプロピオン酸塩ポリマーが挙げられる。
カルボン酸金属塩キレートの具体例としては、ジブチルスズビスアセチルアセテート、ジオクチルスズビスアセチルラウレートが挙げられる。
Specific examples of the carboxylic acid ester metal salt include dioctyltin bisoctylthioglycolate ester salt and dioctyltin maleate ester salt.
Specific examples of the carboxylic acid metal salt polymer include dibutyltin maleate polymer and dimethyltin mercaptopropionate polymer.
Specific examples of the carboxylic acid metal salt chelate include dibutyltin bisacetylacetate and dioctyltin bisacetyllaurate.
チタン酸エステルの具体例としては、テトラブチルチタネート、テトラノニルチタネートが挙げられる。
チタン酸エステルキレートの具体例としては、ビス(アセチルアセトニル)ジ-プロピルチタネートが挙げられる。
Specific examples of the titanate ester include tetrabutyl titanate and tetranonyl titanate.
A specific example of a titanate chelate is bis (acetylacetonyl) di-propyl titanate.
或いは、これらの化合物を助触媒として、上述の金属塩と混合(質量比1:9~9:1の範囲で使用可能だが、1:1前後が好ましい)して用いると、反応時間を更に短縮できる。 Alternatively, when these compounds are used as a co-catalyst and mixed with the above metal salts (can be used in a mass ratio of 1: 9 to 9: 1, preferably around 1: 1), the reaction time is further shortened. it can.
例えば、縮合触媒として、ジブチルスズジアセテートの代わりにケチミン化合物であるジャパンエポキシレジン社のH3を用いることができる。 For example, as a condensation catalyst, H3 of Japan Epoxy Resin Co., which is a ketimine compound, can be used instead of dibutyltin diacetate.
或いは、縮合触媒として、ジャパンエポキシレジン社のH3とジブチルスズジアセテートとの混合物(混合比は1:1)を用いてもよい。 Alternatively, as a condensation catalyst, a mixture of H3 and dibutyltin diacetate manufactured by Japan Epoxy Resin Co., Ltd. (mixing ratio is 1: 1) may be used.
なお、ここで用いることができるケチミン化合物は特に限定されるものではないが、例えば、2,5,8-トリアザ-1,8-ノナジエン、3,11-ジメチル-4,7,10-トリアザ-3,10-トリデカジエン、2,10-ジメチル-3,6,9-トリアザ-2,9-ウンデカジエン、2,4,12,14-テトラメチル-5,8,11-トリアザ-4,11-ペンタデカジエン、2,4,15,17-テトラメチル-5,8,11,14-テトラアザ-4,14-オクタデカジエン、2,4,20,22-テトラメチル-5,12,19-トリアザ-4,19-トリエイコサジエン等が挙げられる。 The ketimine compound that can be used here is not particularly limited. For example, 2,5,8-triaza-1,8-nonadiene, 3,11-dimethyl-4,7,10-triaza- 3,10-tridecadiene, 2,10-dimethyl-3,6,9-triaza-2,9-undecadiene, 2,4,12,14-tetramethyl-5,8,11-triaza-4,11-penta Decadiene, 2,4,15,17-tetramethyl-5,8,11,14-tetraaza-4,14-octadecadiene, 2,4,20,22-tetramethyl-5,12,19-triaza -4,19-trieicosadiene and the like.
また、用いることができる有機酸としても特に限定されるものではないが、例えば、ギ酸、酢酸、プロピオン酸、酪酸、マロン酸等が挙げられる。 Moreover, although it does not specifically limit as an organic acid which can be used, For example, a formic acid, an acetic acid, propionic acid, a butyric acid, malonic acid etc. are mentioned.
或いは、上記の化合物(1)~(19)においてアルコキシシリル基の代わりにハロシリル基(クロロシリル基又はブロモシリル基)を有するハロシラン化合物を膜化合物として用いてもよい。この場合には、シラノール縮合触媒及び助触媒が不要であるが、ハロシリル基は水(空気中の水分も含む)やアルコールと速やかに反応するため、溶媒として水やアルコールを含む溶媒が使用できず、基材12の外側表面への処理液の塗布及び反応を乾燥条件下(相対湿度45%以下)で行う必要がある。 Alternatively, in the above compounds (1) to (19), a halosilane compound having a halosilyl group (chlorosilyl group or bromosilyl group) instead of the alkoxysilyl group may be used as the film compound. In this case, a silanol condensation catalyst and a co-catalyst are not required, but halosilyl groups react quickly with water (including moisture in the air) and alcohol, so that a solvent containing water or alcohol cannot be used as a solvent. The application of the treatment liquid to the outer surface of the substrate 12 and the reaction must be performed under dry conditions (relative humidity of 45% or less).
次に、本発明の第2の実施の形態に係る表示装置用フェースプレート20について説明する。図4に示すように、表示装置用フェースプレート20において、含フッ素有機薄膜21は、アルコキシシラン及び/又はアルコキシポリシロキサンから形成されたポリシロキサン分子24を含んでいる。より具体的には、図4に示すように、ポリシロキサン分子24は、基材22の外側表面のヒドロキシル基(表面官能基の一例)との結合を介して基材22の外側表面に固定され、その表面を網目状に被覆するポリシロキサン分子の被膜27と、基材12の外側表面及びポリシロキサン分子13上に形成された、デシル基(C1021:炭化水素基であるアルキル基の一例)中の末端のメチル基の水素原子がトリフルオロメチル基で置換された膜物質(水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素炭化水素基を有する膜物質の一例)とからなる被膜で被覆されている。膜物質は、膜化合物の末端のアルコキシシリル基(反応性基の一例)と、基材22の外側表面のヒドロキシル基(表面官能基の一例)又はポリシロキサン分子24上のシラノール基との反応により形成された結合(Si-O-結合)を介して基材22の外側表面及び網目状に基材22の外側表面を被覆するポリシロキサン分子24に固定されている。 Next, a face plate 20 for a display device according to a second embodiment of the present invention will be described. As shown in FIG. 4, in the display device face plate 20, the fluorine-containing organic thin film 21 includes polysiloxane molecules 24 formed from alkoxysilane and / or alkoxypolysiloxane. More specifically, as shown in FIG. 4, the polysiloxane molecule 24 is fixed to the outer surface of the substrate 22 through bonding with hydroxyl groups (an example of surface functional groups) on the outer surface of the substrate 22. , A polysiloxane molecule coating 27 covering the surface in a network, and an decyl group (C 10 H 21 : an alkyl group that is a hydrocarbon group) formed on the outer surface of the substrate 12 and the polysiloxane molecule 13. Example) Film material in which the hydrogen atom of the terminal methyl group is substituted with a trifluoromethyl group (fluorine-containing in which part or all of the hydrogen atoms are substituted with either or both of fluorine atoms and fluorocarbon groups) An example of a film substance having a hydrocarbon group). The membrane material is formed by a reaction between an alkoxysilyl group at the end of the membrane compound (an example of a reactive group) and a hydroxyl group (an example of a surface functional group) on the outer surface of the substrate 22 or a silanol group on the polysiloxane molecule 24. It is fixed to the polysiloxane molecules 24 that coat the outer surface of the base material 22 and the outer surface of the base material 22 in a mesh form through the formed bond (Si—O— bond).
表示装置用フェースプレート20は、基材22の外側表面に炭化水素基を有する膜化合物並びにアルコキシシラン及び/又はアルコキシポリシロキサンを溶媒中に混合分散させた処理液を接触させ、膜化合物と基材22の表面官能基との反応により生成した膜物質と網目状のポリシロキサン分子24とを含む有機薄膜18を形成する工程C(図5参照)と、フッ化炭素基を含む化合物のガス雰囲気中で有機薄膜28が形成された基材22の外側表面を低圧プラズマ処理することにより、有機薄膜28に含まれる炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素有機薄膜21を形成する工程Aと、必要に応じて工程Aの前に基材22の外側表面を、上記範囲内の表面粗さ及び凹凸の大きさを有するように粗面化する工程Bとを有する方法により製造される。
以下、表示装置用フェースプレート20の製造方法について説明する。
The face plate 20 for a display device is brought into contact with a film compound having a hydrocarbon group on the outer surface of a base material 22 and a treatment liquid in which alkoxysilane and / or alkoxypolysiloxane are mixed and dispersed in a solvent. Step C (see FIG. 5) for forming an organic thin film 18 containing a film substance generated by reaction with the surface functional group 22 and a network-like polysiloxane molecule 24, and in a gas atmosphere of a compound containing a fluorocarbon group By subjecting the outer surface of the base material 22 on which the organic thin film 28 has been formed to low-pressure plasma treatment, some or all of the hydrogen atoms in the hydrocarbon groups contained in the organic thin film 28 are either fluorine atoms or fluorocarbon groups. Step A for forming the fluorine-containing organic thin film 21 substituted with one or both, and, if necessary, the outer surface of the substrate 22 before the step A, the surface roughness within the above range and Produced by the process and a step B of roughened to have a size of convex.
Hereinafter, a method for manufacturing the display device face plate 20 will be described.
基材22として使用することができる材料については、第1の実施の形態に係る表示装置用フェースプレート10の製造に使用することができる基材12の場合と同様であるので、詳しい説明を省略する。 Since the material that can be used as the base material 22 is the same as that of the base material 12 that can be used for manufacturing the face plate 10 for a display device according to the first embodiment, detailed description thereof is omitted. To do.
工程Cにおいて用いられる処理液は、膜化合物及びアルコキシシラン及び/又はアルコキシポリシロキサンを溶媒中に混合分散させることにより調製される。膜化合物として使用することができる化合物の具体例、使用することができる溶媒及び界面活性剤については、表示装置用フェースプレート10の製造方法と同様であるので、詳しい説明を省略する。 The treatment liquid used in Step C is prepared by mixing and dispersing the film compound and alkoxysilane and / or alkoxypolysiloxane in a solvent. Specific examples of the compound that can be used as the film compound, the solvent and the surfactant that can be used are the same as those in the method of manufacturing the face plate 10 for a display device, and thus detailed description thereof is omitted.
表示装置用フェースプレート20の製造に使用される処理液は、得られる表示装置用フェースプレート20の耐久性を向上させるために、アルコキシシラン及び/又はアルコキシポリシロキサンを含んでいる。アルコキシシランは、式SiH(OA)4-x(式(VI))で表される化合物であり、アルコキシポリシロキサンは、式(AO)Si(OSi(OA)OSi(OA)(式(VII))で表される化合物である。なお、これらの式において、xは0、1、又は2であり、Aは、アルキル基、好ましくはメチル基又はエチル基を表し、nは、0、1、又は2である。 The treatment liquid used for manufacturing the display device face plate 20 contains alkoxysilane and / or alkoxypolysiloxane in order to improve the durability of the obtained display device face plate 20. The alkoxysilane is a compound represented by the formula SiH x (OA) 4-x (formula (VI)), and the alkoxypolysiloxane is represented by the formula (AO) 3 Si (OSi (OA) 2 ) n OSi (OA). 3 It is a compound represented by (Formula (VII)). In these formulas, x is 0, 1, or 2, A represents an alkyl group, preferably a methyl group or an ethyl group, and n is 0, 1, or 2.
上記の式(VI)で表されるアルコキシシラン及び上記の式(VII)で表されるアルコキシポリシロキサンの具体例としては、以下に示す化合物(21)~(28)が挙げられる。
(21)Si(OCH
(22)SiH(OCH
(23)SiH(OCH
(24)(CHO)SiOSi(OCH
(25)Si(OC
(26)SiH(OC
(27)SiH(OC
(28)(HO)SiOSi(OC
Specific examples of the alkoxysilane represented by the above formula (VI) and the alkoxypolysiloxane represented by the above formula (VII) include the following compounds (21) to (28).
(21) Si (OCH 3 ) 4
(22) SiH (OCH 3 ) 3
(23) SiH 2 (OCH 3 ) 2
(24) (CH 3 O) 3 SiOSi (OCH 3 ) 3
(25) Si (OC 2 H 5 ) 4
(26) SiH (OC 2 H 5 ) 3
(27) SiH 2 (OC 2 H 5 ) 2
(28) (H 5 C 2 O) 3 SiOSi (OC 2 H 5) 3
これらは単独で用いてもよく、任意の2種類以上を任意の割合で混合して用いてもよい。撥水撥油防汚性が長期間にわたって維持される好適な表示装置用フェースプレート20を得るためには、膜化合物と、アルコキシシラン及び/又はアルコキシポリシロキサンとの組成比(ケイ素原子数の比をいう)が1:10~1:0であることが好ましく、1:3~3:1であることがより好ましい。 These may be used alone, or any two or more of them may be mixed and used in an arbitrary ratio. In order to obtain a suitable face plate 20 for a display device in which water repellency, oil repellency and antifouling properties are maintained over a long period of time, the composition ratio (ratio of the number of silicon atoms) of the film compound and alkoxysilane and / or alkoxypolysiloxane. Is preferably from 1:10 to 1: 0, more preferably from 1: 3 to 3: 1.
更にまた、膜化合物並びにアルコキシシラン及び/又はアルコキシポリシロキサンの総濃度は、好ましくは0.1mmol/L~50mmol/L、より好ましくは0.1mmol/L~10mmol/Lである。総濃度が0.1mmol/Lを下回ると、均一な親油性の被膜17を形成することが困難であり、総濃度が50mmol/Lを上回ると、ゲル化等が起こりやすくなり、保存安定性が低下する。特に、総濃度が10mmol/L~0.1mmol/Lである場合には、処理液のゲル化を防止でき、寿命を1ヶ月程度まで確保できる。 Furthermore, the total concentration of the membrane compound and alkoxysilane and / or alkoxypolysiloxane is preferably 0.1 mmol / L to 50 mmol / L, more preferably 0.1 mmol / L to 10 mmol / L. When the total concentration is less than 0.1 mmol / L, it is difficult to form a uniform lipophilic film 17, and when the total concentration exceeds 50 mmol / L, gelation or the like is likely to occur, and storage stability is improved. descend. In particular, when the total concentration is 10 mmol / L to 0.1 mmol / L, gelation of the treatment liquid can be prevented, and the lifetime can be secured up to about 1 month.
表示装置用フェースプレート20の製造に使用される処理液は、膜化合物並びにアルコキシシラン及び/又はアルコキシポリシロキサンと、溶媒(好ましくは、界面活性剤及び/又はアルコールとを含む水)とからなる混合物を、混合して分散させる工程を有する方法により調製される。まず、これらの成分を、所望の組成比となるよう秤量したものを混合する。各成分を添加する順番については特に制限されない。次いで、超音波分散機又はホモジナイザーを用いて混合物を処理すると、アルコキシシリル基の一部が加水分解によりシラノール基に変換され、均一かつ透明な処理液が得られる。処理温度及び時間については、上述の表示装置用フェースプレート10の製造に使用する処理液の場合と同様である。また、このようにして得られる処理液による基材22の処理条件についても、第1の実施の形態に係る表示装置用フェースプレート10の製造の場合と同様であるが、このようにして得られる被膜は、図6に示すように、未反応のシラノール基(25)を有するポリシロキサン分子(24a)の被膜27aを含む有機薄膜26である。このままでも次の工程Bに供することも可能であるが、撥水撥油防汚性及び最終的に得られる含フッ素有機薄膜21の耐久性を向上させるために、加熱処理を行ってもよい。加熱処理は、例えば、120℃~300℃で、15分間~1時間程度行うことが好ましい。加熱処理により、未反応のシラノール基25が脱水反応を起こし、膜物質及び網目状のポリシロキサン分子24を含む有機薄膜28が形成される(図5参照)。 The treatment liquid used for the production of the display device face plate 20 is a mixture comprising a film compound and alkoxysilane and / or alkoxypolysiloxane and a solvent (preferably water containing a surfactant and / or alcohol). Is prepared by a method having a step of mixing and dispersing. First, those components weighed so as to have a desired composition ratio are mixed. The order of adding each component is not particularly limited. Next, when the mixture is treated using an ultrasonic disperser or a homogenizer, a part of the alkoxysilyl group is converted into a silanol group by hydrolysis, and a uniform and transparent treatment liquid is obtained. About processing temperature and time, it is the same as that of the case of the processing liquid used for manufacture of the above-mentioned face plate 10 for display devices. The processing conditions of the base material 22 with the processing liquid thus obtained are the same as in the case of manufacturing the display device face plate 10 according to the first embodiment, but are obtained in this way. As shown in FIG. 6, the film is an organic thin film 26 including a film 27a of polysiloxane molecules (24a) having unreacted silanol groups (25). Although it can be used in the next step B as it is, heat treatment may be performed in order to improve the water / oil repellency / antifouling property and the durability of the finally obtained fluorine-containing organic thin film 21. The heat treatment is preferably performed at 120 ° C. to 300 ° C. for about 15 minutes to 1 hour, for example. By the heat treatment, unreacted silanol groups 25 undergo a dehydration reaction, and an organic thin film 28 including a film substance and network-like polysiloxane molecules 24 is formed (see FIG. 5).
次いで、工程Aにおいてフッ化炭素基を含む化合物のガス雰囲気中で有機薄膜28が形成された基材22の外側表面を低圧プラズマ処理することにより、有機薄膜28に含まれる炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素有機薄膜21を形成し、表示装置用フェースプレート20が得られるが、工程Aについては、第1の実施の形態に係る表示装置用フェースプレート10の製造方法と同様であるため、詳しい説明を省略する。同様に、工程Bについても詳しい説明を省略する。 Next, the hydrogen in the hydrocarbon groups contained in the organic thin film 28 is obtained by subjecting the outer surface of the base material 22 on which the organic thin film 28 is formed in the gas atmosphere of the compound containing a fluorocarbon group in the process A to low pressure plasma treatment. A fluorine-containing organic thin film 21 in which some or all of the atoms are substituted with one or both of fluorine atoms and fluorocarbon groups is formed to obtain a face plate 20 for a display device. Since this is the same as the manufacturing method of the face plate 10 for a display device according to the first embodiment, detailed description is omitted. Similarly, detailed description of the process B is also omitted.
このようにして得られる表示装置用フェースプレート20は、第1の実施の形態に係る表示装置用フェースプレート10と同様に使用することができる。 The display device face plate 20 thus obtained can be used in the same manner as the display device face plate 10 according to the first embodiment.
次いで、図7を参照しながら本発明の第3の実施の形態に係る表示装置用フェースプレート30について説明する。表示装置用フェースプレート30において、含フッ素有機薄膜31は、基材32のヒドロキシル基(表面官能基の一例)との結合を介して基材32の外側表面に固定されたポリシロキサン分子(34)の被膜37と、その上に形成されたデシル基(C1021:炭化水素基であるアルキル基の一例)中の末端のメチル基の水素原子がトリフルオロメチル基で置換された膜物質(水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素炭化水素基を有する膜物質の一例)の被膜とからなる2層構造の被膜である。膜物質は、膜化合物の末端のアルコキシシリル基(反応性基の一例)と、ポリシロキサン分子34上の図示しないシラノール基(Si-OH)との反応により形成された結合(Si-O-結合)を介して基材32の外側表面を被覆するポリシロキサン分子(34)の被膜37に固定されている(図7参照)。 Next, a face plate 30 for a display device according to a third embodiment of the present invention will be described with reference to FIG. In the display device face plate 30, the fluorine-containing organic thin film 31 is a polysiloxane molecule (34) fixed on the outer surface of the substrate 32 through bonding with a hydroxyl group (an example of a surface functional group) of the substrate 32. And a film substance in which the hydrogen atom of the terminal methyl group in the decyl group (C 10 H 21 : an example of an alkyl group that is a hydrocarbon group) formed thereon is substituted with a trifluoromethyl group ( A film having a two-layer structure comprising a film of an example of a film substance having a fluorine-containing hydrocarbon group in which part or all of hydrogen atoms are substituted with either or both of a fluorine atom and a fluorocarbon group. The membrane material is composed of a bond (Si—O— bond) formed by a reaction between an alkoxysilyl group (an example of a reactive group) at the end of the membrane compound and a silanol group (Si—OH) (not shown) on the polysiloxane molecule 34. ) To the coating 37 of polysiloxane molecules (34) covering the outer surface of the substrate 32 (see FIG. 7).
本実施の形態において、表示装置用フェースプレート30は、まずアルコキシシラン及び/又はアルコキシポリシロキサンを含む処理液を基材32の外側表面と接触させ、基材32の外側表面にポリシロキサン分子の被膜37を形成し、次いで外側表面にポリシロキサン分子の被膜26が形成された基材32の表面に膜化合物を含む処理液を接触させ、ポリシロキサン分子の被膜37の上に膜物質の被膜を形成し、有機薄膜38が形成された基材32を得る工程Aと、フッ化炭素基を含む化合物のガス雰囲気中で有機薄膜38が形成された基材32の外側表面を低圧プラズマ処理することにより、有機薄膜28に含まれる炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素有機薄膜31を形成する工程Cと、必要に応じて工程Aの前に基材32の外側表面を、上記範囲内の表面粗さ及び凹凸の大きさを有するように粗面化する工程Bとを有する方法により製造することができる。各溶液の調製条件(溶媒、濃度等)、基材32の外側表面へのポリシロキサン分子(34)の被膜37及び膜物質の被膜の条件(処理条件)については、上述の第1及び第2の実施の形態に係る表示装置用フェースプレート10、20の製造方法と同様であるので、詳しい説明は省略する。 In the present embodiment, the display device face plate 30 first contacts a treatment liquid containing alkoxysilane and / or alkoxypolysiloxane with the outer surface of the substrate 32, and coats the outer surface of the substrate 32 with polysiloxane molecules. 37, and then a treatment liquid containing a film compound is brought into contact with the surface of the substrate 32 on which the polysiloxane molecule film 26 is formed on the outer surface to form a film of the film material on the polysiloxane molecule film 37. Then, the step A for obtaining the base material 32 on which the organic thin film 38 is formed and the outer surface of the base material 32 on which the organic thin film 38 is formed in a gas atmosphere of a compound containing a fluorocarbon group are subjected to low-pressure plasma treatment. Fluorine-containing compounds in which some or all of the hydrogen atoms in the hydrocarbon groups contained in the organic thin film 28 are substituted with either or both of fluorine atoms and fluorocarbon groups. Step C for forming the thin film 31 and Step B for roughening the outer surface of the base material 32 so as to have the surface roughness and the size of the irregularities within the above range before the step A as necessary. It can be manufactured by the method of having. Regarding the preparation conditions (solvent, concentration, etc.) of each solution, the coating 37 of the polysiloxane molecules (34) on the outer surface of the substrate 32, and the coating conditions (treatment conditions) of the film substance, the first and second described above. Since it is the same as the manufacturing method of the display device faceplates 10 and 20 according to the embodiment, detailed description is omitted.
次いで、図8(a)、(b)を参照しながら本発明の第4の実施の形態に係る表示装置用フェースプレート40について説明する。本発明の第4の実施の形態に係る撥水撥油防汚性部材40において、基材42の外側表面の少なくとも一部を覆うように含フッ素有機高分子(含フッ素官能基を有する物質の一例)41が存在している。
撥水撥油防汚性部材40の製造に用いられる基材42は、図8(a)に示すように、外側表面が炭化水素基43で被われている。工程Aにおいて低圧プラズマ処理した後の撥水撥油防汚性部材40の外側表面において、図8(b)に示すように、低圧プラズマ処理前の基材42の外側表面を被う炭化水素基43の水素原子の一部が、フッ化炭素基の一例であるトリフルオロメチル基44で置換されている。
Next, a face plate 40 for a display device according to a fourth embodiment of the present invention will be described with reference to FIGS. 8 (a) and 8 (b). In the water / oil repellent / antifouling member 40 according to the fourth embodiment of the present invention, a fluorine-containing organic polymer (of a substance having a fluorine-containing functional group) is formed so as to cover at least a part of the outer surface of the substrate 42. An example) 41 exists.
As shown in FIG. 8A, the base material 42 used for manufacturing the water / oil repellent / antifouling member 40 is covered with a hydrocarbon group 43 on the outer surface. On the outer surface of the water / oil repellent / antifouling member 40 after the low pressure plasma treatment in step A, as shown in FIG. 8B, the hydrocarbon group covering the outer surface of the base material 42 before the low pressure plasma treatment. A part of 43 hydrogen atoms is substituted with a trifluoromethyl group 44 which is an example of a fluorocarbon group.
撥水撥油防汚性部材40は、フッ化炭素基を含む化合物のガス雰囲気中で、基材42を低圧プラズマ処理する工程Aと、必要に応じて工程Aの前に基材42の外側表面を、上記範囲内の表面粗さ及び凹凸の大きさを有するように粗面化する工程Bとを有する方法により製造される。
フッ化炭素基を含む化合物のガス雰囲気中で高周波放電によりプラズマを発生させると、フッ素ラジカル(・F)や、トリフルオロメチルラジカル(・CF)等のフッ化炭素ラジカルが生成する。これらのラジカルが、アクリル基材42の外側表面の炭化水素基の水素原子をトリフルオロメチル基43で置換する(図8(b))。
The water / oil repellent / antifouling member 40 comprises a step A for subjecting the base material 42 to low-pressure plasma treatment in a gas atmosphere of a compound containing a fluorocarbon group, and an outer side of the base material 42 before the step A if necessary. And a step B of roughening the surface so as to have the surface roughness and the size of the irregularities within the above ranges.
When plasma is generated by high frequency discharge in a gas atmosphere of a compound containing a fluorocarbon group, a fluorocarbon radical such as a fluorine radical (· F) or a trifluoromethyl radical (· CF 3 ) is generated. These radicals substitute the hydrogen atom of the hydrocarbon group on the outer surface of the acrylic base material 42 with the trifluoromethyl group 43 (FIG. 8B).
少なくとも外側表面近傍に炭化水素基を有する基材42については、そのまま、工程Bにより所定の表面粗さ及び凹凸の大きさを有するように粗面化したした後に、フッ化炭素基を含む化合物のガス雰囲気中で低圧プラズマ処理する(工程A)ことにより表示装置用フェースプレート40が得られるが、無機材料からなる物品又はその部材について本実施の形態に係る表示装置用フェースプレートの製造方法を適用する場合には、工程Cを実施し、その外側表面に基材42として有機高分子を含む被膜を形成する。被膜の形成に用いられる有機高分子の種類及び分子量等については特に制限はなく、主鎖及び側鎖中に炭化水素基を有し、工程Aにおいてその水素原子の一部又は全部をフッ素原子及び/又はフッ化炭素基で置換可能である限りにおいて任意の有機高分子を用いることができる。被膜の形成には、有機高分子を含む溶液を用いたスプレーコーティング、スピンコーティング、ディップコーティング、キャスト法等の成膜法を用いてもよく、プラズマ重合等により無機材料の表面で重合反応を起こさせて有機高分子を生成させてもよい。 About the base material 42 having a hydrocarbon group at least in the vicinity of the outer surface, the surface of the compound containing a fluorocarbon group is directly roughened so as to have a predetermined surface roughness and unevenness by the step B. The display device face plate 40 is obtained by performing low-pressure plasma treatment in a gas atmosphere (step A). The method for manufacturing a display device face plate according to the present embodiment is applied to an article made of an inorganic material or a member thereof. When doing so, the process C is implemented and the film which contains an organic polymer as the base material 42 is formed in the outer surface. There are no particular restrictions on the type and molecular weight of the organic polymer used to form the coating, and it has a hydrocarbon group in the main chain and side chain, and in step A, part or all of the hydrogen atoms are fluorine atoms and Any organic polymer can be used as long as it can be substituted with a fluorocarbon group. The film may be formed by spray coating using a solution containing an organic polymer, spin coating, dip coating, cast method, or the like, and a polymerization reaction is caused on the surface of the inorganic material by plasma polymerization or the like. To produce an organic polymer.
なお、工程Bにおいて用いられる基材42の外側表面の粗面化方法及び工程A~Cを実施する順序については、上述の第1~第3の実施の形態に係る表示装置用フェースプレート10、20、30の製造方法と同様であるので、詳しい説明を省略する。 For the roughening method of the outer surface of the base material 42 used in the step B and the order of performing the steps A to C, the face plate 10 for a display device according to the first to third embodiments described above, Since it is the same as the manufacturing method of 20 and 30, detailed description is abbreviate | omitted.
以上のようにして得られる表示装置用フェースプレート1が用いられる表示装置としては、CRT(陰極線管、ブラウン管)、液晶表示装置、プラズマディスプレイ、有機及び無機EL表示装置等が挙げられる。
フェースプレート1を組み込んだ表示装置が用いられる物品としては、携帯電話、電子卓上計算機、電子計算機又は電子計算機用ディスプレイ、PDA(携帯情報端末)、携帯用ゲーム機、携帯GPS端末、カーナビゲーションシステム、テレビジョン受像器、携帯用DVDプレーヤ、デジタルカメラ、ビデオ録画装置、キャッシュディスペンサー(CD)装置、現金自動預け払い機(ATM)、自動券売機等が挙げられる。
Examples of the display device using the display device faceplate 1 obtained as described above include CRT (cathode ray tube, cathode ray tube), liquid crystal display device, plasma display, organic and inorganic EL display devices, and the like.
Articles using the display device incorporating the face plate 1 include a mobile phone, an electronic desk calculator, an electronic computer or a display for an electronic computer, a PDA (personal digital assistant), a portable game machine, a portable GPS terminal, a car navigation system, Examples include a television receiver, a portable DVD player, a digital camera, a video recording device, a cash dispenser (CD) device, an automatic teller machine (ATM), and an automatic ticket machine.
次に、本発明の作用効果を確認するために行った実施例について説明する。なお、以下の実施例においては、とくに記載していない限り分子組成比はモル比を意味する。また、%は重量%を意味する。 Next, examples carried out for confirming the effects of the present invention will be described. In the following examples, the molecular composition ratio means a molar ratio unless otherwise specified. Moreover,% means weight%.
実施例1
オクタデシルトリメトキシシランCH3(CH2 )17Si(OCH3(膜化合物)とテトラメトキシシランSi(OCHとをモル比で3:1になるように秤量し、エタノールに0.01mol/Lとなるように混合して、ホモジナイザーで10分間程度処理すると、エタノール中に含まれる水分により、それぞれのメトキシシリル基(-Si(OCH))の一部が加水分解され、-Si(OH)3基、=Si(OH)基、或いは≡SiOH基(シラノール基)に変換された物質を含む処理液を調製した。
Example 1
Octadecyltrimethoxysilane CH 3 (CH 2 ) 17 Si (OCH 3 ) 3 (film compound) and tetramethoxysilane Si (OCH 3 ) 4 are weighed to a molar ratio of 3: 1, and 0.1% in ethanol. When mixed at 01 mol / L and treated with a homogenizer for about 10 minutes, a part of each methoxysilyl group (—Si (OCH 3 )) is hydrolyzed by moisture contained in ethanol, and —Si A treatment liquid containing a substance converted into (OH) 3 group, = Si (OH) 2 group, or ≡SiOH group (silanol group) was prepared.
次に、無機基材としてよく乾燥したガラス製フェースプレート基材を用意し、上で調製した処理液を空気中で(相対湿度57%~70%)外側表面に塗布した後、さらに空気中で1時間程度放置した。この間、処理液中のエタノールの大部分は空気中に蒸発すると共に、アルコキシシリル基の加水分解により生成したシラノール基(Si-OH)にとの脱水反応により、表面全面に亘り、表面に化学結合(シラノール結合)を介して固定された網目状のポリシロキサン分子と、フェースプレート基材の表面又はポリシロキサン分子上に固定されたオクタデシルシリル基とからなる被膜が形成された。 Next, a well-dried glass faceplate substrate is prepared as an inorganic substrate, and the treatment liquid prepared above is applied to the outer surface in the air (relative humidity 57% to 70%), and further in the air. It was left for about 1 hour. During this time, most of the ethanol in the treatment solution evaporates into the air, and the entire surface is chemically bonded to the surface by dehydration reaction with silanol groups (Si-OH) generated by hydrolysis of alkoxysilyl groups. A film composed of network-like polysiloxane molecules fixed via (silanol bond) and octadecylsilyl groups fixed on the surface of the faceplate substrate or on the polysiloxane molecules was formed.
被膜が完全に硬化してしまう前に、水-エタノール混合溶媒で未反応の余分なオクタデシルトリメトキシシラン及びテトラメトキシシランを洗浄除去(塗布量と、液濃度を適正に調合すれば、必ずしもこの工程の洗浄は行わなくても、ほぼ同様の結果が得られた。)すると、略5nm程度の厚みの、ポリシロキサン分子と、フェースプレートの外側表面又はポリシロキサン分子上に固定されたオクタデシルシリル基とからなる被膜がフェースプレート基材の外側表面に化学結合した状態で形成できた(図6)。 Before the coating is completely cured, the unreacted excess octadecyltrimethoxysilane and tetramethoxysilane are washed away with a water-ethanol mixed solvent (this step is not always necessary if the coating amount and the liquid concentration are properly adjusted). In this case, the polysiloxane molecule having a thickness of about 5 nm and the octadecylsilyl group immobilized on the outer surface of the face plate or on the polysiloxane molecule were obtained. A film consisting of the above can be formed in a state of being chemically bonded to the outer surface of the faceplate substrate (FIG. 6).
その後、空気中で120~300℃の温度で30分程度加熱処理を行い、未反応のシラノール基(-SiOH)が完全に脱水反応して、ポリシロキサン結合を形成した有機薄膜を形成した(図5)。 Thereafter, heat treatment is performed in air at a temperature of 120 to 300 ° C. for about 30 minutes, and unreacted silanol groups (—SiOH) are completely dehydrated to form an organic thin film having a polysiloxane bond (FIG. 5).
次いで、有機薄膜が形成されたフェースプレート基材の外側表面を、表1に示す条件の下で、酸素を含むテトラフルオロメタン(CF)雰囲気中でプラズマ処理を行った。なお、表1において流量の単位として用いているsccmは非SI単位であり、1sccm=1.69×10-4Pa・m/secである。 Next, the outer surface of the face plate substrate on which the organic thin film was formed was subjected to plasma treatment in a tetrafluoromethane (CF 4 ) atmosphere containing oxygen under the conditions shown in Table 1. In Table 1, sccm used as a unit of flow rate is a non-SI unit, and 1 sccm = 1.69 × 10 −4 Pa · m 3 / sec.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
このようにして得られたフェースプレートの水滴接触角を測定した。測定は、同一サンプル上の異なる5点(I~V)で行った。測定結果は下記の表2に示すとおりである。なお、表2において、「C.A.」は接触角(contact angle)を意味し、「Avg.」及び「S.D.」はそれぞれ、平均値及び標準偏差を意味する。 The water droplet contact angle of the face plate thus obtained was measured. Measurements were made at five different points (IV) on the same sample. The measurement results are as shown in Table 2 below. In Table 2, “CA” means a contact angle, and “Avg.” And “SD” mean an average value and a standard deviation, respectively.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
全てのサンプルについて水滴接触角の著しい増大が観測された。これは、図2に示した様に、有機薄膜中の炭化水素基が、プラズマ中で発生した・CFラジカルと反応して、水素原子が-CF基と置換され、表面に多数のCF基が結合したことにより、表面の撥水性が向上したことによると考えられる。 A significant increase in water droplet contact angle was observed for all samples. This is because, as shown in FIG. 2, the hydrocarbon groups in the organic thin film react with the .CF 3 radicals generated in the plasma, and the hydrogen atoms are replaced with —CF 3 groups. This is probably because the water repellency of the surface was improved by the bonding of the three groups.
CF以外にも、C、C、CHF等のCF基又はCF基を含む化合物が同様に使用できた。 In addition to CF 4 , compounds containing CF 2 groups or CF 3 groups such as C 2 F 6 , C 2 F 4 , and CHF 3 could be used similarly.
実施例2
処理液がテトラメトキシシランを含まない以外は実施例1と同様の条件下でフェースプレートを製造した。この場合、外側表面に形成された含フッ素有機薄膜は、ポリシロキサン分子を含まない単分子膜となった。水滴接触角については、実施例1の場合と同様な結果が得られた。ただし、含フッ素有機薄膜の耐摩耗性は、実施例1において得られたものに比べ劣っていた。
Example 2
A face plate was produced under the same conditions as in Example 1 except that the treatment liquid did not contain tetramethoxysilane. In this case, the fluorine-containing organic thin film formed on the outer surface was a monomolecular film containing no polysiloxane molecules. As for the water droplet contact angle, the same results as in Example 1 were obtained. However, the wear resistance of the fluorine-containing organic thin film was inferior to that obtained in Example 1.
実施例3
まず、表3に示す条件の下でガラス製フェースプレート基材の表面を低圧プラズマ処理し、表面を粗面化処理した。
Example 3
First, under the conditions shown in Table 3, the surface of the glass faceplate substrate was subjected to low-pressure plasma treatment, and the surface was roughened.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
このプラズマ粗面化処理により、フェースプレート基材の表面に数十~数百nmの微細な凸凹を形成できた。
その後、実施例1と同様の条件で、有機薄膜の形成及びテトラフルオロメタンガス雰囲気中での低圧プラズマ処理を行った。
By this plasma roughening treatment, fine unevenness of several tens to several hundreds of nanometers could be formed on the surface of the faceplate substrate.
Thereafter, under the same conditions as in Example 1, formation of an organic thin film and low-pressure plasma treatment in a tetrafluoromethane gas atmosphere were performed.
このようにして得られたフェースプレートの水滴接触角の測定結果を表4に示す。 Table 4 shows the measurement results of the water droplet contact angle of the face plate thus obtained.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
プラズマ粗面化処理を行うことにより、得られたフェースプレートにおける水滴接触角が大幅に増大していることがわかる。また、本実施例で得られたフェースプレートにおいて、光透過性の低下、干渉縞及びヘイズの発生等は観測されなかった。 It can be seen that the water droplet contact angle on the obtained face plate is greatly increased by performing the plasma surface roughening treatment. Further, in the face plate obtained in this example, a decrease in light transmittance, generation of interference fringes, haze, and the like were not observed.
実施例4:透明アクリル樹脂基板を基材とする撥水撥油防汚性部材の製造
まず、基材である透明アクリル樹脂基板をエタノールで洗浄後、下記の表5に示す条件の下で、酸素ガス雰囲気中での低圧プラズマ処理(Oプラズマ処理)を行った。次いで、表6に示す条件の下で、酸素を含むテトラフルオロメタン(CF)雰囲気中でプラズマ処理を行った。
Example 4: Production of a water / oil repellent / antifouling member based on a transparent acrylic resin substrate First, after the transparent acrylic resin substrate as a substrate was washed with ethanol, under the conditions shown in Table 5 below, Low-pressure plasma treatment (O 2 plasma treatment) in an oxygen gas atmosphere was performed. Next, plasma treatment was performed in a tetrafluoromethane (CF 4 ) atmosphere containing oxygen under the conditions shown in Table 6.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000006
Figure JPOXMLDOC01-appb-T000006
このようにして得られた撥水撥油防汚性部材の水滴接触角を測定した。測定は、同一サンプル上の異なる5点(I~V)で行った。測定結果は下記の表7に示すとおりである。なお、処理前のアクリル樹脂基板の水滴接触角は75.0度であった。 The water droplet contact angle of the water / oil repellent / antifouling member thus obtained was measured. Measurements were made at five different points (IV) on the same sample. The measurement results are as shown in Table 7 below. The water droplet contact angle of the acrylic resin substrate before treatment was 75.0 degrees.
全てのサンプルについて水滴接触角の著しい増大が観測された。これは、図2(b)に示した様に、アクリル樹脂基板表面の炭化水素基が、プラズマ中で発生した・CFラジカルと反応して、水素原子が-CF基と置換され、表面に多数のCF基が結合したことにより、表面の撥水性が向上したことによると考えられる。 A significant increase in water droplet contact angle was observed for all samples. This is because, as shown in FIG. 2B, the hydrocarbon group on the surface of the acrylic resin substrate reacts with the .CF 3 radical generated in the plasma, and the hydrogen atom is replaced with the —CF 3 group. It is thought that the surface water repellency was improved by bonding a large number of CF 3 groups.
なお、ここで、Oプラズマ処理は、アクリル樹脂基板表面をクリーニングする作用と、部材表面を粗面化する作用があり、高周波電源のパワーや処理時間を任意に制御することで、表面粗さを数ナノメートルから数百ミクロンの範囲で制御でき、それによっても最終の水滴接触角を165~100度程度まで制御できた。特に、水滴接触角を150度以上になる様に制御しておけば、極めて表面エネルギーが低く、高性能な撥油防汚性部材を製造できた。また、表面粗さを、可視光の波長以下(例えば、400nm)にしておくと、基材として用いたアクリル樹脂基板の透明度を損なうことはなかった。 Here, the O 2 plasma treatment has an action of cleaning the surface of the acrylic resin substrate and an action of roughening the surface of the member, and the surface roughness can be controlled by arbitrarily controlling the power of the high frequency power source and the treatment time. Can be controlled within a range of several nanometers to several hundred microns, and the final water droplet contact angle can be controlled to about 165 to 100 degrees. In particular, if the water droplet contact angle was controlled to be 150 degrees or more, a high-performance oil-repellent and antifouling member with extremely low surface energy could be produced. Further, when the surface roughness was set to be equal to or less than the wavelength of visible light (for example, 400 nm), the transparency of the acrylic resin substrate used as the base material was not impaired.
また、CF以外にも、C、C、CHF等のCF基又はCF基を含む化合物が同様に使用できた。 In addition to CF 4 , compounds containing CF 2 groups or CF 3 groups such as C 2 F 6 , C 2 F 4 , and CHF 3 could be used similarly.
使用可能な部材は、炭化水素基を含む任意の材質のものであり、合成樹脂、合成皮革、合成繊維等の人工素材に加え、木質材料、紙、羊毛等の天然素材に対しても同様に処理できた。 The materials that can be used are of any material that contains hydrocarbon groups, and in addition to artificial materials such as synthetic resin, synthetic leather, and synthetic fibers, it also applies to natural materials such as woody materials, paper, and wool. I was able to handle it.
本発明を適用できる物品は、表示装置であれば、どのような形態の物でもよい。具体的には、携帯電話、電子計算機、PDA、GPS、テレビジョン受像器、キャッシュディスペンサー(CD)装置、ATM装置のいずれかに設置されている表示装置、又はそれらに使用される部材に使用できる。さらに、それら機器に用いられる、光学レンズや筐体そのものへも応用可能である。 The article to which the present invention can be applied may be in any form as long as it is a display device. Specifically, it can be used for a mobile phone, an electronic computer, a PDA, a GPS, a television receiver, a cash dispenser (CD) device, a display device installed in an ATM device, or a member used for them. . Furthermore, the present invention can be applied to optical lenses and casings used in these devices.
1           表示装置用フェースプレート
2           含フッ素官能基を有する透明な物質
3           基材
10、20、30    表示装置用フェースプレート
11          含フッ素官能基を有する物質
11a、21、31   含フッ素有機薄膜
12、22、32、42 基材
13、23、33    炭化水素基を有する膜物質
24、34       ポリシロキサン分子
24a         シラノール基を有するポリシロキサン分子
25          シラノール基
26          シラノール基を有する有機薄膜
27、37       ポリシロキサン分子の被膜
27a         シラノール基を有するポリシロキサン分子の被膜
18、28、38    有機薄膜
19、44       トリフルオロメチル基
41          含フッ素有機高分子
43          炭化水素基
DESCRIPTION OF SYMBOLS 1 Display apparatus face plate 2 Transparent substance which has a fluorine-containing functional group 3 Base material 10, 20, 30 Display apparatus face plate 11 Substance which has a fluorine-containing functional group 11a, 21, 31 Fluorine-containing organic thin films 12, 22, 32, 42 Substrate 13, 23, 33 Film material 24, 34 having a hydrocarbon group Polysiloxane molecule 24a Polysiloxane molecule 25 having a silanol group 25 Silanol group 26 Organic thin film 27 having a silanol group 27, 37 Polysiloxane molecule coating 27a Polysiloxane molecule coatings 18, 28, 38 having silanol groups Organic thin film 19, 44 Trifluoromethyl group 41 Fluorinated organic polymer 43 Hydrocarbon group

Claims (26)

  1. 炭化水素基中の水素原子の一部又は全部がフッ素原子及びフッ化炭素基のいずれか一方又は双方で置換された含フッ素官能基を有する透明な物質が、外側となる側の表面に露出した透明な基材の少なくとも一部を覆うように存在することを特徴とする表示装置用フェースプレート。 A transparent substance having a fluorine-containing functional group in which some or all of the hydrogen atoms in the hydrocarbon group are substituted with either or both of a fluorine atom and a fluorocarbon group is exposed on the outer surface. A face plate for a display device, wherein the face plate is present to cover at least a part of a transparent substrate.
  2. 前記含フッ素官能基が、前記基材の前記外側となる側の表面の少なくとも一部を覆うように存在する炭化水素基を有する物質を、フッ化炭素基を含む化合物のガス雰囲気中で低圧プラズマ処理することにより得られることを特徴とする請求項1記載の表示装置用フェースプレート。 A substance having a hydrocarbon group present so that the fluorine-containing functional group covers at least a part of the surface on the outer side of the substrate is subjected to low pressure plasma in a gas atmosphere of a compound containing a fluorocarbon group. The display device faceplate according to claim 1, wherein the display device faceplate is obtained by processing.
  3. 前記含フッ素官能基を有する物質が、直鎖状の前記含フッ素官能基を有する膜物質を含み、前記基材の前記外側となる側の表面に化学結合した含フッ素有機薄膜を形成していることを特徴とする請求項1及び2のいずれか1項記載の表示装置用フェースプレート。 The substance having a fluorine-containing functional group includes a linear film substance having the fluorine-containing functional group, and forms a fluorine-containing organic thin film chemically bonded to the outer surface of the substrate. The face plate for a display device according to any one of claims 1 and 2.
  4. 前記含フッ素官能基が、炭化水素基、エステル基を有する炭化水素基、及びエーテル基を有する炭化水素基のいずれかにおいて任意の1又は複数の水素原子がフッ素原子又はフッ化炭素基のいずれかで置換された官能基であることを特徴とする請求項3記載の表示装置用フェースプレート。 The fluorine-containing functional group is any one of a hydrocarbon group, a hydrocarbon group having an ester group, and a hydrocarbon group having an ether group, and any one or more hydrogen atoms are either a fluorine atom or a fluorocarbon group The face plate for a display device according to claim 3, wherein the functional group is substituted with a functional group.
  5. 前記含フッ素官能基が、下記の式(I)~(V)で表される官能基中の任意の1又は複数の水素原子がフッ素原子又はフッ化炭素基のいずれかで置換された官能基であることを特徴とする請求項3及び4のいずれか1項記載の表示装置用フェースプレート。
    Figure JPOXMLDOC01-appb-C000003
    なお、式(I)~(V)において、m及びnは、それぞれ独立して0以上24以下の整数を表し、m≧nである。
    The fluorine-containing functional group is a functional group in which any one or more hydrogen atoms in the functional groups represented by the following formulas (I) to (V) are substituted with either a fluorine atom or a fluorocarbon group The display device face plate according to claim 3, wherein the display device face plate is a display device face plate.
    Figure JPOXMLDOC01-appb-C000003
    In the formulas (I) to (V), m and n each independently represent an integer of 0 or more and 24 or less, and m ≧ n.
  6. 前記含フッ素有機薄膜が、前記基材の前記外側となる側の表面に化学結合した前記膜物質の単分子膜であることを特徴とする請求項3から5のいずれか1項記載の表示装置用フェースプレート。 The display device according to claim 3, wherein the fluorine-containing organic thin film is a monomolecular film of the film substance chemically bonded to a surface on the outer side of the base material. For face plate.
  7. 前記含フッ素有機薄膜が、アルコキシシラン及び/又はアルコキシポリシロキサンから形成されたポリシロキサン分子を含んでいることを特徴とする請求項3から5のいずれか1項記載の表示装置用フェースプレート。 6. The face plate for a display device according to claim 3, wherein the fluorine-containing organic thin film contains polysiloxane molecules formed from alkoxysilane and / or alkoxypolysiloxane.
  8. 前記含フッ素有機薄膜が、前記基材の前記外側となる側の表面に結合固定された前記ポリシロキサン分子の被膜を介して前記基材の前記外側となる側の表面に結合固定されていることを特徴とする請求項7記載の表示装置用フェースプレート。 The fluorine-containing organic thin film is bonded and fixed to the outer surface of the base material through the polysiloxane molecule film fixed and bonded to the outer surface of the base material. The face plate for a display device according to claim 7.
  9. 前記ポリシロキサン分子の被膜がアルコキシシリル基と前記基材の前記外側となる側の表面に存在する表面官能基との反応により形成された結合を介して前記基材の該外側となる側の表面に固定され、前記含フッ素炭化水素基を有する膜物質のうち一部は前記基材の前記外側となる側の表面に直接結合し、残りは前記ポリシロキサン分子の被膜を介して前記基材の該外側となる側の表面に結合固定されていることを特徴とする請求項6記載の表示装置用フェースプレート。 The surface on the outer side of the substrate through a bond formed by a reaction between the alkoxysilyl group and a surface functional group present on the surface on the outer side of the substrate. A part of the film substance having the fluorine-containing hydrocarbon group is directly bonded to the surface on the outer side of the base material, and the remaining part of the base material is bonded to the base material through the polysiloxane molecule coating. 7. The face plate for a display device according to claim 6, wherein the face plate is bonded and fixed to a surface on the outer side.
  10. 前記ポリシロキサン分子が、下記の式(VI)で表されるアルコキシシラン及び/又は式(VII)で表されるアルコキシポリシロキサンの縮合反応により形成されるものであることを特徴とする請求項7から9のいずれか1項記載の表示装置用フェースプレート。
     SiH(OA)4-x                (VI)
     (AO)Si(OSi(OA)OSi(OA) (VII)
    なお、式(VI)及び(VII)において、
    xは0、1、又は2であり、
    Aはアルキル基を表し、
    nは0、1、又は2である。
    The polysiloxane molecule is formed by a condensation reaction of an alkoxysilane represented by the following formula (VI) and / or an alkoxypolysiloxane represented by the formula (VII): 10. The face plate for a display device according to any one of 1 to 9.
    SiH x (OA) 4-x (VI)
    (AO) 3 Si (OSi (OA) 2 ) n OSi (OA) 3 (VII)
    In the formulas (VI) and (VII),
    x is 0, 1, or 2;
    A represents an alkyl group,
    n is 0, 1, or 2.
  11. 前記含フッ素官能基を有する物質が前記含フッ素官能基を有する含フッ素有機高分子であることを特徴とする請求項1及び2のいずれか1項記載の表示装置用フェースプレート。 3. The face plate for a display device according to claim 1, wherein the substance having a fluorine-containing functional group is a fluorine-containing organic polymer having the fluorine-containing functional group.
  12. 前記外側となる側の表面の表面粗さが10nm以上400nm以下であることを特徴とする請求項1から11のいずれか1項記載の表示装置用フェースプレート。 The face plate for a display device according to any one of claims 1 to 11, wherein the outer surface has a surface roughness of 10 nm or more and 400 nm or less.
  13. 炭化水素基を有する透明な物質がフェースプレートの外側となる側の表面の少なくとも一部を覆うように存在する透明な基材の該外側となる側の表面を、フッ化炭素基を含むガス雰囲気中で低圧プラズマ処理する工程Aを含むことを特徴とする表示装置用フェースプレートの製造方法。 A gas atmosphere containing a fluorocarbon group is formed on the surface of the transparent substrate on which the transparent substance having a hydrocarbon group exists so as to cover at least part of the surface of the face plate. A process for producing a face plate for a display device, comprising a step A of low-pressure plasma treatment.
  14. 前記工程Aにおいて、前記フッ化炭素基を含む化合物のガスと酸素ガスの混合雰囲気中で前記基材の外側となる側の表面を低圧プラズマ処理することを特徴とする請求項13記載の撥水撥油防汚性部材の製造方法。 14. The water repellent method according to claim 13, wherein, in the step A, the surface on the outer side of the substrate is subjected to a low pressure plasma treatment in a mixed atmosphere of a compound gas containing a fluorocarbon group and an oxygen gas. Manufacturing method of oil-repellent antifouling member.
  15. 前記工程Aの前に、前記外側となる側の表面に表面粗さが10nm以上400μm以下である凸凹を形成する工程Bを更に有することを特徴とする請求項13及び14のいずれか1項記載の表示装置用フェースプレートの製造方法。 15. The method according to claim 13, further comprising a step B of forming irregularities having a surface roughness of 10 nm or more and 400 μm or less on the outer surface before the step A. 15. Of manufacturing a face plate for a display device.
  16. 前記工程Aの前に、フッ化炭素基を含む化合物のガス雰囲気中で、前記基材の外側となる側の表面の前記炭化水素基を有する物質の表面を低圧プラズマ処理することを特徴とする請求項13から15のいずれか1項記載の表示装置用フェースプレートの製造方法。 Before the step A, in a gas atmosphere of a compound containing a fluorocarbon group, the surface of the substance having a hydrocarbon group on the surface on the outer side of the substrate is subjected to low-pressure plasma treatment. The method for manufacturing a face plate for a display device according to any one of claims 13 to 15.
  17. 前記工程Cにおいて、炭化水素基を有する膜化合物を含む処理液を前記基材の前記外側となる側の表面に接触させ、前記膜化合物と前記基材の前記外側となる側の表面の表面官能基との反応により炭化水素基を含む有機薄膜を形成することを特徴とする請求項16記載の表示装置用フェースプレートの製造方法。 In the step C, a treatment liquid containing a membrane compound having a hydrocarbon group is brought into contact with the surface on the outer side of the substrate, and the surface functionality of the surface on the outer side of the membrane compound and the substrate is measured. 17. The method for producing a face plate for a display device according to claim 16, wherein an organic thin film containing a hydrocarbon group is formed by reaction with a group.
  18. 前記膜化合物が、炭化水素基、エステル基を有する炭化水素基、及びエーテル基を有する炭化水素基のいずれかを含むことを特徴とする請求項17記載の表示装置用フェースプレートの製造方法。 18. The method for manufacturing a face plate for a display device according to claim 17, wherein the film compound includes any one of a hydrocarbon group, a hydrocarbon group having an ester group, and a hydrocarbon group having an ether group.
  19. 前記膜化合物が、下記の式(X)で表される膜化合物であることを特徴とする請求項17及び18のいずれか1項記載の表示装置用フェースプレートの製造方法。
      Z-SiXp3-p  (X)
    なお、式(X)において、Zは炭素数25以下のアルキル基、アリール基、ビニル基及びシリコーン基のいずれかを含む置換基を表し、
    Xは水素原子、又は前記Zより炭素数の少ないアルキル基、アリール基、ビニル基及びシリコーン基のいずれかを含む置換基を表し、
    Yは、ハロゲン原子又はアルコキシル基を表し、
    pは0、1又は2を表す。
    19. The method for manufacturing a face plate for a display device according to claim 17, wherein the film compound is a film compound represented by the following formula (X).
    Z-SiX p Y 3-p (X)
    In the formula (X), Z represents a substituent containing any one of an alkyl group having 25 or less carbon atoms, an aryl group, a vinyl group, and a silicone group,
    X represents a hydrogen atom or a substituent containing any one of an alkyl group having less carbon atoms than Z, an aryl group, a vinyl group, and a silicone group;
    Y represents a halogen atom or an alkoxyl group,
    p represents 0, 1 or 2.
  20. 前記膜化合物が、下記の式(XI)~(XV)のいずれかで表される膜化合物であることを特徴とする請求項17から19のいずれか1項記載の表示装置用フェースプレートの製造方法。
     CH(CHSi(OA)           (XI)
     [CH(CHSi(OA)        (XII)
     [CH(CHSi(OA)         (XIII)
     CH(CH-COO-(CHSi(OA) (XIV)
     CH(CH-O-(CHSi(OA)   (XV)
    なお、式(XI)~(XV)において、m及びnは、それぞれ独立して0以上24以下の整数を表し、m≧nであり、Aはアルキル基を表す。
    20. The face plate for a display device according to claim 17, wherein the film compound is a film compound represented by any of the following formulas (XI) to (XV): Method.
    CH 3 (CH 2) n Si (OA) 3 (XI)
    [CH 3 (CH 2 ) n ] 2 Si (OA) 2 (XII)
    [CH 3 (CH 2 ) n ] 3 Si (OA) (XIII)
    CH 3 (CH 2 ) m —COO— (CH 2 ) n Si (OA) 3 (XIV)
    CH 3 (CH 2 ) m —O— (CH 2 ) n Si (OA) 3 (XV)
    In the formulas (XI) to (XV), m and n each independently represent an integer of 0 to 24, m ≧ n, and A represents an alkyl group.
  21. 前記処理液が、下記の式(VI)で表されるアルコキシシラン及び/又は式(VII)で表されるアルコキシポリシロキサンを含んでいることを特徴とする請求項17から20のいずれか1項記載の表示装置用フェースプレートの製造方法。
     SiH(OA)4-x                (VI)
     (AO)Si(OSi(OA)OSi(OA) (VII)
    なお、式(VI)及び(VII)において、
    xは0、1、又は2であり、
    Aはアルキル基を表し、
    nは0、1、又は2である。
    21. The process according to claim 17, wherein the treatment liquid contains an alkoxysilane represented by the following formula (VI) and / or an alkoxypolysiloxane represented by the formula (VII). The manufacturing method of the face plate for display apparatuses as described.
    SiH x (OA) 4-x (VI)
    (AO) 3 Si (OSi (OA) 2 ) n OSi (OA) 3 (VII)
    In the formulas (VI) and (VII),
    x is 0, 1, or 2;
    A represents an alkyl group,
    n is 0, 1, or 2.
  22. 前記工程Cにおいて、前記アルコキシシラン及び/又は前記アルコキシポリシロキサンを含む溶液で前記基材の前記外側となる側の表面を処理して、該表面にポリシロキサン分子の被膜を形成し、次いで前記処理液でポリシロキサン分子の被膜が形成された前記基材を処理して、前記ポリシロキサン分子の被膜上に前記有機薄膜を形成することを特徴とする請求項17から20のいずれか1項記載の表示装置用フェースプレートの製造方法。 In the step C, a surface of the substrate on the outer side is treated with a solution containing the alkoxysilane and / or the alkoxypolysiloxane to form a polysiloxane molecule film on the surface, and then the treatment 21. The organic thin film is formed on the polysiloxane molecule film by treating the base material on which the polysiloxane molecule film is formed with a liquid. Manufacturing method of face plate for display device.
  23. 前記工程Cにおいて、有機高分子を含む被膜を前記基材として形成することを特徴とする請求項16記載の表示装置用フェースプレートの製造方法。 17. The method of manufacturing a face plate for a display device according to claim 16, wherein a film containing an organic polymer is formed as the substrate in the step C.
  24. 請求項1から12のいずれか1項記載の表示装置用フェースプレートを用いた表示装置。 The display apparatus using the face plate for display apparatuses of any one of Claim 1 to 12.
  25. 請求項24記載の表示装置を用いた物品。 An article using the display device according to claim 24.
  26. 前記物品が、携帯電話、電子計算機又は電子計算機用表示装置、携帯情報端末、GPS端末、テレビジョン受像器、キャッシュディスペンサー装置及び現金自動預け払い機のいずれかであることを特徴とする請求項25記載の物品。 26. The article is any one of a mobile phone, an electronic computer or a display device for an electronic computer, a portable information terminal, a GPS terminal, a television receiver, a cash dispenser device, and an automatic teller machine. The article described.
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