WO2010106072A3 - Electrolyte and surface-active additives for the galvanic deposition of smooth, dense aluminum layers from ionic liquids - Google Patents

Electrolyte and surface-active additives for the galvanic deposition of smooth, dense aluminum layers from ionic liquids Download PDF

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Publication number
WO2010106072A3
WO2010106072A3 PCT/EP2010/053397 EP2010053397W WO2010106072A3 WO 2010106072 A3 WO2010106072 A3 WO 2010106072A3 EP 2010053397 W EP2010053397 W EP 2010053397W WO 2010106072 A3 WO2010106072 A3 WO 2010106072A3
Authority
WO
WIPO (PCT)
Prior art keywords
electrolyte
smooth
ionic liquids
aluminum layers
active additives
Prior art date
Application number
PCT/EP2010/053397
Other languages
German (de)
French (fr)
Other versions
WO2010106072A2 (en
Inventor
Aurelie Alemany
Itamar Michael Malkowsky
Roland Kalb
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Priority to US13/257,092 priority Critical patent/US20120006688A1/en
Priority to EP10708571A priority patent/EP2419551A2/en
Publication of WO2010106072A2 publication Critical patent/WO2010106072A2/en
Publication of WO2010106072A3 publication Critical patent/WO2010106072A3/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/66—Electroplating: Baths therefor from melts
    • C25D3/665—Electroplating: Baths therefor from melts from ionic liquids
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34—Pretreatment of metallic surfaces to be electroplated
    • C25D5/42—Pretreatment of metallic surfaces to be electroplated of light metals
    • C25D5/44—Aluminium

Abstract

The invention relates to a method for the electrochemical deposition of aluminum, whereby mat or glossy dense aluminum layers can be obtained. The method comprises the following steps: (a) making an electrolytic device available, said device comprising at least one anode and at least one cathode in an electrolytic chamber, (b) electrochemically depositing the aluminum on the at least one cathode of the electrolytic device from an ionic liquid which contains anions and cations, as well as one or more metal salt(s), and one or more additive(s), a current density of at least 50 A/m2 being applied to the at least one cathode.
PCT/EP2010/053397 2009-03-18 2010-03-16 Electrolyte and surface-active additives for the galvanic deposition of smooth, dense aluminum layers from ionic liquids WO2010106072A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US13/257,092 US20120006688A1 (en) 2009-03-18 2010-03-16 Electrolyte and surface-active additives for the electrochemical deposition of smooth, dense aluminum layers from ionic liquids
EP10708571A EP2419551A2 (en) 2009-03-18 2010-03-16 Electrolyte and surface-active additives for the galvanic deposition of smooth, dense aluminum layers from ionic liquids

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP09155495.6 2009-03-18
EP09155495 2009-03-18

Publications (2)

Publication Number Publication Date
WO2010106072A2 WO2010106072A2 (en) 2010-09-23
WO2010106072A3 true WO2010106072A3 (en) 2011-09-01

Family

ID=42200026

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2010/053397 WO2010106072A2 (en) 2009-03-18 2010-03-16 Electrolyte and surface-active additives for the galvanic deposition of smooth, dense aluminum layers from ionic liquids

Country Status (3)

Country Link
US (1) US20120006688A1 (en)
EP (1) EP2419551A2 (en)
WO (1) WO2010106072A2 (en)

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KR20120095470A (en) 2009-12-15 2012-08-28 바스프 에스이 Thiazole compounds as additives in electrolyte solutions in electrochemical cells and batteries
DE102011007566A1 (en) 2010-04-19 2012-01-19 Basf Se Preparing composition of aluminum trihalide and solvent, useful for electrochemical coating of substrate with aluminum, comprises e.g. dissolving or suspending aluminum trihalide in cycloaliphatic solvent and adding required solvent
HUE033209T2 (en) 2010-10-06 2017-11-28 Glaxosmithkline Llc Benzimidazole derivatives as pi3 kinase inhibitors
US9340884B2 (en) 2010-12-15 2016-05-17 Basf Se Process for the electrochemical fluorination of organic compounds
CN102888631B (en) * 2011-07-20 2016-04-27 中国科学院过程工程研究所 A kind of ionic liquid low-temperature electro-deposition prepares the method for Al-Bi alloy or plating Al-Bi alloy
CN102888630B (en) * 2011-07-20 2015-11-18 中国科学院过程工程研究所 A kind of ionic liquid/additive system Low-temperature electro-deposition prepares the method for nano aluminum or nano aluminum coating
DE102011055911B3 (en) 2011-12-01 2012-11-29 Volkmar, Prof. Dr. Neubert Process for the electrodeposition of at least one metal or semiconductor
US20130299355A1 (en) * 2012-05-14 2013-11-14 United Technologies Corporation Surface cleaning and activation for electrodeposition in ionic liquids
US10190227B2 (en) 2013-03-14 2019-01-29 Xtalic Corporation Articles comprising an electrodeposited aluminum alloys
WO2014150508A1 (en) * 2013-03-15 2014-09-25 United Technologies Corporation Sacrificial coating and procedure for electroplating aluminum on aluminum alloys
WO2015003948A1 (en) * 2013-07-09 2015-01-15 Basf Se Electrochemical deposition of aluminum from ionic liquid compositions
US9368284B2 (en) 2013-09-02 2016-06-14 Litronik Entwicklungs Gmbh Anode electrode for aluminum electrolytic capacitor and respective production method
US9903034B2 (en) 2013-11-22 2018-02-27 Sikorsky Aircraft Corporation Methods and materials for electroplating aluminum in ionic liquids
WO2015157441A1 (en) 2014-04-09 2015-10-15 Nulwala Hunaid B Ionic liquid solvent for electroplating process
US9758888B2 (en) 2014-05-06 2017-09-12 Apple Inc. Preparation of metal substrate surfaces for electroplating in ionic liquids
WO2016004189A1 (en) 2014-07-03 2016-01-07 Nulwala Hunaid B Selected compositions for aluminum processes and devices
US9752242B2 (en) * 2014-09-17 2017-09-05 Xtalic Corporation Leveling additives for electrodeposition
CN104694984B (en) * 2015-02-13 2017-02-01 浙江大学 Room-temperature molten salt aluminum plating device and method for inner wall of stainless steel tube
EP3088571B1 (en) * 2015-04-28 2021-06-02 The Boeing Company Environmentally friendly aluminum coatings as sacrificial coatings for high strength steel alloys
CN106086959B (en) * 2016-08-03 2018-06-12 南京理工大学 A kind of method that electrochemical reduction deposition of aluminum prepares thermite
US10530864B2 (en) * 2017-02-15 2020-01-07 Dell Products, L.P. Load balancing internet-of-things (IOT) gateways
US20180320282A1 (en) 2017-05-05 2018-11-08 Hamilton Sundstrand Corporation Method of making aluminum-coated metal
US11661665B2 (en) 2020-04-30 2023-05-30 The Boeing Company Aluminum and aluminum alloy electroplated coatings

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EP0404188A1 (en) * 1989-06-23 1990-12-27 Nisshin Steel Co., Ltd. Non-aqueous electrolytic aluminum plating bath composition
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EP0404188A1 (en) * 1989-06-23 1990-12-27 Nisshin Steel Co., Ltd. Non-aqueous electrolytic aluminum plating bath composition
US20040249177A1 (en) * 2003-06-04 2004-12-09 Shipley Company, L.L.C. Leveler compounds
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Also Published As

Publication number Publication date
WO2010106072A2 (en) 2010-09-23
EP2419551A2 (en) 2012-02-22
US20120006688A1 (en) 2012-01-12

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