WO2010090504A4 - Apparatus for vacuum coating - Google Patents

Apparatus for vacuum coating Download PDF

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Publication number
WO2010090504A4
WO2010090504A4 PCT/LV2010/000001 LV2010000001W WO2010090504A4 WO 2010090504 A4 WO2010090504 A4 WO 2010090504A4 LV 2010000001 W LV2010000001 W LV 2010000001W WO 2010090504 A4 WO2010090504 A4 WO 2010090504A4
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
strips
turning roller
winding
turning
Prior art date
Application number
PCT/LV2010/000001
Other languages
French (fr)
Other versions
WO2010090504A2 (en
WO2010090504A3 (en
Inventor
Edgars Jadins
Eduards Ausvalds
Aivars Gaidlazda
Original Assignee
Sidrabe, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sidrabe, Inc. filed Critical Sidrabe, Inc.
Priority to US13/146,214 priority Critical patent/US20110283934A1/en
Priority to JP2011549084A priority patent/JP2012516946A/en
Priority to EP10707142A priority patent/EP2393958A2/en
Publication of WO2010090504A2 publication Critical patent/WO2010090504A2/en
Publication of WO2010090504A3 publication Critical patent/WO2010090504A3/en
Publication of WO2010090504A4 publication Critical patent/WO2010090504A4/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32733Means for moving the material to be treated
    • H01J37/32752Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761Continuous moving
    • H01J37/3277Continuous moving of continuous material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Highly productive apparatus (1) for vacuum coating roll substrate (3) without touching any elements of the winding system by the substrate front surface and thereby preventing damage of the substrate front side and deposited coating. The apparatus comprises at least one loop winding device (9), which is installed between separate units (7) of the substrate cooling device. The said device comprises an input turning roller (11), central turning roller (12) and output turning roller (13), while each pair of neighboring turning rollers touches the substrate in a single plane. The suggested apparatus provides highly productive deposition of up-to-date high-technology coatings onto comparatively wide polymer films, metal foils and similar substrates. Necessary quality is provided, including for composite coatings. The possibility of processing fairly long roll materials provides uninterrupted operation of the deposition apparatus during long operation cycles, thus ensuring high productivity of the equipment.

Claims

AMENDED CLAIMS received by the International Bureau on 11 November 2010 (11.11.2010
1. An apparatus for vacuum coating roll substrates, comprising a deposition source, a substrate cooling device, a substrate winding system, whose all elements are installed against the substrate side not to be coated, wherein the winding system comprises at least one loop winding device, which is installed between separate units of the substrate cooling device, while outside surfaces of the loop winding device turning rollers are covered with axially movable strips.
2. The device according to claim 1, wherein the said axially movable strips are equipped with devices of the strips return into initial positions outside the substrate touching zone.
3. The device according to claim 2, wherein the said devices of the strips return into initial positions are made of springs.
4. The device according to claim 2, wherein the said devices of the strips return into initial positions are made of rubber tapes.

Statement under Article 19(1)

It is stated in Item 2.1 of the Written Opinion of the International Search Report that "the apparatus proposed in claim 1 is an obvious alternative to the one disclosed in Dl" (EP

2113585). The Dl solution "is particularly applicable in the production of thin-film solar cells"

(paragraph 54) by vacuum processing thin films 200-1000 mm wide (paragraph 27).

We would like to draw attention to the fact that during "twisting" according to Dl the thin film will inevitably slide against the turning roller surface along the roller axis, causing the film dry friction against the roller surface and inevitable buckling and deterioration of the film. Therefore such systems are reliably used only for processing metal strips no wider than 200-300 mm (and usually much thicker than thin polymer films and metal foils used in the solar cell technology).

So, the prior art has no solution for qualitative processing thin polymer films and metal foils 200-

1000 mm wide during the web winding without contact of its uncoated surface to winding rollers.

Claim 1 (amended) of the offered application solves this technical problem by coating the turning roller surface with movable strips. During turning the web movement direction the web moves transversely on the movable strips without direct contact with the turning roller surface and without friction against this surface. Outside the substrate touching zone the strips are returned into initial positions by the return devices, such as springs or rubber tapes.

Thus, claim 1 of the offered application solves technical problem, which has not been solved in the prior art, and therefore the claim 1 cannot be considered evident and is featured by inventive step.

PCT/LV2010/000001 2009-02-03 2010-02-01 Highly productive apparatus for vacuum coating roll substrates WO2010090504A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US13/146,214 US20110283934A1 (en) 2009-02-03 2010-02-01 Highly productive apparatus for vacuum coating roll substrates
JP2011549084A JP2012516946A (en) 2009-02-03 2010-02-01 High productivity equipment for vacuum coating roll substrate
EP10707142A EP2393958A2 (en) 2009-02-03 2010-02-01 Highly productive apparatus for vacuum coating roll substrates

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
LVP-09-16A LV14196B (en) 2009-02-03 2009-02-03 High productive apparatus for vacuum coating of roll substrate
LVP-09-16 2009-02-03

Publications (3)

Publication Number Publication Date
WO2010090504A2 WO2010090504A2 (en) 2010-08-12
WO2010090504A3 WO2010090504A3 (en) 2010-11-18
WO2010090504A4 true WO2010090504A4 (en) 2011-01-20

Family

ID=42315225

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/LV2010/000001 WO2010090504A2 (en) 2009-02-03 2010-02-01 Highly productive apparatus for vacuum coating roll substrates

Country Status (4)

Country Link
EP (1) EP2393958A2 (en)
JP (1) JP2012516946A (en)
LV (1) LV14196B (en)
WO (1) WO2010090504A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013179019A (en) * 2012-02-02 2013-09-09 Nitto Denko Corp Guide member, guide mechanism and method for manufacturing organic el device
JP5284443B2 (en) * 2011-10-19 2013-09-11 日東電工株式会社 Manufacturing method and manufacturing apparatus for organic EL device
EP2770803A4 (en) 2011-10-19 2015-08-19 Nitto Denko Corp Method and apparatus for manufacturing organic el device
JP5269970B2 (en) * 2011-10-24 2013-08-21 日東電工株式会社 Manufacturing method and manufacturing apparatus for organic EL device
CN103503567B (en) * 2011-10-24 2016-06-01 日东电工株式会社 The manufacture method of organic EL device and manufacturing installation
DE102012206502B4 (en) 2012-04-19 2019-01-31 VON ARDENNE Asset GmbH & Co. KG Device for front-side contact-free transport of band-shaped material

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08246150A (en) * 1995-03-10 1996-09-24 Fuji Electric Co Ltd Apparatus for manufacturing thin film
JPH08325731A (en) 1995-05-25 1996-12-10 Teijin Ltd Vacuum film forming device
EP2113585A1 (en) * 2008-04-29 2009-11-04 Applied Materials, Inc. Apparatus and method for coating of a web in vacuum by twisting and guiding the web multiple times along a roller past a processing region

Also Published As

Publication number Publication date
WO2010090504A2 (en) 2010-08-12
WO2010090504A3 (en) 2010-11-18
LV14196B (en) 2010-11-20
EP2393958A2 (en) 2011-12-14
LV14196A (en) 2010-08-20
JP2012516946A (en) 2012-07-26

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