WO2010073801A1 - Système optique d'éclairage, appareil d'exposition et procédé de fabrication d'un dispositif - Google Patents

Système optique d'éclairage, appareil d'exposition et procédé de fabrication d'un dispositif Download PDF

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Publication number
WO2010073801A1
WO2010073801A1 PCT/JP2009/067925 JP2009067925W WO2010073801A1 WO 2010073801 A1 WO2010073801 A1 WO 2010073801A1 JP 2009067925 W JP2009067925 W JP 2009067925W WO 2010073801 A1 WO2010073801 A1 WO 2010073801A1
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Prior art keywords
incident
light
optical
illumination
optical system
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PCT/JP2009/067925
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English (en)
Japanese (ja)
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田中　裕久
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株式会社 ニコン
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Publication of WO2010073801A1 publication Critical patent/WO2010073801A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G02B19/0052—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source the light source comprising a laser diode
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/005—Arrays characterized by the distribution or form of lenses arranged along a single direction only, e.g. lenticular sheets
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
    • G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]

Definitions

  • the present invention relates to an illumination optical system that illuminates a surface to be irradiated based on light emitted from a light source, an exposure apparatus including the illumination optical system, and a device manufacturing method using the exposure apparatus.
  • an exposure apparatus for manufacturing a micro device such as a semiconductor integrated circuit includes an illumination optical system for guiding exposure light output from a light source to a mask such as a reticle on which a predetermined pattern is formed.
  • an illumination optical system is provided with a fly-eye lens as an optical integrator.
  • the illumination pupil at a position optically Fourier-transformed with respect to the irradiated surface of the mask on the exit surface side of the fly-eye lens is composed of a number of light sources.
  • a secondary light source is formed as a substantial surface light source. The secondary light source indicates a light intensity distribution at the illumination pupil (hereinafter referred to as “pupil intensity distribution”).
  • the exposure light from such a secondary light source is condensed by a condenser lens and then illuminates the mask in a superimposed manner.
  • the exposure light transmitted through the mask is irradiated onto a substrate such as a wafer to which a photosensitive material is applied via a projection optical system.
  • the mask pattern is projected and transferred (transferred) onto the substrate.
  • the fine pattern of the mask when the fine pattern of the mask is accurately transferred onto the substrate, not only the pupil intensity distribution is adjusted to a desired shape, but also the light intensity at each point on the substrate, which is the final irradiated surface, is approximately It is necessary to adjust uniformly. If there is variation in the light intensity at each point on the substrate, the line width of the pattern varies from position to position on the substrate, and the fine pattern of the mask is accurately applied to the substrate with the desired line width over the entire exposure area. There was a possibility that it could not be transferred.
  • the present invention has been made in view of such circumstances, and an object thereof is to provide an illumination optical system, an exposure apparatus, and a device manufacturing method capable of adjusting a light intensity distribution on an irradiated surface. There is.
  • the illumination optical system of the present invention is an illumination optical system (13) that illuminates the irradiated surface (Ra, Wa) with light (EL) from a light source (12), and the optical axis of the illumination optical system (13).
  • Wa Wa
  • a plurality of exit side optical surfaces 53, 53) arranged in planes (51a, 51b) intersecting the optical axis (AX) and individually corresponding to the plurality of entrance side optical surfaces (52, 54).
  • 55 forms a predetermined light intensity distribution on the illumination pupil plane (27) in the illumination optical path of the illumination optical system (13) when light (EL) from the light source (12) enters.
  • a dimming unit (66) disposed on the source (12) side for dimming a part of light (EL) incident on at least some of the incident side optical surfaces (52, 54).
  • the dimming portion (66, 66A) has a width along a first direction intersecting the optical axis direction of the illumination optical system in a plane intersecting the optical axis (AX).
  • the gist is that the length along the optical axis direction is longer than that.
  • part of the light that is about to enter at least some of the incident-side optical surfaces (52, 54) of the optical integrator (26) is a light source of the optical integrator (26). It is dimmed by the dimming part (66, 66A) arranged on the (12) side.
  • the light intensity distribution (also referred to as “pupil intensity distribution”) at each point on the irradiated surface (Ra, Wa) is independently adjusted by the light reducing action by the light reducing section (66, 66A). Therefore, it is possible to adjust the light intensity distribution at each point on the irradiated surface (Ra, Wa) to a distribution having substantially the same property.
  • the light intensity distribution on the irradiated surface can be adjusted.
  • FIG. 1 is a schematic block diagram that shows an exposure apparatus according to a first embodiment.
  • (A) is a schematic diagram which shows the illumination area
  • (b) is a schematic diagram which shows the static exposure area
  • FIG. 5 is an operation diagram schematically showing a relationship between an incident angle of exposure light with respect to a first micro fly's eye lens and a length along a Y-axis direction of a light shielding member.
  • (A) is a schematic diagram which shows 1st pupil intensity distribution in case each light shielding member is arrange
  • (b) is a schematic diagram which shows 2nd pupil intensity distribution.
  • (A) is a schematic diagram which shows the 1st pupil intensity distribution in case each light shielding member is arrange
  • (b) is a schematic diagram which shows a 2nd pupil intensity distribution.
  • DESCRIPTION OF SYMBOLS 11 Exposure apparatus, 12 ... Light source device, 13 ... Illumination optical system, 15 ... Projection optical system, 26 ... Optical integrator, 27 ... Illumination pupil plane, 36 ... Pupil intensity distribution measuring device, 40 ... Control apparatus, 42 ... Aperture stop , 50... First micro fly's eye lens as the first optical member, 51. Second micro fly's eye lens as the second optical member, 50 a, 51 a... Entrance surface, 50 b and 51 b. Cylindrical lens surface as a side optical surface, 53... Cylindrical lens surface as a first emission side optical surface, 54... Cylindrical lens surface as a second incidence side optical surface, 55 ...
  • the optical axis (vertical direction in FIG. 1) of the projection optical system 15 to be described later is referred to as the Z-axis direction
  • the horizontal direction in FIG. 1 is referred to as the Y-axis direction
  • the direction to do is referred to as the X-axis direction.
  • the exposure apparatus 11 of the present embodiment illuminates exposure light EL onto a transmissive reticle R on which a predetermined circuit pattern is formed, thereby providing a surface Wa (+ Z direction side surface).
  • 1 is an apparatus for projecting an image of a circuit pattern onto a wafer W coated with a photosensitive material such as a resist on the upper surface in FIG.
  • Such an exposure apparatus 11 includes an illumination optical system 13 that guides the exposure light EL emitted from the light source device 12 to an irradiated surface Ra (surface on the + Z direction side) of the reticle R, a reticle stage 14 that holds the reticle R, and a reticle.
  • a projection optical system 15 that guides the exposure light EL that has passed through R to the surface Wa of the wafer W, and a wafer stage 16 that holds the wafer W are provided.
  • the light source device 12 of this embodiment has an ArF excimer laser light source that outputs light having a wavelength of 193 nm, and light output from the ArF excimer laser light source is guided into the exposure device 11 as exposure light EL.
  • the illumination optical system 13 includes a shaping optical system 17 for converting the exposure light EL emitted from the light source device 12 into a parallel light beam having a predetermined cross-sectional shape (for example, a substantially rectangular cross section), and the shaping optical system 17. And a first reflection mirror 18 that reflects the exposure light EL emitted from the light to the reticle R side (here, the + Y direction side and the right side in FIG. 1).
  • a diffractive optical element 19 is provided on the exit side (reticle R side) of the first reflecting mirror 18.
  • the diffractive optical element 19 is formed by forming a plurality of steps having a pitch approximately equal to the wavelength of the exposure light EL on the glass substrate.
  • the diffractive optical element 19 receives the exposure light EL incident from the incident side (light source device 12 side). It has the effect of diffracting to a predetermined angle.
  • the diffractive optical element 19 for annular illumination when used, when the exposure light EL of a parallel light beam having a substantially rectangular cross section is incident on the diffractive optical element 19 from the incident side, the cross-sectional shape is changed from the diffractive optical element 19.
  • a luminous flux having an annular shape is emitted to the reticle R side.
  • the diffractive optical element 19 for illuminating a plurality of poles (two poles, four poles, eight poles, etc.)
  • exposure light EL of a parallel light beam having a substantially rectangular cross section enters the diffractive optical element 19 from the incident side.
  • a plurality of (for example, four) light beams corresponding to the number of poles are emitted to the reticle R side.
  • the illumination optical system 13 is provided with an afocal optical system 20 (also referred to as “non-focal optical system”) on which the exposure light EL emitted from the diffractive optical element 19 is incident.
  • the afocal optical system 20 includes a first lens group 21 (only one lens is shown in FIG. 1) and a second lens group 22 (shown in FIG. 1) arranged on the exit side from the first lens group 21. Only one lens is shown).
  • the focal position on the incident side of the afocal optical system 20 is substantially the same as the installation position of the diffractive optical element 19, and the focal position on the exit side of the afocal optical system 20 is a predetermined surface indicated by a broken line in FIG. It is formed so as to be substantially the same as the position 23.
  • the incident position of the exposure light EL is at a position optically conjugate with or near the illumination pupil plane 27 of the optical integrator 26 described later.
  • a correction filter 24 having a transmittance distribution with different transmittances is provided.
  • the correction filter 24 is a filter in which a light-shielding dot pattern made of chromium, chromium oxide, or the like is formed on a glass substrate whose incident side surface and emission side surface are parallel.
  • An optical system 25 is provided, and the zoom optical system 25 is disposed on the exit side with respect to the predetermined surface 23. Further, on the exit side of the zoom optical system 25, an optical integrator 26 and a distribution correction unit 31 for adjusting the amount of exposure light EL incident on the optical integrator 26 are provided.
  • the distribution correction unit 31 includes an illumination region ER1 (see FIG.
  • This is a unit for correcting the light intensity distribution at each point in (see FIG. 4B).
  • the specific configuration of the distribution correction unit 31 will be described later.
  • the optical integrator 26 has an incident surface (a surface on the ⁇ Y direction side, which is the left surface in FIG. 1) located at a focal position (also referred to as a pupil plane) on the exit side of the zoom optical system 25 or in the vicinity of the focal position.
  • a focal position also referred to as a pupil plane
  • the incident surface of the optical integrator 26 has a substantially Fourier transform relationship with the predetermined surface 23, and the incident surface of the optical integrator 26 is the pupil plane of the afocal optical system 20 (that is, the installation position of the correction filter 24).
  • an optically conjugate positional relationship is incident on such an optical integrator 26 in a state of being converted into a parallel light beam from the zoom optical system 25 side.
  • the optical integrator 26 wave-divides the incident exposure light EL into a plurality of light beams, and a predetermined light intensity distribution (also referred to as “pupil intensity distribution”) on the illumination pupil plane 27 located on the exit side (+ Y direction side). .).
  • the illumination pupil plane 27 on which the pupil intensity distribution is formed is also referred to as a secondary light source 60 (see FIG. 3) composed of a number of surface light sources.
  • an illumination aperture stop (not shown) is provided at a position optically conjugate with the entrance pupil plane of the projection optical system 15 and defines a range contributing to illumination of the secondary light source 60. Is provided.
  • This illumination aperture stop has a plurality of openings having different sizes and shapes.
  • an opening corresponding to the cross-sectional shape of the exposure light EL emitted from the secondary light source 60 is disposed in the optical path of the exposure light EL. That is, when the cross-sectional shape of the exposure light EL emitted from the secondary light source 60 is an annular shape, the illumination aperture stop is driven so that the opening corresponding to the annular shape is located in the optical path of the exposure light EL. It is supposed to be.
  • the illumination aperture stop has an opening having a shape corresponding to the quadrupole shape in the optical path of the exposure light EL.
  • a first condenser optical system 28 composed of at least one lens (only one is shown in FIG. 1), and the exit side of the first condenser optical system 28.
  • a reticle blind 29 (also referred to as a “mask blind”) disposed at a position optically conjugate with the irradiated surface Ra of the reticle R is provided.
  • the first condenser optical system 28 includes an optical element (lens) having power (reciprocal of focal length).
  • the reticle blind 29 is formed with a rectangular opening 29a whose longitudinal direction is the Z-axis direction and whose lateral direction is the X-axis direction.
  • the exposure light EL emitted from the first condenser optical system 28 illuminates the reticle blind 29 in a superimposed manner.
  • the optical element having power is an optical element in which the characteristics of the exposure light EL change when the exposure light EL enters the optical element.
  • a second condenser optical system 30 composed of a lens having power is provided on the exit side of the reticle blind 29, and the second condenser optical system 30 substantially receives light incident from the reticle blind 29 side. The light is converted into a parallel light beam.
  • An imaging optical system 32 is provided on the exit side of the second condenser optical system 30.
  • the imaging optical system 32 includes an incident side lens group 33, a second reflecting mirror 34 that reflects the exposure light EL emitted from the incident side lens group 33 to the ⁇ Z direction side (lower side in FIG. 1), And an exit side lens group 35 disposed on the exit side of the second reflecting mirror 34.
  • the incident side lens group 33 is composed of at least one optical element (lens) having power (only one is shown in FIG.
  • the emission side lens group 35 is at least one (one in FIG. 1). It is comprised from the optical element (lens) which has the power of only illustration.
  • the exposure light EL emitted from the imaging optical system 32 illuminates the irradiated surface Ra of the reticle R in a superimposed manner.
  • the shape of the opening 29a of the reticle blind 29 is rectangular as described above. Therefore, as shown in FIGS. 4A and 4B, the illumination area ER1 on the reticle R and the static exposure area ER2 on the wafer W are in the Y-axis direction as the first direction and short. Each is formed in a rectangular shape whose direction is the X-axis direction as the second direction.
  • the reticle stage 14 is arranged on the object plane side of the projection optical system 15 so that the mounting surface of the reticle R is substantially orthogonal to the optical axis direction (Z-axis direction) of the projection optical system 15.
  • the reticle stage 14 is provided with a reticle stage drive unit (not shown) that moves the held reticle R with a predetermined stroke in the X-axis direction.
  • the pupil intensity distribution measuring device 36 is a device that measures the pupil intensity distribution formed by each incident light incident on one point in the illumination area ER1 on the reticle R in the secondary light source 60 for each point (for each position).
  • the pupil intensity distribution measuring device 36 includes a beam splitter 37 that reflects part of the exposure light EL (also referred to as “reflected light”) emitted from the exit side lens group 35 toward the reticle R, and the beam splitter 37.
  • the detection unit 39 includes a CCD imaging device, a photodiode, and the like, and a detection signal corresponding to the incident reflected light is output from the detection unit 39 to the control device 40. And the control apparatus 40 derives
  • FIG. The pupil intensity distribution measuring device 36 is disclosed in, for example, Japanese Patent Application Laid-Open No. 2006-54328, Japanese Patent Application Laid-Open No. 2003-22967, and US Patent Publication No. 2003/0038225 corresponding thereto.
  • the projection optical system 15 includes a lens barrel 41 filled with an inert gas such as nitrogen, and a plurality of lenses (not shown) are provided in the lens barrel 41 along the optical path (Z-axis direction) of the exposure light EL. Is provided.
  • an aperture stop 42 is disposed in the lens barrel 41 at a position that is optically Fourier-transformed with the installation position of the surface Wa of the wafer W and the installation position of the irradiated surface Ra of the reticle R. Then, the image of the circuit pattern on the reticle R illuminated with the exposure light EL is projected and transferred onto the wafer W on the wafer stage 16 in a state reduced to a predetermined reduction magnification via the projection optical system 15. .
  • the optical path indicates a path through which the exposure light EL is intended to pass in the use state.
  • the wafer stage 16 includes a planar mounting surface 43 that is substantially orthogonal to the optical axis of the projection optical system 15, and the wafer W is mounted on the mounting surface 43.
  • the wafer stage 16 is provided with a wafer stage driving unit (not shown) that moves the wafer W to be held in the X-axis direction with a predetermined stroke. Further, the wafer stage 16 is provided with a function of finely adjusting the position of the wafer W so that the surface Wa of the wafer W is perpendicular to the optical axis of the projection optical system 15.
  • the reticle R is driven from the + X direction side to the ⁇ X direction side (near the paper surface in FIG. 1) by driving the reticle stage driving unit. From the side to the back side of the drawing) at every predetermined stroke. Then, the illumination area ER1 on the reticle R moves from the ⁇ X direction side of the irradiated surface Ra of the reticle R along the + X direction side (in FIG. 1, from the back side to the front side of the paper). That is, the pattern of the reticle R is sequentially scanned from the ⁇ X direction side to the + X direction side.
  • the wafer W is driven from the ⁇ X direction side to the + X direction side at a speed ratio corresponding to the reduction magnification of the projection optical system 15 with respect to the movement of the reticle R along the X-axis direction by driving the wafer stage driving unit. Move synchronously. As a result, a pattern having a shape obtained by reducing the circuit pattern on the reticle R to a predetermined reduction ratio is formed in one shot region of the wafer W in accordance with the synchronous movement of the reticle R and the wafer W. When the pattern formation on one shot area is completed, the pattern formation on the other shot areas of the wafer W is continuously performed.
  • the optical integrator 26 includes a pair of micro fly's eye lenses 50 and 51 arranged along the optical axis AX of the illumination optical system 13 (indicated by a one-dot chain line in FIGS. 1 and 2). ing. These micro fly's eye lenses 50 and 51 are respectively arranged so that the illumination pupil plane 27 located on the exit side of the optical integrator 26 is formed at a position optically conjugate with the aperture stop 42 of the projection optical system 15. Yes.
  • an incident surface 50a that is substantially orthogonal to the optical axis AX of the illumination optical system 13. , 51a are formed.
  • exit surfaces 50b and 51b that are substantially orthogonal to the optical axis AX of the illumination optical system 13 are formed, respectively.
  • a plurality of (10 in FIG. 2) cylindrical lens surfaces 52 and 53 extending in the Z-axis direction as the third direction are on the incident surfaces 50a and 51a side of both the micro fly's eye lenses 50 and 51.
  • Each of the cylindrical lens surfaces 52 and 53 is formed so as to have a shape obtained by cutting a part of a cylinder, and the length (that is, the width) of each cylindrical lens surface 52 and 53 in the X-axis direction is the first.
  • a plurality (10 in FIG. 2) of cylindrical lens surfaces 54 and 55 extending in the X-axis direction are arranged along the Z-axis direction on the exit surfaces 50b and 51b side of both the micro fly's eye lenses 50 and 51, respectively. ing.
  • Each of the cylindrical lens surfaces 54 and 55 is formed to have a shape obtained by cutting a part of a cylinder, and the length (that is, the width) of each cylindrical lens surface 54 and 55 in the Z-axis direction is the first.
  • the second width H2 is wider than the first width H1.
  • the first width H1 and the second width H2 are the length in the X-axis direction and the length in the Z-axis direction of the opening 29a of the reticle blind 29, that is, the length in the X-axis direction of the illumination area ER1 and the still exposure area ER2. And the length in the Y-axis direction correspond to each other.
  • the exposure light EL that is, the parallel light beam
  • the exposure light EL incident along the optical axis AX of the illumination optical system 13 is incident on the incident surface 50a of the first micro fly's eye lens 50.
  • Each of the cylindrical lens surfaces 52 is divided into wavefronts at intervals of the first width H1 along the X-axis direction.
  • the light beams divided by the respective cylindrical lens surfaces 52 are focused on the corresponding cylindrical lens surfaces among the respective cylindrical lens surfaces 53 formed on the incident surface 51a of the second micro fly's eye lens 51. After that, the light is condensed on the illumination pupil plane 27 located on the exit side of the optical integrator 26.
  • the exposure light EL that is, the parallel light beam
  • the exposure light EL incident along the optical axis AX of the illumination optical system 13
  • Wavefront division is performed at intervals of the second width H2 along the Z-axis direction by the cylindrical lens surfaces 54 formed on the surface 50b.
  • the light beams divided by the respective cylindrical lens surfaces 54 are condensed on the corresponding cylindrical lens surfaces among the respective cylindrical lens surfaces 55 formed on the exit surface 51b of the second micro fly's eye lens 51.
  • the light is condensed on the illumination pupil plane 27 located on the exit side of the optical integrator 26.
  • a large number of point light sources 78 are formed on the illumination pupil plane 27.
  • the first width H1 and the second width H2 of the cylindrical lens surfaces 52 to 55 of the micro fly's eye lenses 50 and 51 are originally very narrow. Therefore, the number of wavefront divisions in the optical integrator 26 of the present embodiment is larger than when a fly-eye lens composed of a plurality of lens elements is used.
  • the global light intensity distribution formed on the incident side of the optical integrator 26 and the global light intensity distribution of the entire secondary light source formed on the illumination pupil plane 27 on the exit side are highly correlated with each other. Show the relationship. Therefore, the light intensity distribution on the incident side of the optical integrator 26 and on a surface optically conjugate with the incident side can also be referred to as a pupil intensity distribution.
  • a diffractive optical element for annular illumination when used as the diffractive optical element 19, an annular illumination field around the optical axis AX of the illumination optical system 13 is formed on the incident side of the optical integrator 26.
  • an annular secondary light source 60 is formed on the illumination pupil plane 27 located on the exit side of the optical integrator 26, the same as the annular illumination field formed on the incident side.
  • a diffractive optical element for multipole illumination is used as the diffractive optical element 19
  • a plurality of predetermined shapes (arc shape, circular shape) around the optical axis AX of the illumination optical system 13 are provided on the incident side of the optical integrator 26.
  • a multipolar illuminating field is formed.
  • a multipolar secondary light source 60 is formed on the illumination pupil plane 27 located on the exit side of the optical integrator 26, the same as the multipolar illumination field formed on the incident side.
  • a diffractive optical element 19 for quadrupole illumination is used.
  • the secondary light source 60 includes an arcuate first surface light source 60a positioned on the + X direction side of the optical axis AX of the illumination optical system 13, and a ⁇ X direction side of the optical axis AX of the illumination optical system 13.
  • a second arc surface-shaped second surface light source 60b is provided, and the distance between the first surface light source 60a and the optical axis AX is substantially equal to the distance between the second surface light source 60b and the optical axis AX.
  • the secondary light source 60 includes an arcuate third surface light source 60c positioned on the + Z direction side of the optical axis AX of the illumination optical system 13, and a circle positioned on the ⁇ Z direction side of the optical axis AX of the illumination optical system 13.
  • An arcuate fourth surface light source 60d is provided, and the distance between the third surface light source 60c and the optical axis AX is substantially equal to the distance between the fourth surface light source 60d and the optical axis AX.
  • Each of the surface light sources 60a to 60d is composed of a number of point light sources 78 (see FIG. 9) formed on the illumination pupil plane 27 by the optical integrator 26.
  • each exposure light EL emitted from each of the surface light sources 60a to 60d is guided onto the reticle R, as shown in FIG. 4A, the longitudinal direction is on the Y-axis on the irradiated surface Ra of the reticle R.
  • a rectangular illumination region ER1 that is a direction and whose short direction is the X-axis direction is formed.
  • a rectangular still exposure region ER2 corresponding to the illumination region ER1 on the reticle R is formed on the surface Wa of the wafer W.
  • each of the quadrupole pupil intensity distributions formed by the incident light incident on each point in the still exposure region ER2 (and the illumination region ER1) does not depend on the position where the exposure light EL is incident on each other. It has almost the same shape.
  • the light intensity of the quadrupole pupil intensity distribution for each point in the still exposure region ER2 (and the illumination region ER1) tends to vary depending on the position of the exposure light EL incident on the still exposure region ER2. There is.
  • exposure light EL also referred to as “first incident light”
  • first incident light incident on center points P1a and P1b in the Y-axis direction in the illumination region ER1 and the static exposure region ER2.
  • the light intensity of the third surface light source 61c and the fourth surface light source 61d arranged along the Z-axis direction is the first surface arranged along the X-axis direction.
  • the peripheral points P2a, P3a, P2b which are separated from the center points P1a, P1b in the Y-axis direction in the illumination region ER1 and the still exposure region ER2.
  • Each exposure light EL incident on P3b (hereinafter, light incident on the peripheral point P2b is also referred to as “second incident light” and light incident on the peripheral point P3b is also referred to as “third incident light”).
  • the light intensity of the third surface light source 62c and the fourth surface light source 62d arranged along the Z-axis direction is the first surface light source 62a arranged along the X-axis direction and It tends to be weaker than the light intensity of the second surface light source 62b.
  • the pupil intensity distributions 61 and 62 referred to here are obtained when the correction filter 24 and light shielding members 68, 69, 70, and 71 to be described later are not arranged in the optical path of the exposure light EL in the illumination optical system 13. It shows the light intensity distribution corresponding to each point P1b, P2b, P3b in the still exposure region ER2 formed on the illumination pupil plane 27 and a pupil conjugate plane optically conjugate with the illumination pupil plane 27.
  • the light intensity distribution along the Z-axis direction of the first pupil intensity distribution 61 corresponding to the center points P1a and P1b has the weakest center in the Z-axis direction as shown in FIG.
  • the distribution is a concave curve that gradually becomes stronger as the distance from the first Z-axis increases along the Z-axis direction.
  • the light intensity distribution along the Z-axis direction of each second pupil intensity distribution 62 corresponding to each peripheral point P2a, P2b, P3a, P3b has a center in the Z-axis direction as shown in FIG.
  • the distribution is a convex curved surface that becomes the strongest and gradually weakens as the distance from the center along the Z-axis direction increases.
  • the light intensity distribution along the Z-axis direction of the pupil intensity distributions 61 and 62 hardly depends on the position of each point along the X-axis direction in the illumination region ER1 and the still exposure region ER2, but the illumination region ER1 and There is a tendency to change depending on the position of each point along the Y-axis direction in the still exposure region ER2. Therefore, when the pupil intensity distributions 61 and 62 individually corresponding to the points P1b, P2b, and P3b along the Y-axis direction in the still exposure region ER2 are not uniform, the line width of the pattern formed on the wafer W is set. Variations may occur. In order to solve such a problem, a correction filter 24 and a distribution correction unit 31 are provided in the illumination optical system 13 of the present embodiment.
  • the correction filter 24 of this embodiment dimmes the light flux that constitutes the third surface light source 60c and the fourth surface light source 60d along the Z-axis direction among the secondary light sources 60 formed on the illumination pupil plane 27. On the other hand, it has a transmittance distribution that hardly diminishes the light beams constituting the first surface light source 60a and the second surface light source 60b along the X-axis direction.
  • the distribution correction unit 31 includes a support member 65 having a square ring shape, and one of the cylindrical lens surfaces 54 supported by the support member 65 and on the exit side of the first micro fly's eye lens 50. And a light shielding part 66 as a light reducing part for shielding part of the exposure light EL that is to be incident on the lens surface of the part.
  • the support member 65 is formed with an opening 65 a having a shape surrounding the optical path of the exposure light EL that can enter the micro fly's eye lenses 50 and 51.
  • Surface light sources 67a and 67b individually corresponding to the surface light sources 60a to 60d formed on the illumination pupil plane 27 on the incident surface 50a of the first micro fly's eye lens 50 by the exposure light EL that has passed through the opening 65a. , 67c, 67d are formed.
  • the light shielding portion 66 includes a plurality of (four in the present embodiment) light shielding members 68, 69, 70, 71 as light-reducing members that extend along the X-axis direction that is the direction in which the cylindrical lens surfaces 54, 55 extend.
  • a moving mechanism 72 for individually moving the light shielding members 68 to 71 and an advance / retreat mechanism (not shown) for moving the light shielding members 68 to 71 forward and backward between the optical path of the exposure light EL and the outside of the optical path are provided. ing.
  • the moving mechanism 72 is provided with a plurality of drive sources 73, 74, 75, and 76 that individually correspond to the light shielding members 68 to 71, and each of the drive sources 73 to 76 responds to a control command from the control device 40. Each is driven based on this.
  • Each of the drive sources 73 to 76 has a first driving force for moving the light shielding members 68 to 71 in the Z-axis direction that is the width direction of the cylindrical lens surfaces 54 and 55, and the light shielding members 68 to 71 to the optical axis.
  • the second driving force for moving in the Y-axis direction which is the direction, can be applied to each light shielding member 68-71.
  • Each of the light shielding members 68 to 71 includes a plurality (two in the present embodiment) of first light shielding members 68 and 69 positioned on the + X direction side (right side in FIG. 8) of the optical axis AX of the illumination optical system 13, and illumination.
  • the optical system 13 is classified into a plurality (two in the present embodiment) of second light shielding members 70 and 71 located on the ⁇ X direction side (left side in FIG. 8) of the optical axis AX.
  • the first light shielding members 68 and 69 are light shielding members respectively disposed in the optical path of the exposure light EL that forms the first surface light source 67a on the incident surface 50a of the first micro fly's eye lens 50.
  • Each of the second light shielding members 70 and 71 is a light shielding member disposed in the optical path of the exposure light EL that forms the second surface light source 67b on the incident surface 50a of the first micro fly's eye lens 50.
  • the light shielding member 68 to 71 shields part of the exposure light EL that is about to enter the first micro fly's eye lens 50, thereby exposing the exposure light EL.
  • the light intensity of each of the first surface light source 67a and the second surface light source 67b is weakened as compared with the case where the light source is not arranged in the optical path.
  • each of the light shielding members 68 to 71 extends along a direction (X-axis direction in this embodiment) corresponding to the scanning direction (X-axis direction) of the wafer W and the reticle R at the time of exposure. Each is formed in a quadrangular prism shape. Each of the light shielding members 68 to 71 has a length (hereinafter referred to as “width”) D in the Z-axis direction orthogonal to the Y-axis direction, which is the optical axis direction, of the second width of the cylindrical lens surfaces 54 and 55. Each is formed so as to be narrower than H2.
  • the light shielding members 68 to 71 are formed such that their length in the Y-axis direction (hereinafter simply referred to as “length”) L is longer than their width D. Moreover, the length L and the width D of each of the light shielding members 68 to 71 satisfy the following conditional expression (Expression 1).
  • L is the length of the light shielding members 68 to 71
  • D is the width of the light shielding members 68 to 71
  • ⁇ is the incident angle of the exposure light with respect to the exit surface 50b of the first micro fly's eye lens 50.
  • the exposure light EL is always incident on the effective lens surface 77 regardless of the arrangement positions of the light shielding members 68 to 71.
  • the “effective lens surface 77” indicates a cylindrical lens surface on which the exposure light EL is incident among the cylindrical lens surfaces 54.
  • a parallel light beam is incident on the first micro fly's eye lens 50.
  • each incident light also referred to as a “light beam” constituting such a parallel light flux has an effective lens surface 77 with various incident angles ⁇ with respect to the exit surface 50 b of the first micro fly's eye lens 50.
  • the width D and the length L of each of the light shielding members 68 to 71 do not satisfy the conditional expression (Formula 1)
  • the exposure light EL that is about to enter the effective lens surface 77 is reflected on the effective lens surface 77. Since the light shielding members 68 to 71 are almost shielded from light, the exposure light EL may hardly enter. Therefore, each of the light shielding members 68 to 71 may be designed so as to satisfy the conditional expression (Expression 1).
  • each of the light shielding members 68 to 71 When each of the light shielding members 68 to 71 is disposed at a position corresponding to the boundary portion between the effective lens surfaces 77 adjacent in the Z-axis direction (hereinafter referred to as “boundary position”), as shown in FIG.
  • the light shielding members 68 to 71 allow the exposure light EL to enter the central portion of the effective lens surface 77 in the Z-axis direction, respectively.
  • each of the light shielding members 68 to 71 shields the exposure light EL that is about to enter both ends of the effective lens surface 77 in the Z-axis direction.
  • the exposure light EL is first incident light that forms the first surface light source 61a and the second surface light source 61b of the first pupil intensity distribution 61 corresponding to the center point P1b of the still exposure region ER2. Further, most of the exposure light EL shielded by each of the light shielding members 68 to 71 from the illumination pupil plane 27 in a state having a predetermined angle with respect to the optical axis AX of the illumination optical system 13 when not shielded. Light that is emitted.
  • the dimming degree of each incident light incident on each point in the still exposure region ER2 is the center in the Y-axis direction (that is, the center point P1b). Is the smallest, and gradually increases with increasing distance from the center along the Y-axis direction.
  • the light intensities of the point light sources 78 constituting the first surface light source 61a and the second surface light source 61b are the light shielding members 68 to 71, respectively. Are hardly dimmed by each.
  • each point light source 78 constituting the third surface light source 61c and the fourth surface light source 61d their light intensity is not dimmed by the light shielding members 68 to 71. That is, when the light shielding members 68 to 71 are arranged at the boundary positions, the properties of the first pupil intensity distribution 61 are hardly changed by the action of the light shielding members 68 to 71.
  • the light intensity of some point light sources 78A among the point light sources 78 constituting the first surface light source 62a and the second surface light source 62b is as follows.
  • the light is greatly reduced by the light shielding members 68 to 71, respectively.
  • the first surface light source 62a and the second surface light source 62b are greatly dimmed by the light shielding action of the light shielding members 68 to 71, respectively.
  • the light intensity thereof is not dimmed by the light shielding members 68 to 71.
  • the properties of the second pupil intensity distribution 62 are greatly changed by the action of the light shielding members 68 to 71.
  • the point light sources 78 and 78A are indicated by black circles ( ⁇ ). The size of these black circles indicates the intensity of light intensity for each of the point light sources 78 and 78A, and the light intensity of the point light source 78A having a large black circle size is stronger than the light intensity of the small point light source 78A.
  • each of the light shielding members 68 to 71 when each of the light shielding members 68 to 71 is disposed at a position corresponding to the central portion of the effective lens surface in the Z-axis direction (hereinafter referred to as “central position”), the light shielding members 68 to 71 shield the exposure light EL to be incident on the central portion of the effective lens surface 77 in the Z-axis direction.
  • each of the light shielding members 68 to 71 allows the exposure light EL to enter the both ends of the effective lens surface 77 in the Z-axis direction.
  • the dimming degree of each incident light incident on each point in the still exposure region ER2 is the center in the Y-axis direction (that is, the center point P1b). Is the largest, and gradually decreases with increasing distance from the center along the Y-axis direction.
  • the light intensity of a part of the point light sources 78A of the point light sources 78 constituting the first surface light source 61a and the second surface light source 61b is as follows. The light is greatly reduced by the light shielding members 68 to 71, respectively.
  • the first surface light source 61a and the second surface light source 61b are greatly dimmed by the light shielding action of the light shielding members 68 to 71, respectively.
  • the light intensity thereof is not dimmed by the light shielding members 68 to 71.
  • the properties of the first pupil intensity distribution 61 are greatly changed by the action of the light shielding members 68 to 71.
  • the light intensities of the point light sources 78 constituting the first surface light source 62a and the second surface light source 62b are caused by the light shielding members 68 to 71, respectively. Each is hardly dimmed.
  • their light intensity is not dimmed by the light shielding members 68 to 71. That is, when the light shielding members 68 to 71 are arranged at the central positions, the properties of the second pupil intensity distribution 62 hardly change due to the action of the light shielding members 68 to 71.
  • each of the light shielding members 68 to 71 is assumed to be disposed outside the optical path of the exposure light EL.
  • the diffractive optical element 19 emits the exposure light EL having a quadrilateral cross-sectional shape. Then, the exposure light EL passes through the correction filter 24 arranged at a position optically conjugate with the illumination pupil plane 27 or in the vicinity thereof. As a result, the illumination pupil plane 27 formed on the exit side of the optical integrator 26 is almost corrected by the correction filter 24 and the first and second surface light sources 60a and 60b corrected (dimmed) by the correction filter 24. A secondary light source 60 having a third surface light source 60c and a fourth surface light source 60d that are not formed is formed. At this time, the pupil intensity distribution of the pupil conjugate plane optically conjugate with the illumination pupil plane 27 is also corrected by the correction filter 24.
  • the correction filter 24 of the present embodiment reduces the light intensity of the third surface light source 60c and the fourth surface light source 60d along the Z-axis direction of the secondary light source 60 formed on the illumination pupil plane 27. It is a filter. As described above, in the first pupil intensity distribution 61 corresponding to the center points P1a and P1b in the illumination area ER1 of the reticle R and in the static exposure area ER2 on the wafer W, the correction filter is included in the optical path of the exposure light EL. 24, the light intensity of the first surface light source 61a and the second surface light source 61b along the X-axis direction is greater than the light intensity of the third surface light source 61c and the fourth surface light source 61d along the Z-axis direction.
  • the light intensity of the third surface light source 61c and the fourth surface light source 61d is approximately equal to the light intensity of each of the first surface light source 61a and the second surface light source 61b by the correction filter 24. It becomes.
  • the second pupil intensity distribution 62 corresponding to the peripheral points P2a, P2b, P3a, and P3b in the illumination area ER1 and the still exposure area ER2, the X axis is used when the correction filter 24 is not in the optical path of the exposure light EL.
  • Each light intensity of the first surface light source 62a and the second surface light source 62b along the direction is stronger than each light intensity of the third surface light source 62c and the fourth surface light source 62d along the Z-axis direction. Therefore, in the second pupil intensity distribution 62, the difference between the light intensity of the first surface light source 61a and the second surface light source 62b and the light intensity of each of the third surface light source 62c and the fourth surface light source 62d is caused by the correction filter 24. On the contrary, it will become bigger.
  • the pupil intensity distribution measuring device 36 measures the light intensity of the quadrupole pupil intensity distribution for each point in the still exposure region ER2 in the secondary light source 60 formed on the illumination pupil plane 27. Is done.
  • the second pupil intensity distribution 62 is measured.
  • the first pupil intensity distribution 61 and the second pupil intensity distribution 62 have different properties. Therefore, the light shielding members 68 to 71 are arranged in the optical path of the exposure light EL incident on the optical integrator 26 by driving the advance / retreat mechanism. At this time, the light shielding members 68 to 71 are arranged at the central positions.
  • the light intensities of the first surface light source 61a and the second surface light source 61b of the first pupil intensity distribution 61 are greatly reduced by the light shielding members 68 to 71, respectively.
  • the light intensities of the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 are hardly dimmed by the light shielding members 68 to 71, respectively (see FIGS. 13A and 13B). ). Therefore, the difference between the property of the first pupil intensity distribution 61 and the property of the second pupil intensity distribution 62 is conversely larger than before the light shielding members 68 to 71 are arranged in the optical path of the exposure light EL. turn into.
  • the light shielding members 68 to 71 are moved in the Z-axis direction. Move each one. Then, of the first incident light to be incident on the first surface light source 67a and the second surface light source 67b, the amount of light shielded by the light shielding members 68 to 71 is arranged at the central position. Less than if On the other hand, of the second incident light and the third incident light to be incident on the first surface light source 67a and the second surface light source 67b, the light amounts shielded by the light shielding members 68 to 71 are respectively arranged at the central positions. It will be much larger than the case.
  • each of the light shielding members 68 to 71 attempts to pass through the first surface light source 61a and the second surface light source 61b of the first pupil intensity distribution 61 with respect to the center point P1b of the still exposure region ER2.
  • the amount of the first incident light is only slightly attenuated by the light shielding members 68-71. That is, in the first pupil intensity distribution 61, each light intensity of the first surface light source 61a and the second surface light source 61b is compared with the case where the light shielding members 68 to 71 are not arranged in the optical path of the exposure light EL.
  • the light intensity of the third surface light source 61c and the fourth surface light source 61d does not change.
  • each of the light shielding members 68 to 71 when each of the light shielding members 68 to 71 is disposed at the boundary position, it tries to pass through the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 with respect to the peripheral point P2b of the still exposure region ER2.
  • the amount of the second incident light to be reduced is greatly reduced by the light shielding members 68-71.
  • the light amounts of the third incident lights to be incident on the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 with respect to the peripheral point P3b of the still exposure region ER2 are the light shielding members 68 to 71, respectively.
  • the light shielding members 68 to 71 are not arranged in the optical path of the exposure light EL.
  • the light intensities of the third surface light source 62c and the fourth surface light source 62d do not change.
  • the properties of the first pupil intensity distribution 61 and the properties of the second pupil intensity distribution 62 are substantially identical to each other. That is, the light intensity of each first incident light incident on the center point P1b of the stationary exposure region ER2 from each surface light source 61a to 61d and the light incident on each peripheral point P2b and P3b of the stationary exposure region ER2 from each surface light source 62a to 62d.
  • the light intensity of each of the second incident light and each of the third incident light is substantially the same light intensity.
  • the pupil intensity distributions 61 and 62 corresponding to the points P1b, P2b, and P3b along the Y-axis direction in the static exposure region ER2 on the wafer W are substantially identical. Therefore, the occurrence of variations in the line width of the pattern formed on the surface Wa of the wafer W is suppressed.
  • a part of the exposure light EL that is to be incident on a part of the cylindrical lens surfaces 52 of each cylindrical lens surface 52 of the first micro fly's eye lens 50 is shielded by the light shielding unit 66. Due to the light shielding action by the light shielding unit 66, the pupil intensity distributions 61 and 62 corresponding to the respective points on the surface Wa on the wafer W are independently adjusted. Therefore, the light intensity distribution at each point on the wafer W can be adjusted to distributions having substantially the same properties.
  • each point P1b ⁇ in the static exposure region ER2 on the wafer W is located at a position optically conjugate with the surface Wa of the wafer W on the light source device 12 side of the optical integrator 26.
  • a correction filter 24 is provided for uniformly adjusting the pupil intensity distributions 61 and 62 corresponding to P3b.
  • the pupil intensity distributions 61 and 62 corresponding to the points P1b to P3b in the still exposure region ER2 are adjusted to be substantially uniform by the cooperation of the correction filter 24 and the light shielding unit 66.
  • the pupil intensity distributions 61 and 62 corresponding to the points P1b to P3b in the still exposure region ER2 can be adjusted with higher precision than when the correction filter 24 is not arranged in the optical path of the exposure light EL. Therefore, it is possible to perform exposure processing on the wafer W under an appropriate illumination condition according to the circuit pattern of the reticle R. As a result, the wafer W is faithfully provided with a pattern having a desired line width over the entire wafer W. Can be formed.
  • the light shielding part 66 of the present embodiment includes a plurality of light shielding members 68 to 71 extending along the X-axis direction. Then, by disposing the light shielding members 68 to 71 in the optical path of the exposure light EL, the pupil intensity distribution 61 corresponding to the points P1b to P3b along the Y-axis direction among the points in the still exposure region ER2. , 62 can be adjusted respectively.
  • each of the light shielding members 68 to 71 has a configuration that does not satisfy the conditional expression (Equation 1), each light shielding member 68 to 71 is placed in each effective lens surface 77 in the optical path of the exposure light EL. There is a possibility that there is an effective lens surface where the exposure light EL is not incident at all. In such a case, the pupil intensity distributions 61 and 62 corresponding to all the points P1b to P3b in the still exposure region ER2 are uniformly changed. In other words, the pupil intensity distributions 61 and 62 corresponding to the points P1b to P3b in the still exposure region ER2 cannot be adjusted independently.
  • each of the light shielding members 68 to 71 is configured to satisfy the conditional expression (Expression 1). Therefore, the exposure light EL always enters the effective lens surface 77 even if the light shielding members 68 to 71 are arranged in the optical path of the exposure light EL. Therefore, the pupil intensity distributions 61 and 62 corresponding to the points P1b to P3b along the Y-axis direction in the still exposure region ER2 can be adjusted independently.
  • each of the light shielding members 68 to 71 is movable along the Y-axis direction and the Z-axis direction. Therefore, by moving the respective light shielding members 68 to 71 along the Y-axis direction and the Z-axis direction in the optical path of the exposure light EL, each point along the Y-axis direction among the points within the still exposure region ER2 is obtained.
  • the pupil intensity distributions 61 and 62 corresponding to P1b to P3b can be adjusted in high detail.
  • the light shielding members 68 to 71 correspond to the measurement results calculated based on the detection signal from the pupil intensity distribution measuring device 36, that is, the points P1a to P3a in the illumination region ER1 of the reticle R. And move along the Z-axis direction based on the pupil intensity distributions 61 and 62 respectively. For this reason, when the pupil intensity distributions 61 and 62 change due to deterioration of at least one of the various optical elements constituting the illumination optical system 13, the light shielding is performed according to the measurement result by the pupil intensity distribution measuring device 36. By moving the members 68 to 71 in the Y-axis direction and the Z-axis direction, the pupil intensity distributions 61 and 62 can be quickly adjusted so that their property distributions become the desired property distributions. .
  • each cylindrical lens surface 52 On the incident side of each cylindrical lens surface 52, a plurality of light shielding members 68 to 71 extending along the X-axis direction corresponding to the scanning direction of the wafer W and the reticle R at the time of exposure are arranged. Each of the light shielding members 68 to 71 adjusts the amount of exposure light EL incident on the effective lens surface 77 of each cylindrical lens surface 54 to thereby adjust the Y axis direction among the points in the still exposure region ER2.
  • the pupil intensity distributions 61 and 62 corresponding to the along points P1b to P3b can be adjusted.
  • the distribution correction unit 31 ⁇ / b> A is configured so that the exposure light EL incident on the effective lens surface 77 among the cylindrical lens surfaces 54 formed on the exit surface 50 b of the first micro fly's eye lens 50.
  • a light blocking part 66A is provided as a light reducing part for reducing the light intensity.
  • an accommodation groove 86 extending along the X-axis direction is formed at a boundary portion between the effective lens surfaces 77 adjacent to each other in the Z-axis direction.
  • the boundary portion between the effective lens surfaces 77 adjacent to each other in the Z-axis direction is formed with a receiving groove 86.
  • Each of the receiving grooves 86 is formed so as to extend from the end on the + X direction side of the first micro fly's eye lens 50 to the end on the ⁇ X direction side.
  • the light shielding portion 66A includes a plurality of (two in FIG. 13) square columnar light shielding members 87 as light reducing members extending along the X-axis direction.
  • Each of these light shielding members 87 is formed such that the width D, which is the length in the Z-axis direction, and the length L in the Y-axis direction satisfy the conditional expression (Formula 1). Further, the length of each light shielding member 87 in the X-axis direction is equal to or longer than the width of the first micro fly's eye lens 50 in the X-axis direction.
  • each light shielding member 87 is provided in the light shielding portion 66A between each housing groove 86 individually corresponding to each light shielding member 87 and outside the optical path of the exposure light EL (that is, outside the first micro fly's eye lens 50).
  • An advancing / retreating device (not shown) is provided for advancing and retracting between them.
  • most of the exposure light EL shielded by each light shielding member 87 is emitted from the illumination pupil plane 27 in a state having a predetermined angle with respect to the optical axis AX of the illumination optical system 13 when not shielded.
  • the light that is That is, when most of the exposure light EL is not shielded, the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 corresponding to the peripheral points P2b and P3b of the still exposure region ER2.
  • most of the exposure light EL that is not shielded by each light shielding member 87 is light emitted from the illumination pupil plane 27 along the optical axis AX of the illumination optical system 13. That is, the exposure light EL is first incident light that forms the first surface light source 61a and the second surface light source 61b of the first pupil intensity distribution 61 corresponding to the center point P1b of the still exposure region ER2.
  • each light intensity of the first surface light source 61a and the second surface light source 61b of the first pupil intensity distribution 61 with respect to the center point P1b of the still exposure region ER2 is slightly decreased by each light shielding member 87. It is only dimmed. That is, in the first pupil intensity distribution 61, each light intensity of the first surface light source 61a and the second surface light source 61b is different from that in the case where each light shielding member 87 is not disposed in the optical path of the exposure light EL. The light intensity of each of the third surface light source 61c and the fourth surface light source 61d does not change as it becomes slightly weaker.
  • each second incident light that attempts to pass through the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 with respect to the peripheral point P2b of the still exposure region ER2 is greatly increased by each light shielding member 87. Dimmed.
  • the amount of each third incident light that is to enter the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 with respect to the peripheral point P3b of the still exposure region ER2 is greatly increased by each light shielding member 87. It will be fading.
  • each light intensity of the first surface light source 62a and the second surface light source 62b is higher than when each light shielding member 87 is not disposed in the optical path of the exposure light EL.
  • Each of the light sources of the third surface light source 62c and the fourth surface light source 62d does not change.
  • the properties of the first pupil intensity distribution 61 and the properties of the second pupil intensity distribution 62 are substantially the same.
  • each cylindrical lens surface 54 On the incident side of each cylindrical lens surface 54, a plurality of light shielding members 87 extending along the X-axis direction are arranged. These light shielding members 87 are arranged along the Y-axis direction among the respective points in the still exposure region ER2 by adjusting the amount of exposure light EL incident on the effective lens surface 77 of each cylindrical lens surface 54. The pupil intensity distributions 61 and 62 corresponding to the points P1b to P3b can be adjusted.
  • the light blocking member 87 of the present embodiment can be arranged in both the optical path of the exposure light EL that forms the first surface light source 67a and the optical path of the exposure light EL that forms the second surface light source 67b. Therefore, when the light intensity of the first surface light source 62a and the second surface light source 62b of the second pupil intensity distribution 62 is weakened, it is not necessary to provide a light shielding member for each surface light source. That is, the light shielding member for the first surface light source can be used for the second surface light source. Therefore, compared to the case of the first embodiment, it is possible to contribute to a reduction in the number of parts of the distribution correction unit 31A.
  • the diffractive optical element 19 may be a diffractive optical element for multipole illumination (for example, for quadrupole illumination) or a diffractive optical element for annular illumination.
  • the optical element can change the shape of the exposure light EL
  • another arbitrary optical element such as an axicon lens pair is arranged instead of or in addition to the diffractive optical element 19. May be.
  • An illumination optical system including an axicon lens pair is disclosed in, for example, International Publication No. 2005 / 076045A1 and corresponding US Patent Application Publication No. 2006 / 0170901A.
  • an axicon lens pair can be disposed in the vicinity of the correction filter 24.
  • the diffractive optical element 19 is composed of a large number of minute element mirrors arranged in an array and whose inclination angle and inclination direction are individually controlled to divide the incident light beam into minute units for each reflecting surface.
  • a spatial light modulation element that converts the cross section of the light beam into a desired shape or a desired size by deflecting the light beam may be used.
  • An illumination optical system using such a spatial light modulator is disclosed in, for example, Japanese Patent Application Laid-Open No. 2002-353105.
  • the pupil intensity distribution measuring device 36 can measure the pupil intensity distributions 61 and 62 corresponding to the points P1a, P2a, and P3a in the illumination area ER1 on the reticle R, It may not be near. However, the pupil intensity distribution measuring device 36 may be installed at an arbitrary position as long as it is in the vicinity of a position optically conjugate with the irradiated surface Ra of the reticle R (that is, the surface Wa of the wafer W).
  • the moving mechanism 72 may not be configured to be driven in conjunction with the measurement result by the pupil intensity distribution measuring device 36. That is, the measurement result of the pupil intensity distribution measuring device 36 is displayed on a display screen such as a monitor (not shown), and the operator moves the light shielding members 68 to 71 on the Y axis direction or the X axis based on the measurement result displayed on the display screen. You may make it move individually along a direction. In this case, the moving mechanism 72 does not have to be provided with the drive sources 73 to 76. That is, each of the light shielding members 68 to 71 is moved manually by the operator.
  • the light shielding members 68 and 69 may be moved along the X-axis direction.
  • the respective light shielding members 68 and 69 are arranged at the boundary positions, when the light intensity of the first surface light source 62a of the second pupil intensity distribution 62 is to be slightly increased, as shown in FIG.
  • At least one of the members 68 is moved to the + X direction side.
  • the respective amounts of the second incident light and the second incident light (exposure light EL) passing through the first surface light source 62a of the second pupil intensity distribution 62 are determined by the respective first light shielding members 68 in the optical path of the exposure light EL. This is less than before at least one displacement is performed.
  • the distribution correction unit 31 may be provided with an arbitrary number (for example, four) of first light shielding members other than two. Further, the distribution correction unit 31 may have a configuration in which an arbitrary number (for example, three) of second light shielding members other than two is provided.
  • the distribution correction unit 31A may have a configuration in which an arbitrary number (for example, one) of light shielding members 87 other than two is provided.
  • the installation positions of the light shielding members 68 to 71 and 87 may be fixed in the optical path of the exposure light EL. In this case, the light shielding members 68 to 71 and 87 are immovable.
  • a light shield extending along the Z-axis direction is formed on the incident side of the first micro fly's eye lens 50.
  • a member may be provided. If comprised in this way, the pupil intensity distribution corresponding to each point in the X-axis direction substantially orthogonal to the scanning direction in the still exposure region ER2 can be adjusted.
  • the Z-axis is formed at the boundary portion of each incident surface 50a on the incident side of the first micro fly's eye lens 50.
  • You may provide the light-shielding member extended along a direction.
  • the light shielding member may be provided over the entire effective area (area through which the light beam can pass) of the first micro fly's eye lens 50.
  • the optical integrator 26 may be configured by a single micro fly's eye lens in which unit wavefront dividing surfaces having refractive power are arranged along the Z direction and the X direction.
  • a fly-eye lens in which a plurality of lens elements are arranged may be used as the optical integrator.
  • a pair of fly-eye mirrors in which a plurality of mirror surfaces are arranged may be used as the optical integrator.
  • the exposure apparatus 11 may be embodied as a maskless exposure apparatus using a variable pattern generator (for example, DMD (Digital Mirror Device or Digital Mirror Micro-mirror Device)).
  • a variable pattern generator for example, DMD (Digital Mirror Device or Digital Mirror Micro-mirror Device)
  • DMD Digital Mirror Device or Digital Mirror Micro-mirror Device
  • Such a maskless exposure apparatus is disclosed in, for example, Japanese Patent Application Laid-Open No. 2004-304135, International Patent Publication No. 2006/080285, and US Patent Publication No. 2007/0296936 corresponding thereto.
  • a method of filling the liquid in the optical path between the projection optical system and the photosensitive substrate a method of locally filling the liquid as disclosed in International Publication No. WO99 / 49504, A method of moving a stage holding a substrate to be exposed as disclosed in Japanese Patent Laid-Open No. 6-124873 in a liquid bath, or a stage having a predetermined depth on a stage as disclosed in Japanese Patent Laid-Open No. 10-303114.
  • a technique of forming a liquid tank and holding the substrate in the liquid tank can be employed.
  • the exposure apparatus 11 manufactures a reticle or mask used in not only a microdevice such as a semiconductor element but also a light exposure apparatus, an EUV exposure apparatus, an X-ray exposure apparatus, and an electron beam exposure apparatus. Therefore, an exposure apparatus that transfers a circuit pattern from a mother reticle to a glass substrate or a silicon wafer may be used.
  • the exposure apparatus 11 is used for manufacturing a display including a liquid crystal display element (LCD) and the like, and is used for manufacturing an exposure apparatus that transfers a device pattern onto a glass plate, a thin film magnetic head, and the like. It may be an exposure apparatus that transfers to a wafer or the like, and an exposure apparatus that is used to manufacture an image sensor such as a CCD.
  • LCD liquid crystal display element
  • the exposure apparatus 11 may be embodied as a scanning stepper that transfers the pattern of the reticle R to the wafer W with the reticle R and the wafer W relatively moved, and sequentially moves the wafer W stepwise. .
  • the light source device 12 includes, for example, g-line (436 nm), i-line (365 nm), KrF excimer laser (248 nm), F 2 laser (157 nm), Kr 2 laser (146 nm), Ar 2 laser (126 nm) Or the like.
  • the light source device 12 amplifies the infrared or visible single wavelength laser light oscillated from the DFB semiconductor laser or fiber laser, for example, with a fiber amplifier doped with erbium (or both erbium and ytterbium).
  • a light source capable of supplying harmonics converted into ultraviolet light using a nonlinear optical crystal may be used.
  • the exposure apparatus 11 may be embodied as an EUV exposure apparatus that uses extreme ultraviolet light that is a soft X-ray region having a wavelength of about 100 nm or less, that is, EUV (Extreme Ultraviolet light) as the exposure light EL.
  • the exposure apparatus 11 includes a chamber whose interior is set to a vacuum atmosphere, and an illumination optical system 13, a reticle stage 14, a projection optical system 15, and a wafer stage 16 are disposed in the chamber.
  • the illumination optical system 13 and the projection optical system 15 are each composed of a reflective optical element, and the reticle R is a reflective reticle.
  • the light shielding member is arranged on the light source side of the fly eye mirror located on the light source side of the pair of fly eye mirrors of the illumination optical system 13.
  • FIG. 16 is a flowchart illustrating a manufacturing example of a micro device (a semiconductor chip such as an IC or LSI, a liquid crystal panel, a CCD, a thin film magnetic head, a micro machine, or the like).
  • a micro device a semiconductor chip such as an IC or LSI, a liquid crystal panel, a CCD, a thin film magnetic head, a micro machine, or the like.
  • step S101 design step
  • function / performance design of a micro device for example, circuit design of a semiconductor device
  • a pattern design for realizing the function is performed.
  • step S102 mask manufacturing step
  • a mask reticle R or the like
  • step S103 substrate manufacturing step
  • a substrate a wafer W when a silicon material is used
  • a material such as silicon, glass, or ceramics.
  • step S104 substrate processing step
  • step S105 device assembly step
  • step S105 includes processes such as a dicing process, a bonding process, and a packaging process (chip encapsulation) as necessary.
  • step S106 inspection step
  • inspections such as an operation confirmation test and a durability test of the microdevice manufactured in step S105 are performed. After these steps, the microdevice is completed and shipped.
  • FIG. 17 is a diagram illustrating an example of a detailed process of step S104 in the case of a semiconductor device.
  • step S111 oxidation step
  • step S112 CVD step
  • step S113 electrode formation step
  • step S114 ion implantation step
  • ions are implanted into the substrate.
  • step S115 resist formation step
  • step S116 exposure step
  • step S116 exposure step
  • step S117 development step
  • step S118 etching step
  • step S119 resist removal step
  • the photosensitive material that has become unnecessary after the etching is removed. That is, in step S118 and step S119, the surface of the substrate is processed through the mask layer.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

La présente invention porte sur un système optique d'éclairage, sur un appareil d'exposition et sur un procédé de fabrication d'un dispositif qui peuvent régler la répartition d'intensité de lumière sur le plan qui doit être éclairé. Le système optique d'éclairage comprend : un intégrateur optique (26) qui a une pluralité de surfaces de lentille cylindriques (54) agencées dans un plan incident croisant l'axe optique du système optique d'éclairage et une pluralité de surfaces de lentille cylindriques (55) agencées dans un plan d'émission croisant l'axe optique plus loin vers le côté d'émission que les surfaces de lentille cylindriques (54) et qui forme une distribution d'intensité de lumière prédéterminée sur un plan de pupille d'éclairage (27) dans le trajet optique d'éclairage du système optique d'éclairage lorsque la lumière d'exposition (EL) est incidente ; et une unité de protection contre la lumière (66) qui est agencée au niveau du côté incident de chacune des surfaces de lentille cylindriques (54) et qui protège contre une partie de la lumière d'exposition (EL) incidente sur certaines des surfaces de lentille cylindriques (54). L'unité de protection contre la lumière (66) a des éléments de protection contre la lumière (68, 69) ayant une longueur dans la direction de l'axe Y plus importante que la largeur dans la direction de l'axe Z croisant la direction de l'axe Y dans le plan croisant l'axe optique.
PCT/JP2009/067925 2008-12-25 2009-10-16 Système optique d'éclairage, appareil d'exposition et procédé de fabrication d'un dispositif WO2010073801A1 (fr)

Applications Claiming Priority (2)

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JP2008331511 2008-12-25
JP2008-331511 2008-12-25

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WO2010073801A1 true WO2010073801A1 (fr) 2010-07-01

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001352429A (ja) * 2000-04-05 2001-12-21 Rohm Co Ltd レンズアレイユニットおよびこれを備えた光学装置
JP2002237442A (ja) * 2001-02-09 2002-08-23 Ushio Inc 照度分布均一化フィルタを備えた光照射装置
JP2004056103A (ja) * 2002-05-27 2004-02-19 Nikon Corp 照明光学装置、露光装置および露光方法
JP2004055856A (ja) * 2002-07-19 2004-02-19 Canon Inc 照明装置、それを用いた露光装置及びデバイス製造方法
JP2008235361A (ja) * 2007-03-16 2008-10-02 Nikon Corp オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法
JP2009260337A (ja) * 2008-04-14 2009-11-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001352429A (ja) * 2000-04-05 2001-12-21 Rohm Co Ltd レンズアレイユニットおよびこれを備えた光学装置
JP2002237442A (ja) * 2001-02-09 2002-08-23 Ushio Inc 照度分布均一化フィルタを備えた光照射装置
JP2004056103A (ja) * 2002-05-27 2004-02-19 Nikon Corp 照明光学装置、露光装置および露光方法
JP2004055856A (ja) * 2002-07-19 2004-02-19 Canon Inc 照明装置、それを用いた露光装置及びデバイス製造方法
JP2008235361A (ja) * 2007-03-16 2008-10-02 Nikon Corp オプティカルインテグレータ、照明光学装置、露光装置、およびデバイス製造方法
JP2009260337A (ja) * 2008-04-14 2009-11-05 Nikon Corp 照明光学系、露光装置、およびデバイス製造方法

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