WO2009156346A1 - Système d’éclairage à led pour un système de contrôle électrique - Google Patents
Système d’éclairage à led pour un système de contrôle électrique Download PDFInfo
- Publication number
- WO2009156346A1 WO2009156346A1 PCT/EP2009/057671 EP2009057671W WO2009156346A1 WO 2009156346 A1 WO2009156346 A1 WO 2009156346A1 EP 2009057671 W EP2009057671 W EP 2009057671W WO 2009156346 A1 WO2009156346 A1 WO 2009156346A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- led lighting
- illumination
- led
- lighting system
- dark field
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/12—Condensers affording bright-field illumination
- G02B21/125—Condensers affording bright-field illumination affording both dark- and bright-field illumination
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/06—Means for illuminating specimens
- G02B21/08—Condensers
- G02B21/082—Condensers for incident illumination only
- G02B21/084—Condensers for incident illumination only having annular illumination around the objective
Definitions
- the invention relates generally to the testing of electronic assemblies, as well as the testing of devices that are applied, for example, on a wafer.
- the objects positioned on a support are checked in such a way that they are moved under a microscope and the object position can be determined by optical analysis.
- the contact position for the electrical measurement is determined. Then the positions for the electrical measurement are approached. A chuck / workpiece carrier with wafer and measuring needles are moved towards each other until the electrical contact is made safely.
- the invention has for its object to equip microscope-based tests on electronic assemblies with optimized lighting.
- the invention is based on the finding that methods which are based on microscopic images can be replaced by light-emitting diodes (LED) instead of illumination by halogen lamps. These are optimally positioned in the lighting system, whereby a combination of LEDs or LED groups is formed for different types of lighting.
- the individual associated lighting units can be positioned at different positions in the lighting system.
- the illumination system consists of a combination of differently positioned LEDs as light sources, wherein advantageously one LED illumination unit for the bright field illumination, one LED illumination unit for the near dark field illumination and another LED illumination unit for the far-away dark field illumination is responsible.
- An LED illumination for generating a bright field is optimally coupled sideways into the imaging beam path and is thus positioned in the illumination direction in front of the lens of the system.
- the LED units are each in the direction of illumination positioned behind the lens and form an annular or square frame around the illumination beam path.
- a frame with a smaller diameter is provided, and a frame with a larger diameter is provided for illumination in the distant dark field.
- the individual LEDs are advantageously evenly distributed over a frame or a ring.
- the lenses are optimized so that they emit in a range of +/- 10 ° around a surface normal.
- the imaging beam path advantageously has the same diameter as an object to be imaged.
- the figure shows a measurement setup for an LED lighting system, wherein three separately positioned lighting units for each three different types of lighting are optimally positioned.
- the system consists of a combination of different light sources for the brightfield, the near darkfield and the farfield darkfield illumination.
- the light sources used are white LEDs (light-emitting diodes). Their light is guided via optics onto the object to be viewed with the camera.
- the bright field illumination 3 is generated by the coupling of the light beams via a beam splitter in the imaging beam path.
- a dark field illumination is optimally generated by direct illumination arrangements 1, 2 relative to the imaging beam path 4 behind the objective 7.
- a light source for the near and the far-dark field are also used white emitting LEDs.
- the illumination for the generation of a near dark field consists of LEDs and an optical system, wherein the LEDs and the optics are positioned on a ring with the ring width of 1 to 5 mm around the imaging beam path.
- the imaging beam path has the diameter of the object to be imaged.
- the cross section of the usable beam path is rectangular in shape in accordance with the figure.
- the illumination of the near dark field is positioned within a frame with the frame width of 1 to 5 mm around the rectangular cross section of the beam path.
- the LEDs used have a lens for producing a beam lobe calculated with an opening of +/- 10 ° from the surface normal. At the edge of this opening angle is the
- the angle of 0 ° is identical to the solder on the radiating surface of an LED.
- the lenses of the LEDs are centered around the realization of this radiation characteristic in such a way that the resulting flat surface has the size of the LED chip.
- the polished surfaces have approximately the same solder as the radiating chip surface.
- the LEDs are bent in such a way that for a sufficient number of LEDs the solder of the ab- radiating surface is directed to the object to be illuminated.
- the illumination for the generation of a bright field, for the near dark field and for the distant dark field can be activated separately.
- the light intensity can be varied by the electrical current fed into the light-emitting diodes.
- LEDs have a very long service life, so that no change of the light sources will be necessary for a long time.
- LEDs are very compact, so small LEDs can be placed directly between the lens and the object being imaged. The object can be illuminated almost directly in the dark field, which improves the quality of the object illumination and simplifies the automatic image analysis.
- the figure shows an object to be illuminated and tested in the form of the wafer 14.
- This is mounted on a chuck 15 and can be moved relative to the microscope with a corresponding drive.
- illumination units 1, 2, 3 are provided at different positions, so that different types of illumination are possible. These can be activated individually or in total.
- the bright field illumination 3 can be introduced via a beam splitter 6, the imaging beam 4. Rays reflected back from the object, wafer 14, are picked up by the camera 5 and subjected to image analysis. Based on this, a lighting control or a lighting adjustment can take place.
- the higher-level control of the test system can via the drive control means of the measuring units, consisting of measuring plate 10, measuring spider 11, measuring card 12, measuring needle 13, the wafer or applied to the wafer Check electronic components by appropriate contact with the measuring needle tips 13.
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Microscoopes, Condenser (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
L’invention concerne un éclairage à LED pour un appareil de contrôle optique comprenant une optique de microscope (8) pour générer une représentation microscopique. Selon l’invention, l’éclairage à LED comprend une pluralité d’unités à LED (1, 2, 3) pour éclairer l’échantillon en différentes positions sur l’appareil de contrôle. L’éclairage à LED présente au moins deux unités d’éclairage à LED ((1, 2, 3) positionnées à des endroits différents pour générer des modes d’éclairage différents, lesquels servent respectivement à un éclairage dans le champ sombre lointain, à un éclairage dans le champ sombre proche et à un éclairage dans le champ clair.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP09769195A EP2291699A1 (fr) | 2008-06-26 | 2009-06-19 | Système d éclairage à led pour un système de contrôle électrique |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008030425.5 | 2008-06-26 | ||
DE200810030425 DE102008030425A1 (de) | 2008-06-26 | 2008-06-26 | LED-Beleuchtungssystem für ein elektrisches Prüfsystem |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009156346A1 true WO2009156346A1 (fr) | 2009-12-30 |
Family
ID=41010249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/057671 WO2009156346A1 (fr) | 2008-06-26 | 2009-06-19 | Système d’éclairage à led pour un système de contrôle électrique |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2291699A1 (fr) |
DE (1) | DE102008030425A1 (fr) |
WO (1) | WO2009156346A1 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3926385B1 (fr) * | 2020-06-16 | 2024-05-15 | Carl Zeiss Microscopy GmbH | Microscope numérique et ensemble microscopique |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3906555A1 (de) * | 1989-03-02 | 1989-07-06 | Zeiss Carl Fa | Auflicht-objektbeleuchtungseinrichtung |
WO2002082011A1 (fr) * | 2001-04-03 | 2002-10-17 | Werth Messtechnik Gmbh | Dispositif d'eclairage et procede d'eclairage d'un objet |
EP1363153A1 (fr) * | 2002-05-17 | 2003-11-19 | Mitutoyo Corporation | Illuminateur annulaire |
US20040190132A1 (en) * | 2003-03-19 | 2004-09-30 | Axel Laschke | Control unit for mixed light illumination, especially for microscopy |
EP1933187A1 (fr) * | 2006-12-07 | 2008-06-18 | Alcon RefractiveHorizons, Inc. | Système d'illumination pour microscope chirurgical |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5690417A (en) * | 1996-05-13 | 1997-11-25 | Optical Gaging Products, Inc. | Surface illuminator with means for adjusting orientation and inclination of incident illumination |
DE10128476C2 (de) * | 2001-06-12 | 2003-06-12 | Siemens Dematic Ag | Optische Sensorvorrichtung zur visuellen Erfassung von Substraten |
US20040070990A1 (en) * | 2002-10-01 | 2004-04-15 | Witold Szypszak | LED illuminator and method of manufacture |
DE10356384A1 (de) * | 2003-12-03 | 2005-06-30 | E. Zoller GmbH & Co. KG Einstell- und Messgeräte | Werkzeugbeleuchtungsvorrichtung |
US20080024794A1 (en) * | 2004-06-04 | 2008-01-31 | Yoko Miyazaki | Semiconductor Surface Inspection Apparatus and Method of Illumination |
-
2008
- 2008-06-26 DE DE200810030425 patent/DE102008030425A1/de not_active Ceased
-
2009
- 2009-06-19 WO PCT/EP2009/057671 patent/WO2009156346A1/fr active Application Filing
- 2009-06-19 EP EP09769195A patent/EP2291699A1/fr not_active Withdrawn
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3906555A1 (de) * | 1989-03-02 | 1989-07-06 | Zeiss Carl Fa | Auflicht-objektbeleuchtungseinrichtung |
WO2002082011A1 (fr) * | 2001-04-03 | 2002-10-17 | Werth Messtechnik Gmbh | Dispositif d'eclairage et procede d'eclairage d'un objet |
EP1363153A1 (fr) * | 2002-05-17 | 2003-11-19 | Mitutoyo Corporation | Illuminateur annulaire |
US20040190132A1 (en) * | 2003-03-19 | 2004-09-30 | Axel Laschke | Control unit for mixed light illumination, especially for microscopy |
EP1933187A1 (fr) * | 2006-12-07 | 2008-06-18 | Alcon RefractiveHorizons, Inc. | Système d'illumination pour microscope chirurgical |
Also Published As
Publication number | Publication date |
---|---|
EP2291699A1 (fr) | 2011-03-09 |
DE102008030425A1 (de) | 2010-01-21 |
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