WO2009124609A1 - Dispositif de déviation pour un faisceau d'onde électromagnétique - Google Patents

Dispositif de déviation pour un faisceau d'onde électromagnétique Download PDF

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Publication number
WO2009124609A1
WO2009124609A1 PCT/EP2008/066713 EP2008066713W WO2009124609A1 WO 2009124609 A1 WO2009124609 A1 WO 2009124609A1 EP 2008066713 W EP2008066713 W EP 2008066713W WO 2009124609 A1 WO2009124609 A1 WO 2009124609A1
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WO
WIPO (PCT)
Prior art keywords
deflection device
wafer
reflection
reflection elements
housing
Prior art date
Application number
PCT/EP2008/066713
Other languages
German (de)
English (en)
Inventor
Tjalf Pirk
Stefan Pinter
Hubert Benzel
Heribert Weber
Michael Krueger
Robert Sattler
Frederic Njikam Njimonzie
Joerg Muchow
Joachim Fritz
Christoph Schelling
Christoph Friese
Original Assignee
Robert Bosch Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch Gmbh filed Critical Robert Bosch Gmbh
Publication of WO2009124609A1 publication Critical patent/WO2009124609A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners

Definitions

  • the invention is in the field of optics or micromechanics and deals with deflection devices for electromagnetic radiation such as laser beams, light rays and UV rays, which can be controlled by means of movable reflection elements.
  • the invention deals with the possibilities of a little expensive and easy to produce deflection device for a light beam.
  • the present invention is based on the background of the prior art, the task with a minimum of effort to create a fast-working and reliable deflection, which allows a beam deflection with the required accuracy and is low in design effort and low cost.
  • the deflection device can be planned as a passage element, in which the beam entry direction does not differ or only slightly from the beam exit direction, so that a corresponding light source can be arranged behind the deflection device, while the image area or scan area is positioned in front of the deflection device.
  • Wafer units are used with appropriately integrated reflection elements, so that you can work with a high component concentration and a high yield per wafer.
  • these can be spaced apart from one another by an intermediate element arranged between them and be positioned relative to one another, which, for example, can advantageously be embodied as a transparent plate.
  • the actual light beam can then pass the second reflection element to the first reflection element through the transparent plate, are reflected by the first reflection element through the plate on the second reflection element and emerge from this again by an outlet opening next to the first reflection element from the deflection.
  • a material for such a transparent plate is, for example, glass or a transparent
  • the corresponding plate can be produced with sufficient accuracy plane-parallel or as a wedge plate, so that it aligns the reflection elements to each other.
  • the corresponding reflection elements can then be placed with their carriers directly on the plate or glued or bonded.
  • the reflection elements can also be spaced apart from each other by a housing and positioned.
  • Such a housing can then be filled with air or gas or evacuated and have a frame with two bearing surfaces, which are arranged opposite each other and allow the support of the corresponding carrier of the reflection elements.
  • the carriers or the reflection elements can be aligned parallel to one another or at a suitable angle, and inlet windows must be provided next to each of the reflection elements for entry or exit of the beam, if this is not to enter through the side walls of the housing.
  • Such a housing may for example consist of plastic or a coated glass. It can advantageously be provided that the reflection surfaces in the housing parallel to
  • Entrance window and the housing bottom and / or housing top are aligned.
  • the reflection surfaces are angled in the housing between 20 ° and 70 °, in particular by 45 ° relative to the Gescousunter- and top. In this case, a particularly space-saving arrangement of the reflection elements in the housing may result.
  • a further advantageous embodiment of the invention provides that each reflection element is an integral part of a separate wafer part.
  • the reflection elements as a mirror in particular as a plane mirror is particularly economically possible by the means of micromechanics in a wafer by trench etching a mirror is released. This may be before or after the final pruning be coated in addition to increasing the reflectance. There is a certain minimum distance to adjacent components necessary to allow a swinging of the mirror, for example, when the wafer is glued directly onto a plate, which forms the spacer between the two reflection elements as a transparent plate.
  • each of the wafer parts is covered with a protective layer on its side facing away from the respective other wafer. This ensures that the overall arrangement of the deflection after assembly on all sides is well protected against the ingress of dirt and other environmental influences. Since the reflection elements are arranged relative to one another such that the beam passes through the deflection device and continues on the other side, possibly reflected radiation components of the incident beam are harmless.
  • the protective layer is formed as a substrate and carries the respective wafer.
  • the wafer can be processed in this case on the substrate according to the formation of a reflection element.
  • the orientation of the reflection elements based on the substrates and the fixation of the individual components is thereby simplified.
  • the wafer parts and the substrate parts need to be sawn according to the separation.
  • the reflection elements have electrical drive components in the form of a conductor or electrode which can be acted upon by current. It can then be provided either a suitable magnetic field in which the individual reflection elements are driven due to a Lorenz Koch by a current-carrying, magnetic field-exposed, conductor winding or it can be provided an electrostatic drive with electrodes targeted for generating a deflection force with variable electrical potentials can be applied.
  • the reflection elements can have different sizes, since in particular the first reflection element is struck by a static, undeflected beam and a relative movement occurs only by the slight tilting of the reflection element.
  • the second reflection element must be made slightly larger, since this is struck by a deflected beam to varying degrees and must reflect this in full width.
  • the reflection elements are operated in the so-called eigenfrequenten mode, which is determined by the restoring forces of the resilient suspension and in which particularly low driving forces required and particularly high frequencies are possible.
  • the individual reflection elements if micromachined from a wafer, can be formed by leaving torsion bars as a connection to the rest of the wafer, whereby restoring forces of the desired order of magnitude can be easily achieved.
  • the invention relates in addition to a deflection of the type described on a scanning device with a light source and a corresponding deflection.
  • the invention also provides a method for producing a deflection device according to claim 12.
  • This production method is particularly efficient possible if the wafers are assembled before separation, since this requires only a single adjustment process and, after assembly, the deflection devices can be further processed as ready-to-use units.
  • the accuracy of fit is guaranteed and the joining can be done under clean room conditions, so that impurities are not to be feared, especially if the wafers are already protected on their outer sides by a protective layer, such as the corresponding carrier substrate.
  • a protective layer can also be applied to the wafer immediately before the wafers are joined together.
  • the reflection elements are released and / or mirrored only after the covering of the respective wafer by means of a protective layer. This ensures that the reflection elements are already protected by a corresponding protective layer at the time they receive their final processing, which makes them shock-sensitive and prone to damage.
  • FIG. 1 shows a schematic sectional view of a deflection device according to the invention
  • Figure 2 is an exploded view of a deflection device
  • FIG. 3 shows a first reflection element
  • FIG. 4 shows a second reflection element
  • Figure 5 shows a deflection device with a housing as a positioning element
  • Figure 6 shows a further section through a deflection device according to the invention.
  • Figure 7 is a perspective view of a deflection device with marked beam path.
  • FIG. 1 schematically shows, in a sectional view, a deflection device with a first reflection element 1 and a second reflection element 2, each in the form of a planar mirror.
  • the mirrors 1, 2 are each formed as part of a wafer part and positioned laterally offset from one another parallel to one another.
  • the reflection surfaces 3, 4 of the reflection elements are inclined to each other.
  • FIG. 1 also shows a typical beam path with a light beam 5 which enters through an entrance window 6 within an optically transparent substrate 7 and initially strikes the first reflection element 1.
  • the reflected beam then strikes the second reflection element 2, which is pivotable about an axis 24 which is perpendicular to the plane of the drawing.
  • the steering beam as shown, deflected within the plane of the drawing.
  • the emerging light beam in the region of the exit window 9 in the second substrate 10 is approximately in the extension of the incoming beam, so that the deflection device can be planned in a beam path as a more or less linearly traversed element.
  • the adjustment of the reflection elements 1, 2 is particularly simple if they are each made as a section of a wafer part 11, 12 ( Figure 2), so that the wafer parts 11, 12 can be easily connected by bonding. Such a connection can occur in micromechanical mass production prior to the division of a wafer into wafer parts, so that only a single adjustment process is necessary for a large number of deflection devices.
  • cover wafer also referred to as a substrate 7, 10 are provided, which provide a capping of the deflection and thus the protection against contamination and other
  • recesses 13, 14 must be provided in order to ensure the pivoting of the reflection elements / mirror about the axes 8, 24. These depressions can be provided, for example, by embossing or etching in the corresponding substrates 7, 10.
  • the bonding of the substrates to the respective wafers can also be done by bonding, for example, before joining the wafers, but also after joining the wafers and a sawing process.
  • the corresponding substrates are likewise to be sawed or etched or etched.
  • FIG. 2 shows in an exploded view the layering of the caps / substrates and the wafer parts with the reflection elements.
  • a first substrate 7 with a corresponding recess 14 is shown, followed by a wafer part 12, a further wafer part 11 and a further substrate / wafer 10, likewise with a depression 13.
  • the corresponding recesses 13, 14 are each formed double wedge-shaped to allow the smallest possible depth as high as possible deflection angle of the respective reflection elements 1, 2. Electrostatically controllable electrodes for an electrostatic drive of the reflection elements can be provided within the depressions. In this case, corresponding counter electrodes are likewise to be provided on the reflection elements.
  • electrical conductors for example in the form of turns of a winding, advantageously each be provided parallel to the pivot axis of a reflection element on this, which are subject to a Lorenzkraft in a static magnetic field, which is controllable by the current in the conductor.
  • Mirror / reflection elements 1, 2 consists of a separate wafer part surface, which is separated by micromechanical separation methods by means of a slot 15 from the rest of the wafer part, wherein torsion bars 16, 17 remain for holding and generating a restoring force.
  • the shape of such a reflection element 1, 2 may be basically round or square and the size is given essentially by the swept over by the possible incident rays surface.
  • the respective mirror is designed to be as small as possible in order to enable high acceleration through the lowest possible mass.
  • the first mirror / the first reflection element is usually used for this faster control, since this usually receives a deflection-free incident beam, and therefore relatively small can be planned.
  • this faster mirror can be operated in natural frequency mode, that is, at Auslenkfrequenzen that are in the range of the natural frequency of the mirror, for example, at 20 kHz.
  • the second reflection element 2 is then usually made larger in order to be able to catch and deflect the deflected beam in full width.
  • the second mirror deflects the beam in a direction perpendicular to the deflection direction of the first mirror.
  • the pivot axes 8, 24 of the reflection elements 1, 2 are for this purpose advantageously perpendicular to each other, but in principle it is sufficient that the axes are not parallel and the corresponding reflection elements are driven independently of each other.
  • the caps / wafers 7, 10 may be transparent and, for example, after being bonded to the remaining wafers, are polished at least in the region of the entrance windows or finished by a suitable other method for improving the optical quality.
  • the Reflective elements separated / released and advantageously additionally mirrored by metallizing.
  • a metallization can also be introduced into the recesses of the cover wafers to serve as a stator electrode for the electrostatic drive.
  • an intermediate wafer or a transparent intermediate layer can be inserted between the wafers 11, 12 containing the reflection elements, which can further optimize the light path by the refraction of the incident beam.
  • Such an intermediate layer will be explained in more detail with reference to FIG.
  • wafer parts are illustrated with reflecting elements which are correspondingly provided with slots in them.
  • FIG. 5 shows an embodiment of the deflection device according to the invention, in which a housing 18 serves for relative alignment and positioning of the wafer parts 11, 12 or of the corresponding reflection elements / mirrors 1, 2.
  • the housing 18 is formed by a frame, on the top of a first cover plate 19 and from the bottom of a second cover plate 20 are inserted.
  • the cover plates 19, 20 are at least partially transparent and consist for example of glass or a transparent plastic.
  • the first wafer part 11 is placed and secured there by gluing.
  • a holding block 22 is also integrated, which forms a bearing surface for the second wafer part 12.
  • the housing 18 may be made, for example, by an injection molding process that provides sufficiently accurate results in the surface definition to ensure the relative orientation of the reflective elements.
  • the individual parts of the deflection are advantageously assembled in a clean room atmosphere to prevent the ingress of dirt before the seal.
  • FIG. 6 shows an exemplary embodiment in which the reflection elements 1a, 2a are arranged substantially parallel to one another, but at an angle of 45 ° to the incident beam 5, within a housing which is shown only schematically in cross section. This can be ensured, for example, by integration of corresponding retaining blocks in the housing 18a.
  • the housing 18a also provides an entrance window 6a and an exit window 9a for the light beams.
  • FIG. 7 shows a deflection device in which the first wafer part 11 and the second wafer part 12 are positioned and spaced relative to one another by a transparent intermediate layer lying between them.
  • the intermediate layer is designated in the figure with 23 and consists of glass or a transparent plastic.
  • the incident beam 5 and the outgoing beam cone 25 is shown.
  • the manufacturing process for such an arrangement is particularly simple in that the wafer parts 11, 12 can be applied to the intermediate layer 23, for example by bonding. Before or after this bonding process, the respective wafer part 11, 12 can be provided with a cap wafer on the outside for protection.
  • the capping is still done in connection with the micromechanical mass production process, so that the finished masked wafer parts can be further processed with the corresponding intermediate layer.
  • the intermediate layer is advantageously mirrored in the areas that are not needed for the entry and exit of the light, to avoid interference.
  • the corresponding wafer parts In order to enable a movement of the mirror / reflection elements 1, 2, the corresponding wafer parts must be thinned out and / or a respective depression in the intermediate layer as well as in the cap wafer must be provided.
  • reflection elements as a cascaded mirror arrangement with independent pivot axes and drives can be structurally particularly simple and space-saving realize a deflection device for electromagnetic radiation.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Micromachines (AREA)

Abstract

L'invention concerne un dispositif de déviation pour le faisceau d'une onde électromagnétique, qui comprend deux éléments de réflexion en cascade (1, 2) pouvant pivoter individuellement dans des directions différentes de manière commandée. Selon l'invention, les surfaces de réflexion (3, 4) sont situées à une certaine distance l'une de l'autre et se trouvent en vis-à-vis. Ainsi, les éléments de réflexion supplémentaires deviennent superflus et un faible encombrement peut être obtenu.
PCT/EP2008/066713 2008-04-08 2008-12-03 Dispositif de déviation pour un faisceau d'onde électromagnétique WO2009124609A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200810001056 DE102008001056A1 (de) 2008-04-08 2008-04-08 Umlenkeinrichtung für einen Strahl einer elektromagnetischen Welle
DE102008001056.1 2008-04-08

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WO2009124609A1 true WO2009124609A1 (fr) 2009-10-15

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Cited By (21)

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US8252937B2 (en) 2007-09-14 2012-08-28 Janssen Pharmaceuticals, Inc. 1,3-disubstituted 4-(aryl-X-phenyl)-1H-pyridin-2-ones
US8299101B2 (en) 2007-03-07 2012-10-30 Janssen Pharmaceuticals, Inc. 1,4-disubstituted 3-cyano-pyridone derivatives and their use as positive mGluR2-receptor modulators
US8399493B2 (en) 2004-09-17 2013-03-19 Janssen Pharmaceuticals, Inc. Pyridinone derivatives and their use as positive allosteric modulators of mGluR2-receptors
US8691813B2 (en) 2008-11-28 2014-04-08 Janssen Pharmaceuticals, Inc. Indole and benzoxazine derivatives as modulators of metabotropic glutamate receptors
US8691849B2 (en) 2008-09-02 2014-04-08 Janssen Pharmaceuticals, Inc. 3-azabicyclo[3.1.0]hexyl derivatives as modulators of metabotropic glutamate receptors
US8697689B2 (en) 2008-10-16 2014-04-15 Janssen Pharmaceuticals, Inc. Indole and benzomorpholine derivatives as modulators of metabotropic glutamate receptors
US8716480B2 (en) 2009-05-12 2014-05-06 Janssen Pharmaceuticals, Inc. 7-aryl-1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US8722894B2 (en) 2007-09-14 2014-05-13 Janssen Pharmaceuticals, Inc. 1,3-disubstituted-4-phenyl-1H-pyridin-2-ones
US8785486B2 (en) 2007-11-14 2014-07-22 Janssen Pharmaceuticals, Inc. Imidazo[1,2-A]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US8841323B2 (en) 2006-03-15 2014-09-23 Janssen Pharmaceuticals, Inc. 1, 4-disubstituted 3-cyano-pyridone derivatives and their use as positive allosteric modulators of MGLUR2-receptors
US8906939B2 (en) 2007-03-07 2014-12-09 Janssen Pharmaceuticals, Inc. 3-cyano-4-(4-tetrahydropyran-phenyl)-pyridin-2-one derivatives
US8937060B2 (en) 2009-05-12 2015-01-20 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo [4,3-A] pyridine derivatives and their use for the treatment of prevention of neurological and psychiatric disorders
US8946205B2 (en) 2009-05-12 2015-02-03 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US8993591B2 (en) 2010-11-08 2015-03-31 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a] pyridine derivatives and their use as positive allosteric modulators of MGLUR2 receptors
US9012448B2 (en) 2010-11-08 2015-04-21 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of MGLUR2 receptors
US9114138B2 (en) 2007-09-14 2015-08-25 Janssen Pharmaceuticals, Inc. 1′,3′-disubstituted-4-phenyl-3,4,5,6-tetrahydro-2H,1′H-[1,4′] bipyridinyl-2′-ones
US9271967B2 (en) 2010-11-08 2016-03-01 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US9708315B2 (en) 2013-09-06 2017-07-18 Janssen Pharmaceutica Nv 1,2,4-triazolo[4,3-a]pyridine compounds and their use as positive allosteric modulators of MGLUR2 receptors
US10106542B2 (en) 2013-06-04 2018-10-23 Janssen Pharmaceutica Nv Substituted 6,7-dihydropyrazolo[1,5-a]pyrazines as negative allosteric modulators of mGluR2 receptors
US10537573B2 (en) 2014-01-21 2020-01-21 Janssen Pharmaceutica Nv Combinations comprising positive allosteric modulators or orthosteric agonists of metabotropic glutamatergic receptor subtype 2 and their use
US11369606B2 (en) 2014-01-21 2022-06-28 Janssen Pharmaceutica Nv Combinations comprising positive allosteric modulators or orthosteric agonists of metabotropic glutamatergic receptor subtype 2 and their use

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DE102012206269B4 (de) 2012-04-17 2023-12-14 Robert Bosch Gmbh Mikromechanisches Bauteil und Herstellungsverfahren für ein mikromechanisches Bauteil
DE102022212838A1 (de) 2022-11-30 2024-06-06 Robert Bosch Gesellschaft mit beschränkter Haftung Mikromechanische Spiegelvorrichtung und Herstellungsverfahren für eine mikromechanische Spiegelvorrichtung

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WO2003050590A1 (fr) * 2001-12-10 2003-06-19 University Of Pittsburgh Systeme d'imagerie endoscopique
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Cited By (32)

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US8399493B2 (en) 2004-09-17 2013-03-19 Janssen Pharmaceuticals, Inc. Pyridinone derivatives and their use as positive allosteric modulators of mGluR2-receptors
US8841323B2 (en) 2006-03-15 2014-09-23 Janssen Pharmaceuticals, Inc. 1, 4-disubstituted 3-cyano-pyridone derivatives and their use as positive allosteric modulators of MGLUR2-receptors
US9266834B2 (en) 2006-03-15 2016-02-23 Janssen Pharmaceuticals, Inc. 1, 4-disubstituted 3-cyano-pyridone derivatives and their use as positive allosteric modulators of MGLUR2-receptors
US8299101B2 (en) 2007-03-07 2012-10-30 Janssen Pharmaceuticals, Inc. 1,4-disubstituted 3-cyano-pyridone derivatives and their use as positive mGluR2-receptor modulators
US9067891B2 (en) 2007-03-07 2015-06-30 Janssen Pharmaceuticals, Inc. 1,4-disubstituted 3-cyano-pyridone derivatives and their use as positive allosteric modulators of mGluR2-receptors
US8906939B2 (en) 2007-03-07 2014-12-09 Janssen Pharmaceuticals, Inc. 3-cyano-4-(4-tetrahydropyran-phenyl)-pyridin-2-one derivatives
US8748621B2 (en) 2007-09-14 2014-06-10 Janssen Pharmaceuticals, Inc. 1,3-disubstituted 4-(aryl-X-phenyl)-1H-pyridin-2-ones
US8252937B2 (en) 2007-09-14 2012-08-28 Janssen Pharmaceuticals, Inc. 1,3-disubstituted 4-(aryl-X-phenyl)-1H-pyridin-2-ones
US11071729B2 (en) 2007-09-14 2021-07-27 Addex Pharmaceuticals S.A. 1′,3′-disubstituted-4-phenyl-3,4,5,6-tetrahydro-2H,1′H-[1,4′]bipyridinyl-2′-ones
US8722894B2 (en) 2007-09-14 2014-05-13 Janssen Pharmaceuticals, Inc. 1,3-disubstituted-4-phenyl-1H-pyridin-2-ones
US9132122B2 (en) 2007-09-14 2015-09-15 Janssen Pharmaceuticals, Inc. 1′,3′-disubstituted-4-phenyl-3,4,5,6-tetrahydro-2H,1′H-[1,4′]bipyridinyl-2′-ones
US9114138B2 (en) 2007-09-14 2015-08-25 Janssen Pharmaceuticals, Inc. 1′,3′-disubstituted-4-phenyl-3,4,5,6-tetrahydro-2H,1′H-[1,4′] bipyridinyl-2′-ones
US8785486B2 (en) 2007-11-14 2014-07-22 Janssen Pharmaceuticals, Inc. Imidazo[1,2-A]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US8691849B2 (en) 2008-09-02 2014-04-08 Janssen Pharmaceuticals, Inc. 3-azabicyclo[3.1.0]hexyl derivatives as modulators of metabotropic glutamate receptors
US8697689B2 (en) 2008-10-16 2014-04-15 Janssen Pharmaceuticals, Inc. Indole and benzomorpholine derivatives as modulators of metabotropic glutamate receptors
US8691813B2 (en) 2008-11-28 2014-04-08 Janssen Pharmaceuticals, Inc. Indole and benzoxazine derivatives as modulators of metabotropic glutamate receptors
US8946205B2 (en) 2009-05-12 2015-02-03 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US9085577B2 (en) 2009-05-12 2015-07-21 Janssen Pharmaceuticals, Inc. 7-aryl-1,2,4-triazolo[4,3-A]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US9226930B2 (en) 2009-05-12 2016-01-05 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo [4,3-a] pyridine derivatives and their use for the treatment of prevention of neurological and psychiatric disorders
US8937060B2 (en) 2009-05-12 2015-01-20 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo [4,3-A] pyridine derivatives and their use for the treatment of prevention of neurological and psychiatric disorders
US8716480B2 (en) 2009-05-12 2014-05-06 Janssen Pharmaceuticals, Inc. 7-aryl-1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US9737533B2 (en) 2009-05-12 2017-08-22 Janssen Pharmaceuticals. Inc. 1,2,4-triazolo [4,3-A] pyridine derivatives and their use for the treatment of prevention of neurological and psychiatric disorders
US10071095B2 (en) 2009-05-12 2018-09-11 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo [4,3-A] pyridine derivatives and their use for the treatment of neurological and psychiatric disorders
US9012448B2 (en) 2010-11-08 2015-04-21 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of MGLUR2 receptors
US8993591B2 (en) 2010-11-08 2015-03-31 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a] pyridine derivatives and their use as positive allosteric modulators of MGLUR2 receptors
US9271967B2 (en) 2010-11-08 2016-03-01 Janssen Pharmaceuticals, Inc. 1,2,4-triazolo[4,3-a]pyridine derivatives and their use as positive allosteric modulators of mGluR2 receptors
US10106542B2 (en) 2013-06-04 2018-10-23 Janssen Pharmaceutica Nv Substituted 6,7-dihydropyrazolo[1,5-a]pyrazines as negative allosteric modulators of mGluR2 receptors
US10584129B2 (en) 2013-06-04 2020-03-10 Janssen Pharmaceuticals Nv Substituted 6,7-dihydropyrazolo[1,5-a]pyrazines as negative allosteric modulators of mGluR2 receptors
US9708315B2 (en) 2013-09-06 2017-07-18 Janssen Pharmaceutica Nv 1,2,4-triazolo[4,3-a]pyridine compounds and their use as positive allosteric modulators of MGLUR2 receptors
US10537573B2 (en) 2014-01-21 2020-01-21 Janssen Pharmaceutica Nv Combinations comprising positive allosteric modulators or orthosteric agonists of metabotropic glutamatergic receptor subtype 2 and their use
US11103506B2 (en) 2014-01-21 2021-08-31 Janssen Pharmaceutica Nv Combinations comprising positive allosteric modulators or orthosteric agonists of metabotropic glutamatergic receptor subtype 2 and their use
US11369606B2 (en) 2014-01-21 2022-06-28 Janssen Pharmaceutica Nv Combinations comprising positive allosteric modulators or orthosteric agonists of metabotropic glutamatergic receptor subtype 2 and their use

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