WO2009104273A1 - Iron base alloy product with composite coating - Google Patents

Iron base alloy product with composite coating Download PDF

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Publication number
WO2009104273A1
WO2009104273A1 PCT/JP2008/053063 JP2008053063W WO2009104273A1 WO 2009104273 A1 WO2009104273 A1 WO 2009104273A1 JP 2008053063 W JP2008053063 W JP 2008053063W WO 2009104273 A1 WO2009104273 A1 WO 2009104273A1
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film
iron
composite coating
alloy product
gas
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PCT/JP2008/053063
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French (fr)
Japanese (ja)
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井原仁史
佐藤嘉高
渡部清彦
丹羽司
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ユケン工業株式会社
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Priority to PCT/JP2008/053063 priority Critical patent/WO2009104273A1/en
Publication of WO2009104273A1 publication Critical patent/WO2009104273A1/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635Carbides
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/024Deposition of sublayers, e.g. to promote adhesion of the coating

Definitions

  • the present invention relates to an iron-based alloy product provided with a composite coating.
  • a composite coating is removed after use over time, and a composite coating is formed again by new ion plating (hereinafter referred to as “IP”).
  • IP new ion plating
  • a metal plastic working die (press die) will be described as an example of an iron-based alloy product.
  • the present invention is not limited to this and is applicable to other cutting tools and resin molding dies. Is possible.
  • metal plastic working molds such as press molds are generally made of an iron-based alloy (steel), so that it is necessary to perform a composite coating treatment in order to maintain durability such as wear resistance. .
  • steel iron-based alloy
  • One of the composite coating processes is vanadium carbide (VC) film processing.
  • VC vanadium carbide
  • the main method for forming a VC film is a thermal reaction precipitation diffusion method (TRD method: Thermal Reactive Deposition and Diffusion) (see Patent Documents 1, 2, and 3).
  • the bath temperature it is necessary to set the bath temperature to 800 to 1200 ° C. (see the above publication), which is not desirable from the viewpoint of working environment, energy saving, productivity, and the like. That is, the working environment became high temperature, energy for maintaining the bath temperature was required, and it took time to cool the product after coating.
  • Patent Document 4 a method for forming a vanadium-based film (composite film) having the following configuration, and obtained a patent having the following configuration (Patent Document 4).
  • the vanadium-based coating is a composite coating composed of a VN film, a VCN film, and a VC film sequentially arranged from the substrate side, Each layer of the vanadium-based coating is formed by reaction by using vanadium as an evaporation source and adjusting and maintaining the injection gas amount and gas ratio corresponding to the film type using nitrogen gas and / or hydrocarbon gas as the injection gas.
  • a method for forming a vanadium-based film characterized by the above.
  • the composite coating (vanadium-based coating) is worn out after a long period of use (for example, the number of presses of 100,000 to 150,000), and a predetermined molded product ( It is difficult to ensure the processing accuracy of plastic processed products.
  • the composite coating is dissolved and removed using a solution for the constituent metal of the composite coating.
  • the present invention has a small surface roughness of the iron-based alloy substrate (mold body) after removing the composite coating with a metal solution, and requires little smoothing such as grinding or lapping. It is an object (problem) to provide an iron-based alloy material capable of forming a new composite film.
  • the present inventors made the composite coating into the following film configuration, thereby dissolving the hard composite film with a general-purpose (commercially available) titanium-based metal solution. It was found that the surface roughness of the iron-based substrate after dissolution and removal was small, and a new composite film could be formed without substantial grinding or lapping.
  • an iron-based alloy product comprising a vanadium (V) -based / titanium (Ti) -based hard composite coating on the surface of an iron-based alloy substrate containing chromium carbide
  • the hard composite coating includes a TiN film, a TiVCN film, and a VC film sequentially arranged from the substrate side, and the VC film is located on the outermost surface.
  • the present inventors can dissolve and remove it with a commercially available release agent for titanium-based IP (dissolution solution), as shown in Examples described later, I found out. That is, the speed of dissolving the VC film of the titanium-based IP release agent is slower than that of the Ti-based film, but when a large number of pinholes appear in the second-layer TiVCN film due to slight dissolution of the VC film, The lower layer TiN is dissolved first, and the composite film is peeled and removed in the film state.
  • a commercially available release agent for titanium-based IP dissolution solution
  • the number of pretreatment steps such as grinding and lapping of the mold surface for reducing the surface roughness can be substantially reduced.
  • the iron-base alloy base material is not particularly limited as long as it is a steel material containing chromium, chromium carbide is generated to some extent. Usually, it is selected from the group of steel materials having a chromium content of 1.0 to 30% by mass, preferably 5.0 to 25% by mass (see Table 1).
  • the iron-based alloy product having each of the above-described structures is formed on the surface of the iron-based alloy base material using V and / or Ti as an evaporation source and nitrogen gas and / or hydrocarbon gas as an injection gas amount / gas ratio. Can be adjusted and maintained in accordance with the film type, whereby each layer of the composite coating can be produced by reaction film formation.
  • the composition of the film formation is good from the composition having good adhesion to the iron-based alloy substrate (normally low hardness) to the composition having good wear resistance (normally high hardness). It can be changed stepwise or continuously.
  • the substrate temperature during film formation is usually adjusted in the range of 400 to 500 ° C.
  • the tempering temperature of the tough steel is usually about 500 to 650 ° C. Therefore, when temperature variation is taken into consideration, 500 ° C. or less is desirable. It becomes difficult to get sex.
  • the upper limit of the IP film formation temperature (substrate temperature) is usually 550 ° C.
  • Model diagram showing an example of a composite coating in the present invention Schematic model diagram showing an example of an IP device used in the present invention
  • TiN, TiVCN, and VC mean vanadium nitride (cubic system), titanium vanadium carbonitride (same), and vanadium carbide (same), respectively.
  • HV Vickers hardness measured according to JIS Z 2244.
  • FIG. 1 is a partial cross-sectional view of an iron-based alloy product according to an embodiment of the present invention.
  • a TiN film 14 and a TiVCN are arranged on the surface of a steel base 12 in order from the base 12 side.
  • This is an iron-based alloy product (for example, a mold for plastic working) provided with a vanadium-based composite coating composed of the film 16 and the VC film 18.
  • the TiN film 14, the TiVCN film 16, and the VC film 18 are arranged in this order from the base material 12 side, the hardness increases in that order as described above, and the base material, particularly a steel base material (usually HV 600 to 900). And the hardness difference can be reduced. Therefore, even if the surface hardness is high, it becomes easy to ensure adhesion with the substrate.
  • the VC film 18 is HV3500, and it is easy to ensure the surface hardness that is a factor (parameter) for ensuring wear resistance. If further improvement in wear resistance is required, it is desirable to reduce the friction coefficient (dynamic friction coefficient: JIS K 7125), which is another factor of wear resistance.
  • the dynamic friction coefficient ( ⁇ ) is 0.3 or less, preferably 0.2 or less. As will be described later, the friction coefficient can be easily obtained by increasing the amount of hydrocarbon (carbon source).
  • first and second interlayer coupling layers 20 and 22 having a gradient composition are further interposed between the layers of the composite coating, that is, between the TiN film 14 / TiVCN film 16 / VC film 18. I'm allowed. That is, the first interlayer coupling layer 20 is a Ti-rich TiVCN graded layer, and the second interlayer coupling layer 22 is a V-rich TiVCN graded layer.
  • TiVCN layer to the TiVCN gradient layer are considered to exist mostly in the form of TiVCN compounds, but are also considered to exist somewhat in the form of other polyvalent compounds of TiC, TiN, TiCN, VC, VN and VCN.
  • interlayer bonding layers 20 and 22 further reduces the hardness difference between the respective layers, and as a result, delamination due to mechanical shock or thermal shock hardly occurs, and as a result, the toughness of the vanadium-based coating increases. That is, durability is increased.
  • the thickness is 8 to 2.5 / 2.5 / 5, most preferably about 2/2/6, and the total film thickness is 2 to 50 ⁇ m, preferably 3 to 12 ⁇ m, and most preferably about 10 ⁇ m.
  • the film thickness ratio of the VC film to the TiN film or the TiVCN film is too large, the compression stress of the film increases when the film thickness of the VC film exceeds 10 ⁇ m. Delamination with the TiVCN film is likely to occur. Moreover, since the film toughness is lowered, cracks are likely to occur in the VC film due to impact during forging.
  • the film thickness ratio of the VC film to the TiN film or TiVCN film is too small, the hardness of the entire coating becomes HV3300 or less, making it difficult to obtain wear resistance.
  • the layer thickness (film thickness) of the interlayer coupling layers 20 and 22 is much thinner than the TiN film, the TiVCN film, and the VC film that are the constituent layers of the vanadium-based film. It is desirable that the layer be as thin as possible if it has an interlayer coupling effect. Usually, it is 0.5 / 10 to 3/10, preferably 1/10 to 2/10, most preferably TiN film or TiVCN film. About 1.5 / 10. The reason for the setting is estimated as follows.
  • the iron-based alloy a steel material (usually tool steel) having a chromium content of 1.0 to 30% by mass is used.
  • the steel material not containing chromium according to the present invention does not have the problem of solving the problem of the present invention (the mold surface after the removal of the composite film becomes a fluttered surface), and is mechanically similar to a metal plastic working mold. This is because iron-base alloy products that are susceptible to shock and thermal shock are planned.
  • Fe-based alloys such as high-speed steel, die steel, powdered high-speed steel, and semi-high-speed steel can be suitably used.
  • iron-based alloy examples include those shown in Table 1.
  • Table 1 the chromium content of each steel material is also shown.
  • the iron base alloy product (mold for plastic working) of the above embodiment will be described by taking as an example a case where a composite film is formed (film formation) on an iron base alloy substrate made of tool steel. do.
  • an IP device as shown in FIG. 2 usually an arc IP (AIP) device, is used.
  • the AIP method uses vanadium as an evaporation source, nitrogen gas and / or hydrocarbon gas as a source gas, and adjusts and maintains the injection gas amount and gas ratio corresponding to the film type, thereby forming a TiN film, a TiVCN film, and a VC film. This is because it is easy to form a reactive film on a substrate with high purity.
  • IP methods such as a multi-cathode thermionic irradiation method, a high-frequency excitation method, a holo-cathode discharge method, a cluster method, and an activated reaction deposition method are also possible.
  • the IP device includes a plurality of (two in the illustrated example) evaporation source holding portions (pot portions) 25 and 25A for holding titanium or vanadium in a chamber 24, and a workpiece (base) connected to a bias voltage source 26. Material) 28 is provided. Furthermore, the chamber 24 includes an exhaust port 32 connected to an exhaust pump that maintains the inside of the chamber at a predetermined degree of vacuum, and a reaction gas introduction port 34 for introducing a reaction gas (nitrogen and / or methane). A heater 36 that maintains the interior at a predetermined temperature and also maintains the substrate (substrate) 28 at a predetermined temperature is provided.
  • titanium (Ti) and vanadium (V) are usually used in a purity of tunaine to threeine.
  • the gas that is the source of nitrogen and carbon, which are elements that react with vanadium can use nitrogen gas (N 2 ) for the former and hydrocarbon gases such as methane (CH 4 ), ethane, ethylene, acetylene for the latter It is.
  • N 2 nitrogen gas
  • hydrocarbon gases such as methane (CH 4 ), ethane, ethylene, acetylene for the latter It is.
  • methane which is difficult to generate soot, is desirable because unreactive gas contaminates the surface of the apparatus and the substrate.
  • the purity of each is made from three nine to six nine.
  • the film formation conditions by the AIP method are as shown in Table 2, for example.
  • one or both pots holding titanium and vanadium are heated, and one or both of them are dissolved and evaporated simultaneously.
  • titanium is first held in all pots, heated and evaporated to form the first layer (TiN film), the vacuum in the chamber is released, and half of the plurality of pots are replaced, and the second A layer (TiVCN film) and a third layer (VC film) can also be sequentially formed.
  • Degree of vacuum If the degree of vacuum is too high (the absolute pressure is low), the amount of reaction gas will be small, the deposition rate will be slowed and productivity will be reduced, and the deposited film will contain excessive metal components. Or the particles are coarse and have many voids. (It is estimated that the generation of crystal nuclei is delayed.) On the other hand, if the degree of vacuum is too low (the absolute pressure is high), the amount of reaction gas becomes excessive, and the gas that is not used in the reaction and not fully activated acts as an adsorption inhibitor (inhibitor) on the growth film surface. There is a risk.
  • the surface film when application of the present invention to a mold is expected to improve wear resistance, the surface film (VC film) is required to have slipperiness as well as film hardness. In such a case, it acts as a lubricant. It is desirable to contain C (carbon) in the film. However, when the C content is excessive, the film hardness is lowered and the wear resistance is also lowered.
  • the degree of vacuum that can achieve such a balance is about 10 to 50 mtorr (1.33 to 6.65 Pa), preferably about 20 mtorr (2.66 Pa), and the amount of methane gas is about 400 to 600 mL / min, preferably about 500 mL / min.
  • Arc current If the current value is too low, the film forming speed is slow, and conversely if it is too high, it is not desirable from the viewpoint of the safety of the apparatus.
  • Bias voltage Generally, the higher the bias voltage, the slower the film formation speed. Therefore, the bias voltage is set within an appropriate range in consideration of productivity.
  • the supply gas is nitrogen (N 2 )
  • nitrogen (N 2 ) there is almost no influence on the nitride film crystal of the bias voltage, and it can be appropriately set within the range of 50 to 400V, preferably 50 to 200V.
  • a hydrocarbon such as CH 4
  • the bias voltage is low, the crystallinity of VC becomes low and it becomes difficult to obtain the wear resistance of the carbide film. Therefore, like nitrogen, it can be in the range of 50 to 400 V, but is preferably about 100 to 200 V, and more preferably about 150 V, from the balance between productivity and crystallinity.
  • Substrate temperature The higher the temperature, the faster the film formation rate is desirable, but from the standpoint of energy saving and heat resistance of the base material, when the base material is steel, the temperature is below the temperature at which dimensional distortion due to tempering does not occur, usually 350 ⁇ 550 ° C., preferably 400 to 500 ° C. In the case where the substrate does not generate thermal strain as in the case of ceramics, it may be performed at a maximum IP temperature of about 550 ° C.
  • Table 3 shows an example of the gas flow rate and the deposition time when an interlayer coupling layer is formed between the layers.
  • the amount and pressure of the gas in each interlayer bonding layer in Table 2 do not instantaneously become the amount and pressure, but usually increase continuously to the pressure after an intermediate time of the film formation time, for example, 40 to 50 s, Thereafter, the set value is maintained.
  • the lower hardness is the base material side, and an interlayer coupling layer is formed between each layer.
  • the TiN film having the lowest hardness has a hardness of HV2000, and preferably a vanadium-based film having a hardness of HV3000 or more is easily formed on a substrate such as steel with good adhesion. it can.
  • IP4024 type manufactured by Kobe Steel Co., Ltd. was used as the IP device.
  • V was filled with 800 g of pure three nine
  • N 2 was pure five nine
  • CH 4 was pure three nine.
  • a press die made of cold die steel (SKD11: HV650, HRC58.0) was used as the film forming substrate.
  • the shape of the mold was a short square column, and before forming the composite coating, a length: 70.200 mm, a width: 55.900 mm, and a height: 42.000 mm were used.
  • Example: In Table 3, a composite film (TiN film / TiVCN film / VC film) having a total film thickness of about 10 ⁇ m was formed on the press surface (molded surface) of the mold as a base material with X 1200 s.
  • a composite coating (TiN film / TiVCN film / VC film) having a total film thickness of about 10 ⁇ m was formed on the press surface of a mold as a base material under the film forming conditions shown in Table 4.
  • Vanadium-based IP release agent acidic aqueous solution
  • the conditions were 30 ° C. ⁇ 12 h.
  • the length was ⁇ 90 ⁇ m and the height was ⁇ 120 ⁇ m, whereas in the example, the length was ⁇ 1 ⁇ mm and the height was ⁇ 2 ⁇ m. That is, in the present invention, it was confirmed that the wrapping amount may be very small.

Abstract

An iron base alloy product, such as a metal mold for plastic forming, having a vanadium (V) composite coating superimposed on a surface of chromium-containing iron base alloy substratum (12). The composite coating is composed of, sequentially superimposed from the substratum side, TiN film (14), TiVCN film (16) and VC film (18). The composite coating is formed by first setting an iron base alloy substratum in a chamber of ion plating apparatus and carrying out regulation retention of injected gas rate/gas ratio in correspondence to film species while using titanium and/or vanadium as an evaporation source and using nitrogen gas and/or hydrocarbon gas an injected gas to thereby attain reaction film forming for each of individual layers. This iron base alloy product is low in the surface roughness of iron base alloy substratum (metal mold main body) after removal of the composite coating by a metal dissolving liquid, thereby allowing formation of a new composite coating nearly without grinding and lapping operations.

Description

複合被膜を備えた鉄基合金製品Iron-base alloy products with composite coating
 本発明は、複合被膜を備えた鉄基合金製品に関する。例えば、プレス金型等の鉄基合金製品において、経時使用後に該複合被膜を除膜し、再度、新たなイオンプレーティング(Ion plating:以下「IP」と略す。)により複合被膜を形成する場合に好適な鉄基合金製品に係る発明である。 The present invention relates to an iron-based alloy product provided with a composite coating. For example, in an iron-based alloy product such as a press mold, the composite coating is removed after use over time, and a composite coating is formed again by new ion plating (hereinafter referred to as “IP”). This invention relates to an iron-based alloy product suitable for the above.
 ここでは鉄基合金製品として、金属塑性加工用金型(プレス金型)を例に採り説明するが、これに限られることなく、他の切削工具、樹脂成形用金型にも本発明は適用可能である。 Here, a metal plastic working die (press die) will be described as an example of an iron-based alloy product. However, the present invention is not limited to this and is applicable to other cutting tools and resin molding dies. Is possible.
 従来、プレス金型等の金属塑性加工金型は、基材が一般に鉄基合金(鋼)製であるため、耐摩耗性等の耐久性を維持するために、複合被膜処理をする必要がある。 Conventionally, metal plastic working molds such as press molds are generally made of an iron-based alloy (steel), so that it is necessary to perform a composite coating treatment in order to maintain durability such as wear resistance. .
 複合被膜処理のひとつとして炭化バナジウム(VC)膜処理がある。 One of the composite coating processes is vanadium carbide (VC) film processing.
 VC膜の形成方法は、熱反応析出拡散法(TRD法:Thermal Reactive Deposition and Diffusion)が主流であった(特許文献1・2・3等参照)。 The main method for forming a VC film is a thermal reaction precipitation diffusion method (TRD method: Thermal Reactive Deposition and Diffusion) (see Patent Documents 1, 2, and 3).
 しかし、上記TRD法の場合、浴温を800~1200℃(前記公報等参照)とする必要があり、作業環境、省エネルギー、生産性等の見地から望ましくなかった。すなわち、作業環境が高温となり、浴温を維持するためのエネルギーが必要となるとともに、被膜処理後の製品の冷却にも時間を要した。 However, in the case of the TRD method, it is necessary to set the bath temperature to 800 to 1200 ° C. (see the above publication), which is not desirable from the viewpoint of working environment, energy saving, productivity, and the like. That is, the working environment became high temperature, energy for maintaining the bath temperature was required, and it took time to cool the product after coating.
 また、母材(基材)が鋼である金型の場合、鋼の焼き戻し温度(通常、500~650℃:「半導体・金属材料用語辞典」工業調査会、1999,p1251)よりはるかに高い温度に母材がさらされる。このため、金属塑性加工用金型(プレス加工、鍛造加工等)のような高い寸法精度が要求される鋼製品の場合、上記TRD法は不適であった。 Also, in the case of a mold whose base material (base material) is steel, it is much higher than the tempering temperature of steel (usually 500 to 650 ° C: “Semiconductor / Metal Material Glossary of Terms” Industrial Research Committee, 1999, p1251). The base material is exposed to temperature. For this reason, the TRD method is not suitable for steel products that require high dimensional accuracy, such as metal plastic working dies (pressing, forging, etc.).
 そこで、本願出願人は、下記構成のバナジウム系被膜(複合被膜)の成膜方法を提案し、下記構成の特許を得た(特許文献4)。 Therefore, the applicant of the present application proposed a method for forming a vanadium-based film (composite film) having the following configuration, and obtained a patent having the following configuration (Patent Document 4).
 「バナジウム系被膜をIPにより無機基材の表面に反応成膜させる方法において、
 前記バナジウム系被膜が、基材側から順に配されたVN膜、VCN膜及びVC膜からなる複合被膜であって、
 バナジウムを蒸発源とし、注入ガスを窒素ガス及び/又は炭化水素ガスとして注入ガス量・ガス比を膜種に対応させて調節維持することにより、前記バナジウム系被膜の各層をそれぞれ反応成膜させることを特徴とするバナジウム系被膜の成膜方法。」
 上記方法で複合被膜処理をしたプレス金型であっても、長期間使用後(例えば、プレス回数10~15万回)には複合被膜(バナジウム系被膜)が摩耗して、所定の成形品(塑性加工品)の加工精度を確保し難くなる。
“In the method of reactively forming a vanadium-based coating on the surface of an inorganic substrate by IP,
The vanadium-based coating is a composite coating composed of a VN film, a VCN film, and a VC film sequentially arranged from the substrate side,
Each layer of the vanadium-based coating is formed by reaction by using vanadium as an evaporation source and adjusting and maintaining the injection gas amount and gas ratio corresponding to the film type using nitrogen gas and / or hydrocarbon gas as the injection gas. A method for forming a vanadium-based film characterized by the above. "
Even in a press die that has been subjected to a composite coating treatment by the above method, the composite coating (vanadium-based coating) is worn out after a long period of use (for example, the number of presses of 100,000 to 150,000), and a predetermined molded product ( It is difficult to ensure the processing accuracy of plastic processed products.
 このような場合、金型を廃棄する代わりに、昨今、省資源、省エネルギーの見地から、再生品として再使用することが試みられるようになってきている。
特開昭49-118637号公報 特公昭54-7610号公報 特公昭56-18670号公報 特許第3909658号公報
In such a case, instead of discarding the mold, it has recently been attempted to reuse it as a recycled product from the viewpoint of saving resources and energy.
Japanese Patent Laid-Open No. 49-118637 Japanese Patent Publication No.54-7610 Japanese Examined Patent Publication 56-18670 Japanese Patent No. 3909658
 上記の如く、中古金型の再生使用をするために、新たな硬質の複合被膜を形成しようとする場合、金型面(附形面)の古い複合被膜を除去しないと、新しい複合被膜の形成ができない。 As described above, when a new hard composite coating is to be formed for recycling a used mold, a new composite coating must be formed without removing the old composite coating on the mold surface (molding surface). I can't.
 複合被膜の除去方法としては、通常、複合被膜の構成金属用の溶解液を用いて溶解除去することが考えられる。 As a method for removing the composite coating, it is usually considered that the composite coating is dissolved and removed using a solution for the constituent metal of the composite coating.
 しかし、溶解除去を行った場合、表面粗さが大きく(あばた面)なり、そのまま複合被膜処理することができないことが分かった。表面粗さが大きい理由は、除去後の金型面(附形面)に無数の微小クレータ(直径乃至深さ:約30~50μm)が発生するためである。 However, it was found that when the dissolution was removed, the surface roughness increased (fluttered surface), and the composite coating treatment could not be performed as it was. The reason for the large surface roughness is that innumerable micro craters (diameter or depth: about 30 to 50 μm) are generated on the mold surface (molded surface) after removal.
 すなわち、溶解除去後の金型面(基材面)に複合被膜を形成しても、基材面の影響を受け複合被膜表面に、新品と同様な表面粗さ(表面粗度)を確保し難いことが分かった。表面粗さが大きいと塑性加工時の摩擦抵抗が大きくなり、再生金型に新品金型同様の性能を確保し難い。 That is, even if a composite coating is formed on the mold surface (base material surface) after dissolution and removal, the surface roughness (surface roughness) similar to that of a new product is secured on the composite coating surface due to the influence of the base material surface. I found it difficult. If the surface roughness is large, the frictional resistance during plastic processing increases, and it is difficult to ensure the same performance as that of a new mold in the recycled mold.
 この、表面粗さを小さくする(微小クレータを除去する)には、研削(grinding)ないしラッピング(lapping)により平滑化処理を行う必要がある。これらの平滑化処理は、工数が嵩み、さらには、クレータ寸法が大きいと、取り代(研摩深さ)が100μm近くにもなってしまい、金型面が寸法公差から外れてしまう。 In order to reduce the surface roughness (remove minute craters), it is necessary to perform a smoothing process by grinding or lapping. These smoothing processes require a large number of man-hours. Furthermore, if the crater size is large, the machining allowance (polishing depth) becomes close to 100 μm, and the mold surface deviates from the dimensional tolerance.
 本発明は、上記にかんがみて、金属溶解液で複合被膜を除去後の鉄基合金基材(金型本体)の表面粗さが小さく、研削やラッピング等の平滑化処理をほとんどしなくても新たな複合被膜を形成可能な鉄基合金素材を提供することを目的(課題)とする。 In view of the above, the present invention has a small surface roughness of the iron-based alloy substrate (mold body) after removing the composite coating with a metal solution, and requires little smoothing such as grinding or lapping. It is an object (problem) to provide an iron-based alloy material capable of forming a new composite film.
 本発明者らは、上記課題を解決するために鋭意開発に努力をした結果、複合被膜を下記膜構成とすることにより、当該硬質複合膜を、汎用(市販)のチタン系金属溶解液により溶解除去でき、しかも、溶解除去後の鉄基基材表面の表面粗さが小さく、実質的に研削やラッピングをしなくても新たな複合被膜を形成可能であることを知見した。 As a result of diligent development to solve the above-mentioned problems, the present inventors made the composite coating into the following film configuration, thereby dissolving the hard composite film with a general-purpose (commercially available) titanium-based metal solution. It was found that the surface roughness of the iron-based substrate after dissolution and removal was small, and a new composite film could be formed without substantial grinding or lapping.
 そして、溶解除去後の表面粗さが大きくなる原因は、鉄基合金に含まれているCrの第一イオン化ポテンシャル(Cr:6.76eV、V:6.74eV)が近いため(Δ=0.02eV)、溶解処理に際して、VC/VNとともにCrC、が溶解するためであると推定して、下記構成の鉄基合金製品に想到した。 The reason why the surface roughness after dissolution and removal increases is because the first ionization potential (Cr: 6.76 eV, V: 6.74 eV) of Cr contained in the iron-based alloy is close (Δ = 0.02 eV). In the melting treatment, it was estimated that CrC was dissolved together with VC / VN, and an iron-based alloy product having the following configuration was conceived.
  クロム炭化物を含有する鉄基合金基材の表面にバナジウム(V)系/チタン(Ti)系の硬質複合被膜を備えた鉄基合金製品において、
 前記硬質複合被膜が、基材側から順に配されたTiN膜、TiVCN膜及びVC膜を備え、該VC膜が最表面に位置することを特徴とする。
In an iron-based alloy product comprising a vanadium (V) -based / titanium (Ti) -based hard composite coating on the surface of an iron-based alloy substrate containing chromium carbide,
The hard composite coating includes a TiN film, a TiVCN film, and a VC film sequentially arranged from the substrate side, and the VC film is located on the outermost surface.
 上記構成により、鉄基合金製品を塑性加工金型等に適用した場合、従来における硬質複合被膜が、VN膜、VCN膜及びVC膜からなるものと同等の耐久性を得ることができる。硬度が、TiN:HV2000、TiVCN:HV2500、VC:HV3500と順に高くなっており、成膜組成を無機基材に対して密着性の良好な(通常硬度が低い)組成から耐摩耗性の良好な(通常硬度が高い)組成へと段階的にないし連続的に変化させることができることも寄与していると考えられる。 With the above configuration, when an iron-based alloy product is applied to a plastic working mold or the like, durability equivalent to that of a conventional hard composite coating composed of a VN film, a VCN film, and a VC film can be obtained. Hardness is increasing in order of TiN: HV2000, TiVCN: HV2500, VC: HV3500, and the film-forming composition is excellent in wear resistance from a composition having good adhesion to an inorganic substrate (usually low hardness). The fact that it can be changed stepwise or continuously to a composition (usually high in hardness) is also considered to contribute.
 市販(汎用)のTi用溶解液を使用して除膜が可能であり、更には、除膜後の金型面の表面粗さも未処理品の表面粗さに近い小さいものとなる。この理由は、Tiの第一イオン化ポテンシャルは、6.82eVと、Crのそれ(6.76eV)と離れている(Δ=0.06eV)ため、CrCが溶解液で溶解されないためと推定される。 Film removal is possible using a commercially available (general purpose) solution for Ti, and the surface roughness of the mold surface after film removal is also close to the surface roughness of the untreated product. The reason for this is presumed that the first ionization potential of Ti is 6.82 eV, which is far from that of Cr (6.76 eV) (Δ = 0.06 eV), so CrC is not dissolved in the solution.
 ここで、本発明の複合被膜は、バナジウム系被膜を含んでいても市販のチタン系IP用剥離剤(溶解液)で、溶解除去できることを、本発明者らは後述の実施例で示す如く、知見した。すなわち、チタン系IP用剥離剤のVC膜の溶解させる速度はTi系被膜をそれに比して遅いが、VC膜の若干の溶解により第二層のTiVCN膜にピンホールが多数出現しだすと、最下層のTiNが先に溶解して、膜状態で複合皮膜が剥離除去される。 Here, even if the composite coating of the present invention contains a vanadium-based coating, the present inventors can dissolve and remove it with a commercially available release agent for titanium-based IP (dissolution solution), as shown in Examples described later, I found out. That is, the speed of dissolving the VC film of the titanium-based IP release agent is slower than that of the Ti-based film, but when a large number of pinholes appear in the second-layer TiVCN film due to slight dissolution of the VC film, The lower layer TiN is dissolved first, and the composite film is peeled and removed in the film state.
 したがって、除膜後、硬質複合被膜を形成するに際して、表面粗さを小さくするための金型面の研削、ラッピング等の前処理工数を実質的に不要乃至格段に少なくすることができる。 Therefore, after the film removal, when the hard composite film is formed, the number of pretreatment steps such as grinding and lapping of the mold surface for reducing the surface roughness can be substantially reduced.
 上記構成において、前記複合被膜の最外層硬度は、通常、ビッカース硬度:HV3000以上とする。複合被膜の最外層硬度をビッカース硬度:HV3000以上とすることが耐摩耗性の見地から望ましく、当該硬度は、膜厚比を、TiN膜/TiVCN傾斜被膜/VC膜=0.5/0.5/9~3/3/4とし、合計膜厚2~50μmとすることにより得易くなる。 In the above configuration, the outermost layer hardness of the composite coating is usually set to Vickers hardness: HV3000 or more. It is desirable from the standpoint of wear resistance that the outermost layer hardness of the composite coating is Vickers hardness: HV3000 or more, and the hardness is expressed as follows: film thickness ratio: TiN film / TiVCN gradient coating / VC film = 0.5 / 0.5 / 9 to 3/3/4, and a total film thickness of 2 to 50 μm makes it easy to obtain.
 また、鉄基合金基材としては、クロムを含有する鋼材であれば炭化クロムが多少生成するため特に限定されない。通常、クロム含有率1.0~30質量%、望ましくは5.0~25質量%の鋼材の群から選択する(表1参照)。 Also, the iron-base alloy base material is not particularly limited as long as it is a steel material containing chromium, chromium carbide is generated to some extent. Usually, it is selected from the group of steel materials having a chromium content of 1.0 to 30% by mass, preferably 5.0 to 25% by mass (see Table 1).
 本発明の鉄基合金製品は、寸法精度も要求される金属塑性加工用金型に適用すると、本発明の効果がさらに顕著となる。 When the iron-based alloy product of the present invention is applied to a metal plastic working mold that also requires dimensional accuracy, the effect of the present invention becomes more remarkable.
 そして、上記各構成の鉄基合金製品は、前記鉄基合金基材の表面に、V及び/又はTiを蒸発源とし、注入ガスを窒素ガス及び/又は炭化水素ガスとして注入ガス量・ガス比を膜種に対応させて調節維持することにより、前記複合被膜の各層をそれぞれ反応成膜させて製造することができる。 The iron-based alloy product having each of the above-described structures is formed on the surface of the iron-based alloy base material using V and / or Ti as an evaporation source and nitrogen gas and / or hydrocarbon gas as an injection gas amount / gas ratio. Can be adjusted and maintained in accordance with the film type, whereby each layer of the composite coating can be produced by reaction film formation.
 ガス注入量ないしガス比を調節することにより、成膜組成を鉄基合金基材に対して密着性の良好な(通常硬度が低い)組成から耐摩耗性の良好な(通常硬度が高い)組成へと段階的にないし連続的に変化させることができる。 By adjusting the gas injection amount or gas ratio, the composition of the film formation is good from the composition having good adhesion to the iron-based alloy substrate (normally low hardness) to the composition having good wear resistance (normally high hardness). It can be changed stepwise or continuously.
 さらに、各層の反応成膜工程間の移行に際して、注入ガス量・ガス比を段階的又は連続的に変化させて各傾斜組成の層間結合層を反応成膜させることが望ましい。各層間の組成変化の落差(ギャップ)が縮小されて、熱衝撃や機械的衝撃を受けた場合の層間剥離がより発生し難くなるためである。 Furthermore, it is desirable to carry out the reactive film formation of the interlayer bonding layers having the respective gradient compositions by changing the injection gas amount and the gas ratio stepwise or continuously during the transition between the reactive film formation processes of the respective layers. This is because the drop (gap) in composition change between the respective layers is reduced, and delamination is less likely to occur when subjected to thermal shock or mechanical shock.
 成膜時の、基材温度は、通常、400~500℃の範囲で調節して行う。 The substrate temperature during film formation is usually adjusted in the range of 400 to 500 ° C.
 強靭鋼材の焼き戻し温度が、前述の如く、通常、約500~650℃であるため、温度バラツキを考慮した場合、500℃以下が望ましく、逆に400℃未満であると、各成膜の密着性を得難くなる。なお、IPの成膜温度(基板温度)は、通常550℃が上限である。 As described above, the tempering temperature of the tough steel is usually about 500 to 650 ° C. Therefore, when temperature variation is taken into consideration, 500 ° C. or less is desirable. It becomes difficult to get sex. The upper limit of the IP film formation temperature (substrate temperature) is usually 550 ° C.
本発明における複合被膜の一例を示すモデル図Model diagram showing an example of a composite coating in the present invention 本発明に使用するIP装置の一例を示す概略モデル図Schematic model diagram showing an example of an IP device used in the present invention
符号の説明Explanation of symbols
  12  基材
  14  TiN膜
  16  TiVCN膜
  18  VC膜
  20  第一層間結合層
  22  第二層間結合層
12 Substrate 14 TiN film 16 TiVCN film 18 VC film 20 First interlayer coupling layer 22 Second interlayer coupling layer
 以下、本発明を実施形態に基づいて、詳細に説明をする。本明細書で、化学式TiN、TiVCN、VCは、それぞれ窒化バナジウム(立方晶系)、炭窒化チタンバナジウム(同)、炭化バナジウム(同)を意味する。 Hereinafter, the present invention will be described in detail based on embodiments. In this specification, the chemical formulas TiN, TiVCN, and VC mean vanadium nitride (cubic system), titanium vanadium carbonitride (same), and vanadium carbide (same), respectively.
 また、「HV」は、JIS Z 2244に準じて測定したビッカース硬さを意味する。 Also, “HV” means Vickers hardness measured according to JIS Z 2244.
 図1は、本発明の一実施形態の鉄基合金製品の部分断面図であり、基本的には、鋼材製の基材12の表面に基材12側から順に配されたTiN膜14、TiVCN膜16、VC膜18からなるバナジウム系の複合被膜を備えた鉄基合金製品(例えば、塑性加工用金型)である。 FIG. 1 is a partial cross-sectional view of an iron-based alloy product according to an embodiment of the present invention. Basically, a TiN film 14 and a TiVCN are arranged on the surface of a steel base 12 in order from the base 12 side. This is an iron-based alloy product (for example, a mold for plastic working) provided with a vanadium-based composite coating composed of the film 16 and the VC film 18.
 上記において、基材12側から順にTiN膜14、TiVCN膜16、VC膜18と配すると、前述の如く、その順に硬度が高くなり、基材、特に鋼材製基材(通常、HV600~900)との硬度差を小さくすることができる。したがって、表面硬度が高くても基材との密着性を確保し易くなる。そして、VC膜18は、前述の如く、HV3500であり、耐摩耗性確保の要因(パラメータ)となる表面硬度を確保しやすい。なお、さらに耐摩耗性の向上が要求される場合は、耐摩耗性の他の要因である摩擦係数(動摩擦係数:JIS K 7125)を低減させることが望ましい。その動摩擦係数(μ)は、0.3以下、望ましくは,0.2以下とする。当該摩擦係数は、後述の如く、炭化水素(炭素供給源)の量を増大させることにより容易に得ることができる。 In the above, when the TiN film 14, the TiVCN film 16, and the VC film 18 are arranged in this order from the base material 12 side, the hardness increases in that order as described above, and the base material, particularly a steel base material (usually HV 600 to 900). And the hardness difference can be reduced. Therefore, even if the surface hardness is high, it becomes easy to ensure adhesion with the substrate. As described above, the VC film 18 is HV3500, and it is easy to ensure the surface hardness that is a factor (parameter) for ensuring wear resistance. If further improvement in wear resistance is required, it is desirable to reduce the friction coefficient (dynamic friction coefficient: JIS K 7125), which is another factor of wear resistance. The dynamic friction coefficient (μ) is 0.3 or less, preferably 0.2 or less. As will be described later, the friction coefficient can be easily obtained by increasing the amount of hydrocarbon (carbon source).
 本実施形態では、必然的ではないが、さらに、複合被膜の各層間、すなわちTiN膜14/TiVCN膜16/VC膜18間に、傾斜組成の第一・第二層間結合層20、22を介在させてある。すなわち、第一層間結合層20は、TiリッチのTiVCN傾斜層とし、第二層間結合層22は、VリッチのTiVCN傾斜層とする。 In the present embodiment, although not indispensable, first and second interlayer coupling layers 20 and 22 having a gradient composition are further interposed between the layers of the composite coating, that is, between the TiN film 14 / TiVCN film 16 / VC film 18. I'm allowed. That is, the first interlayer coupling layer 20 is a Ti-rich TiVCN graded layer, and the second interlayer coupling layer 22 is a V-rich TiVCN graded layer.
 TiVCN層乃至TiVCN傾斜層は、TiVCNの化合物の形態で大部分が存在すると考えられが、TiC、TiN、TiCN、VC、VN及びVCNのその他の多原子価化合物の形態でも多少存在すると考えられる。 The TiVCN layer to the TiVCN gradient layer are considered to exist mostly in the form of TiVCN compounds, but are also considered to exist somewhat in the form of other polyvalent compounds of TiC, TiN, TiCN, VC, VN and VCN.
 これらの層間結合層20、22の存在により、各層間の硬度差がさらに縮まり、結果的に機械的衝撃や熱衝撃による層間剥離が発生し難くなり、結果的にバナジウム系被膜の靱性が増大する、すなわち、耐久性が増大する。 The presence of these interlayer bonding layers 20 and 22 further reduces the hardness difference between the respective layers, and as a result, delamination due to mechanical shock or thermal shock hardly occurs, and as a result, the toughness of the vanadium-based coating increases. That is, durability is increased.
 より具体的には、各膜層の膜厚比を、TiN膜14/TiVCN膜16/VC膜18=0.5/0.5/9~3/3/4、望ましくは、1/1/8~2.5/2.5/5、最も望ましくは、約2/2/6とし、合計膜厚2~50μm、望ましくは3~12μm、最も望ましくは約10μmとする。 More specifically, the film thickness ratio of each film layer is set such that TiN film 14 / TiVCN film 16 / VC film 18 = 0.5 / 0.5 / 9 to 3/3/4, preferably 1/1 / The thickness is 8 to 2.5 / 2.5 / 5, most preferably about 2/2/6, and the total film thickness is 2 to 50 μm, preferably 3 to 12 μm, and most preferably about 10 μm.
 当該VC膜のTiN膜またはTiVCN膜に対する膜厚比が大きすぎると、VC膜の膜厚が特に10μmを越えるような場合、膜の圧縮応力が増大するために、VC膜が自己破壊若しくは下層(TiVCN膜)との層間剥離が発生し易い。また、膜靱性が低くなるため、鍛造時の衝撃により、VC膜に亀裂が発生し易くなる。 If the film thickness ratio of the VC film to the TiN film or the TiVCN film is too large, the compression stress of the film increases when the film thickness of the VC film exceeds 10 μm. Delamination with the TiVCN film is likely to occur. Moreover, since the film toughness is lowered, cracks are likely to occur in the VC film due to impact during forging.
 逆にVC膜のTiN膜またはTiVCN膜に対する膜厚比が小さすぎると、被膜全体の硬度がHV3300以下となって、耐摩耗性を得難くなる。 Conversely, if the film thickness ratio of the VC film to the TiN film or TiVCN film is too small, the hardness of the entire coating becomes HV3300 or less, making it difficult to obtain wear resistance.
 また、複合被膜の合計膜厚が小さすぎると、所要の表面硬さ(耐摩耗性)を得難く、逆に大きすぎると、複合被膜の基材からの層剥離が発生し易くなる。また、膜靱性が低下するためプレス・鍛造時の衝撃により被膜に亀裂が発生し易くなる。 Also, if the total film thickness of the composite coating is too small, it is difficult to obtain the required surface hardness (abrasion resistance), and conversely if it is too large, delamination of the composite coating from the substrate tends to occur. Further, since the film toughness is lowered, cracks are likely to occur in the coating film due to impact during pressing and forging.
 また、層間結合層20、22の層厚(膜厚)は、バナジウム系被膜の構成層であるTiN膜、TiVCN膜、VC膜に比べて、格段に薄いものである。層間結合の作用を奏すれば、可及的に薄い方が望ましく、通常、TiN膜、TiVCN膜の0.5/10~3/10、望ましくは、1/10~2/10、最も望ましくは約1.5/10とする。設定理由は、下記の如くであると推定される。 Further, the layer thickness (film thickness) of the interlayer coupling layers 20 and 22 is much thinner than the TiN film, the TiVCN film, and the VC film that are the constituent layers of the vanadium-based film. It is desirable that the layer be as thin as possible if it has an interlayer coupling effect. Usually, it is 0.5 / 10 to 3/10, preferably 1/10 to 2/10, most preferably TiN film or TiVCN film. About 1.5 / 10. The reason for the setting is estimated as follows.
 基材と被膜との硬度格差による剥離を抑制するために三層構造とするだけで充分と考えられる。また、層間結合層が無くても被膜層間の硬度格差はHV1000以内であるため、使用目的に対して上記設定以上の厚さは必要ないと考えられる。 It is considered sufficient to have a three-layer structure in order to suppress peeling due to the hardness difference between the substrate and the coating. Further, even if there is no interlayer bonding layer, the hardness difference between the coating layers is within HV1000, and therefore it is considered that a thickness greater than the above setting is not necessary for the purpose of use.
 ここでは、鉄基合金は、クロム含有率1.0~30質量%の鋼材(通常、工具鋼)を使用する。本発明のクロムを含有しない鋼材は、本発明の解決使用とする課題(複合被膜除去後の金型面があばた面となる。)が発生せず、金属塑性加工用金型の如く、機械的衝撃、熱衝撃を受け易い鉄基合金製品を予定しているためである。 Here, as the iron-based alloy, a steel material (usually tool steel) having a chromium content of 1.0 to 30% by mass is used. The steel material not containing chromium according to the present invention does not have the problem of solving the problem of the present invention (the mold surface after the removal of the composite film becomes a fluttered surface), and is mechanically similar to a metal plastic working mold. This is because iron-base alloy products that are susceptible to shock and thermal shock are planned.
 上記工具鋼としては、高速度鋼、ダイス鋼、粉末ハイス鋼、セミハイス鋼等のFe基合金(強靭鋼材)を好適に使用できる。 As the tool steel, Fe-based alloys (tough steel materials) such as high-speed steel, die steel, powdered high-speed steel, and semi-high-speed steel can be suitably used.
 上記鉄基合金の具体例としては、表1に示すようなものを例示できる。表1では、各鋼材のクロム含有率も併記した。 Specific examples of the iron-based alloy include those shown in Table 1. In Table 1, the chromium content of each steel material is also shown.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 次に、上記実施形態の鉄基合金製品(塑性加工用金型)を、工具鋼からなる鉄基合金基材上に、複合被膜を形成(成膜)して製造する場合を例に採り説明をする。 Next, the iron base alloy product (mold for plastic working) of the above embodiment will be described by taking as an example a case where a composite film is formed (film formation) on an iron base alloy substrate made of tool steel. do.
 本実施形態では、図2に示すようなIP装置、通常、アークIP(AIP)装置を用いて行う。AIP法は、バナジウムを蒸発源とし、反応ガスを窒素ガス及び/又は炭化水素ガスとして注入ガス量・ガス比を膜種に対応させて調節維持することにより、TiN膜、TiVCN膜、VC膜を高純度で基材上に反応成膜させることが容易なためである。当然、多陰極熱電子照射法、高周波励起法、ホロカソードディスチャージ法、クラスタ法、活性化反応蒸着法、等他のタイプのIP法も可能である。 In this embodiment, an IP device as shown in FIG. 2, usually an arc IP (AIP) device, is used. The AIP method uses vanadium as an evaporation source, nitrogen gas and / or hydrocarbon gas as a source gas, and adjusts and maintains the injection gas amount and gas ratio corresponding to the film type, thereby forming a TiN film, a TiVCN film, and a VC film. This is because it is easy to form a reactive film on a substrate with high purity. Naturally, other types of IP methods such as a multi-cathode thermionic irradiation method, a high-frequency excitation method, a holo-cathode discharge method, a cluster method, and an activated reaction deposition method are also possible.
 IP装置は、チャンバー24内に、チタン又はバナジウムを保持する複数(図例では2個)の蒸発源保持部(ポット部)25、25Aと、バイアス電圧源26と接続された被処理物(基材)28を載置する回転テーブル30を備えている。さらに、チャンバー24は、チャンバー内を所定真空度に維持する排気ポンプと接続される排気口32と、反応ガス(窒素及び/又はメタン)を導入する反応ガス導入口34とを備えるとともに、チャンバー24内を所定温度に維持するとともに基材(基板)28も所定温度に維持するヒータ36を備えている。 The IP device includes a plurality of (two in the illustrated example) evaporation source holding portions (pot portions) 25 and 25A for holding titanium or vanadium in a chamber 24, and a workpiece (base) connected to a bias voltage source 26. Material) 28 is provided. Furthermore, the chamber 24 includes an exhaust port 32 connected to an exhaust pump that maintains the inside of the chamber at a predetermined degree of vacuum, and a reaction gas introduction port 34 for introducing a reaction gas (nitrogen and / or methane). A heater 36 that maintains the interior at a predetermined temperature and also maintains the substrate (substrate) 28 at a predetermined temperature is provided.
 そして、AIP法により反応成膜する場合を例に採り説明する。 Then, the case of reactive film formation by the AIP method will be described as an example.
 蒸発源とするチタン(Ti)及びバナジウム(V)は、通常、ツウナインからスリーナインの純度のものを使用する。また、バナジウムと反応する元素である窒素及び炭素の供給源であるガスは、前者は窒素ガス(N2)、後者としてメタン(CH4)、エタン、エチレン、アセチレン等の炭化水素ガスを使用可能である。炭化水素ガスとしては、未反応性ガスが装置や基材表面を汚染するため、煤の発生し難い、メタンが望ましい。そして、それらの純度は、それぞれ、スリーナインからシックスナインとする。 As the evaporation source, titanium (Ti) and vanadium (V) are usually used in a purity of tunaine to threeine. In addition, the gas that is the source of nitrogen and carbon, which are elements that react with vanadium, can use nitrogen gas (N 2 ) for the former and hydrocarbon gases such as methane (CH 4 ), ethane, ethylene, acetylene for the latter It is. As the hydrocarbon gas, methane, which is difficult to generate soot, is desirable because unreactive gas contaminates the surface of the apparatus and the substrate. And the purity of each is made from three nine to six nine.
 そして、AIP法による成膜条件は、例えば、表2の通りとする。 The film formation conditions by the AIP method are as shown in Table 2, for example.
 通常、チタン、バナジウムを保持する一方又は双方のポットを加熱して、それらの一方又は双方を同時に溶解蒸発させる。又は、全てのポットに先ずチタンを保持しておいて、加熱蒸発させ第1層(TiN膜)を成膜した後、チャンバー内の真空を解除し、複数のポットの半数を入れ替えて、第2層(TiVCN膜)、第3層(VC膜)を順次成膜することもできる。 Usually, one or both pots holding titanium and vanadium are heated, and one or both of them are dissolved and evaporated simultaneously. Alternatively, titanium is first held in all pots, heated and evaporated to form the first layer (TiN film), the vacuum in the chamber is released, and half of the plurality of pots are replaced, and the second A layer (TiVCN film) and a third layer (VC film) can also be sequentially formed.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
 上記条件項目の着眼点について以下にそれぞれ説明する。 The focus points of the above condition items will be described below.
 1)真空度:真空度が高すぎる(絶対圧が低い)と、反応ガス量が少ない状態となり、成膜速度が遅くなり生産性が低下し、また、成膜された被膜が、金属成分過多の組成になってしまったり、粒子が粗くて空隙の多いものになったりしやすい。(結晶核の生成が遅くなるためと推定される。)
 逆に真空度が低すぎる(絶対圧が高い)と、反応ガス量が過剰となり、反応に使用されずに充分に活性化されていないガスが、成長被膜面で吸着インヒビタ(抑制剤)として作用するおそれがある。
1) Degree of vacuum: If the degree of vacuum is too high (the absolute pressure is low), the amount of reaction gas will be small, the deposition rate will be slowed and productivity will be reduced, and the deposited film will contain excessive metal components. Or the particles are coarse and have many voids. (It is estimated that the generation of crystal nuclei is delayed.)
On the other hand, if the degree of vacuum is too low (the absolute pressure is high), the amount of reaction gas becomes excessive, and the gas that is not used in the reaction and not fully activated acts as an adsorption inhibitor (inhibitor) on the growth film surface. There is a risk.
 特に、金型に本発明を適用して耐摩耗性の向上を期待する場合、表面膜(VC膜)は、膜硬度とともに滑り性も要求され、そのような場合には、潤滑剤として作用するC(カーボン)を膜中に含有させることが望ましい。しかし、C含有率が過剰になると膜硬度が低下して、やはり耐摩耗性が低下する。そのようなバランスが採れる真空度は、約10~50mtorr(1.33~6.65Pa)、望ましくは約20mtorr(2.66Pa)、メタンガス量で、約400~600mL/min、望ましくは約500mL/minとする。 In particular, when application of the present invention to a mold is expected to improve wear resistance, the surface film (VC film) is required to have slipperiness as well as film hardness. In such a case, it acts as a lubricant. It is desirable to contain C (carbon) in the film. However, when the C content is excessive, the film hardness is lowered and the wear resistance is also lowered. The degree of vacuum that can achieve such a balance is about 10 to 50 mtorr (1.33 to 6.65 Pa), preferably about 20 mtorr (2.66 Pa), and the amount of methane gas is about 400 to 600 mL / min, preferably about 500 mL / min.
 2)アーク電流:電流値が低すぎると成膜速度が遅くなり、逆に高過ぎると、装置の安全性の見地から望ましくない。 2) Arc current: If the current value is too low, the film forming speed is slow, and conversely if it is too high, it is not desirable from the viewpoint of the safety of the apparatus.
 3)バイアス電圧:一般的に、バイアス電圧が高いほど成膜速度が遅くなるため、生産性を考慮して適当な範囲で設定する。供給ガスが窒素(N2)の場合、バイアス電圧の窒化物成膜結晶にほとんど影響はなく50~400V、望ましくは、50~200Vの範囲で適宜設定できる。CH4等の炭化水素の場合、バイアス電圧が低いと、VCの結晶性が低くなって、炭化物成膜の耐摩耗性が得難くなる。このため、窒素と同様、50~400Vの範囲でも可能であるが、生産性と結晶性とのバランスから、約100~200Vが望ましく、さらに望ましくは約150Vとする。 3) Bias voltage: Generally, the higher the bias voltage, the slower the film formation speed. Therefore, the bias voltage is set within an appropriate range in consideration of productivity. When the supply gas is nitrogen (N 2 ), there is almost no influence on the nitride film crystal of the bias voltage, and it can be appropriately set within the range of 50 to 400V, preferably 50 to 200V. In the case of a hydrocarbon such as CH 4 , if the bias voltage is low, the crystallinity of VC becomes low and it becomes difficult to obtain the wear resistance of the carbide film. Therefore, like nitrogen, it can be in the range of 50 to 400 V, but is preferably about 100 to 200 V, and more preferably about 150 V, from the balance between productivity and crystallinity.
 4)基板温度:温度が高いほど成膜速度が速くて望ましいが、省エネルギー及び基材の耐熱性の見地から、基材が鋼の場合、焼き戻しによる寸法歪が発生しない温度以下、通常350~550℃、望ましくは400~500℃とする。なお、基材がセラミックスの如く、熱歪が発生しない場合は、IPの最高温度550℃前後で行ってもよい。 4) Substrate temperature: The higher the temperature, the faster the film formation rate is desirable, but from the standpoint of energy saving and heat resistance of the base material, when the base material is steel, the temperature is below the temperature at which dimensional distortion due to tempering does not occur, usually 350 ~ 550 ° C., preferably 400 to 500 ° C. In the case where the substrate does not generate thermal strain as in the case of ceramics, it may be performed at a maximum IP temperature of about 550 ° C.
 また、各層間に層間結合層を形成する場合におけるガス流量及び着膜時間の一例を表3に示す。表2において、XはTi及びVの充填量および膜厚により異なるが、例えば、Ti充填量約500g、V充填量約700gで合計膜厚3~10μmの場合、X=300~3000sとする。 Table 3 shows an example of the gas flow rate and the deposition time when an interlayer coupling layer is formed between the layers. In Table 2, X varies depending on the filling amounts and film thicknesses of Ti and V. For example, when the Ti filling amount is about 500 g, the V filling amount is about 700 g, and the total film thickness is 3 to 10 μm, X = 300 to 3000 s.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 表2の各層間結合層のガス量及び圧力は、瞬時にその量及び圧力になるわけでなく、通常、着膜時間の中間時間、例えば40~50s後にその圧力に連続的に上昇して、その後設定値を維持するものである。その点は、TiVCN膜、VC膜でも同様である。 The amount and pressure of the gas in each interlayer bonding layer in Table 2 do not instantaneously become the amount and pressure, but usually increase continuously to the pressure after an intermediate time of the film formation time, for example, 40 to 50 s, Thereafter, the set value is maintained. The same applies to the TiVCN film and the VC film.
 鋼を基材とし、複合膜を形成する場合は、原則的には硬度の低い方を基材側とし、各層間には、層間結合層を形成するようにすることが望ましい。 When forming a composite film using steel as a base material, it is generally desirable that the lower hardness is the base material side, and an interlayer coupling layer is formed between each layer.
 したがって、本発明の成膜方法は、一番硬度の低いTiN膜でも硬度はHV2000であり、望ましくはHV3000以上の硬度のバナジウム系被膜を容易に鋼等の基材上に密着性良好に成膜できる。 Therefore, in the film forming method of the present invention, even the TiN film having the lowest hardness has a hardness of HV2000, and preferably a vanadium-based film having a hardness of HV3000 or more is easily formed on a substrate such as steel with good adhesion. it can.
 次に、本発明の効果を確認するために実施例および従来例(比較例)について行った試験例を説明する。 Next, test examples performed on the examples and the conventional example (comparative example) in order to confirm the effect of the present invention will be described.
 なお、IP装置は、神戸製鋼社製「AIP4024型」を用い、Vは純度スリーナインのもの800gを充填し、N2は純度ファイブナイン、CH4は純度スリーナインのものをそれぞれ使用した。 As the IP device, “AIP4024 type” manufactured by Kobe Steel Co., Ltd. was used. V was filled with 800 g of pure three nine, N 2 was pure five nine, and CH 4 was pure three nine.
 また、成膜基材は、いずれも、冷間ダイス鋼(SKD11:HV650、HRC58.0)製のプレス金型を用いた。なお、金型の形状は、短四角柱で、複合被膜形成前において、縦:70.200mm、横:55.900mm、高さ:42.000mmのものを用いた。 In addition, as the film forming substrate, a press die made of cold die steel (SKD11: HV650, HRC58.0) was used. In addition, the shape of the mold was a short square column, and before forming the composite coating, a length: 70.200 mm, a width: 55.900 mm, and a height: 42.000 mm were used.
 実施例:表3において、X=1200sとして基材である金型のプレス面(附形面)に合計膜厚約10μmの複合被膜(TiN膜/TiVCN膜/VC膜)を成膜した。 Example: In Table 3, a composite film (TiN film / TiVCN film / VC film) having a total film thickness of about 10 μm was formed on the press surface (molded surface) of the mold as a base material with X = 1200 s.
 従来例:表4に示す成膜条件で複合被膜を基材である金型のプレス面に合計膜厚約10μmの複合被膜(TiN膜/TiVCN膜/VC膜)を成膜した。 Conventional example: A composite coating (TiN film / TiVCN film / VC film) having a total film thickness of about 10 μm was formed on the press surface of a mold as a base material under the film forming conditions shown in Table 4.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 そして、上記で得た各実施例及び従来例の金型について、下記項目の試験を行った。 And the test of the following item was done about each metal mold | die obtained by the above and the conventional example.
 (1)耐久性評価:
 実施例及び従来例について、ワーク材(高張力鋼板590kg級、3.6mmt)を用いて、不良品が発生するまでの型寿命(摩耗による成形不良)の成形個数を評価した。
(1) Durability evaluation:
About the Example and the prior art example, the number of moldings of the mold life (molding failure due to wear) until a defective product was generated was evaluated using a work material (high-tensile steel plate 590 kg class, 3.6 mmt).
 実施例・従来例ともに、14万個成形でき、実施例は従来例と同等の耐久性能を有することが確認できた。 In both the example and the conventional example, 140,000 pieces could be molded, and it was confirmed that the example had the same durability performance as the conventional example.
 (2)除膜に伴う面粗度変化:
 上記(1)で耐久性評価(14万個成形後)を行った後の実施例・従来例の金型について、それぞれ下記除膜液を用いて下記条件で用いて除膜後、面粗度を測定した。なお、硬質処理膜なし未処理品についても、面粗度を測定した。なお、表面粗さは、触針式表面粗さ測定器を用いて、10点平均荒さRzを求めた(JIS B 0601-1982)。
(2) Surface roughness change accompanying film removal:
For the molds of the examples and conventional examples after the durability evaluation (after 140,000 moldings) in the above (1), using the following film removing solution under the following conditions, after removing the film, the surface roughness Was measured. The surface roughness of the untreated product without the hard treatment film was also measured. For the surface roughness, a 10-point average roughness Rz was determined using a stylus type surface roughness measuring instrument (JIS B 0601-1982).
  ・実施例:市販チタン系IP用剥離剤「チタニック94B」(日本表面処理化学株式会社商品名)の30mL/L希釈液を用いて、30℃×12hの条件で行った。 Example: It was performed under the condition of 30 ° C. × 12 h using a 30 mL / L diluted solution of a commercially available titanium-based IP release agent “Titanic 94B” (trade name of Nippon Surface Treatment Chemical Co., Ltd.).
  ・従来例:自社調製にバナジウム系IP用剥離剤(酸性水溶液)を用いて、30℃×12hの条件で行った。 Conventional example: Vanadium-based IP release agent (acidic aqueous solution) was used for in-house preparation, and the conditions were 30 ° C. × 12 h.
 その結果は、従来例:Rz1.95μm、実施例:Rz0.25μm、未処理品:Rz0.2μmであった。本発明の場合、面粗度(表面粗さ)変化がほとんどないことが確認できた。 The results were as follows: Conventional example: Rz 1.95 μm, Example: Rz 0.25 μm, Untreated product: Rz 0.2 μm. In the case of the present invention, it was confirmed that there was almost no change in surface roughness (surface roughness).
 (3)除膜後のラッピングによる寸法変化量
 上記除膜後の各金型について、面粗度Rz:0.2μm以下になるまで、ラッピング剤(ダイヤモンドペースト)を用いて未満となるように、ラッピング処理をし、その後の、寸法を測定して変化量を求めた。なお、側面(横幅)に対しては、プレス加工面でないため、ラッピングを行わなかった。
(3) Dimensional change due to lapping after film removal For each mold after film removal, lapping is performed using a lapping agent (diamond paste) until the surface roughness Rz: 0.2 μm or less. After processing, the dimensions were measured to determine the amount of change. Note that the side surface (width) was not lapped because it was not a press-worked surface.
 その結果は、従来例は、縦:-90μm、高さ:-120μmであったのに対し、実施例は、縦:-1μmm、高さ:-2μmであった。すなわち、本発明では、ラッピング量が非常に少なくてよいことが確認できた。
                                                                        
As a result, in the conventional example, the length was −90 μm and the height was −120 μm, whereas in the example, the length was −1 μmm and the height was −2 μm. That is, in the present invention, it was confirmed that the wrapping amount may be very small.

Claims (9)

  1.  クロム炭化物を含有する鉄基合金基材の表面にバナジウム(V)系/チタン(Ti)系の複合被膜を備えた鉄基合金製品において、
     前記複合被膜が、基材側から順に配されたTiN膜、TiVCN膜及びVC膜を備え、該VC膜が最表面に位置することを特徴とする鉄基合金製品。
    In an iron-based alloy product comprising a vanadium (V) -based / titanium (Ti) -based composite coating on the surface of an iron-based alloy substrate containing chromium carbide,
    An iron-based alloy product, wherein the composite coating includes a TiN film, a TiVCN film, and a VC film arranged in order from the substrate side, and the VC film is located on the outermost surface.
  2.  前記複合被膜の各層間に、さらに、傾斜組成の層間結合層が介在していることを特徴とする請求項1記載の鉄基合金製品。 2. The iron-based alloy product according to claim 1, wherein an interlayer coupling layer having a gradient composition is further interposed between the layers of the composite coating.
  3.  前記複合被膜の最外層硬度がビッカース硬度:HV3000以上であることを特徴とする請求項1記載の鉄基合金製品。 The iron-based alloy product according to claim 1, wherein the outermost layer hardness of the composite coating is Vickers hardness: HV3000 or more.
  4.  前記複合被膜において、膜厚比が、TiN膜/TiVCN膜/VC膜=0.5/0.5/9~3/3/4であり、合計膜厚2~50μmであることを特徴とする請求項3記載の鉄基合金製品。 In the composite coating, the film thickness ratio is TiN film / TiVCN film / VC film = 0.5 / 0.5 / 9 to 3/3/4, and the total film thickness is 2 to 50 μm. The iron-base alloy product according to claim 3.
  5.  前記鉄基合金基材が、クロム含有率1.0~30質量%の鋼材であることを特徴とする請求項1記載の鉄基合金製品。 2. The iron-base alloy product according to claim 1, wherein the iron-base alloy base material is a steel material having a chromium content of 1.0 to 30% by mass.
  6.  適用製品が金属塑性加工用金型であることを特徴とする請求項1記載の鉄基合金製品。 2. The iron-based alloy product according to claim 1, wherein the applied product is a metal plastic working mold.
  7.  請求項1記載の鉄基合金製品を製造する方法において、
     前記鉄基合金基材の表面に、V及び/又はTiを蒸発源とし、注入ガスを窒素ガス及び/又は炭化水素ガスとして注入ガス量・ガス比を膜種に対応させて調節維持することにより、前記複合被膜の各層をそれぞれ反応成膜させることを特徴とする鉄基合金製品の製造方法。
    A method for producing an iron-base alloy product according to claim 1,
    On the surface of the iron-based alloy base material, V and / or Ti is used as the evaporation source, and the injected gas is nitrogen gas and / or hydrocarbon gas, and the amount and ratio of the injected gas are adjusted and maintained according to the film type. A method for producing an iron-based alloy product, characterized in that each layer of the composite coating is formed by reactive film formation.
  8.  請求項2記載の鉄基合金製品を製造する方法において、
     前記鉄基合金基材の表面に、V及び/又はTiを蒸発源とし、注入ガスを窒素ガス及び/又は炭化水素ガスとして注入ガス量・ガス比を膜種に対応させて調節維持することにより、前記複合被膜の各層をそれぞれ反応成膜させるとともに、
     前記各層の反応成膜工程間の移行に際して、注入ガス量・ガス比を段階的又は連続的に変化させて各傾斜組成の層間結合層を反応成膜させることを特徴とする鉄基合金製品の製造方法。
    A method for producing an iron-base alloy product according to claim 2,
    On the surface of the iron-based alloy base material, V and / or Ti is used as the evaporation source, and the injected gas is nitrogen gas and / or hydrocarbon gas, and the amount and ratio of the injected gas are adjusted and maintained according to the film type. In addition, each layer of the composite coating is formed by reactive film formation,
    An iron-based alloy product characterized in that, during the transition between the reactive film forming steps of each layer, an interlayer bonding layer of each gradient composition is formed by reactive film formation by changing the injection gas amount and gas ratio stepwise or continuously. Production method.
  9.  前記反応成膜に際しての基材温度を400~500℃の範囲に調節して行うことを特徴とする請求項7又は8記載の鉄基合金製品の製造方法。

                                                                            
    The method for producing an iron-based alloy product according to claim 7 or 8, wherein the base material temperature in the reactive film formation is adjusted to a range of 400 to 500 ° C.

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JP2012158793A (en) * 2011-01-31 2012-08-23 Tottori Institute Of Industrial Technology Film formation method, and member coated with hard coating film
CN105102664A (en) * 2013-03-29 2015-11-25 西铁城控股株式会社 Rigid decorative member having gray-tone layer
CN114872311A (en) * 2021-02-05 2022-08-09 苏州泛普智能科技有限公司 Automatic film laminating device

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JP2012158793A (en) * 2011-01-31 2012-08-23 Tottori Institute Of Industrial Technology Film formation method, and member coated with hard coating film
CN105102664A (en) * 2013-03-29 2015-11-25 西铁城控股株式会社 Rigid decorative member having gray-tone layer
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EP2980264A4 (en) * 2013-03-29 2016-12-28 Citizen Holdings Co Ltd Rigid decorative member having gray-tone layer
US9869011B2 (en) 2013-03-29 2018-01-16 Citizen Watch Co., Ltd. Hard decorative member having gray-tone layer
CN114872311A (en) * 2021-02-05 2022-08-09 苏州泛普智能科技有限公司 Automatic film laminating device
CN114872311B (en) * 2021-02-05 2023-11-14 合肥元顿传感科技有限公司 Automatic laminating device

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