WO2009090425A1 - Composition de rinçage - Google Patents

Composition de rinçage Download PDF

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Publication number
WO2009090425A1
WO2009090425A1 PCT/GB2009/050025 GB2009050025W WO2009090425A1 WO 2009090425 A1 WO2009090425 A1 WO 2009090425A1 GB 2009050025 W GB2009050025 W GB 2009050025W WO 2009090425 A1 WO2009090425 A1 WO 2009090425A1
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
curable
monomer
composition
meth
Prior art date
Application number
PCT/GB2009/050025
Other languages
English (en)
Inventor
David A Seuferling
Original Assignee
Sericol Limited
Fujifilm Sericol Usa Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sericol Limited, Fujifilm Sericol Usa Inc filed Critical Sericol Limited
Publication of WO2009090425A1 publication Critical patent/WO2009090425A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/37—Polymers
    • C11D3/3746—Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • C11D3/3757—(Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions
    • C11D3/3765—(Co)polymerised carboxylic acids, -anhydrides, -esters in solid and liquid compositions in liquid compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/165—Prevention or detection of nozzle clogging, e.g. cleaning, capping or moistening for nozzles
    • B41J2/16517—Cleaning of print head nozzles
    • B41J2/16552—Cleaning of print head nozzles using cleaning fluids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Definitions

  • This invention relates to a flushing composition for a radiation-curing printing apparatus, and in particular to a flushing composition for use with a UV-curing ink-jet printer.
  • an ink comprising a curable monomer, a photoinitiator and optionally other conventional components is applied to a substrate.
  • the ink is cured or hardened by irradiating the ink with actinic radiation, such as UV light, which causes the monomer to polymerise (cure).
  • actinic radiation such as UV light
  • screen printing processes the ink is applied to a fine mesh screen which has areas blocked with a non-permeable material to form a stencil. Ink passes through the screen in the areas that are not blocked, and forms a pattern on a substrate placed under the screen.
  • the screen can be made of stainless steel metal mesh, for example.
  • ink-jet printing processes minute droplets of black, white or coloured ink are ejected in a controlled manner from one or more reservoirs or printing heads through narrow nozzles on to a substrate which is moving relative to the reservoirs.
  • residual ink may collect on the nozzle plate which means that the nozzle plate must be cleaned periodically in order to maintain printing quality.
  • Flushing compositions are used to remove residual ink from radiation-curing printing apparatus.
  • a flushing composition should be a good solvent for the ink and, for radiation-curing printing processes in particular, the flushing composition should preferably be able to remove cured or dried ink from the printing apparatus.
  • a flushing composition should also be compatible with the ink in order to avoid precipitation of ink vehicle components or flocculation of the ink pigment. Such precipitation and/or flocculation may lead to clogging of the screen or print head which could lead to a loss of print quality, or damage to the printing apparatus.
  • Flushing compositions can be applied manually, for example by applying the flushing composition to a cloth and wiping the print head or screen clean. Alternatively, the flushing composition can be sprayed directly on to the print head or screen during an automatic cleaning cycle.
  • TPM tripropylene glycol monomethyl ether
  • VOC volatile organic compound
  • Possible alternative flushing solvents include acetone and soy oil.
  • Acetone is exempt from the California VOC regulations but is highly flammable and may cause pigment flocculation in UV-curable inks.
  • Soy oil is a low VOC solvent but it has poor solvency for inks.
  • Methyl acetate has also been suggested as an alternative flushing composition. Methyl acetate is exempt from the VOC legislation but this solvent is flammable and forms toxic methyl alcohol as a metabolite.
  • water-based cleaners such as Spray Clean 12 available from Applied Cleaning Technologies.
  • spray Clean 12 available from Applied Cleaning Technologies.
  • water-based cleaners generally have a low VOC content and low toxicity, the compatibility with ink can be very poor, leading to precipitation and flocculation of ink components.
  • some ink-jet print heads are not designed to tolerate water.
  • the present invention therefore provides the use of a composition comprising a radiation-curable (meth)acrylate monomer having a volatile organic compound (VOC) content of less than 100 g/L as measured by EPA Method 24 as a flushing composition for a radiation-curing printing apparatus.
  • VOC volatile organic compound
  • the present invention provides the use of a composition comprising a radiation-curable (meth)acrylate monomer having a molecular weight of 340 to 600 as a flushing composition for a radiation-curing printing apparatus.
  • flushing composition is meant a composition that is used to clean residual ink from a printing apparatus. Flushing compositions are also known as “flushing solution”, “cleaning solution”, “flush” or “head wash”.
  • compositions used according to the present invention provide excellent solvency for radiation-curable inks and are therefore highly effective cleaners of printing apparatus. Furthermore, the compositions are compatible with inks, and do not lead to precipitation and flocculation of the ink components.
  • the flushing compositions used according to the invention do not compromise printing performance in prints made immediately after cleaning. This is because any radiation-curable (meth)acrylate monomer that contaminates the ink is simply cured when the ink is irradiated, which means that no slow-drying solvent is left in the ink. Finally, the flushing compositions are not highly flammable and are therefore safe to use in a commercial environment.
  • Some modern radiation-curing ink-jet printers comprise an automatic cleaning system which sprays a flushing composition on to the nozzle plate.
  • the flush/ink mixture is removed from the plate using a vacuum assembly.
  • the composition In order for a flushing composition to be suitable for use in a vacuum assembly, the composition must have a relatively low viscosity.
  • the requirement for a flushing composition to have a low viscosity often conflicts with the requirement for a low VOC content, or low flammability. There therefore exists a need for flushing compositions that overcome the disadvantages discussed previously, and that can be used in an automatic cleaning system comprising a vacuum removal step.
  • the inventors have surprisingly found that the use of specific combination of radiation- curable monomers provides a flushing composition that is suitable for use in an automatic cleaning system.
  • the invention therefore provides the use as described in the first or second embodiments wherein the composition additionally comprises a second radiation-curable (meth)acrylate monomer having a viscosity of less than 20 mPas at 25°C.
  • compositions used in this preferred embodiment of the invention provide a particularly advantageous combination of properties.
  • the preferred compositions are suitable for use in automatic cleaning systems that use a vacuum removal assembly, but they also demonstrate the advantageous properties described above.
  • the inventors also surprisingly found that the use of a second radiation- curable (meth)acrylate monomer as defined above results in an improvement in cleaning ability. Without intending to be bound by theory, the improvement is thought to be due to the second radiation-curable (meth)acrylate monomer lowering the surface tension and therefore increasing the wetting power of the composition.
  • the invention also provides a flushing composition for a radiation-curing printing apparatus, said composition consisting essentially of at least one first radiation- curable (meth)acrylate monomer having a volatile organic content of less than 100 g/L as measured by EPA Method 24, at least one second radiation-curable (meth)acrylate monomer having a viscosity of less than 20 mPas at 25°C, and a UV inhibitor.
  • the invention provides a flushing composition for a radiation-curing printing apparatus, said composition consisting essentially of at least one first radiation-curable (meth)acrylate monomer having a molecular weight of 340 to 600, at least one second radiation-curable (meth)acrylate monomer having a viscosity of less than 20 mPas 25°C, and a UV inhibitor.
  • compositions used according to the present invention comprise a radiation- curable (meth)acrylate monomer having a VOC content of less than 100g/L as measured by EPA Method 24 and/or a molecular weight of 340 to 600. Throughout the description of the invention this monomer will be referred to as the first radiation- curable (meth)acrylate monomer.
  • the composition additionally comprises a monomer having a viscosity of less than 20 mPas at 25°C. This monomer will be referred to as the second radiation-curable (meth)acrylate monomer.
  • the first radiation curable monomer and the second radiation curable monomer are different.
  • radiation-curable monomer is meant a monomer that is capable of polymerising upon exposure to radiation, for example UV radiation, in the presence of a photoinitiator, to provide a hardened or cured material.
  • (meth)acrylate monomer is meant an acrylate and/or methacrylate monomer.
  • the first radiation-curable (meth)acrylate monomer will be described in further detail.
  • (Meth)acrylate monomers are widely available. Any (meth)acrylate monomer that has a VOC content of less than 100 g/L as measured by EPA Method 24 and/or a molecular weight of 340 to 600 can be used as the first monomer in the present invention. Suitable monomers are commercially available or can be made by methods known in the art.
  • the first radiation-curable (meth)acrylate monomer has a VOC content less than 50 g/L as measured by EPA Method 24, most preferably less than 20 g/L.
  • the first radiation-curable (meth)acrylate monomer preferably has a viscosity of less than or equal to 100 mPas at 25 0 C, more preferably less than or equal to 80 mPas and most preferably from 20 mPas to 75 mPas at 25 0 C.
  • the first monomer is preferably a mono functional monomer or a difunctional monomer although multifunctional monomers can also be used.
  • monofunctional monomer is meant a monomer having one polymerisable group per monomer molecule.
  • a “difunctional monomer” has two polymerisable groups per monomer molecule.
  • Acrylate monomers are preferred.
  • the monomer can comprise branched or cyclic groups or have a linear structure.
  • Monomers having a "linear structure" comprise one or more polymerisable groups bonded to a linear group. In other words, the monomer comprises no branched or cyclic groups.
  • the first radiation-curable (meth)acrylate monomer preferably comprises one or more oxygen atoms in addition to those found in the (meth)acrylate polymerisable group(s).
  • the first monomer preferably comprises at least one ether, carbamate or an additional ester group.
  • ether group is meant -R-O-Ri- wherein R and Ri are divalent hydrocarbyl groups having 1 to 6 carbon atoms.
  • carbamate group is meant -R 2 -HN-C(O)-O-Rs- wherein R 2 and R3 are divalent hydrocarbyl groups having 1 to 6 carbon atoms.
  • ester group is meant -R 4 -C(O)-O-Rs- wherein R 4 and R5 are divalent hydrocarbyl groups having 1 to 6 carbon atoms.
  • Acrylate and methacrylate monomers comprise an ester of acrylic or methacrylic acid. Where the discussion herein refers to an additional ester group, it is taken to mean an ester group in addition to the ester that forms part of the (meth)acrylate group.
  • first monomers include caprolactone acrylate, which has the following structure:
  • urethane monoacrylates such as Ebecryl 1040 sold by Cytec, Inc.
  • a particularly preferred first monomer comprises an alkoxy group of the formula -(CH(Re)-CH 2 -O) n - wherein R 6 is hydrogen or methyl and n has an average value of 1 to 15, preferably 2 to 10.
  • this type of monomer include polyethylene glycol (meth)acrylates and di(meth)acrylates and 1 to 4 molar alkoxylated Ci to Cs alkanediol diacrylates.
  • An example of the latter is 1 to 2 molar alkoxylated hexanediol diacrylate (alkoxylated HDDA), preferably 1 to 2 molar ethoxylated hexanediol diacrylate.
  • Suitable alkoxylated hexane diol diacrylates include CD564 and CD561, obtainable from Sartomer.
  • Polyethylene glycol (PEG) diacrylates are preferred, particularly polyethylene glycol (200) diacrylate and polyethylene glycol (400) diacrylate. Polyethylene glycol (200) diacrylate is most preferred.
  • the compositions used according to the present invention may comprise one or a mixture of two or more of the first monomers described above.
  • the second radiation-curable (meth)acrylate monomer will be described in further detail. Any (meth)acrylate monomer that has a viscosity of less than 20 mPas at 25°C can be used as a second monomer in the present invention. Suitable monomers are commercially available or can be made by methods known in the art.
  • the second radiation-curable (meth)acrylate monomer has a viscosity at 25 0 C that is lower than the viscosity of the first radiation-curable (meth)acrylate monomer at 25 0 C.
  • the viscosity of the second radiation-curable (meth)acrylate monomer at 25 0 C is preferably at least 5 mPas lower than the viscosity of the first radiation- curable (meth)acrylate monomer at 25 0 C, more preferably at least 10 mPas lower, and more preferably at least 15 mPas lower.
  • the second monomer is preferably a mono functional monomer or a difunctional monomer although multifunctional monomers can also be used. Acrylate monomers are preferred.
  • the second radiation-curable (meth)acrylate monomer can include branched, cyclic or linear groups.
  • One preferred type of second monomer comprises an ether group wherein "ether" is as defined above.
  • This preferred type of monomer preferably includes branched and/or cyclic groups. Examples of this preferred type of monomer include propoxylated (2) neopentyl glycol diacrylate (neopentyl glycol DA (2-PO)) and cyclic trimethylolpropane formal acrylate:
  • Propoxylated (2) neopentyl glycol diacrylate is particularly preferred.
  • An alternative, and most preferred type of second monomer comprises a linear C 4 -C u alkyl or a linear C4-C14 alkylene group.
  • Particularly preferred monomers include Cs- C 14 linear alkyl monoacrylates and C 4 -Cs linear alkylene diacrylates, preferably lauryl acrylate, octyl/decyl acrylate, tridecyl acrylate or 1,6 hexanediol diacrylate (1,6 HDDA), most preferably tridecyl acrylate.
  • C 4 -C 14 alkyl is meant a monovalent alkyl radical comprising 4 to 14 carbon atoms.
  • C 4 -C 14 alkylene is a divalent alkylene radical comprising 4 to 14 carbon atoms.
  • compositions used according to the present invention may comprise one or a mixture of two or more of the second monomers described above.
  • composition used according to the present invention preferably comprises greater than 75 weight percent, more preferably greater than 85 weight percent and most preferably greater than 95 weight percent of radiation-curable (meth)acrylate monomer based on the total weight of the composition.
  • compositions used according to the invention may comprise greater than 75 weight percent, more preferably greater than 85 weight percent and most preferably greater than 95 weight percent of at least one first radiation-curable (meth)acrylate monomer.
  • the total amount of first and second radiation-curable (meth)acrylate monomer preferably comprises greater than 75 weight percent, more preferably greater than 85 weight percent and most preferably greater than 95 weight percent, based on the total weight of the composition.
  • compositions used according to the invention may include additional components such as secondary cleaning agents, surfactants, defoamers, stabilisers against deterioration by heat or light, solvents and biocides.
  • the compositions used according to the present invention preferably comprise a photo inhibitor.
  • the photo inhibitor is preferably added in a trace amount.
  • photoinhibitor is meant a stabiliser that prevents deterioration of the composition by incident actinic radiation, particularly UV light.
  • the compositions preferably comprise less than 10% by weight of water, more preferably less than 5%. Most preferably the compositions are substantially free of water.
  • the compositions used according to the invention consist essentially of at least one first radiation-curable (meth)acrylate monomer as defined above and a UV inhibitor.
  • the compositions used according to the invention consist of at least one first radiation-curable (meth)acrylate monomer as defined above and a UV inhibitor.
  • preferred compositions used according to the invention consist essentially of at least one first radiation-curable (meth)acrylate monomer as defined above, at least one second radiation-curable (meth)acrylate monomer as defined above, and a UV inhibitor.
  • the compositions used according to the invention consist of at least one first radiation-curable (meth)acrylate monomer as defined above, at least one second radiation-curable (meth)acrylate monomer as defined above and a UV inhibitor.
  • Consisting essentially of is taken to mean that in addition to those components which are stated to be mandatory, other components may also be present in the composition, provided that the essential characteristics of the composition are not materially affected by their presence.
  • compositions used according to the present invention comprise 75 to 97 weight percent, preferably 85 to 95 weight percent, and most preferably about 90 weight percent of said first radiation-curable (meth)acrylate monomer, and 3 to 25 weight percent, preferably 5 to 15 weight percent and most preferably about 10 weight percent of second radiation-curable (meth)acrylate monomer, based on the total weight of radiation-curable monomer.
  • compositions used according to the present invention can comprise any combination of first and second monomer described above.
  • Preferred compositions comprise a first monomer comprising an alkoxy group of the formula -(CH(Rs)-CH 2 -O) n - wherein R ⁇ is hydrogen or methyl and n has an average value of 1 to 15, preferably 2 to 10, and a second monomer comprising a linear C4-C14 alkyl or linear C4-C14 alkylene group.
  • Particularly preferred combinations comprise a polyethylene glycol (meth)acrylate such as polyethylene glycol (200) diacrylate or polyethylene glycol (400) diacrylate, and a Cs-Ci 4 linear alkyl monoacrylate such as lauryl acrylate, octyl/decyl acrylate or tridecyl acrylate, preferably tridecyl acrylate.
  • the most preferred combination of first and second monomers comprises polyethylene glycol (200) diacrylate and tridecyl acrylate.
  • a highly preferred composition used according to the invention comprises about 90 weight percent of polyethylene glycol (200) diacrylate and about 10 weight percent of tridecyl acrylate, based on the total weight of monomer.
  • the present invention provides the use of compositions comprising a radiation- curable (meth)acrylate monomer as flushing compositions for a radiation-curing printing apparatus.
  • the compositions described in the present application can be used as flushing compositions for any radiation-curing printing apparatus such as printing screens and ink-jet printers.
  • the compositions can be applied to the printer apparatus manually, for example by applying the composition to a cloth and wiping the apparatus clean.
  • Many modern ink-jet printers provide an automatic cleaning system, however, and the compositions can advantageously be used in these automatic cleaning systems.
  • Some automatic cleaning systems comprise a spraying nozzle that coats the nozzle plate with cleaning solution, and a vacuum nozzle that removes said composition along with the dissolved ink and other dirt.
  • compositions described herein are preferably used to clean UV-curable ink-jet printers, most preferably UV-curable ink-jet printers that use an acrylate-containing, UV-curable ink.
  • the invention also provides flushing compositions per se.
  • the present invention provides a flushing composition for a radiation-curing printing apparatus, said composition consisting essentially of at least one first radiation-curable (meth)acrylate monomer having a VOC content of less than 100 g/L as measured by EPA Method 24, at least one second radiation-curable (meth)acrylate monomer having a viscosity of less than 20 mPas at 25°C, and a UV inhibitor.
  • the present invention also provides a flushing composition for a radiation-curing printing apparatus, said composition consisting essentially of at least one first radiation-curable (meth)acrylate monomer having a molecular weight of 340 to 600, at least one second radiation-curable (meth)acrylate monomer having a viscosity of less than 20 mPas at 25°C, and a UV inhibitor.
  • the preferred monomers, monomer combinations and relative amounts of first and second monomers provided in the flushing compositions of the invention are as described above.
  • Viscosity may be measured using a digital Brookfield viscometer fitted with a thermostatically controlled cup and spindle arrangement and a ULVA, or ultra- low- viscosity adapter, such as model LVDV-I.
  • the spindle used with this ULVA is SOO and the spindle speed is 12 to 60 rpm, for example 40 rpm.
  • United States Environmental Protection Agency Reference Method 24 provides a method for determining the volatile matter content, water content, density, volume solids, and weight solids of surface coatings. This method allows the VOC content to be measured indirectly. The total volatile matter content is determined using ASTM
  • Other ASTM methods are used to measure the amount of water and exempt solvents, and these are subtracted from the total volatile matter to give the VOC content.
  • Viscosity, VOC content and surface tension data for examples of monomers suitable for use in the present invention and for TPM are provided in Table 1 below. Viscosities are provided by the supplier unless stated otherwise. TABLE 1
  • Table 2 shows a comparison of the properties of known flushing compositions and compositions of the invention. Percentages are weight percentages.
  • compositions of Examples 1 to 3 provide good cleaning efficiency and are suitable for use in an automatic cleaning system with vacuum assembly.

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

L'invention porte sur une composition de rinçage pour un appareil d'impression à durcissement par rayonnement, incluant un monomère de méth(acrylate) durcissable par rayonnement présentant une teneur en composé organique volatil (VOC) inférieure à 100 g/l, mesurée par un procédé EPA (24).
PCT/GB2009/050025 2008-01-14 2009-01-14 Composition de rinçage WO2009090425A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2090508P 2008-01-14 2008-01-14
US61/020,905 2008-01-14

Publications (1)

Publication Number Publication Date
WO2009090425A1 true WO2009090425A1 (fr) 2009-07-23

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PCT/GB2009/050025 WO2009090425A1 (fr) 2008-01-14 2009-01-14 Composition de rinçage

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WO (1) WO2009090425A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2921537A1 (fr) * 2014-03-19 2015-09-23 Seiko Epson Corporation Procédé et liquide d'entretien
JP2016159451A (ja) * 2015-02-27 2016-09-05 ブラザー工業株式会社 インクジェット記録装置及び堆積抑制方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3214463A (en) * 1960-05-12 1965-10-26 Du Pont Uv-absorbing sulfonated benzophenone derivatives
US20030092820A1 (en) * 2001-10-03 2003-05-15 Schmidt Kris Alan Ultra-violet light curable hot melt composition
EP1621348A1 (fr) * 2004-07-22 2006-02-01 Toshiba Tec Kabushiki Kaisha Solution de lavage pour une tête imprimante à jet d'encre et procédé de lavage utilisant la solution
EP1837182A1 (fr) * 2006-03-22 2007-09-26 FUJIFILM Corporation Liquide de lavage d'encre et procédé de nettoyage
EP1955850A2 (fr) * 2007-02-07 2008-08-13 FUJIFILM Corporation Dispositif de maintenance de tête d'impression par jet d'encre, dispositif d'impression par jet d'encre et procédé de maintenance de tête d'impression par jet d'encre

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3214463A (en) * 1960-05-12 1965-10-26 Du Pont Uv-absorbing sulfonated benzophenone derivatives
US20030092820A1 (en) * 2001-10-03 2003-05-15 Schmidt Kris Alan Ultra-violet light curable hot melt composition
EP1621348A1 (fr) * 2004-07-22 2006-02-01 Toshiba Tec Kabushiki Kaisha Solution de lavage pour une tête imprimante à jet d'encre et procédé de lavage utilisant la solution
EP1837182A1 (fr) * 2006-03-22 2007-09-26 FUJIFILM Corporation Liquide de lavage d'encre et procédé de nettoyage
EP1955850A2 (fr) * 2007-02-07 2008-08-13 FUJIFILM Corporation Dispositif de maintenance de tête d'impression par jet d'encre, dispositif d'impression par jet d'encre et procédé de maintenance de tête d'impression par jet d'encre

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2921537A1 (fr) * 2014-03-19 2015-09-23 Seiko Epson Corporation Procédé et liquide d'entretien
US10858614B2 (en) 2014-03-19 2020-12-08 Seiko Epson Corporation Maintenance liquid and maintenance method
EP3943559A1 (fr) * 2014-03-19 2022-01-26 Seiko Epson Corporation Procédé et liquide d'entretien
US11629210B2 (en) 2014-03-19 2023-04-18 Seiko Epson Corporation Maintenance liquid and maintenance method
JP2016159451A (ja) * 2015-02-27 2016-09-05 ブラザー工業株式会社 インクジェット記録装置及び堆積抑制方法

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