WO2009057589A1 - Capacitor, semiconductor device comprising the same, and method for manufacturing capacitor - Google Patents
Capacitor, semiconductor device comprising the same, and method for manufacturing capacitor Download PDFInfo
- Publication number
- WO2009057589A1 WO2009057589A1 PCT/JP2008/069542 JP2008069542W WO2009057589A1 WO 2009057589 A1 WO2009057589 A1 WO 2009057589A1 JP 2008069542 W JP2008069542 W JP 2008069542W WO 2009057589 A1 WO2009057589 A1 WO 2009057589A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- capacitor
- film
- insulating film
- semiconductor device
- same
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45531—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations specially adapted for making ternary or higher compositions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02189—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing zirconium, e.g. ZrO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/0805—Capacitors only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
Abstract
Disclosed is a capacitor wherein an upper electrode and a lower electrode are formed on either side of a capacitor insulating film. In this capacitor, increase of leakage current can be suppressed and EOT can be reduced. Specifically disclosed is a capacitor wherein an upper electrode and a lower electrode are formed on either side of a capacitor insulating film. This capacitor is characterized in that the capacitor insulating film is composed of a dielectric body having a crystal structure and mainly composed of Zr, Al and O. In this dielectric body the composition ratio between Zr and Al satisfies the following relation: (1-x):x (0.01 ≤ x ≤ 0.15). The capacitor is also characterized in that the lower electrode has a multilayer structure composed of a TiN film and one film selected from an Ru film, a Pt film and an Ir film, and the film selected from an Ru film, a Pt film and an Ir film is in contact with the capacitor insulating film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009539065A JP5373619B2 (en) | 2007-10-30 | 2008-10-28 | Capacitor, semiconductor device having the same, and method of manufacturing capacitor |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007281512 | 2007-10-30 | ||
JP2007-281512 | 2007-10-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009057589A1 true WO2009057589A1 (en) | 2009-05-07 |
Family
ID=40590980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/069542 WO2009057589A1 (en) | 2007-10-30 | 2008-10-28 | Capacitor, semiconductor device comprising the same, and method for manufacturing capacitor |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5373619B2 (en) |
WO (1) | WO2009057589A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011018707A (en) * | 2009-07-07 | 2011-01-27 | Hitachi Kokusai Electric Inc | Method of manufacturing semiconductor device, and substrate processing apparatus |
JP2011044577A (en) * | 2009-08-21 | 2011-03-03 | Hitachi Kokusai Electric Inc | Method of manufacturing semiconductor device |
JP2012069871A (en) * | 2010-09-27 | 2012-04-05 | Elpida Memory Inc | Semiconductor device, method of manufacturing the same, and adsorption site blocking atomic layer deposition method |
JP2013131749A (en) * | 2011-12-20 | 2013-07-04 | Imec | Metal-insulator-metal stack and method for manufacturing the same |
CN109494303A (en) * | 2017-09-12 | 2019-03-19 | 松下知识产权经营株式会社 | The manufacturing method of capacity cell, imaging sensor, the manufacturing method of capacity cell and imaging sensor |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002033320A (en) * | 2000-07-06 | 2002-01-31 | Sharp Corp | Doped zirconia or zirconia-like dielectric film transistor structure, and method of depositing the same |
JP2004186516A (en) * | 2002-12-05 | 2004-07-02 | Sony Corp | Manufacturing method of ferroelectric nonvolatile semiconductor memory |
JP2004214304A (en) * | 2002-12-27 | 2004-07-29 | Nec Electronics Corp | Semiconductor device and its fabricating process |
JP2005259872A (en) * | 2004-03-10 | 2005-09-22 | Matsushita Electric Ind Co Ltd | Semiconductor device and its manufacturing method |
JP2007081265A (en) * | 2005-09-16 | 2007-03-29 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacturing method therefor |
JP2007150242A (en) * | 2005-11-28 | 2007-06-14 | Hynix Semiconductor Inc | Method for manufacturing capacitor of semiconductor element |
-
2008
- 2008-10-28 WO PCT/JP2008/069542 patent/WO2009057589A1/en active Application Filing
- 2008-10-28 JP JP2009539065A patent/JP5373619B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002033320A (en) * | 2000-07-06 | 2002-01-31 | Sharp Corp | Doped zirconia or zirconia-like dielectric film transistor structure, and method of depositing the same |
JP2004186516A (en) * | 2002-12-05 | 2004-07-02 | Sony Corp | Manufacturing method of ferroelectric nonvolatile semiconductor memory |
JP2004214304A (en) * | 2002-12-27 | 2004-07-29 | Nec Electronics Corp | Semiconductor device and its fabricating process |
JP2005259872A (en) * | 2004-03-10 | 2005-09-22 | Matsushita Electric Ind Co Ltd | Semiconductor device and its manufacturing method |
JP2007081265A (en) * | 2005-09-16 | 2007-03-29 | Matsushita Electric Ind Co Ltd | Semiconductor device and manufacturing method therefor |
JP2007150242A (en) * | 2005-11-28 | 2007-06-14 | Hynix Semiconductor Inc | Method for manufacturing capacitor of semiconductor element |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011018707A (en) * | 2009-07-07 | 2011-01-27 | Hitachi Kokusai Electric Inc | Method of manufacturing semiconductor device, and substrate processing apparatus |
US8685866B2 (en) | 2009-07-07 | 2014-04-01 | Hitachi Kokusai Electric, Inc. | Method of manufacturing semiconductor device and substrate processing apparatus |
JP2011044577A (en) * | 2009-08-21 | 2011-03-03 | Hitachi Kokusai Electric Inc | Method of manufacturing semiconductor device |
JP2012069871A (en) * | 2010-09-27 | 2012-04-05 | Elpida Memory Inc | Semiconductor device, method of manufacturing the same, and adsorption site blocking atomic layer deposition method |
JP2013131749A (en) * | 2011-12-20 | 2013-07-04 | Imec | Metal-insulator-metal stack and method for manufacturing the same |
CN109494303A (en) * | 2017-09-12 | 2019-03-19 | 松下知识产权经营株式会社 | The manufacturing method of capacity cell, imaging sensor, the manufacturing method of capacity cell and imaging sensor |
CN109494303B (en) * | 2017-09-12 | 2024-01-19 | 松下知识产权经营株式会社 | Capacitive element, image sensor, method for manufacturing capacitive element, and method for manufacturing image sensor |
Also Published As
Publication number | Publication date |
---|---|
JPWO2009057589A1 (en) | 2011-03-10 |
JP5373619B2 (en) | 2013-12-18 |
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