WO2009054102A1 - Procede et appareil de classification de defauts - Google Patents
Procede et appareil de classification de defauts Download PDFInfo
- Publication number
- WO2009054102A1 WO2009054102A1 PCT/JP2008/002871 JP2008002871W WO2009054102A1 WO 2009054102 A1 WO2009054102 A1 WO 2009054102A1 JP 2008002871 W JP2008002871 W JP 2008002871W WO 2009054102 A1 WO2009054102 A1 WO 2009054102A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- classification
- defect
- defect classification
- correct answer
- condition setting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
Landscapes
- Engineering & Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Signal Processing (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Quality & Reliability (AREA)
- Theoretical Computer Science (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Image Analysis (AREA)
Abstract
Selon l'invention, dans la classification de défauts résultant d'une inspection d'aspect, la pureté ou la précision, ou les deux, d'un défaut critique doit/doivent être définie(s) comme égale(s) ou supérieure(s) à une valeur cible. Cependant, comme une condition de classification de défauts de type instruction est déterminée de sorte à permettre un taux moyen élevé de réponses correctes, la classification de défauts ne peut pas répondre à ces exigences. L'appareil de classification de défauts selon l'invention comprend une unité d'extraction de quantité caractéristique, une unité de classification de défauts et une unité de définition de conditions de classification. Cette dernière unité est dotée d'une fonction destinée à donner une instruction concernant une quantité caractéristique de défauts correspondant à une catégorie de réponses correctes, et d'une fonction destinée à désigner un ordre de priorité de classification. Ladite unité définit également les conditions de sorte qu'une classification haute priorité résulte en un taux élevé de réponses correctes.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007273894A JP5022174B2 (ja) | 2007-10-22 | 2007-10-22 | 欠陥分類方法及びその装置 |
JP2007-273894 | 2007-10-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009054102A1 true WO2009054102A1 (fr) | 2009-04-30 |
Family
ID=40579212
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/002871 WO2009054102A1 (fr) | 2007-10-22 | 2008-10-10 | Procede et appareil de classification de defauts |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5022174B2 (fr) |
WO (1) | WO2009054102A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011036846A1 (fr) * | 2009-09-28 | 2011-03-31 | 株式会社日立ハイテクノロジーズ | Dispositif et procédé d'inspection de défectuosités |
US8892494B2 (en) | 2009-07-23 | 2014-11-18 | Hitachi High-Technologies Corporation | Device for classifying defects and method for adjusting classification |
CN112129869A (zh) * | 2020-09-23 | 2020-12-25 | 清华大学深圳国际研究生院 | 基于数据驱动的现场质谱仪稳定输出控制系统及方法 |
US11282229B2 (en) | 2018-04-20 | 2022-03-22 | Fanuc Corporation | Inspection apparatus |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5452392B2 (ja) | 2009-12-16 | 2014-03-26 | 株式会社日立ハイテクノロジーズ | 欠陥観察方法及び欠陥観察装置 |
US9020237B2 (en) | 2010-06-07 | 2015-04-28 | Hitachi High-Technologies Corporation | Method for optimizing observed image classification criterion and image classification apparatus |
US8315453B2 (en) * | 2010-07-27 | 2012-11-20 | Applied Materials Israel, Ltd. | Defect classification with optimized purity |
BR112013011107A2 (pt) * | 2010-11-12 | 2016-08-02 | 3M Innovative Properties Co | ''processamento e detecção rápidos de não uniformidades em materiais á base de manta'' |
US9715723B2 (en) | 2012-04-19 | 2017-07-25 | Applied Materials Israel Ltd | Optimization of unknown defect rejection for automatic defect classification |
US10043264B2 (en) | 2012-04-19 | 2018-08-07 | Applied Materials Israel Ltd. | Integration of automatic and manual defect classification |
US10114368B2 (en) | 2013-07-22 | 2018-10-30 | Applied Materials Israel Ltd. | Closed-loop automatic defect inspection and classification |
US9489599B2 (en) * | 2013-11-03 | 2016-11-08 | Kla-Tencor Corp. | Decision tree construction for automatic classification of defects on semiconductor wafers |
JP6531036B2 (ja) * | 2015-12-08 | 2019-06-12 | 株式会社Screenホールディングス | 教師データ作成支援方法、画像分類方法、教師データ作成支援装置および画像分類装置 |
JP7186539B2 (ja) * | 2018-08-03 | 2022-12-09 | Automagi株式会社 | 錆検出プログラム、錆検出システム及び錆検出方法 |
JP7349066B2 (ja) * | 2019-12-17 | 2023-09-22 | 日本電気硝子株式会社 | 欠陥分類方法、欠陥分類装置及びガラス物品の製造方法 |
US11293970B2 (en) | 2020-01-12 | 2022-04-05 | Kla Corporation | Advanced in-line part average testing |
WO2023095416A1 (fr) * | 2021-11-25 | 2023-06-01 | 株式会社ジャパンディスプレイ | Procédé d'inspection de dispositif d'affichage et dispositif de traitement d'informations |
JP2023107693A (ja) | 2022-01-24 | 2023-08-03 | オムロン株式会社 | 分類条件設定支援装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005274285A (ja) * | 2004-03-24 | 2005-10-06 | Olympus Corp | 欠陥分類辞書教示装置 |
JP2007067130A (ja) * | 2005-08-31 | 2007-03-15 | Hitachi High-Technologies Corp | 回路パターン検査方法及びその装置 |
JP2008082821A (ja) * | 2006-09-27 | 2008-04-10 | Hitachi High-Technologies Corp | 欠陥分類方法及びその装置並びに欠陥検査装置 |
-
2007
- 2007-10-22 JP JP2007273894A patent/JP5022174B2/ja not_active Expired - Fee Related
-
2008
- 2008-10-10 WO PCT/JP2008/002871 patent/WO2009054102A1/fr active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005274285A (ja) * | 2004-03-24 | 2005-10-06 | Olympus Corp | 欠陥分類辞書教示装置 |
JP2007067130A (ja) * | 2005-08-31 | 2007-03-15 | Hitachi High-Technologies Corp | 回路パターン検査方法及びその装置 |
JP2008082821A (ja) * | 2006-09-27 | 2008-04-10 | Hitachi High-Technologies Corp | 欠陥分類方法及びその装置並びに欠陥検査装置 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8892494B2 (en) | 2009-07-23 | 2014-11-18 | Hitachi High-Technologies Corporation | Device for classifying defects and method for adjusting classification |
WO2011036846A1 (fr) * | 2009-09-28 | 2011-03-31 | 株式会社日立ハイテクノロジーズ | Dispositif et procédé d'inspection de défectuosités |
JP2011089976A (ja) * | 2009-09-28 | 2011-05-06 | Hitachi High-Technologies Corp | 欠陥検査装置および欠陥検査方法 |
US9075026B2 (en) | 2009-09-28 | 2015-07-07 | Hitachi High-Technologies Corporation | Defect inspection device and defect inspection method |
US11282229B2 (en) | 2018-04-20 | 2022-03-22 | Fanuc Corporation | Inspection apparatus |
CN112129869A (zh) * | 2020-09-23 | 2020-12-25 | 清华大学深圳国际研究生院 | 基于数据驱动的现场质谱仪稳定输出控制系统及方法 |
CN112129869B (zh) * | 2020-09-23 | 2022-11-18 | 清华大学深圳国际研究生院 | 基于数据驱动的现场质谱仪稳定输出控制系统及方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2009103508A (ja) | 2009-05-14 |
JP5022174B2 (ja) | 2012-09-12 |
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