WO2009044667A1 - 感放射線性組成物 - Google Patents

感放射線性組成物 Download PDF

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Publication number
WO2009044667A1
WO2009044667A1 PCT/JP2008/067390 JP2008067390W WO2009044667A1 WO 2009044667 A1 WO2009044667 A1 WO 2009044667A1 JP 2008067390 W JP2008067390 W JP 2008067390W WO 2009044667 A1 WO2009044667 A1 WO 2009044667A1
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
sensitive composition
repeating unit
group
represented
Prior art date
Application number
PCT/JP2008/067390
Other languages
English (en)
French (fr)
Inventor
Yukio Nishimura
Yuusuke Asano
Original Assignee
Jsr Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corporation filed Critical Jsr Corporation
Priority to JP2009536025A priority Critical patent/JP5077354B2/ja
Publication of WO2009044667A1 publication Critical patent/WO2009044667A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

　本発明の感放射線性組成物は、下記一般式（ａ－１）で表される繰り返し単位（ａ－１）、下記一般式（ａ－２）で表される繰り返し単位（ａ－２）、及び酸解離性基を有する繰り返し単位（ａ－３）を含む重合体（Ａ）と、感放射線性酸発生剤（Ｂ）とを含有するものであり、解像性能に優れるだけでなく、ＬＷＲが小さく、パターン倒れ耐性に優れ、且つ、欠陥性にも優れたレジスト膜を形成可能な感放射線性組成物である。 （一般式（ａ－１）及び（ａ－２）中、Ｒ１はメチル基等を示し、Ｒ２は炭素数１～１２の直鎖状又は分岐状のアルキル基等を示し、Ｒ３は、ヒドロキシル基等を示す。）
PCT/JP2008/067390 2007-10-01 2008-09-26 感放射線性組成物 WO2009044667A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009536025A JP5077354B2 (ja) 2007-10-01 2008-09-26 感放射線性組成物

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-257633 2007-10-01
JP2007257633 2007-10-01
JP2007324529 2007-12-17
JP2007-324529 2007-12-17

Publications (1)

Publication Number Publication Date
WO2009044667A1 true WO2009044667A1 (ja) 2009-04-09

Family

ID=40526096

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/067390 WO2009044667A1 (ja) 2007-10-01 2008-09-26 感放射線性組成物

Country Status (3)

Country Link
JP (1) JP5077354B2 (ja)
TW (1) TW200919090A (ja)
WO (1) WO2009044667A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5655781B2 (ja) * 2009-06-16 2015-01-21 Jsr株式会社 感放射線性樹脂組成物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003270787A (ja) * 2002-03-15 2003-09-25 Jsr Corp 感放射線性樹脂組成物
JP2003342323A (ja) * 2002-05-28 2003-12-03 Everlight Usa Inc 化学増幅型ホトレジスト組成物の樹脂
JP2003345025A (ja) * 2002-05-28 2003-12-03 Everlight Usa Inc 化学増幅型ホトレジスト組成物
JP2005060638A (ja) * 2003-08-20 2005-03-10 Mitsubishi Rayon Co Ltd 重合体、製造方法、レジスト組成物およびパターン形成法
JP2006349940A (ja) * 2005-06-15 2006-12-28 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物およびレジストパターン形成方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4801328B2 (ja) * 2004-06-04 2011-10-26 出光ユニテック株式会社 チャックテープ、チャックテープ付き包装袋及びチャックテープ付き包装袋の製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003270787A (ja) * 2002-03-15 2003-09-25 Jsr Corp 感放射線性樹脂組成物
JP2003342323A (ja) * 2002-05-28 2003-12-03 Everlight Usa Inc 化学増幅型ホトレジスト組成物の樹脂
JP2003345025A (ja) * 2002-05-28 2003-12-03 Everlight Usa Inc 化学増幅型ホトレジスト組成物
JP2005060638A (ja) * 2003-08-20 2005-03-10 Mitsubishi Rayon Co Ltd 重合体、製造方法、レジスト組成物およびパターン形成法
JP2006349940A (ja) * 2005-06-15 2006-12-28 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物およびレジストパターン形成方法

Also Published As

Publication number Publication date
TW200919090A (en) 2009-05-01
JP5077354B2 (ja) 2012-11-21
JPWO2009044667A1 (ja) 2011-02-03

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