WO2009028249A1 - 固体メモリ - Google Patents

固体メモリ Download PDF

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Publication number
WO2009028249A1
WO2009028249A1 PCT/JP2008/060856 JP2008060856W WO2009028249A1 WO 2009028249 A1 WO2009028249 A1 WO 2009028249A1 JP 2008060856 W JP2008060856 W JP 2008060856W WO 2009028249 A1 WO2009028249 A1 WO 2009028249A1
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WO
WIPO (PCT)
Prior art keywords
recording
thin film
solid memory
erasing
change
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/060856
Other languages
English (en)
French (fr)
Inventor
Junji Tominaga
James Paul Fons
Alexander Kolobov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
National Institute of Advanced Industrial Science and Technology AIST
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by National Institute of Advanced Industrial Science and Technology AIST filed Critical National Institute of Advanced Industrial Science and Technology AIST
Priority to US12/733,295 priority Critical patent/US20100207090A1/en
Publication of WO2009028249A1 publication Critical patent/WO2009028249A1/ja
Anticipated expiration legal-status Critical
Priority to US13/923,447 priority patent/US9224460B2/en
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B7/2433—Metals or elements of Groups 13, 14, 15 or 16 of the Periodic Table, e.g. B, Si, Ge, As, Sb, Bi, Se or Te
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
    • H10D62/815—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/84—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being selenium or tellurium only 
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011—Manufacture or treatment of multistable switching devices
    • H10N70/021—Formation of switching materials, e.g. deposition of layers
    • H10N70/026—Formation of switching materials, e.g. deposition of layers by physical vapor deposition, e.g. sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20—Multistable switching devices, e.g. memristors
    • H10N70/231—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • H10N70/235—Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect between different crystalline phases, e.g. cubic and hexagonal
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8825—Selenides, e.g. GeSe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00—Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801—Constructional details of multistable switching devices
    • H10N70/881—Switching materials
    • H10N70/882—Compounds of sulfur, selenium or tellurium, e.g. chalcogenides
    • H10N70/8828—Tellurides, e.g. GeSbTe
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302—Metals or metalloids
    • G11B2007/24314—Metals or metalloids group 15 elements (e.g. Sb, Bi)
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/243—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising inorganic materials only, e.g. ablative layers
    • G11B2007/24302—Metals or metalloids
    • G11B2007/24316—Metals or metalloids group 16 elements (i.e. chalcogenides, Se, Te)

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Semiconductor Memories (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)

Abstract

　ＰＲＡＭにおけるデータの記録／消去は、これまで、その記録材料であるＴｅを含むカルコゲン化合物の結晶状態とアモルファス状態の一次相変態により生じる物理的特性変化に基づいて行われてきたが、記録薄膜は、単結晶ではなく、多結晶から構成されているので、抵抗値にバラツキがあり、相転移の際に発生する体積変化により、記録読み出し回数に制限があった。本願発明は、Ｓｂを含む薄膜とＴｅを含む薄膜を超格子構造により固体メモリを作成し、上記課題を解決し、繰り返し記録消去回数を１０１５回とした。
PCT/JP2008/060856 2007-08-31 2008-06-13 固体メモリ Ceased WO2009028249A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US12/733,295 US20100207090A1 (en) 2007-08-31 2008-06-13 Solid memory
US13/923,447 US9224460B2 (en) 2007-08-31 2013-06-21 Solid memory

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-225978 2007-08-31
JP2007225978A JP4595125B2 (ja) 2007-08-31 2007-08-31 固体メモリ

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US12/733,295 A-371-Of-International US20100207090A1 (en) 2007-08-31 2008-06-13 Solid memory
US13/923,447 Continuation US9224460B2 (en) 2007-08-31 2013-06-21 Solid memory

Publications (1)

Publication Number Publication Date
WO2009028249A1 true WO2009028249A1 (ja) 2009-03-05

Family

ID=40386978

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060856 Ceased WO2009028249A1 (ja) 2007-08-31 2008-06-13 固体メモリ

Country Status (5)

Country Link
US (2) US20100207090A1 (ja)
JP (1) JP4595125B2 (ja)
KR (1) KR101072748B1 (ja)
TW (1) TWI470784B (ja)
WO (1) WO2009028249A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010101055A1 (ja) * 2009-03-04 2010-09-10 独立行政法人産業技術総合研究所 固体メモリ
US8335106B2 (en) 2009-05-08 2012-12-18 Elpida Memory, Inc. Superlattice device, manufacturing method thereof, solid-state memory including superlattice device, data processing system, and data processing device

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JP4621897B2 (ja) 2007-08-31 2011-01-26 独立行政法人産業技術総合研究所 固体メモリ
JP4595125B2 (ja) 2007-08-31 2010-12-08 独立行政法人産業技術総合研究所 固体メモリ
JP2010287744A (ja) * 2009-06-11 2010-12-24 Elpida Memory Inc 固体メモリ、データ処理システム及びデータ処理装置
JP2012219330A (ja) * 2011-04-08 2012-11-12 Ulvac Japan Ltd 相変化メモリの形成装置、及び相変化メモリの形成方法
JP5705689B2 (ja) * 2011-09-05 2015-04-22 株式会社アルバック 相変化メモリの形成方法、及び相変化メモリの形成装置
JP5957375B2 (ja) * 2012-11-30 2016-07-27 株式会社日立製作所 相変化メモリ
JP6014521B2 (ja) * 2013-03-11 2016-10-25 株式会社日立製作所 相変化メモリおよび半導体記録再生装置
JP2015072977A (ja) * 2013-10-02 2015-04-16 株式会社日立製作所 不揮発性半導体記憶装置及びその製造方法
CN104934533B (zh) * 2015-04-27 2018-04-13 江苏理工学院 用于高速低功耗相变存储器的Ge/Sb类超晶格相变薄膜材料及其制备方法
CN108258114B (zh) * 2015-04-27 2020-12-08 江苏理工学院 用于高速相变存储器的GeTe/Sb类超晶格相变薄膜材料的制备方法
US10580976B2 (en) 2018-03-19 2020-03-03 Sandisk Technologies Llc Three-dimensional phase change memory device having a laterally constricted element and method of making the same
CN115000296B (zh) * 2022-05-18 2025-10-28 中国科学院上海微系统与信息技术研究所 一种界面相变存储材料、相变存储器及其制备方法

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Publication number Priority date Publication date Assignee Title
WO2010101055A1 (ja) * 2009-03-04 2010-09-10 独立行政法人産業技術総合研究所 固体メモリ
JP2010206017A (ja) * 2009-03-04 2010-09-16 National Institute Of Advanced Industrial Science & Technology 固体メモリ
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US8335106B2 (en) 2009-05-08 2012-12-18 Elpida Memory, Inc. Superlattice device, manufacturing method thereof, solid-state memory including superlattice device, data processing system, and data processing device

Also Published As

Publication number Publication date
JP4595125B2 (ja) 2010-12-08
KR101072748B1 (ko) 2011-10-11
US20130286725A1 (en) 2013-10-31
TW200931658A (en) 2009-07-16
US20100207090A1 (en) 2010-08-19
TWI470784B (zh) 2015-01-21
US9224460B2 (en) 2015-12-29
JP2009059421A (ja) 2009-03-19
KR20100047330A (ko) 2010-05-07

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