WO2009012732A3 - Optical element for x-ray microscopy - Google Patents

Optical element for x-ray microscopy Download PDF

Info

Publication number
WO2009012732A3
WO2009012732A3 PCT/CZ2008/000072 CZ2008000072W WO2009012732A3 WO 2009012732 A3 WO2009012732 A3 WO 2009012732A3 CZ 2008000072 W CZ2008000072 W CZ 2008000072W WO 2009012732 A3 WO2009012732 A3 WO 2009012732A3
Authority
WO
WIPO (PCT)
Prior art keywords
monocrystal
optical axis
optical element
atomic planes
ray microscopy
Prior art date
Application number
PCT/CZ2008/000072
Other languages
French (fr)
Other versions
WO2009012732A4 (en
WO2009012732A2 (en
Inventor
Goce Chadzitaskos
Original Assignee
Ceske Vysoke Uceni Tech V Praze
Goce Chadzitaskos
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceske Vysoke Uceni Tech V Praze, Goce Chadzitaskos filed Critical Ceske Vysoke Uceni Tech V Praze
Priority to EP08773243A priority Critical patent/EP2168130B1/en
Publication of WO2009012732A2 publication Critical patent/WO2009012732A2/en
Publication of WO2009012732A3 publication Critical patent/WO2009012732A3/en
Publication of WO2009012732A4 publication Critical patent/WO2009012732A4/en

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

Abstract

Optical set-up displaying X-ray radiation with wavelength ? consists of monocrystal (1) with atomic planes (2) in parallel with optical axis (3). The mutual distance of the atomic planes in resting state without the force is d0. Cross section (S) of the monocrystal (1) is variable. With respect to the optical axis (3) the farther and/or closer side of monocrystal (1), which is orthogonal to this optical axis (3), is equipped with a device creating and maintaining pull or push force (F) in direction orthogonal to atomic planes (2) of such monocrystal (1).
PCT/CZ2008/000072 2007-07-20 2008-06-19 Optical element for x-ray microscopy WO2009012732A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP08773243A EP2168130B1 (en) 2007-07-20 2008-06-19 Optical element for x-ray microscopy

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CZPV2007-494 2007-07-20
CZ20070494A CZ299759B6 (en) 2007-07-20 2007-07-20 Optical element for X-ray microscopy

Publications (3)

Publication Number Publication Date
WO2009012732A2 WO2009012732A2 (en) 2009-01-29
WO2009012732A3 true WO2009012732A3 (en) 2009-06-18
WO2009012732A4 WO2009012732A4 (en) 2009-08-20

Family

ID=39941697

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CZ2008/000072 WO2009012732A2 (en) 2007-07-20 2008-06-19 Optical element for x-ray microscopy

Country Status (3)

Country Link
EP (1) EP2168130B1 (en)
CZ (1) CZ299759B6 (en)
WO (1) WO2009012732A2 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5210779A (en) * 1991-07-26 1993-05-11 Hughes Aircraft Company Apparatus and method for focusing hard x-rays
JPH06232015A (en) * 1993-02-04 1994-08-19 Rigaku Corp Marking device for single crystal ingot
US20030147161A1 (en) * 2002-02-07 2003-08-07 Nikon Corporation Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1010299A (en) * 1996-06-26 1998-01-16 Ishikawajima Harima Heavy Ind Co Ltd Asymmetrical square spectroscope
JP3741398B2 (en) * 1997-08-29 2006-02-01 株式会社リガク X-ray measuring method and X-ray measuring apparatus
US6389100B1 (en) * 1999-04-09 2002-05-14 Osmic, Inc. X-ray lens system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5210779A (en) * 1991-07-26 1993-05-11 Hughes Aircraft Company Apparatus and method for focusing hard x-rays
JPH06232015A (en) * 1993-02-04 1994-08-19 Rigaku Corp Marking device for single crystal ingot
US20030147161A1 (en) * 2002-02-07 2003-08-07 Nikon Corporation Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same

Also Published As

Publication number Publication date
WO2009012732A4 (en) 2009-08-20
CZ2007494A3 (en) 2008-11-12
CZ299759B6 (en) 2008-11-12
EP2168130B1 (en) 2012-06-06
WO2009012732A2 (en) 2009-01-29
EP2168130A2 (en) 2010-03-31

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