WO2009011176A1 - Photosensitive lithographic printing plate material and method of developing the same - Google Patents

Photosensitive lithographic printing plate material and method of developing the same Download PDF

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Publication number
WO2009011176A1
WO2009011176A1 PCT/JP2008/060138 JP2008060138W WO2009011176A1 WO 2009011176 A1 WO2009011176 A1 WO 2009011176A1 JP 2008060138 W JP2008060138 W JP 2008060138W WO 2009011176 A1 WO2009011176 A1 WO 2009011176A1
Authority
WO
WIPO (PCT)
Prior art keywords
printing plate
plate material
photosensitive lithographic
lithographic printing
developing
Prior art date
Application number
PCT/JP2008/060138
Other languages
French (fr)
Japanese (ja)
Inventor
Kazuhiro Oikawa
Original Assignee
Konica Minolta Medical & Graphic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical & Graphic, Inc. filed Critical Konica Minolta Medical & Graphic, Inc.
Publication of WO2009011176A1 publication Critical patent/WO2009011176A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A photosensitive lithographic printing plate material. When the photosensitive lithographic printing plate material is developed with a developing solution containing no silicic acid, a colorant released from the printing plate material during the development does not adhere again to the printing plate material. Consequently, the resultant printing plate itself is free from soils and, when used in printing, gives a print free from image soils. Also provided is a method of developing the printing plate material. This photosensitive lithographic printing plate material, which is to be treated with a developing solution containing no silicic acid, comprises an aluminum plate base and, applied thereto, a photopolymerization type photosensitive resin composition comprising a monomer having an ethylenically unsaturated bond, a photopolymerization initiator, a photosensitizer dye, and a polymeric binder, and is characterized in that the photosensitizer dye is a compound represented by the following general formula (I) and the composition contains a chain-transfer agent.
PCT/JP2008/060138 2007-07-18 2008-06-02 Photosensitive lithographic printing plate material and method of developing the same WO2009011176A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007186775 2007-07-18
JP2007-186775 2007-07-18

Publications (1)

Publication Number Publication Date
WO2009011176A1 true WO2009011176A1 (en) 2009-01-22

Family

ID=40259518

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060138 WO2009011176A1 (en) 2007-07-18 2008-06-02 Photosensitive lithographic printing plate material and method of developing the same

Country Status (1)

Country Link
WO (1) WO2009011176A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105031706A (en) * 2015-07-01 2015-11-11 武汉纺织大学 Preparation method of polyvinyl alcohol medical sponge

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005029187A1 (en) * 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
JP2005275223A (en) * 2004-03-26 2005-10-06 Konica Minolta Medical & Graphic Inc Method for manufacturing planographic printing plate
JP2005316280A (en) * 2004-04-30 2005-11-10 Fuji Photo Film Co Ltd Original plate for lithographic printing plate
WO2005109103A1 (en) * 2004-05-06 2005-11-17 Agfa-Gevaert Photopolymer printing plate precursor.
JP2006259557A (en) * 2005-03-18 2006-09-28 Fuji Photo Film Co Ltd Photosensitive composition and lithographic printing original plate

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005029187A1 (en) * 2003-09-22 2005-03-31 Agfa-Gevaert Photopolymerizable composition.
JP2005275223A (en) * 2004-03-26 2005-10-06 Konica Minolta Medical & Graphic Inc Method for manufacturing planographic printing plate
JP2005316280A (en) * 2004-04-30 2005-11-10 Fuji Photo Film Co Ltd Original plate for lithographic printing plate
WO2005109103A1 (en) * 2004-05-06 2005-11-17 Agfa-Gevaert Photopolymer printing plate precursor.
JP2006259557A (en) * 2005-03-18 2006-09-28 Fuji Photo Film Co Ltd Photosensitive composition and lithographic printing original plate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105031706A (en) * 2015-07-01 2015-11-11 武汉纺织大学 Preparation method of polyvinyl alcohol medical sponge

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